Gas supply nozzle for semiconductor manufacturing

JP1825910SActive Publication Date: 2026-05-07NGK CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
NGK CORP
Filing Date
2025-06-09
Publication Date
2026-05-07

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Abstract

This item is a gas supply nozzle used in semiconductor manufacturing equipment. It discharges gas used in the semiconductor manufacturing process from a spirally formed channel. As shown in the "Enlarged Cross-Sectional View of CC in Section AB," the vertical spacing of the spirally formed channel changes at an intermediate position in the vertical direction. The part for which design registration is sought forms the spirally formed channel.
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