Specimen analyzer and cleaning method

Abstract

To increase the degree of B / F separation and reduce carry-overs.SOLUTION: A parallel cleaning subsystem 74 comprises a cleaning nozzle set 75, a transport mechanism for transporting the cleaning nozzle set 75, and a nozzle cleaning facility 103. The nozzle cleaning set 75 is constituted by two cleaning nozzles 76, 78 that alternately execute B / F cleaning. In a first parallel cleaning step, B / F cleaning by a cleaning nozzle 76 and nozzle cleaning on a cleaning nozzle 78 are executed simultaneously. In the next parallel cleaning step, nozzle cleaning on the cleaning nozzle 76 and B / F cleaning by the cleaning nozzle 78 are executed simultaneously.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a sample analyzer and a cleaning method, and in particular to a technique for B / F separation. [Background technology]

[0002] A sample analyzer is a device that analyzes samples such as blood and urine collected from a subject. One type of sample analyzer known is an immunoassay device. An immunoassay device is a device that measures a target substance in a sample by utilizing an immune reaction (antigen-antibody reaction). In an immunoassay device, washing for B / F separation (hereinafter referred to as B / F washing) is performed after the immune reaction.

[0003] More specifically, B / F separation is a process for separating substances bound to the solid phase (Bound) from substances not bound to the solid phase (Free) after an immune reaction. The degree of separation can be called the B / F separation degree. It is necessary to perform B / F washing to increase the B / F separation degree.

[0004] Generally, magnetic particles are used as the solid phase. An antibody (or antigen) is fixed to the surface of each magnetic particle, and the antigen (or antibody) in the sample binds to the antibody (or antigen). This forms an immune complex. During B / F washing, a washing solution is injected into the reaction vessel while the magnetic particles (i.e., immune complex) are captured in the reaction vessel by magnetic force, and the washing solution is then aspirated from the reaction vessel, thereby removing unreacted substances from the reaction vessel. In other words, only the unreacted substances are washed away.

[0005] In an immunoassay device, B / F cleaning is performed by a B / F cleaning system equipped with a cleaning nozzle. A typical cleaning nozzle is composed of a discharge nozzle and a suction nozzle. The B / F cleaning system has a nozzle cleaning device that cleans the cleaning nozzle after use.

[0006] An immunoassay device operates according to a cycle time, which is a basic unit of time. In a typical immunoassay device, a B / F cleaning process and a subsequent (or preceding) nozzle cleaning process are set within one cycle time. The nozzle cleaning equipment is not functioning during the period when the B / F cleaning process is being performed. B / F cleaning cannot be performed during the period when the nozzle cleaning process is being performed.

[0007] Patent Document 1 discloses a B / F cleaning unit and a nozzle cleaning equipment. The B / F cleaning unit has one cleaning nozzle attached to a movable arm. The nozzle cleaning equipment is equipment for cleaning used cleaning nozzles. Patent Document 1 does not disclose a configuration for simultaneously performing B / F cleaning and nozzle cleaning.

[0008] Patent Document 2 describes simultaneous container washing by the first nozzle and washing of the second nozzle, and simultaneous container washing by the second nozzle and washing of the first nozzle. In container washing by the first nozzle, a washing liquid is discharged into the specimen container and washing liquid is aspirated from the specimen container. In container washing by the second nozzle, remaining liquid (reaction liquid, washing liquid) in the specimen container is aspirated. That is, one container washing process is completed through container washing by the first nozzle and container washing by the second nozzle (i.e., through two stages of container washing). Patent Document 2 does not disclose a configuration for B / F washing, in particular a washing nozzle set consisting of multiple washing nozzles that sequentially perform B / F washing. [Prior art documents] [Patent documents]

[0009] [Patent Document 1] JP 2015-215277 A [Patent Document 2] JP 2010-175414 A Summary of the Invention [Problem to be solved by the invention]

[0010] In order to increase the reliability of analysis results in a sample analyzer, it is necessary to improve the B / F separation degree (which may also be called the B / F cleaning quality) and to reduce contamination mediated by the cleaning nozzle for B / F cleaning (hereinafter referred to as "carry-over").However, when the B / F cleaning process and the nozzle cleaning process are performed sequentially within one cycle time, the time allocated to each process (specifically, the B / F cleaning time and the nozzle cleaning time) inevitably becomes short.

[0011] It should be noted that if one of the B / F cleaning process and the nozzle cleaning process is assigned to a certain cycle time, and the other of the B / F cleaning process and the nozzle cleaning process is assigned to the next cycle time, both the B / F cleaning time and the nozzle cleaning time can be increased. However, in that case, another problem occurs, that is, the number of samples that can be processed per unit time (hereinafter referred to as throughput) decreases.

[0012] An object of the present invention is to improve B / F separation and reduce carryover in a sample analyzer that performs B / F cleaning, or to increase the reliability of analysis results without reducing throughput in a sample analyzer that performs B / F cleaning. [Means for solving the problem]

[0013] The sample analysis apparatus of the present invention includes a movable table that holds a row of sample containers and has a defined B / F cleaning position, a cleaning nozzle set consisting of n (n is an integer greater than or equal to 2) cleaning nozzles that are used in sequence at the B / F cleaning position, a nozzle cleaning equipment for cleaning the cleaning nozzle set, and a control unit that controls the operation of the cleaning nozzle set so that a parallel cleaning process consisting of n parallel cleaning steps from a first parallel cleaning step to an nth parallel cleaning step is repeatedly performed, wherein in the ith (i=1,...,n) parallel cleaning step, B / F cleaning is performed by the ith cleaning nozzle at the B / F cleaning position, and the nozzle cleaning equipment is used to perform nozzle cleaning of at least one other cleaning nozzle than the ith cleaning nozzle.

[0014] The cleaning method of the present invention is a cleaning method performed in a sample analyzer including a movable table that holds a row of sample containers and has a defined B / F cleaning position, a cleaning nozzle set consisting of n (n is an integer greater than or equal to 2) cleaning nozzles that are used in sequence at the B / F cleaning position, and nozzle cleaning equipment for cleaning the cleaning nozzle set, characterized in that the operation of the cleaning nozzle set is controlled so that a parallel cleaning process consisting of n parallel cleaning steps from a first parallel cleaning step to an nth parallel cleaning step is repeatedly performed, and in the ith (i=1,...,n) parallel cleaning step, B / F cleaning is performed by the ith cleaning nozzle at the B / F cleaning position, and the nozzle cleaning equipment is used to perform nozzle cleaning of at least one other cleaning nozzle other than the ith cleaning nozzle. Effect of the Invention

[0015] According to the present invention, in a sample analyzer that performs B / F cleaning, it is possible to improve B / F separation and reduce carryover, or to increase the reliability of analysis results without reducing throughput in a sample analyzer that performs B / F cleaning. [Brief description of the drawings]

[0016] [Figure 1] FIG. 1 is a diagram showing an immunoassay device according to an embodiment. [Diagram 2] FIG. 13 is a diagram showing parallel execution of B / F cleaning and nozzle cleaning. [Diagram 3] FIG. 1 illustrates a parallel cleaning system. [Figure 4] FIG. 13 illustrates a first example of a parallel cleaning process. [Diagram 5] FIG. 13 illustrates a second example of a parallel washing process. [Figure 6] 11A and 11B are diagrams illustrating a first example of a B / F cleaning sequence and a nozzle cleaning sequence. [Figure 7] 11A and 11B are diagrams illustrating a second example of a B / F cleaning sequence and a nozzle cleaning sequence. [Figure 8] FIG. 1 is a diagram showing a parallel cleaning system according to a first embodiment. [Figure 9] FIG. 11 is a diagram showing a first parallel washing step according to the first embodiment. [Figure 10] FIG. 11 is a diagram showing a second parallel washing process according to the first embodiment. [Figure 11] 4 is a flowchart showing the operation of the parallel cleaning system according to the first embodiment. [Figure 12] FIG. 13 is a diagram showing a parallel cleaning system according to a second embodiment. [Figure 13] FIG. 11 is a diagram showing a first parallel washing process according to the second embodiment. [Figure 14] FIG. 11 is a diagram showing a second parallel washing process according to the second embodiment. [Figure 15] 10 is a flowchart showing the operation of the parallel cleaning system according to the second embodiment. [Figure 16] FIG. 13 is a diagram showing a nozzle cleaning facility according to a modified example. [Figure 17] FIG. 13 is a diagram showing a parallel cleaning system according to a third embodiment. [Figure 18] FIG. 13 is a diagram showing a first parallel washing step according to the third embodiment. [Figure 19] 13 is a flowchart showing the operation of the parallel cleaning system according to the third embodiment. [Figure 20]FIG. 13 is a diagram showing a parallel cleaning system according to a fourth embodiment. [Figure 21] FIG. 13 is a diagram showing a first parallel washing process according to the fourth embodiment. [Figure 22] FIG. 13 is a diagram showing a second parallel washing process according to the fourth embodiment. [Figure 23] FIG. 13 is a diagram showing a third parallel washing process according to the fourth embodiment. [Figure 24] 13 is a flowchart showing the operation of the parallel cleaning system according to the fourth embodiment. [Diagram 25] FIG. 13 is a diagram showing a parallel cleaning system according to a fifth embodiment. [Figure 26] FIG. 13 is a diagram showing a first parallel washing process according to the fifth embodiment. [Figure 27] FIG. 13 is a diagram showing a second parallel washing process according to the fifth embodiment. [Figure 28] 13 is a flowchart showing the operation of the parallel cleaning system according to the fifth embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0017] Hereinafter, an embodiment will be described with reference to the drawings.

[0018] (1) Overview of the embodiment A sample analyzer according to an embodiment includes a movable table, a washing nozzle set, a nozzle washing facility, and a controller. The movable table is a member that holds a row of sample containers. A B / F washing position is defined on the movable table. The washing nozzle set is made up of n washing nozzles (where n is an integer equal to or greater than 2) that are used in sequence at the B / F washing position. The nozzle washing facility is a facility for washing the washing nozzle set. The controller controls the operation of the washing nozzle set so that a parallel washing process consisting of n parallel washing steps from the first parallel washing step to the nth parallel washing step is repeatedly performed. With this control, in the ith (where i=1,...,n) parallel washing step, B / F washing is performed by the ith washing nozzle at the B / F washing position, and the nozzle washing facility is used to perform nozzle washing on at least one other washing nozzle than the ith washing nozzle.

[0019] According to the above configuration, since B / F cleaning and nozzle cleaning are performed simultaneously in parallel, the B / F cleaning time and the nozzle cleaning time can be increased without decreasing the throughput. Therefore, the quality of the B / F cleaning can be improved and carryover can be reduced. In other words, according to the above configuration, the reliability of the analysis results can be improved.

[0020] During the period in which B / F cleaning is being performed by the i-th cleaning nozzle, nozzle cleaning may be performed on only one other cleaning nozzle, or on multiple other cleaning nozzles. When n is 3 or more, nozzle cleaning is desirably performed on n-1 other cleaning nozzles (all cleaning nozzles in the cleaning nozzle set other than the i-th cleaning nozzle).

[0021] In an embodiment, the sample analyzer operates according to a cycle time, which is a fundamental unit of time. n parallel wash steps correspond to n cycle times. In this configuration, one entire cycle time is allocated to the B / F wash and the nozzle wash.

[0022] In the embodiment, in the above-mentioned B / F cleaning, a B / F cleaning sequence including a plurality of nozzle operations is executed. In the above-mentioned nozzle cleaning, a nozzle cleaning sequence including a plurality of nozzle operations is executed. The B / F cleaning sequence and the nozzle cleaning sequence are synchronized.

[0023] According to the above configuration, it is possible to avoid complicating the control contents of the control unit. When the start timing, end timing, and multiple operation timings are found to match between two sequences, the synchronization of the two sequences can be confirmed. The multiple operation timings include, for example, a descending timing, an ascending timing, and a horizontal movement timing.

[0024] When the multiple suction operations included in the B / F cleaning sequence and the multiple suction operations included in the nozzle cleaning sequence are aligned on the time axis, it becomes easier to control the suction operations of the cleaning nozzle set. It is sufficient that the multiple suction operations for B / F cleaning and the multiple suction operations for nozzle cleaning correspond in time, but perfect matching between them is not required.

[0025] On the other hand, when the multiple suction operations included in the B / F cleaning sequence and the multiple suction operations included in the nozzle cleaning sequence are shifted on the time axis, it is possible to reduce pressure fluctuations in a common suction system connected to the n cleaning nozzles. There may be partial overlap between the multiple suction operations for B / F cleaning and the multiple suction operations for nozzle cleaning.

[0026] The sample analyzer according to the embodiment further includes a manifold connected to the n cleaning nozzles via n suction tubes, and a suction pump connected to the manifold. With this configuration, the suction force applied to the n cleaning nozzles can be generated by a single suction pump, so that the configuration of the suction system can be simplified. The manifold is a collection device and generally functions as a buffer tank.

[0027] In the embodiment, n valves controlled by the control unit are provided in the n suction tubes. This configuration makes it easy to set the suction period for each cleaning nozzle individually.

[0028] The sample analyzer according to the embodiment further includes a transport mechanism that transports the entire washing nozzle set in the horizontal and vertical directions while maintaining the arrangement of the n washing nozzles that make up the washing nozzle set. Fixing the arrangement of the n washing nozzles can simplify the configuration of the transport mechanism.

[0029] In an embodiment, the n cleaning nozzles are arranged around a rotation axis that is a vertical axis. The transport mechanism includes a rotation mechanism that rotates the cleaning nozzle set around the rotation axis. The nozzle cleaning equipment includes a plurality of nozzle cleaning tanks for cleaning the n-1 other cleaning nozzles other than the i-th cleaning nozzle. By adopting the rotation method, it is possible to provide the entire cleaning equipment outside the movable table.

[0030] In an embodiment, the n cleaning nozzles are arranged along a sliding direction that crosses the row of specimen containers when viewed from above. The transport mechanism includes a sliding mechanism that moves the cleaning nozzle set in the sliding direction. The nozzle cleaning equipment has a plurality of nozzle cleaning tanks for cleaning the other n-1 cleaning nozzles other than the i-th cleaning nozzle, including at least one nozzle cleaning tank provided on one side of the row of specimen containers and at least one nozzle cleaning tank provided on the other side of the row of specimen containers. The adoption of the sliding method simplifies the movement of the cleaning nozzle set.

[0031] In an embodiment, n is 2. The n cleaning nozzles are a first cleaning nozzle and a second cleaning nozzle. In each parallel cleaning step, B / F cleaning is performed by one of the first cleaning nozzle and the second cleaning nozzle, and at the same time, nozzle cleaning is performed for the other of the first cleaning nozzle and the second cleaning nozzle.

[0032] In an embodiment, n is 3 or more. In each parallel cleaning step, B / F cleaning is performed by the i-th cleaning nozzle, and simultaneously, nozzle cleaning is performed on n-1 other cleaning nozzles other than the i-th cleaning nozzle. In one parallel cleaning process, n-1 nozzle cleanings are performed for each cleaning nozzle. According to this configuration, the entire standby period (non-use period) is assigned to nozzle cleaning for each cleaning nozzle, so that carryover can be further reduced.

[0033] In the embodiment, in addition to the first B / F cleaning position, a second B / F cleaning position different from the first B / F cleaning position is defined on the movable table. The sample analyzer includes a first parallel cleaning subsystem and a second parallel cleaning subsystem. The first parallel cleaning subsystem has a first cleaning nozzle set and a first nozzle cleaning facility. The second parallel cleaning subsystem has a second cleaning nozzle set consisting of n cleaning nozzles that are used in sequence at the second B / F cleaning position, and a second nozzle cleaning facility for cleaning the second cleaning nozzle set. The control unit controls the operation of the first cleaning nozzle set and the operation of the second cleaning nozzle set so that the first parallel cleaning subsystem repeatedly executes a parallel cleaning process, and the second parallel cleaning subsystem repeatedly executes a parallel cleaning process corresponding to the parallel cleaning process. If the first parallel cleaning subsystem and the second parallel cleaning subsystem operate in synchronization with each other, it is easy to control the two parallel cleaning subsystems.

[0034] In the cleaning method according to the embodiment, the operation of the cleaning nozzle set is controlled so that a parallel cleaning process consisting of n parallel cleaning steps from the first parallel cleaning step to the nth parallel cleaning step is repeatedly performed. In the ith (where i=1,...,n) parallel cleaning step, B / F cleaning is performed by the ith cleaning nozzle at the B / F cleaning position, and nozzle cleaning is performed on at least one other cleaning nozzle than the ith cleaning nozzle using the nozzle cleaning equipment.

[0035] (2) Details of the embodiment A sample analyzer 10 according to an embodiment is shown in Figure 1. Figure 1 is a schematic diagram of the top surface of the sample analyzer 10. This sample analyzer 10 is an immunoassay device that analyzes samples using an immune reaction, that is, an antigen-antibody reaction, and more specifically, is an immunoassay device that performs a chemiluminescent enzyme immunoassay (CLEIA).

[0036] In FIG. 1, the sample analyzer 10 has a sample supply section 12, a reaction section 14, a reagent supply section 16, a light detection section 18, a cuvette supply section 20, a substrate refrigerator 22, cuvette transport mechanisms 24, 26, a sample dispensing mechanism 28, and reagent dispensing mechanisms 30, 32, and further has parallel washing systems 70, 72 according to an embodiment.

[0037] The specimen supplying section 12 has a turntable 33 as a rotating platform. A holding hole group 34 is formed on the turntable 33, and the holding hole group 34 is composed of a plurality of holding holes 34a. In the illustrated example, the holding hole group 34 is composed of an outer holding hole row composed of a plurality of holding holes 34a arranged in a ring shape, and an inner holding hole row composed of a plurality of holding holes 34a arranged in a ring shape. Each holding hole 34a is a portion that accommodates a specimen container as an original container. A specimen is accommodated in the specimen container.

[0038] In the embodiment, the specimen is blood such as serum or plasma. Other liquids such as saliva or urine collected from a living body may be used as the specimen. For example, the specimen container is a blood collection tube containing blood or another container containing blood. Each specimen container is manually inserted into each holding hole 34a by the examiner. That is, each specimen container is installed. Any number of specimen containers may be installed in the specimen supply unit 12. The timing for installing each specimen container may also be determined by the examiner. The specimen containers may be automatically inserted using a mechanism for transporting a specimen container rack.

[0039] The sample supplying unit 12 is provided with a barcode reader (BCR) (not shown). The BCR reads the contents of the barcode label attached to each sample container held by the holding hole group 34. This allows sample information such as the sample ID to be read for each sample. Subject information, analysis items, sample container type, etc. are identified based on the sample ID.

[0040] The sample dispensing mechanism 28 includes a rail mechanism 46, a slide base 48, an arm 50, a nozzle 52, etc. The rail mechanism 46 includes a rail extending in a direction inclined with respect to the left-right direction of the device and the depth direction of the device. The slide base 48 slides along the rail (see reference numeral 53). The base end of the arm 50 is rotatably held by the slide base 48, and the nozzle 52 is disposed at the tip of the arm 50.

[0041] The nozzle 52 is composed of a nozzle body and a nozzle tip. The nozzle tip is removably attached to the nozzle body. The nozzle body is made of metal, and the nozzle tip is made of a transparent, semi-transparent, or non-transparent resin. The nozzle tip is replaced after the sample is aspirated.

[0042] The moving area of ​​the nozzle 52 is expanded by a combination of the sliding movement of the slide base 48 and the pivoting movement of the arm 50. Under the control of a control unit (not shown), during sample dispensing, the nozzle 52 aspirates the sample in a sample container (source container) at the aspirating position, and the aspirated sample is discharged from the nozzle 52 into a specific cuvette on the reaction unit 14. The discharge destination position may be fixedly determined, or may be dynamically changed. The cuvette corresponds to the sample container and the reaction container.

[0043] The tip rack 54 is a member that holds a number of nozzle tips. When replacing a nozzle tip, the used nozzle tip is removed from the nozzle body and discarded. The tip of the nozzle body is then inserted into the upper opening of a nozzle tip selected from the tip rack 54. This attaches a new nozzle tip to the nozzle body. The tip rack is replaced by a tip rack replacement mechanism (not shown).

[0044] The reaction section 14 has a turntable 39 as a rotating platform or movable table. A holding hole group 40 is formed in the turntable 39, and the holding hole group 40 is composed of a plurality of holding holes 40a. The holding hole group 40 may be composed of an outer holding hole row composed of a plurality of holding holes arranged in a ring shape, and an inner holding hole row composed of a plurality of holding holes arranged in a ring shape. Each holding hole 40a is a portion for accommodating a cuvette. A reagent and a sample are injected into each cuvette in a stepwise manner. This causes an immune reaction in each cuvette. The turntable 39 may be composed of one ring member, or may be composed of a plurality of ring members arranged in a concentric circle shape.

[0045] In the embodiment, for example, a sample is measured based on a so-called two-step method. The two-step method includes a first immune reaction step using a first reagent containing a first antibody, a second immune reaction step using a second reagent containing a second antibody, an enzyme reaction step using a substrate (substrate liquid), and a light detection step. The first immune reaction step, the second immune reaction step, and the enzyme reaction step are performed in the reaction unit 14. Also, a B / F washing step, a stirring step, and the like are performed in the reaction unit 14.

[0046] In the B / F cleaning step, parallel cleaning systems 70, 72 are operated near the reaction section 14. In the embodiment, two parallel cleaning systems 70, 72 are provided, but more parallel cleaning systems may be provided, or a single parallel cleaning system may be provided. Each of the parallel cleaning systems 70, 72 has the same configuration.

[0047] In an embodiment, each of the parallel cleaning systems 70 and 72 includes multiple parallel cleaning subsystems. Each parallel cleaning subsystem includes a cleaning nozzle set, a transport mechanism, and a nozzle cleaning facility, as described in detail below. Each of the parallel cleaning systems 70 and 72 may include a single parallel cleaning subsystem or three or more parallel cleaning subsystems.

[0048] The reagent supply unit 16 has a reagent tank 41 serving as a rotating cooler. A reagent bottle row 42 and a reagent bottle row 44 are accommodated in the reagent tank 41. The reagent bottle row 42 and the reagent bottle row 44 are each composed of a plurality of reagent bottles. Each reagent bottle accommodates a reagent. Each reagent used in the first immune reaction step contains a plurality of magnetic particles. Each magnetic particle functions as a solid phase. That is, an antibody layer (or an antigen layer) is provided on the surface of each magnetic particle.

[0049] Reagent dispensing mechanisms 30, 32 are provided adjacent to the reagent supply unit 16 and the reaction unit 14. The reagent dispensing mechanism 30 has a rotating arm 60 and a nozzle 62 provided at the tip of the arm 60. The reagent dispensing mechanism 32 has a rotating arm 64 and a nozzle 65 provided at the tip of the arm 64. The nozzles 62, 65 are each a non-replaceable nozzle, that is, a washable nozzle. A specific reagent is aspirated by the reagent dispensing mechanisms 30, 32, and the aspirated reagent is dispensed into a specific cuvette.

[0050] The light detection unit 18 is a unit that detects luminescence generated in the cuvette after the enzyme reaction. The concentration of the analyte and the like are calculated based on the detected value. When the cuvette is transferred, the cuvette transfer mechanisms 24 and 26 function.

[0051] Next, the configuration and operation of the above-mentioned parallel cleaning subsystem will be described with reference to Fig. 2. In Fig. 2, the parallel cleaning subsystem 74 includes a cleaning nozzle set 75, a transfer mechanism (not shown), and a nozzle cleaning facility 103.

[0052] Cleaning nozzle set 75 consists of n cleaning nozzles (where n is an integer of 2 or more) that are used in sequence at B / F cleaning position P1. In the configuration example shown in FIG. 2, n=2, and cleaning nozzle set 75 consists of two cleaning nozzles 76, 78. Cleaning nozzle set 75 may also be composed of three or more cleaning nozzles that are used in sequence. The illustrated cleaning nozzles 76, 78 are each a non-replaceable nozzle made of metal.

[0053] The cleaning nozzle 76 is composed of an integrated suction nozzle 80 and discharge nozzle 82. The position of the discharge port 88 of the discharge nozzle 82 is higher than the position of the suction port 86 of the suction nozzle 80. When a cleaning liquid is discharged from the discharge port 88, the discharged cleaning liquid flows down along the outer surface of the suction nozzle 80. Note that a surface coating 84 is applied to the suction nozzle 80 over an area that may come into contact with the reaction solution.

[0054] The cleaning nozzle 78 has the same configuration as the cleaning nozzle 76. That is, the cleaning nozzle 78 is composed of a suction nozzle 90 and a discharge nozzle 92 which are integrated with each other. The suction nozzle 90 has a suction hole 94, and the discharge nozzle 92 has a discharge port 96. The suction nozzle 90 is also surface-coated. The transport mechanism that transports the cleaning nozzle set 75 has a vertical transport mechanism and a horizontal transport mechanism.

[0055] A cuvette 98 is placed in a holding hole 40a in the turntable 39. The cuvette 98 is on the B / F washing position P1. The magnetic particles 102 in the reaction solution are captured on the inner surface of the cuvette 98 by the magnet unit 100. Reference numeral 76A denotes a washing nozzle inserted into the cuvette 98. A washing solution discharged from a discharge nozzle 82A is injected into the cuvette 98. The washing solution in the cuvette 98 is then aspirated by the suction nozzle 80A. The discharge and suction of the washing solution are repeated as necessary. This completes the B / F washing. When the suction nozzle 80A descends, its suction port hits the inner bottom surface of the cuvette 98. In this state, the washing solution is aspirated through a plurality of slits formed in the suction port.

[0056] The nozzle cleaning equipment 103 has one or more cleaning tanks 104. FIG. 2 shows the cleaning tank 104 provided at the nozzle cleaning position Q1. The cleaning tank 104 has a cleaning container 106, and a cleaning well 108 is provided therein. The horizontal cross-sectional shape of the cleaning tank 104 is, for example, circular or rectangular. Reference numeral 112 denotes a drain for discharging waste liquid generated by overflow. An internal space 108a of the cleaning well 108 is a portion for storing the cleaning liquid.

[0057] Reference numeral 78A denotes a cleaning nozzle during nozzle cleaning. Cleaning liquid is discharged from the discharge nozzle 92A and injected into the cleaning well 108. If necessary, a large amount of cleaning liquid is injected into the cleaning well 108. In that case, overflow occurs in the cleaning well 108. The cleaning liquid in the cleaning well 108 is sucked up by the suction nozzle 90A.

[0058] During nozzle cleaning, the suction port of the suction nozzle 90A is abutted against the inner bottom surface of the cleaning well 108. In this state, the cleaning liquid is sucked through a plurality of slits or the like formed in the suction port.

[0059] In the parallel cleaning subsystem 74 according to the embodiment, the arrangement of the multiple cleaning nozzles 76, 78 that make up the cleaning nozzle set 75 is fixed, and the multiple cleaning nozzles 76, 78 are transported as a unit.

[0060] In the configuration example shown in FIG. 2, one parallel cleaning process is made up of two parallel cleaning steps assigned to two cycle times. In a first parallel cleaning process, B / F cleaning by cleaning nozzle 76 and nozzle cleaning for cleaning nozzle 78 are performed simultaneously. In the next second parallel cleaning process, nozzle cleaning for cleaning nozzle 76 and B / F cleaning by cleaning nozzle 78 are performed simultaneously. Such parallel cleaning processes are performed repeatedly. Generally speaking, a parallel cleaning process is made up of n parallel cleaning processes that are connected on the time axis. In the n parallel cleaning processes, n cleaning nozzles are used in sequence.

[0061] During B / F cleaning, the bottom level of the cleaning nozzle 76A performing the B / F cleaning is z1. During nozzle cleaning, the bottom level of the cleaning nozzle 78A to be cleaned is also z1. By aligning the two bottom levels, the configuration of the vertical transfer mechanism can be simplified, and the control of the vertical transfer mechanism can be simplified.

[0062] As described below, each cleaning nozzle is held by a holder. The holder is equipped with an elastic member that urges the cleaning nozzle downward. When the lower end of the cleaning nozzle collides with the inner bottom surface of the cuvette 98 or the inner bottom surface of the cleaning well 108, an impact force is exerted on the cleaning nozzle. The impact force is absorbed by the elastic member. When the cleaning nozzle set 75 is transported horizontally, the lower end level of each cleaning nozzle 76, 78 is z2. Here, z2>z1.

[0063] 3 shows the main components of the parallel cleaning system 70. In the illustrated configuration example, the parallel cleaning system 70 is composed of two parallel cleaning subsystems 74, 114. Each of the parallel cleaning subsystems 74, 114 has the same configuration and operates synchronously.

[0064] The parallel cleaning subsystem 74 includes a cleaning nozzle set 75, a first transport mechanism 116, and a nozzle cleaning facility (not shown). The cleaning nozzle set 75 includes two cleaning nozzles 76, 78. The cleaning nozzle 76 includes a suction nozzle 80 and a discharge nozzle 82, and the cleaning nozzle 78 includes a suction nozzle 90 and a discharge nozzle 92. The first transport mechanism 116 includes a horizontal transport mechanism and a vertical transport mechanism. In FIG. 3, the cleaning nozzle 76 is positioned at the B / F cleaning position P1, and the cleaning nozzle 78 is positioned at the nozzle cleaning position Q1.

[0065] The parallel cleaning subsystem 114 has the same configuration as the parallel cleaning subsystem 74, specifically, includes a cleaning nozzle set 117, a second transfer mechanism 122, and a nozzle cleaning facility (not shown). The cleaning nozzle set 117 includes two cleaning nozzles 118, 120. The cleaning nozzle 118 includes a suction nozzle 124 and a discharge nozzle 126, and the cleaning nozzle 120 includes a suction nozzle 128 and a discharge nozzle 130. The second transfer mechanism 122 includes a horizontal transfer mechanism and a vertical transfer mechanism. In FIG. 3, the cleaning nozzle 118 is positioned at the B / F cleaning position P2, and the cleaning nozzle 120 is positioned at the nozzle cleaning position Q2.

[0066] A discharge facility 131 and a suction facility 132 are connected to the cleaning nozzle set 75 and the cleaning nozzle set 117. Details of the discharge facility 131 are not shown in Fig. 3. The discharge facility 131 has four syringe pumps connected to the four discharge nozzles 82, 92, 126, and 130 via four tubes 147, 148, 149, and 150. Each syringe pump supplies a cleaning liquid.

[0067] In the illustrated configuration example, the suction equipment 132 has a manifold 138 and a pump 144. The manifold 138 is connected to the four suction nozzles 80, 90, 124, and 128 via four tubes 134, 135, 136, and 137. The manifold 138 is a collection device and corresponds to a common buffer tank. A pump 144 is connected to the outlet side of the manifold 138. The pump 144 is a suction source and generates pressure to suck and discharge the cleaning liquid. Four solenoid valves 140, 141, 142, and 143 are provided in the middle of the four tubes 134, 135, 136, and 137. Each of the solenoid valves 140, 141, 142, and 143 performs an opening operation and a closing operation.

[0068] The control unit 146 is a main controller that controls the operation of the sample analyzer. In detail, the control unit 146 controls the operation of the first transport mechanism 116 and the operation of the second transport mechanism 122, and also controls the operation of the discharge facility 131 and the suction facility 132. In this way, the control unit 146 indirectly controls the operation of the two cleaning nozzle sets 75, 117.

[0069] A first example of a parallel cleaning process performed in each parallel cleaning subsystem is shown in Figure 4. This first example assumes n=2, that is, the use of a cleaning nozzle set consisting of two cleaning nozzles.

[0070] (A) shows a series of cycle times. #k, #k+1, and #k+2 are cycle time numbers, respectively. Cycle time is the basic unit of time in an analytical device, and each component operates at each cycle time. For example, a turntable rotates one pitch at each cycle time. The time that a sample stopped at the B / F cleaning position remains at that position corresponds to the cycle time. (B) shows multiple steps performed by or applied to a first cleaning nozzle, and (C) shows multiple steps performed by or applied to a second cleaning nozzle.

[0071] The parallel cleaning process 152 is made up of n parallel cleaning processes connected on the time axis. In the first example, n is 2, and the parallel cleaning process 152 is made up of a first parallel cleaning process 154A and a second parallel cleaning process 154B. When these are expressed as the i-th parallel cleaning process, the possible values ​​of i are 1 and 2.

[0072] In the first parallel cleaning process 154A, B / F cleaning is performed on the mth sample by the first cleaning nozzle (where m is an integer equal to or greater than 1), and simultaneously, nozzle cleaning is performed on the second cleaning nozzle. In the second parallel cleaning process 154B, nozzle cleaning is performed on the first cleaning nozzle, and simultaneously, B / F cleaning is performed on the (m+1)th sample by the second cleaning nozzle. Such a parallel cleaning process 152 is repeatedly performed. Note that in the first parallel cleaning process 154A, B / F cleaning using the second cleaning nozzle may be performed, and in the second parallel cleaning process 154B, B / F cleaning using the first cleaning nozzle may be performed.

[0073] A second example of the parallel cleaning process performed in each parallel cleaning subsystem is shown in Figure 5. This second example assumes n=3, i.e., the use of a cleaning nozzle set consisting of three cleaning nozzles.

[0074] (A) shows a series of cycle times. #k, #k+1, #k+2, and #k+3 are cycle time numbers, respectively. (B) shows a number of steps performed or applied by a first cleaning nozzle, (C) shows a number of steps performed or applied by a second cleaning nozzle, and (D) shows a number of steps performed or applied by a third cleaning nozzle.

[0075] The parallel cleaning process 156 is made up of n parallel cleaning processes connected on the time axis, as in the above example. In the second example, n is 3, and the parallel cleaning process 156 is made up of a first parallel cleaning process 158A, a second parallel cleaning process 158B, and a third parallel cleaning process 158C. When these are expressed as the i-th parallel cleaning process, the possible values ​​for i are 1, 2, and 3.

[0076] In the first parallel cleaning process 158A, B / F cleaning is performed on the m-th sample by the first cleaning nozzle, nozzle cleaning is performed on the second cleaning nozzle, and nozzle cleaning is performed on the third cleaning nozzle.

[0077] In the second parallel cleaning process 158B, nozzle cleaning is performed on the first cleaning nozzle, B / F cleaning is performed on the (m+1)th sample by the second cleaning nozzle, and nozzle cleaning is performed on the third cleaning nozzle.

[0078] In the third parallel washing step 158C, nozzle washing is performed for the first washing nozzle, nozzle washing is performed for the second washing nozzle, and B / F washing is performed for the (m+3)th sample by the third washing nozzle. Such a parallel washing process 156 is repeatedly performed. n may be 4 or more.

[0079] In FIG. 5, the three cleaning nozzles were used in the three B / F cleanings of the three cuvettes in the order of the first cleaning nozzle, the second cleaning nozzle, and the third cleaning nozzle, but the order in which the cleaning nozzles are used can be determined arbitrarily.

[0080] In both the first and second parallel cleaning processes, the B / F cleaning and nozzle cleaning can be performed using the entire individual cycle time, thereby improving the B / F separation and reducing carryover. In the second example, after using a cleaning nozzle, two nozzle cleanings are applied to the used cleaning nozzle, thereby further reducing carryover.

[0081] FIG. 6 shows a first example of the B / F cleaning sequence and the nozzle cleaning sequence executed in each parallel cleaning process. Here, n=2, and the parallel cleaning process consists of a first parallel cleaning process and a second parallel cleaning process. In the first parallel cleaning process, the B / F cleaning sequence is executed using the first cleaning nozzle, and the nozzle cleaning sequence is executed with the second cleaning nozzle as the cleaning target. In the second parallel cleaning process, the nozzle cleaning sequence is executed with the first cleaning nozzle as the cleaning target, and the B / F cleaning sequence is executed with the second cleaning nozzle.

[0082] The B / F cleaning sequence and nozzle cleaning are each composed of multiple nozzle operations. The multiple nozzle operations include a lowering operation, an upward operation, a horizontal movement, a discharge operation, and a suction operation. In FIG. 6, the multiple boxes representing the nozzle operations have the same width, but the duration of each nozzle operation varies. The discharge conditions in the discharge operation and the suction conditions in the suction operation can be determined arbitrarily.

[0083] In the illustrated example, the B / F washing sequence consists of a lowering operation (T11), an aspiration operation (T12), a discharge operation (T13), an aspiration operation (T14), a period (T15) during which the discharge and aspiration operations (160A) are repeated, a discharge operation (T16), a lifting operation (T17), and a horizontal movement (T18). During this series of operations, the magnetic particles in the cuvette are kept captured by the magnetic force.

[0084] In the first aspirating operation (T12), the reaction solution in the cuvette is aspirated. The dispensing operation (T16) is performed as needed, and a relatively small amount of washing liquid is supplied into the cuvette to prevent the magnetic particles from drying out. During the ascent operation (T17), an aspirating operation is performed as needed to prevent droplets from falling. Similarly, during the horizontal movement (T18), an aspirating operation is performed as needed.

[0085] In the illustrated example, the nozzle cleaning sequence consists of a downward operation (T21), a suction operation (T22), a discharge operation (T23), a suction operation (T24), a period (T25) during which the discharge operation and suction operation (160B) are repeated, a discharge operation (T26), a rising operation (T27), and horizontal movement (T28).

[0086] During the downward movement (T21), the cleaning nozzle (specifically, the suction nozzle) is immersed in the cleaning liquid (reserved cleaning liquid) in the cleaning well. This causes the reaction solution adhering to the outer surface of the cleaning nozzle to dissolve into the retained cleaning liquid. In the first suction movement (T12), the retained cleaning liquid in the cleaning well is sucked in. In the discharge movement (T26), the cleaning liquid is stored in the cleaning well. During the upward movement (T27), a suction movement is performed as necessary to prevent droplets from falling. Similarly, during the horizontal movement (T28), a suction movement is performed as necessary.

[0087] In each parallel cleaning process, the B / F cleaning sequence and the nozzle cleaning sequence are synchronized. Specifically, the start timing and end timing of the two cleaning sequences are aligned, and the lowering operation period, the ascending operation period, and the horizontal movement period included in the B / F cleaning sequence are aligned. Furthermore, the suction operation start timing is aligned between the B / F cleaning sequence and the nozzle cleaning sequence. By synchronizing the B / F cleaning sequence and the nozzle cleaning sequence, the control content of the control unit is simplified. In particular, it becomes easier to control the operation of the suction equipment.

[0088] Note that the start timings of multiple ejection operations may be made to coincide. Multiple suction operation periods included in the B / F cleaning sequence may be made to coincide with multiple suction operation periods included in the nozzle cleaning sequence. Similarly, multiple ejection operation periods included in the B / F cleaning sequence may be made to coincide with multiple ejection operation periods included in the nozzle cleaning sequence.

[0089] FIG. 7 shows a second example of the B / F cleaning sequence and the nozzle cleaning sequence. Here, n=2, and the parallel cleaning process consists of a first parallel cleaning step and a second parallel cleaning step, similar to the first example above. In the first parallel cleaning step, the B / F cleaning sequence is performed using the first cleaning nozzle, and the nozzle cleaning sequence is performed with the second cleaning nozzle as the cleaning target. In the second parallel cleaning step, the nozzle cleaning sequence is performed with the first cleaning nozzle as the cleaning target, and the B / F cleaning sequence is performed with the second cleaning nozzle.

[0090] In the illustrated example, the B / F cleaning sequence consists of a lowering operation (T11), a rest period (T12), an aspiration operation (T13), a discharge operation (T14), an aspiration operation (T15), a period (T16) during which the discharge and aspiration operations (162A) are repeated, a discharge operation (T17), a lifting operation (T18), and a horizontal movement (T19). During this series of operations, the magnetic particles in the cuvette are kept captured by the magnetic force.

[0091] In the illustrated example, the nozzle cleaning sequence consists of a lowering operation (T21), a suction operation (T22), a discharge operation (T23), a suction operation (T24), a period (T25, T26) in which the discharge and suction operation (162B) is repeated, a discharge operation (T27), a rising operation (T28), and a horizontal movement (horizontal operation) (T29).

[0092] 7, the B / F cleaning sequence and the nozzle cleaning sequence executed in each parallel cleaning process are synchronized. Specifically, the start timing and end timing of the two cleaning sequences are aligned, and the lowering operation period, the raising operation period, and the horizontal movement period included in the B / F cleaning sequence are aligned.

[0093] However, the multiple suction operations included in the B / F cleaning sequence and the multiple suction operations included in the nozzle cleaning sequence are shifted on the time axis, and the multiple discharge operations included in the B / F cleaning sequence and the multiple discharge operations included in the nozzle cleaning sequence are also shifted on the time axis. In the second example, the suction operations and the discharge operations are executed in parallel between the B / F cleaning sequence and the nozzle cleaning sequence. Therefore, according to the second example, it is possible to obtain the advantage that the pressure fluctuation in the manifold connected to the multiple cleaning nozzles can be reduced.

[0094] Next, a specific configuration example of the parallel cleaning system will be described with reference to FIGS.

[0095] A first embodiment of the parallel cleaning system is shown in Figures 8 to 11. In Figure 8, an annular turntable 170 has a holding hole row 172 consisting of a plurality of holding holes. A cuvette row (sample container row) 174 consisting of a plurality of cuvettes (a plurality of sample containers) is held by the holding hole row 172. A first B / F cleaning position P1 and a second B / F cleaning position P2 are defined on the turntable 170. In Figure 8, a cuvette 176 is stopped at the first B / F cleaning position P1, and a cuvette 178 is stopped at the second B / F cleaning position P2.

[0096] The parallel cleaning system 164 according to the first embodiment is composed of a first parallel cleaning subsystem 166 and a second parallel cleaning subsystem 168. The two parallel cleaning subsystems 166, 168 have the same configuration and perform the same operation. In the following, the configuration and operation of the first parallel cleaning subsystem 166 will be described, and a description of the second parallel cleaning subsystem 168 will be omitted. Note that the z direction is the vertical direction, and the y direction is the horizontal direction. The y direction is the radial direction crossing the cuvette row 174 when viewed from above.

[0097] The first parallel cleaning subsystem 166 has two cleaning nozzle units 180, 182, a transport mechanism 184, and a nozzle cleaning facility 187. The cleaning nozzle unit 180 is composed of a cleaning nozzle 190 and a holder 192 that holds it. The cleaning nozzle unit 182 is composed of a cleaning nozzle 194 and a holder 196 that holds it. The two cleaning nozzles 190, 194 form a cleaning nozzle set. The arrangement of the two cleaning nozzles 190, 194 is fixed, and they move together.

[0098] Each of the holders 192, 196 has an elastic member that applies a downward biasing force to the cleaning nozzles 190, 194 and absorbs a collision force acting on the cleaning nozzles 190, 194. Specifically, the elastic member is a spring. Each of the cleaning nozzles 190, 194 is composed of a suction nozzle and a discharge nozzle.

[0099] The transport mechanism 184 has a vertical transport mechanism and a horizontal transport mechanism. The vertical transport mechanism is not shown. The horizontal transport mechanism is a mechanism that transports the two cleaning nozzle units 180, 182 in the y direction, and includes an actuator 200 and an arm 198. The actuator 200 is a slide drive mechanism that slides the arm 198 in the y direction. The two cleaning nozzle units 180, 182 are attached to the arm 198.

[0100] The nozzle cleaning equipment 187 consists of a cleaning tank 186 provided on one side of the cuvette row 174, specifically, on the inside of the turntable 170, and a cleaning tank 188 provided on the other side of the cuvette row 174, specifically, on the outside of the turntable 170.

[0101] For example, in the state shown in Fig. 8, the vertical transport mechanism is operated to move the two cleaning nozzle units 180, 182 downward, so that the cleaning nozzle 190 is inserted into the cuvette 176 at the B / F cleaning position P1, and at the same time, the cleaning nozzle 194 is inserted into the cleaning tank 188, as shown in Fig. 9. Specifically, the cleaning nozzle 194 is inserted into the cleaning well in the cleaning tank 188. In this state, the first parallel cleaning step is performed. Specifically, B / F cleaning is performed using the cleaning nozzle 190, and at the same time, nozzle cleaning is performed on the cleaning nozzle 194.

[0102] After the first parallel cleaning step is completed, the two cleaning nozzle units 180, 182 are moved upward, forward, and downward, and then the second parallel cleaning step is performed as shown in Fig. 10. In Fig. 10, the cleaning nozzle 190 is inserted into the cleaning tank 186, and the cleaning nozzle 194 is inserted into the cuvette 176 at the B / F cleaning position P1. In this state, nozzle cleaning is performed on the cleaning nozzle 190, and at the same time, B / F cleaning is performed by the cleaning nozzle 194.

[0103] FIG. 11 shows the operation of the parallel cleaning system according to the first embodiment. In S10, the nozzle set is positioned at the initial position (see FIG. 8). In S12, the nozzle set moves downward, and in S14, the first parallel cleaning process is performed (see FIG. 9). In S16, the nozzle set moves upward, and in S18, the nozzle set moves forward. In S20, the nozzle set moves downward, and in S22, the second parallel cleaning process is performed (see FIG. 10). In S24, the nozzle set moves upward, and in S26, the nozzle set moves backward. This returns the nozzle set to the initial position (S10). For example, when S26 is performed, the turntable rotates by one pitch.

[0104] In addition, as long as two parallel cleaning steps are performed within one cycle time, the cleaning nozzle set may be moved forward from the initial position instead of downward. Also, any position may be determined as the initial position.

[0105] According to the first embodiment, since the washing nozzle set moves linearly in the horizontal direction, there is an advantage that the discharge tubes and suction tubes connected to each washing nozzle are not twisted.

[0106] In each parallel cleaning subsystem, four cleaning nozzle units may be provided on one arm (two-unit configuration). In this case, in addition to the B / F cleaning positions P1 and P2, B / F cleaning positions P1a and P2a are defined on the turntable 170 in FIG. 8. When such a configuration is adopted, four cleaning tanks may be provided as the nozzle cleaning equipment, or two cleaning tanks may be used to clean the four cleaning nozzles. In other words, one cleaning tank may be used for two cleaning nozzles.

[0107] 12 to 15 show a second embodiment of the parallel cleaning system. In FIG. 12, B / F cleaning positions P1 and P2 are defined on a turntable 170. A parallel cleaning system 202 is composed of a first parallel cleaning subsystem 204 and a second parallel cleaning subsystem 205. The two parallel cleaning subsystems 204 and 205 have the same configuration and perform the same operation. The configuration and operation of the first parallel cleaning subsystem 204 will be described below.

[0108] The first parallel cleaning subsystem 204 includes two cleaning nozzle units 206, 208, a transport mechanism 210, and a nozzle cleaning device 211. The cleaning nozzle unit 206 includes a cleaning nozzle 216 and a holder 218 that holds the cleaning nozzle. The cleaning nozzle unit 208 includes a cleaning nozzle 220 and a holder 222 that holds the cleaning nozzle. The two cleaning nozzles 216, 220 form a cleaning nozzle set. The arrangement of the cleaning nozzles 216, 220 is fixed, and they move together. Each holder 218, 222 has an elastic member. The cleaning nozzles 216, 220 each include a suction nozzle and a discharge nozzle. In FIG. 12, a cuvette 228 stopped at the B / F cleaning position P1 is located directly below the cleaning nozzle 216.

[0109] The conveying mechanism 210 has a vertical conveying mechanism and a horizontal conveying mechanism. The vertical conveying mechanism is omitted from the drawing. The horizontal conveying mechanism is a mechanism for conveying the two cleaning nozzle units 206, 208 around a rotation axis C1, and includes a base 224 and a support 226. The illustrated θa is the positive rotation direction. Incidentally, the parallel cleaning subsystem 205 has a rotation axis C2, and the illustrated θb is the positive rotation direction. The nozzle cleaning equipment 211 is composed of cleaning tanks 212, 214 provided outside the turntable 170.

[0110] For example, in the state shown in Fig. 12, the vertical transport mechanism is operated to move the two cleaning nozzle units 206, 208 downward, so that the cleaning nozzle 216 is inserted into the cuvette 228 at the B / F cleaning position P1, and at the same time, the cleaning nozzle 220 is inserted into the cleaning tank 214, as shown in Fig. 13. In this state, the first parallel cleaning step is performed. Specifically, B / F cleaning is performed using the cleaning nozzle 216, and at the same time, nozzle cleaning is performed on the cleaning nozzle 220.

[0111] After the first parallel cleaning step is completed, the two cleaning nozzles are moved upward, rotated +90 degrees, and then moved downward, and the second parallel cleaning step is performed as shown in Fig. 14. In Fig. 14, the cleaning nozzle 216 is inserted into the cleaning tank 212, and the cleaning nozzle 220 is inserted into the cuvette 228 at the B / F cleaning position P1. In this state, nozzle cleaning is performed on the cleaning nozzle 216, and at the same time, B / F cleaning is performed by the cleaning nozzle 220.

[0112] FIG. 15 shows the operation of the parallel cleaning system according to the second embodiment. In S30, the nozzle set is positioned at the initial position (see FIG. 12). In S32, the nozzle set moves downward, and in S34, the first parallel cleaning process is executed (see FIG. 13). In S36, the nozzle set moves upward, and in S38, the nozzle set turns +90 degrees in the forward direction. In S40, the nozzle set moves downward, and in S42, the second parallel cleaning process is executed (see FIG. 14). In S44, the nozzle set moves upward, and in S46, the nozzle set turns -90 degrees. This returns the nozzle set to the initial position (S30). For example, when S46 is executed, the turntable rotates by one pitch.

[0113] According to the second embodiment, the rotation angle range can be reduced, so that the amount of movement and the amount of twisting of the suction tube and the discharge tube connected to each cleaning nozzle can be reduced. Also, according to the second embodiment, the installation area of ​​the parallel cleaning system can be relatively small. The angle interval between the two cleaning nozzles constituting the cleaning nozzle set may be more than 90 degrees or less than 90 degrees.

[0114] 16 shows a modified example of the second embodiment. In this modified example, a part of the equipment for nozzle cleaning is shared between the first parallel cleaning subsystem 204A and the second parallel cleaning subsystem 205A. Specifically, the first parallel cleaning subsystem 204A has cleaning nozzle units 230 and 232. Cleaning tanks 238 and 240 are provided to clean the two cleaning nozzles of the cleaning nozzle units 230 and 232.

[0115] The second parallel cleaning subsystem 205A has cleaning nozzle units 234 and 236. Cleaning tanks 240 and 242 are provided to clean the two cleaning nozzles of the cleaning nozzle units 234 and 236. The cleaning tank 240 is shared between the first parallel cleaning subsystem 204A and the second parallel cleaning subsystem 205A. That is, the cleaning tank 240 is used to clean the cleaning nozzle of the cleaning nozzle unit 230 and also to clean the cleaning nozzle of the cleaning nozzle unit 236.

[0116] For alternate cleaning of the two cleaning nozzles, the positive swirl direction θa in the first parallel cleaning subsystem 204A and the positive swirl direction θb in the second parallel cleaning subsystem 205A are aligned. That is, after the first parallel cleaning step, the cleaning nozzle set in each of the parallel cleaning subsystems 204A and 205A swirls in the positive direction. After the second parallel cleaning step, the cleaning nozzle set in each of the parallel cleaning subsystems 204A and 205A swirls in the negative direction. The modification shown in FIG. 16 has the advantage of reducing the number of parts.

[0117] 17 to 19 show a third embodiment of the parallel cleaning system. In FIG. 17, B / F cleaning positions P1 and P2 are defined on the turntable. The parallel cleaning system 202 is composed of a first parallel cleaning subsystem 248 and a second parallel cleaning subsystem 250. The two parallel cleaning subsystems 248 and 250 have the same configuration and perform the same operation. The configuration and operation of the first parallel cleaning subsystem 248 will be described below.

[0118] The first parallel cleaning subsystem 248 includes two cleaning nozzle units 252, 254, a transport mechanism 256, and a nozzle cleaning device 257. The cleaning nozzle unit 252 includes a cleaning nozzle 260 and a holder 262 that holds the cleaning nozzle. The cleaning nozzle unit 254 includes a cleaning nozzle 264 and a holder 266 that holds the cleaning nozzle. The two cleaning nozzles 260, 264 form a cleaning nozzle set. The arrangement of the cleaning nozzles 260, 264 is fixed, and they move together. Each holder 262, 266 has an elastic member. The cleaning nozzles 260, 264 each include an aspirating nozzle and a discharging nozzle. In FIG. 17, a cuvette 274 stopped at the B / F cleaning position P1 is located directly below the cleaning nozzle 260.

[0119] In Fig. 17, labels I and II are attached to identify the two cleaning nozzle units 252 and 254. The same applies to Fig. 18 described later.

[0120] The transport mechanism 256 has a vertical transport mechanism and a horizontal transport mechanism. The vertical transport mechanism is omitted from the drawing. The horizontal transport mechanism is a mechanism for transporting the two cleaning nozzle units 252, 254 around the rotation axis C3, and includes a base 270 and a support 272. The two cleaning nozzle units 252, 254 are attached to the base 270. The illustrated θa is the positive rotation direction. Incidentally, the parallel cleaning subsystem 250 has a rotation axis C4, and the illustrated θb is the positive rotation direction. The nozzle cleaning equipment 257 consists of a single cleaning tank 258 provided outside the turntable.

[0121] For example, in the state shown in Fig. 17, the vertical transport mechanism is operated to move the two cleaning nozzle units 252, 254 downward, so that the cleaning nozzle 260 is inserted into the cuvette 274 at the B / F cleaning position P1, and at the same time, the cleaning nozzle 264 is inserted into the cleaning tank 258, as shown in Fig. 18. In this state, the first parallel cleaning step is performed. Specifically, B / F cleaning is performed using the cleaning nozzle 260, and at the same time, nozzle cleaning is performed on the cleaning nozzle 264. After the first parallel cleaning step is completed, the two cleaning nozzle units are moved upward, rotated +180 degrees, and moved downward, and then the second parallel cleaning step is performed.

[0122] FIG. 19 shows the operation of the parallel cleaning system according to the third embodiment. In S50, the nozzle set is positioned at the initial position (see FIG. 17). In S52, the nozzle set moves downward, and in S54, the first parallel cleaning process is executed (see FIG. 18). In S56, the nozzle set moves upward, and in S58, the nozzle set turns +180 degrees. In S60, the nozzle set moves downward, and in S62, the second parallel cleaning process is executed. In S64, the nozzle set moves upward, and in S66, the nozzle set turns -180 degrees. This causes the nozzle set to return to the initial position (S50). For example, when S66 is executed, the turntable rotates by one pitch. According to the third embodiment, the number of cleaning tanks can be reduced.

[0123] 20 to 24 show a fourth embodiment of the parallel cleaning system. In FIG. 20, B / F cleaning positions P1 and P2 are defined on a turntable. A parallel cleaning system 280 is composed of a first parallel cleaning subsystem 282 and a second parallel cleaning subsystem 284. The two parallel cleaning subsystems 282 and 284 have the same configuration and perform the same operation. The configuration and operation of the first parallel cleaning subsystem 282 will be described below.

[0124] The first parallel cleaning subsystem 282 has three cleaning nozzle units 286, 288, 290, a transport mechanism 292, and a nozzle cleaning facility 293. The cleaning nozzle unit 286 is composed of a cleaning nozzle 300 and a holder 302 that holds it. The cleaning nozzle unit 288 is composed of a cleaning nozzle 304 and a holder 306 that holds it. The cleaning nozzle unit 290 is composed of a cleaning nozzle 308 and a holder 310 that holds it.

[0125] A cleaning nozzle set is made up of three cleaning nozzles 300, 304, and 308. The arrangement of the cleaning nozzles 300, 304, and 308 is fixed, and they move together. The holders 302, 306, and 310 each have an elastic member. The cleaning nozzles 300, 304, and 308 each include a suction nozzle and a discharge nozzle. In FIG. 20, a cuvette 316 is located directly below the cleaning nozzle 304 and stops at the B / F cleaning position P1.

[0126] In Fig. 20, labels I, II, and III are attached to identify the three cleaning nozzle units 286, 288, and 290. The same applies to Figs. 21 to 23 described later.

[0127] The transport mechanism 292 has a vertical transport mechanism and a horizontal transport mechanism. The vertical transport mechanism is not shown. The horizontal transport mechanism is a mechanism for transporting the three cleaning nozzle units 286, 288, and 290 around the pivot axis C5, and includes a base 312 and a support 314. The illustrated θa is the positive rotation direction. Incidentally, the parallel cleaning subsystem 284 has a pivot axis C6, and the illustrated θb direction is the positive rotation direction. The nozzle cleaning equipment 293 consists of three cleaning tanks 294, 296, and 298 provided outside the turntable. The three nozzle cleaning positions and the B / F cleaning positions (i.e., the four cleaning nozzle stop positions) are arranged at 90 degree intervals around the pivot axis C5.

[0128] For example, in the state shown in Fig. 20, the vertical transport mechanism is operated to move the three cleaning nozzle units 286, 288, 290 downward, so that the cleaning nozzle 304 is inserted into the m-th cuvette 316 at the B / F cleaning position P1, the cleaning nozzle 300 is inserted into the cleaning tank 296, and the cleaning nozzle 308 is inserted into the cleaning tank 298, as shown in Fig. 21. In this state, the first parallel cleaning step is performed. Specifically, B / F cleaning is performed using the cleaning nozzle 304, and at the same time, nozzle cleaning is performed on the cleaning nozzles 300 and 308.

[0129] After the first parallel cleaning step is completed, the three cleaning nozzle units are moved upward, rotated +90 degrees, and then moved downward, and the second parallel cleaning step is performed as shown in Fig. 22. In Fig. 22, the cleaning nozzle 308 is inserted into the (m+1)th cuvette 316A at the B / F cleaning position P1. The cleaning nozzles 300 and 304 are inserted into the cleaning tanks 294 and 296. In this state, the cleaning nozzle 308 performs B / F cleaning, and the cleaning nozzles 300 and 304 are also cleaned.

[0130] After the second parallel cleaning step is completed, the three cleaning nozzle units are moved upward, rotated -180 degrees, and then moved downward, and the third parallel cleaning step is performed as shown in Fig. 23. In Fig. 23, the cleaning nozzle 300 is inserted into the (m+2)th cuvette 316B at the B / F cleaning position P1. The cleaning nozzles 304 and 308 are inserted into the cleaning tanks 298 and 294. In this state, the cleaning nozzle 300 performs B / F cleaning, and the cleaning nozzles 304 and 308 are also cleaned.

[0131] FIG. 24 shows the operation of the parallel cleaning system according to the fourth embodiment. In S70, the nozzle set is positioned at the initial position (see FIG. 20). In S72, the nozzle set moves downward, and in S74, the first parallel cleaning process is performed (see FIG. 21). In S76, the nozzle set moves upward, and in S78, the nozzle set is turned +90 degrees. In S80, the nozzle set moves downward, and in S82, the second parallel cleaning process is performed (see FIG. 22). In S84, the nozzle set moves upward, and in S86, the nozzle set is turned -180 degrees. Thereafter, in S88, the nozzle set moves downward, and in S90, the third parallel cleaning process is performed (see FIG. 23). In S92, the nozzle set moves upward, and in S94, the nozzle set is turned +90 degrees. This causes the nozzle set to return to the initial position (S70). For example, when S94 is executed, the turntable rotates one pitch.

[0132] According to the fourth embodiment, after each cleaning nozzle is used, nozzle cleaning is performed twice for that cleaning nozzle, which further reduces carryover. In each parallel cleaning subsystem, four cleaning nozzle units may be provided at 90 degree intervals around the rotation axis. In that case, after each cleaning nozzle is used, nozzle cleaning is performed three times for that cleaning nozzle, which greatly reduces carryover.

[0133] 25 to 28 show a fifth embodiment of the parallel cleaning system. In Fig. 25, B / F cleaning positions P1 and P2 are defined on a turntable. The parallel cleaning system 320 includes four cleaning nozzle units 324, 326, 328, and 330, a transport mechanism 322, and nozzle cleaning equipment 331 and 333.

[0134] The conveying mechanism 322 has a vertical conveying mechanism and a horizontal conveying mechanism. The vertical conveying mechanism is not shown. The horizontal conveying mechanism has a support 322A, a base 322B, and arms 322C and 322D. The base 322B is fixed to the upper end of the support 322A, and two arms 322C and 322D are fixed to both ends of the base 322B. Two cleaning nozzle units 324 and 330 are attached to both ends of the arm 322C. Two cleaning nozzle units 326 and 328 are attached to both ends of the arm 322D. The parallel cleaning system 320 has a rotation axis C7. The illustrated θa is the positive rotation direction. The nozzle cleaning equipment 331 is composed of a single cleaning tank 332, and the nozzle cleaning equipment 333 is composed of a single cleaning tank 334.

[0135] In the fifth embodiment, the parallel cleaning system 320 also includes a first parallel cleaning subsystem and a second parallel cleaning subsystem. The first parallel cleaning subsystem includes two cleaning nozzle units 324 and 326 that are diagonally arranged, and also includes a cleaning tank 332. The second parallel cleaning subsystem includes two cleaning nozzle units 328 and 330 that are diagonally arranged, and also includes a cleaning tank 334. The transfer mechanism 322 is shared between the first parallel cleaning subsystem and the second parallel cleaning subsystem.

[0136] The cleaning nozzle unit 324 is composed of a cleaning nozzle 336 and a holder 338 that holds it. The cleaning nozzle unit 326 is composed of a cleaning nozzle 340 and a holder 342 that holds it. The cleaning nozzle unit 328 is composed of a cleaning nozzle 344 and a holder 346 that holds it. The cleaning nozzle unit 330 is composed of a cleaning nozzle 348 and a holder 350 that holds it. The two cleaning nozzles 336, 340 form a first cleaning nozzle set. The two cleaning nozzles 344, 348 form a second cleaning nozzle set.

[0137] In Fig. 25, labels I, II, III, and IV are attached to identify the four cleaning nozzle units 324, 326, 328, and 330. The same applies to Figs. 26 to 28 described later.

[0138] The arrangement of the four cleaning nozzles 336, 340, 344, and 348 is fixed, and they move together. The holders 338, 342, 346, and 350 each have an elastic member. The cleaning nozzles 336, 340, 344, and 348 each include a suction nozzle and a discharge nozzle. In FIG. 25, a cuvette 352 that stops at a first B / F cleaning position P1 is located directly below the cleaning nozzle 336. A cuvette 354 that stops at a second B / F cleaning position P2 is located directly below the cleaning nozzle 344.

[0139] For example, in the state shown in Fig. 25, the vertical transport mechanism is operated to move the four cleaning nozzle units 324, 326, 328, and 330 downward, so that cleaning nozzle 336 is inserted into cuvette 352 at B / F cleaning position P1, and cleaning nozzle 344 is inserted into cuvette 354 at B / F cleaning position P2, as shown in Fig. 26. At the same time, cleaning nozzle 340 is inserted into cleaning tank 332, and cleaning nozzle 348 is inserted into cleaning tank 334. In this state, a first parallel cleaning step is performed in the two parallel cleaning subsystems.

[0140] After the first parallel washing step is completed, the four washing nozzle units are moved upward, rotated +180 degrees, and then moved downward, so that the second parallel washing step is performed as shown in Fig. 27. In Fig. 27, the washing nozzle 340 is inserted into the next cuvette 352A at the B / F washing position P1, and the washing nozzle 348 is inserted into the next cuvette 354A at the B / F washing position P2. At the same time, the washing nozzle 336 is inserted into the washing tank 332, and the washing nozzle 344 is inserted into the washing tank 334. In this state, the second parallel washing step is performed in the two parallel washing subsystems.

[0141] FIG. 28 shows the operation of the parallel cleaning system according to the fifth embodiment. In S100, the nozzle set is positioned at the initial position (see FIG. 25). In S102, the nozzle set moves downward, and in S104, the first parallel cleaning process is executed (see FIG. 26). In S106, the nozzle set moves upward, and in S108, the nozzle set rotates +180 degrees. In S110, the nozzle set moves downward, and in S112, the second parallel cleaning process is executed (see FIG. 27). In S114, the nozzle set moves upward, and in S116, the nozzle set rotates -180 degrees. This causes the nozzle set to return to the initial position (S100). For example, when S116 is executed, the turntable rotates by one pitch. According to the fifth embodiment, the transport equipment can be shared between the two parallel cleaning subsystems.

[0142] According to the sample analyzer of each of the above embodiments, it is possible to improve the B / F cleaning quality and reduce carryover without reducing throughput. [Explanation of symbols]

[0143] 10 Sample analyzers, 70, 72, 164, 202, 246, 280, 320, Parallel cleaning systems 74, 114, 166, 168, 204, 205, 248, 250, 282, 284 Parallel cleaning subsystems, 75, 117 Cleaning nozzle sets, 76, 78, 118, 120, 190, 194, 216, 220, 260, 264, 300, 304, 308, 336. 340, 344, 348 Cleaning nozzles, 116, 122, 184, 210, 256, 292, 322 Transport mechanisms, 103, 187, 211, 257, 293, 331, 333 Nozzle cleaning equipment.

Claims

1. a movable table for holding a row of sample containers and having a B / F washing position; a cleaning nozzle set consisting of n cleaning nozzles (where n is an integer of 2 or more) which are used in sequence at the B / F cleaning position; a nozzle cleaning facility for cleaning the cleaning nozzle set; a control unit that controls an operation of the cleaning nozzle set so that a parallel cleaning process consisting of n parallel cleaning processes from a first parallel cleaning process to an nth parallel cleaning process is repeatedly performed; Including, In an i-th (where i=1, ..., n) parallel cleaning step, B / F cleaning is performed by an i-th cleaning nozzle at the B / F cleaning position, and nozzle cleaning is performed on at least one other cleaning nozzle than the i-th cleaning nozzle by using the nozzle cleaning equipment. A sample analyzer comprising:

2. 2. The sample analyzer according to claim 1, The sample analyzer operates according to a cycle time, which is a basic unit of time; The n parallel cleaning steps correspond to n cycle times. A sample analyzer comprising:

3. 2. The sample analyzer according to claim 1, In the B / F cleaning, a B / F cleaning sequence including a plurality of nozzle operations is performed; In the nozzle cleaning, a nozzle cleaning sequence including a plurality of nozzle operations is performed, the B / F cleaning sequence and the nozzle cleaning sequence are synchronized; A sample analyzer comprising:

4. 4. The sample analyzer according to claim 3, a plurality of suction operations included in the B / F cleaning sequence and a plurality of suction operations included in the nozzle cleaning sequence are aligned on a time axis; A sample analyzer comprising:

5. 4. The sample analyzer according to claim 3, a plurality of suction operations included in the B / F cleaning sequence and a plurality of suction operations included in the nozzle cleaning sequence are shifted on a time axis; A sample analyzer comprising:

6. 2. The sample analyzer according to claim 1, a manifold connected to the n cleaning nozzles via n suction tubes; a suction pump connected to the manifold; A sample analyzer comprising:

7. 7. The sample analyzer according to claim 6, n valves controlled by the control unit are provided in the n suction tubes. A sample analyzer comprising:

8. 2. The sample analyzer according to claim 1, a conveying mechanism for conveying the entire cleaning nozzle set in horizontal and vertical directions while maintaining the arrangement of the n cleaning nozzles constituting the cleaning nozzle set; A sample analyzer comprising:

9. 9. The sample analyzer according to claim 8, The n cleaning nozzles are arranged around a pivot axis that is a vertical axis, the transport mechanism includes a rotation mechanism that rotates the cleaning nozzle set around the rotation axis, The nozzle cleaning equipment includes a plurality of nozzle cleaning tanks for cleaning n-1 other cleaning nozzles other than the i-th cleaning nozzle. A sample analyzer comprising:

10. 9. The sample analyzer according to claim 8, The n cleaning nozzles are arranged along a slide direction crossing the row of sample containers as viewed from above, the transport mechanism includes a slide mechanism that moves the cleaning nozzle set in the slide direction, the nozzle cleaning facility has a plurality of nozzle cleaning tanks for cleaning n-1 other cleaning nozzles other than the i-th cleaning nozzle, the nozzle cleaning tanks including at least one nozzle cleaning tank provided on one side of the specimen container row and at least one nozzle cleaning tank provided on the other side of the specimen container row. A sample analyzer comprising:

11. 2. The sample analyzer according to claim 1, wherein n is 2; The n cleaning nozzles are a first cleaning nozzle and a second cleaning nozzle, In each of the parallel cleaning steps, the B / F cleaning is performed by one of the first cleaning nozzle and the second cleaning nozzle, and at the same time, the nozzle cleaning is performed by the other of the first cleaning nozzle and the second cleaning nozzle. A sample analyzer comprising:

12. 2. The sample analyzer according to claim 1, The n is 3 or more, In each of the parallel cleaning steps, the B / F cleaning is performed by the i-th cleaning nozzle, and simultaneously, the nozzle cleaning is performed on n-1 other cleaning nozzles other than the i-th cleaning nozzle; In one parallel cleaning process, n-1 nozzle cleanings are performed for each cleaning nozzle. A sample analyzer comprising:

13. 2. The sample analyzer according to claim 1, the B / F cleaning position is a first B / F cleaning position, a second B / F cleaning position different from the first B / F cleaning position is defined on the movable table; The sample analyzer includes: a first parallel cleaning subsystem having a first cleaning nozzle set, the cleaning nozzle set, and a first nozzle cleaning facility, the nozzle cleaning facility; a second parallel cleaning subsystem having a second cleaning nozzle set of n cleaning nozzles that are rotated at the second B / F cleaning position and a second nozzle cleaning station for cleaning the second cleaning nozzle set; Including, the control unit controls the operation of the first cleaning nozzle set and the operation of the second cleaning nozzle set so that the first parallel cleaning subsystem repeatedly executes the parallel cleaning process, and the second parallel cleaning subsystem repeatedly executes a parallel cleaning process corresponding to the parallel cleaning process. A sample analyzer comprising:

14. a movable table for holding a row of sample containers and having a B / F washing position; a cleaning nozzle set consisting of n cleaning nozzles (where n is an integer of 2 or more) which are used in sequence at the B / F cleaning position; a nozzle cleaning facility for cleaning the cleaning nozzle set; A cleaning method performed in a sample analyzer comprising: The operation of the cleaning nozzle set is controlled so that a parallel cleaning process consisting of n parallel cleaning processes from a first parallel cleaning process to an nth parallel cleaning process is repeatedly performed; In an i-th (where i=1, ..., n) parallel cleaning step, B / F cleaning is performed by an i-th cleaning nozzle at the B / F cleaning position, and nozzle cleaning is performed on at least one other cleaning nozzle than the i-th cleaning nozzle by using the nozzle cleaning equipment. A cleaning method comprising the steps of:

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