Composition for biofilm formation inhibition
Patent Information
- Application Number
- JP2024146925
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-08-28
- Filing Date
- 2024-08-28
- Publication Date
- 2025-03-12
AI Technical Summary
【0018】 本発明によれば、汚れが多い環境下で効果があり、及び/又は、微生物の薬剤耐性を生じさせにくく、広く様々な微生物に対して有効なバイオフィルム形成阻止剤組成物を提供することができる。
Smart Images

Figure 2025033012000001 
Figure 2025033012000002 
Figure 2025033012000003
Abstract
Description
[Technical field]
[0001] The present invention relates to a biofilm formation inhibitor composition, which is effective in dirty environments and / or is unlikely to cause drug resistance in microorganisms, and can be used as a biofilm formation inhibitor to maintain a hygienic environment around water. [Background technology]
[0002] A biofilm is a structure formed by a community of microorganisms such as bacteria and mold attached to a solid surface together with secretions, etc., and slime present around water such as drains in washrooms, kitchens, bathrooms, and toilets is also known as a biofilm. In general, once a biofilm is formed, it has a reduced drug permeability and heat resistance, making it difficult to remove by drug treatment or heat treatment. Therefore, since it is difficult to remove a biofilm once it has formed, it is more important to suppress the formation of the biofilm. Biofilms that occur around water not only spoil the appearance and cause bad odors, but are also known to be a source of transmission of pathogenic bacteria and resistant bacteria in medical institutions.
[0003] Conventionally, chlorine-based disinfectants have been generally used to prevent biofilms around water. However, such water areas are always wet environments and are continuously contaminated by organic matter such as food and microorganisms. For example, chlorine-based agents such as sodium hypochlorite are easily inactivated by organic matter and cannot fully exert their effects. Furthermore, the use of large amounts of chlorine-based agents has the problem that they can damage materials such as plastic and stainless steel, and have a large impact on the human body and the environment. Therefore, they could not be used continuously at a concentration that can sufficiently inhibit the growth of microorganisms, and biofilm formation could not be suppressed. Therefore, there is a demand for the development of a new system that has little impact on the human body, the environment, and materials, and can effectively suppress biofilm formation even in dirty environments.
[0004] In general, when antibacterial agents are routinely used as biofilm formation inhibitors, there has been concern that antibacterial agents may selectively leave biofilm-forming bacteria that are resistant to the agent. For this reason, most of the reported biofilm formation inhibitors use concentrations or components that do not inhibit bacterial growth. Patent Document 1 is a biofilm formation inhibitor composition that is a combination of an aromatic aldehyde and a solvent used at or below the minimum inhibitory concentration (MIC), and Patent Document 2 uses hexylresorcinol at a concentration that results in a growth inhibition rate of 20% or less as an active ingredient. In addition, Patent Document 3 is an example of a drug that does not inhibit bacterial growth. However, it is thought that acting at a concentration below the MIC rather reduces drug sensitivity and promotes the development of resistant bacteria, and in both cases, the biofilm formation inhibitory ability is low and it cannot be said that biofilm formation is prevented. When these drugs are used, it is expected that biofilms will be formed over time due to the growth of microorganisms that have become resistant by adhering to the remaining biofilm. Moreover, it is expected that this will be more pronounced in dirty environments with a lot of organic matter.
[0005] In recent years, there have been reports of the suppression of biofilm formation by quorum sensing inhibitors; however, since these basically control the biofilm maturation process, it is difficult to control the initial adhesion of bacteria. In addition, some environmental bacteria control biofilm formation using molecules and mechanisms other than the targeted autoinducer molecules (e.g., acyl homoserine lactones, AHLs). Therefore, these inhibitors only target a certain type of bacteria, and their effectiveness against other microorganisms that form biofilms in aqueous systems, such as mold, is questionable. [Prior art documents] [Patent documents]
[0006] [Patent Document 1] Patent No. 6787828 [Patent Document 2] JP 2017-218390 A [Patent Document 3] Patent No. 7211730 Summary of the Invention [Problem to be solved by the invention]
[0007] An objective of the present invention is to provide a biofilm formation inhibitor composition that is effective in highly soiled environments and / or that is unlikely to cause drug resistance in microorganisms and is effective against a wide variety of microorganisms. [Means for solving the problem]
[0008] The present invention provides a biofilm formation inhibitor composition that exerts an antibacterial effect even in a dirty environment by using an antibacterial component in combination with hydrogen peroxide or a substance that generates hydrogen peroxide, and suppresses the decrease in drug sensitivity of microorganisms that occurs when the antibacterial component is used alone, thereby making it difficult for drug-resistant bacteria to develop even with continuous daily use. The composition can inhibit the formation of biofilms even in dirty environments such as around water.
[0009] Therefore, the gist of the present invention is as follows. A biofilm formation inhibitor composition comprising the following components (A) and (B): (A) Antibacterial ingredients (excluding hydrogen peroxide or substances that generate hydrogen peroxide) (B) Hydrogen peroxide or a substance that generates hydrogen peroxide
[0010] The composition may contain component (A) and component (B) to provide a synergistic increase in antibacterial activity. The composition can inhibit the decrease in drug susceptibility that occurs in microorganisms exposed to component (A) during continuous use. The composition is capable of providing antimicrobial efficacy even in dirty environments.
[0011] In the composition, the component (A) may be an anionic surfactant used at a pH of not more than 3. Preferably, the anionic surfactant is contained in the composition in an amount of 0.1 to 20% by mass.
[0012] The component (A) in the composition may be a cationic surfactant. Preferably, the cationic surfactant is contained in the composition in an amount of 0.001 to 50% by mass.
[0013] The composition can contain the components (A) and (B) in amounts such that the effective concentrations are: component (A): 0.1 to 20,000 ppm; component (B): 0.1 to 5,000 ppm calculated as hydrogen peroxide. In one embodiment, the composition can be used by adding it to a solvent such as water.
[0014] The composition may further comprise (C) a hydrogen peroxide stabilizer as a stabilizer for the component (B).
[0015] The composition may have a pH of 5 or less in order to stabilize component (B).
[0016] The composition may be used as a slime prevention agent for wet areas and / or a bactericide for biofilm-forming bacteria. The slime prevention agent for wet areas and / or a bactericide for biofilm-forming bacteria of the present invention includes the composition.
[0017] The composition may have a broad antibacterial effect against all microorganisms including fungi such as yeast and mold. Effect of the Invention
[0018] According to the present invention, it is possible to provide a biofilm formation inhibitor composition that is effective in highly soiled environments and / or is unlikely to cause drug resistance in microorganisms and is effective against a wide variety of microorganisms. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0019] In this specification, the term "antibacterial" refers not only to the effect of suppressing the growth of microorganisms, but also to the effect of removing microorganisms (sterilization) and killing microorganisms (disinfection).
[0020] In this specification, the term "biofilm formation inhibitor" is defined as an agent that inhibits and suppresses the formation of biofilms on surfaces that are easily contaminated by microorganisms by continuously inhibiting or killing the growth of microorganisms in a wet environment. The target surfaces are not particularly limited, but possible examples include sinks, drains, bathrooms, and other wet areas. Biofilm formation inhibitors can be used for the purpose of maintaining a hygienic environment, including preventing slime around wet areas, preventing microbial contamination around wet areas, maintaining the aesthetic appearance, and preventing the spread and transmission of pathogenic microorganisms caused by wet areas.
[0021] In the present specification, the composition contains hydrogen peroxide and an antibacterial component having a broad antibacterial spectrum, and therefore may be effective against a wide range of bacteria, fungal organisms such as yeast and mold, and viruses.
[0022] Hereinafter, each of the raw material components of the biofilm formation inhibitor composition of the present invention (hereinafter, may be referred to as "the composition") will be described.
[0023] (A) Antibacterial ingredient As the component (A), there is no particular limitation so long as the component (B) is excluded, but it is desirable to use an anionic surfactant or a cationic surfactant that is used at a pH of 3 or less. The anionic surfactant used at pH 3 or less may be adjusted to pH 3 or less by an acidic anionic surfactant or a combination of an anionic surfactant and an acid. Both are components used in general-purpose cleaning agents, and it is considered that even if they are released into the environment, the impact on the ecosystem is minor. The anionic surfactant here is not particularly limited, but examples thereof include alkane sulfonic acid or its salt having an alkane moiety with 10 to 24 carbon atoms, alkyl sulfosuccinic acid or its salt having an alkyl group with 10 to 24 carbon atoms, alkyl sulfate having an alkyl group with 8 to 22 carbon atoms, linear alkylbenzene sulfonic acid and its salt, α-sulfofatty acid ester or its salt having a fatty acid moiety with 10 to 22 carbon atoms, olefin sulfonic acid or its salt having an olefin moiety with 10 to 24 carbon atoms, C10 to C24 polyoxyalkylene (preferably polyoxyethylene, average number of moles added is 0.5 or more, preferably 1 or more, and 4 or less, preferably 3 or less) alkyl ether sulfate ester or its salt, etc. Among them, sodium alkanesulfonate and linear alkylbenzenesulfonic acid are preferred from the viewpoints of economy and stability. These can be used alone or in combination of two or more. The content of the compound is considered to be 0.01 to 50% by mass relative to the composition, but it is preferable to include the compound so as to be in the range of 0.1 to 20% by mass. If the content is too low, there is no antibacterial effect, and conversely, if the content is too high, the stability of the liquid tends to decrease. The acid is not particularly limited to organic acids and inorganic acids, but it is preferable to use one or more acids with a pKa of 3 or less. For example, phosphoric acid, citric acid, and sulfamic acid are preferred. The cationic surfactant is not particularly limited, but examples thereof include quaternary ammonium salts having two alkyl groups with 8 to 24 carbon atoms, quaternary ammonium salts having one alkyl group with 8 to 24 carbon atoms, and benzalkonium chloride. The content of the surfactant is considered to be 0.001 to 50% by mass relative to the composition, but is preferably contained in the range of 0.01 to 20% by mass. If the content is too low, there is no antibacterial effect, and conversely, if the content is too high, the stability of the liquid tends to decrease. Other examples of (A) components include alkyldiaminoethylglycine hydrochlorides, polyaminomonocarboxylic acids (glycine type), monoaminomonocarboxylic acids (alanine type), alkylbetaines (betaine type), imidazolines, and piperidine amphoteric surfactants, C2-C8 alcohols, such as ethanol, n-propanol, and the like; aldehydes, such as glutaraldehyde, formaldehyde, and O-phthalaldehyde; formaldehyde-producing compounds, such as noxythioline, taurolin, hexamine, urea formaldehyde, imidazolone derivatives, and the like; anilides, especially triclocarban; biguanides, such as chlorhexidine and alexidine, and polymeric forms, such as poly(hexamethylene biguanide); dicarboxyimidamides, such as substituted or unsubstituted, Any antibacterial agent may be used, such as propamidine (e.g., propamidine) and their isethionates; compounds containing or releasing halogen atoms, such as bleach, C1O2, dichloroisocyanurate, tosyl chloramide, iodine (and iodophors, etc.); silver and silver compounds, such as silver acetate, silver sulfadiazine and silver nitrate; phenols, bisphenols and halophenols (including hexachlorophene) and phenoxyphenols (e.g., triclosan). Additionally, antibiotics may be used, and may be included in the composition in any amount capable of exerting an antibacterial effect. The component (A) may be one compound selected from the above, or a combination of multiple compounds. In one embodiment, the component (A) is desirably contained in the composition in an amount such that the effective concentration is in the range of 0.1 to 20,000 ppm.
[0024] (B) Hydrogen peroxide or a substance that generates hydrogen peroxide Component (B), hydrogen peroxide, is used to ensure sterilization performance. Hydrogen peroxide generators include, but are not limited to, hydrogen peroxide solution, percarbonates (i.e., sodium percarbonate, potassium percarbonate), perborates (i.e., sodium perborate, potassium perborate), hydrogen peroxide urea or peroxide salts, hydrated salts thereof, or combinations thereof, and the like. The component (B) may be one compound selected from the above, or a combination of multiple compounds. The content of the (B) component in the composition is considered to be 0.01 to 20% by mass in terms of hydrogen peroxide, but when hydrogen peroxide is used, it is preferably 6% by mass or less, which is not a deleterious substance, from the viewpoint of worker safety. In one embodiment, the (B) component is preferably contained in the composition in an amount such that the effective concentration is in the range of 0.1 to 5000 ppm in terms of hydrogen peroxide. If the content is too low, there is no antibacterial effect, and conversely, if the content is too high, there is a concern of corrosion to metals and an irritating odor is generated.
[0025] (C) Hydrogen peroxide stabilizer Since hydrogen peroxide is easily decomposed by metals, the composition may further contain a hydrogen peroxide stabilizer (C) for the purpose of preventing the decomposition of hydrogen peroxide by trace metals present in the (A) antibacterial component and optional components used in combination. The addition of component (C) is preferable because it improves the stability of the composition. Examples of the component (C) include chelating agents, but are not limited to these. Examples of the chelating agents include 1-hydroxyethane-1,1-diphosphonic acid, sodium aminotrimethylene phosphonate, potassium aminotrimethylene phosphonate, sodium 1-hydroxyethylidene-1,1-diphosphonate, potassium 1-hydroxyethylidene-1,1-diphosphonate, sodium 2-phosphonobutane-1,2,4-tricarboxylate, potassium 2-phosphonobutane-1,2,4-tricarboxylate, sodium ethylenediaminetetramethylene phosphonate, potassium ethylenediaminetetramethylene phosphonate, sodium diethylenetriaminepentamethylene phosphonate, potassium diethylenetriaminepentamethylene phosphonate, trisodium nitrilotriacetate, tripotassium nitrilotriacetate, hydo Examples of the hydroxyethyliminodiacetate include disodium hydroxyethyliminodiacetate, dipotassium hydroxyethyliminodiacetate, trisodium methylglycine diacetate, tripotassium methylglycine diacetate, tetrasodium ethylenediaminetetraacetate, tetrapotassium ethylenediaminetetraacetate, trisodium hydroxyethylethylenediaminetriacetate, tripotassium hydroxyethylethylenediaminetriacetate, tetrasodium L-glutamic acid-N,N-2acetate, tetrapotassium L-glutamic acid-N,N-2acetate, tetrasodium L-aspartic acid-N,N-2acetate, tetrapotassium L-aspartic acid-N,N-2acetate, pentasodium diethylenetriaminepentaacetate, pentasodium diethylenetriaminepentaacetate, disodium tartrate, dipotassium tartrate, and sodium potassium tartrate. In addition, triazole-based rust inhibitors such as benzotriazole, which are used as corrosion inhibitors, and organic acids such as salicylic acid have also been reported to have a hydrogen peroxide stabilizing effect by inactivating metals, and can be used for this purpose as component (C). These can be used alone or in combination of two or more kinds. The component (C) can be included in the composition in any amount that can achieve the above-mentioned object. For example, the content in the entire composition is preferably 0.01 to 10 mass%, more preferably 0.05 to 5 mass%, and even more preferably 0.1 to 3 mass%.
[0026] In the biofilm formation inhibitor composition of the present invention, in addition to the above-mentioned components (A), (B), and (C), the following optional components may be further used as necessary.
[0027] (cleaning ingredients) Detergent ingredients are used to enhance cleaning power. The composition may include, but is not limited to, detergents such as alkyl polyglucosides, alkanolamines, ethoxylated alkanolamides, fatty acid esters, glycerol esters, and PEG esters, sorbitan esters, ethoxylated sorbitan esters, and alcohol ethoxylates.
[0028] (pH adjuster) The pH adjuster is used to increase the stability of hydrogen peroxide (B). Although not particularly limited, examples of the pH adjuster include organic acids and inorganic acids, and are added so that the pH (25°C) of the composition is 0.5 to 5. If the pH (25°C) is 5 or higher, the stability of hydrogen peroxide decreases, and if the pH (25°C) is 0.5 or lower, metal corrosion occurs.
[0029] (solvent) Examples of the solvent include lower alcohols having 1 to 5 carbon atoms, such as water, ethanol, and isopropanol; lower aliphatic ketones, such as acetone and methyl ethyl ketone; polyhydric alcohols having 2 to 5 carbon atoms, such as 1,3-ethylene glycol, propylene glycol, triethylene glycol, hexylene glycol, and glycerin; ethylene glycol ethers, such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol ethers, such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, and diethylene glycol monobutyl ether; glycol ethers, such as propylene glycol monomethyl ether, propylene glycol monopropyl ether, and dipropylene glycol monomethyl ether. These can be used alone or in combination of two or more.
[0030] In addition to the above components, the biofilm formation inhibitor composition of the present invention may further contain other components, such as additives commonly used in the manufacture of antibacterial agents, disinfectants, bactericides, etc., as necessary. Such other components include (but are not limited to) excipients, lubricants, binders, disintegrants, buffers, suspending agents, solubilizers, thickeners, surfactants, stabilizers, preservatives, antioxidants, desiccants, colorants, lubricants, plasticizers, chelating agents, fragrances, etc., and may be appropriately blended in an amount appropriate for the use of the composition within a range that does not impair the effects of the present invention.
[0031] The biofilm formation inhibitor composition of the present invention may be in the form of a liquid, a solid (powder, granules, etc.), or a semi-solid / semi-liquid (gel, sol, etc.), and may be in an appropriate form depending on the form in which the composition is used. For example, the biofilm formation inhibitor composition of the present invention may be in the form of a ready-to-use type that is added to a solvent before use.
[0032] When the antibacterial component is used alone, the drug sensitivity of the microorganisms decreases with continued use, but when the biofilm formation inhibitor composition of the present invention, which uses the antibacterial component in combination with hydrogen peroxide, is used, the drug sensitivity of the microorganisms does not change, or rather, they become more sensitive to the drug. This shows that when the antibacterial component is used in combination with hydrogen peroxide, the occurrence of drug-resistant bacteria can be prevented.
[0033] In addition, in the biofilm formation inhibitor composition of the present invention, by using an antibacterial component and hydrogen peroxide in combination, the antibacterial component and hydrogen peroxide act synergistically even in a dirty environment, and effective bactericidal and antibacterial effects can be achieved at low concentrations. Furthermore, since the decomposition products of hydrogen peroxide are oxygen and water, the composition has little impact on the environment and is preferable as a drug that is used daily and released into the environment.
[0034] Furthermore, the mechanism of action of hydrogen peroxide is known to be non-specific oxidative damage to the enzyme system of microorganisms, and it is known to act on a wide range of microorganisms, including not only bacteria but also fungi, viruses, etc. Therefore, the composition combining an antibacterial component and hydrogen peroxide is effective against a wide range of microorganisms.
[0035] The compositions can be used in a variety of applications, including disinfection and contamination prevention. Such compositions are effective in inhibiting or disinfecting microbial contamination on surfaces susceptible to microbial contamination or surfaces susceptible to biofilm formation.
[0036] In one embodiment, the composition is used as an anti-slime agent in wet areas.
[0037] In another embodiment, the composition is used to kill biofilm-forming bacteria. For example, it can be used as a disinfectant for biofilm-forming bacteria in wet areas, can be used to prevent the transmission and / or spread of pathogenic microorganisms originating in wet areas, and can be used to maintain a hygienic environment in wet areas.
[0038] The biofilm formation inhibitor composition, anti-slime agent for wet areas, and bactericide for biofilm-forming bacteria of the present invention can be used in any manner as long as it achieves the above-mentioned effects. For example, the biofilm formation inhibitor composition, anti-slime agent for wet areas, and bactericide for biofilm-forming bacteria of the present invention are preferably used so that the active concentration of component (A) is in the range of 0.1 to 20,000 ppm, and the active concentration of component (B) is in the range of 0.1 to 5,000 ppm in terms of hydrogen peroxide. In addition, the biofilm formation inhibitor composition, the slime prevention agent for around water, and the bactericide for biofilm-forming bacteria of the present invention may be added to a solvent at the time of use and dissolved or diluted. The solvent may be one defined above. A more specific anticipated method of using the biofilm formation inhibitor composition, anti-slime agent for wet areas, and disinfectant for biofilm-forming bacteria of the present invention is to spray the composition into a drain or the like at a concentration about 10 to 50 times the MIC, depending on the state of dirt in the wet areas, and then lightly flush the pipes with water to allow the solution to permeate the pipes and perform treatment. EXAMPLES
[0039] The present invention will be described in more detail below with reference to examples. However, the present invention is not limited to the following examples as long as it does not depart from the gist of the present invention.
[0040] Prior to the examples, each raw material component was prepared as follows. The values in the table are shown in mass % with the total composition to be obtained being 100 mass %, and each component is shown as a pure content. Unless otherwise specified, "%" refers to a mass basis.
[0041] (A) Antibacterial ingredient Anionic Surfactants A1: Sodium alkanesulfonate A2: Sodium lauryl sulfate A3: Sodium alkylbenzene sulfonate A4: Alkylbenzene sulfonic acid Cationic Surfactants A5: Benzalkonium chloride A6: Dodecyl dimethyl ammonium methosulfate
[0042] (B) Hydrogen peroxide or a substance that generates hydrogen peroxide B1: Hydrogen peroxide
[0043] (C) Hydrogen peroxide stabilizer C1: Sodium 1-hydroxyethylidene-1,1-diphosphonate C2: Diethylenetriamine pentasodium acetate [others] Cleansing ingredients Polyoxyethylene alkyl ether pH adjuster ·phosphoric acid Citric acid Sulfamic acid solvent Ion-exchanged water Propylene glycol monopropyl ether
[0044] Biofilms occurring around water are mainly reported to be caused by gram-negative microorganisms such as Pseudomonas aeruginosa, Sphingomonas, Sphingopyxis, Klebsiella, Acinetobacter, Flavobacterium, and Roseomonas. Among them, Pseudomonas is an indicator of biofilm-forming bacteria around water, so the antibacterial activity was evaluated using the MIC.
[0045] The soil contains organic and inorganic substances, and is preferably one that promotes the growth of the indicator bacteria, not inhibits it. From this perspective, the medium components of a general-purpose liquid medium were used as the soil. The antibacterial activity in a dirty environment was determined by performing MIC measurements in the liquid medium to which the composition was added. Basically, TSB (Tryptone Soya Broth) medium, which is generally used for the formation of biofilms by Pseudomonas aeruginosa, was mainly used. In addition, evaluation was also performed using NB (Nutrient Broth) medium and LB (Luria Broth) medium, which have different ingredients. For mold and yeast, the pH was adjusted to 5.7 and chloramphenicol was added. Furthermore, 0.1% Tween 80 was added for mold.
[0046] (1. MIC Measurement) (1-1. Preparation of test bacteria solution) The test species was mainly Pseudomonas aeruginosa NBRC13736, a typical biofilm-forming species in wet areas. In addition, red yeast isolated from red stains on the sink and mold Cladosporium sphaerospermum-NBRC6348 were also confirmed. Each microorganism was inoculated onto standard agar medium or potato dextrose agar medium supplemented with chloramphenicol, and then subcultured three times on consecutive days. The resulting colonies were then dispersed in phosphate buffer, which was then inoculated into a 2-fold concentrated liquid medium to prepare a test bacterial solution.
[0047] (1-2. Measurement of minimum inhibitory concentration (MIC)) 100 μL of the test bacteria solution prepared in 1-1 above was added to each well of a 96-well microplate, and then 100 μL of the composition diluted to a 2-fold concentrated concentration with distilled water was added to each well and incubated at 28 to 37° C. for 1 to 6 days. The lowest concentration (maximum dilution ratio) among the dilution series that did not become cloudy by visual inspection was determined as the minimum inhibitory concentration (MIC).
[0048] (1-3. Evaluation of changes in drug susceptibility (resistance)) After culturing the 96-well microplate at 28-37°C for 1-6 days, the bacterial liquid collected from the wells where bacterial growth was confirmed was added to a 2-fold concentrated liquid medium. The liquid was re-inoculated with a 2-fold concentration of drug, and the MIC was measured after leaving the liquid at 20-37°C for another 1-6 days. The change in drug susceptibility (resistance) was confirmed from the change in MIC. An increase in MIC was designated resistance (+), no change in MIC was designated (±), and a decrease in MIC was designated (-).
[0049] (1-4. Evaluation of the stability of hydrogen peroxide) 100 mL of the composition was stored at 50°C for one month, and those with remaining available oxygen after storage of 95% or more were rated as ◯, those with remaining available oxygen of 50% or more but less than 95% were rated as △, and those with remaining available oxygen of less than 50% were rated as ×.
[0050] (2.Results) The results of the above evaluations are shown in Tables 1 to 6 below. Tables 1 to 5 show the results using Pseudomonas aeruginosa NBRC13736. As shown by Examples 1 to 8 in Table 1 and Comparative Examples 1 to 8 in Table 2, the MIC was significantly lowered by combining with hydrogen peroxide than by using the antibacterial component alone. Furthermore, as shown by Examples 7 and 8 in Table 1 and Comparative Example 9 in Table 2, the combined use of hydrogen peroxide and an antibacterial component had a lower MIC than hydrogen peroxide alone. Furthermore, as shown in Examples 1 and 9 in Table 1, the addition of a hydrogen peroxide stabilizer increased the residual rate of hydrogen peroxide, and as shown in Examples 8 and 10 in Table 1, the residual rate of hydrogen peroxide increased at pH 5 or lower.
[0051] Tables 3 and 4 show the change in drug susceptibility (resistance) evaluated based on the MIC when bacteria grown in liquid medium to which a drug had been added the first time were subcultured into liquid medium to which a drug had been added for the first time. As shown by Examples 1 to 8 in Table 3 and Comparative Examples 1 to 8 in Table 4, even when the antibacterial component alone showed resistance of (+) or (±) in the comparative examples, the antibacterial component and hydrogen peroxide used in combination showed resistance of (-). In other words, the antibacterial component and hydrogen peroxide used in combination prevented microorganisms from developing drug resistance. Table 5 shows that Example 1 was also evaluated on media other than the TSB medium as a type of dirt. As a result, the resistance was (-) in all cases, and the development of drug resistance in microorganisms was prevented.
[0052] Table 6 shows the results for the red yeast, Cladosporium sphaerospermum NBRC6348. For the red yeast, Cladosporium sphaerospermum NBRC6348, the MIC was significantly lowered by combining with hydrogen peroxide than by using the antibacterial component alone, as shown by the MICs of Example 1 and Comparative Example 1. For Example 1 and Comparative Example 1, the resistance was (+) or (±) when the antibacterial component was used alone in Comparative Example 1, but the resistance was (-) in Example 1, where the antibacterial component was used in combination with hydrogen peroxide. In other words, the development of drug resistance in microorganisms was prevented by combining the antibacterial component with hydrogen peroxide, as in the case of Pseudomonas aeruginosa NBRC13736.
[0053] [Table 1]
[0054] [Table 2]
[0055] [Table 3]
[0056] [Table 4]
[0057] [Table 5]
[0058] [Table 6]
[0059] According to the present invention, it is possible to provide a biofilm formation inhibitor composition that exerts an antibacterial effect even in a dirty environment and suppresses the decrease in drug sensitivity of microorganisms that occurs when the antibacterial component is used alone, thereby making it difficult for drug-resistant bacteria to develop even when used continuously on a daily basis. The composition can be used to inhibit the formation of biofilms even in dirty environments such as around water, for example.
Claims
1. A biofilm formation inhibitor composition comprising the following components (A) and (B): (A) Antibacterial components (excluding hydrogen peroxide or substances that generate hydrogen peroxide) (B) Hydrogen peroxide or something that generates hydrogen peroxide.
2. The composition according to claim 1 , wherein component (A) is an anionic surfactant used at a pH of 3 or less.
3. The composition according to claim 2, wherein the content of the anionic surfactant of the component (A) is 0.1 to 20 mass %.
4. The composition according to claim 1 , wherein component (A) is a cationic surfactant.
5. The composition according to claim 1, wherein the component (A) and the component (B) are contained in amounts such that their effective concentrations are: component (A): 0.1 to 20,000 ppm; and component (B): 0.1 to 5,000 ppm calculated as hydrogen peroxide.
6. The composition of claim 1 further comprising (C) a hydrogen peroxide stabilizer.
7. 2. The composition of claim 1, having a pH (25°C) of 5 or less.
8. The composition according to claim 1, which is used as an anti-slime agent in wet areas.
9. A disinfectant for biofilm-forming bacteria, comprising the composition according to claim 1.
10. 10. The composition of claim 1 having an antimicrobial effect against microorganisms, including fungi.
11. The composition according to claim 1, which is used for the purpose of preventing the transmission and / or spread of pathogenic microorganisms from wet areas.
Citation Information
Patent Citations
Biofilm formation inhibitor
JP2017218390A
Composition for inhibiting biofilm formation
JP6787828B2
Biofilm formation inhibitor and biofilm formation inhibition method
JP7211730B2