CVD reactor gas inlet

Abstract

The present invention relates to a device for supplying process gas to a process chamber (4) of a CVD reactor, the device comprising: a gas distributor (12) having a central region (15) in which an opening for a gas supply line (13) is located and the opening extends only to a partial periphery of the outer surface; a flow barrier (17,19,21) having an inner surface (17',19',21') and an outer surface (17”,19”,21”); and a plurality of gas passages (22,23,24) which are identical to each other and evenly distributed over the periphery of the flow barrier (17,19,21). To reduce the required manufacturing tolerances, the gas passages (22,23,24) are longer than the radial distance between the inner surface (17',19',21') and the outer surface (17”,19”,21”). Each passage (22, 23, 24) has an entrance passage (25) that branches into at least two branch passages (26, 26') inside the flow barrier (17, 19, 21), and each branch passage (26, 26') leads to at least one exit passage (27) that opens outside the flow barrier (17, 19, 21).

Description

Technical Field

[0001] The present invention relates to an apparatus for supplying a process gas to a process chamber of a CVD reactor. The apparatus has at least one gas distributor arranged around an axis, the gas distributor having a central region with an outer surface surrounding the axis, and in the central region there are arranged openings of gas supply lines extending only over a partial periphery of the outer surface. The apparatus has a flow barrier having an inner surface facing the gas distribution chamber and an outer surface opposite thereto, and has the same design such that the process gas exits from the openings, spreads into the gas distribution chamber, and is uniformly dispersed into the process chamber, and has a plurality of gas passages that are evenly distributed in the circumferential direction of the flow barrier and connect the inner surface and the outer surface.

Background Art

[0002] Patent Document 1 describes this type of apparatus. A plurality of substantially uniformly designed gas distributors are vertically arranged one above the other. In the central region of each gas distributor, a gas supply line arranged around the axis extends in the circumferential direction, and each gas supply line supplies the process gas to be supplied to the process chamber of the CVD reactor in which the apparatus is arranged to one of the gas distributors. The gas supply line opens into a gas distribution chamber surrounding the central region. The openings of the gas supply lines are arranged eccentrically with respect to the axis on the outer wall of the central region adjacent to the gas distribution chamber. The apparatus has its outer wall, and around the cylindrical outer wall, a plurality of gas passages through which the process gas can flow into the process chamber are uniformly arranged. In order to equalize the process gas flow, at least one flow barrier having gas passages is provided between the outer wall and the central region.

[0003] Such devices are used as gas inlet elements in CVD reactors, supplying various process gases into the process chamber of the CVD reactor at different vertical heights. These gases flow radially within the process chamber and are discharged from the CVD reactor through a gas outlet element. Multiple substrates are arranged in a circle around the center of the gas inlet element, which is located in the center of the process chamber. To form a homogeneous process gas flow that flows uniformly into the process chamber around the entire circumference of the gas inlet element, the process gas flowing out from the opening of the gas supply line must be uniformly distributed into one or more gas distribution chambers within the gas inlet element. For this purpose, it is advantageous to make the cross-sectional area of ​​the gas passage in the flow barrier or outer wall very small, so that a sufficiently high pressure drop occurs throughout the gas passage. However, manufacturing reproducible gas passages with very small cross-sectional areas is difficult from a manufacturing technology standpoint. The smaller the cross-sectional area, the greater the relative deviation. Furthermore, there is the problem that parasitic deposits of reaction products of the process gas can change the cross-sectional area of ​​the gas passage.

[0004] Patent Document 2 describes a CVD reactor having a gas inlet element having a gas outlet wall with a gas outlet hole that extends obliquely with respect to the radial direction. Patent Document 3 discloses a gas inlet device for generating a linear process gas flow for a CVD reactor, delivered from a flat gas outlet surface, in which a single supply line branches multiple times. The multiple branches terminate in outlet passages on the gas outlet surface. [Prior art documents] [Patent Documents]

[0005] [Patent Document 1] International Publication No. 2020 / 109361 [Patent Document 2] German Patent Application Publication No. 10064944 [Patent Document 3] Korean Patent No. 101487410 Specification [Overview of the project] [Problems that the invention aims to solve]

[0006] The present invention aims to improve the uniformity of the process gas flow, which is supplied eccentrically from a gas inlet element having a cylindrical gas outlet surface and discharged from multiple gas outlet openings. To achieve this objective, it is also necessary to reduce the required manufacturing tolerances. [Means for solving the problem]

[0007] This objective is achieved by the invention as described in the claims, and the dependent claims not only demonstrate an advantageous development of the invention as described in the main claims, but also provide an independent solution to this objective.

[0008] First, we propose an apparatus that essentially comprises at least one gas distributor for supplying process gas to the process chamber of a CVD reactor. This apparatus has an axis that may be a symmetrical axis. The gas distributor has a central region surrounded by a gas distribution chamber. The gas distributor is provided with a gas supply line having an opening in the wall adjacent to the gas distribution chamber, through which process gas can flow into the gas distribution chamber. The central region has an outer surface extending onto a cylindrical surface, and an opening is located on this outer surface. The opening may extend only to a portion of the circumference of the cylindrical surface, such as one-quarter, one-fifth, or one-sixth of the circumference, or it may extend over the entire circumference. Multiple such openings may be arranged circumferentially, front to back. One or more flow barriers are arranged around the central region, with the inner surface of each flow barrier adjacent to an inner annular gas distribution chamber and the outer surface of each flow barrier adjacent to an outer annular gas distribution chamber. At least one flow barrier is an outer wall, with its inner surface adjacent to a gas distribution chamber and its outer surface adjacent to a process chamber. Its outer surface may be the cylindrical surface of a gas distributor. Further flow barriers may be arranged between the central region and the outer wall. The outer wall and the flow barriers each have a plurality of gas passages evenly distributed over the entire circumference and, optionally, over the entire vertical height. The gas distribution chamber may be a circular space with its top and bottom closed and radially restricted outward by one or more flow barriers, such as an outer wall. In a preferred embodiment, the process gas is supplied to the innermost gas distribution chamber through an opening eccentrically positioned with respect to the axis. The process gas diffuses within the gas distribution chambers arranged annularly around the axis and passes through the gas passages to the flow barrier. The flow barrier may be surrounded by the outer gas distribution chamber, or by another flow barrier, or directly by an outer wall. Further gas passages are provided in the outer wall. Gas distribution takes place in one or more gas distribution chambers. The total pressure in each gas distribution chamber is substantially the same. Therefore, a small pressure difference exists within each gas distribution chamber. This pressure difference is smaller than the pressure difference between two adjacent gas distribution chambers, particularly the pressure difference between the radially outermost gas distribution chamber and the process chamber. To maximize the pressure difference between adjacent gas distribution chambers and / or between the radially outermost gas distribution chamber and the process chamber, or to ensure that the gas is distributed as uniformly as possible within the process chamber, it is first proposed to make the gas passages longer than the radial distance between the inner and outer surfaces of the flow barrier. Therefore, the passage is not the shortest length, but rather longer than the radial width of the flow barrier. This increases the pressure resistance of the gas passage without reducing its cross-sectional area. Alternatively, a section extending circumferentially from the flow barrier can be provided following the inlet passage of the gas passage. An adjacent outlet passage can open to the outer surface of the flow barrier. The circumferentially extending section lengthens the gas passage, which also determines the pressure resistance. In a preferred modification, it is proposed that each gas passage in at least one inner flow barrier or outer wall has an inlet passage that branches into at least two branch passages within the flow barrier or outer wall, and each branch passage is at least indirectly continuous with an outlet passage that opens to the outer surface of the flow barrier or outer wall. In particular, it is proposed that the passages have sections extending in different directions. The passage may have sections that change direction multiple times. It is considered advantageous for multiple gas passages of the same design to connect two adjacent gas distribution chambers to each other, or the outermost gas distribution chamber in the radial direction to the process chamber. The means according to the present invention allow the free cross-sectional area of ​​the gas passage to be increased compared to gas inlet elements known in the prior art. Since the number of gas inlet passages is smaller than in the prior art, their cross-sectional areas can be increased. Therefore, a relatively high pressure drop is possible in the gas passage. Since the inlet passage branches into at least two branch passages, the outer surface of the pressure barrier or outer wall is provided with an opening at least twice the size of the inner surface. At least one flow barrier can be placed between the central region and the outer wall. According to an advanced version of the present invention, at least two flow barriers can be arranged between the central region and the outer wall. The flow barriers can be arranged in a ring shape around the central region. At least one flow barrier may extend along an arc around an axis. The device preferably has a plurality of gas distributors arranged vertically above and below, and the flow barriers or outer walls of these gas distributors can be designed identically to one another. However, the flow barriers or outer walls may have different designs, for example, different shapes or different numbers of gas passages. Multiple gas supply lines are located in the central region and are offset circumferentially around the axis. In each of the multiple gas distributors, one of the gas supply lines opens at a different circumferential position. The openings of the gas supply lines in the gas distributors located vertically are angularly offset. The gas distributors have angularly offset windows opening on their top and bottom surfaces, through which process gas can flow, and the process gas flows into the gas distribution chamber of the gas distributor located below. In a preferred modification, the extension direction of the inlet and outlet passages is radial with respect to the axis. Branch passages may extend circumferentially or vertically. Branch passages may rise substantially perpendicularly from the inlet passage or merge perpendicularly with the outlet passage. Optionally, inlet and gas passages arising from a gas distribution chamber are arranged to be offset circumferentially or vertically from the outlet passage or gas passage opening into the same gas distribution chamber. Furthermore, an inlet or outlet passage may have a first section in a different direction from the second section. For example, one section may extend in a horizontal plane. The second section may extend vertically. A first section extending radially in the inlet passage may be followed by a second section extending vertically. A first section extending vertically in the outlet passage may be followed by a second section extending horizontally. The horizontally extending section may extend radially. The apparatus may be formed by arranging multiple gas distributors vertically. The gas distributors may be disc-shaped objects having circular recesses. The circular recesses form gas distribution spaces. Ribs flanking the circular recesses form at least one flow barrier and outer wall. The top and bottom surfaces of the gas distributors are substantially flat, and when the gas distributors are stacked, the flat bottom surfaces overlap flatly with the flat top surfaces. According to a preferred development of such an apparatus, the inlet passages, branch passages, and / or outlet passages may have open tops. This is advantageous from a manufacturing perspective. The openings of the inlet passages, branch passages, or outlet passages are closed by the bottom surface of the gas distributor directly above them. In an advanced form of the present invention, the branch passage and / or outlet passage may be formed by a portion of a space extending from the lower surface of the gas distribution chamber to the upper surface of the gas distribution body. This space may be open at the top. However, the space or passage may be open at the bottom and closed by the upper surface of a gas distribution body located below it. This space may be U-shaped in a plan view of the upper surface of the gas distribution body. The branch passage or the outlet passage into which the branch passage opens may be formed by this space. The U-shape of the space can be formed by a sub-part that divides the space into two passages opening into a process chamber or gas distribution chamber. The sub-part may have wedge-shaped side walls that taper towards a rounded tip. The rounded tip may be located in front of the opening of the inlet passage. However, if a branch is already provided in a section of the gas passage located upstream of the space, the tip may be located in front of the opening of the outlet passage. The inlet passage may preferably branch into three or more outlet passages. In a further development, a radially extending inlet passage may branch into two branch passages extending circumferentially or vertically. Both branch passages can then branch again, in which case the horizontally extending branch passage preferably branches into a further vertically extending branch passage, or the vertically extending branch passage preferably branches into a further horizontally extending branch passage. A total of four further branch passages open to the outer surface of either the flow barrier or the outer wall to form an outlet passage. The gas distributor can be made from metal, graphite, ceramic material, or quartz. At least one gas distributor preferably consists of a single quartz component, and the cavities and passages are manufactured using the SLE method. It has been found advantageous that at least a portion of the passages, e.g., the inlet passage, branch passages, or outlet passages, have a rectangular or square cross-section. However, it is also provided that at least a portion of the passage, for example, an inlet passage, a branch passage, or an outlet passage, may have a different cross-section, particularly a circular cross-section. Furthermore, in each case, only one flow barrier or only an outer wall may be provided with a gas passage designed according to the present invention. Other flow barriers or outer walls may have non-branching gas passages. However, it is also provided that all gas passages in all flow barriers and outer walls may have branches according to the present invention. According to the present invention, gas passages formed by flow barriers or outer walls can be designed identically to one another. The total number of gas passages in flow barriers or outer walls positioned one behind the other in the flow direction can be at least twice as many. For example, the innermost flow barrier has a first number of branching gas passages, and the second flow barrier surrounding it or the surrounding outer wall has at least twice that number of gas passages, preferably branching again. The cross-sectional area of ​​the inlet and / or outlet passages is at least 1 mm². 2 This is possible. The cross-sectional area of ​​the branching passage may be larger than that. [Brief explanation of the drawing]

[0009] The present invention will be described in further detail below with reference to exemplary embodiments with reference to the attached drawings. [Figure 1] Figure 1 schematically shows a vertical cross-section of the reactor housing 1 of the CVD reactor. [Figure 2] Figure 2 schematically shows the five gas distributors 12 of the supply device 11 for the gas inlet element 9 in a perspective view. [Figure 3] Figure 3 is a plan view of the gas distributor 12. [Figure 4] Figure 4 is a cross-sectional perspective view of an embodiment of the gas distributor 12. [Figure 5] Figure 5 shows a detailed plan view of Figure 4. [Figure 6] Figure 6 is a perspective view of the first embodiment, enlarged from the detailed VI of Figure 5. [Figure 7]FIG. 7 shows a cross-section taken along line VII-VII of FIG. 5 as a second embodiment. [Figure 8] FIG. 8 is a cross-section taken along line VIII-VIII of FIG. 5. [Figure 8a] FIG. 8a shows a cross-section of the third embodiment of FIG. 8. [Figure 8b] FIG. 8b shows a cross-section of the fourth embodiment of FIG. 8. [Figure 9] FIG. 9 shows a cross-section taken along line IX-IX of FIG. 5. [Figure 10] FIG. 10 shows a view along arrow X of FIG. 9. [Figure 11] FIG. 11 is a detailed perspective view of the gas distributor 12 of the fifth embodiment. [Figure 12] FIG. 12 shows a plan view of the detailed part shown in FIG. 11. [Figure 13] FIG. 13 shows a cross-section taken along line XIII-XIII of FIG. 12. [Figure 14] FIG. 14 shows a cross-section taken along line XIV-XIV of FIG. 12. [Figure 15] FIG. 15 shows a cross-section taken along line XV-XV of FIG. 12. [Figure 16] FIG. 16 is a plan view of the gas distributor 12 of the sixth embodiment. [Figure 17] FIG. 17 shows a cross-section taken along line XVII-XVII of FIG. 16. [Figure 18] FIG. 18 is a view in the direction of arrow XVIII of FIG. 16. [Figure 19] FIG. 19 is a plan view of the gas distributor 12 of the seventh embodiment. [Figure 20] FIG. 20 is a perspective view showing the exploded details of the gas distributor 12 of FIG. 19. [Figure 21] FIG. 21 is an enlarged view of section XXI of FIG. 19. [Figure 22] FIG. 22 shows a cross-section taken along line XXII-XXII of FIG. 21. [Figure 23] FIG. 23 shows a cross-section taken along line XXIII-XXIII of FIG. 21. [Figure 24]Figure 24 is an enlarged view of section XXIV of Figure 19. [Figure 25] Figure 25 shows a cross-section along the line XXV-XXV in Figure 24. [Figure 26] Figure 26 shows a cross-section along the line XXVI-XXVI in Figure 24. [Figure 27] Figure 27 shows a cross-section along the line XXVII-XXVII in Figure 24. [Figure 28] Figure 28 is a plan view of the gas distributor 12 of the eighth embodiment. [Modes for carrying out the invention]

[0010] Figure 1 is a schematic diagram of a CVD reactor for depositing, for example, layers II-VI, IV-IV, or III-III. The substrate is coatable within the process chamber 4 of the CVD reactor and is positioned on a susceptor 2. The susceptor 2 has a disc shape and is heated from below to the process temperature by a heating device 3. The heating device 3 is either a resistance heater, an RF heater, or an IR heater. The shaft 8 supporting the susceptor 2 can be rotated around its contour axis. In the center of the reactor housing 1 is a gas inlet element 9 with a feeder 11 projecting into the process chamber 4. The process chamber 4 is separated at the bottom by the susceptor 2 and at the top by the process chamber ceiling 5. The substrate is arranged in a ring around the gas outlet surface of the feeder 11 located in the center of the process chamber 4. A gas outlet element 7 for discharging process gas or reaction products extends around the susceptor 2.

[0011] The gas inlet element 9 has a head 10 in which multiple gas supply lines 13 extending to a gas distributor 12 that forms the supply device 11 extend inside.

[0012] The gas distributor 12 is a disc-shaped quartz body having a central region 15, and the gas supply line 13 extends through the central region 15. Figure 2 is a perspective view and schematic diagram showing how a supply device 11 is formed when five such gas distributors 12 are stacked on top of each other. Each gas distributor 12 is provided with an opening 14, and one of the gas supply lines 13 opens from this opening 14 into a gas distribution chamber 16. Process gas flows into the gas distribution chamber 16 from the opening 14. The opening 14 may be divided into two openings by a baffle wall 31.

[0013] On the radially outward side, a flow barrier 17 is adjacent to the first gas distribution chamber 16. The flow barrier 17 has a gas passage 22 (not shown in Figure 2), through which process gas can flow from the inner surface 17' to the outer surface 17'' of the flow barrier 17. The outer surface 17'' is adjacent to a gas distribution space 18 surrounded by an outer wall 21. The outer wall 21 is provided with gas passages 24 uniformly distributed along its circumference, through which process gas can flow into the process chamber 4.

[0014] In other embodiments, for example, in the embodiments shown in Figures 11 and 12, the second gas distribution space 18 is adjacent to a second flow barrier 19 having a gas passage 23 connecting the inner surface 19' and the outer surface 19''.

[0015] Figures 4 to 8 show an embodiment of a gas distributor 12 having a flow barrier 17 surrounding a radially inward gas distribution chamber 16, a radially outward gas distribution chamber 18 surrounding the flow barrier 17, and an outer wall 21. Both the flow barrier 17 and the outer wall 21 have branched gas passages 22 and 24, respectively.

[0016] Figure 6 shows a first embodiment of the branched gas passage 22. A Y-shaped recess is provided on the upper surface 28 of the annular flow barrier 17. Sections of the recess adjacent to the inner surface 17' form a radially extending inlet passage 25, which branches into two circumferentially extending branch passages 26. The inlet passages 25 of adjacent gas passages 22 in the circumferential direction are evenly distributed in the circumferential direction. The branch passages 26 continue to radially extending outlet passages 27, which open to the outer surface 17'' of the flow barrier 17. Adjacent outlet passages 27 are spaced equally apart from each other. Therefore, the angle between two adjacent outlet passages 27 is half the angle between two adjacent inlet passages 25. The passages 25, 26, and 27 open toward the upper surface 28 of the gas distributor 12 and are closed by the lower surface 29 of the gas distributor 12, which is located above it when the supply device 11 is assembled.

[0017] Figures 8, 9, and 10 show a second embodiment of the branch gas passage 24. An inlet passage 25 having a rectangular cross-section is located approximately midway along the inner surface 21' of the outer wall 21. The outer wall 21 forms a plurality of spaces 30 separated from each other by a partition wall 34 extending from the lower surface to the upper surface 28 of the gas distribution space 18. These spaces 30 are closed at the bottom but open at the top. The inlet passage 25 opens approximately in the center of the space 30. The space 30 is divided into two sections by a sub-body 33. These two sections each form a branch passage 26. The inlet passage 25 opens in front of the rounded front of the wedge-shaped sub-body 33. The sub-body 33 tapers toward the rounded front and forms a side wall located on the side of the branch passage.

[0018] The branching passages open into the outlet passages 27, which have a circular cross-section. In the embodiment shown in Figure 10, three outlet passages 27 are formed vertically from each branching passage 26, arranged in a vertical direction.

[0019] In the third embodiment shown in Figure 8a, the branch passage 26 opens to only one exit passage 27.

[0020] In the fourth embodiment shown in Figure 8b, the branch passage 26 opens into two exit passages 27.

[0021] In the fifth embodiment shown in Figures 11-15, the first section 25 of the inlet passage opens into the second section 25' of the inlet passage. The first section 25 extends radially, while the second section 25' extends vertically upward. Thus, the second section 25' branches into two branch passages 26 that extend circumferentially. The two branch passages 26 each merge into an outlet passage 27 that extends radially. The second flow barrier 19 surrounding the flow barrier 17 is provided with a gas passage 23 with a square cross-section that extends radially. The outer wall 21 surrounding the second flow barrier 19 is provided with a gas passage 24 with a circular cross-section. The first section 25 extends at approximately half the height of the inner surface 17', while the outlet passage 27 opens into the uppermost region of the outer surface 17''. The outlet passage 27 and the branch passages 26 open toward the upper surface 28 and are closed by the lower surface 29 of the gas distributor 12 located above them in the assembled state.

[0022] In the sixth embodiment shown in Figures 16-18, the inlet passage 25 first branches into two first branch passages 26 that extend circumferentially in the horizontal plane. Each of the first branch passages 26 branches into a second branch passage 26' that extends vertically. The second branch passages 26' have an open top and are closed by the lower surface of the upper gas distributor 12. Each of the second branch passages 26' opens into an outlet passage 27. The inlet passage 25 and the outlet passage 27 extend radially and are offset in both the vertical and circumferential directions.

[0023] The entrance passage 25 branches at a 90° angle in one circumferential direction and at a 90° angle in the opposite circumferential direction. The length of the branch passage 26 may be longer than the diameter of the branch passage 26. However, the length may also be shorter than the diameter of the branch passage. The two branch passages 26 each branch upward at a 90° angle and downward at a 90° angle to form a second branch passage 26'. The length of the second branch passage 26' may be shorter or longer than its diameter. The second branch passages 26' each turn at a 90° angle to form an exit passage 27. The two exit passages 27 are arranged vertically, one above the other.

[0024] The embodiment shown in Figure 19 has two flow barriers 17 and 19, each flow barrier 17 and 19 provided with branched gas passages 22, 23, and 24. The gas passages 22 of flow barrier 17 are shown in detail in Figures 21 to 23. These are T-shaped branched gas passages 22, in which an inlet passage 25 branches into two branched passages 26, each of which merges into an outlet passage 27. Here, all passages 25, 26, and 27 extend at approximately half the height of the flow barrier 17 and lie in the same horizontal plane.

[0025] Figures 19-27 show the gas passages 23 of the flow barrier 19, which are substantially the same as those shown in Figures 16 and 17. The inlet passage 25 first branches into two branch passages 26. These branch passages 26 further branch into two branch passages 26'. Each branch passage 26' opens to the outlet passage 27 on its outer surface 19''.

[0026] Figure 28 shows a further embodiment in which the flow barrier 17 initially has an inlet passage 25, which branches into two branch passages 26. The inlet passage 25 and the branch passages 26 each have a square cross-section, and in particular, they have the same cross-section. The inlet passage 25 again opens upward and continues into a second section 25' that extends vertically downward. The second section 25' branches into branch passages 26. The two branch passages 26 each continue into an outlet passage 27, each outlet passage 27 opening into a space 30. Multiple spaces 30 of the same design are arranged circumferentially along the outer surface of the flow barrier 17. Each space 30 has a sub-section 33 that divides the space 30 into two passages 35. The rounded front of the sub-section 33 is in front of the opening of the outlet passage 27. The passages 35 and spaces 30 extend over the entire height of the flow barrier 17.

[0027] The gas distribution chamber 18 surrounding the flow barrier 17 is adjacent to the outer wall 21, and gas passages 24 are formed in the outer wall 21, but these passages 24 do not branch here. However, the gas passages 24 in the outer wall 21 may branch, as in other embodiments.

[0028] In all embodiments, the gas distribution chambers 16, 18, and 20 can be open all around, forming an annular space. In all embodiments, the flow barriers 17 and 19 can be closed all around, thereby separating the radially inner gas distribution chamber from the radially outer gas distribution chamber, and gas exchange between the radially inner and radially outer gas distribution chambers occurs only through the gas passage.

[0029] In all embodiments, the gas distribution chambers 16, 18, and 20 may have radial barriers that divide the gas distribution chambers 16, 18, and 20 into, for example, two semi-chambers.

[0030] In some embodiments, the gas passages 22, 23, and 24 have a radially extending inlet passage 25, from which a circumferentially extending section 26 of the flow barriers 17, 19, and 21 branches off substantially laterally relative to the radial direction. The outlet passage 27 branches off substantially laterally from this section 26, and the outlet passage 27 also extends radially.

[0031] The foregoing is intended to describe the invention covered by this application as a whole, and the present invention independently develops the prior art by at least the following combinations of features, and any two, some, or all of these combinations of features may be combined.

[0032] The apparatus is characterized in that the gas passages 22, 23, and 24 are longer than the distance measured radially from the inner surfaces 17', 19', and 21' to the outer surfaces 17'', 19'', and 21''.

[0033] The apparatus is characterized in that each gas passage 22, 23, and 24 has an inlet passage 25, and the inlet passage 25 is followed by at least one section 26, 26' that extends circumferentially inside the flow barriers 17, 19, and 21, and has an outlet passage 27 that opens to the outer surface of the flow barriers 17, 19, and 21.

[0034] The apparatus is characterized in that gas passages 22, 23, and 24 each have an inlet passage 25, the inlet passage 25 branches into at least two branch passages 26, 26' inside the flow barriers 17, 19, and 21, and the branch passages 26, 26' each lead to at least one outlet passage 27 that opens to the outer surface of the flow barriers 17, 19, and 21.

[0035] An apparatus according to any one of claims 1 to 4, comprising a plurality of flow barriers 17, 19, 21, each flow barrier 17, 19, 21 having passages 22, 23, 24, the radially outermost of the flow barriers 17, 19, 21 forming an outer wall 21, the outer surface 21'' forming a cylindrical surface of the gas distributor 12, and the inner surface 17' of the radially innermost flow barrier 17 of the flow barriers 17, 19, 21, is the radially outermost of the central region 15. The innermost flow barrier 17 is adjacent to an inner gas distribution chamber 16, and the outer surface 17'' of the radially innermost flow barrier 17 is adjacent to a further gas distribution chamber 18. The passages 22, 23, 24 in at least one of the flow barriers 17, 19, 21, at least two of the flow barriers 17, 19, 21, or all of the flow barriers 17, 19, 21 each have an inlet passage 25 that branches into at least two branch passages 26, 26' inside the flow barriers 17, 19, 21.

[0036] The apparatus is characterized in that the entrance passage 25 extends radially with respect to the axis of symmetry A, and / or the branching passage 26 branches off from the entrance passage 25 in the circumferential direction or parallel to the direction of the axis of symmetry A.

[0037] The apparatus is characterized in that the inlet passage 25 and outlet passage 27 assigned to the gas distribution chambers 18 and 20 are offset from each other in the circumferential direction and / or in the direction of the axis of symmetry A.

[0038] The apparatus is characterized in that the entrance passage 25 has a first section extending in the radial direction and a second section 25' extending in a direction parallel to the axis of symmetry A, and two branch passages 26 extending in the circumferential direction are adjacent to the second section 25'.

[0039] The apparatus is characterized in that multiple gas distributors 12 are arranged directly above and below each other, forming a gas supply line 13 that is eccentrically positioned with respect to the axis of symmetry A.

[0040] An apparatus characterized in that the entrance passage 25, branch passage 26, and exit passage 27 have a rectangular cross-section.

[0041] The apparatus is characterized in that at least one of the inlet passage 25, branch passage 26, and outlet passage 27 opens to one side 28 of the gas distributor 12, and is closed off from the adjacent gas distributor 12 on the opposite side 29.

[0042] The device is characterized in that the branching passage 26 is formed by a space 30 that is U-shaped in plan view above the gas distributor 12, and the side walls of the U-shaped legs meet at an acute angle in a curved shape.

[0043] A device characterized in that gas passages 22, 23, and 24 branch into three or more outlet passages 27.

[0044] The flow barrier 17 is characterized in that the outer surface 17" of the flow barrier 17 is provided with a plurality of spaces 30 separated by partition walls 34, the spaces 30 are divided into two passages 35 by a sub-body 33, these passages 35 open to a gas distribution space 18, and the sub-body 33 is positioned in front of an outlet passage 27 that opens to the spaces 30.

[0045] All disclosed features are essential to the present invention (both in themselves and in combination with each other). The disclosures of this application encompass the disclosures of any related / additional priority documents (copies of earlier applications) in their entirety, and are intended to incorporate the features of those documents into the claims of this application. Dependent claims feature independent inventive further developments of the prior art, even without the features of the cited claims, particularly for the purpose of filing a divisional application based on these claims. The invention specified in each claim may have one or more additional functions, particularly those specified in the preceding description, especially those to which reference numerals are assigned, and / or specified in the descriptions of the reference numerals. The present invention also relates, in particular, to design configurations in which individual features described above are not implemented, insofar as they are obviously unnecessary for their respective intended use or can be replaced by other means having the same technical effect. [Explanation of Symbols]

[0046] 1 Reactor Housing 2 Susceptors 3 Heating device 4 process chambers 5 Process chamber ceiling 7. Gas outlet device 8 shafts 9. Gas inlet device 10 heads 11 Feeding device 12 Gas distributors 13 Gas supply lines 14 Aperture 15 Central area 16. First Gas Distribution Room 17. First flow barrier 17' Inner self 17” Exterior 18. Second Gas Distribution Room 19. Second flow barrier 19' Inner self 19” Exterior 20. Third Gas Distribution Room 21. Third flow barrier, exterior wall 21' Inner self 21” Exterior 22 Gas passage 23 Gas passage 24 Gas passage 25 Entrance passage 25' Part of the entrance channel 26 branching passages, part 26' Branching passage, part 27 Exit passage 28 Top 29 Bottom side 30 space 31 Baffles 32 Bulkhead 33 Partial field 34 Bulkhead 35 aisles A axis of symmetry

Claims

1. A device (1) that supplies process gas to the process chamber (4) of a CVD reactor, At least one gas distributor (12) arranged around an axis (A), having a central region (15) with an outer surface surrounding the axis (A), and an opening (14) for a gas supply line (13) located on the outer surface, the opening (14) extending only to or over at least the partial periphery of the outer surface, A flow barrier (17, 19, 21) having inner surfaces (17', 19', 21') facing the gas distribution chambers (16, 18, 20) and outer surfaces (17'', 19'', 21'') facing the opposite direction, In order to disperse the process gas exiting from the opening (14) within the gas distribution chambers (16, 18, 20) and uniformly distribute it to the process chamber (4), the apparatus (1) includes a plurality of identically designed gas passages (22, 23, 24) that connect the inner surfaces (17', 19', 21') and the outer surfaces (17'', 19'', 21'') and are evenly distributed over the circumferential direction of the flow barrier (17, 19, 21), The gas passages (22, 23, 24) are longer than the radial distance measured from the inner surface (17', 19', 21') to the outer surface (17'', 19'', 21''). The apparatus is characterized in that each of the gas passages (22, 23, 24) has an inlet passage (25) leading to at least one section (26, 26') extending circumferentially or in a direction parallel to the axis (A) inside the flow barrier (17, 19, 21), and has an outlet passage (27) on the outer surface of the flow barrier (17, 19, 21).

2. A device (1) that supplies process gas to the process chamber (4) of a CVD reactor, At least one gas distributor (12) arranged around an axis (A), having a central region (15) with an outer surface surrounding the axis (A), and an opening (14) for a gas supply line (13) located on the outer surface, the opening (14) extending only to or over at least the partial periphery of the outer surface, A flow barrier (17, 19, 21) having inner surfaces (17', 19', 21') facing the gas distribution chambers (16, 18, 20) and outer surfaces (17'', 19'', 21'') facing the opposite direction, In order to disperse the process gas exiting from the opening (14) within the gas distribution chambers (16, 18, 20) and uniformly distribute it to the process chamber (4), the apparatus (1) includes a plurality of identically designed gas passages (22, 23, 24) that connect the inner surfaces (17', 19', 21') and the outer surfaces (17'', 19'', 21'') and are evenly distributed over the circumferential direction of the flow barrier (17, 19, 21), The gas passages (22, 23, 24) are longer than the radial distance measured between the inner surface (17', 19', 21') and the outer surface (17'', 19'', 21''). Each of the gas passages (22, 23, 24) has an inlet passage (25) that branches into at least two branch passages (26, 26') inside the flow barrier (17, 19, 21), The apparatus is characterized in that each of the branch passages (26, 26') leads to at least one outlet passage (27) that opens to the outer surface of the flow barrier (17, 19, 21).

3. The apparatus according to any of the preceding claims, It has a plurality of flow barriers (17, 19, 21) each having passages (22, 23, 24), Of the flow barriers (17, 19, 21), the outermost one in the radial direction forms an outer wall (21), and the outer surface (21'') of the outer wall (21) forms the cylindrical sheath surface of the gas distributor (12). The inner surface (17') of the radially innermost flow barrier (17) among the flow barriers (17, 19, 21) is adjacent to the radially innermost gas distribution chamber (16) surrounding the outer surface of the central region (15), and The outer surface (17") of the radially innermost flow barrier (17) is adjacent to a further gas distribution chamber (18), The apparatus is characterized in that one of the flow barriers (17, 19, 21), or at least two of the flow barriers (17, 19, 21), or all of the flow barriers (17, 19, 21), each has an inlet passage (25) that branches into at least two branch passages (26, 26') inside the flow barrier (17, 19, 21).

4. The entrance passage (25) extends radially with respect to the axis (A), and / or The apparatus according to claim 2 or 3, characterized in that the branch passage (26) branches off from the inlet passage (25) in a direction circumferential or parallel to the axis (A).

5. The apparatus according to any of the preceding claims, characterized in that the inlet passage (25) and outlet passage (27) assigned to the gas distribution chambers (18, 20) are offset from each other in the circumferential direction of the axis (A) and / or in the direction of the axis (A).

6. The apparatus according to any one of claims 3 to 5, characterized in that the entrance passage (5) has a first section extending in the radial direction and a second section (25') extending in a direction parallel to the axis (A), and these are adjacent to two branch passages (26) extending in the circumferential direction.

7. The apparatus according to any of the preceding claims, characterized in that a plurality of gas distributors (12) are arranged to form a gas supply line (13) which is stacked vertically on top of each other and eccentrically with respect to the axis (A).

8. The apparatus according to any of the preceding claims, characterized in that the entrance passage (25), the branch passage (26), and the exit passage (27) have a rectangular cross-section.

9. The apparatus according to any of the preceding claims, characterized in that at least one of the inlet passage (25), the branch passage (26), and the outlet passage (27) opens to one side (28) of the gas distributor (12) and is closed off from the adjacent gas distributor (12) on the opposite side (29).

10. A device (1) that supplies process gas to the process chamber (4) of a CVD reactor, At least one gas distributor (12) arranged around an axis (A), having a central region (15) with an outer surface surrounding the axis (A), and an opening (14) for a gas supply line (13) located on the outer surface, the opening (14) extending only to or over at least the partial periphery of the outer surface, A flow barrier (17, 19, 21) having inner surfaces (17', 19', 21') facing the gas distribution chambers (16, 18, 20) and outer surfaces (17'', 19'', 21'') facing the opposite direction, In order to disperse the process gas exiting from the opening (14) within the gas distribution chambers (16, 18, 20) and uniformly distribute it to the process chamber (4), the apparatus (1) includes a plurality of identically designed gas passages (22, 23, 24) that connect the inner surfaces (17', 19', 21') and the outer surfaces (17'', 19'', 21'') and are evenly distributed over the circumferential direction of the flow barrier (17, 19, 21), The gas passages (22, 23, 24) are longer than the radial distance measured from the inner surface (17', 19', 21') to the outer surface (17'', 19'', 21''). The apparatus is characterized in that at least one of the gas passages (22, 23, 24) is open to one side (28) of the gas distributor (12) and closed off from the adjacent gas distributor (12) on the opposite side (29).

11. The apparatus according to any one of claims 2 to 9, characterized in that the branch passage (26) is formed by a U-shaped space (30) in a plan view of the upper surface of the gas distributor (12), and the side walls of the U-shaped legs meet at an acute angle in a curved shape.

12. The apparatus according to any of the preceding claims, characterized in that the gas passages (22, 23, 24) branch into three or more outlet passages (27).

13. The apparatus according to any of the preceding claims, characterized in that the outer surface (17") of the flow barrier (17) has a plurality of spaces (30) separated by partitions (34), the spaces (30) are divided into two passages (35) by a sub-body (33), these passages (35) open to a gas distribution space (18), and the sub-body (33) is positioned in front of an outlet passage (27) that opens to the spaces (30).

14. An apparatus characterized by one or more of the features described in any one of the above claims.

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