rectifier

Abstract

The present invention relates to the field of integrated circuit chip manufacturing, and more particularly to a rectifier device having a gas inlet / distribution plate disposed on a diffusion plate, a gas inlet pipe and a gas exhaust pipe disposed on a cover body, a first chamber formed between the upper surface of the gas inlet / distribution plate and the inner wall of the cover body, a second chamber formed between the lower surface of the diffusion plate and the substrate, and a third chamber formed between the lower surface of the gas inlet / distribution plate and the upper surface of the diffusion plate, both ends of the gas inlet pipe respectively connected to an external gas supply source and the first chamber, one end of the gas exhaust pipe communicating with the third chamber, a plurality of through-holes formed in the diffusion plate, external gas passing through the gas inlet pipe, passing through the first chamber, the second chamber, the through-holes, and the third chamber in sequence, and then being exhausted to the outside through the gas exhaust pipe, the depth of the through-holes being set according to the flow rate of the gas flowing through the through-holes, with the through-holes with a higher gas flow rate being deeper than the through-holes with a lower gas flow rate, thereby achieving uniform gas distribution on the substrate.

Description

[Technical Field]

[0001] The present invention relates to the field of integrated circuit chip manufacturing, and more particularly to rectifier devices. [Background technology]

[0002] Chip manufacturing involves photolithography, and coating and heating are essential processes in the photolithography process. During the heating process of the substrate after the coating process, an external gas is introduced into the heating device. It is necessary to ensure that the hot external gas (e.g., N2) is heated by a hot plate (HP) and flows uniformly over the surface of the substrate, which can uniformly remove the evaporated organic gases from the coating and prevent them from accumulating on the coating, resulting in uneven distribution of the coating in the radial direction of the substrate. For this reason, uniformity of the flow rate on the substrate is very important. However, how to improve the uniformity of the flow rate on the substrate is an urgent issue. Summary of the Invention

[0003] SUMMARY OF THE INVENTION In view of the above-mentioned problems of the prior art, it is an object of the present invention to provide a flow straightening device for improving the uniformity of gas volume distribution on a substrate.

[0004] To achieve the above objectives, the present invention provides the following technical solutions:

[0005] The straightening device has a cover body, a gas intake distribution plate, a diffusion plate, a gas intake pipe, and a gas exhaust pipe, the gas intake distribution plate being disposed on the diffusion plate, and the gas intake pipe and the gas exhaust pipe being disposed on the cover body. A substrate can be placed below the diffuser plate.

[0006] A first chamber is formed between the upper surface of the gas intake distribution plate and the inner wall of the cover body, a second chamber can be formed between the lower surface of the diffusion plate and the substrate, and a third chamber is formed between the central region of the lower surface of the gas intake distribution plate and the upper surface of the diffusion plate.

[0007] One end of the gas inlet pipe is used for connection to a gas supply source and the other end communicates with the first chamber, and one end of the gas exhaust pipe is used for connection to an external gas extraction device and the other end communicates with the third chamber.

[0008] The gas intake distribution plate has a plurality of gas inlets, and the diffusion plate has a plurality of through-holes. The external gas flows through the gas intake pipe, sequentially through the first chamber, the gas inlet, the second chamber, the through-holes, and the third chamber, and is then discharged to the outside through the gas exhaust pipe.

[0009] The depth of the through-holes is set according to the flow rate of the gas flowing through the through-holes, and through-holes with a high gas flow rate are deeper than through-holes with a low gas flow rate.

[0010] The present invention further provides a heating device having a flow straightening device and a heating assembly. The flow commutator covers the heating assembly to form an enclosed space in which the substrate is placed. The heating assembly is used to heat the substrate.

[0011] The present invention has the following advantageous effects compared to the prior art.

[0012] The flow straightening device provided by the present invention comprises a gas intake distribution plate, a diffusion plate, a cover body, a gas intake pipe, and a gas exhaust pipe. The diffusion plate is provided with a plurality of through holes, and the external gas flows through the gas inlet pipe to the gas inlet distribution plate and then to the surface of the substrate. The gas flowing over the surface of the substrate is discharged to a gas exhaust pipe through a plurality of through holes. The depth of the through-holes is set according to the flow rate of the gas flowing through the through-holes. The high flow rate through-holes are deeper than the low flow rate through-holes. Deep through-holes may hinder the discharge of external gases and volatile gases to some extent, but by making through-holes with high flow rates deeper, the inflow of external gases into the through-holes can be reduced. In response to this, the reduced amount of external gas gathers at the position of the shallow through-holes, and the external gas can be discharged. Shallow through-holes are more suitable for the evacuation of external and volatile gases, thus balancing the evacuation of external gases on the substrate. The above structure design can achieve uniform distribution of external gas on the substrate throughout the process. The external gas and the volatile gas can be uniformly discharged from the diffusion plate. [Brief explanation of the drawings]

[0013] In order to more clearly describe the embodiments of the present invention and the technical solutions in the prior art, the drawings required for describing the embodiments and the prior art are briefly introduced below. It is apparent that the drawings in the following description are only some embodiments of the present invention, and those skilled in the art can obtain other drawings based on these drawings without any creative efforts. [Figure 1] FIG. 1 is a schematic structural diagram of a heating device according to the present invention. [Figure 2] FIG. 2 is a partial cross-sectional view of a heating device according to the present invention. [Figure 3] FIG. 3 is a schematic cross-sectional view of a rectifier according to an embodiment of the present invention. [Figure 4] FIG. 4 is a schematic cross-sectional view of a rectifier device according to another embodiment of the present invention. [Figure 5] FIG. 5 is a schematic cross-sectional view of a rectifier device according to yet another embodiment of the present invention. [Figure 6] FIG. 6 is a top view of a diffuser plate according to an embodiment of the present invention. [Figure 7] FIG. 7 is a top view of a gas intake distribution plate according to an embodiment of the present invention. [Figure 8] FIG. 8 is a schematic cross-sectional view of a rectifier device according to yet another embodiment of the present invention. [Figure 9] FIG. 9 is an enlarged schematic view of part A in FIG. [Figure 10] FIG. 10 is an enlarged schematic view of part B in FIG. [Figure 11] FIG. 11 is a comparison diagram of the flow velocity distribution of the diffuser plate. DETAILED DESCRIPTION OF THE INVENTION

[0014] In order to make the objectives, features and advantages of the present invention clearer and easier to understand, the technical solutions in the embodiments of the present invention are clearly and completely described in the following embodiments of the present invention with reference to the accompanying drawings. It is apparent that the embodiments described below are merely some of the embodiments of the present invention, and do not represent all of the embodiments. Based on the embodiments of the present invention, all other embodiments that a person skilled in the art can obtain without any creative efforts belong to the protection scope of the present invention.

[0015] In describing this invention, when a component is considered to be "connected" to another component, the component may be directly connected to the other component, or there may be other components in between. When an element is considered to be "disposed on" another element, the element may be directly disposed on the other element, or there may be other elements in between.

[0016] Below, the technical solutions of the present invention are further described with reference to the accompanying drawings and specific embodiments.

[0017] First embodiment As shown in FIGS. 1-3, an embodiment of the present invention provides a heating device having a flow straightening device and a heating assembly. The flow straightening device surrounds the heating assembly to form an enclosed space. The substrate 4 is located in the enclosed space, and the heating assembly is used to heat the substrate 4 .

[0018] The flow rectifier includes a cover body 1, a gas intake distribution plate 2, a diffusion plate 3, a gas intake pipe 5, and a gas exhaust pipe 6. The gas intake pipe 5 and the gas exhaust pipe 6 are attached to the cover body 1. Furthermore, the gas intake distribution plate 2, the diffusion plate 3, and the cover body 1 are connected by connectors. The connector may be a bolt, a screw, or the like. A number of screws are used to pass through the edge of the diffusion plate 3, the edge of the gas intake distribution plate 2 and the top of the cover body 1 to connect the three parts. As shown in FIG. 6, the diffusion plate 3 has a plurality of through holes 31 evenly spaced apart.

[0019] The gas intake distribution plate 2 is provided with a plurality of connecting pillars 22, and the diffusion plate 3 and the gas intake distribution plate 2 are connected by the connecting pillars 22. As shown in FIG. 7, the gas intake distribution plate 2 has an end region and a central region, and the end region is provided along the outer periphery of the central region. In the end region of the gas intake distribution plate 2, a plurality of gas inlets 21 are provided. In this embodiment, the range of the end region of the gas intake distribution plate 2 is the range from the region defined by the connecting pillars 22 to the inner wall of the cover body 1. The remaining area of ​​the gas inlet and distribution plate 2 is the central area of ​​the gas inlet and distribution plate 2 . Of course, the connecting pillars 22 are not limited to the configuration of this embodiment, and the connecting pillars 22 may be disposed in a direction closer to the center of the gas intake distribution plate 2 .

[0020] The heating assembly includes a heating plate 7 , a plurality of guide rings 8 , and a plurality of joints 9 . The outer periphery of the heating plate 7 is snapped onto a guide ring 8 and the substrate 4 rests on the heating plate 7 . The cover body 1 covers the joint portion 9 and forms a closed space. The gas intake distribution plate 2, the diffusion plate 3, and the substrate 4 are all located within a closed space.

[0021] A first chamber 11 is formed between the upper surface of the gas intake distribution plate 2 and the inner wall of the cover body 1 . A second chamber 12 is formed between the lower surface of the diffusion plate 3 and the substrate 4 . Between the central region of the lower surface of the gas inlet distribution plate 2 and the upper surface of the diffusion plate 3, a third chamber 13 is formed.

[0022] One end of the gas intake pipe 5 is connected to an external gas supply source, which delivers the external gas to the flow straightener. The other end of the gas intake pipe 5 communicates with the first chamber 11 . The gas exhaust pipe 6 passes through the gas intake distribution plate 2 and is disposed above the diffusion plate 3 . One end of the gas exhaust pipe 6 is connected to an external gas extraction device, and the other end is connected to the third chamber 13 . The nozzle of the gas exhaust pipe 6 and the center of the diffusion plate 3 are provided so as to correspond to each other.

[0023] When the external gas extraction device is activated, the gas exhaust pipe 6 exerts a large suction force on the third chamber 13 . The external gas flows through the first chamber 11, the gas inlet 21, the second chamber 12, the through-hole 31, and the third chamber 13 in sequence via the gas intake pipe 5. Finally, the external gas is discharged to the outside through the gas exhaust pipe 6. When the external gas is in the second chamber 12, the external gas can flow into the third chamber 13 together with the volatile gas, and carry the volatile gas out of the rectifier device. In this embodiment, the external gas may be N2.

[0024] The diffuser plate 3 has edge regions and a central region. The central region of the diffusion plate 3 is disposed in correspondence with the gas exhaust pipe 6, and the end regions surround the periphery of the central region. Since the gas exhaust pipe 6 has a stronger suction force on the central region of the diffuser plate 3 than on the edge regions, most of the N2 accumulates in the central region of the diffuser plate 3. The volatile gas is discharged from the through-holes 31 in the central region of the diffusion plate 3 . Therefore, it may be difficult to remove volatile gases present on the edge regions of the substrate 4 . By arranging the gas exhaust pipe 6 corresponding to the central region of the diffusion plate 3, a large suction force is obtained, and the gas flow rate of the through holes 31 in the central region of the diffusion plate 3 is higher than the gas flow rate of the through holes 31 in the edge regions.

[0025] Therefore, embodiments of the present invention are designed such that the depth of the through-holes 31 gradually increases from the edge region to the central region of the diffuser plate 3. That is, the through-holes 31 with higher gas flow rates are deeper than the through-holes 31 with lower gas flow rates. Since the multiple through holes 31 of different depths have different resistances to gas discharge, the gas flow rates in the through holes 31 in the edge and central regions of the diffusion plate 3 tend to be consistent, and as a result, the flow rates passing through the multiple through holes 31 tend to be consistent overall. The N2 uniformly removes volatilized organic gases from the coating, allowing the coating to be uniformly distributed along the radial direction of the substrate 4.

[0026] The plurality of through holes 31 in the diffusion plate 3 are set to different depths. The through holes 31 in the central region are deep and can prevent the volatile gases and a part of the N2 from being discharged to some extent, so that the N2 gathers in the edge regions. The through holes 31 in the end region are shallow, which is advantageous for discharging N2 and volatile gases. The uniformity of the N2 distribution in the second chamber 12 is improved. The flow rate of the gas in the through-holes 31 in the edge region and the central region of the diffusion plate 3 tends to be constant.

[0027] In the end region of the gas inlet distribution plate 2, a whole circle formed by a plurality of gas inlets 21 may be provided. The gas inlet 21 is not limited to the end region of the gas inlet distribution plate 2 , but may be provided in the central region of the gas inlet distribution plate 2 . The relative positions of the nozzle of the gas exhaust pipe 6 and the diffusion plate 3 are not limited to those described above, and the nozzle of the gas exhaust pipe 6 and the end of the diffusion plate 3 may be provided so as to correspond to each other.

[0028] In an embodiment of the present invention, the depth of the through-holes 31 increases linearly from the edge regions towards the central region of the diffuser plate 3 . The depth of the through-holes 31 in the edge regions also increases linearly along the direction from the edge regions toward the central region. The depth of the through holes 31 in the central region also increases linearly along the direction from the central region toward the center of the diffusion plate 3 . The coefficient of linear increase at both locations is the same and the cross section of the diffuser 3 resembles the shape of a circular table. The depth of the through-holes 31 may be adjusted in response to changes in the flow rate, and the coefficients of increase of the two linearities may be different.

[0029] Specifically, with continued reference to FIG. 3, FIG. 3 is a schematic cross-sectional view of the straightening device taken through the center point of the diffuser plate 3. The distance between the upper surface of the diffusion plate 3 and the gas intake distribution plate 2 is Gap 1, which is the same as the Gap 1 between all of the through holes 31 and the gas intake distribution plate 2. The distance between the lower surface of the diffusion plate 3 in the edge region and the substrate 4 is Gap21, and the distance between the lower surface of the diffusion plate 3 in the central region and the substrate 4 is Gap22. The distance between the through-holes 31 of the diffuser plate 3 and the substrate 4 varies linearly. In this embodiment, Gap 21 is 2 to 10 mm, and Gap 22 is 1 to 5 mm.

[0030] The through-holes 31 in the edge regions of the diffuser plate 3 are shallower than the through-holes 31 in the central region. Gap 21, which is the distance between the lower surface of the diffusion plate 3 in the edge region and the substrate 4, is larger than Gap 22, which is the distance between the lower surface of the diffusion plate 3 in the central region and the substrate 4. Since the gap 21 is large, the amount of N2 remaining on the edge region of the substrate 4 increases, and the release of volatile gases in the edge region of the substrate 4 is further promoted. The small size of Gap22 reduces the amount of N2 remaining above the central region to some extent, further equalizing the amount of N2 remaining in both the central and edge regions. The uniformity of the N2 flow rate at different locations on the substrate 4 throughout the process is further improved.

[0031] In any embodiment, as shown in FIG. 4, FIG. 4 is a schematic cross-sectional view of the straightening device through the center point of the diffuser plate 3. The distance between the upper surface of the end region of the diffusion plate 3 and the gas intake / distribution plate 2 is greater than the distance between the upper surface of the central region of the diffusion plate 3 and the gas intake / distribution plate 2 . The distance between the lower surface of the edge region of the diffusion plate 3 and the central region of the substrate 4 may be constant.

[0032] In any embodiment, as shown in FIG. 5, FIG. 5 is a schematic cross-sectional view of the straightening device through the center point of the diffuser plate 3. The distance between the upper surface of the end region of the diffusion plate 3 and the gas intake / distribution plate 2 is greater than the distance between the upper surface of the central region of the diffusion plate 3 and the gas intake / distribution plate 2 . On the other hand, the distance between the lower surface of the diffuser plate 3 in the edge region and the substrate 4 is greater than the distance between the lower surface of the diffuser plate 3 in the central region and the substrate 4.

[0033] In any embodiment, as shown in FIG. 6, the plurality of through-holes 31 are evenly arranged on the diffusion plate 3, and adjacent through-holes 31 are spaced apart by the same distance. Three adjacent through holes 31 are arranged to form an equilateral triangle.

[0034] The arrangement of the through holes 31 is not limited to the above arrangement. The plurality of through-holes 31 on the diffusion plate 3 may be arranged so as to form a plurality of imaginary concentric circles. The through holes 31 on each concentric circle have the same depth, and the through holes 31 on different concentric circles have different depths. Depending on the flow velocity distribution in each region, the opening sizes of the through-holes 31 on one concentric circle may be set to be the same, and the opening sizes of the through-holes 31 on different concentric circles may be set to be different.

[0035] Second embodiment As shown in FIGS. 8 to 10, the present embodiment differs from the first embodiment in that the depth of the through-holes 31 in the diffusion plate 3 increases stepwise from the edge region toward the center region of the diffusion plate 3. The depth of the through-hole 31 is the same at each position in the end region.

[0036] The distance between the upper surface of the diffusion plate 3 and the gas intake distribution plate 2 is Gap 1, which is the same as the Gap 1 between all of the through holes 31 and the gas intake distribution plate 2.

[0037] Since the end region is far from the nozzle of the gas exhaust pipe 6, the arrangement of the gas exhaust pipe 6 has little effect on the end region. Since the gas flow rate of the through-holes 31 at each position in the end region is substantially equal, the depth of the through-holes 31 at each position in the end region is set to be the same. However, the position of the gas exhaust pipe 6 has a large effect on the central region, and there are significant differences in the gas flow speed of the through-holes 31 at each position in the central region. Therefore, it is necessary to further improve the uniformity of the through holes 31 at each position in the central region.

[0038] The central region of the diffusion plate 3 has a first central region, a second central region, a third central region, and a fourth central region, which are arranged in this order from the inside to the outside around the center of the diffusion plate 3. The depths of the through holes 31 corresponding to the fourth central region, the third central region, the second central region, and the first central region increase in this order.

[0039] As shown in FIGS. 8 to 10, the second central region, the third central region, and the fourth central region are all annular regions. The radius of the first central region is R1, that is, the length from the farthest boundary of the first central region to the center of the diffuser plate 3 is R1, the length from the farthest boundary of the second central region to the center of the diffuser plate 3 is R2, the length from the farthest boundary of the third central region to the center of the diffuser plate 3 is R3, and the length from the farthest boundary of the fourth central region to the center of the diffuser plate 3 is R4. The distance between the underside of the first central region of the diffusion plate 3 and the substrate 4 is Gap221, the distance between the underside of the third central region of the diffusion plate 3 and the substrate 4 is Gap222, and the distance between the underside of the diffusion plate 3 and the substrate 4 in the region where the radius of the edge region is greater than R4 is Gap223. The distance between each position on the underside of the first central region of the diffusion plate 3 and the substrate 4 tends to be constant, and the distance between each position on the underside of the third central region of the diffusion plate 3 and the substrate 4 also tends to be constant.

[0040] In the direction from the edge region to the central region, the distance between the lower surface of the diffusion plate 3 and the substrate 4 in the second central region and the fourth central region decreases linearly, and the depth of the through hole 31 in the second central region and the fourth central region increases linearly.

[0041] Furthermore, there is a linear relationship between the distance between the through-hole 31 in the second central region and the center of the diffusion plate 3 and the depth of the through-hole 31. As shown in FIG. 10, the inclination angle formed between the lower surface of the diffusion plate 3 and the horizontal plane of the second central region is θ1.

[0042]

number

[0043] There is a linear relationship between the distance between the through-hole 31 in the fourth central region and the center of the diffusion plate 3 and the depth of the through-hole 31. As shown in FIG. 9, the tilt angle formed between the lower surface of the diffusion plate 3 and the horizontal plane of the fourth central region is θ2.

[0044]

number

[0045] Referring to FIG. 11, FIG. 11 is a comparison diagram of the flow velocity distribution of the diffusion plate 3. The X-axis represents the position of each through-hole on a cross-sectional plane passing through the center of the diffuser plate, and the Y-axis represents the flow velocity of the through-hole. New scheme 1 is a flow velocity distribution curve of the flow straightener of the first embodiment, and new scheme 2 is a flow velocity distribution curve of the flow straightener of the second embodiment. The existing scheme is the flow velocity distribution curve of the existing flow straightener. As shown in the figure, in the conventional straightening device, the flow velocity of the through-holes 31 in the central region of the diffuser plate 3 is much higher than that in the edge regions, whereas the flow velocity uniformity of the through-holes 31 of the diffuser plate 3 of the present invention is better. The flow rectifier of the second embodiment has the highest uniformity of the flow velocity.

[0046] In order to further improve the uniformity of the flow rate at each position on the diffusion plate 3 , the depth of the through-holes 31 is set according to the flow rate through the through-holes 31 . The high flow rate through-holes 31 are deeper than the low flow rate through-holes 31 . In the figure, the depth of the through holes 31 where the flow velocity is high is further increased, and the depth of the through holes 31 where the flow velocity is low is decreased, so that the flow velocity of each through hole 31 is ultimately positioned on a horizontal straight line. The uniformity of the flow rate at the diffusion plate 3 is further improved.

[0047] The existing diffuser plate is compared with a similar circular mesa diffuser plate 3 in the present invention. The uniformity of flow rates of the existing diffuser plate and the diffuser plate of the present invention can be analyzed under a given flow rate condition. Uniformity can be judged at 3σ. 3σ is a mathematical statistical concept that means three times the standard deviation and is used to express the degree of variation in data and to express uniformity. Compared with the conventional diffuser, the diffuser 3 with the circular mesa structure of the present invention has a smaller calculated 3σ value and better uniformity.

[0048] [Table 1]

[0049] In any embodiment, when the total intake flow rate of N2 increases, the distance between the lower surface of the diffuser plate 3 and the substrate 4 can be continuously reduced to stabilize the uniformity of the flow rate of the diffuser plate 3. Furthermore, the opening of the through-holes 31 can be made smaller, and the uniformity of the flow rate on the diffusion plate 3 can be further improved.

[0050] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit the technical solutions. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions described in the foregoing embodiments can still be modified, or some technical features may be replaced with equivalents. However, these modifications and substitutions do not deviate from the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of each embodiment of the present invention. [Explanation of symbols]

[0051] 1 Cover body 2 Gas intake distribution plate 3 Diffuser 4 boards 5 Gas intake pipe 6 Gas Exhaust Pipe 7 Heating plate 8 Guide Ring 9 Joint 11 First Chamber 12 Second Chamber 13 Third Chamber 21 Gas inlet 22 Connecting pillar 31 Through hole

Claims

1. A rectifier device having a cover body (1), a gas intake distribution plate (2), a diffusion plate (3), a gas intake pipe (5), and a gas exhaust pipe (6), wherein the gas intake distribution plate (2) is disposed on the diffusion plate (3), a substrate (4) can be disposed below the diffusion plate (3), and the gas intake pipe (5) and the gas exhaust pipe (6) are disposed on the cover body (1); A first chamber (11) is formed between the upper surface of the gas inlet / distributor plate (2) and the inner wall of the cover body (1), a second chamber (12) can be formed between the lower surface of the diffusion plate (3) and the substrate (4), and a third chamber (13) is formed between the lower surface of the gas inlet / distributor plate (2) and the upper surface of the diffusion plate (3); One end of the gas inlet pipe (5) is used for connection to a gas supply source, and the other end is in communication with the first chamber (11); one end of the gas exhaust pipe (6) is used for connection to an external gas extraction device, and the other end is in communication with the third chamber (13); The gas intake distribution plate (2) is provided with a plurality of gas inlets (21), and the diffusion plate (3) is provided with a plurality of through-holes (31). The external gas flows through the gas intake pipe (5) through the first chamber (11), the gas inlet (21), the second chamber (12), the through-holes (31), and the third chamber (13) in this order, and is then discharged to the outside through the gas exhaust pipe (6). The depth of the through holes (31) is set according to the flow velocity of the gas flowing through the through holes (31), and the through holes (31) through which the gas flow velocity is high are deeper than the through holes (31) through which the gas flow velocity is low, in this straightening device.

2. 2. The rectifier device according to claim 1, wherein the nozzle of the gas exhaust pipe and the center of the diffuser plate correspond to each other, the diffuser plate having end regions and a central region, the end regions surrounding the central region, and the through holes in the end regions being shallower than the through holes in the central region.

3. 2. The flow straightening device according to claim 1, wherein a plurality of gas inlets (21) are provided in the end region of the gas inlet distribution plate (2), and external gas flows through the gas inlet pipe (5) through the gas inlet ports (21) toward the surface of the substrate (4).

4. 3. The flow straightening device according to claim 2, wherein the depth of the through holes (31) increases linearly from the end regions towards the central region.

5. 5. The flow straightening device according to claim 4, wherein the depth of the through holes (31) in the end regions and the central region increases linearly along the direction from the end regions toward the central region.

6. 3. The flow straightening device according to claim 2, wherein the depth of the through holes (31) increases stepwise from the end regions towards the central region.

7. 7. The rectifier according to claim 4, wherein the distance between the upper surface of the end region of the diffuser plate (3) and the gas intake / distribution plate (2) is greater than the distance between the upper surface of the central region of the diffuser plate (3) and the gas intake / distribution plate (2).

8. 8. The rectifier device according to claim 7, wherein the distance between the lower surface of the diffuser plate (3) in the edge regions and the substrate (4) is greater than or equal to the distance between the lower surface of the diffuser plate (3) in the central region and the substrate (4).

9. 7. The rectifier device according to claim 4, wherein the distance between the lower surface of the diffuser plate (3) and the substrate (4) in the edge regions is greater than the distance between the lower surface of the diffuser plate (3) and the substrate (4) in the central region of the diffuser plate (3).

10. 10. The rectifier device according to claim 9, wherein the distance between the upper surface of the end region of the diffuser plate (3) and the gas intake distribution plate (2) is equal to the distance between the upper surface of the central region and the gas intake distribution plate (2).

11. The central region has a first central region, a second central region, a third central region, and a fourth central region, which are arranged in this order from the inside to the outside around the center of the diffusion plate (3), The rectifier device according to claim 6 , wherein the depths of the through holes 31 corresponding to the fourth central region, the third central region, the second central region and the first central region increase stepwise.

12. The flow straightening device according to claim 11, wherein the depth of the through holes (31) corresponding to the second central region and the fourth central region increases linearly along a direction from the end regions toward the central region.

13. 12. The flow straightening device according to claim 11, wherein the through holes (31) have the same depth at all positions in the first central region, and the through holes (31) have the same depth at all positions in the third central region.

14. The rectifying device of claim 13, wherein the distance between each position on the underside of the first central region of the diffuser plate (3) and the substrate (4) is constant, and the distance between each position on the underside of the third central region of the diffuser plate (3) and the substrate (4) is also constant.

15. 13. The rectifier device according to claim 12, wherein the distance between the lower surface of the diffuser plate (3) in the second central region and the substrate (4) in the fourth central region decreases linearly along the direction from the edge regions to the central region.

16. 12. The flow straightening device according to claim 11, wherein the through holes (31) have the same depth at all positions in the end region.

17. 12. The rectifier according to claim 11, wherein the distance between each point on the upper surface of the diffusion plate (3) and the gas intake distribution plate (2) is the same.

18. 2. The flow straightening device of claim 1, wherein adjacent through holes (31) are spaced apart by the same distance.

19. 19. The rectifier device according to claim 18, wherein three adjacent through holes (31) are arranged to describe an equilateral triangle.

20. The flow straightening device according to claim 18, wherein the plurality of through holes (31) are arranged in a plurality of imaginary concentric circles.

21. The flow straightening device according to claim 20, wherein the depths of the through holes (31) on one concentric circle are the same, and the depths of the through holes (31) on different concentric circles are different.

22. 22. The flow straightening device according to claim 21, wherein the openings of the through holes (31) on one concentric circle are the same, and the openings of the through holes (31) on different concentric circles are different.

23. A heating device comprising the rectifier device according to any one of claims 1 to 22 and a heating assembly, wherein the rectifier device covers the heating assembly to form an enclosed space for placing a substrate (4), and the heating assembly is used to heat the substrate (4).

24. 24. The heating device according to claim 23, wherein the heating assembly comprises a heating plate (7), a guide ring (8), and a joint (9), the outer periphery of the heating plate (7) is snapped onto the guide ring (8), the substrate (4) is placed on the heating plate (7), the cover body (1) covers the joint (9) to form a closed space, and the gas intake distribution plate (2) and the diffusion plate (3) are both within the closed space.

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