SAMPLE HOLDER, METHOD FOR USING THE SAMPLE HOLDER, PROP AMOUNT ADJUSTING DEVICE, PROP AMOUNT ADJUSTING METHOD AND LOAD CARRIER BLASTING DEVICE
The sample holder with integrated pressure elements and elastic bodies ensures stable adhesion and precise positioning, addressing thermal issues and enhancing machining and observation accuracy in ion milling and scanning electron microscopy.
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2019-09-25
- Publication Date
- 2026-03-26
AI Technical Summary
Existing sample holders fail to ensure adequate adhesion between heat-sensitive samples and shielding plates during ion milling, leading to thermal damage, re-deposition, and changes in protrusion due to insufficient cooling efficiency, especially when using materials with high thermal expansion coefficients.
A sample holder design featuring a shielding plate connected to a sample support element with pressure elements and elastic bodies, ensuring static and dynamic stress to maintain adhesion, even during sample deformation, and incorporating a projection adjustment device for precise sample positioning.
The design prevents thermal damage, re-deposition, and protrusion changes, enabling high-accuracy machining and observation of samples in ion milling and scanning electron microscopy by maintaining consistent adhesion and facilitating easy adjustment of sample protrusion.
Smart Images

Figure 00000000_0000_ABST
Abstract
Description
Technical field
[0001] The present invention relates to a sample holder, a method for using the sample holder, a protrusion adjustment device for adjusting the protrusion of a sample attached to the sample holder, a method for adjusting the protrusion using the protrusion adjustment device, and a charge carrier beam device to which the sample holder can be attached, and which can preferably be used in particular for a sample holder containing a shielding plate. Technical background
[0002] In recent years, a sectioning process (ion milling) using an ion beam has become widely used as a method for producing a stress-free sample. In this process, a shielding plate (mask element) made of a low-sputtering-yield material is first placed on one side of the sample. Next, a section of the sample separated from an end face of the shielding plate by approximately 50 to 200 µm is exposed, with the ion beam being emitted from one surface side (shielding plate side) of the sample in an evacuated vacuum sample chamber. By removing atoms from the top of the sample using a physical sputtering phenomenon, a stress-free milled surface with a shape along the end face of the shielding plate can be obtained.
[0003] The resulting sample is a target for observation using, for example, a scanning electron microscope (SEM). Generally, ion milling to prepare a sample for SEM is often performed under machining conditions with an accelerating voltage of approximately 10 kV or less and an ion beam current of approximately 200 µA or less. At this point, the amount of heat transferred to the sample by the ion beam is approximately 2 J / s or less.
[0004] However, half the width of the ion milling surface of the sample is approximately 300 µm, and the processing time can exceed several hours. Consequently, when ion milling is applied to a sample with a low melting point, such as one made of a polymer material, the temperature rise of the sample cannot be ignored. To prevent this temperature rise, it is necessary to cool both the shielding plate and the sample. When the sample is cooled and the heat is dissipated by the shielding plate, adhesion between the shielding plate and the sample is required.
[0005] PTL 1 discloses, for example, an ion milling device equipped with a movement mechanism for moving a contact surface between a sample mounted on a sample holder and a shielding plate in response to deformation of the sample. PTL 1 also discloses a method for using a sample holding element arranged between the shielding plate and the sample, which deforms in response to the sample's deformation during irradiation with an ion beam. Furthermore, PTL 2 discloses a sample holder system consisting of a sample holder and a detachably connectable sample positioning device. The sample holder itself comprises a pivotably mounted holding section, which is fixed by means of a fastening mechanism. The external positioning device serves to position the sample relative to the shielding plate. Separating the holding and positioning functions simplifies the sample holder design.PTL 3 discloses a device for reducing thermal damage to samples during ion beam processing. For this purpose, a coolable blocking plate with an opening is positioned between the ion source and the sample mask. This plate limits the irradiation area on the sample by blocking the outer parts of a widened ion beam, such as occurs particularly at low accelerating voltages, and thus reduces the heat input into the sample. List of oppositions patent literature PTL 1: WO 2014 / 199 737 A1 PTL 2: US 2018 / 358 201 A1 PTL 3: DE 11 2014 006 536 T5 Summary of the invention: Technical problem
[0006] When a sample made of a heat-sensitive soft material is cooled using the ion milling device, it is essential to ensure adhesion between the shielding plate and the sample. In the prior art, the shielding plate is an accessory of a sample holder for holding the sample, wherein the shielding plate is pressed against the sample side by a screw to bring the shielding plate into close contact with the sample.
[0007] Fig. Figure 14 is a side view showing a main section of a sample holder of an experimental embodiment investigated by the inventors of this application. In the experimental embodiment, a shielding plate 102 and the sample SAM are brought into close contact. A section of the sample holder is provided with a mask holder 103 for holding the shielding plate 102. The mask holder 103 is a section to which a copper wire for transferring the cooling effect of liquid nitrogen in a Dewar outside a chamber to the shielding plate 102 is attached and is made of phosphor bronze. The mask holder 103 has high thermal conductivity but exhibits significant contraction due to cooling. As shown in Fig. As shown in Figure 14, the mask holder 103 contracts after cooling and warps, with a mask holder mounting section acting as a support point. Therefore, there is a problem: adhesion between the sample SAM and the shielding plate 102 cannot be guaranteed.
[0008] Examples of the impact of insufficient adhesion on sample preparation include thermal damage, re-deposition, and changes in the sample's protrusion. In an ion milling device equipped with a mechanism for cooling the sample by cooling the shielding plate, the cooling efficiency is reduced if the adhesion between the shielding plate and the sample is insufficient. Because the sample is inadequately cooled, heat from the ion beam irradiation accumulates in the sample, causing thermal damage. One example of this damage is sample melting.
[0009] Re-deposition is a problem because, if adhesion between the shielding plate and the sample cannot be ensured, fine particles removed by irradiation of the sample with argon ions adhere to a gap between the shielding plate and the sample.
[0010] The change in the protrusion amount is a problem because the shape of the sample changes until the temperature of both the shielding plate and the sample stabilizes due to cooling from one side of the shielding plate and the temperature increase caused by ion beam irradiation. Therefore, particularly in the case of a sample with a high coefficient of thermal expansion, a step is created on a machined surface of the sample. The "protrusion amount" described in this application refers to an exposure area of the sample irradiated with an ion beam.
[0011] To solve the problems mentioned above, it is important to attach the sample directly to the shielding plate and ensure sufficient adhesion between the shielding plate and the sample. Therefore, a high-performance sample holder that guarantees this adhesion is desired. Furthermore, a high-performance sample holder is needed that maintains this adhesion even if the sample shape changes during cooling.
[0012] One objective of this application is to improve the performance of a sample holder. Another objective is to easily adjust the projection of a sample attached to the sample holder. A further objective of this application is to increase the accuracy required for a charge carrier beam device by incorporating the aforementioned sample holder. If the charge carrier beam device is, for example, an ion milling device, one objective is to machine a sample with high accuracy. If the charge carrier beam device is a scanning electron microscope, one objective is to acquire a more accurate observational image.
[0013] Other problems and novel features will become apparent from a description of this patent specification and the accompanying drawings. Solution to the problem
[0014] An outline of a representative embodiment of the embodiments disclosed in this application is briefly described below.
[0015] A sample holder according to one aspect comprises: a shielding plate having a first front and a first back opposite the first front; a sample support connected to the first back of the shielding plate; and a pressure element configured to move in a first direction perpendicular to the first back of the shielding plate when the pressure element is attached to the sample support, and having a rod shape. The sample holder includes a sample support element located at a position facing the first back of the shielding plate and connected to the pressure element, and an elastic body extending along an outer circumference of the pressure element and connected to the sample support element and the sample holder. Beneficial effect
[0016] One aspect that can be improved is the performance of a sample holder. The projection of a sample attached to the sample holder can be easily adjusted. The accuracy required for a carrier beam device can be increased by incorporating the sample holder described above. Brief description of the drawings Fig. Figure 1 is a perspective view showing a sample holder according to a first embodiment. Fig. Figure 2 is a top view showing the sample holder according to the first embodiment. Fig. Figure 3 is a side view showing the sample holder according to the first embodiment. Fig. Figure 4 is a perspective view showing a shielding plate according to the first embodiment. Fig. Figure 5 is a perspective view showing a projection amount adjustment device according to the first embodiment. Fig. Figure 6 is a top view and a side view showing the projection amount adjustment device according to the first embodiment. Fig. Figure 7 is a side view showing a state in which the sample holder is attached to the projection amount adjusting device. Fig. Figure 8 is a flowchart that shows a procedure for setting the lead amount of a sample. Fig. Figure 9 is a schematic view showing an ion milling device according to the first embodiment. Fig. Figure 10 is a perspective view showing an attachment according to the first embodiment. Fig. Figure 11 is a top view and a side view showing the attachment according to the first embodiment. Fig. Figure 12 is a side view showing a state in which the sample holder is attached to the attachment. Fig. Figure 13 is a schematic view showing a scanning electron microscope according to the first embodiment. Fig. Figure 14 is a side view showing a main section of a sample holder in an investigation example. Description of the embodiments
[0017] One embodiment is described in detail below with respect to the drawings. In all drawings describing the embodiment, elements with the same functions are designated by the same reference numerals, and their repeated description is omitted. In the following embodiment, the description of the same or a similar section is generally not repeated unless necessary. (First embodiment)<Struktur des Probenhalters 1>
[0018] The sample holder 1 in the first embodiment is described below with regard to the Fig. 1 to 4 described. The sample holder 1 is preferably used for a charge carrier beam device, such as an ion milling device or a scanning electron microscope. Fig. Figures 1 to 3 are a perspective view, a side view and a top view showing the sample holder 1. Fig. Figure 4 is a perspective view to illustrate a screw hole 12 of a shielding plate 2.
[0019] As in the Fig. As shown in Figures 1 to 3, the sample holder 1 includes the shielding plate (mask element) 2, a fastening screw 3, a sample support element 4, the pressure elements 5, the springs (elastic bodies) 6, a sample carrier 7, which is a support element for the pressure elements 5 or the like, a plate 8, a knob 9, the fastening screws 10, and a fastening screw 13. These elements are each made of a non-magnetic material.
[0020] The shielding plate 2 is a plate with four sides tapered by approximately 50 µm. The shielding plate 2 has a front face 2f with a relatively small surface area and a back face 2b, which is opposite the front face 2f and has a surface area larger than that of the front face 2f. Each of the four side faces is trapezoidal. A screw hole for attaching the mounting screw 3 is formed in a central section of the shielding plate 2, with the mounting screw 3 being screwed into the shielding plate 2 on the side of the front face 2f.
[0021] The sample support element 4 is positioned facing the rear side 2b of the shielding plate 2 and is connected to the pressure element 5. The sample support element 4 comprises a front surface 4f and a rear surface 4b, which is a surface opposite the front surface 4f, with the front surface 4f facing the rear side 2b of the shielding plate 2. The width of the sample support element 4 is approximately equal to the width of the shielding plate 2 (one length of one side of the rear side 2b). A sample SAM is mounted between the sample support element 4 and the shielding plate 2. That is, the sample SAM is positioned between the sample support element 4 and the shielding plate 2 such that it is in contact with both the front surface 4f of the sample support element 4 and the rear side 2b of the shielding plate 2.
[0022] The rod-shaped pressure element 5, when attached to the sample carrier 7, can move in a direction perpendicular to the rear side 2b of the shielding plate 2. Specifically, the pressure element 5 penetrates a pressure element connection section 7b of the sample carrier 7 and is connected to the sample support element 4 and the plate 8. One end section of the pressure element 5 is connected to the sample support element 4, while the other end section of the pressure element 5 penetrates the sample carrier 7 and is connected to the plate 8. Fig. 1 the pressure element 5 with rod shape is a cylinder, but the pressure element 5 is not restricted to the cylinder and can be a polygonal prism.
[0023] As in Fig. As shown in Figure 3, two pressure elements 5 are provided, positioned in locations that are line-symmetric or point-symmetric with respect to a central section of the sample support element 4. In other words, the two pressure elements 5 are positioned in locations that are line-symmetric with respect to the central section of the shielding plate 2 (a central section of the fastening screw 3). The two pressure elements 5 are positioned as described above, such that the pressures exerted on the sample support element 4 are in equilibrium, with the pressure for holding the sample SAM on a contact surface between the sample support element 4 and the sample SAM being uniform.
[0024] The sample carrier 7 includes a shielding plate connection section 7a extending in the same direction as the pressure element 5, and a pressure element connection section 7b extending in a direction that intersects the shielding plate connection section 7a. In other words, the shielding plate connection section 7a extends in a direction perpendicular to the rear surface 2b of the shielding plate 2 and is connected to the shielding plate 2. The pressure element connection section 7b extends in a direction parallel to the rear surface 2b of the shielding plate 2 and is connected to the pressure element 5 and the spring 6.
[0025] The spring 6 is a type of elastic body that can expand and contract due to an external stress. It is provided along an outer circumference of the pressure element 5 and connected to the sample support element 4 and the sample carrier 7. In other words, the spring 6 is spirally coiled around the pressure element 5, which passes through an inner diameter of the spring 6. One end section of the spring 6 is connected to the sample support element 4, while the other end section of the spring 6 is connected to the pressure element connection section 7b of the sample carrier 7. Here, two springs 6 are provided on each of the outer circumferences of the two pressure elements 5 and are positioned similarly to the two pressure elements 5 at locations that are line-symmetric or point-symmetric with respect to the central section of the sample support element 4.
[0026] A section of plate 8 forms the cylindrical knob 9, which is positioned on a central section of plate 8. Knob 9 is pulled or pushed to change the position of the sample support element 4. That is, when knob 9 is moved in a direction perpendicular to the rear side 2b of the shielding plate 2, the sample support element 4, the pressure element 5, the spring 6, and plate 8 move together in the direction of movement of knob 9.
[0027] The fastening screw 13 is provided on a central section of the knob 9, penetrates the plate 8 and the sample carrier 7 (the pressure element connection section 7b), and has a length at which the fastening screw 13 can come into contact with the sample support element 4. The sample support element 4 is secured not only by the pressure element 5 but also by the fastening screw 13. Because the sample support element 4 can be secured by the fastening screw 13, its position can be prevented from being displaced due to an impact or the like.
[0028] As in Fig. As shown in Figure 4, a screw hole 12 for the fastening screw 10 is formed in a central section of each of the four sides that form the rear side 2b of the shielding plate 2. Two screw holes 12, provided point-symmetrically with respect to the central section of the rear side 2b of the shielding plate 2, are used to connect the shielding plate 2 and the sample holder 7. As can be seen from the Fig. 1 and Fig. As can be seen in Figure 2, two screw holes 11 are formed in the shielding plate connection section 7a of the sample carrier 7, the positions of the two screw holes being adjusted so that they are connected to two point-symmetrically provided screw holes 12. Each of the fastening screws 10 is inserted into the screw hole 11 and the screw hole 12, which are connected to each other, so that the sample carrier 7 is connected to the shielding plate 2 and the sample carrier 7 and the shielding plate 2 are a single unit.
[0029] The shielding plate 2 is rotated by 90 degrees, using the two other screw holes 12, so that the sample holder 7 can also be attached to the shielding plate 2. In this way, by rotating the shielding plate 2 to a predetermined position, the side from which the sample SAM protrudes can be appropriately modified. Therefore, all four sides of the shielding plate 2 can be used for ion milling. If damage to a particular side of the shielding plate 2 from ion milling becomes noticeable, it can be replaced with another side. Because each side can be used multiple times for ion milling, the cost of replacing the shielding plate 2 with a new one can be reduced.
[0030] As described above, according to the first embodiment, the sample holder 1, which can hold the sample SAM, can be created, wherein such a sample holder 1 can preferably be used for different charge carrier beam devices.
[0031] As described above, it is essential, for example, to cool the shielding plate 2 for contact with the sample SAM to prevent the temperature of the sample SAM from rising due to ion beam irradiation when the sample holder 1 is used for ion milling. In the case of an investigation example, as in Fig. As illustrated in Figure 14, the shielding plate 2 warps away from the sample SAM in one direction, with a mask holder attachment section acting as a support point, when a mask holder contracts. Consequently, adhesion cannot be guaranteed. As a result, the cooling efficiency of the sample SAM decreases, and thermal damage, re-deposition, and a change in the protrusion amount can occur.
[0032] In contrast, in the first embodiment, the shielding plate 2 and the sample holder 7 are connected and form a single unit. Consequently, the defect of the shielding plate 2 separating from the sample SAM can be reduced, and adhesion between the sample SAM and the shielding plate 2 can be ensured. Therefore, it is possible to create a high-performance sample holder 1 that can solve the problems mentioned above.
[0033] The sample SAM is pressed against the shielding plate 2 by a static and a dynamic stress exerted by the sample support element 4. In the first embodiment, the static stress is generated by the pressure element 5 and the fastening screw 13, while the dynamic stress is generated by the spring 6. The spring 6 can accommodate slight movement due to deformation and maintain a state in which the sample SAM is pressed against the shielding plate 2, even if the sample SAM undergoes deformation due to contraction or expansion. Therefore, adhesion between the sample SAM and the shielding plate 2 can be further ensured.
[0034] The elements forming the sample holder 1 are each made of a non-magnetic material. The shielding plate 2 is, for example, made of titanium (Ti) or tungsten carbide (WC). The fastening screw 3, the sample support element 4, the pressure elements 5, the sample carrier 7, the plate 8 including the knob 9, the fastening screws 10, and the fastening screw 13 are, for example, made of stainless steel, such as SUS316 or SUS316L. The spring 6 is, for example, made of phosphor bronze.
[0035] For example, if sample holder 1 is used for the scanning electron microscope and the elements of sample holder 1 each contain a magnetic material, a magnetic field is generated during observation that hinders the acquisition of an accurate image. If the elements are made of a non-magnetic material, the influence of the magnetic field during observation is reduced, allowing for a more accurate image. <Struktur der Vorsprungbetrag-Einstellvorrichtung und Verfahren zum Einstellen des Vorsprungbetrags>
[0036] Fig. Figure 5 is a perspective view showing a projection amount adjustment device 21, Fig. Figure 6 shows a top view and a side view showing the projection amount adjusting device 21, and Fig. Figure 7 is a side view showing a state in which the sample holder 1 is installed on the protrusion amount setting device 21. The sample holder 1 can be attached to the protrusion amount setting device 21, with the protrusion amount setting device 21 being used to set a protrusion amount of the sample SAM.
[0037] As in the Fig. As shown in Figures 5 to 7, the projection amount adjustment device 21 includes a shielding plate mounting carrier 22, a slider 23 and a micrometer (a movement mechanism) 24, wherein these components are one piece.
[0038] The shielding plate mounting bracket 22 comprises a front face 22f and a rear face 22b opposite the front face 22f. The shielding plate mounting bracket 22 is provided with a notch 25 extending from the front face 22f to the rear face 22b, and two edges 26 projecting slightly from the front face 22f in which the notch 25 is formed. The notch 25 is used to fasten the shielding plate 2 using the fastening screw 3, the widths of the two edges 26 being adapted to a width of the shielding plate 2. The shielding plate mounting bracket 22 has a thickness to which the fastening screw 3 can be attached.
[0039] The slider 23 is a plate and is provided on the front 22f of the shielding plate mounting bracket 22 and attached to the shielding plate mounting bracket 22. An end face of the slider 23 faces an end face of both the shielding plate 2 and the sample support element 4 and can come into close contact with an end face of the shielding plate 2. When the sample SAM is attached, the end face of the slider 23 comes into close contact with the end face of the sample SAM. The thickness of the slider 23 is greater than the thickness of the sample SAM and is such that the slider 23 can come into close contact with the sample SAM and the shielding plate 2.
[0040] A micrometer 24 is connected to the shielding plate mounting bracket 22 as a movement mechanism for the slide 23. By rotating the micrometer 24, the position of the slide 23 can be moved in a horizontal direction. For example, if the micrometer 24 is rotated clockwise, the slide 23 moves in a direction closer to the shielding plate 2, while if the micrometer 24 is rotated counterclockwise, the slide 23 moves in a direction away from the shielding plate 2.
[0041] Fig. Figure 8 is a flowchart showing a procedure for setting the lead amount of the sample SAM, wherein the procedure for setting the lead amount includes the steps S1 to S4 described below. <<Schritt S1> >
[0042] First, as a preparation for starting the adjustment, the micrometer 24 provided in the projection amount adjustment device 21 is rotated to set a scale of the micrometer 24 to zero (0). <<Schritt S2> >
[0043] The sample holder 1 is attached to the shielding plate mounting bracket 22. The sample holder 1 is attached, for example, to the front 22f of the shielding plate mounting bracket 22 along the edges 26, such that the front 2f of the shielding plate 2 is in contact with the front 22f of the shielding plate mounting bracket 22 and the sample support element 4 is positioned on one side of the slide 23. The shielding plate 2 is attached to the shielding plate mounting bracket 22 by inserting the fastening screw 3 from one side of the rear 22b of the shielding plate mounting bracket 22 into the notch 25. The end face of the shielding plate 2 is in close contact with the end face of the slide 23. <<Schritt S3> >
[0044] The exposure of sample SAM is determined. Because the slider 23 moves away from the shielding plate 2 by rotating the micrometer 24 counterclockwise, a distance from the shielding plate 2 to the slider 23 is set. That is, a distance between the shielding plate 2 and the slider 23 is set by moving the slider 23 using the micrometer 24. This distance is defined as the exposure of sample SAM. In other words, the exposure of sample SAM that is not covered by the shielding plate 2 and is exposed by the shielding plate 2 is defined as the exposure above. <<Schritt S4> >
[0045] The sample SAM is placed on the shielding plate mounting bracket 22, to which the sample holder 1 is attached. First, the knob 9 is lifted, moving the sample support element 4 or the like away from the shielding plate 2. Next, with the sample support element 4 separated from the shielding plate 2, the sample SAM is positioned between the sample support element 4 and the shielding plate 2. By bringing the end face of the sample SAM into contact with the end face of the slider 23, a section of the sample SAM is exposed from the shielding plate 2 (a section of the sample SAM protrudes from the shielding plate 2). Next, the knob 9 is slightly lowered, moving the sample support element 4 so that it comes into contact with the sample SAM and holds the sample SAM between the sample support element 4 and the shielding plate 2.Then the fastening screw 13 is turned to bring the fastening screw 13 into contact with the sample support element 4 and thereby fasten the sample support element 4.
[0046] In the example study, as it is in Fig. As shown in Figure 14, it is necessary, for example, to adjust the relative position using a micrometer while the sample SAM and the shielding plate 2 are attached to the sample holder 1. Therefore, the adjustments to the parallel position and degree of adhesion of the sample SAM and the shielding plate 2, as well as the adjustment of the protrusion amount, are performed under observation using an optical microscope. This makes the process of attaching the sample SAM complex.
[0047] In contrast, in the first embodiment, the adjustments can be made using the protrusion adjustment device 21 without using the optical microscope. Although not shown, the sample holder 1 and the protrusion adjustment device 21 can be installed inside a glove box (sealed container), with steps S1 to S4 above being performed inside the glove box. That is, the sample SAM can also be attached to the sample holder 1 by adjusting the protrusion of the sample SAM inside the glove box. Therefore, the protrusion can be set more easily than in the example under investigation when the protrusion adjustment device 21 is used according to the first embodiment. That is, the process of attaching the sample SAM can be simplified and the number of steps can be reduced. <Anwendung auf eine Ionenfräsvorrichtung>
[0048] Fig. Figure 9 is a schematic view showing an ion milling device (charge carrier beam device) 31 containing the sample holder 1.
[0049] As in Fig. As shown in Figure 9, the ion milling device 31 includes an ion cannon IG, a machining holder 33 and a cooling plate 34 inside a chamber (sample chamber) 32, wherein it includes a cooling mechanism 36 and a control unit 37 outside the chamber 32.
[0050] The processing holder 33 can hold the sample holder 1, with the shielding plate 2 being attached to the processing holder 33 by the fastening screw 3 or the like. As per Fig. As illustrated in Figure 8, the sample SAM, whose protrusion amount is set using the protrusion adjustment device 21, is attached to the sample holder 1. The protrusion amount of the SAM sample is set within a range of, for example, 10 µm to 100 µm.
[0051] The processing holder 33 is equipped with the cooling plate 34 to be in direct contact with the front 2f of the shielding plate 2. The cooling plate 34 is connected to the cooling mechanism 36 and the control unit 37 via a wire mesh 35. The wire mesh 35 contains, for example, several copper wires, each of which is made of phosphor bronze. The cooling mechanism 36 is, for example, liquid nitrogen filled into the interior of a Dewar flask. The shielding plate 2 is connected to the cooling mechanism 36 via the cooling plate 34 and the wire mesh 35, so that the sample SAM is cooled in close contact with the shielding plate 2.
[0052] Although not shown here, a heating device is provided between the cooling plate 34 and the control unit 37, which can heat the cooling plate 34. The temperature of the cooling plate 34 is set to a target temperature by monitoring the temperature of the cooling plate 34 cooled by the cooling mechanism 36 and appropriately adjusting the temperature of the heating device in the control unit 37. Therefore, the sample SAM can be set to a predetermined temperature.
[0053] In the ion milling device 31 according to the first embodiment, a milling operation can be performed using the sample holder 1. During milling, a section of the sample SAM, which is made of various materials such as a metal, a metal compound, an inorganic insulating film, or an organic insulating film containing a polymer material, is milled. During ion milling, an ion beam IB, such as argon ions, is emitted from the ion gun IG in the evacuated vacuum chamber 32. The sample SAM is irradiated with the ion beam IB from the side of the shielding plate 2 while the machining holder 33 is pivoted within a range of, for example, ±15 to 40 degrees. A section of the sample SAM that protrudes (is exposed) from the shielding plate 2 is machined to obtain a milled surface that has a shape along the end face of the stress-free shielding plate 2.
[0054] In the first embodiment, problems such as thermal damage, re-deposition, and changes in the protrusion amount that occur during ion milling are prevented by using the sample holder 1. Therefore, defects such as deformation or steps on the machined surface are reduced in sample SAM. This means that sample SAM can be machined with high accuracy in the ion milling device 31 to which the sample holder 1 is attached. <Anwendung auf ein Rasterelektronenmikroskop>
[0055] Fig. Figure 10 is a perspective view showing an essay 41, Fig. Figure 11 is a top view and a side view showing the attachment 41, and Fig. Figure 12 is a side view showing the specimen holder 1 installed on the attachment 41. The attachment 41 is a device for holding the specimen holder 1 and is used for the scanning electron microscope.
[0056] As in the Fig. 11 and Fig. As shown in Figure 12, the attachment 41 includes a shielding plate mounting bracket 42 made of a non-magnetic material, the shielding plate mounting bracket 42 comprising a front face 42f and a rear face 42b opposite the front face 42f. The shielding plate mounting bracket 42 is provided with a shielding plate mounting section (protruding section) 43 projecting from the front face 42f, a groove 45 recessed from the front face 42f, and a table mounting hole 46 extending from the front face 42f to the rear face 42b.
[0057] A notch 44 is provided in a section of the shielding plate mounting section 43. The stage mounting hole 46 is located near a pivot point of the attachment 41. The groove 45 is positioned between the shielding plate mounting section 43 and the stage mounting hole 46. One height of the attachment 41 (one height of the shielding plate mounting section 43) is the height at which the attachment 41 can be inserted into a sample exchange chamber of the scanning electron microscope, while one width of the groove 45 is the same as, or slightly greater than, the width of the shielding plate 2.
[0058] As in Fig. As shown in Figure 12, when the sample holder 1 is installed on the attachment 41, the front face 2f of the shielding plate 2 is brought into contact with the shielding plate mounting section 43, with a section of the shielding plate 2 being inserted into the groove 45. The fastening screw 3 is inserted into the notch 44, so that the shielding plate 2 is attached to the shielding plate mounting section 43 and the sample holder 1 is attached to the shielding plate mounting bracket 42.
[0059] When the sample holder 1 is installed on the shielding plate mounting bracket 42, the sample SAM is positioned near the center of the stage mounting hole 46. With the attachment 41 installed inside the scanning electron microscope, the attachment 41 is secured by inserting an adjustment screw of the scanning electron microscope into the stage mounting hole 46. The sample SAM can then be observed inside the scanning electron microscope.
[0060] Fig. Figure 13 is a schematic view showing a scanning electron microscope (a charge carrier beam device) 51, which includes the sample holder 1 and the attachment 41.
[0061] As in Fig.As shown in Figure 13, the scanning electron microscope 51 comprises an electron gun 52, condenser lenses (electronic lenses) 53, deflection coils (scanning coils) 54, objective lenses (electronic lenses) 55, a stage 56, an adjustment screw 57, and a detector 58. These elements are contained within a microscope body 59, which is also equipped with a control circuit for controlling the configurations, although illustrations of this circuit are omitted here. The condenser lens 53 and the objective lens 55 are electromagnets containing a coil, with an electromagnetic field generated by each lens acting as a lens that focuses an electron beam EB. The adjustment screw 57 is attached to the stage 56 and projects from the stage 56 toward one side of the electron gun 52.
[0062] When the sample SAM, which is the observation target, is observed, the mount 41, to which the sample holder 1 is attached, is first installed on the stage 56 by inserting the adjusting screw 57 from one side of the rear 42b of the shielding plate mounting bracket 42 into the stage mounting hole 46. Next, the interior of the microscope body 59 is brought into a vacuum state, and the electron beam EB, which consists of charged particles, is emitted from the electron gun 52. The emitted electron beam EB is reduced to a specific magnification by the condenser lens 53, scans the sample SAM towards a desired position by the deflection coil 54, and is focused by the objective lens 55 as an electron spot on the sample SAM.
[0063] The scanning electron microscope 51 is equipped with a detector 58, such as a secondary electron detector, wherein, when the electron beam EB collides with the sample SAM, the secondary electrons (particles) produced by the sample SAM are detected by the detector 58. An observation image (SEM image, secondary electron image) is obtained by displaying the quantity of detected secondary electrons (particles) as brightness on an image processing device or the like, which is electrically connected to the detector 58. The obtained observation image is recorded in a recording device, such as a hard disk or flash memory, which is provided in the scanning electron microscope 51.
[0064] In addition to such a detector 58, the scanning electron microscope 51 can be equipped with a reflection electron detector for detecting reflected electrons, an X-ray detector for detecting a spectrum of X-rays generated by the SAM sample, and for performing an elemental analysis of the sample SAM or the like.
[0065] When the sample SAM is machined using the above ion milling device 31, the sample SAM is machined with high accuracy, consequently a more accurate observation image can be obtained with the scanning electron microscope 51.
[0066] A procedure for using the sample holder 1 in this case can be roughly summarized as follows. First, a step is performed to hold the sample SAM between the shielding plate 2 and the sample support element 4 using the projection adjustment device 21 described above. Next, a step is performed to machine the sample SAM using the ion milling device 31 described above. Next, a step is performed to transfer the sample holder 1 from the ion milling device 31 to the scanning electron microscope 51 without separating the sample SAM from the sample holder 1. Next, a step is performed to observe the machined sample SAM using the scanning electron microscope 51.
[0067] In the prior art, it is necessary to remove sample SAM from sample holder 1 and reattach sample SAM to the sample holder for the scanning electron microscope 51. In the first embodiment, it is unnecessary to remove sample SAM from sample holder 1, thus saving this step and consequently allowing observation with the scanning electron microscope 51 to be carried out more quickly and easily.
[0068] The sample holder 1 and the attachment 41 can be used for samples other than sample SAM, which was processed using the ion milling device 31. For example, a sample processed by another method can be attached to the sample holder 1, followed by installing the sample holder 1 on the attachment 41 and installing the attachment 41 inside the scanning electron microscope 51, allowing the sample to be observed.
[0069] This means that the sample holder 1 can also be used as an element for easily holding a sample for observation in the scanning electron microscope 51. Depending on the observation objective, the cooled sample can be observed, or the sample can be observed while it is being cooled. In either case, the adhesion between the sample SAM and the shielding plate 2 in the sample holder 1 is high, with the sample SAM being held by the static stress generated by the pressure elements 5 and the dynamic stress generated by the springs 6. Therefore, it is evident that the sample holder 1 according to the first embodiment is also excellent as a holding element. Thus, the sample holder 1 can contribute to obtaining a more accurate observation image in the scanning electron microscope 51.
[0070] Although the invention has been described in detail based on the embodiment described above, the invention is not limited to the embodiment described above, and various modifications can be made without deviating from the scope of protection of the invention. List of reference symbols 1 Sample holder 2 Shielding plate (mask element) 2b reverse 2f Front 3 fastening screws 4 Sample support element 4b reverse 4f front 5 pressure element 6 Spring (elastic body) 7 Sample carriers 7a Shielding plate connection section 7b Pressure element connection section 8 plate 9 buttons 10 fastening screws 11 screw holes 12 screw holes 13 Mounting screw 21 Protrusion amount adjustment device 22 shielding plate mounting brackets 22b reverse 22f Front 23 sliders 24 micrometers (movement mechanism) 25 notch 26 edge 31 ion milling device 32nd Chamber (Sample Chamber) 33 processing holders 34 Cooling plate 35 wire mesh 36 Cooling mechanism (liquid nitrogen) 37 Control unit 41 essay 42 shielding plate mounting brackets 42b reverse 42f Front 43 Shielding plate mounting section 44 notch 45 Nut 46 Table mounting hole 51 Scanning electron microscope 52 electron gun 53 Condenser lens 54 Deflection coil 55 lens 56 Table 57 Adjusting screw 58 Detector 59 microscope bodies 102 Shielding plate 103 mask holders EB electron beam IB ion beam IG ion cannon S1 to S4 step SAM Sample
Claims
[1] Sample holder (1) used for a charge carrier beam device (51), the sample holder (1) comprising: a shielding plate (2) comprising a first front (2f) and a first back (2b) opposite the first front (2f); a sample carrier (7) which is connected to the first rear side (2b) of the shielding plate (2); a pressure element (5) configured to move in a first direction perpendicular to the first back side (2b) of the shielding plate (2) when the pressure element (5) is attached to the sample carrier (7), and which has a rod shape; a sample support element (4) which is provided at a position facing the first rear side (2b) of the shielding plate (2) and which is connected to the pressure element (5); and an elastic body (6) which is provided along an outer circumference of the pressure element (5) and is connected to the sample support element (4) and the sample carrier (7). [2] Sample holder (1) according to claim 1 with a second pressure element, such that the pressure elements (5) are line-symmetric with respect to a central section of the sample support element (4), and the elastic body (6) is provided on an outer circumference of each of the two pressure elements (5). [3] Sample holder (1) according to claim 1, wherein the sample carrier (7) contains a first connecting section extending in the first direction and a second connecting section extending in a second direction intersecting the first direction, the first section is connected to the shielding plate (2), and the second section is connected to the pressure element (5) and the elastic body (6). [4] Sample holder (1) according to claim 1, wherein the shielding plate (2) and the sample carrier (7) are fastened by a first screw (10). [5] Sample holder (1) according to claim 4, wherein two first screw holes (11) are formed in the sample carrier (7), second screw holes (12) are formed in central sections of four sides, which form the first back side (2b) of the shielding plate (2), two of the second screw holes (12), which are provided point-symmetrically with respect to a central section of the first rear side (2b) of the shielding plate (2), are each connected to the two first screw holes (11), and the first screw (10) is inserted into the first screw hole (11) and the second screw hole (12), which are connected to each other. [6] Sample holder (1) according to claim 1, wherein an end section of the pressure element (5) is connected to the sample support element (4), the other end section of the pressure element (5) penetrates the sample carrier (7) and is connected to a plate (8) which contains a button (9), and By moving the button (9) in the first direction, the sample support element (4), the pressure element (5), the elastic body (6) and the plate (8) move in the first direction. [7] Sample holder (1) according to claim 6, wherein the knob (9) is provided with a second screw (13) which penetrates the plate (8) and the sample carrier (7) and has a length which enables contact with the sample support element (4). [8] Sample holder (1) according to claim 1, wherein the shielding plate (2), the sample carrier (7), the pressure element (5), the sample support element (4) and the elastic body (6) are each made of a non-magnetic material. [9] A projection amount adjustment device (21) configured to attach the sample holder (1) according to claim 1, the projection amount adjustment device (21) comprising: a shielding plate installation carrier (22) comprising a second front (22f) and a second back (22b) opposite the second front (22f); a slider (23) provided on the second front face (22f) of the shielding plate installation carrier (22); and a movement mechanism (24) which is connected to the shielding plate installation carrier (22) and is used to move the slider (23). [10] A method for adjusting the amount of a protrusion of a sample, which is carried out using the protrusion amount adjusting device (21) according to claim 9, the method comprising: (a) a step of attaching the sample holder (1) to the second front face (22f) of the shielding plate installation carrier (22) so that the first front face (2f) of the shielding plate (2) comes into contact with the second front face (22f) of the shielding plate installation carrier (22); (b) a step of adjusting a distance between the shielding plate (2) and the slider (23) by moving the slider (23) using the movement mechanism (24); (c) a step of moving the sample support element (4) in the first direction and installing the sample between the sample support element (4) and the shielding plate (2) in a state in which the sample support element (4) is separated from the shielding plate (2); (d) a step of enabling a section of the sample to protrude from the shielding plate (2) by bringing an end face of the sample into contact with an end face of the slider (23); and (e) a step of moving the sample support element (4) so that the sample support element (4) comes into contact with the sample and holding the sample between the sample support element (4) and the shielding plate (2). [11] Charge carrier beam device (51) comprising: the sample holder (1) according to claim 1. [12] Charge carrier beam device (51) according to claim 11, further comprising: a ion cannon (IG); a processing holder (33) configured to hold the sample holder (1); a cooling plate (34) provided on the processing holder (33) and in direct contact with the first front face (2f) of the shielding plate (2); and a cooling mechanism (36) which is connected to the cooling plate (34). [13] Charge carrier beam device (51) according to claim 11, further comprising: an electron gun (52); a table (56); an adjusting screw (57) which is attached to the table (56) so that it protrudes from the table (56) in the direction of the electron gun (52); a detector (58); and an attachment (41) configured to hold the sample holder (1), wherein the attachment (41) includes a shielding plate installation carrier (42) which has a third front (42f) and a third back (42b) opposite the third front (42f), the shielding plate mounting carrier (42) is provided with a shielding plate mounting section (43) projecting from the third front (42f), a mounting hole penetrating from the third front (42f) to the third rear (42b), and a groove (45) recessed from the third front (42f) and positioned between the shielding plate mounting section (43) and the mounting hole, the shielding plate fastening section (43) is provided with a notch (44), the sample holder (1) is attached to the shielding plate mounting carrier (42) by bringing the first front face (2f) of the shielding plate (2) into contact with the shielding plate mounting section (43), inserting a section of the shielding plate (2) into the groove (45) and inserting a third screw (3) into the notch (44), and The attachment (41) is installed by inserting the adjusting screw (57) into the mounting hole on the table (56). [14] Method for using a sample holder (1), wherein the sample holder (1) comprises: a shielding plate (2) comprising a first front (2f) and a first back (2b) opposite the first front (2f); a sample carrier (7) connected to the first back (2b) of the shielding plate (2); a pressure element (5) configured to move in a first direction perpendicular to the first back (2b) of the shielding plate (2) when the pressure element (5) is attached to the sample carrier (7), and having a rod shape; a sample support element (4) provided at a position facing the first back (2b) of the shielding plate (2) and connected to the pressure element (5); and an elastic body (6) provided along an outer circumference of the pressure element (5) and connected to the sample support element (4) and the sample carrier (7), the method comprising: (a) a step of holding a sample between the shielding plate (2) and the sample support element (4); (b) a step of processing the sample using an ion milling device (31); (c) a step of transferring the sample holder (1) from the ion milling device (31) to a scanning electron microscope (51) without separating the processed sample from the sample holder (1); and (d) a step of viewing a section of the processed sample using the scanning electron microscope (51).
Citation Information
Patent Citations
Ion milling device
WO2014199737A1
ion processing device
DE112014002250T5
Ion etching device and sample processing method
DE112014006536T5
Sample Holder System and Sample Observation Apparatus
US20180358201A1