Coating and developing equipment

Abstract

This product is a coating and developing apparatus for performing coating, developing, heat treatment, etc. on substrates such as semiconductor wafers. This product includes a transfer chamber located on the left side in the front view, a substrate processing chamber located in the center, and a transfer chamber located on the right side. The transfer chamber located on the left side is configured so that a cassette can be placed inside from the top (opening for loading and unloading the cassette), and includes a loader / unloader and a transfer mechanism such as a transfer arm adjacent to the loader / unloader, and also includes a control panel on the front side. The substrate processing chamber located in the center includes a plurality of device housing boxes capable of housing each processing device such as a coating processing device for applying photoresist, a development processing device, a heat processing device, and a transfer processing device. The transfer chamber located on the right side includes a transfer mechanism for transferring substrates between the exposure device and the like installed adjacent to this product.

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