Inspection apparatus and focal position adjustment method

Abstract

To decrease an autofocus tracking delay.SOLUTION: According to an embodiment, an inspection apparatus comprises: a stage 110; an illumination optical system 140; an imaging optical system 150 that includes a first sensor 322 that detects a focal position and causes light with which a sample 2 is irradiated to form an image on the first sensor; a detection circuit 170 that detects a focal position signal of the light on the basis of the light received by the first sensor; a setting circuit 230 that sets a first focus offset value of a first region SP1 on the basis of a result obtained by shifting, in an advancing direction of the stage, coordinate data of first focal position data FD generated on the basis of a result obtained by optically scanning the first region SP1 of a plurality of stripe-shaped regions into which the sample is virtually divided; and a control circuit 207 that controls a height position of the stage on the basis of the focal position signal and the first focus offset value.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] An embodiment of the present invention relates to an inspection apparatus and a focal position adjustment method for inspecting a pattern formed on a sample. [Background technology]

[0002] In the manufacturing process of semiconductor devices, a circuit pattern is transferred onto a semiconductor substrate by reduction exposure using an exposure apparatus (also called a "stepper" or "scanner"). The exposure apparatus uses a mask (also called a "reticle") on which an original pattern (hereinafter simply referred to as a "pattern") is formed.

[0003] In the manufacture of semiconductor devices, mask pattern defects are one of the factors that reduce yields.

[0004] For example, cutting-edge devices require the formation of patterns with line widths of several nm. As patterns become finer, defects in the mask patterns also become finer. Therefore, mask inspection equipment is required to improve the detection accuracy of minute defects.

[0005] In a mask inspection device, the mask is placed on a stage. As the stage moves, light irradiated via an optical system scans the mask. The light transmitted through or reflected from the mask is focused on a sensor via a lens. In this way, an optical image is acquired.

[0006] In order to capture optical images of fine patterns, the optical system of inspection equipment is becoming higher in magnification and higher in numerical aperture (NA). As a result, the focal depth between the optical system and the mask is becoming shallower. When the focal depth becomes shallow, even a slight change in the distance between the optical system and the mask causes light to go out of focus. As a result, the pattern image of the optical image becomes blurred, which interferes with the acquisition of the optical image and the defect detection process. Inspection equipment equipped with a real-time autofocus mechanism to suppress the focus deviation is known.

[0007] For example, Patent Document 1 discloses a method of performing polynomial approximation calculation processing of focal position information in a certain inspection area, and controlling the focal position of an adjacent inspection area based on the calculation result. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] JP 2010-217317 A Summary of the Invention [Problem to be solved by the invention]

[0009] If the stage movement speed during optical scanning is increased in order to increase the inspection speed, a delay occurs in autofocus tracking, and defocusing may occur when there is a steep step.

[0010] The present invention has been made in view of the above points, and an object of the present invention is to provide an inspection apparatus and a focal position adjustment method that can reduce the tracking delay of autofocus. [Means for solving the problem]

[0011] According to a first aspect of the present invention, an inspection apparatus includes a stage on which a sample is placed, When the inspection area is virtually divided into multiple stripes and each stripe is scanned, an illumination optical system for irradiating light used in the Of light focal position of detection Used for An imaging optical system including a first sensor that forms an image of light irradiated onto the sample on the first sensor; Detects the focus position and controls the auto focus based on the detected focus position Signal Generate A detection circuit for detecting the A generating circuit generates focal position data based on coordinate data of the sample for each stripe based on the results of scanning, and uses a shift amount determined by the scanning speed and the tracking speed of the autofocus, Based on the result of shifting the coordinate data of the focal position data in the direction of the stage movement ,centre a setting circuit for setting a focus offset value; Autofocus Control signal Tofu Based on the focus offset value, The focal point of the light is on the surface of the sample. stage of and a control circuit for controlling the height position. When scanning a first stripe of the multiple stripes, the setting circuit sets a focus offset value corresponding to the first stripe based on the result of shifting coordinate data of focus position data based on the result of dummy scanning the first stripe in the stage progression direction for the first stripe; when scanning a second stripe of the multiple stripes, the setting circuit sets a focus offset value corresponding to the second stripe based on the result of shifting coordinate data of focus position data based on the result of dummy scanning the second stripe in the stage progression direction for the second stripe; and when scanning an nth stripe (n is a natural number greater than or equal to 3) of the multiple stripes, the setting circuit sets a focus offset value corresponding to the nth stripe based on the result of shifting coordinate data of focus position data based on the result of scanning the (n-2)th stripe in the stage progression direction for the nth stripe.

[0012] According to a first aspect of the present invention, The direction of movement of the stage relative to the second stripe is opposite to the direction of movement of the stage relative to the first stripe. It is preferred.

[0013] According to a first aspect of the present invention, a generating circuit includes: Multiple Stripes of Dummy scan or scan Based on the results, For each stripe Moving average stages of It is preferable to generate approximate data for the height position.

[0014] According to a first aspect of the present invention, The direction of movement of the stage for the (n-2)th stripe is the same as the direction of movement of the stage for the nth stripe. It is preferred.

[0015] According to a first aspect of the present invention, The imaging optical system further includes a second sensor for capturing an optical image. When scanning the sample, the optical image is captured, and when dummy scanning the sample, the optical image is not captured. It is preferred.

[0016] According to a second aspect of the present invention, The inspection area of ​​the sample placed on the stage is virtually divided into multiple stripes, and the light is scanned strip by stripe. How to adjust the focus position , multiple Number stripes Dummy scan the first stripe of And a process of Dummy scan the first stripe Based on the results of the (-1) generating focus position data; a step of dummy scanning a second stripe of the plurality of stripes; generating zeroth focus position data based on a result of the dummy scanning of the second stripe; and when scanning an nth stripe (n is a natural number) of the plurality of stripes, using a shift amount determined based on a scan speed and an autofocus tracking speed, No. (n-2) Focus position data No. (n-2) Coordinate data For the nth stripe Based on the result of shifting the stage , the nth stripe setting a focus offset value; ,centre Focus offset value and Of light Based on the focus position detection result , so that the focal position of the light is on the surface of the sample. Controlling the height of the stage Scan the nth stripe And a process of generating n-th focal position data from the result of scanning the n-th stripe; Includes.

[0017] According to a second aspect of the present invention, The direction of movement of the stage relative to the second stripe is opposite to the direction of movement of the stage relative to the second stripe. It is preferred.

[0018] According to a second aspect of the present invention, (- 1 ) In the step of generating the focus position data, stripe of Dummy Scan Based on the results, a moving average is used to generate an approximation of the stage height position. In the step of generating 0th focal position data, approximate data of the height position of the stage in the second stripe is generated by moving average based on the result of dummy scanning the second stripe, and in the step of generating nth focal position data, approximate data of the height position of the stage in the nth stripe is generated by moving average based on the result of scanning the nth stripe. It is preferred.

[0019] According to a second aspect of the present invention, The direction of movement of the stage for the (n-2)th stripe is the same as the direction of movement of the stage for the nth stripe. It is preferred.

[0020] According to a second aspect of the present invention, In the step of scanning the n-th stripe, an optical image is captured, and in the step of dummy scanning the first stripe and the step of dummy scanning the second stripe, no optical image is captured. It is preferred. Effect of the Invention

[0021] According to the inspection apparatus and the focal position adjusting method of the present invention, the tracking delay of the autofocus can be reduced. [Brief description of the drawings]

[0022] [Figure 1] FIG. 1 is a diagram showing an overall configuration of an inspection device according to an embodiment. [Diagram 2] FIG. 2 is a block diagram of an illumination optical system 140 and an imaging optical system 150 of an inspection apparatus according to an embodiment. [Diagram 3] FIG. 3 is a diagram showing an example of an inspection area of ​​a mask in the inspection apparatus according to an embodiment. [Figure 4] FIG. 4 is a flowchart of an inspection process in an inspection device according to an embodiment. [Diagram 5] FIG. 5 is a flowchart showing a flow of optical image acquisition in an inspection device according to an embodiment. [Figure 6] FIG. 6 is a diagram showing a specific example of approximate data of the Z coordinate obtained by moving average and polynomial approximation. [Figure 7]FIG. 7 is a diagram showing an example of pre-reading of focal position data when the stripe is scanned in the FWD direction in the inspection apparatus according to one embodiment. [Figure 8] FIG. 8 is a diagram showing an example of pre-reading of focal position data when scanning stripes in the BWD direction in an inspection apparatus according to an embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0023] Hereinafter, the embodiments will be described with reference to the drawings. The embodiments exemplify devices and methods for embodying the technical ideas of the invention. The drawings are schematic or conceptual, and the dimensions and ratios of each drawing are not necessarily the same as those in reality. The technical ideas of the present invention are not specified by the shapes, structures, arrangements, etc. of the components.

[0024] In the following, a mask inspection device will be described as an example of a sample inspection device. In the present embodiment, a case where the inspection device captures an optical image will be described, but the present invention is not limited to this. The inspection device may capture an electron beam image using, for example, a scanning electron microscope (SEM) as an inspection image.

[0025] Furthermore, in this embodiment, the sample to be inspected is a mask used in a photolithography method, but is not limited to this. For example, the sample may be a template used in nanoimprint lithography (NIL), or a wafer (semiconductor substrate), etc., as long as the sample has a pattern on its surface.

[0026] Furthermore, in this embodiment, a D-DB (Die to Database) method for comparing an inspection image with a reference image based on design data is described as a method for inspecting defects of a mask in an inspection device, but the method is not limited to this. The defect inspection method may be a DD (Die to Die) method for comparing an inspection image with images of multiple areas of the same pattern formed on a mask.

[0027] Furthermore, the focal position adjustment method described in the embodiment is not limited to an inspection apparatus, but may be applied to other apparatuses, such as a charged particle beam irradiation apparatus used in manufacturing a mask.

[0028] 1. Overall configuration of the inspection device First, an example of the overall configuration of the inspection device 1 will be described with reference to FIG. 1. FIG. 1 is a diagram showing the overall configuration of the inspection device 1. Note that the example of FIG. 1 shows a configuration in which an optical image is acquired using light reflected from a mask 2 (hereinafter also referred to as "reflected light"), but the inspection device 1 is not limited to this. The inspection device 1 may be configured to acquire an optical image using light transmitted through the mask 2 (hereinafter also referred to as "transmitted light"). Moreover, the inspection device 1 may be configured to acquire an optical image using reflected light and an optical image using transmitted light.

[0029] 1, the inspection device 1 includes an image acquisition mechanism 10 and a control mechanism 20. The inspection device 1 of the present embodiment has an autofocus mechanism.

[0030] The image acquisition mechanism 10 includes a stage 110 , an XY drive unit 120 , a Z drive unit 130 , an illumination optical system 140 , an imaging optical system 150 , a sensor circuit 160 , a focal position detection circuit 170 , a laser measurement system 180 , and an autoloader 190 .

[0031] The stage 110 is movable in an X direction parallel to the surface of the stage 110, a Y direction parallel to the surface of the stage 110 and intersecting the X direction, and a Z direction perpendicular to the surface of the stage 110. The mask 2 is placed on the stage 110.

[0032] The XY driving unit 120 has a driving mechanism for moving the stage 110 on an XY plane consisting of the X direction and the Y direction. More specifically, the XY driving unit 120 includes an X-axis motor 121 that drives the stage 110 in the X direction and a Y-axis motor 122 that drives the stage 110 in the Y direction. For example, a stepping motor can be used for the X-axis motor 121 and the Y-axis motor 122. Note that the XY driving unit 120 may have, for example, a rotary shaft motor that rotates the stage 110 around a rotary shaft on the XY plane with the Z direction as the rotary shaft.

[0033] The inspection area of ​​the mask 2 is virtually divided into a plurality of stripes along the Y direction, for example. Hereinafter, each divided inspection area is referred to as a "stripe." The XY driving unit 120 controls the operation of the stage 110 so as to continuously optically scan each divided stripe.

[0034] The Z driving unit 130 has a driving mechanism for moving the stage 110 in the Z direction. More specifically, for example, the Z driving unit 130 includes a plurality of Z-axis actuators 131 that drive the stage 110 in the Z direction. For the Z-axis actuators 131, for example, an actuator using a piezoelectric element such as a piezo element can be used.

[0035] The illumination optical system 140 includes a light source, and irradiates illumination light emitted from the light source onto the mask 2. The illumination optical system will be described in detail later.

[0036] The imaging optical system 150 forms an image on a sensor of the light reflected from the mask 2. The imaging optical system 150 includes a sensor for capturing an optical image and a sensor for measuring a focal position. The imaging optical system 150 will be described in detail later.

[0037] The sensor circuit 160 performs A / D (analog / digital) conversion on an electrical signal received from a sensor for capturing an optical image in the imaging optical system 150. The sensor circuit 160 transmits optical image data based on the converted digital signal to the comparison circuit 211 of the control mechanism 20. The optical image is based on the pattern of the mask 2. In the optical image, the brightness (luminance) of each pixel obtained by dividing the imaging area on the XY plane is expressed by a gradation value. For example, when the gradation value is expressed as 8-bit data, the pixel value of each pixel is expressed by a gradation value of 0 to 255.

[0038] The focal position detection circuit 170 detects the focal position (amount of focus deviation) based on an electrical signal received from a focal position measurement sensor in the imaging optical system 150. The focal position detection circuit 170 generates a focal position adjustment signal based on the detected focal position. The focal position adjustment signal is a signal for focusing the focal position of the illumination light on the pattern surface of the mask 2. The focal position adjustment signal includes information on the correction amount of the Z coordinate of the stage 110. The focal position detection circuit 170 transmits the focal position adjustment signal to the Z driver control circuit 207. The focal position detection circuit 170 is included in an autofocus mechanism.

[0039] The laser measurement system 180 measures the position in the X and Y directions of the stage 110 (also referred to as “stage position”). The laser measurement system 180 transmits the measured stage position information in the XY plane to the position circuit 212 of the control mechanism 20.

[0040] A plurality of masks 2 are set in the autoloader 190. The autoloader 190 carries the mask 2 to be inspected onto the stage 110. The autoloader 190 removes the mask 2 from the stage 110 after the optical image has been captured.

[0041] The control mechanism 20 includes a control computer 200, a storage unit 201, a display unit 202, an input unit 203, a communication unit 204, an autoloader control circuit 205, an XY drive unit control circuit 206, a Z drive unit control circuit 207, an FD generation circuit 208, an expansion circuit 209, a reference circuit 210, a comparison circuit 211, and a position circuit 212. These are connected to each other via, for example, a bus line.

[0042] The autoloader control circuit 205, the XY drive control circuit 206, the Z drive control circuit 207, the unfolding circuit 209, the reference circuit 210, the comparison circuit 211, and the position circuit 212 may be configured by a program executed by the control computer 200, may be configured by hardware or firmware included in the control computer 200, or may be configured by individual circuits controlled by the control computer 200. In the following, a case will be described in which the functions of these circuits are realized based on a program executed by the control computer 200.

[0043] The control computer 200 controls the entire inspection device 1. More specifically, the control computer 200 controls the image acquisition mechanism 10, the storage unit 201, the display unit 202, the input unit 203, the communication unit 204, the autoloader control circuit 205, the XY drive unit control circuit 206, the Z drive unit control circuit 207, the development circuit 209, the reference circuit 210, the comparison circuit 211, and the position circuit 212. The control computer 200 controls the image acquisition mechanism 10 to acquire an optical image. The control computer 200 also controls the control mechanism 20 to generate a reference image. The control computer 200 compares the optical image with the reference image to detect defects in the pattern. The control computer 200 includes, for example, a CPU (Central Processing Unit) not shown. The CPU executes, for example, an inspection program 223 in the storage unit 201. The control computer 200 may be, for example, a CPU device such as a microprocessor, or a computer device such as a personal computer. In addition, at least some of the functions of the control computer 200 may be performed by other integrated circuits, such as an Application Specific Integrated Circuit (ASIC), a Field Programmable Gate Alley (FPGA), or a Graphics Processing Unit (GPU).

[0044] The storage unit 201 stores information related to the inspection. More specifically, the storage unit 201 stores design data 220, inspection conditions 221, inspection data 222, and an inspection program 223. The storage unit 201 may include various storage devices such as a magnetic disk storage device (HDD: Hard Disk Drive) or a solid state drive (SSD: Solid State Drive) as an external storage.

[0045] Design data 220 is the design data for mask 2 .

[0046] The inspection conditions 221 include parameters such as imaging conditions and inspection conditions.

[0047] The inspection data 222 includes data related to the reference image, the optical image, and the inspection result. The inspection data 222 also includes focal position data FD. The focal position data FD is data based on the X-coordinate, the Y-coordinate, and the Z-coordinate of the mask 2 (stage 110) when the mask 2 is optically scanned (scanned).

[0048] The inspection program 223 is a program for executing a pattern inspection. The storage unit 201 stores the inspection program 223 as a non-transitory storage medium. For example, the inspection program 223 is stored in a ROM (Read Only Memory).

[0049] The display unit 202 is a display device such as a CRT display, a liquid crystal display, an organic EL display, etc. The display unit 202 may include an audio output device.

[0050] The input unit 203 is an input device such as a keyboard, a mouse, a touch panel, or a button switch.

[0051] The communication unit 204 is a device for connecting to a network to transmit and receive data to and from an external device. Various communication standards may be used for communication. For example, the communication unit 204 receives design data from an external device and transmits inspection results to the external device.

[0052] The autoloader control circuit 205 controls the operation of the autoloader 190. The autoloader control circuit 205 operates the autoloader 190 to load the mask 2 to be inspected onto the stage 110. The autoloader control circuit 205 also operates the autoloader 190 to unload the mask 2 from the stage 110.

[0053] The XY driving unit control circuit 206 controls the XY driving unit 120. For example, the XY driving unit control circuit 206 acquires the position measurement result (X coordinate and Y coordinate) on the XY plane of the stage 110 measured by the laser measurement system 180 via the position circuit 212, and controls the XY driving unit 120 based on the acquired result.

[0054] The Z drive control circuit 207 controls the Z drive unit 130. In this embodiment, the Z drive control circuit 207 determines the Z coordinate based on a focus offset value and a focal position adjustment signal (autofocus control signal). The focus offset value is a setting value (X coordinate, Y coordinate, and Z coordinate) of the position of the stage 110 used for scanning. The Z drive control circuit 207 is included in the autofocus mechanism.

[0055] The Z driver control circuit 207 includes an offset setting circuit 230. The offset setting circuit 230 sets a focus offset value based on the focus position data FD read from the storage unit 201. The offset setting circuit 230 of this embodiment sets a focus offset value using the focus position data FD obtained when scanning an arbitrary stripe of the mask 2 in the same direction. At this time, the offset setting circuit 230 reads ahead, for example, information on the Z coordinate of the focus position data FD in the moving direction of the stage 110, and sets the focus offset value. Details of the focus offset value setting will be described later.

[0056] The FD generation circuit 208 generates focal position data FD based on the result of scanning the stripe. More specifically, the FD generation circuit 208 calculates approximate data by moving average using data of successive Z coordinates (height position of the stage 110) when scanning one stripe, for example. Then, the FD generation circuit 208 generates focal position data FD by associating, for example, the approximate data of the Z coordinate with data of the X coordinate and the Y coordinate. The focal position data FD may also include information such as the number of the stripe. The data of the X coordinate, the Y coordinate, and the Z coordinate may be the result of position measurement of the stage 110 acquired from the position circuit 212 or the like, or may be control information of the position of the stage 110 by the XY driving unit 120 and the Z driving unit 130. The FD generation circuit 208 transmits the focal position data FD to the storage unit 201.

[0057] The unfolding circuit 209 unfolds (converts) the design data 220, for example, into binary or multi-value image data. More specifically, the unfolding circuit 209 unfolds the design data 220 held in the storage unit 201, for example, into data for each pattern (figure), and interprets the figure code indicating the figure shape of the figure data, the figure dimensions, and the like. The unfolding circuit 209 unfolds the design data 220 into a binary or multi-value image (hereinafter, referred to as an "unfolded image") as a pattern arranged in a square having a grid of a predetermined quantization dimension as a unit. The unfolding circuit 209 then calculates the occupancy rate of the figure for each pixel of the unfolded image. The figure occupancy rate in each pixel thus calculated is the pixel value of the unfolded image. For example, when the pixel value of the unfolded image is expressed as an 8-bit gradation value, the pixel value of each pixel is expressed as a gradation value of 0 to 255. The unfolding circuit 209 transmits the generated unfolded image to the reference circuit 210.

[0058] The reference circuit 210 generates a reference image using the developed image. The reference circuit 210 transmits the generated reference image to the comparison circuit 211.

[0059] The comparison circuit 211 compares the optical image received from the sensor circuit 160 with the reference image received from the reference circuit 210 using an appropriate algorithm. If the grayscale difference between the optical image and the reference image exceeds a preset threshold, the comparison circuit 211 determines that there is a defect at the corresponding coordinate position (X coordinate and Y coordinate) of the mask 2. The comparison circuit 211 stores the inspection data in the storage unit 201. The comparison circuit 211 may also display the inspection data on the display unit 202, or output it to the outside via the communication unit 204.

[0060] The position circuit 212 generates position data on the XY plane of the stage 110 based on the data received from the laser measurement system 180 .

[0061] 2. Configuration of illumination optical system and imaging optical system Next, an example of the configuration of the illumination optical system 140 and the imaging optical system 150 will be described with reference to Fig. 2. Fig. 2 is a block diagram of the illumination optical system 140 and the imaging optical system 150.

[0062] First, the configuration of the illumination optical system 140 will be described. As shown in FIG. 2, the illumination optical system 140 includes light sources 301 and 302 , a dichroic mirror 303 , a lens 304 , a slit 305 , a lens 306 , a half mirror 307 , and an objective lens 308 .

[0063] The light sources 301 and 302 emit light to be irradiated onto the mask 2. The wavelengths of the light emitted from the light sources 301 and 302 are different from each other. Either one of the light sources 301 and 302 or both of them can emit light simultaneously. For example, the light source 301 is used for capturing an optical image and detecting the focal position. Depending on the relationship between the wavelength of the light from the light source 301 and the layout of the mask pattern, the accuracy of the focal position detection may be reduced due to the influence of diffracted light of the light reflected by the mask 2. In such a case, the light source 302 is used for the focal position detection. Although the description has been given of having two light sources, the number of light sources may be one (for example, the light source 301), in which case the dichroic mirror 303 is not necessary.

[0064] The dichroic mirror 303 is used as a light separating means for the light sources 301 and 302. The dichroic mirror 303 of this embodiment transmits the light from the light source 301 and reflects the light from the light source 302. Note that the dichroic mirror 303 may reflect the light from the light source 301 and transmit the light from the light source 302.

[0065] The light transmitted through or reflected by the dichroic mirror 303 propagates along the optical axis L 1 and enters the lens 304 .

[0066] A part of the light that passes through the lens 304 passes through the slit 305. The light that passes through the slit 305 is used for detecting the focal position. The light that passes through the lens 304 and the light that passes through the slit 305 enters the lens 306.

[0067] The light refracted by the lens 306 is incident on the half mirror 307. A part of the light incident on the half mirror 307 is reflected and incident on the objective lens 308.

[0068] The objective lens 308 focuses the light on the pattern surface of the mask 2. At this time, the light that has passed through the slit 305 is focused outside the imaging region of the optical image of the mask 2. Note that the objective lens 308 may have a structure in which multiple lenses are arranged in a lens barrel.

[0069] The stage 110 moves in the Z direction so that the focal position of the light that has passed through the objective lens 308 is the pattern surface of the mask 2. In the following description, when limiting the Z direction to a direction moving away from the objective lens 308, it is expressed as a +Z direction, and when limiting the Z direction to a direction moving closer to the objective lens 308, it is expressed as a -Z direction.

[0070] Next, a description will be given of the configuration of the imaging optical system 150. The imaging optical system 150 includes an objective lens 308, half mirrors 307, 314, and 316, lenses 309, 311 to 313, and 315, a mirror 310, slits 317 and 318, a photodiode array 320, and sensors 321 to 323. The lenses 313 and 315, the half mirrors 314 and 316, the slits 317 and 318, and the sensors 321 to 323 are included in an autofocus mechanism.

[0071] A part of the light that is reflected by the mask 2 and passes through the objective lens 308 passes through the half mirror 307 and enters the lens 309. The light that is refracted by the lens 309 becomes approximately parallel to the optical axis.

[0072] A portion of the light that passes through lens 309 passes through lenses 311 and 312. Lenses 311 and 312 focus the light onto a photodiode array 320.

[0073] The photodiode array 320 is a sensor for capturing an optical image. The photodiode array 320 photoelectrically converts the focused light to generate an electric signal. The photodiode array 320 transmits the electric signal to the sensor circuit 160. More specifically, the photodiode array 320 includes an image sensor (not shown). As the image sensor, for example, a line sensor in which CCD cameras as image pickup elements are arranged in a line may be used. An example of the line sensor is a TDI (Time Delay Integration) sensor. For example, the pattern of the mask 2 placed on the stage 110, which is continuously moving, is captured by the TDI sensor.

[0074] Further, a part of the light that has passed through lens 309 is reflected by mirror 310 and enters lens 313. Here, the light reflected by mirror 310 includes light that has passed through slit 305 and been reflected by mask 2. Note that mirror 310 may be a half mirror.

[0075] The light refracted by the lens 313 is incident on the half mirror 314 .

[0076] The light reflected by the half mirror 314 is incident on a sensor 321 .

[0077] The sensor 321 is used to measure the light intensity distribution of the pupil of the illumination optical system 140, i.e., the pupil of the objective lens 308, or the pupil at a position conjugate thereto. The sensor 321 generates an electric signal based on the received light and transmits it to the focal position detection circuit 170. For example, a CCD (Charge Coupled Device) image sensor, which is a two-dimensional sensor, is used as the sensor 321. For example, when the influence of diffracted light can be confirmed from the light intensity measured by the sensor 321, the light source 302 is used for focal position detection.

[0078] Furthermore, the light transmitted through the half mirror 314 passes through a lens 315 and enters the half mirror 316 .

[0079] The light transmitted through the half mirror 316 illuminates the slit 317. The light passing through the slit 317 is incident on the sensor 322. The light reflected by the half mirror 316 illuminates the slit 318. The light passing through the slit 318 is incident on the sensor 323. The slits 317 and 318 are arranged to pass the light that passes through the slit 305 and is reflected by the mask 2. At this time, the slits 317 and 318 are arranged to be located in front of and behind the mask 2 at a conjugate position. The slit 317 may be arranged in front and the slit 318 may be arranged in back, or vice versa. The width of the slits 317 and 318 is preferably half the light beam expanded by the numerical aperture NA of the objective lens 308, that is, half the pupil diameter of the objective lens 308.

[0080] The sensors 322 and 323 are sensors for detecting the focal position. The sensors 322 and 323 generate electrical signals based on the received light and transmit the signals to the focal position detection circuit 170. For the sensors 322 and 323, for example, a photodiode or a photomultiplier tube is used. The focal position detection circuit 170 compares the amount of light in front of the conjugate position with the amount of light in back of the conjugate position to calculate the focal position (amount of deviation from the focal position). The optimal focal position is when the amount of light in front of the conjugate position is equal to the amount of light in back of the conjugate position.

[0081] In the imaging optical system 150, the light from the light source 301 and the light from the light source 302 may be separated, and the focal position may be detected from each of the lights. In this case, for example, a dichroic mirror may be provided between the half mirror 314 and the lens 315. The dichroic mirror transmits the light from the light source 301 and reflects the light from the light source 302. Two focus detection systems each composed of the lens 315, the half mirror 316, the slits 317 and 318, and the sensors 322 and 323 may be provided, and the focal position may be detected from the transmitted light and the reflected light of the dichroic mirror, respectively.

[0082] 3. Mask inspection area Next, an example of the inspection area of ​​the mask 2 will be described with reference to FIG. 3. FIG. 3 is a diagram showing the surface of the mask 2. In the following description, a case will be described in which the mask 2 is scanned in the X direction and a plurality of stripes are arranged side by side in the Y direction. In the X direction, when the direction toward the left side of the paper in FIG. 3 is limited, it is expressed as the -X direction, and when the direction toward the right side of the paper is limited, it is expressed as the +X direction. In addition, in the Y direction, when the direction toward the lower side of the paper in FIG. 3 is limited, it is expressed as the -Y direction, and when the direction toward the upper side of the paper is limited, it is expressed as the +Y direction.

[0083] As shown in Fig. 3, the mask 2 includes an inspection area 400. The inspection area 400 is provided with a pattern (not shown). For example, the inspection area 400 is a transparent area of ​​the mask 2, and the periphery of the inspection area 400 is a light-shielding area. In the reduction projection exposure apparatus, the pattern is exposed by light that has passed through the transparent area. Note that the inspection area 400 may include a part of the light-shielding area.

[0084] The inspection area 400 is virtually divided into a number of stripes SP along the Y direction. The stripes SP have a rectangular shape with a preset width. The ends of adjacent stripes SP in the Y direction may overlap. In the example of FIG. 3, the inspection area 400 is divided into n stripes SP1 to SPn (n is a natural number equal to or greater than 1). The stripes SP1 to SPn are arranged in order in the +Y direction. The XY driver 120 moves the stage 110 so that the stripes SP1 to SPn are scanned continuously.

[0085] More specifically, first, in the stripe SP1, the irradiation area of ​​the light moves in the +X direction. Hereinafter, the movement in the +X direction is also referred to as "moving in the FWD direction". At this time, the stage 110 moves in the -X direction. Hereinafter, the movement in the -X direction is also referred to as "moving in the BWD direction". When the scanning of the stripe SP1 is completed, the scanning of the stripe SP2 is performed. In the scanning of the stripe SP2, the irradiation area moves in the -X direction (BWD direction). At this time, the stage 110 moves in the +X direction (FWD direction). Next, in the scanning of the stripe SP3, the irradiation area moves in the FWD direction. At this time, the stage 110 moves in the -X direction (BWD direction). Next, in the scanning of the stripe SP4, the irradiation area moves in the BWD direction. At this time, the stage 110 moves in the +X direction (FWD direction). In this way, the scanning is performed while the moving direction of the irradiation area is alternately changed between the FWD direction and the BWD direction until the scanning of the stripe SPn is completed. That is, if the stripe SP is an odd number, scanning is performed in the FWD direction, and if the stripe SP is an even number, scanning is performed in the BWD direction.

[0086] 4. Overall flow of the inspection process Next, an example of the overall flow of the inspection process will be described with reference to Fig. 4. Fig. 4 is a flowchart of the inspection process.

[0087] 4, the control computer 200 first controls the image acquisition mechanism 10 to execute a calibration (step S1). Through the calibration, the pixel values ​​(grayscale values) of the optical image acquired by the sensor circuit 160 are adjusted.

[0088] Next, the control computer 200 executes a scan to obtain an inspection image (optical image) of the mask 2 (step S2). The obtained optical image is transmitted to the comparison circuit 211.

[0089] The unfolding circuit 209 executes unfolding processing of the design data 220 (step S3). More specifically, the unfolding circuit 209 reads out the design data 220 stored in the storage unit 201. Then, the unfolding circuit 209 unfolds (converts) the design data 220 into, for example, 8-bit image data (unfolded image). The unfolding circuit 209 transmits the generated unfolded image to the reference circuit 210.

[0090] The reference circuit 210 generates a reference image (step S4). The reference circuit 210 transmits the generated reference image to the comparison circuit 211. Note that the order of obtaining the inspection image and generating the reference image may be reversed, or they may be performed simultaneously.

[0091] The comparison circuit 211 performs a comparison process (step S5). More specifically, the comparison circuit 211 first aligns the optical image with the reference image, and aligns the pattern in the optical image with the pattern in the reference image. Next, the comparison circuit 211 compares the optical image with the reference image. The comparison circuit 211 calculates the difference in pixel value (gradation value) of each pixel, and if the gradation value difference is equal to or greater than a preset threshold value, it determines that the pixel is defective.

[0092] The control computer 200 outputs the comparison result (inspection data) (step S6). The control computer 200 stores the inspection result in the storage unit 201. The control computer 200 may display the inspection result on the display unit 202, or may output the inspection result to an external device (e.g., a review device, etc.) via the communication unit 204.

[0093] 5 Focus position adjustment Next, the focus position adjustment will be described. In this embodiment, when scanning is performed, focus position adjustment (adjustment of the height position of the stage 110) is performed based on the focus offset value and the autofocus control signal. The focus offset value is set based on the focus position data FD obtained by scanning an arbitrary stripe SP in the same direction. More specifically, for example, when scanning a stripe SPn, the focus offset value is set based on the focus position data FD(n-2) of the previous stripe SP(n-2) scanned in the same direction. For this reason, in this embodiment, before scanning the stripes SP1 and SP2, a dummy scan corresponding to the progress direction of each scan is performed. In the dummy scan, the focus position data FD is acquired, and no optical image is acquired. For example, when the variable n is a value less than n=1 corresponding to the stripe SP1, that is, when n=-1 or n=0 is set, the dummy scan is performed.

[0094] 5.1 Flow of optical image acquisition First, an example of the flow of optical image acquisition focusing on scanning will be described with reference to Fig. 5. Fig. 5 is a flowchart showing the flow of optical image acquisition.

[0095] As shown in FIG. 5, first, the control computer 200 sets a variable n=-1 (step S101). Next, the control computer 200 executes a dummy scan in the FWD direction (step S102). The dummy scan in the FWD direction corresponds to stripe SP1. For example, stripe SP1 is used for the dummy scan in the FWD direction. At this time, an optical image of stripe SP1 is not acquired.

[0096] Next, the FD generation circuit 208 generates approximate data of the Z coordinate (height position of the stage 110) by moving average from the scan result. The FD generation circuit 208 generates focal position data FD(-1) based on the approximate data of the Z coordinate (step S103). The focal position data FD(-1) is stored in the storage unit 201.

[0097] Next, the control computer 200 counts up the variable n, setting n=0 (step S104). Next, the control computer 200 executes a dummy scan in the BWD direction (step S105). The dummy scan in the BWD direction corresponds to stripe SP2. Therefore, for example, stripe SP2 is used for the dummy scan in the FWD direction.

[0098] Next, the FD generation circuit 208 generates approximate data of the Z coordinate by moving average from the scan result. The FD generation circuit 208 generates focal position data FD0 based on the approximate data of the Z coordinate (step S106). The focal position data FD0 is stored in the storage unit 201.

[0099] Next, the control computer 200 counts up the variable n to n=n+1 (step S107).

[0100] Next, the offset setting circuit 230 reads out the focal position data FD(n-2) from the storage unit 201. The offset setting circuit 230 sets a focus offset value in the scan of the stripe SPn based on the focal position data FD(n-2) (step S108). At this time, the offset setting circuit 230 executes pre-reading of the focal position data FD. In other words, the offset setting circuit 230 shifts the X-coordinate data of the focal position data FD in the moving direction of the stage 110. More specifically, for example, in the stripe SP1, a scan is executed in the FWD direction. That is, the stage 110 moves in the -X direction. In such a case, the offset setting circuit 230 sets a focus offset value based on the result of shifting the coordinate data of the focal position data FD(-1), more specifically, the value of the X-coordinate, in the -X direction. Also, for example, in the stripe SP2, a scan is executed in the BWD direction. That is, the stage 110 moves in the +X direction. In such a case, the offset setting circuit 230 sets a focus offset value based on the result of shifting the X coordinate value of the focus position data FD0 in the +X direction. The shift amount is determined based on the scan speed and the autofocus tracking speed. Similarly, for example, from stripe SP3 onwards (n=3 or more), the offset setting circuit 230 sets a focus offset value based on the result of shifting the focus position data FD of the stripe SP scanned two stripes ago.

[0101] When setting a focus offset value, focus position data FD to which pre-reading is applied and focus position data FD to which pre-reading is not applied may be mixed. For example, the offset setting circuit 230 may execute pre-reading for focus position data FD(-1) and FD0 acquired by dummy scan, and may not execute pre-reading for focus position data FDn (n>1) acquired by other scans.

[0102] In the present embodiment, the offset setting circuit 230 reads out the focal position data FD(n-2) from the storage unit 201, but this is not limiting as long as the scanning direction is the same. For example, with reference to the design data 220, if the stripe SP(n-4) is more similar to the pattern of the stripe SPn than the stripe SP(n-2), the offset setting circuit 230 may read out the focal position data FD(n-4) from the storage unit 201.

[0103] Next, the control computer 200 executes a scan of the stripe SPn (step S109). At this time, the Z drive unit control circuit 207 controls the height position (Z coordinate) of the stage 110 based on the focus offset value and the focal position adjustment signal of the focal position detection circuit 170. The optical image data acquired by the scan is transmitted to the comparison circuit 211.

[0104] Next, the FD generation circuit 208 generates approximate data of the Z coordinate by moving average from the scan result. The FD generation circuit 208 generates focal position data FDn based on the approximate data of the Z coordinate (step S110). The focal position data FDn is stored in the storage unit 201.

[0105] The control computer 200 checks whether the scanned stripe SPn is the last one (step S111). If it is not the last stripe SP (step S111_No), the control computer 200 proceeds to step S107 and counts up the variable n. On the other hand, if it is the last stripe SP (step S111_Yes), the control computer 200 ends the acquisition of the optical image.

[0106] 5.2 Specific examples of approximate data for Z coordinates Next, a specific example of the approximation data of the Z coordinate will be described with reference to Fig. 6. Fig. 6 is a diagram showing a specific example of the approximation data of the Z coordinate. The example in Fig. 6 shows the X coordinate and the Z coordinate of the stage 110 in one stripe SP.

[0107] The graph in the upper part of Fig. 6 shows the coordinates of the stage 110 when scanning is performed. The fact that the Z coordinate generally rises toward the +X direction indicates the influence of distortion of the mask 2. In this example, there are steep steps at the coordinates X1 and X2.

[0108] The graph in the lower part shows two pieces of approximate data by two kinds of calculations for the coordinates shown in the graph in the upper part. The approximate data shown by the solid line shows the case where the FD generation circuit 208 of this embodiment calculates the approximate data by moving average. The dashed line shows the case where the approximate data is calculated by polynomial approximation as a comparative example. When the polynomial approximation of the comparative example is used, if the degree of the polynomial is low, the step between X1 and X2 may not be reflected. In contrast, the moving average allows the step to be reflected in the approximate data. In the moving average, the number of pieces of data used to calculate the average value of the Z coordinate at each X coordinate can be set arbitrarily. It can be set appropriately according to the noise of the Z coordinate, etc.

[0109] 5.3 Example of pre-reading focus position data Next, a specific example of pre-reading of focus position data FD will be described with reference to Fig. 7 and Fig. 8. Fig. 7 is a diagram showing an example of pre-reading of focus position data FD(-1) when stripe SP1 is scanned in the FWD direction. Fig. 8 is a diagram showing an example of pre-reading of focus position data FD0 when stripe SP2 is scanned in the BWD direction.

[0110] First, the case where the stripe SP1 is scanned in the FWD direction will be described. 7 shows a part of the cross section of the scanned mask 2. The graph in the middle shows the relationship between the Z and X coordinates of the stage 110 based on the dummy scan of stripe SP1. The graph in the bottom shows the relationship between the Z and X coordinates of the stage 110 based on the scan of stripe SP1.

[0111] For example, a protrusion 500 (e.g., a pattern) with a height T1 exists between X coordinates P1 and P2 of the mask 2. A dummy scan in the FWD direction is executed for such a location. That is, the stage 110 is moved in the -X direction. Note that the focus offset value at this time is constant at Z0 regardless of the X coordinate. Then, in the focal position data FD(-1), an autofocus tracking delay occurs in the +X direction with respect to the X coordinate of the actual protrusion 500. More specifically, in the X coordinate P1, the Z coordinate of the surface of the mask 2 fluctuates (rises) by +T1. On the other hand, in the focal position data FD(-1), while the X coordinate transitions from P1 to P1+d, the Z coordinate transitions from Z0 to Z0+T1. That is, an autofocus tracking delay of magnitude |d| occurs in the +X direction. Similarly, in the X coordinate P2, the Z coordinate of the surface of the mask 2 fluctuates (descends) by -T1. In contrast, in the focus position data FD(-1), while the X coordinate transitions from P2 to P2+d, the Z coordinate transitions from Z0+T1 to Z0. That is, an autofocus tracking delay of magnitude |d| occurs in the +X direction. Based on this result, the focus position data FD(-1) is generated. Therefore, the focus position data FD(-1) includes coordinate data in which an autofocus tracking delay has occurred.

[0112] When scanning SP1, the offset setting circuit 230 uses the focus position data FD(-1) read from the storage unit 201 to set a focus offset value used in scanning the stripe SP1. At this time, the offset setting circuit 230 reads ahead the focus position data FD(-1). More specifically, in the case of scanning in the FWD direction, the offset setting circuit 230 shifts the X coordinate data in the -X direction. For example, if the magnitude of the shift amount is |s|, the offset setting circuit 230 sets the data obtained by subtracting |s| from the X coordinate of the focus position data FD(-1) as the focus offset value. The shift amount |s| is a value equal to or less than the tracking delay amount |d|.

[0113] As a result, in scanning stripe SP1, the Z coordinate can start to change based on the focus offset value before the Z coordinate is changed by the autofocus control signal. For example, in the dummy scan, the Z coordinate change starts from coordinate P1, but in the scan, it starts from coordinate P1-s. As a result, the autofocus tracking delay is reduced by the shift amount |s|.

[0114] Next, a case where the stripe SP2 is scanned in the BWD direction will be described.

[0115] 8 shows a part of the cross section of the scanned mask 2. The graph in the middle shows the relationship between the Z and X coordinates of the stage 110 based on the dummy scan of stripe SP2. The graph in the bottom shows the relationship between the Z and X coordinates of the stage 110 based on the scan of stripe SP2.

[0116] In the example of FIG. 8, a dummy scan in the BWD direction is performed. That is, the stage 110 is moved in the +X direction. Note that the focus offset value at this time is constant at Z0 regardless of the X coordinate. Then, in the focal position data FD0, an autofocus tracking delay occurs in the -X direction with respect to the X coordinate of the actual protrusion 500. More specifically, in the X coordinate P2, the Z coordinate of the surface of the mask 2 fluctuates (rises) by +T1. In contrast, in the focal position data FD0, while the X coordinate transitions from P2 to P2-d, the Z coordinate transitions from Z0 to Z0+T1. That is, an autofocus tracking delay of magnitude |d| occurs in the -X direction. Similarly, in the X coordinate P1, the Z coordinate of the surface of the mask 2 fluctuates (descends) by -T1. In contrast, in the focal position data FD0, while the X coordinate transitions from P1 to P2-d, the Z coordinate transitions from Z0+T1 to Z0. That is, an autofocus tracking delay of magnitude |d| occurs in the -X direction. Based on this result, the focus position data FD0 is generated. Therefore, the focus position data FD0 includes coordinate data in which an autofocus tracking delay has occurred.

[0117] When scanning SP2, the offset setting circuit 230 uses the focus position data FD0 read from the storage unit 201 to set a focus offset value used in scanning the stripe SP2. At this time, the offset setting circuit 230 reads ahead the focus position data FD0. More specifically, in the case of scanning in the BWD direction, the offset setting circuit 230 shifts the X coordinate data in the +X direction. The offset setting circuit 230 adds |s| to the X coordinate value of the focus position data FD0 and sets the data as the focus offset value.

[0118] As a result, the Z coordinate change that started from the coordinate P2 in the dummy scan starts from the coordinate P2+s in the scan, so the tracking delay is reduced by the shift amount |s|.

[0119] 6. Effects of this embodiment In the configuration according to this embodiment, the inspection device includes an FD generation circuit that calculates approximate data of the Z coordinate by moving average from the scan result of the stripe SP and generates focal position data FD using the approximate data, and an offset setting circuit that reads (shifts) the focal position data in advance in the moving direction of the stage 110 to set a focus offset value. By calculating the approximate data by moving average, the inspection device can calculate approximate data in which the influence of noise is reduced and information on steep steps is reflected. In addition, by reading the focal position data in advance and setting the focus offset value, the inspection device can start moving the height position of the stage 110 based on the focus offset value before moving the height position of the stage 110 by the autofocus control signal. This can reduce the tracking delay of the autofocus control signal. Therefore, the defocus in the optical image can be reduced, making it easier to capture a fine pattern and improving the detection accuracy of pattern defects.

[0120] 7.Other Although some embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and spirit of the invention, and are included in the scope of the invention and its equivalents described in the claims. [Explanation of symbols]

[0121] 1... inspection apparatus, 2... mask, 10... image acquisition mechanism, 20... control mechanism, 110... stage, 120... XY drive unit, 121... X-axis motor, 122... Y-axis motor, 130... Z drive unit, 131... Z-axis actuator, 140... illumination optical system, 150... imaging optical system, 160... sensor circuit, 170... focal position detection circuit, 180... laser measurement system, 190... autoloader, 200... control computer, 201... memory unit, 202... display unit, 203... input unit, 204... communication unit, 205... autoloader control circuit, 206... XY drive unit control circuit, 207... Z drive unit control circuit, 208... FD generation circuit, 209... Expansion circuit, 210...reference circuit, 211...comparison circuit, 212...position circuit, 220...design data, 221...inspection conditions, 222...inspection data, 223...inspection program, 230...offset setting circuit, 301, 302...light source, 303...dichroic mirror, 304, 306, 309, 311-313, 315...lens, 305, 317, 318...slit, 307, 314, 316...half mirror, 308...objective lens, 310...mirror, 320...photodiode array, 321-323...sensor, 400...inspection area, 500...protrusion, L1...optical axis, SP1-SPn...stripes.

Claims

1. A stage on which a sample is placed; an illumination optical system that irradiates a light used for scanning when an inspection area of ​​the sample is virtually divided into a plurality of stripes and scanned for each stripe; an imaging optical system including a first sensor used for detecting a focal position of the light, the imaging optical system forming an image of the light irradiated onto the sample on the first sensor; a detection circuit that detects the focal position of the light based on the light received by the first sensor and generates an autofocus control signal based on the detected focal position; a generating circuit for generating focal position data based on coordinate data of the sample for each stripe based on a result of scanning; a setting circuit that sets a focus offset value based on a result of shifting the coordinate data of the focal position data in the moving direction of the stage by using a shift amount determined by a scan speed and an autofocus tracking speed; a control circuit that controls a height position of the stage based on the autofocus control signal and the focus offset value so that the focal position of the light is located on the surface of the sample; Equipped with The setting circuit includes: when scanning a first stripe of the plurality of stripes, the focus offset value corresponding to the first stripe is set based on a result of shifting the coordinate data of the focus position data based on a result of dummy scanning the first stripe in the moving direction of the stage relative to the first stripe; when scanning a second stripe of the plurality of stripes, the focus offset value corresponding to the second stripe is set based on a result of shifting the coordinate data of the focus position data based on a result of dummy scanning the second stripe in the moving direction of the stage relative to the second stripe; When scanning an n-th stripe (n is a natural number equal to or greater than 3) of the plurality of stripes, the focus offset value corresponding to the n-th stripe is set based on a result of shifting the coordinate data of the focus position data based on a result of scanning the (n-2)-th stripe in the moving direction of the stage relative to the n-th stripe. Inspection equipment.

2. The moving direction of the stage relative to the second stripe is opposite to the moving direction of the stage relative to the first stripe.

2. The inspection device according to claim 1.

3. the generation circuit generates approximate data of the height position of the stage by a moving average for each of the stripes based on a result of dummy scanning or scanning the plurality of stripes.

3. The inspection device according to claim 1 or 2.

4. The moving direction of the stage relative to the (n-2) stripe is the same as the moving direction of the stage relative to the n stripe.

2. The inspection device according to claim 1.

5. The imaging optical system further includes a second sensor for capturing an optical image, When scanning the sample, an optical image is taken; When the sample is dummy scanned, the optical image is not captured.

2. The inspection device according to claim 1.

6. A method for adjusting a focal position of light in which an inspection area of ​​a sample placed on a stage is virtually divided into a plurality of stripes and scanned for each stripe, the method comprising the steps of: dummy scanning a first stripe of the plurality of stripes; generating (-1)-th focal position data based on a result of dummy scanning the first stripe; dummy scanning a second stripe of the plurality of stripes; generating zeroth focus position data based on a result of dummy scanning the second stripe; when scanning an n-th stripe (n is a natural number) of the plurality of stripes, a step of shifting the (n-2)-th coordinate data of the (n-2)-th focal position data in the moving direction of the stage relative to the n-th stripe by a shift amount determined based on a scan speed and a tracking speed of an autofocus, and setting a focus offset value of the n-th stripe based on the result of the shift; a step of controlling a height position of the stage based on the focus offset value and a result of detecting the focal position of the light so that the focal position of the light is on the surface of the sample, and scanning the nth stripe; generating n-th focal position data from a result of scanning the n-th stripe; The focus position adjustment method includes:

7. The moving direction of the stage relative to the second stripe is opposite to the moving direction of the stage relative to the first stripe. The focus position adjusting method according to claim 6 .

8. in the step of generating the (-1) focal position data, approximate data of the height position of the stage in the first stripe is generated by a moving average based on the result of the dummy scan of the first stripe, in the step of generating the zero focal position data, the approximate data of the height position of the stage in the second stripe is generated by the moving average based on the result of dummy scanning of the second stripe, In the step of generating the nth focal position data, the approximate data of the height position of the stage in the nth stripe is generated by the moving average based on the result of scanning the nth stripe.

8. The method for adjusting a focal position according to claim 6.

9. The moving direction of the stage with respect to the (n-2)th stripe is the same as the moving direction of the stage with respect to the nth stripe. The focus position adjusting method according to claim 6 .

10. In the step of scanning the nth stripe, an optical image is taken, In the step of dummy scanning the first stripe and the step of dummy scanning the second stripe, the optical image is not captured. The focus position adjusting method according to claim 6 .

Images