Exposure apparatus and method of manufacturing semiconductor device

Abstract

To provide an exposure apparatus in which a controller can be arranged close to a spatial light modulator and a plurality of spatial light modulators can be arranged at short intervals.SOLUTION: The exposure apparatus includes a first substrate on which a first spatial light modulator including a plurality of first mirrors is mounted, a second substrate on which a second spatial light modulator including a plurality of second mirrors is mounted, a first stage movable in a first direction and a second direction, a first illumination optical system including a first lens and a first reflection mirror, and a second illumination optical system including a second lens and a second reflection mirror, in a plan view, the first and second substrates are arranged in the second direction, a longitudinal direction of the first substrate faces the first direction or a direction closer to the first direction than the second direction, a longitudinal direction of the second substrate faces the first direction or a direction closer to the first direction than the second direction, the first lens and the first spatial light modulator are arranged in the first direction without overlapping each other, and the second lens and the second spatial light modulator are arranged in the first direction without overlapping each other.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an exposure apparatus and a method for producing a semiconductor device. This application claims priority based on Japanese Patent Application No. 2021-111623, filed on July 5, 2021, the contents of which are incorporated herein by reference. [Background technology]

[0002] Conventionally, as an exposure apparatus that irradiates a substrate with illumination light through an optical system, an exposure apparatus has been known that uses a spatial light modulator to modulate light, passes the modulated light through a projection optical system, and forms an image of this light on a resist applied to the substrate to perform exposure (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2005-266779 Summary of the Invention

[0004] A first aspect of the present invention includes a first substrate on which a first spatial light modulator including a plurality of first mirrors arranged in a first arrangement direction is mounted, a second substrate on which a second spatial light modulator including a plurality of second mirrors arranged in a second arrangement direction is mounted, a first stage including an upper surface capable of holding an object, located below the first spatial light modulator and the second spatial light modulator, and movable relative to the first spatial light modulator and the second spatial light modulator in a first direction and a second direction intersecting the first direction, a first illumination optical system including a first lens that guides incident light downward and a first reflecting mirror that guides light that has passed through the first lens to the plurality of first mirrors, and a second illumination optical system including a second lens that guides incident light downward and a second reflecting mirror that guides light that has passed through the second lens to the plurality of second mirrors, wherein the side of the first spatial light modulator on which the plurality of first mirrors are arranged is the first substrate and the second substrate are aligned in the second direction, the longitudinal direction of the first substrate faces the first direction or a direction closer to the first direction than the second direction, the longitudinal direction of the second substrate faces the first direction or a direction closer to the first direction than the second direction, the first lens of the first illumination optical system and the first spatial light modulator are aligned in the first direction without overlapping, and the second lens of the second illumination optical system and the second spatial light modulator are aligned in the first direction without overlapping.

[0005] A second aspect of the present invention provides a method for manufacturing a spatial light modulator, comprising: a first substrate on which a first spatial light modulator including a plurality of first mirrors arranged in a first arrangement direction is mounted; a second substrate on which a second spatial light modulator including a plurality of second mirrors arranged in a second arrangement direction is mounted; a first stage including an upper surface capable of holding an object, the first stage being positioned below the first spatial light modulator and the second spatial light modulator, and being movable in a first direction and a second direction intersecting the first direction relative to the first spatial light modulator and the second spatial light modulator; a first lens that guides incident light downward; and a second stage that guides light that has passed through the first lens to the plurality of second mirrors. a second illumination optical system including a first illumination optical system including a first reflecting mirror that guides incident light downward to a first mirror, a second lens that guides incident light downward, and a second reflecting mirror that guides light that has passed through the second lens to the plurality of second mirrors, wherein the side of the first spatial light modulator on which the plurality of first mirrors are arranged faces the upper surface side of the first stage, and the side of the second spatial light modulator on which the plurality of second mirrors are arranged faces the upper surface side of the first stage, and the first board includes at least a power supply circuit and a controller that controls the plurality of first mirrors. On the first substrate, the at least one member of the first substrate and the first spatial light modulator are aligned in a predetermined direction; on the second substrate, at least one member of a power supply circuit and a controller that controls the plurality of second mirrors is mounted; on the second substrate, the at least one member of the second substrate and the second spatial light modulator are aligned in a predetermined direction; the first lens of the first illumination optical system is positioned lower than the first spatial light modulator; and the second lens of the second illumination optical system is positioned lower than the second spatial light modulator. the first substrate and the second substrate are arranged in the second direction in a plan view, the predetermined direction of the first substrate faces the first direction or faces a direction closer to the first direction than the second direction, the predetermined direction of the second substrate faces the first direction or faces a direction closer to the first direction than the second direction, the first lens of the first illumination optical system and the first spatial light modulator are arranged in the first direction without overlapping, and the second lens of the second illumination optical system and the second spatial light modulator are arranged in the first direction without overlapping.

[0006] A third aspect of the present invention is the exposure apparatus according to the first or second aspect, wherein the object is a substrate including a photosensitive material layer.

[0007] A fourth aspect of the present invention is a method for producing a semiconductor device, comprising exposing the substrate using the exposure apparatus according to the third aspect. [Brief explanation of the drawings]

[0008] [Figure 1] 1 is a perspective view showing an exposure apparatus using a spatial light modulation unit according to a first embodiment. [Figure 2] FIG. 1 is a side view showing an outline of an exposure apparatus. [Figure 3] FIG. 2 is a plan view showing a spatial light modulation unit. [Figure 4] FIG. 2 is a side view of the spatial light modulation unit according to the first embodiment. [Figure 5] FIG. 2 is a plan view of a plurality of spatial light modulation units according to the first embodiment arranged side by side. [Figure 6] FIG. 10 is a plan view of a modified example 1A of the spatial light modulation unit according to the first embodiment. [Figure 7] FIG. 10 is a plan view of a modified example 1B of the spatial light modulation unit according to the first embodiment. [Figure 8] FIG. 10 is a plan view of a modified example 1C of the spatial light modulation unit according to the first embodiment. [Figure 9] FIG. 10 is a side view of a spatial light modulation unit according to a second embodiment. [Figure 10] FIG. 10 is a developed plan view of a spatial light modulation unit according to a second embodiment. [Figure 11] FIG. 10 is a plan view of a plurality of spatial light modulation units according to a second embodiment arranged side by side. [Figure 12] FIG. 10 is a developed plan view of a modified example 2A of the spatial light modulation unit 1 according to the second embodiment. [Figure 13] FIG. 10 is a developed plan view of a modified example 2B of the spatial light modulation unit 1 according to the second embodiment. [Figure 14]FIG. 10 is a developed plan view of a modified example 2C of the spatial light modulation unit 1 according to the second embodiment. [Figure 15] FIG. 10 is a side view of a spatial light modulation unit according to a third embodiment. [Figure 16] FIG. 10 is a plan view of a modified example of a plurality of spatial light modulation units according to the first embodiment arranged side by side. [Figure 17] FIG. 10 is a plan view of a modified example of a plurality of spatial light modulation units according to the first embodiment arranged side by side. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, the embodiments will be described in detail with reference to the drawings. FIG. 1 is a perspective view showing an exposure apparatus 100 using a spatial light modulation unit 1 according to the first embodiment. FIG. 2 is a side view showing an outline of the exposure apparatus 100. FIG. 3 is a view seen from the arrow A in FIG. 2 and is a plan view of the spatial light modulation unit 1 according to the first embodiment. FIG. 4 is a side view of the spatial light modulation unit 1 according to the first embodiment. FIG. 5 is a view seen from the arrow A in FIG. 2 and is a plan view of a plurality of spatial light modulation units 1 according to the first embodiment arranged in a row. FIG. 6 is a plan view of a modified example 1A of the spatial light modulation unit 1 according to the first embodiment. FIG. 7 is a plan view of a modified example 1B of the spatial light modulation unit 1 according to the first embodiment. FIG. 8 is a plan view of a modified example 1C of the spatial light modulation unit 1 according to the first embodiment. FIGS. 16 and 17 are plan views of modified examples of a plurality of spatial light modulation units according to the first embodiment arranged in a row. Hereinafter, the direction in which the photosensitive substrate 10 (or the substrate stage 4 that moves together with the photosensitive substrate 10) moves relative to the spatial light modulation unit 1 during exposure of the photosensitive substrate 10 will be referred to as the scanning direction S or first direction X1. A direction that intersects (or is perpendicular to) the first direction along the photosensitive surface 10a of the photosensitive substrate 10 will be referred to as the second direction X2. A direction that intersects (or is perpendicular to) the first direction X1 and the second direction X2 will be referred to as the third direction X3.

[0010] As shown in FIG. 1, the exposure apparatus 100 is an apparatus that irradiates a photosensitive substrate 10 with illumination light via an exposure unit 20 that includes a spatial light modulation unit 1. As shown in Figure 2, the exposure apparatus 100 passes light modulated by a spatial light modulation unit 1 through an illumination projection module 7, which serves as a projection optical system, and forms an image of this light on a photosensitive material (also called a resist) on the photosensitive surface 10a of a photosensitive substrate 10, thereby exposing the material. The exposure apparatus 100 exposes an exposure pattern onto the photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction. The spatial light modulation unit 1 is used in such an exposure apparatus 100.

[0011] As shown in FIG. 1, the exposure apparatus 100 includes a substrate stage 4 that supports a photosensitive substrate 10, and an exposure apparatus main body 2 that performs scanning exposure to expose the photosensitive substrate 10 with a predetermined exposure pattern.

[0012] (Photosensitive substrate) The photosensitive substrate 10 has, for example, a rectangular shape in a plan view. The photosensitive substrate 10 has a photosensitive surface 10a on which a photosensitive material is applied to a surface layer facing the spatial light modulation unit 1. The photosensitive substrate 10 is, for example, a glass substrate for a display.

[0013] (substrate stage) The substrate stage 4 is used to position the photosensitive substrate 10 with high precision relative to the image of the exposure pattern projected via the illumination projection module 7. As shown in Fig. 1, the substrate stage 4 is driven with six degrees of freedom: a first direction X1, a second direction X2, a third direction X3, and θX1, θX2, and θX3 directions that rotate around the axes X1, X2, and X3, respectively. The substrate stage 4 holds the photosensitive substrate 10 with the photosensitive substrate 10 placed on an upper surface 4a.

[0014] (Exposure device body) The exposure apparatus main body 2 has an exposure unit 20, an optical surface plate 21, an alignment system 22, and an autofocus system 23.

[0015] The optical surface plate 21 is formed in a flat plate shape and is fixed to the upper part of a gate-shaped column 3 provided so as to straddle a base plate B on which the substrate stage 4 is placed, the base plate B extending in the first direction X1. The optical surface plate 21 is disposed in the center of the base plate B in the first direction X1.

[0016] The base plate B is placed on the floor via multiple vibration isolation stands BB. The base plate B is a base extending in the first direction X1, and a substrate stage 4 (described later) is mounted on its upper surface Ba. A guide (not shown) is provided on the upper surface Ba of the base plate B to guide the substrate stage 4 along the first direction X1.

[0017] The column 3 has a pair of cross members 31 extending in the second direction X2, and legs 32 extending downward from both ends of the cross members 31 and connected to the base plate B. Since the weight of the optical surface table 21 is applied to the legs 32, a vibration isolation table (not shown) may be placed at the connection between the base plate B and the legs 32. Three V-grooves are formed at appropriate positions on the lower surface of the optical surface table 21 or on the upper surface of the cross members 31. The optical surface table 21 is placed on the pair of cross members 31 with the upper surface 21a kept horizontal, via rotatable balls fitted into each of the three V-grooves.

[0018] The optical surface plate 21 is mounted with an illumination projection module 7, an alignment system 22, and an autofocus system 23. The optical surface plate 21 is provided with a plurality of first through holes 21b that penetrate in the thickness direction to guide the exposure light to the photosensitive surface 10a of the photosensitive substrate 10.

[0019] (Exposure unit) The exposure unit 20 causes light supplied from the light source 61 of the light source unit 6 to enter the spatial light modulation unit 1, and irradiates the photosensitive substrate 10 with light of a preset exposure pattern. The exposure unit 20 includes a spatial light modulation unit 1 and an illumination projection module 7 for illuminating the spatial light modulation unit 1 with light from a light source 61 of the light source unit 6 and exposing the pattern on the spatial light modulation unit 1 onto a photosensitive substrate 10.

[0020] (light source unit) The light source unit 6 may be, for example, a light source unit using a highly coherent laser as the light source 61, a light source unit using a light source 61 such as a semiconductor laser type UV-LD, or a light source unit using a lens relay type retarder. The light source 61 may be, for example, a lamp or a laser diode that emits light with a wavelength of 405 nm or 365 nm.

[0021] (Lighting projection module) The illumination projection module 7 is provided on an optical surface plate 21. As shown in FIG. 2, the illumination projection module 7 includes an illumination module (illumination optical system) 7A and a projection module (projection optical system) 7B. The illumination module 7A illuminates the spatial light modulator 11 (see FIG. 3, for example) of the spatial light modulation unit 1. The projection module 7B irradiates the photosensitive substrate 10 with light reflected by a mirror of the spatial light modulator 11. A plane including the optical axis of the illumination light illuminating the spatial light modulator 11 and the optical axis of the projection module 7B is provided parallel to the scanning direction S.

[0022] (Lighting Module 7A) The illumination module 7A causes laser light L (hereinafter sometimes simply referred to as light L) output from the light source 61 of the light source unit 6 shown in Fig. 1 to be incident on the spatial light modulation unit 1. As shown in Fig. 2, the illumination module 7A includes an optical fiber 71, a collimator lens 721, a fly's eye lens 723, a main condenser lens 724, and a mirror 725.

[0023] The number of illumination modules 7A is the same as that of projection modules 7B in a one-to-one relationship. As shown in Fig. 2, the illumination module 7A takes in laser light L emitted from an optical fiber 71, and illuminates the spatial light modulation unit 1 almost uniformly with the laser light L that has passed through a collimator lens 721, a fly-eye lens 723, and a main condenser lens 724.

[0024] The optical fiber 71 may be, for example, a quartz fiber. The laser light L output from the light source 61 is guided by the optical fiber 71 and enters a collimating lens 721. The collimating lens 721 converts the diverging light emitted from the optical fiber 71 into parallel light and emits it. The intensity (power) of the light emitted from the optical fiber 71 is appropriately adjusted by a movable ND filter (not shown). A movable filter is a filter with a transmittance distribution, and by changing the area through which light passes, the intensity of the light after passing through the filter can be changed. The light that has passed through the collimating lens 721 passes through a fly's eye lens 723 and a main condenser lens 724, is reflected by a mirror 725, and enters the spatial light modulation unit 1 at a predetermined reflection angle. The illumination module 7A and the light source unit 6 can also be considered to illuminate the spatial light modulation unit 1 together, and the two may be collectively referred to as an illumination system.

[0025] (Projection Module 7B) As shown in FIG. 2, the projection module 7B is supported on an optical surface plate 21 and disposed between the spatial light modulation unit 1 and the photosensitive substrate 10. The projection module 7B projects, exposes, and forms an image of the pattern on the spatial light modulation unit 1 onto the photosensitive substrate 10. The projection module 7B is composed of several lenses. The projection module 7B includes a magnification adjustment unit that adjusts the magnification to appropriately reduce and project one pixel of the spatial light modulation unit 1 to a predetermined size, and a focus adjustment unit that adjusts the focus by driving the lens in the third direction X3. The projection modules 7B are arranged in a plurality of rows on the optical base 21 along the first direction X1.

[0026] (Spatial Light Modulation Unit 1) The spatial light modulation unit 1 modulates illumination light to create an exposure pattern. The spatial light modulation unit 1 includes an OFF light absorbing plate (not shown). As an example, a digital mirror device is used as the spatial light modulation unit 1. The spatial light modulation unit 1 includes multiple elements (mirrors in the case of a digital mirror device). Each of the multiple elements constituting the spatial light modulation unit 1 can be controlled individually and periodically. For this reason, it is preferable that the light source 61 emits pulsed light at a constant frequency based on the period at which the elements are individually controlled, or emits pulsed light for a predetermined period of time, rather than emitting continuous light.

[0027] The spatial light modulation unit 1 is preferably held by an SLM stage that can be driven with six degrees of freedom: in the first direction X1, the second direction X2, and the third direction X3, and in the θX1, θX2, and θX3 directions that rotate around the X1, X2, and X3 axes, respectively. The position and attitude of the spatial light modulation unit 1 are corrected by driving the SLM stage, for example, by the amount of deviation from the target value of the substrate stage 4. The exposure unit 20 including the SLM stage is supported by an optical table 21.

[0028] (First embodiment) A spatial light modulation unit 1 according to the first embodiment will be described. Fig. 3 is a view seen from the arrow A in Fig. 2 and is a plan view of the spatial light modulation unit 1 according to the first embodiment. Fig. 4 is a side view of the spatial light modulation unit 1 according to the first embodiment. Fig. 5 is a view seen from the arrow A in Fig. 2 and is a plan view of a plurality of spatial light modulation units 1 according to the first embodiment arranged side by side.

[0029] The spatial light modulation unit 1 according to the first embodiment is used in an exposure apparatus 100 that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 according to the first embodiment is supported on an optical base 21. More specifically, as shown in FIG. 5, a plurality of spatial light modulation units 1 are arranged in a row with their flat surfaces facing the photosensitive substrate 10.

[0030] As shown in Figures 3 to 5, the spatial light modulation unit 1 includes a spatial light modulator 11 having multiple elements (not shown), a controller 12 that controls the multiple elements (spatial light modulator 11) according to the exposure pattern, and an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted. Here, the controller 12 is arranged alongside the spatial light modulator 11 in the scanning direction S. In this manner, the controller 12 is mounted on the SLM substrate 13. Therefore, compared to when the controller that controls the spatial light modulator is mounted on a separate substrate separated from the substrate on which the spatial light modulator is mounted via wiring, connectors, etc., the data communication speed can be improved. This allows the number of pixels of the spatial light modulator 11 to be increased and / or the update speed to be increased. Furthermore, the controller 12 is arranged alongside the spatial light modulator 11 in the scanning direction S. This allows the spacing between adjacent spatial light modulators 11 in the second direction X2 intersecting the scanning direction S to be shortened. This allows the spatial light modulators 11 to be densely arranged in the second direction X2 intersecting the scanning direction S. This allows the exposure area of ​​the exposure pattern exposed in one scan to be increased, thereby increasing throughput. Furthermore, by increasing the update speed of the spatial light modulator 11, the movement speed of the substrate stage 4 in the scanning direction S can be increased, resulting in a shorter exposure time per photosensitive substrate 10 and an increased throughput.

[0031] The spatial light modulator 11 has a rectangular or square shape in a plan view. The longitudinal direction of the spatial light modulator 11 (the direction parallel to the sides of the rectangular or square shape) may be along the scanning direction S, or along a second direction X2 that intersects with the scanning direction S. As shown in FIG. 4, the spatial light modulator 11 is mounted on the front side surface 13a of the SLM substrate 13. The spatial light modulator 11 is exposed and faces the photosensitive substrate 10 (or the substrate stage 4).

[0032] The controller 12 controls the multiple elements of the spatial light modulator 11 in accordance with the exposure pattern. The controller 12 may be, for example, a PLD (programmable logic device) such as an FPGA (field-programmable gate array). As shown in FIG. 4, the controller 12 is mounted on the back surface 13b of the SLM substrate 13. The controller 12 is exposed to the space on the back surface 13b side of the SLM substrate 13.

[0033] The SLM substrate 13 has a rectangular shape in plan view. The longitudinal direction of the SLM substrate 13 (the direction parallel to the long sides of the rectangle) is aligned with the scanning direction S.

[0034] In this way, the longitudinal direction of the spatial light modulator 11 is along the second direction X2 that intersects with the scanning direction S, and the longitudinal direction of the SLM substrate 13 is along the scanning direction S. This allows the multiple elements (not shown) of the spatial light modulator 11 to be densely arranged in the second direction X2, and also allows the SLM substrate 13 to be densely arranged in the second direction X2. Therefore, it is possible to increase the throughput, which is the amount of information of the exposure pattern exposed in one scan.

[0035] The spatial light modulation unit 1 has a power supply circuit 14 connected to a power cable C1 leading to the outside of the SLM substrate 13, and a communication circuit 15 connected to a data communication cable C2 leading to the outside of the SLM substrate 13. Here, the power supply circuit 14 and the communication circuit 15 are aligned along the scanning direction S with respect to the spatial light modulator 11 and the controller 12. This makes it possible to improve the data communication speed and power supply efficiency, and to reduce the distance between adjacent spatial light modulators 11 in the second direction X2 and the dimension of the SLM substrate 13 in the second direction X2, compared to when the power supply circuit and the communication circuit 15 are mounted on a substrate separate from the SLM substrate 13.

[0036] The spatial light modulation unit 1 may include a heat sink 16, as shown in Fig. 4. The heat sink 16 is not disposed on the front side surface 13a of the SLM substrate 13, but is disposed on the back side surface 13b of the SLM substrate 13. The spatial light modulator 11 is mounted on a front surface 13a of the SLM substrate 13, and the controller 12 is mounted on a back surface 13b of the SLM substrate 13. The spatial light modulator 11 is mounted on the front surface 13a in a state where it faces the photosensitive substrate 10 from a functional standpoint. Here, it is preferable that the heat sink 16 is in contact with the controller 12. This allows the controller 12 to be cooled from the rear surface 13b of the SLM substrate 13, so that the temperature rise of the spatial light modulation unit 1 due to heat generated by the controller 12 can be efficiently suppressed, and the impact on exposure performance can be reduced.

[0037] The heat sink 16 is made of a material with high thermal conductivity, such as a metal material. The heat sink 16 may have a flow path 16T through which a fluid coolant such as water flows. The flow path 16T is connected to one end of a cooling pipe 16P outside the heat sink 16, and the other end of the cooling pipe 16P is connected to a coolant pump (not shown). This effectively improves the cooling performance of the heat sink 16 for the controller 12 or the spatial light modulator 11.

[0038] Here, the spatial light modulator 11 is preferably disposed on the upstream side of the flow path 16T from the controller 12. This makes it possible to effectively suppress a temperature rise in the spatial light modulator 11, which has a relatively large effect on exposure performance.

[0039] The SLM substrate 13 may have a Peltier element 17 arranged on the back surface 13b of the SLM substrate 13 and in contact with the heat sink 16. The SLM substrate 13 may also have an intermediate portion (not shown) in contact with the spatial light modulator 11 and the Peltier element 17. The Peltier element 17 preferably contacts the spatial light modulator 11 via this intermediate portion. That is, the spatial light modulator 11 may be in direct contact with the Peltier element 17, or may be in contact via an intermediate portion made of a metal such as copper or aluminum. This allows the spatial light modulator 11 to be cooled from the back surface 13b of the SLM substrate 13, even if the spatial light modulator 11 is mounted on the front surface 13a of the SLM substrate 13. This allows the spatial light modulator 11 and the controller 12 to be cooled simultaneously.

[0040] Alternatively, as shown in FIG. 16, the spatial light modulator 11, controller 12, power supply circuit 14, and communication circuit 15 may be arranged side by side in the longitudinal direction of the SLM substrate 13, with the longitudinal direction of the SLM substrate 13 tilted relative to the scanning direction, and the spatial light modulator 11 and illumination module 7A may be arranged side by side in the scanning direction. When a digital mirror device (DMD) is used as the spatial light modulator 11, it is preferable that the mirror of the DMD in the ON state be tilted in the scanning direction. As shown in FIG. 17, the spatial light modulator 11, controller 12, power supply circuit 14, communication circuit 15, and illumination module 7A may be arranged side by side in the longitudinal direction of the SLM substrate 13, with the longitudinal direction of the SLM substrate 13 tilted relative to the scanning direction. When a digital mirror device (DMD) is used as the spatial light modulator 11, it is preferable that the mirror of the DMD in the ON state be tilted in the scanning direction.

[0041] (Variation 1A) Next, a description will be given of a modified example 1A of the spatial light modulation unit 1 according to the first embodiment. Note that a description of matters common to the spatial light modulation unit 1 according to the first embodiment may be omitted. FIG. 6 is a plan view of a modified example 1A of the spatial light modulation unit 1 according to the first embodiment. As shown in FIG. 6, the controller 12 is arranged next to the spatial light modulator 11 in the scanning direction S. Here, variant 1A of the spatial light modulation unit 1 according to the first embodiment differs from the spatial light modulation unit 1 according to the first embodiment shown in Fig. 5 in that it has a spatial light modulator 11 that is arranged at a slight incline (for example, 5 degrees) with respect to the scanning direction S. That is, in the spatial light modulation unit 1 according to the first embodiment, the longitudinal direction of the photosensitive substrate 10 and the lateral direction of the spatial light modulator 11 are parallel, whereas the longitudinal direction of the photosensitive substrate 10 and the lateral direction of the spatial light modulator 11 are not parallel. This makes it possible to set the width and position of the exposure pattern in units finer than one element (one mirror) among multiple elements, even without arranging the entire SLM substrate 13 at an angle. Furthermore, the spatial light modulator 11 may be mounted on the SLM substrate 13 so that the direction in which the plurality of elements are arranged is aligned with a direction intersecting the scanning direction S. Furthermore, the spatial light modulator 11 may be mounted on the SLM substrate 13 so that the direction in which a plurality of elements are arranged is perpendicular to the scanning direction S.

[0042] (Variation 1B) Next, a description will be given of a modified example 1B of the spatial light modulation unit 1 according to the first embodiment. Note that a description of matters common to the spatial light modulation unit 1 according to the first embodiment may be omitted. FIG. 7 is a plan view of a modified example 1B of the spatial light modulation unit 1 according to the first embodiment. As shown in FIG. 7, the controller 12 is arranged next to the spatial light modulator 11 in the scanning direction S. Here, variant 1B of the spatial light modulation unit 1 according to the first embodiment differs from the spatial light modulation unit 1 according to the first embodiment shown in FIG. 5 in that it includes a controller 12 having a first controller 12A arranged on one side of the spatial light modulator 11 in the scanning direction S and a second controller 12B arranged on the other side. That is, controllers 12 that control multiple elements of the spatial light modulator 11 are provided on both sides of the spatial light modulator 11 in the scanning direction S. Because the controllers 12 are provided on both sides of the spatial light modulator 11 in the scanning direction S, even if multiple controllers 12 are provided on a single SLM substrate 13 to improve processing speed, the controllers 12 can be arranged close to the spatial light modulator 11. Furthermore, multiple controllers 12 can be arranged on a single SLM substrate 13 while maintaining a short distance between adjacent spatial light modulators 11 in the second direction X2 intersecting the scanning direction S. This allows for increased throughput, which is the amount of information in the exposure pattern exposed in a single scan.

[0043] (Variation 1C) Next, a description will be given of a modified example 1C of the spatial light modulation unit 1 according to the first embodiment. Note that the description of matters common to the spatial light modulation unit 1 according to the first embodiment may be omitted. FIG. 8 is a plan view of a modified example 1C of the spatial light modulation unit 1 according to the first embodiment. As shown in FIG. 8, the controller 12 is arranged next to the spatial light modulator 11 in the scanning direction S. 5, the modified example 1C of the spatial light modulation unit 1 according to the first embodiment includes a controller 12 having a first controller 12A and a third controller 12C arranged on one side in the scanning direction S of the spatial light modulator 11, and a second controller 12B and a fourth controller 12D arranged on the other side. That is, the controller 12 has a first controller 12A arranged on one side in the scanning direction S of the spatial light modulator 11, and a third controller 12C arranged alongside the first controller 12A in a second direction X2 intersecting the scanning direction S. In this way, the controller 12 has the first controller 12A arranged on one side of the spatial light modulator 11 in the scanning direction S, and the third controller 12C arranged side by side in the second direction X2 intersecting the scanning direction S. Therefore, even when a plurality of controllers 12 are provided on a single SLM substrate 13 to improve processing speed, the controllers 12 can be arranged close to the spatial light modulator 11. Furthermore, while maintaining a short distance between adjacent spatial light modulators 11 in the second direction X2 intersecting the scanning direction S, even more controllers 12 can be arranged on a single SLM substrate 13. This makes it possible to increase throughput, which is the amount of information in the exposure pattern exposed in one scan.

[0044] (Second embodiment) Next, a spatial light modulation unit 1 according to a second embodiment will be described. FIG. 9 is a side view of a spatial light modulation unit 1 according to the second embodiment. FIG. 10 is an exploded plan view of the spatial light modulation unit 1 according to the second embodiment. FIG. 11 is a plan view of a plurality of spatial light modulation units 1 according to the second embodiment arranged side by side. FIG. 12 is an exploded plan view of a modified example 2A of the spatial light modulation unit 1 according to the second embodiment. FIG. 13 is an exploded plan view of a modified example 2B of the spatial light modulation unit 1 according to the second embodiment. FIG. 14 is an exploded plan view of a modified example 2C of the spatial light modulation unit 1 according to the second embodiment.

[0045] The spatial light modulation unit 1 of the second embodiment, like the spatial light modulation unit 1 of the first embodiment, is used in an exposure apparatus 100 that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 according to the second embodiment is supported on an optical surface plate 21, similar to the spatial light modulation unit 1 according to the first embodiment. More specifically, as shown in FIG. 11, a plurality of spatial light modulation units 1 are arranged in a row with their flat surfaces facing the photosensitive substrate 10.

[0046] As shown in Figures 9 to 14, the spatial light modulation unit 1 includes a spatial light modulator 11 having multiple elements (not shown), a controller 12 (first controller 12A, second controller 12B) that controls the multiple elements of the spatial light modulator 11 according to the exposure pattern, a supply unit (not shown) that supplies power to the spatial light modulator 11 and the controller 12, and an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted. Here, the SLM substrate 13 comprises a first substrate 131 on which the spatial light modulator 11 is mounted and to which part of the supply unit is connected, and a second substrate 132 on which the controller 12 is mounted and to which the other part of the supply unit is connected. As shown in FIG. 9 , the second surface 132S of the second substrate 132 on which the controller 12 is mounted intersects with the first surface 131S of the first substrate 131 on which the spatial light modulator 11 is mounted. This allows the dimension in the scanning direction S to be reduced even if both the spatial light modulator 11 and the controller 12 are mounted on the SLM substrate 13. Therefore, the SLM substrates 13 can be densely arranged along the scanning direction S. This reduces the distance in the scanning direction S required for one scan to irradiate the exposure pattern, and shortens the time for one scan. The front side surface 131a and the front side surface 132a of the first substrate 131 may not be on the same plane. The SLM substrate 13 may be in a bent state. Either of these methods can reduce the dimension in the scanning direction S. Therefore, the SLM substrates 13 can be densely arranged along the scanning direction S.

[0047] The first substrate 131 is a substrate on the SLM substrate 13 on which the spatial light modulator 11 is mounted. The first substrate 131 is disposed so that its front side surface 131a faces the photosensitive substrate 10 (or the substrate stage 4 on which the photosensitive substrate 10 is placed) and is perpendicular to the third direction X3, while being supported on the optical surface plate 21 via an SLM stage, which will be described later.

[0048] The second substrate 132 is a substrate of the SLM substrate 13 that does not have the spatial light modulator 11 mounted thereon. That is, the first substrate 131 has the spatial light modulator 11 mounted thereon, and the second substrate 132 has no spatial light modulator 11 mounted thereon. The second substrate 132 is disposed so that the front side surface 131a intersects with the first direction and the second direction, while being supported on the optical surface plate 21 via an SLM stage (see FIG. 15) described later as appropriate. The second surface 132S is preferably perpendicular to the scanning direction S (first direction X1). That is, the front side surface 132a of the second substrate 132 is preferably perpendicular to the scanning direction S (first direction X1). This makes it possible to reduce the dimension of the SLM substrate 13 in the scanning direction S, and also makes it possible to use the space above the back side surface 131b of the first substrate 131, for example, to place an SLM stage.

[0049] The second substrate 132 has the controller 12 (second controller 12B) mounted thereon. The controller 12 is mounted on the rear surface 132b of the second substrate 132. This allows the controller 12 to be disposed in a position where it can easily come into contact with the heat sink 16.

[0050] As shown in FIG. 9, the heat sink 16 is formed in the shape of a plate having an L-shaped cross section that conforms to the first substrate 131 and the second substrate 132 when viewed from the side.

[0051] The SLM substrate 13 has a bending portion 134 that bends and connects the first substrate 131 and the second substrate 132. The bending portion 134 has a third thickness t3 that is thinner than the first thickness t1 of the first substrate 131 and the second thickness t2 of the second substrate 132. This makes it possible to make the bending rigidity (second moment of area about the weak axis) of the bending portion 134 smaller than the bending rigidity of each of the first substrate 131 and the second substrate 132. Therefore, by bending the SLM substrate 13 in the unfolded spatial light modulation unit 1 as shown in FIGS. 10 and 12 to 14, that is, the SLM substrate 13 in a state in which the front side surface 131a of the first substrate 131 and the front side surface 132a of the second substrate 132 are aligned on the same plane, at the bending portion 134, for example, at a right angle, it is possible to form an SLM substrate 13 having an L-shaped cross section as shown in FIG. 9.

[0052] 9, the SLM substrate 13 is formed to include a core layer 13A and a surface layer 13B that covers the core layer 13A. The core layer 13A may be exposed at bent portion 134. For example, in an SLM substrate 13 in which the core layer 13A and a surface layer such as a resist are laminated together, bent portion 134 may be a portion where the surface layer has been removed to expose the remaining core material. This makes the bending rigidity of bent portion 134 relatively small, making it easy to form an SLM substrate 13 having an L-shaped cross section by bending at bent portion 134 an SLM substrate 13 in which the front side surface 131a of the first substrate 131 and the front side surface 132a of the second substrate 132 are aligned on the same plane.

[0053] The SLM substrate 13 may include a third substrate (not shown). That is, the SLM substrate 13 may include a third substrate in addition to the first substrate 131 and second substrate 132 described above. The third surface formed by extending the front side surface of the third substrate preferably intersects with at least one of the first surface 131S and the second surface 132S. Furthermore, the third surface formed by extending the front side surface of the third substrate preferably intersects with at least one of the first surface 131S and the second surface 132S at right angles. This allows components including the controller 12 to be densely arranged three-dimensionally by utilizing the space above the back side surface 131b of the first substrate 131 on which the spatial light modulator 11 is mounted.

[0054] The spatial light modulation unit 1 is equipped with a heat sink 16. The spatial light modulator 11 is mounted on the front side surface 131a of the SLM substrate 13. The controller 12 is mounted on the back side surface 132b of the SLM substrate 13. The heat sink 16 is in contact with the controller 12. As a result, even if the SLM substrate 13 has a bent L-shaped cross section as shown in FIG. 9, the heat sink 16 can be placed above the back side surface 131b of the first substrate 131 and by effectively utilizing the space in the scanning direction S on the back side surface 132b of the second substrate 132.

[0055] The SLM substrate 13 has a Peltier element 17 that is arranged on the back surface 131b of the SLM substrate 13 and is in contact with the heat sink 16. The spatial light modulator 11 is in contact with the Peltier element 17. This allows the spatial light modulator 11 mounted on the front surface 131a of the SLM substrate 13 to be cooled by the heat sink 16 on the back surface 131b of the SLM substrate 13.

[0056] (Variation 2A) Next, a description will be given of a modified example 2A of the spatial light modulation unit 1 according to the second embodiment. Note that the description of matters common to the spatial light modulation unit 1 according to the first embodiment or the spatial light modulation unit 1 according to the second embodiment may be omitted. FIG. 12 is a plan view of a modified example 2A of the spatial light modulation unit 1 according to the second embodiment. The first substrate 131 is mounted with the spatial light modulator 11 and the first controller 12A. The second board 132 has a second controller 12B mounted thereon. Here, in a modified example 2A of the spatial light modulation unit 1 according to the second embodiment, the second substrate 132 is disposed so as to intersect with the second direction X2. That is, as shown in Fig. 12, the unfolded SLM substrate 13 is in a state of being rotated and bent around the bending portion 134 around the first direction X1 (see Fig. 9). This makes it possible to reduce the area of ​​the first substrate 131 in a plan view, while utilizing the space above the back surface 131b of the first substrate 131, so that, for example, multiple controllers 12 can be mounted on a single spatial light modulation unit 1.

[0057] (Variation 2B) Next, a description will be given of a modified example 2B of the spatial light modulation unit 1 according to the second embodiment. Note that the description of matters common to the spatial light modulation unit 1 according to the first embodiment or the spatial light modulation unit 1 according to the second embodiment may be omitted. FIG. 13 is a plan view of a modified example 2B of the spatial light modulation unit 1 according to the second embodiment. The first substrate 131 is mounted with the spatial light modulator 11. The first substrate 131 is not mounted with the controller 12. The second board 132 has the controller 12 mounted thereon. Here, in Modification 2B of the spatial light modulation unit 1 according to the second embodiment, the second substrate 132 is disposed so as to intersect with the second direction X2. That is, as shown in Fig. 13, the unfolded SLM substrate 13 is in a state of being rotated and bent around the bending portion 134 around the first direction X1 (see Fig. 9). This makes it possible to reduce the area of ​​the first substrate 131 in a plan view, while utilizing the space above the back surface 131b of the first substrate 131, so that, for example, multiple controllers 12 can be mounted on a single spatial light modulation unit 1.

[0058] (Variation 2C) Next, a description will be given of a modified example 2C of the spatial light modulation unit 1 according to the second embodiment. Note that the description of matters common to the spatial light modulation unit 1 according to the first embodiment or the spatial light modulation unit 1 according to the second embodiment may be omitted. FIG. 14 is a plan view of a modified example 2B of the spatial light modulation unit 1 according to the second embodiment. On the first substrate 131, the spatial light modulator 11 and the controller 12 are mounted side by side in the first direction X1. The second board 132 does not have the controller 12 mounted thereon. Here, in Modification 2B of the spatial light modulation unit 1 according to the second embodiment, the second substrate 132 is disposed so as to intersect with the second direction X2. That is, as shown in Fig. 14, the unfolded SLM substrate 13 is in a state of being rotated and bent around the bending portion 134 around the first direction X1 (see Fig. 9). This makes it possible to reduce the area of ​​the first substrate 131 in a plan view, while utilizing the space above the back surface 131b of the first substrate 131, so that, for example, multiple controllers 12 can be mounted on a single spatial light modulation unit 1.

[0059] (Third embodiment) Next, a spatial light modulation unit 1 according to a third embodiment will be described. FIG. 15 is a side view of the spatial light modulation unit 1 according to the third embodiment.

[0060] The spatial light modulation unit 1 of the third embodiment, like the spatial light modulation unit 1 of the first embodiment and the spatial light modulation unit 1 of the second embodiment, is used in an exposure apparatus 100 that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 according to the third embodiment is supported on an optical surface plate 21, similar to the spatial light modulation unit 1 according to the first embodiment and the spatial light modulation unit 1 according to the second embodiment. More specifically, as shown in FIG. 11, a plurality of spatial light modulation units 1 are arranged in a row with their flat surfaces facing the photosensitive substrate 10.

[0061] 15, the spatial light modulation unit 1 includes a spatial light modulator 11 having a plurality of elements (not shown), a controller 12 that controls the plurality of elements of the spatial light modulator 11 in accordance with the exposure pattern, an SLM substrate 13 on which the spatial light modulator 11 and controller 12 are mounted, and a heat sink 16. The spatial light modulator 11 is mounted on a front surface 131a of the SLM substrate 13. The controller 12 is mounted on a back surface 131b of the SLM substrate 13. Here, the heat sink 16 is in contact with the controller 12. This allows the space above the rear surface 131b of the first substrate 131 to be used effectively to place the heat sink 16.

[0062] The SLM substrate 13 has a Peltier element 17 that is arranged on the back surface 131b of the SLM substrate 13 and is in contact with the heat sink 16. The spatial light modulator 11 is in contact with the Peltier element 17. This allows the spatial light modulator 11 mounted on the front surface 131a of the SLM substrate 13 to be cooled by the heat sink 16 on the back surface 131b of the SLM substrate 13.

[0063] 15, the heat sink 16 is supported by an SLM stage 18 that is rotatable around a reference axis P that is perpendicular to the reflecting surface of the spatial light modulator 11. This allows the position of the spatial light modulation unit 1 to be corrected.

[0064] The heat sink 16 is preferably supported by an SLM stage 18 that is movable along the photosensitive surface 10a of the photosensitive substrate 10 in the scanning direction S and a second direction X2 intersecting the scanning direction S. This makes it possible to correct the position of the spatial light modulation unit 1 in the scanning direction S and the second direction X2 intersecting the scanning direction S.

[0065] The heat sink 16 is preferably supported by an SLM stage 18 that is movable with six degrees of freedom. This makes it possible to correct the position of the spatial light modulation unit 1 in six degrees of freedom: the scanning direction S (first direction X1), the second direction X2 that intersects with the scanning direction S, the third direction X3 that is perpendicular to the first direction X1 and the second direction X2, and the θX1 direction, θX2 direction, and θX3 direction that rotate around the first direction X1, the second direction X2, and the third direction X3, respectively.

[0066] The heat sink 16 may have a flow path 16T through which a fluid coolant such as water flows. The flow path 16T is connected to one end of a cooling pipe 16P outside the heat sink 16, and the other end of the cooling pipe 16P is connected to a coolant pump (not shown). This effectively improves the cooling performance of the heat sink 16 for the controller 12 or the spatial light modulator 11.

[0067] Here, the spatial light modulator 11 is preferably disposed on the upstream side of the flow path 16T from the controller 12. This makes it possible to effectively suppress a temperature rise in the spatial light modulator 11, which has a relatively large effect on exposure performance.

[0068] The embodiments of the present invention have been described above, but the correspondence between the present invention and the above embodiments will now be supplemented with a description.

[0069] (1) In the above embodiment, the spatial light modulation unit 1 is used in an exposure apparatus 100 that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 includes a spatial light modulator 11 having a plurality of elements, a controller 12 that controls the plurality of elements of the spatial light modulator 11 according to the exposure pattern, and an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted. The controller 12 is arranged alongside the spatial light modulator 11 in the scanning direction S.

[0070] In the spatial light modulation unit 1 configured as above, the controller 12 is mounted on the SLM substrate 13. Therefore, the data communication speed can be improved compared to when the controller that controls the spatial light modulator is mounted on a separate substrate separated from the substrate on which the spatial light modulator is mounted via wiring, connectors, etc. This allows for a larger number of pixels in the spatial light modulator 11, thereby increasing the update speed. Furthermore, the controller 12 is arranged in parallel with the spatial light modulator 11 in the scanning direction S. This allows for a shorter interval between adjacent spatial light modulators 11 in the second direction X2 intersecting the scanning direction S. This allows for a denser arrangement of the spatial light modulators 11 in the second direction X2 intersecting the scanning direction S. This allows for an increased throughput, which is the amount of information in the exposure pattern exposed in one scan.

[0071] (2) In the above embodiment, the controller 12 includes a first controller 12A disposed on one side of the spatial light modulator 11 in the scanning direction S, and a second controller 12B disposed on the other side.

[0072] (3) In addition, in the above embodiment, the controller 12 includes a first controller 12A arranged on one side of the spatial light modulator 11 in the scanning direction S, and a third controller 12C arranged next to the first controller 12A in a second direction X2 that intersects the scanning direction S.

[0073] (4) In addition, in the above embodiment, the spatial light modulation unit 1 has a power supply circuit 14 connected to a power cable C1 connected to the outside of the SLM substrate 13, and a communication circuit 15 connected to a data communication cable C2 connected to the outside of the SLM substrate 13, and the power supply circuit 14 and the communication circuit 15 are aligned along the scanning direction S with respect to the spatial light modulator 11 and the controller 12.

[0074] (5) In addition, in the above embodiment, the spatial light modulation unit 1 is provided with a heat sink 16, the spatial light modulator 11 is mounted on the front side 13a of the SLM substrate 13, the controller 12 is mounted on the back side 13b of the SLM substrate 13, and the heat sink 16 is in contact with the controller 12.

[0075] (6) In the above embodiment, the SLM substrate 13 has a Peltier element 17 disposed on the rear surface 13 b of the SLM substrate 13 and in contact with the heat sink 16 , and the spatial light modulator 11 is in contact with the Peltier element 17 .

[0076] (7) Also, an intermediate portion is provided that contacts the spatial light modulator 11 and the Peltier element 17, and the Peltier element 17 contacts the spatial light modulator 11 via the intermediate portion.

[0077] (8) Furthermore, the spatial light modulator 11 is mounted on the SLM substrate 13 so that the direction in which the plurality of elements are arranged is aligned with the direction intersecting the scanning direction S.

[0078] (9) Furthermore, the spatial light modulator 11 is mounted on the SLM substrate 13 so that the direction in which the plurality of elements are arranged is perpendicular to the scanning direction.

[0079] (10) In the above embodiment, the spatial light modulation unit 1 is used in an exposure apparatus 100 that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 includes a spatial light modulator 11 having a plurality of elements, a controller 12 that controls the spatial light modulator 11 in accordance with the exposure pattern, a power supply unit that supplies power to the spatial light modulator 11 and the controller 12, and an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted. The SLM substrate 13 includes a first substrate 131 on which the spatial light modulator 11 is mounted and to which a part of the power supply unit is connected, and a second substrate 132 on which the controller 12 is mounted and to which the other part of the power supply unit is connected. A second surface 132S of the second substrate 132 on which the controller 12 is mounted intersects with a first surface 131S of the first substrate 131 on which the spatial light modulator 11 is mounted.

[0080] In the spatial light modulation unit 1 configured as above, even if both the spatial light modulator 11 and the controller 12 are mounted on the SLM substrate 13, the dimension in the scanning direction S can be reduced. Therefore, the SLM substrates 13 can be densely arranged along the scanning direction S. As a result, the distance in the scanning direction S required for one scan to irradiate the exposure pattern can be shortened, and the time for one scan can be shortened.

[0081] (11) Furthermore, in the above embodiment, the SLM substrate 13 has a bending portion 134 that connects the first substrate 131 and the second substrate 132 and bends, and the bending portion 134 has a third thickness t3 that is thinner than the first thickness t1 of the first substrate 131 and the second thickness t2 of the second substrate 132.

[0082] (12) In the above embodiment, the SLM substrate 13 is formed to include the core layer 13A and the surface layer 13B that covers the core layer 13A, and the core layer 13A at the bent portion 134 is exposed.

[0083] (13) In the above embodiment, the second surface 132S is perpendicular to the scanning direction S.

[0084] (14) In the above embodiment, the SLM substrate 13 includes the third substrate 133, and the third surface 133S, which is an extension of the front side surface 133a of the third substrate 133, intersects with at least one of the first surface 131S and the second surface 132S.

[0085] (15) In addition, in the above embodiment, the spatial light modulation unit 1 includes a heat sink 16, the spatial light modulator 11 is mounted on the front side 131a of the SLM substrate 13, the controller 12 is mounted on the back side 131b of the SLM substrate 13, and the heat sink 16 is in contact with the controller 12.

[0086] (16) In the above embodiment, the SLM substrate 13 has a Peltier element 17 disposed on the rear surface 131 b of the SLM substrate 13 and in contact with the heat sink 16 , and the spatial light modulator 11 is in contact with the Peltier element 17 .

[0087] (17) In the above embodiment, an intermediate portion is provided that contacts the spatial light modulator 11 and the Peltier element 17, and the Peltier element 17 contacts the spatial light modulator 11 via the intermediate portion.

[0088] (18) In the above embodiment, the spatial light modulation unit 1 is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate 10 while moving the photosensitive substrate 10 in a scanning direction S. The spatial light modulation unit 1 includes a spatial light modulator 11 having a plurality of elements, a controller 12 that controls the spatial light modulator 11 in accordance with the exposure pattern, an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted, and a heat sink 16. The spatial light modulator 11 is mounted on a front surface 131a of the SLM substrate 13, the controller 12 is mounted on a back surface 131b of the SLM substrate 13, and the heat sink 16 is in contact with the controller 12.

[0089] (19) In the above embodiment, the SLM substrate 13 has a Peltier element 17 disposed on the rear surface 131 b of the SLM substrate 13 and in contact with the heat sink 16 , and the spatial light modulator 11 is in contact with the Peltier element 17 .

[0090] (20) In the above embodiment, an intermediate portion is provided that contacts the spatial light modulator 11 and the Peltier element 17. The Peltier element 17 contacts the spatial light modulator 11 via the intermediate portion.

[0091] (21) In the above embodiment, the heat sink 16 is supported by the SLM stage 18 which is rotatable about a reference axis P which is perpendicular to the reflecting surface of the spatial light modulator 11 .

[0092] (22) In the above embodiment, the heat sink 16 is supported by the SLM stage 18 which is movable along the photosensitive surface 10a of the photosensitive substrate 10 in the scanning direction S and the second direction X2 which intersects with the scanning direction S.

[0093] (23) In the above embodiment, the heat sink 16 is supported by the SLM stage 18, which is movable with six degrees of freedom.

[0094] (24) In the above embodiment, the heat sink 16 has a flow path 16T through which a coolant flows, and the spatial light modulator 11 is disposed upstream of the controller 12 from the flow path 16T.

[0095] (25) In the above embodiment, the exposure apparatus 100 includes a spatial light modulation unit 1 having a spatial light modulator 11 having a plurality of elements, a controller 12 that controls the plurality of elements, an SLM substrate 13 on which the spatial light modulator 11 and the controller 12 are mounted, a substrate stage 4 that holds a photosensitive substrate 10 and moves in a scanning direction S relative to the spatial light modulation unit 1, and a projection optical system that projects an image of a pattern formed by the plurality of elements controlled by the controller 12 onto the photosensitive substrate 10. The controller 12 is mounted on the SLM substrate 13, aligned with the spatial light modulator 11 in the scanning direction S.

[0096] (26) In the above embodiment, exposure apparatus 100 exposes a substrate while moving the substrate in a scanning direction. Exposure apparatus 100 includes an illumination optical system (illumination module) 7A, a spatial light modulator 11 illuminated by light from illumination optical system 7A, a projection optical system (projection module) 7B that irradiates the substrate with light emitted from spatial light modulator 11, and a stage 4 that holds the substrate and moves in the scanning direction. Illumination optical system 7A and spatial light modulator 11 are arranged side by side in scanning direction S.

[0097] (27) In the above embodiment, the exposure apparatus 100 includes a stage 4 that moves the substrate in a scanning direction S, a spatial light modulator 11, an illumination optical system (illumination module) 7A that illuminates the spatial light modulator 11, and a projection optical system (projection module) 7B that irradiates the substrate with light reflected by a mirror of the spatial light modulator 11. A plane that includes the optical axis of the illumination light that illuminates the spatial light modulator 11 and the optical axis of the projection optical system (projection module) 7B is provided parallel to the scanning direction S.

[0098] (28) In the above embodiment, the mirror of the spatial light modulator 11 is tilted with respect to the scanning direction S.

[0099] One embodiment of the present invention has been described in detail above with reference to the drawings, but the specific configuration is not limited to that described above, and various design changes and the like are possible within the scope that does not deviate from the gist of the present invention. [Explanation of symbols]

[0100] 1...Spatial light modulation unit 2...Exposure device body 3. Column 4...Substrate stage 4a…Top surface 6...Light source unit 7...Lighting projection module 7A...Lighting module 7B...Projection module 10...Photosensitive substrate 10a…Photosensitive surface 11...Spatial light modulator 12...Controller 12A...1st controller 12B...Second controller 12C...Third controller 12D...4th controller 13...SLM substrate 13a…Front side 13A…Core layer 13b...Back side 13B…Surface layer 14…Power circuit 15...Communication circuit 16...heat sink 16P...Cooling pipe 16T...flow path 17...Peltier element 18...SLM stage 20...Exposure unit 21...Optical surface plate 21a…Top surface 21b...1st through hole 22...Alignment system 23...Autofocus 31...Beam 32…legs 61...Light source 71...Optical fiber 100...Exposure device 131...First board 131a…Front side 131b...Back side 131S...Side 1 132...Second board 132a…Front side 132b...Back side 132S…Second side 133...Third board 133a…Front side 133S…Side 3 134...Bend 721...Collimating lens 723...Fly-eye lens 724...Main condenser lens 725...Mirror B...Base plate Ba...Top BB…Vibration isolation table C1...Power cable C2: Data communication cable L...Laser light (light) P…Reference axis S: Scanning direction t1…1st plate thickness t2…Second plate thickness t3…Third plate thickness X1…1st direction, axis X2…Second direction, axis X3…Third direction, axis

Claims

1. a first substrate on which a first spatial light modulator including a plurality of first mirrors arranged in a first arrangement direction is mounted; a second substrate on which a second spatial light modulator including a plurality of second mirrors arranged in a second arrangement direction is mounted; a first stage including an upper surface capable of holding an object, positioned below the first spatial light modulator and the second spatial light modulator, and movable relative to the first spatial light modulator and the second spatial light modulator in a first direction and a second direction intersecting the first direction; a first illumination optical system including a first lens that guides incident light downward and a first reflecting mirror that guides light that has passed through the first lens to the plurality of first mirrors; a second illumination optical system including a second lens that guides incident light downward and a second reflecting mirror that guides light that has passed through the second lens to the plurality of second mirrors, a side of the first spatial light modulator on which the plurality of first mirrors are arranged faces the upper surface side of the first stage; a side of the second spatial light modulator on which the plurality of second mirrors are arranged faces the upper surface side of the first stage; the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator, the second lens of the second illumination optical system is located at a position lower than the second spatial light modulator, In plan view, the first substrate and the second substrate are aligned in the second direction, a longitudinal direction of the first substrate faces the first direction or faces a direction closer to the first direction than the second direction; a longitudinal direction of the second substrate faces the first direction or faces a direction closer to the first direction than the second direction; the first lens of the first illumination optical system and the first spatial light modulator are aligned in the first direction without overlapping with each other, and the second lens of the second illumination optical system and the second spatial light modulator are aligned in the first direction without overlapping with each other; Exposure device.

2. a first substrate on which a first spatial light modulator including a plurality of first mirrors arranged in a first arrangement direction is mounted; a second substrate on which a second spatial light modulator including a plurality of second mirrors arranged in a second arrangement direction is mounted; a first stage including an upper surface capable of holding an object, positioned below the first spatial light modulator and the second spatial light modulator, and movable relative to the first spatial light modulator and the second spatial light modulator in a first direction and a second direction intersecting the first direction; a first illumination optical system including a first lens that guides incident light downward and a first reflecting mirror that guides light that has passed through the first lens to the plurality of first mirrors; a second illumination optical system including a second lens that guides incident light downward and a second reflecting mirror that guides light that has passed through the second lens to the plurality of second mirrors, a side of the first spatial light modulator on which the plurality of first mirrors are arranged faces the upper surface side of the first stage; a side of the second spatial light modulator on which the plurality of second mirrors are arranged faces the upper surface side of the first stage; at least one of a power supply circuit and a controller that controls the plurality of first mirrors is mounted on the first substrate; On the first substrate, the at least one member of the first substrate and the first spatial light modulator are aligned in a predetermined direction, at least one of a power supply circuit and a controller that controls the plurality of second mirrors is mounted on the second substrate; On the second substrate, the at least one member of the second substrate and the second spatial light modulator are aligned in a predetermined direction, the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator, the second lens of the second illumination optical system is located at a position lower than the second spatial light modulator, In plan view, the first substrate and the second substrate are aligned in the second direction, the predetermined direction of the first substrate faces the first direction or faces a direction closer to the first direction than the second direction; the predetermined direction of the second substrate faces the first direction or faces a direction closer to the first direction than the second direction; the first lens of the first illumination optical system and the first spatial light modulator are aligned in the first direction without overlapping with each other, and the second lens of the second illumination optical system and the second spatial light modulator are aligned in the first direction without overlapping with each other; Exposure device.

3. In plan view, the first arrangement direction intersects with the first direction, the second arrangement direction intersects with the first direction; 3. The exposure apparatus according to claim 1.

4. the plurality of first mirrors can be controlled to a plurality of states; 3. The exposure apparatus according to claim 1.

5. a first projection optical system that reduces and projects light from the plurality of first mirrors onto the object; the plurality of states include a first state in which light from the plurality of first mirrors is incident on the first projection optical system, and a second state in which light from the plurality of first mirrors is incident on a location other than the first projection optical system.

5. The exposure apparatus according to claim 4.

6. the plurality of first mirrors are arranged in the first arrangement direction and a third arrangement direction intersecting the first arrangement direction, the plurality of second mirrors are arranged in the second arrangement direction and a fourth arrangement direction intersecting the second arrangement direction; 4. The exposure apparatus according to claim 3.

7. In plan view, the first arrangement direction is inclined at about 5 degrees from the first direction within a plane including the first direction and the second direction, the second arrangement direction is inclined at approximately 5 degrees from the first direction within a plane including the first direction and the second direction; 7. The exposure apparatus according to claim 6.

8. a second stage supporting the first substrate; a third stage supporting the second substrate; In plan view, the second stage is movable in the first direction and the second direction and is rotatable about an axis perpendicular to a plane including the centers of the first mirrors; and the third stage is movable in the first direction and the second direction, and is rotatable about an axis perpendicular to a plane including the centers of the second mirrors.

7. The exposure apparatus according to claim 6.

9. the first arrangement direction is oriented in a longitudinal direction of the first substrate, the second arrangement direction is oriented in the longitudinal direction of the second substrate; 7. The exposure apparatus according to claim 6.

10. In plan view, the first illumination optical system and the second illumination optical system are aligned in the second direction, the at least one member of the first substrate, the first spatial light modulator, and the first lens of the first illumination optical system are located on a first straight line; the at least one member of the second substrate, the second spatial light modulator, and the second lens of the second illumination optical system are located on a second straight line; 3. The exposure apparatus according to claim 2.

11. a heat sink overlapping the first spatial light modulator is mounted on an upper side of the first substrate; a power supply circuit mounted on the upper side of the first substrate; the first spatial light modulator is mounted on the lower side of the first substrate; 2. The exposure apparatus according to claim 1.

12. a heat sink overlapping the first spatial light modulator is mounted on an upper side of the first substrate; the power supply circuit is mounted on the upper side of the first substrate; the first spatial light modulator is mounted on the lower side of the first substrate; 3. The exposure apparatus according to claim 2.

13. a power cable connected to the power supply circuit; The power cable extends in the longitudinal direction of the first substrate. The exposure apparatus according to claim 11.

14. a power cable connected to the power supply circuit; The power cable extends in the predetermined direction of the first board. The exposure apparatus according to claim 12.

15. a Peltier element positioned between the heat sink and the first spatial light modulator; the first spatial light modulator, the Peltier element, and the heat sink are stacked in a direction intersecting a plane including the first direction and the second direction.

13. The exposure apparatus according to claim 11 or 12.

16. a first autofocus system that irradiates the object with light; a second autofocus system that irradiates the object with light; the first autofocus system is located on one side of the first spatial light modulator in the first direction, the second autofocus system is located on the other side of the first spatial light modulator in the first direction.

3. The exposure apparatus according to claim 1.

17. the object is a substrate including a layer of photosensitive material; 3. The exposure apparatus according to claim 1.

18. the substrate is a glass substrate including the photosensitive material layer; 18. The exposure apparatus according to claim 17.

19. exposing the substrate using the exposure apparatus of claim 17; A method for making a semiconductor device.

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