High density linear capacitors in semiconductor technology

Abstract

The device includes a first plurality of MEOL interconnects coupled to a second node extending in a first direction. The first plurality of MEOL interconnects includes a first and second subset of second terminal interconnects of the MEOL. The device includes a second plurality of MEOL interconnects coupled to a first node extending in a first direction. The second plurality of MEOL interconnects includes a first and second subset of first terminal interconnects of the MEOL. The first subset of first terminal interconnects and the first subset of second terminal interconnects of the MEOL are interleaved, being a first subset of interleaved MEOL interconnects. The second subset of first terminal interconnects and the second subset of second terminal interconnects of the MEOL are interleaved, being a second subset of interleaved MEOL interconnects. The device includes at least one of a first plurality of gate interconnects or a first plurality of OD regions extending in a second direction orthogonal to the first direction between a first subset and a second subset of the interleaved MEOL interconnects.

Description

[Technical field]

[0001] (CROSS REFERENCE TO RELATED APPLICATIONS) This application claims the benefit of U.S. patent application Ser. No. 17 / 650,233, entitled "HIGH DENSITY LINEAR CAPACITOR IN SEMICONDUCTOR TECHNOLOGIES," filed Feb. 7, 2022, which is expressly incorporated by reference in its entirety.

[0002] The present disclosure relates generally to layout structures, and more particularly, to high density linear capacitors in semiconductor technology.

[0003] introduction A typical integrated circuit (IC) includes a stack of layers formed sequentially. Each layer is stacked or overlaid on the previous layer and may be patterned to form features that define transistors (e.g., field effect transistors (FETs), fin FETs (FinFETs), gate-all-around (GAA) FETs (GAAFETs), and / or other multi-gate FETs) and connect the transistors into a circuit. The devices may be arranged based on a particular layout structure. Currently, there is a need for improved, higher density linear capacitors. Summary of the Invention

[0004] In one aspect of the disclosure, the device includes a first plurality of middle-end-of-line (MEOL) interconnects coupled to a second node and extending in a first direction across at least a portion of the device. The first plurality of MEOL interconnects includes at least a first subset of the MEOL second terminal interconnects and a second subset of the MEOL second terminal interconnects. The device further includes a second plurality of MEOL interconnects coupled to the first node and extending in the first direction across at least a portion of the device. The second plurality of MEOL interconnects includes at least the first subset of the MEOL first terminal interconnects and a second subset of the MEOL first terminal interconnects. The first subset of the MEOL second terminal interconnects and the first subset of the MEOL first terminal interconnects are interleaved, forming a first subset of interleaved MEOL interconnects. The second subset of the MEOL second terminal interconnects and the second subset of the MEOL first terminal interconnects are interleaved, forming a second subset of interleaved MEOL interconnects. The device further includes at least one of a first plurality of gate interconnects or a first plurality of oxide diffusion (OD) regions extending in a second direction between the first subset of interleaved MEOL interconnects and the second subset of interleaved MEOL interconnects. The second direction is orthogonal to the first direction. [Brief description of the drawings]

[0005] [Figure 1] FIG. 1 is a first diagram showing a side view of various layers within an IC. [Diagram 2] FIG. 2 is a second diagram showing a side view of various layers within an IC. [Diagram 3] FIG. 2 conceptually illustrates a top view of a portion of a high density linear capacitor according to a first configuration. [Figure 4] FIG. 1 conceptually illustrates a top view of a portion of a high density linear capacitor according to a second configuration. [Diagram 5] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a third configuration. [Figure 6] FIG. 6 conceptually illustrates a side view of a portion of the high density linear capacitor shown in FIG. 5. [Figure 7] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a fourth configuration. [Figure 8] FIG. 2 conceptually illustrates a top view of the upper portion of a high density linear capacitor according to a first configuration. [Figure 9] 9A and 9B conceptually show top views of portions of the high density linear capacitors of FIGS. 5 and 8 . [Figure 10] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a fifth configuration. [Figure 11] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a sixth configuration. [Figure 12] FIG. 13 conceptually illustrates a top view of the upper portion of a high density linear capacitor according to a second configuration. [Figure 13] 13 is a conceptual diagram showing top views of portions of the high density linear capacitors of FIGS. 10 and 12 . FIG. [Figure 14] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a seventh configuration. [Figure 15] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to an eighth configuration. [Figure 16] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor according to a ninth configuration. [Figure 17] FIG. 13 conceptually illustrates a top view of a portion of a high density linear capacitor based on a tenth configuration. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0006] The Detailed Description of the Invention described below with reference to the accompanying drawings describes various configurations and is not intended to represent the only configurations in which the concepts described herein may be practiced. The Detailed Description of the Invention includes specific details intended to provide a thorough understanding of the various concepts. However, it will be apparent to one skilled in the art that these concepts may be practiced without these specific details. In some instances, well-known structures and components are shown in block diagram form to avoid obscuring such concepts. Apparatus and methods are described in the Detailed Description of the Invention below and may be illustrated in the accompanying drawings by various blocks, modules, components, circuits, steps, processes, algorithms, elements, etc.

[0007] FIG. 1 is a first diagram 100 showing a side view of various layers in a cell device and IC. The various layers vary in the z-direction (labeled the third direction). As shown in FIG. 1, a transistor has a gate 102 (sometimes referred to as POLY, but the gate may also be formed from metal, polysilicon, or a combination of polysilicon and metal), a source 104, and a drain 106. The gate 102 is formed by a gate interconnect. The source 104 and drain 106 may be formed by fins 104, 106 on a bulk silicon substrate 101. The bulk silicon substrate 101 may be referred to as a wafer or a slice. The bulk silicon substrate 101 may be formed by adding very small amounts of certain impurities (e.g., 0.0001% boron, phosphorus, arsenic, antimony, etc.) to a melt, which defines the bulk silicon substrate 101 (which may be about 99.9999% silicon based on the above impurities) as either bulk p-type (also called p-type substrate or P-substrate) or bulk n-type (also called n-type substrate or N-substrate). The gate 102 may extend in a second direction (e.g., vertically along the y-axis of the drawing page) and the fins 104, 106 may extend in a first direction (e.g., horizontally along the x-axis) that is orthogonal to the second direction. A contact layer interconnect 108 (also called a metal POLY (MP) layer interconnect, contact B (CB) layer interconnect, or middle-end-of-line (MEOL) interconnect) may contact the gate 102. A trench silicide (TS) 109 may contact the source 104 and / or drain 106. A contact layer interconnect 110 (also called a metal diffusion (MD) layer interconnect, contact A (CA) layer interconnect, or MEOL interconnect) may contact the TS layer 109. The tops of the contact layer interconnects 110, 108 each have a height of h above the bulk silicon substrate 101. A2 , h B2 and the height of the bottom of the contact layer interconnects 110 and 108 from the bulk silicon substrate 101 is hA1 , h B1 Therefore, the thickness of the contact layer interconnect 110 in the z direction is t A =h A2 -h A1 and the thickness of the contact layer interconnect 108 in the z-direction is t B =h B2 -h B1 In one configuration,

[0008]

number

[0009] (Both of these are shown to be equal to h.) The gate 102 has a height of the TS layer 109, h A1 Lower height h B1 , the thickness t of the contact layer interconnect 108 B is the thickness t of the contact layer interconnect 110 A 1. Via 112 (also referred to as via A, VA) may contact contact layer interconnect 110. Metal 1 (M1) layer interconnect 114 may contact via 112. M1 layer interconnect 114 is shown extending in a first direction, but may also extend in a second direction. Via V1 116 may contact M1 layer interconnect 114. Metal 2 (M2) layer interconnect 118 may contact via V1 116. M2 layer interconnect 118 is shown extending in a second direction, but may alternatively extend in the first direction. The upper layers include a via layer including via V2, an M3 layer including a metal 3 (M3) layer interconnect, and an upper via / metal layer. The interconnects in the M3 layer and above may extend in the first direction or the second direction. q) layers or higher may extend in both the first and second directions. The cell devices may be implemented using FinFETs (as shown), GAAFETs, or other multi-gate FETs. In the case of continuous OD regions across the devices, the fins are continuous (in the first direction) across the devices. In the case of discontinuous OD regions across the devices, the fins are separated at diffusion breaks (e.g., single / double diffusion breaks extending in the second direction) between different sets of devices.

[0010] FIG. 2 is a second diagram 200 showing a side view of various layers in a standard cell and an IC. The various layers vary in the z-direction (labeled the third direction). As shown in FIG. 2, a transistor has a gate 202, a source 204, and a drain 206. The gate 202 is formed by a gate interconnect. The source 204 and the drain 206 may be formed by fins 204, 206 on a bulk silicon substrate 201. The bulk silicon substrate 201 may be referred to as a wafer or a slice. The bulk silicon substrate 201 may be formed by adding very small amounts of certain impurities (e.g., 0.0001% boron, phosphorus, arsenic, antimony, etc.) to a melt that defines the bulk silicon substrate 201 (which may be about 99.9999% silicon based on the above impurities) as either bulk p-type (also called p-type substrate or P-substrate) or bulk n-type (also called n-type substrate or N-substrate). The gate 202 may extend in a second direction (e.g., vertically along the y-axis of the page of the drawing), and the fins 204, 206 may extend in a first direction orthogonal to the second direction (e.g., horizontally along the x-axis). A contact layer interconnect 208 (also referred to as an MP layer interconnect or a CB layer interconnect) may contact the gate 202. A TS layer 209 may contact the source 204 and / or the drain 206. A contact layer interconnect 210 (also referred to as an MD layer interconnect, a CA layer interconnect, or a MEOL interconnect) may contact the TS layer 209. As mentioned above, the thickness t of the contact layer interconnect 208 may be 100 μm. Bis the thickness t of the contact layer interconnect 210 A 2. Via 212 (also referred to as via B, VB) may contact contact layer interconnect 208. M1 layer interconnect 214 may contact via 212. M1 layer interconnect 214 is shown extending in a first direction, but may also extend in a second direction. Via V1 216 may contact M1 layer interconnect 214. M2 layer interconnect 218 may contact via V1 216. M2 layer interconnect 218 is shown extending in a second direction, but may alternatively extend in the first direction. Upper layers include a via layer including via V2, an M3 layer including an M3 layer interconnect, and an upper via / metal layer. The interconnects in the M3 layer and higher layers may extend in the first direction or the second direction. M q The layers or more of the metal layers may extend in both the first and second directions. The cell devices may be implemented using FinFETs (as shown), GAAFETs, or other multi-gate FETs. In the case of continuous OD regions across the devices, the fins are continuous (in the first direction) across the devices. In the case of discontinuous OD regions across the devices, the fins are separated at diffusion breaks between different sets of the devices (e.g., single / double diffusion breaks extending in the second direction).

[0011] 1 and 2, the transistors including the gates 102, 202, drains 106, 206, and sources 104, 204 are on a front-end-of-line (FEOL) layer. The contact layer interconnects 108, 208 and contact layer interconnects 110, 210 are on a MEOL layer. The metal layers including the M1 layers 114, 214 and upper metal layers (e.g., M2 layers 118, 218) are on a back-end-of-line (BEOL) layer.

[0012] There are many analog circuits where linear capacitors are needed for signal processing or circuit compensation. For example, a linear capacitor may be used as a Miller compensation capacitor in a feedback circuit such as a low-dropout regulator (LDO) or an amplifier. In another example, a linear capacitor may be used in a switched-capacitor circuit such as an analog to digital converter (ADC). A linear capacitor refers to a capacitor whose capacitance does not depend on the voltage across its terminals. Linearity is important in many analog applications. Given the high wafer cost of FinFET technology, high density capacitors are desirable to reduce integrated circuit (IC) chip area. Metal oxide semiconductor (MOS) capacitors have high density but are highly nonlinear and, as a result, are not suitable as signal path capacitors. Existing metal capacitors with interdigitating fingers are linear but have low density.

[0013] As described below with respect to Figures 3-17, a different configuration of a capacitor is provided that has a higher density than existing metal-oxide-metal (MOM) capacitors. The provided capacitor has an upper terminal (also referred to as an upper plate) and a lower terminal (also referred to as a lower plate), with portions of the upper terminal and the lower terminal on the MEOL layer, and the MEOL interconnects of the upper terminal and the lower terminal are interleaved. The portions of the upper terminal and the lower terminal on the MEOL layer may be referred to as a MEOL capacitor. As described above, the MEOL layer includes contact layer interconnects 108, 208 and contact layer interconnects 110, 210. The contact layer interconnects 108, 208 may be referred to as CB / MP layer interconnects, or generally as MEOL interconnects. The contact layer interconnects 110, 210 may be referred to as CA / MD layer interconnects, or generally as MEOL interconnects. For purposes of this specification, contact layer interconnects 110, 210 are referred to as type-A MEOL interconnects, and contact layer interconnects 108, 208 are referred to as type-B MEOL interconnects. As discussed in connection with Figures 3-17, a MEOL capacitor may be formed using interleaved type-B MEOL interconnects and may further include type-A MEOL interconnects coupling together top / bottom terminal subsets of the type-B MEOL interconnects.

[0014] FIG. 3 is a diagram 300 conceptually illustrating a top view of a portion of a high density linear capacitor based on a first configuration. As shown in FIG. 3, a set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 extend in a first direction across at least a portion of the device. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 are coupled to a first node through via 312t. In one example, the first node is the top terminal of the capacitor 370. In addition, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 extend in a first direction across at least a portion of the device. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 are coupled to a second node through via 312b. The vias 312t, 312b are identified in the pattern key as 312. In one example, the second node is the bottom terminal of the capacitor 370. The set of MEOL interconnects 308t1, 308b1, the set of MEOL interconnects 308t2, 308b2, the set of MEOL interconnects 308t3, 308b3, and the set of MEOL interconnects 308t4, 308b4 are each interleaved in a first direction. Between the set of MEOL interconnects 308t1, 308b1 and the set of MEOL interconnects 308t2, 308b2, the plurality of gate interconnects 302 (sometimes referred to as POLY contacts (PC)) and the plurality of OD regions 305 (sometimes referred to as active RX regions) in 330 may extend in a second direction orthogonal to the first direction. The gate interconnects 302 and the OD regions 305 at 330 may be interleaved. Additionally, the gate interconnects 302 at 332 may extend in the second direction between the set of MEOL interconnects 308t2, 308b2 and the set of MEOL interconnects 308t3, 308b3. Alternatively, the OD regions 305 at 332 may extend in the second direction between the set of MEOL interconnects 308t2, 308b2 and the set of MEOL interconnects 308t3, 308b3.Additionally, between the set of MEOL interconnects 308t3, 308b3 and the set of MEOL interconnects 308t4, 308b4, the gate interconnects 302 and the OD regions 305 at 334 may extend in the second direction. The gate interconnects 302 and the OD regions 305 at 334 may be interleaved. The gate interconnects 302 at 330, 332, 334 and the OD regions 305 at 330, 334 may be floating or not tied to any node or voltage. The gate interconnects 302 at 330, 332, 334 and the OD regions 305 at 330, 334 may be used as filler to meet PC / RX density requirements. In the absence of PC / RX density requirements, additional MEOL interconnects may be utilized in regions 330, 332, 334 to increase the effective capacitance of the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4 (identified as 308 in the pattern key).

[0015] The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 are configured to be at least a portion of a first terminal of a capacitor 370, and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 are configured to be at least a portion of a second terminal of the capacitor 370. Additional portions of the capacitor 370 are shown in FIG. 8. In one configuration, each MEOL interconnect 308 in the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 is a type B MEOL interconnect, which may be an MP / CB contact layer interconnect 108, 208, as described above.

[0016] FIG. 4 is a diagram 400 conceptually illustrating a top view of a portion of a high density linear capacitor according to a second configuration. As shown in FIG. 4, the device shown in FIG. 3 may include an n-type well (n-well) 480 extending throughout the device, the n-well 480 underlying the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4. In a first configuration, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 are coupled to the n-well 480. In such a configuration, the first node (the top terminal of the capacitor 370) is shielded from the substrate. Shielding the first node (top terminal) from the substrate by coupling the second node (bottom terminal) to the n-well reduces the parasitic capacitance on the first node (e.g., from 4% to 0.6% of the total capacitance). However, in such a configuration, the second node (bottom terminal) will have a larger parasitic capacitance that is non-linear (e.g., increasing from 4.5% to 20%-22% of the total capacitance) and will require a larger drive strength through the signal path that includes capacitor 370. In a second configuration, a third node is coupled to n-well 480 and is not connected to the first node (top terminal of capacitor 370) and the second node (bottom terminal of capacitor 370).

[0017] FIG. 5 is a diagram 500 conceptually illustrating a top view of a portion of a high density linear capacitor according to a third configuration. As shown in FIG. 5, a set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 extend in a first direction across at least a portion of the device. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 are coupled together by MEOL interconnect 310t extending in a second direction perpendicular to the first direction. The MEOL interconnects 308t1, 308t2, 308t3, 308t4 and the set of MEOL interconnects 310t are shorted together because they are at the same height h (see FIG. 1, FIG. 2) from the bulk silicon substrate 101, 201. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 consequently extend as fingers from MEOL interconnect 310t. MEOL interconnect 310t is coupled to a first node. In one example, the first node is the top terminal of capacitor 370. Additionally, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 extend in a first direction across at least a portion of the device. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 are coupled together by MEOL interconnect 310b, which extends in a second direction. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnect 310b are shorted together because they are at the same height h (see FIGS. 1 and 2) from the bulk silicon substrate 101, 201. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 consequently extend as fingers from MEOL interconnect 310b. MEOL interconnect 310b is coupled to a second node. In one example, the second node is the bottom terminal of capacitor 370. MEOL interconnects 310t, 310b are identified in the pattern key as 310.The set of MEOL interconnects 308t1, 308b1, the set of MEOL interconnects 308t2, 308b2, the set of MEOL interconnects 308t3, 308b3, and the set of MEOL interconnects 308t4, 308b4 are each interleaved in a first direction. Between the set of MEOL interconnects 308t1, 308b1 and the set of MEOL interconnects 308t2, 308b2, the gate interconnects 302 and the OD regions 305 in 330 may extend in a second direction. The gate interconnects 302 and the OD regions 305 in 330 may be interleaved. Additionally, between the set of MEOL interconnects 308t2, 308b2 and the set of MEOL interconnects 308t3, 308b3, the gate interconnects 302 at 332 may extend in a second direction. Furthermore, between the set of MEOL interconnects 308t3, 308b3 and the set of MEOL interconnects 308t4, 308b4, the gate interconnects 302 and the OD regions 305 at 334 may extend in a second direction. The gate interconnects 302 and the OD regions 305 at 334 may be interleaved. The gate interconnects 302 at 330, 332, 334 and the OD regions 305 at 330, 334 may be floating and not tied to any node or voltage. The multiple gate interconnects 302 at 330, 332, 334 and the multiple OD regions 305 at 330, 334 may be used as filler to meet PC / RX density requirements. In the absence of PC / RX density requirements, additional MEOL interconnects may be utilized in regions 330, 332, 334 to increase the effective capacitance of the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4.

[0018] The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and MEOL interconnect 310t are configured to be at least a portion of a first terminal of capacitor 370, and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnect 310b are configured to be at least a portion of a second terminal of capacitor 370. An additional portion of capacitor 370 is shown in FIG. In one configuration, each MEOL interconnect 308 in the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and in the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 is a type-B MEOL interconnect, which may be an MP / CB contact layer interconnect 108, 208, as described above. Further, in such a configuration, each of the MEOL interconnects 310t, 310b is a type-A MEOL interconnect, which may be an MD / CA contact layer interconnect 110, 210, as described above.

[0019] A side view in the direction of arrow 360 in a first direction of the dotted portion is shown in Figure 6. The side view of Figure 6 illustrates the relative thickness difference between the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4 and MEOL interconnects 310t, 310b.

[0020] Figure 6 is a diagram 600 conceptually illustrating a side view of a portion of the high density linear capacitor shown in Figure 5. As shown in Figure 6, the type-B MEOL interconnect 308 and the type-A MEOL interconnect 310 are at a height h from the bulk silicon substrate 101, 201. The bottom surface of the type-B MEOL interconnect is at a height h that is the height of the transistor gates 102, 202. B1 Therefore, the thickness of the Type B MEOL interconnect t B ,hh B1As shown in Figure 6, the thickness of the Type-B MEOL interconnect is equal to t B is the thickness of the type A MEOL interconnect, t A Greater than.

[0021] FIG. 7 is a diagram 700 conceptually illustrating a top view of a portion of a high density linear capacitor based on a fourth configuration. As shown in FIG. 7, the device shown in FIG. 5 may include an n-well 780 extending across the entire device, which underlies the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4, and underlies MEOL interconnects 310t, 310b. In the first configuration, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnect 310b are coupled to the n-well 780. In such a configuration, the first node (the top terminal of capacitor 370) is shielded from the substrate. Shielding the first node (top terminal) from the substrate by coupling the second node (bottom terminal) to the n-well reduces the parasitic capacitance on the first node (e.g., from 4% to 0.6% of the total capacitance). However, in such a configuration, the second node (bottom terminal) will have a larger parasitic capacitance that is non-linear (e.g., increasing from 4.5% to 20%-22% of the total capacitance) and will require a larger drive strength through the signal path that includes capacitor 370. In a second configuration, a third node is coupled to n-well 780, and the third node is not connected to the first node (top terminal of capacitor 370) and the second node (bottom terminal of capacitor 370).

[0022] FIG. 8 is a diagram 800 conceptually illustrating a top view of a top portion of a high density linear capacitor based on a first configuration. FIG. 9 is a diagram 900 conceptually illustrating top views of portions of the high density linear capacitors of FIGS. 5 and 8 together. As shown in FIG. 8, the top portion of the capacitor 370 (which may be referred to as a MOM capacitor) includes a first comb structure 840t having fingers extending in a second direction and a second comb structure 840b having fingers extending in the second direction. The fingers of the first comb structure 840t and the fingers of the second comb structure 840b are interleaved. Each of the first comb structure 840t and the second comb structure 840b is formed by metal layers M1-M2. x 8, the first comb structure 840t and the second comb structure 840b may include fingers on the lower metal layers M1, M2, and M3, where x>1. For example, if x=3 as shown in FIG. 8, the first comb structure 840t and the second comb structure 840b will include fingers on the lower metal layers M1, M2, and M3, as well as on the central metal layers including the metal 4 (C4) layer and the metal 5 (C5) layer (wider and further apart). The comb structure 840t includes a side terminal 842t (see FIG. 9) that connects to the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 of FIG. 3, FIG. 4, or to the MEOL interconnect 310t of FIG. 5, FIG. 7. The comb structure 840b includes a side terminal 842b that connects to the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 in FIG. 3 and FIG. 4 or to the MEOL interconnect 310b in FIG. 5 and FIG. 7 (see FIG. 9). The first comb structure 840t and the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 together are the top terminal (i.e., the first node) of the capacitor 370. The second comb structure 840b and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 together are the bottom terminal (i.e., the second node) of the capacitor 370. As shown in FIG. 9, the MEOL capacitor of FIG. 5 and the BEOL MOM capacitor of FIG. 8 are coupled in parallel to provide one MEOL-BEOL capacitor 370 with increased density.

[0023] FIG. 10 is a diagram 1000 conceptually illustrating a top view of a portion of a high density linear capacitor according to the fifth configuration. As shown in FIG. 10, a set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 extend in a first direction across at least a portion of the device. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 are coupled together by MEOL interconnect 310t extending in a second direction. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and MEOL interconnect 310t are shorted together. The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 thus extend as fingers from MEOL interconnect 310t. MEOL interconnect 310t is coupled to a first node. In one example, the first node is the top terminal of capacitor 370. Additionally, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 extends in a first direction across at least a portion of the device. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 are coupled together by MEOL interconnect 310b extending in a second direction. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnect 310b are shorted together. The set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 thus extends as fingers from MEOL interconnect 310b. MEOL interconnect 310b is coupled to a second node, which in one example is the bottom terminal of capacitor 370. The set of MEOL interconnects 308t1, 308b1, the set of MEOL interconnects 308t2, 308b2, the set of MEOL interconnects 308t3, 308b3, and the set of MEOL interconnects 308t4, 308b4 are each interleaved in a first direction.

[0024] MEOL interconnect 1010b adjacent to MEOL interconnect 310t is coupled to a second node. MEOL interconnect 1010b shields MEOL interconnect 310t such that MEOL interconnect 310t is more isolated from nearby local / global routing interconnects that may couple to MEOL interconnect 310t and cause parasitic capacitance on MEOL interconnect 310t. Such a design may be suitable for applications in which the top terminal of capacitor 370 should have a relatively lower parasitic capacitance.

[0025] Between the set of MEOL interconnects 308t1, 308b1 and the set of MEOL interconnects 308t2, 308b2, the gate interconnects 302 and the OD regions 305 at 330 may extend in a second direction. The gate interconnects 302 and the OD regions 305 at 330 may be interleaved. Additionally, between the set of MEOL interconnects 308t2, 308b2 and the set of MEOL interconnects 308t3, 308b3, the gate interconnects 302 at 332 may extend in a second direction. Additionally, between the set of MEOL interconnects 308t3, 308b3 and the set of MEOL interconnects 308t4, 308b4, the gate interconnects 302 and the OD regions 305 at 334 may extend in a second direction. The gate interconnects 302 and OD regions 305 in 334 may be interleaved. The gate interconnects 302 in 330, 332, 334 and the OD regions 305 in 330, 334 may be floating and not tied to any node or voltage. The gate interconnects 302 in 330, 332, 334 and the OD regions 305 in 330, 334 may be used as filler to meet PC / RX density requirements. In the absence of PC / RX density requirements, additional MEOL interconnects may be utilized in regions 330, 332, 334 to increase the effective capacitance of the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4.

[0026] The set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and MEOL interconnect 310t are configured to be at least a portion of a first terminal of capacitor 370, and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnects 310b, 1010b are configured to be at least a portion of a second terminal of capacitor 370. An additional portion of capacitor 370 is shown in FIG. As described above, each MEOL interconnect 308 in the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 may be a type-B MEOL interconnect, which may be a MP / CB contact layer interconnect 108, 208. Additionally, each of MEOL interconnects 310t, 310b, 1010b may be a type-A MEOL interconnect, which may be a MD / CA contact layer interconnect 110, 210.

[0027] FIG. 11 is a diagram 1100 conceptually illustrating a top view of a portion of a high density linear capacitor based on a sixth configuration. As shown in FIG. 11, the device shown in FIG. 10 may include an n-well 1180 extending throughout the device, which underlies the set of interleaved MEOL interconnects 308t1, 308t2, 308t3, 308t4, 308b1, 308b2, 308b3, 308b4, and underlies MEOL interconnects 310t, 310b. In the first configuration, the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 and MEOL interconnects 310b, 1010b are coupled to the n-well 1180. In such a configuration, the first node (the upper terminal of the capacitor 370) is shielded from the substrate. Shielding the first node (top terminal) from the substrate by coupling the second node (bottom terminal) to the n-well reduces the parasitic capacitance on the first node (e.g., from 4% to 0.6% of the total capacitance). However, in such a configuration, the second node (bottom terminal) will have a larger parasitic capacitance that is non-linear (e.g., increasing from 4.5% to 20%-22% of the total capacitance) and will require a larger drive strength through the signal path that includes capacitor 370. In a second configuration, a third node is coupled to n-well 1180, and the third node is not connected to the first node (top terminal of capacitor 370) and the second node (bottom terminal of capacitor 370).

[0028] FIG. 12 is a diagram 1200 conceptually illustrating a top view of a top portion of a high density linear capacitor based on the second configuration. FIG. 13 is a diagram 1300 conceptually illustrating top views of portions of the high density linear capacitors of FIGS. 10 and 12 together. As shown in FIG. 12, the top portion of the capacitor 370 (i.e., the MOM capacitor) includes a first comb structure 1240t having fingers extending in a second direction and a second comb structure 1240b having fingers extending in the second direction. The fingers of the first comb structure 1240t and the fingers of the second comb structure 1240b are interleaved. Each of the first comb structure 1240t and the second comb structure 1240b is formed by metal layers M1-M2.x The comb structure 1240t may include fingers on the lower metal layers M1, M2, and M3, where x>1. For example, when x=3 as shown in FIG. 12, the first comb structure 1240t and the second comb structure 1240b will include fingers on the lower metal layers M1, M2, and M3, and on the central metal layers C4 and C5. In another example, when x=5, the first comb structure 1240t and the second comb structure 1240b will include fingers on the lower metal layers M1, M2, and M3, and on the central metal layers C4 and C5. The comb structure 1240t includes a side terminal 1242t that connects to a set of MEOL interconnects 308t1, 308t2, 308t3, and 308t4 (described in connection with FIG. 8 and FIG. 9) or connects to the MEOL interconnect 310t in FIG. 10 and FIG. 11 (see FIG. 13). The comb structure 1240b includes side terminals 1242b that connect to the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 (described in connection with Figures 8 and 9) or to the MEOL interconnect 310b of Figures 10 and 11 (see Figure 13). The comb structure 1240b further includes side terminals 1244b that connect to the MEOL interconnect 1010b of Figures 10 and 11 (see Figure 13). The side terminal 1244b connects the second node (i.e., the bottom terminal) to the MEOL interconnect 1010b such that the MEOL interconnect 1010b can shield the MEOL interconnect 310t and isolate the MEOL interconnect 310t from nearby local / global routing interconnects that may couple to the MEOL interconnect 310t and cause parasitic capacitance on the MEOL interconnect 310t. The first comb structure 1240t and the set of MEOL interconnects 308t1, 308t2, 308t3, 308t4 together are the top terminal (i.e., the first node) of the capacitor 370. The second comb structure 1240b and the set of MEOL interconnects 308b1, 308b2, 308b3, 308b4 together are the bottom terminal (i.e., the second node) of the capacitor 370. As shown in Figure 13, the MEOL capacitor of Figure 10 and the BEOL MOM capacitor of Figure 12 are combined in parallel to provide one MEOL-BEOL capacitor 370 with increased density.

[0029] Figure 14 is a diagram 1400 conceptually illustrating a top view of a portion of a high density linear capacitor according to the seventh configuration. As shown in Figure 14, MEOL interconnect 1410t extends in a second direction across approximately the center of the device. A set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 extend as fingers from MEOL interconnect 1410t in a first direction across a portion of the device, the first direction being orthogonal to the second direction. The set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 are coupled together by MEOL interconnect 1410t. The set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 and MEOL interconnect 1410t are at the same height h (see FIG. 1, FIG. 2) from the bulk silicon substrate 101, 201, and are therefore shorted together. MEOL interconnect 1410t is coupled to a first node. In one example, the first node is the top terminal of capacitor 370.

[0030] MEOL interconnect 1410b1 extends in a second direction across a first side (right side of the figure) of the device. The set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4 extend as fingers from MEOL interconnect 1410b1 in a first direction across a portion of the device. The set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4 are coupled together by MEOL interconnect 1410b1. The set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4 and MEOL interconnect 1410b1 are at the same height h (see Figures 1 and 2) from the bulk silicon substrate 101, 201 and are therefore shorted together. MEOL interconnect 1410b1 is coupled to a second node, which in one example is the bottom terminal of capacitor 370.

[0031] MEOL interconnect 1410b2 extends in a second direction across a second side of the device (left side in the figure). MEOL interconnects 1410t, 1410b1, 1410b2 are identified in the pattern key as 1410. The set of MEOL interconnects 1408b5, 1408b6, 1408b7, 1408b8 extend as fingers from MEOL interconnect 1410b2 in a first direction across a portion of the device. The set of MEOL interconnects 1408b5, 1408b6, 1408b7, 1408b8 are coupled together by MEOL interconnect 1410b2. The set of MEOL interconnects 1408b5, 1408b6, 1408b7, 1408b8 and MEOL interconnect 1410b2 are shorted together because they are at the same height h (see FIGS. 1 and 2) from the bulk silicon substrate 101, 201. MEOL interconnect 1410b2 is coupled to a second node.

[0032] The set of MEOL interconnects 1408b1, 1408t1, the set of MEOL interconnects 1408b2, 1408t2, the set of MEOL interconnects 1408b3, 1408t3, and the set of MEOL interconnects 1408b4, 1408t4 are each interleaved in a first direction on a first half of the device. The set of MEOL interconnects 1408b5, 1408t5, the set of MEOL interconnects 1408b6, 1408t6, the set of MEOL interconnects 1408b7, 1408t7, and the set of MEOL interconnects 1408b8, 1408t8 are each interleaved in a first direction on a second half of the device.

[0033] In this configuration, MEOL interconnects 1410b1, 1410b2 shield MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 and MEOL interconnect 1410t, thereby reducing coupling of the first node (top terminal) to local / global routing interconnects that may increase parasitic capacitance on the first node. Additionally, MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8, 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8 (identified in the pattern key as 1408) are each approximately half the length of MEOL interconnect 308. The reduced length of MEOL interconnect 1408 significantly reduces the resistance of the finger compared to the fingers shown in Figures 3-5, 7, 9-11, and 13, thereby increasing the quality (Q) factor (Q value) of capacitor 370. Q value is inversely proportional to resistance. Since the resistance of the finger is effectively halved, the Q factor is effectively doubled.

[0034] Between the set of MEOL interconnects 1408t1, 1408b1, 1408t5, 1408b5 and the set of MEOL interconnects 1408t2, 1408b2, 1408t6, 1408b6, the gate interconnects 1402 and the OD regions 1405 in 1430 may extend in a second direction. The gate interconnects 1402 and the OD regions 1405 in 1430 may be interleaved. Additionally, between the set of MEOL interconnects 1408t2, 1408b2, 1408t6, 1408b6 and the set of MEOL interconnects 1408t3, 1408b3, 1408t7, 1408b7, the gate interconnects 1402 in 1432 may extend in a second direction. Additionally, between the set of MEOL interconnects 1408t3, 1408b3, 1408t7, 1408b7 and the set of MEOL interconnects 1408t4, 1408b4, 1408t8, 1408b8, the gate interconnects 1402 and the OD regions 1405 at 1434 may extend in a second direction. The gate interconnects 1402 and the OD regions 1405 at 1434 may be interleaved. The gate interconnects 1402 at 1430, 1432, 1434 and the OD regions 1405 at 1430, 1434 may be floating and not tied to any node or voltage. The gate interconnects 1402 at 1430, 1432, 1434 and the OD regions 1405 at 1430, 1434 may be used as filler to meet PC / RX density requirements. In the absence of PC / RX density requirements, additional MEOL interconnects may be utilized in regions 1430, 1432, 1434 to increase the effective capacitance of the set of interleaved MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8, 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8.

[0035] The set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 and MEOL interconnect 1410t are configured to be at least a portion of a first terminal of capacitor 370, and the set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8 and MEOL interconnects 1410b1, 1410b2 are configured to be at least a portion of a second terminal of capacitor 370. Additional portions of capacitor 370 are on higher metal layers, such as metal layers M1, M2, M3, C4, C5, for example. In one configuration, each MEOL interconnect 1408 in the set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 and MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8 is a type B MEOL interconnect, which may be an MP / CB contact layer interconnect 108, 208, as described above. Furthermore, in such a configuration, each of the MEOL interconnects 1410t, 1410b1, 1410b2 is a type-A MEOL interconnect, which may be the MD / CA contact layer interconnects 110, 210, as described above.

[0036] Figure 15 is a diagram 1500 conceptually illustrating a top view of a portion of a high density linear capacitor according to the eighth configuration. As shown in Figure 15, the device shown in Figure 14 may include an n-well 1580 extending throughout the device, where the n-well 1580 underlies the set of interleaved MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8, 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8, and underlies the MEOL interconnects 1410t, 1410b1, 1410b2. In a first configuration, the set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8 and MEOL interconnects 1410b1, 1410b2 are coupled to n-well 1580. In such a configuration, the first node (top terminal of capacitor 370) is shielded from the substrate. Shielding the first node (top terminal) from the substrate by coupling the second node (bottom terminal) to the n-well reduces the parasitic capacitance on the first node (e.g., reducing it from 4% to 0.6% of the total capacitance). However, in such a configuration, the second node (bottom terminal) will have a larger parasitic capacitance that is nonlinear (e.g., increasing from 4.5% to 20%-22% of the total capacitance) and will require a larger drive strength through the signal path that includes capacitor 370. In the second configuration, a third node is coupled to the n-well 1580, and the third node is not connected to the first node (the upper terminal of the capacitor 370) and the second node (the lower terminal of the capacitor 370).

[0037] Figure 16 is a diagram 1600 conceptually illustrating a top view of a portion of a high density linear capacitor according to a ninth configuration. As shown in Figure 16 and similar to the configuration of Figure 3, without the use of type-A MEOL interconnect 1410, the set of MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8 may be coupled to a first node via vias 1612t, the set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4 may be coupled to a second node via vias 1612b1, and the set of MEOL interconnects 1408b5, 1408b6, 1408b7, 1408b8 may be coupled to a second node via vias 1612b2. Vias 1612t, 1612b1, and 1612b2 are identified as 1612 in the pattern key.

[0038] Figure 17 is a diagram 1700 conceptually illustrating a top view of a portion of a high density linear capacitor according to the tenth configuration. As shown in Figure 17, the device shown in Figure 16 may include an n-well 1780 extending throughout the device, where the n-well 1780 underlies the set of interleaved MEOL interconnects 1408t1, 1408t2, 1408t3, 1408t4, 1408t5, 1408t6, 1408t7, 1408t8, 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8, and underlies MEOL interconnects 1410t, 1410b1, 1410b2. In a first configuration, the set of MEOL interconnects 1408b1, 1408b2, 1408b3, 1408b4, 1408b5, 1408b6, 1408b7, 1408b8 and MEOL interconnects 1410b1, 1410b2 are coupled to n-well 1780. In such a configuration, the first node (top terminal of capacitor 370) is shielded from the substrate. Shielding the first node (top terminal) from the substrate by coupling the second node (bottom terminal) to the n-well reduces the parasitic capacitance on the first node (e.g., reducing it from 4% to 0.6% of the total capacitance). However, in such a configuration, the second node (bottom terminal) will have a larger parasitic capacitance that is nonlinear (e.g., increasing from 4.5% to 20%-22% of the total capacitance) and will require a larger drive strength through the signal path that includes capacitor 370. In the second configuration, a third node is coupled to the n-well 1780, and the third node is not connected to the first node (the upper terminal of the capacitor 370) and the second node (the lower terminal of the capacitor 370).

[0039] 3-17, the device includes a first plurality of MEOL interconnects (e.g., 308b1, 308b2, 1408b1, 1408b2) coupled to a second node (e.g., a bottom terminal of capacitor 370) and extending in a first direction across at least a portion of the device. The first plurality of MEOL interconnects (e.g., 308b1, 308b2, 1408b1, 1408b2) includes at least a first subset of the MEOL second terminal interconnects (e.g., 308b1, 1408b1) and a second subset of the MEOL second terminal interconnects (e.g., 308b2, 1408b2). Note that other examples are possible, as the first plurality of MEOL interconnects can be at least two of 308b1, 308b2, 308b3, and 308b4, or at least two of 1408b1, 1408b2, 1408b3, and 1408b4. The device includes a second plurality of MEOL interconnects (e.g., 308t1, 308t2, 1408t1, 1408t2) coupled to a first node (e.g., the top terminal of the capacitor 370) and extending in a first direction across at least a portion of the device. The second plurality of MEOL interconnects (e.g., 308t1, 308t2, 1408t1, 1408t2) includes at least a first subset of the first terminal interconnects of the MEOL (e.g., 308t1, 1408t1) and a second subset of the first terminal interconnects of the MEOL (e.g., 308t2, 1408t2). Note that other examples are possible, as the second plurality of MEOL interconnects can be at least two of 308t1, 308t2, 308t3, and 308t4, or at least two of 1408t1, 1408t2, 1408t3, and 1408t4. The first plurality of MEOL interconnects (e.g., 308b1, 308b2, 1408b1, 1408b2) and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 1408t1, 1408t2) are interleaved.Specifically, a first subset of MEOL second terminal interconnects (e.g., 308b1, 1408b1) and a first subset of MEOL first terminal interconnects (e.g., 308t1, 1408t1) are interleaved, resulting in a first subset of interleaved MEOL interconnects (e.g., 308b1, 308t1, 1408b1, 1408t1). In addition, the second subset of the MEOL second terminal interconnects (e.g., 308b2, 1408b2) and the second subset of the MEOL first terminal interconnects (e.g., 308t2, 1408t2) are interleaved, resulting in a second subset of interleaved MEOL interconnects (e.g., 308b2, 308t2, 1408b2, 1408t2). The device further includes at least one of a first plurality of gate interconnects 302, 1402 (at 330, 332, 334, 1430, 1432, 1434) or a first plurality of OD regions 305, 1405 (at 330, 334, 1430, 1434) extending in a second direction between a first subset of interleaved MEOL interconnects (e.g., 308b1, 308t1, 1408b1, 1408t1) and a second subset of interleaved MEOL interconnects (e.g., 308b2, 308t2, 1408b2, 1408t2). The second direction is orthogonal to the first direction.

[0040] In one configuration, a first plurality of MEOL interconnects (e.g., 308b1, 308b2, 1408b1, 1408b2) are configured to be at least a portion of a second terminal (e.g., a lower terminal) of the capacitor 370, and a second plurality of MEOL interconnects (e.g., 308t1, 308t2, 1408t1, 1408t2) are configured to be at least a portion of a first terminal (e.g., an upper terminal) of the capacitor 370.

[0041] In one configuration, the device includes both a first plurality of OD regions 305, 1405 (at 330, 334, 1430, 1434) and a first plurality of gate interconnects 302, 1402 (at 330, 334, 1430, 1434) extending in a second direction between a first subset of interleaved MEOL interconnects (e.g., 308b1, 308t1, 1408b1, 1408t1) and a second subset of interleaved MEOL interconnects (e.g., 308b2, 308t2, 1408b2, 1408t2). The first plurality of gate interconnects 302, 1402 and the first plurality of OD regions 305, 1405 are interleaved. In one configuration, the first plurality of gate interconnects 302, 1402 and the first plurality of OD regions 305, 1405 may be floating.

[0042] In one configuration, the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) further includes a third subset of the MEOL second terminal interconnects (e.g., 308b3, 1408b3) and a fourth subset of the MEOL second terminal interconnects (e.g., 308b4, 1408b4). Additionally, in such a configuration, the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4; 1408t1, 1408t2, 1408t3, 1408t4) further includes a third subset of the first terminal interconnects of the MEOL (e.g., 308t3, 1408t3) and a fourth subset of the first terminal interconnects of the MEOL (e.g., 308t1, 1408t4). The third subset of the second terminal interconnects of the MEOL (e.g., 308b3, 1408b3) are interleaved with the third subset of the first terminal interconnects of the MEOL (e.g., 308t3, 1408t3). A fourth subset of the second terminal interconnects of the MEOL (eg, 308b4, 1408b4) are interleaved with a fourth subset of the first terminal interconnects of the MEOL (eg, 308t4, 1408t4).

[0043] In one configuration, the third subset of the MEOL second terminal interconnects (e.g., 308b3, 1408b3) and the third subset of the MEOL first terminal interconnects (e.g., 308t3, 1408t3) are a third subset of interleaved MEOL interconnects (e.g., 308b3, 308t3, 1408b3, 1408t3), and the fourth subset of the MEOL second terminal interconnects (e.g., 308b4, 1408b4) and the fourth subset of the MEOL first terminal interconnects (e.g., 308t4, 1408t4) are a fourth subset of interleaved MEOL interconnects (e.g., 308b4, 308t4, 1408b4, 1408t4).

[0044] In one configuration, the device includes both a first plurality of OD regions 305, 1405 (e.g., at 330) and a first plurality of gate interconnects 302, 1402 (e.g., at 330) extending in a second direction between a first subset of interleaved MEOL interconnects (e.g., 308b1, 308t1, 1408b1, 1408t1) and a second subset of interleaved MEOL interconnects (e.g., 308b2, 308t2, 1408b2, 1408t2). The first plurality of gate interconnects 302, 1402 and the first plurality of OD regions 305, 1405 are interleaved. In such a configuration, the first plurality of gate interconnects 302, 1402 and the first plurality of OD regions 305, 1405 may be floating.

[0045] In one configuration, the device further includes a second plurality of gate interconnects 302, 1402 (e.g., at 332) extending in a second direction between a second subset of the interleaved MEOL interconnects (e.g., 308b2, 308t2, 1408b2, 1408t2) and a third subset of the interleaved MEOL interconnects (e.g., 308b3, 308t3, 1408b3, 1408t3). In such a configuration, the second plurality of gate interconnects 302, 1402 may be floating.

[0046] In one configuration, the device further includes a third plurality of gate interconnects 302, 1402 (e.g., at 334) extending in the second direction between a third subset of the interleaved MEOL interconnects (e.g., 308b3, 308t3, 1408b3, 1408t3) and a fourth subset of the interleaved MEOL interconnects (e.g., 308b4, 308t4, 1408b4, 1408t4). Additionally, in such a configuration, the device further includes a second plurality of OD regions 305, 1405 (e.g., at 334) extending in the second direction between the third subset of interleaved MEOL interconnects (e.g., 308b3, 308t3, 1408b3, 1408t3) and the fourth subset of interleaved MEOL interconnects (e.g., 308b4, 308t4, 1408b4, 1408t4). The third plurality of gate interconnects 302, 1402 and the second plurality of OD regions 305, 1405 are interleaved. In such a configuration, the third plurality of gate interconnects 302, 1402 and the second plurality of OD regions 305, 1405 may be floating.

[0047] In one configuration, the device further includes an n-well 480, 780, 1180, 1580 that extends throughout the device. The n-well 480, 780, 1180, 1580 underlies the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4). In a first configuration, the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) may be coupled to n-well 480, 780, 1180, 1580. In a second configuration, a third node may be coupled to n-well 480, 780, 1180, 1580, where the third node is not connected to the first node (e.g., the upper terminal of capacitor 370) and the second node (e.g., the lower terminal of capacitor 370).

[0048] In one configuration, the device further includes a BEOL MOM capacitor 800, 1200 having a second terminal (e.g., the bottom terminal of the capacitor 370) coupled to a second node and a first terminal (e.g., the top terminal of the capacitor 370) coupled to a first node. As shown in FIGS. 9 and 13, the bottom of the capacitor 370 (i.e., the MEOL capacitor) shown in FIGS. 5 and 10 is coupled to the top of the capacitor 370 (i.e., the BEOL MOM capacitor) shown in FIGS. 8 and 12. Note that the bottom of the capacitor 370 (i.e., the MEOL capacitor) shown in FIGS. 3, 4, 7, 11, 14-17 can also be coupled to the top of the capacitor 370 (i.e., the BEOL MOM capacitor (see FIGS. 8 and 12).

[0049] In one configuration, as shown in Figures 3, 4, 16 and 17, the device further includes a first set 312b, 1612b1 of vias coupling a first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) on a first side of the device to a second node, and a second set 312t, 1612t of vias coupling a second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) on the second side to the first node of the device.

[0050] In one configuration, as shown in Figures 14-17, the device further includes a third plurality of MEOL interconnects (e.g., 1408b5, 1408b6) coupled to the second node and extending in a first direction across at least a portion of the device. The first plurality of MEOL interconnects (e.g., 1408b1, 1408b2) and the third plurality of MEOL interconnects (e.g., 1408b5, 1408b6) are collinear. Note that other examples are possible, as the first plurality of MEOL interconnects can be at least two of 1408b1, 1408b2, 1408b3, and 1408b4, and the third plurality of MEOL interconnects can be at least two of a corresponding set of MEOL interconnects 1408b5, 1408b6, 1408b7, and 1408b8. Additionally, the device further includes a fourth plurality of MEOL interconnects (e.g., 1408t5, 1408t6) coupled to the first node and extending in the first direction across at least a portion of the device. The third plurality of MEOL interconnects (e.g., 1408b5, 1408b6) and the fourth plurality of MEOL interconnects (e.g., 1408t5, 1408t6) are interleaved. Note that other examples are possible, as the third plurality of MEOL interconnects can be at least two of 1408b5, 1408b6, 1408b7, and 1408b8, and the fourth plurality of MEOL interconnects can be at least two of a corresponding set of MEOL interconnects 1408t5, 1408t6, 1408t7, and 1408t8.

[0051] In one configuration, as shown in FIGS. 16 and 17, a device may include a first set of vias 1612b1 coupling a first plurality of MEOL interconnects (e.g., 1408b1, 1408b2, 1408b3, 1408b4) on a first side of the device to a second node, and a second set of vias 1612b1 coupling a second plurality of MEOL interconnects (e.g., 1408t1, 1408t2, 1408t3, 1408t4) and a fourth plurality of MEOL interconnects (e.g., 1408t1, 1408t2, 1408t3, 1408t4) on a first side of the device to a second node. The device further includes a second set of vias 1612t coupling the plurality of MEOL interconnects (e.g., 1408t5, 1408t6, 1408t7, 1408t8) to a first node, and a third set of vias 1612b2 coupling a third plurality of MEOL interconnects (e.g., 1408b5, 1408b6, 1408b7, 1408b8) on the second side to a second node of the device. The second set of vias 1612t may be approximately at a center of the device.

[0052] In one configuration, the device further includes a first interconnect 310b, 1410b1 extending in a second direction across the device and adjacent to a first side of the device, as shown in Figures 5, 7, 10, 11, 14, and 15. The first interconnect 310b, 1410b1 is coupled to the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and a second node. In addition, the device further includes a second interconnect 310t, 1410t extending in the second direction across the device. The second interconnect 310t, 1410t is coupled to the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) and the first node.

[0053] In one configuration, a first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) extend as fingers in a first direction from the first interconnect 310b, 1410b1 toward the second interconnect 310t, 1410t, and a second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) extend as fingers in a first direction from the second interconnect 310t, 1410t toward the first interconnect 310b, 1410b1.

[0054] In one configuration, each of the first interconnect 310b, 1410b1 and the second interconnect 310t, 1410t is a first type interconnect (e.g., a type A MEOL interconnect), and the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) are a second type interconnect (e.g., a type B MEOL interconnect).

[0055] In one configuration, each of the first interconnects 310b, 1410b1 and the second interconnects 310t, 1410t has a first thickness t A and each interconnect of the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and each MEOL interconnect of the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) has a second thickness t B and a second thickness t B is the first thickness t A Greater than.

[0056] In one configuration, the first interconnect 310b, 1410b1 and the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) are coupled together on the same layer, and the second interconnect 310t, 1410t and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) are coupled together on the same layer. In one configuration, the first interconnect 310b, 1410b1 and the second interconnect 310t, 1410t are MEOL interconnects.

[0057] In one configuration, as shown in Figures 5, 7, 10, and 11, the second interconnect 310t is generally adjacent to a second side of the device, the second side being opposite the first side in the first direction. In one configuration, as shown in Figures 10 and 11, the device further includes a third interconnect 1010b extending across the device in the second direction. The third interconnect 1010b is adjacent to the second side of the device. The third interconnect 1010b is coupled to the first interconnect 310b. In one configuration, as shown in Figures 12 and 13, the device further includes a BEOL interconnect 1240b on a third side of the device. The BEOL interconnect 1240b couples the first interconnect 310b and the third interconnect 1010b together. In one configuration, the third interconnect 1010b is a MEOL interconnect (eg, a type B MEOL interconnect).

[0058] In one configuration, as shown in Figures 14 and 15, the second interconnect 1410t is approximately in the center of the device. In such a configuration, the device further includes a third interconnect 1410b2 extending across the device in a second direction and adjacent to a second side of the device. The second side is opposite the first side in the first direction. In addition, the device includes a third plurality of MEOL interconnects (e.g., 1408b5, 1408b6, 1408b7, 1408b8) contacting the third interconnect 1410b2 and extending as fingers in the first direction from the third interconnect 1410b2 toward the second interconnect 1410t. Additionally, the device includes a fourth plurality of MEOL interconnects (e.g., 1408t5, 1408t6, 1408t7, 1408t8) in contact with the second interconnect 1410t and extending as fingers in a first direction from the second interconnect 1410t toward the third interconnect 1410b2. The third plurality of MEOL interconnects (e.g., 1408b5, 1408b6, 1408b7, 1408b8) and the fourth plurality of MEOL interconnects (e.g., 1408t5, 1408t6, 1408t7, 1408t8) are interleaved. In one configuration, the first interconnect 1410b1, the first plurality of MEOL interconnects (e.g., 1408b1, 1408b2, 1408b3, 1408b4), the third interconnect 1410b2, and the third plurality of MEOL interconnects (e.g., 1408b5, 1408b6, 1408b7, 1408b8) are at least a portion of a second terminal of a capacitor. In one configuration, the second interconnect 1410t, the second plurality of MEOL interconnects (e.g., 1408t1, 1408t2, 1408t3, 1408t4), and the fourth plurality of MEOL interconnects (e.g., 1408t5, 1408t6, 1408t7, 1408t8) are configured to be at least a portion of a first terminal of a capacitor. In one configuration, the third interconnect 1410b2 is a MEOL interconnect.

[0059] In one configuration, as shown in FIGS. 1, 2 and 6, each gate interconnect of the first plurality of gate interconnects is disposed at a distance h from the bulk substrate in a third direction. B1 and each MEOL interconnect 108, 110, 208, 210, 308, 310, 1408, 1410 of the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) has a height of h in a third direction from the bulk substrate. The third direction is orthogonal to the first direction and the second direction. The thickness of each MEOL interconnect 108, 110, 208, 210, 308, 310, 1408, 1410 in the third direction of the first plurality of MEOL interconnects (e.g., 308b1, 308b2, 308b3, 308b4, 1408b1, 1408b2, 1408b3, 1408b4) and the second plurality of MEOL interconnects (e.g., 308t1, 308t2, 308t3, 308t4, 1408t1, 1408t2, 1408t3, 1408t4) is hh B1 is equal to.

[0060] Referring again to FIGS. 3-17, different configurations of capacitors having higher density than existing MOM capacitors are provided. The provided capacitors have top and bottom terminals, portions of the top and bottom terminals are on the MEOL layer, and the MEOL interconnects of the top and bottom terminals are interleaved. Specifically, the interleaved MEOL interconnects may be type-B MEOL interconnects. The interleaved type-B MEOL interconnects may be referred to as MEOL capacitors. In some configurations, the interleaved type-B MEOL interconnects are coupled to the BEOL MOM capacitors through vias, as shown in FIGS. 3, 4, 16, 17, and in other configurations, the interleaved type-B MEOL interconnects are coupled together with type-A MEOL interconnects, and the type-A MEOL interconnects are coupled to the BEOL MOM capacitors, as shown in FIGS. 5, 7, 10, 11, 14, 15. The MEOL capacitor and the BEOL MOM capacitor are coupled together in parallel and act as one capacitor. The provided capacitor increases density by 44% due to the MEOL capacitor. In some configurations, the bottom terminal may shield the top terminal to reduce the parasitic capacitance on the top terminal, as shown in Figures 5, 7, 10, 11, 14, 15. In some configurations, the top terminal is shielded by the bottom terminal, as shown in Figures 14, 15, and the Q factor is increased compared to other configurations. In some configurations, the device may include an n-well, as shown in Figures 7, 11, 15, 17, which, when coupled to the bottom terminal, may further reduce the parasitic capacitance on the top terminal at the expense of increasing the parasitic capacitance on the bottom terminal. As mentioned above, coupling the bottom terminal interleaved MEOL interconnect to the n-well reduces the top terminal parasitic capacitance to total capacitance ratio from 4% to 0.6%, but at the expense of higher capacitor nonlinearity and an increase in the bottom terminal parasitic capacitance to total capacitance ratio from 4.5% to 20%-22%.

[0061] It is understood that the specific order or hierarchy of steps in the processes disclosed is an example of example approaches. Based on design preferences, it will be understood that the specific order or hierarchy of steps in the processes may be rearranged. Further, some steps may be combined or omitted. The accompanying method claims present elements of the various steps in a sample order, and are not intended to be limited to the specific order or hierarchy presented.

[0062] The foregoing description is provided to enable any person skilled in the art to practice the various aspects described herein. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other aspects. Thus, the claims are not intended to be limited to the aspects shown herein but are to be accorded the widest scope consistent with the language of the claims, and references to elements in the singular do not mean "one and only," unless expressly stated otherwise, but rather "one or more." The word "exemplary" is used herein to mean "serving as an example, instance, or illustration." Any aspect described herein as "exemplary" should not necessarily be construed as preferred or advantageous over other aspects. Unless expressly stated otherwise, the term "some" refers to one or more. Combinations such as "at least one of A, B, or C," "at least one of A, B, and C," and "A, B, C, or any combination thereof" include any combination of A, B, and / or C, and may include multiple As, multiple Bs, or multiple Cs. In particular, combinations such as "at least one of A, B, or C," "at least one of A, B, and C," and "A, B, C, or any combination thereof" may be A only, B only, C only, A and B, A and C, B and C, or A and B and C, where any such combination may include one or more members of A, B, or C. All structural and functional equivalents of the elements of the various aspects described throughout this disclosure that are known or later become known to those of skill in the art are expressly incorporated herein by reference and are intended to be encompassed by the claims. Furthermore, nothing disclosed herein is intended to be made public, regardless of whether such disclosure is expressly recited in the claims. No element of the claims should be construed as a means-plus-function unless the element is expressly recited using the phrase "means for."

[0063] The following examples are illustrative only and may be combined, without limitation, with other embodiments or aspects of the teachings described herein.

[0064] Aspect 1 is a device including a first plurality of mid-end-of-line (MEOL) interconnects coupled to a second node and extending in a first direction across at least a portion of the device. The first plurality of MEOL interconnects includes at least a first subset of the MEOL second terminal interconnects and a second subset of the MEOL second terminal interconnects. The device further includes a second plurality of MEOL interconnects coupled to the first node and extending in the first direction across at least a portion of the device. The second plurality of MEOL interconnects includes at least the first subset of the MEOL first terminal interconnects and a second subset of the MEOL first terminal interconnects. The first subset of the MEOL second terminal interconnects and the first subset of the MEOL first terminal interconnects are interleaved, being a first subset of interleaved MEOL interconnects. The second subset of the MEOL second terminal interconnects and the second subset of the MEOL first terminal interconnects are interleaved, forming a second subset of interleaved MEOL interconnects. The device further includes at least one of a first plurality of gate interconnects or a first plurality of oxide diffusion (OD) regions extending in a second direction between the first subset of interleaved MEOL interconnects and the second subset of interleaved MEOL interconnects. The second direction is orthogonal to the first direction.

[0065] Example 2 is the device of example 1, wherein the first plurality of MEOL interconnects are configured to be at least a portion of a second terminal of the capacitor, and the second plurality of MEOL interconnects are configured to be at least a portion of a first terminal of the capacitor.

[0066] Example 3 is the device of any of Examples 1 and 2, wherein at least one of the first plurality of gate interconnects or the first plurality of OD regions comprises both the first plurality of gate interconnects and the first plurality of OD regions, and the first plurality of gate interconnects and the first plurality of OD regions are interleaved.

[0067] Example 4 is the device of Example 3, wherein the first plurality of gate interconnects and the first plurality of OD regions are floating.

[0068] Aspect 5 is a device of any of aspects 1-4, wherein the first plurality of MEOL interconnects further comprises a third subset of the MEOL second terminal interconnects and a fourth subset of the MEOL second terminal interconnects, and the second plurality of MEOL interconnects further comprises a third subset of the MEOL first terminal interconnects and a fourth subset of the MEOL first terminal interconnects, the third subset of the MEOL second terminal interconnects being interleaved with the third subset of the MEOL first terminal interconnects, and the fourth subset of the MEOL second terminal interconnects being interleaved with the fourth subset of the MEOL first terminal interconnects.

[0069] Example 6 is the device of example 5, wherein the third subset of the MEOL second terminal interconnects and the third subset of the MEOL first terminal interconnects are a third subset of interleaved MEOL interconnects, and the fourth subset of the MEOL second terminal interconnects and the fourth subset of the MEOL first terminal interconnects are a fourth subset of interleaved MEOL interconnects.

[0070] Example 7 is the device of Example 6, wherein at least one of the first plurality of gate interconnects or the first plurality of OD regions comprises both the first plurality of gate interconnects and the first plurality of OD regions, the first plurality of gate interconnects and the first plurality of OD regions are interleaved, and the first plurality of gate interconnects and the first plurality of OD regions are floating.

[0071] Example 8 is the device of Example 7, further comprising a second plurality of gate interconnects extending in the second direction between the second subset of the interleaved MEOL interconnects and the third subset of the interleaved MEOL interconnects, the second plurality of gate interconnects being floating.

[0072] Example 9 is the device of Example 8, further comprising: a third plurality of gate interconnects extending in the second direction between the third subset of the interleaved MEOL interconnects and the fourth subset of the interleaved MEOL interconnects; and a second plurality of OD regions extending in the second direction between the third subset of the interleaved MEOL interconnects and the fourth subset of the interleaved MEOL interconnects, the third plurality of gate interconnects and the second plurality of OD regions being interleaved, wherein the third plurality of gate interconnects and the second plurality of OD regions are floating.

[0073] Example 10 is the device of any of Examples 1-9, further comprising an n-well extending throughout the device, the n-well underlying the first plurality of MEOL interconnects and the second plurality of MEOL interconnects.

[0074] Example 11 is the device of Example 10, wherein the first plurality of MEOL interconnects are coupled to the n-well.

[0075] Example 12 is the device of Example 10, wherein the third node is coupled to the n-well, and the third node is not connected to the first node and the second node.

[0076] Example 13 is the device of any of Examples 1-12, further comprising a back-end-of-line (BEOL) metal-oxide-metal (MOM) capacitor having a second terminal coupled to the second node and a first terminal coupled to the first node.

[0077] Example 14 is a device of any of Examples 1-13, further comprising a first set of vias coupling a first plurality of MEOL interconnects on a first side of the device to a second node, and a second set of vias coupling a second plurality of MEOL interconnects on a second side of the device to the first node.

[0078] Example 15 is a device of any of Examples 1 to 14, further comprising: a third plurality of MEOL interconnects coupled to the second node and extending in a first direction across at least a portion of the device, where the first plurality of MEOL interconnects and the third plurality of MEOL interconnects are collinear; and a fourth plurality of MEOL interconnects coupled to the first node and extending in the first direction across at least a portion of the device, where the third plurality of MEOL interconnects and the fourth plurality of MEOL interconnects are interleaved.

[0079] Example 16 is the device of example 15, further comprising: a first set of vias coupling the first plurality of MEOL interconnects on the first side of the device to a second node; a second set of vias coupling the second plurality of MEOL interconnects and the fourth plurality of MEOL interconnects to the first node; and a third set of vias coupling the third plurality of MEOL interconnects on the second side of the device to the second node.

[0080] Example 17 is the device of Example 16, wherein the second set of vias is approximately at the center of the device.

[0081] Example 18 is a device of any of Examples 1-13 and 15, further comprising: a first interconnect extending in a second direction across the device and adjacent a first side of the device, the first interconnect being coupled to the first plurality of MEOL interconnects and the second node; and a second interconnect extending in the second direction across the device and coupled to the second plurality of MEOL interconnects and the first node.

[0082] Example 19 is the device of example 18, wherein the first plurality of MEOL interconnects extend as fingers in a first direction from the first interconnect to the second interconnect, and the second plurality of MEOL interconnects extend as fingers in the first direction from the second interconnect to the first interconnect.

[0083] Example 20 is the device of any of Examples 18 and 19, wherein each of the first interconnect and the second interconnect is a first type interconnect, and each of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects is a second type interconnect.

[0084] Example 21 is a device of example 20, wherein each of the first interconnect and the second interconnect has a first thickness in a third direction perpendicular to the first direction and the second direction, and each of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a second thickness in the third direction, the second thickness being greater than the first thickness.

[0085] Example 22 is the device of any of Examples 18-21, wherein the first interconnect and the first plurality of MEOL interconnects are bonded to each other on the same layer, and the second interconnect and the second plurality of MEOL interconnects are bonded together on the same layer.

[0086] Example 23 is the device of any of Examples 18-22, wherein the first interconnect and the second interconnect are MEOL interconnects.

[0087] Example 24 is the device of any of Examples 18-23, wherein the second interconnect is substantially adjacent to a second side of the device, the second side being opposite the first side in the first direction.

[0088] Example 25 is the device of Example 24, further comprising a third interconnect extending in a second direction across the device, the third interconnect adjacent a second side of the device, and the third interconnect coupled to the first interconnect.

[0089] Example 26 is the device of Example 25, further comprising a BEOL interconnect on a third side of the device, the BEOL interconnect coupling the first interconnect and the third interconnect together.

[0090] Example 27 is the device of any of Examples 25 and 26, wherein the third interconnect is a MEOL interconnect.

[0091] Example 28 is the device of any of Examples 18-23, further comprising: a third interconnect adjacent a second side of the device, the second interconnect being approximately at the center of the device, the device extending in the second direction across the device, the second side being opposite the first side in the first direction; a third plurality of MEOL interconnects in contact with the third interconnect and extending as fingers in the first direction from the third interconnect to the second interconnect; and a fourth plurality of MEOL interconnects in contact with the second interconnect and extending as fingers in the first direction from the second interconnect to the third interconnect, wherein the third plurality of MEOL interconnects and the fourth plurality of MEOL interconnects are interleaved.

[0092] Example 29 is the device of example 28, wherein the first interconnect, the first plurality of MEOL interconnects, the third interconnect, and the third plurality of MEOL interconnects are configured to be at least a portion of a second terminal of the capacitor, and the second interconnect, the second plurality of MEOL interconnects, and the fourth plurality of MEOL interconnects are configured to be at least a portion of a first terminal of the capacitor.

[0093] Example 30 is the device of any of Examples 28 and 29, wherein the third interconnect is a MEOL interconnect.

[0094] In an embodiment 31, each gate interconnect of the first plurality of gate interconnects is disposed at a distance h from the bulk substrate in a third direction. B1 and each MEOL interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a height of h in a third direction from the bulk substrate, the third direction being perpendicular to the first direction and the second direction, and each MEOL interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a thickness in the third direction of hh. B1The device of any one of aspects 1 to 30,

Claims

1. A device, comprising: a first plurality of middle-end-of-line (MEOL) interconnects coupled to a second node and extending in a first direction across at least a portion of the device, the first plurality of MEOL interconnects including at least a first subset of the MEOL second terminal interconnects and a second subset of the MEOL second terminal interconnects; a second plurality of MEOL interconnects coupled to a first node and extending in the first direction across at least a portion of the device, the second plurality of MEOL interconnects including at least a first subset of MEOL first terminal interconnects and a second subset of MEOL first terminal interconnects, the first subset of MEOL second terminal interconnects and the first subset of MEOL first terminal interconnects being interleaved, the first subset of interleaved MEOL interconnects, and the second subset of MEOL second terminal interconnects and the second subset of MEOL first terminal interconnects being interleaved, the second subset of interleaved MEOL interconnects; at least one of a first plurality of gate interconnects or a first plurality of oxide diffusion (OD) regions extending in a second direction between a first subset of the interleaved MEOL interconnects and a second subset of the interleaved MEOL interconnects, the second direction being orthogonal to the first direction; A device comprising:

2. 2. The device of claim 1 , wherein the first plurality of MEOL interconnects is configured to be at least a portion of a second terminal of a capacitor, and the second plurality of MEOL interconnects is configured to be at least a portion of a first terminal of the capacitor.

3. 2. The device of claim 1 , wherein the at least one of the first plurality of gate interconnects or the first plurality of OD regions comprises both the first plurality of gate interconnects and the first plurality of OD regions, and the first plurality of gate interconnects and the first plurality of OD regions are interleaved.

4. The device of claim 3 , wherein the first plurality of gate interconnects and the first plurality of OD regions are floating.

5. the first plurality of MEOL interconnects further comprising: a third subset of MEOL second terminal interconnects; and a fourth subset of MEOL second terminal interconnects; the second plurality of MEOL interconnects further comprising: a third subset of MEOL first terminal interconnects; and a fourth subset of MEOL first terminal interconnects; a third subset of the second terminal interconnects of the MEOL are interleaved with a third subset of the first terminal interconnects of the MEOL; a fourth subset of the second terminal interconnects of the MEOL are interleaved with a fourth subset of the first terminal interconnects of the MEOL. The device of claim 1 .

6. 6. The device of claim 5, wherein a third subset of the MEOL second terminal interconnects and a third subset of the MEOL first terminal interconnects are a third subset of interleaved MEOL interconnects, and a fourth subset of the MEOL second terminal interconnects and a fourth subset of the MEOL first terminal interconnects are a fourth subset of interleaved MEOL interconnects.

7. the at least one of the first plurality of gate interconnects or the first plurality of OD regions comprises both the first plurality of gate interconnects and the first plurality of OD regions, the first plurality of gate interconnects and the first plurality of OD regions being interleaved; the first plurality of gate interconnects and the first plurality of OD regions are in a floating state; The device of claim 6.

8. 8. The device of claim 7, further comprising a second plurality of gate interconnects extending in a second direction between a second subset of the interleaved MEOL interconnects and a third subset of the interleaved MEOL interconnects, the second plurality of gate interconnects being floating.

9. a third plurality of gate interconnects extending in the second direction between a third subset of the interleaved MEOL interconnects and a fourth subset of the interleaved MEOL interconnects; a second plurality of OD regions extending in the second direction between a third subset of the interleaved MEOL interconnects and a fourth subset of the interleaved MEOL interconnects, the third plurality of gate interconnects and the second plurality of OD regions being interleaved; and Further equipped with the third plurality of gate interconnects and the second plurality of OD regions are in a floating state; The device of claim 8.

10. 10. The device of claim 1, further comprising an n-type well (n-well) extending throughout said device, said n-well underlying said first plurality of MEOL interconnects and said second plurality of MEOL interconnects.

11. The device of claim 10 , wherein the first plurality of MEOL interconnects are coupled to the n-well.

12. 11. The device of claim 10, wherein a third node is coupled to the n-well, the third node being unconnected to the first node and the second node.

13. 10. The device of claim 1, further comprising: a back-end-of-line (BEOL) metal-oxide-metal (MOM) capacitor having a second terminal coupled to the second node and a first terminal coupled to the first node.

14. a first set of vias coupling the first plurality of MEOL interconnects on a first side of the device to the second node; a second set of vias coupling the second plurality of MEOL interconnects on a second side of the device to the first node; The device of claim 1 further comprising:

15. a third plurality of MEOL interconnects coupled to the second node and extending in the first direction across at least a portion of the device, the first plurality of MEOL interconnects and the third plurality of MEOL interconnects being collinear; a fourth plurality of MEOL interconnects coupled to the first nodes and extending in the first direction across at least a portion of the device; Further comprising: the third plurality of MEOL interconnects and the fourth plurality of MEOL interconnects are interleaved. The device of claim 1 .

16. a first set of vias coupling the first plurality of MEOL interconnects on a first side of the device to the second node; a second set of vias coupling the second plurality of MEOL interconnects and the fourth plurality of MEOL interconnects to the first node; a third set of vias coupling the third plurality of MEOL interconnects on a second side of the device to the second node; The device of claim 15 further comprising:

17. The device of claim 16 , wherein the second set of vias is approximately at a center of the device.

18. a first interconnect extending across the device in the second direction adjacent a first side of the device, the first interconnect being coupled to the first plurality of MEOL interconnects and to the second node; a second interconnect extending in the second direction across the device, the second interconnect being coupled to the second plurality of MEOL interconnects and to the first node; The device of claim 1 further comprising:

19. 20. The device of claim 18, wherein the first plurality of MEOL interconnects extend as fingers in the first direction from the first interconnect toward the second interconnect, and the second plurality of MEOL interconnects extend as fingers in the first direction from the second interconnect toward the first interconnect.

20. 20. The device of claim 18, wherein each of the first interconnect and the second interconnect is a first type of interconnect, and each interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects is a second type of interconnect.

21. 21. The device of claim 20, wherein each of the first interconnect and the second interconnect has a first thickness in a third direction perpendicular to the first direction and the second direction, and each interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a second thickness in the third direction, the second thickness being greater than the first thickness.

22. 20. The device of claim 18, wherein the first interconnect and the first plurality of MEOL interconnects are bonded together on a same layer, and the second interconnect and the second plurality of MEOL interconnects are bonded together on a same layer.

23. 20. The device of claim 18, wherein the first interconnect and the second interconnect are MEOL interconnects.

24. 20. The device of claim 18, wherein the second interconnect is generally adjacent to a second side of the device, the second side being opposite the first side in the first direction.

25. 25. The device of claim 24, further comprising a third interconnect extending in the second direction across the device, the third interconnect adjacent the second side of the device, the third interconnect coupled to the first interconnect.

26. 26. The device of claim 25, further comprising a back-end-of-line (BEOL) interconnect on a third side of the device, the BEOL interconnect coupling the first interconnect and the third interconnect together.

27. 26. The device of claim 25, wherein the third interconnect is a MEOL interconnect.

28. the second interconnect is approximately at a center of the device, the device comprising: a third interconnect extending across the device in the second direction and adjacent a second side of the device, the second side being opposite the first side in the first direction; and a third plurality of MEOL interconnects contacting the third interconnect and extending as fingers in the first direction from the third interconnect toward the second interconnect; a fourth plurality of MEOL interconnects contacting the second interconnects and extending as fingers in the first direction from the second interconnects toward the third interconnects; Further comprising: the third plurality of MEOL interconnects and the fourth plurality of MEOL interconnects are interleaved.

20. The device of claim 18.

29. 30. The device of claim 28, wherein the first interconnect, the first plurality of MEOL interconnects, the third interconnect, and the third plurality of MEOL interconnects are configured to be at least a portion of a second terminal of a capacitor, and the second interconnect, the second plurality of MEOL interconnects, and the fourth plurality of MEOL interconnects are configured to be at least a portion of a first terminal of the capacitor.

30. 30. The device of claim 28, wherein the third interconnect is a MEOL interconnect.

31. Each gate interconnect of the first plurality of gate interconnects is disposed at a distance h from the bulk substrate in a third direction. Ｂ１ each MEOL interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a height of h from the bulk substrate in the third direction, the third direction being orthogonal to the first direction and the second direction, and each MEOL interconnect of the first plurality of MEOL interconnects and the second plurality of MEOL interconnects has a thickness in the third direction of h-h Ｂ１ The device of claim 1 , wherein

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