Top ring, polishing device, and seal member

Abstract

To provide a top ring in which a seal member can be fixed without using double-sided tape and adhesive.SOLUTION: A top ring according to the present disclosure includes: a suction member assembly which includes a porous member for adsorbing a substrate, and has a top surface on which an upper groove is formed, a bottom surface in which a lower groove is formed, and a side circumferential surface extending between the top surface and the bottom surface; and an annular seal member surrounding the suction member assembly. The seal member includes: a side wall which extends from an upper end portion to a lower end portion in the vertical direction and is in contact with the side circumferential surface of the suction member assembly; a first fitting portion which extends from the upper end portion of the side wall toward the inside of the seal member and is fitted into the upper groove of the suction member assembly; and a second fitting portion which extends from the lower end portion of the side wall toward the inside of the seal member, is fitted into the lower groove of the suction member assembly, and holds the suction member assembly together with the first fitting portion.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The present invention relates to a top ring, a polishing apparatus, and a seal member.

Background Art

[0002] A polishing apparatus is used to polish a substrate. Such a polishing apparatus includes a top ring for holding the substrate. An example of the top ring is disclosed in Patent Document 1. The top ring 302 disclosed in Patent Document 1 includes a porous member 334 for adsorbing the substrate, a second shielding member 332-2, and a seal member 336, as shown in FIG. 3A thereof. The second shielding member 332-2 is located around the porous member 334 and shields a part of the side surface 334d of the porous member 334. The elastic seal member 336 is attached to the lower surface of the second shielding member 332-2 by a double-sided tape. Since the top ring 302 has such a configuration, when the porous member 334 adsorbs the substrate WF, the elastic seal member 336 can prevent air leakage between the substrate WF and the shielding member 332-2.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] As described above, in the top ring 302 of Patent Document 1, the elastic seal member 336 is attached to the second shielding member 332-2 by a double-sided tape. Therefore, water may adhere to the double-sided tape during polishing of the substrate WF. As a result, the adhesive force of the double-sided tape decreases, and the elastic seal member 336 may peel off from the second shielding member 332-2.

[0005] Furthermore, if the double-sided tape that was used previously remains after the replacement of the elastic seal member 336, there is a risk that the elastic seal member 336 may be easily peeled off from the second shielding member 332-2.

[0006] Also, the same problem may occur when an adhesive is used instead of the double-sided tape.

[0007] Therefore, one of the objectives of the present disclosure is to provide a top ring, a polishing apparatus, and a seal member capable of fixing the seal member without using a double-sided tape and an adhesive.

Means for Solving the Problems

[0008] The top ring according to the present disclosure is a top ring including a porous member for adsorbing a substrate, and having an upper surface on which an upper groove is formed, a lower surface on which a lower groove is formed, and a side circumferential surface extending between the upper surface and the lower surface, a suction member assembly, and an annular seal member surrounding the suction member assembly. The seal member extends from an upper end portion to a lower end portion in the vertical direction, and has a side wall in contact with the side circumferential surface of the suction member assembly, a first fitting portion extending from the upper end portion of the side wall toward the inside of the seal member and fitting into the upper groove of the suction member assembly, and a second fitting portion extending from the lower end portion of the side wall toward the inside of the seal member and fitting into the lower groove of the suction member assembly and sandwiching the suction member assembly together with the first fitting portion.

[0009] The polishing apparatus according to the present disclosure includes the above-described top ring and a polishing table configured to be able to hold a polishing pad.

[0010] The seal member according to the present disclosure is a seal member for attaching to a suction member assembly of a top ring. The suction member assembly includes a porous member for sucking a substrate, and has an upper surface on which an upper groove is formed, a lower surface on which a lower groove is formed, and a side circumferential surface extending between the upper surface and the lower surface. The seal member is configured to surround the suction member assembly and is annular, extending from an upper end portion to a lower end portion in the vertical direction, and having a side wall configured to contact the side circumferential surface of the suction member assembly, a first fitting portion extending from the upper end portion of the side wall toward the inside of the seal member and configured to fit into the upper groove of the suction member assembly, and a second fitting portion extending from the lower end portion of the side wall toward the inside of the seal member and configured to fit into the lower groove of the suction member assembly and configured to sandwich the suction member assembly together with the first fitting portion.

Brief Description of the Drawings

[0011]

Figure 1

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Figure 19

Embodiments for Carrying Out the Invention

[0012] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the drawings described below, the same or corresponding components are denoted by the same reference numerals, and redundant descriptions are omitted. Also, the sizes and positional relationships of the members shown in the drawings may be exaggerated for clarity of explanation and do not limit the technical scope of the present invention.

[0013] <Substrate processing apparatus 100> FIG. 1 is a plan view showing the overall configuration of a substrate processing apparatus 100 according to an embodiment of the present disclosure. The substrate processing apparatus 100 shown in FIG. 1 includes a load module 120, a transfer module 140, a polishing module 160, a drying module 180, and an unload module 200. Further, the substrate processing apparatus 100 includes a control device 220. Each component of the substrate processing apparatus 100 is controlled by the control device 220. The control device 220 is composed of a general computer including, for example, an input / output device, an arithmetic device, a storage device, and the like.

[0014] <Load module 120> The load module 120 has a function of introducing the substrate W before processes such as polishing and cleaning into the substrate processing apparatus 100. The load module 120 is configured to comply with, for example, the mechanical device interface standard (IPC - SMEMA - 9851) of the Surface Mount Equipment Manufacturers Association (SMEMA). As shown in FIG. 1, the load module 120 has, as a transport mechanism, a plurality of transport rollers 102 and a plurality of roller shafts 104 to which the transport rollers 102 are attached. Three transport rollers 102 are attached to each roller shaft 104. The substrate W is placed on the transport rollers 102, and the substrate W is transported by the rotation of the transport rollers 102.

[0015] <Transfer module 140> The transfer module 140 has two transfer devices 142. The transfer device 142 includes a plurality of transfer rollers 102 for transferring the substrate W. By the rotation of the transfer rollers 102, the substrate W on the transfer rollers 102 is transferred in a predetermined direction. The substrate W is transferred to the substrate transfer position by the transfer rollers 102.

[0016] In addition, the transfer module 140 has a cleaning nozzle 144. The cleaning nozzle 144 is connected to a cleaning liquid supply source (not shown). The cleaning nozzle 144 is configured to supply the cleaning liquid to the substrate W transferred by the transfer rollers 102.

[0017] <Polishing module 160> As shown in FIG. 1, the polishing module 160 has two polishing apparatuses 300. The polishing apparatus 300 has a function of polishing the substrate W. FIG. 2 is a perspective view schematically showing the configuration of the polishing apparatus 300. Referring to FIG. 2, the polishing apparatus 300 includes a polishing table 350 and a top ring 302. The top ring 302 is configured to hold the substrate W and press it against the polishing surface on the polishing table 350. The polishing table 350 is connected to a polishing table rotation motor (not shown) disposed below it via a table shaft 351. Therefore, the polishing table 350 can rotate integrally with the table shaft 351. A polishing pad 352 is attached to the upper surface of the polishing table 350. And the surface of the polishing pad 352 constitutes a polishing surface 352a for polishing the substrate W.

[0018] Above the polishing table 350, a polishing liquid supply nozzle 354 is installed. The polishing liquid is supplied onto the polishing pad 352 on the polishing table 350 by the polishing liquid supply nozzle 354. Further, the polishing table 350 and the table shaft 351 are provided with a passage 353 for supplying the polishing liquid. The passage 353 communicates with an opening 355 on the surface of the polishing table 350. A through hole 357 is formed in the polishing pad 352 at a position corresponding to the opening 355 of the polishing table 350. The polishing liquid passing through the passage 353 is supplied to the surface of the polishing pad 352 through the opening 355 of the polishing table 350 and the through hole 357 of the polishing pad 352. The opening 355 of the polishing table 350 and the through hole 357 of the polishing pad 352 are arranged near the center of the polishing table 350 as an example.

[0019] Further, the polishing apparatus 300 includes an atomizer 358 for injecting a liquid or a mixed fluid of a liquid and a gas toward the polishing pad 352 (see FIG. 1). The liquid injected from the atomizer 358 is, for example, pure water, and the gas is, for example, nitrogen gas.

[0020] Referring again to FIG. 2, the top ring 302 is connected to the top ring shaft 18. The top ring shaft 18 is configured to be vertically movable with respect to the swing arm 360 by a vertical movement mechanism 319. By the vertical movement of the top ring shaft 18, the top ring 302 moves vertically with respect to the swing arm 360 and is positioned. Also, the top ring shaft 18 is configured to be rotatable by the drive of a motor (not shown). By the rotation of the top ring shaft 18, the top ring 302 rotates together with the top ring shaft 18.

[0021] The top ring 302 is configured to be able to hold a rectangular substrate W as an example. In another embodiment according to the present disclosure, the top ring 302 may be configured to be able to hold a round substrate W. The detailed configuration of the top ring 302 will be described later. Also, the swing arm 360 is configured to be pivotable about the pivot shaft 362. The top ring 302 can move between the substrate transfer position of the transfer module 140 and above the polishing table 350 by the pivoting of the swing arm 360.

[0022] During polishing of the substrate W, the top ring 302 descends, and the substrate W is pressed against the polishing surface 352a of the polishing pad 352. At this time, the top ring 302 and the polishing table 350 rotate respectively. Then, polishing liquid is supplied onto the polishing pad 352 from a polishing liquid supply nozzle 354 provided above the polishing table 350 and an opening 355 provided in the polishing table 350. In this way, the polishing apparatus 300 presses the substrate W against the polishing surface 352a of the polishing pad 352 and polishes the surface of the substrate W.

[0023] Further, as an example, the vertical movement mechanism 319 includes a bridge 28, a ball screw 32, a support base 29, and a servo motor 38. The bridge 28 supports the top ring shaft 18 via a bearing 321. The bearing 321 is configured to allow rotation of the top ring shaft 18 with respect to the bridge 28 but not to allow vertical movement. For this reason, the top ring shaft 18 is configured to move vertically integrally with the bridge 28. Further, the support base 29 supports the servo motor 38 and is fixed to the swing arm 360 via a support column 130. The ball screw 32 is attached to the bridge 28 and includes a screw shaft 32a connected to the servo motor 38 and a nut 32b that engages with the screw shaft 32a. Thus, when the servo motor 38 is driven, the bridge 28 moves vertically via the ball screw 32. As a result, the top ring shaft 18 and the top ring 302 move vertically.

[0024] Furthermore, as an example, the polishing apparatus 300 includes a dressing module 356. The dressing module 356 has a function of dressing the polishing surface 352a of the polishing pad 352. The dressing module 356 includes a dresser 50, a dresser shaft 51 to which the dresser 50 is connected, an air cylinder 53 provided at the upper end of the dresser shaft 51, and a swing arm 55 that rotatably supports the dresser shaft 51. The lower part of the dresser 50 is constituted by a dressing member 50a. Needle-shaped diamond particles are attached to the lower surface of the dressing member 50a. The air cylinder 53 is disposed on a support base 57 supported by a support column 56. And the support column 56 is fixed to the swing arm 55.

[0025] The swing arm 55 is driven by a motor (not shown) and is configured to swing about the support shaft 58. The dresser shaft 51 is configured to rotate by the drive of a motor (not shown). Due to the rotation of the dresser shaft 51, the dresser 50 rotates around the dresser shaft 51. The air cylinder 53 moves the dresser 50 up and down via the dresser shaft 51 and presses the dresser 50 against the polishing surface 352a of the polishing pad 352 with a predetermined force.

[0026] Dressing of the polishing surface 352a of the polishing pad 352 is performed as follows. At the same time as the dresser 50 is pressed against the polishing surface 352a by the air cylinder 53, pure water is supplied from a pure water supply nozzle (not shown) to the polishing surface 352a. In this state, the dresser 50 rotates around the dresser shaft 51 and the swing arm 55 swings on the polishing surface 352a, and the dressing module 356 brings the lower surface (diamond particles) of the dressing member 50a into sliding contact with the rotating polishing surface 352a. Thereby, the polishing pad 352 is scraped off by the dresser 50, and the polishing surface 352a is dressed.

[0027] <Drying module 180> The drying module 180 has a function of drying the substrate W after being polished and cleaned by the polishing apparatus 300. Referring to FIG. 1 again, the drying module 180 is disposed downstream of the transfer module 140. The drying module 180 has a nozzle 182 for injecting gas toward the substrate W being transferred on the transfer roller 102. The gas is, for example, compressed air or nitrogen. The water droplets on the transferred substrate W are blown off by the drying module 180, whereby the substrate W is dried.

[0028] <Unloading module 200> The unloading module 200 has a function of carrying out of the substrate processing apparatus 100 the substrate W after processes such as polishing and cleaning are performed. The unloading module 200 receives the substrate W after being dried by the drying module 180. As shown in FIG. 1, the unloading module 200 is arranged downstream of the drying module 180. The unloading module 200 is configured to comply with, for example, the mechanical device interface standard (IPC - SMEMA - 9851) of the Surface Mount Equipment Manufacturers Association (SMEMA).

[0029] <Top ring 302> Next, a more detailed configuration of the top ring 302 will be described. FIG. 3 is a cross-sectional view schematically showing the top ring 302. FIG. 4 is a view taken in the direction of arrow A in FIG. 3. Referring to FIG. 3, the top ring 302 includes, as an example, a base member 301 connected to the top ring shaft 18. The base member 301 includes a flange 303 connected to the top ring shaft 18, an upper guide member 305 provided below the flange 303, and a lower guide member 306 provided below the upper guide member 305. The upper guide member 305 has a planar size smaller than the planar size of the flange 303 and protrudes downward from the lower surface of the flange 303. The lower guide member 306 is provided in a frame shape at the peripheral edge of the lower surface of the upper guide member 305.

[0030] The top ring 302 further includes a substrate adsorption member 330 disposed below the base member 301 and a seal member 400. The substrate adsorption member 330 has a suction member assembly 480 including a porous member 482. The porous member 482 has a rectangular parallelepiped shape (see FIG. 4). The porous member 482 is in fluid communication with a vacuum source 931 via a flow path 338. And the porous member 482 has a lower surface 482a for adsorbing the substrate W. The porous member 482 may be any member that can vacuum-adsorb the substrate W by evacuation using the vacuum source 931. For example, it may be composed of a resin porous material in which a large number of pores are formed in a resin such as PE (polyethylene), PP (polypropylene), PTFE (polytetrafluoroethylene), or PVC (polyvinyl chloride). Further, the porous member 482 may be composed of a ceramic material generated from alumina or the like.

[0031] Referring to FIG. 4, the seal member 400, as an example, surrounds the porous member 482 and has a square annular shape. The seal member 400 is composed of a member having elasticity and capable of shielding the flow of gas. The seal member 400 may, as an example, be composed of a soft member having chemical resistance and good stretchability. For example, the seal member 400 may be made using an extruded foam material. Further, the seal member 400 may be formed from silicone sponge, silicone rubber, soft polyvinyl chloride, or the like. The seal member 400 is configured to contact the substrate W when adsorbing the substrate W.

[0032] Further, the substrate suction member 330 includes, as an example, a first shielding member 380 and a second shielding member 382 (see FIG. 3). The first shielding member 380 and the second shielding member 382 may be any airtight members capable of shielding the gas flow, and may be formed of resin plates such as relatively soft PE (polyethylene), PP (polypropylene), PTFE (polytetrafluoroethylene), and PVC (polyvinyl chloride), for example. Referring to FIG. 3, the first shielding member 380 is located above the porous member 482 and is in contact with the upper surface 482b of the porous member 482. Thereby, the first shielding member 380 shields the upper surface 482b of the porous member 482. On the other hand, the second shielding member 382 is attached to the first shielding member 380 so as to surround the seal member 400 (see FIG. 4). More specifically, the second shielding member 382 is in contact with the side wall 420 of the seal member 400 to be described later (see FIG. 5).

[0033] Since the top ring 302 has such a configuration, when the vacuum source 931 evacuates from the porous member 482, the substrate W is adsorbed by the porous member 482. At this time, the elastic seal member 400 adheres to the substrate W. As a result, gas leakage from the gap between the seal member 400 and the substrate W is suppressed.

[0034] Referring to FIG. 3, the substrate suction member 330 further includes a frame member 344 provided above the first shielding member 380. The frame member 344 is configured to surround the upper guide member 305 and the lower guide member 306. The frame member 344 includes a lower frame member 343 provided in a frame shape at the peripheral edge of the upper surface of the first shielding member 380, and an upper frame member 342 provided in a frame shape on the lower frame member 343. The lower frame member 343 and the first shielding member 380 are connected via a seal material 341. In the present embodiment, the seal material 341 is formed in a film shape covering the upper surface of the substrate suction member 330, but is not limited thereto, and may have a frame shape having only a peripheral edge for sealing the lower frame member 343 and the first shielding member 380.

[0035] The upper frame member 342 includes a frame member protrusion 342a that protrudes in the direction of the upper guide member 305. The upper guide member 305 also includes a guide member protrusion 305a that protrudes in the direction of the upper frame member 342 at a height position different from that of the frame member protrusion 342a. The frame member protrusion 342a and the guide member protrusion 305a overlap each other in a predetermined region when the top ring 302 is viewed in plan. Therefore, the movement of the substrate adsorption member 330 in the height direction is restricted by the contact between the frame member protrusion 342a and the guide member protrusion 305a.

[0036] The substrate adsorption member 330 includes at least a part surrounded by the frame member 344 of the base member 301 and an elastic member 340 that connects to the frame member 344. Specifically, the elastic member 340 is a frame-shaped plate member having an inner end portion 340a sandwiched between the upper guide member 305 and the lower guide member 306, and an outer end portion 340b sandwiched between the lower frame member 343 and the upper frame member 342. The elastic member 340 is formed of a rubber material such as silicone rubber, EPDM (ethylene propylene diene rubber), FKM (fluororubber), but is not limited thereto.

[0037] The top ring 302 also includes an elastic membrane 320 for forming a plurality of pressure chambers 323, 324, 325, 326 between the base member 301 and the substrate adsorption member 330. Specifically, the elastic membrane 320 includes a film-shaped sealing material 341 and a plurality of elastic membranes 320-1, 320-2, 320-3 having different areas and laminated thereon. A pressure chamber 326 for pressing the entire substrate W is formed between the base member 301 and the sealing material 341. The pressure chamber 326 communicates with the pressure adjustment unit 930 via the pressure path 313-4. Further, each of the elastic membranes 320-1, 320-2, 320-3 is configured to apply pressure to the upper surface of the first shielding member 380, and extends from the central portion and is fixed to different positions on the lower surface of the upper guide member 305 including an end portion that can be... A plurality of elastic membranes 320-1, 320-2, 320-3 form a plurality of concentric pressurizing chambers 323, 324, 325 for pressing the substrate W between the base member 301 and the plurality of elastic membranes 320-1, 320-2, 320-3. Each of the plurality of pressurizing chambers 323, 324, 325 is in fluid communication with a pressure regulating device 930 via pressure regulating paths 313-1, 313-2, 313-3. The pressure regulating device 930 has a pressure regulating function for regulating the pressure of the fluid supplied to each of the pressurizing chambers 323, 324, 325, 326. That is, the pressure regulating device 930 can regulate the pressure of the pressurizing chamber 326 for pressing the entire substrate W by regulating the pressure of the fluid supplied to the pressure regulating path 313-4. Also, the pressure regulating device 930 can regulate the pressures of the plurality of concentric pressurizing chambers 323, 324, 325 by regulating the pressures of the fluids supplied to the pressure regulating paths 313-1, 313-2, 313-3. By forming the plurality of pressurizing chambers 323, 324, 325, 326 in this way, the pressing force on the substrate W is controlled for each area.

[0038] FIG. 5 is an enlarged view of a portion of the seal member 400 of the top ring 302. FIG. 6 is a cross-sectional view of the seal member 400. With reference to FIGS. 5 and 6, a more detailed configuration of the seal member 400 and the suction member assembly 480 will be described. Referring to FIG. 5, the porous member 482 included in the suction member assembly 480 includes a lower surface 482a on which a lower groove 483 is formed, an upper surface 482b on which an upper groove 484 is formed, and a side peripheral surface 482c. The lower surface 482a is located below the upper surface 482b in the vertical direction D1. The side peripheral surface 482c extends between the upper surface 482b and the lower surface 482a.

[0039] The seal member 400 includes a side wall 420, a first engagement portion 430, and a second engagement portion 440. The side wall 420 has an annular shape surrounding the porous member 482 as an example. And the side wall 420 extends from the upper end portion 421 to the lower end portion 422 in the vertical direction D1 and is in contact with the side peripheral surface 482c of the porous member 482. The first engagement portion 430 extends from the upper end portion 421 of the side wall 420 toward the inside of the seal member 400 and fits into the upper groove 484 of the porous member 482. In other words, the first engagement portion 430 has a first upper wall 432, and the first upper wall 432 extends from the upper end portion 421 of the side wall 420 to the inner end portion 431 toward the inside of the seal member 400. On the other hand, the second engagement portion 440 extends from the lower end portion 422 of the side wall 420 toward the inside of the seal member 400 and fits into the lower groove 483 of the porous member 482. In other words, the second engagement portion 440 has a first lower wall 442, and the first lower wall 442 extends from the lower end portion 422 of the side wall 420 to the inner end portion 441 toward the inside of the seal member 400.

[0040] In the present disclosure, the inside of the seal member 400 means the inside of the annular shape formed by the seal member 400. Also, the outside of the seal member 400 means the outside of the annular shape formed by the seal member 400. Further, in the example of FIG. 5, the vertical direction D1 coincides with the vertical direction as an example. However, in another embodiment according to the present disclosure, the vertical direction D1 does not have to coincide with the vertical direction. For example, the vertical direction D1 may be in any direction and may be a direction orthogonal to the vertical direction.

[0041] Since the seal member 400 has such a configuration, the first engagement portion 430 and the second engagement portion 440 sandwich the porous member 482. As a result, the seal member 400 is fixed to the top ring 302 without using a double-sided tape and an adhesive.

[0042] Also, as shown in FIGS. 3 and 5, the top ring 302 further includes a plurality of fastening members 390. The fastening member 390 is, for example, a bolt. The second shielding member 382 is fixed to the first shielding member 380 by the fastening member 390. Thus, an operator can remove the second shielding member 382 from the first shielding member 380 by removing the fastening member 390. And the operator can remove the seal member 400 from the top ring 302 or attach the seal member 400 to the top ring 302 by radially expanding the annular seal member 400. That is, the top ring 302 is configured such that the seal member 400 can be easily replaced. That is, the top ring 302 is configured such that the seal member 400 can be easily replaced.

[0043] Note that the second shielding member 382 may be composed of four members 382a, 382b, 382c, and 382d so that it can be easily removed from the first shielding member 380 (see FIG. 4). Also, if the second shielding member 382 can be removed from the first shielding member 380, it may be composed of one member, two members, three members, or five or more members.

[0044] Also, in the example shown in FIG. 3, the fastening member 390 does not fix the frame member 344. However, in another embodiment according to the present disclosure, the fastening member 390 may fix the frame member 344, the first shielding member 380, and the second shielding member 382 to each other. Also, the number of fastening members 390 for fixing the frame member 344, the first shielding member 380, and the second shielding member 382 to each other may be one or a plurality.

[0045] Referring to FIG. 5, the seal member 400 has a lip portion 410 configured to be in contact with the substrate W. The lip portion 410 protrudes downward from the lower surface 482a of the porous member 482 when not in contact with the substrate W. More specifically, the lip portion 410 extends downward and outward of the seal member 400 from the lower end portion 422 of the side wall 420. Thereby, when the substrate W is adsorbed, the lip portion 410 provides a sealing property between the seal member 400 and the substrate W. As an example, a groove 384 into which the lip portion 410 can fit is formed in the second shielding member 382 (see FIG. 5).

[0046] FIG. 6 is a cross-sectional view of the seal member 400. Referring to FIG. 6, the seal member 400 is configured symmetrically about the vertical axis. More specifically, the seal member 400 has a lip portion 412 configured symmetrically with the lip portion 410 via the central axis X. Further, the first mating portion 430 is configured symmetrically with the second mating portion 440 via the central axis X. Since the seal member 400 is configured symmetrically about the vertical axis in this way, an operator can use the seal member 400 in both the normal state and the state in which the seal member 400 is turned upside down. As a result, when the lip portion 410 deteriorates due to use, the operator can use the non-deteriorated lip portion 412 as a contact portion with the substrate W by turning the seal member 400 upside down. A groove 386 into which the lip portion 410 and the lip portion 412 can fit is formed in the second shielding member 382 (see FIG. 5).

[0047] FIG. 7 is a cross-sectional view taken along line A-A in FIG. 5. Referring to FIG. 7, a plurality of communication holes 424 for sucking gas from the porous member 482 are formed in the side wall 420 of the seal member 400. That is, the communication holes 424 constitute a part of the flow path 338 for fluidly connecting the porous member 482 and the vacuum source 931. For this reason, in the top ring 302, when the substrate W is adsorbed, gas is sucked from the porous member 482 through the communication holes 424.

[0048] FIG. 8 is a partial cross-sectional view schematically showing a top ring 302 according to another embodiment of the present disclosure. In another embodiment according to the present disclosure, the top ring 302 may include a seal member 500 and a porous member 540 shown in FIG. 8 instead of the seal member 400 and the porous member 482 shown in FIG. 3.

[0049] Referring to FIG. 8, the porous member 540 includes a lower surface 542 in which a lower groove 541 is formed, an upper surface 544 in which an upper groove 543 is formed, and a side peripheral surface 545. The side peripheral surface 545 extends between the upper surface 544 and the lower surface 542. The seal member 500 includes a side wall 510, a first engaging portion 520, a second engaging portion 530, and a lip portion 502. The side wall 510 has, for example, an annular shape surrounding the porous member 540. And the side wall 510 extends from the upper end portion 511 to the lower end portion 512 in the vertical direction D1 and is in contact with the side peripheral surface 545 of the porous member 540. And it extends from the upper end portion 511 to the lower end portion 512 in the vertical direction D1 and is in contact with the side peripheral surface 545 of the porous member 540.

[0050] The first engaging portion 520 extends from the upper end portion 511 of the side wall 510 toward the inside of the seal member 500 and fits into the upper groove 543 of the porous member 540. More specifically, the first engaging portion 520 has a first upper wall 521 and a second upper wall 522. The first upper wall 521 extends from the upper end portion 511 of the side wall 510 toward the inside of the seal member 500 to the inner end portion 524. The second upper wall 522 extends downward from the inner end portion 524 of the first upper wall 521.

[0051] On the other hand, the second engaging portion 530 extends from the lower end portion 512 of the side wall 510 toward the inside of the seal member 500 and fits into the lower groove 541 of the porous member 540. More specifically, the second engaging portion 530 has a first lower wall 531 and a second lower wall 532. The first lower wall 531 extends from the lower end portion 512 of the side wall 510 toward the inside of the seal member 500 to the inner end portion 534. The second lower wall 532 extends upward from a position between the lower end portion 512 of the side wall 510 and the inner end portion 534 of the first lower wall 531.

[0052] The lip portion 502 is configured to be in contact with the substrate W. More specifically, the lip portion 502 extends downward and outward of the seal member 500 from the lower end portion 512 of the side wall 510.

[0053] As described above, the seal member 500 includes a second upper wall 522 and a second lower wall 532. Therefore, the seal member 500 is less likely to fall off from the top ring 302 than the seal member 400.

[0054] FIG. 9 is a partial cross-sectional view schematically showing the top ring 302 according to another embodiment of the present disclosure. In another embodiment according to the present disclosure, the top ring 302 may include a seal member 550 and a porous member 590 shown in FIG. 9 instead of the seal member 400 and the porous member 482 shown in FIG. 3.

[0055] Referring to FIG. 9, the porous member 590 includes a lower surface 592 on which a lower groove 591 is formed, an upper surface 594 on which an upper groove 593 is formed, and a side peripheral surface 595. The side peripheral surface 595 extends between the upper surface 594 and the lower surface 592. The seal member 550 includes a side wall 560, a first engagement portion 570, a second engagement portion 580, and a lip portion 552. The side wall 560 has, for example, an annular shape surrounding the porous member 590. The side wall 560 extends from the upper end portion 561 to the lower end portion 562 in the vertical direction D1 and is in contact with the side peripheral surface 595 of the porous member 590.

[0056] The first engagement portion 570 extends from the upper end portion 561 of the side wall 560 toward the inside of the seal member 550 and fits into the upper groove 593 of the porous member 590. More specifically, the first engagement portion 570 has a first upper wall 571, a second upper wall 572, and a third upper wall 573. The first upper wall 571 extends from the upper end portion 561 of the side wall 560 toward the inside of the seal member 550 to the inner end portion 574. The second upper wall 572 extends downward from the inner end portion 574 of the first upper wall 571 to the lower end portion 575. The third upper wall 573 extends from the lower end portion 575 of the second upper wall 572 toward the side wall 560.

[0057] On the other hand, the second fitting portion 580 extends from the lower end portion 562 of the side wall 560 toward the inside of the seal member 550 and fits into the lower groove 591 of the porous member 590. More specifically, the second fitting portion 580 has a first lower wall 581, a second lower wall 582, and a third lower wall 583. The first lower wall 581 extends from the lower end portion 562 of the side wall 560 toward the inside of the seal member 550 to the inner end portion 584. The second lower wall 582 extends upward from the inner end portion 584 of the first lower wall 581 to the upper end portion 585. The third lower wall 583 extends from the upper end portion 585 of the second lower wall 582 toward the side wall 560. The lip portion 552 is configured to be in contact with the substrate W. More specifically, the lip portion 552 extends from the lower end portion 562 of the side wall 560 downward and toward the inside of the seal member 550.

[0058] As described above, the seal member 550 includes a second upper wall 572, a second lower wall 582, a third upper wall 573, and a third lower wall 583. Therefore, the seal member 550 is less likely to fall off from the top ring 302 than the seal member 400.

[0059] As described above, the seal member 550 includes a second upper wall 572, a second lower wall 582, a third upper wall 573, and a third lower wall 583. Therefore, the seal member 550 is less likely to fall off from the top ring 302 than the seal member 400.

[0060] FIG. 10 is a partial cross-sectional view schematically showing a top ring 302 according to another embodiment of the present disclosure. FIG. 11 is a cross-sectional view showing the porous member 640 shown in FIG. 10. In another embodiment according to the present disclosure, the top ring 302 may include a seal member 600 and a porous member 640 shown in FIG. 10 instead of the seal member 400 and the porous member 482 shown in FIG. 3.

[0061] Referring to FIG. 10, the porous member 640 includes a lower surface 642 in which a lower groove 641 is formed, an upper surface 644 in which an upper groove 643 is formed, and a side peripheral surface 645. The side peripheral surface 645 extends between the upper surface 644 and the lower surface 642. The seal member 600 includes a side wall 610, a first engaging portion 620, a second engaging portion 630, and a lip portion 602. The side wall 610 has an annular shape surrounding the porous member 640 as an example. And the side wall 610 extends from the upper end portion 611 to the lower end portion 612 in the vertical direction D1 and is in contact with the side peripheral surface 645 of the porous member 640.

[0062] The first engaging portion 620 extends from the upper end portion 611 of the side wall 610 toward the inside of the seal member 600 and fits into the upper groove 643 of the porous member 640. More specifically, the first engaging portion 620 has a first upper wall 621, a second upper wall 622, and a third upper wall 623. The first upper wall 621 extends from the upper end portion 611 of the side wall 610 toward the inside of the seal member 600 to the inner end portion 624. The second upper wall 622 extends downward from the inner end portion 624 of the first upper wall 621 to the lower end portion 625. The third upper wall 623 extends from the lower end portion 625 of the second upper wall 622 toward the side wall 610.

[0063] On the other hand, the second engaging portion 630 extends from the lower end portion 612 of the side wall 610 toward the inside of the seal member 600 and fits into the lower groove 641 of the porous member 640. More specifically, the second engaging portion 630 has a first lower wall 631, a second lower wall 632, and a third lower wall 633. The first lower wall 631 extends from the lower end portion 612 of the side wall 610 toward the inside of the seal member 600 to the inner end portion 634. The second lower wall 632 extends upward from the inner end portion 634 of the first lower wall 631 to the upper end portion 635. The third lower wall 633 extends from the upper end portion 635 of the second lower wall 632 toward the side wall 610.

[0064] The lip portion 602 is configured to be capable of contacting the substrate W. More specifically, the lip portion 602 extends from the inner end portion 634 of the first lower wall 631 of the second engaging portion 630 in a downward direction and in a direction toward the outside of the seal member 600.

[0065] As described above, the seal member 600 includes the second upper wall 622, the second lower wall 632, the third upper wall 623, and the third lower wall 633. Therefore, the seal member 600 is less likely to fall off the top ring 302 than the seal member 400.

[0066] 10 and 11, the first lower wall 631 of the second fitting portion 630 comes into contact with A chamfered portion 648 is formed between a surface 646 of the porous member 640 and a surface 647 of the porous member 640 with which the second lower wall 632 of the second fitting portion 630 comes into contact.

[0067] From experience of using the seal member 600, the substrate W was occasionally damaged at a contact point 606 of the lip portion 602 located below the connection point 604 between the first lower wall 631 and the lip portion 602 and the substrate W. For this reason, when the seal member 600 contacts the substrate W, the force is not released from the connection point 604 due to the folding back between the first lower wall 631 and the lip portion 602 at the connection point 604, and stress may be concentrated at the contact point 606. In response to this, the porous member 640 is formed with a chamfered portion 648. For this reason, when the seal member 600 contacts the substrate W, the seal member 600 can escape to the gap formed by the chamfered portion 648. As a result, damage to the substrate W may be suppressed.

[0068] Furthermore, the length L1 between the surface 646 and the lower surface 642 in the vertical direction D1 is, for example, longer than the sum of the thickness of the first lower wall 631 and the thickness of the lip portion 602 (see FIG. 11). This prevents the lip portion 602 from applying excessive force to the substrate W when the seal member 600 comes into contact with the substrate W.

[0069] In addition, the length L2 in the vertical direction D1 between the surface 649 of the porous member 640 with which the first upper wall 621 of the first fitting portion 620 comes into contact and the upper surface 644 is, for example, equal to the thickness of the first upper wall 621 (see Figure 11).

[0070] FIG. 12 is a partial cross-sectional view schematically showing a top ring 302 according to another embodiment of the present disclosure. In another embodiment according to the present disclosure, the top ring 302 may include a seal member 650, a suction member assembly 690, and a second shielding member 710 shown in FIG. 12 instead of the seal member 400, the suction member assembly 480, and the second shielding member 382 shown in FIG. 3.

[0071] Referring to FIG. 12, the suction member assembly 690 includes, as an example, a porous member 691 having a rectangular parallelepiped shape, and a holder 692 configured to surround the porous member 691 adjacent to the porous member 691. The suction member assembly 690 includes a lower surface 694 in which a lower groove 693 is formed, an upper surface 696 in which an upper groove 695 is formed, and a side peripheral surface 697. The side peripheral surface 697 extends between the upper surface 696 and the lower surface 694. More specifically, the upper groove 695 and the lower groove 693 are formed in the holder 692. And the holder 692 is made of resin, for example.

[0072] The seal member 650 includes a side wall 660, a first mating portion 670, a second mating portion 680, and a lip portion 652. The side wall 660 has an annular shape surrounding the suction member assembly 690, for example. And the side wall 660 extends from an upper end portion 661 to a lower end portion 662 in the vertical direction D1 and is in contact with the side peripheral surface 697 of the suction member assembly 690. Note that the side peripheral surface 697 is formed in the holder 692 of the suction member assembly 690.

[0073] The first mating portion 670 extends from the upper end portion 661 of the side wall 660 toward the inside of the seal member 650 and fits into the upper groove 695 of the suction member assembly 690. On the other hand, the second mating portion 680 extends from the lower end portion 662 of the side wall 660 toward the inside of the seal member 650 and fits into the lower groove 693 of the suction member assembly 690.

[0074] Generally, processing of the porous member 691 is known to be more difficult than processing of resin materials and the like. In contrast, in the suction member assembly 690, the upper groove 695 and the lower groove 693 are formed in the holder 692. For this reason, in the example shown in FIG. 12, there is no need to perform processing for forming the upper groove 695 and the lower groove 693 in the porous member 691, which is difficult to process.

[0075] FIG. 13 is a cross-sectional view taken along line A-A of FIG. 12. FIG. 14 is a cross-sectional view taken along line C-C of FIG. 13. FIG. 15 is a cross-sectional view taken along line D-D of FIG. 13. FIG. 16 is a view seen in the direction of arrow E of FIG. 13. Referring to FIG. 14, a communication hole 664 is formed in the side wall 660 of the seal member 650. Further, a communication hole 698 penetrating the holder 692 is formed in the holder 692. The communication hole 664 and the communication hole 698 constitute a part of the flow path 338 for fluidly connecting the porous member 691 and the vacuum source (see FIG. 12). For this reason, when the substrate W is adsorbed, gas is sucked from the porous member 691 through the communication hole 664 and the communication hole 698.

[0076] Also, referring to FIG. 12, the porous member 691 has a contact plane 699. The holder 692 has a contact plane 700 that contacts the contact plane 699. And a lateral groove 701 that is in fluid communication with the communication hole 664 and the communication hole 698 is formed in the contact plane 700 (see FIG. 13). The lateral groove 701 is positioned overlapping the communication hole 698 and forms a space integrally with the communication hole 698. The horizontal length L3 of the lateral groove 701 is, as an example, longer than 1 / 3 of the horizontal length L4 (see FIG. 16) of the contact plane 699. Therefore, when sucking gas from the porous member 691, the gas is sucked from a relatively long region in the horizontal direction of the porous member 691 through the lateral groove 701. As a result, the lower surface 694 of the porous member 691 can adsorb the entire surface of the substrate W relatively uniformly compared to the case where the length L3 of the lateral groove 701 is short. As shown in FIG. 15, the lateral groove 701, as an example, extends from the contact plane 700 toward the surface located opposite to the contact plane 700 but does not penetrate. Also, in another embodiment according to the present disclosure, the horizontal length L3 of the lateral groove 701 may be longer than 1 / 2, 2 / 3, or 3 / 4 of the horizontal length L4 of the contact plane 699.

[0077] FIG. 17 is a cross-sectional view taken along line B-B of FIG. 12. Referring to FIGS. 12 and 17, the second shielding member 710 has a contact surface 712 that contacts the side wall 660 of the seal member 650. And a plurality of grooves 714 extending in the horizontal direction are formed in the contact surface 712 (see FIG. 17). Therefore, when a force in the vertical direction D1 acts on the seal member 650, the seal member 650 is caught by the plurality of grooves 714 and is difficult to slide in the vertical direction D1. That is, the plurality of grooves 714 prevent the seal member 650 from falling off.

[0078] FIG. 18 is a partial cross-sectional view schematically showing a top ring 302 according to another embodiment of the present disclosure. In another embodiment according to the present disclosure, the top ring 302 may include a suction member assembly 720 shown in FIG. 18 instead of the suction member assembly 690 shown in FIG. 12. Referring to FIG. 18, the suction member assembly 720 includes, as an example, a porous member 721 having a rectangular parallelepiped shape, and a holder 722 configured to surround the porous member 721 adjacent to the porous member 721. A recess 723 is formed in the porous member 721. The holder 722 has a convex portion 724. The convex portion 724 fits into the recess 723. Thereby, displacement of the holder 722 with respect to the porous member 721 is prevented.

[0079] FIG. 19 is a partial cross-sectional view schematically showing a top ring 302 according to another embodiment of the present disclosure. In another embodiment according to the present disclosure, the top ring 302 may include a seal member 770 and a holder 813 shown in FIG. 19 instead of the seal member 650 and the holder 722 shown in FIG. 18.

[0080] Referring to FIG. 19, the seal member 770 includes a side wall 780, a first engagement portion 790, a second engagement portion 800, and a lip portion 772. The side wall 780 extends from an upper end portion 781 to a lower end portion 782 in the vertical direction D1. The first engagement portion 790 extends from the upper end portion 781 of the side wall 780 toward the inside of the seal member 770 and fits into the upper groove 774. More specifically, the first engagement portion 790 has a first upper wall 791, a second upper wall 792, and a third upper wall 793. The first upper wall 791 extends from the upper end portion 781 of the side wall 780 toward the inside of the seal member 770 to an inner end portion 794. The second upper wall 792 extends downward from the inner end portion 794 of the first upper wall 791 to a lower end portion 795. The third upper wall 793 extends from the lower end portion 795 of the second upper wall 792 toward the side wall 780. On the other hand, the second engagement portion 800 extends from the lower end portion 782 of the side wall 780 toward the inside of the seal member 770 and fits into the lower groove 775. The lip portion 772 is configured to be in contact with the substrate W.

[0081] Further, a communication hole 776 is formed in a first upper wall 791 of a first fitting portion 790 of the seal member 770. A communication hole 814 penetrating through the holder 813 is formed in the holder 813. The communication hole 776 and the communication hole 814 constitute a part of a flow path 338 for fluidly connecting the porous member 721 and a vacuum source. Therefore, when the substrate W is adsorbed, gas is sucked from the porous member 721 through the communication hole 776 and the communication hole 814.

[0082] Note that the first shielding member 380 and the holder 813 are hermetically fixed by a fastening member (not shown) via the first upper wall 791 of the seal member 770. Therefore, leakage of fluid and vacuum is prevented from portions of the communication hole 776 (portions between the first shielding member 380 and the seal member 770, and between the seal member 770 and the holder 813).

[0083] Also, when the top ring 302 includes the seal member 770 and the holder 813, as shown in FIG. 19, the top ring 302 may not include a second shielding member surrounding the seal member 770. However, in another embodiment according to the present disclosure, even when the top ring 302 includes the seal member 770 and the holder 813, the top ring 302 may include a second shielding member surrounding the seal member 770.

[0084] [Appendix] Some or all of the above embodiments may be described as follows in the appendix, but are not limited thereto.

[0085] (Appendix 1) The top ring according to Supplementary Note 1 is a top ring, including a porous member for adsorbing a substrate, and having an upper surface where an upper groove is formed, a lower surface where a lower groove is formed, and a side circumferential surface extending between the upper surface and the lower surface, a suction member assembly, and an annular seal member surrounding the suction member assembly. The seal member extends from an upper end portion to a lower end portion in the vertical direction, and has a side wall in contact with the side circumferential surface of the suction member assembly, a first fitting portion extending from the upper end portion of the side wall toward the inside of the seal member and fitted into the upper groove of the suction member assembly, and a second fitting portion extending from the lower end portion of the side wall toward the inside of the seal member and fitted into the lower groove of the suction member assembly, and sandwiching the suction member assembly together with the first fitting portion.

[0086] (Supplementary Note 2) The top ring according to Supplementary Note 2 is the top ring according to Supplementary Note 1, and includes a first shielding member located above the suction member assembly and in contact with the upper surface of the suction member assembly, a second shielding member surrounding the seal member and in contact with the side wall, and a fastening member for fixing the second shielding member to the first shielding member.

[0087] (Supplementary Note 3) The top ring according to Supplementary Note 3 is the top ring according to Supplementary Note 1 or 2, and the seal member is configured symmetrically in the vertical direction.

[0088] (Supplementary Note 4) The top ring according to Supplementary Note 4 is the top ring according to Supplementary Note 1 or 2, and the se al member has a lip portion configured to be in contact with the substrate, and the lip portion extends downward and outward of the seal member from the lower end portion of the side wall.

[0089] (Supplementary Note 5) The top ring according to Supplementary Note 5 is the top ring described in Supplementary Note 1 or 2, wherein the seal member has a lip portion configured to be in contact with the substrate, and the lip portion extends downward and inward of the seal member from the lower end portion of the side wall.

[0090] (Supplementary Note 6) The top ring according to Supplementary Note 6 is the top ring described in any one of Supplementary Notes 1 to 5, wherein the first mating portion has a first upper wall extending from the upper end portion of the side wall inward of the seal member to the inner end portion, and a second upper wall extending downward from the inner end portion of the first upper wall to the lower end portion; and the second mating portion has a first lower wall extending from the lower end portion of the side wall inward of the seal member to the inner end portion, and a second lower wall extending upward from a position between the lower end portion of the side wall and the inner end portion of the first lower wall.

[0091] (Supplementary Note 7) The top ring according to Supplementary Note 7 is the top ring described in any one of Supplementary Notes 1 to 5, wherein the first mating portion has a first upper wall extending from the upper end portion of the side wall inward of the seal member to the inner end portion, a second upper wall extending downward from the inner end portion of the first upper wall to the lower end portion, and a third upper wall extending from the lower end portion of the second upper wall toward the side wall; and the second mating portion has a first lower wall extending from the lower end portion of the side wall inward of the seal member to the inner end portion, a second lower wall extending upward from the inner end portion of the first upper wall to the upper end portion, and a third lower wall extending from the upper end portion of the second upper wall toward the side wall.

[0092] (Supplementary Note 8) The top ring according to Supplementary Note 8 is the top ring described in Supplementary Note 7, wherein the seal member has a lip portion configured to be in contact with the substrate, and the lip portion extends downward and outward of the seal member from the inner end portion of the first lower wall of the second mating portion.

[0093] (Supplementary Note 9) The top ring according to Supplementary Note 9 is the top ring described in Supplementary Note 7 or 8, and a chamfered portion is formed between the surface of the suction member assembly that contacts the first lower wall of the second engagement portion and the surface of the suction member assembly that contacts the second lower wall of the second engagement portion.

[0094] (Supplementary Note 10) The top ring according to Supplementary Note 10 is the top ring described in Supplementary Note 8, and the length in the vertical direction between the surface of the suction member assembly that contacts the first lower wall of the second engagement portion and the lower surface is longer than the sum of the thickness of the first lower wall and the thickness of the lip portion.

[0095] (Supplementary Note 11) The top ring according to Supplementary Note 11 is the top ring described in any one of Supplementary Notes 1 to 10, and a communication hole for sucking gas from the porous member is formed in the side wall of the seal member.

[0096] (Supplementary Note 12) The top ring according to Supplementary Note 12 is the top ring described in any one of Supplementary Notes 1 to 11 and the suction member assembly has a holder that is adjacent to the porous member and in which the upper groove and the lower groove are formed.

[0097] (Supplementary Note 13) The top ring according to Supplementary Note 13 is the top ring described in Supplementary Note 12 that cites Supplementary Note 11, the porous member has a contact plane, the holder has a contact plane that contacts the contact plane, and a horizontal groove that is in fluid communication with the communication hole is formed in the contact plane, and the horizontal length of the horizontal groove is longer than 1 / 3 of the horizontal length of the contact plane.

[0098] (Supplementary Note 14) The top ring according to Supplementary Note 14 is the top ring described in Supplementary Note 12, a concave portion is formed in the porous member, and the holder has a convex portion that fits into the concave portion.

[0099] (Appendix 15) The top ring according to Appendix 15 is the top ring described in Appendix 2. The second shielding member has a contact surface in contact with the side wall, and a plurality of grooves extending in the horizontal direction are formed on the contact surface.

[0100] (Appendix 16) The top ring according to Appendix 16 is the top ring described in any one of Appendices 1 to 10 and 15. A communication hole for sucking gas from the porous member is formed in the first mating portion.

[0101] (Appendix 17) The polishing apparatus according to Appendix 17 includes the top ring described in any one of Appendices 1 to 16 and a polishing table configured to be able to hold a polishing pad.

[0102] (Appendix 18) The seal member according to Appendix 18 is a seal member for mounting on the suction member assembly of the top ring. The suction member assembly includes a porous member for adsorbing a substrate, and has an upper surface on which an upper groove is formed, a lower surface on which a lower groove is formed, and a side circumferential surface extending between the upper surface and the lower surface. The seal member is configured to surround the suction member assembly and is annular, extending from the upper end portion to the lower end portion in the vertical direction, and has a side wall configured to contact the side circumferential surface of the suction member assembly, a first mating portion extending from the upper end portion of the side wall toward the inside of the seal member and configured to fit into the upper groove of the suction member assembly, and a second mating portion extending from the lower end portion of the side wall toward the inside of the seal member and configured to fit into the lower groove of the suction member assembly and configured to sandwich the suction member assembly together with the first mating portion.

[0103] As described above, the embodiments of the present invention and their respective modifications have been explained. Needless to say, each of the above examples is for facilitating the understanding of the present invention and does not limit the present invention. The present invention can be appropriately changed and improved without departing from its gist, and its equivalents are included in the present invention. Further, within the range where at least a part of the above-described problems can be solved, or within the range where at least a part of the effects can be achieved, any combination or omission of the respective components described in the claims and the specification is possible.

Explanation of Reference Numerals

[0104] 100: Substrate processing apparatus 300: Polishing apparatus 302: Top ring 338: Flow path 350: Polishing table 352: Polishing pad 380: First shielding member 382, 710: Second shielding member 390: Fastening member 400, 500, 550, 600, 650, 770: Seal member 410, 502, 552, 602, 652, 772: Lip portion 420, 510, 560, 610, 660, 780: Side wall 421, 511, 561, 611, 661, 781: Upper end portion 422, 512, 562, 612, 662, 782: Lower end portion 424, 664, 776: Communication hole 430, 520, 570, 620, 670, 790: First mating portion 431, 524, 574, 624, 794: Inner end portion 432, 521, 571, 621, 791: First upper wall 522, 572, 622, 792: Second upper wall 573, 623, 793: Third upper wall 575, 625, 795: Lower end portion 440, 530, 580, 630, 680, 800: Second mating portion 441, 534, 584, 634: Inner end portion 442,531,581,631: First lower wall 532,582,632: Second lower wall 583,633: Third lower wall 585,635: Upper end portion 480,690,720: Suction member assembly 482,540,590,640,691,721: Porous member 692,722,813: Holder 723: Recess 724: Protrusion 482a,542,592,642,694: Lower surface 482b,544,594,644,696: Upper surface 482c,545,595,645,697: Side peripheral surface 483,541,591,641,693,774: Lower groove 484,543,593,643,695,775: Upper groove 648: Chamfered portion 699: Plane to be contacted 700: Contact plane 701: Transverse groove 712: Contact surface 714: Groove D1: Vertical direction L1: Length L2: Length L3: Length L4: Length W: Substrate

Claims

1. A top ring, comprising: A suction member assembly having a porous member for adsorbing a substrate, and having an upper surface formed with an upper groove, a lower surface formed with a lower groove, and a side peripheral surface extending between the upper surface and the lower surface; An annular seal member surrounding the suction member assembly; Comprising: The seal member: Has a side wall extending from an upper end portion to a lower end portion in the vertical direction and contacting the side peripheral surface of the suction member assembly; A first mating portion extending from the upper end portion of the side wall toward the inside of the seal member and fitting into the upper groove of the suction member assembly; A second mating portion extending from the lower end portion of the side wall toward the inside of the seal member, fitting into the lower groove of the suction member assembly, and sandwiching the suction member assembly together with the first mating portion; Having: A top ring.

2. The top ring according to claim 1, further comprising: A first shielding member located above the suction member assembly and contacting the upper surface of the suction member assembly; A second shielding member surrounding the seal member and contacting the side wall; A fastening member for fixing the second shielding member to the first shielding member. A top ring.

3. The top ring according to claim 1 or 2, wherein: The seal member is configured symmetrically in the vertical direction. A top ring.

4. The top ring according to claim 1 or 2, wherein: The seal member has a lip portion configured to be in contact with the substrate; The lip portion extends from the lower end portion of the side wall downward and outward of the seal member. A top ring.

5. The top ring according to claim 1 or 2, wherein: The seal member has a lip portion configured to be in contact with the substrate; The lip portion extends from the lower end portion of the side wall downward and inward of the seal member. A top ring.

6. The top ring according to claim 1 or 2, wherein: The first mating portion: Has a first upper wall extending from the upper end portion of the side wall toward the inside of the seal member to an inner end portion; And a second upper wall extending from the inner end portion of the first upper wall downward to a lower end portion. Having: The second mating portion: Has a first lower wall extending from the lower end portion of the side wall toward the inside of the seal member to an inner end portion; And a second lower wall extending upward from a position between the lower end portion of the side wall and the inner end portion of the first lower wall. Having: Top ring.

7. The top ring according to claim 1 or 2, wherein the first mating portion includes a first upper wall extending from the upper end portion of the side wall toward the inside of the seal member to an inner end portion, a second upper wall extending downward from the inner end portion of the first upper wall to a lower end portion, a third upper wall extending from the lower end portion of the second upper wall toward the side wall, and the second mating portion includes a first lower wall extending from the lower end portion of the side wall toward the inside of the seal member to an inner end portion, a second lower wall extending upward from the inner end portion of the first upper wall to an upper end portion, a third lower wall extending from the upper end portion of the second upper wall toward the side wall, and is a top ring.

8. The top ring according to claim 7, wherein the seal member has a lip portion configured to be in contact with the substrate, and the lip portion extends downward and outward of the seal member from the inner end portion of the first lower wall of the second mating portion. is a top ring.

9. The top ring according to claim 7, wherein a chamfered portion is formed between the surface of the suction member assembly contacted by the first lower wall of the second mating portion and the surface of the suction member assembly contacted by the second lower wall of the second mating portion. is a top ring.

10. The top ring according to claim 8, wherein the length in the vertical direction between the surface of the suction member assembly contacted by the first lower wall of the second mating portion and the lower surface is longer than the sum of the thickness of the first lower wall and the thickness of the lip portion. is a top ring.

11. The top ring according to claim 1 or 2, wherein communication holes for sucking gas from the porous member are formed in the side wall of the seal member. is a top ring.

12. The top ring according to claim 11, wherein the suction member assembly has a holder adjacent to the porous member and having the upper groove and the lower groove formed therein. is a top ring.

13. The top ring according to claim 12, wherein the porous member has a contact plane, the holder has a contact plane that contacts the contact plane, a lateral groove in fluid communication with the communication hole is formed in the contact plane, and the horizontal length of the lateral groove is longer than 1 / 3 of the horizontal length of the contact plane. is a top ring.

14. The top ring according to claim 12, wherein a recess is formed in the porous member, the holder has a convex portion that fits into the recess, top ring.

15. The top ring according to claim 2, wherein the second shielding member has a contact surface that contacts the side wall, a plurality of grooves extending in the horizontal direction are formed in the contact surface, top ring.

16. The top ring according to claim 1 or 2, wherein a communication hole for sucking gas from the porous member is formed in the first mating portion, top ring.

17. The top ring according to claim 1 or 2, and a polishing table configured to be able to hold a polishing pad, a polishing apparatus comprising the same.

18. A seal member for attaching to a suction member assembly of a top ring, wherein the suction member assembly includes a porous member for sucking a substrate, and has an upper surface on which an upper groove is formed, a lower surface on which a lower groove is formed, and a side circumferential surface extending between the upper surface and the lower surface, the seal member is configured to surround the suction member assembly and is annular, extends from an upper end portion to a lower end portion in the vertical direction, and has a side wall configured to contact the side circumferential surface of the suction member assembly, a first mating portion extending from the upper end portion of the side wall toward the inside of the seal member and configured to fit into the upper groove of the suction member assembly, a second mating portion extending from the lower end portion of the side wall toward the inside of the seal member and configured to fit into the lower groove of the suction member assembly, and configured to sandwich the suction member assembly together with the first mating portion, having seal member.

Images