Substrate transport device

Abstract

To provide a technology capable of quickly removing static electricity generated by contact with a transport roller.SOLUTION: A substrate transport device 1 includes a transport roller 112 that transports a substrate 9 by rotating around a predetermined rotation axis Lc while in contact with the substrate 9, and an ionizer 71 that generates ions, which is positioned on the side of the rotation axis Lc of the downstream end Pa of the transport roller 112 in the transport direction D when viewed from the normal direction of the main surface of the substrate 9.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present application relates to a substrate transport apparatus. [Background technology]

[0002] A substrate processing apparatus that performs various processes on a substrate may be provided with a substrate transport device that transports the substrate. One type of substrate transport device transports a substrate in one direction by a transport roller that rotates while in contact with the substrate (for example, Patent Documents 1 to 3). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2006-221998 A [Patent Document 2] Patent No. 6139451 [Patent Document 3] Patent No. 6658459 Summary of the Invention [Problem to be solved by the invention]

[0004] When the conveying rollers rotate while in contact with the substrate, static electricity may be generated on the substrate due to friction with the conveying rollers. If the substrate becomes charged with static electricity, particles in the air may be attracted to the substrate and adhere thereto. If the substrate becomes charged and the potential increases, various problems may occur (for example, electricity may flow through the wiring pattern formed on the substrate, causing the wiring pattern to be damaged, or discharge may occur between the substrate and a member nearby, etc.), which may result in a decrease in yield.

[0005] For example, Patent Documents 2 and 3 disclose providing an ionizer in the middle of the transport path. With this configuration, static electricity generated on the substrate due to contact with the transport roller can be removed by ions generated by the ionizer.

[0006] In such a configuration, it is important to shorten the time (ion supply time lag) between when the transport roller comes into contact with each position on the main surface of the substrate (i.e., when static electricity is generated) and when ions are supplied to the position. As described above, static electricity can cause particle adhesion, damage to wiring patterns, discharge, etc., and the shorter the ion supply time lag, the lower the risk of these events occurring.

[0007] The present application has been made in view of the above problems, and has an object to provide a technique capable of quickly removing static electricity generated by contact of a transport roller. [Means for solving the problem]

[0008] A first aspect is a substrate transport device comprising a transport roller that transports a substrate by rotating about a predetermined rotation axis while in contact with the substrate, and an ionizer that generates ions and is positioned closer to the rotation axis than the downstream end of the transport roller in the transport direction when viewed from the normal direction of the main surface of the substrate.

[0009] A second aspect is a substrate transport device according to the first aspect, comprising a roller shaft arranged coaxially with the rotation axis and supporting the transport roller, and a bracket provided on the roller shaft and supporting the ionizer.

[0010] A third aspect is a substrate transport device according to the second aspect, further comprising a weight provided on the bracket on the opposite side of the ionizer with respect to the center of gravity of the bracket, the bracket being rotatably provided on the roller shaft, and the ionizer being positioned vertically upward by the load of the weight.

[0011] A fourth aspect is a substrate transport device according to the second or third aspect, wherein the bracket has a cylindrical circumferential surface, and the ionizer is provided in an arc region of the circumferential surface having a central angle of 180 degrees or less.

[0012] A fifth aspect is a substrate transport device relating to any one of the second to fourth aspects, wherein a plurality of the transport rollers are supported on the roller shaft along its extension direction, and the bracket is provided in the gap between adjacent transport rollers in the extension direction of the roller shaft.

[0013] A sixth aspect is a substrate transport device according to the fifth aspect, comprising a plurality of roller shafts, the roller shafts being arranged in a direction perpendicular to the extension direction in such a manner that the roller shafts extend parallel to each other, a plurality of brackets being provided on each of the roller shafts, and the brackets provided on each of the roller shafts being arranged in a staggered pattern along the arrangement direction of the roller shafts.

[0014] A seventh aspect is the substrate transfer device according to the first aspect, further comprising a flat bracket that is disposed along the axis of rotation and supports the ionizer on one main surface thereof.

[0015] An eighth aspect is the substrate transport device according to the seventh aspect, wherein a combined thickness of the bracket and the ionizer is smaller than a radius of the transport roller.

[0016] A ninth aspect is the substrate transport device according to the eighth aspect, wherein a combined thickness of the bracket and the ionizer is equal to or less than one-fifth of a radius of the transport roller.

[0017] A tenth aspect is the substrate transport device according to any one of the first to ninth aspects, wherein the transport rollers are provided in a speed switching section that switches a transport speed of the substrate.

[0018] An eleventh aspect is a substrate transport device related to the first aspect, comprising one or more roller units comprising the transport roller and a roller shaft arranged coaxially with the rotation axis and supporting the transport roller, wherein the ionizer includes a first ionizer and a second ionizer, and comprising a first bracket provided on the roller shaft of one or more roller units of the one or more roller units and supporting the first ionizer, and a flat second bracket arranged along the roller shaft of one or more roller units of the one or more roller units and supporting the second ionizer on one main surface. Effect of the Invention

[0019] According to the first aspect, it is highly likely that ions can be supplied to a position on the main surface of the substrate after the substrate comes into contact with the transport roller (i.e., after the substrate crosses the rotation axis when viewed from the normal direction of the main surface) before the substrate reaches the downstream end of the transport roller in the transport direction. Therefore, static electricity generated on the substrate due to contact with the transport roller can be quickly removed.

[0020] According to the second aspect, there is a high possibility that ions can be supplied to a position on the main surface of the substrate at the time when the position comes into contact with the transport roller (i.e., the time when the position crosses the rotation axis when viewed from the normal direction of the main surface). Therefore, while static electricity is generated on the substrate due to contact with the transport roller, the generated static electricity can be eliminated in parallel.

[0021] According to the third aspect, even if the roller shaft rotates, the ionizer continues to be disposed vertically above, and therefore no twisting occurs in the wiring supplying power to the ionizer.

[0022] According to the fourth aspect, the size of the ionizer can be kept small.

[0023] According to the fifth aspect, ions can be supplied to the vicinity of each transport roller in the extension direction of the roller shaft.

[0024] According to the sixth aspect, it is possible to supply ions evenly to the area where a plurality of roller shafts are arranged, while keeping the number of ionizers to a minimum.

[0025] According to the seventh aspect, an ion atmosphere can be formed across the extension direction of the rotation axis, and therefore ions can be supplied evenly within the main surface of the transported substrate.

[0026] According to the eighth aspect, for example, the entire ionizer can be positioned closer to the rotation axis than the upper end of the conveying roller, while the upstream end of the ionizer in the conveying direction can be positioned closer to the rotation axis than the downstream end of the conveying roller in the conveying direction.

[0027] According to the ninth aspect, the distance in the transport direction between the upstream end of the ionizer in the transport direction and the rotation axis can be made sufficiently small, so that static electricity generated on the substrate due to contact with the transport roller can be sufficiently quickly removed.

[0028] In the tenth aspect, when the transport speed of the substrate is switched, the substrate is easily slippery against the transport roller, making it particularly susceptible to static electricity. However, by arranging the ionizer closer to the rotation axis than the downstream end in the transport direction of the transport roller provided in the speed switching section, static electricity generated on the substrate when the transport speed is switched can be quickly removed.

[0029] According to the eleventh aspect, by combining the ion atmosphere formed by the first ionizer and the ion atmosphere formed by the second ionizer, an ion atmosphere suited to the actual static electricity generation conditions can be formed, and static electricity can be appropriately removed. [Brief description of the drawings]

[0030] [Figure 1] 1 is a plan view illustrating a schematic configuration of a substrate processing system. [Diagram 2] FIG. 2 is a diagram illustrating a configuration example of a developing device. [Diagram 3] FIG. 2 is a perspective view showing a substrate transport device. [Figure 4] FIG. 2 is a plan view showing the substrate transport device. [Diagram 5] FIG. 2 is a side view showing the substrate transport device. [Figure 6] 10A and 10B are schematic diagrams for explaining transitions in potential in a case where ions are supplied with a relatively short time lag after static electricity is generated, and in a case where ions are supplied with a relatively long time lag after static electricity is generated. [Figure 7] FIG. 2 is a perspective view showing a substrate transport device. [Figure 8] FIG. 2 is a plan view showing the substrate transport device. [Figure 9] FIG. 2 is a side view showing the substrate transport device. [Figure 10] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 11] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 12] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 13] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 14] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 15] FIG. 4 is a diagram showing an example of a layout of a static eliminating unit. [Figure 16] FIG. 13 is a side view showing a modified example of the static eliminating unit. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] Hereinafter, an embodiment will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples, and are not intended to limit the scope of the present disclosure. In addition, in the drawings, the dimensions or numbers of each part may be exaggerated or simplified as necessary for ease of understanding.

[0032] Expressions showing relative or absolute positional relationships (e.g., "in one direction," "along one direction," "parallel," "orthogonal," "center," "concentric," "coaxial," etc.) not only strictly express the positional relationship, but also express a state in which the relative angle or distance is displaced within a range in which a tolerance or similar function is obtained, unless otherwise specified. Expressions showing an equal state (e.g., "same," "equal," "homogeneous," etc.) not only strictly express a quantitatively equal state, but also express a state in which a difference exists in which a tolerance or similar function is obtained, unless otherwise specified. Expressions showing a shape (e.g., "circular," "square," "cylindrical," etc.) not only strictly express the shape geometrically, but also express a shape within a range in which a similar effect is obtained, and may have, for example, unevenness or chamfering. Expressions such as "comprise," "include," "include," "have," etc. of components are not exclusive expressions that exclude the presence of other components. In addition, the expression "at least one of A, B, and C" includes "A only," "B only," "C only," "any two of A, B, and C," and "all of A, B, and C."

[0033] <1. Overall configuration of the substrate processing system> The configuration of the substrate processing system 100 will be described with reference to Fig. 1. Fig. 1 is a plan view showing a schematic example of the configuration of the substrate processing system 100.

[0034] The substrate processing system 100 illustrated here is a system (coater developer system) that performs a coating process of a resist liquid and a developing process on a substrate 9. The substrate 9 to be processed in the substrate processing system 100 is, for example, a rectangular glass substrate used in a liquid crystal display device.

[0035] The substrate processing system 100 has a configuration in which a plurality of substrate processing apparatuses (cleaning apparatus 101, dehydration bake apparatus 102, coating-related apparatus 103, pre-bake apparatus 104, developing apparatus 105, and post-bake apparatus 106) are arranged between an indexer unit ID and an interface unit IF. On a forward line from the indexer unit ID to the interface unit IF, for example, the cleaning apparatus 101, dehydration bake apparatus 102, coating-related apparatus 103, and pre-bake apparatus 104 are arranged in this order. On the other hand, on a return line from the interface unit IF to the indexer unit ID, for example, the developing apparatus 105 and post-bake apparatus 106 are arranged in this order. In addition, the substrate processing system 100 is connected to an exposure apparatus E via the interface unit IF.

[0036] In the indexer part ID, a substrate transport robot (indexer robot) takes out substrates 9 one by one from a container (cassette) that holds a plurality of substrates 9, and sends the taken out substrates 9 to a cleaning apparatus 101.

[0037] In the cleaning apparatus 101, for example, a cleaning liquid is supplied to the substrate 9 to remove particles, organic contaminants, metal contaminants, oils and fats, natural oxide films, and the like adhering to the surface of the substrate 9 (cleaning process). The substrate 9 that has been subjected to the cleaning process is sent to a dehydration bake apparatus 102.

[0038] In the dehydration bake unit 102, the substrate 9 is heated and dehydrated (dehydration bake process). The substrate 9 that has been subjected to the dehydration bake process is sent to a coating-related device 103.

[0039] In the coating-related apparatus 103, a resist liquid is coated onto the substrate 9, and the coated resist liquid is dried, for example, by reduced pressure drying, thereby forming a resist film on the surface of the substrate 9 (coating-related process). The substrate 9 that has been subjected to the coating-related process is sent to a pre-baking apparatus 104.

[0040] In the pre-baking unit 104, the resist film provided on the substrate 9 is heated (pre-baking process) for the purpose of solidifying the resist film, etc. The substrate 9 that has been subjected to the pre-baking process is sent to an interface unit IF.

[0041] In the interface section IF, a substrate transport robot (interface robot) delivers the substrate 9 sent from the pre-bake apparatus 104 to the exposure apparatus E.

[0042] In the exposure device E, the substrate 9 is irradiated with light through a photomask, so that the pattern on the photomask is transferred to a resist film provided on the substrate 9 (exposure process). After the exposure process, the substrate 9 is returned to the interface unit IF.

[0043] In the interface unit IF, the interface robot delivers the substrate 9 that has returned from the exposure apparatus E to the developing apparatus 105.

[0044] In the developing device 105, first, a developer is supplied (applied) to the substrate 9. This causes the development of the resist film to proceed, and a pattern is formed on the substrate 9 (developing process). Next, the substrate 9 is rinsed with a rinse liquid (rinsing process). This stops the development process. Next, the rinse liquid adhering to the substrate 9 is removed (drained) (draining process). The substrate 9 that has undergone the draining process is sent to a post-bake device 106.

[0045] In the post-bake unit 106, the substrate 9 is heated (post-bake process) for the purpose of improving the film quality of the resist after development, etc. The substrate 9 that has been subjected to the post-bake process is sent to the indexer part ID.

[0046] In the indexer part ID, the indexer robot, for example, stores the substrate 9 sent from the post-bake unit 106 in a cassette.

[0047] The substrate processing system 100 includes a control unit 107 that controls each unit (cleaning device 101, dehydration bake device 102, coating-related device 103, pre-bake device 104, developing device 105, post-bake device 106, indexer unit ID, and interface unit IF) included in the substrate processing system 100. A series of operations performed in the substrate processing system 100 are performed under the control of the control unit 107. The control unit 107 is configured, for example, by a general computer having an electric circuit. As an example, the control unit 107 includes a CPU (Central Processor Unit) as a central processing unit responsible for data processing, a ROM (Read Only Memory) in which basic programs and the like are stored, a RAM (Random Access Memory) used as a working area when the CPU performs a predetermined process (data processing), a storage device (for example, a storage device configured by a non-volatile storage device such as a flash memory or a hard disk device), and a bus line connecting these devices to each other. For example, a program that specifies the process to be executed by the control unit 107 is stored in the storage device, and the CPU executes the program, thereby allowing the control unit 107 to execute the process specified by the program. However, some or all of the processing executed by control unit 107 may be executed by hardware such as a dedicated logic circuit.

[0048] <2. Flat flow processing equipment> The substrate processing system 100 includes a plurality of substrate processing apparatuses (cleaning apparatus 101, dehydration bake apparatus 102, coating-related apparatus 103, pre-bake apparatus 104, developing apparatus 105, and post-bake apparatus 106) that transport substrates 9 in one direction and process each substrate 9 in turn (flat flow processing apparatus). For example, cleaning apparatus 101 and developing apparatus 105 are examples of this type of processing apparatus. The configuration of the flat flow processing apparatus will be described below with reference to FIG. 2, taking developing apparatus 105 as an example. FIG. 2 is a schematic diagram showing an example of the configuration of developing apparatus 105.

[0049] The developing apparatus 105 includes a substrate transport device 1 that transports a substrate 9. The developing apparatus 105 also includes a substrate introduction section 2, a development processing section 3, a rinsing processing section 4, a draining section 5, and a substrate discharge section 6, which are provided in this order from the upstream side of the transport direction D along a transport path formed by the substrate transport device 1. These sections 2, 3, 4, 5, and 6 are provided with processing tanks 2h, 3h, 4h, 5h, and 6h, respectively, and the interiors of adjacent processing tanks 2h, 3h, 4h, 5h, and 6h communicate with each other through a transfer port for passing the substrate 9 therethrough.

[0050] (Substrate transport device 1) The substrate transport device 1 is, for example, a mechanism (roller transport mechanism) that transports the substrate 9 by a roller method, and includes a plurality of roller units 11. Each roller unit 11 includes a long, rod-shaped roller shaft 111 and rollers (transport rollers) 112 supported by the roller shaft 111 (see FIG. 3). The rollers 112 include, for example, a cylindrical peripheral surface and circular main surfaces provided at both ends in the width direction of the peripheral surface. As an example, the roller shaft 111 is provided to penetrate the center of the main surface of the roller 112 in the normal direction of the main surface, thereby supporting the roller 112 on the roller shaft 111. Here, the roller 112 is fixed to the roller shaft 111 so as not to rotate. Also, here, the plurality of rollers 112 are arranged and supported at intervals (typically at equal intervals) along the extension direction of the roller shaft 111.

[0051] The roller units 11 are arranged in a row with the roller shafts 111 extending parallel to each other and spaced apart from each other along a direction perpendicular to the extension direction of the roller shafts 111 (see FIG. 3). Specifically, for example, the roller shafts 111 of the roller units 11 are installed between a pair of support plates 113 with the roller shafts 111 extending perpendicular to the extension direction of the support plates 113, and are arranged in a row with spaces between them along the extension direction of the pair of support plates 113, 113.

[0052] The substrate conveying device 1 includes a plurality of driving units 12. Each driving unit 12 includes, for example, a motor and rotates the roller shaft 111 around its axis. The roller shaft 111 is arranged coaxially with the rotation axis Lc, and as the roller shaft 111 rotates around its axis, each roller 112 fixed to the roller shaft 111 so as not to rotate rotates around the rotation axis Lc. The roller 112 rotates around the rotation axis Lc while in contact with the substrate 9, so that the substrate 9 is conveyed in the rotation direction of the roller 112. As each roller shaft 111 of the plurality of roller units 11 arranged in a row is rotated in the same direction around the rotation axis Lc, the substrate 9 is conveyed in the arrangement direction of the plurality of roller units 11 along a conveying path defined by the arrangement surface of the plurality of roller units 11.

[0053] Here, for example, a predetermined number of adjacent roller units 11 are grouped to form one roller unit group 11g, and a drive unit 12 is provided for each roller unit group 11g. That is, each roller shaft 111 of a predetermined number of roller units 11 belonging to the same group is driven by the same drive unit 12. The drive unit 12 rotates each roller shaft 111 of the predetermined number of roller units 11 to be driven in the same direction and at the same rotational speed around the rotation axis Lc (synchronous rotation).

[0054] The substrate transport apparatus 1 includes a static elimination unit 7. The static elimination unit 7 is provided, for example, in a roller unit 11 provided in each of the substrate inlet section 2 and the substrate outlet section 6. A specific configuration of the static elimination unit 7 will be described later.

[0055] (Substrate introduction section 2) The substrate introduction section 2 is a speed switching section that switches (changes) the transport speed of the substrate 9. For example, in order to improve the throughput, the transport speed in a path section where the substrate 9 is not processed (simply transported) may be set to be faster than the transport speed in a path section where the substrate 9 is processed (for example, a path section from the development processing section 3 to the draining section 5). In this case, the transport speed of the substrate 9 is switched in a speed switching section provided between these two path sections. That is, the substrate introduction section 2 is disposed on the upstream side of the development processing section 3 in the transport direction D, and the speed of the substrate 9 transported at a relatively high speed from the interface section IF is reduced here. Specifically, for example, in the substrate introduction section 2, the rotation speed of the roller unit group 11g on the downstream side of the transport direction D is set to be smaller than the rotation speed of the roller unit group 11g on the upstream side of the transport direction D. As a result, the transport speed of the substrate 9 is switched from high speed to low speed, and the substrate 9 is sent out at a low speed.

[0056] (Development Processing Unit 3) The developing processing section 3 includes a developing nozzle 31 that supplies a developing solution to the upper surface of the substrate 9 transported by the substrate transport device 1. The developing nozzle 31 is, for example, a nozzle having a long discharge port (a so-called slit nozzle) and is disposed in a position such that the extension direction of the discharge port intersects (for example, is perpendicular to) the transport direction D. The developing nozzle 31 is disposed in an inclined position such that the discharge direction is inclined from the vertical downward direction to the downstream side of the transport direction D.

[0057] The developing nozzle 31 is connected to a developer storage section 313 via, for example, a supply pipe 312 having an on-off valve 311 interposed therein. When the on-off valve 311 is opened, the developer is supplied from the developer storage section 313 to the developing nozzle 31 through the supply pipe 312, and the developer is discharged from the discharge port. That is, the developer is discharged in a curtain shape (a curtain shape across the entire width direction (direction perpendicular to the transport direction D) of the substrate 9) along a discharge direction that inclines from a vertical downward direction to the downstream side of the transport direction D. As a result, the developer is supplied to the upper surface of the substrate 9 being transported, and a liquid layer of the developer is formed on the upper surface. The formation of the liquid layer of the developer progresses the development of the resist film, and a pattern is formed on the substrate 9.

[0058] The developing section 3 includes an air knife 32 that ejects gas (here, for example, air) toward the transported substrate 9. The air knife 32 is disposed downstream of the developing nozzle 31 in the transport direction D. The air knife 32 is, for example, a nozzle having a long ejection port, and is disposed in a position such that the extension direction of the ejection port intersects with the transport direction D. The air knife 32 is disposed, for example, in a vertical position such that the ejection direction is vertically downward.

[0059] The air knife 32 is connected to the compressed air supply source Q via, for example, a supply pipe 322 in which an on-off valve 321 is interposed. When the on-off valve 321 is opened, compressed air is supplied from the compressed air supply source Q to the air knife 32 through the supply pipe 322, and the air is discharged at high pressure from the discharge port. That is, the air is discharged at high pressure in a curtain shape (a curtain shape across the entire width direction of the substrate 9) along the vertically downward discharge direction. The air blown vertically downward onto the transported substrate 9 acts as a barrier to prevent the developer on the upper surface of the substrate 9 from moving downstream in the transport direction D together with the substrate 9. The developer that cannot move together with the substrate 9 is swept away upstream in the transport direction D or in a direction intersecting the transport direction D, and flows down from the substrate 9, and is removed from the substrate 9. However, the air knife 32 does not completely remove the developer on the substrate 9, and leaves a small amount of developer on the substrate 9 to the extent that the substrate 9 does not dry out.

[0060] (Rinse processing section 4) The rinse processing unit 4 includes two types of rinse nozzles (a first rinse nozzle 41a and a second rinse nozzle 41b) that supply a rinse liquid to the upper surface of the substrate 9 being transported. The first rinse nozzle 41a is, for example, a nozzle having a long discharge port, and is disposed in a position in which the extension direction of the discharge port intersects with the transport direction D. The first rinse nozzle 41a is, for example, disposed in an inclined position in which the discharge direction inclines from a vertical downward direction to the downstream side of the transport direction D. The second rinse nozzle 41b is disposed downstream of the first rinse nozzle 41a with respect to the transport direction D. The second rinse nozzle 41b is, for example, a nozzle in which a plurality of discharge ports are provided in a long cylindrical body along its extension direction, and is disposed in a position in which the extension direction of the cylindrical body intersects with the transport direction D. A plurality of second rinse nozzles 41b may be provided along the transport direction D.

[0061] The first rinse nozzle 41a and the second rinse nozzle 41b are connected to a rinse liquid storage section 413, for example, via a supply pipe 412 in which an on-off valve 411 is interposed. When the on-off valve 411 is opened, a rinse liquid (for example, pure water as a rinse liquid) is supplied to each rinse nozzle 41a, 41b from the rinse liquid storage section 413 through the supply pipe 412, and the rinse liquid is discharged from the discharge port of each rinse nozzle 41a, 41b. That is, the rinse liquid is discharged in a curtain shape (a curtain shape covering the entire width direction of the substrate 9) from the discharge port of the first rinse nozzle 41a along a discharge direction inclined from a vertical downward direction to the downstream side of the transport direction D. In addition, the rinse liquid is discharged, for example, in a spray shape from each discharge port of the second rinse nozzle 41b. As a result, the rinse liquid is supplied to the upper surface of the substrate 9 being transported, and the developing liquid remaining on the upper surface is replaced with the rinse liquid. That is, the substrate 9 is rinsed with the rinsing liquid.

[0062] (Draining part 5) The liquid drainer 5 includes an air knife 51 that blows gas (here, for example, air) onto the substrate 9 being transported. Here, air knives 51 are provided on both the upper and lower sides of the transport path. Each air knife 51 is, for example, a nozzle having a long discharge port, and is disposed in a position in which the extension direction of the discharge port intersects with the transport direction D. The air knife 51 disposed on the upper side of the transport path is disposed in an inclined position in which the discharge direction is inclined from the vertical downward direction to the upstream side of the transport direction D. Meanwhile, the air knife 51 disposed on the lower side of the transport path is disposed in an inclined position in which the discharge direction is inclined from the vertical upward direction to the upstream side of the transport direction D.

[0063] Each air knife 51 is connected to a compressed air supply source Q via, for example, a supply pipe 512 in which an on-off valve 511 is interposed. When the on-off valve 511 is opened, compressed air is supplied from the compressed air supply source Q to each air knife 51 through the supply pipe 512, and air is discharged at high pressure from the discharge port. That is, air is discharged at high pressure from the discharge port of the air knife 51 arranged on the upper side of the transport path in a curtain shape (a curtain shape covering the entire width direction of the substrate 9) along a discharge direction that inclines from a vertical downward direction to the upstream side of the transport direction D. As a result, liquid adhering to the upper surface of the substrate 9 being transported is blown off to the upstream side of the transport direction D and removed (drained) from the upper surface. On the other hand, air is discharged at high pressure from the discharge port of the air knife 51 arranged on the lower side of the transport path in a curtain shape (a curtain shape covering the entire width direction of the substrate 9) along a discharge direction that inclines from a vertical upward direction to the upstream side of the transport direction D. As a result, the liquid adhering to the lower surface of the transported substrate 9 is blown off to the upstream side in the transport direction D and removed from the lower surface.

[0064] (Board lead-out part 6) Like the substrate introduction section 2, the substrate discharge section 6 is a speed switching section that switches the transport speed of the substrate 9. The substrate discharge section 6 is disposed downstream of the draining section 5 in the transport direction D, and here, for example, the speed of the substrate 9 transported from the draining section 5 at a relatively low speed is accelerated. Specifically, for example, in the substrate discharge section 6, the rotation speed of the roller unit group 11g on the downstream side of the transport direction D is made higher than the rotation speed of the roller unit group 11g on the upstream side of the transport direction D. This switches the transport speed of the substrate 9 from a low speed to a high speed, and the substrate 9 is sent out at high speed.

[0065] 3. Static electricity removing unit according to the first embodiment <3-1. Configuration> As described above, the substrate transport apparatus 1 (specifically, for example, the roller units 11 provided in each of the substrate inlet section 2 and the substrate outlet section 6) is provided with a static elimination unit 7. The static elimination unit 7 according to the first embodiment will be described with reference to Figs. 3 to 5. Each of Figs. 3, 4, and 5 is a perspective view, a plan view, or a side view showing a portion of the substrate transport apparatus 1 (the portion where the static elimination unit 7 is provided).

[0066] The static electricity removing unit 7 includes an ionizer 71 and a bracket 72 .

[0067] (Ionizer 71) The ionizer 71 is a device that neutralizes (neutralizes) static electricity by ionizing the surrounding air and generating ions (such devices are also called static eliminators, static electricity removers, etc.). The ionizer 71 is, for example, a long thin plate. Specifically, the ionizer 71 includes, for example, a long thin plate-like base material and an electrode provided along the base material, and generates ions in a planar manner from approximately the entire one main surface (ion generating surface) of the base material by supplying power (for example, high-frequency power) to the electrode to cause discharge. As a commercially available product of such an ionizer 71, for example, there is the Ion Blade (registered trademark) F2 series (catalog URL: https: / / www.fisa.co.jp / product / dynac / ionblade_F2.html) by Fisa Co., Ltd.

[0068] (Bracket 72) Bracket 72 is a support that supports ionizer 71. Bracket 72 includes, for example, a cylindrical circumferential surface 721 and circular main surfaces 722 provided at both ends of circumferential surface 721 in the width direction, and ionizer 71 is provided on circumferential surface 721. That is, circumferential surface 721 serves as a support surface that supports ionizer 71. As an example, ionizer 71 is provided in an arc region on circumferential surface 721 with a central angle θ of 180 degrees or less, with the long dimension aligned along the extension direction of circumferential surface 721.

[0069] The bracket 72 is provided on the roller shaft 111. For example, here, a through hole 723 is provided at the center of a main surface 722 of the bracket 72, penetrating the main surface 722 in the normal direction, and the roller shaft 111 is provided penetrating this through hole 723, thereby supporting the bracket 72 on the roller shaft 111. As described above, a plurality of rollers 112 are supported on the roller shaft 111 along its extension direction, and the bracket 72 is provided in the gaps between the rollers 112 adjacent to each other in the extension direction of the roller shaft 111. As an example, the brackets 72 are provided in all of the gaps between the adjacent rollers 112.

[0070] As described above, the bracket 72 is supported by the roller shaft 111 at the center of its main surface 722. The roller 112 is also supported by the roller shaft 111 at the center of its main surface. That is, both the bracket 72 and the roller 112 are arranged concentrically with the axis (rotation axis) Lc of the roller shaft 111. Here, the radius of the bracket 72 (the radius of the main surface 722) is set to a dimension that is smaller than the radius of the roller 112 (the radius of the main surface) even when the thickness of the ionizer 71 is added to the radius. That is, the dimension obtained by adding the thickness of the ionizer 71 to the radius of the bracket 72 is smaller than the radius of the roller 112. Therefore, when viewed along the rotation axis Lc, the ionizer 71 supported by the bracket 72 is arranged on the side of the rotation axis Lc with respect to the peripheral surface of the roller 112. That is, the ionizer 71 supported by the bracket 72 is disposed closer to the rotation axis Lc (i.e., at a position that does not interfere with the transport path) than the upper end (upper end in the vertical direction) Pb of the roller 112. Also, when viewed from the normal direction to the main surface of the substrate 9 being transported, the ionizer 71 supported by the bracket 72 is disposed closer to the rotation axis Lc than the downstream end (downstream end in the transport direction D) Pa of the roller 112.

[0071] The bracket 72 is provided rotatably with respect to the roller shaft 111. A bearing or the like may be provided between the bracket 72 (specifically, through hole 723) and the roller shaft 111 so that the bracket 72 can rotate smoothly with respect to the roller shaft 111. Here, a weight 724 is provided on the bracket 72. The weight 724 is a member heavier than the ionizer 71, and is provided on the opposite side of the ionizer 71 with respect to the center of gravity G of the bracket 72. Therefore, even if the roller shaft 111 is rotated around the rotation axis Lc, the bracket 72 is maintained in a rotational posture in which the weight 724 is disposed vertically downward and the ionizer 71 is disposed vertically upward (opposite the conveying path) due to the load of the weight 724.

[0072] <3-2.Static charge removal method> Next, the manner in which static electricity is removed by the static removing unit 7 will be described with continued reference to FIGS.

[0073] Ionizer 71 included in static electricity removing unit 7 is connected to a wiring (not shown) for supplying power thereto, and when power is supplied to ionizer 71 through the wiring, ions are generated in a planar manner from the ion generating surface. As described above, ionizer 71 is supported by bracket 72 provided on roller shaft 111 and disposed opposite to the transport path. Therefore, ions generated by ionizer 71 are supplied to the transport path.

[0074] Here, attention is focused on an arbitrary position on the main surface of the substrate 9 transported along the transport path. When the position of interest comes into contact with the rotating roller 112, static electricity may be generated at the position of interest due to friction with the roller 112. The static electricity generated at the position of interest is eliminated by ions supplied from the ionizer 71, and here, the time from when static electricity is generated at the position of interest (i.e., when the position of interest comes into contact with the roller 112) to when ions are supplied to the position of interest (the time lag in ion supply) can be shortened.

[0075] That is, in this case, the ionizer 71 is disposed on the side of the rotation axis Lc of the downstream end Pa of the roller 112 as viewed from the normal direction of the main surface of the substrate 9 being transported, so that an atmosphere containing ions (ion atmosphere) is formed on the side of the rotation axis Lc of the downstream end Pa. Therefore, it is highly likely that ions can be supplied to the target position before the target position reaches the downstream end Pa of the roller 112 after the target position comes into contact with the roller 112 (i.e., after the target position crosses the rotation axis Lc as viewed from the normal direction of the main surface). Therefore, the time lag of ion supply can be shortened. That is, static electricity generated on the substrate 9 due to contact with the roller 112 can be quickly removed.

[0076] In particular, since the ionizer 71 is supported by the bracket 72 provided on the roller shaft 111, an ion atmosphere is formed around the roller shaft 111 (that is, around the rotation axis Lc). Therefore, it is highly likely that ions can be supplied to the position of interest at the time when the position of interest comes into contact with the roller 112 (that is, the time when the position of interest crosses the rotation axis Lc when viewed from the normal direction of the main surface), or even before the position of interest comes into contact with the roller 112. Therefore, it is possible to substantially eliminate the time lag in the supply of ions. That is, in parallel with the generation of static electricity on the substrate 9 due to contact with the roller 112, the generated static electricity can be removed.

[0077] The shorter the time lag of ion supply, the more preferable. FIG. 6 shows a schematic diagram of a transition V1 of the potential at the position of interest when ions are supplied with a relatively short time lag T1, and a transition V2 of the potential at the position of interest when ions are supplied with a relatively long time lag T2. As shown here, if the time lag of ion supply is sufficiently short, the charge is removed at the timing when the potential at the position of interest is rising, so that the maximum potential (peak value of potential) at the position of interest is kept low and the duration of the state of being charged with static electricity (charged state) is kept short. As a result, the risk of particles in the air being attracted to and attached to the position of interest is reduced. In addition, various inconveniences caused by an increase in potential (for example, damage to the wiring pattern due to electricity flowing through the pattern (wiring pattern) formed on the substrate 9, discharge between the substrate 9 and a member nearby, etc.) are sufficiently avoided. Furthermore, the amount of ions required for charge removal can be kept small (i.e., static electricity can be removed with a relatively small amount of ions).

[0078] <3-3.Effects> The substrate transport device 1 including the static elimination unit 7 according to the first embodiment includes a roller (transport roller) 112 that transports the substrate 9 by rotating around a predetermined rotation axis Lc while contacting the substrate 9, and an ionizer 71 that generates ions and is disposed on the side of the rotation axis Lc of the downstream end (downstream end) Pa of the roller 112 in the transport direction D, as viewed from the normal direction of the main surface of the substrate 9 being transported. With this configuration, it is highly likely that ions can be supplied to a position in the main surface of the substrate 9 before the substrate 9 reaches the downstream end Pa of the roller 112 after the substrate 9 contacts the roller 112 (i.e., after the substrate 9 crosses the rotation axis Lc as viewed from the normal direction of the main surface). Therefore, static electricity generated on the substrate 9 due to contact with the roller 112 can be quickly eliminated.

[0079] Moreover, the substrate transport device 1 includes a roller shaft 111 that is disposed coaxially with the rotation axis Lc and supports the roller 112, and a bracket 72 that is provided on the roller shaft 111 and supports the ionizer 71. With this configuration, it is highly likely that ions can be supplied to a position in the main surface of the substrate 9 at the time when the position comes into contact with the roller 112 (i.e., the time when the position crosses the rotation axis Lc when viewed from the normal direction of the main surface). Therefore, in parallel with the generation of static electricity on the substrate 9 due to contact with the roller 112, the generated static electricity can be neutralized.

[0080] Furthermore, bracket 72 includes weight 724 provided on the opposite side of ionizer 71 with respect to center of gravity G of bracket 72. Bracket 72 is rotatably provided on roller shaft 111, and ionizer 71 is disposed vertically upward by the load of weight 724. With this configuration, even if roller shaft 111 rotates, the rotational posture of bracket 72 does not change, and ionizer 71 continues to be disposed vertically upward, so no twisting occurs in the wiring supplying power to ionizer 71. Furthermore, even if roller shaft 111 rotates, the portion of bracket 72 facing the transport path does not change, so there is no problem even if ionizer 71 is not provided in any other portion.

[0081] Moreover, bracket 72 has a cylindrical circumferential surface 721, and ionizer 71 is provided in an arc region of circumferential surface 721 with a central angle of 180 degrees or less. With this configuration, the size (dimension in the long direction) of ionizer 71 can be kept small. Furthermore, by bending ionizer 71 into an arc shape, it is possible to form an ion atmosphere that spreads outward beyond both ends in the extension direction of ionizer 71 as viewed from the normal direction of the main surface of substrate 9 being transported. Therefore, ions can be supplied to an area longer than the length of ionizer 71 in the extension direction as viewed from the normal direction.

[0082] Further, a plurality of rollers 112 are supported on roller shaft 111 along the extension direction thereof, and brackets 72 are provided in the gaps between adjacent rollers 112 in the extension direction of roller shaft 111. With this configuration, ions can be supplied to the vicinity of each roller 112 in the extension direction of roller shaft 111.

[0083] In the developing device 105, speed switching units (substrate inlet unit 2 and substrate outlet unit 6) for switching the transport speed of the substrate 9 are provided on the upstream and downstream sides of the group of processing units (developing processing unit 3, rinsing processing unit 4, and draining unit 5) in the transport direction D. A static electricity removal unit 7 is provided in the roller unit 11 provided in the speed switching unit. When the transport speed of the substrate 9 is switched, the substrate 9 is easily slippery against the rollers 112, and static electricity is particularly likely to be generated. By providing the static electricity removal unit 7 in the roller unit 11 provided in the speed switching unit (i.e., by arranging the ionizer 71 on the side of the rotation axis Lc rather than the downstream end Pa of the roller 112 included in the roller unit 11 provided in the speed switching unit), static electricity generated on the substrate 9 when the transport speed is switched can be quickly removed.

[0084] <4. Static electricity removing unit according to the second embodiment> <4-1. Configuration> The static eliminating unit 8 according to the second embodiment will be described with reference to Figures 7 to 9. Each of Figures 7, 8, and 9 is a perspective view, a plan view, or a side view showing a part of the substrate transport apparatus 1 (a part where the static eliminating unit 8 is provided).

[0085] The static electricity removing unit 8 is provided in the substrate transport device 1 (specifically, for example, in the roller units 11 provided in each of the substrate introduction section 2 and the substrate discharge section 6), similar to the static electricity removing unit 7 according to the first embodiment.

[0086] The static electricity removing unit 8 includes an ionizer 81 and a bracket 82 .

[0087] (Ionizer 81) The ionizer 81 is similar to the ionizer 71 according to the first embodiment.

[0088] (Bracket 82) The bracket 82 is a support that supports the ionizer 81. The bracket 82 is, for example, a long flat plate, and the ionizer 81 is supported on one of the main surfaces. That is, one of the main surfaces of the bracket 82 serves as a support surface that supports the ionizer 81. The dimension of the bracket 82 in the long direction is approximately the same as the dimension of the roller shaft 111 in the extending direction, and the ionizer 81 is provided so as to cover substantially the entire main surface of the bracket 82 (substantially the entire surface from one end side to the other end side in the long direction). Needless to say, multiple ionizers 81 may be arranged without gaps in the extending direction of the bracket 82 as necessary. That is, the multiple ionizers 81 may cover substantially the entire main surface of the bracket 82.

[0089] The bracket 82 is disposed, for example, below the transport path in such a direction that the ionizer 81 faces the transport path. The bracket 82 is disposed along the axis (rotation axis) Lc of the roller shaft 111 (preferably parallel to the rotation axis Lc) on the downstream side of the transport direction D of the roller shaft 111. The bracket 82 is provided at a position sufficiently close to the roller shaft 111. Here, the "position sufficiently close to the roller shaft 111" refers to a position where the entire ionizer 81 supported by the bracket 82 is disposed on the side of the rotation axis Lc relative to the upper end Pb of the roller 112, and where at least a part of the ionizer 81 supported by the bracket 82 is disposed on the side of the rotation axis Lc relative to the downstream end Pa of the roller 112 when viewed from the normal direction of the main surface of the substrate 9 being transported.

[0090] Here, the thickness T obtained by combining the thickness of the bracket 82 and the thickness of the ionizer 81 is smaller than the radius R (the radius of the main surface) of the roller 112. That is, the thickness of the bracket 82 is determined taking into account the thickness of the ionizer 81 so that the thickness T is smaller than the radius R of the roller 112. Therefore, while the entire ionizer 81 is disposed closer to the rotation axis Lc than the upper end Pb of the roller 112, the upstream end Pc of the ionizer 81 (the upstream end in the conveying direction D) can be disposed closer to the rotation axis Lc than the downstream end Pa of the roller 112. Here, it is preferable that the separation distance between the upstream end Pc of the ionizer 81 and the rotation axis Lc in the conveying direction D is small, and the smaller the thickness T obtained by combining the thickness of the bracket 82 and the thickness of the ionizer 81 is with respect to the radius R of the roller 112, the smaller this separation distance can be. In order to make this separation distance sufficiently small, the combined thickness T of the bracket 82 and the ionizer 81 is preferably equal to or less than one-fifth of the radius R of the roller 112, and particularly preferably equal to or less than one-tenth of the radius R of the roller 112.

[0091] The bracket 82 may be disposed in any manner at the above position. However, if the bracket 82 is small (thin), the bracket 82 is likely to sag midway along its extension. Therefore, for example, it is preferable to support the bracket 82 with a plurality of legs 821 provided in the extension direction of the bracket 82. In this case, the tip of each leg 821 may be fixed to, for example, the bottom surface of the treatment tank 2h, 6h. Also, the end of the bracket 82 in the extension direction may be fixed to the support plate 113.

[0092] <4-2.Static charge removal method> Next, the manner in which static electricity is removed by the static removing unit 8 will be described with continued reference to FIGS.

[0093] The ionizer 81 included in the static electricity removing unit 8 is connected to a wiring (not shown) for supplying power thereto, and when power is supplied to the ionizer 81 through the wiring, ions are generated in a planar manner from the ion generating surface. As described above, the ionizer 81 is supported by the bracket 82 provided along the rotation axis Lc and is disposed opposite the transport path. Therefore, the ions generated by the ionizer 81 are supplied to the transport path.

[0094] Here too, attention is focused on an arbitrary position on the main surface of the substrate 9 being transported along the transport path. When the position of interest comes into contact with the rotating roller 112, static electricity may be generated at the position of interest due to friction with the roller 112. The static electricity generated at the position of interest is eliminated by ions supplied from the ionizer 81, and here too, the time lag in the supply of ions can be shortened.

[0095] That is, in this case as well, the ionizer 81 is disposed closer to the rotation axis Lc than the downstream end Pa of the roller 112 when viewed from the normal direction of the main surface of the substrate 9 being transported, so that an ion atmosphere is formed closer to the rotation axis Lc than the downstream end Pa. Therefore, it is highly likely that ions can be supplied to the target position before the target position reaches the downstream end Pa of the roller 112 after the target position comes into contact with the roller 112 (i.e., after the target position crosses the rotation axis Lc when viewed from the normal direction of the main surface). Therefore, the time lag in ion supply can be shortened. That is, static electricity generated on the substrate 9 due to contact with the roller 112 can be quickly removed.

[0096] In particular, here, the ionizer 81 is supported by a flat bracket 82 provided along the rotation axis Lc. In this configuration, the smaller the thickness T of the bracket 82 and the ionizer 81 is relative to the radius R of the roller 112, the smaller the separation distance between the upstream end Pc of the ionizer 81 and the rotation axis Lc in the transport direction D can be, and the smaller this separation distance is, the shorter the time lag of ion supply can be. For example, by making the thickness T of the bracket 82 and the ionizer 81 equal to or less than one-fifth of the radius R of the roller 112, the separation distance can be made sufficiently small. As a result, the time lag of ion supply can be made sufficiently short. That is, the static electricity generated on the substrate 9 by contact with the roller 112 can be sufficiently quickly removed.

[0097] <4-3.Effects> The substrate transport device 1 equipped with the static elimination unit 8 according to the second embodiment includes a roller 112 that transports the substrate 9 by rotating around a predetermined rotation axis Lc while contacting the substrate 9, and an ionizer 81 that generates ions and is disposed closer to the rotation axis Lc than the downstream end Pa of the roller 112 when viewed from the normal direction of the main surface of the substrate 9 being transported. With this configuration, it is highly likely that ions can be supplied to a position in the main surface of the substrate 9 before the substrate 9 reaches the downstream end Pa of the roller 112 after the substrate 9 comes into contact with the roller 112 (i.e., after the substrate 9 crosses the rotation axis Lc when viewed from the normal direction of the main surface). Therefore, static electricity generated on the substrate 9 due to contact with the roller 112 can be quickly eliminated.

[0098] The substrate transfer device 1 also includes a flat bracket 82 that is disposed along the rotation axis Lc and supports the ionizer 81 on one of its main surfaces. This configuration allows an ion atmosphere to be formed along the extension direction of the rotation axis Lc. Therefore, ions can be supplied evenly within the main surface of the substrate 9 being transferred.

[0099] Moreover, the thickness T of the bracket 82 and the ionizer 81 combined is smaller than the radius R of the roller 112. With this configuration, for example, the entire ionizer 81 can be disposed closer to the rotation axis Lc than the upper end Pb of the roller 112, while the upstream end Pc of the ionizer 81 in the transport direction D can be disposed closer to the rotation axis Lc than the downstream end Pa of the roller 112. In particular, if the thickness T is equal to or less than one-fifth of the radius R of the roller 112, the separation distance between the upstream end Pc of the ionizer 81 and the rotation axis Lc in the transport direction D can be sufficiently small. Therefore, the time lag of ion supply can be sufficiently short. That is, the static electricity generated on the substrate 9 by contact with the roller 112 can be sufficiently quickly neutralized.

[0100] <5. Modifications> (Layout of static elimination units 7 and 8) The layout (installation position, number of units, etc.) of the static elimination unit 7 according to the first embodiment (hereinafter also referred to as the "first static elimination unit 7") and the static elimination unit 8 according to the second embodiment (hereinafter also referred to as the "second static elimination unit 8") can be specified as appropriate.

[0101] For example, when multiple rollers 112 are supported along the extension direction of the roller shaft 111, the first static eliminating units 7 (specifically, brackets 72 supporting ionizers 71) do not necessarily need to be provided in all gaps between adjacent rollers 112. For example, brackets 72 supporting ionizers 71 may be provided only in appropriately selected gaps (for example, gaps every predetermined number of gaps (every other gap in the illustrated example) in the extension direction of the roller shaft 111) (FIG. 10).

[0102] Further, for example, when a plurality of roller units 11 are arranged (i.e., when a plurality of roller units 11 are arranged in a direction perpendicular to the extension direction of the roller shafts 111 with the roller shafts 111 extending parallel to each other), a plurality of first static eliminating units 7 (specifically, brackets 72 supporting ionizers 71) may be provided on each of the plurality of roller shafts 111, and further, a plurality of brackets 72 provided on each roller shaft 111 may be arranged in a staggered manner along the arrangement direction of the plurality of roller shafts 111 (FIG. 10). In other words, the arrangement position of the brackets 72 with respect to each roller shaft 111 may be specified so that each bracket 72 provided on each roller shaft 111 is shifted from the bracket 72 provided on the roller shaft 111 adjacent to the roller shaft 111 (shifted in the extension direction of the roller shaft 111). With this configuration, it is possible to supply ions evenly to the area where the plurality of roller shafts 111 are arranged while suppressing the number of ionizers 71.

[0103] Furthermore, for example, when a plurality of roller units 11 are arranged, the first static eliminating unit 7 does not necessarily have to be provided on all roller units 11. For example, the first static eliminating unit 7 may be provided only on appropriately selected roller units 11 (for example, roller units 11 at a predetermined interval in the arrangement direction (every other roller unit 11 in the illustrated example)) (FIG. 11). "The first static eliminating unit 7 is provided on the roller unit 11" specifically means that a bracket 72 supporting an ionizer 71 is provided on the roller shaft 111 of the roller unit 11.

[0104] Furthermore, for example, when a plurality of roller units 11 are arranged, the second static eliminating unit 8 does not necessarily have to be provided on all roller units 11. For example, the second static eliminating unit 8 may be provided only on appropriately selected roller units 11 (for example, roller units 11 at a predetermined interval in the arrangement direction (every other roller unit 11 in the illustrated example)) (FIG. 12). Specifically, "the second static eliminating unit 8 is provided on the roller unit 11" means that a bracket 82 supporting an ionizer 81 is provided at a position sufficiently close to the roller shaft 111 of the roller unit 11, along the roller shaft 111 (specifically, its rotation axis Lc).

[0105] Furthermore, for example, when a plurality of roller units 11 are arranged, the first static eliminating units 7 may be provided on every other roller unit 11 in the arrangement direction, and the second static eliminating units 8 may be provided on each roller unit 11 between these roller units 11 (FIG. 13). In other words, the first static eliminating units 7 and the second static eliminating units 8 may be provided alternately in the arrangement direction of the plurality of roller units 11.

[0106] Also, for example, when multiple roller units 11 are arranged, a first static elimination unit 7 may be provided in each of a group of adjacent roller units 11 in one arrangement area, and a second static elimination unit 8 may be provided in each of a group of adjacent roller units 11 in another arrangement area (Figure 14).

[0107] Furthermore, for example, each of the plurality of roller units 11 may be provided with both the first static eliminating unit 7 and the second static eliminating unit 8 (FIG. 15).

[0108] As illustrated in Figures 13 to 15, in a configuration in which the substrate transport device 1 is equipped with both the first static electricity removal unit 7 and the second static electricity removal unit 8 (i.e., a configuration in which the ionizer equipped in the substrate transport device 1 includes an ionizer (first ionizer) 71 supported by a bracket (first bracket) 72 provided on the roller shaft 111, and an ionizer (second ionizer) 81 supported on one main surface of a flat bracket (second bracket) 82 arranged along the roller shaft 111 at a position sufficiently close to the roller shaft 111), an ion atmosphere formed by the first ionizer 71 (an ion atmosphere formed around the roller shaft 111) and an ion atmosphere formed by the second ionizer 81 (an ion atmosphere extending in the extension direction of the roller shaft 111) can be combined to form an ion atmosphere suited to the actual generation of static electricity, thereby making it possible to properly remove static electricity.

[0109] (Modification of the static elimination unit 7 according to the first embodiment) In the static electricity removing unit 7 according to the first embodiment, it is preferable that the ionizer 71 is sufficiently close to the transport path (and thus the main surface of the substrate 9 being transported) in a non-contact state. This is because the smaller the separation distance between the ionizer 71 and the main surface of the substrate 9 being transported, the greater the number of ions that can reach the substrate 9. However, if this separation distance is too small, the risk of discharge occurring between the ionizer 71 and the substrate 9 increases. Therefore, it is preferable that this separation distance is as small as possible within a range in which no discharge occurs between the ionizer 71 and the substrate 9. In other words, it is preferable that the radius of the bracket 72 is specified so that the separation distance between the ionizer 71 and the main surface of the substrate 9 being transported is as small as possible within a range in which no discharge occurs between the two.

[0110] The bracket 72 included in the static eliminating unit 7 according to the first embodiment may have any shape. That is, the bracket 72 may have a shape (disk-like, columnar, etc.) including a cylindrical circumferential surface 721 and circular main surfaces 722 provided at both ends in the width direction of the circumferential surface 721 as described above, or may have other shapes (for example, a rectangular parallelepiped, cubic, other polyhedral shapes, a cone shape, a polygonal pyramid shape, a sphere, etc.). In any case, it is preferable that a weight is provided on the bracket as necessary so that the ionizer 71 supported by the bracket is positioned vertically above the bracket when the bracket is provided rotatably with respect to the roller shaft 111.

[0111] In addition, when a plurality of roller units 11 are arranged, the brackets 72 adjacent to each other in the arrangement direction (conveying direction) may be connected to each other and formed as one unit. That is, an integrally formed bracket may be provided so as to span the gap between the plurality of roller shafts 111. As an example, the rectangular parallelepiped brackets 72 provided on each roller shaft 111 may be connected to each other and formed into a prism shape extending in the conveying direction. The integrally formed bracket includes a portion provided on each roller shaft 111 (that is, a portion intersecting with the roller shaft 111 (that is, the rotation axis Lc) when viewed from the normal direction of the main surface of the substrate 9 to be conveyed) and a connecting portion connecting the portions. The ionizer 71 may be provided in a portion excluding the connecting portion, or may be provided in the entirety including the connecting portion. That is, the ionizer 71 may be provided intermittently in the extending direction of the integrally formed bracket so as to include a portion intersecting with the roller shaft 111, or the ionizer 71 may be provided over the entire extending direction of the integrally formed bracket.

[0112] (Modification of the static elimination unit 8 according to the second embodiment) In the static electricity removing unit 8 according to the second embodiment, the ionizer 81 provided on the bracket 82 is arranged to face the transport path. Here, it is also preferable that the ionizer 81 is arranged in a plane parallel to the transport path (and thus the main surface of the substrate 9 being transported). It is also preferable that the ionizer 81 is sufficiently close to the transport path (and thus the main surface of the substrate 9 being transported) in a non-contact state.

[0113] The static eliminating unit 8 according to the second embodiment may be disposed above the transport path (FIG. 16). In this case, the bracket 82 is disposed above the transport path in such a direction that the ionizer 81 faces the transport path. The bracket 82 is disposed along the axis (rotation axis) Lc of the roller shaft 111 (preferably parallel to the rotation axis Lc) on the downstream side of the transport direction D of the roller shaft 111. The bracket 82 is provided at a position such that at least a part of the ionizer 81 supported by the bracket 82 is disposed on the side of the rotation axis Lc relative to the downstream end Pa of the roller 112, as viewed from the normal direction of the main surface of the substrate 9 being transported. The bracket 82 may be disposed at such a position in any manner. For example, the bracket 82 may be supported by being suspended from the ceiling of the processing tank 2h, 6h by a plurality of hanging rods 822 provided in the extending direction of the bracket 82.

[0114] The static eliminating units 8 according to the second embodiment may be provided on the upper and lower sides of the transport path (i.e., facing each other across the transport path) at the same positions in the transport direction D (FIG. 16). Alternatively, the static eliminating units 8 may be provided on the upper and lower sides of the transport path at different positions in the transport direction D.

[0115] (Other variations) The substrate conveying device 1 according to the above embodiment may convey the substrate 9 in an inclined position (a position in which the main surface is inclined in the width direction). Specifically, for example, the substrate conveying device 1 may include a mechanism (lifting mechanism) for raising and lowering one of the pair of support plates 113, 113 on which the roller shaft 111 is installed. In such a configuration, when the lifting mechanism raises and lowers one of the support plates 113, the pair of support plates 113, 113 are disposed at different heights from each other, and each roller shaft 111 installed between the pair of support plates 113, 113 is in an inclined position. As a result, the substrate 9 is conveyed in an inclined position. Note that, when the roller shaft 111 is in an inclined position, the bracket 82 of the static elimination unit 8 according to the second embodiment preferably follows the roller shaft 111 and assumes a similar inclined position (an inclined position extending parallel to the roller shaft 111).

[0116] In the roller unit 11 according to the above embodiment, the roller 112 may be made of an insulating resin, or may be made of a resin to which electrical conductivity has been imparted. Alternatively, the roller 112 may be made of a material other than resin.

[0117] In the roller unit 11 according to the above embodiment, the roller supported by the roller shaft may be rotatably supported on the roller shaft, and the drive unit may rotate the roller on the roller shaft. Also, the number of rollers supported by the roller shaft may be one. For example, a long cylindrical roller may be supported by the roller shaft.

[0118] In the above embodiment, when multiple roller units 11 are arranged in a direction perpendicular to the extension direction of the roller shafts 111 with the roller shafts 111 extending parallel to each other, the multiple rollers 112 provided on each roller shaft 111 may be arranged in a lattice pattern or a staggered pattern along the arrangement direction of the multiple roller shafts 111.

[0119] In the substrate transport device 1 according to the above embodiment, the static elimination units 7 and 8 are provided in the roller unit 11 provided in the speed switching section (specifically, the substrate introduction section 2 and the substrate discharge section 6), but the static elimination units 7 and 8 may be provided in the roller unit 11 provided in a section other than the speed switching section. For example, the static elimination units 7 and 8 may be provided in the roller unit 11 provided in the drainer section 5. In the drainer section 5, after the gas is blown from the air knife 51 to the substrate 9 to blow off the droplets adhering to the substrate 9 (after the substrate 9 is dried), static electricity is likely to be generated on the substrate 9. Therefore, it is preferable that the static elimination units 7 and 8 are provided at the same position as the air knife 51 or at a position downstream of the air knife 51 in the transport direction D.

[0120] In the above-mentioned embodiments, the static elimination units 7 and 8 are provided in the substrate transport device 1 provided in the developing device 105, but the static elimination units 7 and 8 may be provided in the substrate transport device provided in various substrate processing apparatuses other than the developing device 105. For example, the static elimination units 7 and 8 may be provided in the substrate transport device provided in the cleaning device 101. As an example, when the cleaning device 101 includes a substrate transport device that transports the substrate 9 by a roller method, a processing unit group (e.g., a cleaning processing unit that supplies a cleaning liquid to the substrate 9 to clean the substrate 9, and a liquid draining unit that removes the cleaning liquid adhering to the substrate 9) provided along the transport path formed by the substrate transport device, a speed switching unit (substrate introduction unit) provided upstream of the processing unit group in the transport direction D, and a speed switching unit (substrate discharge unit) provided downstream of the processing unit group in the transport direction D, the static elimination units 7 and 8 may be provided in the roller unit provided in the substrate introduction unit, the roller unit provided in the substrate discharge unit, or the roller unit provided in the liquid draining unit.

[0121] In each of the above embodiments, the substrate 9 transported by the substrate transport device 1 may be various types of glass substrates (e.g., a glass substrate for a liquid crystal display (LCD), a glass substrate for a plasma display (PDP), a glass substrate for an organic light emitting diode (OLED), a glass substrate for a field emission display (FED), a glass substrate for a solar cell panel, a glass substrate for an optical disk, a glass substrate for a magnetic disk, a glass substrate for a photomask, etc.), various types of ceramic substrates (e.g., a ceramic substrate for a magnetic / optical disk), a semiconductor substrate (semiconductor wafer), an electronic device substrate, a printing plate for printing, etc.

[0122] In each of the above embodiments, the static elimination units 7, 8 are provided in the substrate transport device 1 that transports the substrate 9. However, the static elimination units 7, 8 may be provided in devices that transport various objects other than the substrate 9.

[0123] Although the substrate transport device has been described in detail as above, the above description is merely an example in all respects, and the substrate transport device is not limited thereto. It is understood that countless variations not illustrated can be envisioned without departing from the scope of this disclosure. The configurations described in the above embodiments and the above variations can be appropriately combined or omitted as long as they are not mutually contradictory. [Explanation of symbols]

[0124] 1. Substrate transport device 11 Roller unit 111 Roller shaft 112 Roller (transport roller) Lc rotation axis Downstream end of Pa roller Pb Upper end of roller 12 Drive unit 7. Static electricity removal unit 71 Ionizer 72 Bracket 724 Weight 8. Static electricity removal unit 81 Ionizer 82 Bracket

Claims

1. a transport roller that transports the substrate by rotating about a predetermined rotation axis while in contact with the substrate; an ionizer that generates ions and is disposed closer to the rotation axis than an end of the transport roller that is downstream in a transport direction when viewed from a normal direction of a main surface of the substrate; A substrate transport apparatus comprising:

2. 2. The substrate transport apparatus according to claim 1, a roller shaft arranged coaxially with the rotation axis and supporting the conveying roller; A bracket provided on the roller shaft and supporting the ionizer; A substrate transport apparatus comprising:

3. 3. The substrate transport apparatus according to claim 2, A weight provided on the bracket on an opposite side of the ionizer with respect to a center of gravity of the bracket; Equipped with The bracket is rotatably provided on the roller shaft, and the ionizer is disposed vertically upward by the load of the weight. Substrate transport device.

4. 4. The substrate transport device according to claim 3, the bracket having a cylindrical periphery; The ionizer is provided in an arc region on the circumferential surface having a central angle of 180 degrees or less. Substrate transport device.

5. 5. The substrate transport device according to claim 2, A plurality of the conveying rollers are supported on the roller shaft along the extending direction thereof, The bracket is provided in a gap between the adjacent conveying rollers in an extension direction of the roller shaft. Substrate transport device.

6. 6. The substrate transport apparatus according to claim 5, The roller shaft is provided in a plurality of portions. The roller shafts are arranged in a direction perpendicular to the extending direction so as to extend parallel to each other, A plurality of the brackets are provided on each of the plurality of roller shafts, the plurality of brackets provided on the plurality of roller shafts are arranged in a staggered manner along an arrangement direction of the plurality of roller shafts; Substrate transport device.

7. 2. The substrate transport apparatus according to claim 1, a flat bracket disposed along the rotation axis and supporting the ionizer on one main surface; A substrate transport apparatus comprising:

8. 8. The substrate transport apparatus according to claim 7, The combined thickness of the bracket and the ionizer is smaller than the radius of the conveying roller. Substrate transport device.

9. 9. The substrate transport apparatus according to claim 8, The combined thickness of the bracket and the ionizer is equal to or less than one-fifth of the radius of the conveying roller. Substrate transport device.

10. A substrate transport apparatus according to any one of claims 1, 2 and 7, The transport roller is provided in a speed switching section that switches the transport speed of the substrate. Substrate transport device.

11. 2. The substrate transport apparatus according to claim 1, one or more roller units including the conveying roller and a roller shaft arranged coaxially with the rotation axis and supporting the conveying roller; The ionizer includes a first ionizer and a second ionizer, a first bracket provided on the roller shaft of one or more roller units among the one or more roller units and supporting the first ionizer; a flat second bracket that is disposed along the roller shaft of one or more roller units among the one or more roller units and supports the second ionizer on one main surface; A substrate transport apparatus comprising:

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