Back-pumped semiconductor membrane laser.

Abstract

The present disclosure relates, in one aspect, to a semiconductor film laser chip (500), comprising: a planar-shaped laser medium (510) including a top surface (511a) and a bottom surface (511b) opposite the top surface (511a), the laser medium (510) being configured to emit electromagnetic radiation (170) at a laser wavelength λ1; a first heat spreader (520a, 520b) bonded to one of the top surface (511a) and the bottom surface (511b) of the laser medium (510); a first dielectric layer (535b) disposed on the lower surface (511b) of the laser medium (510), or disposed on the lower surface (525b) of the first heat spreader (520a, 520b) when the first heat spreader (520a, 520b) is bonded to the lower surface (511b) of the laser medium (510), wherein the first dielectric layer (535b) is reflective to the laser wavelength λ1.

Description

[Technical field]

[0001] The present invention is in the field of photonics, and in particular in the field of semiconductor lasers. [Background technology]

[0002] As is known in the art, optically pumped semiconductor lasers, for example implemented as vertical emitting semiconductor lasers, provide high output power and excellent beam characteristics over a wide wavelength range. In addition, the provision of an external cavity located outside the semiconductor laser chip allows optical elements to influence how the semiconductor laser operates to achieve, for example, narrow linewidth, tunable emission wavelength, efficient frequency conversion, and / or ultrashort pulses of laser light emission.

[0003] However, depending on the emission wavelength of the laser light, and therefore also depending on the material system of the gain medium of the semiconductor laser, the realization of this laser concept is currently only possible through great technical and financial efforts.Currently, it is necessary to use a large pump light source, and an expensive separate heat spreader needs to be installed to dissipate the heat energy generated in the semiconductor laser.The thermal contact between the semiconductor gain medium and the heat spreader is not good in the semiconductor laser of the prior art.

[0004] One of the reasons for this large technical effort is the lack of availability of inexpensive pump sources for semiconductor lasers. Since the pump source requires good beam characteristics over a wide wavelength range, expensive pump optics need to be used to focus the pump beam from the pump laser to the pump spot of the semiconductor laser. However, the size of the focusing lens of the pump optics in combination with the required minimum distance from the focusing lens to the pump spot is geometrically limited by the 90° angle between the gain medium of the semiconductor laser and the generated laser beam in the resonator.

[0005] This is illustrated in FIG. 1, which shows a semiconductor disk laser having a semiconductor disk laser chip 10 with a heat spreader 20, an active region 30 with an gain medium, and a Bragg reflector 40. Pump laser light 50 from a pump source laser 60 is incident on a pump spot 35 from a side surface 15. The pump laser light 50 causes lasing in the active region 30, and laser light 70 emerges from the top surface 12 of the semiconductor disk laser chip 10. The laser light 75 is coupled out of the semiconductor disk laser by a mirror 80. To achieve lasing in the active region 30, an expensive, well-focusable pump source laser must be used, or the active region 30 will be pumped over too large an area. As a result, more pump power is required for the pump laser light 50 to achieve the required power density in the active region 30 to cause lasing, which in turn generates more heat in the active region 30, which in turn requires an increase in the pump power density, further reducing the output power of the laser medium in the active region 30.

[0006] Another problem concerns the thermal management of such semiconductor lasers, especially optically pumped vertical emitting semiconductor lasers. There are three different approaches that can be adopted to deal with the distribution of heat (thermal energy) in such semiconductor lasers. The first solution is shown in FIG. 1, where the heat from the gain medium of the active region 30 is transferred to the heat spreader 20 (for example made of diamond) through a semiconductor mirror (Bragg reflector 40). Depending on the wavelength range of the semiconductor disk laser and therefore the material system of the semiconductor mirror, the heat dissipation is very limited due to the low heat transfer rate through the Bragg reflector.

[0007] Another solution is shown in FIG. 2, which shows a semiconductor disk laser with an intracavity heat spreader 220. The heat spreader 220 (which is also diamond with very good optical properties) is attached directly to the gain medium of the active region 30. This attachment is done by purely mechanical pressure or by the presence of an intermediate layer that ensures a permanent mechanical contact between the active region 30 and the heat spreader 220. The Bragg reflector 40 is supported on the substrate 200. In both cases, the heat dissipation at the interface 225 between the active region 30 and the heat spreader 220 is also limited.

[0008] A third solution is shown in FIG. 3, which shows an obliquely (or gradient) pumped semiconductor membrane laser. In this newer laser concept, the active region 30 with the gain medium is contacted with an upper heat spreader 320a and a lower heat spreader 320b on either side of the active region 30. This concept already provides a significant improvement in heat dissipation compared to the approach shown in FIG. 2. As an alternative to diamond, the use of silicon carbide as a heat spreader has also been demonstrated. The silicon carbide is in direct contact with the gain medium of the active region 30 by plasma-induced bonding (see Non-Patent Document 1). However, the geometric limitations of the pump optics discussed above still exist in this third solution.

[0009] The optically pumped vertically emitting semiconductor laser chip is mounted in or on a so-called submount, as described below, to form an amplifier unit that acts as a heat sink coupled to the heat spreader of the semiconductor laser. All the discussed solutions have limitations in upscaling to low-cost manufacturing processes suitable for mass production, since each individual one of the amplifier units needs to be manufactured separately. Therefore, for a large number of emission wavelengths, the prior art solutions only allow the fabrication of optically pumped vertically emitting semiconductor lasers with at least one of the following limitations: low optical output power due to poor thermal management of the amplifier unit, poor optical pump adaptation to the resonator geometry, and high cost of the individual laser systems due to complex thermal management that requires specialized pump sources or pump optics that are not cost-effective or expensive for large volumes. As a result, the prior art solutions do not offer any advantages (or even disadvantages) in these wavelength ranges compared to other concepts already commercially available.

[0010] Therefore, the prior art solutions are not attractive for a large market and only the solutions shown in Figures 1 and 2 are available at individual emission wavelengths and at high unit prices.

[0011] Prior Art There are several known patents and literature articles that describe optically pumped vertically emitting semiconductor lasers and their fabrication. For example, US Pat. No. 5,399,633 teaches the use of a diamond heat spreader. The design shown in this patent is not amenable to mass production on a wafer scale.

[0012] US Patent No. 5,999,363 teaches the use of a dielectric layer instead of a heat spreader as a reflector in direct contact with the gain medium for efficient heat dissipation. The gain medium is a III-nitride on a GaN substrate, but the application does not teach complete substrate removal. The laser wavelengths are from 370 nm to 550 nm.

[0013] Characteristic document 3 teaches a high contrast grating as a reflector in which diamond is used as a heat spreader. However, this structure is not suitable for mass production on a wafer scale. Another structure, which is also not suitable for mass production on a wafer scale, is known from patent document 4, in which a mechanical device is used to bring the gain medium into contact with the heat spreader by pressure. Similarly, patent document 5 also teaches the use of a mechanical device to bring the gain medium into contact with the heat spreader by pressure ("in physical contact with but not bonded to").

[0014] US Pat. No. 5,399,433 teaches a complete amplifier chip with Bragg mirror (DBR) and substrate. The substrate is either intact or has an aperture. There is no plasma-induced wafer bonding, but purely mechanical contact or liquid capillary bonding.

[0015] US Pat. No. 5,999,363 teaches a solid-state laser active medium that includes an optical gain material and a heat sink, where the heat sink is transparent. A Bragg mirror (DBR) is present between the gain medium and either a heat spreader or an external mirror. This results in a reduction in heat dissipation from the gain medium or requires limiting the distance between the pump optics and the gain medium.

[0016] The aforementioned non-patent document 1 does not teach the use of a dielectric coating, nor does it mention a dielectric coating with different functions at two different wavelengths. The optically pumped vertical emitting laser in this non-patent document is pumped obliquely from the side. The amplifier unit is clamped in a holder.

[0017] 2006 does not teach the removal of the substrate. The light from the pump is pumped through the substrate. The diamond heat spreader is bonded to the heat spreader using liquid capillary bonding rather than using plasma excitation. Mass production of semiconductor disk lasers on a wafer scale is not possible. [Prior art documents] [Patent documents]

[0018] [Patent Document 1] U.S. Patent No. 8,170,073B2 (corresponding to PCT Application No. WO2011 / 031718A2) [Patent Document 2] U.S. Patent No. 9,124,062B2 [Patent Document 3] US Patent Application Publication No. 2013 / 0028279A1 [Patent Document 4] International Publication No. WO2005036702A2 [Patent Document 5] U.S. Patent No. 6,385,220B1 [Patent Document 6] European Patent No. 1720225B1 [Patent Document 7] European Patent No. 2996211A1 [Non-patent literature]

[0019] [Non-Patent Document 1] Z. Yang et al., “16W DBR-free membrane semiconductor disk laser with dual-SiC heatspreader”, Electronics Letters, Vol. 54, No. 7, pp. 430-432 (2018) [Non-Patent Document 2] Cho et al., "Compact and Efficient Green VECSEL Based on Novel Optical End-Pumping Scheme", IEEE Photonics Technology Letters, Vol. 19, No. 17, pp. 1325-1327 (2007) Summary of the Invention [Problem to be solved by the invention]

[0020] The semiconductor membrane lasers described herein overcome the prior art problem of limited geometric possibilities for pumping semiconductor membrane lasers, while at the same time enabling a low-cost mass production process for the entire amplifier unit. [Means for solving the problem]

[0021] In this disclosure, we describe a novel laser concept (back-pumped semiconductor membrane laser) that enables special pump geometries.

[0022] In one embodiment, the present disclosure relates to a semiconductor membrane laser chip. The semiconductor membrane laser chip includes a planar shaped laser medium including an upper surface and a lower surface. The lower surface is opposite to the upper surface. The laser medium is configured to emit electromagnetic radiation at a laser wavelength λ1. The semiconductor membrane laser chip further includes a first heat spreader disposed or bonded to one of the upper surface and the lower surface of the laser medium, and further includes a first dielectric layer disposed on the lower surface of the laser medium. Alternatively, the first dielectric layer is disposed on the lower surface of the heat spreader when the first heat spreader is bonded to the lower surface of the laser medium. Here, the first dielectric layer is disposed on the surface of the heat spreader facing away from the laser medium.

[0023] In either method, and in both alternatives, the first dielectric layer is reflective to the laser wavelength λ1. Typically, the first dielectric layer is highly reflective to the laser wavelength λ1. Typically, the first dielectric layer exhibits a reflectivity to the laser wavelength of at least 95%, at least 97%, at least 99%, at least 99.5%, or at least 99.9%.

[0024] In a typical embodiment, the first dielectric layer provides the mirror or mirror surface of the cavity of the semiconductor membrane laser chip. The first dielectric layer is appropriately designed to allow the optical pumping of the laser medium through each dielectric layer. In this way, the distance between the pump laser or pump laser beam and the semiconductor membrane laser chip and the somewhat close arrangement is optimized, for example reduced.

[0025] In some examples, a so-called backside pumped semiconductor membrane laser chip is provided by utilizing a properly designed first dielectric layer that is reflective to the laser wavelength and at least partially transparent to the electromagnetic radiation emitted from the pump laser. As a result, the direction of the laser beam coming from the pump light source or pump laser can be substantially parallel to the direction of the laser beam emitted from the laser medium of the semiconductor membrane laser chip.

[0026] Such mutual alignment is particularly beneficial for miniaturizing the respective laser devices, as well as for eliminating final focusing or collimating optics that were previously necessary to focus or collimate the pump laser onto or into the laser medium of the semiconductor membrane laser chip.

[0027] The laser medium usually includes multiple layers of various semiconductor materials or material combinations. The heat spreader usually includes a planar monocrystalline material that exhibits a well-defined thermal conductivity and provides for dissipation of the thermal energy generated or emitted in the laser medium. The first dielectric layer usually also includes multiple individual layers of different materials, resulting in a dielectric layer structure that is characterized by a well-defined predetermined optical reflectivity, especially for the laser wavelength.

[0028] According to another example, the laser or laser medium is configured to emit electromagnetic radiation at a pump wavelength λ2 when optically pumped with electromagnetic radiation at that laser wavelength. Typically, a light source is provided that is configured to generate and emit electromagnetic radiation at a desired wavelength into or onto the laser medium. In some examples, the pump light source includes a pump laser, for example an edge-emitting laser diode or multiple laser diode bars.

[0029] Typically, the first dielectric layer is at least partially transparent to the pump wavelength λ2 such that the laser medium is optically pumped by electromagnetic radiation at the pump wavelength λ2 propagating through the first dielectric layer.

[0030] According to another example, the first dielectric layer is transparent to electromagnetic radiation of pump wavelength λ2. Therefore, the first dielectric layer exhibits a relatively high reflectivity for the laser wavelength and at the same time exhibits a sufficient transmittance for electromagnetic radiation of pump wavelength λ2. In this way, the first dielectric layer provides a dual function. On the one hand, the first dielectric layer serves as a mirror or mirror layer of the cavity of the semiconductor film laser chip. On the other hand, the first dielectric layer is at least partially transparent to electromagnetic radiation of pump wavelength λ2. Therefore, the laser medium of the semiconductor film laser chip is pumped through the first dielectric layer.

[0031] Typically, the pump wavelength is shorter than the laser wavelength. Typically, the pump wavelength is at least 20 nm shorter than the laser wavelength of the electromagnetic radiation generated or emitted by the laser medium when suitably pumped with electromagnetic radiation at the pump wavelength.

[0032] In some examples, the laser wavelength is between 850 nm and 1200 nm, where the pump wavelength may be about 808 nm, and in other examples, the laser wavelength is in the range of 630 nm to 790 nm, where the pump wavelength may be about 520 nm.

[0033] According to another example, the first dielectric layer comprises a first transmittance T1 for the laser wavelength λ1 and further comprises a second transmittance T2 for another, hence third, wavelength λ3, the second transmittance T2 being greater than the first transmittance T1 and the third wavelength λ3 being shorter than the laser wavelength λ1.

[0034] In other words, and taking into account the laser wavelength λ1 for which the first dielectric layer comprises a relatively high reflectivity, the first dielectric layer has a reduced reflectivity for electromagnetic radiation having a wavelength shorter than the laser wavelength λ1. Thus, the first dielectric layer exhibits a relatively high reflectivity in particular for this laser wavelength, and has a desired reduced reflectivity and therefore sufficient transmission for the pump wavelength λ2.

[0035] It should be noted that, with respect to the present disclosure, the upper and lower surfaces of the laser medium, the upper and lower surfaces of the heat spreader, the upper and lower surfaces of the dielectric layer and / or substrate, or the upper and lower surfaces of any other layer are simply synonymous with the opposing surfaces of the respective layer or layer structure. In general, the semiconductor film laser chip may be oriented upside down, in which case the lower surface becomes the upper surface; and vice versa. In general, the upper surface of the layer or medium is considered to be a first surface, and the lower surface of the respective layer or medium is considered to be a second surface opposite the first surface.

[0036] According to another example, the semiconductor membrane laser chip further includes a second dielectric layer disposed on the top surface of the laser medium or disposed on the top surface of at least one heat spreader. The second dielectric layer is disposed on the top surface of the laser medium when the heat spreader is disposed on or bonded to the bottom surface of the laser medium. The second dielectric layer is disposed on the top surface of the at least one heat spreader when the at least one heat spreader is bonded to the top surface of the laser medium. Here, the second dielectric layer is disposed on or deposited on the top surface of the heat spreader facing away from the top surface of the underlying laser medium.

[0037] The second dielectric layer includes a well-defined transmittance for the laser wavelength λ1. For that laser wavelength, the second dielectric layer includes an increased transmittance compared to the first dielectric layer. Therefore, for that laser wavelength, the transmittance of the second dielectric layer is greater than the transmittance of the first dielectric layer. For that laser wavelength, the first dielectric layer is highly reflective, while the second dielectric layer can be highly transparent for that laser wavelength. Typically, the second dielectric layer functions or operates as a kind of anti-reflection coating of the layer stack of the semiconductor membrane laser chip to avoid any intra-cavity reflection of the semiconductor membrane laser chip.

[0038] According to another example, the semiconductor membrane laser chip further includes a second heat spreader bonded to the other of the upper and lower surfaces of the laser medium. In some examples, when the first heat spreader is bonded to the upper surface of the laser medium, the second heat spreader is bonded to the lower surface of the laser medium. In some examples where the first heat spreader is bonded to the upper surface of the laser medium and the first dielectric layer is disposed on the lower surface of the laser medium, the second heat spreader is disposed on the lower surface of the first dielectric layer facing away from the laser medium.

[0039] In other examples, it is even contemplated that the laser medium is directly or indirectly sandwiched between the first and second heat spreaders, where the first dielectric layer is deposited or disposed on an outer surface of the first or second heat spreader facing away from the laser medium. In some examples, it is contemplated that the laser medium is sandwiched between the first and second heat spreaders, and that the first and second heat spreaders are at least partially sandwiched by the first and second dielectric layers.

[0040] In practice, and in some examples, the layer stack of the semiconductor membrane laser chip may include a first dielectric layer as a bottom layer. On top of the first dielectric layer, one of the first and second heat spreaders is provided. On each of the heat spreaders, a laser medium is provided. On top of the laser medium, the other of the first and second heat spreaders is provided, and on top of each of the heat spreaders, a second dielectric layer is provided.

[0041] According to another example, the semiconductor membrane laser chip includes at least a first contact layer, for example implemented as a first metal contact layer. The first contact layer is disposed adjacent to one of the upper and lower surfaces of the laser medium. Alternatively, the first contact layer is disposed adjacent to a surface of one of the first and second heat spreaders facing away from the laser medium. The first contact layer typically includes a metal or metal layer and serves to provide good thermal contact with the heat spreader and / or the laser medium to facilitate dissipation of thermal energy emitted or generated from the laser medium when optically pumped with electromagnetic radiation of pump wavelength λ1.

[0042] In some instances, only a single contact layer is provided, disposed immediately adjacent to one of the heat spreader and the laser medium.

[0043] In another example of the semiconductor membrane laser chip, at least one of the first and second contact layers includes an opening, aperture, or recess in which one of the first and second dielectric layers is disposed. In some examples, substantially the entire outer surface of the laser medium and / or the heat spreader is covered by the contact layers. Only in the active lateral region of the laser medium, i.e., only in the region of the layer of the laser medium that is optically pumped by electromagnetic radiation at the pump wavelength and / or emits radiation at the laser wavelength λ1, are apertures or openings provided in the respective contact layers to allow unobstructed optical pumping of the laser medium and / or unobstructed emission of radiation at that laser wavelength.

[0044] Typically, the first and second dielectric layers are selectively provided only in the region of the openings or apertures in the first and / or second contact layers.

[0045] According to another example, at least one of the first contact layer and the second contact layer includes a metal contact layer configured to be fastened, secured or soldered to a mount or submount. Typically, a submount or mount for a semiconductor membrane laser chip includes a metal body. Thus, when properly secured or attached to the submount, at least one of the first contact layer and the second contact layer can form a direct mechanical contact with the metal body of the respective mount. In this way, thermal energy is easily transferred or dissipated from the metal contact layer to and into the metal body of the submount.

[0046] The thermal energy emitted from the laser medium is thus transferred quite effectively from the laser medium to at least one of the first and second heat spreaders, to at least one of the first and second contact layers, and finally to the metal body of the mount, thereby resulting in improved thermal management of the semiconductor film laser chip.

[0047] According to another example, the mount or submount comprises a metal body having a recess dimensioned to receive a stack of layers including at least a laser medium, a first heat spreader, and a first dielectric layer. In some examples, the depth of the recess in the metal body is substantially equal to the thickness of the layer stack of the semiconductor film laser chip. In this way, the layer stack is flush mounted to the metal body, thereby enabling improved mechanical assembly and fastening of the layer stack and the metal body. A back surface of the metal body, substantially flush with the outer surface of the layer stack, comprises a solder foil or retaining plate covering at least a portion of the metal body of the submount and covering at least a portion of the layer stack.

[0048] According to another example, the present disclosure also relates to a laser device. The laser device includes the above-mentioned semiconductor film laser chip and a pump laser or pump light source configured to emit electromagnetic radiation at pump wavelength λ2. Here, the pump laser or pump light source is arranged and configured to emit electromagnetic radiation at pump wavelength λ2 through a first dielectric layer into the laser medium of the above-mentioned semiconductor film laser chip. Typically, the semiconductor film laser chip includes a top surface from which the laser radiation at the laser wavelength is emitted. The semiconductor film laser chip further includes a bottom surface to which the electromagnetic radiation of the pump laser or pump light source is coupled, or the pump light source is coupled to the layer stack of the semiconductor film laser chip.

[0049] Thus, a backside pumped semiconductor membrane laser chip is provided. The pump radiation, for example in the form of a pump beam, can propagate coaxially with the laser radiation generated or generated by the semiconductor membrane laser chip. This allows for a highly efficient implementation and, for example, for miniaturization of the laser device. The pump laser or pump light source is arranged in close proximity to the layer stack of the semiconductor membrane laser chip. The pump laser or pump light source is arranged at a distance of less than 1 mm, less than 500 μm, less than 200 μm, less than 100 μm, or less than 50 μm.

[0050] The pump laser or pump light source may even be located without any substantial gap and therefore close to the backside of the semiconductor membrane laser chip.

[0051] Of course, the laser device further includes an external mirror for coupling the laser beam out of the semiconductor film laser. The external cavity mirror and the pump laser are provided on either side of the layer stack of the semiconductor film laser chip.

[0052] According to another example, the pump laser comprises at least one or several edge-emitting laser diodes. Alternatively, the pump laser comprises at least one or several laser diode bars. In such laser diodes or laser diode bars exhibiting a somewhat elliptical beam profile at the exit face of the laser diode, the distance between the respective laser diode and the laser medium of the semiconductor membrane laser chip is selected such that a somewhat circular or circularly symmetric beam profile emitted by the laser diode is present at the laser medium of the semiconductor membrane laser chip. As the beam of the laser diode propagates, the somewhat elliptical beam profile with its major axis in a first transverse direction changes into a somewhat circularly symmetric profile, and as the beam propagates further, it changes into an elliptical beam profile with another major axis in another transverse direction, for example perpendicular to the first transverse direction.

[0053] By appropriately selecting the distance between the laser diode serving as the pump light source and the laser medium of the semiconductor film laser chip, any focusing and / or collimating optical components between the pump light source and the laser medium can become obsolete and unnecessary.

[0054] According to another example of the laser device, the optical path between the pump laser and the semiconductor membrane laser chip is substantially devoid of collimating or focusing optics, thus avoiding the rather complicated arrangement of such optical components, which can reduce the manufacturing cost for producing such a laser device.

[0055] According to another example, a laser device includes a mount or submount having a metal body. The semiconductor membrane laser chip includes at least one contact layer as described above. Here, in this laser device, the semiconductor membrane laser chip is arranged on the submount such that the semiconductor membrane laser is or will be thermally coupled to the metal body of the submount. Here, in the final assembly configuration, the contact layer implemented as a metal contact layer can be in direct surface contact with a portion of the metal body. The respective metal surfaces in direct contact with each other provide a respective thermal coupling. In some examples, the thermal coupling between the contact layer and the metal body of the submount is provided by soldering.

[0056] According to another aspect, a method of fabricating the above-mentioned multiple laser chips is provided. The method includes the steps of providing a laser medium on a substrate and disposing or forming a first heat spreader on a top surface of the laser medium, the top surface of the laser medium facing away from the substrate. Then, in a subsequent step, the substrate is removed. In this case, the residual layer stack only includes or consists of the laser medium and the heat spreader.

[0057] In a subsequent step, a first dielectric layer is then placed, e.g., deposited or bonded, on the bottom surface of the laser medium or the top surface of the first heat spreader. The top surface of the heat spreader faces away from the laser medium. The bottom surface of the laser medium faces away from the top surface of the laser medium. Finally, in some examples, the laser medium is sandwiched between the first heat spreader and the first dielectric layer. In other examples, the first heat spreader is sandwiched between the laser medium and the first dielectric layer. Removal of the substrate may occur before or after depositing the first dielectric layer into the layer stack. Removal of the substrate should occur after providing the first heat spreader on the laser medium.

[0058] In some examples, when the laser medium is provided on a substrate, only the first heat spreader is disposed or formed on the upper surface of the laser medium. The heat spreader usually includes mechanical stability somewhat comparable to that of the substrate. The first heat spreader is then attached to the upper surface of the laser medium, and the substrate is then removed, for example by a suitable etching process. Once the substrate is removed from the lower surface of the laser medium, a dielectric layer is provided on the lower surface of the laser medium. Alternatively, the lower surface of the laser medium is also provided with a second heat spreader. The first and / or second dielectric layers are then provided on the outward facing surfaces of the first and / or second heat spreaders, respectively, with the outward facing surfaces facing away from the laser medium.

[0059] According to another example, if a first dielectric layer is disposed or formed on the upper surface of the laser medium, removing the substrate may compromise the mechanical integrity of the laser medium, since the first dielectric layer may not provide sufficient mechanical stability to the laser medium or a layer of the laser medium. Here, at least one other layer is provided on top of the first dielectric layer to establish a layer stack with sufficient mechanical stability. The substrate is then removed from the lower surface of the laser medium, and then a first heat spreader is provided on the lower surface of the laser medium.

[0060] In another example, a substrate is provided. A laser medium is provided or disposed on the substrate. A first heat spreader is provided or formed on top of the laser medium. A first dielectric layer is then formed on top of the first heat spreader. After or before depositing or disposing the first dielectric layer on the first heat spreader, the substrate is removed. Removing the substrate ultimately allows unobstructed transmission of electromagnetic radiation at the pump wavelength through the first dielectric layer, through the first heat spreader, and into the laser medium.

[0061] The removal of the substrate is performed as soon as the layers of the laser medium are mechanically stabilized, typically by providing or forming at least one heat spreader on the laser medium. Typically, in some instances, first and second heat spreaders are provided on opposite sides of the laser medium before at least a first dielectric layer is deposited or coated on the semiconductor membrane laser chip.

[0062] In another example, it is even conceivable to provide a heat spreader preform, i.e. a layer of heat spreader coated with or provided with a first dielectric layer. At the same time, a laser medium preform, i.e. a substrate provided with a laser medium, is also provided. In a subsequent step, the heat spreader preform and the laser medium preform are bonded together such that the laser medium is in direct or indirect thermal contact with the heat spreader. Then, once the laser medium is mechanically stabilized by the heat spreader, the substrate is removed.

[0063] Typically, and for substantially all examples described herein, the heat spreader is substantially transparent to the laser wavelength and / or the pump wavelength, and exhibits negligible absorption at each wavelength.

[0064] According to another example of the method, the substrate comprises a wafer of a predetermined wafer size. The wafer can comprise a diameter of at least 2 inches, at least 3 inches, or at least 4 inches, or can be even greater than 5 inches or 10 inches in its planar diameter.

[0065] The laser medium, the first heat spreader and the first dielectric layer extend across the entire surface of the wafer, forming a wafer layer stack and therefore a wafer-sized layer stack. Fabricating multiple laser chips includes dicing the wafer layer stack into individual laser chips. Typically, the laser chips are square or rectangular in size. Producing the wafer layer stack and dicing the individual laser chips from the wafer layer stack provides a fairly efficient method of mass manufacturing semiconductor film laser chips.

[0066] In another aspect, the new laser concept includes a semiconductor membrane laser chip having a laser medium with a first heat spreader bonded to a top surface of the laser medium, and a first contact layer disposed on the top surface of the first heat spreader and having a first opening in which a first dielectric layer is disposed. A second contact layer is disposed on a bottom surface of the laser medium and has a second opening in which a second dielectric layer is disposed. The first transmissive dielectric layer and the second dielectric layer are made of multiple layers.

[0067] This arrangement allows the pump beam to be perpendicularly incident on the gain medium of the active region of the semiconductor membrane laser. The focusing lens of the pump optics (or a system of several lenses) is placed close to the gain medium, resulting in an angle of 180°, so that its lateral size is not limited. Therefore, inexpensive pump sources with poor beam profile (or with correspondingly large fiber diameters and coupled fibers) can be used as pump lasers. The pump power is focused via the corresponding pump optics into the plane of the gain medium.

[0068] In another embodiment, the semiconductor membrane laser chip includes an additional second heat spreader bonded between the lower surface of the laser medium and the second contact layer to provide more heat dissipation.

[0069] In some examples, the first heat spreader and / or the second heat spreader are selected from a group of thermally conductive materials including silicon carbide, diamond, or aluminum oxide.

[0070] In some examples, the active or laser medium is selected from the group of semiconductor materials including or consisting of AlGaInAsP (including AlGaAs, InGaAs and AlGaInP), AlInGaN, or AlGaInAsSb or AlGaInNAs, although this is not intended to be a limitation of the invention.

[0071] The semiconductor membrane laser chip is assembled into a laser device, with a pump laser positioned to pump a pump beam of laser light through one of the first opening or the second opening. The laser chip is positioned on a submount in contact with the semiconductor membrane as a heat sink to improve thermal management. The submount is soldered to at least one of the top heat spreader or the bottom heat spreader. The pump laser is, for example, an edge-emitting laser diode.

[0072] In another aspect, the present disclosure also provides a method for producing a method of making a pharmaceutical composition comprising: - providing a laser medium on a substrate; - bonding a first heat spreader to an upper surface of the laser medium; - Removing the substrate; - selectively depositing a dielectric layer on a top surface of the first heat spreader; and - selectively depositing a metallization layer on a top surface of the first heat spreader; A method for fabricating multiple laser chips is also described, including:

[0073] In another embodiment, a second heat spreader is bonded to the bottom surface of the laser medium, and a dielectric layer and / or a metallization layer is applied to the bottom surface of the second heat spreader.

[0074] Next, the method includes dicing the laser chip into one or more individual elements, which are then soldered to a submount.

[0075] The aim of the present invention is the cost-effective production of miniature laser light sources that have advantages compared to existing alternatives in terms of output power and / or beam profile and / or achievable emission wavelength.

[0076] According to another aspect, there is also provided a semiconductor film laser chip, a laser device, and a method for fabricating a plurality of semiconductor film laser chips, in accordance with the following provisions: Clause 1: A semiconductor film laser chip (500) including: a laser medium (510) having a first heat spreader (520a) bonded to a top surface (515a) of the laser medium (510); a first contact layer (530a) disposed on an upper surface of the first heat spreader (520a) and having a first opening (730a) in which a first permeable dielectric layer (535a) is disposed; A second contact layer (535b) disposed on the lower surface (515b) of the laser medium (510) and having a second opening (730b). Clause 2: The laser chip (500) according to clause 1, wherein one of the semiconductor layer or the second transmissive dielectric layer (535b) is disposed in the second opening (730b). Clause 3: The laser chip (500) of clause 1 or 2, further comprising a second heat spreader (520b) bonded between a lower surface of the laser medium (510) and the second contact layer (535b). Clause 4: A laser chip described in any of the preceding clauses, wherein at least one of the first heat spreader (520a) or the second heat spreader (520b) is selected from a group of thermally conductive materials including silicon carbide, diamond, or aluminum oxide. Clause 5: The laser chip according to any of the preceding clauses, wherein the laser medium (510) is selected from the group of semiconductor materials consisting of AlGaInAsP, AlInGaN, or AlGaInAsSb, or AlGaInNAs. Clause 6: A laser chip described in any of the above clauses, wherein at least one of the first transparent dielectric layer (535a) or the second transparent dielectric layer (535b) is made from a group of dielectric materials consisting of SiO2, TiO2, Al2O3 and Ta2O5. Clause 7: Laser devices, including: A laser chip according to one of clauses 1 to 6; A pump laser (810) positioned to pump a pump beam (820) of laser light through one of the first aperture (730a) or the second aperture (730b). Clause 8: A laser device as described in clause 7, wherein the laser chip is disposed on a submount (700). Clause 9: The laser apparatus of clause 8, wherein the submount (700) is soldered to at least one of the upper heat spreader (520a) or the lower heat spreader (530a). Clause 10: A laser device according to any one of clauses 7 to 9, further comprising a coupler (740) for outputting the laser beam (11) from the laser chip. Clause 11: A laser device according to any one of clauses 7 to 10, wherein the pump laser (810) is an edge-emitting laser diode. Clause 12: A method for fabricating a plurality of laser chips, comprising: - providing (1000) a laser medium (510) on a substrate; - bonding (1010) a first heat spreader (320a) to the top surface of the laser medium (510); - removing the substrate (1020); - selectively depositing (1040) a first dielectric layer onto a top surface of the first heat spreader (320a); and - selectively depositing (1040) a metallization layer onto the top surface of the first heat spreader (320a); Clause 13: The method of clause 12, further comprising bonding (1030) a second heat spreader (320b) to a bottom surface of the laser medium (510), and providing (1040) a dielectric layer and a metallization layer on the bottom surface of the second heat spreader (320b). Clause 14: The method of clause 12 or 13, further comprising dicing (1050) the laser chip into one or more individual elements. Clause 15: The method according to any one of clauses 12 to 14, further comprising soldering the laser chip to a submount (700). [Brief description of the drawings]

[0077] [Figure 1] FIG. 1 illustrates a semiconductor disk laser using a flip-chip process. [Diagram 2] FIG. 1 illustrates a semiconductor disk laser with an intracavity heat spreader. [Diagram 3] FIG. 1 illustrates a gradient pumped semiconductor membrane laser. [Figure 4] FIG. 1 illustrates an example of a back-pumped semiconductor membrane laser according to the present disclosure. [Diagram 5] FIG. 2 is a cross-sectional view showing an amplifier unit. [Figure 6] FIG. 1 shows the production of multiple multiplier tube units on a wafer scale (partial cross section visible). [Figure 7] FIG. 1 shows an exemplary setup of a laser resonator with a complete amplifier unit on a submount (cross section). [Figure 8A] FIG. 13 shows a cross-sectional view of an amplifier unit for a compact component with an integrated edge-emitting diode as a pump light source. [Figure 8B] FIG. 13 shows a cross-sectional view of an amplifier unit for a compact component with an integrated edge-emitting diode as a pump light source. [Figure 9] FIG. 9 shows another example of an amplifier unit in which a submount is attached to one side of a semiconductor membrane laser chip. [Figure 10] FIG. 1 is a flow diagram of the fabrication process. [Figure 11] 1A-1C illustrate an example of a process for fabricating a layer stack for manufacturing a semiconductor membrane laser chip. [Figure 12] 1A-1C show another example of a process for fabricating a layer stack for manufacturing a semiconductor membrane laser chip. [Figure 13] 1A-1C illustrate yet another example of a process for fabricating a layer stack for manufacturing a semiconductor membrane laser chip. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0078] The present invention will now be described based on the figures. It should be understood that the embodiments and aspects of the present invention described herein are merely illustrative and do not limit the scope of protection of the claims. The present invention is defined by the claims and their equivalents. It should be understood that the features of one aspect or embodiment of the present invention can be combined with the features of another aspect and / or embodiment of the present invention.

[0079] FIG. 4 shows an example of a semiconductor membrane laser according to the present disclosure implemented as a back-pumped semiconductor membrane laser. Here, the laser medium 510 is pumped by the radiation 150 of the pump laser 160 from the back side of the semiconductor membrane laser. The second heat spreader 520b is covered with a coating 410 that is transparent to the light from the pump laser but reflects the light of the optical wavelength generated in the active region, i.e., the laser medium or gain medium 510. The laser medium 510, and therefore the layer stack of the laser medium or gain medium 510, is sandwiched by the first heat spreader 520a and the second heat spreader 520b. The lower surface of the second heat spreader, i.e., the surface facing away from the laser medium 510, is provided with the coating 410. Typically, the coating 410 is provided or formed by a dielectric layer 535b.

[0080] FIG 5 shows an example of a semiconductor film laser 500 according to one embodiment of the present disclosure. The steps of the fabrication process of the semiconductor film laser 500 are shown in FIG 10. It should be understood that the steps shown in FIG 10 and described below are merely exemplary. In particular, the order of some of the steps may be changed.

[0081] The semiconductor film laser 500 includes a semiconductor amplifier or laser medium 510 (also called a semiconductor film) between an upper or first heat spreader 520a and a lower or second heat spreader 520b, and selectively deposited dielectric layers 535a, 535b and metal contact layers 530a, 530b. The semiconductor gain medium 510 is created in step 1000 by depositing a layer stack of semiconductor materials on a substrate using an epitaxial process. It should be understood that the terms "upper" and "lower" as used herein are merely used to distinguish between different elements shown in the figures.

[0082] In the illustrated example, a planar laser medium 510 is sandwiched between a first and a second heat spreader 520a, 520b. Here, the top surface 511a of the laser medium 510 is in contact with the bottom surface 522a of the first heat spreader 520a. The bottom surface 511b of the laser medium 510 is in contact with the top surface 521b of the second heat spreader 520b. The top surface 521a of the first heat spreader 520a facing away from the laser medium 510 comprises a second dielectric layer 535a and a first contact layer 530a. The bottom surface 522b of the second heat spreader 520b comprises or is in contact with a first dielectric layer 535b and a second contact layer 530b.

[0083] The first and second contact layers 530a, 530b may each include an opening or recess 532a, 532b in the layer structure that extends entirely through the thickness of the first and second contact layers 530a, 530b, respectively. The opening or recess 532a, 532b is provided with a respective dielectric layer 535a, 535b. Since the contact layers 530a, 530b typically include metal or are made of a metallic material, the recess or opening extending through the contact layers 530a, 530b provides for unimpeded light beam propagation.

[0084] Examples of semiconductor gain medium 510 include, but are not limited to, the following material systems: · AlGaInAsP (on GaAs substrate) - for example GaInAs quantum wells embedded in GaAs(P) barriers for laser emission in the near infrared spectral range (approximately 850-1200 nm). · AlGaInP (on GaAs substrate) - for example GaInP quantum wells embedded in AlGaInP barriers for laser emission in the red spectral region (approximately 630-700 nm). · AlInGaN (on GaN / Al2O3 / SiC substrate) - for example, InGaN quantum wells for laser emission in the blue / green spectral region (approx. 400-550 nm). · AlGaInNAs (on GaAs substrate) - for example GaInNAs quantum wells embedded in GaAs barriers for laser emission in the near infrared spectral range (>1200 nm). · GaAsSb (on GaSb substrate) - for example GaInAsSb quantum wells embedded in GaAs barriers for laser emission in the short-wave infrared spectral range (about 2 μm). · AlGaInAsP (on an InP substrate) - for example GaInAs quantum wells embedded in AlGaInAs barriers for laser emission in the short-wave infrared spectral range (about 1.6 μm).

[0085] In step 1010, the top surface of the semiconductor gain medium 510 is cleaned, and then the upper heat spreader 520a is attached to the cleaned top surface of the semiconductor gain medium 510 by a plasma enhanced bonding process to form a direct contact. In step 1020, the substrate is removed from the bottom surface of the semiconductor gain medium 510, for example by wet chemical etching, and if necessary, in step 1030, the lower heat spreader 520b is attached to the bottom surface of the semiconductor gain medium 510 using the same bonding process.

[0086] The two heat spreaders, top heat spreader 520a and bottom heat spreader 520b, are brought into direct monolithic contact as a full wafer with the semiconductor gain medium 510, which is also wafer-sized, by a plasma-enhanced bonding process in steps 1010 and 1030. As a result of this direct contact, the interfaces 515a and 515b between the gain medium 510 and the top spreader 520a or bottom spreader 520b are substantially unhindered from dissipating heat (i.e., dissipating thermal energy) from the gain medium 510 during operation.

[0087] The two heat spreaders 520a and 520b are made of, for example, diamond or silicon carbide, which have good optical properties, to allow the transmission of the laser radiation. Silicon carbide (SiC) is single crystal and has very high optical properties at the wafer size scale with good surface finish. Its thermal conductivity is up to 400 W / mK. Diamond is also single crystal and currently does not yet have the high optical properties with good surface finish that can be obtained at the wafer scale, but has very good thermal conductivity of up to 2000 W / mK. Aluminum oxide (single crystal) can also be used, which has very high optical properties with good surface finish that can be obtained at the wafer scale, but has a low thermal conductivity of only about 25 W / mK.

[0088] The combination of semiconductor gain medium 510 and heat spreaders 520 a and 520 b is referred to as the “wafer layer stack” 110 .

[0089] Subsequently, in step 1040, the upper 525a and lower 525b of the wafer layer stack are selectively provided with dielectric layers 535a and 535b by deposition or with metal contact layers 530a and 530b by metallization using lithography or shadow masks. As can be seen in the wafer 600 shown in FIG. 6, the individual faces (optical opening windows or apertures), here shown as circles, are provided with dielectric layers 535, and the adjacent surrounding areas, here shown as squares, are provided with metal contact layers 530. Between each metal contact layer 530, so-called sawing lines 610 are left uncoated along the lines along which the sawing or division process is carried out later in step 1050 of the separation or dicing of the semiconductor membrane laser chips. In a non-limiting example, the wafer 600 is a 4-inch wafer, and with an amplifier unit edge length of 1.5 mm and a saw line width of 0.1 mm, about 3000 semiconductor membrane laser chips are obtained as amplifier units.

[0090] It can be seen that the deposition of the dielectric layers 535a and 535b and the metal contact layers 530a and 530b is performed symmetrically on both the top 525a and bottom 525b of the wafer layer stack. However, the dielectric layers 535a and 535b have different functions on the two sides, as will be explained next. The bottom of the wafer layer stack shall be in the direction in which the pump light 150 is received (as shown in Figures 4 and 5). The function of the top or second dielectric layer 535a deposited on the top heat spreader 520a may be to enable high transmission at the wavelength λ1 of the generated laser mode of the gain medium 510. On the other hand, the function of the bottom or first dielectric layer 535b attached to the bottom heat spreader 520b is to enable high reflectivity at the wavelength λ1 of the generated laser mode of the gain medium 510 and high transmission at the wavelength λ2 of the pump laser 160 used to pump the gain medium 510. Alternatively, the lower dielectric layer 520b is arranged to reflect the light of the wavelength λ2 of the pump laser used to create a resonator for the pump wavelength, thus producing an improved absorption efficiency. The materials used for the dielectric layer can be SiO2, Nb2O5, HfO2, TiO2, Al2O3, and Ta2O5, but this is not a limitation of the present invention.

[0091] It was mentioned above that the order of the fabrication steps shown in Fig. 10 is not a limitation of the present invention. For example, the deposition of the dielectric layers 535a and 535b and the metal contact layers 530a and 530b can be changed and depends on the design of the semiconductor membrane chip. Similarly, the bonding of the substrate and the subsequent removal of the substrate may be performed in a different order. It is also possible to apply the dielectric layers 535a, 535b after dicing the semiconductor membrane chip.

[0092] Finally, in step 1060, the individual semiconductor film laser chips are fixed or soldered to the submount 700 in a soldering process, as shown in FIG. 7, for example, using a preformed soldering foil 710 or any other metal fastener, for example in the form of a metal plate. Alternatively, solder is pre-deposited on the submount 700 or the semiconductor film laser chip. This submount 700 includes, but is not limited to, a metal body, for example, copper or brass, which may or may not be gold-coated. The metal body has high thermal conductivity and has a recess 720. The recess 720 is adapted to the thickness of the semiconductor film laser chip and the thickness of the solder foil 710 so that the semiconductor film laser chip is flush with the opposite surface of the submount 700, and thus the metal contact layer 530b can be connected to the submount 700 via another solder foil 710 or a metal fastener.

[0093] The submount 700 has an upper window 730a and a lower window 730b, which are aligned with the upper dielectric layer 535a and the lower dielectric layer 535b, respectively, so that the submount 700 remains optically freely accessible through the recess 720 with the dielectric layers 535a and 535b and allows light to pass through the submount 700. The remaining areas of the upper and lower surfaces of the semiconductor film laser chip are available for heat transfer between the upper and lower heat spreaders 520a and 520b and the submount 700, so that heat or thermal energy from both sides of the upper and lower heat spreaders 520a and 520b is dissipated to the submount 700.

[0094] The example shown in FIG. 7 is a linear cavity geometry where a single external mirror 180 couples the laser beam 175 out of the semiconductor membrane laser. Designing the amplifier unit on the submount 700 allows good access to the gain medium 510 from both sides of the semiconductor membrane laser. The semiconductor membrane laser is pumped by a pump laser 160 that can focus the beam through the lower dielectric layer 535b at an angle of 180° onto the amplifier layer 510. This means that the lateral size of the focusing lens as part of the pump optics is not limited by the geometry of the submount 700. Preferably, the optical path between the pump laser 160 and the laser medium 510 can be devoid of any optical components such as focusing collimating optical arrangements. The optical path can be devoid of any refractive or diffractive optical elements. In an alternative arrangement, the individual semiconductor laser chips and submounts 700 can also be arranged such that the more accessible side of the submount 700 is the side with the upper dielectric layer 535a, thereby pointing in the direction of the output coupler mirror 180 and the outcoupled laser beam 170, in order to take advantage of the good accessibility of the particularly small resonator geometry.

[0095] In FIG. 8A, a similar concept is shown with only a single upper heat spreader 520a and no lower heat spreader 520b compared to the designs shown in FIG. 5 and FIG. 7. The lower part, hence the first dielectric layer 535b and the lower metal contact layer 530b, are directly attached to the gain medium 510. This design allows the edge-emitting laser diode 162 as the pump light source to be placed at a very small distance from the gain medium 510. This distance is selected depending on the emission profile of the edge-emitting laser diode 510 and the thickness of the lower dielectric layer 535b, so that the pump beam 150 has a circular shape in the plane of the gain medium 510. At this defined distance (typical optical path lengths in the range of 10-100 μm), the plane of the gain medium 510 is between the near and far fields of the pump beam 150, and the beam diameters in the two beam dimensions of the pump beam "fast axis" and "slow axis" are the same. In this arrangement, no optical components are required for focusing the pump beam 150, which makes it possible to produce particularly compact and cost-effective components consisting of an amplifier unit with an integrated pump source.

[0096] The semiconductor membrane laser shown in Figure 8B also lacks the lower heat spreader 520b, nor the lower metal contact layer 530b, and therefore does not require a lower window through which light from the pump laser 160 must pass.

[0097] 9 shows another example of a semiconductor film laser in which the submount 700 is disposed on one end 910 of the semiconductor film laser 500, rather than on the periphery of the semiconductor film laser 500. Solder 930 is disposed on the end 910, and thermal coupling between the submount 700 and the semiconductor film laser 500 is established.

[0098] In another embodiment, a GRIN (graded index) lens is fabricated such that the GRIN lens through which the pump beam 820 passes is in direct contact with the upper dielectric layer 535a or the lower dielectric layer 535b. This lens reduces energy loss by allowing the pump laser light from the pump laser 160 to be focused in the plane of the active region comprising the gain medium 510.

[0099] It should be understood that the semiconductor membrane lasers described herein may include additional mirrors, such as for V-shaped or Z-shaped cavities. Additionally, the resonator may include additional intracavity elements, such as nonlinear crystals (e.g., SHG (second harmonic generation) crystals, birefringent filters (BRFs), etalons, and absorbers).

[0100] One method of manufacturing a laser chip is shown, for example, in FIG. 11. Here, in step a, a substrate 100 with a layer 510 of a laser medium is provided. In a subsequent step b), a layer of a first heat spreader 520a is placed or formed on the upper surface 511a of the laser medium 510. Then, as shown in step c), the substrate 100 is removed, and in a further step d), a first dielectric layer 535b is deposited or placed on the lower surface 511b of the laser medium 510, thereby forming a multilayer stack 110. The multilayer stack is subsequently cut into individual laser chips 500 of suitable lateral size. In general, the order of the steps to be performed to produce the multilayer stack 110 can vary. The removal of the substrate 100 may only take place after the laser medium 510 has been mechanically stabilized, for example by attaching a heat spreader 520a.

[0101] In Fig. 12, another method of fabricating a laser chip 500 as described above is shown. Here, in step a), a substrate 100 is provided with a layer 510 of laser medium. In a subsequent step b), a first heat spreader 520a is placed or formed on the top surface 511a of the laser medium 510. Then, as shown in step c), the substrate 100 is removed, and in a further step d), a first dielectric layer 535b is deposited or placed on the top surface of the first heat spreader 520a facing away from the laser medium 510, thereby forming a multilayer stack 110. The multilayer stack is then cut into individual laser chips 500 of suitable lateral size. The removal of the substrate 100 may also be performed after depositing the first dielectric layer 535b on the heat spreader 520a. In some examples, the dielectric layer 535b is deposited or coated on the heat spreader 520a before the heat spreader 520a is bonded or coupled to the laser medium 510, reversing the order of steps shown in Fig. 12. In another alternative, the separated heat spreader 520a includes the first dielectric layer 535b. The substrate 100 with the layers of the laser medium 510 shown in step a) of Fig. 12 is prepared separately and then bonded to the heat spreader 520a, which is prefabricated with the dielectric layer 535b.

[0102] In Fig. 13, another example of fabricating a semiconductor membrane laser chip 500 including a multi-layer stack 110 is shown in a schematic manner. Here, in step a), a substrate 100 is provided with one or several inner layers of a laser medium 510. Then, as shown in step b), a first heat spreader 520a is provided on top of the laser medium 510. Then, the substrate 100 is removed in step c), since the first heat spreader 520a provides mechanical stability to the laser medium 510. After the removal of the substrate 100, a second heat spreader 520b is provided on the face of the laser medium 510 facing away from the first heat spreader 520a, as shown in step d). Now, the second heat spreader 520b is bonded to the laser medium 510. Thereafter, as shown in step e), at least a first dielectric layer 535b is provided on one of the first heat spreader 520a and the second heat spreader 520b. [Explanation of symbols]

[0103] 10 Semiconductor disk laser chip 12 Top side 15 Side 20 Heat spreader 30 active area 35 Pump Spot 40 Bragg reflector 50 Pump laser light 60 Pump Source Laser 70 Intracavity laser light 75 External laser light 80 Mirror 100 Substrates 110 layer stack 150 Electromagnetic Radiation 160 Pump Laser 162 Edge-emitting laser diode 170 Laser Beam 175 Laser Beam 180 Mirror 200 Substrates 220 In-cavity heat spreader 225 Interface 320a,b Heat spreader 410 Coating 500 Semiconductor film laser chip 510 Laser medium 511a side 511b surface 515a,b interface 520a,b Heat spreader 521a side 521b side 522a side 522b side 525a side 525b side 530a, b Contact layer 532a opening 532b opening 535a, b Dielectric layer 600 wafers 610 Sewing Line 700 Submount 710 Solder foil 720 Recess 730a,b Windows 810 Side-emitting diode 820 Pump Beam 910 End 930 Solder

Claims

1. A semiconductor membrane laser chip (500) comprising: A flat-shaped laser medium (510) including an upper surface (511a) and a lower surface (511b) opposite to the upper surface (511a), the laser medium (510) having a laser wavelength λ 1 It emits electromagnetic radiation (170). A laser medium (510) configured as follows: a first heat spreader (520a, 520b) bonded to one of the upper surface (511a) and the lower surface (511b) of the laser medium (510); a first dielectric layer (535b) disposed on the underside (511b) of the laser medium (510) or on the underside (525b) of the first heat spreader (520a, 520b) if the first heat spreader (520a, 520b) is bonded to the underside (511b) of the laser medium (510); where the first dielectric layer (535b) is 1 , and the first dielectric layer (535b) is reflective to the pump wavelength λ 2 is transparent to electromagnetic radiation (150); Further comprising a second heat spreader (520a, 520b) bonded to the other of the upper surface (511a) and the lower surface (511b) of the laser medium (510); The semiconductor film laser chip.

2. A semiconductor film laser chip (500): A laser medium (510) having a planar shape including a top surface (511a) and a bottom surface (511b) opposite the top surface (511a), the laser medium (510) being configured to emit electromagnetic radiation (170) at a laser wavelength λ 1 . A laser medium (510) configured as follows: a first heat spreader (520a, 520b) bonded to one of the upper surface (511a) and the lower surface (511b) of the laser medium (510); a first dielectric layer (535b) disposed on the underside (511b) of the laser medium (510) or on the underside (525b) of the first heat spreader (520a, 520b) if the first heat spreader (520a, 520b) is bonded to the underside (511b) of the laser medium (510); where the first dielectric layer (535b) is reflective to the laser wavelength λ 1 . The first dielectric layer (535b) is transparent to electromagnetic radiation (150) at a pump wavelength λ 2 . can be, a second dielectric layer (535a) disposed on the top surface (511a) of the laser medium (510) or on the top surface (525a) of the at least one heat spreader (520a, 520b) if the at least one heat spreader (520a, 520b) is bonded to the top surface (511a) of the laser medium (510), the second dielectric layer (535a) comprising a transmittance for the laser wavelength λ 1 that is greater than the transmittance of the first dielectric layer (535b) for the laser wavelength λ 1; The semiconductor film laser chip.

3. A semiconductor film laser chip (500): A laser medium (510) having a planar shape including a top surface (511a) and a bottom surface (511b) opposite the top surface (511a), the laser medium (510) being configured to emit electromagnetic radiation (170) at a laser wavelength λ 1 . A laser medium (510) configured as follows: a first heat spreader (520a, 520b) bonded to one of the upper surface (511a) and the lower surface (511b) of the laser medium (510); a first dielectric layer (535b) disposed on the underside (511b) of the laser medium (510) or on the underside (525b) of the first heat spreader (520a, 520b) if the first heat spreader (520a, 520b) is bonded to the underside (511b) of the laser medium (510); wherein the first dielectric layer (535b) is reflective to a laser wavelength λ 1 and the first dielectric layer (535b) is transparent to electromagnetic radiation (150) at a pump wavelength λ 2 ; a submount (700) having a metallic body with a recess (720) dimensioned to receive a stack of layers including the laser medium (510), the first heat spreader (520a, 520b) and the first dielectric layer (535b); The semiconductor film laser chip.

4. The planar laser medium (510) is irradiated with a pump wavelength λ 2 by electromagnetic radiation (150) When optically pumped, the laser wavelength λ 1 configured to emit electromagnetic radiation (170) The semiconductor membrane laser chip (500) according to any one of claims 1 to 3.

5. The semiconductor film laser chip (500) according to any one of claims 1 to 4, further comprising at least a first contact layer (530a, 530b) arranged adjacent to one of the upper surface (511a) and the lower surface (511b) of the laser medium (510), or adjacent to a surface (521a, 522b) of one of the first heat spreader (520a, 520b) and the second heat spreader (520a, 520b) facing away from the laser medium (510).

6. The semiconductor film laser chip (500) of claim 5 further comprising at least a second contact layer (530a, 530b) arranged adjacent to the other of the upper surface (511a) and the lower surface (511b) of the laser medium (510) or adjacent to the other surface (521a, 522b) of the first heat spreader (520a, 520b) and the second heat spreader (520a, 520b) facing away from the laser medium (510).

7. The semiconductor membrane laser chip (500) of claim 5 or 6, wherein at least one of the first and second contact layers (530a, 530b) includes an opening (532a, 532b) or aperture in which one of the first and second dielectric layers (535a, 535b) is disposed.

8. The semiconductor film laser chip (500) of any one of claims 5 to 7, wherein at least one of the first contact layer and the second contact layer (530a, 530b) comprises a metal contact layer configured for soldering to a submount (700), the submount (700) comprising a metal body.

9. The semiconductor membrane laser chip (500) of any one of claims 1 to 8, wherein at least one of the first heat spreader (520a) or the second heat spreader (520b) is selected from a group of thermally conductive materials including silicon carbide, diamond, or aluminum oxide.

10. The semiconductor membrane laser chip (500) of any one of claims 1 to 9, wherein the laser medium (510) is one of a group of semiconductor materials including AlGaInAsP, AlInGaN or AlGaInAsSb or AlGaInNAs.

11. At least one of the first dielectric layer (535b) and the second dielectric layer (535a) is made of SiO 2 , Nb 2 O 5 , HfO 2 , TiO 2 , Al 2 O 3 and Ta 2 O 5 A group of dielectric materials including The semiconductor membrane laser chip (500) according to any one of claims 1 to 10, wherein the semiconductor membrane laser chip (500) is one of the above.

12. 1. A laser apparatus comprising: A semiconductor membrane laser chip (500) according to any one of claims 1 to 11, Pump wavelength λ 2 a pump laser (16) configured to emit electromagnetic radiation (150) of 0), wherein the pump laser (160) is positioned and configured to emit electromagnetic radiation (150) through a first dielectric layer (535b) into a laser medium (510).

13. 13. The laser device of claim 12, wherein the pump laser (160) comprises at least one or several edge-emitting laser diodes (162), or the pump laser (160) comprises at least one or several laser diode bars.

14. 14. The laser arrangement of claim 12 or 13, wherein the optical path between the pump laser (160) and the semiconductor membrane laser chip (500) is devoid of collimating or focusing optics.

15. The laser device according to any one of claims 12 to 14, further comprising a submount (700) having a metal body, wherein the semiconductor film laser chip (500) comprises at least one contact layer (530a, 530b) thermally coupled to the submount (700) by soldering.

16. A method for fabricating a plurality of laser chips (500) according to any one of claims 1 to 11, comprising: Providing a laser medium (510) on a substrate (100); placing or bonding a first heat spreader (520a) on a top surface (511a) of the laser medium (510) facing away from the substrate; removing the substrate (100); disposing or forming a first dielectric layer (535b) on one of a lower surface (511b) of the laser medium (510) facing away from the first heat spreader (520a) and an upper surface (521a) of the first heat spreader (520a) facing away from the laser medium (510); The method comprising:

17. 17. The method of claim 16, further comprising disposing or forming a second heat spreader (520b) on a lower surface (511b) of the laser medium (510) when the first dielectric layer (535b) is provided on the upper surface (521a) of the first heat spreader (520a).

18. 18. The method of claim 16 or 17, wherein the substrate (100) comprises a wafer (600) of a predetermined wafer size, the laser medium (510), the first heat spreader (520a) and the first dielectric layer (535b) extend across the entire size of the wafer (600) to form a wafer layer stack (110), and fabricating the plurality of laser chips (500) comprises dicing the wafer layer stack (110) into individual laser chips (500).

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