Substrate processing apparatus and method

JP2024531585A5Pending Publication Date: 2025-08-21PICOSUN OY
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Patent Information

Application Number
JP2024514599
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-09-14
Filing Date
2022-09-12
Publication Date
2025-08-21

AI Technical Summary

Technical Problem

Existing substrate processing reactors using plasma sources face issues with unwanted particle generation due to unwanted contact between movable parts, leading to contamination during substrate loading and processing.

Method used

A substrate processing apparatus with a deformable infeed assembly and a resilient tubing system that stabilizes the position of movable parts, preventing unwanted contact and particle generation by using elastic forces to maintain concentric alignment and seal the reaction chamber.

Benefits of technology

The solution effectively reduces particle generation and stabilizes the infeed assembly during movement, ensuring cleaner substrate processing and improved reactor performance.

✦ Generated by Eureka AI based on patent content.

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Abstract

A substrate processing apparatus (100) comprising: a reaction chamber (20) for processing at least one substrate; a deformable in-feed assembly (85) having upper and lower portions (70 and 80) movable relative to one another and configured to deform between a vertically extended state to facilitate flow of reactants to the reaction chamber and a vertically contracted state to allow a substrate to be loaded; and a resilient tube (150) coupled to the upper portion of the deformable in-feed assembly.
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Description

[Technical field]

[0001] The present invention relates generally to substrate processing reactors that include a plasma source. More particularly, the present invention relates to deposition reactors (deposition reactors) in which material is deposited on a surface by sequential self-saturating surface reactions, or to etching reactors (etching reactors) in which material is removed from a surface by sequential self-saturating surface reactions. Background

[0002] Please note that this section provides useful background information, but is not an admission that the technology described herein represents the state of the art.

[0003] In chemical deposition and etching processes such as atomic layer deposition (ALD) and atomic layer etching (ALE), plasma can be used to provide the additional energy required for surface reactions. While ALD and ALE reactors have existed for decades, plasma-enhanced reactors are a more recent emerging technology. Thus, there is an ongoing need to develop better plasma-enhanced ALD (PEALD) and plasma-enhanced ALE (PEALE) reactors, or at least provide an alternative to existing solutions.

[0004] Generally, substrate processing reactors must have moving parts to at least allow for the loading and unloading of substrates and for the positioning of parts. However, moving parts in a reactor come with certain drawbacks. A common problem is unwanted contact between reactor parts, which can generate unwanted particles in the reactor that can adhere to the substrate and cause contamination. This problem often manifests as challenges in moving reactor parts between substrate loading and processing positions. Thus, there remains a need for better solutions to reduce unwanted particles in substrate processing reactors, especially in reactors that use plasma sources. Abstract

[0005] It is an object of certain embodiments of the present invention to provide an improved substrate processing apparatus, or at least to provide an alternative to existing techniques.

[0006] According to a first exemplary aspect, there is provided a substrate processing apparatus as follows. a reaction chamber for processing at least one substrate; a deformable in-feed assembly having upper and lower portions movable relative to one another and configured to deform between a vertically extended state that facilitates flow of reactant to the reaction chamber and a vertically contracted state that allows a substrate to be loaded; a resilient tube coupled to the upper portion of the deformable in-feed assembly; Equipped with.

[0007] In some embodiments, the upper portion of the in-feed assembly is a first portion and the lower portion of the in-feed assembly is a second portion, the first portion being closer to a reaction chamber and the second portion being further from the reaction chamber when the in-feed assembly is in its longitudinally extended state. In some embodiments, the in-feed assembly is configured to close or seal the reaction chamber from the top (in the longitudinally extended state). In some embodiments, the in-feed assembly is supported from the top by a resilient tube. In some embodiments, the resilient tube is fixedly attached to the upper portion of the in-feed assembly.

[0008] In some embodiments, the elastic tube is configured to provide a flow of reactant to the in-feed assembly. In some embodiments, the elastic tube provides a conduit for providing a flow of reactant to an upper portion of the in-feed assembly. In some embodiments, the elastic tube is configured to provide reactant to the upper portion of the in-feed assembly in a top-to-bottom flow. In some embodiments, the upper and lower portions of the in-feed assembly are configured to direct or facilitate the flow of reactant in a top-to-bottom flow toward a reaction chamber. In some embodiments, the apparatus is configured to deform a deformable in-feed assembly to a longitudinally contracted state to enable removal of a substrate.

[0009] In some embodiments, the elastic tube is coupled between an upper portion of the in-feed assembly and a stationary element of an apparatus. In some embodiments, the stationary element is an outer chamber. In some embodiments, the elastic tube is coupled between an outer chamber that at least partially surrounds a reaction chamber and an upper portion of a deformable in-feed assembly. In some embodiments, the elastic tube is coupled between an outer chamber lid and an upper portion of a deformable in-feed assembly. The outer chamber at least partially surrounds a reaction chamber. In some embodiments, the elastic tube is coupled between an upper portion of the in-feed assembly and a seal member. The seal member is coupled to a stationary element of an apparatus having a fixed position.

[0010] In some embodiments, the elastic tubing is disposed in a fixed position relative to its attachment point on a stationary component of the apparatus. In some embodiments, the elastic tubing is disposed in a fixed position relative to its attachment point to the outer chamber. In some embodiments, the in-feed assembly is coupled to the outer chamber via the elastic tubing and provides a flow of reactant to a volume within the reaction chamber.

[0011] In some embodiments, the position of all parts of the in-feed assembly are adjustable.

[0012] In some embodiments, the substrate processing apparatus is a plasma enhanced atomic layer deposition apparatus (PEALD reactor). In some embodiments, the substrate processing apparatus is an atomic layer deposition apparatus (ALD reactor). In some embodiments, the substrate processing apparatus is a plasma enhanced atomic layer etch apparatus (PEALE reactor). In some embodiments, the substrate processing apparatus is an atomic layer etch apparatus (ALE reactor). In some embodiments, the apparatus comprises a plasma source above a reaction chamber. In some embodiments, the deposition apparatus comprises a plasma source above an outer chamber. In some embodiments, the plasma source is an inductively coupled plasma source. In some embodiments, the plasma source is configured to generate radicals for use as reactants in the reaction chamber.

[0013] In some embodiments, the device provides a top-to-bottom flow path for the flow of reactant from the plasma source through a resilient tube into the deformable in-feed assembly and into the reaction chamber, and in some embodiments, the reactant exits the reaction chamber through an outlet at the bottom of the reaction chamber.

[0014] In some embodiments, the reactant flow is comprised of a gas containing reactant. In some embodiments, the reactant includes a fluid reactant, a gas reactant, and / or a plasma reactant. In some embodiments, the reactant flows within a conduit provided by a resilient tube. In some embodiments, the reactant containing excited species generated in the plasma source flows through an inner conduit of a resilient tube to a reaction chamber. In some embodiments, the reactant containing excited species flows through the in-feed assembly to a substrate(s) present in the reaction chamber to generate a surface reaction.

[0015] In some embodiments, an intermediate space is formed between the reaction chamber and the outer chamber, at least partially surrounding the reaction chamber. In some embodiments, the outer chamber completely surrounds the reaction chamber. In some embodiments, the intermediate space formed between the reaction chamber and the outer chamber completely surrounds the reaction chamber. With respect to "completely" in this respect, the reaction chamber in which the substrate is processed is considered to be completely surrounded by the outer chamber and / or the intermediate space, since the reaction chamber is surrounded by the outer chamber except for the entrance and exit locations to and from the reaction chamber. In some embodiments, the elastic tube and the in-feed assembly are disposed within the same space. In some embodiments, the elastic tube and the in-feed assembly are disposed within the intermediate space within the outer chamber.

[0016] In some embodiments, the resilient tube is coupled to the upper portion of the in-feed assembly, for example via a flange.

[0017] In some embodiments, the elastic tube is configured to generate a mechanical force on the in-feed assembly using mechanical potential energy stored therein. In some embodiments, the elastic tube is configured to generate a mechanical force on the in-feed assembly using elastic energy stored therein. In some embodiments, the elastic tube is configured to generate a mechanical force on the upper portion of the in-feed assembly. In some embodiments, the elastic tube is configured to generate a mechanical force on the upper portion and the lower portion.

[0018] In some embodiments, the resilient tube is configured to generate a mechanical force on the in-feed assembly to stabilize the upper portion of the in-feed assembly. In some embodiments, the resilient tube is configured to adjust a position of the upper portion of the in-feed assembly. In some embodiments, the resilient tube is configured to stabilize and adjust a position of the upper portion of the in-feed assembly by generating a mechanical force on the in-feed assembly.

[0019] In some embodiments, the elastic tubing is elastic and configured to store mechanical potential energy. In some embodiments, the elastic tubing is configured to be pre-tensioned. In some embodiments, the pre-tensioned elastic tubing is coupled to the upper portion of the in-feed assembly and configured to provide a reactant flow to the in-feed assembly.

[0020] In some embodiments, the resilient tube is configured to adjust the longitudinal and / or lateral and / or angular position of the upper portion of the in-feed assembly. In some embodiments, the resilient tube is configured to pull or retract the upper portion of the in-feed assembly toward the resilient tube and / or in alignment with a vertical central axis of the lower portion of the in-feed assembly, thereby adjusting the position of the upper portion of the in-feed assembly.

[0021] In some embodiments, the resilient tubing is configured to retract or pull the upper portion of the in-feed assembly away from a reaction chamber. In some embodiments, the resilient tubing is configured to retract or pull the upper and lower portions of the in-feed assembly away from a reaction chamber.

[0022] In some embodiments, the mechanical force generated by the elastic tube is configured to pull or retract the upper portion towards the elastic tube and / or in alignment with a vertical central axis of the lower portion, thereby adjusting a position of the upper portion of the in-feed assembly. In some embodiments, the mechanical force generated by the elastic tube is not adapted to adjust a position of the lower portion of the in-feed assembly. In some embodiments, the mechanical force generated by the elastic tube is not sufficient to adjust a position of the lower portion.

[0023] In some embodiments, the mechanical force generated by the elastic tube causes the lower and upper portions to become concentric, thereby preventing undesired contact between the upper and lower portions, where undesired contact in this context means contact between the upper and lower portions that would result in undesired particle generation.

[0024] In some embodiments, mechanical energy within the elastic tubing is configured to concentrically align the upper and lower portions during deformation of the in-feed assembly and in longitudinally expanded and / or contracted states. In some embodiments, the concentricity means and the upper and lower portions are aligned about the same vertical central axis, thereby preventing undesired contact between the upper and lower portions. In some embodiments, the elastic tubing is configured to concentrically align the upper and lower portions during deformation of the in-feed assembly, thereby preventing undesired contact between an outer surface of the upper portion and an inner surface of the lower portion.

[0025] In some embodiments, the resilient tube is configured to stabilize the in-feed assembly. In some embodiments, the resilient tube is configured to stabilize the movement of the in-feed assembly. In some embodiments, stabilizing the movement of the in-feed assembly reduces unwanted particle generation. In some embodiments, the resilient tube is configured to prevent vibration of the in-feed assembly and unwanted particle generation primarily while the in-feed assembly is moving. In some embodiments, the resilient tube is configured to prevent vibration of the in-feed assembly and unwanted particle generation even while the in-feed assembly is stationary.

[0026] In some embodiments, the mechanical energy in the elastic tube is configured to pull or retract the upper portion of the in-feed assembly upwardly away from a reaction chamber during deformation of the in-feed assembly and in a longitudinally extended and / or contracted state.

[0027] In some embodiments, the elastic tube is constantly stretched. In some embodiments, the elastic tube is configured to be stretched longitudinally during longitudinal deformation of the in-feed assembly. In some embodiments, the elastic tube is configured to be stretched under displacement of the lower portion relative to the upper portion. In some embodiments, the elastic tube is configured to expand and contract under mechanical forces generated by the in-feed assembly. In some embodiments, the elastic tube is configured to expand or compress when the in-feed assembly is in a longitudinally stretched state. In some embodiments, the elastic tube is configured to expand or compress under longitudinal movement of the longitudinally stretched in-feed assembly. In some embodiments, the elastic tube is configured to expand further longitudinally when the longitudinally stretched in-feed assembly moves towards a reaction chamber. In some embodiments, the elastic tube is configured to compress longitudinally when the longitudinally stretched in-feed assembly is moved away from a reaction chamber.

[0028] In some embodiments, the resilient tube is configured to be horizontally and / or vertically and / or angularly resilient, hi some embodiments, the resilient tube is configured to be resilient in multiple axes.

[0029] In some embodiments, the elastic tube is a resilient tubular conduit. In some embodiments, the elastic tube is a bellows-like body. In some embodiments, the elastic tube is a tubular metal bellows. In some embodiments, the elastic tube is a tubular spring-like body. In some embodiments, the elastic tube is comprised of a nickel-based alloy, such as an alloy including AISI304, AISI304L, AISI316, or AISI316L, Inconel, and / or Titanium. In some embodiments, the elastic tube is comprised of a material that has a coefficient of thermal expansion similar to that of the material of the surrounding components.

[0030] In some embodiments, the elastic tubing is configured to deform when a mechanical force is applied. In some embodiments, the elastic tubing is configured to be compressed or retracted and / or stretched when a mechanical force is applied. In some embodiments, the elastic tubing is configured to return to its original position when the applied force is released or removed.

[0031] In some embodiments, thermal expansion or contraction does not cause significant relative movement between components that make up the elastic tube. In some embodiments, the elastic tube is configured to not deform significantly in response to temperature changes. In some embodiments, the elastic tube is configured to not deform significantly in response to pressure changes in the surrounding space.

[0032] In some embodiments, the elastic tube is configured to form a sealed barrier between its inner conduit space and a space surrounding the elastic tube from the outside, which is typically the intermediate space in the outer chamber. In some embodiments, the elastic tube is configured to form a sealed connection with an upper part of the in-feed assembly and with a stationary element of the device, such as the outer chamber. In some embodiments, the elastic tube is configured to prevent leakage of reactants from the elastic tube into an ambient space, such as the intermediate space in the outer chamber. In some embodiments, the elastic tube is also configured to prevent ingress of gas from the external ambient space into the interior space of the elastic tube.

[0033] In some embodiments, the elastic tube is configured to prevent leakage of the in-feed assembly at the junction between the upper and lower portions of the in-feed assembly. In some embodiments, the elastic tube is also configured to prevent leakage of the deformable in-feed assembly at the distal end of the in-feed assembly (the junction where it is coupled to another portion of the device). In some embodiments, the elastic tube is configured to deform to prevent leakage between portions or modules of the in-feed assembly. In some embodiments, the elastic tube is configured to deform to prevent leakage of the in-feed assembly when the in-feed assembly is in a longitudinally extended state.

[0034] In some embodiments, the lower portion of the in-feed assembly is comprised of multiple sections.

[0035] In some embodiments, the lower portion of the in-feed assembly is configured to be sealed against a reaction chamber when the in-feed assembly is in a vertically extended position to provide a flow of reactants to a reaction chamber. In some embodiments, the vertically extended in-feed assembly is configured to be positioned against a reaction chamber to form a reaction chamber volume and provide a flow of reactants to the reaction chamber for substrate processing. In some embodiments, the lower portion of the in-feed assembly is configured to use the position against the reaction chamber that is a leak-proof position. In some embodiments, a lower rim of the in-feed assembly is configured to be sealed against an edge of an opening of a reaction chamber when the in-feed assembly is in a vertically extended position.

[0036] In some embodiments, a face seal is provided between the infeed assembly and the reaction chamber when the infeed assembly is in the vertically extended state. In some embodiments, the reaction chamber includes a flange or collar that fits snugly against the lower portion when the infeed assembly is in the vertically extended state. In some embodiments, the infeed assembly is coupled to an infeed assembly flange that fits against a flange of the reaction chamber when the infeed assembly is in the vertically extended state.

[0037] In some embodiments, the in-feed assembly expands toward the reaction chamber. In some embodiments, the in-feed assembly expands toward the reaction chamber in a longitudinally extended state. In some embodiments, the in-feed assembly defines an expanding or widening space by its cylindrical upper and lower portions, which expands or widens toward the reaction chamber.

[0038] In some embodiments, the apparatus includes a sealed interface between a lower portion and an upper portion of the deformable in-feed assembly when the deformable in-feed assembly is in a longitudinally extended state, In some embodiments, the sealed interface is configured to prevent leakage of the in-feed assembly.

[0039] In some embodiments, a lower rim of the upper portion and an upper rim of the lower portion of the in-feed assembly form horizontal collars, the horizontal collars of the upper and lower portions overlapping each other in an extended state of the in-feed assembly. In some embodiments, the overlapping collars form a hook structure, allowing the overlapping collar of the lower portion to hook onto or hang from the collar of the upper portion. In some embodiments, the overlapping collars are configured to prevent leakage of the longitudinally extended deformable in-feed assembly.

[0040] In some embodiments, a seal is provided between the upper and lower portions of the deformable in-feed assembly to prevent undesired contact between the upper and lower portions and to prevent leakage of the deformable in-feed assembly. In some embodiments, the seal prevents leakage of gas from the surrounding space into a space within the in-feed assembly. In some embodiments, the seal prevents leakage of reactants from the in-feed assembly into the surrounding space.

[0041] In some embodiments, the lower and upper sections are configured to nest within one another when the in-feed assembly is in a longitudinally contracted state.

[0042] In some embodiments, the lower portion of the in-feed assembly is configured to slide over the upper portion. In some embodiments, the upper portion of the in-feed assembly is configured to nest inside the lower portion when the in-feed assembly is in a longitudinally retracted position. In some embodiments, the in-feed assembly is formed of cylindrical, frusto-conical, or ring-shaped members configured to slide and / or nest within one another. In some embodiments, the in-feed assembly forms a telescoping structure having a hollow interior space.

[0043] In some embodiments, the vertical distance that the deformable in-feed assembly parts move during contraction and extension depends on the size of the device and the in-feed assembly parts. In some embodiments, the upper part of the in-feed assembly is configured to move vertically only in the vertically extended state of the in-feed assembly to allow the in-feed assembly to be sealed against a reaction chamber. In some embodiments, the upper part of the in-feed assembly is configured to move vertically upwards and / or downwards by 3-20 mm, preferably 5-10 mm, in the vertically extended state of the in-feed assembly. In some embodiments, the lower part of the in-feed assembly is configured to move vertically in the vertically extended state and when the in-feed assembly is deformed vertically between the contracted state and the extended state. In some embodiments, the vertical distance that the lower part of the in-feed assembly moves is 100-300 mm.

[0044] In some embodiments, the device comprises a pretensioning mechanism that pretensions the elastic tube by preventing it from returning to an unstretched position. In some embodiments, the device comprises a pretensioning mechanism around the elastic tube, the pretensioning mechanism configured to generate a mechanical force on the elastic tube by preventing it from returning to an unstretched or relaxed state. In some embodiments, the pretensioning mechanism is around the elastic tube. In some embodiments, the pretensioning mechanism is configured to continuously generate a pretension on the elastic tube, the pretensioning mechanism always preventing the elastic tube from returning to an unstretched or relaxed state.

[0045] In some embodiments, the pretensioning mechanism is configured to generate a mechanical force on the in-feed assembly via the elastic tube. In some embodiments, the pretensioning mechanism is configured to generate a mechanical force on an upper portion of the in-feed assembly. In some embodiments, the pretensioning mechanism is configured to generate a mechanical force on upper and lower portions of the in-feed assembly.

[0046] In some embodiments, the pretensioning mechanism is configured to adjust the position of the elastic tube. In some embodiments, the elastic tube is configured to deform under adjustment between components of the pretensioning mechanism.

[0047] In some embodiments, the elastic tube and the pretensioning mechanism are configured to generate a mechanical force on the in-feed assembly to stabilize the in-feed assembly and prevent leakage. In some embodiments, the mechanical force generated by the pretensioning mechanism continuously pulls or retracts the upper portion of the in-feed assembly upward (away from a reaction chamber) and / or in alignment with a vertical central axis of the lower portion of the in-feed assembly during deformation and in longitudinally extended and / or retracted states of the in-feed assembly. In some embodiments, the mechanical force generated by the pretensioning mechanism is configured to constantly keep the lower and upper portions of the in-feed assembly concentric during deformation and in longitudinally extended and / or retracted states of the in-feed assembly.

[0048] In some embodiments, the elastic tube and / or the pretensioning mechanism are configured to stabilize movement of the in-feed assembly.

[0049] In some embodiments, the resilient tube and / or the pretensioning mechanism are configured to prevent vibration of the in-feed assembly and generation of unwanted particles, particularly while the in-feed assembly is moving. In some embodiments, the resilient tube and / or the pretensioning mechanism are configured to prevent vibration of the in-feed assembly and generation of unwanted particles while the in-feed assembly is not moving and thus essentially stationary.

[0050] In some embodiments, the elastic tube and / or the pretensioning mechanism are configured to prevent leakage of gas (containing reactive species) from the in-feed assembly at the junction between the upper and lower sections. In some embodiments, the elastic tube and / or the pretensioning mechanism are configured to prevent leakage of gas (containing reactive species) from the in-feed assembly, even at the distal end of the in-feed assembly (where it is joined to the rest of the device). In some embodiments, the pretensioning mechanism is configured to prevent leakage of gas (containing reactive species) from the in-feed assembly, even at the junction between the upper and lower sections. In some embodiments, the pretensioning mechanism is configured to prevent leakage of the deformable in-feed assembly, even at the distal end of the in-feed assembly (where it is joined to the rest of the device).

[0051] In some embodiments, the elastic tube and / or the pretensioning mechanism are configured to prevent gas in the ambient or intermediate space from leaking into the longitudinally extending in-feed assembly and into the reaction chamber. In some embodiments, the elastic tube and / or the pretensioning mechanism are configured to prevent any reactant in the longitudinally extending in-feed assembly from leaking into the ambient or intermediate space.

[0052] In some embodiments, the pretensioning mechanism is secured near a periphery of a lower edge or lower rim of the elastic tube. The lower edge or lower rim of the elastic tube is configured to stretch or compress through the pretensioning mechanism. In some embodiments, stretching or compressing of the lower edge or lower rim of the elastic tube through the pretensioning mechanism is limited. In some embodiments, the pretensioning mechanism is rigidly coupled to an upper edge or upper rim of the elastic tube. In some embodiments, the pretensioning mechanism is indirectly coupled to the elastic tube, with one or more components separating the pretensioning mechanism from the elastic tube.

[0053] In some embodiments, the pretensioning mechanism is configured to be vertically and / or horizontally and / or diagonally and / or angularly adjustable. In some embodiments, the pretensioning mechanism is configured to be easily accessible and easily adjustable.

[0054] In some embodiments, thermal expansion does not cause significant relative movement between the components that make up the pretensioning mechanism. In some embodiments, the pretensioning mechanism is made of nickel-based alloys, such as AISI304, AISI304L, AISI316, AISI316L, Inconel and / or titanium-containing alloys. In some embodiments, the pretensioning mechanism is made of a material that has a thermal expansion coefficient similar to that of the surrounding component materials.

[0055] In some embodiments, the elastic tube is placed in a tensioned state between or within the pretensioning mechanism. In some embodiments, the pretensioning mechanism prevents the elastic tube from being in its equilibrium, relaxed and / or unstretched state. In some embodiments, a restoring force driving the upward deformation movement of the elastic tube is configured to be inhibited or prevented by the pretensioning mechanism during extension and retraction movements of the in-feed assembly and while the in-feed assembly is in a longitudinally contracted or extended state.

[0056] In some embodiments, the upper portion of the in-feed assembly is configured to contact the pretensioning mechanism. In some embodiments, the upper portion of the in-feed assembly has a protrusion, such as a flange-like, ring-like, or cylindrical object, coupled to its outer space or to a side facing the intermediate space. The protrusion is configured to inhibit or prevent the elastic tube from returning to its equilibrium, resting, or unstretched state. In some embodiments, the protrusion is configured to be blocked or stopped against a lower plane of the pretensioning mechanism. In some embodiments, the elastic tube cannot return further vertically upwards to its unstretched state when the protrusion hits the lower plane of the pretensioning mechanism. In some embodiments, the protrusion is configured to pretension the elastic tube.

[0057] In some embodiments, the protrusions coupled to the sides of the upper portion of the infeed assembly are configured to minimize unwanted particle generation resulting from contact between its surface against the pretensioning mechanism. In some embodiments, the protrusions are made of or coated with a material that allows for minimizing particle generation resulting from friction of its surface against the pretensioning mechanism. In some embodiments, the protrusions are made of or coated with a material that has a low coefficient of friction and high temperature resistance. In some embodiments, the material comprises a fluorocarbon or a fluoropolymer such as polytetrafluoroethylene (PTFE), perfluoroalkoxyalkane (PFA). In some embodiments, the material comprises a high performance plastic such as a polyimide (e.g., Kapton). In some embodiments, the material comprises a thermoplastic polymer such as polyaryletherketone (e.g., PAEK).

[0058] In some embodiments, the protrusions coupled to sides of the upper portion of the in-feed assembly are configured to cause the upper portion to be concentric with the lower portion of the in-feed assembly, thereby preventing undesired contact between the upper and lower portions of the in-feed assembly. In some embodiments, the protrusions coupled to sides of the upper portion of the in-feed assembly are configured to cause the upper portion to be concentric with the lower portion of the in-feed assembly during deformation and in longitudinally expanded and / or contracted states of the in-feed assembly.

[0059] In some embodiments, movement of the deformable in-feed assembly separates the upper portion from the pretensioning mechanism. In some embodiments, when the in-feed assembly is sealed to a reaction chamber in a longitudinally extended state, the elastic tube is in a more extended state than when the in-feed assembly is longitudinally extended but not sealed to the reaction chamber. In some embodiments, when the in-feed assembly is sealed to a reaction chamber, the elastic tube is in a more extended state than when the in-feed assembly is longitudinally contracted. In some embodiments, when the in-feed assembly is sealed to a reaction chamber, the protrusion of the upper portion of the in-feed assembly is pulled away from the pretensioning mechanism towards the reaction chamber. This configuration compensates for thermal expansion of device components during use of the device.

[0060] In some embodiments, when the in-feed assembly is in a longitudinally extended state, the protrusion coupled to a side of the upper portion of the in-feed assembly is configured to obstruct a lower surface of the pretensioning mechanism when the in-feed assembly is sealed to a reaction chamber and the elastic tube is further extended, hi such embodiments, the protrusion is configured to space away from the lower surface of the pretensioning mechanism, leaving a gap therebetween.

[0061] In some embodiments, the lower portion includes a drive mechanism attached thereto, the drive mechanism configured to transform the in-feed assembly between a vertically extended state and a vertically contracted state. In some embodiments, the drive mechanism is configured to transform the in-feed assembly to a vertically contracted state. In this state, the in-feed assembly is open to the reaction chamber. In some embodiments, the drive mechanism allows for loading at least one substrate into the reaction chamber from an upper side of the reaction chamber. In some embodiments, the drive mechanism also allows for unloading at least one substrate from an upper side of the reaction chamber. In some embodiments, the drive mechanism is configured to transform the in-feed assembly to a vertically extended state. In this state, the in-feed assembly is sealed to the reaction chamber, i.e., closed to the reaction chamber.

[0062] In some embodiments, the drive mechanism is configured to reversibly vary the size of the in-feed assembly.

[0063] In some embodiments, the drive mechanism is attached to a lower portion of the in-feed assembly with a spring biased attachment. In some embodiments, the drive mechanism has at least one moveable shaft coupled to the lower portion of the in-feed assembly with a spring biased attachment. In some embodiments, the drive mechanism comprises at least two moveable shafts coupled to the lower portion with a spring biased attachment. In some embodiments, the number of moveable shafts is two. In some embodiments, the number of moveable shafts is three or four. In some embodiments, one or more moveable shafts are coupled to an upper half of the lower portion of the in-feed assembly. In some embodiments, one or more moveable shafts are coupled to an upper edge or upper rim of the lower portion of the in-feed assembly.

[0064] In some embodiments, the drive mechanism comprises at least one actuator, wherein the actuator is a device configured to generate movement of the apparatus through at least one movable shaft. In some embodiments, the drive mechanism comprises at least two, three or four actuators. In some embodiments, the drive mechanism comprises multiple actuators. In some embodiments, one or more actuators are each coupled to only one movable shaft. In some embodiments, one or more actuators are each coupled to two movable shafts. In some embodiments, all shafts and all actuators coupled to the shafts are arranged symmetrically with respect to the circumference of the deformable in-feed line. In some embodiments, the drive mechanism comprises two actuators, each coupled to its own shaft. In some embodiments, the drive mechanism comprises one actuator coupled to two shafts.

[0065] In some embodiments, the in-feed assembly is configured to deform under forces generated by one or more actuators and one or more shafts.

[0066] In some embodiments, the drive mechanism is also configured to deform the elastic tube coupled to the upper portion of the in-feed assembly. In some embodiments, the elastic tube is configured to deform under mechanical forces generated by one or more actuators and one or more movable shafts. In some embodiments, the elastic tube is configured to deform under mechanical forces generated by one or more movable shafts that reversibly push and pull the in-feed assembly between a longitudinally extended state and a longitudinally contracted state. In some embodiments, when the in-feed assembly is longitudinally extended and flush against a reaction chamber, the mechanical forces applied to the elastic tube and the upper portion of the in-feed assembly are greater than when the in-feed assembly is longitudinally extended but not flush against a reaction chamber, or when the in-feed assembly is longitudinally contracted.

[0067] In some embodiments, coupling of one or more moveable shafts to an upper half of the lower portion is configured to reduce vibration and stabilize the movement of the deformable in-feed assembly. In some embodiments, coupling of one or more moveable shafts to an upper edge or surface of an upper rim of the lower portion is configured to reduce vibration and stabilize the movement of the deformable in-feed assembly. In some embodiments, coupling of one or more moveable shafts to the lower portion above the center of mass of the lower portion reduces vibration and stabilizes the movement of the deformable in-feed assembly.

[0068] In some embodiments, the one or more movable shafts are configured to reversibly deform the deformable in-feed assembly from a longitudinally extended state to a longitudinally contracted state, in which the longitudinally contracted state allows for loading of at least one substrate into the reaction chamber. In some embodiments, the movable shafts are configured to reversibly deform the in-feed assembly from a longitudinally contracted state to a longitudinally extended state, in which the longitudinally expanded state allows for processing of at least one substrate in the reaction chamber.

[0069] In some embodiments, the apparatus comprises a plurality of moveable shafts symmetrically coupled to the periphery of the deformable in-feed assembly. In some embodiments, the number of moveable shafts is two, the two shafts being located on opposite sides of the deformable in-feed assembly. In other embodiments, the number of moveable shafts is three, four or more, but in any case, the moveable shafts are symmetrically disposed around the periphery of the deformable in-feed assembly.

[0070] In some embodiments, the spring-loaded attachment is configured to resiliently couple the drive mechanism to the in-feed assembly and stabilize the movement of the in-feed assembly. In some embodiments, the spring-loaded attachment couples a lower portion of the in-feed assembly to one or more movable shafts. In some embodiments, the spring-loaded attachment is configured to adjust the angle and / or vertical and / or horizontal position of the lower portion of the in-feed assembly. In some embodiments, the spring-loaded attachment facilitates vertical adjustment of the entire in-feed assembly.

[0071] In some embodiments, the spring-loaded attachment comprises a plurality of resilient elements, preferably at least three resilient elements, for example three or four resilient elements. In some embodiments, one or more movable shafts are coupled to a lower portion of the deformable in-feed assembly via resilient elements. In some embodiments, each resilient element in the spring-loaded attachment is configured to resist longitudinal movement of the deformable in-feed assembly to stabilize the movement of the deformable in-feed assembly. In some embodiments, the number of movable shafts is two and the number of resilient elements is three or four.

[0072] In some embodiments, each resilient element is an elastic body configured to store mechanical potential energy. In some embodiments, each resilient element is configured to be pretensioned. In some embodiments, each resilient element is configured to be pretensioned between the elements that make up the spring attachment. In some embodiments, each resilient element is a spring. In some embodiments, each resilient element is configured to resist vertical, horizontal and diagonal movement of the in-feed assembly with mechanical potential energy stored therein, thereby stabilizing the movement of the in-feed assembly. In some embodiments, each resilient element is configured to resist deformation of the in-feed assembly to a longitudinally extended state, thereby stabilizing said deformation with mechanical potential energy stored therein. In some embodiments, each resilient element is configured to resist deformation of the in-feed assembly to a longitudinally contracted state, thereby stabilizing said deformation with mechanical energy stored therein. In some embodiments, each resilient element is configured to adjust the angle of the in-feed line with respect to the reaction chamber when the in-feed assembly is in a longitudinally extended state.

[0073] In some embodiments, the greater the distance in the horizontal plane of each elastic component in the spring-loaded attachment from a surface of the in-feed assembly facing the intermediate space, the greater the accuracy of positioning of the lower portion of the in-feed assembly.

[0074] In some embodiments, when the in-feed assembly is in a longitudinally extended state, a longitudinal gap separates the lower portion of the in-feed assembly from the reaction chamber. In some embodiments, the gap between the lower portion of the in-feed assembly and the reaction chamber is closed by the drive mechanism further compressing each of the resilient elements. In some embodiments, the gap between the lower portion of the in-feed assembly and the reaction chamber is closed by the drive mechanism further extending the resilient tube.

[0075] In some embodiments, the drive mechanism further expands the elastic tube in a longitudinal direction, thereby pressing the longitudinally expanded in-feed assembly further longitudinally toward a reaction chamber to seal between the in-feed assembly and the reaction chamber. In some embodiments, the drive mechanism further compresses the elastic components to press the longitudinally expanded in-feed assembly toward a reaction chamber to seal between the in-feed assembly and the reaction chamber. In some embodiments, the elastic components are configured to resist the further compression in the longitudinally expanded state of the in-feed assembly more than the deformation of the in-feed assembly to the longitudinally expanded state. In some embodiments, the elastic components are configured to resist the longitudinal deformation of the in-feed assembly most in the longitudinally extended state of the in-feed assembly. In some embodiments, the resistance of the elastic components to the further compression in the longitudinally expanded state of the in-feed assembly stabilizes the movement of the in-feed assembly and prevents the generation of undesirable particles.

[0076] In some embodiments, the elastic tube is coupled between the lower portion of the in-feed assembly and a fixed element of the apparatus. In some embodiments, the fixed element is the upper portion of the in-feed assembly. In such embodiments, the upper portion of the in-feed assembly is a stationary portion of the in-feed assembly and is fixedly attached to the apparatus. In some embodiments, the upper portion of the in-feed assembly is coupled to another fixed element of the apparatus having a fixed location, such as an inner surface of an outer chamber or a flange coupled to an outer chamber. In some embodiments, the elastic tube is directly coupled to the upper portion of the in-feed assembly or indirectly coupled via another fixed portion of the apparatus, such as an outer chamber.

[0077] In some embodiments, the upper portion of the in-feed assembly is nested inside the elastic tube. In some embodiments, in a longitudinally expanded state of the deformable in-feed assembly, the elastic tube surrounds the entire longitudinal length of the upper portion of the in-feed assembly. In some embodiments, in a longitudinally contracted state of the deformable in-feed assembly, the elastic tube surrounds only a portion of the longitudinal length of the upper portion of the deformable in-feed assembly, while a portion of the upper portion is nested inside the lower portion of the deformable in-feed assembly.

[0078] In some embodiments, the resilient tube is configured to adjust the position of the lower portion of the in-feed assembly and the upper portion of the in-feed assembly is configured to provide a flow of reactant to the lower portion. In some embodiments, the resilient tube is configured to adjust the position of the lower portion relative to the upper portion of the in-feed assembly to provide a leak-tight, deformable in-feed assembly.

[0079] According to a second aspect, there is provided the following method. This method comprises the steps of: Providing a reaction chamber for processing at least one substrate and a deformable in-feed assembly having upper and lower portions movable relative to one another; deforming the in-feed assembly to a longitudinally contracted state to load a substrate into the reaction chamber; deforming the in-feed assembly to a longitudinally elongated state; flowing a reactant through a resilient tubing coupled to the upper portion, and flowing the reactant from the resilient tubing through the in-feed assembly and into the reaction chamber; Includes.

[0080] According to a third aspect, there is provided the following method. This method comprises the steps of: Providing a reaction chamber for processing at least one substrate and a deformable in-feed assembly having upper and lower portions movable relative to one another; deforming the in-feed assembly to a longitudinally contracted state to load a substrate into the reaction chamber; deforming the in-feed assembly to a longitudinally elongated state; flowing a reactant through the upper portion nested within the flexible tubing and flowing the reactant from the upper portion through the lower portion to the reaction chamber; Includes.

[0081] Although various aspects and embodiments have been introduced, they are not presented to limit the scope of the invention. The above-mentioned embodiments are merely used to illustrate certain aspects and steps that may be used in implementing the present invention. Some embodiments may be presented only with reference to certain exemplary aspects. It should be understood that some embodiments are applicable to other embodiments. In particular, the embodiments described in relation to the first aspect are also applicable to other aspects. These embodiments can be combined as appropriate. [Brief description of the drawings]

[0082] The invention will now be described, by way of example only, with reference to the accompanying drawings, in which: [Figure 1] 1 is a schematic cross-sectional view of certain portions of a substrate processing apparatus in accordance with an embodiment, with a deformable in-feed assembly in a longitudinally extended position; [Diagram 2] 1 is another schematic cross-section of certain portions of a substrate processing apparatus according to certain embodiments, with the deformable in-feed assembly in a longitudinally contracted state; [Diagram 3] FIG. 13 is an enlarged cross-sectional view of an elastic tube according to an embodiment. [Figure 4] FIG. 13 is another enlarged cross-sectional view of a flexible tube according to an embodiment. [Diagram 5] 1 is a schematic cross-sectional view of a deformable in-feed assembly according to an embodiment. [Figure 6] 1 is another schematic cross-sectional view of a deformable in-feed assembly according to an embodiment. [Figure 7] 1 is yet another schematic cross-sectional view of a deformable in-feed assembly according to an embodiment. [Figure 8] 6 is another schematic cross-section of the deformable in-feed assembly of FIG. 5 according to an embodiment. [Figure 9] 7 is another schematic cross-section of the deformable in-feed assembly of FIG. 6 according to an embodiment. [Figure 10] 8 is another schematic cross-section of the deformable in-feed assembly of FIG. 7 according to an embodiment. [Figure 11] 1 is an alternative schematic cross-sectional view of certain portions of a substrate processing apparatus according to an embodiment, with a deformable in-feed assembly in a longitudinally extended position; [Figure 12] 1 is another schematic cross-section of certain portions of a substrate processing apparatus according to certain embodiments, with the deformable in-feed assembly in a longitudinally contracted state; Detailed explanation

[0083] In the following description, an atomic layer deposition (ALD) technique and an atomic layer etching (ALE) technique are used as an example.

[0084] The basics of ALD growth mechanisms are known to those skilled in the art. ALD is a specialized chemical deposition method based on the sequential introduction of at least two reactive precursor species to at least one substrate. A basic ALD deposition cycle consists of four sequential steps: Pulse A, Purge A, Pulse B, and Purge B. Pulse A consists of a first precursor vapor, and Pulse B consists of another precursor vapor. Inert gases and vacuum pumps are used in Purge A and Purge B to purge gaseous reaction by-products and residual reactant molecules from the reaction space. A deposition sequence consists of at least one deposition cycle. The deposition sequence is organized such that the deposition cycles are repeated until a thin film or coating of the desired thickness is produced. The deposition cycles can be simple or more complex. For example, a deposition cycle can include three or more reactant vapor pulses separated by purge steps. Also, some of the purge steps can be omitted. In plasma-assisted ALD, such as PEALD (Plasma-Enhanced Atomic Layer Deposition) or Photon-Assisted ALD, the additional energy required for the surface reaction is provided through a plasma or a supply of photons to assist one or more deposition steps. Alternatively, one of the reactive precursors can be replaced by energy (e.g. simply light), leading to a single precursor ALD process. Thus, the pulsing and purging sequences can vary depending on the individual case. These deposition cycles form a timed deposition sequence controlled by a logic unit or microprocessor. Thin films grown by ALD are dense, pinhole-free, and of uniform thickness.

[0085] In the context of substrate processing, at least one substrate is typically exposed to multiple, time-separated precursor pulses in a reactor (or reaction chamber), whereby material is deposited on the substrate surface in a sequential self-saturating surface reaction. In the context of this application, the term ALD includes all available techniques based on ALD, as well as any equivalent or closely related techniques, including, for example, ALD variants such as: MLD (Molecular Layer Deposition), plasma-assisted ALD, e.g. PEALD (Plasma Enhanced Atomic Layer Deposition), photon-assisted ALD (also known as flash enhanced ALD or photon-enhanced ALD).

[0086] However, the present invention is not limited to ALD techniques and may be utilized in a wide variety of substrate processing equipment, including chemical deposition reactors, such as chemical vapor deposition (CVD) reactors, and chemical etching reactors, such as atomic layer etching (ALE) reactors.

[0087] The basics of the ALE etching mechanism are known to those skilled in the art. In ALE, a material layer is removed from a surface using a self-limiting sequence of reaction steps. A typical ALE etching cycle includes a modification step, which forms a reaction layer, and a removal step, which removes only the reaction layer. The removal step uses plasma species (particularly ions) to remove the layer.

[0088] With respect to the ALD and ALE techniques, a self-saturating surface reaction means that the surface reaction in the surface reaction layer stops and self-saturates when the surface reaction fields are completely exhausted.

[0089] In the following description, the atomic layer deposition (ALD) technique is used as an example.

[0090] 1 is a schematic cross-sectional view of an apparatus 100. The apparatus 100 is a substrate processing apparatus or reactor suitable for performing, for example, plasma-enhanced ALD film deposition reactions or plasma-enhanced atomic layer etch reactions.

[0091] The apparatus 100 includes a reaction chamber 20, which partially defines a space 60 in which a substrate is processed. The apparatus 100 also includes a deformable in-feed assembly 85, which has at least an upper portion 70 and a lower portion 80. The in-feed assembly 85 is configured to lower by extending and to raise by contracting. The upper portion 70 and the lower portion 80 are movable relative to each other, such that the in-feed assembly 85 is configured to deform between a vertically extended state and a vertically contracted state. As shown in FIG. 2, the upper portion 70 and the lower portion 80 have a variable diameter and are configured to slide over each other as the in-feed assembly 85 extends and retracts. The upper portion 70 and the lower portion 80 form a telescopic structure.

[0092] The extension and retraction of the deformable in-feed assembly 85 is configured to be effected by a drive mechanism attached to the lower portion 80. The drive mechanism is configured to raise at least the lower portion 80 so that the deformable in-feed assembly 85 is in a longitudinally contracted state. The drive mechanism is also configured to lower at least the lower portion 80 so that the deformable in-feed assembly 85 is in a longitudinally extended state. The drive mechanism is also configured to further pull down the entire longitudinally extended deformable in-feed assembly 85 so that the in-feed assembly 85 is sealed at the edge of the opening of the reaction chamber 20. In some embodiments, the deformable in-feed assembly 85 is coupled to a flange 40 surrounding the opening of the reaction chamber 20, and in some embodiments, the deformable in-feed assembly 85 is coupled to an in-feed assembly flange 45. The in-feed assembly flange 45 is sealed to the flange 40 of the reaction chamber when the deformable in-feed assembly 85 is in a longitudinally extended state.

[0093] The drive mechanism comprises at least one movable shaft 120 (only one is shown in Figs. 5-10) coupled to the lower part 80 of the deformable in-feed assembly 85 by a spring-loaded attachment 90, as shown in Figs. 1 and 2. Preferably, the spring-loaded attachment 90 is coupled to the upper half of the lower part 80 to allow a stable vibration-free movement of the deformable in-feed assembly 85. Ideally, the spring-loaded attachment 90 is coupled to the upper end or upper edge of the lower part 80 to optimize the movement stability of the deformable in-feed assembly 85. In some embodiments, the spring-loaded attachment 90 may be coupled to the lower half of the lower part 80, in which case a sufficiently stable vibration-free movement of the deformable in-feed assembly 85 is achieved with other or additional structural solutions of the device 100.

[0094] When the deformable in-feed assembly 85 is raised in a retracted state, one or more substrates can be side-loaded into and / or side-removed from the reaction chamber 20. The in-feed assembly 85 is lowered to an extended state and sealed against the reaction chamber 20 for substrate processing.

[0095] As used herein, the terms "top", "bottom", or "horizontal", "vertical", "upper", and "lower" are used to describe orientations as shown in the figures, where the orientations are merely intended to indicate the location and movement of parts relative to one another. Because the device 100 may be oriented differently than shown in the figures, the above terms describing orientations may be adjusted accordingly.

[0096] Typically, the reaction chamber 20 and the in-feed assembly 85 are surrounded by the outer chamber 30, leaving an intermediate space 10 between them. In some embodiments, the outer chamber 30 surrounds the entire reaction chamber 20 and the in-feed assembly 85, while in some embodiments, only a portion of the reaction chamber 20 and / or the in-feed assembly 85 are surrounded by the outer chamber 30. The outer chamber 30 can be a vacuum chamber, but its pressure is still kept higher than the pressure in the reaction chamber 20 and the pressure in the in-feed assembly 85. This is to prevent leakage of chemicals into the intermediate space.

[0097] The apparatus 100 includes a resilient tube 150 coupled to the upper portion 70 of the deformable in-feed assembly 85. The upper end of the resilient tube 150 may be coupled to the inner surface of the outer chamber 30 or to another element of the apparatus whose position is fixed (e.g., a flange 153 coupled to the outer chamber 30). The resilient tube 150 defines a hollow channel therein. The lower end of the resilient tube 150 is coupled to the upper portion 70 of the deformable in-feed assembly 85. Reactant is supplied to a first end of the hollow inner channel of the resilient tube 150 and discharged from the other end, providing a flow of reactant to the upper portion 70. The resilient tube 150 is a resilient element configured to generate a mechanical force by pulling at least the upper portion 70 of the deformable in-feed assembly 85 toward itself.

[0098] A plasma source 160 is provided upstream of the elastic tube 150. The plasma source 160 includes a plasma generating section. In some embodiments, the plasma source 160 is directly connected to the elastic tube 150 upstream of the elastic tube 150. In some embodiments, the plasma source 160 is provided upstream of the elastic tube 150 but is not directly connected to the elastic tube 150, and the two are separate. A gas-phase chemical flows through the plasma source 160, and the chemical is activated to a plasma state. These chemical reactants, including excited species generated in the plasma source 160, flow downstream through the elastic tube 150 and through the longitudinally extended infeed assembly 85 to the reaction chamber 20. The reactants, including excited species, then flow to the substrate present in the space 60 of the reaction chamber 20, and generate a self-saturating surface reaction on the substrate surface.

[0099] The substrates being processed may be of any form or shape, but preferably each substrate is a flat substrate such as a wafer. In some embodiments, multiple substrates may be processed simultaneously within the volume 60 in the reaction chamber 20. One or more substrates may be placed on a substrate support within the volume 60. Although not shown, the substrate support passes through the reaction chamber outlet 50 at the bottom of the reaction chamber 20. Alternatively, the substrate support (not shown) may be tethered to or suspended from an inner surface of the in-feed assembly 85 (e.g., of the lower portion 80).

[0100] 3 and 4 show the structure of the elastic tube 150 and its surrounding components in more detail. A pretensioning mechanism 130 is provided around or around the periphery of the elastic tube 150. The pretensioning mechanism 130 prevents the elastic tube 150 from returning to an unstretched position, thereby forcing the elastic tube 150 to be continuously stretched and unrelaxed. The pretensioning mechanism 130 is thereby configured to pretension the elastic tube 150. The pretensioning mechanism 130 is configured to indirectly generate a mechanical force through the elastic tube 150 to at least the upper portion 70 of the deformable in-feed assembly 85. The pretensioned elastic tube 150 continuously pulls or retracts the upper portion 70 of the deformable in-feed assembly 85 towards the elastic tube 150 and / or in alignment with the vertical central axis of the lower portion 80, thereby adjusting and changing the position of the upper portion 70. The mechanical force generated by the elastic tube 150 and the pretensioning mechanism 130 stabilizes the movement of at least the upper portion 70 of the deformable in-feed assembly 85, thereby preventing the formation of unwanted particles from the components of the apparatus 100. The unwanted particles may be metallic or non-metallic particles. If the unwanted particles come into contact with the substrate(s), they may interfere with the processing of the substrate and significantly reduce the quality of the processed substrate(s).

[0101] The lower edge of the upper portion 70 and the upper edge of the lower portion 80 of the deformable infeed assembly 85 have horizontal collars 81, as shown in Figures 5-10. The horizontal collars 81 of the upper portion 70 and the lower portion 80 are configured to overlap one another when the deformable infeed assembly 85 is in a longitudinally extended state. When the pretensioned elastic tubing 150 pulls the upper portion 70 upward in the extended state of the infeed assembly 85, the upper portion 70 and the lower portion 80 are forced together to form a sealed joint. The elastic tubing 150 and the pretensioning mechanism 130 are thus configured to enable the formation of a leak-free infeed assembly 85 when the infeed assembly 85 is in a longitudinally extended state.

[0102] The pretensioning mechanism 130 is coupled to a fixedly positioned component of the device 100, preferably above the elastic tube 150. In some embodiments, the upper portion 133' of the pretensioning mechanism 130 is coupled to the outer chamber 30 or to a flange 153 coupled to the outer chamber 30. In some embodiments, the upper end of the elastic tube 150 is coupled to the same fixed component as the upper portion 133' of the pretensioning mechanism 130, e.g., the flange 153. The pretensioning mechanism 130 extends downwardly beyond the elastic tube 150. The lower portion 133 of the pretensioning mechanism 130 is located near or below the lower edge of the elastic tube 150. The upper portion 133' and the lower portion 133 of the pretensioning mechanism 130 are connected to each other by adjustable supports 132, 132'. The adjustable supports 132, 132' are configured to stabilize the structure of the pretensioning mechanism 130. The adjustable supports 132, 132' include adjustment members 131, 131', such as nuts and / or washers, that are configured to allow adjustment of the proximity of the upper portion 133' from the lower portion 133. In this way, the adjustable supports 132, 132' are configured to adjust the amount of pre-tension applied to the elastic tubing 150.

[0103] The lower portion 133 of the pretensioning mechanism 130 is disposed at a lower edge of or below the elastic tubing 150 such that the elastic tubing 150 and upper portion 70 can move and / or extend through the lower portion 133. The lower portion 133 has an opening 76 through which the elastic tubing 150 can move and / or extend vertically and / or horizontally and / or diagonally. In some embodiments, a portion of the upper portion 70 of the deformable in-feed assembly 85 is also configured to move vertically through the opening 76 in the lower portion 133 during vertical extension and / or contraction of the in-feed assembly 85.

[0104] The upper part 70 of the deformable in-feed assembly 85 includes a protrusion 71, such as a flange-like, ring-like, or cylindrical object, coupled to the outer periphery of the upper part 70 and configured to prevent the elastic tube 150 from returning to an equilibrium or unstretched state. In some other embodiments, the surface of the upper part 70 facing the intermediate space 10 has several protrusions 71, such as pins or plugs, symmetrically arranged around the outer periphery of the upper part 70. Thus, the term protrusion 71 can also mean a plurality of protrusions 71. The elastic tube 150 is placed in a pretensioned state, longitudinally stretched between the pretensioning mechanisms 130. The protrusion 71 is configured to be blocked by the lower surface of the lower part 133 of the pretensioning mechanism 130, thereby preventing the elastic tube 150 from returning to its unstretched state. The protrusion 71 is configured to be blocked by the lower portion 133 of the pretensioning mechanism 130 during longitudinal extension / contraction of the deformable in-feed assembly 85 and when the deformable in-feed assembly 85 is in a longitudinally contracted state as shown in FIG.

[0105] The protrusion 71 is configured to be blocked by the lower portion 133 of the pretensioning mechanism 130 even in the longitudinally extended state of the deformable in-feed assembly 85. The protrusion 71 is configured to disengage from the lower portion 133 of the pretensioning mechanism 130 when the longitudinally extended in-feed assembly 85 is further pulled down and the elastic tube 150 is further longitudinally extended so that the in-feed assembly 85 can be fitted into the reaction chamber 20. When the protrusion 71 disengages from the lower portion 133, the protrusion 71 moves further downward together with the upper portion 70, as shown in FIG. 3. The drive mechanism is configured to move the lower portion 80 of the in-feed assembly 85 when the deformable in-feed assembly 85 changes state, i.e., from a longitudinally extended state to a longitudinally contracted state (or vice versa). The movement of the lower portion 80 of the deformable in-feed assembly 85 also moves the upper portion 70, thereby disengaging the protrusion 71 from the pretensioning mechanism 130.

[0106] The size of the opening 76 is preferably adjusted to the diameter of the projection 71. In some embodiments, the opening 76 in the lower part 133, through which the elastic tube 150 and the upper part of the upper part 70 can move, is cut at an angle. That is, the edge 77 of the opening 76 is inclined towards the upper part of the device and is not perpendicular to the horizontal plane of the lower part 133 of the pretensioning mechanism 130. In some embodiments, the shape of the outer edge 72 of the projection 71 is also cut at an angle to the horizontal plane of the projection 71, so that the edge 72 fits said angled edge 77 of the opening 76. The angled shape of the edge 72 of the projection 71 and the edge 77 of the opening 76 prevents the projection 71 from penetrating upward from below the lower part 133 of the pretensioning mechanism 130. The angled shape of the edges 72 and 77 also allows the projection 71 to move smoothly upward relative to the lower part 133, preventing the formation of unwanted particles. Unwanted particle formation at the surface-to-surface contact between edge 72 of projection 71 and edge 77 of opening 76 is further prevented by appropriate selection of projection 71 and / or lower portion 133 material of pretensioning mechanism 130. In some embodiments, projection 71 is made of or coated with a material that has a low coefficient of friction and high temperature resistance. The mechanism that prevents projection 71 from punching through pretensioning mechanism 130 can be configured in any alternative manner in which unwanted particle formation is minimized.

[0107] The elastic tube 150 is stretched further when the in-feed assembly 85 contacts the reaction chamber 20 (see Figs. 7 and 10) than when the in-feed assembly 85 is longitudinally stretched but not in contact with the reaction chamber 20 (see Figs. 6 and 9). When the deformable in-feed assembly 85 contacts the reaction chamber 20, the protrusions 71 around the upper portion 70 of the deformable in-feed assembly 85 are pulled downwards, and the protrusions 71 are not pressed against the lower portion 133 of the pre-tensioning mechanism 130. When the deformable in-feed assembly 85 contacts the reaction chamber 20, the elastic tube 150 can be stretched further in the longitudinal direction, for example, 3-20 mm, than in other states of the in-feed assembly 85. And a gap of a corresponding length separates the protrusions 71 from the lower portion 133 of the pre-tensioning mechanism 130. As the drive mechanism begins to lift the lower portion 80 of the longitudinally extending in-feed assembly 85 together with the one or more shafts 120 and separates the lower portion 80 from the reaction chamber 20, the projection 71 moves upward with the upper portion 70 until it is eventually blocked by the lower portion 133 of the pretensioning mechanism 130. The elastic tube 150 is no longer able to return to its unstretched state, and thus the elastic tube 150 remains pretensioned. The elastic tube 150 is configured to continuously pull the upper portion 70 towards itself in an attempt to return to its unstretched state.

[0108] The drive mechanism including the movable shafts 120 is coupled to the lower portion 80 of the deformable in-feed assembly 85 with a spring-loaded attachment 90 as shown in FIGS. 1-2 and 5-10. The spring-loaded attachment 90 has an upper coupling piece 92 and a lower coupling piece 93 for coupling one or more shafts 120 to the lower portion 80 of the deformable in-feed assembly 85. Both the upper coupling piece 92 and the lower coupling piece 93 may be comprised of multiple pieces. For example, as shown in the exemplary embodiment of FIGS. 8-10, the spring-loaded attachment 90 may be comprised of two or more lower coupling pieces 93. In another exemplary embodiment, each movable shaft 120 is individually coupled to a dedicated upper coupling piece 92. Regardless of the design of the spring-loaded attachment 90, one or more movable shafts 120 are coupled to at least one upper coupling piece 92, and the lower portion 80 of the deformable in-feed assembly 85 is coupled to at least one lower coupling piece 93. In all possible embodiments, the upper connecting part 92 is adjustably and movably connected to the lower connecting part 93 .

[0109] The spring attachment 90 further comprises a resilient element 122 connecting the upper connecting element 92 and the lower connecting element 93. In some embodiments, the resilient element 122 is disposed between the upper connecting element 92 and the lower connecting element 93, as shown in Figs. 5-10, and in some embodiments, the resilient element 122 is disposed around the connector 91. Each resilient element 122 is resilient at least in a direction in which the one or more shafts 120 move the assembly 85. Each resilient element 122 is configured to store mechanical potential energy. Each resilient element 122, e.g., a spring, is configured to resist vertical, horizontal, and diagonal movement of the deformable in-feed assembly 85, thereby stabilizing the movement of the deformable in-feed assembly 85. Each resilient element 122 is configured to apply a pretension between the upper connecting element 92 and the lower connecting element 93.

[0110] In some embodiments, the upper coupling piece 92 and / or the lower coupling piece 93 are coupled to a connector 91, and each connector 91 is coupled to a resilient piece 122. The connector 91 is configured to support and stabilize the movement of the deformable in-feed assembly 85. In some embodiments, each connector 91 is movably and adjustably coupled only to the upper coupling piece 92. For example, each connector 91 has a fixed attachment point to the lower portion coupling piece 93, while the upper portion coupling piece 92 is movably disposed on an outer edge of the connector 91. The connector 91 can be shaped to form a fastener type structure, allowing the upper coupling piece 92 to move at least along a vertical plane of the connector 91 while preventing the upper coupling piece 92 from disengaging from the connector 91. The longitudinal movement of the upper coupling piece 92 along the vertical plane of the connector 91 is limited by one or more resilient pieces 122. The vertical position of the upper coupling piece 92 relative to the connector 91 depends on the vertical position of the deformable in-feed assembly 85. All of the connectors 91 are symmetrically positioned around the periphery of the deformable in-feed assembly 85 with respect to all of the moveable shafts 120 .

[0111] In some embodiments, each movable shaft 120 is coupled to at least two connectors 91 and / or at least two elastic components 122 via the upper portion coupling part 92. In some embodiments, the number of connectors 91 and / or elastic components 122 coupled to each movable shaft 120 is three or four. In some embodiments, one or more movable shafts 120 are connected to at least three, preferably four connectors 91 and / or at least three, preferably four elastic components 122 of the device via a single upper coupling part 92.

[0112] As shown in the alternative embodiment of Figures 5 and 8, when the deformable in-feed assembly 85 is in a longitudinally contracted state, the one or more movable shafts 120, the spring-loaded attachment 90, and the lower portion 80 are lifted to an upper position. When the lower portion 80 is lifted when the deformable in-feed assembly 85 is in a longitudinally contracted state, the upper portion 70 is at least partially nested inside the lower portion 80, creating a gap A between the lower end of the lower portion 80 and the reaction chamber 20. This gap A allows access to the interior space 60 of the reaction chamber 20, allowing substrates to be loaded into or removed from the reaction chamber 20. When the deformable in-feed assembly 85 is in a longitudinally contracted state, each elastic member 122 is pre-tensioned between the upper and lower coupling members 92 and 93. The parts of the apparatus shown in detail in the alternative embodiment of Figures 5 and 8 are representative of the embodiment shown in Figure 2.

[0113] The drive mechanism is configured to move the lower portion 80 towards the reaction chamber 20 with one or more movable shafts 120, bringing the deformable in-feed assembly 85 into a longitudinally extended state. During said movement towards the reaction chamber 20, the one or more movable shafts 120 are configured to push the upper coupling part 92, which in turn pushes the other part of the spring-loaded attachment 90 and the lower portion 80 towards the reaction chamber 20. The upper coupling part 92 is configured to press against the elastic part 122 during said movement, which is configured to resist compression, thereby stabilizing said movement. The upper coupling part 92 is configured to press against the elastic part 122, which is configured to resist pressure applied to the elastic part 122 with a constant force until the in-feed assembly 85 is in a longitudinally extended state.

[0114] In the longitudinally extended state of the deformable infeed assembly 85, the deformable infeed assembly 85 is fully extended. As shown in the alternative embodiment of Figures 6 and 9, the horizontal collars 81 of the rims of the upper and lower portions 70 and 80 overlap each other to form a sealed infeed assembly 85. A seal 75 between the upper and lower portions 70 and 80 seals the interface and prevents unwanted contact between the upper and lower portions 70 and 80. The seal 75 can be provided above the lower rim and / or horizontal collar of the upper portion 70 of the deformable infeed assembly 85. The seal 75 can also be provided below the upper rim and / or horizontal collar of the lower portion 80 of the deformable infeed assembly 85. In some embodiments, the seal 75 is an O-ring seal and can have a rounded profile or an angular contour. In any case, the seal 75 has a shape and configuration that does not encourage particle adhesion and can be kept clean. Seal 75 is made of a material that minimizes the generation of unwanted particles during operation of the device. Seal 75 can be a metallic seal or a non-metallic seal.

[0115] When the driving mechanism deforms the in-feed assembly 85 to the longitudinally extended state, a small gap B remains between the lower end of the lower portion 80 and the reaction chamber 20, as shown in FIG. 6 and FIG. 9. The gap B is closed by the driving mechanism pressing the lower portion 80 of the in-feed assembly 85 against the surface of the reaction chamber 20 prior to substrate processing. The gap B is also closed by the driving mechanism pressing the upper coupling part 92 toward the reaction chamber 20. By the driving mechanism pressing the upper coupling part 92 toward the reaction chamber 20, each elastic part 122 is compressed more than during deformation to the longitudinally extended state. This is shown in the alternative embodiment of FIG. 7 and FIG. 10. The compressed elastic part 122 resists the movement of the in-feed assembly 85 more strongly than during deformation to the longitudinally extended state. This further stabilizes the deformation movement of the deformable in-feed assembly 85 and prevents the formation of unwanted particles.

[0116] The longitudinal stretch of the elastic tube 15 towards the reaction chamber 20 also contributes to closing the gap B. The drive mechanism is configured to pull the protrusion 71 away from the lower portion 133 of the pretensioning mechanism 130 and move the protrusion 71 further downward together with the upper portion 70 as shown in FIG. 3 when the drive mechanism further presses the deformable in-feed assembly 85 towards the reaction chamber 20. Thus, the movement of the lower portion 80 of the deformable in-feed assembly 85 moves the upper portion 70 away from the pretensioning mechanism 130. The further longitudinal stretch of the elastic tube 150 as described above is configured to stabilize and / or prevent leakage of the deformable in-feed assembly 85. The device parts shown in detail in FIG. 3 and the alternative embodiment in FIG. 7 and FIG. 10 are representative of the embodiment shown in FIG. 1.

[0117] Thus, the width of gap B between the lower portion 80 of the deformable in-feed assembly 85 and the reaction chamber 20 is configured to approximately correspond to the length that the elastic tubing 150 must be further extended in the longitudinally extended position of the in-feed assembly 85 in order for the lower portion 80 of the in-feed assembly 85 to close against the reaction chamber 20. In some embodiments, the apparatus is configured to close gap B using the mechanism to compensate for relative movement between components of the apparatus 100 caused by thermal expansion or misalignment of the components of the apparatus.

[0118] FIG. 11 is a schematic cross-sectional view of the apparatus 100 according to another embodiment. In this example, the deformable in-feed assembly 85 is in a longitudinally stretched state and is configured to provide a flow of reactants to the reaction chamber 20. According to this embodiment, the upper part 70 of the deformable in-feed assembly 85 is a static component of the apparatus and is disposed at least partially inside the elastic tube 150. In the configuration of FIG. 11, the upper part 70 of the deformable in-feed assembly 85 is coupled between the lower part 80 of the deformable in-feed assembly 85 and a fixed element of the apparatus, such as the outer chamber 30. The top of the elastic tube 150 is coupled to the upper part 70 of the deformable in-feed assembly 85 and / or to a fixed element of the apparatus, such as the outer chamber 30, while the bottom of the elastic tube 150 is coupled to the lower part 80 of the deformable in-feed assembly 85. The top of the elastic tube 150 may be directly or indirectly coupled to the upper part 70. When the deformable in-feed assembly 85 is in a longitudinally extended state, the elastic tube 150 also extends longitudinally and surrounds the entire longitudinal length (or a majority) of the upper portion 70 of the deformable in-feed assembly 85. The elastic tube 150 is longitudinally extended so as to be able to lower the lower portion 80 of the deformable in-feed assembly 85 and seal against the edge of the opening of the reaction chamber 20. In such an embodiment, the elastic tube 150 must possess the required elasticity, travel length, and stiffness properties. In some embodiments, the material of the elastic tube 150 includes a fluorocarbon or fluoropolymer such as polytetrafluoroethylene (PTFE) and / or the elastic tube 150 is a PTFE bellows. The elastic tube 150 is also sufficiently stretched longitudinally so that the upper edge of the lower portion 80 can descend and seal against the lower edge of the upper portion 70, thereby providing a leak-free interface between the portions 70, 80 in the longitudinally extended state of the deformable infeed assembly 85.

[0119] The configuration of the device in Fig. 11 allows reactants to flow directly from the plasma source 160 into the upper part 70 of the deformable in-feed assembly 85, and from there into the lower part 80 of the deformable in-feed assembly 85, towards the reaction chamber 20. As a result, in such a configuration, the elastic tube 150 is not directly involved in the flow of reactants into the deformable in-feed assembly 85. Thus, the elastic tube 150 is in this case configured only to stabilize and adjust the position of the lower part 80 of the deformable in-feed assembly 85, while the upper part 70 is configured to be in a fixed position. Furthermore, the elastic tube 150 is configured to generate mechanical forces only on the lower part 80 of the deformable in-feed assembly 85, using the mechanical potential energy stored therein.

[0120] FIG. 12 shows another configuration of the device 100 presented in FIG. 11. In this configuration, the deformable in-feed assembly 85 is in a longitudinally contracted state. That is, the deformable in-feed assembly 85 is open, allowing the loading of a substrate. The device 100 according to the embodiment shown in FIGS. 11 and 12 is configured to lift the lower part 80 of the deformable in-feed assembly 85 with a drive mechanism attached thereto, thereby also contracting the elastic tube 150 to its contracted and / or unstretched state. The lower part 80 is configured to slide at least partially over the upper part 70 of the deformable in-feed assembly 85. In some embodiments, the device according to FIGS. 11 and 12 does not include a pretensioning mechanism 130 for the elastic tube 150. The simplified in-feed assembly structure shown in FIGS. 11 and 12 is beneficial because it can be composed of fewer parts, making it easier to install, and because the need for positional accuracy and angular adjustment of the upper part 70 is avoided. Additionally, the fixed position of the upper portion 70 improves the leak tightness of the entire deformable infeed assembly 85 .

[0121] Without limiting the scope and interpretation of the claimed invention, one or more technical effects of the exemplary embodiments disclosed herein are listed below. One technical effect is to prevent unwanted particle generation from parts of the device. A further technical effect is to stabilize the movement of the deformable in-feed assembly as it contracts and expands. A further technical effect is to stabilize the structure while the deformable in-feed assembly is substantially stationary. A further technical effect is to prevent leakage from a longitudinally stretched deformable in-feed assembly.

[0122] The above description provides a complete and informative description of the best mode currently contemplated by the inventors for carrying out the present invention, by way of non-limiting examples of specific implementations and embodiments of the present invention. However, as will be apparent to those skilled in the art, the details of the above-described embodiments do not limit the present invention, and may be implemented in other embodiments using equivalent means without departing from the characteristics of the present invention.

[0123] Moreover, features of the embodiments of the present invention disclosed above may be used without the corresponding use of other features. Accordingly, the foregoing description should be considered as merely illustrative of the principles of the present invention, and not in limitation thereof. The scope of the present invention is therefore limited only by the appended claims.

Claims

1. a reaction chamber for processing at least one substrate; a deformable in-feed assembly having upper and lower portions movable relative to one another and configured to deform between a vertically extended state that facilitates reactant flow to the reaction chamber and a vertically contracted state that allows a substrate to be loaded; a resilient tube coupled to the upper portion of the deformable infeed assembly; A substrate processing apparatus comprising:

2. The substrate processing apparatus of claim 1 , wherein the flexible tubing is configured to supply the reactant to the in-feed assembly.

3. The substrate processing apparatus of claim 1 , wherein the resilient tubing is coupled between the upper portion and a stationary element of the substrate processing apparatus.

4. The substrate processing apparatus of claim 1 , wherein the resilient tube is configured to generate a mechanical force on the in-feed assembly using mechanical potential energy stored therein.

5. The substrate processing apparatus of claim 1 , wherein the resilient tubing is configured to generate a mechanical force to stabilize and adjust the position of the upper portion.

6. The substrate processing apparatus of claim 1 , wherein the elastic tubing is configured to expand and contract under mechanical forces generated by the in-feed assembly.

7. 10. The substrate processing apparatus of claim 1, wherein the lower portion is sealed to the reaction chamber when the in-feed assembly is in a vertically extended position to provide the reactant flow to the reaction chamber.

8. The substrate processing apparatus of claim 1 , wherein the in-feed assembly has a sealed interface between the lower section and the upper section when in a longitudinally extended state.

9. The substrate processing apparatus of claim 1 , wherein the lower section and the upper section are configured to nest within each other when the in-feed assembly is in a longitudinally contracted state.

10. The substrate processing apparatus of claim 1 , further comprising a pretensioning mechanism that pretensions the elastic tube by preventing the elastic tube from returning to an unstretched state.

11. The substrate processing apparatus of claim 10 , wherein the pretensioning mechanism is configured to generate a mechanical force on the in-feed assembly via the elastic tube.

12. The substrate processing apparatus of claim 10 , wherein the elastic tube and the pretensioning mechanism are configured to generate a mechanical force to stabilize the in-feed assembly and prevent leakage.

13. 10. The substrate processing apparatus of claim 1, further comprising a drive mechanism attached to the lower portion, the drive mechanism configured to deform the in-feed assembly between a longitudinally extended state and a longitudinally retracted state.

14. The substrate processing apparatus of claim 13 , wherein the drive mechanism is attached to the lower portion by a spring-biased attachment.

15. The substrate processing apparatus of claim 14 , wherein the drive mechanism includes at least one movable shaft, the movable shaft coupled to the lower portion by a spring-biased attachment.

16. The substrate processing apparatus of claim 1 , wherein the resilient tubing is coupled between the lower portion and a stationary element of the substrate processing apparatus.

17. The substrate processing apparatus of claim 16 , wherein the fixed element is the upper portion.

18. Providing a reaction chamber for processing at least one substrate and a deformable in-feed assembly having upper and lower portions movable relative to one another; deforming the in-feed assembly to a longitudinally contracted state to load a substrate into the reaction chamber; deforming the infeed assembly to a longitudinally elongated state; flowing a reactant through a flexible tubing coupled to the upper portion, and flowing the reactant from the flexible tubing through the infeed assembly and into the reaction chamber; A method comprising:

19. Providing a reaction chamber for processing at least one substrate and a deformable in-feed assembly having upper and lower portions movable relative to one another; deforming the in-feed assembly to a longitudinally contracted state to load a substrate into the reaction chamber; deforming the infeed assembly to a longitudinally elongated state; flowing a reactant through the upper portion nested within a flexible tubing, and flowing the reactant from the upper portion through the lower portion to the reaction chamber; A method comprising: