A method of controlling stress variation in a layer comprising silicon oxycarbide formed using plasma enhanced chemical vapour deposition
GB202419157D0Pending Publication Date: 2025-02-12SPTS TECH LTD
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Patent Information
- Application Number
- GB2024019157
- Authority / Receiving Office
- GB · GB
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-02-12
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