PVD target and use of the same

Abstract

To provide a PVD target and use in a cooking device.SOLUTION: A PVD target is constituted of 10 to 30% of silicon and residual metal when calculated in mass percentage, where the metal contains one or a plurality of chromium, zirconium and titanium, and after physical vapor deposition, a composite film made of metal, silicon, metal nitride, silicon nitride and metal silicide is formed on a metal substrate surface. In the composite film, by combining substances of different particle diameters, the composite film is tightly bound and isolates air, a gap that a single element target has by forming a PVD film can be avoided, so that can be guaranteed such that the surface hardness of a metal substrate is enhanced, a PVD layer does not discolor even if heated, and the PVD layer has excellent non-stick characteristics, and a surface is easily cleaned.SELECTED DRAWING: None

Description

[Technical Field]

[0001] This application relates to the field of surface coating technology, and more particularly to PVD targets and their applications. [Background technology]

[0002] Currently, stainless steel cookware is widely popular due to its excellent durability and relatively low cost. However, typical stainless steel cookware is prone to heat-induced discoloration during use, and its uneven surface structure easily attracts dirt and dust, making cleaning extremely inconvenient. To provide nonstick properties and effectively address the heat-induced discoloration problem, the cookware surface is typically coated with polytetrafluoroethylene. While polytetrafluoroethylene coatings are nontoxic at room temperature, they begin to evaporate when heated to 260°C and decompose at temperatures up to 350°C. Therefore, the operating temperature of polytetrafluoroethylene-coated stainless steel cookware is generally limited to no more than 250°C. However, common cookware, such as frying pans, frequently exceed 260°C, posing safety risks. Furthermore, the polytetrafluoroethylene coating has poor abrasion resistance, making it susceptible to flaking and accidental ingestion, potentially resulting in health problems. To solve the above problems, people have gradually applied physical vapor deposition (PVD) technology, which forms a layer of physical vapor deposition on the metal surface, to stainless steel cookware. In order for the stainless steel cookware to have non-stick properties, the PVD layer must have a textured structure. However, conventional PVD layers are prone to discoloration at high temperatures, and conventional PVD layers with a textured structure are prone to accumulating dirt and dust, making them very inconvenient to clean. Summary of the Invention [Problem to be solved by the invention]

[0003] To solve the problems of the PVD layer existing in the related art being easily discolored and prone to accumulating dirt and dust, the present application provides a PVD target and its use. [Means for solving the problem]

[0004] In a first aspect, the present application provides a sterilant, which uses the following technical solution: A PVD target, calculated by mass percentage, is composed of 10 to 30% silicon and the remainder metal, the metal including one or more of chromium, zirconium, or titanium.

[0005] By using the above technical solution, the PVD target provided in the present application can form a composite film consisting of metal, silicon, metal nitride, silicon nitride, and metal silicide on the surface of the metal substrate after physical vapor deposition. This composite film is made by combining materials with different particle sizes, which allows the composite film to be firmly bonded and isolates air, avoiding the gaps that would occur when a single-element target forms a PVD film. Therefore, the PVD layer formed by the PVD target provided in the present application can strengthen the surface hardness of the metal substrate, ensure that the PVD layer does not discolor when heated, has good non-stick properties, and is easy to clean.

[0006] Preferably, calculated by mass percentage, the PVD target comprises 15 to 20% silicon and the remainder chromium.

[0007] By using silicon and chromium as the PVD target, the present application can ensure that the cost of the PVD target is low, while ensuring that the PVD layer formed by the PVD target has good non-stick properties and can prevent the PVD layer from discoloring due to heating.

[0008] Preferably, calculated by mass percentage, the PVD target is composed of 15-20% silicon and the remaining metals, the metals being chromium and titanium.

[0009] The present application can ensure that the PVD layer formed by the PVD target has high hardness by configuring the PVD target with silicon, chromium and titanium.

[0010] Preferably, the titanium content is 0.001 to 3 wt % based on the total metal content.

[0011] By limiting the content of the titanium element, the present application controls the cost of the PVD target while ensuring that the PVD layer formed using the PVD target has high hardness, thereby avoiding a decrease in hardness due to an excessively low titanium content, and avoiding the imbalance between cost and hardness improvement due to an increase in the titanium content.

[0012] Preferably, calculated by mass percentage, the PVD target comprises 15-20% silicon and the remaining metals, which are chromium, zirconium and titanium.

[0013] In the present application, by constructing a PVD target using silicon, chromium, zirconium, and titanium, the PVD layer formed using the PVD target can be provided with high hardness while maintaining the hardness of the formed PVD layer equivalent to that of stainless steel.

[0014] Preferably, the titanium content is 0.001 to 3 wt % based on the total metal content.

[0015] By limiting the content of the titanium element, the present application controls the cost of the PVD target while ensuring that the PVD layer formed using the PVD target has high hardness, thereby avoiding a decrease in hardness due to an excessively low titanium content, and avoiding the imbalance between cost and hardness improvement due to an increase in the titanium content.

[0016] In a second aspect, the present application provides a use of the PVD target in a cookware, and in the present invention, the cookware is a cookware, preferably including heatable cookware such as a wok, soup pot, rice cooker liner, electric pressure cooker liner, electric pot, frying pan, etc.

[0017] Preferably, the PVD target is deposited onto the inner metal layer of the cookware by a PVD process to form a PVD coat.

[0018] By using the above method, the present application can ensure that the cookware has high hardness and non-stick properties, while also ensuring that the cookware is easy to clean and is less likely to discolor due to heat.

[0019] Preferably, the thickness of the PVD coating is 0.8 to 3 μm.

[0020] By limiting the thickness of the PVD coating, the present application can ensure that the PVD coating will not be caused to come off during use.

[0021] Preferably, the surface roughness of the inner metal layer is Ra≧0.15.

[0022] By limiting the surface roughness of the inner metal layer, the present application can ensure that the PVD target is deposited on the surface of the inner metal layer in the physical vapor deposition process without the need for a concave-convex structure.

[0023] In summary, the present application has the following beneficial effects: 1. The PVD target provided in the present application is composed of 10-30% silicon and the remaining metal, the metal including one or more of chromium, zirconium, and titanium, and when physical vapor deposition is performed using the PVD target provided in the present application, a composite film consisting of metal, silicon, metal nitride, silicon nitride, and metal silicide can be formed on the surface of a metal substrate, and this composite film is formed by combining materials with different particle sizes, which allows the composite film to be tightly bonded and isolates air, avoiding the gaps that would occur when a single-element target forms a PVD film. Therefore, the PVD layer formed by the PVD target provided in the present application can strengthen the surface hardness of the metal substrate, ensure that the PVD layer does not discolor when heated, and ensure that the PVD layer has good non-stick properties and is easy to clean.

[0024] 2. The PVD target provided by the present application does not require the surface of the metal substrate to be limited to a textured structure during the physical vapor deposition process, and preferably only requires the surface roughness of the metal layer to be Ra≧0.15. The PVD target provided by the present application can be guaranteed to be applicable to ordinary metal surfaces, and is easy to promote and use. [Brief explanation of the drawings]

[0025] [Figure 1] FIG. 1 is a photograph of the alloy bowls having PVD coatings in Example 1 and Comparative Example 2 of the present application after being left standing in an environment of 250° C. for half an hour. [Figure 2] FIG. 2 is a photograph of the alloy bowls having PVD coatings in Example 1 and Comparative Example 2 of the present application after being left standing in an environment of 300° C. for half an hour. [Figure 3] FIG. 3 is a photograph of the alloy bowls having PVD coatings in Example 1 and Comparative Example 2 of the present application after being left standing in an environment of 350° C. for half an hour. [Figure 4]FIG. 4 is a photograph of the alloy bowls having PVD coatings in Example 1 and Comparative Example 2 of the present application after being left standing in an environment of 400° C. for half an hour. [Figure 5] FIG. 5 is a photograph of the alloy bowl having a PVD coating in Example 1 of the present application after being subjected to an oil immersion cleaning treatment. [Figure 6] FIG. 6 is a photograph of the alloy bowl having a PVD coating in Comparative Example 2 of the present application after oil immersion and cleaning treatment. DETAILED DESCRIPTION OF THE INVENTION

[0026] The present application will be described in more detail below with reference to the specification, drawings and examples.

[0027] Example 1 1. Use of a PVD target in a cookware, comprising: In a deposition chamber, an alloy bowl with a surface roughness Ra of 0.5 and a PVD target are mounted at a distance of 50 cm. The chamber is evacuated to 4.5 x 10-3 Pa, then gradually heated from 25°C to 355°C over 30 minutes, and then evacuated to 2.5 x 10-3 Pa. A glow discharge is performed with Ar at a bias voltage of -800 V. A plasma surface cleaning treatment is performed for 25 minutes, and the PVD target is composed of 15% silicon and the remaining chromium by mass. Step 2: performing an etching process for 10 minutes at an Ar pressure of 2.5×10 Pa and a pulsed bias voltage of −600 V (80% duty cycle and 80 kHz frequency); The PVD coating was produced by reaction in a pure N2 atmosphere. During the deposition process, N2 was first injected and the pressure in the deposition chamber was set to 3.0 x 10 -3 Step 3: Adjust the temperature as follows: Pa; simultaneously, turn on the magnetron sputtering power supply; and deposit the alloy bowl with a PVD coating of 1.51 μm thick.

[0028] Example 2 Example 2 differs from Example 1 in that the PVD target, calculated as a mass percentage, is composed of 15% silicon and the remaining chromium, as in Example 1, is changed to the PVD target, calculated as a mass percentage, is composed of 20% silicon and the remaining chromium.

[0029] Example 3 The difference from Example 1 is that "the PVD target, calculated in mass percentage, is composed of 15% silicon and the remainder chromium" in Example 1 is changed to "the PVD target, calculated in mass percentage, is composed of 15% silicon, 82% chromium, and 3% titanium."

[0030] Example 4 Example 4 differs from Example 1 in that the PVD target, calculated in mass percentage, is composed of 15% silicon and the remainder chromium, as in Example 1, is changed to the PVD target, calculated in mass percentage, is composed of 15% silicon, 84.9% chromium, and 0.1% titanium.

[0031] Example 5 Example 5 differs from Example 1 in that the PVD target, calculated in mass percentage, is composed of 15% silicon and the remainder chromium, is changed to the PVD target, calculated in mass percentage, is composed of 15% silicon, 41% chromium, 41% zirconium, and 3% titanium.

[0032] Comparative Example 1 Comparative Example 1 differs from Example 1 in that the PVD target, calculated in mass percentage, is composed of 15 to 20% silicon and the remainder chromium, is changed to the PVD target, calculated in mass percentage, is composed of 15% silicon, 80% chromium, and 5% titanium.

[0033] Comparative Example 2 Comparative Example 2 differs from Example 1 in that "the PVD target is composed of 15% silicon and the remaining chromium, calculated in mass percentage," in Example 1 is changed to "the PVD target is a commercially available PVD target."

[0034] Performance Detection Test The alloy bowls with PVD coating in Examples 1 to 5 and Comparative Examples 1 and 2 were treated at high temperatures, and the alloy bowls with PVD coating in Examples 1 to 5 and Comparative Examples 1 and 2 were left standing for half an hour in environments of 250°C, 300°C, 350°C, and 400°C, respectively, and the state of discoloration was observed. The results are shown in Table 1, and Figures 1 to 4 are photographs of the alloy bowls with PVD coating in Example 1 and Comparative Example 2 of the present application, respectively, after being left standing for half an hour in environments of 250°C, 300°C, 350°C, and 400°C, and the alloy bowl with the PVD mark is the alloy bowl with PVD coating in Example 1.

[0035] Table 1. Discoloration status of Examples 1 to 5 and Comparative Examples 1 and 2 JPEG2025170183000001.jpg74170 The alloy bowls having PVD coating in Examples 1 to 5 and Comparative Examples 1 and 2 were subjected to an oil immersion cleaning treatment, and the cleaning results are shown in Table 2.

[0036] Table 2: Cleaning results for Examples 1 to 5 and Comparative Examples 1 and 2 JPEG2025170183000002.jpg33170 GB / T4342-1991 "Metal Micro Vickers Hardness Testing Method" conducted hardness tests on the alloy bowls with PVD coating in Examples 1 to 5 and Comparative Examples 1 and 2, and the cleaning results are shown in Table 3. FIG. 5 is a photograph of the alloy bowl with PVD coating in Example 1 of the present application that was subjected to oil immersion cleaning, and FIG. 6 is a photograph of the alloy bowl with PVD coating in Comparative Example 2 of the present application that was subjected to oil immersion cleaning.

[0037] Table 3: Hardness test results for Examples 1 to 5 and Comparative Examples 1 and 2 JPEG2025170183000003.jpg18159A non-stick performance test was conducted on the alloy bowls with PVD coating in Examples 1 to 5 and Comparative Examples 1 and 2. The test method was to pour an appropriate amount of vegetable oil into the alloy bowl, wipe the non-stick surface with a soft cloth until the coating was uniform, wash it with warm water above 60°C and neutral detergent, then wash it with clean water and wipe it clean, and then place the cookware on an electric stove with a rated voltage of 220V and an output power of 1kW. Place the egg on a baking tray and heat until the PVD plating reaches a surface temperature of 150-170°C (measured with a surface thermometer with an accuracy of 2.5 or higher). When the temperature reaches 150-170°C, crack one fresh egg (50-60g, conforming to SB / T10277-1997 standard level 2) into the cooking utensil and cook until the egg is almost completely solidified (the surface temperature of the PVD plating must not exceed 210°C throughout the cooking process). Use a plastic spatula with a blade thickness of 0.2-0.5mm to completely remove the egg. If any egg residue remains, gently wipe it off with a damp sponge or gauze. Repeat steps c) and d) three times. The results are shown in Table 4.

[0038] Table 4. Non-stick performance test results for Examples 1 to 5 and Comparative Examples 1 and 2 JPEG2025170183000004.jpg20160As can be seen from Tables 1-4 and Figures 1-6 of Examples 1-5 and Comparative Examples 1-2, the PVD target provided by the present application for use in cookware can enhance the surface hardness of metal substrates. The PVD plating provided by the present application is more than eight times harder than ordinary steel. Furthermore, the PVD layer of the PVD target provided by the present application does not discolor when heated, has excellent non-stick properties, and the surface is easy to clean. Furthermore, by limiting the titanium content, the present application avoids the imbalance between cost and hardness improvement that occurs when increasing the titanium content.

[0039] Example 6 The sixth embodiment differs from the first embodiment in that the "thickness of 1.51 μm" in the first embodiment is changed to "thickness of 2.4 μm."

[0040] Comparative Example 3 Comparative Example 3 differs from Comparative Example 2 in that "surface roughness Ra is 0.5" in Comparative Example 2 is changed to "surface roughness Ra is 0.5".

[0041] The hardness test was carried out on the alloy bowls with PVD coating in Example 6 and Comparative Example 3 according to GB / T4342-1991 "Metal Micro Vickers Hardness Testing Method", and the hardness test results are shown in Table 5.

[0042] Table 5. Hardness test results for Examples 1 and 6 and Comparative Example 3 JPEG2025170183000005.jpg18128 The alloy bowls having PVD coating in Examples 1 and 6 and Comparative Example 3 were subjected to a non-stick performance test. Pour a moderate amount of vegetable oil into the alloy bowl and wipe the nonstick surface with a soft cloth until the coating is even. Wash with warm water (>60°C) and a mild detergent, then rinse with clean water and wipe clean. Place the cookware on a 220V, 1kW electric stove and heat it. Measure with a surface thermometer with an accuracy of at least 2.5. When the PVD surface temperature reaches 150-170°C, crack one fresh egg (50-60g, conforming to SB / T10277-1997 standard level 2) into the cookware. Place the egg in the cookware until the egg is almost completely solidified (the PVD surface temperature must not exceed 210°C throughout the cooking process). Use a plastic spatula with a blade thickness of 0.2-0.5mm to remove any remaining egg residue. Gently wipe it off with a damp sponge or gauze. Repeat steps c) and d) three times. The results are shown in Table 6.

[0043] Table 6. Non-stick performance test results for Examples 1 and 6 and Comparative Example 3 JPEG2025170183000006.jpg26128 Referring to Tables 5-6 for Examples 1 and 6 and Comparative Example 3, the PVD target provided herein forms a PVD coating by physical vapor deposition, which provides high hardness and non-stick performance on metal surfaces with different surface roughnesses, and the thickness of the PVD coating formed by vapor deposition does not affect its hardness or non-stick performance. Commercially available PVD targets are unable to form PVD coatings with non-stick performance on metal surfaces. This is because conventional PVD targets rely solely on the original texture of the substrate after forming a PVD coating to ensure overall non-stick performance. A PVD coating formed by a conventional PVD target can provide overall non-stick performance even if the substrate surface does not have a textured surface. However, the PVD target provided herein does not require a textured substrate surface, and instead forms a dense PVD coating on a smooth metal surface to ensure non-stick performance.

[0044] The specific examples are merely illustrative of the present application and do not limit the present application. After reading this specification, a person skilled in the art may make amendments to the examples as necessary without making any creative contribution, but all such amendments within the scope of the claims of the present application shall be protected by the Patent Law.

Claims

1. 1. A PVD target comprising: Calculated by mass percentage, the PVD target is composed of 10-30% silicon and the remainder metal, which may include one or more of chromium, zirconium, or titanium. PVD target characterized by:

2. Calculated by mass percentage, the PVD target is composed of 15-20% silicon and the remainder chromium.

2. The PVD target of claim 1.

3. Calculated by mass percentage, the PVD target is composed of 15-20% silicon and the remaining metals, which are chromium and titanium.

2. The PVD target of claim 1.

4. The titanium content is 0.001 to 3 wt % based on the total metal content.

4. The PVD target of claim 3.

5. Calculated by mass percentage, the PVD target is composed of 15-20% silicon and the remainder metals, which are chromium, zirconium, and titanium.

2. The PVD target of claim 1.

6. The titanium content is 0.001 to 3 wt % based on the total metal content.

6. The PVD target of claim 5.

7. Use of the PVD target according to any one of claims 1 to 6 in a cookware.

8. The PVD target is deposited onto the inner metal layer of the cookware by a PVD process to form a PVD coating.

8. Use according to claim 7.

9. The thickness of the PVD coating is 0.8 to 3 μm.

9. Use according to claim 8.

10. The surface roughness of the inner metal layer is Ra≧0.

15.

9. Use according to claim 8.

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