Microstructure transfer device and microstructure transfer method

Abstract

To provide a microstructure transfer device and a microstructure transfer method capable of transferring fine concave-convex patterns onto both sides of a substrate with high precision and high throughput.SOLUTION: A microstructure transfer device 1 includes a first sheet-like body 4U on which a pattern to be inverted and transferred to the front surface of a substrate 14 is formed, a second sheet-like body 4L on which a pattern to be inverted and transferred to the rear surface of the substrate 14 is formed, a substrate base that supports the substrate 14, the front and rear surfaces of which are coated with a photocurable resin, outside a pattern formation area, a first imprint roll 2U that faces the pattern-formed surface of the first sheet-like body 4U to the front surface of the substrate 14 and the pattern-formed surface of the second sheet-like body 4L to the rear surface of the substrate, and presses the first sheet-like body 4U against the front surface of the substrate 14, and a second imprint roll 2L that presses the second sheet-like body 4L against the rear surface of the substrate 14, and presses the first imprint roll 2U and the second imprint roll 2L with a predetermined pressure to invert-transfer the pattern to the front and rear surfaces of the substrate 14.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a fine structure transfer device and a fine structure transfer method for transferring a fine structure inversely onto both sides (front and back sides) of a substrate. [Background technology]

[0002] Ultraviolet / electron beam lithography, which is a microfabrication technique for exposure devices used in semiconductor manufacturing, has high equipment costs and complicated processes, and there are problems with improving the time and cost required for manufacturing. However, with the advancement of nanoimprint lithography (hereinafter referred to as NIL), which directly transfers a mold (also called a stamper or template) with a fine concave-convex pattern to a resin material, etc., fine patterns of the order of 10 nm to several hundreds of nm can be easily realized with simple equipment and processes, and the superiority of equipment prices and mass production costs has increased. For example, Patent Document 1 discloses a pattern transfer mold for transferring a concave-convex pattern to a transfer material, which includes a ring-shaped support base, a plurality of stampers arranged on the surface of the support base and having a concave-convex pattern for shaping on one surface, and an adhesive member for fixing the support base and the stamper. It is also described that the surface of the support base or the stamper that contacts the adhesive member has a plurality of recesses, and a portion of the adhesive member is filled in the recesses.

[0003] Patent Document 2 also discloses a fine structure transfer device 1, which includes an unwinder that winds up a flexible sheet-like body and unwinds the sheet-like body, a winder that winds up the sheet-like body transported through multiple guide rolls, a stage arranged between the unwinder and the winder on which a mold having a fine uneven pattern formed thereon and coated with a photocurable resin is placed, an imprint roll 2 that moves back and forth at least between both ends of the mold while pressing the sheet-like body against the mold from above, and a curing light irradiator that irradiates ultraviolet light to the sheet-like body pressed against the mold. It also describes that multiple replicas are continuously fixed to the sheet-like body. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2014-162111 A [Patent Document 2] Patent Publication No. 2021-28933 Summary of the Invention [Problem to be solved by the invention]

[0005] Currently, there is a growing need to print fine irregularities on AR (Augmented Reality) / VR (Virtual Reality) devices and glass surfaces to add value. Conventionally, film was formed on one side, but by applying irregularities on both sides (front and back), new functional improvements are expected.

[0006] However, in the above-mentioned Patent Documents 1 and 2, the concave-convex pattern is continuously formed on the surface (one side) of the substrate. When the concave-convex pattern is formed on each side, it is difficult to form a uniform film and align it with high precision. Furthermore, although FIG. 8 of Patent Document 1 shows an example of continuously forming a concave-convex pattern on both sides (front and back) of a substrate, no specific description is given of special problems, actions, effects, etc.

[0007] Therefore, the present invention provides a fine structure transfer device and a fine structure transfer method that can transfer a fine concave-convex pattern to both sides (front and back sides) of a substrate with high precision and improve throughput. [Means for solving the problem]

[0008] In order to solve the above-mentioned problems, the microstructure transfer device of the present invention comprises a first sheet-like body having a pattern to be inverted and transferred to the front surface of a substrate, a second sheet-like body having a pattern to be inverted and transferred to the back surface of the substrate, a substrate base that supports the substrate, the front and back surfaces of which are coated with a photocurable resin, outside a pattern formation area, a first imprint roll that faces the pattern forming surface of the first sheet-like body to the front surface of the substrate and faces the pattern forming surface of the second sheet-like body to the back surface of the substrate, and presses the first sheet-like body against the front surface of the substrate, and a second imprint roll that presses the second sheet-like body against the back surface of the substrate, and is characterized in that the first imprint roll and the second imprint roll are pressed together with a predetermined pressure to invert the pattern to the front and back surfaces of the substrate.

[0009] In addition, the microstructure transfer device of the present invention is characterized in that it is equipped with a control unit, and the control unit controls the pressing of the first imprint roll and the second imprint roll so that the pressure applied to the substrate by pressing the first imprint roll and the second imprint roll becomes a predetermined pressure.

[0010] The microstructure transfer device of the present invention is characterized in that it has a load measuring load cell installed below the second imprint roll and measures pressure as a load, and the control unit determines whether the pressure value measured by the load measuring load cell is within a predetermined allowable range, and adjusts the load applied to the first imprint roll and the second imprint roll based on the determination result.

[0011] The micropattern transfer device according to the present invention is characterized in that the control unit presses the first imprint roll and the second imprint roll simultaneously, thereby inverting and transferring the pattern onto the front and back surfaces of the substrate simultaneously.

[0012] The microstructure transfer method of the present invention is a method for transferring a microstructure using a microstructure transfer device comprising: a first sheet-like body having a pattern to be inverted and transferred to the front surface of a substrate; a second sheet-like body having a pattern to be inverted and transferred to the back surface of the substrate; a substrate base that supports the substrate, the front and back surfaces of which are coated with a photocurable resin, outside a pattern formation area; a first imprint roll that faces the pattern-forming surface of the first sheet-like body to the front surface of the substrate and the pattern-forming surface of the second sheet-like body to the back surface of the substrate, and presses the first sheet-like body against the front surface of the substrate; and a second imprint roll that presses the second sheet-like body against the back surface of the substrate, and is characterized in that the first imprint roll and the second imprint roll are pressed together with a predetermined pressure to invert the pattern to the front and back surfaces of the substrate.

[0013] Furthermore, the microstructure transfer method of the present invention is characterized in that it has a control unit, and the control unit controls the pressure of the first imprint roll and the second imprint roll so that the pressure applied to the substrate by pressing the first imprint roll and the second imprint roll becomes a predetermined pressure.

[0014] The microstructure transfer method of the present invention is characterized in that it has a load measuring load cell installed below the second imprint roll and measures pressure as a load, and the control unit determines whether the pressure value measured by the load measuring load cell is within a predetermined allowable range, and adjusts the load applied to the first imprint roll and the second imprint roll based on the determination result.

[0015] The fine structure transfer method according to the present invention is characterized in that the control unit presses the first imprint roll and the second imprint roll simultaneously to invert and transfer the pattern onto the front and back surfaces of the substrate simultaneously. Effect of the Invention

[0016] According to the present invention, it is possible to provide a fine structure transfer device and a fine structure transfer method that can transfer a fine concave-convex pattern to both sides (front and back sides) of a substrate with high precision and improve throughput. Specifically, the following is also possible: (1) In order to keep the imprint load on both sides constant, the load applied to the lower imprint roll is measured and fed back, making it possible to apply a uniform load to the pattern material attached to both sides of the substrate. (2) The imprint unit that runs in the length direction of the substrate (either vertically or horizontally) is mounted on a single running unit, so that there is no misalignment between the upper and lower rolls and a constant load can be applied to the substrate. (3) The material used for imprinting is mainly composed of a resin that hardens when exposed to UV light, and after imprinting, it is hardened by irradiating it with UV light. Compared to irradiating UV light on one side at a time, irradiating both sides simultaneously makes it possible to process the material at the same time, preventing overexposure. (4) Since a single device can process both sides simultaneously compared to processing each side individually, throughput is doubled and the equipment installation space can be reduced by half or less.

[0017] Problems, configurations and effects other than those described above will become apparent from the following description of the embodiments. [Brief description of the drawings]

[0018] [Figure 1] 1 is a side view showing a schematic configuration of a fine pattern transfer device according to a first embodiment of the present invention. [Diagram 2] 2 is a cross-sectional view of the fine structure transfer device shown in FIG. 1 taken along the line AA. [Diagram 3] FIG. 2 is a diagram showing the relationship between a gantry stand provided with an upper imprint roll (first imprint roll) and a lower imprint roll (second imprint roll), and a traveling unit. [Figure 4] 4 is a flowchart showing an operation flow of the micropattern transfer device according to the first embodiment of the present invention. [Figure 5A]11A and 11B are diagrams illustrating a positioning process performed by an imaging unit. [Figure 5B] 13A and 13B are diagrams showing a film clamp and imprint roll pressing process. [Figure 5C] 1A to 1C are diagrams illustrating nanoimprint operation steps. [Figure 5D] FIG. [Figure 5E] FIG. [Figure 6A] 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and showing the state when a marker added to a sheet is detected. FIG. [Figure 6B] 13A to 13C are diagrams showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and are diagrams showing the state during the positioning operation and the positioning confirmation. [Figure 6C] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and is a diagram showing the state when the film is clamped and the upstream guide roll is clamped. [Figure 6D] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when the imprint roll is lowered. [Figure 6E] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state at the start of pressing the imprint roll and the downstream guide roll. [Figure 6F] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when both the imprint roll and the downstream guide roll move downstream and apply pressure. [Figure 6G] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and is a diagram showing the state when the curing light irradiator is lowered. [Figure 6H] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating a state during irradiation with curing light. [Figure 6I] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when the film clamp is raised / retracted and both the imprint roll and the downstream guide roll start to move upstream. [Figure 6J] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating a state during peeling. [Figure 6K] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when both the imprint roll and the downstream guide roll start to move upstream. [Figure 7] FIG. 1 shows an overview of the process for forming a pattern on a substrate, in which (A) shows replica alignment, (B) shows pressing (imprinting), (C) shows curing light irradiation, (D) shows peeling, and (E) shows the completion of pattern formation on the glass substrate. [Figure 8] FIG. 11 is a cross-sectional view showing a schematic configuration of a fine pattern transfer device according to a second embodiment of the present invention. [Figure 9] 9 is an explanatory diagram of a replica set position, an imprint position, and a wafer carry-in / out position of the micropattern transfer device shown in FIG. 8. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0019] In this specification, a fine pattern region having a fine concave-convex pattern formed on one mold or on the surface of one mold is referred to as a "cell." In addition, in this specification, it is assumed that a plurality of replicas transferred from the same mold (metal mold) have already been fixed in cell units at a predetermined pitch to an upper sheet-like body (first sheet-like body) located at the top and a lower sheet-like body (second sheet-like body) located at the bottom, sandwiching the substrate as the transfer target body. Note that the sheet-like body used is one that transmits ultraviolet rays. In addition, in this specification, the substrate, which is the object onto which the fine uneven pattern is inversely transferred by replica, naturally includes substrates of various panel materials, such as wafers, glass substrates, and resin substrates or film substrates. Hereinafter, an embodiment of the present invention will be described with reference to the drawings. EXAMPLES

[0020] FIG. 1 is a side view showing a schematic configuration of a fine structure transfer device according to this embodiment, and FIG. 2 is a cross-sectional view of the fine structure transfer device shown in FIG. 1 taken along the line A-A. The white arrows in FIG. 1 indicate the conveying direction (supply direction) of the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L. The white arrows in FIG. 2 indicate the moving direction of the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L, and also indicate the direction in which the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L operate to bring the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L, to which a plurality of replicas have already been fixed in cell units at a predetermined pitch, into contact with both sides (front and back sides) of the substrate 14 by the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L.

[0021] As shown in FIG. 1, the microstructure transfer device 1 includes, from the upstream side, an upper unwinder 5U that winds up the unwound film (upper sheet-like body (first sheet-like body) 4U), an upper guide roll 3U that transports the upper sheet-like body (first sheet-like body) 4U sent out from the upper unwinder 5U, an upper dry cleaner 9U that blows air onto the upper sheet-like body (first sheet-like body) 4U to remove dust adhering to the film surface, two upper guide rolls 3U that transport the upper sheet-like body (first sheet-like body) 4U vertically downward, an upper upstream guide roll (upper first guide roll) 3aU that is arranged upstream of the upper imprint roll (first imprint roll) 2U described in detail below via an upper curing light irradiator 8U, the upper curing light irradiator 8U, the upper imprint roll (first imprint roll) 2U, and an upper downstream guide roll (upper second guide roll) 3bU that is adjacent to the upper imprint roll (first imprint roll) 2U and arranged downstream of it. In addition, here, the upper curing light irradiator 8U irradiates, for example, ultraviolet light (ultraviolet light) as the curing light.

[0022] The microstructure transfer device 1 includes an upper guide roll 3U that guides an upper sheet-like body (first sheet-like body) 4U passing through an upstream / downstream guide roll (upper second guide roll) 3bU vertically upward, an upper guide roll 3U that conveys the upper sheet-like body (first sheet-like body) 4U from the upper guide roll 3U to the downstream side at an incline and guides the upper sheet-like body (first sheet-like body) 4U vertically downward, and a replica formed when the upper sheet-like body (first sheet-like body) 4U passes through the upper guide roll 3U. The upper sheet-like body feeding mechanism is made up of an upper laser marker 10U that irradiates a laser to add markers at positions corresponding to the start and end of the fine pattern area, an upper dry cleaner 9U that blows air onto the upper sheet-like body (first sheet-like body) 4U to remove dust adhering to the film surface, two upper guide rolls 3U arranged below the upper dry cleaner 9U, an upper dancer roll 7U, an upper cleaning roll 12U, two upper guide rolls 3U, and an upper winder 6U that winds up the upper sheet-like body (first sheet-like body) 4U.

[0023] The upper cleaning roll 12U has a surface (outer peripheral surface) of the paired cleaning roll coated with glue or the like in advance, and the upper sheet-like body (first sheet-like body) 4U is sandwiched between the paired upper cleaning rolls 12U and passes through while in contact with the upper sheet-like body (first sheet-like body) 4U, thereby removing dust and the like attached to the surface of the upper sheet-like body (first sheet-like body) 4U. At this time, the replica, which will be described in detail later, is hardened and firmly fixed to the upper sheet-like body (first sheet-like body) 4U, so that the replica does not separate or peel off from the upper sheet-like body (first sheet-like body) 4U when passing through the paired upper cleaning roll 12U. In this embodiment, the microstructure transfer device 1 has an upper cleaning roll 12U, but the installation of the upper cleaning roll 12U may be optional. In other words, the configuration may be such that the upper cleaning roll 12U is not included.

[0024] The upper sheet-like body (first sheet-like body) 4U is flexible and has a property of transmitting light. The upper dancer roll 7U applies a predetermined tension to the conveyed upper sheet-like body (first sheet-like body) 4U by displacing left and right in FIG. 1, that is, back and forth in a horizontal plane. For example, even if the upper sheet-like body (first sheet-like body) 4U is sent out from the upper unwinder 5U at a predetermined feed amount (speed), based on the difference in diameter of each guide roll, the film may bend. However, the above-mentioned bending can be prevented by displacing the upper dancer roll 7U back and forth to adjust the tension of the upper sheet-like body (first sheet-like body) 4U.

[0025] Also, as shown in FIG. 1, the microstructure transfer device 1 includes, from the upstream side, a lower unwinder 5L that winds up the unwinding film (lower sheet-like body (second sheet-like body) 4L), a lower guide roll 3L that transports the lower sheet-like body (second sheet-like body) 4L sent out from the lower unwinder 5L, a lower dry cleaner 9L that blows air onto the lower sheet-like body (second sheet-like body) 4L to remove dust adhering to the surface, two lower guide rolls 3L that transport the lower sheet-like body (second sheet-like body) 4L vertically upward, a lower upstream guide roll (lower first guide roll) 3aL that is arranged upstream of the lower imprint roll (second imprint roll) 2L described in detail later via a lower curing light irradiator 8L, the lower curing light irradiator 8L, the lower imprint roll (second imprint roll) 2L, and a lower downstream guide roll (lower second guide roll) 3bL that is adjacent to the lower imprint roll (second imprint roll) 2L and arranged downstream of it. In addition, here, the lower curing light irradiator 8L irradiates, for example, ultraviolet light (ultraviolet light) as the curing light.

[0026] In addition, the microstructure transfer device 1 includes a lower guide roll 3L that guides a lower sheet-like body (second sheet-like body) 4L passing through a lower downstream guide roll (lower second guide roll) 3bL downward in the vertical direction, a lower guide roll 3L that conveys the lower sheet-like body (second sheet-like body) 4L downstream at an incline and guides the lower sheet-like body (second sheet-like body) 4L upward in the vertical direction, and a lower guide roll 3L that guides the lower sheet-like body (second sheet-like body) 4L upward in the vertical direction when the lower sheet-like body (second sheet-like body) 4L passes through the lower guide roll 3L. The lower laser marker 10L irradiates a laser to add markers to positions corresponding to the start and end of the fine pattern area formed on the replica, two lower guide rolls 3L arranged above a lower dry cleaner 9L that blows air onto the lower sheet-like body (second sheet-like body) 4L to remove dust adhering to the surface, a lower dancer roll 7L, a lower cleaning roll 12L, two lower guide rolls 3L, and a lower winder 6L that winds up the lower sheet-like body (second sheet-like body) 4L. These components constitute the lower sheet-like body feeding mechanism.

[0027] The lower cleaning roll 12L has a surface (outer circumferential surface) of the paired cleaning roll coated with glue or the like in advance, and the lower sheet-like body (second sheet-like body) 4L is sandwiched between the paired lower cleaning rolls 12L and passes through while in contact with them, thereby removing dust and the like attached to the surface of the lower sheet-like body (second sheet-like body) 4L. At this time, the replica, which will be described in detail later, is hardened and firmly fixed to the lower sheet-like body (second sheet-like body) 4L, so that the replica does not separate or peel off from the lower sheet-like body (second sheet-like body) 4L when passing through the paired lower cleaning roll 12L. In this embodiment, the microstructure transfer device 1 has a configuration having the lower cleaning roll 12L, but the installation of the lower cleaning roll 12L may be optional. In other words, the configuration may be one without the lower cleaning roll 12L.

[0028] The lower sheet-like body (second sheet-like body) 4L is flexible and has a property of transmitting light. The lower dancer roll 7L applies a predetermined tension to the conveyed lower sheet-like body (second sheet-like body) 4L by displacing left and right in FIG. 1, that is, back and forth in a horizontal plane. For example, even if the lower sheet-like body (second sheet-like body) 4L is fed from the lower unwinder 5L at a predetermined feed amount (speed), based on the difference in diameter of each guide roll, the film may bend. However, the above-mentioned bending can be prevented by displacing the lower dancer roll 7L back and forth to adjust the tension of the lower sheet-like body (second sheet-like body) 4L.

[0029] As shown in FIG. 2, the substrate 14 is supported by the substrate base 11 at a portion outside the fine pattern region. The fine structure transfer device 1 also includes an upper imprint roll vertical movement unit 51U that drives the upper imprint roll (first imprint roll) 2U up and down, a gantry upper frame 13U, a lower imprint roll vertical movement unit 51L that drives the lower imprint roll (second imprint roll) 2L up and down, a gantry lower frame 13L, and a load measurement load cell 52. The load measurement load cell 52 detects the load applied to the lower imprint roll (second imprint roll) 2L as a pressure. The detected pressure is sent to a control unit (not shown), which compares it with a predetermined pressure to feedback-control the movement amounts of the upper imprint roll vertical movement unit 51U and the lower imprint roll vertical movement unit 51L. The control unit (not shown) also controls the upper sheet-like material feed mechanism and the lower sheet-like material feed mechanism described above. Here, the control unit (not shown) is realized, for example, by a processor such as a CPU (not shown), a ROM for storing various programs, a RAM for temporarily storing data during the calculation process, and a storage device such as an external storage device, and the processor such as the CPU reads and executes the various programs stored in the ROM, and stores the calculation results that are the results of the execution in the RAM, an external storage device, or cloud storage via a network connection, etc.

[0030] Here, substrate 14 is loaded onto substrate pedestal 11 and unloaded from substrate pedestal 11 by a transport mechanism such as a robot arm (not shown). When substrate 14 is mounted on substrate pedestal 11, the movement of substrate 14 is restricted by a mechanism (not shown) for mechanically locking substrate 14 or by adsorbing substrate 14 to substrate pedestal 11 using a chuck (not shown) or the like.

[0031] Fig. 3 is a diagram showing the relationship between the gantry stand provided with an upper imprint roll (first imprint roll) and a lower imprint roll (second imprint roll), and the traveling unit. As shown in Fig. 3, while applying a load (at a predetermined pressure) to the upper imprint roll (first imprint roll) and the lower imprint roll (second imprint roll), the gantry stand 15 travels to the right in accordance with the length of the substrate 14 by the operation of a motor 22 constituting the traveling unit 21, thereby inverting and transferring a replica in which a fine pattern is formed on the substrate 14. The operation of the motor 22 constituting the traveling unit 21 is also controlled by the above-mentioned control unit (not shown).

[0032] [Operation of the microstructure transfer device] Fig. 4 is a flowchart showing the operation flow of the microstructure transfer device according to this embodiment. As shown in Fig. 4, when pressure feedback control is started in step S11, in step S12, a control unit (not shown) operates the upper imprint roll vertical movement unit 51U and the lower imprint roll vertical movement unit 51L to sandwich the substrate 14 between the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L. At this time, depending on production conditions such as target takt and positioning accuracy, there are cases where it is better to sandwich simultaneously or synchronously (when conditions are advantageous in terms of takt), and cases where it is better to sandwich sequentially at a predetermined timing (such as settling time) (when advantageous in terms of positioning accuracy).

[0033] In step S13, the load measuring load cell 52 measures the imprint load (imprint pressure) and transmits it to the control unit (not shown). In step S14, the control unit (not shown) compares the received measured imprint load (imprint pressure) with a preset load (predetermined pressure) to determine the difference. If the determined difference is smaller than the allowable value, proceed to step S16 to start imprinting. On the other hand, if the determined difference is larger than the allowable value, proceed to step S15 to finely adjust the torque of the upper imprint roll vertical movement unit 51U and the lower imprint roll vertical movement unit 51L, and return to step S13. Note that the left and right measurements of the load measuring load cell 52 are also compared with a preset load (predetermined pressure) to determine the difference. If the determined difference is larger than the allowable value, proceed to step S15 to finely adjust the torque of the left and right upper imprint roll vertical movement units 51U, and return to step S13 (first measurement).

[0034] When imprinting is started in step S16, in step S17, the load measuring load cell 52 measures the imprint load (imprint pressure), and the control unit (not shown) performs monitoring. In step S18, the control unit (not shown) compares the received measured imprint load (imprint pressure) with a preset load (predetermined pressure) to determine the difference. If the obtained difference is smaller than the allowable value, the process proceeds to step S20 to determine whether imprinting is complete. On the other hand, if the obtained difference is larger than the allowable value, the process proceeds to step S19 to fine-adjust the torque of the upper imprint roll vertical movement unit 51U and the lower imprint roll vertical movement unit 51L, and then returns to step S17. Note that the left and right measurements of the load measuring load cell 52 are also compared with a preset load (predetermined pressure) to determine the difference, and if the obtained difference is smaller than the allowable value, the process proceeds to step S20 to determine whether imprinting is complete. On the other hand, if the calculated difference is greater than the allowable value, the process proceeds to step S19, where the torques of the left and right upper imprint roll vertical movement units 51U are finely adjusted, and the process returns to step S17 (second measurement).

[0035] In step S20, if the control unit (not shown) determines that the imprinting is completed, the operation is terminated. On the other hand, if the control unit (not shown) determines that the imprinting is continuing, the process returns to step S17, and the above-mentioned operation is repeatedly executed.

[0036] [Operation of the microstructure transfer device when forming a pattern on a substrate] 5A to 5E show each process when the pattern fixed to the replica is reverse-transferred to the substrate 14. In the following description, the gantry stand 15 is omitted for convenience. In the alignment process by the imaging unit shown in FIG. 5A, the upstream / downstream guide roll (upper second guide roll) 3bU moves downstream while maintaining a predetermined distance from the surface of the substrate 14, while in contact with the upper sheet-like body (first sheet-like body) 4U, to a position beyond the end of the substrate 14. At the same time, the downstream guide roll (lower second guide roll) 3bL moves downstream while maintaining a predetermined distance from the surface of the substrate 14, while in contact with the lower sheet-like body (second sheet-like body) 4L, to a position beyond the end of the substrate 14. The upstream imaging section 17aU and the upstream imaging section 17bU move vertically above the upper sheet-like body (first sheet-like body) 4U to positions corresponding to the start of the fine pattern area on the surface of the replica (the upstream end in the conveying direction of the upper sheet-like body (first sheet-like body) 4U) and the end of the fine pattern area (the downstream end in the conveying direction of the upper sheet-like body (first sheet-like body) 4U). When the upstream imaging section 17aU and the upstream imaging section 17bU detect a marker added to the conveyed upper sheet-like body (first sheet-like body) 4U, the upper winder 6U stops the winding operation of the upper sheet-like body (first sheet-like body) 4U. At the same time or in synchronization, the downstream imaging section 17aL and the downstream imaging section 17bL move vertically below the lower sheet-like body (second sheet-like body) 4L to positions corresponding to the start of the fine pattern area on the surface of the replica (the upstream end in the conveying direction of the lower sheet-like body (second sheet-like body) 4L) and the end of the fine pattern area (the downstream end in the conveying direction of the upper sheet-like body (first sheet-like body) 4U). When the downstream imaging section 17aL and the downstream imaging section 17bL detect the markers added to the conveyed lower sheet-like body (second sheet-like body) 4L, the lower winder 6L stops the winding operation of the lower sheet-like body (second sheet-like body) 4L.

[0037] Next, in the film clamp and imprint roll pressing process shown in FIG. 5B, the upper film clamp 16U descends to clamp the upper sheet-like body (first sheet-like body) 4U. At the same time or in synchronization, the lower film clamp 16L ascends to clamp the lower sheet-like body (second sheet-like body) 4L. As a result, the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L are fixed via the substrate 14. In addition, the upper imprint roll (first imprint roll) 2U descends to contact the upper sheet-like body (first sheet-like body) 4U while maintaining a predetermined gap between the upper sheet-like body (first sheet-like body) 4U and the surface of the substrate 14. In this state, the upstream and downstream guide roll (upper second guide roll) 3bU moves upstream together with the upper guide roll 3U arranged vertically above, and stops at a position where it is a predetermined distance from the upper imprint roll (first imprint roll) 2U. Also, simultaneously or synchronously, the lower imprint roll (second imprint roll) 2L rises and comes into contact with the lower sheet-like body (second sheet-like body) 4L. In this state, the lower downstream guide roll (lower second guide roll) 3bL moves upstream together with the lower guide roll 3L disposed vertically below, and stops at a position where it is a predetermined distance from the lower imprint roll (second imprint roll) 2L. Note that the operation of simultaneously or synchronously clamping the substrate 14 with the upper and lower film clamps (16U, 16L) or the upper and lower imprint rolls (2U, 2L) is similar below.

[0038] In the nanoimprint operation process shown in Fig. 5C, the upper curing light irradiator 8U moves downstream at the same speed as the upstream / downstream guide roll (upper second guide roll) 3bU while pressing the upper imprint roll (first imprint roll) 2U. At this time, in the example shown in Fig. 5C, the upper curing light irradiator 8U moves so as to follow the upper imprint roll (first imprint roll) 2U, the upstream / downstream guide roll (upper second guide roll) 3bU, and the upper guide roll 3U disposed vertically above them. The upper imprint roll (first imprint roll) 2U moves downstream at the same speed as the upstream / downstream guide roll (upper second guide roll) 3bU, and thus their positional relationship, i.e., the distance, is kept constant, so that the path length of the upper sheet-like body (first sheet-like body) 4U does not change, and even if the upper imprint roll (first imprint roll) 2U moves while pressing the upper sheet-like body (first sheet-like body) 4U, the tension applied to the upper sheet-like body (first sheet-like body) 4U does not fluctuate. That is, a replica having a fine concave-convex pattern fixed to the upper sheet-like body (first sheet-like body) 4U on a substrate 14 previously coated with a photocurable resin is pressed against the photocurable resin on the surface of the substrate 14 by the upper imprint roll (first imprint roll) 2U, and moves downstream at the same speed as the downstream guide roll (lower second guide roll) 3bL. At the same time or in synchronization with the lower imprint roll (second imprint roll) 2L, the lower curing light irradiator 8L moves downstream at the same speed as the upstream / downstream guide roll (upper second guide roll) 3bU. At this time, in the example shown in Fig. 5C, the lower curing light irradiator 8L moves so as to follow the lower imprint roll (second imprint roll) 2L, the downstream guide roll (lower second guide roll) 3bL, and the lower guide roll 3L arranged vertically below them. As the lower imprint roll (second imprint roll) 2L moves downstream at the same speed as the downstream guide roll (lower second guide roll) 3bL, the positional relationship between them, i.e., the distance, is maintained constant, so that the path length of the lower sheet-like body (second sheet-like body) 4L does not change, and even if the lower imprint roll (second imprint roll) 2L moves while pressing the lower sheet-like body (second sheet-like body) 4L, the tension applied to the lower sheet-like body (second sheet-like body) 4L does not fluctuate.That is, a replica having a fine concave-convex pattern fixed to a lower sheet-like body (second sheet-like body) 4L on a substrate 14 previously coated with a photocurable resin is pressed against the photocurable resin on the back surface of the substrate 14 by a lower imprint roll (second imprint roll) 2L, while moving downstream at the same speed as the lower downstream guide roll (lower second guide roll) 3bL.

[0039] In the curing light irradiation step shown in Fig. 5D, as described above, the upper curing light irradiator 8U moves downstream to follow the upper imprint roll (first imprint roll) 2U, so that it moves downstream while irradiating ultraviolet light (curing light), and the replica having the fine pattern region is fixed to the photocurable resin pre-applied on the surface of the substrate 14 in cooperation with the pressing force of the upper imprint roll (first imprint roll) 2U. As a result, the fine concave-convex pattern formed on the surface of the replica is inversely transferred to the photocurable resin pre-applied on the surface of the substrate 14. Therefore, in this embodiment, the nanoimprint operation step and the curing light irradiation step are performed simultaneously. At the same time or synchronized, the lower curing light irradiator 8L moves toward the downstream side to follow the lower imprint roll (second imprint roll) 2L, and therefore moves downstream while irradiating ultraviolet light (curing light), and the replica having the fine pattern area is fixed to the photocurable resin pre-applied to the back surface of the substrate 14 in cooperation with the pressing force of the lower imprint roll (second imprint roll) 2L.

[0040] 5E, the upper imprint roll (first imprint roll) 2U moves upstream at the same speed as the upstream / downstream guide roll (upper second guide roll) 3bU and the upper guide roll 3U arranged vertically above it, thereby peeling the replica from the substrate 14 while the replica adhered to the upper sheet-like body (first sheet-like body) 4U is in a uniform state, thereby forming a fine concave-convex pattern on the surface of the substrate 14. At the same time or in synchronization with this, the lower imprint roll (second imprint roll) 2L moves upstream at the same speed as the downstream guide roll (lower second guide roll) 3bL and the lower guide roll 3L arranged vertically below it, thereby peeling the replica from the substrate 14 while the replica adhered to the lower sheet-like body (second sheet-like body) 4L is in a uniform state, thereby forming a fine concave-convex pattern on the back surface of the substrate 14. As described above, it is possible to simultaneously form the fine concave-convex pattern formed as a replica on the front and back surfaces (both surfaces) of the substrate 14.

[0041] Next, the operation of the upper upstream guide roll (upper first guide roll) 3aU, the upper imprint roll (first imprint roll) 2U, and the upper downstream guide roll (upper second guide roll) 3bU constituting the upper sheet-like material feed mechanism, and the operation of the lower upstream guide roll (lower first guide roll) 3aL, the lower imprint roll (second imprint roll) 2L, and the lower downstream guide roll (lower second guide roll) 3bL constituting the lower sheet-like material feed mechanism will be described in detail with reference to Figs. 6A to 6K. As shown in Fig. 6A, the upper upstream guide roll (upper first guide roll) 3aU moves downstream and stops at a position beyond the downstream end of the substrate 14. At this time, the distance L1 between the axial centers of the upper upstream guide roll (upper first guide roll) 3aU and the upper downstream guide roll (upper second guide roll) 3bU is, for example, 4000 mm. The length L2 of the fine pattern area, which is the area where the fine concave-convex pattern formed on the replica exists on the surface of the substrate 14, is, for example, 65 inches. Two upstream imaging units 17aU and two upstream imaging units 17bU are positioned vertically above the upper sheet-like body (first sheet-like body) 4U transported between the upstream guide roll (upper first guide roll) 3aU, the upper imprint roll (first imprint roll) 2U, and the upstream and downstream guide roll (upper second guide roll) 3bU, and detect markers at positions corresponding to the start and end of the fine pattern area of ​​the replica, which are formed in advance on the upper sheet-like body (first sheet-like body) 4U by the upper laser marker 10U. The upper sheet-like body (first sheet-like body) 4U is transported at a pitch by the drive of the upper winder 6U by a length corresponding to one cell. Simultaneously or synchronously, two downstream upstream imaging units 17aL and two downstream downstream imaging units 17bL are positioned vertically below the lower sheet-like body (second sheet-like body) 4L, which is transported between the lower upstream guide roll (lower first guide roll) 3aL, the lower imprint roll (second imprint roll) 2L and the lower downstream guide roll (lower second guide roll) 3bL, and detect markers at positions corresponding to the start and end of the fine pattern area of ​​the replica, which are formed in advance on the lower sheet-like body (second sheet-like body) 4L by the lower laser marker 10L.The lower sheet-like body (second sheet-like body) 4L is pitch-fed by the drive of a lower winder 6L over a length corresponding to one cell.

[0042] As shown in FIG. 6B, when four markers are detected by the upstream-side imaging unit 17aU and the downstream-side imaging unit 17bU, the four markers are positioned by the upper sheet-like material feed mechanism so that the four markers overlap with the start and end of the fine pattern area of ​​the substrate 14, based on the four detected markers. The positioning is also confirmed based on the images captured by the upstream-side imaging unit 17aU and the downstream-side imaging unit 17bU. Similarly, when four markers are detected by the downstream-side imaging unit 17aL and the downstream-side imaging unit 17bL, the four markers are positioned by the lower sheet-like material feed mechanism so that the four markers overlap with the start and end of the fine pattern area of ​​the substrate 14, based on the four detected markers. The positioning result is also confirmed based on the images captured by the downstream-side imaging unit 17aL and the downstream-side imaging unit 17bL. Positioning by the sheet feed mechanism is performed in the X direction (imprint direction) by micro-transport by the unwinder and winder, in the Y direction (direction perpendicular to the imprint direction) by linear motors (not shown) provided in the unwinding mechanism and winding mechanism, and in the Θ direction (rotation direction) by an unwinding angle adjustment mechanism (not shown) and a winding angle adjustment mechanism (not shown) provided in the unwinding mechanism and winding mechanism, respectively.

[0043] Once positioning is complete, as shown in Fig. 6C, an upper film clamp 16U having a substantially L-shaped vertical cross section presses and clamps the upper sheet-like body (first sheet-like body) 4U against the front surface of the substrate 14. It also clamps the upper upstream guide roll (upper first guide roll) 3aU. Similarly, a lower film clamp 16L having a substantially L-shaped vertical cross section presses and clamps the lower sheet-like body (second sheet-like body) 4L against the rear surface of the substrate 14. It also clamps the lower upstream guide roll (lower first guide roll) 3aL.

[0044] Next, as shown in FIG. 6D, the upper imprint roll (first imprint roll) 2U descends, and as shown in FIG. 6E, the upstream / downstream guide roll (upper second guide roll) 3bU, which had been stopped at a position beyond the downstream end of the substrate 14, moves upstream to be in a predetermined positional relationship with the upper imprint roll (first imprint roll) 2U. At this time, the upstream / downstream guide roll (upper second guide roll) 3bU is positioned vertically above the upper imprint roll (first imprint roll) 2U and vertically above the upper upstream guide roll (upper first guide roll) 3aU. Therefore, the upper sheet-like body (first sheet-like body) 4U that hangs on the upstream / downstream guide roll (upper second guide roll) 3bU from the position pressed by the upper imprint roll (first imprint roll) 2U forms a predetermined angle with the surface of the substrate 14. Similarly, the lower imprint roll (second imprint roll) 2L rises, and as shown in FIG. 6E, the lower downstream guide roll (lower second guide roll) 3bL, which had been stopped at a position beyond the downstream end of the substrate 14, moves upstream to be in a predetermined positional relationship with the lower imprint roll (second imprint roll) 2L. At this time, the lower downstream guide roll (lower second guide roll) 3bL is positioned vertically lower than the lower imprint roll (second imprint roll) 2L and vertically lower than the lower upstream guide roll (lower first guide roll) 3aL. Therefore, the lower sheet-like body (second sheet-like body) 4L that is hung on the lower downstream guide roll (lower second guide roll) 3bL from the position pressed by the lower imprint roll (second imprint roll) 2L forms a predetermined angle with the rear surface of the substrate 14.

[0045] As shown in Fig. 6F, the upper imprint roll (first imprint roll) 2U moves to a position beyond the downstream end of the substrate 14 at a constant speed with the upstream / downstream guide roll (upper second guide roll) 3bU while pressing the upper sheet-like body (first sheet-like body) 4U. As the upper imprint roll (first imprint roll) 2U and the upstream / downstream guide roll (upper second guide roll) 3bU move at a constant speed, their positional relationship remains constant as they move downstream, and thus no fluctuation occurs in the tension applied to the upper sheet-like body (first sheet-like body) 4U. Here, for example, the movement speed of the upper imprint roll (first imprint roll) 2U and the upstream / downstream guide roll (upper second guide roll) 3bU is 150 mm / s. Similarly, the lower imprint roll (second imprint roll) 2L moves to a position beyond the downstream end of the substrate 14 at a constant speed with the downstream guide roll (lower second guide roll) 3bL while pressing the lower sheet-like body (second sheet-like body) 4L. Since the lower imprint roll (second imprint roll) 2L and the downstream guide roll (lower second guide roll) 3bL move at a constant speed, their positional relationship remains constant as they move downstream, and therefore no fluctuation occurs in the tension applied to the lower sheet-like body (second sheet-like body) 4L. Here, for example, the movement speed of the lower imprint roll (second imprint roll) 2L and the downstream guide roll (lower second guide roll) 3bL is 150 mm / s.

[0046] Next, as shown in FIG. 6G, the upper curing light irradiator 8U descends to just above the upper film clamp 16U. Then, the upper curing light irradiator 8U irradiates ultraviolet light (curing light) from above the upper sheet-like body (first sheet-like body) 4U to the photocurable resin that has been applied in advance to the fine pattern region on the surface of the substrate 14 and that has been fixed to the upper sheet-like body (first sheet-like body) 4U by the pressing force of the upper imprint roll (first imprint roll) 2U, and moves to the vicinity of the upper imprint roll (first imprint roll) 2U located at a position beyond the downstream end of the substrate 14 (FIG. 6H). This causes the photocurable resin to harden, and the fine concave-convex pattern formed on the replica fixed to the upper sheet-like body (first sheet-like body) 4U is inverted and transferred to the surface of the substrate 14. Similarly, the lower curing light irradiator 8L ascends to just above the lower film clamp 16L. The lower curing light irradiator 8L irradiates ultraviolet light (curing light) from below the lower sheet-like body (second sheet-like body) 4L to the photocurable resin that has been applied in advance to the fine pattern region on the back surface of the substrate 14, and the replica that has been fixed to the lower sheet-like body (second sheet-like body) 4L by the pressing force of the lower imprint roll (second imprint roll) 2L, and moves to the vicinity of the lower imprint roll (second imprint roll) 2L located at a position beyond the downstream end of the substrate 14 (FIG. 6H). This causes the photocurable resin to harden, and the fine concave-convex pattern formed on the replica that has been fixed to the lower sheet-like body (second sheet-like body) 4L is inverted and transferred to the surface of the substrate 14. Note that, although the operation of the curing light irradiator after the imprint operation is completed has been described here, The operation of the curing light irradiator may be performed simultaneously with the imprint operation.

[0047] As shown in FIG. 6I, the upper film clamp 16U then rises and retreats from the substrate 14. Then, the upper imprint roll (first imprint roll) 2U starts to move upstream at a constant speed together with the upstream / downstream guide roll (upper second guide roll) 3bU. As shown in FIG. 6J, the upper imprint roll (first imprint roll) 2U moves upstream at a constant speed together with the upstream / downstream guide roll (upper second guide roll) 3bU, so that the replica fixed to the upper sheet-like body (first sheet-like body) 4U is peeled off from the fine concave-convex pattern formed on the surface of the substrate 14 in a uniform state. The upper upstream guide roll (upper first guide roll) 3aU continues to be clamped until the upper imprint roll (first imprint roll) 2U reaches the vicinity of the upstream end of the substrate 14. Similarly, the lower film clamp 16L descends and retreats from the substrate 14. Then, the lower imprint roll (second imprint roll) 2L starts to move upstream at a constant speed together with the downstream guide roll (lower second guide roll) 3bL. As shown in Fig. 6J, the lower imprint roll (second imprint roll) 2L moves upstream at a constant speed together with the downstream guide roll (lower second guide roll) 3bL, so that the replica fixed to the lower sheet-like body (second sheet-like body) 4L is peeled off in a uniform state from the fine concave-convex pattern formed on the rear surface of the substrate 14. The lower upstream guide roll (lower first guide roll) 3aL continues to be clamped until the lower imprint roll (second imprint roll) 2L reaches the vicinity of the upstream end of the substrate 14. Finally, as shown in Figure 6K, when the upper imprint roll (first imprint roll) 2U reaches the vicinity of the upstream end of the substrate 14, the upper upstream guide roll (upper first guide roll) 3aU is released from the clamp, the upper imprint roll (first imprint roll) 2U and the upper downstream guide roll (upper second guide roll) 3bU rise, and the replica of one cell fixed to the upper sheet-like body (first sheet-like body) 4U is inverted and transferred onto the surface of the substrate 14.Similarly, when the lower imprint roll (second imprint roll) 2L reaches the vicinity of the upstream end of the substrate 14, the lower upstream guide roll (lower first guide roll) 3aL is released from the clamp, the lower imprint roll (second imprint roll) 2L and the lower downstream guide roll (lower second guide roll) 3bL descend, and the replica of one cell fixed to the lower sheet-like body (second sheet-like body) 4L is inverted and transferred to the back surface of the substrate 14.

[0048] 7 is a diagram showing an overview of the process when forming a pattern on a glass substrate, where (A) is replica alignment, (B) is pressing (imprinting), (C) is curing light irradiation, (D) is peeling, and (E) is a diagram showing the completion of pattern formation on the glass substrate. In FIG. 7(A), the replica 20 fixed to the upper sheet-like body (first sheet-like body) 4U and the replica 20 fixed to the lower sheet-like body (second sheet-like body) 4L are aligned with the substrate 15 on which the front and back surfaces (both sides) are coated with a photocurable resin 19 in advance. After that, in FIG. 8(B), the replica 20 fixed to the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L, respectively, are moved downstream while being pressed against the substrate 14 on which the resin 19 is applied by the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L. In Fig. 8(C), ultraviolet light (ultraviolet light) is irradiated from the upper curing light irradiator 8U and the lower curing light irradiator 8L to the resin 19 on the substrate 15 (front and back surfaces) through the replica 20 fixed to the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L, while the upper curing light irradiator 8U and the lower curing light irradiator 8L move downstream. In Fig. 8(D), the upper imprint roll (first imprint roll) 2U and the lower imprint roll (second imprint roll) 2L move upstream, whereby the replica 20 fixed to the upper sheet-like body (first sheet-like body) 4U and the lower sheet-like body (second sheet-like body) 4L are peeled off from the front and back surfaces of the substrate 14 having the cured resin 19. In FIG. 8(E), the replica 20 fixed to the sheet-like body (film) 4 is completely peeled off from the glass substrate 15, thereby forming a fine concave-convex pattern of the replica on the glass substrate 15.

[0049] As described above, according to this embodiment, it is possible to provide a fine structure transfer device and a fine structure transfer method that can transfer fine concave-convex patterns on both sides (front and back) of a substrate with high precision and improve throughput. Specifically, it is possible to simultaneously reverse-transfer a replica having a fine concave-convex pattern onto both sides (front and back) of a substrate using an upper imprint roll (first imprint roll) 2U and a lower imprint roll (second imprint roll) 2L.

[0050] More specifically, this embodiment also makes the following possible. (1) In order to keep the imprint load on both sides constant, the load applied to the lower imprint roll is measured and fed back, making it possible to apply a uniform load to the pattern material attached to both sides of the substrate. (2) The imprint unit that runs in the length direction of the substrate (either vertically or horizontally) is mounted on a single running unit, so that there is no misalignment between the upper and lower rolls and a constant load can be applied to the substrate. (3) The material used for imprinting is mainly composed of a resin that hardens when exposed to UV light, and after imprinting, it is hardened by irradiating it with UV light. Compared to irradiating UV light on one side at a time, irradiating both sides simultaneously makes it possible to process the material at the same time, preventing overexposure. (4) Since a single device can process both sides simultaneously compared to processing each side individually, throughput is doubled and the equipment installation space can be reduced by half or less. EXAMPLES

[0051] Fig. 8 is a cross-sectional view showing a schematic configuration of a fine structure transfer device according to this embodiment, and Fig. 9 is an explanatory diagram of the replica set position, imprint position, and wafer load / unload position of the fine structure transfer device shown in Fig. 8. This embodiment differs from the first embodiment in that a linear motor 53 for substrate pedestal travel is provided on the substrate pedestal 11, and that a drive motor 23 is provided in addition to the motor 22 in the travel unit 21a. The same components as those in the first embodiment are given the same reference numerals, and duplicated explanations will be omitted below.

[0052] 8, the microstructure transfer device 1a according to this embodiment includes a substrate base 11 that supports the substrate 14 from below outside the region where the micropattern is formed, a substrate base traveling linear motor 53 connected to the substrate base 11, an upper imprint roll (first imprint roll) 2U, an upper imprint roll vertical movement unit 51U, a lower imprint roll (second imprint roll) 2L, a lower imprint roll vertical movement unit 51L, a load measuring load cell 52, and a traveling unit 21a. The traveling unit 21a functions as a drive mechanism that moves the gantry in a predetermined direction by a motor 22 therein. The traveling unit 21a also includes a drive motor 23, and functions as a drive mechanism that moves the gantry in a direction perpendicular to the predetermined direction of the gantry by the motor 22 within the same plane.

[0053] 9, the linear motor 53 for traveling the substrate pedestal has the function of positioning the substrate pedestal 11 at a replica set position for the substrate pedestal 11, an imprint position where the fine concave-convex pattern formed on the replica 20 is inverted and transferred to both sides (front and back) of the substrate 14 by an upper imprint roll (first imprint roll) 2U and a lower imprint roll (second imprint roll) 2L, and a load / unload position for a wafer as an example of a substrate 14. It is also possible to unload the wafer from the replica set position, making it possible to change the production line from a U-shaped layout to a linear layout.

[0054] As described above, according to this embodiment, in addition to the effects of the first embodiment, it is possible to suitably position the substrate pedestal 11, and it is also possible to improve productivity.

[0055] The present invention is not limited to the above-mentioned embodiment, but includes various modified examples. For example, the above-mentioned embodiment has been described in detail to easily explain the present invention, and the present invention is not necessarily limited to those including all of the configurations described. In addition, it is possible to replace a part of the configuration of one embodiment with the configuration of another embodiment, and it is also possible to add the configuration of another embodiment to the configuration of one embodiment. [Explanation of symbols]

[0056] 1, 1a...Microstructure transfer device 2U…Upper imprint roll (first imprint roll) 2L…Lower imprint roll (second imprint roll) 3U…Upper guide roll 3L…Lower guide roll 3aU…Upper upstream guide roll (upper first guide roll) 3aL…Lower upstream guide roll (lower first guide roll) 3bU…Upstream / downstream guide roll (upper second guide roll) 3bL…Downstream guide roll (lower second guide roll) 4U: Upper sheet body (first sheet body) 4L…Lower sheet body (second sheet body) 5U…Upper winder 5L…Lower winding machine 6U…Upper winder 6L…Lower winding machine 7U…Upper dancer roll 7L…Lower dancer roll 8U…Top curing light irradiator 8L…Lower curing light irradiator 9U…Upper dry cleaner 9L…Dry cleaner underneath 10U…Upper laser marker 10L…Lower laser marker 11...Board base 12U…Upper cleaning roll 12L…Lower cleaning roll 13U…Gantry upper frame 13L…Gantry lower frame 14...Substrate 15…Gantry stand 16U…Upper film clamp 16L…Lower film clamp 17aU...Upstream upstream imaging section 17aL…Downstream upstream imaging section 17bU…Upstream / downstream imaging section 17bL…Downstream side imaging section 18... Imaging unit support section 19…Resin 20…Replica 21, 21a…Travel unit 22…Motor 23...Drive motor 51U: Upper imprint roll vertical movement unit 51L…Lower imprint roll vertical movement unit 52...Load cell for measuring load 53...Linear motor for moving the substrate base

Claims

1. a first sheet-like body having a pattern to be inversely transferred onto a surface of a substrate; a second sheet-like body having a pattern to be inverted and transferred onto the rear surface of the substrate; a substrate base that supports the substrate having a photocurable resin applied to its front and back surfaces outside a pattern formation region; a first imprint roll that faces a pattern-formed surface of the first sheet-like body against a front surface of the substrate and faces a pattern-formed surface of the second sheet-like body against a rear surface of the substrate, and presses the first sheet-like body against the front surface of the substrate; and a second imprint roll that presses the second sheet-like body against the rear surface of the substrate, A fine pattern transfer apparatus, comprising: a first imprint roll and a second imprint roll that are pressed against each other with a predetermined pressure, thereby transferring a pattern inversely onto the front and rear surfaces of the substrate.

2. 2. The micropattern transfer apparatus according to claim 1, A control unit is provided, A microstructure transfer apparatus characterized in that the control unit controls the pressure of the first imprint roll and the second imprint roll so that the pressure applied to the substrate by pressing the first imprint roll and the second imprint roll becomes a predetermined pressure.

3. 3. The micropattern transfer apparatus according to claim 2, a load cell for measuring a load, the load cell being disposed below the second imprint roll and measuring a pressure as a load; The control unit determines whether the pressure value measured by the load measuring load cell is within a predetermined allowable range, and adjusts the load applied to the first imprint roll and the second imprint roll based on the determination result.

4. 4. The micropattern transfer apparatus according to claim 3, The control unit presses the first imprint roll and the second imprint roll simultaneously to inversely transfer a pattern onto the front and back surfaces of the substrate.

5. A method for transferring a fine structure using a fine structure transfer device, the method comprising: a first sheet-like body having a pattern to be inverted and transferred to a front surface of a substrate; a second sheet-like body having a pattern to be inverted and transferred to a rear surface of the substrate; a substrate base that supports the substrate, the front surface and rear surface of which are coated with a photocurable resin, outside a pattern formation region; a first imprint roll that faces the pattern-formed surface of the first sheet-like body to the front surface of the substrate and faces the pattern-formed surface of the second sheet-like body to the rear surface of the substrate, and presses the first sheet-like body against the front surface of the substrate; and a second imprint roll that presses the second sheet-like body against the rear surface of the substrate, A method for transferring a fine structure, comprising pressing the first imprint roll and the second imprint roll with a predetermined pressure to inversely transfer a pattern onto the front and back surfaces of the substrate.

6. The method for transferring a fine structure according to claim 5, A method for transferring a microstructure, comprising: a control unit; and the control unit controls the pressure of the first imprint roll and the second imprint roll so that the pressure applied to the substrate by pressing the first imprint roll and the second imprint roll becomes a predetermined pressure.

7. The method for transferring a fine structure according to claim 6, a load cell for measuring a load, the load cell being disposed below the second imprint roll and measuring a pressure as a load; A method for transferring a fine structure, characterized in that the control unit determines whether the pressure value measured by the load measuring load cell is within a predetermined allowable range, and adjusts the load applied to the first imprint roll and the second imprint roll based on the determination result.

8. The method for transferring a fine structure according to claim 7, A method for transferring a fine structure, characterized in that the control unit presses the first imprint roll and the second imprint roll simultaneously to inversely transfer a pattern onto the front and back surfaces of the substrate.

9. a sheet-like body having a pattern to be transferred onto one surface of a substrate; Another sheet-like body having a pattern to be transferred to the other surface of the substrate; one imprint roll that presses the substrate, both sides of which are coated with a photocurable resin, against a sandwiching body that sandwiches the sides on which the pattern is formed by the one and other sheet-like bodies so that the sandwiching body faces the one sheet-like body; and Another imprint roll is disposed opposite the one imprint roll and presses the other sheet-like body from the side of the other imprint roll; a first drive mechanism that uses one of the two imprint rolls as a reference, moves the other imprint roll closer to each other in the Z-axis direction, and aligns the one sheet-like body in the XYΘ direction; and a second drive mechanism that aligns the other sheet-like body in the XYΘ direction. A micropattern transfer device comprising: a control unit that drives and controls the first drive mechanism and the second drive mechanism so that the clamping body is clamped between one imprint roll and the other imprint roll simultaneously or synchronously.

10. a sheet-like body having a pattern to be transferred onto one surface of a substrate; Another sheet-like body having a pattern to be transferred to the other surface of the substrate; one imprint roll that presses the substrate, both sides of which are coated with a photocurable resin, against a sandwiching body that sandwiches the sides on which the pattern is formed by the one and other sheet-like bodies so that the sandwiching body faces the one sheet-like body; and Another imprint roll is disposed opposite the one imprint roll and presses the other sheet-like body from the side of the other imprint roll; a first drive mechanism that uses one of the two imprint rolls as a reference, moves the other imprint roll closer to each other in the Z-axis direction, and aligns the one sheet-like body in the XYΘ direction; and a second drive mechanism that aligns the other sheet-like body in the XYΘ direction. a control unit that drives and controls the first driving mechanism and the second driving mechanism so as to sequentially sandwich the clamping body between one imprint roll and the other imprint roll.

Images