High-precision wafer rotation device

CN309935057SActive Publication Date: 2026-04-21SHANGHAI BERLING TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
SHANGHAI BERLING TECH CO LTD
Filing Date
2025-07-25
Publication Date
2026-04-21

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Abstract

1. Name of the product in this design: Wafer Rotation Device (High Precision). 2. Application of this design: This design is used to control wafer rotation. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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