Raw material equipment and TLE system

Abstract

The present invention relates to a source device (10) for a TLE system (100) for providing a source element (12) including or consisting of a source material (14) to be evaporated and / or sublimated by a laser beam (112), the source element (12) comprising a support (20) for carrying the source element (12), the support (20) enclosing a free space (60) free from structural elements of the support (20), the free space (60) being cylindrical and extending along a central axis (66) of the free space (60), and a surface portion (22) of the support (20) including a casing (22) for arranging the casing (22) and ...). An opening (24) provided in the support (20) provides a passageway from outside the support (20) to the free space (60), the opening (24) defines an upper end (62) of the free space (60), a feedstock element (12) disposed within the free space (60) and spaced from the opening (24) along a central axis (66) of the free space (60) defines a lower end (64) of the free space (60), and a wall structure (30) of the support (20) surrounding the free space (60) between the upper end (62) and the lower end (64) has a mirror surface (32) that reflects the laser light (112).

Description

[Technical field]

[0001] The present invention relates to a source device for a TLE system providing a source element comprising or consisting of a raw material to be evaporated and / or sublimated by laser light, the source device comprising a support for carrying said source element.Furthermore, the present invention relates to a TLE system comprising a laser source for providing laser light, a reaction chamber containing a reaction atmosphere, a source device for providing a source element comprising or consisting of a raw material to be evaporated and / or sublimated by said laser light in said reaction chamber, and a substrate device for providing a substrate to be coated with the evaporated and / or sublimated raw material in said reaction chamber. [Background technology]

[0002] In thermal laser deposition (TLE), materials are evaporated and / or sublimated by laser heating in a controlled environment, typically in a reaction chamber filled with a reactive atmosphere, with the goal of coating surfaces with thin films. However, undesirable or harmful coatings can form on the inner surfaces of components present in the reaction chamber, such as entrance windows and laser mirrors.

[0003] As shown in Fig. 1, a narrow region of high deposition rate with very weak radial dependence is obtained by providing the raw material 14 to be evaporated and / or sublimated using an elongated crucible 40. The lower part of Fig. 1 shows a raw material element 12 placed at the lower end 44 of such a crucible 40. The raw material 14 is evaporated and / or sublimated by laser light 112.

[0004] The top part of Figure 1 shows the distribution of evaporated and / or sublimated source material 14 at the position of substrate 132 (not shown, see Figure 9) on the horizontal axis of the distribution. Every point of substrate 132 within the central part 16 of the distribution is irradiated by molecules in the direct line of sight from all exposed surfaces of source elements 12. This region therefore has the highest deposition rate and a very weak radial dependence.

[0005] In the wings 18 adjacent to the central portion 16, the flux of source material 14 is partially shadowed by the walls of the crucible 40. Within this region, a large, almost linear, decrease in deposition is observed moving radially outward. Further out in the distribution, only source material 14 re-emitted from the walls of the crucible 40 reaches the plane on which the substrate 132 is located. The deposition rate in this region is small, typically less than 10% of the peak value, and drops off rapidly with increasing distance from the center.

[0006] However, FIG. 1 also reveals a problem when using the elongated crucible 40. The laser beam 112 must be oriented very steeply with respect to the crucible 40 in order to reach the surface of the raw material element 12. For this reason, the laser beam 112 must be located in the center 16 or at least at the boundary between the center 16 and the wings 18 of the distribution of evaporated and / or sublimated raw material 14. The positioning of the laser beam 112 limits the space required for the deposition of the substrate 132 in the first place. In addition, there is a risk of undesirable or harmful coatings on the guide elements of the laser beam 112, such as mirrors and entrance windows 126 (see FIG. 9). This leads to increased maintenance costs and shorter maintenance intervals.

[0007] State-of-the-art TLE systems address the latter problem by providing an aperture in the path of the laser beam between the entrance window and the source element. However, aligning and maintaining this aperture with the laser beam requires some effort, e.g., observing and controlling the position of the laser beam at the aperture using adjustments and cameras. Also, deposition requires large sources that move a larger distance upward than the other sources in order to evaporate and / or sublimate materials at a high flux. This requires additional positioning elements in the chamber. Summary of the Invention [Problem to be solved by the invention]

[0008] It is an object of the present invention to provide an improved source arrangement, an improved TLE system and an improved method of using a TLE system that does not have the disadvantages of the state of the art. In particular, it is an object of the present invention to provide an improved source arrangement, an improved TLE system and an improved method of using a TLE system that provides a stable high flux of evaporation with very low radial dependence while preventing unintentional coating of the TLE system components. [Means for solving the problem]

[0009] The object of the invention is achieved by the respective independent patent claims. In particular, the object of the invention is achieved by a TLE system according to independent claim 1, a feed device according to independent claim 26 and a method using a TLE system according to independent claim 34. The dependent claims describe preferred embodiments of the invention. Details and advantages stated with respect to the feed device according to the first aspect of the invention also refer to the TLE system according to the second aspect of the invention and to the method according to the third aspect of the invention and vice versa, wherever this makes technical sense.

[0010] According to a first aspect of the present invention, the object is achieved by a raw material device for a TLE system providing raw material elements including or consisting of raw material to be evaporated and / or sublimated by laser light, comprising a support for carrying the raw material elements, the support enclosing a free space free from structural elements of the support, the free space extending along a central axis of the free space and being cylindrical, an opening provided in a surface portion of the support providing a passage from outside the support to the free space, the opening defining an upper end of the free space, the raw material elements arranged in the free space and spaced apart from the opening along the central axis of the free space defining a lower end of the free space, and a wall structure of the support enclosing the free space between the upper end and the lower end having a mirror surface for reflecting laser light.

[0011] The source device according to the first aspect of the invention is intended for use with or within a thermal laser deposition system (TLE system). To this end, the source device may be placed in a reaction chamber of a TLE system filled with a reaction atmosphere. Suitable means for mounting and fixing the source device may be part of the source device and / or the reaction chamber.

[0012] The feed device is used to provide the actual feed element to be evaporated and / or sublimated. The feed element itself can comprise one or more raw materials, and in particular can consist of a single raw material due to high purity requirements. The feed device comprises a support carrying a single feed element. However, embodiments of the feed device comprising two or more supports, each of which carries a single feed element, are also possible. In this case, the feed elements may be identical or may contain raw materials of different composition.

[0013] In particular, the support encloses a free space, which is free from the structural elements of the support and therefore also from the structural elements of the source device and other parts of the TLE system. However, the free space is accessible from the outside of the support through an opening in the surface of the support. The free space when used in a TLE system is therefore open to the interior of the reaction chamber and is filled with a reaction atmosphere.

[0014] The free space is elongated along a central axis of the free space. In other words, the extension of the free space along the central axis of the free space is longer than its extension perpendicular to said central axis. The central axis itself is an imaginary straight line, preferably passing through the centre of each cross section of the free space perpendicular to the central axis. The extensions along and perpendicular to the central axis of the free space provide a cylindrical free space.

[0015] As mentioned above, the free space is accessible from the outside of the support through an opening in the surface of the support. In fact, said opening defines the upper end of the free space. In other words, the free space starts from an opening in the surface of the support and extends into the inside of the support. As mentioned above, near the upper end the free space has its columnar middle stage. The wall structure of the support surrounds said middle stage of the free space. The lower end of the free space is defined by the raw material element. The free space ends at the surface of the raw material element facing the free space. The raw material element is therefore located inside the support. The support itself has suitable means for arranging the raw material element in the desired design position inside the support.

[0016] In summary, the support of the source device according to the invention provides and carries the source elements. The source elements are arranged in the support and are accessible through openings in the surface of the support. A columnar free space extends between the opening and the support. In other words, the source elements are arranged in the support so as to define the lower end of the free space, forming a device similar to an elongated crucible. By evaporating and / or sublimating the raw material of the source elements, a narrow region of high deposition rate with very weak radial dependence is provided. In essence, this region of high deposition rate is fixed to an imaginary extension of the central axis extending beyond the upper end of the free space.

[0017] Essentially, in the raw material device according to the first aspect of the present invention, the wall of the support has a mirror surface that reflects the laser light. In particular, the mirror surface reflects the laser light specularly and / or diffusely. As described above, the wall structure surrounds a middle section between the upper and lower ends of the free space. By having the mirror surface, the laser light for evaporating and / or sublimating the raw material does not need to directly impinge on the raw material element, but can be reflected on the mirror surface one or more times. The laser light enters the free space and is guided to the raw material element in the free space by one or more reflections on the mirror surface.

[0018] Thus, the initial direction of the laser light, in other words the direction in which the laser light enters the free space, can be selected without the restriction of the presence of a direct line of sight to the raw material element. Therefore, the laser source providing the laser light, or at least the last optical element in the path of the laser light before it enters the free space, can be arranged in the reaction chamber so that it is located outside the above-mentioned central part of the distribution of evaporated and / or sublimated raw material, preferably outside the wings adjacent to said central part of the distribution. This makes it possible to avoid the occurrence of unintended, often harmful, coatings on the elements of the laser system.

[0019] In conclusion, the source device according to the first aspect of the invention provides an area of ​​evaporated and / or sublimated raw material with a very low radial dependence and high density, i.e. an area that is particularly suitable for placing a substrate on it. This is due to the long and narrow columnar free space that trims and narrows the flux of evaporated and / or sublimated raw material. Furthermore, the provision of a reflective mirror surface makes it possible to position the laser source, at least the last element of the laser light guidance system in the reaction chamber, in an area of ​​low or negligible flux of evaporated and / or sublimated raw material. This makes it possible to avoid undesirable or harmful coatings on the laser light guidance elements, such as mirrors and entrance windows, which increase maintenance costs and shorten maintenance intervals.

[0020] Furthermore, in the source device according to the present invention, the mirror surface can be provided so as to completely surround the free space along the central axis. In other words, the laser light is reflected by the mirror surface of the wall structure regardless of the angle around the central axis. This simplifies the source device in the reaction chamber. Moreover, since there is no need to provide a dedicated second reflection area for the second reflection, fourth reflection, etc. in the free space, multiple reflections of the laser light on the mirror surface can be provided more easily.

[0021] Furthermore, the raw material device according to the invention can be characterized in that the mirror surface at least partially has a wavy surface structure that diffuses the reflected laser light. Since the free space is surrounded by the mirror surface of the wall structure, a focusing effect of the laser light can occur, resulting in a very high power density near each focal point. Such a focal point can lead to unstable evaporation and / or sublimation, contamination of the raw material due to excessive heating of the support, and even failure of the support. To avoid this, it is effective to make the mirror surface wavy, in particular a wavy surface with a well-defined range of local surface inclination, since it diffuses the reflected laser light into a well-defined angular range upon reflection. This angular range should be as large as possible to ensure good averaging and spreading of the radiation, while being small enough so that the longitudinal propagation of the incident light is not reversed by a substantial number of degrees before reaching the raw material. In particular, polishing along the major axis of the free space, for example with sandpaper of grit size, preferably around 800, is effective in minimizing reflections that cause light to diffuse laterally with respect to the direction of propagation into the free space while at the same time reversing the direction of light propagation towards the top of the free space.

[0022] In another embodiment of the source device according to the invention, the cross section of the opening completely includes the cross section of the top end of the free space. An opening in the surface of the support defines the top end of the free space. By the opening completely including the cross section of the top end of the free space, the complete cross section of the top end of the free space is accessible to both the incoming laser light and the outgoing evaporated and / or sublimated source material. This avoids the laser light being absorbed in the top end of the free space before it enters the free space and the evaporated and / or sublimated source material being deposited on the top end of the free space.

[0023] The source device according to the invention can be made more robust by making the cross section of the opening the same as the cross section of the top end of the free space. This ensures that the opening in the support does not extend beyond the size required for the cross section of the top end of the free space. It is therefore possible to provide a particularly compact support setup. The opening in the surface of the support also provides a passage into the interior of the support, and therefore also makes it possible to protect the interior of the support from undesired or harmful ingress, for example of reaction gases or evaporated and / or sublimated raw materials.

[0024] Furthermore, the feed device according to the invention can be characterized in that the extent of the free space along the central axis is equal to or greater than the diameter of its upper end, in particular equal to or greater than twice as large. As mentioned above, in the wings adjacent to the center of the distribution of evaporated and / or sublimated raw material, the raw material flux is partially shadowed. This shadowing effect increases with the extension of the free space along the central axis, so that the size of the wings is directly related to the extension of the free space along the central axis. By making the extent of the free space along the central axis equal to or greater than the diameter of its upper end, in particular equal to or greater than twice as large, it is possible to provide particularly small wings and thus a particularly defined center in the distribution of evaporated and / or sublimated raw material.

[0025] In one embodiment of the source device according to the present invention, the free space is rotationally symmetrical with respect to the central axis. Therefore, the center of the distribution of the evaporated and / or sublimated raw material is rotationally symmetrical with respect to the central axis and its imaginary extension beyond the upper end of the free space. This makes it easier to apply a regular uniform coating to the placed substrate. Furthermore, especially in combination with a mirror surface surrounding the free space, it is possible to reflect the laser light on the mirror surface inside, regardless of the angle around the central axis at which the laser light enters the free space from the upper end of the free space.

[0026] In a first alternative embodiment, the free space can be cylindrical, which makes the source device according to the invention robust. In other words, the wall structure of the support, in particular the mirror surface, is aligned parallel or at least substantially parallel to the central axis. This ensures that the average reflection angle in the cylindrical free space is constant relative to the central axis of the free space, in particular regardless of the number of reflections. In addition, the cross section of the source element defining the lower end is also constant. The center of the distribution of evaporated and / or sublimated raw material therefore remains constant, or at least substantially constant, regardless of the actual positioning of the surface of the source element and the extent of the free space along its central axis, respectively.

[0027] In a second alternative embodiment, the free space can be made conical to make the source device according to the invention more robust. In other words, the wall structure of the support, in particular the mirror surfaces, are aligned with an angle with respect to the central axis by the opening angle. In this case, the average reflection angle with respect to the central axis is reduced by the opening angle with each reflection. The geometry must therefore be designed in such a way that the laser light reaches the source element that defines the lower end of the free space before reversing its propagation direction along the central axis. On the other hand, this optimization results in a relatively small longitudinal propagation of the laser light that is sufficiently homogeneous and longitudinally focused near the lower end of the free space and therefore near the source material to be evaporated and / or sublimated. In addition, such a configuration provides a more homogeneous heating of the source elements in this region, since the reflected laser light mixes more homogeneously after multiple reflections, thereby contributing to achieving a homogeneous and efficient evaporation or sublimation.

[0028] Furthermore, the source device can be characterized in that the support has a tubular crucible with a closed lower end, the source elements are arranged at the lower end, the crucible enclosing the free space and thus forming at least a part of the wall structure of the support. Crucibles are known devices for providing source elements that can have various source materials, including liquid source materials or source materials that melt completely when irradiated with laser light of sufficient energy density. By realizing the crucible as part of the support, in particular as a mirror surface enclosing the free space, these known features of the crucible are also provided by the source device according to the invention. However, the shape and dimensions of each crucible must be set in such a way that a particularly elongated cylindrical free space is enclosed by it.

[0029] Alternatively, the raw material device according to the invention may be configured as follows: the raw material elements are free-standing, the support has a tubular retainer with an open lower end, the raw material elements are inserted into the retainer from the lower end, the retainer encloses the free space and thus forms at least a part of the wall structure of the support. The retainer in this embodiment is similar to the crucible described above, but differs from it in that it includes an open lower end. The free-standing raw material elements can be inserted from the open lower end. This allows, for example, a simple exchange of raw material elements, in particular with raw material elements with different compositions, in particular without changing the retainer. Preferably, the retainer has a constant, in particular circular, cross-section, at least in the part where the raw material elements are inserted. More preferably, the raw material elements have a cross-section corresponding to each cross-section of the retainer, in particular a cross-section of the same shape but slightly smaller size. Thus, the lower end of the retainer is completely filled with raw material elements, and therefore also the lower end of the free space defined by the raw material elements. In particular, the laser light that reaches the lower end of the free space is completely absorbed by the feedstock element.

[0030] In a further enhanced embodiment, the feed device according to the invention is characterized in that: the support comprises an actuator for moving the feed element in the retainer, in particular towards the upper end of the free space. In this embodiment, the feed element can be moved, in particular along the central axis. This causes the surface of the feed element, and thus the raw material that is actually evaporated and / or sublimated, to be moved upwards during operation. It is therefore possible to keep the surface of the feed element in the retainer at the same position during operation. This makes it possible to avoid flux transients due to exhaustion of the feed element during operation. Since the feed element can in principle be of any length, and since the mirror surface of the wall structure and the surface of the feed element at a constant position do not change over time, as the relative geometry of the laser light, the feed device allows a long-term operation under constant operating conditions. Alternatively or additionally at different times, the position of the surface of the feed element can be kept in different constant positions relative to the upper end of the free space. This makes it possible to change the resulting flux distribution of the evaporated and / or sublimated raw material, in particular the width of the wings of the flux distribution. In particular, the position of the feedstock elements within the retainer can be dynamically altered during operation, allowing for significant changes in the flux distribution, and therefore the thickness profile, of the feedstock material deposited on the substrate.

[0031] Furthermore, the source device can be provided with an enclosure that surrounds one or more crucibles and / or retainers along the central axis, at least in the region of the free space of each of the crucibles or retainers, and forms at least a part of the wall structure of the support. The enclosure can support, for example, the structural stability of each of the crucibles or retainers. In particular, it is also possible to replace the crucibles or retainers, respectively, containing the source elements, while continuing to use the same enclosure. In short, the flexibility of use of the source device according to the invention can be increased.

[0032] Furthermore, the source device according to the present invention is strengthened by having the enclosure completely enclose the one or more crucibles and / or retainers and the respective source elements, except for the opening forming the upper end of the free space. In other words, the enclosure has an enclosed volume, one for each crucible or retainer. This enclosed volume starts from the opening in the surface of the support and extends into the volume of the support. Such an enclosed volume can prevent leakage of source material, especially liquid source material, and / or laser light that has escaped the mirror surface and the source elements. This avoids the remaining source device or TLE system from being damaged by such a malfunction.

[0033] In one embodiment of the source device according to the invention, the surface of the crucible or the retainer facing the free space is the mirror surface of the wall structure of the support. Thus, the inner surfaces of both the crucible and the retainer directly facing the free space form a mirror surface, respectively. No other elements are required to provide the mirror surface. This allows simplifying the design of the source device according to the invention. Since both the crucible and the retainer enclose the free space between the upper and lower ends of the free space, the mirror surfaces formed by the crucible and the retainer also enclose the free space. Thus, reflection of the laser light is provided regardless of the direction of the laser light.

[0034] In an enhanced embodiment of the source device according to the invention, at least the part of the crucible or the retainer forming the mirror surface, and preferably the whole of the crucible or the retainer, is made from aluminum or tantalum or molybdenum or stainless steel. All of these materials provide at least one of the following attributes: stability, high melting point, and / or good reflectivity. For each of the source elements having different compositions of raw material, the most suitable material for the crucible or the retainer can be provided.

[0035] Alternatively to the embodiment described in the two paragraphs above, the source device can be characterized in that the material of the crucible or the retainer is at least partially transparent to the laser light, and the surface of the enclosure facing the free space is the mirror surface of the wall structure of the support. The laser light passes through the transparent crucible or the retainer, respectively, and is reflected by the surface of the enclosure forming the mirror surface. In this variant, the enclosure must be highly reflective in order to avoid a dominant absorption of the laser power in the enclosure. Since the crucible or the retainer is transparent to the laser light, no, or at least substantially no, absorption of the laser energy in the material forming the crucible or the retainer occurs. Thus, heating of the source element by the impinging laser light only can be ensured. Furthermore, since the mirror surface reflecting the laser light is at least a little away from the surface of the source element, it is also possible to heat a side portion of the source element different from the surface of the source element that defines the lower end of the free space, at least near said lower end.

[0036] The source device of the present invention can be further strengthened by the following configuration: the crucible or the retainer is at least partially, preferably completely, made of quartz or sapphire or borosilicate glass. In many applications of TLE systems, the laser light has a wavelength of about 1 μm. Each of the listed materials, quartz, sapphire, and borosilicate glass, has high transparency to light having this wavelength. At the same time, each of quartz, sapphire, and borosilicate glass is stable enough to be manufactured as a crucible or retainer and to provide the necessary support for the source elements.

[0037] Furthermore, the source device according to the present invention may have a configuration in which the enclosure is at least partially, preferably completely, made of aluminum. Aluminum is very useful as an enclosure material since it can be easily machined with high precision. Moreover, it has high thermal conductivity, which is suitable for indirect temperature measurement and / or active cooling or heating of the source elements, for example. Moreover, aluminum, when used as a mirror surface, is highly reflective to laser light having a wavelength of about 1 μm, which is commonly used. Moreover, machining of the enclosure surface with a nearly smooth surface finish as required with a predetermined angular spread to provide a wavy surface structure for diffusing the reflected laser light as described above is also easily provided by using aluminum as the enclosure material.

[0038] Furthermore, the source device according to the invention can be characterized in that the crucible or the retainer and the enclosure are in contact at three contact points. In order to effectively evaporate and / or sublimate the source material, preferably all the energy deposited in the source element from the laser light should be used for this purpose. The contact surface between the crucible or the retainer, respectively, and the enclosure can lead to undesired escape of thermal energy from the source element. Three contact points is the minimum number of contact points to ensure stable installation of the crucible or the retainer inside the enclosure. Therefore, by providing a point-like contact area between the crucible or the retainer, respectively, and the enclosure in addition to only three contact points, it is possible to avoid unavoidable escape of thermal energy of the source element.

[0039] In another embodiment, the source device according to the invention can be characterized in that the support comprises one or more temperature sensors, which measure the temperature of the source elements arranged in and / or on the enclosure. The arrangement of temperature sensors in and / or on the enclosure can provide an indirect measurement of the temperature of at least the surface of the source elements, preferably at the lower end of the free space. Such a measurement is rather indirect, since the results are distorted by temperature gradients in the source elements, mismatches in thermal impedance of the respective materials of the crucible or the retainer, gaps with the enclosure, heat dissipation in the enclosure, etc. On the other hand, such a temperature measurement, although possibly systematically deviating from the actual surface temperature of the source elements, can be useful for process control, for example to stabilize the temperature at a given value or to ensure run-to-run stability.

[0040] In an enhanced embodiment of the ingredient device of the present invention, the one or more temperature sensors are thermocouples or pyrometers. Both thermocouples and pyrometers are suitable temperature sensors to be used to measure the temperature of the ingredient elements. Thermocouples are placed directly on the surface to be measured, whereas pyrometers are sensors that can be placed remotely. Therefore, depending on the boundary conditions, it is possible to select the most suitable temperature sensor.

[0041] The ingredient device of the present invention is further enhanced by the following configuration: the enclosure has one or more bores, in each of which one or more temperature sensors are disposed. The bores allow each of the temperature sensors to be disposed within the volume of the enclosure, reducing the amount of enclosure material between the temperature sensor and the ingredient element. Thus, preferably, the bores end near the end of the ingredient element. In short, disposing the temperature sensor within a bore within the volume of the enclosure helps to improve the accuracy of the temperature measurement.

[0042] In another embodiment, the raw material device according to the invention can be characterized in that the enclosure comprises cooling ducts for the flow of liquid and / or gas coolant, which allow active cooling of the enclosure, in particular by flowing liquid and / or gas coolant through the cooling ducts. The cooling serves to avoid outgassing of the raw material elements to the surroundings, in particular into the reaction chamber of the TLE system. In particular, such cooling keeps the enclosure at a fixed temperature, or at least below a critical temperature at which adverse effects such as outgassing may occur. Furthermore, in embodiments with two or more raw material elements provided by a single raw material device, the cooling provided by the cooling ducts ensures that the individual raw material elements are thermally isolated from each other.

[0043] Furthermore, the source device according to the invention is enhanced by the cooling ducts being arranged in the enclosure at least in the region of the free space. As mentioned above, evaporated and / or sublimated source material may be deposited on the walls surrounding the free space and may be successively re-emitted, forming adjacent parts of the wing of the distribution of evaporated and / or sublimated source material. By actively cooling the enclosure in the region of the free space, said re-emission may be reduced. Furthermore, in embodiments of the source device in which the enclosure provides a mirror surface, by actively cooling the enclosure in the region of the free space, deposition of the energy of the non-reflected laser light in the material of the enclosure may be countered.

[0044] According to a second aspect of the present invention, the object is achieved by a TLE system comprising a laser source for providing laser light, a reaction chamber containing a reaction atmosphere, a source device for providing source elements including or consisting of raw material to be evaporated and / or sublimated by the laser light in the reaction chamber, and a substrate device for providing a substrate to be coated with the evaporated and / or sublimated raw material in the reaction chamber, wherein the source device has a configuration as described in any of the preceding claims, and wherein the laser light and the source device are provided and positioned such that a direct line of sight between the laser light and the raw material elements is completely blocked by the source device, whereby the laser light reflects one or more times on the mirror surface of the source device before impinging on the raw material elements.

[0045] In the TLE system according to the second aspect of the present invention, the laser light provided by the laser light source is used to evaporate and / or sublimate raw material and deposit the evaporated and / or sublimated raw material on a substrate provided by a substrate device. In many cases, the laser light is coupled into the reaction chamber via a coupling means, which is, for example, a simple entrance window provided in the chamber wall of the reaction chamber. Furthermore, a guiding element, such as a mirror for the laser, a focusing element, and / or an aperture, for guiding and / or shaping the laser light can be arranged in the reaction chamber.

[0046] The raw materials are placed in a reaction chamber that can be sealed to prevent the ingress of the ambient atmosphere and can be filled with a reaction atmosphere. The reaction atmosphere can be a vacuum, particularly a 10 -12 The pressure may be up to 100 MPa or a suitable pressure for the material to be deposited, such as a reactant gas providing oxygen for deposition of an oxide of a vaporized source material.

[0047] The TLE system according to the second aspect of the invention comprises a feed device according to the first aspect of the invention, whereby the TLE system according to the second aspect of the invention provides all the features and advantages described with respect to the feed device according to the first aspect of the invention.

[0048] In particular, in the TLE system according to the invention, the source device and the laser light are arranged and aligned in such a way that the direct line of sight of the laser light to the source element provided in the support of the source device is blocked. Thus, in order to evaporate and / or sublimate the source material, the laser light is reflected at least once on the mirror surface provided by the source device according to the first aspect of the invention. This causes the source material to evaporate and / or sublimate and the flux distribution to be concentrated around the central axis of the free space in the support of the source device. Meanwhile, therewith, the laser source or at least the last elements in the guidance system of the laser system, such as the entrance window, mirrors and / or focusing elements, are positioned apart from this well-defined flux of evaporated and / or sublimated source material. Thus, it is possible to avoid the occurrence of undesirable or harmful coatings on the elements present in the reaction chamber, in particular on the inner surfaces of the entrance window or mirrors and / or focusing elements for the laser.

[0049] In an embodiment of the TLE system according to the invention, the source device comprises two or more supports, each of which carries a source element, and / or the TLE system comprises two or more source devices. In other words, in the reaction chamber of the TLE system, there are two or more source elements. The source elements may contain the same source material or different source materials. Thus, together with the provided laser light, the TLE system can provide an alternating deposition or co-deposition of source materials evaporated and / or sublimated from two or more source elements. In particular, source elements providing the same source material can increase the deposition rate and / or provide a spatial variation of the flux of evaporated and / or sublimated source material. Alternatively or additionally, source elements providing different source materials can provide a deposition of a combination of the different evaporated and / or sublimated source materials, in particular with a constant or variable composition.

[0050] Furthermore, the TLE system according to the invention may have the following configuration: the support and the substrate device are arranged in the reaction chamber such that an imaginary extension of the central axis beyond the upper end of the free space hits the substrate, in particular at the center of the substrate and / or perpendicular to the substrate. In other words, the substrate provided by the substrate device can be positioned and aligned in the center of the distribution of evaporated and / or sublimated raw material. This optimizes the deposition of the raw material in the center on the substrate and the coating of the substrate. Alternatively, the substrate provided by the substrate device can be positioned and aligned in the center of the distribution of evaporated and / or sublimated raw material such that an imaginary extension of the central axis hits the substrate away from the substrate center, preferably perpendicularly. In this embodiment, the substrate device preferably comprises an actuator, which moves, in particular rotates, the substrate relative to the distribution of evaporated and / or sublimated raw material. This allows a larger area of ​​the substrate to be coated with evaporated and / or sublimated raw material. In particular, it is possible to provide a coating that is, for example, annular, the radius of which depends on the distance between the center of distribution of evaporated and / or sublimated raw material and the axis of rotation of the substrate.

[0051] Furthermore, the TLE system can be characterized in that the support of the source device is at least partially provided by the chamber wall of the reaction chamber, whereby the support of the source device is at least partially integrated into the chamber wall, and it is possible to avoid providing additional means for positioning and / or aligning the support in the reaction chamber, thus simplifying the organization of the entire TLE system according to the invention.

[0052] In a further enhanced TLE system according to the invention, the support comprises an enclosure, one or more temperature sensors are arranged on and / or within the enclosure, and / or the enclosure comprises cooling ducts, the one or more temperature sensors and / or the cooling ducts being accessible from outside the reaction chamber. As mentioned above, the support of the source device is integrated directly into the chamber wall of the reaction chamber. Thereby, in this enhanced embodiment, the temperature sensors and / or the cooling ducts are also directly accessible. Additional feedthroughs in the chamber wall, which are not only complicated and expensive but also require additional maintenance, can be avoided.

[0053] Furthermore, the TLE system according to the present invention can be characterized as follows: the TLE system comprises two or more laser light sources and / or the laser light sources provide one or more laser lights, which are directed in the reaction chamber to evaporate and / or sublimate the raw material of the same raw material element. Using multiple laser lights to evaporate and / or sublimate the same raw material can heat the raw material more uniformly and therefore more efficiently, because it is more symmetrical. In this case, the two or more laser lights are still reflected by the mirror surface in the raw material device one or more times. This allows the two or more laser lights to be positioned and aligned outside the center of the flux distribution of the raw material resulting from evaporation and / or sublimation.

[0054] In an embodiment of the TLE system according to the invention, the laser light has a wavelength between 100 nm and 10 μm, preferably around 1 μm. Laser light with a wavelength between 100 nm and 10 μm, preferably around 1 μm, is very suitable for vaporizing and / or sublimating raw materials, in particular the raw materials mentioned in the next paragraph. Furthermore, laser light with said wavelengths has high wall plug efficiency and low cost per kilowatt.

[0055] Further, in the TLE system according to the present invention, the raw material of the raw material element comprises, and preferably consists of, at least one of the following elements: Arsenic; Antimony; tellurium; sulfur; selenium.

[0056] This list is a list of preferred raw materials, other raw materials are also possible, in particular all solid and liquid elements and compounds can be used as raw materials in the TLE system according to the invention.

[0057] According to a third aspect of the present invention, the object is to provide a method of using a TLE system comprising a laser source for providing laser light, a reaction chamber containing a reaction atmosphere, a source device for providing a source element including or consisting of a source material to be evaporated and / or sublimated by the laser light in the reaction chamber, and a substrate device for providing a substrate to be coated with the evaporated and / or sublimated source material in the reaction chamber, comprising the following steps: a) providing the laser light in a direction such that a direct line of sight between the laser light and the ingredient element is completely blocked by the ingredient device; b) reflecting the laser light one or more times within the ingredient device before impinging on the ingredient element; c) evaporating and / or sublimating the raw material with the reflected laser light; d) depositing the source material evaporated and / or sublimated in step c) onto the substrate.

[0058] The method according to the present invention can be carried out in a TLE system comprising the basic elements of a TLE system such as a laser source providing laser light, a reaction chamber, a source element, and a substrate, and further comprising positioning means for the required source elements and the substrate.

[0059] Essential for the method according to the invention is the relative positioning and alignment of the laser light, the source element and the substrate, respectively. In particular, in order to provide or even optimize the deposition of evaporated and / or sublimated source material on said substrate in step d), the source element and the substrate are preferably positioned such that there is a direct line of sight to each other. However, in step a), the laser light is provided without a direct line of sight to such source element. This provides the feature and advantage that evaporated and / or sublimated source material moving towards the laser source, at least towards the last optical element of the laser system, such as a mirror or an entrance window, is intercepted somewhere and deposited elsewhere. Thus, the occurrence of undesirable and harmful coatings on said optical elements can be avoided or at least reduced.

[0060] In order nevertheless to carry out the evaporation and / or sublimation of the raw material by means of the laser light, in step b) of the method according to the invention the laser light is reflected in the raw material device so that in the subsequent step c) it impinges on the raw material elements and evaporates and / or sublimes the respective raw material.

[0061] In particular, the method according to the invention may be characterised in that the TLE system is configured according to the second aspect of the invention. The TLE system according to the second aspect of the invention comprises a feed device according to the first aspect of the invention. Thus, in this embodiment, the method according to the third aspect of the invention provides all the features and advantages described with respect to the feed device according to the first aspect of the invention and the TLE system according to the second aspect of the invention.

[0062] The present invention will now be described in detail by way of embodiments with reference to the drawings, in which: [Brief description of the drawings]

[0063] [Figure 1] Schematic of an elongated crucible and the resulting distribution of the raw material flux along the substrate plane. [Diagram 2]FIG. 1 is a schematic cross-sectional view of a first embodiment of a raw material device according to the present invention. [Diagram 3] FIG. 4 is a schematic cross-sectional view of a second embodiment of a raw material device according to the present invention. [Figure 4] FIG. 4 is a schematic cross-sectional view of a third embodiment of a raw material device according to the present invention. [Diagram 5] FIG. 11 is a schematic cross-sectional view of a fourth embodiment of a raw material device according to the present invention. [Figure 6] FIG. 2 is a schematic cross-sectional view of a first embodiment of an enclosure of a raw material device according to the present invention. [Figure 7] FIG. 4 is a schematic cross-sectional view of a second embodiment of an enclosure of a raw material device according to the present invention. [Figure 8] FIG. 2 is a diagram showing the raw material device according to the present invention and raw material being evaporated by two laser beams. [Figure 9] FIG. 1 is a schematic cross-sectional view of a TLE system according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0064] 2 to 5 show various embodiments of the raw material device 10 according to the present invention. In the following, to avoid repetition, elements common to all the embodiments will be described in general terms, and differences between the embodiments will be described in detail.

[0065] All the source devices 10 described below are intended for use in a TLE system 100, for example as shown in FIG. 9. These source devices are capable of providing a source element 12 that includes or consists of a source material 14. The source material 14 can be a single element, for example arsenic, antimony, tellurium, sulfur, selenium, etc. Alternatively, the source material 14 can be a compound. A laser beam 112 having a suitable wavelength, often between 100 nm and 10 μm, and preferably around 1 μm, is used to evaporate and / or sublimate the source material 14.

[0066] The essence of the present invention is that the direct line of sight from the laser light 112 to the ingredient element 12 is blocked, so that the laser light 112 does not directly hit the surface of the ingredient element 12. This is partly due to the design of the support 20 of the ingredient device 10. The support 20 encloses a free space 60. The free space 60 is free from the structural elements of the support 20, starts from an opening 24 in the surface portion 22 of the support 20, and extends into the interior of the support 10. The free space 60 is columnar, extending along a central axis 66 of the free space 60. In other words, the free space 60 starts from an upper end 62 defined by the opening 24, extends along its central axis 66, and is limited by its lower end 64 defined by the ingredient element 12. Designing the opening 24 to be equal to or larger than the upper end 62 of the free space 60 can prevent the shadowing effect, but it is not necessary.

[0067] In the present invention, the wall structure 30 of the support 20 encloses a free space 60 between an upper end 62 and a lower end 64. In particular, the wall structure 30 includes a mirror surface 32 that reflects the laser light 112. Thus, the laser light 112 that impinges on said mirror surface 32 is reflected and finally guided to the raw material element 12, where the raw material is evaporated and / or sublimated. This allows the laser light 112 to be positioned and aligned outside the central portion 16 of the distribution of evaporated and / or sublimated raw material 14 shown in FIG. 1, and preferably even outside the wing portions 18. Thus, all the advantages of such a distribution of evaporated and / or sublimated raw material 14, including a well-defined central portion 16 with high intensity and very weak radial dependence, are obtained, while avoiding the occurrence of undesirable or harmful coatings on components of the laser system, such as mirrors or entrance windows 126 (see FIG. 9).

[0068] The mirror surface 32 preferably surrounds the free space 60 along the central axis 66. This is because, firstly, it makes it easier to reflect the laser light 112 on the mirror surface 32 multiple times. Furthermore, it makes the placement and alignment of the source device 10 in the reaction chamber 120 (see FIG. 9) easier and less error prone. Providing the multiple reflections is supported by designing the extent 68 of the free space 60 along the central axis 66 to be equal to or greater than the diameter 70 of its upper end 62, as illustrated in FIG. 2. Providing the mirror surface 32 with a corrugated surface structure, preferably tangent to a cross section of the mirror surface perpendicular to the approximate axis of symmetry of the free space 60 along the normal direction of the laser light 112, which in most embodiments is the central axis 66, helps to avoid undesirable focusing effects by diffusing the reflected laser light 112, especially but not exclusively for free spaces 60 that are rotationally symmetric about their respective central axes 66.

[0069] 2 shows a conical crucible 40 forming the support 20. The crucible 40 comprises a closed lower end 44, thereby providing a safe placement space for the raw material elements 12 and further for the source material 14. Furthermore, in this embodiment, the crucible 40 itself has a wall structure 30, in particular a mirror surface 32.

[0070] In contrast to the embodiment shown in Fig. 2, the support 20 of the feedstock device 10 shown in Fig. 3 comprises a retainer 42 with an open lower end 44. Again, the retainer 42, which is part of the wall structure 30, has a mirror surface 32 that reflects the laser light 112. The retainer 42 with the open lower end 44 guides a columnar, in particular a free-standing, feedstock element 12 into the retainer 42. An actuator 26 can be used to move the feedstock element 12 towards the upper end 62 of the free space 60 above, preferably at a pace that compensates for the amount of feedstock 14 evaporated and / or sublimated by the laser light 112.

[0071] Preferably, the crucible 40 having the mirror surface 32 and the retainer 42 are made from aluminum or tantalum or molybdenum or stainless steel.

[0072] Another possible embodiment of the source device 10 according to the present invention is shown in Fig. 4. In addition to the crucible 40 shown in Fig. 2 and the retainer 42 shown in Fig. 3, the support 20 can further comprise an enclosure 46 surrounding the crucible 40 (as shown in Fig. 4) or surrounding the retainer 42 (not shown). Preferably, the enclosure 46 is made of aluminum. In particular, the enclosure 46 surrounding the crucible 40 completely surrounds the free space 60. Thus, even if the crucible 40 fails, the source material 24 is contained within the enclosure 46, i.e., within the support 20 of the source device 10.

[0073] The crucible 40 is disposed within an enclosure 46 and contacts the enclosure at three contact points 48. This secures the location of the crucible 40 within the enclosure 46 and minimizes thermal contact between these components of the source device 10.

[0074] As an alternative to the conical crucible 40 shown in Figure 2, the crucible 40 shown in Figure 4 is cylindrical. Here too, the surface of the crucible 40 facing the free space 60 has a mirror surface 32.

[0075] 5 also illustrates an embodiment of a source material apparatus 10 according to the present invention, which includes a cylindrical crucible 40 disposed within an enclosure 46. Again, the crucible 40 contacts the enclosure 46 at three contact points 48, and the enclosure 46 completely surrounds the crucible 40.

[0076] In contrast to the embodiment of the source device 10 shown in Figures 2 to 4, in which the crucible 40 or the retainer 42, respectively, have a mirror surface 32, in Figure 5 the material of the crucible 40 is at least partially transparent to the laser light 112. For example, the crucible 40 is made of quartz or sapphire or borosilicate glass. Furthermore, the enclosure 46, in particular at least the surface of the enclosure 46 facing the crucible 40, forms the mirror surface 32 that is part of the wall structure 30.

[0077] In summary, in this embodiment of the source material device 10 according to the present invention, the laser light 112 enters the free space 60 from the upper end 62 thereof, passes through the transparent wall of the crucible 40, and is sequentially reflected at least once, preferably more than once, on the mirror surface 32 of the enclosure 46. Finally, the reflected laser light 112 impinges on the surface of the source material element 12 at the lower end 64 of the free space 60, and the source material 14 is evaporated and / or sublimated. The free space 60 is elongated, and the resulting distribution of the flux of evaporated and / or sublimated source material 14 has a central portion 16 with a width defined by the diameter 70 of the free space 60 (see FIG. 1 ).

[0078] Figures 6 and 7 show possible further enhanced developments of the enclosure 46 of the ingredient device 10 according to the present invention. These two enhanced developments can be implemented either alone or in combination.

[0079] In Figure 6, the enclosure 46 includes a bore 52 beginning at the exterior surface of the enclosure 46 and terminating near the interior volume of the enclosure 46, within which, for example, the crucible 40 may be placed (see Figures 4, 5). A temperature sensor 50, for example a thermocouple or pyrometer, is inserted into the bore 52 to indirectly measure the temperature of the source elements 12 disposed within the enclosure 46 (see again Figures 4, 5). The measured temperature information may be used, for example, to control the rate and / or flux of the source material 14 being evaporated and / or sublimated, preferably within a closed loop control.

[0080] Alternatively or additionally, as shown in Fig. 7, the enclosure 46 can also be provided with cooling ducts 54 for the flow of a coolant 56. This allows the volume of the enclosure 46 to be cooled to a predetermined temperature or at least the temperature of the enclosure 46 to be kept below a predetermined temperature limit. In this way, the cooling ducts 54 can be arranged in the enclosure 46, in particular in the area in which the crucible 40 or the retainer 42, respectively, containing the raw material 14 is located after insertion (see Figs. 4, 5). This makes it easier to ensure constant conditions of evaporation and / or sublimation of the raw material 14 provided by the source device 10 according to the invention.

[0081] Figure 8 shows a possible intensification of the evaporation and / or sublimation process made possible by the raw material device 10 according to the invention. In particular, instead of just one laser beam 112, two laser beams 112 are used, where both are arranged in such a way that they are both reflected at least once on the mirror surface 32 before impinging on the raw material element 12. The other elements shown in Figure 8 are similar to the embodiment already shown and described in Figure 4. Using more than one laser beam 112 for evaporation and / or sublimation of the raw material 14 provides a more symmetrical and therefore more uniform and therefore more effective heating of the raw material 14.

[0082] 9 shows a schematic and extremely simplified embodiment of a TLE system 100 according to the invention. The source device 10 according to the invention is arranged in a reaction chamber 120. The volume enclosed by a chamber wall 122 of the reaction chamber 120 is filled with a reaction atmosphere 124, which can be, for example, a vacuum or a suitable reaction gas, depending on the evaporation and / or sublimation process to be established.

[0083] The laser source 110 provides a laser light 112, which is coupled into the reaction chamber 120 via an entrance window 126. The direction of the laser light 112 is aligned such that a direct line of sight to the laser light 112 provided by the source material device 10 is blocked. However, as described in connection with Figures 2-5, the laser light 112 reflects off the mirror surface 32 of the wall structure 30 of the support 20 of the source material device 10, but still impinges on the source material element 12.

[0084] The evaporated and / or sublimated source material 14 thereby has a flux distribution aligned with respect to the central axis 66 of the free space 60. The laser light 112, and for example the entrance window 126, is located away from this direction of emission of the evaporated and / or sublimated source material 14, thereby avoiding undesirable and detrimental deposition of the source material 14.

[0085] Furthermore, the substrate 132 of the substrate device 130 is preferably arranged in the reaction chamber 120 such that the imaginary extension 80 of the central axis 66 strikes the substrate 132 perpendicularly. This optimizes the deposition of the source material 14 on the substrate 132 and the coating of the substrate 132. Alternatively, the substrate 132 may be arranged such that the imaginary extension 80 of the central axis 66 strikes the substrate 132 with an optimized lateral shift to the substrate 132's center. In particular, the movement of the substrate 132 provided by the actuator of the substrate device 130, preferably in combination with the rotation of the substrate 132 about the substrate rotation axis 134 as shown in FIG. 9, allows the deposition of the source material 14 on the substrate 132 in an annular shape. In all embodiments, the substrate 132 can be aligned at an angle with respect to the imaginary extension 80 of the central axis 66.

[0086] 9, the support 20 of the source device 10, particularly the enclosure 46, can be provided by the chamber wall 122 of the reaction chamber 120. Thus, the placement, particularly the alignment, of the source device 10 within the reaction chamber 120 can be more easily provided.

[0087] Moreover, this integration of the enclosure 46 into the chamber wall allows direct access to the cooling ducts 54 and bores 52 located within the enclosure 46 and the temperature sensors located therein, avoiding additional feedthroughs into the chamber wall 122 that would not only be complex but would also require increased maintenance. [Explanation of symbols]

[0088] 10 Raw material equipment 12 Raw material elements 14 Raw Materials 16 Distribution - Central 18 Distribution - Wings 20 Support 22 Surface part 24 Aperture 26 Actuator 30 Wall structure 32 Mirror surface 40 Crucible 42 Retainer 44 Lower end 46 Enclosure 48 Contacts 50 Temperature Sensor 52 Bore 54 Cooling Duct 56 Coolant 60 free space 62 Top 64 Bottom end 66 Center axis 68 Range 70 diameter 80 extension line 100 TLE system 110 Laser light source 112 Laser light 120 Reaction Chamber 122 Chamber wall 124 Reaction Atmosphere 126 Entrance window 130 Substrate device 132 Substrate 134 Substrate rotation axis

Claims

1. A feed unit (10) for a TLE system (100) providing a feed element (12) including or consisting of a source material (14) to be evaporated and / or sublimated by a laser beam (112), comprising: A support (20) for supporting the raw material elements (12), The support (20) surrounds a free space (60) free from structural elements of the support (20), the free space (60) extending along a central axis (66) of the free space (60) and being cylindrical; an opening (24) provided in a surface portion (22) of the support (20) provides a passageway from outside the support (20) to the free space (60), the opening (24) defining an upper end (62) of the free space (60), and the raw material element (12) disposed within the free space (60) and spaced apart from the opening (24) along the central axis (66) of the free space (60) defines a lower end (64) of the free space (60); a wall structure (30) of the support (20) surrounding the free space (60) between the upper end (62) and the lower end (64) has a mirror surface (32) that reflects laser light (112); Raw material equipment (10).

2. The mirror surface (32) completely surrounds the free space (60) along the central axis (66). A feed device (10) according to claim 1.

3. the mirror surface (32) at least partially has a corrugated surface structure that diffuses the reflected laser light (112); A feed device (10) according to claim 1 or 2.

4. the cross section of the opening (24) completely contains the cross section of the upper end (62) of the free space (60); A feed device (10) according to any one of claims 1 to 3.

5. the cross section of the opening (24) is the same as the cross section of the upper end (62) of the free space (60); A feed device (10) according to claim 4.

6. the extent (68) of the free space (60) along the central axis (66) is greater than or equal to the diameter (70) of its upper end (62), in particular greater than or equal to twice the diameter (70); A feed device (10) according to any one of claims 1 to 5.

7. The free space (60) is rotationally symmetrical about the central axis (66). A feed device (10) according to any one of claims 1 to 6.

8. The free space (60) is cylindrical. A feed device (10) according to claim 7.

9. The free space (60) is conical. A feed device (10) according to claim 7.

10. the support (20) has a tubular crucible (40) with a closed lower end (44), the raw material element (12) is placed in the lower end (44), the crucible (40) enclosing the free space (60) and thus forming at least a part of the wall structure (30) of the support (20); A feed device (10) according to any one of claims 1 to 9.

11. the ingredient element (12) is free-standing, the support (20) has a tubular retainer (42) with an open lower end (44), the ingredient element (12) is inserted into the retainer (42) from the lower end (44), the retainer (42) enclosing the free space (60) and thus forming at least a part of the wall structure (30) of the support (20); A feed device (10) according to any one of claims 1 to 9.

12. the support (20) has an actuator (26) for moving the ingredient element (12) in the retainer (42), in particular towards the upper end (62) of the free space (60); A feed device (10) according to claim 11.

13. The support (20) has an outer periphery (46) surrounding one or more crucibles (40) and / or retainers (42) along the central axis (66) at least in the region of the free space (60) of each of the crucibles (40) or retainers (42) and forming at least a portion of the wall structure (30) of the support (20). A feed device (10) according to any one of claims 10 to 12.

14. the enclosure (46) completely encloses the one or more crucibles (40) and / or retainers (42) and each of the feed elements (12), except for an opening (24) that defines the upper end (62) of the free space (60); A feed device (10) according to claim 13.

15. the surface of the crucible (40) or the retainer (42) facing the free space (60) is the mirror surface (32) of the wall structure (30) of the support (20); A feed device (10) according to any one of claims 10 to 14.

16. At least the portion of the crucible (40) or the retainer (42) that forms the mirror surface (32), and preferably the entire crucible (40) or the retainer (42) is made of aluminum, tantalum, molybdenum, or stainless steel. A feed device (10) according to claim 15.

17. the material of the crucible (40) or the retainer (42) is at least partially transparent to the laser light (112), and the surface of the enclosure (46) facing the free space (60) is the mirror surface (32) of the wall structure (30) of the support (20); A feed device (10) according to claim 14.

18. The crucible (40) or the retainer (42) is at least partially, preferably completely, made of quartz or sapphire or borosilicate glass; A feed device (10) according to claim 17.

19. The enclosure (46) is at least partially, and preferably entirely, made of aluminum. A feed device (10) according to any one of claims 13 to 18.

20. The crucible (40) or the retainer (42) and the outer envelope (46) contact each other at three contact points (48). A feed device (10) according to any one of claims 13 to 19.

21. the support (20) includes one or more temperature sensors (50) for measuring the temperature of the enclosure (46) and / or the ingredient elements (12) disposed within the enclosure (46); A feed device (10) according to any one of claims 13 to 20.

22. the one or more temperature sensors (50) being thermocouples or pyrometers; A feed device (10) according to claim 21.

23. The enclosure (46) has one or more bores (52) within each of which one or more of the temperature sensors (50) is disposed. A feed device (10) according to claim 21 or 22.

24. The enclosure (46) has cooling ducts (54) for the flow of liquid and / or gaseous coolant. A feed device (10) according to any one of claims 13 to 23.

25. the cooling duct (54) is arranged in the enclosure (46) at least in the region of the free space (60); A feed device (10) according to claim 24.

26. 1. A TLE system (100) comprising: a laser source (110) for providing a laser light (112); a reaction chamber (120) containing a reaction atmosphere (124); a source device (10) for providing a source element (12) including or consisting of a source material (14) to be evaporated and / or sublimated by the laser light (112) in the reaction chamber (120); and a substrate device (130) for providing a substrate (132) to be coated with the evaporated and / or sublimated source material (14) in the reaction chamber (120), The raw material device (10) has a configuration as described in any one of claims 1 to 25, and the laser light (112) and the raw material device (10) are provided and arranged such that a direct line of sight between the laser light (112) and the raw material element (12) is completely blocked by the raw material device (10), so that the laser light (112) reflects one or more times on the mirror surface (32) of the raw material device (10) before impinging on the raw material element (12). TLE system (100).

27. the feed unit (10) has two or more supports (20), each of which supports (20) carries a feed element (12), and / or the TLE system (100) has two or more feed units (10); The TLE system (100) of claim 26.

28. the support (20) and the substrate device (130) are arranged in the reaction chamber (120) such that an imaginary extension (80) of the central axis (66) beyond the upper end (62) of the free space (60) impinges on the substrate (132), in particular on the center of the substrate (132) and / or perpendicular to the substrate (132), 28. The TLE system (100) of claim 26 or 27.

29. The support (20) of the source device (10) is at least partially provided by a chamber wall (122) of a reaction chamber (120). The TLE system (100) of any one of claims 26 to 28.

30. the support (20) has an enclosure (46), one or more temperature sensors (50) are arranged in and / or within the enclosure (46), and / or the enclosure (46) has a cooling duct (54), the one or more temperature sensors (50) and / or the cooling duct (54) being accessible from outside the reaction chamber (120); 30. The TLE system (100) of claim 29.

31. The TLE system (100) comprises two or more laser light sources (110) and / or the laser light sources (110) provide one or more laser beams (112) that are directed within the reaction chamber (120) to vaporize and / or sublimate the source material (14) of the same feed element (12). The TLE system (100) of any one of claims 26 to 30.

32. The laser light (112) has a wavelength of 100 nm to 10 μm, preferably about 1 μm. The TLE system (100) of any one of claims 26 to 31.

33. The raw material (14) of the raw material element (12) comprises, and preferably consists of, at least one of the following elements: Arsenic; Antimony; tellurium; sulfur; selenium, A TLE system (100) according to any one of claims 26 to 32.

34. A method of using a TLE system (100) comprising a laser source (110) for providing a laser light (112), a reaction chamber (120) containing a reaction atmosphere (124), a source device (10) for providing a source element (12) including or consisting of a source material (14) to be evaporated and / or sublimated by the laser light (112) in said reaction chamber (120), and a substrate device (130) for providing a substrate (132) to be coated with the evaporated and / or sublimated source material (14) in said reaction chamber (120), comprising the steps of: a) providing said laser light (112) in a direction such that a direct line of sight between said laser light (112) and said ingredient element (12) is completely blocked by said ingredient device (10); b) reflecting the laser light (112) one or more times within the ingredient device (10) before impinging on the ingredient element (12); c) evaporating and / or sublimating the source material (14) with the reflected laser light (112); d) depositing the source material evaporated and / or sublimated in step c) onto the substrate.

35. The TLE system (100) has the configuration described in any one of claims 26 to 33.

35. The method of claim 34.

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