Photocurable compositions having improved thermal stability

Abstract

The photocurable composition includes a polymerizable material and a photopolymerization initiator, and the polymerizable material can include a first polymerizable monomer having a structure of formula (1) or formula (2). [Formula 1] JPEG2025503368000039.jpg19121However, X is C1-C4-alkyl or oxygen (O), n is 0 or 1, Y1 and Y2 are [Case 2] JPEG2025503368000040.jpg3389, R3 is H or methyl, where Y1 and Y2 can be the same or different, and the amount of Y1 and Y2 per benzene ring is 1, 2, or 3; R1, R2 are substituted or unsubstituted alkyl or aryl, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4.

Description

[Technical field]

[0001] The present invention relates to a photocurable composition, and in particular to a photocurable composition suitable for forming a photocurable layer for inkjet compatible planarization. [Background technology]

[0002] Inkjet adaptive planarization (IAP) is a process of planarizing the surface of a substrate, e.g., a wafer containing electrical circuitry, by jetting droplets of a photocurable composition onto the surface of the substrate and directly contacting the applied liquid with a planar superstrate to form a planar liquid layer. The planar liquid layer is typically cured by exposure to UV light, and after removal of the superstrate, a planar polymer surface is obtained that can be subjected to subsequent processing steps, e.g., baking, etching, and / or further deposition steps.

[0003] There is a need for improved IAP materials that yield planar photocurable layers with high etch resistance and good thermal stability during subsequent processing. Summary of the Invention

[0004] In one embodiment, the photocurable composition includes a photoinitiator and a polymerizable material, and the polymerizable material can include a first polymerizable monomer having a structure of Formula (1) or Formula (2). [ka] where X is C1-C4-alkyl or oxygen (O), n is 0 or 1, and Y1 and Y2 are [ka] and R3 is H or methyl, where Y1 and Y2 can be the same or different, and the amount of Y1 and Y2 per benzene ring is 1, 2, or 3; R1, R2 are substituted or unsubstituted alkyl or aryl, and the amount of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4.

[0005] In some embodiments, the first polymerizable monomer of the photocurable composition can include a structure selected from formula (3), (4), (5), or (6). [ka] where R3 is H or methyl, R1 and R2 are one or more alkyl, aryl, or alkylaryl, and may be the same or different, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4, and [ka] The amount of is 1 or 2 per benzene ring. [ka] The amount of is 1 or 2.

[0006] In another embodiment, the first polymerizable monomer of the polymerizable material can include a structure selected from formula (7), (8), (9), or (10). [ka] where R3 is H or methyl, R1 and R2 are one or more alkyl, aryl, or alkylaryl, and may be the same or different, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4, and [ka] The amount of is 1 or 2 per benzene ring. [ka] The amount of is 1 or 2.

[0007] In an embodiment of the photocurable composition, the first polymerizable monomer can be at least one monomer selected from the following structures: [ka]

[0008] In another embodiment, the polymerizable material includes at least one second monomer, and the at least one second monomer includes at least one acrylate monomer. In a particular embodiment, the at least one acrylate monomer of the second monomer can include at least two multifunctional acrylate monomers. In a particular embodiment, the at least one acrylate monomer can include at least one monofunctional acrylate monomer and at least one multifunctional acrylate monomer.

[0009] In one embodiment, the amount of the polymerizable material in the photocurable composition may be 80 wt % or more, based on the total weight of the photocurable composition.

[0010] In another embodiment, the viscosity of the photocurable composition at 23° C. may be 50 mPa·s or less.

[0011] In certain embodiments, the photocurable composition may include a solvent in an amount of 15 vol % or greater, based on the total volume of the photocurable composition.

[0012] In another particular embodiment, the photocurable composition is essentially free of solvent.

[0013] In yet another embodiment of the photocurable composition, the amount of the first monomer can be 5 wt% or more and 90 wt% or less based on the total weight of the photocurable composition. In a particular embodiment, the amount of the first monomer can be 30 wt% or more based on the total weight of the polymerizable material.

[0014] In one embodiment, the photocurable composition may be adapted for use in inkjet adaptive planarization (IAP) or nanoimprint lithography (NIL).

[0015] In another embodiment, a laminate includes a substrate and a photocurable layer overlying the substrate, the photocurable layer may be formed from a photocurable composition as described above in this disclosure.

[0016] In one embodiment, the photocured layer of the laminate can have a carbon content of 70% or greater.

[0017] In another embodiment of the laminate, the photocurable layer may have a thermal stability of 250° C. or more.

[0018] In one embodiment, a method of forming a photocurable layer on a substrate includes applying a layer of a photocurable composition on the substrate, the photocurable composition comprising a photoinitiator and a polymerizable material, the polymerizable material comprising a first polymerizable monomer having a structure of Formula (1) or Formula (2). [ka] where X is C1-C4-alkyl or oxygen (O), n is 0 or 1, and Y1 and Y2 are [ka] and R3 is H or methyl, where Y1 and Y2 can be the same or different and the amount of Y1 and Y2 per benzene ring is 1, 2, or 3, R1, R2 are substituted or unsubstituted alkyl or aryl and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4, and the method further comprises contacting the photocurable composition with a template or superstrate; irradiating the photocurable composition with light to form a photocured layer; and removing the template or superstrate from the photocured layer.

[0019] In one embodiment of the method, the first polymerizable monomer can include at least one second monomer, and the at least one second monomer can include at least one acrylate monomer.

[0020] In another embodiment, a method of forming an article may include applying a layer of the above-described photocurable composition onto the substrate, contacting the photocurable composition with a template or superstrate, irradiating the curable composition with light to form a cured layer, removing the template or superstrate from the photocurable layer, forming a pattern on the substrate, treating the substrate with the pattern formed in the forming step, and manufacturing an article from the substrate treated in the treating step. [Brief description of the drawings]

[0021] Embodiments are illustrated by way of example and not limitation in the accompanying figures.

[0022] [Figure 1] FIG. 1 includes a graph illustrating a TGA curve of a photocurable material according to an embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0023] The following description is provided to aid in understanding the teachings disclosed herein and focuses on specific implementations and embodiments of the teachings. This focus is provided to help explain the teachings and should not be construed as a limitation on the scope or applicability of the teachings.

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The materials, methods, and examples are illustrative only and are not intended to be limiting. To the extent not described herein, many details regarding specific materials and processing operations are conventional and can be found in imprint and lithography technology textbooks and other sources.

[0025] As used herein, the terms "comprises," "comprising," "includes," "including," "has," "having" or any other variations thereof are intended to cover an open-ended inclusion. For example, a process, method, article, or apparatus that includes a list of features is not necessarily limited to only those features and may include other features that are not expressly listed or that are inherent to such process, method, article, or apparatus.

[0026] As used herein, and unless expressly stated otherwise, "or" refers to an inclusive or, not an exclusive or. For example, a condition A or B is satisfied by any one of: A is true (or exists) and B is false (or does not exist), A is false (or does not exist) and B is true (or exists), and both A and B are true (or exist).

[0027] Additionally, the use of "a" or "an" is used to describe elements and components described herein. This is used merely for convenience to give a general sense of the scope of the invention. The specification should be read to include one or at least one, and the singular also includes the plural, unless it is clear that no plural is intended.

[0028] The present disclosure relates to photocurable compositions comprising a photoinitiator and a polymerizable material, where the polymerizable material may comprise a first polymerizable monomer having a structure of Formula (1) or Formula (2). [ka] where X is C1-C4-alkyl or oxygen (O), n is 0 or 1, and Y1 and Y2 are [ka] and R3 is H or methyl, where Y1 and Y2 can be the same or different, the amount of Y1 and Y2 per benzene ring is 1, 2, or 3, and R1, R2 are substituted or unsubstituted alkyl or aryl, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4. As used herein, unless otherwise indicated, the term "first polymerizable monomer" refers to a monomer having the structure of formula (1) or (2).

[0029] In one embodiment, the amount of the first polymerizable monomer can be 5 wt% or more, or 10 wt% or more, or 15 wt% or more, or 20 wt% or more, or 30 wt% or more, based on the total weight of the polymerizable material. In another aspect, the amount of the first polymerizable monomer can be 50 wt% or less, or 45 wt% or less, or 40 wt% or less, or 35 wt% or less, or 30 wt% or less, or 25 wt% or less, based on the total weight of the polymerizable material.

[0030] In certain embodiments, the first polymerizable monomer can include structures shown in formulas (3), (4), (5), and (6). [ka] where R3 is H or methyl, R1 and R2 are one or more alkyl, aryl, or alkylaryl, and may be the same or different, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4, and [ka] The amount of is 1 or 2 per benzene ring. [ka] is 1 or 2. In certain embodiments, R1 and R2 can independently be one or more C1-C5 alkyl.

[0031] In other embodiments, the first polymerizable monomer can have the structure shown in formulas (7), (8), (9), and (10). [ka] where R3 is H or methyl, R1 and R2 are one or more alkyl, aryl, or alkylaryl, and may be the same or different, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4, and [ka] The amount of is 1 or 2 per benzene ring. [ka] is 1 or 2. In certain embodiments, R1 and R2 can independently be one or more C1-C5 alkyl.

[0032] In certain embodiments, the first polymerizable monomer can include one of the following structures (11), (12), (13), (14), (15), (16), or (17). [ka]

[0033] At least one monomer falling within formulas (1) and (2) may have the advantage of a high carbon content, which may contribute to a high final carbon content in the formed photocured layer. In one embodiment, the carbon content of the at least one first monomer may be 80% or more, or 85% or more, or 90% or more, or 92% or more, or 93% or more, or 94% or more, based on the total weight of the first monomer.

[0034] In another embodiment, the at least one first monomer may have a vapor pressure at a temperature of 25° C. of 0.01 mmHg or less, or 0.005 mmHg or less, or 0.001 mmHg or less, or 0.0005 mmHg or less, or 0.0003 mmHg or less.

[0035] In certain embodiments, the at least one first monomer may have a carbon content of 92% or greater, based on the total weight of the at least one monomer, and a vapor pressure of 0.001 mmHg or less.

[0036] In further embodiments, the polymerizable material of the photocurable composition may include at least one second monomer that does not fall within formula (1) or formula (2) of the at least one first monomer.

[0037] In one embodiment, the at least one second monomer can include at least one acrylate monomer, such as two acrylate monomers, three acrylate monomers, four acrylate monomers, or five acrylate monomers. As used herein, the term "acrylate" refers to unsubstituted acrylate or alkyl-acrylate, such as methacrylate. In certain embodiments, the acrylate monomer can be at least one monofunctional acrylate monomer, at least one multifunctional acrylate monomer, or a combination thereof.

[0038] In another embodiment, the at least one second monomer can be a monofunctional monomer or a multifunctional monomer. In a particular embodiment, the at least one second monomer of the polymerizable material can include at least one difunctional acrylate monomer or at least one trifunctional acrylate monomer. In a further embodiment, the second monomer can include a non-acrylic monomer, such as a monofunctional or multifunctional vinylbenzene compound. In a particular embodiment, the vinylbenzene compound can be divinylbenzene.

[0039] The amount of polymerizable material in the photocurable composition can be 30 wt% or more, for example, 50 wt% or more, 60 wt% or more, 70 wt% or more, 80 wt% or more, 85 wt% or more, 90 wt% or more, or 95 wt% or more, based on the total weight of the photocurable composition. In another embodiment, the amount of polymerizable material can be 99 wt% or less, for example, 98 wt% or less, or 97 wt% or less, or 95 wt% or less, based on the total weight of the photocurable composition. The amount of polymerizable material can be any value between the minimum and maximum values ​​above. In a particular embodiment, the amount of polymerizable material can be 80 wt% or more and 98 wt% or less.

[0040] In another embodiment, the polymerizable material of the photocurable composition can include an amount of a polymerizable monomer, oligomer, or polymer in addition to at least one first polymerizable monomer and one second polymerizable monomer.

[0041] In one embodiment, the viscosity of the photocurable composition can be 50 mPa·s or less, e.g., 40 mPa·s or less, 30 mPa·s or less, 25 mPa·s or less, 20 mPa·s or less, 15 mPa·s or less, or 10 mPa·s or less. In another embodiment, the viscosity can be 2 mPa·s or more, or 3 mPa·s or more, or 5 mPa·s or more. As used herein, all viscosity values ​​refer to viscosities measured at a temperature of 23° C. using the Brookfield method using a Brookfield viscometer.

[0042] The photocurable composition can be adapted so that the photocured layer formed therefrom has high thermal stability. In one embodiment, the onset temperature of thermal degradation of the photocurable layer can be greater than 250°C, or greater than 300°C, or greater than 350°C, or greater than 375°C, or greater than 400°C. As used herein, onset thermal degradation temperature, also referred to as "thermal degradation temperature", refers to the temperature of the TGA curve where deviation of the curve from a nearly linear plateau is first observed, immediately prior to rapid degradation of the sample.

[0043] In one embodiment, the first photocurable composition of the present disclosure may be essentially free of solvent. As used herein, unless otherwise indicated, the term solvent refers to a compound that can dissolve or disperse polymerizable monomers, but does not itself polymerize during photocuring of the photocurable composition. The term "essentially free of solvent" herein refers to an amount of solvent that is 5 wt% or less based on the total weight of the photocurable composition. In certain aspects, the amount of solvent may be 3 wt% or less, 2 wt% or less, 1 wt% or less, or the photocurable composition may be free of solvent except for unavoidable impurities.

[0044] In other specific embodiments, the photocurable composition may include a solvent in an amount of 6 wt% or more, or 8 wt% or more, 10 wt% or more, 15 wt% or more, 20 wt% or more, 30 wt% or more, or 50 wt% or more, based on the total weight of the photocurable composition. In other embodiments, the amount of solvent may be 80 wt% or less, or 50 wt% or less, or 40 wt% or less, or 30 wt% or less, or 20 wt% or less, or 15 wt% or less.

[0045] One or more photoinitiators may be included in the photocurable composition to initiate photocuring of the composition when exposed to light.

[0046] In some embodiments, curing may be accomplished by a combination of photocuring and thermal curing.

[0047] The photocurable composition may further contain one or more optional additives. Non-limiting examples of the optional additives may be stabilizers, dispersants, solvents, surfactants, inhibitors, or any combination thereof.

[0048] The photocurable compositions of the present disclosure may be adapted for use in inkjet adaptive planarization (IAP) or nanoimprint lithography (NIL).

[0049] In one embodiment, the photocurable composition can be coated onto a substrate to form a photocured layer. As used herein, the combination of the substrate and the photocured layer overlying the substrate is referred to as a laminate.

[0050] The inclusion of at least one first monomer of the polymerizable material can contribute to a high carbon content in the formed photocurable layer. In an embodiment, the photocurable composition can be adapted such that the carbon content of the photocurable layer can be 70% or more, or 71% or more, 72% or more, 73% or more, 74% or more, or 75% or more. As used herein, the carbon content of the photocurable layer can be determined by elemental analysis using standard commercially available analytical measurement techniques.

[0051] In another embodiment, the photocurable layer of the laminate can have an Ohnishi number of 3.2 or less, or 3.0 or less, or 2.9 or less, or 2.8 or less, or 2.7 or less, or 2.6 or less. In another embodiment, the Ohnishi number can be 1.8, e.g., 1.9, 2.0 or more, 2.1 or more, 2.2 or more, or 2.3 or more.

[0052] In certain embodiments, the photocured layer may have a carbon content of 70% or greater and an Ohnishi number of 2.9 or less.

[0053] The present disclosure further relates to a method of forming a photocurable layer, which may include applying a layer of the above-described photocurable composition onto a substrate, contacting the photocurable composition with a template or superstrate, irradiating the photocurable composition with light to form a photocurable layer, and removing the template or superstrate from the photocurable layer.

[0054] The substrate and solidified layer may be subjected to additional processing, such as an etching process, to transfer an image corresponding to the pattern of one or both of the solidified layer and / or the patterned layer underlying the solidified layer to the substrate. The substrate may be further subjected to known steps and processes for device (article) manufacturing, including, for example, curing, oxidation, layering, deposition, doping, planarization, etching, formable material removal, dicing, bonding, and packaging.

[0055] The photocurable layer may be used as an interlayer insulating film in semiconductor devices such as LSI, system LSI, DRAM, SDRAM, RDRAM, and D-RDRAM, or as a resist film used in the semiconductor manufacturing process.

[0056] As further demonstrated in the examples, monomers corresponding to the chemical structure of formula (1) or (2) can have the advantages of high carbon content, low vapor pressure, and low viscosity, thereby making them suitable for inclusion in photocurable compositions compatible with IAP or NIL processing. The photocurable compositions can be used to form photocurable layers with only minor loss of monomer due to evaporation, resulting in photocurable layers with uniform structure, high etching resistance, and high thermal stability. Working Example

[0057] The following non-limiting examples illustrate the concepts described herein.

[0058] Example 1

[0059] Comparison of properties of first polymer examples

[0060] Table 1 includes representative monomers (11-17) that all conform to the structures of formulas (1) and (2), along with their calculated carbon content and calculated vapor pressure. It can be seen that the carbon content of the listed monomers 11-17 is greater than about 86%. When the two phenyl groups are directly bonded, the carbon content is greater than 92%.

[0061] Furthermore, the calculated vapor pressures for monomers 11-17 are below 0.0005 mmHg.

[0062] In contrast, benzyl acrylate (BA) and divinyl benzole (DVB), typical monomers for use in resist compositions in IAP and NIL processes, do not have this combination of high carbon content and low vapor pressure. Both DVB and BA have much higher vapor pressures, and BA has a much lower carbon content.

[0063] [Table 1]

[0064] photocurable composition

[0065] A series of photocurable compositions were prepared containing various amounts of monomers as shown in Table 1. The components of the polymerizable materials are outlined in Tables 2 and 3.

[0066] [Table 2]

[0067] [Table 3]

[0068] All photocurable compositions contained 1 wt% surfactant and 2 wt% photoinitiator next to the polymerizable material. Diacrylate A was m-xylylene diacrylate, diacrylate C was 5-ethenyl-1,3-phenyl acrylate, and triacrylate B was trimethylolpropane triacrylate.

[0069] From Tables 2 and 3, it can be seen that the presence of small amounts of monomers described herein as "at least one first polymerizable monomer" conforming to the general structure of Formula (1) or Formula (2) can result in an increase in the calculated carbon content of the polymerizable material of 2 percent or more. The carbon content of the polymerizable material was calculated based on the known molecular weight and amount of monomer of the polymerizable material. Furthermore, it was observed that the addition of monomers conforming to Formulas (1) and (2) does not adversely affect the viscosity, and does not result in an undesirable increase in viscosity above 50 mPa·s at 23° C.

[0070] It may further be observed that photocured layers made from the photocurable compositions may have increased thermal decomposition temperatures as compared to photocured layers formed from respective photocurable compositions that do not include one of the monomers 11-17 listed in Table 1.

[0071] The photocured layers were prepared by adding the respective resist composition between two glass slides, which had a distance of 300 microns from each other. The resist between the glass slides was photocured by applying 2.4 J of radiation energy. The photocured layers were analyzed by thermal analysis (TGA). TGA was performed using a LINSEIS STA PT1000 instrument (Linseis Messgeraete GmbH, Germany). All measurements were performed under nitrogen at a rate of 5 liters / h. The samples (approximately 25 mg per test) were heated at a rate of 20 °C / min and the weight loss was continuously recorded.

[0072] The TGA curves of some representative photocurable layer (S16, S17, and S18) and comparative photocurable layer C1 materials are shown in FIG. 1. It can be seen that all of the analyzed materials shown had decomposition temperatures above 350° C., except for C1. Furthermore, it can be seen that the addition of small amounts of the disclosed biphenyl-monomers can increase the thermal decomposition temperature of the materials. For example, a 10 wt % amount of monomer 16 (sample S16) can increase the thermal decomposition temperature of the respective composition C1 (containing only diacrylate-A) by about 30° C.

[0073] As used herein, thermal degradation temperature refers to the initial degradation temperature T(X), which is the temperature in the TGA curve where the deviation of the curve from a nearly linear plateau shape is first observed immediately prior to a rapid loss in mass of the sample, i.e., degradation.

[0074] Viscosity measurement

[0075] The viscosities of samples C1-C4 and S16-S18 were measured using a Brookfield DV-11+Pro viscometer with spindle #18. For each viscosity measurement, 6-7 ml of sample was taken, added to the sample chamber, and allowed to equilibrate for 15-20 minutes until the target temperature of 23°C was reached. Viscosity was measured at a speed of 135 rpm with spindle #18. For each sample, measurements were repeated three times and the average value was calculated.

[0076] The viscosities of samples S1 to S13 were calculated according to the following formula.

number

[0077] The specification and illustrations of the embodiments described herein are intended to provide a general understanding of the structure of the various embodiments. The specification and illustrations are not intended to be exhaustive and comprehensive descriptions of all of the elements and features of the apparatus and systems that use the structures or methods described herein. Separate embodiments may also be provided in combination in a single embodiment, and conversely, for brevity, various features described in the context of a single embodiment may be provided separately or in any subcombination. Furthermore, references to values ​​described in ranges include each and every value within that range. Many other embodiments may be apparent to those skilled in the art only after reading this specification. Other embodiments may be used and derived from this disclosure, such that structural substitutions, logical substitutions, or other changes may be made without departing from the scope of this disclosure. Thus, this disclosure should be considered illustrative rather than limiting.

Claims

1. A photocurable composition comprising a polymerizable material and a photopolymerization initiator, the polymerizable material comprising a first polymerizable monomer having a structure represented by formula (1) or (2). 【Chemistry 1】 however, X is C 1 -C 4 - alkyl or oxygen (O), n is 0 or 1; Y 1 , Y 2 teeth, 【Chemistry 2】 and R 3 is H or methyl, where Y 1 and Y 2 are the same or different, and Y per benzene ring 1 and Y 2 is 1, 2, or 3; R 1 , R 2 is a substituted or unsubstituted alkyl or aryl, and R per benzene ring 1 and R 2 Each amount of is 0, 1, 2, 3, or 4.

2. 2. The photocurable composition of claim 1, wherein the first polymerizable monomer comprises a structure selected from formula (3), (4), (5), or (6). 【Chemistry 3】 Here, R 3 is H or methyl, R 1 and R 2 is one or more alkyl, aryl, or alkylaryl, which may be the same or different, and R 1 and R 2 is 0, 1, 2, 3, or 4, and 【Chemistry 4】 The amount of is 1 or 2, and 【Chemistry 5】 The amount of is 1 or 2.

3. 2. The photocurable composition of claim 1, wherein the first polymerizable monomer comprises a structure selected from formula (7), (8), (9), or (10). 【Chemistry 6】 Here, R 3 is H or methyl, R 1 and R 2 is one or more alkyl, aryl, or alkylaryl, which may be the same or different, and R 1 and R 2 is 0, 1, 2, 3, or 4, and 【Chemistry 4】 The amount of is 1 or 2, and 【Chemistry 5】 The amount of is 1 or 2.

4. 2. The photocurable composition of claim 1, wherein the first polymerizable monomer is at least one monomer selected from the following structures: 【Chemistry 7】

5. The photocurable composition of claim 1 , wherein the polymerizable material comprises at least one second monomer, the at least one second monomer comprising at least one acrylate monomer.

6. The photocurable composition of claim 5 , wherein the at least one acrylate monomer comprises at least two monofunctional acrylate monomers.

7. The photocurable composition of claim 5 , wherein the at least one acrylate monomer comprises at least one monofunctional acrylate monomer and at least one multifunctional acrylate monomer.

8. The photocurable composition of claim 1 , wherein the amount of the polymerizable material is 80 wt % or more, based on the total weight of the photocurable composition.

9. 2. The photocurable composition according to claim 1, wherein the photocurable composition has a viscosity at 23° C. of 50 mPa·s or less.

10. The photocurable composition of claim 1 , wherein the photocurable composition comprises a solvent in an amount of 15 vol % or more, based on the total volume of the photocurable composition.

11. The photocurable composition of claim 1 , wherein the photocurable composition is essentially free of solvent.

12. 2. The photocurable composition of claim 1, wherein the amount of the first monomer is from 5 wt % to 50 wt %, based on the total weight of the photocurable composition.

13. 13. The photocurable composition of claim 12, wherein the amount of the first monomer is 30 wt% or more, based on the total weight of the polymerizable material.

14. 10. The photocurable composition of claim 1, wherein the composition is adapted for use in inkjet adaptive planarization (IAP) or nanoimprint lithography (NIL).

15. A laminate comprising a substrate and a photocurable layer overlying the substrate, the photocurable layer being formed from the photocurable composition of claim 1.

16. 16. The laminate of claim 15, wherein the photocured layer has a carbon content of 70% or greater.

17. 16. The laminate of claim 15, wherein the photocurable layer has a thermal stability of 250°C or greater.

18. 1. A method for forming a photocurable layer on a substrate, comprising: applying a layer of a photocurable composition onto the substrate; The photocurable composition includes a photopolymerization initiator and a polymerizable material, and the polymerizable material includes a first polymerizable monomer having a structure represented by formula (1) or formula (2), 【Chemistry 1】 however, X is C 1 -C 4 - alkyl or oxygen (O), n is 0 or 1; Y 1 , Y 2 teeth, 【Chemistry 2】 and R 3 is H or methyl, where Y 1 and Y 2 may be the same or different, and Y per benzene ring 1 and Y 2 is 1, 2, or 3; R 1 , R 2 is a substituted or unsubstituted alkyl or aryl, and R per benzene ring 1 and R 2 is 0, 1, 2, 3, or 4; The method further comprises: contacting the photocurable composition with a template or superstrate; irradiating the photocurable composition with light to form a photocured layer, and removing the template or the superstrate from the photocured layer; The method according to claim 1,

19. 20. The method of claim 18, wherein the first polymerizable monomer comprises at least one second monomer, and the at least one second monomer comprises at least one acrylate monomer.

20. 1. A method of forming an article, comprising: applying a layer of a photocurable composition onto the substrate; The photocurable composition includes a photopolymerization initiator and a polymerizable material, and the polymerizable material includes a first polymerizable monomer having a structure represented by formula (1) or formula (2), 【Chemistry 1】 however, X is C 1 -C 4 - alkyl or oxygen (O), n is 0 or 1; Y 1 , Y 2 teeth, 【Chemistry 2】 and R 3 is H or methyl, where Y 1 and Y 2 may be the same or different, and Y per benzene ring 1 and Y 2 is 1, 2, or 3; R 1 , R 2 is a substituted or unsubstituted alkyl or aryl, and R 1 and R 2 is 0, 1, 2, 3, or 4; The method further comprises: contacting the photocurable composition with a template or superstrate; A step of irradiating the curable composition with light to form a cured layer; removing the template or the superstrate from the photocurable layer; forming a pattern on the substrate; processing the substrate on which the pattern is formed in the forming step; manufacturing an article from the substrate processed in the processing step; The method according to claim 1,

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