Viewport for plasma monitoring, plasma generator including the same, and plasma monitoring method

Abstract

A plasma monitoring viewport, a plasma generator including the same, and a plasma monitoring method are disclosed. The plasma monitoring viewport may include a transparent substrate and a transparent sensor formed on the transparent substrate. The viewport is formed outside a plasma chamber, allowing the inside of the plasma chamber to be observed through the transparent substrate and allowing the electromagnetic field generated by plasma in the plasma chamber to be measured using the transparent sensor.

Description

[Technical Field]

[0001] The present invention relates to a viewport for monitoring electromagnetic field characteristics of plasma, a plasma generator including the same, and a method for monitoring plasma. [Background technology]

[0002] In order to utilize plasma in the manufacture of semiconductors and flat panel displays (FPDs), it is essential to control the plasma through monitoring of the plasma state and thereby manage process yields and results. Generally, a viewport is formed in a chamber, which is a plasma generator, for visually observing the plasma. The present invention aims to maintain the ability to visually observe the plasma through the viewport, while also providing an electrical circuit on or inside the viewport that can monitor the plasma state. Summary of the Invention [Problem to be solved by the invention]

[0003] It is an object of the present invention to provide a plasma monitoring viewport that can view the interior of a plasma chamber and measure the electromagnetic fields from the plasma.

[0004] Another object of the present invention is to provide a plasma generator including the plasma monitoring viewport.

[0005] It is still another object of the present invention to provide a plasma monitoring method for observing the inside of a plasma chamber and measuring an electromagnetic field from the plasma using the plasma monitoring viewport. [Means for solving the problem]

[0006] In one aspect, the present invention provides a viewport for plasma monitoring, comprising: a transparent substrate; and a transparent sensing portion formed on the transparent substrate and including a transparent electrode and a planar coil.

[0007] In one embodiment, the plasma monitoring viewport is formed outside the plasma chamber, allowing the inside of the plasma chamber to be observed through the transparent substrate, and at the same time, the electromagnetic field generated by the plasma in the plasma chamber can be measured using the transparent sensing portion.

[0008] In one embodiment, the transparent sensing portion may include indium tin oxide (ITO).

[0009] In one embodiment, the device may further include a printed circuit board (PCB) formed on the outer periphery of the transparent substrate and having a circuit printed thereon that can process the electromagnetic field signal measured by the transparent sensing unit.

[0010] In one embodiment, the circuit included in the printed circuit board may include one or more components selected from the group including a low pass filter, a high pass filter, and a resonance filter.

[0011] In one embodiment, the circuit included in the printed circuit board can generate one or more frequencies selected from the group consisting of a plasma frequency, a plasma operation frequency, and a plasma instability frequency of the plasma.

[0012] In another aspect, the present invention provides a plasma generator including: a plasma chamber having a hollow formed on at least one side thereof and capable of generating plasma therein; and a transparent substrate formed to cover the hollow, and a viewport formed on the transparent substrate outside the plasma chamber, the viewport including a transparent sensing unit including a transparent electrode and a planar coil.

[0013] In one embodiment, the transparent sensing portion may include indium tin oxide (ITO).

[0014] In one embodiment, the viewport may further include a printed circuit board (PCB) formed on the outer periphery of the transparent substrate and having printed thereon a circuit capable of processing an electromagnetic field signal measured by the transparent sensing unit.

[0015] In one embodiment, the circuit included in the printed circuit board may include one or more components selected from the group including a low pass filter, a high pass filter, and a resonance filter.

[0016] In one embodiment, the circuit included in the printed circuit board can generate one or more frequencies selected from the group consisting of a plasma frequency, a plasma operation frequency, and a plasma instability frequency of the plasma.

[0017] In another aspect, the present invention provides a plasma monitoring method including: observing the inside of a plasma chamber through the plasma monitoring viewport; and measuring an electromagnetic field generated by plasma in the plasma chamber using the plasma monitoring viewport. [Effects of the Invention]

[0018] A plasma monitoring viewport according to an embodiment of the present invention is capable of observing the inside of a plasma chamber and monitoring the electromagnetic environment.

[0019] The plasma generator according to the embodiment of the present invention may be configured so that the inside can be observed and the electromagnetic environment can be measured through the plasma monitoring viewport.

[0020] A plasma monitoring method according to an embodiment of the present invention provides a method for observing the inside of a plasma generator and measuring the electromagnetic environment. [Brief explanation of the drawings]

[0021] [Figure 1] 1 is a diagram schematically illustrating a viewport for plasma monitoring according to an embodiment of the present invention. [Figure 2] 1 is a front view, plan view, or side view showing one surface of a plasma generator according to an embodiment of the present invention. [Figure 3] 1 is a flow chart illustrating an embodiment of a plasma monitoring method according to an embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0022] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The present invention may be modified in various ways and may have various forms. Specific examples are illustrated in the drawings and described in detail herein. However, this is not intended to limit the present invention to the particular disclosed form, but it should be understood that the present invention encompasses all modifications, equivalents, and alternatives within the spirit and technical scope of the present invention. Similar reference numerals are used to refer to similar components throughout the drawings. In the accompanying drawings, the dimensions of structures are exaggerated to clarify the present invention.

[0023] The terms used in this application are used only to describe specific embodiments and are not intended to limit the present invention. The singular expressions include the plural expressions unless the context clearly dictates otherwise. In this application, the terms "comprise" or "have" are intended to specify the presence of features, numbers, steps, operations, components, or combinations thereof described in the specification, and should be understood not to preclude the presence or additional possibility of one or more other features, numbers, steps, operations, components, or combinations thereof.

[0024] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. Terms as defined in commonly used dictionaries should be interpreted to have a meaning consistent with the meaning they have in the context of the relevant art, and should not be interpreted in an idealized or overly formal sense unless expressly defined in this application.

[0025] FIG. 1 is a diagram schematically illustrating a viewport for plasma monitoring according to an embodiment of the present invention.

[0026] Referring to FIG. 1, a viewport 1 for plasma monitoring according to an embodiment of the present invention may include a transparent substrate 10 and a transparent sensing portion 20 formed on the transparent substrate 10 and including a transparent electrode and a planar coil.

[0027] The transparent substrate 10 is a member that includes a transparent material and allows visible light to pass through the transparent substrate 10. In the context of this specification, "transparent" refers to a property that allows all or part of incident visible light to pass through, and that allows all or a significant part of visible information about a material, object, or phenomenon located on the other side of the transparent member to be recognized and processed by the naked eye, an instrument, or a circuit. In one embodiment, when the transparent substrate 10 is formed outside a plasma chamber, the inside of the plasma chamber can be observed through the transparent substrate 10.

[0028] The transparent sensing unit 20 includes a transparent conductive material, allowing visible light to pass through the transparent sensing unit 20 while being conductive. In particular, the transparent sensing unit 20 has a conductive path formed on the opposite side of the viewport, including the surroundings, to respond to the electromagnetic environment of the plasma formed in the plasma chamber. In the context of this specification, "conductive" refers to the property of providing a significant level of electrical transport path. In one embodiment, the transparent sensing unit 20 can be used to measure an electromagnetic field generated by the plasma in the plasma chamber. In one embodiment, the transparent sensing unit 20 can be used to measure electromagnetic fields, such as the strength of an induced magnetic field or an induced electric field, generated by the plasma in the plasma chamber. Therefore, the type of material constituting the transparent sensing unit 20 is not particularly limited as long as it is substantially transparent and conductive enough to perform the function of measuring an electromagnetic field. In one embodiment, the transparent sensing unit 20 may include indium tin oxide (ITO).

[0029] The plasma monitoring viewport 1 according to an embodiment of the present invention achieves one object of the present invention by simultaneously performing the functions of the transparent substrate 10 and the transparent sensing unit 20. In one embodiment, the plasma monitoring viewport 1 is formed outside the plasma chamber, and can observe the inside of the plasma chamber through the transparent substrate 10, and can simultaneously measure the electromagnetic field generated by the plasma in the plasma chamber through the transparent sensing unit 20.

[0030] The addition of additional components to the viewport 1 for plasma monitoring according to an embodiment of the present invention is not limited. Referring to FIG. 1 , in one embodiment, the viewport 1 for plasma monitoring according to an embodiment of the present invention may further include a printed circuit board (PCB) 30 formed on the outer periphery of the transparent substrate 10 and having a circuit printed thereon that can process an electromagnetic field signal measured by the transparent sensor 20.

[0031] The printed circuit board 30 may be a member including a substrate on which a circuit is pre-formed. The circuit printed on the substrate of the printed circuit board 30 can process an electromagnetic field signal from the transparent sensing unit 20 when formed on the substrate, and the type, material, function, and method of forming the circuit are not particularly limited as long as the circuit performs the above-mentioned function.

[0032] In one embodiment, the circuit included in the printed circuit board 30 may include one or more components selected from the group including a low pass filter, a high pass filter, and a resonance filter. In one embodiment, the circuit included in the printed circuit board 30 may derive one or more frequencies selected from the group including a plasma frequency, a plasma operation frequency, and a plasma instability frequency of the plasma.

[0033] As described above, the plasma monitoring viewport according to the embodiment of the present invention can observe the inside of the plasma chamber and can also derive the electromagnetic environment.

[0034] FIG. 2 is a front view, a plan view, or a side view showing one surface of a plasma generator according to an embodiment of the present invention.

[0035] Referring to FIG. 2, a plasma generator 5 according to an embodiment of the present invention may include a plasma chamber 40 having a hollow H formed on at least one side thereof and capable of generating plasma therein; a transparent substrate 10′ formed to cover the hollow H; and a viewport 50 including a transparent sensing portion 20′ formed on the transparent substrate 10′ and outside the plasma chamber 40.

[0036] The hollow H formed in at least one surface of the plasma generator 5 is a configuration formed to enable observation of the interior of the plasma chamber 40. In the context of this specification, "hollow" may refer to a configuration formed by being surrounded by a member and having holes passing through both opposing surfaces of the member. The hollow H may be formed in at least one surface of the plasma generator 5, i.e., one or more of the top surface, bottom surface, and side surface. Since FIG. 2 shows one surface of the plasma generator 5 in which the hollow H is formed, FIG. 2 may be a front view, a plan view, or a side view.

[0037] The description regarding all or part of the configuration of the plasma generator 5 according to the embodiment of the present invention may be applied in the same or similar manner to the description regarding the configuration of the viewport for plasma monitoring according to the embodiment of the present invention. Therefore, the object of the present invention can be achieved by applying the viewport for plasma monitoring that can observe the inside of the plasma chamber 40 at least through the hollow H, and by the viewport 50 becoming the above-mentioned viewport for plasma monitoring.

[0038] In one embodiment, the transparent sensing unit 20' may include indium tin oxide (ITO). In one embodiment, the viewport block 50 may further include a printed circuit board (PCB) 30' formed on the outer periphery of the transparent substrate 10' and having printed thereon a circuit capable of processing an electromagnetic field signal measured by the transparent sensing unit 20'. In one embodiment, the circuit included in the PCB 30' may include one or more components selected from the group including a low pass filter, a high pass filter, and a resonance filter. In one embodiment, the circuit included in the PCB 30' may derive one or more frequencies selected from the group including a plasma frequency, a plasma operation frequency, and a plasma instability frequency of the plasma.

[0039] As described above, the inside of the plasma generator according to the embodiment of the present invention can be observed through the plasma monitoring viewport, and the electromagnetic environment can be derived.

[0040] FIG. 3 is a flow chart illustrating one embodiment of a plasma monitoring method according to an embodiment of the present invention.

[0041] Referring to FIG. 3, a plasma monitoring method 100 according to an embodiment of the present invention may include observing the interior of a plasma chamber through a plasma monitoring viewport (S110) and measuring an electromagnetic field generated by plasma in the plasma chamber using the plasma monitoring viewport (S120). In one embodiment, the plasma monitoring method 100 according to an embodiment of the present invention may include simultaneously performing observing the interior of the plasma chamber through the plasma monitoring viewport (S110) and measuring an electromagnetic field generated by plasma in the plasma chamber using the plasma monitoring viewport (S120). In one embodiment, observing the interior of the plasma chamber through the plasma monitoring viewport (S110) may be observing the interior of the plasma chamber through the plasma monitoring viewport according to the above-described embodiment of the present invention. In one embodiment, measuring an electromagnetic field generated by plasma in the plasma chamber using the plasma monitoring viewport (S120) may be measuring an electromagnetic field generated by plasma in the plasma chamber using the plasma monitoring viewport according to the above-described embodiment of the present invention.

[0042] As described above, the plasma monitoring method according to the embodiment of the present invention provides a method for observing the inside of a plasma generator and deriving the electromagnetic environment.

[0043] Hereinafter, embodiments of the present invention will be described. However, the embodiments described below are merely some of the embodiments of the present invention, and the scope of the present invention is not limited to the following embodiments.

[0044] Fabrication of a viewport for plasma monitoring

[0045] A viewport for plasma monitoring is fabricated. A printed circuit board such as a PCB is formed on the outer casing of a transparent substrate containing a transparent material, and a resonant circuit suitable for plasma monitoring is formed on the transparent substrate using a flat coil and capacitor made of ITO, and connected to the PCB board located on the outer casing. A BNC port is installed on the PCB board so that it can be connected to a measuring instrument capable of monitoring, such as an oscilloscope. This allows the plasma operating frequency or harmonic frequency to be measured.

[0046] Plasma generator operation

[0047] A closed plasma chamber was constructed, and the plasma monitoring viewport was attached to one side of the plasma chamber. The inside of the plasma chamber was observed through the viewport and analyzed using optical equipment. At the same time, the electromagnetic environment was measured using the ITO transparent sensor and the printed circuit board. In particular, the plasma operating frequency and harmonic frequency were measured.

[0048] Although the present invention has been described above with reference to preferred embodiments, it should be understood that those skilled in the art can make various modifications and changes to the present invention without departing from the spirit and scope of the present invention as set forth in the claims below. [Explanation of symbols]

[0049] 1. Plasma monitoring viewport 10, 10'...Transparent substrate 20, 20'...transparent sensing part 30, 30'... Printed circuit board 5. Plasma generator H...Hollow part 40. Plasma chamber 50...Viewport B 100 Plasma monitoring method

Claims

1. A transparent substrate; a transparent sensing unit formed on the transparent substrate and including a transparent electrode and a planar coil; A plasma monitoring viewport formed outside a plasma chamber, allowing the inside of the plasma chamber to be observed through the transparent substrate and allowing the electromagnetic field generated by plasma in the plasma chamber to be measured using the transparent sensing portion.

2. 2. The viewport for plasma monitoring of claim 1, wherein the transparent sensing portion includes indium tin oxide (ITO).

3. 2. The viewport for plasma monitoring of claim 1, further comprising a printed circuit board (PCB) formed on an outer periphery of the transparent substrate and having printed thereon a circuit capable of processing an electromagnetic field signal measured by the transparent sensing unit.

4. 4. The viewport for plasma monitoring of claim 3, wherein the circuit included in the printed circuit board includes one or more components selected from the group consisting of a low pass filter, a high pass filter, and a resonance filter.

5. 5. The viewport for monitoring plasma of claim 4, wherein the circuit included in the printed circuit board derives one or more frequencies selected from the group consisting of a plasma frequency of the plasma, a plasma operation frequency, and a plasma instability frequency.

6. a plasma chamber having a hollow space formed on at least one side thereof and capable of generating plasma therein; a transparent substrate formed to cover the hollow; and a viewport formed on the transparent substrate outside the plasma chamber, the viewport including a transparent sensing portion including a transparent electrode and a planar coil.

7. The plasma generator of claim 6 , wherein the transparent sensing portion includes indium tin oxide (ITO).

8. 7. The plasma generator of claim 6, wherein the viewport further comprises a printed circuit board (PCB) formed on an outer periphery of the transparent substrate and having a circuit printed thereon that can process an electromagnetic field signal measured by the transparent sensing unit.

9. 9. The plasma generator of claim 8, wherein the circuit included in the printed circuit board includes one or more elements selected from the group consisting of a low pass filter, a high pass filter, and a resonance filter.

10. 10. The plasma generator of claim 9, wherein the circuit included in the printed circuit board generates one or more frequencies selected from the group consisting of a plasma frequency of the plasma, a plasma operation frequency, and a plasma instability frequency.

11. Observing the inside of a plasma chamber through the plasma monitoring viewport according to any one of claims 1 to 5; measuring an electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport; A plasma monitoring method comprising:

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