Cryogenic micro zone electrostatic chuck connector assembly

Abstract

To provide a cryogenic micro-zone connection assembly for a substrate support assembly suitable for use in cryogenic applications.SOLUTION: In the substrate support assembly 126, the cryogenic micro-zone connection assembly 200 includes a first end 291 having a micro-zone connector 201, a second end 293 having a socket connection 206, a flange 210 disposed between the micro-zone connector and the socket connection, and a wiring harness 226 coupled to the micro-zone connector at a first end, extending through the flange, and coupled to the socket connection at a second end.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] FIELD OF THE DISCLOSURE Embodiments of the present disclosure relate generally to apparatus and processes for microelectronics manufacturing, and more particularly to a substrate support assembly having an electrostatic chuck assembly for use in cryogenic applications. [Background technology]

[0002] Reliable production of sub-nanometer features is one of the key technological challenges for the next generation of very large scale integration (VLSI) and ultra-large scale integration (ULSI) semiconductor devices. However, as the limits of circuit technology are pushed, the shrinking dimensions of VLSI and ULSI interconnect technologies have placed further demands on processing power. Reliable formation of gate structures on substrates is critical to the success of VLSI and ULSI, as well as to the continuing effort to increase circuit density and quality on individual substrates and dies.

[0003] To reduce manufacturing costs, integrated chip (IC) manufacturers demand higher throughput and better device yield and performance from every silicon substrate processed. Some manufacturing techniques currently being explored for next-generation devices under development require processing in a vacuum at temperatures below 0°C and even as low as -200°C during processing of films on substrates that are disposed on a substrate support.

[0004] Some of these low-temperature, sometimes cryogenic (below -153°C) manufacturing techniques are performed in processing chambers that utilize electrostatic chucks to secure substrates being processed in the chamber. A conventional electrostatic chuck has an electrode for chucking the substrate and is part of a substrate support assembly that also includes a heater and cooling plate for more precise control of the processing temperature at the substrate. A conventional electrostatic chuck has many electrical connectors for coupling power to the heater and electrodes. For example, an exemplary conventional electrostatic chuck may have over 150 connectors for coupling power to the heater and electrodes.

[0005] In cryogenic applications, a cryogenic fluid is circulated through a cooling plate to remove heat from the substrate. The cooling plate may be part of a substrate support assembly at atmospheric pressure, while the electrostatic chuck with its heater is at vacuum pressure. The electrical connector for the electrostatic chuck must navigate both the vacuum in the substrate support assembly and atmospheric pressure. The cooling plate may be cooled to temperatures below 0°C, such as from about -10°C to about -100°C or below. At such low temperatures, the electrical connector heated by the electrostatic chuck may have condensation forming on it or may even become covered in ice on the cooling plate. Condensation on the electrical connector can lead to failure modes of the electrical connections and other components of the substrate support assembly due to corrosion and electrical shorts.

[0006] Therefore, there is a need for an improved substrate support assembly suitable for use in cryogenic applications. Summary of the Invention

[0007] Embodiments of the present disclosure generally relate to a cryogenic micro-zone connection assembly for a substrate support assembly suitable for use in cryogenic applications. In one or more embodiments, the cryogenic micro-zone connection assembly has a first end having a micro-zone connector. A second end of the cryogenic micro-zone connection assembly has a socket connection. A flange is disposed between the micro-zone connector and the socket connection. A wiring harness is coupled to the micro-zone connector at the first end. The wiring harness extends through the flange and is coupled to the socket connection at the second end.

[0008] In one or more embodiments, a substrate support assembly configured to operate at temperatures below 0°C is disclosed. The substrate support assembly includes an electrostatic chuck, a cooling plate, and a cryogenic micro-zone connection assembly. The electrostatic chuck has a workpiece support surface opposite a bottom surface. The cooling plate has a top surface, a bottom surface, and a cavity extending through the top and bottom surfaces. The cooling location cavity has a recessed step in the bottom surface. A bonding film is disposed between the electrostatic chuck and the cooling plate. The bonding film includes a bonding layer comprising a silicone material. An optional equipment plate is bonded to the bottom surface of the cooling plate. The cryogenic micro-zone connection assembly has a first end having a micro-zone connector. A second end of the cryogenic micro-zone has a socket connection. A flange is disposed between the micro-zone connector and the socket connection. A wiring harness is bonded to the micro-zone connector at the first end. The wiring harness extends through the flange and is bonded to the socket connection at the second end.

[0009] In one or more embodiments, a cryogenic processing chamber is disclosed. The cryogenic processing chamber has a chamber body having a sidewall, a bottom, and a lid that surround an inner processing region. A substrate support assembly is disposed within the inner processing region. The substrate support assembly is configured to operate at temperatures below 0°C. The substrate support assembly has an electrostatic chuck, a cooling plate, and a cryogenic micro-zone connection assembly. The electrostatic chuck has a workpiece support surface opposite a bottom surface. The cooling plate has a top surface, a bottom surface, and a cavity extending through the top and bottom surfaces. The cavity in the cooling plate has a recessed step in the bottom surface. A bonding film is disposed between the electrostatic chuck and the cooling plate. The bonding film includes a bonding layer comprising a silicone material. An optional equipment plate is bonded to the bottom surface of the cooling plate. The cryogenic micro-zone connection assembly has a first end having a micro-zone connector. A second end of the cryogenic micro-zone has a socket connection. A flange is disposed between the micro-zone connector and the socket connection. A wiring harness is coupled at a first end to the MicroZone connector, extends through the flange and is coupled at a second end to the socket connection.

[0010] In a manner in which the above-recited features of the disclosure may be understood in detail, a more particular description of the present disclosure, briefly outlined above, may be had with reference to embodiments, some of which are illustrated in the accompanying drawings. It should be noted, however, that the accompanying drawings illustrate only exemplary embodiments and, therefore, should not be considered as limiting its scope, as other equally effective embodiments may be recognized. [Brief explanation of the drawings]

[0011] [Figure 1] 1 is a cross-sectional schematic side view of a processing chamber including a substrate support assembly having an electrostatic chuck according to one or more embodiments described and discussed herein. [Figure 2]FIG. 1 is a cross-sectional schematic side view of a substrate support assembly having a cryogenic micro-zone connection assembly according to one or more embodiments described and discussed herein. [Figure 3] FIG. 1 is a schematic bottom view of an electrostatic chuck illustrating a connection scheme for a micro-zone connector according to one or more embodiments described and discussed herein. DETAILED DESCRIPTION OF THE INVENTION

[0012] To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements common to the figures. It is contemplated that elements or features of one or more embodiments may be beneficially incorporated in other embodiments.

[0013] Embodiments of the present disclosure generally relate to a substrate support assembly suitable for use in cryogenic applications. As used herein, cryogenic processing temperatures refer to temperatures below 0°C. In one or more embodiments, the substrate support assembly has a cooling plate coupled to an electrostatic chuck with a secondary heater for independent temperature control at cryogenic processing temperatures below -10°C, such as temperatures below 0°C and about -50°C, about -80°C, about -100°C to about -110°C, about -120°C, about -135°C, about -150°C, or about -200°C. For example, the substrate support assembly is used at cryogenic processing temperatures of about -50°C to about -150°C.

[0014] The substrate support assembly has a primary heater and multiple secondary heaters. The substrate support assembly has a cryogenic micro-zone connection assembly uniquely configured to operate the secondary heaters. The cryogenic micro-zone connection assembly enables individual control of the temperature at a substrate undergoing cryogenic processing while disposed on an electrostatic chuck. The cryogenic micro-zone connection assembly includes several electrical connectors, flanges, or insulator blocks and gaskets to connect the secondary heaters to a control plate disposed inside the substrate support assembly. The flange and gasket arrangement allows the cryogenic micro-zone connection assembly to extend from a vacuum environment to an atmospheric environment and to be used over a wide variety of temperatures without the formation of condensation on or within the cryogenic micro-zone connection assembly. The cryogenic micro-zone connection assembly minimizes corrosion and short circuits resulting from condensation within the electrical components of the substrate support assembly. Thus, the cryogenic micro-zone connection assembly extends the service life and reliability of the substrate support assembly.

[0015] 1 is a schematic cross-sectional view of an exemplary cryogenic processing chamber 100 with a substrate support assembly 126, shown configured as an etch chamber. The substrate support assembly 126 can be utilized in other types of processing plasma chambers, such as plasma processing chambers, annealing chambers, physical vapor deposition (PVD) chambers, chemical vapor deposition (CVD) chambers, and ion implantation chambers, among others, as well as other systems where the ability to control surface or substrate processing uniformity is desirable. Control of the dielectric properties tan(δ), e.g., dielectric loss, or ρ, e.g., volume resistivity, over an elevated temperature range of the substrate support assembly 126 beneficially enables azimuthal process control, e.g., processing uniformity, for a substrate 124 disposed on the substrate support assembly 126.

[0016] The cryogenic processing chamber 100 includes a chamber body 102 having sidewalls 104, a bottom, and a lid 108 that surround an inner processing region 110. An injection system 112 is coupled to the sidewalls 104 and / or the lid 108 of the chamber body 102. A gas panel 114 is coupled to the injection system 112 to enable process gases to be provided into the inner processing region 110. The injection system 112 may be one or more nozzles or inlets, or alternatively, a showerhead. The process gases, along with any process by-products, are removed from the inner processing region 110 through an exhaust port 128 formed in the sidewalls 104 or bottom 106 of the chamber body 102. The exhaust port 128 is coupled to a pumping system 132 that includes a throttle valve and a pump that are utilized to control the vacuum level within the inner processing region 110.

[0017] The process gas can be activated to form a plasma within the inner processing region 110. The process gas can be activated by capacitively or inductively coupling RF power to the process gas. In the embodiment depicted in FIG. 1 , multiple coils 116 are disposed on the lid 108 of the cryogenic processing chamber 100 and are coupled to an RF power source 120 through a matching network 118. Power applied to the multiple coils 116 inductively couples power to the process gas to form a plasma within the inner processing region 110.

[0018] The substrate support assembly 126 is disposed within the inner processing region 110 below the injection device 112. The substrate support assembly 126 includes an electrostatic chuck (ESC) 174 and a cooling plate 130. The cooling plate 130 is supported by a base plate 176. The base plate 176 is supported by one of the sidewalls 104 or the bottom 106 of the cryogenic processing chamber 100. The substrate support assembly 126 may additionally include a heater assembly (not shown). Additionally, the substrate support assembly 126 may include a fixture plate 145 and / or an insulator plate (not shown) disposed between the cooling plate 130 and the base plate 176 to facilitate electrical, cooling, and gas connections to the substrate support assembly 126.

[0019] The cooling plate 130 is formed of or otherwise contains one or more metallic materials. In one or more examples, the cooling plate 130 contains one or more aluminum alloys, one or more aluminum-silicon alloys, one or more aluminum-molybdenum alloys, one or more aluminum-molybdenum-silicon alloys, and other alloys and / or composite materials as further described and discussed herein. The cooling plate 130 includes a plurality of cooling channels 190 formed therein. The cooling channels 190 are connected to a heat transfer fluid source 122. The heat transfer fluid source 122 provides a heat transfer fluid, such as a liquid, gas, or a combination thereof, that is circulated through one or more cooling channels 190 disposed within the cooling plate 130. Fluid flowing through neighboring cooling channels 190 is isolated to enable localized control of heat transfer between the ESC 174 and different regions of the cooling plate 130, which helps control the lateral temperature profile of the substrate 124. In one or more embodiments, the heat transfer fluid circulating through the cooling channels 190 of the cooling plate 130 maintains the cooling plate 130 at a temperature below 0°C, such as between about -40°C and about -100°C.

[0020] The ESC 174 typically includes a chuck electrode 186 embedded within the dielectric 175. The chuck electrode 186 may be configured as a monopolar or bipolar electrode, or other suitable configuration. The chuck electrode 186 is coupled through an RF filter to a chuck power supply 187, which provides DC power to electrostatically clamp the substrate 124 to the substrate support surface 137 of the ESC 174. The RF filter prevents RF power utilized to form a plasma (not shown) within the cryogenic processing chamber 100 from causing damage to electrical equipment or creating electrical disturbances outside the chamber.

[0021] The substrate support surface 137 of the ESC 174 includes gas passages (not shown) for providing a backside heat transfer gas to an interstitial space defined between the substrate 124 and the substrate support surface 137 of the ESC 174. The ESC 174 also includes lift pin holes for accommodating lift pins (not shown) for lifting the substrate 124 above the substrate support surface 137 of the ESC 174 to facilitate robotic movement into and out of the cryogenic processing chamber 100.

[0022] A bonding layer 150 is disposed below the ESCs 174 and secures the ESCs 174 to the cooling plate 130. In other embodiments, the bonding layer 150 is disposed between the ESCs 174 and a lower plate disposed between the ESCs 174 and the cooling plate 130, as described further below. The bonding layer 150 may have a thermal conductivity of about 0.1 W / mK to about 5 W / mK. The bonding layer 150 may be formed from several layers that compensate for differential thermal expansion between the ESCs 174 and the underlying portion of the substrate support assembly 126, such as the cooling plate 130. The layers comprising the bonding layer 150 may be formed from different materials and are discussed with reference to subsequent figures illustrating separate embodiments.

[0023] The ESC 174 includes one or more electrodes 186 for chucking the substrate. The electrodes 186 are disposed within a dielectric 175 of the ESC 174. The dielectric 175 of the ESC 174 has a substrate support surface 137 and a bottom surface 133 opposite the substrate support surface 137. The dielectric 175 of the ESC 174 is fabricated from a ceramic material, such as alumina (Al2O3), aluminum nitride (AlN), or other suitable material. Alternatively, the dielectric 175 can be fabricated from a polymer, such as polyimide, polyetheretherketone, polyaryletherketone, and the like.

[0024] The dielectric 175 optionally includes one or more primary resistive heaters 188 embedded therein. The primary resistive heaters 188 are utilized to raise the temperature of the substrate support assembly 126 to a temperature suitable for processing a substrate 124 disposed on the substrate support surface 137 of the substrate support assembly 126. The primary resistive heaters 188 are coupled to a heater power supply 189 through the fixture plate 145. The heater power supply 189 may provide 900 watts or more of power to the primary resistive heaters 188. A controller (not shown) is utilized to control the operation of the heater power supply 189, which is typically set to heat the substrate 124 to a predetermined temperature. In one or more embodiments, the primary resistive heaters 188 include multiple laterally separated heating zones, and the controller enables at least one of the primary resistive heaters 188 to be preferentially heated relative to primary resistive heaters 188 located in one or more of the other zones. For example, the primary resistive heaters 188 may be arranged concentrically within the multiple separated heating zones. In one example, the primary resistive heaters 188 are arranged in four concentric primary heater zones, such as a first primary heater zone, a second primary heater zone, a third primary heater zone, and a fourth primary heater zone, etc. The primary resistive heaters 188 may maintain the substrate 124 at a temperature suitable for processing, such as between about 180°C and about 500°C, such as greater than about 250°C, such as between about 250°C and about 300°C.

[0025] In one or more embodiments, the dielectric 175 of the ESC 174 has multiple secondary heaters 140 that create a microzone effect. The secondary heaters 140 create temperature control within small, individual locations, or microzones, on the ESC 174. Here, microzones refer to individually temperature-controllable areas of the ESC 174, and there may be anywhere from 10, about 50, about 80, or about 100 microzones to about 120, about 150, about 200, or more microzones on the ESC 174. The number of secondary heaters 140 may be an order of magnitude greater than the number of primary resistive heaters 188. The secondary heaters 140 serve to control the temperature of the ESC 174 at a microlevel, such as plus or minus 5 degrees Celsius, while the primary resistive heaters 188 control the temperature of the ESC 174 at a macrolevel. The microzones are temperature-controlled by the secondary heaters 140.

[0026] The secondary heaters 140 may be configured in a pattern to efficiently generate a thermal profile along the surface of the substrate support assembly 126. The pattern may be symmetrical about a midpoint while providing clearance in and around holes for lift pins or other mechanical, fluid, or electrical connections. The secondary heaters 140 are arranged in multiple cells, or microzones. It is contemplated that each secondary heater 140 occupies a respective single microzone.

[0027] Each secondary heater 140 has a resistor terminated in terminals. When current enters one terminal and exits the other, the current travels across the wires of the resistor, generating heat. The amount of heat released by the resistor is proportional to the square of the current passing through it. Power design densities can be from about 1 watt / cell to about 100 watts / cell, such as 10 watts / cell.

[0028] Each secondary heater 140 can be controlled by a controller 142. The controller 142 can turn on a single secondary heater 140 or multiple secondary heaters together in groups. In this manner, temperature can be precisely controlled at independent locations along the microzones formed within the ESC 174, and such independent locations are not limited to concentric rings as known in the art. While the pattern shown is made up of smaller units, the pattern could alternatively have larger and / or smaller units, extend to the edges, or have other configurations to form 150 or more individual microzones.

[0029] In one or more examples, the ESC 174 contains about 50 to about 200 heaters disposed therein. Each heater can be independently enabled to control the temperature within its respective zone. The micro-zone connectors 201 allow connection of the secondary heaters 140 in cryogenic environments. FIG. 2 depicts a cross-sectional schematic side view of a substrate support assembly 126 having a micro-zone connector 201 according to one or more embodiments described and discussed herein. The micro-zone connectors 201 are configured to operate within the substrate support assembly 126 at temperatures of about 0° C. to about −140° C.

[0030] 2 depicts a cross-sectional schematic side view of a substrate support assembly 126 having a cryogenic micro-zone connection assembly 200 according to one or more embodiments described and discussed herein. It should be understood that FIG. 2 depicts only a portion of the substrate support assembly 126 along the periphery and at only one location where one cryogenic micro-zone connection assembly 200 is located. It should also be understood that the substrate support assembly 126 can have multiple cryogenic micro-zone connection assemblies 200, for example, at least one per secondary heater 140.

[0031] The substrate support assembly 126 may have a first sidewall 272 extending between the facilities plate 145 and the ESC 174. In some examples, the first sidewall 272 is part of the facilities plate 145. A gasket 264 is disposed between the first sidewall 272 and the ESC 174. The gasket 264 provides an airtight seal between the first sidewall 272 and the ESC 174. A second sidewall 276 may extend between the facilities plate 145 and the base plate 176. In some examples, the second sidewall 276 is part of the base plate 176. A gasket 266 is disposed between the second sidewall 276 and the facilities plate 145. The gasket 266 provides an airtight seal between the second sidewall 276 and the facilities plate 145. Various components of the substrate support assembly 126, such as the bonding layer 150, the cooling plate 130, and the printed circuit (PC) board 270, are disposed within the sidewalls, a first sidewall 272, and a second sidewall 276. The first sidewall 272 and the second sidewall 276 detect the various components of the substrate support assembly 126 from the processing environment.

[0032] Bonding layer 150 secures bottom 237 of ESC 174 to top surface 292 of cooling plate 130. Bonding layer 150 includes silicone bonds 256, molybdenum bonds 254, and indium bonds 252. A cavity 242 extends through cooling plate 130 and through bonding layer 150 to expose bottom 237 of ESC 174. Cavity 242 aligns with the location of one or more of multiple connectors 204 of secondary heater 140.

[0033] Cryogenic micro-zone connection assembly 200 has a plurality of connectors 204 at a first end 291 and a socket connection 206 at a second end 293 distal from first end 292. Cryogenic micro-zone connection assembly 200 includes micro-zone connectors 201, a flange 210, and a wiring harness 226. Cryogenic micro-zone connection assembly 200 may additionally include one or more heaters 280, such as heaters 282, 284. Heater 280 is disposed below cooling plate 130. Heater 280 is discussed further below. Cryogenic micro-zone connection assembly 200 is disposed within substrate support assembly 126 and extends from ESC 174 at first end 291, through cooling plate 130 and equipment plate 145, and into base plate 176 at second end 293.

[0034] The micro-zone connector 201 may be formed from a low-temperature compatible material, such as a material that can be used at temperatures below 200°C. The micro-zone connector 201 may be formed from polyimide, alumina, ceramic, or other suitable material. The micro-zone connector 201 has a plurality of connectors 204. In one example, the micro-zone connector 201 has 25 to 100 connectors 204, such as 50 connectors 204.

[0035] The connectors 204 may couple to and mate with multiple corresponding heater connectors 202. The heater connectors 202 are coupled to the secondary heaters 140. In one example, each heater connector 202 is coupled to a respective secondary heater 140, such that there is a one-to-one correspondence between the secondary heaters 140 and each connector 204. In this manner, individual control for each secondary heater 140 is provided via the respective connector 204. That is, one connector 204 provides power and control to one secondary heater 140. In another example, each micro-zone connector 201 may handle multiple heater connections. For example, in a substrate support assembly 126 having 150 heaters, there may be three equally spaced micro-zone connectors 201, with each micro-zone connector 201 coupled to 50 heaters.

[0036] Turning briefly to FIG. 3 , FIG. 3 depicts a schematic bottom view of the ESC 174 illustrating the connection schematic of the micro-zone connector 201. The bottom surface 133 of the ESC 174 may have multiple heater interfaces 310 disposed along the periphery 372 of the ESC 174. A primary heater interface 340 for controlling and powering the primary resistive heaters 188 may be located at the center 399 of the ESC 134. Connectors 204 may be grouped in a heater interface 310 on the bottom surface 133 of the ESC 174. Each heater interface 310 may serve as a connection for providing power to a secondary heater 140. In one example, each heater interface 310 has about 10 to about 50 connectors 204 that individually control about 10 to about 50 secondary heaters 140. In one example, the ESC 174 has 150 secondary heaters 140 grouped into three of the heater interfaces 310. For example, the first heater connection 301 may operate a first group of 50 secondary heaters 140, the second heater connection 302 may operate a second group of 50 secondary heaters 140, while the third heater connection 303 may operate a third group of 50 secondary heaters 140. The first heater connection 301, the second heater connection 302, and the third heater connection 303 allow for individual control of up to 150 secondary heaters 140. Each of the heater interfaces 310 has several heater connectors 202 corresponding to the respective secondary heaters 140. In one example, each heater interface 310 has 50 individual heater connectors 202 that provide power to a separate secondary heater 140. However, it should be understood that there may be more or fewer than 150 secondary heaters 140 and therefore more or fewer heater interfaces 310 for the secondary heaters 140 .

[0037] 2 , connector 204 and heater connector 202 may be of a type that allows an elective connection to be made across connector 204 and heater connector 202. In one example, connector 204 is female and heater connector 202 is male, e.g., a socket and pin. In another example, connector 204 is male and heater connector 202 is female. Connector 204 mates with heater connector 202 to provide an electrical connection to secondary heater 140.

[0038] The cooling plate 130 has a bottom surface 294 and a top surface 292. The cooling plate 130 has a plurality of cavities 242 extending from the top surface 292 to the bottom surface 294. The cooling plate 130 has recessed steps 232 formed in the cavities 242 along the bottom surface 294 of the cooling plate 130. The recessed steps 232 extend a depth 235 into the bottom surface 294.

[0039] The flange 210 is disposed within a recessed step 232 of the cooling plate 130. The flange 210 is of a height substantially similar to a depth 235 and is sized to fit within the recessed step 232 such that the bottom surface of the flange 210 is substantially flush with the bottom surface 294 of the cooling plate 130. Alternately, the flange 210 may extend slightly beyond the bottom surface 294 of the cooling plate 130. In yet another alternative, the flange 210 may be recessed slightly within the bottom surface 294 of the cooling plate 130. The flange 210 is formed of a material having a low thermal conductivity. The flange 210 may be formed of a thermally insulating material such as alumina, polyimide, thermoplastic, such as polyphenylene sulfide, metal, silicone, high-temperature polyimide (such as VESPEL® and MELDIN®), or other suitable thermally insulating material. The flange 210 may additionally be formed of an electrically insulating material.

[0040] The flange 210 has one or more sealed leads 220, such as a first lead 222 and a second lead 224, extending therethrough. The sealed lead 220 may include 50 or more individual connections. For example, the sealed lead 220 may be a wire bundle of 50 electrical cables bound together in an insulating jacket, such as polyimide insulation. The sealed lead 220 extends through the flange 210. The sealed lead 220 extends through the flange 210 in a manner such that fluids, such as liquids or gases, cannot pass through the flange 210 along the sealed lead 220. The sealed lead 220 is configured to prevent fluid transmission through the flange 210. The sealed lead 220 is coupled to the micro-zone connector 201. The sealed lead 220 includes each connection extending through the micro-zone connector 201. For example, the sealed lead 220 may include 50 or more wired connections for controlling the secondary heater 140.

[0041] In some examples, the sealed lead 220 is configured to be removably connected to the first lead 222 and the second lead 224, such as with pin connectors, to aid in installation. In other examples, the sealed lead 220 is integral with the first lead 222 and the second lead 224 to ensure good connectivity. In yet another example, the sealed lead 220 extends through the flange 220 and is configured to be removably connected to the wiring harness 226. In yet another example, the sealed lead 220 extends through the flange 220 and is integrally part of the wiring harness 226. To aid in assembly, the first lead 222 and the second lead 224 may be long enough to allow the micro-zone connector 201 to connect to the secondary heater 140 without the recessed step 232 in the flange 220. Alternately, the first lead 222 and the second lead 224 can be firmly attached to both the micro-zone connector 201 and the flange 220 such that pressing the flange 220 into the recessed step 232 compresses the micro-zone connector 201 to effect connection with the secondary heater 140. It should be understood that this functionality does not change in any arrangement for assembling the micro-zone connector assembly 200, while other arrangements for ease of assembly may be equally suitable.

[0042] A seal 262 is disposed between the flange 210 and the equipment plate 145. The seal 262 provides an airtight seal between the flange 210 and the equipment plate 145. Thus, a pressure differential can exist across the seal 262. For example, there can be vacuum pressure on one side of the seal 262, while atmospheric pressure can be on the other side of the seal 262.

[0043] The facility plate 145 may have one or more passages 245 extending therethrough. The passages 245 are provided to allow wiring from the electrostatic chuck 174 and other components of the substrate support assembly 126 to extend into the base plate 176 of the substrate support assembly 126. The sealed leads 220 extend into the passages 245 and couple with a wiring harness 226.

[0044] PC board 270 may be coupled to equipment plate 145. For example, PC board 270 may be coupled to equipment plate 145 by one or more standoffs 271. PC board 270 is disposed within base plate 176. PC board 270 may be a programmable logic controller or other suitable hardware configured to control the operation and components of ESC 174. In one example, PC board 270 controls secondary heater 140. Wiring harness 226 extends to socket connection 206 on PC board 270 for electrically coupling secondary heater 140 to PC board 270 through micro-zone connector 201.

[0045] The substrate support assembly 126 is provided in a vacuum processing environment for processing a substrate disposed on the ESC 174. However, it should be noted that portions of the substrate support assembly 126 are at atmospheric pressure. For example, the first inner portion 248 is at vacuum pressure, while the second inner portion 244 is at atmospheric pressure. A plurality of gaskets / seals 262, 264, 266 provide the necessary seals to maintain a vacuum in the first inner portion 248 while the second inner portion 244 is at atmospheric pressure. Additionally, the cavity 242 may be fluidly coupled to the first inner portion 248 such that the cavity 242 is at vacuum pressure. For example, the flange 210 does not seal against the cooling plate 130 within the recessed step 232 such that the vacuum in the first inner portion 248 extends into the cavity 242 between the flange 210 and the ESC 174. Alternatively, the flange 210 may be sealed to the cooling plate 130 using an O-ring, gasket, or other suitable seal.

[0046] Additionally, the vacuum processing environment is maintained at a cryogenic temperature for processing substrates. For example, the substrate support assembly 126 may be operable to process substrates at temperatures below −10° C., such as below 0° C. and temperatures of about −50° C., about −80° C., about −100° C. to about −110° C., about −120° C., about −135° C., about −150° C., or about −200° C.

[0047] Condensation occurs when air cools to its dew point, or when the air becomes saturated with water vapor to the point where it can no longer hold water. Whether water condenses depends on the partial pressure and temperature of the water vapor. Water condenses when the temperature of an object is below its boiling (sublimation) point at that pressure. As a result, water condenses within the cryogenic vacuum chamber and can cause electrical shorts, corrosion, or other damage. The cryogenic micro-zone connection assembly 200 prevents condensation from causing electrical shorts and other damage. The flange 210 of the cryogenic micro-zone connection assembly 200 creates a seal between the cavity 242 and the second inner portion 244 to prevent condensation from forming on the cryogenic micro-zone connection assembly 200, which provides power and control from the PC board 270 to the secondary heater 140.

[0048] Cryogenic micro-zone connection assembly 200 is designed for use in cryogenic processing chamber 100 in a process-ready state. For example, first end 291 of cryogenic micro-zone connection assembly 200 is at vacuum pressure, while simultaneously second end 293 of cryogenic micro-zone connection assembly 200 is at atmospheric pressure. In one example, connector 204 of cryogenic micro-zone connection assembly 200 can be subjected to a vacuum environment at a temperature below that of socket connection 206 of cryogenic micro-zone connection assembly 200 in PC board 270, which is at an atmospheric environment. Cryogenic micro-zone connection assembly 200 electrically couples PC board 270 to secondary heater 140.

[0049] In some examples, the cryogenic micro-zone connection assembly 200 may additionally or optionally include one or more heaters 280. For example, the first heater 282 may be disposed on the flange 210 within the space of the second inner portion 244 of the substrate support assembly 126. In another example, the second heater 284 may be disposed on the PC board 270 opposite the flange 210 within the space of the second inner portion 244 of the substrate support assembly 126. The cryogenic micro-zone connection assembly 200 may use either the first heater 282 and / or the second heater 284 to prevent condensation from forming on the cryogenic micro-zone connection assembly 200 that provides power and control from the PC board 270 to the secondary heater 140.

[0050] Advantageously, the cryogenic micro-zone connection assembly 200, with or without the heater 280, prevents moisture from entering the PC board 270. Reducing moisture in the PC board 270 by the cryogenic micro-zone connection assembly 200 prevents electrical shorts in the PC board 270, corrosion of electrical connections in the PC board 270, and extends the life between maintenance procedures for the PC board 270.

[0051] Although the foregoing is directed to embodiments of the present disclosure, other and further embodiments may be devised without departing from the basic scope of the present disclosure, the scope of which is determined by the claims that follow. As is apparent from the foregoing general description and specific embodiments, while forms of the present disclosure have been illustrated and described, various modifications may be made without departing from the spirit and scope of the present disclosure. As used herein, the term "about" refers to a + / - 10% variation from the nominal value. It is understood that such a variation may be included in any value provided herein.

[0052] Certain embodiments and features are described using a set of upper numerical limits and a set of lower numerical limits. It is understood that ranges including combinations of any two values ​​are contemplated, for example, any lower value with any upper value, any two lower values, and / or any two upper values, unless otherwise stated. Particular lower limits, upper limits, and ranges appear in one or more claims below.

Claims

1. 1. A cryogenic micro-zone connection assembly comprising: a first end having a microzone connector; a second end having a socket connection; a flange disposed between the microzone connector on a first side and the socket connection on a second side; a wiring harness coupled to the micro-zone connector at the first end, extending through the flange, and coupled to the socket connection at the second end, the wiring harness sealing the flange between the first end and the second end, the flange being suitable for maintaining a pressure differential from the first side to the second side of the flange.

2. 10. The cryogenic micro-zone connection assembly of claim 1, wherein the micro-zone connector comprises about 10 to about 50 connectors.

3. The cryogenic micro-zone connection assembly of claim 1 , wherein the flange is formed of an insulating material.

4. 4. The cryogenic micro-zone connection assembly of claim 3, wherein the flange is formed from one of alumina, polyimide, or thermoplastic.

5. 10. The cryogenic micro-zone connection assembly of claim 1, further comprising a sealed lead extending through the flange, the sealed lead sealed to the flange to prevent fluid from passing along the sealed lead through the flange.

6. 1. A substrate support assembly configured to operate at a temperature below 0° C., comprising: an electrostatic chuck having a workpiece support surface opposite a bottom surface; A cooling plate, top surface, The bottom, and a cooling plate comprising a cavity extending through the top surface and the bottom surface, the cavity having a recessed step in the bottom surface; a bonding layer disposed between the electrostatic chuck and the cooling plate, the bonding layer comprising a silicone material; and an equipment plate coupled to the bottom surface of the cooling plate; 1. A cryogenic micro-zone connection assembly comprising: a first end having a microzone connector coupled to the bottom surface of the electrostatic chuck; a second end having a socket connection disposed within the equipment plate; and a flange disposed within the cooling plate and disposed between the microzone connector and the socket connection; and a cryogenic micro-zone connection assembly including a wiring harness coupled at the first end to the micro-zone connector, extending through the flange, and coupled at the second end to the socket connection; A substrate support assembly comprising:

7. The substrate support assembly of claim 6 , further comprising a sealed lead extending through the flange, the sealed lead configured to prevent fluid transmission through the flange.

8. The substrate support assembly of claim 7 , further comprising a PC board coupled to the facilities plate, the socket connections being electrically coupled to the PC board.

9. The substrate support assembly of claim 7, wherein the micro-zone connector comprises about 10 to about 50 connectors.

10. The substrate support assembly of claim 7 , wherein the flange is formed from an insulating material.

11. The substrate support assembly of claim 10 , wherein the cavity extends through the bonding layer to expose a bottom of the electrostatic chuck, and the micro-zone connector is disposed within the cavity.

12. The substrate support assembly of claim 11 , wherein the flange is disposed within a recessed step of the cavity.

13. 1. A cryogenic processing chamber comprising: a chamber body having a sidewall, a bottom, and a lid enclosing an inner processing region; a substrate support assembly disposed within the inner processing region, the substrate support assembly configured to operate at a temperature below 0° C., the substrate support assembly comprising: an electrostatic chuck having a workpiece support surface opposite a bottom surface; A cooling plate, top surface, The bottom, and a cooling plate comprising a cavity extending through the top surface and the bottom surface, the cavity having a recessed step in the bottom surface; a bonding film disposed between the electrostatic chuck and the cooling plate, the bonding film comprising a bonding layer comprising a silicone material; an equipment plate coupled to the bottom surface of the cooling plate; 1. A cryogenic micro-zone connection assembly comprising: a first end having a microzone connector coupled to the bottom surface of the electrostatic chuck; a second end having a socket connection disposed within the equipment plate; and a cryogenic micro-zone connection assembly disposed within the cooling plate and including a flange disposed between the micro-zone connector and the socket connection; a seal between the flange and the equipment plate, the seal operable to maintain a pressure differential between the first end and the second end of the cryogenic micro-zone connection assembly.

14. The substrate support assembly includes: The cryogenic processing chamber of claim 13 , further comprising a sealed lead extending through the flange, the sealed lead configured to prevent fluid communication through the flange.

15. 15. The cryogenic processing chamber of claim 14, further comprising a PC board coupled to the facilities plate, the socket connection being electrically coupled to the PC board.

16. 15. The cryogenic processing chamber of claim 14, wherein the flange is formed of an insulating material, the flange being disposed within the recessed step of the cavity.

17. 17. The cryogenic processing chamber of claim 16, wherein the cavity extends through the bonding layer to expose the bottom of the electrostatic chuck, and the micro-zone connector is disposed within the cavity.

18. 15. The cryogenic processing chamber of claim 14, wherein the first end of the cryogenic micro-zone connection is at vacuum pressure relative to the second end of the cryogenic micro-zone connection assembly.

19. The cryogenic processing chamber of claim 14 further comprising a heater disposed below the cooling plate.

20. The cryogenic processing chamber of claim 13 further comprising a seal formed between the flange and the equipment plate.

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