Substrate processing apparatus and substrate processing method

Abstract

To provide a substrate processing apparatus and a substrate processing method, capable of highly accurately identifying processing liquid in a liquid discharge unit.SOLUTION: A substrate processing apparatus 100 includes a chamber 112, a substrate holding unit 120, a processing liquid supply unit 130, a liquid discharge unit 190, at least one near-infrared light source 140, a near-infrared imaging unit 150, and a control unit 102. The substrate holding unit 120 is housed in the chamber 112. The substrate holding unit 120 holds a substrate W. The processing liquid supply unit 130 supplies multiple types of processing liquid at different times onto the substrate W. The liquid discharge unit 190 discharges the multiple types of processing liquid outside the chamber 112. The at least one near-infrared light source 140 irradiates a region AR1 including at least a part of the liquid discharge unit 190 with near-infrared rays. The near-infrared imaging unit 150 captures an image of the multiple types of processing liquid in the liquid discharge unit irradiated with the near-infrared rays and generates a captured image. The control unit 102 identifies the type of the processing liquid in the liquid discharge unit 190 on the basis of the captured image.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus and a substrate processing method. [Background technology]

[0002] There is known a substrate processing apparatus that processes a substrate by supplying a processing liquid to the substrate (see, for example, Patent Document 1). The substrate processing apparatus described in Patent Document 1 includes a substrate holding unit, a processing liquid supply unit, a common drain pipe, a switching valve, a cleaning liquid supply unit, and a liquid detection unit. The processing liquid supply unit individually supplies multiple types of processing liquid to the substrate. The liquid detection unit detects the presence or absence of valve cleaning liquid at a detection position on the common drain pipe. This makes it possible to easily clean the inside of the switching valve. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2017-208404 A Summary of the Invention [Problem to be solved by the invention]

[0004] In a substrate processing apparatus as described in Patent Document 1, for example, when a switching valve switches the destination of a processing liquid, the open / close state of the switching valve connected to a common drain pipe is changed. In this case, it is difficult to confirm whether the processing liquid on the common drain pipe and in the flow path of the switching valve (drainage section) has been switched. Specifically, since the processing liquid used in substrate processing is generally transparent, the processing liquid cannot be detected by a general CCD camera. For this reason, the processing liquid on the common drain pipe and in the switching valve (drainage section) may not be identified with high accuracy.

[0005] The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of identifying the processing liquid in a drainage section with high accuracy. [Means for solving the problem]

[0006] According to one aspect of the present invention, a substrate processing apparatus includes a chamber, a substrate holding unit, a processing liquid supply unit, a drainage unit, at least one near-infrared light source, a near-infrared imaging unit, and a controller. The substrate holding unit is accommodated in the chamber. The substrate holding unit holds a substrate. The processing liquid supply unit supplies a plurality of types of processing liquid to the substrate at different times. The drainage unit drains the plurality of types of processing liquid outside the chamber. The at least one near-infrared light source irradiates an area including at least a portion of the drainage unit with near-infrared light. The near-infrared imaging unit images the plurality of types of processing liquid in the drainage unit being irradiated with the near-infrared light to generate an image. The controller controls the near-infrared imaging unit. The controller identifies the type of the processing liquid in the drainage unit based on the image.

[0007] In one embodiment, the control unit controls the drainage unit based on the result of identifying the type of the treatment liquid.

[0008] In one embodiment, the drainage section includes an upstream pipe, a common pipe, and a plurality of downstream pipes. The upstream pipe allows the plurality of treatment liquids discharged from the chamber to flow through. The common pipe is connected to a downstream end of the upstream pipe. The upstream ends of the plurality of downstream pipes are connected to the common pipe.

[0009] In one embodiment, the drainage unit further includes a switching unit that switches a destination of the treatment liquid flowing through the common pipe between the plurality of downstream pipes.

[0010] In one embodiment, the near-infrared light source irradiates an area including at least a part of the upstream piping with near-infrared light. The near-infrared imaging unit generates the captured image. The captured image is generated by capturing an image of the multiple types of treatment liquid in the upstream piping irradiated with near-infrared light. The control unit identifies the type of treatment liquid in the upstream piping based on the captured image.

[0011] In one embodiment, the near-infrared light source irradiates an area including at least a portion of the common pipe with near-infrared light. The near-infrared image capturing unit captures an image of the plurality of types of processing liquid in the common pipe irradiated with the near-infrared light to generate the captured image. The control unit identifies the type of the processing liquid in the common pipe based on the captured image.

[0012] In one embodiment, the control unit controls a switching timing for switching a destination of the treatment liquid flowing through the common pipe based on a result of identifying the type of the treatment liquid.

[0013] In one embodiment, the at least one near-infrared light source is a plurality of near-infrared light sources. The plurality of near-infrared light sources emit near-infrared light having different peak wavelengths from one another. The control unit acquires type information indicating a type of the treatment liquid. The control unit changes the near-infrared light source that irradiates an area including at least a part of the drainage unit based on the type information.

[0014] In one embodiment, the control unit controls the treatment liquid supply unit based on the result of identifying the type of the treatment liquid.

[0015] According to another aspect of the present invention, a substrate processing method includes the steps of holding a substrate in a chamber; supplying multiple types of processing liquid to the substrate at different times; a drainage section draining the multiple types of processing liquid out of the chamber; irradiating an area including at least a portion of the drainage section with near-infrared light; generating an image of the multiple types of processing liquid in the drainage section being irradiated with near-infrared light; and identifying the type of processing liquid in the drainage section based on the image.

[0016] In one embodiment, the method further comprises controlling the drainage section based on the result of identifying the type of the processing liquid.

[0017] In one embodiment, the drainage section includes an upstream pipe, a common pipe, and a downstream pipe. The upstream pipe allows the plurality of processing liquids discharged from the chamber to flow through. The common pipe is connected to a downstream end of the upstream pipe. The upstream ends of the plurality of downstream pipes are connected to the common pipe.

[0018] In one embodiment, in the step of controlling the drainage section, a destination of the treatment liquid flowing through the common pipe is switched between the plurality of downstream pipes.

[0019] In one embodiment, in the step of irradiating with near-infrared rays, an area including at least a portion of the upstream piping is irradiated with the near-infrared rays. In the step of generating the captured image, the captured image is generated by capturing images of the multiple types of treatment liquid in the upstream piping being irradiated with the near-infrared rays. In the step of identifying the type of treatment liquid, the type of treatment liquid in the upstream piping is identified based on the captured image.

[0020] In one embodiment, in the step of irradiating with near-infrared rays, an area including at least the part of the common pipe is irradiated with near-infrared rays. In the step of generating a captured image, an image of the multiple types of processing liquid in the common pipe being irradiated with near-infrared rays is captured to generate the captured image. In the step of identifying the type of processing liquid, the type of processing liquid in the common pipe is identified based on the captured image.

[0021] In one embodiment, in the step of controlling the drainage unit, a switching timing for switching a destination of the treatment liquid flowing through the common pipe is controlled based on a result of identifying the type of the treatment liquid.

[0022] In one embodiment, in the step of irradiating with near-infrared rays, any one of a plurality of near-infrared light sources emitting near-infrared rays having different peak wavelengths irradiates an area including at least a portion of the drainage section with the near-infrared rays. The substrate processing method further includes a step of acquiring type information indicating a type of the processing liquid, and a step of changing the near-infrared light source that irradiates the area including at least a portion of the drainage section based on the type information.

[0023] In one embodiment, in the step of supplying the processing liquids at different timings, the processing liquid to be supplied to the substrate is switched based on the result of identifying the type of the processing liquid. Effect of the Invention

[0024] According to the present invention, it is possible to provide a substrate processing apparatus and a substrate processing method capable of identifying the processing liquid in the drainage section with high accuracy. [Brief description of the drawings]

[0025] [Figure 1] FIG. 2 is a schematic plan view of the substrate processing apparatus. [Diagram 2] 2 is a schematic diagram of a substrate processing unit in the substrate processing apparatus; FIG. [Diagram 3] FIG. 2 is a block diagram of the substrate processing apparatus. [Figure 4] 2 is a diagram showing an example of the configuration of a switching valve included in the substrate processing apparatus of the present embodiment; FIG. [Diagram 5] 2 is a block diagram showing configurations of a control device and a switching unit included in the substrate processing apparatus of the present embodiment. FIG. [Figure 6] FIG. 1 is a flow diagram of a substrate processing method. [Figure 7] 4 is a flow diagram of a substrate processing step in the substrate processing method of the present embodiment. FIG. [Figure 8] 4 is a flow diagram of a substrate processing step in the substrate processing method of the present embodiment. FIG. [Figure 9] 2 is a diagram showing an example of the configuration of a switching valve included in the substrate processing apparatus of the present embodiment; FIG. [Figure 10] 2 is a diagram showing an example of the configuration of a switching valve included in the substrate processing apparatus of the present embodiment; FIG. [Figure 11] 2 is a diagram showing an example of the configuration of a switching valve included in the substrate processing apparatus of the present embodiment; FIG. [Figure 12] 2 is a diagram showing an example of the configuration of a switching valve included in the substrate processing apparatus of the present embodiment; FIG. [Figure 13] 1 is a schematic diagram of a substrate processing unit in a substrate processing apparatus equipped with a plurality of near-infrared light sources. [Figure 14] 4 is a flow diagram of a substrate processing step in the substrate processing method of the present embodiment. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0026] Hereinafter, an embodiment of a substrate processing apparatus and a substrate processing method according to the present invention will be described with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference symbols and will not be described repeatedly. In this specification, to facilitate understanding of the invention, an X-axis, a Y-axis, and a Z-axis that are orthogonal to each other may be described. Typically, the X-axis and the Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0027] First, a substrate processing apparatus 100 according to the present embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic plan view of the substrate processing apparatus 100.

[0028] 1, the substrate processing apparatus 100 processes a substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface treatment, property imparting, treatment film formation, removal of at least a portion of a film, and cleaning.

[0029] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W has a substantially circular disk shape. Here, the substrate processing apparatus 100 processes the substrates W one by one.

[0030] 1, the substrate processing apparatus 100 includes a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a controller 101. The controller 101 controls the load ports LP, the indexer robot IR, the center robot CR, and the substrate processing units 110.

[0031] Each load port LP accommodates a plurality of stacked substrates W. The indexer robot IR transports the substrates W between the load port LP and the center robot CR. Note that a placement stage (path) on which the substrate W is temporarily placed may be provided between the indexer robot IR and the center robot CR, and the substrate W may be indirectly transferred between the indexer robot IR and the center robot CR via the placement stage. The center robot CR transports the substrates W between the indexer robot IR and the substrate processing units 110. Each of the substrate processing units 110 discharges a processing liquid onto the substrate W to process the substrate W. The fluid cabinet 10A accommodates a processing liquid. Note that the fluid cabinet 10A may accommodate a gas.

[0032] The substrate processing units 110 form a plurality of towers TW (four towers TW in FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes the substrate processing units 110 stacked vertically (three substrate processing units 110 in FIG. 1). Each fluid box 10B corresponds to a plurality of towers TW. The processing liquid in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via any of the fluid boxes 10B. Also, the gas in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via any of the fluid boxes 10B.

[0033] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computer.

[0034] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may include a removable medium. The control unit 102 executes a computer program stored in the storage unit 104 to perform a substrate processing operation.

[0035] The storage unit 104 stores data. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes defines the processing content and processing procedure for the substrate W.

[0036] The storage unit 104 may also store the luminance value or brightness of the reference treatment liquid, or may store a reference image obtained by capturing an image of the reference treatment liquid.

[0037] Next, the substrate processing unit 110 in the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 2. Fig. 2 is a schematic diagram of the substrate processing unit 110 in the substrate processing apparatus 100.

[0038] The substrate processing unit 110 includes a chamber 112, a substrate holding part 120, and a processing liquid supply part 130. The chamber 112 houses the substrate holding part 120 and the processing liquid supply part 130.

[0039] The chamber 112 has a generally box-like shape with an internal space. The chamber 112 accommodates the substrate W. Here, the substrate processing unit 110 is a single-wafer type that processes the substrate W one by one, and the chamber 112 accommodates the substrate W one by one. The substrate W is accommodated in the chamber 112 and is processed in the chamber 112.

[0040] The substrate holding unit 120 holds the substrate W. The substrate holding unit 120 holds the substrate W horizontally so that the top surface (front surface) Wt of the substrate W faces upward and the back surface (bottom surface) Wr of the substrate W faces vertically downward. The substrate holding unit 120 also rotates the substrate W while holding it. The top surface Wt of the substrate W may be flattened. Alternatively, the top surface Wt of the substrate W may be provided with a device surface, or a pillar-shaped laminate with a recess may be provided. The substrate holding unit 120 rotates the substrate W while holding it.

[0041] For example, the substrate holding unit 120 may be of a clamping type that clamps an end of the substrate W. Alternatively, the substrate holding unit 120 may have any mechanism that holds the substrate W from the back surface Wr. For example, the substrate holding unit 120 may be of a vacuum type. In this case, the substrate holding unit 120 holds the substrate W horizontally by adsorbing the center part of the back surface Wr of the substrate W, which is the non-device forming surface, to the upper surface. Alternatively, the substrate holding unit 120 may combine a clamping type that brings multiple chuck pins into contact with the peripheral end surface of the substrate W with a vacuum type.

[0042] For example, the substrate holding unit 120 includes a spin base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the spin base 121. The chuck member 122 chucks the substrate W. Typically, the spin base 121 is provided with a plurality of chuck members 122.

[0043] The shaft 123 is a hollow shaft. The shaft 123 extends vertically along the rotation axis Ax. The spin base 121 is coupled to the upper end of the shaft 123. The substrate W is placed above the spin base 121.

[0044] The spin base 121 is disk-shaped. The chuck member 122 horizontally supports the substrate W. The shaft 123 extends downward from the center of the spin base 121. The electric motor 124 applies a rotational force to the shaft 123. The electric motor 124 rotates the shaft 123 in a rotational direction, thereby rotating the substrate W and the spin base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0045] The processing liquid supply unit 130 supplies a plurality of types of processing liquids at different times to the substrate W. Typically, the processing liquid supply unit 130 supplies the processing liquid to the upper surface Wt of the substrate W held by the substrate holding unit 120.

[0046] The processing liquid may be an etching liquid for etching the substrate W. Examples of the etching liquid include hydrofluoric nitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of the etching liquid is not particularly limited, and may be, for example, acidic or alkaline.

[0047] Alternatively, the processing liquid may be a rinse liquid, such as deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water (e.g., about 10 ppm to 100 ppm), and reduced water (hydrogen water).

[0048] Alternatively, the treatment liquid may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinse liquid. Examples of the organic solvent include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoro ether (HFE), propylene glycol monoethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0049] In this embodiment, the processing liquid supply unit 130 includes a first processing liquid supply unit 130a, a second processing liquid supply unit 130b, and a rinsing liquid supply unit 130c. The first processing liquid supply unit 130a supplies a first processing liquid to the substrate W. The second processing liquid supply unit 130b supplies a second processing liquid different from the first processing liquid to the substrate W. The rinsing liquid supply unit 130c supplies a rinsing liquid to the substrate W.

[0050] The first processing liquid supply unit 130a includes a pipe 132a, a valve 134a, a nozzle 136a, and a moving mechanism 1381. The first processing liquid flows through the pipe 132a from a supply source. The valve 134a opens and closes a flow path in the pipe 132a. The nozzle 136a is connected to the pipe 132a. The first processing liquid flows through the nozzle 136a, causing the nozzle 136a to eject the first processing liquid onto the upper surface Wt of the substrate W. The nozzle 136a is preferably configured to be movable relative to the substrate W.

[0051] The pipe 132a and the nozzle 136a are made of resin, and are not particularly limited, but are formed of, for example, PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0052] The moving mechanism 1381 moves the nozzle 136a in the horizontal and vertical directions. More specifically, the moving mechanism 138 moves the nozzle 136a in the circumferential direction around a rotation axis that extends in the vertical direction. The moving mechanism 138 also raises and lowers the nozzle 136a in the vertical direction.

[0053] The moving mechanism 1381 has an arm 138a, a shaft 138b, and a drive unit 138c. The arm 138a extends along the horizontal direction. The nozzle 136 is disposed at the tip of the arm 138a. The nozzle 136 is disposed at the tip of the arm 138a in a position that allows the nozzle 136 to supply a processing liquid toward the upper surface Wt of the substrate W held by the chuck member 122. More specifically, the nozzle 136a is coupled to the tip of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is coupled to the shaft 138b. The shaft 138b extends along the vertical direction.

[0054] The driving unit 138c has a rotation driving mechanism and an elevation driving mechanism. The rotation driving mechanism of the driving unit 138c rotates the shaft portion 138b about the rotation axis, and rotates the arm 138a along the horizontal plane about the shaft portion 138b. As a result, the nozzle 136a moves along the horizontal plane. More specifically, the nozzle 136a moves in the circumferential direction around the shaft portion 138b. The rotation driving mechanism of the driving unit 138c includes, for example, a motor capable of forward and reverse rotation.

[0055] The lifting drive mechanism of the drive unit 138c raises and lowers the shaft unit 138b in the vertical direction. The lifting drive mechanism of the drive unit 138c raises and lowers the shaft unit 138b, thereby raising and lowering the nozzle 136 in the vertical direction. The lifting drive mechanism of the drive unit 138c has a drive source such as a motor and a lifting mechanism, and the drive source drives the lifting mechanism to raise or lower the shaft unit 138b. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

[0056] The second processing liquid supply unit 130b includes a pipe 132b, a valve 134b, a nozzle 136b, and a moving mechanism 1382. The second processing liquid flows through the pipe 132b from a supply source. The valve 134b opens and closes a flow path in the pipe 132b. The nozzle 136b is connected to the pipe 132b. The second processing liquid flows through the nozzle 136b, so that the nozzle 136b ejects the second processing liquid onto the upper surface Wt of the substrate W. The nozzle 136b is preferably configured to be movable relative to the substrate W.

[0057] The pipe 132b and the nozzle 136b are made of resin, and are not particularly limited, but may be made of, for example, PFA or PTFE.

[0058] The moving mechanism 1382 moves the nozzle 136b in the horizontal and vertical directions. The moving mechanism 1382 has a similar configuration to the moving mechanism 1381, and therefore a description thereof will be omitted.

[0059] The rinsing liquid supply unit 130c includes a pipe 132c, a valve 134c, and a nozzle 136c. The rinsing liquid flows through the pipe 132c from a supply source. The valve 134c opens and closes a flow path in the pipe 132c. The nozzle 136c is connected to the pipe 132c. As the rinsing liquid flows through the nozzle 136c, the nozzle 136c ejects the rinsing liquid onto the upper surface Wt of the substrate W. The nozzle 136c is fixed to the substrate W.

[0060] The pipe 132c and the nozzle 136c are made of resin. The pipe 132b and the nozzle 136b are made of, but are not limited to, PFA or PTFE, for example.

[0061] In this specification, the pipes 132a, 132b, and 132c may be collectively referred to as the pipes 132. In this specification, the valves 134a, 134b, and 134c may be collectively referred to as the valves 134. In this specification, the nozzles 136a, 136b, and 136c may be collectively referred to as the nozzles 136. In this specification, the moving mechanisms 1381 and 1382 may be collectively referred to as the moving mechanisms 138.

[0062] The substrate processing apparatus 100 further includes a cup 180. The cup 180 collects the processing liquid scattered from the substrate W. The cup 180 moves up and down. For example, the cup 180 moves up vertically to the side of the substrate W during the period in which the processing liquid supply unit 130 supplies the processing liquid to the substrate W. In this case, the cup 180 collects the processing liquid scattered from the substrate W due to the rotation of the substrate W. Furthermore, when the period in which the processing liquid supply unit 130 supplies the processing liquid to the substrate W ends, the cup 180 moves down vertically from the side of the substrate W.

[0063] Next, the substrate processing apparatus 100 will be further described with reference to Fig. 2. As shown in Fig. 2, the substrate processing apparatus 100 further includes a drainage unit 190, at least one near-infrared light source 140, and a near-infrared imaging unit 150. In this embodiment, the substrate processing apparatus 100 includes one near-infrared light source 140.

[0064] The drainage unit 190 drains the multiple types of treatment liquids to the outside of the chamber 112. The drainage unit 190 is disposed outside the chamber 112. The drainage unit 190 is disposed, for example, below the chamber 112. The drainage unit 190 has an upstream pipe 12, a common pipe 13, multiple downstream pipes 14, a switching unit 19, and a first port P1, a second port P2, a third port P3, and a fourth port P4.

[0065] A plurality of types of processing liquids drained from the chamber 112 flow through the upstream pipe 12. The upstream pipe 12 is a tubular member that extends from the inside to the outside of the chamber 112. One end 12a of the upstream pipe 12 is connected to the bottom of the cup 180. More specifically, a drain hole is provided in the bottom of the cup 180. The upstream pipe 12 is connected to the bottom of the cup 180 so as to communicate with the drain hole. As a result, the processing liquids collected in the cup 180 after the substrate processing flow into the upstream pipe 12 due to their own weight. In other words, the drainage liquid collected in the cup 180 flows into the upstream pipe 12 due to their own weight.

[0066] The downstream end 12b of the upstream pipe 12 is connected to the common pipe 13. The common pipe 13 is a tubular member. The common pipe 13 is disposed outside the chamber 112.

[0067] Upstream ends 14a of the multiple downstream pipes 14 are connected to the common pipe 13. The multiple downstream pipes 14 are tubular members. In this embodiment, the multiple downstream pipes 14 include a first pipe 141, a second pipe 142, a third pipe 143, and a fourth pipe 144.

[0068] The switching unit 19 switches the destination of the treatment liquid flowing through the common pipe 13 between the multiple downstream pipes 14. Specifically, the switching unit 19 is controlled by the control device 101 (control unit 102). The control device 101 (control unit 102) controls the switching unit 19 to switch the destination of the treatment liquid flowing through the common pipe 13 between the multiple downstream pipes 14. Hereinafter, the destination of the treatment liquid flowing through the common pipe 13 may be referred to as the "destination of the treatment liquid."

[0069] In this embodiment, the switching unit 19 switches the destination of the treatment liquid flowing through the common pipe 13 between the first pipe 141 to the fourth pipe 144.

[0070] In detail, the switching unit 19 includes a switching valve 191. The switching valve 191 includes a first switching valve 191a to a fourth switching valve 191d. The first switching valve 191a to the fourth switching valve 191d are arranged in a straight line in this order. That is, the first switching valve 191a and the second switching valve 191b are adjacent to each other, the second switching valve 191b and the third switching valve 191c are adjacent to each other, and the third switching valve 191c and the fourth switching valve 191d are adjacent to each other. Therefore, the first switching valve 191a and the second switching valve 191b are connected to each other. Similarly, the second switching valve 191b and the third switching valve 191c are connected to each other, and the third switching valve 191c and the fourth switching valve 191d are connected to each other. In this embodiment, the switching valve 191 extends straight in a substantially horizontal position. In this embodiment, the common pipe 13 and the first to fourth switching valves 191a to 191d form a multiple valve.

[0071] The downstream end 12b of the upstream pipe 12 is connected to the first switching valve 191a. More specifically, in this embodiment, the upstream pipe 12 includes a horizontal section 12c extending in the horizontal direction, and one end of the horizontal section 12c is connected to the first switching valve 191a. One end of a first pipe 141 is further connected to the first switching valve 191a. The other end of the first pipe 141 is connected to the first port P1. The treatment liquid flowing through the upstream pipe 12 flows in a substantially horizontal direction in the horizontal section 12c.

[0072] One end of the second pipe 142 is connected to the second switching valve 191b. The other end of the second pipe 142 is connected to the second port P2. One end of the third pipe 143 is connected to the third switching valve 191c. The other end of the third pipe 143 is connected to the third port P3. One end of the fourth pipe 144 is connected to the fourth switching valve 191d. The other end of the fourth pipe 144 is connected to the fourth port P4.

[0073] The control device 101 (control unit 102) controls the first switching valve 191a to the fourth switching valve 191d to switch the destination of the treatment liquid between the first pipe 141 to the fourth pipe 144. In other words, the control device 101 (control unit 102) switches the destination of the treatment liquid between the first port P1 to the fourth port P4. For example, when the first pipe 141 (first port P1) is selected as the destination of the treatment liquid, the treatment liquid flows into the first pipe 141 via the switching valve 191 and is guided to the first port P1 by the first pipe 141.

[0074] For example, a drainage line (not shown) is connected to the first port P1, the second port P2, the third port P3, and the fourth port P4. The drainage line is installed in a factory where the substrate processing apparatus 100 is installed. The first port P1, the second port P2, the third port P3, and the fourth port P4 may be connected to a drainage tank (not shown) provided in the substrate processing apparatus 100 via piping (not shown).

[0075] The upstream pipe 12, the common pipe 13, the multiple downstream pipes 14, and the switching unit 19 are made of resin. The upstream pipe 12, the common pipe 13, the multiple downstream pipes 14, and the switching unit 19 transmit near-infrared light emitted from the near-infrared light source 140. Details of the near-infrared light source 140 will be described later. In this embodiment, the upstream pipe 12, the common pipe 13, the multiple downstream pipes 14, and the switching unit 19 transmit near-infrared light emitted from the near-infrared light source 140. The upstream pipe 12, the common pipe 13, the multiple downstream pipes 14, and the switching unit 19 are made of, but are not particularly limited to, PFA or PTFE, for example.

[0076] The near-infrared light source 140 emits at least near-infrared light. The near-infrared light source 140 irradiates an area including at least a part of the drainage section 190 with near-infrared light. The near-infrared light source 140 irradiates an area outside the chamber 112 and including at least a part of the drainage section 190 with near-infrared light. In detail, the near-infrared light source 140 irradiates an area including at least a part of the common pipe 13. Here, the near-infrared light source 140 emits near-infrared light toward the entire area of ​​the common pipe 13.

[0077] For example, the near-infrared light source 140 emits near-infrared light having a wavelength in the range of at least 800 nm to 2.5 μm. Typically, the near-infrared light source 140 emits near-infrared light having a wavelength in the range of at least 800 nm to 1.5 μm. Note that the near-infrared light source 140 may emit visible light together with the near-infrared light.

[0078] For example, the near-infrared light emitted from the near-infrared light source 140 travels linearly along the optical axis. Alternatively, the near-infrared light emitted from the near-infrared light source 140 travels while diverging from the optical axis. It is preferable that the near-infrared light source 140 is disposed so that the optical axis of the near-infrared light source 140 passes through the center of the common pipe 13.

[0079] The near-infrared imaging section 150 has a plurality of pixels. The near-infrared imaging section 150 is sensitive to at least near-infrared light. The near-infrared imaging section 150 captures a plurality of types of processing liquids in the drainage section 190 that are irradiated with near-infrared light to generate a captured image. In detail, the near-infrared imaging section 150 captures the inside of the drainage section 190 by receiving components of the near-infrared light emitted from the near-infrared light source 140 that are transmitted and / or reflected by members in the drainage section 190 to generate a captured image. Here, the near-infrared imaging section 150 receives components of the near-infrared light emitted from the near-infrared light source 140 that are transmitted and / or reflected by the common pipe 13.

[0080] The near-infrared imaging section 150 images an area including at least a part of the drainage section 190. The near-infrared imaging section 150 images an area outside the chamber 112 and including at least a part of the drainage section 190. The near-infrared imaging section 150 may image the entire drainage section 190. Alternatively, the near-infrared imaging section 150 may image a partial area inside the drainage section 190. In this case, the near-infrared imaging section 150 may image the inside of the drainage section 190 by switching the imaging area. Alternatively, the near-infrared imaging section 150 may image the inside of the drainage section 190 by switching the imaging area between the entire inside of the drainage section 190 and a partial area inside the chamber 112. The area imaged by the near-infrared imaging section 150 does not have to coincide with the area irradiated by the near-infrared light source 140.

[0081] In the near-infrared imaging section 150, the frame rate may be 30 fps or 60 fps. Alternatively, the frame rate may be 120 fps.

[0082] The near-infrared imaging unit 150 may include a SWIR (Short Wavelength Infra-Red) image sensor. In this case, the near-infrared imaging unit 150 detects near-infrared rays having a wavelength in the range of at least 800 nm to 2.5 μm.

[0083] The near-infrared imaging section 150 may be sensitive to visible light as well as near-infrared light, or may switch between receiving near-infrared light and visible light.

[0084] The near-infrared imaging section 150 captures an image of the surroundings centered on the imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the captured image of the near-infrared imaging section 150 is located at the center of the common pipe 13. In this case, the imaging optical axis of the near-infrared imaging section 150 is located at the center of the common pipe 13. Alternatively, the center of the captured image of the near-infrared imaging section 150 may be located at the upstream pipe 12.

[0085] The near-infrared imaging section 150 generates a captured image by capturing an image of an area including at least a part of the drainage section 190. The captured image identifies the type of treatment liquid in the drainage section 190. For example, it is preferable that the captured image can identify the type of treatment liquid flowing through the common pipe 13. Alternatively, it is preferable that the captured image can identify the type of treatment liquid flowing through the upstream pipe 12.

[0086] When the substrate processing unit 110 is viewed in plan, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging section 150 pass through the drainage section 190. When the substrate processing unit 110 is viewed in plan, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging section 150 may be coincident with each other or may be parallel. When the substrate processing unit 110 is viewed in plan, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging section 150 do not have to be parallel.

[0087] Here, the near-infrared light source 140 and the near-infrared image capturing section 150 are disposed near the drainage section 190. More specifically, the near-infrared light source 140 and the near-infrared image capturing section 150 are disposed near the common pipe 13. The near-infrared light source 140 and the near-infrared image capturing section 150 may be disposed fixed to each other.

[0088] The near-infrared light source 140 and the near-infrared image capturing section 150 may be movable relative to the drainage section 190. For example, it is preferable that the near-infrared light source 140 and the near-infrared image capturing section 150 are movable in the horizontal direction and / or the vertical direction according to a moving mechanism controlled by the control section 102. When the near-infrared light source 140 and the near-infrared image capturing section 150 move, the near-infrared light source 140 and the near-infrared image capturing section 150 may be movable independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared image capturing section 150 may be movable as a unit.

[0089] The processing liquid may contain an organic substance. For example, in organic substances, bonds such as CH, CO, CN, and CF absorb specific wavelengths included in near infrared rays. Since the absorption amount of a specific wavelength of near infrared rays is proportional to the amount of a component having a specific bonding group, the amount of a specific component present in the substrate W can be measured based on the near infrared rays transmitted and / or reflected by the drainage section 190. Therefore, the type of processing liquid flowing through the drainage section 190 can be identified.

[0090] As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the cup 180, and / or the drainage unit 190. In one example, the control unit 102 controls the electric motor 124, the valves 134a, 134b, 134c, the moving mechanisms 1381, 1382, the near-infrared light source 140, the near-infrared imaging unit 150, the cup 180, and / or the drainage unit 190.

[0091] According to the substrate processing apparatus 100 of this embodiment, the processing liquid in the chamber 112 irradiated with near-infrared light from the near-infrared light source 140 is imaged by the near-infrared imaging unit 150. Typically, the processing liquid is transparent and transmits visible light. On the other hand, the processing liquid often exhibits relatively strong absorption in the near-infrared region. Also, the processing liquid often exhibits unique absorption in the near-infrared region depending on the type. Therefore, the type of the processing liquid can be identified from the captured image of the processing liquid in the drainage unit 190 captured by the near-infrared imaging unit 150.

[0092] In addition, when the treatment liquid has a fairly high absorbance of near-infrared light, it is preferable that the near-infrared light source 140 emits visible light together with near-infrared light, so that the captured image shows the treatment liquid in the drainage section 190 with a relatively high brightness.

[0093] Alternatively, since different treatment liquids have different wavelengths at which they show strong absorption, the near-infrared light source 140 may change the wavelength of the emitted near-infrared light, thereby making it possible to easily identify the edge and type of the treatment liquid.

[0094] The substrate processing apparatus 100 of this embodiment is suitable for use in the manufacture of a semiconductor device having a semiconductor. Typically, in a semiconductor device, a conductive layer and an insulating layer are laminated on a base material. The substrate processing apparatus 100 is suitable for use in cleaning and / or processing (e.g., etching, changing characteristics, etc.) the conductive layer and / or insulating layer during the manufacture of the semiconductor device.

[0095] Next, a substrate processing apparatus 100 according to the present embodiment will be described with reference to Figures 1 to 3. Figure 3 is a block diagram of the substrate processing apparatus 100.

[0096] 3, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the cup 180, and the drainage unit 190. Specifically, the control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the cup 180, and the drainage unit 190 by transmitting control signals to the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the cup 180, and the drainage unit 190.

[0097] The memory unit 104 also stores computer programs and data. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes specifies the processing content, processing procedure, and substrate processing conditions for the substrate W. The control unit 102 executes the computer programs stored in the memory unit 104 to perform substrate processing operations.

[0098] The recipe data also includes type information indicating the type of processing liquid supplied from the nozzle 136 to the substrate W. The storage unit 104 also pre-stores data associating the type of processing liquid with the luminance or brightness of the processing liquid in the reference image.

[0099] The control unit 102 controls the indexer robot IR to transfer the substrate W by the indexer robot IR.

[0100] The control unit 102 controls the center robot CR to transfer the substrate W by the center robot CR. For example, the center robot CR receives an unprocessed substrate W and carries the substrate W into any one of the multiple chambers 112. The center robot CR also receives a processed substrate W from the chamber 112 and carries the substrate W out.

[0101] The control unit 102 controls the substrate holding unit 120 to start rotation of the substrate W, change the rotation speed, and stop the rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0102] The control unit 102 can control the valve 134 of the processing liquid supply unit 130 to switch the state of the valve 134 between an open state and a closed state. Specifically, the control unit 102 can control the valve 134 of the processing liquid supply unit 130 to open the valve 134, thereby allowing the processing liquid flowing through the pipe 132 toward the nozzle 136 to pass. In addition, the control unit 102 can stop the supply of the processing liquid flowing through the pipe 132 toward the nozzle 136 by controlling the valve 134 of the processing liquid supply unit 130 to close the valve 134.

[0103] The control unit 102 can control the movement mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136. Specifically, the control unit 102 can control the movement mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 to above the upper surface Wt of the substrate W. The control unit 102 can also control the movement mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 to a retracted position away from above the upper surface Wt of the substrate W.

[0104] The control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to capture an image of an area including at least a portion of the drainage unit 190 and generate a captured image. The control unit 102 controls the near-infrared light source 140 to irradiate an area including at least a portion of the drainage unit 190 with near-infrared light. The control unit 102 also controls the near-infrared imaging unit 150 to capture an image of an area including at least a portion of the drainage unit 190 and generate a captured image.

[0105] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to emit near-infrared rays from the near-infrared light source 140 toward the common pipe 13 and receive the near-infrared rays transmitted through or reflected by each member in the near-infrared imaging unit 150 to measure the luminance value. Note that the control unit 102 may control the near-infrared light source 140 and the near-infrared imaging unit 150 to move the near-infrared light source 140 and the near-infrared imaging unit 150 relative to the common pipe 13.

[0106] Furthermore, the control unit 102 identifies the type of processing liquid in the drainage unit 190 based on the captured image. More specifically, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value in the captured image. The control unit 102 identifies the type of processing liquid in the captured image based on the luminance value in the captured image and the luminance value of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the captured image and the reference image.

[0107] The control unit 102 may control the cup 180 to move the cup 180 relative to the substrate W. Specifically, the control unit 102 raises the cup 180 vertically upward to the side of the substrate W during the period during which the processing liquid supply unit 130 supplies the processing liquid to the substrate W. Furthermore, when the period during which the processing liquid supply unit 130 supplies the processing liquid to the substrate W ends, the control unit 102 lowers the cup 180 vertically downward from the side of the substrate W.

[0108] The substrate processing apparatus 100 of this embodiment is preferably used for forming semiconductor elements. For example, the substrate processing apparatus 100 is preferably used for processing a substrate W used as a semiconductor element having a stacked structure. The semiconductor element is a so-called 3D structure memory (storage device). As an example, the substrate W is preferably used as a NAND type flash memory.

[0109] Furthermore, the control unit 102 controls the drainage unit 190 based on the result of identifying the type of the treatment liquid. For example, the control unit 102 controls the switching timing for switching the destination of the treatment liquid flowing through the common pipe 13 based on the result of identifying the type of the treatment liquid.

[0110] Next, an example of the configuration of the switching valve 191 will be described with reference to Fig. 4. Fig. 4 is a diagram showing an example of the configuration of the switching valve 191 included in the substrate processing apparatus 100 of the present embodiment.

[0111] 4, the switching valve 191 may have a first valve body 193a to a fourth valve body 193d, a common flow path MR, and a first branch flow path BR1 to a fourth branch flow path BR4. The first valve body 193a and the first branch flow path BR1 are included in the first switching valve 191a. The second valve body 193b and the second branch flow path BR2 are included in the second switching valve 191b. The third valve body 193c and the third branch flow path BR3 are included in the third switching valve 191c. The fourth valve body 193d and the fourth branch flow path BR4 are included in the fourth switching valve 191d.

[0112] The common flow passage MR extends linearly in a substantially horizontal position. One end of the common flow passage MR is open, and the other end of the common flow passage MR is closed. The upstream pipe 12 is connected to one end of the common flow passage MR, and the flow passage R1 of the upstream pipe 12 communicates with the common flow passage MR.

[0113] The first branch flow channel BR1 to the fourth branch flow channel BR4 are flow channels branching off from the common flow channel MR and communicating with the common flow channel MR. The first branch flow channel BR1 to the fourth branch flow channel BR4 each extend in a direction intersecting the extension direction of the common flow channel MR.

[0114] One end of the first branch flow passage BR1 is connected to the common flow passage MR. The other end of the first branch flow passage BR1 is connected to the first pipe 141, and the flow passage R2a of the first pipe 141 communicates with the first branch flow passage BR1.

[0115] One end of the second branch flow passage BR2 is connected to the common flow passage MR. The second pipe 142 is connected to the other end of the second branch flow passage BR2, and the flow passage R2b of the second pipe 142 communicates with the second branch flow passage BR2.

[0116] One end of the third branch flow path BR3 is connected to the common flow path MR. The third pipe 143 is connected to the other end of the third branch flow path BR3, and the flow path R2c of the third pipe 143 communicates with the third branch flow path BR3.

[0117] One end of the fourth branch flow passage BR4 is connected to the common flow passage MR. The fourth pipe 144 is connected to the other end of the fourth branch flow passage BR4, and the flow passage R2d of the fourth pipe 144 communicates with the fourth branch flow passage BR4.

[0118] The first valve body 193a is movable between a closed position and an open position. The closed position of the first valve body 193a indicates a position where the first valve body 193a closes one end of the first branch flow channel BR1. The open position of the first valve body 193a indicates a position where the first valve body 193a opens one end of the first branch flow channel BR1 to communicate the first branch flow channel BR1 with the common flow channel MR.

[0119] When the first valve body 193a moves from the open position to the closed position, one end of the first branch flow path BR1 is closed, and the first branch flow path BR1 and the common flow path MR are not communicated with each other. Therefore, the first branch flow path BR1 and the flow path R1 of the upstream pipe 12 are not communicated with each other. On the other hand, when the first valve body 193a moves from the closed position to the open position, one end of the first branch flow path BR1 is opened, and the first branch flow path BR1 and the common flow path MR are communicated with each other. In other words, the first branch flow path BR1 and the flow path R1 of the upstream pipe 12 are communicated with each other.

[0120] The second valve body 193b is movable between a closed position and an open position, similar to the first valve body 193a. The closed position of the second valve body 193b indicates a position where the second valve body 193b closes one end of the second branch flow channel BR2. The open position of the second valve body 193b indicates a position where the second valve body 193b opens one end of the second branch flow channel BR2 to communicate the second branch flow channel BR2 with the common flow channel MR.

[0121] When the second valve body 193b moves from the open position to the closed position, one end of the second branch flow path BR2 is closed, and the second branch flow path BR2 and the common flow path MR are not in communication with each other. Therefore, the second branch flow path BR2 and the flow path R1 of the upstream pipe 12 are not in communication with each other. On the other hand, when the second valve body 193b moves from the closed position to the open position, one end of the second branch flow path BR2 is opened, and the second branch flow path BR2 and the common flow path MR are in communication with each other. In other words, the second branch flow path BR2 and the flow path R1 of the upstream pipe 12 are in communication with each other.

[0122] The third valve body 193c is movable between a closed position and an open position, similar to the first valve body 193a and the second valve body 193b. The closed position of the third valve body 193c indicates a position where the third valve body 193c closes one end of the third branch flow channel BR3. The open position of the third valve body 193c indicates a position where the third valve body 193c opens one end of the third branch flow channel BR3 to communicate with the third branch flow channel BR3 and the common flow channel MR.

[0123] When the third valve body 193c moves from the open position to the closed position, one end of the third branch flow path BR3 is closed, and the third branch flow path BR3 and the common flow path MR are not communicated with each other. Therefore, the third branch flow path BR3 and the flow path R1 of the upstream pipe 12 are not communicated with each other. On the other hand, when the third valve body 193c moves from the closed position to the open position, one end of the third branch flow path BR3 is opened, and the third branch flow path BR3 and the common flow path MR are communicated with each other. In other words, the third branch flow path BR3 and the flow path R1 of the upstream pipe 12 are communicated with each other.

[0124] The fourth valve body 193d is movable between a closed position and an open position, similar to the first valve body 193a to the third valve body 193c. The closed position of the fourth valve body 193d indicates a position where the fourth valve body 193d closes one end of the fourth branch flow channel BR4. The open position of the fourth valve body 193d indicates a position where the fourth valve body 193d opens one end of the fourth branch flow channel BR4 to communicate the fourth branch flow channel BR4 with the common flow channel MR.

[0125] When the fourth valve body 193d moves from the open position to the closed position, one end of the fourth branch flow path BR4 is closed, and the fourth branch flow path BR4 and the common flow path MR are not communicated with each other. Therefore, the fourth branch flow path BR4 and the flow path R1 of the upstream pipe 12 are not communicated with each other. On the other hand, when the fourth valve body 193d moves from the closed position to the open position, one end of the fourth branch flow path BR4 is opened, and the fourth branch flow path BR4 and the common flow path MR are communicated with each other. In other words, the fourth branch flow path BR4 and the flow path R1 of the upstream pipe 12 are communicated with each other.

[0126] 4 illustrates the switching valve 191 in which the first valve body 193a is in the open position and the second valve body 193b to the fourth valve body 193d are in the closed position. In this case, the first pipe 141 is the destination of the treatment liquid (waste liquid) flowing through the common pipe 13.

[0127] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 5. Fig. 5 is a block diagram showing the configurations of a control device 101 and a switching unit 19 included in the substrate processing apparatus 100 of this embodiment.

[0128] 5, the switching valve 191 further includes a first valve drive unit 192a to a fourth valve drive unit 192d. The first valve drive unit 192a is included in the first switching valve 191a. Similarly, the second valve drive unit 192b to the fourth valve drive unit 192d are included in the second switching valve 191b to the fourth switching valve 191d, respectively.

[0129] The first valve driving unit 192a is controlled by the control device 101 (control unit 102) to move the first valve body 193a between a closed position and an open position. The first valve driving unit 192a may include, for example, a motor as a power source for the first valve body 193a.

[0130] Similarly, the second valve drive unit 192b is controlled by the control device 101 (control unit 102) to move the second valve body 193b between a closed position and an open position. The third valve drive unit 192c is controlled by the control device 101 (control unit 102) to move the third valve body 193c between a closed position and an open position. The fourth valve drive unit 192d is controlled by the control device 101 (control unit 102) to move the fourth valve body 193d between a closed position and an open position. Each of the second valve drive unit 192b to the fourth valve drive unit 192d may include, for example, a motor as a power source for the second valve body 193b to the fourth valve body 193d.

[0131] Next, the substrate processing method of the present embodiment will be described with reference to Figures 1 to 6. Figure 6 is a flow diagram of the substrate processing method. Note that step SB is an example of the "step of holding the substrate" of the present invention.

[0132] 6, in step SA, the substrate W is loaded into the substrate processing apparatus 100. Specifically, the substrate W is loaded into the chamber 112 of the substrate processing unit 110 via the indexer robot IR and the center robot CR.

[0133] In step SB, the substrate W is held. Specifically, in the chamber, the substrate holding part 120 holds the substrate W. When the substrate W is carried into the chamber 112, the substrate W is held by the substrate holding part 120.

[0134] In step SC, the substrate W is processed in the substrate processing unit 110. Typically, the substrate holder 120 holds and rotates the substrate W, and the processing liquid supply unit 130 supplies a processing liquid to the substrate W.

[0135] In this embodiment, the near-infrared light source 140 emits near-infrared light. An area including at least a part of the drainage section 190 is irradiated with near-infrared light emitted from the near-infrared light source 140. For example, the common pipe 13 is irradiated with near-infrared light emitted from the near-infrared light source 140. The near-infrared image capturing section 150 captures an image of the area including at least a part of the drainage section 190 irradiated with near-infrared light. For example, the near-infrared image capturing section 150 captures an image of the common pipe 13 irradiated with near-infrared light. By capturing an image of the area including at least a part of the drainage section 190 irradiated with near-infrared light from the near-infrared image capturing section 150, the processing liquid in the drainage section 190 can be captured with high accuracy even if the processing liquid is substantially transparent.

[0136] In step SD, the substrate W is released from its hold. Specifically, the substrate holder 120 releases the hold of the substrate W.

[0137] In step SE, the substrate W is unloaded. The substrate W is unloaded from the substrate processing apparatus 100. Specifically, the substrate W is unloaded from the chamber 112 of the substrate processing unit 110 via the center robot CR and the indexer robot IR.

[0138] According to this embodiment, the processing liquid irradiated with near-infrared light from the near-infrared light source 140 is imaged by the near-infrared imaging section 150. Processing liquids often exhibit specific absorption in the near-infrared region depending on the type. For this reason, the type of processing liquid can be identified from the captured image of the processing liquid in the drainage section 190 captured by the near-infrared imaging section 150.

[0139] Next, a substrate processing step in the substrate processing method of the present embodiment will be described with reference to Fig. 1 to Fig. 11. Fig. 7 and Fig. 8 are flow charts of the substrate processing step in the substrate processing method of the present embodiment. Fig. 9 to Fig. 11 are diagrams showing an example of the configuration of a switching valve 191 included in the substrate processing apparatus 100 of the present embodiment.

[0140] In FIG. 7 and FIG. 8, step S120 is an example of the "step of irradiating with near-infrared rays," "step of generating a captured image," and "step of changing the near-infrared light source" of the present invention. Step S125 is an example of the "step of acquiring type information" of the present invention. Steps S130, S160, and S210 are an example of the "step of supplying a plurality of types of processing liquid at different timings" of the present invention. Steps S140, S170, and S220 are an example of the "step of draining liquid" of the present invention. Steps S180 and S230 are an example of the "step of identifying the type of processing liquid" of the present invention. Step S250 is an example of the "step of controlling the drainage unit" of the present invention.

[0141] 9, an area AR1 indicates an area onto which near-infrared light is irradiated by the near-infrared light source 140. An area AR2 indicates an area onto which an image is captured by the near-infrared imaging section 150. In this embodiment, the areas AR1 and AR2 are the same.

[0142] 7, in step S110, the substrate W is rotated in a held state. Specifically, the substrate holder 120 rotates the substrate W in a held state. For example, the rotation speed of the substrate W is 10 rpm to 1500 rpm. The process proceeds to step S120.

[0143] In step S120, the near-infrared light source 140 irradiates an area including at least a part of the drainage section 190 with near-infrared light, and the near-infrared image capturing section 150 captures an image of the area including at least a part of the drainage section 190 irradiated with near-infrared light. The ... control section 102 controls the near-infrared light source 140 and the near-infrared image capturing section 150 so that the near-infrared light source 140 emits near-infrared light toward the area including at least a part of the drainage section 190, and the near-infrared image capturing section 150 captures an image of the area including at least a part of the drainage section 190. The timing at which the near-infrared light source 140 starts emitting near-infrared light may be the same as or different from the timing at which the near-infrared image capturing section 150 starts capturing an image of the substrate W. Furthermore, the timing at which the near-infrared light source 140 starts emitting near-infrared light may be earlier or later than the timing at which the near-infrared imaging section 150 starts imaging the substrate W. The process proceeds to step S125.

[0144] In step S125, type information indicating the type of the processing liquid is acquired. Specifically, the control unit 102 acquires the type information indicating the type of the processing liquid from the recipe data stored in the storage unit 104. In this embodiment, the types of processing liquid are, for example, SC1 (ammonia hydrogen peroxide aqueous solution), DIW, and IPA. In addition, the control unit 102 acquires data associating the type of processing liquid with the luminance or brightness of the processing liquid in the reference image from the recipe data stored in the storage unit 104. The process proceeds to step S130.

[0145] In step S130, the first processing liquid La is supplied to the upper surface Wt of the substrate W. Specifically, the first processing liquid supply unit 130a starts supplying the first processing liquid La to the upper surface Wt of the substrate W. Specifically, the controller 102 controls the first processing liquid supply unit 130a to start supplying the first processing liquid La to the upper surface Wt of the substrate W. The first processing liquid La is, for example, SC1. The process proceeds to step S140.

[0146] The supply of the treatment liquid in step S130 may be started before or after the irradiation of near-infrared rays and / or the imaging by the near-infrared imaging section 150 in step S120.

[0147] In step S140, the drainage unit 190 drains the processing liquid after the substrate processing to outside the chamber 112. Here, the drainage unit 190 drains the first processing liquid La after the substrate processing to outside the chamber 112. Here, as shown in FIG. 9, in the switching valve 191, the first valve body 193a is located in the open position, and the second valve body 193b to the fourth valve body 193d are located in the closed position. In this case, the first pipe 141 is the destination of the first processing liquid La flowing through the common pipe 13. Therefore, the first processing liquid La after the substrate processing flows through the upstream pipe 12, then through the common pipe 13, and then through the first pipe 141. At the timing of step S140, the first valve body 193a may be driven to be in the open position and the second valve body 193b to the fourth valve body 193d may be driven to be in the closed position, or if the first valve body 193a is previously in the open position and the second valve body 193b to the fourth valve body 193d are previously in the closed position, this state may be maintained. The process proceeds to step S150.

[0148] In step S150, the supply of the first processing liquid La is stopped. In detail, the first processing liquid supply unit 130a stops the supply of the first processing liquid La to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the first processing liquid supply unit 130a to stop the supply of the first processing liquid La after a predetermined period has elapsed since the supply of the first processing liquid La was started. The predetermined period is, for example, 30 seconds. The predetermined period, i.e., the time from the start of the supply of the first processing liquid La to the stop of the supply of the first processing liquid La, is specified in the recipe indicated by the recipe data stored in the storage unit 104. The process proceeds to step S160.

[0149] In step S160, the rinsing liquid Lb is supplied to the upper surface Wt of the substrate W. Specifically, the rinsing liquid supply unit 130c starts supplying the rinsing liquid Lb to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the rinsing liquid supply unit 130c to start supplying the rinsing liquid Lb to the upper surface Wt of the substrate W. As the rinsing liquid Lb is supplied to the upper surface Wt of the substrate W, the first processing liquid La covering the upper surface Wt of the substrate W is replaced with the rinsing liquid Lb. The rinsing liquid Lb is, for example, DIW. The process proceeds to step S170.

[0150] In step S170, the drainage section 190 drains the processing liquid after the substrate processing to the outside of the chamber 112. Here, the drainage section 190 drains the rinsing liquid Lb after the substrate processing to the outside of the chamber 112. Here, as shown in FIG. 10, in the switching valve 191, the first valve body 193a is located in the open position, and the second valve body 193b to the fourth valve body 193d are located in the closed position. In this case, the first pipe 141 is the destination of the rinsing liquid Lb flowing through the common pipe 13. Therefore, the rinsing liquid Lb after the substrate processing flows through the upstream pipe 12, then through the common pipe 13, and then through the first pipe 141 of the downstream pipe 14. The first processing liquid La flowing through the drainage section 190 is gradually diluted by the rinsing liquid Lb. That is, in the processing liquid flowing through the drainage section 190, the proportion of the first processing liquid La decreases and the proportion of the rinsing liquid Lb increases as time passes. At the timing of step S170, the first valve body 193a may be driven to be in the open position and the second valve body 193b to the fourth valve body 193d may be driven to be in the closed position, or if the first valve body 193a is previously in the open position and the second valve body 193b to the fourth valve body 193d are previously in the closed position, this state may be maintained. The process proceeds to step S180.

[0151] In step S180, the type of processing liquid in the captured image is identified based on the captured image generated by the near-infrared imaging unit 150. The control unit 102 identifies the type of processing liquid in the captured image based on the captured image. In this embodiment, the control unit 102 identifies the type of processing liquid in the common pipe 13 based on the captured image. Note that the control unit 102 may also identify the type of processing liquid in the upstream pipe 12 based on the captured image.

[0152] More specifically, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image generated by the near-infrared imaging unit 150. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the captured image and the reference image.

[0153] The control unit 102 also identifies the position of the rinsing liquid Lb (processing liquid) in the captured image based on the luminance value or brightness in the captured image and the type information. The control unit 102 may also identify an area in a predetermined area of ​​the captured image (e.g., an area corresponding to the common pipe 13) where the first processing liquid La is located and an area in which the rinsing liquid Lb is located based on the luminance value or brightness in the captured image, the luminance value or brightness of the reference processing liquid stored in the storage unit 104, and the type information. For example, the control unit 102 may also calculate the ratio of the number of pixels having the luminance value or brightness corresponding to the second processing liquid Lc to the total number of pixels in the predetermined area of ​​the captured image (e.g., an area corresponding to the common pipe 13). The control unit 102 may also calculate the sum of the luminance values ​​or brightness of all pixels in the predetermined area.

[0154] For example, when the area where the rinsing liquid Lb is located is equal to or greater than a predetermined value (e.g., 99%) of a predetermined area of ​​the captured image (e.g., an area corresponding to the common pipe 13), the control unit 102 identifies the type of the processing liquid as the rinsing liquid Lb. Also, for example, when the calculated ratio is equal to or greater than a predetermined value (e.g., 99%), the control unit 102 identifies the type of the processing liquid as the rinsing liquid Lb. Note that the control unit 102 may identify the type of the processing liquid as the rinsing liquid Lb when the calculated total is equal to or greater than a predetermined value.

[0155] In step S190, the control unit 102 determines whether the type of the identified processing liquid is the rinse liquid Lb. If the control unit 102 determines that the type of the identified processing liquid is not the rinse liquid Lb (No in step S190), the process returns to step S180. As a result, the identification of the type of processing liquid and the determination of whether the type of the identified processing liquid is the rinse liquid Lb are repeated until the processing liquid flowing through the drainage unit 190 is replaced from the first processing liquid La with the rinse liquid Lb. On the other hand, if the control unit 102 determines that the type of the identified processing liquid is the rinse liquid Lb (Yes in step S190), the process proceeds to step S190.

[0156] In step S200, the supply of the rinsing liquid Lb is stopped. In detail, the rinsing liquid supply unit 130c stops the supply of the rinsing liquid Lb to the upper surface Wt of the substrate W. More specifically, the control unit 102 controls the rinsing liquid supply unit 130c (processing liquid supply unit 130) to stop the supply of the rinsing liquid Lb based on the result of identifying the type of the processing liquid. Specifically, when the control unit 102 determines that the type of the identified processing liquid is the rinsing liquid Lb (Yes in step S190), the control unit 102 controls the rinsing liquid supply unit 130c (processing liquid supply unit 130) to stop the supply of the rinsing liquid Lb. Therefore, the supply of the rinsing liquid Lb can be stopped after the processing liquid flowing through the drainage unit 190 is sufficiently replaced from the first processing liquid La with the rinsing liquid Lb. Therefore, the timing of stopping the supply of the rinsing liquid Lb can be executed at an appropriate timing. As a result, the amount of the rinsing liquid Lb used can be reduced. The process proceeds to step S210 shown in FIG.

[0157] 8, in step S210, the second processing liquid Lc is supplied to the upper surface Wt of the substrate W. In detail, the second processing liquid supply unit 130b starts supplying the second processing liquid Lc to the upper surface Wt of the substrate W. Here, the supply of the second processing liquid Lc starts at the same time as the supply of the rinsing liquid Lb to the substrate W is stopped. The first processing liquid La is, for example, isopropyl alcohol (IPA). The process proceeds to step S220.

[0158] In step S220, the drainage part 190 drains the processing liquid after the substrate processing to outside the chamber 112. Here, the drainage part 190 drains the second processing liquid Lc after the substrate processing to outside the chamber 112. Here, as shown in FIG. 10, in the switching valve 191, the first valve body 193a is located in the open position, and the second valve body 193b to the fourth valve body 193d are located in the closed position. As time passes, the proportion of the rinsing liquid Lb in the processing liquid flowing through the drainage part 190 decreases, and the proportion of the second processing liquid Lc increases. The process proceeds to step S230.

[0159] In step S230, the type of treatment liquid in the captured image is identified based on the captured image generated by the near-infrared imaging section 150. The control section 102 identifies the type of treatment liquid in the captured image based on the captured image. For example, the control section 102 identifies the type of treatment liquid in the captured image based on the captured image.

[0160] Furthermore, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value in the captured image. The control unit 102 identifies the type of processing liquid in the captured image based on the luminance value in the captured image and the luminance value of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the captured image and the reference image.

[0161] In step S240, the control unit 102 determines whether the type of the identified processing liquid is the second processing liquid Lc. If the control unit 102 determines that the type of the identified processing liquid is not the second processing liquid Lc (No in step S240), the process returns to step S230. As a result, the identification of the type of processing liquid and the determination of whether the type of the identified processing liquid is the second processing liquid Lc are repeated until the processing liquid flowing through the drainage unit 190 is replaced from the rinsing liquid Lb to the second processing liquid Lc. On the other hand, if the control unit 102 determines that the type of the identified processing liquid is the second processing liquid Lc (Yes in step S240), the process proceeds to step S250.

[0162] In step S250, the control unit 102 controls the drainage unit 190 based on the result of identifying the type of the processing liquid. Specifically, the control unit 102 switches the destination of the processing liquid flowing through the common pipe 13 between the multiple downstream pipes 14. More specifically, when the control unit 102 determines in step S240 that the type of the identified processing liquid is the second processing liquid Lc (Yes in step S240), the control unit 102 controls the switching valve 191 so that the switching valve 191 changes from a state in which the first valve body 193a is located at an open position and the second valve body 193b to the fourth valve body 193d are located at closed positions as shown in FIG. 10 to a state in which the second valve body 193b is located at an open position and the first valve body 193a, the second valve body 193b, and the fourth valve body 193d are located at closed positions as shown in FIG. 11. As a result, the destination of the processing liquid flowing through the common pipe 13 is switched from the first pipe 141 to the second pipe 142. Therefore, the second processing liquid Lc after the substrate processing flows through the upstream pipe 12, then flows through the common pipe 13, and then flows through the second pipe 142. The process proceeds to step S260.

[0163] In step S260, the drainage unit 190 drains the processing liquid after the substrate processing to outside the chamber 112. Here, the drainage unit 190 drains the second processing liquid Lc after the substrate processing to outside the chamber 112. In step S250, the destination of the processing liquid flowing through the common pipe 13 is switched from the first pipe 141 to the second pipe 142. Therefore, the second processing liquid Lc is drained via the second pipe 142.

[0164] In step S270, the supply of the second processing liquid Lc is stopped. In detail, the second processing liquid supply unit 130b stops the supply of the second processing liquid Lc to the upper surface Wt of the substrate W. Specifically, the control unit 102 controls the second processing liquid supply unit 130b to stop the supply of the second processing liquid Lc after a predetermined period has elapsed since the supply of the second processing liquid Lc was started. The predetermined period is, for example, 4 seconds. The predetermined period, i.e., the time from the start of the supply of the second processing liquid Lc to the stop of the supply of the second processing liquid Lc, is specified in the recipe indicated by the recipe data stored in the storage unit 104. The process proceeds to step S280.

[0165] In step S280, the rotation of the substrate W is stopped. Specifically, the control unit 102 controls the substrate holding unit 120 so that the substrate holding unit 120 stops the rotation of the substrate W. The process then ends.

[0166] In this embodiment, an image is captured of an area including at least a part of the drainage section 190 irradiated with near-infrared light from the near-infrared imaging section 150. Near-infrared light is selectively absorbed by the processing liquid. This allows the processing liquid in the drainage section 190 to be imaged with high accuracy. This allows the type of processing liquid in the drainage section 190 to be identified. As a result, the control section 102 can control the processing of the drainage section 190 depending on the type of processing liquid in the drainage section 190.

[0167] As described above, the near-infrared light source 140 may switch between emitting visible light and near-infrared light, and the near-infrared image capturing section 150 may capture images by switching between the visible region and the near-infrared region.

[0168] In this embodiment, as described above, the control unit 102 identifies the type of treatment liquid in an area including at least a part of the drainage unit 190 based on the captured image. Therefore, for example, it is possible to check whether the treatment liquid in the drainage unit 190 has been switched.

[0169] Furthermore, in this embodiment, after the control unit 102 determines that the type of the identified processing liquid is the second processing liquid Lc (e.g., IPA) (Yes in step S240), the control unit 102 controls the drainage unit 190 (step S250). Specifically, for example, after the processing liquid in the drainage unit 190 is sufficiently replaced with the second processing liquid Lc, the destination of the processing liquid flowing through the common pipe 13 can be switched between the downstream pipes 14. Therefore, mixing of the processing liquid in the downstream pipe 14 can be suppressed. For example, mixing of the first processing liquid La (e.g., SC1) and the second processing liquid Lc (e.g., IPA) in the downstream pipe 14 can be suppressed.

[0170] Generally, the time from when the supply of the rinsing liquid starts (step S160) to when the supply of the rinsing liquid stops (step S200) is set in advance. Generally, it is preferable to continue supplying the rinsing liquid Lb from the rinsing liquid supply unit 130c to the substrate W until the processing liquid flowing through the drainage unit 190 is sufficiently replaced with the rinsing liquid. Generally, the time it takes for the processing liquid in the drainage unit 190 to be sufficiently replaced with the rinsing liquid varies depending on the temperature and the like. Therefore, the time from when the supply of the rinsing liquid Lb starts to the substrate W to when the supply of the rinsing liquid Lb to the substrate W is stopped is set to be longer. In this embodiment, the recipe also includes a supply set time indicating the time from when the supply of the rinsing liquid Lb starts to the substrate W to when the supply of the rinsing liquid to the substrate W is stopped. Hereinafter, in this specification, "the time from when the supply of rinsing liquid Lb to the substrate W begins to the time when the supply of the rinsing liquid to the substrate W stops" may be referred to as "rinsing liquid supply period." Also, hereafter, in this specification, "the set time from when the supply of rinsing liquid Lb to the substrate W begins to the time when the supply of the rinsing liquid to the substrate W stops" may be referred to as "rinsing liquid supply set time."

[0171] In this embodiment, if the control unit 102 determines in step S190 that the type of the identified processing liquid is the rinse liquid Lb, the process proceeds to step S200 regardless of whether the rinse liquid supply setting time has elapsed or not. In this case, for example, the control unit 102 may rewrite the recipe so that the rinse liquid supply setting time (e.g., 15 seconds) is shortened depending on the timing at which the control unit 102 determines that the type of the identified processing liquid is the rinse liquid Lb. Note that, for example, the control unit 102 may rewrite the recipe so that the rinse liquid supply setting time (e.g., 15 seconds) is lengthened depending on the timing at which the control unit 102 determines that the type of the identified processing liquid is the rinse liquid Lb.

[0172] In this way, since it is possible to confirm whether the processing liquid in the drainage section 190 has been switched, the supply of the processing liquid (e.g., rinsing liquid Lb) from the processing liquid supply section 130 can be stopped at the timing when it is confirmed that the processing liquid in the drainage section 190 has been switched, regardless of whether the rinse liquid supply setting time has elapsed, thereby shortening the substrate processing time. In addition, the amount of rinsing liquid Lb used can be reduced, which leads to a reduction in the environmental load. Furthermore, by shortening the substrate processing time, the amount of processing liquid after substrate processing, that is, the amount of drainage liquid, can be reduced. If the amount of drainage liquid increases, the burden on the factory increases. According to this embodiment, the amount of drainage liquid can be reduced, thereby reducing the burden on the factory.

[0173] As described above, the processing liquid supply unit 130 supplies a plurality of types of processing liquids at different timings to the substrate W. When a plurality of types of processing liquids are supplied to the substrate W at different timings in this manner, that is, when the drain unit 190 drains a plurality of types of processing liquids, it is particularly effective to apply the present invention.

[0174] As described above, the control unit 102 controls the treatment liquid supply unit 130 based on the result of identifying the type of treatment liquid. Therefore, the destination of the treatment liquid flowing through the drainage unit 190 can be easily determined according to the state of the treatment liquid in the drainage unit 190.

[0175] As described above, the drainage section 190 has the upstream pipe 12, the common pipe 13, and the downstream pipe 14. A plurality of types of processing liquids drained from the chamber 112 flow through the upstream pipe 12. A downstream end 12b of the upstream pipe 12 is connected to the common pipe 13. An upstream end 14a of the downstream pipe 14 is connected to the common pipe 13. In this way, when a plurality of types of processing liquids flow through the upstream pipe 12, it is particularly effective to apply the present invention to identify the type of processing liquid.

[0176] Furthermore, as described above, the control unit 102 identifies the type of the processing liquid in the area including the common pipe 13 based on the captured image. Therefore, the state of the processing liquid in the common pipe 13 can be easily confirmed. For example, it can be easily confirmed whether the processing liquid in the common pipe 13 has been switched. In other words, it can be easily confirmed whether the processing liquid in the drainage unit 190 has been switched.

[0177] As described above, the drainage unit 190 has the switching unit 19. The switching unit 19 switches the destination of the treatment liquid flowing through the common pipe 13 between the multiple downstream pipes 14. Therefore, the treatment liquid can be separated and drained into different downstream pipes 14. As a result, mixing of the treatment liquids in the downstream pipes 14 can be suppressed. For example, mixing of the first treatment liquid La (e.g., SC1) and the second treatment liquid Lc (e.g., IPA) in the downstream pipes 14 can be suppressed.

[0178] Furthermore, as described above, the control unit 102 may identify the type of the processing liquid in the region including the upstream piping 12 based on the captured image. Therefore, the state of the processing liquid in the upstream piping 12 can be easily confirmed. For example, it can be easily confirmed whether the processing liquid in the upstream piping 12 has been switched. In other words, it can be easily confirmed whether the processing liquid in the drainage unit 190 has been switched.

[0179] 9 to 11, the area AR1 to which near-infrared rays are irradiated is an area including at least a part of the common pipe 13, but is not limited thereto. For example, the area AR1 to which near-infrared rays are irradiated may be an area including at least a part of the upstream pipe 12.

[0180] 9 to 11, the area AR2 captured by the near-infrared imaging unit 150 is an area including at least a part of the common pipe 13, but is not limited thereto. For example, the area AR2 captured by the near-infrared imaging unit 150 may be an area including at least a part of the upstream pipe 12.

[0181] Fig. 12 is a diagram showing an example of the configuration of a switching valve 191 included in the substrate processing apparatus 100 of this embodiment. In Fig. 12, an area AR1 indicates an area irradiated with near-infrared light by the near-infrared light source 140. An area AR2 indicates an area imaged by the near-infrared imaging unit 150. As shown in Fig. 12, the area AR1 irradiated with near-infrared light is an area including at least a part of the upstream piping 12. The area AR2 imaged by the near-infrared imaging unit 150 is an area including at least a part of the upstream piping 12.

[0182] In this embodiment, the region AR1 and the region AR2 are the same. The region AR1 and the region AR2 are preferably provided on the downstream end 12b side of the upstream pipe 12 (see FIG. 2). In other words, the region AR1 and the region AR2 are preferably provided in the vicinity of the common pipe 13. By providing the region AR1 and the region AR2 in the vicinity of the common pipe 13, it is possible to shorten the time it takes for the processing liquid in the region AR1 and the processing liquid in the region AR2 to reach the common pipe 13. Therefore, it is possible to suppress unintended mixing of the processing liquid into the common pipe 13.

[0183] In this embodiment, the near-infrared light source 140 irradiates an area AR1 including at least a part of the upstream pipe 12 with near-infrared light. The near-infrared image capturing unit 150 captures images of the multiple types of processing liquid in the upstream pipe 12 irradiated with near-infrared light to generate a captured image. The control unit 102 identifies the type of processing liquid in the upstream pipe 12 based on the captured image. Therefore, it is possible to confirm whether the processing liquid in the upstream pipe 12 has been switched.

[0184] The area AR1 to which the near-infrared light is irradiated may include an area AR1 including at least a part of the common pipe 13 and an area AR1 including at least a part of the upstream pipe 12. The area AR2 to be imaged by the near-infrared imaging unit 150 may include an area AR1 including at least a part of the common pipe 13 and an area AR1 including at least a part of the upstream pipe 12.

[0185] Next, an example in which a plurality of near-infrared light sources 140 are provided will be described with reference to Fig. 13. Here, an example in which the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b will be described. Fig. 13 is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 including a plurality of near-infrared light sources 140 (near-infrared light source 140a and near-infrared light source 140b). The substrate processing unit 110 shown in Fig. 13 has a similar configuration to the substrate processing unit 110 shown in Fig. 2, except that a plurality of near-infrared light sources 140 are provided, and therefore, redundant description will be omitted to avoid redundancy.

[0186] 13, the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b. The near-infrared light source 140a and the near-infrared light source 140b emit near-infrared rays having different peak wavelengths from each other.

[0187] The control unit 102 acquires recipe data from the memory unit 104, and acquires type information indicating the type of processing liquid supplied by the processing liquid supply unit 130 (the first processing liquid supply unit 130a, the second processing liquid supply unit 130b, and the rinsing liquid supply unit 130c) from the recipe data. Furthermore, for example, the recipe data may include information indicating the type of near-infrared light source 140 corresponding to the type of processing liquid. Furthermore, for example, the control unit 102 may acquire type information indicating the type of processing liquid supplied by the processing liquid supply unit 130 (the first processing liquid supply unit 130a, the second processing liquid supply unit 130b, and the rinsing liquid supply unit 130c) from input information input by the user.

[0188] The control unit 102 changes the near-infrared light source 140 that irradiates an area including at least a part of the drainage unit 190 based on the acquired type information. For example, when the rinsing liquid supply unit 130c supplies DIW to the substrate W, that is, when the drainage unit 190 drains DIW, the control unit 102 irradiates with the near-infrared light source 140a. On the other hand, when the second processing liquid supply unit 130b supplies IPA to the substrate W, that is, when the drainage unit 190 drains IPA, the control unit 102 irradiates with the near-infrared light source 140b.

[0189] 7, 13 and 14, the substrate processing step in the substrate processing method when a plurality of near-infrared light sources 140 are provided will be described. FIG. 14 is a flow diagram of the substrate processing step in the substrate processing method of this embodiment. The flow diagram in FIG. 14 is similar to the flow diagram in FIG. 8 except that the near-infrared light source 140 is changed, and therefore, in order to avoid redundancy, duplicated explanations will be omitted. Note that step S205 in the example where a plurality of near-infrared light sources 140 are provided is an example of the "step of changing the near-infrared light" of the present invention.

[0190] 7, the processes of steps S110 to S220 are performed. In this embodiment, after the process of step S220 is completed, the process proceeds to step S205 shown in FIG.

[0191] 14, in step S205, the control unit 102 changes the near-infrared light source 140 that irradiates the area including at least a part of the drainage unit 190 based on the type information. Specifically, the control unit 102 changes the near-infrared light source 140 that irradiates the area including at least a part of the drainage unit 190 from near-infrared light source 140a to near-infrared light source 140b based on the type information. The process proceeds to step S210.

[0192] Steps S220 to S280 are similar to steps S220 to S280 shown in FIG.

[0193] In this embodiment, as described above, the control unit 102 acquires type information indicating the type of the treatment liquid, and changes the near-infrared light source 140 that irradiates an area including at least a part of the drainage unit 190 based on the acquired type information. Therefore, since the near-infrared light to be irradiated can be changed according to the absorbance (also referred to as the absorptivity) of the treatment liquid, the type of treatment liquid can be more accurately identified even when the type of treatment liquid is changed.

[0194] Specifically, the absorbance of the treatment liquid varies depending on the type of treatment liquid. For this reason, for example, by irradiating the treatment liquid with light of a wavelength at which the absorbance of the second treatment liquid is relatively high and capturing an image of the treatment liquid, the contrast in brightness or luminance between the area showing the second treatment liquid and the area other than the second treatment liquid in the captured image can be increased. Therefore, the type of treatment liquid can be more accurately identified based on the captured image.

[0195] Other effects of the embodiment in which a plurality of near-infrared light sources 140 are provided are similar to those of the substrate processing apparatus 100 described with reference to FIGS.

[0196] The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments, and can be implemented in various aspects without departing from the gist of the present invention. In addition, various inventions can be formed by appropriately combining multiple components disclosed in the above embodiments. For example, some components may be deleted from all components shown in the embodiments. Furthermore, components across different embodiments may be appropriately combined. The drawings are mainly shown schematically for ease of understanding, and the thickness, length, number, spacing, etc. of each component shown in the drawings may differ from the actual ones due to the convenience of drawing. In addition, the material, shape, dimensions, etc. of each component shown in the above embodiments are examples and are not particularly limited, and various changes are possible within a range that does not substantially deviate from the effects of the present invention.

[0197] For example, in the above embodiment, an example was shown in which the present invention is applied to a substrate processing step to shorten the substrate processing time, but the present invention is not limited to this. For example, the present invention may be applied when setting a rinse liquid supply setting time (e.g., 10 seconds) (when creating a recipe). In this case, the recipe creation time can be shortened. Also, as in the above embodiment, the amount of rinse liquid Lb used can be reduced, which leads to a reduction in the environmental load.

[0198] In the above embodiment, the drainage section 190 includes the switching section 19. However, the present invention is not limited to this. For example, the drainage section 190 does not have to include the switching section 19. [Industrial Applicability]

[0199] The present invention can be used in the field of substrate processing apparatuses and the like. [Explanation of symbols]

[0200] 12 Upstream piping 12b Downstream end 13 Common piping 14 Downstream piping 14a Upstream end 19 Switching section 100 Substrate processing apparatus 102 Control section 112 Chamber 120 Board holding part 130 Processing liquid supply unit 130a First processing liquid supply unit (processing liquid supply unit) 130b Second processing liquid supply unit (processing liquid supply unit) 130c Rinse liquid supply unit (processing liquid supply unit) 140, 140a, 140b near-infrared light source 150 Near-infrared imaging unit 190 Drainage section AR1 area AR2 area W substrate S120 step (step of irradiating with near-infrared rays), (step of generating an image) S125 Step (Process to obtain type information) Step S130 (a process of supplying multiple types of processing liquids at different times) S140 Step (Draining process) S160 step (a process of supplying multiple types of processing liquids at different times) S170 Step (Draining process) S180 Step (Step to identify the type of processing liquid) S205 Step (Process of changing near infrared rays) Step S210 (a process of supplying multiple types of processing liquids at different times) S220 Step (Draining process) Step S230 (step to identify the type of processing liquid) S250 Step (Process to control the drainage section) SB Step (Substrate holding process)

Claims

1. A chamber; a substrate holder housed in the chamber and holding a substrate; a processing liquid supply unit that supplies a plurality of types of processing liquid to the substrate at different timings; a drainage section that drains the plurality of types of treatment liquids to the outside of the chamber; At least one near-infrared light source that irradiates an area including at least a part of the drainage portion with near-infrared light; a near-infrared image capturing unit capturing an image of the plurality of treatment liquids in the drainage unit irradiated with near-infrared light; A control unit that controls the near-infrared imaging unit; Equipped with The control unit identifies a type of the processing liquid in the drainage unit based on the captured image.

2. The substrate processing apparatus according to claim 1 , wherein the control unit controls the drainage unit based on a result of identifying the type of the processing liquid.

3. The drainage section is an upstream pipe through which the plurality of types of treatment liquids discharged from the chamber flow; a common pipe to which a downstream end of the upstream pipe is connected; a plurality of downstream pipes each having an upstream end connected to the common pipe; The substrate processing apparatus according to claim 1 , further comprising:

4. The substrate processing apparatus according to claim 3 , wherein the drainage unit further comprises a switching unit that switches a destination of the processing liquid flowing through the common pipe between the plurality of downstream pipes.

5. The near-infrared light source irradiates an area including at least a portion of the upstream pipe with near-infrared light, the near-infrared image capturing unit captures an image of the plurality of types of treatment liquids in the upstream pipe irradiated with the near-infrared light to generate the captured image; The substrate processing apparatus according to claim 3 , wherein the control unit identifies a type of the processing liquid in the upstream pipe based on the captured image.

6. The near-infrared light source irradiates an area including at least a portion of the common pipe with near-infrared light, the near-infrared image capturing unit captures an image of the plurality of types of processing liquids in the common pipe being irradiated with the near-infrared light to generate the captured image; The substrate processing apparatus according to claim 3 , wherein the control unit identifies a type of the processing liquid in the common pipe based on the captured image.

7. The substrate processing apparatus according to claim 4 , wherein the control unit controls a switching timing for switching a destination of the processing liquid flowing through the common pipe based on a result of identifying the type of the processing liquid.

8. The at least one near-infrared light source is a plurality of light sources, The plurality of near-infrared light sources emit near-infrared light having different peak wavelengths, The control unit is acquiring type information indicating a type of the treatment liquid; The substrate processing apparatus according to claim 1 , further comprising: a control unit for controlling the near-infrared light source for irradiating an area including at least a part of the drainage portion, the near-infrared light source being changed based on the type information.

9. The substrate processing apparatus according to claim 1 , wherein the control unit controls the processing liquid supply unit based on a result of identifying the type of the processing liquid.

10. holding the substrate within a chamber; supplying a plurality of types of processing liquids to the substrate at different times; a step of discharging the plurality of types of treatment liquids to the outside of the chamber by a liquid discharge unit; irradiating an area including at least a portion of the drainage portion with near-infrared light; generating an image of the plurality of treatment liquids in the drainage section irradiated with the near-infrared light; identifying the type of the treatment liquid in the drainage section based on the captured image; The method for processing a substrate includes the steps of:

11. The substrate processing method according to claim 10 , further comprising the step of controlling the drainage section based on a result of identifying the type of the processing liquid.

12. The drainage section is an upstream pipe through which the plurality of types of treatment liquids discharged from the chamber flow; a common pipe to which a downstream end of the upstream pipe is connected; a plurality of downstream pipes each having an upstream end connected to the common pipe; The method of claim 11 , comprising:

13. The substrate processing method according to claim 12 , wherein in the step of controlling the drainage section, a destination of the processing liquid flowing through the common pipe is switched between the plurality of downstream pipes.

14. In the step of irradiating with near-infrared rays, an area including at least a portion of the upstream pipe is irradiated with the near-infrared rays; In the step of generating the captured image, the captured image is generated by capturing an image of the plurality of types of treatment liquid in the upstream pipe irradiated with the near-infrared light; The substrate processing method according to claim 12 , wherein in the step of identifying the type of the processing liquid, the type of the processing liquid in the upstream pipe is identified based on the captured image.

15. In the step of irradiating with near-infrared rays, an area including at least the part of the substrate is irradiated with near-infrared rays; In the step of generating the captured image, the captured image is generated by capturing an image of the plurality of types of processing liquids in the common pipe irradiated with the near-infrared light; The substrate processing method according to claim 12 , wherein in the step of identifying the type of the processing liquid, the type of the processing liquid in the common pipe is identified based on the captured image.

16. The substrate processing method according to claim 13 , wherein in the step of controlling the drainage section, a switching timing for switching a destination of the processing liquid flowing through the common pipe is controlled based on a result of identifying the type of the processing liquid.

17. In the step of irradiating with near-infrared rays, one of a plurality of near-infrared light sources emitting near-infrared rays having mutually different peak wavelengths irradiates an area including at least a part of the drainage portion with the near-infrared rays; acquiring type information indicating a type of the treatment liquid; changing the near-infrared light source that irradiates an area including at least a part of the drainage portion based on the type information; The substrate processing method according to claim 10 or 11, further comprising:

18. 12. The substrate processing method according to claim 10, wherein in the step of supplying the processing liquids at different timings, the processing liquid to be supplied to the substrate is switched based on a result of identifying the type of the processing liquid.

Images