Substrate processing system and monitoring method

Abstract

To provide a substrate processing system and a monitoring method that can reduce an amount of data when storing image data.SOLUTION: A substrate processing system 1 includes a chamber 112, an imaging device 510, a comparison unit 532a, and a storage unit 534. The imaging device 510 captures images of the interior of the chamber 112 and generates multiple frame images. Each of frame images F1 and F2 has multiple unit areas. The comparison unit 532a compares the frame images F2 and F1 for each corresponding unit area and determines whether each unit area is a changed area where there is a change or a non-changed area where there is no change. The comparison unit 532a stores data of the frame image F2 in the storage unit 534 for the changed areas as the frame image F2, and stores a reference value indicating the frame image F1 to be referenced in the storage unit 534 for the non-changed areas.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to a substrate processing system and a monitoring method. [Background technology]

[0002] Substrate processing apparatuses that process substrates by supplying a processing liquid to the substrate are known (see, for example, Patent Document 1). Patent Document 1 describes a substrate processing apparatus that includes a supply nozzle that supplies the processing liquid to the substrate and an imaging device that images the substrate and the supply nozzle. This makes it possible, when a processing defect occurs in a substrate, to determine the cause of the processing defect by viewing the imaging data (video). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2008-135679 Summary of the Invention [Problem to be solved by the invention]

[0004] However, when video data (data of multiple frame images) generated by an imaging device is stored as is in a storage unit, the amount of video data is large, making it difficult for a control unit with limited storage capacity to store video data for a long period of time. For this reason, even if you try to check the video when a processing error occurs, you may not be able to determine the cause because the data has been overwritten.

[0005] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a substrate processing system and a monitoring method that are capable of reducing the amount of data when imaging data is stored. [Means for solving the problem]

[0006] According to one aspect of the present invention, a substrate processing system includes a chamber, an imaging device, a comparison unit, and a storage unit. The chamber accommodates a substrate to be processed with a processing liquid. The imaging device captures images of the interior of the chamber at a predetermined frame rate to generate multiple frame images. The comparison unit compares a first frame image of the multiple frame images with at least one second frame image generated before the first frame image. Each of the frame images has multiple unit areas including one or more pixels. The comparison unit compares the first frame image with the second frame image for each corresponding unit area and determines whether each unit area is a changed area or a non-changed area. The comparison unit stores data of the first frame image for the changed areas in the storage unit as the first frame image, and stores reference values ​​indicating the second frame image to be referenced for the non-changed areas in the storage unit.

[0007] In one embodiment, the unit region includes one of the pixels, and the comparison section compares the first frame image with the second frame image for each corresponding pixel.

[0008] In one embodiment, the comparison section compares pixel values ​​of the unit region of the first frame image with pixel values ​​of the unit region of the second frame image.

[0009] In one embodiment, the comparison section determines that the unit region is the changed region when a difference between the pixel values ​​of the unit region in the first frame image and the pixel values ​​of the unit region in the second frame image is equal to or greater than a threshold, and determines that the unit region is the non-changed region when a difference between the pixel values ​​of the unit region in the first frame image and the pixel values ​​of the unit region in the second frame image is less than the threshold.

[0010] In one embodiment, the comparison unit stores the data of the first frame image for the changing area and the non-changing area as the first frame image in the memory unit at predetermined time intervals, regardless of whether the unit area is the changing area or the non-changing area.

[0011] In one embodiment, the substrate processing system includes a substrate holding unit and a processing liquid cup. The substrate holding unit holds the substrate. The processing liquid cup surrounds the substrate holding unit and receives the processing liquid splashed from the substrate. The comparison unit reduces at least one of the resolution and the frame rate for at least a portion of the frame image that represents the processing liquid cup, and stores the frame image in the storage unit.

[0012] In one embodiment, the storage unit stores a process recipe that defines process conditions for the substrate, and the comparison unit reduces at least one of the resolution and the frame rate for a predetermined processing period based on the process recipe and stores the reduced resolution and frame rate in the storage unit.

[0013] In one embodiment, the comparison unit stores the data of a predetermined region of the first frame image corresponding to the predetermined processing period in the memory unit by lowering at least one of the resolution and the frame rate based on the processing recipe.

[0014] In one embodiment, the substrate processing system includes a synthesis unit that synthesizes the data of the changed region of the first frame image with the data of the unit region of the second frame image that corresponds to the reference value, thereby generating a synthesized frame image that corresponds to the first frame image.

[0015] In one embodiment, the substrate processing system further includes a determination unit that determines whether or not there is a processing abnormality based on the plurality of composite frame images generated by the composition unit.

[0016] According to another aspect of the present invention, a monitoring method includes the steps of capturing images of a chamber containing a substrate to be processed with a processing liquid at a predetermined frame rate to generate a plurality of frame images having a plurality of unit areas each including one or more pixels; comparing a first frame image of the plurality of frame images with at least one second frame image generated before the first frame image for each corresponding unit area; determining whether each of the unit areas is a changed area where there is a change or a non-changed area where there is no change; and storing data of the first frame image in a memory unit for the changed areas as the first frame image, and storing a reference value indicating the second frame image to be referenced in the memory unit for the non-changed areas.

[0017] In one embodiment, the unit region includes one of the pixels. In the comparing step, the first frame image and the second frame image are compared for each corresponding pixel.

[0018] In one embodiment, the comparing step compares pixel values ​​of the unit region of the first frame image with pixel values ​​of the unit region of the second frame image.

[0019] In one embodiment, in the determining step, if the difference between the pixel values ​​of the unit area in the first frame image and the pixel values ​​of the unit area in the second frame image is equal to or greater than a threshold, the unit area is determined to be the changed area, and if the difference between the pixel values ​​of the unit area in the first frame image and the pixel values ​​of the unit area in the second frame image is less than the threshold, the unit area is determined to be the non-changed area.

[0020] In one embodiment, in the storing step, regardless of whether the unit area is the changed area or the non-changed area, the data of the first frame image for the changed area and the non-changed area is stored in the memory unit as the first frame image at predetermined time intervals.

[0021] In one embodiment, in the storing step, at least a portion of the frame image showing a processing liquid cup that receives the processing liquid splashed from the substrate is stored in the memory unit with at least one of the resolution and frame rate lowered.

[0022] In one embodiment, in the storing step, at least one of the resolution and the frame rate is lowered for a predetermined processing period based on a processing recipe that defines processing conditions for the substrate, and the lowered resolution and frame rate are stored in the storage unit.

[0023] In one embodiment, in the storing step, the data of the first frame image corresponding to the specified processing period and of a specified area is stored in the memory unit with at least one of the resolution and frame rate reduced based on the processing recipe.

[0024] In one embodiment, the monitoring method includes a step of generating a composite frame image corresponding to the first frame image by combining the data of the changed area of ​​the first frame image with the data of the unit area of ​​the second frame image corresponding to the reference value.

[0025] In one embodiment, the monitoring method includes a step of determining whether or not there is a processing abnormality based on the plurality of composite frame images generated in the generating step. [Effects of the Invention]

[0026] According to the present invention, it is possible to provide a substrate processing system and a monitoring method that can reduce the amount of data when storing image data. [Brief explanation of the drawings]

[0027] [Figure 1] FIG. 2 is a schematic plan view of a substrate processing apparatus of the substrate processing system according to the first embodiment. [Figure 2] 2 is a schematic diagram of a substrate processing unit and a monitoring device of the substrate processing apparatus; [Figure 3] FIG. 1 is a block diagram of a substrate processing system. [Figure 4] FIG. 10 is a diagram schematically illustrating an example of a frame image generated by the imaging device, showing a state immediately before the first nozzle starts discharging the treatment liquid. [Figure 5] FIG. 10 is a diagram schematically illustrating an example of a frame image generated by the imaging device, showing a state in which ejection of treatment liquid from a first nozzle has started. [Figure 6] FIG. 10 is a schematic diagram showing four unit areas at the same position in three frame images. [Figure 7] FIG. 2 is a flowchart of a substrate processing method according to the first embodiment. [Figure 8] FIG. 2 is a flow diagram of a monitoring method according to the first embodiment. [Figure 9] FIG. 10 is a diagram schematically illustrating an example of a storage method according to the second embodiment. [Figure 10] FIG. 10 is a block diagram of a substrate processing system according to a fourth embodiment. [Figure 11] FIG. 10 is a flow diagram of a monitoring method according to a fourth embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0028] Hereinafter, embodiments of a substrate processing system and a monitoring method according to the present invention will be described with reference to the drawings. In the drawings, identical or corresponding parts are designated by the same reference numerals, and descriptions thereof will not be repeated. In this specification, to facilitate understanding of the invention, mutually orthogonal X-, Y-, and Z-axes may be described. Typically, the X- and Y-axes are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0029] (First embodiment) First, a substrate processing apparatus 100 of a substrate processing system 1 according to a first embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic plan view of the substrate processing apparatus 100 of the substrate processing system 1 according to the first embodiment.

[0030] 1, the substrate processing system 1 includes a substrate processing apparatus 100 and a monitoring apparatus 500 (see FIG. 2). The substrate processing apparatus 100 processes a substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface treatment, property imparting, treatment film formation, removal of at least a portion of a film, and cleaning.

[0031] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W has a substantially circular disk shape. Here, the substrate processing apparatus 100 processes the substrates W one by one.

[0032] The substrate processing apparatus 100 includes a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a controller 101. The controller 101 controls the indexer robot IR, the center robot CR, and the substrate processing units 110.

[0033] Each load port LP accommodates a plurality of stacked substrates W. The indexer robot IR transports substrates W between the load port LP and the center robot CR. Note that a placement stage (path) on which the substrate W is temporarily placed may be provided between the indexer robot IR and the center robot CR, and the device may be configured so that the substrate W is indirectly transferred between the indexer robot IR and the center robot CR via the placement stage. The center robot CR transports substrates W between the indexer robot IR and the substrate processing units 110. Each of the substrate processing units 110 processes the substrate W by discharging a processing liquid onto the substrate W. The fluid cabinet 10A contains a processing liquid. Note that the fluid cabinet 10A may contain a gas.

[0034] The substrate processing units 110 form a plurality of towers TW (four towers TW in FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes vertically stacked substrate processing units 110 (three substrate processing units 110 in FIG. 1). Each fluid box 10B corresponds to a plurality of towers TW. The processing liquid in the fluid cabinet 10A is supplied to all of the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via one of the fluid boxes 10B. Furthermore, the gas in the fluid cabinet 10A is supplied to all of the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via one of the fluid boxes 10B.

[0035] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computer.

[0036] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may include removable media. The control unit 102 executes computer programs stored in the storage unit 104 to perform substrate processing operations.

[0037] The storage unit 104 stores data. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes defines the processing content and processing procedure for the substrate W. The storage unit 104 also stores data received from the monitoring device 500 (see FIG. 2).

[0038] Next, the substrate processing unit 110 and the monitoring device 500 of the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 2. Fig. 2 is a schematic diagram of the substrate processing unit 110 and the monitoring device 500 of the substrate processing apparatus 100.

[0039] 2, the substrate processing unit 110 includes a chamber 112, a substrate holding part 120, a first processing liquid supply part 130, a second processing liquid supply part 140, and a third processing liquid supply part 150. The chamber 112 accommodates the substrate holding part 120 and at least a portion of the first processing liquid supply part 130, the second processing liquid supply part 140, and the third processing liquid supply part 150. At least a portion of the monitoring device 500 may be disposed inside the chamber 112; however, in this embodiment, the entire monitoring device 500 is disposed outside the chamber 112.

[0040] The chamber 112 has a generally box-like shape with an internal space. The chamber 112 accommodates the substrates W. Here, the substrate processing unit 110 is a single-wafer type that processes the substrates W one by one, and the chamber 112 accommodates the substrates W one by one. The substrates W are accommodated in the chamber 112 and are processed in the chamber 112.

[0041] The substrate holding unit 120 holds the substrate W. The substrate holding unit 120 holds the substrate W horizontally so that the upper surface (front surface) Wa of the substrate W faces upward and the lower surface (back surface) Wb of the substrate W faces vertically downward. The substrate holding unit 120 also rotates the substrate W while holding it. The upper surface Wa of the substrate W may be flattened. Alternatively, the upper surface Wa of the substrate W may be provided with a device surface or a pillar-shaped stacked body with a recess. The substrate holding unit 120 rotates the substrate W while holding it.

[0042] For example, the substrate holding unit 120 may be a clamping type that clamps the edge of the substrate W. Alternatively, the substrate holding unit 120 may have any mechanism that holds the substrate W from its lower surface Wb. For example, the substrate holding unit 120 may be a vacuum type. In this case, the substrate holding unit 120 holds the substrate W horizontally by adsorbing the central portion of the lower surface Wb of the substrate W, which is the surface on which devices are not formed, to its upper surface. Alternatively, the substrate holding unit 120 may be a combination of a clamping type that brings multiple chuck pins into contact with the peripheral edge surface of the substrate W, and a vacuum type.

[0043] For example, the substrate holder 120 includes a spin base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the spin base 121. The chuck member 122 chucks the substrate W. Typically, the spin base 121 is provided with a plurality of chuck members 122.

[0044] The shaft 123 is a hollow shaft. The shaft 123 extends vertically along the rotation axis Ax. The spin base 121 is coupled to the upper end of the shaft 123. The substrate W is placed above the spin base 121.

[0045] The spin base 121 is disk-shaped. The chuck member 122 supports the substrate W horizontally. The shaft 123 extends downward from the center of the spin base 121. The electric motor 124 applies a rotational force to the shaft 123. The electric motor 124 rotates the shaft 123 in a rotational direction, thereby rotating the substrate W and the spin base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0046] The first processing liquid supply unit 130, the second processing liquid supply unit 140, and the third processing liquid supply unit 150 supply the processing liquid to the substrate W. Typically, the first processing liquid supply unit 130, the second processing liquid supply unit 140, and the third processing liquid supply unit 150 supply the processing liquid to the upper surface Wa of the substrate W held by the substrate holder 120.

[0047] The processing liquid may be an etching liquid for etching the substrate W. Examples of the etching liquid include hydrofluoric nitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching liquid is not particularly limited, and may be, for example, acidic or alkaline.

[0048] Alternatively, the processing liquid may be a rinse liquid, such as deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0049] Alternatively, the treatment liquid may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinse liquid. Examples of organic solvents include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoroether (HFE), propylene glycol monoethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0050] The first processing liquid supply unit 130 includes a pipe 132, a first valve 134, a first nozzle 136, and a movement mechanism 138. A first processing liquid flows through the pipe 132 from a supply source. In this embodiment, the first processing liquid is, for example, an etching liquid such as hydrofluoric acid. The first valve 134 starts and stops the supply of the first processing liquid to the first nozzle 136. Specifically, the first valve 134 opens and closes a flow path within the pipe 132. The first valve 134 is, but is not limited to, an air valve, for example. The first nozzle 136 is connected to the downstream end of the pipe 132. The first processing liquid supply unit 130 may include, for example, a pump (not shown) that pumps the first processing liquid from the supply source. As the first processing liquid flows through the first nozzle 136, the first nozzle 136 ejects the first processing liquid onto the upper surface Wa of the substrate W. The first nozzle 136 is preferably configured to be movable relative to the substrate W.

[0051] The pipe 132 and the first nozzle 136 are made of resin. The first nozzle 136 transmits, for example, visible light. This allows an image of the first processing liquid in the first nozzle 136 to be easily captured by an imaging device 510, which will be described later. The pipe 132 and the first nozzle 136 are not particularly limited, but are formed, for example, from PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0052] The movement mechanism 138 moves the first nozzle 136 in the horizontal and vertical directions. Specifically, the movement mechanism 138 moves the first nozzle 136 in the circumferential direction around a rotation axis extending in the vertical direction. The movement mechanism 138 also raises and lowers the first nozzle 136 in the vertical direction. The movement mechanism 138 has, for example, a ball screw mechanism and an electric motor that provides a driving force to the ball screw mechanism.

[0053] The second processing liquid supply unit 140 includes a pipe 142, a second valve 144, a second nozzle 146, and a movement mechanism 148. The second processing liquid flows through the pipe 142 from a supply source. In this embodiment, the second processing liquid is, for example, a rinse liquid such as DIW. The second valve 144 starts and stops the supply of the second processing liquid to the second nozzle 146. Specifically, the second valve 144 opens and closes a flow path within the pipe 142. The second valve 144 is, but is not limited to, an air valve, for example. The second nozzle 146 is connected to the downstream end of the pipe 142. The second processing liquid supply unit 140 may include, for example, a pump (not shown) that pumps the second processing liquid from the supply source. As the second processing liquid flows through the second nozzle 146, the second nozzle 146 ejects the second processing liquid onto the upper surface Wa of the substrate W. The second nozzle 146 is preferably configured to be movable relative to the substrate W.

[0054] The pipe 142 and the second nozzle 146 are made of resin. The second nozzle 146 transmits, for example, visible light. The pipe 142 and the second nozzle 146 are made of, but are not limited to, PFA or PTFE, for example.

[0055] The movement mechanism 148 moves the second nozzle 146 in the horizontal and vertical directions. Specifically, the movement mechanism 148 moves the second nozzle 146 in the circumferential direction around a rotation axis extending in the vertical direction. The movement mechanism 148 also raises and lowers the second nozzle 146 in the vertical direction. The movement mechanism 148 has, for example, a ball screw mechanism and an electric motor that provides a driving force to the ball screw mechanism.

[0056] The third processing liquid supply unit 150 includes a pipe 152, a third valve 154, a third nozzle 156, and a moving mechanism 158. The third processing liquid flows through the pipe 152 from a supply source. In this embodiment, the third processing liquid is, for example, IPA. The third valve 154 starts and stops the supply of the third processing liquid to the third nozzle 156. Specifically, the third valve 154 opens and closes a flow path within the pipe 152. The third valve 154 is not particularly limited, but may be, for example, an air valve. The third nozzle 156 is connected to the downstream end of the pipe 152. The third processing liquid supply unit 150 may include, for example, a pump (not shown) that pumps the third processing liquid from the supply source. As the third processing liquid flows through the third nozzle 156, the third nozzle 156 ejects the third processing liquid onto the upper surface Wa of the substrate W. The third nozzle 156 is preferably configured to be movable relative to the substrate W.

[0057] The pipe 152 and the third nozzle 156 are made of resin. The third nozzle 156 transmits, for example, visible light. The pipe 152 and the third nozzle 156 are made of, but are not particularly limited to, PFA or PTFE, for example.

[0058] The movement mechanism 158 moves the third nozzle 156 in the horizontal and vertical directions. Specifically, the movement mechanism 158 moves the third nozzle 156 in the circumferential direction around a rotation axis extending in the vertical direction. The movement mechanism 158 also raises and lowers the third nozzle 156 in the vertical direction. The movement mechanism 158 has, for example, a ball screw mechanism and an electric motor that provides a driving force to the ball screw mechanism.

[0059] The substrate processing apparatus 100 further includes a cup 180. The cup 180 is an example of a "processing liquid cup" of the present invention. The cup 180 surrounds the periphery of the substrate holding unit 120. The cup 180 has an opening 181 through which the substrate W and the upper part of the substrate holding unit 120 (spin base 121) can pass. The processing liquid is supplied to the substrate W through the opening 181. The cup 180 receives and recovers the processing liquid splashed from the substrate W. The cup 180 moves up and down. For example, the cup 180 moves up vertically to the side of the substrate W during the period when the first processing liquid supply unit 130, the second processing liquid supply unit 140, or the third processing liquid supply unit 150 supplies the processing liquid to the substrate W. In this case, the cup 180 recovers the processing liquid splashed from the substrate W due to the rotation of the substrate W. Furthermore, when the period during which the first processing liquid supply unit 130, the second processing liquid supply unit 140, or the third processing liquid supply unit 150 supplies processing liquid to the substrate W ends, the cup 180 descends vertically downward from the side of the substrate W.

[0060] The monitoring device 500 includes an imaging device 510, an illumination device 520, and a control device 530. The imaging device 510 and the illumination device 520 are provided, for example, for each chamber 112. The control device 530 is provided, for example, for each substrate processing apparatus 100.

[0061] The imaging device 510 includes, for example, an imaging element, an electronic shutter, and an optical system. The imaging element may be, for example, a CCD (Charge Coupled Device). The optical system includes, for example, a lens. The imaging device 510 captures images of the interior of the chamber 112 at a predetermined frame rate and generates multiple consecutive frame images that are video data. The imaging device 510 outputs the multiple frame images to the control device 530. The operation of the imaging device 510 is controlled by the control device 530.

[0062] In this embodiment, the imaging device 510 is disposed outside the chamber 112. The chamber 112 has a sidewall 112a facing the imaging device 510, and the sidewall 112a is provided with a window 112b facing the imaging device 510. The imaging device 510 captures an image of the inside of the chamber 112 through the window 112b in the sidewall 112a. The window 112b transmits light. For example, the window transmits visible light.

[0063] The imaging device 510 captures an image of an area including the opening 181 of the cup 180 and the substrate W to generate a plurality of frame images. Therefore, the imaging device 510 can capture images of the processing liquid discharged from the first nozzle 136, the second nozzle 146, and the third nozzle 156, the substrate W, and the like to generate a plurality of frame images. In this embodiment, the imaging device 510 captures an image of not only the opening 181 of the cup 180 and the substrate W, but also, for example, an area including at least one of the first nozzle 136, the second nozzle 146, and the third nozzle 156, and at least one of the moving mechanisms 138, 148, and 158. It is preferable that the imaging device 510 captures an image of an area including all of the first nozzle 136, the second nozzle 146, and the third nozzle 156, and all of the moving mechanisms 138, 148, and 158.

[0064] The frame rate of the imaging device 510 may be 30 fps or 60 fps. Alternatively, the frame rate may be 120 fps. In this embodiment, the imaging device 510 has sensitivity to, for example, visible light. Note that the imaging device 510 does not have to be a visible light camera. The imaging device 510 may be, for example, an infrared camera, a thermopile, or a color sensor.

[0065] The illumination device 520 irradiates light (e.g., visible light) into the chamber 112. Specifically, the illumination device 520 irradiates light (hereinafter, sometimes referred to as illumination light) onto an area including the opening 181 of the cup 180 and the substrate W. In this embodiment, the illumination device 520 irradiates with illumination light an area including not only the opening 181 of the cup 180 and the substrate W, but also, for example, at least one of the first nozzle 136, the second nozzle 146, and the third nozzle 156, and at least one of the moving mechanisms 138, the moving mechanisms 148, and the moving mechanisms 158. Therefore, the imaging device 510 captures images of the inside of the opening 181 of the cup 180 illuminated by the illumination light, the substrate W, the first nozzle 136, the second nozzle 146, the third nozzle 156, the moving mechanisms 138, the moving mechanisms 148, and the moving mechanisms 158, etc. Therefore, the imaging device 510 can easily capture images of the processing liquid, the upper surface Wa of the substrate W, etc.

[0066] The control device 530 controls various operations of the monitoring device 500. The control device 530 includes a control unit 532 and a storage unit 534. The control unit 532 has a processor. The control unit 532 has, for example, a GPU (Graphics Processing Unit) or a CPU (Central Processing Unit). Alternatively, the control unit 532 may have a general-purpose computing device.

[0067] The storage unit 534 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 534 may include removable media. The control unit 532 executes a computer program stored in the storage unit 534 to perform the discharge analysis operation. The storage unit 534 stores various data. The data includes, for example, frame images captured by the imaging device 510.

[0068] Next, the substrate processing system 1 of this embodiment will be described with reference to Fig. 3. Fig. 3 is a block diagram of the substrate processing system 1.

[0069] 3 , the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the first processing liquid supply unit 130, the second processing liquid supply unit 140, the third processing liquid supply unit 150, the cup 180, and the monitoring device 500. Specifically, the control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the first processing liquid supply unit 130, the second processing liquid supply unit 140, the third processing liquid supply unit 150, the cup 180, and the monitoring device 500 by transmitting control signals to the indexer robot IR, the center robot CR, the substrate holding unit 120, the first processing liquid supply unit 130, the second processing liquid supply unit 140, the third processing liquid supply unit 150, the cup 180, and the monitoring device 500.

[0070] The memory unit 104 also stores computer programs and data. The data includes recipe data. The recipe data includes information indicating multiple recipes. The recipe is an example of a "processing recipe" of the present invention. Each of the multiple recipes specifies the processing content, processing procedure, and processing conditions for the substrate W. The control unit 102 executes the computer program stored in the memory unit 104 to perform substrate processing operations.

[0071] The control unit 102 controls the indexer robot IR to transfer the substrate W by the indexer robot IR.

[0072] The control unit 102 controls the center robot CR to transfer the substrate W by the center robot CR. For example, the center robot CR receives an unprocessed substrate W and transports the substrate W into one of the plurality of chambers 112. The center robot CR also receives a processed substrate W from the chamber 112 and transports the substrate W out.

[0073] The control unit 102 controls the substrate holding unit 120 to start rotation of the substrate W, change the rotation speed, and stop rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0074] The control unit 102 controls the first valve 134 of the first processing liquid supply unit 130 to switch the state of the first valve 134 between an open state and a closed state. Specifically, the control unit 102 controls the first valve 134 of the first processing liquid supply unit 130 to open the first valve 134, thereby allowing the processing liquid flowing through the pipe 132 toward the first nozzle 136 to pass. Furthermore, the control unit 102 controls the first valve 134 of the first processing liquid supply unit 130 to close the first valve 134, thereby stopping the supply of the processing liquid flowing through the pipe 132 toward the first nozzle 136.

[0075] The control unit 102 can control the movement mechanism 138 of the first processing liquid supply unit 130 to move the first nozzle 136. Specifically, the control unit 102 can control the movement mechanism 138 of the first processing liquid supply unit 130 to move the first nozzle 136 above the upper surface Wa of the substrate W. The control unit 102 can also control the movement mechanism 138 of the first processing liquid supply unit 130 to move the first nozzle 136 to a retracted position away from above the upper surface Wa of the substrate W.

[0076] Similarly, the control unit 102 can control the second valve 144 of the second processing liquid supply unit 140 to switch the state of the second valve 144 between an open state and a closed state. Similarly, the control unit 102 can control the movement mechanism 148 of the second processing liquid supply unit 140 to move the second nozzle 146.

[0077] Similarly, the control unit 102 can control the third valve 154 of the third treatment liquid supply unit 150 to switch the state of the third valve 154 between an open state and a closed state. Similarly, the control unit 102 can control the movement mechanism 158 of the third treatment liquid supply unit 150 to move the third nozzle 156.

[0078] The control unit 102 may control the cup 180 to move the cup 180 relative to the substrate W. Specifically, the control unit 102 raises the cup 180 vertically upward to a side of the substrate W during a period in which the first processing liquid supply unit 130, the second processing liquid supply unit 140, and the third processing liquid supply unit 150 supply the processing liquid to the substrate W. Furthermore, when the period in which the first processing liquid supply unit 130, the second processing liquid supply unit 140, and the third processing liquid supply unit 150 supply the processing liquid to the substrate W ends, the control unit 102 lowers the cup 180 vertically downward from the side of the substrate W.

[0079] In this embodiment, the monitoring device 500 has a display device 540. The display device 540 displays various images and various information. The display device 540 has, for example, a liquid crystal display or an organic EL display. The display device 540 displays, for example, a video of the inside of the chamber 112 captured by the imaging device 510. The display device 540 may have an input unit such as a touch panel or a pointing device that accepts various inputs from the user. Furthermore, the monitoring device 500 may have an input unit that accepts various inputs from the user, separate from the display device 540.

[0080] The control device 530 controls various operations of the monitoring device 500. The control device 530 controls the imaging device 510, the lighting device 520, and the display device 540. Specifically, the control device 530 controls the imaging device 510, the lighting device 520, and the display device 540 by transmitting control signals to the imaging device 510, the lighting device 520, and the display device 540.

[0081] The storage unit 534 stores computer programs and data. In this embodiment, the storage unit 534 also stores data generated based on frame images captured and generated by the imaging device 510. The control unit 532 executes the computer programs stored in the storage unit 534 to perform image processing operations.

[0082] The control unit 532 controls the lighting device 520 to irradiate a predetermined area within the chamber 112 with visible light. The control unit 532 controls the imaging device 510 to capture an image of the predetermined area within the chamber 112. The imaging device 510 captures images of the interior of the chamber 112 at a predetermined frame rate to generate a plurality of frame images. The imaging device 510 sequentially transmits the generated plurality of frame images to the control device 530.

[0083] In this embodiment, control unit 532 has a comparison unit 532a and a synthesis unit 532b. Comparison unit 532a converts the multiple frame images generated by imaging device 510 into data with a small amount of data and stores the data in storage unit 534. Synthesis unit 532b generates multiple composite frame images based on the data stored in storage unit 534. This makes it possible to generate, for example, moving image data (multiple composite frame images) that is the same as the moving image data (multiple frame images) generated by imaging device 510.

[0084] Next, a method for storing frame images and a method for generating a composite frame image by the monitoring device 500 will be described with reference to FIGS. 4 and 5. FIG. 4 is a diagram schematically illustrating an example of a frame image (one frame image) F1 generated by the imaging device 510, illustrating a state immediately before the first nozzle 136 starts discharging the treatment liquid. FIG. 5 is a diagram schematically illustrating an example of a frame image F2 generated by the imaging device 510, illustrating a state after the first nozzle 136 starts discharging the treatment liquid. The frame image F1 shown in FIG. 4 and the frame image F2 shown in FIG. 5 are consecutive frame images, and the frame image F2 shown in FIG. 5 is the frame image next to the frame image F1 shown in FIG. 4. In the relationship between the frame images F1 and F2, the frame image F1 is an example of a "second frame image" in the present invention, and the frame image F2 is an example of a "first frame image" in the present invention.

[0085] First, a method for storing frame images by the comparison unit 532a will be described. The storage of frame images is performed, for example, in parallel with the processing of the substrate W by the substrate processing system 1.

[0086] As shown in Fig. 4, when the first nozzle 136 is positioned above the center of the substrate W and the processing liquid is discharged from the first nozzle 136, the state shown in Fig. 5 is obtained. That is, the processing liquid is discharged from the tip (here, the lower end) of the first nozzle 136 onto the center of the upper surface Wa of the substrate W. The imaging device 510 captures images at a predetermined frame rate and generates a series of frame images. The imaging device 510 transmits the generated frame images to the control device 530. At this time, the frame images include, for example, frame image F1 and frame image F2.

[0087] The frame image F1 shows, for example, the cup 180, the substrate W, the first nozzle 136, the moving mechanism 138, and the inner surface of the sidewall 112c of the chamber 112. In other words, the frame image F1 includes an area showing, for example, the cup 180, the substrate W, the first nozzle 136, the moving mechanism 138, and the inner surface of the sidewall 112c of the chamber 112.

[0088] The comparison unit 532a of the control unit 532 compares a first frame image (for example, frame image F2) of the multiple frame images with at least one second frame image (for example, frame image F1) that was generated before the first frame image. Specifically, each frame image has multiple unit areas. The comparison unit 532a compares the first frame image and the second frame image for each corresponding unit area. In other words, the comparison unit 532a compares unit areas at the same position in the first frame image and the second frame image. The comparison unit 532a compares all unit areas included in the first frame image with the corresponding unit areas in the second frame image.

[0089] A unit area is an area that includes one or more pixels. In this embodiment, a unit area is an area of ​​one pixel. That is, in this embodiment, comparison section 532a compares the first frame image and the second frame image for each corresponding pixel. Note that the unit area may be, for example, an area of ​​four pixels, 2 pixels vertically and 2 pixels horizontally, or an area of ​​16 pixels, 4 pixels vertically and 4 pixels horizontally.

[0090] Furthermore, when comparing unit areas, the comparison unit 532a compares, for example, the RGB numerical values ​​(gradations). That is, in this embodiment, the comparison unit 532a compares the pixel values ​​of the unit areas. The pixel values ​​are expressed, for example, as numerical values ​​between 0 and 255. Note that when a unit area includes multiple pixels, the comparison unit 532a may compare the unit areas using, for example, the average value of the multiple pixels included in the unit area. The comparison unit 532a may also compare the unit areas using, for example, brightness value, hue, and / or saturation.

[0091] Then, the comparison unit 532a determines for each unit region whether the unit region is a changed region where there is a change or a non-changed region where there is no change.

[0092] When comparing the numerical values ​​of a unit area in the first frame image with the numerical values ​​of a unit area in the second frame image, the comparison unit 532a may determine that the area is a changed area if the difference is, for example, 1 or more. In this embodiment, the comparison unit 532a compares the numerical values ​​(here, pixel values) of the unit area in the first frame image with the numerical values ​​(here, pixel values) of the unit area in the second frame image, and determines that the area is a changed area if the difference between the numerical values ​​of the unit area in the first frame image and the numerical values ​​of the unit area in the second frame image is equal to or greater than a threshold. On the other hand, the comparison unit 532a determines that the area is a non-changed area if the difference is less than the threshold. This prevents the comparison unit 532a from determining that a certain unit area is a changed area even though there is no change within the imaging range of the chamber 112. The threshold is not particularly limited, but is, for example, equal to or greater than 2 and equal to or less than several tens.

[0093] More specifically, the comparison unit 532a compares, for example, frame image F2 with frame image F1. The comparison unit 532a compares frame image F2 with frame image F1 for each unit area. Then, the comparison unit 532a determines whether each unit area is a changed area where there is a change or a non-changed area where there is no change.

[0094] For example, when comparing frame image F2 with frame image F1, the unit area that constitutes the cup 180, most of the upper surface Wa of the substrate W, the first nozzle 136, the moving mechanism 138, and the inner surface of the sidewall 112c of the chamber 112 is determined to be a non-changed area. On the other hand, the unit area included in the area R1 that represents the processing liquid discharged from the first nozzle 136 (the area surrounded by the dashed line in FIG. 5) is determined to be a changed area.

[0095] Then, the comparison unit 532a stores the data (pixel values) of the frame image F2 for the changed region (region R) in the storage unit 534 as the frame image F2. That is, the comparison unit 532a stores, for example, the pixel values ​​(each numerical value of RGB) for the changed region in the storage unit 534 as the frame image F2.

[0096] On the other hand, for the non-changing region of frame image F2, comparison unit 532a stores reference values ​​indicating unit regions of frame image F1 to be referenced in storage unit 534. Note that the amount of data indicating the reference values ​​is smaller than the amount of data indicating pixel values.

[0097] That is, in this embodiment, the comparison unit 532a stores pixel values ​​(RGB numerical values) for changed regions, but stores reference values ​​instead of pixel values ​​for unchanged regions, thereby reducing the amount of data stored in the storage unit 534.

[0098] Next, a method for generating a composite frame image by the composition unit 532b will be described. The generation of a composite frame image is performed, for example, when an error occurs in the substrate processing system 1 or a processing defect occurs in a substrate W, by a user performing an operation to call up video data in order to clarify the cause.

[0099] The synthesis unit 532b generates a synthetic frame image corresponding to the frame image F1, for example, by synthesizing data relating to the unchanged region (a portion of the data of the frame image F2) and data relating to the changed region (a portion of the data of the frame image F1).

[0100] In this embodiment, as described above, the comparison unit 532a, for example, compares the frame images F2 and F1 for each corresponding unit area and determines whether each unit area is a changed area where there is a change or a non-changed area where there is no change. The comparison unit 532a stores data (e.g., pixel values) of the frame image F2 in the storage unit 534 for the changed areas as the frame image F2, and stores reference values ​​indicating the reference frame image F1 for the non-changed areas in the storage unit 534. Therefore, for the non-changed areas, the reference values ​​are stored instead of the data (e.g., pixel values) of the unit areas, so the amount of data stored in the storage unit 534 can be reduced. Furthermore, when imaging the inside of the chamber 112, the majority of the frame images (e.g., at least 90% or more) are non-changed areas, so the effect of reducing the amount of data is particularly large.

[0101] Furthermore, in this embodiment, since the effect of reducing the amount of data by storing reference values ​​instead of pixel values ​​is significant, it is not necessary to store, for example, only data (frame images) for a specific processing period in the substrate processing flow, or only data for a specific region in the frame images. Therefore, it is possible to store data (frame images) for the entire processing period in the substrate processing flow, or data for all regions in the frame images. Therefore, unlike when only data for a specific processing period and / or a specific region is stored, it is possible to prevent the inconvenience of there being a period and / or region that cannot be confirmed when checking the moving image due to a processing defect or the like of the substrate W.

[0102] Furthermore, it is possible to generate a composite frame image corresponding to frame image F2 by combining data of the changed area of ​​frame image F2 stored in storage unit 534 with data of the unit area of ​​frame image F1 corresponding to the reference value. In other words, it is possible to generate a plurality of composite frame images (moving images) with the same resolution, same imaging range, and same frame rate as the plurality of frame images (moving images) generated by imaging device 510.

[0103] Furthermore, as described above, the comparison section 532a compares the frame images F2 and F1 for each corresponding pixel, and therefore the data can be stored in a high resolution (high image quality) state.

[0104] Furthermore, as described above, the comparison section 532a compares the pixel values ​​of the frame image F2 with the pixel values ​​of the frame image F1, so that the frame images F2 and F1 can be easily compared.

[0105] Furthermore, as described above, the comparison unit 532a determines a unit region to be a changed region when the difference between the pixel values ​​of the unit region in frame image F2 and the pixel values ​​of the unit region in frame image F1 is equal to or greater than the threshold. Furthermore, the comparison unit 532a determines a unit region to be a non-changed region when the difference between the pixel values ​​of the unit region in frame image F2 and the pixel values ​​of the unit region in frame image F1 is less than the threshold. Therefore, for example, even if there is no change within the imaging range of the chamber 112, when variations in pixel values ​​occur in a certain unit region due to noise or the like, the comparison unit 532a can be prevented from determining that the region is a changed region. This prevents the amount of data stored in the storage unit 534 from becoming unnecessarily large.

[0106] As described above, the substrate processing system 1 also includes the combining unit 532b. The combining unit 532b combines data of the changed region of the frame image F2 with data of the unit region of the frame image F1 corresponding to the reference value to generate a combined frame image corresponding to the frame image F2. This makes it possible to easily generate a combined frame image.

[0107] Next, the method for storing frame images and the method for generating a composite frame image will be described in more detail with reference to Figures 6 and 7. Figure 6 is a schematic diagram showing four unit areas P1 to P4 at the same position in three frame images F11 to F13. For ease of understanding, the comparison and storage of only the four unit areas P1 to P4 at the same position in frame images F11 to F13 will be described here.

[0108] First, the method of storing frame images by the comparison unit 532a will be further described.

[0109] As shown in Fig. 6, frame image F11 is, for example, the first frame image captured by imaging device 510. Because frame image F11 is the first frame image, data for all unit areas is stored in storage unit 534. Frame image F12 is the frame image following frame image F11. Frame image F13 is the frame image following frame image F12. In the figure, A1, B1, C1, D1, A2, and C3 indicate pixel values ​​of each unit area.

[0110] First, the pixel values ​​of unit areas P1 to P4 of frame image F11 are A1, B1, C1, and D1, respectively. The pixel values ​​of unit areas P1 to P4 of the next frame image F12 are A2, B1, C1, and D1, respectively.

[0111] The comparison unit 532a compares, for example, frame image F12 and frame image F11. In this case, frame image F12 corresponds to the "first frame image" of the present invention, and frame image F11 corresponds to the "second frame image" of the present invention. For example, unit area P1 is determined to be a changed area because the pixel value changes from A1 to A2. On the other hand, unit areas P2 to P4 are determined to be non-changed areas because the pixel values ​​do not change.

[0112] Then, the comparison unit 532a stores the pixel value A2 for the unit area P1 (changing area) in the memory unit 534 as the frame image F12, and stores reference values ​​indicating the unit areas P2 to P4 of the frame image F11 for the unit areas P2 to P4 (non-changing areas) in the memory unit 534.

[0113] Next, the comparison unit 532a compares, for example, frame image F13 with frame image F12. In this case, frame image F13 corresponds to the "first frame image" of the present invention, and frame images F11 and F12 correspond to the "second frame image" of the present invention. Unit region P3 is determined to be a changed region because its pixel value changes from C1 to C3. On the other hand, unit regions P1, P2, and P4 are determined to be non-changed regions because their pixel values ​​do not change.

[0114] Then, the comparison unit 532a stores the pixel value C3 for the unit area P3 (changing area) in the memory unit 534 as the frame image F13, and stores reference values ​​indicating the unit areas P1, P2 and P4 of the frame image F12 in the memory unit 534 for the unit areas P1, P2 and P4 (non-changing areas).

[0115] In this way, the comparison unit 532a compares all frame images generated by the imaging device 510 with the frame image (second frame image) generated earlier, and stores the pixel values ​​or reference values ​​in the storage unit 534.

[0116] For ease of understanding, an example has been described in which the pixel values ​​of unit areas P2 to P4 of frame image F12 are stored (remain) in storage unit 534 when comparing frame image F13 and frame image F12, but the present invention is not limited to this. Specifically, when comparing frame image F13 and frame image F12, the pixel values ​​of unit areas P2 to P4 of frame image F12 may be used as reference values. In this case, the pixel value of unit area P2 of frame image F13, for example, is compared with the pixel value of unit area P2 of frame image F11.

[0117] Next, a method for generating a composite frame image by the synthesis unit 532b will be further described.

[0118] The synthesis unit 532b generates a composite frame image by synthesizing the data stored in the storage unit 534. Because frame image F11 is the first frame image, the pixel values ​​of all unit areas of frame image F11 are stored in the storage unit 534. For this reason, the synthesis unit 532b does not need to generate a composite frame image corresponding to frame image F11.

[0119] Next, the synthesis unit 532b generates a synthetic frame image corresponding to the frame image F12. At this time, the synthesis unit 532b generates a synthetic frame image corresponding to the frame image F12 by synthesizing the data (pixel value A2) of the frame image F12 relating to the changed region (unit region P1) with the data (pixel values ​​B1, C1, D1) of the frame image F11 relating to the unchanged region (unit regions P2 to P4).

[0120] Next, the synthesis unit 532b generates a synthetic frame image corresponding to the frame image F13. At this time, the synthesis unit 532b generates the synthetic frame image corresponding to the frame image F13 by synthesizing the data (pixel value C3) of the frame image F13 relating to the changed region (unit region P3) with the data (pixel values ​​A2, B1, D1) of the frame images F11 and F12 relating to the unchanged regions (unit regions P1, P2, and P4).

[0121] The synthesis unit 532b similarly generates synthetic frame images in sequence for the subsequent frame images F14, F15, etc. In this way, moving image data made up of a plurality of synthetic frame images is generated.

[0122] Next, the substrate processing method of this embodiment will be described with reference to Fig. 7. Fig. 7 is a flow chart of the substrate processing method of the first embodiment.

[0123] 7, in step SA, the substrate W is loaded into the substrate processing apparatus 100. Specifically, the substrate W is loaded into the chamber 112 of the substrate processing unit 110 via the indexer robot IR and the center robot CR.

[0124] In step SB, the substrate holding part 120 holds the substrate W. Specifically, when the substrate W is loaded into the chamber 112, it is held by the substrate holding part 120.

[0125] In step SC, the control unit 102 processes the substrate W. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holder 120 rotates while holding the substrate W, and the first processing liquid supply unit 130, the second processing liquid supply unit 140, and / or the third processing liquid supply unit 150 supply the processing liquid to the substrate W. The control unit 102 stops the supply of the processing liquid to the substrate W when a predetermined time has elapsed since the supply of the processing liquid to the substrate W started.

[0126] In step SD, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate W from the substrate holding unit 120.

[0127] In step SE, the substrate W is unloaded from the substrate processing unit 110. Specifically, the substrate W is unloaded from the chamber 112 of the substrate processing unit 110 via the center robot CR and the indexer robot IR.

[0128] Next, the monitoring method of this embodiment will be described with reference to FIG. 8. FIG. 8 is a flow diagram of the monitoring method of the first embodiment. The monitoring method of the first embodiment includes steps S101 to S108. Note that steps S101 to S105 are executed in parallel with steps SA to SE of the substrate processing method described above. Step S102 is an example of a "frame image generating step" of the present invention. Step S103 is an example of a "comparing step" of the present invention. Step S104 is an example of a "determining whether a unit area is a changed area or a non-changed area" of the present invention. Step S105 is an example of a "storing step" of the present invention. Step S107 is an example of a "composite frame image generating step" of the present invention.

[0129] 8, in step S101, the control unit 532 starts imaging. Specifically, the control unit 532 controls the imaging device 510 to start imaging the inside of the chamber 112 at a predetermined frame rate. At this time, the control unit 532 controls the lighting device 520 to start illuminating the inside of the chamber 112.

[0130] Next, in step S102, the imaging device 510 generates frame images. Specifically, the control unit 532 controls the imaging device 510 to generate a plurality of frame images.

[0131] Next, in step S103, comparison unit 532a of control unit 532 compares the first frame image (for example, frame image F2) with the second frame image (for example, frame image F1). Specifically, comparison unit 532a compares the first frame image with the second frame image for each corresponding unit area.

[0132] Next, in step S104, the comparison unit 532a determines the unit areas of the frame images. Specifically, the comparison unit 532a determines whether each of the multiple unit areas of the frame images compared in step S103 is a changed area where there is a change, or a non-changed area where there is no change. In this embodiment, the comparison unit 532a determines that a unit area is a changed area when the difference between the pixel values ​​of the unit area of ​​the first frame image (for example, frame image F2) and the pixel values ​​of the unit area of ​​the second frame image (for example, frame image F1) is equal to or greater than a threshold. On the other hand, the comparison unit 532a determines that the unit area is a non-changed area when the difference in pixel values ​​is less than the threshold.

[0133] Next, in step S105, comparison unit 532a stores the data in storage unit 534. Specifically, comparison unit 532a stores the data of the first frame image (for example, frame image F2) as the first frame image for the changed region in storage unit 534. Furthermore, comparison unit 532a stores a reference value indicating the second frame image (for example, frame image F1) to be referenced as the first frame image for the unchanged region in storage unit 534.

[0134] In this embodiment, regardless of whether the unit region is a changed region or a non-changed region, comparison section 532a stores data of all unit regions of the first frame image every predetermined time (for example, at least several seconds and at most several tens of seconds) in storage section 534. In this case, it is not necessary to compare the first frame image and the second frame image.

[0135] As described above, steps S101 to S105 are performed in parallel with steps SA to SE of the substrate processing method, whereas steps S106 and after may be performed when the substrate W is not being processed.

[0136] Next, in step S106, control unit 532 accepts an output instruction. The output instruction is an instruction to output video data from control device 530. The video data may be output to display device 540, or may be output to control unit 102. Furthermore, the video data may be output to another device via control unit 102.

[0137] Specifically, when a processing abnormality or the like occurs with respect to the substrate W, the user investigates the cause. At this time, the user instructs the monitoring device 500 to output video data in order to check the video data stored in the monitoring device 500. The user instructs the control device 530 of the monitoring device 500 to output video data, for example, by operating an input unit of the monitoring device 500 or an input unit of the substrate processing apparatus 100. In this embodiment, the user operates the input unit of the monitoring device 500 so that the display device 540 displays (plays) the video. As a result, the control unit 532 accepts the output instruction.

[0138] Next, in step S107, the combining unit 532b of the control unit 532 combines the data to generate a combined frame image. Specifically, the data stored in the storage unit 534 is not moving image data, and therefore cannot be played back as a moving image as is. For this reason, the data stored in the storage unit 534 needs to be generated as moving image data.

[0139] In this embodiment, the synthesis unit 532b synthesizes data relating to the changed region (for example, data of a portion of frame image F2) with data relating to the unchanged region (for example, data of a portion of frame image F1). This generates a synthesized frame image corresponding to the first frame image (for example, frame image F2) generated by the imaging device 510. The synthesis unit 532b sequentially generates a plurality of consecutive synthesized frame images, thereby generating moving image data.

[0140] Next, in step S108, control unit 532 outputs a plurality of composite frame images (moving image data) to display device 540. At this time, control unit 532 may output the moving image data to display device 540 after generating moving image data including all composite frame images, or may sequentially output the composite frame images to display device 540 as they are generated. Then, display device 540 displays (plays) the moving image based on the moving image data.

[0141] In this embodiment, as described above, regardless of whether the unit region is a changed region or a non-changed region, comparison section 532a stores the data of the first frame image (for example, frame image F2) for the changed region and the non-changed region at predetermined time intervals in storage section 534. Therefore, for example, even if some of the data stored in storage section 534 is corrupted, the data can be reset at predetermined time intervals, making it possible to limit the range affected by the corrupted data.

[0142] (Second embodiment) Next, a substrate processing system 1 according to a second embodiment will be described with reference to Fig. 9. Fig. 9 is a diagram schematically illustrating an example of a storage method according to the second embodiment. Unlike the first embodiment, the second embodiment describes an example in which the comparison unit 532a reduces at least one of the resolution and the frame rate for a predetermined region of a frame image and stores the image in the storage unit 534.

[0143] In this embodiment, comparison unit 532a reduces at least one of the resolution and frame rate for a predetermined region of the first frame image (for example, frame image F2) and stores the image in storage unit 534. Specifically, the predetermined region includes at least a portion of the region of the frame image that shows cup 180. In this embodiment, the predetermined region is the region of the frame image that is outside cup 180 (the region outside opening 181 of cup 180).

[0144] The predetermined area may be set manually by the user when the imaging device 510 is installed. Alternatively, the control unit 532 may automatically set the predetermined area by recognizing the cup 180. Alternatively, the comparison unit 532a may perform a determination between a changed area and a non-changed area for a predetermined period (for example, several hours to several days or more), and the control unit 532 may set the area that is determined to be a non-changed area at a high rate as the predetermined area. In this embodiment, the predetermined area is set manually by the user when the imaging device 510 is installed.

[0145] First, an example in which the comparison unit 532a reduces the resolution of a predetermined region of a frame image and stores the image in the storage unit 534 will be described.

[0146] Specifically, the comparison unit 532a compares the first frame image (e.g., frame image F2) with the second frame image (e.g., frame image F1) in the same manner as in the first embodiment, and determines whether the unit area is a changed area or a non-changed area.

[0147] For example, as shown in FIG. 9, for areas of the first frame image other than a predetermined area (for example, an area including the substrate W or the tip of the first nozzle 136), the comparison unit 532a stores the data (pixel values) of each unit area P11 to P14 in the memory unit 534, as in the first embodiment.

[0148] On the other hand, for a predetermined region (region outside the cup 180) in the first frame image, the comparison unit 532a combines multiple (e.g., four) unit regions into one new unit region P20. Then, the comparison unit 532a stores the data (pixel values) of the new unit region P20 in the storage unit 534. At this time, the comparison unit 532a, for example, averages the data (pixel values) of the multiple (e.g., four) unit regions to form the data (pixel value) of the new unit region. Note that when combining multiple (e.g., four) unit regions into one new unit region, the new unit region may be formed only if all (e.g., four) unit regions are non-changing regions.

[0149] Next, an example will be described in which the comparison unit 532a reduces the frame rate for a predetermined region of the frame image (here, at least a partial region showing the cup 180) and stores the image in the storage unit 534.

[0150] Specifically, for example, for an area other than a predetermined area in the first frame image (e.g., frame image F2), comparison unit 532a compares the first frame image with the second frame image in the same manner as in the first embodiment. Then, comparison unit 532a determines whether the unit area is a changed area or a non-changed area, and stores the result in storage unit 534.

[0151] On the other hand, for a predetermined region of the first frame image (for example, frame image F2), comparison unit 532a compares the first frame image with the second frame image for each of multiple (for example, two) frame images. Then, comparison unit 532a determines whether the unit region is a changed region or a non-changed region, and stores the result in storage unit 534. Furthermore, for frame images that have not been compared, comparison unit 532a determines that all unit regions in the predetermined region are non-changed regions, and stores the result in storage unit 534. Therefore, for a predetermined region, only one frame image out of multiple consecutive frame images (for example, two) has a changed region. This makes it possible to reduce the amount of data to be stored.

[0152] Furthermore, for example, in a configuration in which, as described above, comparing section 532a stores data of the first frame image in storage section 534 at predetermined time intervals (for example, at least several seconds and at most several tens of seconds) regardless of whether the unit region is a changed region or a non-changed region, the predetermined time may be longer (for example, at least several tens of seconds and at most several minutes) for a predetermined region of the first frame image. In this case as well, comparing section 532a stores the predetermined region of the frame image in storage section 534 at a lower frame rate.

[0153] In the present embodiment, as described above, the comparison unit 532a reduces at least one of the resolution and the frame rate for at least a portion of the region of the frame image (for example, frame image F2) that shows the cup 180 and stores the reduced image in the storage unit 534. Unlike, for example, the surface of the substrate W, the cup 180 is unlikely to be a cause of processing defects. Furthermore, there is little need for high resolution for the cup 180 when checking the moving image. For this reason, by reducing at least one of the resolution and the frame rate for at least a portion of the region that shows the cup 180 and storing the reduced image in the storage unit 534, the amount of data stored in the storage unit 534 can be effectively reduced.

[0154] The other configurations, the flow of the monitoring method, and other effects of the second embodiment are the same as those of the first embodiment.

[0155] (Third embodiment) Next, a substrate processing system 1 according to a third embodiment will be described. The third embodiment differs from the first and second embodiments in that the comparison unit 532a reduces at least one of the resolution and the frame rate of the data based on a recipe and stores the data in the storage unit 534.

[0156] In this embodiment, the comparison unit 532a stores data in the storage unit 534 with a lower resolution or frame rate for a predetermined processing period based on the recipe. Specifically, the predetermined processing period may include, for example, at least one of step SA of loading the substrate W, step SB of holding the substrate W, step SD of releasing the holding of the substrate W, and step SE of unloading the substrate W. The predetermined processing period may also include a part of step SC of treating the substrate W. For example, the predetermined processing period may not include the periods around the start and stop of discharging the processing liquid during step SC of treating the substrate W, but may include the periods excluding the periods around the start and stop of discharging the processing liquid. In other words, for example, the predetermined processing period may include a period during which discharging of the processing liquid is stably performed. The predetermined processing period is set in advance by the user.

[0157] First, an example will be described in which the comparison unit 532a reduces the resolution of the frame image based on a recipe and stores it in the storage unit 534.

[0158] Specifically, the comparison unit 532a compares the first frame image with the second frame image based on the recipe for periods other than a predetermined processing period (for example, a period during which the discharge of the processing liquid is stably performed), in the same manner as in the first embodiment. Then, the comparison unit 532a determines whether a unit region (here, a region of one pixel) is a changed region or a non-changed region, and stores the data in the storage unit 534.

[0159] On the other hand, for a predetermined processing period (for example, a period during which the discharge of the processing liquid is being stably performed), the comparison unit 532a combines a plurality of unit areas (for example, four) into one new unit area P20 (see FIG. 9). Then, the comparison unit 532a stores the data (pixel values) of the new unit area P20 in the storage unit 534. At this time, the comparison unit 532a, for example, averages the data (pixel values) of the plurality of unit areas to set the data (pixel values) of the new unit area P20. Note that the comparison unit 532a, for example, reduces the resolution of the entire frame image and stores it in the storage unit 534.

[0160] Next, an example will be described in which the comparison unit 532a reduces the frame rate of the frame images based on a recipe and stores them in the storage unit 534.

[0161] Specifically, for example, the comparison unit 532a compares the first frame image with the second frame image based on the recipe for a period other than a predetermined processing period (for example, a period during which the discharge of the processing liquid is stably performed), in the same manner as in the first embodiment. Then, the comparison unit 532a determines whether the unit region is a changed region or a non-changed region, and stores the result in the storage unit 534.

[0162] On the other hand, for a predetermined processing period (for example, a period during which the discharge of processing liquid is being performed stably), the comparison unit 532a compares the first frame image with the second frame image for each of a plurality of frame images (for example, two). The comparison unit 532a then determines whether a unit region is a changed region or a non-changed region, and stores the data in the storage unit 534. Furthermore, for frame images that were not compared, the comparison unit 532a determines that all unit regions are non-changed regions, and stores the data in the storage unit 534. As a result, only one frame image out of a plurality of consecutive frame images (for example, two) will have a changed region. This makes it possible to reduce the amount of data to be stored.

[0163] Furthermore, for example, in a configuration in which, as described above, comparing section 532a stores data of the first frame image in storage section 534 at predetermined time intervals (for example, at least several seconds and at most several tens of seconds), regardless of whether the unit region is a changed region or a non-changed region, the predetermined time for the predetermined processing period may be longer (for example, at least several tens of seconds and at most several minutes). In this case as well, comparing section 532a stores the frame images in storage section 534 at a lower frame rate.

[0164] In this embodiment, as described above, the comparison unit 532a reduces at least one of the resolution and the frame rate for a predetermined processing period based on the recipe, and stores the data in the storage unit 534. Therefore, by storing frame image data corresponding to a processing period in which processing defects are unlikely to occur (for example, a period in which the discharge of processing liquid is stably performed) in the storage unit 534 with at least one of the resolution and the frame rate reduced, the amount of data stored in the storage unit 534 can be effectively reduced.

[0165] Other configurations, the flow of the monitoring method, and other effects of the third embodiment are similar to those of the first and second embodiments.

[0166] (First Modification) Next, a substrate processing system 1 according to a first modified example of the third embodiment will be described. Unlike the third embodiment, the first modified example will describe an example in which the comparison unit 532a reduces at least one of the resolution and the frame rate for a predetermined region of a frame image and stores the image in the storage unit 534.

[0167] In the first modified example, similar to the second embodiment, the comparison unit 532a reduces at least one of the resolution and frame rate for a predetermined region of the first frame image (for example, frame image F2) and stores the image in the storage unit 534. That is, in the first modified example, the comparison unit 532a reduces at least one of the resolution and frame rate for the first frame image corresponding to a predetermined processing period based on a recipe and stores the data of the predetermined region of the first frame image in the storage unit 534.

[0168] In the first modified example, as described above, the comparison unit 532a reduces at least one of the resolution and the frame rate of the first frame image corresponding to a predetermined processing period based on the recipe and stores the data of a predetermined region in the storage unit 534. Therefore, by reducing at least one of the resolution and the frame rate of the data of a processing period in which processing defects are unlikely to occur and of a region in which processing defects are unlikely to occur in the storage unit 534, the amount of data stored in the storage unit 534 can be effectively reduced.

[0169] The other configurations, the flow of the monitoring method, and other effects of the first modified example are similar to those of the second and third embodiments.

[0170] (Fourth embodiment) Next, a substrate processing system 1 according to a fourth embodiment will be described with reference to Figures 10 and 11. Figure 10 is a block diagram of the substrate processing system 1 according to the fourth embodiment. Unlike the first to third embodiments, the fourth embodiment will be described as an example in which a determination unit 532c that determines whether or not there is an abnormality in the processing is provided.

[0171] In this embodiment, as shown in FIG. 10 , the control unit 532 of the control device 530 includes a determination unit 532c. The determination unit 532c determines whether or not there is a processing abnormality based on a plurality of composite frame images generated by the composition unit 532b. For example, the determination unit 532c may compare a video consisting of a plurality of composite frame images to be investigated for a processing abnormality with a video of a previous process performed using the same recipe to determine whether or not there is a processing abnormality. In this case, the determination unit 532c may compare the two videos and determine that there is a processing abnormality if the proportion of unit areas with different pixel values, etc., is equal to or greater than a predetermined value. Alternatively, the determination unit 532c may use, for example, a machine-learned program to compare the two videos and determine whether or not there is a processing abnormality.

[0172] Other configurations of the fourth embodiment are the same as those of the first to third embodiments.

[0173] Next, a monitoring method according to the fourth embodiment will be described with reference to Fig. 11. Fig. 11 is a flow diagram of the monitoring method according to the fourth embodiment. The monitoring method according to the fourth embodiment includes steps S101 to S107 and step S109. Step S109 is an example of the "step of determining whether or not there is an abnormality in the processing" of the present invention. Note that in the fourth embodiment, the monitoring method may include step S108 of Fig. 8 between steps S107 and S109.

[0174] As shown in FIG. 11, steps S101 to S107 are executed in the same manner as in the first embodiment.

[0175] Next, in step S109, the judgment unit 532c compares the video to be investigated for processing abnormalities with a video from a previous process using the same recipe (e.g., a video that serves as a judgment standard) to determine whether there was an abnormality in the processing.

[0176] Then, the determination unit 532c outputs the determination result to, for example, a notification device such as a speaker or an LED lamp, the display device 540, and / or the control device 101. This allows the user to easily know whether or not there is an abnormality in the processing.

[0177] In this embodiment, as described above, the determination unit 532c determines whether or not there is a processing abnormality based on the multiple composite frame images generated by the composition unit 532b. Therefore, the user can easily know whether or not there is a processing abnormality.

[0178] Other flow of the monitoring method and other effects of the fourth embodiment are similar to those of the first to third embodiments.

[0179] The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and can be embodied in various forms without departing from the spirit and scope of the present invention. Furthermore, various inventions can be formed by appropriately combining multiple components disclosed in the above embodiments. For example, some components may be omitted from all components shown in the embodiments. Furthermore, components from different embodiments may be appropriately combined. The drawings mainly show each component in a schematic manner to facilitate understanding. The thickness, length, number, spacing, etc. of each component shown may differ from the actual thickness, length, number, spacing, etc. of each component shown in the above embodiments due to the convenience of drawing. Furthermore, the materials, shapes, dimensions, etc. of each component shown in the above embodiments are merely examples and are not particularly limited. Various modifications are possible within a scope that does not substantially deviate from the effects of the present invention.

[0180] For example, in the above embodiment, the substrate processing apparatus 100 is of a single-substrate processing type, but the present invention is not limited to this. The substrate processing apparatus 100 may be of a batch type that processes a plurality of substrates W at once.

[0181] Furthermore, in the above embodiment, an example was described in which a first frame image (e.g., frame image F2) was compared with at least the frame image immediately preceding the first frame image (e.g., frame image F1), but the present invention is not limited to this. For example, when storing first frame image data every predetermined time (e.g., at least several seconds and not more than several tens of seconds), a new first frame image may be compared with the frame image stored every predetermined time.

[0182] In the above embodiment, the monitoring apparatus 500 includes the control unit 532, and the control unit 532 executes the monitoring method. However, the present invention is not limited to this. For example, the control unit 102 of the substrate processing apparatus 100 may also function as the control unit 532. In other words, the control unit 102 may execute the monitoring method.

[0183] Furthermore, in the above embodiment, an example has been described in which the monitoring device 500 includes the display device 540, but the present invention is not limited to this.

[0184] Furthermore, in the above embodiment, an example has been described in which comparison section 532a stores data of the first frame image in storage section 534 at predetermined time intervals regardless of whether the unit region is a changed region or a non-changed region, but the present invention is not limited to this. Comparison section 532a does not have to store data of the first frame image in storage section 534 at predetermined time intervals. [Industrial Applicability]

[0185] The present invention is suitably used in a substrate processing system and a monitoring method. [Explanation of symbols]

[0186] 1: Substrate processing system 112: Chamber 120: Board holding part 180: Cup (processing liquid cup) 510: Imaging device 532a: Comparison section 532b:Synthesis section 532c: Judgment section 534: Storage section F1, F2, F11~F13: Frame images P1~P4: Unit area S102: Step (frame image generation process) S103: Step (comparison process) S104: Step (Step of determining whether the unit area is a changed area or a non-changed area) S105: Step (storing step) S107: Step (process for generating a composite frame image) S109: Step (process for determining whether or not there is a processing abnormality) W: Substrate

Claims

1. a chamber for accommodating a substrate to be treated with a treatment liquid; an imaging device that captures images of the inside of the chamber at a predetermined frame rate to generate a plurality of frame images; a comparison unit that compares a first frame image of the plurality of frame images with at least one second frame image that was generated before the first frame image; Memory section and Equipped with each of the frame images has a plurality of unit areas each including one or more pixels; The comparison unit comparing the first frame image and the second frame image for each corresponding unit area, and determining whether each unit area is a changed area or a non-changed area; The comparison unit uses, as the first frame image, For the changed region, the data of the first frame image is stored in the storage unit; For the non-changing region, a reference value indicating the second frame image to be referenced is stored in the storage unit.

2. the unit area includes one pixel, 2. The substrate processing system according to claim 1, wherein the comparison unit compares the first frame image with the second frame image for each corresponding pixel.

3. 3. The substrate processing system according to claim 1, wherein the comparison unit compares pixel values ​​of the unit area of ​​the first frame image with pixel values ​​of the unit area of ​​the second frame image.

4. The comparison unit determining that the unit region is the changed region when a difference between a pixel value of the unit region in the first frame image and a pixel value of the unit region in the second frame image is equal to or greater than a threshold value; 4. The substrate processing system according to claim 3, wherein the unit area is determined to be the non-changed area when a difference between a pixel value of the unit area in the first frame image and a pixel value of the unit area in the second frame image is less than the threshold value.

5. The comparison unit, regardless of whether the unit area is the changed area or the non-changed area, compares the first frame image with the first frame image at every predetermined time.

3. The substrate processing system according to claim 1, wherein the data of the first frame image for the changed region and the non-changed region is stored in the storage unit.

6. a substrate holder for holding the substrate; a processing liquid cup that surrounds the substrate holder and receives the processing liquid that splashes from the substrate; Equipped with 3. The substrate processing system according to claim 1, wherein the comparison unit reduces at least one of a resolution and a frame rate for at least a portion of the frame image showing the processing liquid cup and stores the frame image in the storage unit.

7. the storage unit stores a processing recipe that defines processing conditions for the substrate; 3. The substrate processing system according to claim 1, wherein the comparison unit reduces at least one of the resolution and the frame rate for a predetermined processing period based on the processing recipe and stores the reduced value in the storage unit.

8. 8. The substrate processing system of claim 7, wherein the comparison unit stores the data of a predetermined region of the first frame image corresponding to the predetermined processing period in the memory unit by lowering at least one of a resolution and a frame rate based on the processing recipe.

9. 3. The substrate processing system of claim 1, further comprising a synthesis unit that generates a composite frame image corresponding to the first frame image by synthesizing the data of the changed area of ​​the first frame image with the data of the unit area of ​​the second frame image corresponding to the reference value.

10. The substrate processing system according to claim 9 , further comprising a determination unit that determines whether or not there is an abnormality in the processing based on the plurality of composite frame images generated by the composition unit.

11. capturing an image of the interior of a chamber accommodating a substrate to be treated with a treatment liquid at a predetermined frame rate to generate a plurality of frame images each having a plurality of unit areas each including one or more pixels; a step of comparing a first frame image of the plurality of frame images with at least one second frame image generated before the first frame image for each corresponding unit area; determining whether each of the unit regions is a changed region or a non-changed region; As the first frame image, For the changed region, the data of the first frame image is stored in a storage unit; a step of storing a reference value indicating the second frame image to be referenced in the storage unit for the non-changed region; A monitoring method, including:

12. the unit area includes one pixel, 12. The monitoring method according to claim 11, wherein in the comparing step, the first frame image and the second frame image are compared for each corresponding pixel.

13. 13. The monitoring method according to claim 11, wherein in the comparing step, pixel values ​​of the unit area of ​​the first frame image are compared with pixel values ​​of the unit area of ​​the second frame image.

14. In the determining step, determining that the unit region is the changed region when a difference between a pixel value of the unit region in the first frame image and a pixel value of the unit region in the second frame image is equal to or greater than a threshold value; The monitoring method according to claim 13, wherein the unit area is determined to be the non-changing area when a difference between the pixel values ​​of the unit area in the first frame image and the pixel values ​​of the unit area in the second frame image is less than the threshold value.

15. 13. The monitoring method according to claim 11 or 12, wherein in the storing step, the data of the first frame image for the changing area and the non-changing area is stored in the storage unit as the first frame image at predetermined time intervals, regardless of whether the unit area is the changing area or the non-changing area.

16. A monitoring method as described in claim 11 or claim 12, wherein in the storing step, at least a portion of the frame image showing a processing liquid cup that receives the processing liquid splashed from the substrate is stored in the memory unit with at least one of the resolution and frame rate lowered.

17. 13. The monitoring method according to claim 11, wherein in the storing step, at least one of the resolution and the frame rate is lowered for a predetermined processing period based on a processing recipe that defines processing conditions for the substrate, and the data is stored in the storage unit.

18. 18. The monitoring method according to claim 17, wherein in the storing step, the data of a predetermined region in the first frame image corresponding to the predetermined processing period is stored in the storage unit with at least one of a resolution and a frame rate reduced based on the processing recipe.

19. 13. The monitoring method according to claim 11, further comprising a step of generating a composite frame image corresponding to the first frame image by combining the data of the changed region of the first frame image with the data of the unit region of the second frame image corresponding to the reference value.

20. The monitoring method according to claim 19, further comprising a step of determining whether or not there is a processing abnormality based on the plurality of composite frame images generated in the step of generating the composite frame image.

Images