Coil component, laser device, and laser processing machine

JP2025031176APending Publication Date: 2025-03-07SUMITOMO HEAVY IND LTD
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Patent Information

Application Number
JP2023137222
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-08-25
Publication Date
2025-03-07

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Benefits of technology

【0008】 コイルの内径を調整可能であるため、コイルのインダクタンスを微調整することが可能である。

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Abstract

To provide a coil component capable of finely adjusting inductance.SOLUTION: A coil is wound around a coil support, which has a structure that contacts the coil to support the coil from the inside and is capable of adjusting an inner diameter of the coil.SELECTED DRAWING: Figure 1
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Description

[Technical field]

[0001] The present invention relates to a coil component, a laser device, and a laser processing machine. [Background technology]

[0002] A laser device in which a discharge electrode of a laser oscillator and a high-frequency power supply are connected by copper plates is known (Patent Document 1). The number of copper plates is adjusted according to the desired inductance. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 11-163447 Summary of the Invention [Problem to be solved by the invention]

[0004] Due to individual differences in laser oscillators, it becomes necessary to fine-tune the inductance of the inductor inserted between the discharge electrode and the high-frequency power supply. An object of the present invention is to provide a coil component that allows fine adjustment of the inductance. Another object of the present invention is to provide a laser device and a laser processing machine that use this coil component. [Means for solving the problem]

[0005] According to one aspect of the present invention, A coil support; a coil wound around the coil support; Equipped with The coil support is in contact with the coil to support the coil from the inside, and a coil component having a structure capable of adjusting the inner diameter of the coil is provided.

[0006] According to another aspect of the invention, The coil component described above; a laser oscillator having a pair of discharge electrodes; a high frequency power source for supplying high frequency power to the pair of discharge electrodes; Equipped with A laser device is provided in which the coil component is connected between the high frequency power supply and the pair of discharge electrodes.

[0007] According to yet another aspect of the present invention, The laser device described above; A stage for supporting the workpiece; a beam scanner that causes the laser beam output from the laser device to be incident on the workpiece supported by the stage and moves the incident position of the laser beam within the surface of the workpiece; A laser processing machine including the above is provided. Effect of the Invention

[0008] Since the inner diameter of the coil is adjustable, it is possible to fine-tune the inductance of the coil. [Brief description of the drawings]

[0009] [Figure 1] FIG. 1 is a schematic perspective view of a coil device according to a first embodiment. [Diagram 2] FIG. 2 is a diagram showing the positional relationship between the end member, the three supporting columns, and the coil when viewed in the axial direction of the coil. [Diagram 3] FIG. 3 is a block diagram of the laser processing machine according to the first embodiment. [Figure 4] FIG. 4 is a flowchart showing a procedure for adjusting the set voltage of the laser power supply and the inductance of the coil component. [Diagram 5] FIG. 5 is a graph showing the relationship between the number of turns of the coil component, the set value of the voltage of the laser power supply, and the measured value of the high-frequency current. [Figure 6] FIG. 6 is a diagram showing the positional relationship between an end member, four supporting columns, and a coil when a coil device according to a modified example of the first embodiment is viewed from the axial direction of the coil. [Figure 7]FIG. 7A is a diagram showing the positional relationship between an end member, three pillars, and a coil when the coil device according to the second embodiment is viewed from the axial direction of the coil, and FIG. 7B is a perspective view of a plurality of adjustment members. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] A coil component, a laser device, and a laser processing machine according to a first embodiment will be described with reference to FIGS.

[0011] FIG. 1 is a schematic perspective view of a coil device 10 according to a first embodiment. The coil device 10 according to the first embodiment includes a coil support 20 and a coil 30 wound around the coil support 20. The coil 30 is wound around the coil support 20 in a helical shape, for example. The coil support 20 contacts the coil 30 and supports the coil 30 from the inside. The coil 30 may be wound around the coil support 20 in a spiral shape. In this case, it is preferable to use a winding having a shape suitable for spiral winding.

[0012] The coil support 20 includes a pair of end members 21 and three pillars 22. The pair of end members 21 are arranged at an interval in the axial direction DA of the coil 30. An xyz Cartesian coordinate system is defined with the axial direction DA as the z direction. Each of the three pillars 22 is long in the axial direction DA and connects the pair of end members 21 to each other. In addition, the pair of end members 21 fixes the relative positions of the three pillars 22 in the xy plane. The end members 21 and the pillars 22 are formed of a thermosetting resin such as Bakelite. Alternatively, they may be formed of a non-magnetic metal.

[0013] The coil 30 is wound around the three pillars 22. For example, a conductive wire with an insulating coating is used for the winding of the coil 30. Due to the high rigidity of the winding of the coil 30, when the winding is wound around the three pillars 22, the winding is not bent at the contact points with the pillars 22, and the coil 30 has a substantially circumferential shape when viewed from the axial direction DA. The three pillars 22 contact the coil 30 from the inside, thereby fixing the inner diameter of the coil 30 to a specific value.

[0014] Fig. 2 is a diagram showing the positional relationship (positional relationship in the xy plane) of the end member 21, the three pillars 22, and the coil 30 when viewed from the axial direction DA. In Fig. 2, the area in which the coil 30 is arranged is shown in gray. The three pillars 22 are respectively arranged at the three vertices of an equilateral triangle. More specifically, each of the three pillars 22 has a cylindrical shape with a circular xy cross section, and the center of the xy cross section is arranged at the vertex of the equilateral triangle.

[0015] The size of the inner diameter of the coil 30 is fixed by the coil 30 coming into contact with the three supports 22. One of the three supports 22 is fixed so as not to move relative to the pair of end members 21. Each of the other two supports 22 is movable in a direction parallel to each of two straight lines L extending from the fixed support 22 when viewed from a direction parallel to the z-axis, and can be fixed to the pair of end members 21 at a specific position.

[0016] For example, two long holes 23 that are long in directions parallel to the two straight lines L are provided in each of the pair of end members 21. The ends of the pillars 22 are inserted into the long holes 23 and can move in the longitudinal direction of the long holes 23. Also, the pillars 22 can be fixed to the end members 21 at any position within the long holes 23. When the two pillars 22 are moved along the straight lines L, the diameter of the minimum including circle EC of the three pillars 22 in the xy plane changes. The xy cross section of a cylinder along the inner circumference of the coil 30 corresponds to the minimum including circle EC. The diameter of the minimum including circle EC corresponds to the inner diameter of the coil 30. When the pillars 22 are moved to change the inner diameter of the coil 30, the inductance of the coil 30 changes.

[0017] The angle between the two straight lines L is 60°. Therefore, even if each of the two support columns 22 is moved along the straight lines L, the three support columns 22 can be maintained at the vertices of an equilateral triangle in the xy plane.

[0018] FIG. 3 is a block diagram of a laser processing machine according to the first embodiment. The laser processing machine according to the first embodiment includes a laser power supply 40, a laser oscillator 50, a processing unit 60, and a control unit 70. A high-frequency current is supplied in a pulsed manner from the laser power supply 40 to the laser oscillator 50 via a coil component 10. The coil component 10 shown in FIG. 1 and FIG. 2 is used as the coil component 10. The two coil components 10 are inserted into two wirings connecting the laser power supply 40 and the laser oscillator 50, respectively. A gas laser oscillator, for example, a carbon dioxide gas laser oscillator is used as the laser oscillator 50. The laser oscillator 50 includes a pair of discharge electrodes 51. When a high-frequency current is supplied to the laser oscillator 50, a discharge occurs between the pair of discharge electrodes 51, and a pulse laser beam is output.

[0019] A pulsed laser beam output from a laser oscillator 50 is incident on a processing unit 60. The pulsed laser beam incident on the processing unit 60 is reflected by a mirror 61, passes through a beam scanner 62 and a condenser lens 63, and is incident on a processing object 68. The processing object 68 is held on a movable stage 64. Under the control of a control unit 70, the movable stage 64 moves the processing object 68 in two directions parallel to the processing surface and in a direction perpendicular to the processing surface.

[0020] The beam scanner 62 scans the pulsed laser beam under the control of the control unit 70 to move the incidence position of the pulsed laser beam on the surface to be processed of the workpiece 68. For example, a galvanometer scanner can be used as the beam scanner 62. The condenser lens 63 condenses the pulsed laser beam on the surface to be processed of the workpiece 68. For example, an fθ lens can be used as the condenser lens 63. Note that a beam expander, an aperture, an attenuator, etc. may be arranged in the beam path as necessary.

[0021] The workpiece 68 is, for example, a printed circuit board, and holes are drilled within a scannable range by moving the beam spot of the pulsed laser beam with the beam scanner 62. The movable stage 64 is operated to sequentially position the areas to be processed on the surface of the workpiece 68 within the scannable range of the beam scanner 62, thereby processing the entire surface of the workpiece 68.

[0022] Next, a description will be given of the configuration of the laser power supply 40. The laser power supply 40 includes a rectifier 41, a charging power supply 42, a bank capacitor 44, and a high frequency power supply 43. The rectifier 41, the charging power supply 42, and the high frequency power supply 43 each operate under the control of the control unit 70.

[0023] A three-phase AC current is supplied to the rectifier 41 from an external AC power supply 75. The DC current rectified by the rectifier 41 is supplied to the charging power supply 42. The charging power supply 42 boosts the input DC voltage and charges the bank capacitor 44. DC power is supplied from the bank capacitor 44 to the high frequency power supply 43. The high frequency power supply 43 converts the DC power supplied from the bank capacitor 44 into high frequency power, and supplies the high frequency power to the laser oscillator 50 in a pulsed manner.

[0024] Since there are individual differences in the laser oscillator 50 and the laser power supply 40, in order to obtain a desired laser output, it is necessary to adjust the set voltage of the laser power supply 40 and the inductance of the coil component 10. Next, a procedure for adjusting the set voltage of the laser power supply 40 and the inductance of the coil component 10 will be described with reference to Fig. 4.

[0025] 4 is a flowchart showing a procedure for adjusting the set voltage of the laser power supply 40 and the inductance of the coil component 10. First, the number of turns and the inner diameter of the coil 30 of the coil component 10 are set to initial values ​​(step S1). The laser oscillator 50 is operated under these conditions, and the set voltage of the laser power supply 40 is adjusted so that the laser output from the laser oscillator 50 becomes a target value (step S2). For example, it is preferable to adopt the voltage between the terminals of the bank capacitor 44 as the set voltage of the laser power supply 40. The voltage between the terminals of the bank capacitor 44 can be changed by changing the operating conditions of the charging power supply 42.

[0026] When the target laser output is obtained, the high frequency current supplied to the discharge electrode 51 is measured (step S3). It is determined whether the voltage setting value after adjustment in step S2 and the high frequency current measurement value measured in step S3 are within the allowable range (step S4). If the voltage setting value and the high frequency current measurement value are within the allowable range, the adjustment procedure ends.

[0027] If the voltage setting value and the high frequency current measurement value are not within the allowable range, the number of turns of the coil component 10 and the inner diameter of the coil 30 are changed (step S5). After that, the procedures from step S2 to step S4 are repeated.

[0028] Next, the advantageous effects of the first embodiment will be described with reference to FIG. 5 is a graph showing the relationship between the number of turns of the coil device 10, the voltage setting value of the laser power supply 40, and the measured value of the high-frequency current. The horizontal axis represents the number of turns, the left vertical axis represents the voltage setting value in relative value, and the right vertical axis represents the measured value of the high-frequency current in relative value. The voltage setting value and the measured value of the high-frequency current are values ​​after adjustment so that the laser output of the laser oscillator 50 becomes the target value.

[0029] In this evaluation experiment, two types of power supplies (power supply A and power supply B) were used as the laser power supply 40. The gray and white circle symbols in the graph respectively indicate the voltage setting value and the measured value of the high frequency current when power supply A was used, and the gray and white triangle symbols respectively indicate the voltage setting value and the measured value of the high frequency current when power supply B was used.

[0030] The voltage setting value increases as the number of turns is increased from 4 turns by 1 turn. The measured value of the high frequency current changes according to the change in the voltage setting value. The allowable ranges of the voltage and the high frequency current are determined as design conditions of the high frequency power supply 43, the coil component 10, and the discharge electrode 51. The allowable range of the voltage is denoted as ARV, and the allowable range of the high frequency current is denoted as ARI. When the power supply A is used, when the number of turns of the coil component 10 is set to 6 turns and 7 turns, the voltage setting values ​​(relative values) become V6 and V7, respectively. The voltage V6 is less than the lower limit of the allowable range ARV of the voltage, and the voltage V7 exceeds the upper limit of the allowable range ARV. Therefore, under the condition that the inner diameter of the coil 30 is not changed and the number of turns is set to an integer, the voltage setting value does not fall within the allowable range ARV. The measured value of the high frequency current falls within the allowable range. When the power supply B is used, the voltage setting value does not fall within the allowable range AR either.

[0031] In this case, in the first embodiment, the position of the support 22 (FIG. 2) of the coil component 10 is changed and the coil 30 is rewound to change the inner diameter of the coil 30, thereby enabling fine adjustment of the inductance. By finely adjusting the inductance of the coil component 10, it becomes possible to keep the voltage setting value within the allowable range AR.

[0032] The inductance of the coil 30 is proportional to the square of the inner diameter and the square of the number of turns. In the example shown in Fig. 5, when power source A is used and the number of turns is 6, the voltage setting value is below the lower limit of the allowable range AR. In order to keep the voltage setting value within the allowable range AR, it is necessary to increase the inductance of the coil component 10, but if the number of turns is set to 7, the inductance becomes too large, causing the voltage setting value to exceed the upper limit of the allowable range AR.

[0033] In this case, by leaving the number of turns at six and slightly increasing the inner diameter of the coil 30, the inductance can be set to a suitable value. This makes it possible to keep the voltage setting value within the allowable range AR. In this way, in the first embodiment, since the inner diameter of the coil 30 can be adjusted, the degree of freedom in adjusting the inductance can be increased.

[0034] Next, a coil component according to a modification of the first embodiment will be described with reference to FIG. 6 is a diagram showing the positional relationship (positional relationship in the xy plane) of the end member 21, the four pillars 22, and the coil 30 when the coil device 10 according to the modified example of the first embodiment is viewed from the axial direction DA (z direction) of the coil 30. In the first embodiment (FIGS. 1 and 2), the coil device 10 includes three pillars 22, but in the modified example shown in FIG. 6, the coil device 10 includes four pillars 22. One of the four pillars 22 is fixed immovably relative to the pair of end members 21, and the other three pillars 22 are movable along the long hole 23 relative to the pair of end members 21.

[0035] The three long holes 23 are arranged in the xy plane along a straight line extending from one support 22 whose position is fixed. The four support columns 22 can be positioned so that all of them are tangent to the minimum encompassing circle EC. For example, the four support columns 22 are arranged at the four vertices of a square in the xy plane. As in this modified example, the number of support columns 22 may be four. As another modified example, the number of support columns 22 may be five or more.

[0036] When three or more support columns 22 are arranged, at least one of the support columns 22 may be movable in a direction in which the diameter of the minimum including circle EC changes. The moving direction of the movable support column 22 is a direction in which the size of the minimum including circle EC can be adjusted by fixing the position of the support column 22 with respect to the pair of end members 21 at a specific position within the movable range.

[0037] Next, a coil component according to a second embodiment will be described with reference to Figures 7A and 7B. Below, a description of the configuration common to the coil component according to the first embodiment (Figures 1 to 5) will be omitted.

[0038] 7A is a diagram showing the positional relationship (positional relationship in the xy plane) of the end member 21, three supports 22, and the coil 30 when the coil device 10 according to the second embodiment is viewed from the axial direction DA (z direction) of the coil 30. In the second embodiment, instead of moving the supports 22 relative to the pair of end members 21, the inner diameter of the coil 30 is adjusted by attaching adjustment members 25 to the respective side surfaces of the supports 22. The adjustment members 25 have a shape formed by curving a flat plate so as to fit along the side surfaces of the supports 22.

[0039] 7B is a perspective view of a plurality of adjustment members 25. A plurality of adjustment members 25 having different thicknesses are prepared. When adjusting the inductance of the coil 30, the inner diameter of the coil 30 can be adjusted by using the adjustment member 25 having the most appropriate thickness.

[0040] Next, the advantageous effects of the second embodiment will be described. In the second embodiment, since a plurality of adjustment members 25 with different thicknesses are prepared, the inner diameter of the coil 30 can be changed in the same manner as in the first embodiment. This provides the excellent effect of increasing the degree of freedom in adjusting the inductance of the coil 30.

[0041] The above-mentioned embodiments are merely examples, and it goes without saying that partial replacement or combination of the configurations shown in different embodiments is possible. Similar effects due to similar configurations of multiple embodiments are not mentioned in each embodiment. Furthermore, the present invention is not limited to the above-mentioned embodiments. For example, it will be obvious to those skilled in the art that various modifications, improvements, combinations, etc. are possible. [Explanation of symbols]

[0042] 10 Coil parts 20 Coil support 21 End members 22 Posts 23 long hole 25 Adjustment parts 30 Coil 40 Laser power supply 41 Rectifier 42 Charging power supply 43 High frequency power supply 44 Bank Capacitor 50 Laser Oscillator 51 Discharge electrode 60 Processing Department 61 Mirror 62 Beam Scanner 63 Condenser Lens 64 Movable Stage 68 Processing Objects 70 Control section 75 AC power supply Axial direction of DA coil EC minimum enclosing circle L A straight line extending from a fixed support

Claims

1. A coil support; a coil wound around the coil support; Equipped with The coil support is a coil component having a structure that contacts the coil to support the coil from the inside and is capable of adjusting the inner diameter of the coil.

2. The coil support includes: A pair of end members arranged at an interval in the axial direction of the coil; a plurality of struts extending in the axial direction and connecting the pair of end members; Includes.

2. The coil component according to claim 1, wherein at least one of the plurality of pillars is movable in a direction in which a diameter of a minimum inclusive circle of the plurality of pillars changes when viewed from a direction parallel to the axial direction, and is fixable to the pair of end members at a specific position.

3. 3. The coil component according to claim 2, wherein the plurality of supports are arranged in three numbers, and the plurality of supports can be fixed to the pair of end members in a positional relationship in which the plurality of supports are positioned at vertices of an equilateral triangle when viewed from a direction parallel to the axial direction.

4. 4. The coil component according to claim 3, wherein one of the plurality of supports is fixed so as not to move relative to the pair of end members, and each of the other two supports is movable in a direction parallel to a straight line extending from the fixed support when viewed from a direction parallel to the axial direction, and is fixable to the pair of end members at a specific position.

5. The coil component according to any one of claims 1 to 4, a laser oscillator having a pair of discharge electrodes; a high frequency power source for supplying high frequency power to the pair of discharge electrodes; Equipped with The coil component is connected between the high frequency power supply and the pair of discharge electrodes.

6. A laser device according to claim 5; A stage for supporting the workpiece; a beam scanner that causes the laser beam output from the laser device to be incident on the workpiece supported by the stage and moves the incident position of the laser beam within the surface of the workpiece; A laser processing machine equipped with

Citation Information

Patent Citations

  • Pulsed gas laser oscillator and laser anneal device using the same

    JP1999163447A