High-precision wafer rotation device
CN309935057SActive Publication Date: 2026-04-21SHANGHAI BERLING TECH CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHANGHAI BERLING TECH CO LTD
- Filing Date
- 2025-07-25
- Publication Date
- 2026-04-21
Smart Images

Figure 000007_ABST
Abstract
1. Name of the product in this design: Wafer Rotation Device (High Precision). 2. Application of this design: This design is used to control wafer rotation. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Need to check novelty before this filing date? Find Prior Art