Radio frequency power generation device having plurality of output ports

Abstract

To provide a method and a device, for generating a radio frequency power (RF) adopted to be coupled to a multi-station integrated circuit manufacturing chamber.SOLUTION: An RF power generation device 205 comprises: an oscillator 210 for providing a period signal; an input port for receiving the signal from the oscillator; and one or a plurality of pre-amplifiers 232 to 238 having an output port for providing an amplification signal. The RF generation device may further comprise: an input port for receiving a signal from the one or plurality of pre-amplifiers; and one or a plurality of constant gain amplifiers having the output port constructed so as to couple the amplification signal to an electrode in order to generate plasma in an allocated station in a multi-station integrated circuit manufacturing chamber.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] Incorporation by Reference A PCT application is being filed contemporaneously herewith as a part of this application. Each application identified in that contemporaneously filed PCT application to which this application claims benefit or priority is hereby incorporated by reference in its entirety for all purposes. [Background technology]

[0002] The fabrication of integrated circuit devices may include the processing of semiconductor wafers in semiconductor processing chambers. Typical processes may include deposition, where semiconductor material may be deposited in a layer-by-layer manner, as well as the removal (e.g., etching) of material in specific areas of the semiconductor wafer. In commercial-scale manufacturing, each wafer contains multiple copies of the particular semiconductor device being manufactured, and multiple wafers may be utilized to obtain the required quantity of devices. Thus, commercial viability of semiconductor processing operations may depend, at least in part, on uniformity within a wafer and repeatability of process conditions from wafer to wafer. As a result, efforts are made to ensure that each portion of a given wafer, as well as each wafer processed in a semiconductor processing chamber, is subjected to the same processing conditions. Variations in processing conditions may result in undesirable variations in deposition and etch rates, which in turn may result in unacceptable variations in the overall manufacturing process. Such variations may degrade the performance of the circuits, which in turn may cause unacceptable variations in the performance of an upper system that utilizes, for example, the integrated circuit devices.

[0003] The background discussion provided herein is intended to provide a general overview of the contents of the present disclosure. Work by the currently named inventors within the scope of what is described in this background section, as well as aspects of the description that may not otherwise be considered prior art at the time of filing, are not admitted, expressly or impliedly, as prior art against the present disclosure. Summary of the Invention

[0004] Provided herein are methods and apparatus for generating radio frequency power suitable for coupling to a multi-station integrated circuit manufacturing chamber. One aspect includes an apparatus for generating radio frequency power suitable for coupling to a multi-station integrated circuit manufacturing chamber, the apparatus including: an oscillator configured to generate a periodic signal; a plurality of variable gain preamplifiers, each having an input port for receiving a signal from the oscillator and an output port for providing a signal of varying amplitude; a plurality of constant gain amplifiers, each having an input port for receiving a signal from one of the plurality of variable gain preamplifiers and an output port configured for coupling an amplified signal to an electrode to generate a plasma at an assigned station of the multi-station integrated circuit manufacturing chamber; and a plurality of sensors, each of the plurality of sensors coupled to a corresponding output port of the plurality of constant gain amplifiers.

[0005] In some embodiments, the periodic signal generated by the oscillator includes a frequency between 300.0 kHz and 100.0 MHz.

[0006] In some embodiments, the periodic signal generated by the oscillator comprises a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, or 100.0 MHz.

[0007] In any of the above aspects, an output port of each of the plurality of sensors may be coupled to an input port of a control module, and an output signal from the control module may be coupled to the input port to adjust the gain of a corresponding one of the plurality of variable gain preamplifiers.

[0008] In any of the above aspects, one or more of the plurality of sensors may be configured to detect out-of-range parameters selected from the group consisting of power transmitted to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, power reflected from the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, current coupled to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, and voltage applied to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold.

[0009] In any of the above aspects, the control module may implement circuitry for providing the output signal within 10.0 ns of receiving a signal from one of the plurality of sensors.

[0010] In any of the above embodiments, each of the plurality of constant gain amplifiers may provide an output power of at least about 1000W.

[0011] Another aspect includes an apparatus for generating radio frequency power for coupling to a multi-station integrated circuit manufacturing chamber, the apparatus including: an oscillator configured to generate a periodic signal; a preamplifier having an input port for receiving a signal from the oscillator and an output port for providing a signal having a constant gain for the received signal; a plurality of variable gain amplifiers, each having an input port for receiving a signal from the preamplifier and an output port configured for coupling the amplified signal to an electrode to generate a plasma at an assigned station of the multi-station integrated circuit manufacturing chamber; and a plurality of sensors, each of the plurality of sensors providing a control signal to vary an output power of a corresponding one of the plurality of variable gain amplifiers.

[0012] In any of the above aspects, the periodic signal generated by the oscillator may include a frequency between 300.0 kHz and 100.0 MHz.

[0013] In any of the above embodiments, the periodic signal generated by the oscillator may include a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

[0014] In any of the above embodiments, each of the plurality of variable gain amplifiers may be capable of providing an output power of at least about 1000.0 W.

[0015] In any of the above aspects, the apparatus may further include a control module having circuitry for providing the control signal within 10.0 ns of receiving a signal from one of the plurality of sensors.

[0016] Another aspect includes a multi-station integrated circuit manufacturing chamber including a plurality of stations; and a plurality of radio frequency power generators configured to couple radio frequency power to assigned stations of the multi-station integrated circuit manufacturing chamber, each radio frequency power generator including a variable gain preamplifier having an input port for receiving a signal from an oscillator and an output port for providing a signal of varying power amplitude; a constant gain amplifier having an input port for receiving a signal from the variable gain preamplifier and an output port configured to couple power to the assigned station, the power coupled to the assigned station being supplied to an electrode to generate a plasma at the assigned station of the multi-station integrated circuit manufacturing chamber; and a sensor coupled to a corresponding output port of the constant gain amplifier.

[0017] In any of the above embodiments, the oscillator may generate a periodic signal having a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

[0018] In any of the above embodiments, the constant gain amplifier may be capable of providing an output power of at least about 1000.0 W.

[0019] In any of the above aspects, each of the plurality of radio frequency power generators may be coupled to a sensor configured to detect an out-of-range parameter of the power coupled to the assigned station, the out-of-range parameter corresponding to one of the group consisting of an output voltage amplitude, an output current amplitude, an amplitude of power transmitted to the assigned station, and an amplitude of power reflected from the assigned station.

[0020] In any of the above aspects, the sensor may be configured to detect the out-of-range parameter and communicate a signal to the variable gain preamplifier within about 10.0 ns of detecting the out-of-range parameter.

[0021] Another aspect includes a control module including one or more input ports for acquiring a signal from a radio frequency power sensor, the signal indicating detection of an out-of-range parameter in an output signal from a radio frequency power generator, one or more output ports for providing a signal to an amplifier stage of the radio frequency power generator, the signal to the amplifier stage configured to alter a parameter of the output signal from the radio frequency power generator, and a processor for commencing generation of the signal from the one or more output ports within about 10 ns of acquiring the signal from the radio frequency power sensor.

[0022] In any of the above embodiments, the radio frequency power generator may operate at a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

[0023] In any of the above aspects, the out-of-range parameter of the output signal from the radio frequency power generator may include a phase angle between a voltage waveform and a current waveform.

[0024] In any of the above aspects, the out-of-range parameters may include power supplied from the radio frequency power generator.

[0025] In any of the above embodiments, the radio frequency power generator may provide approximately 1.0 kW of power.

[0026] Another aspect includes a method of generating radio frequency power suitable for coupling to an assigned station of a multi-station integrated circuit manufacturing chamber, the method including generating a periodic signal, coupling the periodic signal to a plurality of variable gain preamplifiers, coupling an output signal from each of the plurality of variable gain preamplifiers to a corresponding one of a plurality of constant gain amplifiers, and coupling an output signal from each of the plurality of constant gain amplifiers to the assigned station of the multi-station integrated circuit manufacturing chamber.

[0027] In any of the above aspects, the method may further include sensing an out-of-range parameter in an output signal from one of the plurality of constant gain amplifiers, and modifying an amplitude of the output signal from a variable gain preamplifier among the variable gain preamplifiers in response to sensing the out-of-range parameter.

[0028] In any of the above aspects, the out-of-range parameter may correspond to power reflected from the assigned station of the multi-station integrated circuit manufacturing chamber.

[0029] In any of the above aspects, the out-of-range parameter may correspond to a current conducted to the assigned station of the multi-station integrated circuit manufacturing chamber.

[0030] In any of the above aspects, the out-of-range parameter may correspond to a voltage applied to the assigned station of the multi-station integrated circuit manufacturing chamber.

[0031] In any of the above aspects, the amplitude of the output signal from the variable gain preamplifier may be changed within 10.0 ns of sensing the out-of-range parameter.

[0032] In any of the above embodiments, generating the periodic signal may include generating a signal having a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz. [Brief description of the drawings]

[0033] [Figure 1A] FIG. 1A illustrates a substrate processing apparatus for depositing films on or over a semiconductor substrate using any number of processes, according to various embodiments.

[0034] [Figure 1B] FIG. 1B shows a schematic diagram of one embodiment of a multi-station processing tool.

[0035] [Diagram 2] FIG. 2 is a schematic diagram of a radio frequency (RF) power generator having multiple output ports, according to one embodiment.

[0036] [Diagram 3] FIG. 3 is a schematic diagram of an RF power generator having multiple output ports, according to one embodiment.

[0037] [Figure 4] FIG. 4 is a schematic diagram of a control module suitable for use in an RF generator having multiple output ports, according to one embodiment.

[0038] [Diagram 5] FIG. 5 is a flow chart of a method for generating radio frequency power suitable for coupling to assigned stations of a multi-station integrated circuit manufacturing chamber, according to one embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0039] In certain embodiments, a radio frequency (RF) power generator having multiple output ports may be utilized in various semiconductor manufacturing processes, such as plasma-based wafer fabrication. For example, in a multi-station integrated circuit manufacturing chamber, which may include individual process stations for performing deposition and / or etching processes, a particular output port may be assigned to or otherwise configured to operate with a corresponding station of the multi-station manufacturing chamber. Thus, for example, if a deposition rate in a particular station of the multi-station manufacturing chamber exhibits an increase or decrease in deposition rate compared to other stations of the multi-station manufacturing chamber, RF power parameters may be adjusted at the particular station. Such adjustments may result in a correction or equalization of the deposition rate compared to the deposition rates of other chambers to result in more uniform deposition across all process stations of the multi-station manufacturing chamber. In some cases, such independent control over the RF power coupled to the individually assigned stations of the multi-station manufacturing chamber may enable one or more stations to continue performing a manufacturing process while other stations are completing manufacturing operations. This may enable maximization of the yield of all wafers and / or devices manufactured through the multi-station manufacturing chamber.

[0040] Certain embodiments may represent improvements over other devices of an RF power generator coupled to a multi-station integrated circuit manufacturing chamber. For example, in some embodiments, the RF power generator may utilize two or more signal amplifiers coupled to a power combiner. The output power from the RF power combiner, which may be coupled to the multi-station manufacturing chamber through a single output port, may be coupled to an RF power splitter to allow coupling of the divided RF power to an input port of the manufacturing chamber. As a result of the combining and subsequent splitting of the RF power, the stations of the multi-station manufacturing chamber may all be controlled as a single component, which may include substantially identical RF power levels being supplied to each station. In addition to providing substantially identical RF power levels to all stations of the multi-station manufacturing chamber, such combining and splitting of RF power may allow all stations of the multi-station chamber to be equally exposed to any anomalies in the RF power generated by the RF power generator. Thus, anomalies such as over-voltage and / or over-current conditions, as well as variations in the RF power supplied by the power combiner that may adversely affect the manufacturing process, may be similarly coupled to all stations of the manufacturing chamber. The coupling of such abnormal voltages, currents, and total power to all stations of a multi-station integrated circuit manufacturing chamber can not only reduce wafer yield, but also result in unpredictable results in the manufactured circuit elements.

[0041] Certain embodiments and implementations may be utilized in several wafer fabrication processes, such as various plasma-enhanced atomic layer deposition (ALD) processes (e.g., ALD1, ALD2), various plasma-enhanced chemical vapor deposition (e.g., CVD1, CVD2, CVD3) processes, or may be utilized on-the-fly during a single deposition process. In certain embodiments, the RF power generator with multiple output ports may be utilized at any signal frequency, such as a frequency between 300.0 kHz and 60.0 MHz, which may include frequencies of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, and 27.12 MHz. However, in other embodiments, the RF power generator with multiple output ports may operate at any signal frequency, which may include, without substantial limitation, relatively low frequencies, such as between 50.0 kHz and 300.0 kHz, as well as higher signal frequencies, such as frequencies between 60.0 MHz and 100.0 MHz.

[0042] It should be noted that while certain embodiments described herein may show and / or describe an RF power generator having multiple output ports, where the output ports may be assigned to one of four process stations of a four-station integrated circuit manufacturing chamber, the claimed subject matter may include a multi-station integrated circuit manufacturing chamber with any number of process stations. Thus, in embodiments, individual output ports of an RF power generator having multiple output ports may be assigned to a process station of a multi-station manufacturing chamber having, for example, two process stations or three process stations. In other embodiments, individual output ports of an RF power generator having multiple output ports may be assigned to a process station of a multi-station integrated circuit manufacturing chamber having a greater number of process stations, such as five process stations, six process stations, eight process stations, ten process stations, or any other number of process stations, virtually without limitation.

[0043] The manufacture of semiconductor devices generally requires the deposition of one or more thin films on or over planar or non-planar substrates in an integrated manufacturing process. In some aspects of the integrated process, it may be useful to deposit a thin film that conforms to a unique substrate topography. One type of reaction useful in such cases includes chemical vapor deposition (CVD). In a typical CVD process, gas-phase reactants introduced into a station of a reaction chamber undergo a gas-phase reaction simultaneously. The products of the gas-phase reaction are deposited on the surface of the substrate. This type of reaction may be promoted or enhanced by the presence of a plasma, in which case the process may be referred to as a plasma-enhanced chemical vapor deposition (PECVD) reaction. As used herein, the term CVD is intended to include PECVD unless otherwise indicated. CVD processes have certain disadvantages that make them less suitable in some contexts. For example, mass transport limitations of CVD gas-phase reactions may result in a deposition effect that exhibits thicker deposition on top surfaces (e.g., top surfaces of a gate stack) and thinner deposition on recessed surfaces (e.g., bottom corners of a gate stack). Furthermore, for some semiconductor dies having regions of different device densities, mass transfer effects across the substrate surface can result in intra-die and intra-wafer thickness variations. Thus, during a subsequent etching process, thickness variations can result in some regions being over-etched and other regions being under-etched, which can reduce device performance and die yield. Another difficulty with CVD processes is the inability of such processes to deposit conformal films on nearly high aspect ratio features. This problem can become increasingly problematic as device dimensions shrink. These and other disadvantages of certain aspects of wafer fabrication processes are described in conjunction with FIGS. 1A and 1B.

[0044] In another example, some deposition processes include multiple film deposition cycles, each producing a distinct film thickness. For example, in atomic layer deposition (ALD), the thickness of the deposited layer may be limited by the amount of one or more film precursor reactants that may adsorb onto the substrate surface to form an adsorption-limiting layer prior to the film-forming chemical reaction itself. Thus, ALD features require the formation of thin film layers (such as layers having the width of a single atom or molecule) that are used repeatedly and sequentially. As device and feature sizes continue to scale and three-dimensional devices and structures become more common in integrated circuit (IC) design, the ability to deposit thin conformal films (e.g., films of material having uniform thickness relative to the shape of the underlying structure) continues to gain importance. Thus, ALD may be well suited for the deposition of conformal films, given that it is a film formation technique in which each deposition cycle operates to deposit a single atomic or molecular layer of material. A typical device fabrication process requiring ALD includes multiple ALD cycles, which may amount to hundreds or thousands, and multiple ALD cycles may then be utilized to form films of virtually any desired thickness. Moreover, given that each layer is thin and conformal, the films resulting from such processes may conform to the shape of the underlying device structure. In certain embodiments, an ALD cycle may include the following steps:

[0045] Exposing a substrate surface to a first precursor.

[0046] Cleaning the reaction chamber in which the substrate is located.

[0047] Activating a reaction at the substrate surface, typically using a plasma and / or a second precursor.

[0048] Cleaning the reaction chamber in which the substrate is located.

[0049] The duration of each ALD cycle may generally be less than 25.0 seconds, or less than 10.0 seconds, or less than 5.0 seconds. The plasma exposure step (or steps) of an ALD cycle may be of short duration, such as 1.0 second or less in duration.

[0050] Turning now to the figures, FIG. 1A illustrates a substrate processing apparatus 100 for depositing a film on a semiconductor substrate using any number of processes, according to various embodiments. The processing apparatus 100 of FIG. 1A utilizes a single process station 102 of a process chamber with a single substrate holder 108 (e.g., pedestal) within an internal volume, which may be maintained under vacuum by a vacuum pump 118. A showerhead 106 and a gas supply system 101, which may be fluidly coupled to the process chamber, may enable the supply of, for example, film precursors, as well as carrier gases and / or purge gases and / or process gases, secondary reactants, etc. Equipment utilized to generate plasma in the process chamber is also illustrated in FIG. 1A. The apparatus illustrated generally in FIG. 1A may be particularly suitable for performing plasma enhanced CVD.

[0051] In FIG. 1A, the gas delivery system 101 includes a mixing vessel 104 for mixing and / or conditioning process gases for delivery to the showerhead 106. One or more mixing vessel inlet valves 120 may control the introduction of process gases to the mixing vessel 104. Certain reactants may be stored in liquid form prior to vaporization and delivery to the process station 102 of the subsequent process chamber. The embodiment of FIG. 1A includes a vaporization point 103 for vaporizing liquid reactants delivered to the mixing vessel 104. In some implementations, the vaporization point 103 may comprise a heated liquid injection module. In other implementations, the vaporization point 103 may comprise a heated vaporizer. In still other implementations, the vaporization point 103 may be removed from the process station. In some implementations, a liquid flow controller (LFC) upstream of the vaporization point 103 may be provided to control the mass flow rate of liquid for vaporization and delivery to the process station 102.

[0052] The showerhead 106 may operate to distribute process gases and / or reactants (e.g., film precursors) toward the substrate 112 at the process stations, the flow of which is controlled by one or more valves (e.g., valves 120, 120A, 105) upstream from the showerhead. In the embodiment shown in FIG. 1A, the substrate 112 is shown positioned below the showerhead 106 and resting on a pedestal 108. The showerhead 106 may have any suitable shape and may include any suitable number and arrangement of ports for distributing process gases to the substrate 112. In some embodiments with two or more stations, the gas delivery system 101 includes valves or other flow control structures upstream from the showerhead that can independently control the flow of process gases and / or reactants to each station to isolate the gas flow and allow gas flow to a first station while preventing gas flow to a second station. Additionally, the gas supply system 101 may be configured to independently control the process gases and / or reactants supplied to each station in a multi-station apparatus such that the gas compositions supplied to different stations are different, e.g., the partial pressures of the gas compositions may be varied between stations simultaneously.

[0053] In FIG. 1A, the volume 107 is shown to be located below the showerhead 106. In some implementations, the pedestal 108 may be raised or lowered to expose the substrate 112 to the volume 107 and / or to change the size of the volume 107. Optionally, the pedestal 108 may be lowered and / or raised during a portion of the deposition process to adjust the process pressure, reactant concentration, etc. within the volume 107. The showerhead 106 and pedestal 108 are shown to be electrically coupled to a radio frequency power source 114 and a matching network 116 to provide power to the plasma generator. Thus, the showerhead 106 may function as an electrode for coupling radio frequency power to the process station 102. In some implementations, the plasma energy is controlled (e.g., via a system controller having appropriate machine-readable instructions and / or control logic) by controlling the pressure, gas concentration, RF power generator, etc. of one or more process stations. For example, the radio frequency power source 114 and matching network 116 may be operated at any suitable RF power level and may operate to form a plasma having a desired composition of radical species. Similarly, the RF power source 114 may provide RF power at any suitable frequency or group of frequencies and power level.

[0054] In some implementations, plasma ignition and maintenance conditions are controlled with suitable hardware and / or suitable machine-readable instructions in a system controller capable of providing control instructions via a sequence of input / output control (IOC) instructions. In one example, instructions to effect ignition or maintenance of plasma are provided in the form of a plasma activation recipe of a process recipe. In some cases, the process recipe may be sequentially arranged such that at least some instructions for the processes may be executed simultaneously. In some implementations, instructions for setting one or more plasma parameters may be included in a recipe preceding the plasma ignition process. For example, a first recipe may include instructions for setting a flow rate of an inert gas (e.g., helium) and / or a reactive gas, instructions for setting a plasma generator to a power set point, and a time delay instruction for the first recipe. A second, subsequent recipe may include instructions for enabling the plasma generator and a time delay instruction for the second recipe. A third recipe may include instructions for disabling the plasma generator and a time delay instruction for the third recipe. It will be understood that these recipes may be further subdivided and / or repeated in any suitable manner within the scope of the present disclosure. In some deposition processes, the duration of the plasma strike may correspond to a duration of several seconds, such as from 3.0 to 15.0 seconds, or may require a longer duration, for example, up to 30.0 seconds duration. In certain implementations described herein, much shorter plasma strikes may be applied during a processing cycle. The duration of such plasma strikes may be on the order of less than 50.0 milliseconds, with a particular example utilizing a plasma strike of 25.0 milliseconds.

[0055] For simplicity, processing apparatus 100 is shown in FIG. 1A as a stand-alone station (102) of a process chamber for maintaining a low pressure environment. However, it should be understood that multiple processing stations may be included in a multi-station processing tool environment, as shown in FIG. 1B, which shows a schematic diagram of one embodiment of a multi-station processing tool. Processing tool 150 employs an integrated circuit fabrication chamber 165 that includes multiple fabrication process stations, each of which may be used to perform a processing operation on a substrate held on a wafer holder, such as pedestal 108 in FIG. 1A, at a particular process station. In the embodiment of FIG. 1B, integrated circuit fabrication chamber 165 is shown having four process stations 151, 152, 153, and 154. Other similar multi-station processing apparatus may have more or fewer process stations depending on the implementation and, for example, the desired level of parallel wafer processing, size / space constraints, cost constraints, etc. Also shown in FIG. 1B is a substrate handler robot 175, which may operate under the control of system controller 190 and is configured to move a substrate from a wafer cassette (not shown in FIG. 1B) from load port 180 into integrated circuit manufacturing chamber 165 and onto one of process stations 151, 152, 153, and 154.

[0056] FIG. 1B also illustrates one embodiment of a system controller 190 employed to control process conditions and hardware states of the process tool 150. The system controller 190 may include one or more storage devices, one or more mass storage devices, and one or more processors. The one or more processors may include a central processing unit, analog and / or digital input / output connections, stepper motor controller boards, etc. In some embodiments, the system controller 190 controls all operations of the process tool 150. The system controller 190 executes system control software stored in the mass storage device, which may be loaded into the storage device and executed by the processor of the system controller. The software executed by the processor of the system controller 190 may include instructions for controlling the timing, mixture of gases, pressure of the fabrication chambers and / or stations, temperature of the fabrication chambers and / or stations, temperature of the wafer, position of the substrate pedestal, chuck and / or susceptor, number of cycles performed on one or more substrates, and other parameters of the particular process performed by the process tool 150. These programmed processes may include various types of processes, including, but not limited to, processes for determining the amount of build-up on surfaces inside the chamber, processes for depositing a film on a substrate including cycle number, processes for determining and obtaining a compensated cycle number, and processes for cleaning the chamber. System control software, which may be executed by one or more processors of the system controller 190, may be configured in any suitable manner. For example, various process tool component subroutines or control objects may be written to control the operation of process tool components necessary to perform various tool processes.

[0057] In some embodiments, the software for execution via the processor of the system controller 190 may include input / output control (IOC) sequence instructions for controlling the various parameters described above. For example, each phase of a substrate deposition and deposition cycle may include one or more instructions for execution by the system controller 190. Instructions for setting process conditions for an ALD / CFD deposition process phase may be included in a corresponding ALD / CFD deposition recipe phase. In some implementations, the recipe phases may be arranged in sequence such that all instructions for a process phase are executed simultaneously with that process phase.

[0058] Other computer software and / or programs stored on the mass storage device of the system controller 190 and / or on storage accessible to the system controller 190 may be employed in some embodiments. Examples of programs or sections of programs for this purpose include a substrate positioning program, a process gas control program, a pressure control program, a heater control program, and a plasma control program. The substrate positioning program may include program code for process tool components used to load the substrate onto the pedestal 108 (of FIG. 1A) and to control the spacing between the substrate and other parts of the process tool 150. The positioning program may include instructions for appropriately moving the substrate in and out of the reaction chamber as needed to deposit a film on the substrate and to clean the chamber.

[0059] The process gas control program may include code for controlling gas composition and flow rates, and optionally code for flowing gas to one or more process stations prior to deposition to stabilize pressure in the process station. In some embodiments, the process gas control program includes instructions for introducing gas during formation of a film on a substrate in a reaction chamber. This may include introducing gas at different cycles for one or more substrates in a batch of substrates. The pressure control program may include code for controlling pressure in the process station, for example, by adjusting a throttle valve in an exhaust system of the process station, gas flow into the process station, etc. The pressure control program may include instructions for maintaining the same pressure during different cycles of deposition on one or more substrates during processing of a batch.

[0060] The heater control program may include code for controlling the current to the heating unit 110 used to heat the substrate. Alternatively, the heater control program may control the supply of a heat carrier gas (such as helium) to the substrate.

[0061] In some embodiments, there may be a user interface associated with the system controller 190. The user interface may include a display screen, a graphical software representation of equipment and / or process conditions, and user input devices such as a pointing device, keyboard, touch screen, microphone, etc.

[0062] In some embodiments, the parameters adjusted by the system controller 190 may relate to process conditions. Non-limiting examples include process gas composition and flow rates, temperature, pressure, plasma conditions, etc. These parameters may be provided to a user in the form of a recipe, which may be entered utilizing a user interface. A recipe for an entire batch of substrates may include a compensated cycle count for one or more substrates in the batch to account for thickness trends while processing the batch.

[0063] Signals for monitoring the process may be provided by analog and / or digital input connections of the system controller 190 from various process tool sensors. Signals for controlling the process may be output through analog and / or digital output connections of the process tool 150. Non-limiting examples of process tool sensors that can be monitored include mass flow controllers, pressure sensors (such as manometers), thermocouples, and the like. Sensors may also be included and used to monitor and determine build-up on one or more surfaces inside the chamber and / or the thickness of a material layer on a substrate within the chamber. Appropriately programmed feedback and control algorithms may use data from these sensors to maintain process conditions.

[0064] The system controller 190 may provide program instructions for implementing the deposition processes described above. The program instructions may control various process parameters such as DC power levels, pressure, temperature, number of cycles for the substrate, amount of build-up on at least one surface inside the chamber, etc. The instructions may control the parameters to operate in situ deposition of a film stack according to various embodiments described herein.

[0065] For example, the system controller may include control logic for performing the techniques described herein, such as determining an amount of deposition material currently accumulated on at least an internal region within the deposition chamber, applying the amount of accumulated deposition material determined in (a), or a parameter derived therefrom, to a relationship between (i) the number of ALD cycles required to achieve a target deposition thickness and (ii) a variable representative of the amount of accumulated deposition material, and performing a compensated number of ALD cycles on one or more substrates in the batch of substrates to obtain a compensated number of ALD cycles to produce a target deposition thickness that accounts for the amount of deposition material currently accumulated on the internal region within the deposition chamber. The system may also include control logic for determining that accumulation in the chamber has reached an accumulation limit and, in response to the determination, for stopping processing of the batch of substrates and cleaning the chamber interior.

[0066] In addition to the above-identified functions and / or operations performed by system controller 190 of FIG. 1B , the controller may further control and / or manage the operation of RF power generator 205, which may communicate RF power to integrated circuit fabrication chamber 165 via radio frequency input ports 166, 167, 168, and 169. As described further herein, such operations may relate to, for example, determining upper and lower thresholds for RF power supplied to integrated circuit fabrication chamber 165, determining the actual (e.g., real-time) level of RF power supplied to integrated circuit fabrication chamber 165, RF power activation / deactivation times, RF power on / off durations, operating frequency, and the like. Additionally, system controller 190 may determine a set of normal operating parameters for the RF power supplied to integrated circuit fabrication chamber 165 via input ports 166, 167, 168, and 169. Such parameters may include, for example, a reflection coefficient (e.g., a scattering parameter “S 11The thresholds may include upper and lower thresholds for power reflected from one or more of the input ports 166-169 with respect to the input port 166-169 ("out of range"); upper and lower thresholds for voltage applied to one or more of the input ports 166-169; upper and lower thresholds for current conducted through one or more of the input ports 166-169; and an upper threshold for the magnitude of the phase angle between the voltage and the current conducted through one or more of the input ports 166-169. Such thresholds may be utilized in defining an "out of range" RF power parameter. For example, a reflected power greater than an upper threshold may refer to an out of range RF power parameter. Similarly, an applied voltage or conducted current having a value lower than a lower threshold or greater than an upper threshold may refer to an out of range RF power parameter. Similarly, a phase angle between an applied voltage and conducted current greater than an upper threshold may refer to an out of range RF power parameter. Additionally, the system controller 190 may provide settings for the control module of the RF power generator 205, which may include a control system response time of 10.0 ns, 15.0 ns, 20.0 ns, etc.

[0067] In certain embodiments, integrated circuit fabrication chamber 165 may include input ports in addition to input ports 166-169 (additional input ports not shown in FIG. 1B). Thus, integrated circuit fabrication chamber 165 may utilize eight RF input ports. In certain embodiments, process stations 151-154 of integrated circuit fabrication chamber 165 may each utilize a first and second input port, where the first input port may transmit a signal having a first frequency and the second input port may transmit a signal having a second frequency. The use of dual frequencies may result in enhanced plasma characteristics, which may result in deposition rates within certain limits and / or more easily controlled deposition rates. Dual frequencies may result in other desirable results, and claimed subject matter is not limited in this respect. In certain embodiments, frequencies between 300.0 kHz and 65.0 MHz may be utilized. In some implementations, signal frequencies of 2.0 MHz or less may be referred to as low frequency (LF), while frequencies greater than 2.0 MHz may be referred to as high frequency (HF).

[0068] Accordingly, system controller 190 may enable independent operation of various signal paths within RF power generator 205. Such independence between paths may enable independent control over RF power coupled to individually assigned stations of integrated circuit fabrication chamber 165. Thus, as previously described herein, if the deposition rate within a particular station of integrated circuit fabrication chamber 165 indicates an increase or decrease in deposition rate compared to other process stations of integrated circuit fabrication chamber 165, RF power parameters of the particular signal path within RF power generator 205 may be adjusted. Such adjustments may result in a correction or adjustment of the deposition rate compared to the deposition rates of the other chambers, which may result in a more consistent deposition rate across all process stations of integrated circuit fabrication chamber 165. Additionally, and as previously described, such independent control over RF power coupled via independent signal paths of RF power generator 205 may enable one or more stations of integrated circuit fabrication chamber 165 to continue executing a fabrication process while other stations are completing fabrication operations. This may enable maximization of yield of all wafers and / or all devices fabricated utilizing integrated circuit fabrication chamber 165.

[0069] FIG. 2 is a schematic diagram of an RF power generator having multiple output ports according to one embodiment 200. As described with reference to FIG. 1B, the RF power generator 205 may include independent signal paths, which may allow coupling to assigned stations of a multi-station manufacturing chamber. Thus, the RF power generator 205 includes four output ports for coupling to a corresponding number of input ports, such as input ports 166, 167, 168, and 169, of the multi-station integrated circuit manufacturing chamber 165. In certain implementations, the RF power generator 205 may be capable of generating RF power in the range of 1.0 to 10.0 kW, such as 5.0 kW, 6.0 kW, or 8.0 kW. However, in certain implementations, the RF power generator 205 may generate less than 1.0 kW, such as 500 W, 750 W, etc. In other implementations, the RF power generator 205 may generate power greater than 10.0 kW, such as 12.0 kW, 15.0 kW, 20.0 kW, etc. Additionally, although RF power generator 205 is shown as having four independent signal paths, in other embodiments the RF power generator may have between one and three independent signal paths, or may have more than four signal paths, such as five signal paths, six signal paths, etc.

[0070] Oscillator 210 of RF power generator 205 may provide a periodic signal, such as a signal having a substantially fixed frequency between 300.0 kHz and 100.0 MHz. However, in certain implementations, oscillator 210 may provide a periodic signal having a fixed frequency between (and including) 400.0 kHz and 100.0 MHz, such as fixed frequencies of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz. An output signal from oscillator 210 may be coupled to input ports of preamplifiers 232, 234, 236, and 238, each of which may operate to controllably increase the amplitude of the signal received from oscillator 210. In the embodiment of FIG. 2, a gain parameter of each of preamplifiers 232-238 may be controlled via a signal from control module 275, which may result in an output signal having a variable amplitude. In certain embodiments, each of the preamplifiers 232-238 may amplify the signal from the oscillator 210 by an amount between 0.0 dB and 20.0 dB. However, in other embodiments, the control module 275 may operate to provide different amounts of amplification by the preamplifiers 232-238, such as in amounts of 10.0 dB and 23.0 dB.

[0071] The signal from the output port of the preamplifier 232 is coupled to the input port of the power amplifier 242, which may represent a constant gain amplifier that, in the embodiment of FIG. 2, may apply a gain of, for example, 30.0 dB. Thus, in a particular implementation, a 1 watt signal from the preamplifier 232 may be amplified by the power amplifier 242 to provide a 1000 watt signal at the output port of the amplifier 242. In a similar manner, the power amplifier 244 may apply a similar gain (e.g., 30.0 dB) to the signal from the preamplifier 234. Similarly, the power amplifier 246 may apply a similar gain (e.g., 30.0 dB) to the signal from the preamplifier 236. Similarly, the power amplifier 248 may apply a similar gain (e.g., 30.0 dB) to the signal from the preamplifier 238. It should be noted that in other implementations, power amplifiers 242-248 may apply different values ​​of gain, such as a gain less than 30.0 dB, such as 25.0 dB, 20.0 dB, or may apply an amplification gain greater than 30.0 dB, such as 33.0 dB, 35.0 dB, or 40.0 dB, and claimed subject matter is not limited in this respect.

[0072] A signal from the output port of the power amplifier 242 may be coupled to a sensor 252, which may monitor or detect a parameter of the power supplied to the input port 166, which may correspond to an input port of a process station of the integrated circuit manufacturing chamber 165. Additionally, the sensor 252 may operate to measure the power reflected from the input port 166 of the integrated circuit manufacturing chamber 165. Thus, in response to measurable variations detected in the power transmitted to or reflected from the input port 166, the sensor 252 may provide a corresponding indication to the control module 275. The control module 275 may then instruct the preamplifier 232 to compensate for the detected variations in the output power generated and coupled to the input port of the power amplifier 242. Such compensation may assist in maintaining a constant power supplied to the input port 166.

[0073] In some implementations, the sensor 252 may measure additional parameters, such as the amplitude of the voltage of the output signal from the amplifier 242, the current conducted by the output signal from the amplifier 242, and the phase angle between the voltage and current of the output signal. Thus, in response to a variation in the voltage or current of the signal provided to the input port 166, or in response to a phase angle (θ) between the voltage (V) and current (I) of the output signal exceeding a threshold, which may indicate a drop in the effective power (VIcos(θ)) provided to the input port 166, the sensor 252 may provide an indication to the control module 275. The control module 275 may then instruct the preamplifier 232 to increase the output power coupled to the input port of the power amplifier 242, and the preamplifier 232 may operate to maintain a constant power provided to the input port 166. The sensors 254, 256, and 258 may operate in a manner similar to the sensor 252, by monitoring the output voltage, current, and phase of the signal from the corresponding power amplifiers 244, 246, and 248.

[0074] In certain implementations, the control module 275 may respond to input signals from the sensors 252-258 in a manner that allows for rapid adjustments in parameters of the output signals from the power amplifiers 242-248. Such rapid adjustments in parameters of the output signals from the power amplifiers 242-248 may ensure that out-of-range parameters of the signals coupled to the input ports 166-169 of the integrated circuit fabrication chamber 165 do not result in long-term anomalies in the process stations. Thus, for example, in response to the sensor 252 detecting a reduction in power coupled to or transmitted to the input port 166 of the integrated circuit fabrication chamber 165 that may momentarily reduce the deposition rate of an assigned process station of the chamber, the output signal power from the power amplifier 242 may be rapidly increased to minimize any effect of such reduction in deposition on wafer processing operations. In certain implementations, the control module 275 may respond to an out-of-range parameter detected in the output signal from one or more of the power amplifiers 242-248 within 10.0 ns, such as by changing a gain parameter of one or more of the preamplifiers 232-238. However, in other embodiments, the control module 275 may respond to an out-of-range parameter detected in the output signal from the power amplifier within a longer period of time, such as within 15.0 ns, 20.0 ns, or 25.0 ns.

[0075] 3 is a schematic diagram of an RF power generator having multiple output ports, according to one embodiment 300. In a similar manner to the RF power generator 205 described with reference to FIG. 2, the RF power generator 305 may include independent signal paths, which may enable coupling to an assigned station of, for example, the integrated circuit fabrication chamber 165. Thus, the RF power generator 305 includes four output ports for coupling to a corresponding number of input ports, such as input ports 166, 167, 168, and 169, of the integrated circuit fabrication chamber 165. In certain implementations, the RF power generator 305 may be capable of generating RF power in the range of 1.0 to 10.0 kW, such as 5.0 kW, 6.0 kW, or 8.0 kW. However, in certain implementations, the RF power generator 305 may generate less than 1.0 kW, such as 500 W, 750 W, etc. In other implementations, the RF power generator 305 may generate power greater than 10.0 kW, such as 12.0 kW, 15.0 kW, 20.0 kW, etc. Additionally, although RF power generator 305 is shown as having four independent signal paths, in other embodiments the RF power generator may have between one and three independent signal paths, or may have more than four signal paths, such as five signal paths, six signal paths, etc.

[0076] The oscillator 310 of the RF power generator 305 may provide a periodic signal, such as, for example, a signal having a substantially fixed frequency between 300.0 kHz and 100.0 MHz. However, in certain implementations, the oscillator 310 may provide a periodic signal having a fixed frequency between 400.0 kHz and 100.0 MHz, such as fixed frequencies of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz. The output signal from the oscillator 310 may be coupled to an input port of a preamplifier 320, which may operate to apply a constant gain to the signal received from the oscillator 310. In the embodiment of FIG. 3, the preamplifier 320 may amplify the signal from the oscillator 310 by an amount between 0.0 dB and 20.0 dB. However, in other embodiments, the control module 375 may operate to provide different amounts of amplification by the preamplifiers 232-238, such as in amounts of 10.0 dB and 23.0 dB.

[0077] The signal from the output port of preamplifier 320 may be split and coupled to input ports of power amplifiers 342, 344, 346, and 348, which may represent variable gain amplifiers that, in the embodiment of FIG. 3, are capable of applying gains of, for example, 20.0 dB and 40.0 dB. Thus, for example, a 1 watt signal from preamplifier 320 may be modified by each of power amplifiers 342, 344, 346, and 348 to provide a signal having a varying amplitude, such as an amplitude between 100.0 W and 10.0 kW, at the output port of the power amplifier. Note that in other implementations, power amplifiers 342-348 may apply different values ​​of gain, such as a gain less than 20.0 dB, such as 15.0 dB, 20.0 dB, or may apply an amplification gain greater than 40.0 dB, such as 43.0 dB or 45.0 dB, and claimed subject matter is not limited in this respect.

[0078] Output signals from power amplifiers 342-348 may be coupled to input ports of sensors 352, 354, 356, and 358, which may operate to monitor or detect parameters of the power provided to or reflected from input ports 166, 167, 168, and 169 of integrated circuit fabrication chamber 165. In the embodiment of FIG. 3, sensor 352 may measure the power coupled to (or transmitted to) input port 166 of integrated circuit fabrication chamber 165 as well as the power reflected from input port 166 of integrated circuit fabrication chamber 165. Thus, in response to a detected measurable variation in the power transmitted to input port 166, sensor 352 may provide a corresponding indication to control module 375. Control module 375 may then instruct power amplifiers 342, 344, 346, or 348 to compensate for the detected variation by adjusting the output power generated by the corresponding power amplifier. This may include changing the value of a reactive circuit component in the output stage of one or more of power amplifiers 342-348. Such compensation may act to maintain a constant power delivered to the input ports 166-169. Similar to the method described with reference to FIG. 2, the sensors 352-358 may further detect a phase angle (θ) between the voltage (V) and current (I) of the output signal that exceeds a threshold, which may indicate a reduction in the real power (VIcos(θ)) delivered to the input ports 166-169. In response to detecting a reduction in the real power delivered to the input ports 166-169, the control module 275 may adjust the output signal of one or more of the power amplifiers 342-348, which adjustment may assist in maintaining a constant power delivered to the input ports 166-169.

[0079] In certain implementations, the control module 375 may respond to input signals from the sensors 352-358 in a manner that allows for rapid adjustments in parameters of the output signals from the power amplifiers 342-348. Such rapid adjustments in parameters of the output signals from the power amplifiers 342-348 may ensure that out-of-range parameters of the signals coupled to the input ports 166-169 of the integrated circuit fabrication chamber 165 do not result in long-term anomalies in the process stations of the chamber. Thus, for example, in response to the sensor 352 detecting a reduction in power coupled to or transmitted to the input port 166 of the integrated circuit fabrication chamber 165 that may momentarily reduce the deposition rate of an assigned process station of the chamber, the output signal power from the power amplifier 342 may be rapidly increased to minimize any effect of such reduction in deposition on wafer processing operations. In certain implementations, the control module 375 may respond to an out-of-range parameter detected in the output signal from one or more of the power amplifiers 342-348 within 10.0 ns, such as by changing a gain parameter of one or more of the power amplifiers 342-348. However, in other embodiments, the control module 375 may respond to an out-of-range parameter detected in the output signal from the power amplifier within a longer period of time, such as within 15.0 ns, within 20.0 ns, within 25.0 ns, etc.

[0080] Figure 4 is a schematic diagram of a control module suitable for use in an RF generator having multiple output ports, according to one embodiment 400. The control module 405 may include many of the features of the control modules 275 or 375, as described with reference to Figures 2 and 3, respectively, and may operate to detect out-of-range parameters in an output signal from the RF power generator. In the embodiment of Figure 4, the control module 405 may include four sensor input ports 410, which may be suitable for obtaining input signals from a corresponding number of sensors to compare an output power parameter of an amplifier of the RF generator to a predetermined threshold. Thus, sensors 1, 2, 3, and 4 may correspond to sensors 252, 254, 256, and 258 (respectively) of Figure 2, or sensors 352, 354, 356, and 358 (respectively) of Figure 3. It should be noted, however, that control module 405 may be usable with a wide variety of other types of RF generators, and claimed subject matter is not limited to use of control module 405 with any particular RF generator. Additionally, in other implementations, control module 405 may include a fewer number of sensor input ports, such as three ports or less, or may include a greater number of sensor input ports, such as five ports, six ports, etc.

[0081] The signal from the sensor input port 410 may be connected or coupled to a voltage comparator 415, a current comparator 420, a reflected power comparator 425, and a forward power comparator 430. Thus, the voltage comparator 415, in cooperation with the processor / memory 435, may be capable of measuring both the amplitude and phase angle of the voltage signal and may provide an indication to the processor / memory 435 in response to a determination that the voltage of the RF generator output signal has exceeded an upper threshold or fallen below a lower threshold. Similarly, the current comparator 420, in cooperation with the processor / memory 435, may be capable of measuring both the amplitude and phase angle of the current conducted from the RF generator and may provide an indication to the processor / memory 435 in response to a determination that the RF generator output current has exceeded an upper threshold or fallen below a lower threshold. Additionally, both the voltage comparator 415 and the current comparator 420, in cooperation with the processor / memory 435, may provide an indication that the phase angle between the measured voltage and the measured current has exceeded a threshold. Additionally, the control module 405 may include a reflected power comparator 425 that may operate to determine whether a value of power reflected from an input port of the multi-station manufacturing chamber exceeds a threshold value. The control module 405 may further include a forward power comparator 430 that may operate to determine whether a value of power delivered or transmitted to an input port of the multi-station manufacturing chamber exceeds an upper threshold value or falls below a lower threshold value.

[0082] In response to detecting one or more out-of-range parameters in the output signal from the RF power generator, the processor / memory 435 may provide a signal to an amplifier stage of the RF power generator. The signal from the processor / memory 435 may be communicated through the output signal port 440 and may act to modify a parameter of the output signal from the RF power generator. In certain implementations, the processor / memory 435 may begin generating a signal from one or more of the output signal ports 440 within about 10.0 ns of obtaining a signal from any sensor input port 410. In certain implementations, the control module 405 may communicate the output signal to a preamplifier stage of the RF power generator, such as one or more of the preamplifiers 232, 234, 236, and 238 of FIG. 2. In certain other implementations, the control module may communicate the output signal to an amplifier stage of the RF power generator, such as one or more of the power amplifiers 342, 344, 346, and 348 of FIG. 3.

[0083] Figure 5 is a flow chart for a method 500 of generating radio frequency power suitable for coupling to assigned stations of a multi-station integrated circuit manufacturing chamber, according to one embodiment. In addition to the operations recited in method 500, embodiments of the claimed subject matter may include fewer operations than those recited in method 500, or operations performed in a different order than those recited in method 500. Furthermore, although the devices of Figures 1B, 2, and 3 may be suitable for performing the method of Figure 5, the claimed subject matter is intended to include utilizing alternative systems and / or devices to perform the method of Figure 5.

[0084] The method of FIG. 5 may begin at 510, where a periodic signal may be generated by a suitable frequency generator, such as oscillator 210 of FIG. 2 or oscillator 310 of FIG. 3. In certain embodiments, the frequency generator utilized at 510 may generate a signal having a frequency between 300.0 kHz and 100.0 MHz. In certain embodiments, the frequency generator used at 510 may generate frequencies of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz. The method of FIG. 5 may continue at 520, where 520 may include coupling the periodic signal to a plurality of variable gain preamplifiers. In certain embodiments, the plurality of variable gain preamplifiers may include four preamplifiers, such as preamplifiers 232, 234, 236, and 238. The method may continue at 530, which may include coupling the output signal from each of the plurality of variable gain preamplifiers to a corresponding one of the plurality of constant gain amplifiers. In a particular embodiment, four constant gain preamplifiers may be utilized.

[0085] At 540, the output signal from each of the plurality of constant gain amplifiers is coupled to an assigned station of the multi-station integrated circuit manufacturing chamber. Thus, in some embodiments, each station of the multi-station integrated circuit manufacturing chamber is provided with a supply of RF power from an assigned or dedicated signal path. Thus, in response to sensing one or more out-of-range parameters in the output signal from one of the plurality of constant gain amplifiers, the amplitude of the output signal from the variable gain preamplifier or the constant gain amplifier may be adjusted. Such adjustments may be made rapidly (e.g., within about 10.0 ns) to bring the one or more out-of-range parameters in the output signal within normal operating parameters.

[0086] Referring back to FIG. 1B, the system controller 190 may comprise a part of a system that may form part of the apparatus of FIG. 1A / 1B. Such a system may comprise semiconductor processing equipment, including one or more processing tools, one or more chambers, one or more platforms for processing, and / or specific processing components (wafer pedestal, gas flow systems, etc.). These systems may be integrated with electronics for controlling pre-, during, and post-processing operations of the semiconductor wafer or substrate. The electronics may be referred to as a "controller" and may control various components or subparts of the system or systems. The controller may be programmed to control any of the processes disclosed herein depending on the processing requirements and / or type of system. Such processes may include the number of cycles performed on the substrate, supply of process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow settings, fluid supply settings, position and motion settings, loading and unloading of wafers into and out of the tool, and other transport tools and / or load locks connected or interfaced with the particular system.

[0087] In a broad sense, a controller may be defined as an electronic device having various integrated circuits, logic, memory, and / or software that receive instructions, issue instructions, control operations, enable cleaning operations, enable endpoint measurements, etc. Integrated circuits may include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application specific integrated circuits (ASICs), and / or one or more microprocessors or microcontrollers that execute the program instructions (e.g., software). Program instructions may be instructions communicated to the controller in the form of various individual settings (or program files) that define operational parameters for performing a particular process on a semiconductor wafer or for a system. In some embodiments, the operational parameters may be part of a recipe defined by a process engineer to accomplish one or more processing steps during the manufacture of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or dies of a wafer.

[0088] In some implementations, the controller may be part of or coupled to a computer that is integral with, coupled to, or otherwise networked to the system, or a combination thereof. For example, the controller may be in the "cloud" or may be all or part of a fab host computer system, allowing remote access of wafer processing. The computer may allow remote access to the system to monitor the current progress of a manufacturing operation, examine the history of past manufacturing operations, examine trends or performance criteria from multiple manufacturing operations, modify parameters of a current process, set processing steps following a current process, or initiate a new process. In some examples, a remote computer (e.g., a server) may provide process recipes to the system over a network, which may include a local network or the Internet. The remote computer may include a user interface that allows entry or programming of parameters and / or settings, which are then communicated from the remote computer to the system. In some examples, the controller receives instructions in the form of data, which identifies parameters for each of the processing steps that are performed during one or more operations. It should be understood that the parameters may be specific to the type of process being performed and the type of tool with which the controller is configured to interface or control. Thus, as discussed above, the controller may be distributed, such as by having one or more individual controllers networked together and cooperating toward a common purpose, such as the processes and controls described herein. One example of a distributed controller for such purposes would include one or more integrated circuits on the chamber that are located remotely (such as at the platform level or as part of a remote computer) and communicate with one or more integrated circuits coupled to control the process on the chamber.

[0089] In the foregoing detailed description, numerous specific details are set forth in order to provide a thorough understanding of the presented embodiments or implementations. The disclosed embodiments or implementations may be practiced without some or all of these specific details. In other instances, well-known process operations have not been described in detail so as not to unnecessarily obscure the disclosed embodiments or implementations. While the disclosed embodiments or implementations are described in connection with specific embodiments or implementations, it will be understood that such description is not intended to limit the disclosed embodiments or implementations.

[0090] The foregoing detailed description has been directed to specific embodiments or implementations for the purpose of illustrating the disclosed aspects. However, the teachings herein may be applied and implemented in many different ways. In the foregoing detailed description, reference is made to the accompanying drawings. Although the disclosed embodiments or implementations have been described in sufficient detail to enable one skilled in the art to practice the embodiments or implementations, it should be understood that these examples are not limiting and that other embodiments or implementations may be used and changes may be made to the disclosed embodiments or implementations without departing from their spirit and scope. Furthermore, it should be understood that in this specification, the conjunction "or" is intended in an inclusive sense where appropriate, unless otherwise expressly stated, and for example, the expression "A, B, or C" is intended to include the possibilities of "A", "B", "C", "A and B", "B and C", "A and C", and "A, B, and C".

[0091] In this application, the terms "semiconductor wafer," "wafer," "substrate," "wafer substrate," and "partially fabricated integrated circuit" are used interchangeably. One of ordinary skill in the art will appreciate that the term "partially fabricated integrated circuit" can refer to a silicon wafer during any of the many stages of integrated circuit manufacturing. Wafers or substrates used in the semiconductor device industry typically include diameters of 200 mm, or 300 mm, or 450 mm. The foregoing detailed description contemplates that embodiments or implementations are implemented on wafers or in connection with processes associated with the formation or manufacture of wafers. However, the claimed subject matter is not so limited. Workpieces may be of various shapes, sizes, and materials. In addition to semiconductor wafers, other workpieces that may utilize the claimed subject matter may include various articles such as printed circuit boards, or the manufacture of printed circuit boards.

[0092] Unless the context of this disclosure clearly requires otherwise, throughout this specification and claims, terms such as "comprises," "comprising," and the like should be interpreted in an inclusive sense, i.e., "including but not limited to," as opposed to an exclusive or exhaustive sense. Also, terms using a singular or plural number generally include the plural or singular number, respectively. When the term "or" is used in connection with a list of two or more items, the term includes all interpretations of the term, any item in the list, all items in the list, and any combination of items in the list. The term "embodiment" refers to an embodiment of the techniques and methods described herein, as well as a physical object that embodies the structure and / or incorporates the techniques and / or methods described herein.

Claims

1. 1. An apparatus for generating radio frequency power suitable for coupling into a multi-station integrated circuit manufacturing chamber, comprising: an oscillator configured to generate a periodic signal; a plurality of variable gain preamplifiers each having an input port for receiving a signal from the oscillator and an output port for providing a signal of varying amplitude; a plurality of constant gain amplifiers, each having an input port for receiving a signal from one of the plurality of variable gain preamplifiers and an output port configured to couple the amplified signal to an electrode for generating a plasma at an assigned station of the multi-station integrated circuit manufacturing chamber; a plurality of sensors, each of the plurality of sensors being coupled to a corresponding output port of the plurality of constant gain amplifiers; An apparatus comprising:

2. 2. The apparatus of claim 1, An apparatus, wherein the periodic signal generated by the oscillator comprises a frequency between 300.0 kHz and 100.0 MHz.

3. 3. The apparatus of claim 2, 13. An apparatus, wherein the periodic signal generated by the oscillator comprises a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

4. 2. The apparatus of claim 1, an output port of each of the plurality of sensors coupled to an input port of a control module, and an output signal from the control module coupled to the input port to adjust a gain of a corresponding one of the plurality of variable gain preamplifiers.

5. 5. The apparatus of claim 4, The apparatus, wherein one or more of the plurality of sensors are configured to detect out-of-range parameters selected from the group consisting of power transmitted to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, power reflected from the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, current coupled to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold, and voltage applied to the assigned station of the multi-station integrated circuit manufacturing chamber exceeding a threshold.

6. 5. The apparatus of claim 4, The apparatus, wherein the control module implements circuitry for providing the output signal within 10.0 ns of receiving a signal from one of the plurality of sensors.

7. 2. The apparatus of claim 1, An apparatus, wherein each of the plurality of constant gain amplifiers provides an output power of at least about 1000 W.

8. 1. An apparatus for generating radio frequency power for coupling to a multi-station integrated circuit manufacturing chamber, comprising: an oscillator configured to generate a periodic signal; a preamplifier having an input port for receiving a signal from the oscillator and an output port for providing a signal having a constant gain relative to the received signal; a plurality of variable gain amplifiers, each having an input port for receiving a signal from the preamplifier and an output port configured to couple the amplified signal to an electrode for generating a plasma at an assigned station of the multi-station integrated circuit manufacturing chamber; a plurality of sensors, each of the plurality of sensors providing a control signal to vary an output power of a corresponding one of the plurality of variable gain amplifiers; An apparatus comprising:

9. 9. The apparatus of claim 8, An apparatus, wherein the periodic signal generated by the oscillator comprises a frequency between 300.0 kHz and 100.0 MHz.

10. 10. The apparatus of claim 9, 13. An apparatus, wherein the periodic signal generated by the oscillator comprises a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

11. 9. The apparatus of claim 8, 11. An apparatus, wherein each of the plurality of variable gain amplifiers is capable of providing an output power of at least about 1000.0 W.

12. 9. The apparatus of claim 8, The apparatus further comprising a control module having circuitry for providing the control signal within 10.0 ns of receiving a signal from one of the plurality of sensors.

13. 1. A multi-station integrated circuit manufacturing chamber comprising: Multiple stations and a plurality of radio frequency power generators configured to couple radio frequency power to assigned stations of the multi-station integrated circuit manufacturing chamber, each radio frequency power generator comprising: a variable gain preamplifier having an input port for receiving a signal from an oscillator and an output port for providing a signal of varying power amplitude; a constant gain amplifier having an input port for receiving a signal from the variable gain preamplifier and an output port configured to couple power to the assigned station, a fixed gain amplifier, the power coupled to the assigned station being supplied to an electrode to generate a plasma at the assigned station of the multi-station integrated circuit fabrication chamber; a sensor coupled to a corresponding output port of the constant gain amplifier; a plurality of radio frequency power generators each comprising:

1. A multi-station integrated circuit manufacturing chamber comprising:

14. 14. A multi-station integrated circuit manufacturing chamber as recited in claim 13, comprising:

1. A multi-station integrated circuit manufacturing chamber, wherein the oscillator generates a periodic signal having a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

15. 15. A multi-station integrated circuit manufacturing chamber as recited in claim 14, comprising: A multi-station integrated circuit manufacturing chamber, wherein the constant gain amplifier is capable of providing an output power of at least about 1000.0 W.

16. 14. A multi-station integrated circuit manufacturing chamber as recited in claim 13, comprising:

11. A multi-station integrated circuit manufacturing chamber, wherein each of the plurality of radio frequency power generators is coupled to a sensor configured to detect an out-of-range parameter of the power coupled to the assigned station, the out-of-range parameter corresponding to one of the group consisting of an output voltage amplitude, an output current amplitude, an amplitude of power transmitted to the assigned station, and an amplitude of power reflected from the assigned station.

17. 20. A multi-station integrated circuit manufacturing chamber as recited in claim 16, comprising:

11. A multi-station integrated circuit manufacturing chamber, wherein the sensor configured to detect the out-of-range parameter communicates a signal to the variable gain preamplifier within about 10.0 ns of detecting the out-of-range parameter.

18. A control module comprising: one or more input ports for acquiring a signal from a radio frequency power sensor, the signal indicating detection of an out-of-range parameter in an output signal from the radio frequency power generator; one or more output ports for providing signals to an amplifier stage of the radio frequency power generator, the signals to the amplifier stage being configured to modify a parameter of the output signal from the radio frequency power generator; a processor for commencing generation of the signal from the one or more output ports within about 10 ns of acquiring the signal from the radio frequency power sensor; A control module comprising:

19. 20. The control module of claim 18, A control module, wherein the radio frequency power generator operates at a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

20. 20. The control module of claim 18, A control module, wherein the out-of-range parameter of the output signal from the radio frequency power generator comprises a phase angle between a voltage waveform and a current waveform.

21. 20. The control module of claim 18, The out-of-range parameter includes power provided by the radio frequency power generator.

22. 20. The control module of claim 18, The radio frequency power generator provides approximately 1.0 kW of power.

23. 1. A method for generating radio frequency power suitable for coupling to an assigned station of a multi-station integrated circuit manufacturing chamber, comprising: generating a periodic signal; coupling the periodic signal to a plurality of variable gain preamplifiers; coupling an output signal from each of the plurality of variable gain preamplifiers to a corresponding one of a plurality of constant gain amplifiers; coupling an output signal from each of said plurality of constant gain amplifiers to said assigned station of said multi-station integrated circuit manufacturing chamber; A method comprising:

24. 24. The method of claim 23, sensing an out-of-range parameter in an output signal from one of the plurality of constant gain amplifiers; modifying an amplitude of the output signal from one of the variable gain preamplifiers in response to sensing the out-of-range parameter; The method further comprising:

25. 25. The method of claim 24, The method, wherein the out-of-range parameter corresponds to power reflected from the assigned station of the multi-station integrated circuit manufacturing chamber.

26. 25. The method of claim 24, The method, wherein the out-of-range parameter corresponds to a current conducted to the assigned station of the multi-station integrated circuit manufacturing chamber.

27. 25. The method of claim 24, The method, wherein the out-of-range parameter corresponds to a voltage applied to the assigned station of the multi-station integrated circuit manufacturing chamber.

28. 25. The method of claim 24, The method of claim 1, wherein the amplitude of the output signal from the variable gain preamplifier is altered within 10.0 ns of sensing the out-of-range parameter.

29. 24. The method of claim 23, The method of claim 1, wherein generating the periodic signal includes generating a signal having a frequency selected from the group consisting of 400.0 kHz, 1.0 MHz, 2.0 MHz, 13.56 MHz, 27.12 MHz, 60.0 MHz, and 100.0 MHz.

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