Imprint device, imprint method, and article manufacturing method

Abstract

To provide a technique advantageous for reducing a variation in standby time for a substrate to be processed next.SOLUTION: An imprint device executes imprint processing to form patterns in a plurality of shot areas of a substrate. The imprint device comprises a control unit that detects the timing at which the time required for the completion of the processing on the substrate reaches a predetermined time. The plurality of shot areas are classified into a plurality of processing time groups, and each processing time group is associated with processing time required for the processing on each shot area belonging to the processing time group. The control unit determines the total time for processing unprocessed shot areas of the plurality of shot areas of the substrate, based on the processing time associated with the processing time groups to which the respective unprocessed shot areas belong.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present invention relates to an imprint apparatus, an imprint method, and an article manufacturing method. [Background technology]

[0002] In the manufacture of articles such as semiconductors, in order to improve throughput, a substrate transport robot that exchanges substrates with a substrate stage may be provided with two hands. While a substrate placed on the substrate stage is being processed, the substrate transport robot holding the next substrate to be processed with one hand may wait at a substrate exchange position. When the processing of the substrate placed on the substrate stage is completed, the substrate placed on the substrate stage may be received by the other hand of the substrate transport robot, and the substrate held by the one hand of the substrate transport robot may be placed on the substrate stage. If the waiting time of the substrate transport robot at the substrate exchange position varies among substrates, the substrates may be affected by heat differently at the substrate exchange position, and the temperature of the substrates placed on the substrate stage may vary. This may cause variations in overlay accuracy. Patent Document 1 describes a substrate transport device provided with a temperature adjustment unit. However, providing a temperature adjustment unit in the substrate transport device may complicate the configuration of the substrate transport device. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2000-200820 A Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present invention is to provide an advantageous technique for reducing the variation in the waiting time for the next substrate to be processed. [Means for solving the problem]

[0005] One aspect of the present invention relates to an imprint apparatus that forms a pattern on a plurality of shot areas of a substrate by imprint processing, the imprint apparatus including a control unit that detects the timing when a predetermined time has elapsed until processing of the substrate is completed, the plurality of shot areas being classified into a plurality of processing time groups, each processing time group being associated with a processing time required to process each shot area belonging to that processing time group, and the control unit calculating a total time for processing unprocessed shot areas of the plurality of shot areas of the substrate based on the processing time associated with the processing time group to which each of the unprocessed shot areas belongs. Effect of the Invention

[0006] According to the present invention, an advantageous technique is provided for reducing the variation in waiting time for the next substrate to be processed. [Brief description of the drawings]

[0007] [Figure 1] FIG. 1 is a diagram illustrating a configuration of an imprint apparatus according to an embodiment. [Diagram 2] 5A to 5C are views for explaining a dispensing process and an imprint process. [Diagram 3] 6A and 6B are views illustrating an example of processing for a plurality of shot regions. [Figure 4] 6 is a timing chart showing the relationship between the processing of a plurality of shot areas of a substrate and the transport of the next substrate. [Diagram 5] 1A to 1C are diagrams illustrating the operation of an imprint apparatus according to an embodiment; [Figure 6] 10A to 10C are diagrams illustrating the operation of an imprint apparatus according to another embodiment. [Figure 7] 1 is a diagram illustrating a method for manufacturing an article. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0009] In this specification and the accompanying drawings, directions are described according to an XYZ coordinate system. Directions parallel to the X, Y and Z axes are the X, Y and Z directions, respectively. The X, Y and Z directions can be understood as directions perpendicular to each other or as directions intersecting each other. The θX, θY and θZ axes are rotations around the X, Y and Z axes, respectively.

[0010] FIG. 1 shows a schematic configuration of an imprinting apparatus 100 according to an embodiment. The imprinting apparatus 100 forms a pattern made of a cured product of the imprinting material by disposing an imprinting material on a substrate 1, bringing the imprinting material into contact with a mold 11, and curing the imprinting material. A curable composition (sometimes called an uncured resin) that is cured by applying curing energy is used as the imprinting material. As the curing energy, for example, light (e.g., infrared light, visible light, ultraviolet light, etc.) having a wavelength selected from a range of 10 nm to 1 mm, or heat, may be used. The curable composition may be a composition that is cured by irradiation with light. A photocurable composition that is cured by irradiation with light contains at least a polymerizable compound and a photopolymerization initiator, and may further contain a non-polymerizable compound or a solvent as necessary. The non-polymerizable compound is at least one selected from the group consisting of a sensitizer, a hydrogen donor, an internal mold release agent, a surfactant, an antioxidant, and a polymer component. The imprint material may be arranged on the substrate in the form of droplets, or in the form of islands or a film formed by connecting a plurality of droplets. The viscosity of the imprint material (at 25° C.) may be, for example, 1 mPa·s or more and 100 mPa·s or less. Examples of materials that may be used for the substrate include glass, ceramics, metals, semiconductors, and resins. If necessary, a member made of a material different from that of the substrate may be provided on the surface of the substrate. The substrate may be, for example, a silicon wafer, a compound semiconductor wafer, or quartz glass.

[0011] The imprint apparatus 100 may include a substrate stage 3 having a substrate holding part 2 that holds the substrate 1. The substrate stage 3 is driven by a substrate driving mechanism (not shown), which may drive the substrate 1 about a plurality of axes (e.g., three axes: the X-axis, the Y-axis, and the θZ-axis). The imprint apparatus 100 includes a mold driving mechanism 13 that drives the mold 11. The mold driving mechanism 13 may be configured to drive the mold 11 by driving the mold holding part 12 that holds the mold 11. The mold driving mechanism 13 may be configured to drive the mold 11 about a plurality of axes (e.g., six axes: the X-axis, the Y-axis, the Z-axis, the θX-axis, the θY-axis, and the θZ-axis). The substrate driving mechanism that drives the substrate stage 3 and the mold driving mechanism 13 constitute an alignment mechanism that drives the substrate 1 and the mold 11 so that the relative positions of the substrate 1 and the mold 11 are adjusted.

[0012] The imprint apparatus 100 may include a light source (not shown) that generates light to be irradiated onto the imprint material in contact with the mold 11 as a component for hardening the imprint material. The light source may include, for example, a halogen lamp that generates i-rays and / or g-rays, or a mercury lamp. The imprint apparatus 100 may also include a dispenser 21 (supply unit) that supplies the imprint material onto the substrate 1. A spread promoter and / or an adhesion material for enhancing adhesion between the imprint material and the substrate 1 may be supplied in advance onto the substrate 1 outside the imprint apparatus 100.

[0013] The imprint apparatus 100 may include a transport robot 22 for exchanging the processed substrate 1 with the substrate 1 to be processed next after the processing on the substrate 1 is completed. In order to efficiently exchange the substrate 1, the transport robot 22 may have two hands (not shown). Before the processing on the substrate 1 on the substrate holding unit 2 is completed, the transport robot 22 may hold the substrate 1 to be processed next with one hand and wait at the substrate exchange position. The substrate exchange position is a position where the substrate 1 for which processing has been completed is unloaded from the substrate stage 3 (substrate holding unit 2) to the transport robot 22, and the substrate 1 to be processed next is loaded from the transport robot 22 to the substrate holding unit 2.

[0014] If the transport robot 22 arrives at the substrate exchange position too early compared to the completion of processing of the substrate 1 on the substrate stage 3, the waiting time for the next substrate 1 to be processed at the substrate exchange position becomes excessively long. In this case, there is a concern about the influence of heat on the next substrate 1 to be processed. On the other hand, if the transport robot 22 arrives at the substrate exchange position too late compared to the completion of processing of the substrate 1 on the substrate stage 3, substrate exchange cannot be performed, and throughput decreases.

[0015] For this reason, it is important to more accurately control the timing when the transport robot 22 starts transporting the substrate 1 to be processed next, and ultimately the exchange timing of the substrate 1 to be processed next at the substrate exchange position. The time for which the substrate 1 to be processed next is kept waiting at the substrate exchange position depends on the thermal control capability of the chamber of the imprint apparatus 100, the thermal effect (thermal expansion coefficient of the substrate), the required overlay accuracy, etc., but it is desirable for it to be within 3 seconds, within 2.5 seconds, or within 2 seconds, for example.

[0016] The imprint apparatus 100 may include a control unit 14. The control unit 14 may be configured to control components of the imprint apparatus 100, such as a substrate driving mechanism that drives the substrate stage 3, the mold driving mechanism 13, the dispenser 21, and the transport robot 22. The control unit 14 may be configured, for example, by a PLD (abbreviation for Programmable Logic Device) such as an FPGA (abbreviation for Field Programmable Gate Array), or an ASIC (abbreviation for Application Specific Integrated Circuit), or a general-purpose or dedicated computer with a program embedded therein, or a combination of all or part of these.

[0017] The dispensing process and the imprint process will be described below with reference to Fig. 2. Fig. 2 shows the relative positions of the substrate 1 and the dispenser 21, together with an arrangement of a plurality of shot areas (shot area arrangement). Usually, the relative positions are controlled by moving the substrate 1 (substrate stage 3), but the dispenser 21 may also be driven.

[0018] In this embodiment, the multiple shot areas of the substrate 1 are classified into multiple multi-dispense groups. Each multi-dispense group is composed of at least one shot area, preferably at least two shot areas. Each multi-dispense group is composed of shot areas in which the imprint material is successively placed by the dispenser 21 without going through an imprint process.

[0019] Fig. 2(a) shows a state in which the substrate 1 is placed at an application start position for a group of shot regions constituting one multi-dispense group. In the state shown in Fig. 2(a), application of imprint material to the substrate 1 by the dispenser 21 is started. Thereafter, while the relative position between the dispenser 21 and the substrate 1 is changed as shown by the arrow, the dispenser 21 applies the imprint material to the group of shot regions constituting the multi-dispense group. Fig. 2(b) shows a state in which application (dispensing process) of the imprint material has been completed up to the rear shot region to which the imprint material is applied last among the group of shot regions constituting one multi-dispense group.

[0020] 2(c) shows the state of imprint processing on the first shot area of ​​the shot area group constituting the multi-dispense group to which the imprint material has been applied. Here, in this specification, the imprint processing includes a step of bringing the imprint material already applied or placed on the shot area into contact with the pattern area 15 of the mold 11, a step of curing the imprint material, and a step of separating the cured imprint material from the mold 11. In this specification, the imprint processing does not include a dispensing process of applying or placing the imprint material on the shot area. The first shot area may or may not be the shot area (leading shot area) to which the imprint material has been applied first among the shot area group constituting the multi-dispense group.

[0021] 2(d) shows the state of imprint processing for the second shot area of ​​the group of shot areas constituting the multi-dispense group to which the imprint material has been applied. The second shot area may or may not be the shot area to which the imprint material has been applied second among the group of shot areas constituting the multi-dispense group.

[0022] 2(e) shows the state of imprint processing for the third shot area among the shot area group constituting the multi-dispense group to which the imprint material has been applied. The third shot area may or may not be the shot area to which the imprint material has been applied third among the shot area group constituting the multi-dispense group.

[0023] 2(f) shows the imprint processing for the fourth (in this example, the last) shot area of ​​the group of shot areas constituting the multi-dispense group to which the imprint material has been applied. The fourth shot area may or may not be the shot area to which the imprint material has been applied fourth among the group of shot areas constituting the multi-dispense group.

[0024] With reference to FIG. 3, the processing for a plurality of shot areas on the substrate 1 will be described by way of example. The processing for each shot area includes a dispensing process and an imprinting process. In FIG. 3, Sx (x=1 to 64) is an identifier for identifying a shot area. x is the number of the shot area. The imprinting process for the plurality of shot areas S1 to S64 is performed in ascending order of the shot area numbers. In the example of FIG. 3, one row (e.g., shot areas S1, S2, S3, S4) constitutes one multi-dispense group. The imprinting material is applied continuously to a group of shot areas (e.g., shot areas S1, S2, S3, S4) constituting one multi-dispense group (one row) without going through an imprinting process. The shot area to which the imprinting material is applied first among the group of shot areas constituting one multi-dispense group (one row) is defined as the leading shot area. In the example of FIG. 3, shot areas S1, S5, S13, S23, S33, S43, S53, and S61 are the leading shot areas.

[0025] For example, in processing one multi-dispense group consisting of shot regions S1, S2, S3, and S4, a dispensing process is performed in which the imprint material is applied to the shot regions S1, S2, S3, and S4 consecutively without going through an imprint process. Then, an imprint process is performed consecutively on the shot regions S1, S2, S3, and S4.

[0026] In processing one multi-dispense group consisting of shot regions S5 to S12, a dispensing process is performed in which the imprint material is continuously applied to the shot regions S5 to S12 without going through an imprint process. Then, an imprint process is continuously performed on the shot regions S5 to S12. For the other multi-dispense groups, the dispensing process and the imprint process can be performed according to the same rules.

[0027] Fig. 4 is a timing chart showing in chronological order the procedure for processing the substrate 1 in accordance with the example shown in Fig. 3. For convenience of drawing, shot regions S11 to S46 are omitted.

[0028] After substrate replacement (unloading of substrate 1 from substrate stage 3 and loading of new substrate 1 onto substrate stage 3), alignment of the new substrate 1 (hereinafter simply substrate 1) is performed. Then, processing (dispense processing and imprint processing) is performed on shot regions S1 to S4 constituting the first multi-dispense group. Specifically, first, a dispense processing is performed in which the imprint material is applied to shot regions S1, S2, S3, and S4 consecutively without going through an imprint processing. Shot region S1 is the leading shot region to which the imprint material is applied first in the multi-dispense group (shot regions S1, S2, S3, and S4). Shot regions S2, S3, and S4 are subsequent shot regions to which the imprint material is applied second or later in the multi-dispense group (shot regions S1, S2, S3, and S4). After the successive dispensing processes are performed on the shot regions S1, S2, S3, and S4, the imprint processes are performed successively on the shot regions S1, S2, S3, and S4.

[0029] The processing time 51 required to process the shot region S1, which is the leading shot region, is the time required from the start of processing the shot region S1 to the completion of processing the shot region S1. In other words, the processing time 51 includes the time required to continuously apply the imprint material to the shot regions S1 to S4 that constitute the multi-dispense group to which the shot region S1 belongs, and the time required for the imprint processing of the shot region S1.

[0030] The processing time 53 required to process the shot region S2, which is one of the subsequent shot regions, is the time required for the imprint processing of the shot region S2. In other words, the processing time 53 required to process the shot region S2, which is the subsequent shot region, is treated as not including the time required to apply the imprint material to the shot region S2.

[0031] The same applies to the shot regions constituting the subsequent multi-dispense groups. For example, the processing time 52 required to process the shot region S5, which is the leading shot region, is the time required from the start of processing the shot region S5 to the completion of processing the shot region S5. In other words, the processing time 52 includes the time required to continuously apply the imprint material to the shot regions S5 to S12 constituting the multi-dispense group to which the shot region S5 belongs, and the time required for the imprint processing of the shot region S5. In addition, the processing time required to process the shot region S6, which is one of the subsequent shot regions, is the time required for the imprint processing of the shot region S6. In other words, the processing time required to process the shot region S6, which is the subsequent shot region, is treated as not including the time required to apply the imprint material to the shot region S6.

[0032] Similarly, the processing time required to process the shot region S53, which is the leading shot region, is the time required from the start of processing the shot region S53 to the completion of processing the shot region S53. In other words, the processing time required to process the shot region S53 includes the time required to continuously apply the imprint material to the shot regions S53 to S59 that constitute the multi-dispense group, and the time required for the imprint processing of the shot region S53. In addition, the processing time required to process the shot region S54, which is one of the subsequent shot regions, is the time required for the imprint processing of the shot region S54. In other words, the processing time required to process the shot region S54, which is the subsequent shot region, is treated as not including the time required to apply the imprint material to the shot region S54.

[0033] The transfer time 54 is the time required for the transfer robot 22 to obtain the substrate 1 to be processed next from its supply source (e.g., a cassette, a temperature adjustment unit, a pre-aligner, etc.) and transfer it to the substrate exchange position. The transfer time 54 may be treated as a constant time, or, if there is a factor that causes the transfer time 54 to fluctuate, the control unit 14 may update the transfer time 54 based on the fluctuation of the factor.

[0034] The control unit 14 sequentially calculates the time from the current time to the time when processing of the last shot area to be processed is completed (remaining processing time), and detects the timing when the remaining processing time matches the transport time 54. In other words, the control unit 14 detects the timing when the time until processing of the current substrate 1 to be processed is completed (remaining processing time) becomes a predetermined time (transport time 54). Then, in accordance with that timing, the control unit 14 causes the transport robot 22 to start the operation of transporting the next substrate to be processed to the substrate stage 3.

[0035] As can be seen from the examples shown in Figures 3 and 4, the processing time required to process each of the multiple shot areas of substrate 1 can be classified into multiple processing time groups. Each processing time group can be associated with the processing time required to process each shot area belonging to that processing time group. For example, the processing time required to process the leading shot area S1 of a multi-dispense group made up of four shot areas S1 to S4 is processing time 53 as described above. Similarly, the processing time required to process the leading shot area S61 of a multi-dispense group made up of four shot areas S61 to S64 can be considered to be classified into the same processing time group as processing time 53.

[0036] Additionally, the multi-dispense group consisting of shot regions S5 to S12 and the multi-dispense group consisting of shot regions S53 to S60 each consist of eight shot regions. Therefore, the processing time required to process the leading shot region S5 and the processing time required to process the leading shot region S53 can be considered to be classified into the same processing time group.

[0037] Furthermore, each of the four multi-dispense groups, which are respectively made up of shot regions S13-S22, shot regions S23-S32, shot regions S33-S42, and shot regions S43-S22, is made up of 10 shot regions. Therefore, the processing times required to process the leading shot region S13, leading shot region S23, leading shot region S33, and leading shot region S43 can be considered to be classified into the same processing time group.

[0038] The other shot areas S2 to S4, S6 to S12, S14 to S22, S24 to S32, S34 to S42, S44 to S52, and S62 to S64 are shot areas where only imprint processing should be performed. Therefore, the processing times required to process these shot areas can be considered to be classified into the same processing time group.

[0039] The control unit 14 can be configured to determine the total time (remaining processing time) required to process unprocessed shot areas among the multiple shot areas of the substrate 1, based on the processing times associated with the processing time groups to which the unprocessed shot areas belong. This allows the control unit 14 to detect the timing at which the time remaining until the processing of the currently processed substrate 1 is completed (remaining processing time) reaches a predetermined time (transport time 54).

[0040] The control unit 14 can control the dispenser 21 based on control information including information for controlling the application process of the imprint material so as to apply the imprint material to a specified number of shot regions continuously without going through an imprint process. The control unit 14 can determine a plurality of processing time groups based on the control information. The control unit 14 can classify each of the plurality of shot regions into one of a plurality of processing time groups based on the control information.

[0041] The multiple processing time groups may include at least two groups according to the number of shot areas to which the imprint material should be applied continuously without going through the imprint process. At least one processing time group among the multiple processing time groups may be configured as a leading shot area in which the imprint material is placed first in the multi-dispense group. The multi-dispense group is configured as shot areas to which the imprint material should be applied continuously without going through the imprint process. At least another processing time group among the multiple processing time groups may be configured as a subsequent shot area in which the imprint material is applied second or later in the multi-dispense group. The control unit 14 may be configured to update the processing time associated with the processing time group to which the shot area belongs, based on the time required to process a shot area that has already been subjected to the imprint process among the multiple shot areas.

[0042] FIG. 5 illustrates an example of the operation of the imprint apparatus 100. The operation illustrated in FIG. 5 is controlled by the control unit 14. In step S501, the control unit 14 reads control information (recipe file) and classifies a plurality of shot areas of the substrate into a plurality of processing time groups based on the control information. More specifically, the control unit 14 classifies each of the plurality of shot areas of the substrate into one of a plurality of processing time groups based on the control information. For example, in the example of FIG. 3, the control unit 14 may classify the shot areas S1 and S61 into a first processing time group and the shot areas S5 and S53 into a second processing time group. In addition, the control unit 14 may classify the shot areas S13, S23, S33, and S43 into a third processing time group and the other shot areas into a fourth processing time group.

[0043] In step S502, the control unit 14 controls the transport robot 22 to load the first substrate of the multiple substrates constituting the lot onto the substrate stage 3. In step S503, the control unit 14 identifies the shot area to be processed. In the example of FIG. 3, the shot areas are selected in numerical order starting from the shot area number=1, and identified as the shot area to be processed. In step S504, the control unit 14 calculates the remaining processing time according to the method described with reference to FIG. 4. Here, if information on the processing time required for the calculation is lacking, the control unit 14 may skip the calculation of the remaining processing time, or may calculate the remaining processing time using a default value.

[0044] In step S505, the control unit 14 judges whether the remaining processing time calculated in step S504 matches the transfer time 54. Here, whether the remaining processing time matches the transfer time 54 can be judged taking a predetermined margin into consideration. For example, the control unit 14 can judge that the remaining processing time matches the transfer time 54 when the value obtained by subtracting the transfer time 54 from the remaining processing time falls below a predetermined value. If it is determined that the remaining processing time matches the transfer time 54, the control unit 14 controls the transfer robot 22 to start transferring the next substrate in step S514, and proceeds to step S506.

[0045] If it is determined that the remaining processing time does not match the transport time 54, the control unit 14 proceeds to step S506 without executing step S514. In step S506, the control unit 14 starts measuring the processing time required to process the shot area identified in step S503. In step S507, the control unit 14 determines whether the shot area identified in step S503 is the leading shot area of ​​the multi-dispense group, and if so, proceeds to step S508, and if not, proceeds to step S515.

[0046] In step S508, the control unit 14 executes a dispensing process of continuously supplying the imprint material to the shot areas constituting the multi-dispense group to which the shot area identified in step S503 (in this case, the leading shot area) belongs. Next, in step S509, the control unit 14 executes an imprint process for the shot area identified in step S503 (in this case, the leading shot area). Next, in step S510, the control unit 14 ends the measurement started in step S506, and registers the processing time obtained by the measurement as one sample of the processing time for the processing time group to which the shot area identified in step S503 belongs. This means updating the already registered processing time. Here, if the number of processing times registered for one processing time group becomes two or more, in step S504, the processing time obtained by statistically processing them (for example, calculating the average value) may be used. Alternatively, in step S510, the control unit 14 may update the already registered processing time based on the newly obtained processing time.

[0047] In step S511, the control unit 14 judges whether the processing of the currently processed substrate is completed, and if so, proceeds to step S512, otherwise returns to step S503. In step S512, the control unit 14 judges whether the above processing of all substrates constituting the lot is completed, and if so, proceeds to step S513, otherwise proceeds to step S516. In step S516, the control unit 14 controls the transport robot 22 to replace the substrate placed on the substrate stage 3 with the next substrate, and then returns to step S503. In step S513, the control unit 14 controls the transport robot 22 to unload the substrate onto the substrate stage 3.

[0048] Fig. 6 illustrates an example of the operation of the imprint apparatus 100 in the case where processing times have already been associated with a plurality of processing time groups. The operation of the imprint apparatus 100 is illustrated. The operation illustrated in Fig. 6 corresponds to the operation illustrated in Fig. 5 with steps S506 and S510 deleted. When processing a lot made up of a plurality of substrates, the processing time of each processing time group may be measured using at least one substrate at the beginning, and the operation illustrated in Fig. 6 may be performed for the subsequent substrates based on the processing times thus measured.

[0049] In the above description, a plurality of shot areas are classified into a plurality of shot areas according to the number of shot areas to which the imprint material is continuously applied in the dispensing process. However, the present invention is not limited to the method of continuously applying the imprint material in the dispensing process. The present invention can also be applied to a case where a plurality of shot areas are classified into a plurality of processing time groups according to conditions other than the number of shot areas to which the imprint material is continuously applied in the dispensing process. Such conditions can be, for example, at least one of the distance between the dispenser and the shot area, the size (or area) of the shot area, the position of the shot area in the substrate, and the like. The distance between the dispenser and the shot area can affect the processing time required to process the shot area (for example, the driving time of the substrate). The size of the shot area differs between a full shot area (a shot area having the same shape as the pattern area of ​​the mold) and a partial shot area (a shot area arranged around the substrate and having a different shape from the pattern area of ​​the mold). The size (or area) can also differ between a plurality of partial shot areas. The size of the shot area, for example, can affect the time it takes to fill the space between the pattern area of ​​the mold and the substrate with imprint material. The location of the shot area within the substrate can also affect the time it takes to fill the space between the pattern area of ​​the mold and the substrate with imprint material.

[0050] The pattern of the cured product formed by using the imprinting apparatus is used permanently on at least a part of various articles, or temporarily when manufacturing various articles. The articles include electric circuit elements, optical elements, MEMS, recording elements, sensors, and molds. Examples of the electric circuit elements include volatile or non-volatile semiconductor memories such as DRAM, SRAM, flash memory, and MRAM, and semiconductor elements such as LSI, CCD, image sensors, and FPGA. Examples of the molds include molds for imprinting.

[0051] The pattern of the cured product is used as it is as at least a part of a component of the article, or is used temporarily as a resist mask, which is removed after etching or ion implantation in a substrate processing step.

[0052] Next, an article manufacturing method will be described, in which a pattern is formed on a substrate by an imprinting device, the substrate on which the pattern is formed is processed, and an article is manufactured from the processed substrate. As shown in Fig. 7(a), a substrate 1z such as a silicon wafer having a workpiece 2z such as an insulator formed on its surface is prepared, and then an imprinting material 3z is applied to the surface of the workpiece 2z by an inkjet method or the like. Here, a state in which the imprinting material 3z in the form of multiple droplets is applied onto the substrate is shown.

[0053] As shown in Fig. 7(b), the imprinting mold 4z is placed so that the side on which the concave-convex pattern is formed faces the imprinting material 3z on the substrate. As shown in Fig. 7(c), the substrate 1z to which the imprinting material 3z has been applied is brought into contact with the mold 4z, and pressure is applied. The imprinting material 3z fills the gap between the mold 4z and the workpiece 2z. When light is irradiated through the mold 4z in this state as energy for hardening, the imprinting material 3z hardens.

[0054] 7(d), after the imprint material 3z is cured, the mold 4z and the substrate 1z are separated, and a pattern of the cured product of the imprint material 3z is formed on the substrate 1z. In this cured product pattern, the recesses of the mold correspond to the protrusions of the cured product, and the protrusions of the mold correspond to the recesses of the cured product, i.e., the recessed and protruding patterns of the mold 4z are transferred to the imprint material 3z.

[0055] As shown in Fig. 7(e), when etching is performed using the pattern of the cured material as an etching-resistant mask, the portion of the surface of the workpiece 2z where there is no cured material or where only a thin layer remains is removed, forming a groove 5z. As shown in Fig. 7(f), when the pattern of the cured material is removed, an article having grooves 5z formed on the surface of the workpiece 2z can be obtained. Here, the pattern of the cured material is removed, but it may be used as an interlayer insulating film included in a semiconductor element or the like, that is, a component of an article, without being removed after processing.

[0056] The present disclosure includes the following. (Item 1) An imprint apparatus for forming a pattern on a plurality of shot areas of a substrate by an imprint process, a control unit that detects when a time until the processing of the substrate is completed reaches a predetermined time; the plurality of shot areas are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required for processing each shot area belonging to that processing time group; the control unit determines a total time for processing unprocessed shot areas among the plurality of shot areas of the substrate based on the processing time associated with a processing time group to which each of the unprocessed shot areas belongs. 1. An imprint apparatus comprising: (Item 2) a dispenser configured to place an imprint material on the plurality of shot areas of the substrate; the dispenser is controlled based on control information including information for controlling a coating process of the imprint material so as to coat a designated number of shot regions with the imprint material continuously without going through an imprint process; The plurality of processing time groups are determined based on the control information. 2. The imprint apparatus according to item 1, (Item 3) the control unit classifies each of the plurality of shot areas into one of the plurality of processing time groups based on the control information. 3. The imprint apparatus according to item 2, characterized in that (Item 4) the plurality of processing time groups include at least two groups corresponding to the number of shot areas to which the imprint material is to be applied continuously without undergoing an imprint process; 4. The imprint apparatus according to item 3, (Item 5) At least one of the plurality of processing time groups is configured with a leading shot area in which the imprint material is placed first in a multi-dispense group configured with shot areas to which the imprint material is to be applied continuously without going through an imprint process. 4. The imprint apparatus according to item 3, (Item 6) At least one other processing time group among the plurality of processing time groups is configured with a subsequent shot area in which the imprint material is applied second or later in the multi-dispense group. 6. The imprint apparatus according to item 5, characterized in that (Item 7) a processing time required for processing the leading shot area includes a time for continuously applying an imprint material to shot areas constituting a multi-dispense group to which the leading shot area belongs, and a time required for imprint processing of the leading shot area. 6. The imprint apparatus according to item 5, characterized in that (Item 8) The processing time required for processing the subsequent shot area includes a time required for imprint processing on the subsequent shot area. 7. The imprint apparatus according to item 6, (Item 9) each of at least two of the plurality of processing time groups is configured with a leading shot region in which the imprint material is placed first in a multi-dispense group configured with shot regions to which the imprint material is to be applied continuously without going through an imprint process; 4. The imprint apparatus according to item 3, (Item 10) each of the at least two processing time groups is a processing time group corresponding to the number of shot areas constituting the multi-dispense group; 10. The imprint apparatus according to item 9, (Item 11) a processing time required for processing a shot area belonging to each of the at least two processing time groups includes a time for continuously applying an imprint material to the shot areas constituting a multi-dispense group to which the shot area belongs, and a time required for imprint processing on the leading shot area; 11. The imprinting apparatus according to item 10, (Item 12) the control unit updates the processing time associated with the processing time group to which the shot area belongs based on a time required to process a shot area that has already been subjected to imprint processing among the plurality of shot areas. 12. The imprinting apparatus according to any one of items 1 to 11, (Item 13) a substrate stage for holding the substrate; the control unit causes the transport robot to start an operation of transporting the next substrate to be processed to the substrate stage in accordance with the timing. 13. The imprinting apparatus according to any one of items 1 to 12, (Item 14) 1. An imprint method for forming a pattern in a plurality of shot areas of a substrate, comprising: a coating step of coating each of the plurality of shot areas with an imprint material; an imprinting step of forming a pattern by performing an imprinting process on the imprint material on each of the plurality of shot areas; and detecting a timing when a time until the processing of the substrate is completed reaches a predetermined time, the plurality of shot areas are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required for processing each shot area belonging to that group; the detection step includes a step of determining a total time for processing unprocessed shot areas among the plurality of shot areas of the substrate based on the processing time associated with a processing time group to which each of the unprocessed shot areas belongs, 1. An imprint method comprising: (Item 15) the step of causing the transport robot to start an operation of transporting a substrate to be processed next in response to the timing, 15. The imprint method according to item 14, (Item 16) Forming a pattern on a plurality of substrates according to the imprinting method according to item 14 or 15; a processing step of processing each of the plurality of patterned substrates to obtain an article; A method for manufacturing an article, comprising:

[0057] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0058] 1: substrate, 14: control unit, 21: dispenser, 22: transfer robot, 100: imprint device

Claims

1. An imprint apparatus that performs imprint processing on a plurality of shot areas on a substrate, a control unit that calculates the timing at which a predetermined time has elapsed until the processing of the substrate is completed; the plurality of shot areas are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required to process each shot area belonging to that processing time group; the control unit calculates a total time for processing unprocessed shot areas among the plurality of shot areas based on the processing time associated with a processing time group to which each of the unprocessed shot areas belongs. An imprinting apparatus comprising:

2. Further comprising a dispenser that places an imprint material on the plurality of shot areas, the dispenser is controlled based on control information including information for controlling the application process of the imprint material so as to apply the imprint material to a designated number of shot areas continuously without going through an imprint process; the plurality of processing time groups are determined based on the control information. The imprint apparatus according to claim 1 .

3. the control unit classifies each of the plurality of shot areas into one of the plurality of processing time groups based on the control information. The imprint apparatus according to claim 2 .

4. the plurality of processing time groups include at least two groups corresponding to the number of shot areas to which the imprint material is to be applied continuously without undergoing the imprint processing; 4. The imprint apparatus according to claim 3.

5. at least one processing time group among the plurality of processing time groups is configured by a leading shot area in which the imprint material is placed first in a multi-dispense group configured by shot areas to which the imprint material is to be applied continuously without going through an imprint process; 4. The imprint apparatus according to claim 3.

6. at least one other processing time group among the plurality of processing time groups is configured with a subsequent shot area in which the imprint material is applied second or later in the multi-dispense group; 6. The imprinting apparatus according to claim 5.

7. a processing time required to process the leading shot area includes a time required to continuously apply an imprint material to shot areas constituting a multi-dispense group to which the leading shot area belongs, and a time required to perform an imprint process on the leading shot area.

6. The imprinting apparatus according to claim 5.

8. the processing time required to process the subsequent shot area includes the time required to perform imprint processing on the subsequent shot area.

7. The imprinting apparatus according to claim 6,

9. each of at least two processing time groups among the plurality of processing time groups is configured with a leading shot area in which the imprint material is placed first in a multi-dispense group configured with shot areas to which the imprint material is to be successively applied without going through an imprint process; 4. The imprint apparatus according to claim 3.

10. each of the at least two processing time groups is a processing time group corresponding to the number of shot areas constituting the multi-dispense group; The imprint apparatus according to claim 9 .

11. the processing time required to process the shot areas belonging to each of the at least two processing time groups includes a time required to continuously apply the imprint material to the shot areas constituting the multi-dispense group to which the shot areas belong, and a time required to perform the imprint processing on the leading shot area; The imprinting apparatus according to claim 10 .

12. the control unit updates the processing time associated with the processing time group to which a shot area that has already been subjected to imprint processing belongs, based on the time required to process the shot area among the plurality of shot areas. The imprint apparatus according to claim 1 .

13. further comprising a substrate stage for holding the substrate; the control unit causes the transport robot to start an operation of transporting the next substrate to be processed to the substrate stage in accordance with the timing. The imprinting apparatus according to any one of claims 1 to 12.

14. An imprint method for forming a pattern by performing an imprint process on a plurality of shot areas of a substrate, comprising: a coating step of coating an imprint material onto each of the plurality of shot areas; an imprinting step of performing an imprinting process on the imprint material on each of the plurality of shot areas; a calculation step of calculating a timing at which a time until the processing of the substrate is completed reaches a predetermined time, the plurality of shot areas are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required to process each shot area belonging to that group; the calculation step includes a step of calculating a total time for processing unprocessed shot areas among the plurality of shot areas on the substrate based on the processing times associated with processing time groups to which each of the unprocessed shot areas belongs. An imprint method comprising:

15. The method further includes a step of causing the transfer robot to start an operation of transferring the substrate to be processed next in accordance with the timing. The imprint method according to claim 14 .

16. forming a pattern on a plurality of substrates according to the imprinting method of claim 14 or 15; a processing step of processing each of the plurality of patterned substrates to obtain an article; A method for manufacturing an article, comprising:

Images