Semiconductor device, solid-state imaging device and electronic device

Abstract

Provided is a semiconductor device capable of suppressing capacitor performance deterioration caused by a bonding process. The present invention is configured such that, among a first substrate and a second substrate that are bonded to each other, a first electrode having one surface that is located on the same surface as the bonding surface of the first substrate and the second substrate is provided in the first substrate, and a second electrode having one surface that is located on the same surface as the bonding surface and that is bonded to the one surface of the first electrode is provided in the second substrate. The present invention is also configured to have at least one of a first capacitor that is provided in the first substrate and that has one electrode electrically connected to a non-exposed surface of the first electrode and a second capacitor that is provided in the second substrate and that has one electrode electrically connected to a non-exposed surface of the second electrode.

Description

[Technical field]

[0001] The present technology relates to a semiconductor device, a solid-state imaging device, and an electronic device. [Background technology]

[0002] Conventionally, a semiconductor device has been proposed that has a first substrate and a second substrate bonded to the first substrate, and a first connection electrode formed on the first substrate and a second connection electrode formed on the second substrate are electrically connected at the bonding surface between the first substrate and the second substrate (see, for example, Patent Document 1). In the semiconductor device described in Patent Document 1, an insulating film is disposed between the second connection electrode and a metal wiring provided in the second substrate to form a capacitor. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2011-166171 A Summary of the Invention [Problem to be solved by the invention]

[0004] Generally, when the first and second substrates are bonded together, the first and second substrates are subjected to warping correction, which applies stress to the capacitor. In addition, stress is also applied to the capacitor due to the difference in thermal expansion coefficient between the second connection electrode and the insulating film. In the semiconductor device described in Patent Document 1, the capacitor is located close to the bonding surface, and the contact area between the insulating film and the metal wiring that constitute the capacitor is large, so that the stress due to the bonding process is directly applied to the capacitor. This may result in, for example, cracks in the insulating film and variations in the polarization state of the insulating film, which may deteriorate the performance of the capacitor.

[0005] An object of the present disclosure is to provide a semiconductor device, a solid-state imaging device, and an electronic device that are capable of suppressing deterioration in performance of a capacitor due to a bonding process. [Means for solving the problem]

[0006] The semiconductor device of the present disclosure comprises: (a) a first substrate; (b) a second substrate bonded to the first substrate; (c) a first electrode provided in the first substrate, one surface of which is flush with the bonding surface between the first substrate and the second substrate; (d) a second electrode provided in the second substrate, one surface of which is flush with the bonding surface and bonded to one surface of the first electrode; and (e) at least one of a first capacitor provided in the first substrate, one electrode of which is electrically connected to the other surface of the first electrode, and a second capacitor provided in the second substrate, one electrode of which is electrically connected to the other surface of the second electrode.

[0007] The solid-state imaging device of the present disclosure comprises a sensor substrate on which a plurality of photoelectric conversion units are arranged, a logic substrate joined to the sensor substrate and integrating a circuit for processing electrical signals from the photoelectric conversion units, a first electrode provided in the sensor substrate and having one surface located on the same plane as the joining surface between the sensor substrate and the logic substrate, a second electrode provided in the logic substrate and having one surface located on the same plane as the joining surface and joined to one surface of the first electrode, and at least one of a first capacitor provided in the sensor substrate and having one electrode electrically connected to the other surface of the first electrode, and a second capacitor provided in the logic substrate and having one electrode electrically connected to the other surface of the second electrode.

[0008] The electronic device of the present disclosure comprises a solid-state imaging device including a sensor substrate on which a plurality of photoelectric conversion units are arranged, a logic substrate joined to the sensor substrate and integrating a circuit for processing electrical signals from the photoelectric conversion units, a first electrode provided in the sensor substrate and having one surface located on the same plane as the joining surface between the sensor substrate and the logic substrate, a second electrode provided in the logic substrate and having one surface located on the same plane as the joining surface and joined to one surface of the first electrode, at least one of a first capacitor provided in the sensor substrate and having one electrode electrically connected to the other surface of the first electrode, and a second capacitor provided in the logic substrate and having one electrode electrically connected to the other surface of the second electrode, an optical lens that forms an image light from a subject on an imaging surface of the solid-state imaging device, and a signal processing circuit that performs signal processing on a signal output from the solid-state imaging device. [Brief description of the drawings]

[0009] [Figure 1] 1 is a cross-sectional view showing an overall configuration of a semiconductor device according to a first embodiment. [Diagram 2] FIG. 2 is an enlarged cross-sectional view showing a first electrode. [Diagram 3] FIG. 2 is an enlarged cross-sectional view showing a first electrode. [Figure 4] FIG. 4 is an enlarged cross-sectional view showing a second electrode. [Diagram 5] FIG. 4 is an enlarged cross-sectional view showing a second electrode. [Figure 6] FIG. 3 is a cross-sectional view showing a first electrode and a second electrode that are joined together. [Figure 7] FIG. 3 is a cross-sectional view showing a first electrode and a second electrode that are joined together. [Figure 8] FIG. 3 is a cross-sectional view showing a first electrode and a second electrode that are joined together. [Figure 9] FIG. 3 is a cross-sectional view showing a first electrode and a second electrode that are joined together. [Figure 10A] 4 is a cross-sectional view showing a first substrate before a substrate connection region is formed. FIG. [Figure 10B] FIG. 4 is a cross-sectional view showing a second substrate before a substrate connection region is formed. [Figure 11A]FIG. 4 is a cross-sectional view showing the first substrate after the substrate connection region is formed. [Figure 11B] FIG. 4 is a cross-sectional view showing the second substrate after the substrate connection region is formed. [Figure 12] FIG. 4 is a cross-sectional view showing the first substrate and the second substrate after bonding. [Figure 13] FIG. 4 is a cross-sectional view showing the first substrate and the second substrate after being thinned. [Figure 14] FIG. 2 is a plan view showing the overall configuration of a sensor substrate. [Figure 15] FIG. 11 is a cross-sectional view showing a second electrode according to a modified example. [Figure 16] FIG. 11 is a cross-sectional view showing a second capacitor according to a modified example. [Figure 17] 13 is a cross-sectional view showing a substrate connection region according to a modified example. FIG. [Figure 18A] FIG. 11 is a cross-sectional view showing a second capacitor according to a modified example. [Figure 18B] 18B is a plan view showing the second substrate of FIG. 18A as viewed from the bonding surface side. [Figure 19] FIG. 11 is a cross-sectional view showing a second capacitor according to a modified example. [Figure 20] FIG. 1 is a block diagram illustrating an example of a schematic configuration of a solid-state imaging device. [Figure 21] 1 is a cross-sectional view showing a cross section of one pixel of a solid-state imaging device. [Figure 22] FIG. 1 is a block diagram illustrating an example of a schematic configuration of a solid-state imaging device. [Figure 23A] FIG. 2 is an enlarged cross-sectional view showing a first substrate. [Figure 23B] FIG. 4 is an enlarged cross-sectional view showing a second substrate. [Figure 24] FIG. 2 is a circuit diagram showing the circuit configuration of one pixel of the solid-state imaging device. [Diagram 25] 1 is a circuit diagram showing a circuit configuration for four pixels in two rows and two columns of a solid-state imaging device. [Figure 26] 4 is a timing chart showing a method of driving the solid-state imaging device. [Figure 27] FIG. 1 is a diagram illustrating an example of a schematic configuration of an electronic device. [Figure 28]1 is a block diagram showing an example of a schematic configuration of a vehicle control system; [Figure 29] 4 is an explanatory diagram showing an example of the installation positions of an outside-vehicle information detection unit and an imaging unit; FIG. [Diagram 30] 1 is a diagram illustrating an example of a schematic configuration of an endoscopic surgery system. [Diagram 31] 2 is a block diagram showing an example of a functional configuration of a camera head and a CCU. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] An example of a semiconductor device according to an embodiment of the present disclosure will be described below with reference to FIGS. 1 to 31. The embodiment of the present disclosure will be described in the following order. Note that the present disclosure is not limited to the following example. Also, the effects described in this specification are merely examples and are not limiting, and other effects may be present.

[0011] 1. First embodiment: semiconductor device 1-1 Structure of semiconductor device 1-2 Manufacturing method of semiconductor device 1-3 Variations 2. Application example to solid-state imaging devices 2-1 Configuration of solid-state imaging device 2-2 Main components 2-3 Variations 3. Application examples to electronic devices 4. Application examples for moving objects 5. Application example to endoscopic surgery system

[0012] 1. First embodiment [1-1 Configuration of semiconductor device] 1, the semiconductor device 1 according to the first embodiment includes a first substrate 2 and a second substrate 3 bonded to the first substrate 2. The first substrate 2 may be, for example, a sensor substrate on which a plurality of photoelectric conversion units are arranged. The second substrate 3 may be, for example, a logic substrate on which circuits for processing electrical signals from the photoelectric conversion units are integrated. The first substrate 2 and the second substrate 3 may be bonded together by, for example, plasma bonding. An interlayer insulating film 4 is provided on the second substrate 3 side of the first substrate 2 (the lower side in FIG. 1). The interlayer insulating film 4 has a plurality of wiring layers therein. FIG. 1 illustrates an example in which the plurality of wiring layers include four layers, a first wiring layer 5a, a second wiring layer 5b, a third wiring layer 5c, and a fourth wiring layer 5d. That is, in FIG. 1, the interlayer insulating film 4 and the first wiring layer 5a, the second wiring layer 5b, the third wiring layer 5c, and the fourth wiring layer 5d form a multi-layer wiring layer. Note that the number of wiring layers illustrated in FIG. 1 is an example, and the number of wiring layers included in the interlayer insulating film 4 may be other than four. Although detailed illustration is omitted, the first wiring layer 5a, the second wiring layer 5b, the third wiring layer 5c and the fourth wiring layer 5d are each electrically connected to elements etc. provided on the first substrate 2.

[0013] An interlayer insulating film 6 is provided on the surface of the interlayer insulating film 4 facing the second substrate 3 (the lower side in FIG. 1). As shown in FIGS. 2 and 3, the interlayer insulating film 6 is provided with a plurality of first electrodes 7, one surface of which (hereinafter also referred to as "exposed surface S1") is located on the same plane as the bonding surface S2 between the first substrate 2 and the second substrate 3. That is, the exposed surface S1 of the first electrodes 7 is exposed from the surface (bonding surface S2) of the interlayer insulating film 6 facing the second substrate 3. For example, a copper electrode made of pure copper or a copper alloy can be used as the first electrodes 7. As shown in Figures 1, 2 and 3, the first electrode 7 is composed of a flat first electrode pad 8 having one surface (the lower surface in Figures 1 to 3) located on the same plane as the bonding surface S2, and a columnar first via 9 extending from the other surface (the upper surface in Figures 1 to 3) of the first electrode pad 8 in the thickness direction of the first substrate 2 (upward in Figures 1 and 2).

[0014] 2, the other surface (hereinafter also referred to as "non-exposed surface S3") of some of the first electrodes 7 (hereinafter also referred to as "first electrodes 7a") among the plurality of first electrodes 7 is electrically connected to the wiring of the fourth wiring layer 5d, that is, the wiring of the wiring layer closest to the second substrate 3 side (lower side in FIG. 2). Also, as shown in FIG. 3, the other surface (non-exposed surface S3) of some of the first electrodes 7 (part or all of the first electrodes 7 other than the first electrodes 7a. Hereinafter also referred to as "first electrodes 7b") among the plurality of first electrodes 7 is electrically connected to the wiring of the fourth wiring layer 5d via a first capacitor 10 provided in the interlayer insulating film 6.

[0015] The first capacitor 10 includes two flat electrodes 11 and 12 facing each other, and an insulating film 13 disposed between the two electrodes 11 and 12. The electrode 11 is disposed on the second substrate 3 side (lower side in FIG. 3), and is electrically connected to the first electrode 7b. The electrode 12 is disposed on the opposite side to the second substrate 3 side (upper side in FIG. 3), and is electrically connected to the wiring of the fourth wiring layer 5d. The material of the electrodes 11 and 12 is a conductor in which copper is difficult to diffuse and which is difficult to diffuse into the insulating film 13. Examples of the material include refractory metals such as tantalum (Ta), tantalum nitride (TaN), titanium (Ti), titanium nitride (TiN), tungsten nitride (WN), zirconium nitride (ZnN), and cobalt (Co), and refractory metal nitrides. The insulating film 13 may be a single layer film made of any of high dielectric constant insulating materials such as tantalum oxide (TaO), hafnium oxide (HfO), aluminum oxide (AlO), silicon nitride (SiN), zirconium oxide (ZnO), or a multilayer film made of a combination of these materials.

[0016] Returning to FIG. 1, an interlayer insulating film 14 is provided on the first substrate 2 side (upper side in FIG. 1) of the second substrate 3. The interlayer insulating film 14 has a plurality of wiring layers therein. FIG. 1 illustrates an example in which the plurality of wiring layers include a first wiring layer 15a, a second wiring layer 15b, a third wiring layer 15c, a fourth wiring layer 15d, a fifth wiring layer 15e, and a sixth wiring layer 15f. That is, in FIG. 1, the interlayer insulating film 14 and the first wiring layer 15a to the sixth wiring layer 15f form a multi-layer wiring layer. Note that the number of wiring layers shown in FIG. 1 is an example, and the number of wiring layers included in the interlayer insulating film 14 may be other than six. Although detailed illustration is omitted, each of the first wiring layer 15a to the sixth wiring layer 15f is electrically connected to an element or the like provided on the second substrate 3.

[0017] An interlayer insulating film 16 is provided on the surface of the interlayer insulating film 14 facing the first substrate 2 (upper side in FIG. 1). As shown in FIGS. 4 and 5, the interlayer insulating film 16 is provided with a plurality of second electrodes 17, one surface of which (hereinafter also referred to as "exposed surface S4") is located on the same plane as the bonding surface S2. That is, the exposed surface S4 of the second electrodes 17 is exposed from the surface of the interlayer insulating film 16 facing the first substrate 2 (bonding surface S2). For example, a copper electrode made of pure copper or a copper alloy can be used as the second electrodes 17. As shown in Fig. 1, Fig. 4 and Fig. 5, the second electrode 17 includes a flat second electrode pad 18 whose one surface (the upper surface in Fig. 1, Fig. 4 and Fig. 5) is located on the same plane as the bonding surface S2, and a columnar second via 19 extending from the other surface (the lower surface in Fig. 1, Fig. 4 and Fig. 5) of the second electrode pad 18 in the thickness direction of the second substrate 3 (the downward direction in Fig. 1, Fig. 4 and Fig. 5). The second electrode pad 18 is disposed symmetrically with the first electrode pad 8 with the bonding surface S2 in between. That is, on the bonding surface S2, the first electrode pad 8 and the second electrode pad 18 are bonded to each other, and the interlayer insulating film 6 and the interlayer insulating film 16 are bonded to each other.

[0018] As shown in FIG. 4, the other surface (hereinafter also referred to as "non-exposed surface S5") of some of the second electrodes 17 (hereinafter also referred to as "second electrodes 17a") among the plurality of second electrodes 17 is electrically connected to the wiring of the sixth wiring layer 15f, that is, the wiring of the wiring layer closest to the first substrate 2 (upper side in FIG. 4). The second electrode 17a is connected to the first electrode 7a connected to the wiring of the fourth wiring layer 5d, or the first electrode 7b connected to the wiring of the fourth wiring layer 5d via the first capacitor 10. At the connection point between the second electrode 17a and the first electrode 7a, as shown in FIG. 6, the wiring of the fourth wiring layer 5d of the first substrate 2 and the wiring of the sixth wiring layer 15f of the second substrate 3 are electrically connected via the first electrode 7a and the second electrode 17a. Therefore, it is possible to transmit a DC signal or supply a DC power supply between the wiring of the fourth wiring layer 5d of the first substrate 2 and the wiring of the sixth wiring layer 15f of the second substrate 3. On the other hand, at the connection point between the second electrode 17a and the first electrode 7b, as shown in Fig. 7, the wiring of the fourth wiring layer 5d of the first substrate 2 and the wiring of the sixth wiring layer 15f of the second substrate 3 are electrically connected via the first capacitor 10 in addition to the first electrode 7b and the second electrode 17a. Then, the charges of these wirings can be stored in the first capacitor 10. When realizing the configuration of the connection point shown in Fig. 7, for example, either the wiring of the fourth wiring layer 5d or the wiring of the sixth wiring layer 15f electrically connected to the first capacitor 10 may be used as a ground wiring.

[0019] 5, the other surface (non-exposed surface S5) of some of the second electrodes 17 (part or all of the second electrodes 17 other than the second electrode 17a. Hereinafter, also referred to as "second electrode 17b") among the plurality of second electrodes 17 is electrically connected to the wiring of the sixth wiring layer 15f via a second capacitor 20 provided in the interlayer insulating film 16. The second electrode 17b is connected to the first electrode 7a connected to the wiring of the fourth wiring layer 5d, or the first electrode 7b connected to the wiring of the fourth wiring layer 5d via a first capacitor 10, like the second electrode 17a. At the connection point between the second electrode 17b and the first electrode 7a, the wiring of the fourth wiring layer 5d of the first substrate 2 and the wiring of the sixth wiring layer 15f of the second substrate 3 are electrically connected via the first electrode 7a, the second electrode 17b, and the second capacitor 20, as shown in FIG. 8. Then, the electric charges of these wirings can be stored in the second capacitor 20. On the other hand, at the connection point between the second electrode 17b and the first electrode 7b, as shown in Fig. 9, the wiring of the fourth wiring layer 5d of the first substrate 2 and the wiring of the sixth wiring layer 15f of the second substrate 3 are electrically connected via the first capacitor 10 in addition to the first electrode 7b, the second electrode 17b, and the second capacitor 20. Then, the charges of these wirings can be stored in the first capacitor 10 and the second capacitor 20. When realizing the configuration of the connection point shown in Figs. 8 and 9, for example, either the wiring of the fourth wiring layer 5d or the wiring of the sixth wiring layer 15f electrically connected to the first capacitor 10 or the second capacitor 20 may be used as a ground wiring.

[0020] The second capacitor 20 includes two plate-shaped electrodes 21 and 22 facing each other, and an insulating film 23 disposed between the two electrodes 21 and 22. The electrode 21 is disposed on the first substrate 2 side (upper side in FIG. 5), and is electrically connected to the second electrode 17b. The electrode 22 is disposed on the opposite side to the first substrate 2 side (lower side in FIG. 5), and is electrically connected to a wiring of the sixth wiring layer 15f. The electrodes 21 and 22 and the insulating film 23 may be made of the same material as the electrodes 11 and 12 and the insulating film 13 of the first substrate 2, for example. Here, the region between the fourth wiring layer 5d of the first substrate 2 and the sixth wiring layer 15f of the second substrate 3 is defined as a substrate connection region 24. That is, the substrate connection region 24 is a region where the interlayer insulating film 6 of the first substrate 2 and the interlayer insulating film 16 of the second substrate 3 are provided. The first capacitor 10 and the second capacitor 20 are each disposed in the outermost layer of the substrate connection region 24.

[0021] With this configuration, the substrate connection region 24 electrically connects the wiring of the fourth wiring layer 5d and the wiring of the sixth wiring layer 15f via the first electrode 7a and the second electrode 17a, as shown in Fig. 6, to transmit signals and supply power between the first substrate 2 and the second substrate 3. Also, as shown in Fig. 7, Fig. 8, and Fig. 9, the wiring of the fourth wiring layer 5d and the wiring of the sixth wiring layer 15f are electrically connected via the first capacitor 10 and the second capacitor 20 in addition to the first electrode 7b and the second electrode 17a, to realize a capacitor function for accumulating charges of the wiring of the fourth wiring layer 5d and the wiring of the sixth wiring layer 15f.

[0022] [1-2 Manufacturing method of semiconductor device] Next, a method for manufacturing the semiconductor device 1 of the first embodiment will be described. Figures 10A, 10B, 11A, 11B, 12, and 13 are diagrams showing the manufacturing process of the semiconductor device 1 of the first embodiment. First, as shown in Figures 10A and 10B, a first substrate 2 (e.g., a sensor substrate) before the substrate connection region 24, the color filter 36, and the microlens 37 are formed, and a second substrate 3 (e.g., a logic substrate) before the substrate connection region 24 is formed are prepared. 11A, a first capacitor 10, an interlayer insulating film 6, a first via 9, and a first electrode pad 8 are formed in this order on the prepared first substrate 2. This forms a substrate connection region 24 on the first substrate 2. Similarly, as shown in FIG. 11B, a second capacitor 20, an interlayer insulating film 16, a second via 19, and a second electrode pad 18 are formed in this order on the prepared second substrate 3. This forms a substrate connection region 24 on the second substrate 3. 12, the first substrate 2 and the second substrate 3 are bonded together so that the substrate connection region 24 of the first substrate 2 and the substrate connection region 24 of the second substrate 3 overlap with each other. As a method for bonding the first substrate 2 and the second substrate 3, for example, plasma bonding can be used. Next, as shown in FIG. 13, the first substrate 2 is thinned. 1, a color filter 36, a microlens 37, and the like are formed on the light incident side of the first substrate 2. In this way, the semiconductor device 1 of the first embodiment is formed.

[0023] As described above, the semiconductor device 1 of the first embodiment includes at least one of the first capacitor 10 provided in the first substrate 2 and one electrode 11 electrically connected to the non-exposed surface S3 of the first electrode 7 (7b), and the second capacitor 20 provided in the second substrate 3 and one electrode 21 electrically connected to the non-exposed surface S5 of the second electrode 17 (17b), as shown in Figs. 1 to 5. Therefore, compared to a method in which the first electrode 7 (7b) is the electrode 11 of the first capacitor 10 and the second electrode 17 (17b) is the electrode 21 of the second capacitor 20, for example, the positions of the first capacitor 10 and the second capacitor 20 are farther from the bonding surface S2, so that stress due to the bonding process is not directly applied to the first capacitor 10 and the second capacitor 20. Therefore, it is possible to provide a semiconductor device 1 capable of suppressing performance degradation of the first capacitor 10 and the second capacitor 20 (capacitors) due to the bonding process.

[0024] Furthermore, since the first electrode 7 (7b) and the second electrode 17 (17b) do not contact the insulating film 13 of the first capacitor 10 and the insulating film 23 of the second capacitor 20, even if the first electrode 7 (7b) and the second electrode 17 (17b) are copper electrodes made of pure copper or a copper alloy, the copper contained in the first electrode 7 (7b) and the second electrode 17 (17b) can be prevented from diffusing into the insulating films 13, 23. Furthermore, for example, compared to a method in which the first electrode 7 and the second electrode 17 are used as the electrodes 11 and 21 of the first capacitor 10 and the second capacitor 20, the degree of freedom in the material of the electrodes 11 and 21 can be increased, and the characteristics of the first capacitor 10 and the second capacitor 20 can be improved.

[0025] Also, unlike, for example, a method of providing the first capacitor 10 and the second capacitor 20 in the fourth wiring layer 5d of the first substrate 2 and the sixth wiring layer 15f of the second substrate 3, it is possible to prevent the first capacitor 10 from using the region in the fourth wiring layer 5d and the second capacitor 20 from using the region in the sixth wiring layer 15f, and it is possible to suppress the fourth wiring layer 5d and the sixth wiring layer 15f from becoming large, and to suppress an increase in the size of the semiconductor device 1. It is also possible to prevent an increase in the wiring density of the fourth wiring layer 5d and the sixth wiring layer 15f, and to improve the yield. That is, the semiconductor device 1 of the first embodiment is made by noting that the substrate connection region 24 between the first substrate 2 and the second substrate 3 is not an area with a tight metal density like the first wiring layer 5a to the fourth wiring layer 5d of the first substrate 2 or the first wiring layer 15a to the sixth wiring layer 15f of the second substrate 3. According to the semiconductor device 1 of the first embodiment, the substrate connection region 24 can be effectively utilized by providing the first capacitor 10 and the second capacitor 20 in the substrate connection region 24.

[0026] Furthermore, in the semiconductor device 1 of the first embodiment, by using the first capacitor 10 and the second capacitor 20, it is possible to realize a cutoff function for noise generated in a power supply or an analog circuit, and a storage function for temporarily holding electric charge. For example, if the power supply contains noise, the semiconductor device 1 runs on the power supply containing the noise, and there is a possibility that the semiconductor device 1 does not operate properly. In contrast, by realizing the noise cutoff function, the power supply from which the noise has been removed is supplied to the semiconductor device 1, and the semiconductor device 1 can operate properly. In particular, by mounting a capacitor (the first capacitor 10, the second capacitor 20) on each of the first substrate 2 and the second substrate 3, it is possible to more than double the noise removal performance.

[0027] Here, a case will be considered in which a solid-state imaging device is configured as the semiconductor device 1 using a sensor substrate as the first substrate 2 and a logic substrate as the second substrate 3. In such a solid-state imaging device (semiconductor device 1), as shown in FIG. 14, a pixel region 25 provided with a photoelectric conversion section and the like is disposed in the chip center of the sensor substrate (first substrate 2), an I / O section 26 provided with an I / O pad and the like is disposed in the chip periphery, and a driver 27 serving as a transmission path of a photoelectrically converted signal is disposed between the pixel region 25 and the I / O section 26. The driver 27 is configured by arranging first electrodes 7a (see FIG. 2) joined to second electrodes 17a (see FIG. 4) in an array. Then, the solid-state imaging device (semiconductor device 1) transmits a signal photoelectrically converted in the pixel region 25 of the image sensor (first substrate 2) to the logic substrate (second substrate 3) via the driver 27, performs a calculation on the logic substrate (second substrate 3) based on the transmitted signal, and outputs the calculation result to an external display or the like via the I / O section 26.

[0028] In the solid-state imaging device (semiconductor device 1) as shown in FIG. 14, generally, in the region other than the region occupied by the driver 27, that is, in most of the region of the sensor substrate (first substrate 2), dummy electrodes for robustly joining the first substrate 2 and the second substrate 3 are laid out. The dummy electrodes are electrodes that have electrode pads, vias, etc., like the first electrode 7 and the second electrode 17, but are not electrically connected to either the first substrate 2 or the second substrate 3. Therefore, the region in which the dummy electrodes are laid out does not have the function of electrically connecting the first substrate 2 and the second substrate 3, and can be used for the layout of the first electrode 7a and the second electrode 17a of the first embodiment, that is, the electrodes electrically connected to the first capacitor 10 and the second capacitor 20. Therefore, when the solid-state imaging device (semiconductor device 1) as shown in FIG. 14 is constructed, a wide region can be prepared as a region in which the first capacitor 10 and the second capacitor 20 can be laid out, and the degree of freedom of the layout of the first capacitor 10 and the second capacitor 20 can be increased, and the difficulty of designing the solid-state imaging device (semiconductor device 1) can be reduced.

[0029] In addition, in the solid-state imaging device (semiconductor device 1) shown in FIG. 14, if the power supply contains noise, the solid-state imaging device (semiconductor device 1) operates with the power supply containing noise, so that the image created by the solid-state imaging device (semiconductor device 1) reacts sensitively to the noise, and in the worst case, streaks may appear in the image. Here, the power supply is generated by an AC-DC conversion unit inside a system such as a smartphone, camera, or monitoring device in which the solid-state imaging device (semiconductor device 1) is mounted, and is supplied from a plurality of terminals provided in the I / O section 26. In contrast, when the solid-state imaging device (semiconductor device 1) shown in FIG. 14 is configured, there is a wide area around the I / O section 26 in which the first capacitor 10 and the second capacitor 20 can be laid out. Therefore, the first capacitor 10 and the second capacitor 20 can be laid out near the I / O section 26 to realize a noise cutoff function, and a power supply from which noise has been removed can be supplied to the solid-state imaging device (semiconductor device 1), and the solid-state imaging device (semiconductor device 1) can create clearer images.

[0030] Furthermore, by arranging the first capacitor 10 and the second capacitor 20 near the I / O section 26 to realize a noise cutoff function, it is possible to remove noise from the signal output to the display via the I / O section 26, for example, thereby reducing the electrical load on the display and further enabling an image with less noise to be displayed on the display.

[0031] Although the above description concerns a case where a noise cutoff function is realized at a macro level, the same effect can be obtained when a noise cutoff function is realized at a micro level. For example, in a solid-state imaging device (semiconductor device 1) as shown in FIG. 14, when noise is superimposed on a signal from a photoelectric conversion unit in an analog circuit such as a pixel transistor, it is difficult to prevent degradation of signal quality even if the signal is digitized by an A / D converter for each pixel or area. In contrast, if a noise cut function can be realized for each pixel or area using the first capacitor 10 and the second capacitor 20, degradation of signal quality can be prevented, and a clear image can be created by the solid-state imaging device (semiconductor device 1). In addition, by realizing a storage function by laying out the first capacitor 10 and the second capacitor 20, they can also be used for charge accumulation in a global shutter. By using them for charge accumulation, it is possible to capture an image of a subject moving at high speed without distortion.

[0032] In the semiconductor device 1 of the first embodiment, the first electrode 7 includes a first electrode pad 8 having one surface located on the same plane as the bonding surface S2, and a first via 9 extending from the other surface of the first electrode pad 8. The second electrode 17 includes a second electrode pad 18 having one surface located on the same plane as the bonding surface S2, and a second via 19 extending from the other surface of the second electrode pad 18. This reduces the amount of copper used by the first electrode 7 and the second electrode 17, thereby reducing manufacturing costs, and also makes it possible to increase the bonding surface S2 of the first electrode 7 and the second electrode 17.

[0033] In the semiconductor device 1 of the first embodiment, at least one of the first capacitor 10 and the second capacitor 20 includes two electrodes 11, 12 facing each other, and an insulating film 13 disposed between the two electrodes 11, 12. Therefore, the first capacitor 10 and the second capacitor 20 can have an MIM (metal-insulator-metal) structure, and the capacitance density of the first capacitor 10 and the second capacitor 20 can be increased.

[0034] [1-3 Modifications] (1) In the first embodiment, an example has been shown in which the second electrode 17 is configured by the second electrode pad 18 and the second via 19, but other configurations may also be adopted. For example, as shown in Fig. 15, the second via 19 may be omitted and the second electrode 17 may be configured by only the second electrode pad 18. Similarly, the first electrode 7 may be configured by only the first electrode pad 8.

[0035] (2) In the first embodiment, the electrode 22 of the second capacitor 20 is connected to the wiring of the sixth wiring layer 15f, but other configurations may be adopted. For example, as shown in FIG. 16, the electrode 22 may be electrically connected to a second electrode 17 other than the second electrode 17 connected to the electrode 21. In FIG. 16, an insulating film 28 is disposed between the electrode 22 and the wiring of the sixth wiring layer 15f so that they are not electrically connected. Also, the periphery of the second via 19 of the second electrode 17 connected to the electrode 22 is covered with an insulating film 29 so as not to be electrically connected to the electrode 21. Similarly, the electrode 12 of the first capacitor 10 may be electrically connected to a first electrode 7 other than the first electrode 7 connected to the electrode 11.

[0036] (3) Here, the capacitance C of a capacitor is generally expressed as the relative dielectric constant ε r It is defined by the following equation (1) using the dielectric constant of vacuum ε0, the electrode area S, and the distance between the electrodes d. C=ε r ε0 S / d ………(1) According to the above formula (1), the capacitance C of the capacitor is increased by the reduction of the distance d between the electrodes, the increase of the electrode area S, and the relative dielectric constant ε r However, reducing the distance d between the electrodes requires making the insulating film between the electrodes thinner, which increases the possibility of shorting between the electrodes. In particular, when forming a capacitor by stacking using planar technology, the relative dielectric constant ε r In general, a thin film of a material with a high dielectric constant is used as the insulating film. This increases the possibility of short circuits between electrodes. The probability of short circuits between electrodes is largely affected by defects in the insulating film caused by dust and the like, and is determined by the defect density of the insulating film. The defect density of the insulating film can be reduced to a certain extent by improving the equipment and processes used in the manufacture of the semiconductor device 1, but it cannot be reduced to zero.

[0037] In contrast, by utilizing the high degree of freedom in the layout of the first capacitor 10 and the second capacitor 20, at least one of the first capacitor 10 and the second capacitor 20 may be divided and laid out. In this case, as shown in FIG. 17, two or more of the multiple first capacitors 10 or two or more of the multiple second capacitors 20 are connected to the same wiring. FIG. 17 illustrates a configuration in which two or more second capacitors 20 are connected to the same wiring (the wiring of the fourth wiring layer 5d) in the first substrate 2. By using the configuration shown in FIG. 17, two or more second capacitors 20 can be connected in parallel, and the same capacitance as that of a large capacitor having the same area as the total area of ​​the parallel-connected second capacitors 20 can be realized. That is, since a large capacitance can be realized with a small capacitor (second capacitor 20), the yield of the semiconductor device 1 can be improved. Furthermore, by redundantly laying out the divided capacitor (second capacitor 20), the yield of the semiconductor device 1 can be further improved. Although an example in which two or more of the plurality of second capacitors 20 are connected to the same wiring has been described, the same effect can be obtained when two or more of the plurality of first capacitors 10 are connected to the same wiring.

[0038] (4) In the first embodiment, the first capacitor 10 has an insulating film 13 disposed between two electrodes 11, 12, and the second capacitor 20 has an insulating film 23 disposed between two electrodes 21, 22. However, other configurations may be adopted. For example, at least one of the first capacitor 10 and the second capacitor 20 may have a multilayer structure in which electrodes 30 and insulating films 31 are alternately and repeatedly disposed, as shown in Figs. 18A and 18B. 18A and 18B illustrate a configuration in which the second capacitor 20 has a multi-layer structure. In FIG. 18A and 18B, among the electrodes 30 forming the multi-layer structure, the electrode 30 (hereinafter also referred to as "electrode 30a") closest to the sixth wiring layer 15f is electrically connected to the sixth wiring layer 15f, and the other electrodes 30 (hereinafter also referred to as "electrode 30b", "electrode 30c", "electrode 30d", and "electrode 30e") are electrically connected to different second electrodes 17. That is, each of the electrodes 30b to 30e corresponds to "one electrode 21" in the first embodiment. The periphery of the second via 19 of the second electrode 17 is covered with an insulating film 32 so as not to be electrically connected to the electrode 30 that is not to be connected. The second capacitor 20 shown in Figures 18A and 18B forms a capacitor between electrodes 30a, 30b and insulating film 31, a capacitor between electrodes 30b, 30c and insulating film 31, a capacitor between electrodes 30c, 30d and insulating film 31, and a capacitor between electrodes 30d, 30e and insulating film 31, forming a total of four capacitors. 18A and 18B, the capacitors can be appropriately laid out even when there are restrictions on the area in which the capacitors can be laid out, such as when a capacitor (second capacitor 20) is provided for each pixel. Although an example in which the second capacitor 20 has a multi-layer structure has been described, the same effect can be obtained when the first capacitor 10 has a multi-layer structure.

[0039] (5) In the first embodiment, the first capacitor 10 and the second capacitor 20 are flat, but other configurations may be adopted. For example, as shown in Fig. 19, the first capacitor 10 and the second capacitor 20 may be three-dimensional so that the areas of the electrodes 11, 12, 21, and 22 of the first capacitor 10 and the second capacitor 20 are large. FIG. 19 illustrates a configuration in which the second capacitor 20 has a three-dimensional shape. In FIG. 19, the second capacitor 20 includes a bottom 33 and sidewalls 34, 35 extending from the edge of the bottom 33 in a direction intersecting the bottom 33. The second capacitor 20 is provided on the sixth wiring layer 15f, and the end faces of the sidewalls 34, 35 on the first substrate 2 side are located on the same plane as the bonding surface S2. With the configuration shown in FIG. 19, the area of ​​the electrodes 21, 22 of the second capacitor 20 can be increased, and the capacitance of the second capacitor 20 can be increased. Furthermore, by connecting the second capacitors 20 with increased capacitance in parallel, the same capacitance as that of a capacitor having an area equal to the total area of ​​the second capacitors 20 connected in parallel can be realized. In this case, by using aluminum (Al) as the wiring of the sixth wiring layer 15f on which the second capacitor 20 is provided, processing can be easily performed and the process cost can be reduced. Although the example in which second capacitor 20 is formed by bottom portion 33 and sidewall portions 34, 35 has been described, the same effect can be obtained when first capacitor 10 is formed by a bottom portion and sidewall portions.

[0040] <2. Application example to solid-state imaging device> [2-1 Structure of solid-state imaging device] The technology according to the present disclosure (the present technology) can be applied to various products. For example, the technology according to the present disclosure may be applied to a solid-state imaging device. FIG. 20 is a diagram showing an example of a schematic configuration of a solid-state imaging device to which the technology according to the present disclosure (the present technology) can be applied. As shown in FIG. 20, the solid-state imaging device 101 includes a pixel section 103 consisting of a plurality of pixels 102 arranged on a substrate 111 made of silicon, a vertical driving circuit 104, a column signal processing circuit 105, a horizontal driving circuit 106, an output circuit 107, a control circuit 108, and the like.

[0041] The pixel 102 is composed of a photoelectric conversion unit made up of a photodiode, a charge storage capacitance unit, and a plurality of MOS transistors, and is regularly arranged in a two-dimensional array on the substrate 111. The MOS transistors constituting the pixel 102 may be four MOS transistors composed of a transfer transistor, a reset transistor, a selection transistor, and an amplifier transistor, or may be three MOS transistors excluding the selection transistor.

[0042] The pixel section 103 is composed of a plurality of pixels 102 arranged regularly in a two-dimensional array. The pixel section 103 is composed of an effective pixel area that actually receives light, amplifies the signal charge generated by photoelectric conversion, and reads it out to a column signal processing circuit 105, and a black reference pixel area (not shown) for outputting optical black that serves as a reference for the black level. The black reference pixel area is usually formed on the outer periphery of the effective pixel area.

[0043] Based on the vertical synchronization signal, the horizontal synchronization signal, and the master clock, the control circuit 108 generates clock signals and control signals that serve as a reference for the operations of the vertical drive circuit 104, the column signal processing circuit 105, the horizontal drive circuit 106, etc. The clock signals and control signals generated by the control circuit 108 are input to the vertical drive circuit 104, the column signal processing circuit 105, the horizontal drive circuit 106, etc.

[0044] The vertical drive circuit 104 is configured with, for example, a shift register, and sequentially selects and scans each pixel 102 of the pixel unit 103 in the vertical direction on a row-by-row basis. Then, a pixel signal based on a signal charge generated in the photodiode of each pixel 102 according to the amount of received light is supplied to a column signal processing circuit 105 through a vertical signal line 109.

[0045] The column signal processing circuit 105 is arranged, for example, for each column of pixels 102, and performs signal processing such as noise removal and signal amplification on signals output from one row of pixels 102 for each pixel column using signals from a black reference pixel area (not shown, but formed around the effective pixel area). A horizontal selection switch (not shown) is provided between the output stage of the column signal processing circuit 105 and the horizontal signal line 110.

[0046] The horizontal drive circuit 106 is configured, for example, by a shift register, and sequentially outputs horizontal scanning pulses to select each of the column signal processing circuits 105 in turn, and cause each of the column signal processing circuits 105 to output a pixel signal to a horizontal signal line 110.

[0047] The output circuit 107 processes signals sequentially supplied from each of the column signal processing circuits 105 through a horizontal signal line 110 and outputs the processed signals.

[0048] [2-2 Sensor board configuration] Next, there will be described a schematic configuration of the sensor substrate constituting the solid-state imaging device 101. Fig. 21 is a cross-sectional view showing a cross section of one pixel of the sensor substrate 20000. 21, in a sensor substrate 20000, a PD (photodiode) 20019 receives incident light 20001 incident from the back surface (top surface in the figure) of a semiconductor substrate 20018. A planarization film 20013, a CF (color filter) 20012, and a microlens 20011 are provided above the PD 20019, and the incident light 20001 incident through each part in sequence is received by a light receiving surface 20017 and photoelectric conversion is performed.

[0049] For example, in the PD20019, an n-type semiconductor region 20020 is formed as a charge accumulation region that accumulates charges (electrons). In the PD20019, the n-type semiconductor region 20020 is provided inside the p-type semiconductor regions 20016, 20041 of the semiconductor substrate 20018. On the front (lower) side of the semiconductor substrate 20018, a p-type semiconductor region 20041 having a higher impurity concentration than the back (upper) side is provided. In other words, the PD20019 has a HAD (Hole-Accumulation Diode) structure, and the p-type semiconductor regions 20016, 20041 are formed so as to suppress the generation of dark current at each interface between the upper and lower sides of the n-type semiconductor region 20020.

[0050] A pixel separator 20030 that electrically separates the multiple pixels 20010 is provided inside the semiconductor substrate 20018, and the PD 20019 is provided in an area partitioned by this pixel separator 20030. When the solid-state imaging device is viewed from the top side in the figure, the pixel separator 20030 is formed, for example, in a lattice shape so as to be interposed between the multiple pixels 20010, and the PD 20019 is formed in the area partitioned by this pixel separator 20030.

[0051] The anode of each PD20019 is grounded, and in the solid-state imaging device, the signal charge (e.g., electrons) accumulated in the PD20019 is read out via a transfer Tr (MOS FET) not shown, and output as an electrical signal to a VSL (vertical signal line) not shown.

[0052] The wiring layer 20050 is provided on the front surface (lower surface) of the semiconductor substrate 20018 opposite to the back surface (upper surface) on which the light shielding film 20014, the CF 20012, the microlens 20011, and the like are provided.

[0053] The wiring layer 20050 includes wiring 20051 and an insulating layer 20052, and the wiring 20051 is formed in the insulating layer 20052 so as to be electrically connected to each element. The wiring layer 20050 is a so-called multi-layer wiring layer, and is formed by alternately stacking an interlayer insulating film constituting the insulating layer 20052 and wiring 20051 multiple times. Here, as the wiring 20051, wiring to a Tr for reading out charges from the PD 20019 such as a transfer Tr, and each wiring such as a VSL are stacked via the insulating layer 20052.

[0054] A substrate connection region 20061 is provided on the surface of the wiring layer 20050 opposite to the side on which the PD 20019 is provided. The substrate connection region 20061 includes a capacitor 20062, an electrode 20063, and an interlayer insulating film 20064, and is configured such that one electrode of the capacitor 20062 is electrically connected to the wiring 20051 of the wiring layer 20050 within the interlayer insulating film 20064. The other electrode of the capacitor 20062 is electrically connected to the electrode 20063, and the electrode 20063 is exposed from the back surface of the substrate connection region 20061 (the bottom surface in the figure). 21 illustrates an example in which the electrode 20063 includes a flat electrode pad 20065 located on the same plane as the back surface of the substrate connection region 20061, and a columnar via 20066 extending in the thickness direction of the sensor substrate 20000 (upward in FIG. 21) from the back surface (upper surface in the figure) of the electrode pad 20065. The substrate connection region 20061 is joined to the substrate connection region (not shown) of the logic substrate such that the electrode (not shown) of the logic chip and the electrode 20063 overlap.

[0055] The light-shielding film 20014 is provided on the back surface (upper surface in the figure) of the semiconductor substrate 20018 .

[0056] The light-shielding film 20014 is configured to block a part of the incident light 20001 traveling from above the semiconductor substrate 20018 toward the rear surface of the semiconductor substrate 20018 .

[0057] The light-shielding film 20014 is provided above a pixel separating portion 20030 provided inside a semiconductor substrate 20018. Here, the light-shielding film 20014 is provided so as to protrude in a convex shape on the rear surface (upper surface) of the semiconductor substrate 20018 via an insulating film 20015 such as a silicon oxide film. In contrast, above a PD 20019 provided inside the semiconductor substrate 20018, the light-shielding film 20014 is not provided, and an opening is provided so that the incident light 20001 can be incident on the PD 20019.

[0058] That is, when the solid-state imaging device is viewed from above in the figure, the planar shape of the light-shielding film 20014 is lattice-like, and openings through which the incident light 20001 passes to the light-receiving surface 20017 are formed.

[0059] The light-shielding film 20014 is formed of a light-shielding material that blocks light. For example, a titanium (Ti) film and a tungsten (W) film are sequentially laminated to form the light-shielding film 20014. Alternatively, the light-shielding film 20014 can be formed, for example, by sequentially laminating a titanium nitride (TiN) film and a tungsten (W) film.

[0060] The light shielding film 20014 is covered with a planarizing film 20013. The planarizing film 20013 is made of an insulating material that transmits light. The pixel separating portion 20030 includes a groove portion 20031 , a fixed charge film 20032 , and an insulating film 20033 .

[0061] The fixed charge film 20032 is formed on the rear surface (upper surface) side of the semiconductor substrate 20018 so as to cover the grooves 20031 which partition the plurality of pixels 20010 .

[0062] Specifically, the fixed charge film 20032 is provided so as to cover, with a certain thickness, the inner surface of a groove 20031 formed on the back surface (upper surface) of the semiconductor substrate 20018. Then, an insulating film 20033 is provided (filled) so as to fill the inside of the groove 20031 covered with the fixed charge film 20032.

[0063] Here, the fixed charge film 20032 is formed using a high dielectric material having a negative fixed charge so that a positive charge (hole) accumulation region is formed at the interface with the semiconductor substrate 20018, thereby suppressing the generation of dark current. Since the fixed charge film 20032 is formed to have a negative fixed charge, an electric field is applied to the interface with the semiconductor substrate 20018 by the negative fixed charge, and a positive charge (hole) accumulation region is formed.

[0064] The fixed charge film 20032 can be formed of, for example, a hafnium oxide film (HfO2 film). The fixed charge film 20032 can also be formed so as to contain at least one of the oxides of other elements, such as hafnium, zirconium, aluminum, tantalum, titanium, magnesium, yttrium, and lanthanoid elements.

[0065] An example of a solid-state imaging device to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the sensor substrate 20000 among the configurations described above. Specifically, the first capacitor 10 in FIG. 1 can be applied to the capacitor 20062 in FIG. 21, and the first electrode 7 in FIG. 1 can be applied to the electrode 20063 in FIG. 21. By applying the technology according to the present disclosure to the sensor substrate 20000, it is possible to suppress the performance degradation of the capacitor due to the bonding process, and therefore it is possible to obtain a better captured image.

[0066] [2-3 Modifications] The present technology may also be applied to a solid-state imaging device having a global shutter function. The overall configuration of the solid-state imaging device according to this modification is the same as that shown in Fig. 20, and therefore is not shown. Fig. 22 is a cross-sectional view of one pixel of the solid-state imaging device 101 according to this modification. 22, the solid-state imaging device 101 includes a first substrate 180 on which a photoelectric conversion unit PD is formed, and a second substrate 181 on which a charge storage capacitance unit 153 and a plurality of MOS transistors are formed. The first substrate 180 and the second substrate 181 are laminated and bonded together. The first substrate 180 side on which the photoelectric conversion unit PD is formed constitutes a light incident surface on which light L is incident, and a color filter 159 and an on-chip lens 160 are formed on the light incident surface of the first substrate 180.

[0067] The configurations of the first substrate 180 and the second substrate 181 will be described in detail with reference to FIGS. 23A and 23B. First, the first substrate 180 will be described. As shown in FIG. 23A, the first substrate 180 is composed of a semiconductor substrate 112 in which a photoelectric conversion unit PD and an impurity region 116 serving as the drain of the first transfer transistor Tr1 are formed, a multilayer wiring layer 117 formed on the upper part of the semiconductor substrate 112, and a substrate connection region 190 formed on the upper part of the multilayer wiring layer 117.

[0068] The semiconductor substrate 112 is formed of an N-type silicon substrate, and a P-type well layer 113 is formed on the upper part of the semiconductor substrate 112. The P-type well layer 113 can be formed by ion-implanting a P-type impurity into the semiconductor substrate 112.

[0069] The photoelectric conversion unit PD is composed of an N-type well layer 114 formed in the P-type well layer 113, and a P+-type impurity region 115 formed on the surface side of the P-type well layer 113, which is a region in contact with the N-type well layer 114. The N-type well layer 114 is formed by ion-injecting N-type impurities into a desired region of the P-type well layer 113. The P+-type impurity region 115 is formed by ion-injecting P-type impurities at a high concentration into a desired region of the P-type well layer 113. In this photoelectric conversion unit PD, a HAD (Hole Accumulation Diode: registered trademark) structure is formed by the effect of the pn junction between the P+-type impurity region 115 and the N-type well layer 114, and the pn junction between the N-type well layer 114 and the P-type well layer 113. In the photoelectric conversion unit PD having such a configuration, a signal charge is generated according to the amount of incident light L, and the photoelectrically converted signal charge is accumulated in a depletion layer formed between the P+ type impurity region 115 and the N type well layer 114.

[0070] The impurity region 116 is formed in a region on the surface side of the P-type well layer 113, a predetermined distance away from the photoelectric conversion unit PD, and serves as a region for temporarily storing signal charges transferred from the photoelectric conversion unit PD. The impurity region 116 is formed by ion-implanting N-type impurities at a high concentration into a desired region of the P-type well layer 113. In this modification, the region between the photoelectric conversion unit PD and the impurity region 116 is used as the channel portion of the first transfer transistor Tr1.

[0071] The multilayer wiring layer 117 is formed above the P-type well layer 113 in which the photoelectric conversion unit PD and the impurity region 116 are formed of the semiconductor substrate 112. In the multilayer wiring layer 117, a gate electrode 119 constituting the first transfer transistor Tr1 and a first wiring layer M1 formed above the gate electrode 119 are stacked with an interlayer insulating film 118 interposed therebetween. The gate electrode 119 is formed above a channel portion between the photoelectric conversion portion PD formed in the P-type well layer 113 and the impurity region 116 via a gate insulating film (not shown). In the first wiring layer M1, a first connection wiring 123 and a second connection wiring 122 are formed. The first connection wiring 123 is connected to the impurity region 116 via a contact portion 121 formed in the interlayer insulating film 118. The second connection wiring 122 is connected to the gate electrode 119 via a contact portion 120 formed in the interlayer insulating film 118.

[0072] The substrate connection region 190 is formed above the first wiring layer M1 of the multilayer wiring layer 117. In the substrate connection region 190, a second wiring layer M2 is stacked on the first wiring layer M1 with an interlayer insulating film 191 interposed therebetween. In the second wiring layer M2, a first connection electrode 127 and a second connection electrode 126 are respectively configured, and the first connection electrode 127 and the second connection electrode 126 are formed to be exposed on the surface of the multi-layer wiring layer 117. The first connection electrode 127 is connected to a first connection wiring 123 made of the first wiring layer M1 through a contact portion 124 formed in the interlayer insulating film 191. In addition, the second connection electrode 126 is connected to a second connection wiring 122 made of the first wiring layer M1 through a contact portion 125 formed in the interlayer insulating film 191.

[0073] In first substrate 180 having the above configuration, the side of semiconductor substrate 112 opposite to the side on which first connection electrode 127 and second connection electrode 126 are formed is the light incident side.

[0074] Next, the second substrate 181 will be described. 23B, the second substrate 181 is composed of a semiconductor substrate 128 in which impurity regions 130, 131, 132, 134, and 135 serving as the source and drain of a plurality of MOS transistors are formed, a multilayer wiring layer 136 formed on the semiconductor substrate 128, and a substrate connection region 195 formed on the multilayer wiring layer 136. A charge storage capacitor 153 is formed in the substrate connection region 195. In this modification, the plurality of MOS transistors formed on the second substrate 181 are a second transfer transistor Tr2, a reset transistor Tr3, an amplifier transistor Tr4, and a selection transistor Tr5.

[0075] The semiconductor substrate 128 is formed of an N-type silicon substrate, and a P-type well layer 129 is formed on the upper part of this semiconductor substrate 128. The P-type well layer 129 can be formed by ion-implanting P-type impurities into the semiconductor substrate 128. The impurity regions 130, 131, 132, 134, and 135 constituting the second transfer transistor Tr2, the reset transistor Tr3, the amplification transistor Tr4, and the selection transistor Tr5 are each formed in a desired region on the surface side of the P-type well layer 129. These impurity regions 130, 131, 132, 134, and 135 are formed by ion-implanting N-type impurities at a high concentration into the desired regions of the P-type well layer 129.

[0076] The impurity region 130 is used as the source of the second transfer transistor Tr2. The impurity region 131 is used as a floating diffusion region for reading out signal charges, shared by the drain of the second transfer transistor Tr2 and the source of the reset transistor Tr3. The impurity region 132 is used as a drain of the reset transistor Tr3 and the source of the amplification transistor Tr4. The impurity region 134 is used as a drain of the amplification transistor Tr4 and the source of the selection transistor Tr5. The impurity region 135 is used as the drain of the selection transistor Tr5. The regions of the P-type well layer 129 between the impurity regions 130, 131, 132, 134, and 135 are used as channel portions constituting the respective MOS transistors.

[0077] The multilayer wiring layer 136 is formed on the P-type well layer 129 in which the impurity regions 130, 131, 132, 134, and 135 are formed in the semiconductor substrate 128. The multilayer wiring layer 136 is configured by stacking gate electrodes 138, 139, 140, and 141 constituting each MOS transistor, a first wiring layer M1', and a second wiring layer M2' with an interlayer insulating film 137 interposed therebetween.

[0078] Each of the gate electrodes 138, 139, 140, and 141 is formed on a channel portion constituting each MOS transistor via a gate insulating film (not shown). The gate electrode 138 formed on the upper part of the P-type well layer 129 between the impurity region 130 and the impurity region 131 is used as the gate electrode 138 of the second transfer transistor Tr2. The gate electrode 139 formed on the upper part of the P-type well layer 129 between the impurity region 131 and the impurity region 132 is used as the gate electrode of the reset transistor Tr3. The gate electrode 140 formed on the upper part of the P-type well layer 129 between the impurity region 132 and the impurity region 134 is used as the gate electrode of the amplification transistor Tr4. The gate electrode 141 formed on the upper part of the P-type well layer 129 between the impurity region 134 and the impurity region 135 is used as the gate electrode of the selection transistor Tr5.

[0079] The first wiring layer M1' is formed on the gate electrodes 138, 139, 140, and 141 via the interlayer insulating film 137, and the first connection wiring 150, the second connection wiring 149, the selection wiring 148, and the vertical signal line 109 (see FIG. 20) are respectively configured in this first wiring layer M1'. The first connection wiring 150 is connected to the impurity region 130 serving as the source of the second transfer transistor Tr2 via a contact portion 142 formed in the interlayer insulating film 137. The second connection wiring 149 is connected to the impurity region 131 and the gate electrode 140 of the amplification transistor Tr4 via contact portions 143 and 144 formed in the interlayer insulating film 137, respectively. That is, the second connection wiring 149 electrically connects the impurity region 131, which is a floating diffusion region, and the gate electrode 140 of the amplification transistor Tr4. The selection wiring 148 is connected to the gate electrode 141 of the selection transistor Tr5 via a contact portion 145 formed in the interlayer insulating film 137. A selection pulse is supplied to the gate electrode 141 of the selection transistor Tr5 from a selection wiring 148. The vertical signal line 109 (see FIG. 20) is connected to the impurity region 135, which is the drain of the selection transistor Tr5, via a contact portion 146 formed in the interlayer insulating film 137.

[0080] In the second wiring layer M2', a third connection wiring 152 and a fourth connection wiring 151 are configured. The third connection wiring 152 is connected to the first connection wiring 150 via a contact portion 147 formed in the interlayer insulating film 137. The fourth connection wiring 151 is formed extending in a predetermined region. A first transfer wiring formed in the multilayer wiring layer 136 of the second substrate 181 (not shown) is connected to the fourth connection wiring 151, and a first transfer pulse is supplied from the first transfer wiring to the fourth connection wiring 151.

[0081] The substrate connection region 195 is formed above the third connection wiring 152 and the fourth connection wiring 151 of the multi-layer wiring layer 136. In the substrate connection region 195, a charge storage capacitance portion 153 is formed above the third connection wiring 152 and the fourth connection wiring 151 of the second wiring layer M2', and the third wiring layer M3' is formed above the second wiring layer M2' via the charge storage capacitance portion 153. That is, the charge storage capacitance portion 153 is sandwiched between the second wiring layer M2' and the third wiring layer M3'. A capacitor with an MIM structure can be used as the charge storage capacitance portion 153.

[0082] In the third wiring layer M3', a first connection electrode 156 and a second connection electrode 157 are respectively configured, and the first connection electrode 156 and the second connection electrode 157 are formed to be exposed on the surface of the substrate connection region 195. The first connection electrode 156 is connected to the third connection wiring 152 made of the second wiring layer M2' via a contact portion 155 formed in the interlayer insulating film 196, and is also formed to extend to the upper part of the fourth connection wiring 151 made of the second wiring layer M2' via a charge storage capacitance portion 153. The second connection electrode 157 is connected to the fourth connection wiring 151 made of the second wiring layer M2' via a contact portion 154 formed in the interlayer insulating film 196.

[0083] 23B, a second transfer wiring for supplying a second transfer pulse is connected to the gate electrode 138 of the second transfer transistor Tr2. Similarly, a reset wiring for supplying a reset pulse is connected to the gate electrode 139 of the reset transistor Tr3. The second transfer wiring and the reset wiring are formed by desired wiring layers formed in the multilayer wiring layer 136.

[0084] The solid-state imaging device 101 of this modification has a configuration in which the first substrate 180 is laminated on the upper portion of the second substrate 181 such that the first connection electrodes 156, 127 and the second connection electrodes 157, 126 of the first substrate 180 and the second substrate 181 are connected to each other. The first substrate 180 and the second substrate 181 are laminated together, whereby the impurity region 116 constituting the first transfer transistor Tr1, the charge storage capacitance section 153, and the impurity region 130 constituting the second transfer transistor Tr2 are electrically connected. In the solid-state imaging device 101 of this modification, the first substrate 180 and the second substrate 181 are laminated and laminated together, whereby the photoelectric conversion section PD and the charge storage capacitance section 153 are laminated three-dimensionally.

[0085] In the solid-state imaging device 101 of this modification, the first connection electrode 156 also serves as a light-shielding film, and the impurity region 130 serving as the source of the second transfer transistor Tr2 is shielded from light by the first connection electrode 156. This suppresses the incidence of light on the impurity region 130, suppressing the generation of unnecessary signal charges, thereby reducing color mixing. In this case, it is preferable that all regions except for the openings of the photoelectric conversion unit PD are shielded from light.

[0086] Next, a method for driving the solid-state imaging device 101 of this modified example will be described with reference to Fig. 24. Fig. 24 shows a circuit configuration for one pixel of the solid-state imaging device 101 of this modified example, and Fig. 25 shows a circuit configuration for four adjacent pixels in two rows and two columns.

[0087] 24 indicates an electrode connection surface between first connection electrode 127 and second connection electrode 126 formed on first substrate 180, and first connection electrode 156 and second connection electrode 157 formed on second substrate 181. Line a in FIG.

[0088] The anode side of the photodiode, which is the photoelectric conversion unit PD, is grounded, and the cathode side is connected to the source of the first transfer transistor Tr1. Although not shown in FIG. 22, as shown in FIG. 24 and FIG. 25, a photoelectric conversion unit reset transistor Tr6 is configured on the first substrate 180, and the drain of the photoelectric conversion unit reset transistor Tr6 is connected to the cathode side of the photoelectric conversion unit PD. A power supply voltage wiring 185 for applying a power supply voltage VDD is connected to the source of the photoelectric conversion unit reset transistor Tr6. A reset wiring 175 for supplying a reset pulse φPDRST is connected to the gate electrode 162 of the photoelectric conversion unit reset transistor Tr6.

[0089] The drain of the first transfer transistor Tr1 is connected to the source of the second transfer transistor Tr2 via a first connection electrode 156 connected to one electrode of the charge storage capacitor 153. A first transfer wiring 184 to which a first transfer pulse φTRG1 is supplied is connected to a gate electrode 119 of the first transfer transistor Tr1. The first transfer wiring 184 is also connected to a fourth connection wiring 151 connected to the other electrode of the charge storage capacitor 153.

[0090] The drain of the second transfer transistor Tr2 is connected to the source of the reset transistor Tr3 and to the gate electrode 140 of the amplification transistor Tr4. A second transfer wiring 163 for supplying a second transfer pulse φTRG2 is connected to the gate electrode 138 of the second transfer transistor Tr2.

[0091] A power supply voltage line 188 for applying a power supply voltage VDD is connected to the drain of the reset transistor Tr3, and a reset line 164 for supplying a reset pulse φRST is connected to a gate electrode 139 of the reset transistor Tr3.

[0092] A power supply voltage line 188 for applying a power supply voltage VDD is connected to the source of the amplification transistor Tr4, and the drain of the amplification transistor Tr4 is connected to the source of the selection transistor Tr5.

[0093] A selection wiring 148 for supplying a selection pulse φSEL is connected to a gate electrode 141 of the selection transistor Tr5, and the drain of the selection transistor Tr5 is connected to a vertical signal line 109 (see FIG. 20).

[0094] 25, in a solid-state imaging device 101 in which pixels 102 are arranged in a two-dimensional matrix, a second transfer wiring 163, a reset wiring 164, and a selection wiring 148 that are common to each row are connected to each of the gate electrodes 138, 139, and 141. The second transfer pulse φTRG2, the reset pulse φRST, and the selection pulse φSEL input to each of the gate electrodes 138, 139, and 141 are supplied from a vertical drive circuit 104. Although not shown, a reset pulse φPDRST supplied to the gate electrode 162 of the photoelectric conversion unit reset transistor Tr6 and a first transfer pulse φTRG1 supplied to the gate electrode 119 of the first transfer transistor Tr1 are also supplied from the vertical drive circuit 104.

[0095] Moreover, a vertical signal line 109 (see FIG. 20) common to each column is connected to the drain of the selection transistor Tr5. A column signal processing circuit 105 provided for each column is connected to the rear stage of the vertical signal line 109. A horizontal transistor Tr7 to which a horizontal selection pulse is input from a horizontal drive circuit 106 is connected to the rear stage of the column signal processing circuit 105.

[0096] Next, a method of driving the solid-state imaging device 101 having the above circuit configuration will be described with reference to a timing chart shown in FIG. 26 and the circuit configuration shown in FIG.

[0097] First, the reset pulse φPDRST is set to high to simultaneously turn on the photoelectric conversion unit reset transistors Tr6 of all pixels, thereby resetting the potential of the photoelectric conversion units PD of all pixels to the same potential as the power supply voltage VDD. In other words, this operation discharges unnecessary charges that have accumulated in the photoelectric conversion units PD of all pixels, and resets the potential of the photoelectric conversion units PD to a constant value (VDD).

[0098] Next, the reset pulse φPDRST is set to low to simultaneously turn off the photoelectric conversion unit reset transistors Tr6 of all pixels, and the generation and accumulation of signal charges is started in the photoelectric conversion units PD of all pixels. The signal charges are generated according to the amount of light incident on the photoelectric conversion units PD, and the generated signal charges are accumulated in a potential well formed by the effect of the pn junction in the photoelectric conversion units PD. At this time, it is assumed that the signal charges stored in the charge accumulation capacitance unit 153 have been sequentially read out during the previous readout and the charge accumulation capacitance unit 153 is empty, but a separate timing for resetting the charge accumulation capacitance unit 153 may be set.

[0099] Next, before a predetermined accumulation time has elapsed since the reset pulse φPDRST is set to low, the first transfer pulse φTRG1 is set to high to simultaneously turn on the first transfer transistors Tr1 of all pixels, and the signal charges stored in the photoelectric conversion unit PD are transferred to the impurity region 116. Then, since the impurity region 116, the impurity region 130, and the charge accumulation capacitance unit 153 are electrically connected, the signal charges are temporarily stored in the impurity region 116, the impurity region 130, and the charge accumulation capacitance unit 153 formed on the first substrate 180. Also, while the first transfer pulse φTRG1 is high in this manner, the signal charges are mainly stored in the charge accumulation capacitance unit 153.

[0100] Thereafter, the first transfer pulse φTRG1 is turned low to turn off the first transfer transistors Tr1 of all pixels, whereby the signal charges stored mainly in the charge storage capacitor 153 are transferred to the depletion layers of the impurity regions 116 and 130. As shown in Fig. 26, the time from when the reset pulse φPDRST is turned low to when the first transfer pulse φTRG1 is turned low again is the accumulation exposure time (electronic shutter time). Note that when the first transfer pulse φTRG1 is turned high to transfer the signal charges from the photoelectric conversion unit PD to the charge storage capacitor 153, the potential of the first transfer pulse φTRG1 is set to a potential at which the signal charges from the photoelectric conversion unit PD can be completely transferred.

[0101] Next, the reset pulse φPDRST is set to high to turn on the photoelectric conversion unit reset transistor Tr6 of all pixels to reset the photoelectric conversion unit PD. This prevents the signal charge accumulated in the photoelectric conversion unit PD and exceeding the maximum amount of accumulated charge of the photoelectric conversion unit PD from overflowing into the charge accumulation capacitance unit 153 while the signal charge accumulated in the charge accumulation capacitance unit 153 is being read out. Alternatively, the photoelectric conversion unit PD is reset to the same potential as the power supply voltage VDD in preparation for the next accumulation of signal charge. While the signal charge is being accumulated in the charge accumulation capacitance unit 153 or the impurity regions 116 and 130, a potential that forms an inversion layer on the surface of the charge accumulation capacitance unit 153 may be applied as the potential of the first transfer pulse φTRG1. This makes it possible to suppress the generation of dark current during the accumulation of signal charge.

[0102] After that, the selection pulse φSEL(1) is set to high to turn on the selection transistor Tr5 in the first row and select the pixel 102 in the first row. With the selection pulse φSEL(1) for the first row set to high, the reset pulse φRST(1) is set to high to turn on the reset transistor Tr3 in the first row. This resets the potential of the impurity region 131, which serves as a floating diffusion region connected to the gate electrode 140 of the amplification transistor Tr4, to the same potential as the power supply voltage VDD. At this time, the reset output of the amplification transistor Tr4 is stored in the column signal processing circuit 105 via the vertical signal line 109 (see FIG. 20).

[0103] Next, the second transfer pulse φTRG2(1) is set to high to turn on the second transfer transistor Tr2 of the pixel 102 in the first row, and the signal charge in the impurity region 130 and the impurity region 116 of the pixel 102 in the first row is transferred to the impurity region 131, which is a floating diffusion region. At this time, the potential of the second transfer pulse φTRG2(1) is set to a potential that allows the signal charge to be completely transferred from the impurity region 130 and the impurity region 116 to the impurity region 131. By reading out the signal charge to the impurity region 131, the potential of the impurity region 131, which is a floating diffusion region, changes, and a signal voltage corresponding to the potential change is applied to the gate electrode 140 of the amplifier transistor Tr4. Then, the signal voltage amplified by the amplifier transistor Tr4 is output to the vertical signal line 109 (see FIG. 20).

[0104] The signal voltage output to the vertical signal line 109 (see FIG. 20) is then sent to the column signal processing circuit 105. The column signal processing circuit 105 outputs the difference between the reset output previously stored and the amplified signal voltage as the pixel signal of the first row of pixels 102. Then, the pixel signals of the first row of pixels 102 are serially output from the output terminal Vout via the output circuit 107 (see FIG. 20) by the horizontal driving circuit 106 sequentially turning on the horizontal transistors Tr7.

[0105] Thereafter, the selection pulse φSEL(1) is set to low, and then the selection pulse φSEL(2) is set to high to turn on the selection transistor Tr5 of the second row and select the pixels 102 of the second row. With the selection pulse φSEL(2) of the selection transistor Tr5 of the second row set to high, the second transfer pulse φTRG2(2) and the reset pulse φRST(2) are driven in the same states as the second transfer pulse φTRG2(1) and the reset pulse φRST(1) of the first row. As a result, the same readout operation as that of the first row surface described above is performed for the pixels 102 of the second row.

[0106] As can be seen from the above description, in the solid-state imaging device 101 of this modification, the accumulation exposure time for generating and accumulating signal charges in the photoelectric conversion unit PD is performed simultaneously for all pixels. That is, by each pixel 102 having a charge accumulation capacitance unit 153, it is possible to perform an electronic shutter operation (global shutter operation) simultaneously for all pixels. Then, the signal charges accumulated simultaneously in all pixels are accumulated and held in the respective charge accumulation capacitance units 153, and are read out line-sequentially to the impurity regions 131, and a signal voltage amplified according to the potential of the signal charges is output via the vertical signal line 109 (see FIG. 20).

[0107] An example of a solid-state imaging device to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the first substrate 180, the second substrate 181, the first connection electrode 127, the first connection electrode 156, and the charge storage capacitance section 153 among the configurations described above. Specifically, the first substrate 2 in FIG. 1 can be applied to the first substrate 180 in FIG. 22, the second substrate 3 in FIG. 1 can be applied to the second substrate 181, the first electrode pad 8 in FIG. 1 can be applied to the first connection electrode 127 in FIG. 22, the second electrode 17 in FIG. 1 can be applied to the first connection electrode 156 in FIG. 22, and the second capacitor 20 in FIG. 1 can be applied to the charge storage capacitance section 153 in FIG. 22. As a result, the second capacitor 20 in FIG. 1 can configure the charge storage capacitance section 153 for storing the signal charge generated in the photoelectric conversion section PD when the global shutter operation is performed. By applying the technology disclosed herein to the first substrate 180, the second substrate 181, the first connection electrode 127, the first connection electrode 156 and the charge storage capacitance section 153, it is possible to suppress the performance degradation of the capacitor (the charge storage capacitance section 153) due to the bonding process, and therefore it is possible to obtain a better captured image.

[0108] In this modification, an example has been shown in which the charge storage capacitance section 153 is formed in the substrate connection region 195 of the second substrate 181, but other configurations can also be adopted. For example, it may be formed in the substrate connection region 190 of the first substrate 180. When formed in the substrate connection region 190, the first capacitor 10 of Fig. 1 can be applied to the charge storage capacitance section 153. As a result, the first capacitor 10 of Fig. 1 can be used to configure the charge storage capacitance section 153 for storing signal charges generated in the photoelectric conversion unit PD when the global shutter operation is performed.

[0109] <3. Application examples to electronic devices> The technology according to the present disclosure (the present technology) may be applied to various electronic devices such as imaging devices such as digital still cameras and digital video cameras, mobile phones with imaging functions, or other devices with imaging functions. FIG. 27 is a diagram showing an example of a schematic configuration of an imaging device as an electronic device to which the technology according to the present disclosure (the present technology) can be applied. As shown in FIG. 27, the imaging device 201 includes an optical system 202, a shutter device 203, a solid-state imaging element 204, a driving circuit 205, a signal processing circuit 206, a monitor 207, and a memory 208, and is capable of capturing still and moving images. The optical system 202 is configured to have one or more lenses, and guides light from a subject (incident light) to the solid-state imaging element 204 , forming an image on the light receiving surface of the solid-state imaging element 204 . The shutter device 203 is disposed between the optical system 202 and the solid-state imaging element 204 , and controls the light irradiation period and light blocking period for the solid-state imaging element 204 under the control of a drive circuit 205 .

[0110] The solid-state imaging element 204 is configured by a package including the above-mentioned solid-state imaging element 204. The solid-state imaging element 204 accumulates signal charges for a certain period of time in response to light that is imaged on the light receiving surface via the optical system 202 and the shutter device 203. The signal charges accumulated in the solid-state imaging element 204 are transferred in accordance with a drive signal (timing signal) supplied from a drive circuit 205. The drive circuit 205 outputs drive signals that control the transfer operation of the solid-state imaging element 204 and the shutter operation of the shutter device 203 to drive the solid-state imaging element 204 and the shutter device 203 . The signal processing circuit 206 performs various signal processing on the signal charges output from the solid-state imaging element 204. An image (image data) obtained by performing the signal processing by the signal processing circuit 206 is supplied to a monitor 207 and displayed, or supplied to a memory 208 and stored (recorded).

[0111] An example of an electronic device (imaging device) to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the solid-state imaging element 204 among the configurations described above. Specifically, the image sensors in FIGS. 21 and 22 can be applied to the solid-state imaging element 204. By applying the technology according to the present disclosure to the solid-state imaging element 204, it is possible to suppress the performance degradation of the capacitor due to the bonding process, and therefore it is possible to obtain a better captured image.

[0112] <4. Application examples for moving objects> The technology according to the present disclosure (the present technology) may be applied to a device mounted on any type of moving body, such as an automobile, an electric vehicle, a hybrid electric vehicle, a motorcycle, a bicycle, personal mobility, an airplane, a drone, a ship, a robot, etc.

[0113] FIG. 28 is a block diagram showing a schematic configuration example of a vehicle control system, which is an example of a moving object control system to which the technology according to the present disclosure can be applied.

[0114] The vehicle control system 12000 includes a plurality of electronic control units connected via a communication network 12001. In the example shown in Fig. 28, the vehicle control system 12000 includes a drive system control unit 12010, a body system control unit 12020, an outside-vehicle information detection unit 12030, an inside-vehicle information detection unit 12040, and an integrated control unit 12050. Also, as functional configurations of the integrated control unit 12050, a microcomputer 12051, an audio / video output unit 12052, and an in-vehicle network I / F (interface) 12053 are illustrated.

[0115] The drivetrain control unit 12010 controls the operation of devices related to the drivetrain of the vehicle in accordance with various programs. For example, the drivetrain control unit 12010 functions as a control device for a drive force generating device for generating a drive force of the vehicle, such as an internal combustion engine or a drive motor, a drive force transmission mechanism for transmitting the drive force to the wheels, a steering mechanism for adjusting the steering angle of the vehicle, and a braking device for generating a braking force of the vehicle.

[0116] The body system control unit 12020 controls the operation of various devices mounted on the vehicle body according to various programs. For example, the body system control unit 12020 functions as a control device for a keyless entry system, a smart key system, a power window device, or various lamps such as head lamps, back lamps, brake lamps, turn signals, and fog lamps. In this case, radio waves or signals of various switches transmitted from a portable device that replaces a key may be input to the body system control unit 12020. The body system control unit 12020 receives the input of these radio waves or signals and controls the door lock device, power window device, lamps, and the like of the vehicle.

[0117] The outside-vehicle information detection unit 12030 detects information outside the vehicle equipped with the vehicle control system 12000. For example, an imaging unit 12031 is connected to the outside-vehicle information detection unit 12030. The outside-vehicle information detection unit 12030 causes the imaging unit 12031 to capture an image outside the vehicle and receives the captured image. The outside-vehicle information detection unit 12030 may perform object detection processing or distance detection processing for a person, a car, an obstacle, a sign, or characters on a road surface, based on the received image.

[0118] The imaging unit 12031 is an optical sensor that receives light and outputs an electrical signal according to the amount of light received. The imaging unit 12031 can output the electrical signal as an image, or as distance measurement information. The light received by the imaging unit 12031 may be visible light or invisible light such as infrared light.

[0119] The in-vehicle information detection unit 12040 detects information inside the vehicle. For example, a driver state detection unit 12041 that detects the state of the driver is connected to the in-vehicle information detection unit 12040. The driver state detection unit 12041 includes, for example, a camera that captures an image of the driver, and the in-vehicle information detection unit 12040 may calculate the degree of fatigue or concentration of the driver based on the detection information input from the driver state detection unit 12041, or may determine whether the driver is dozing.

[0120] The microcomputer 12051 can calculate control target values ​​for the driving force generating device, the steering mechanism, or the braking device based on the information inside and outside the vehicle acquired by the outside-of-vehicle information detection unit 12030 or the inside-vehicle information detection unit 12040, and output a control command to the drive system control unit 12010. For example, the microcomputer 12051 can perform cooperative control aimed at realizing the functions of an ADAS (Advanced Driver Assistance System), including vehicle collision avoidance or impact mitigation, following driving based on the inter-vehicle distance, vehicle speed maintenance driving, vehicle collision warning, vehicle lane departure warning, etc.

[0121] In addition, the microcomputer 12051 can perform cooperative control for the purpose of autonomous driving, which allows the vehicle to travel autonomously without relying on the driver's operation, by controlling the driving force generating device, steering mechanism, braking device, etc. based on information about the surroundings of the vehicle acquired by the outside vehicle information detection unit 12030 or the inside vehicle information detection unit 12040.

[0122] Furthermore, the microcomputer 12051 can output a control command to the body system control unit 12020 based on the information outside the vehicle acquired by the outside-vehicle information detection unit 12030. For example, the microcomputer 12051 can control the headlamps according to the position of a preceding vehicle or an oncoming vehicle detected by the outside-vehicle information detection unit 12030, and perform cooperative control for the purpose of preventing glare, such as switching from high beams to low beams.

[0123] The audio / video output unit 12052 transmits at least one output signal of audio and image to an output device capable of visually or audibly notifying information to passengers in the vehicle or the outside of the vehicle. In the example of Fig. 28, an audio speaker 12061, a display unit 12062, and an instrument panel 12063 are exemplified as the output device. The display unit 12062 may include at least one of an on-board display and a head-up display, for example.

[0124] FIG. 29 is a diagram showing an example of the installation position of the imaging unit 12031.

[0125] In FIG. 29, a vehicle 12100 has imaging units 12101, 12102, 12103, 12104, and 12105 as the imaging unit 12031.

[0126] The imaging units 12101, 12102, 12103, 12104, and 12105 are provided at positions such as the front nose, side mirrors, rear bumper, back door, and the upper part of the windshield in the vehicle interior of the vehicle 12100. The imaging unit 12101 provided at the front nose and the imaging unit 12105 provided at the upper part of the windshield in the vehicle interior mainly acquire images of the front of the vehicle 12100. The imaging units 12102 and 12103 provided at the side mirrors mainly acquire images of the sides of the vehicle 12100. The imaging unit 12104 provided at the rear bumper or back door mainly acquires images of the rear of the vehicle 12100. The images of the front acquired by the imaging units 12101 and 12105 are mainly used to detect a preceding vehicle, a pedestrian, an obstacle, a traffic light, a traffic sign, a lane, or the like.

[0127] 29 shows an example of the imaging ranges of the imaging units 12101 to 12104. An imaging range 12111 indicates the imaging range of the imaging unit 12101 provided on the front nose, imaging ranges 12112 and 12113 indicate the imaging ranges of the imaging units 12102 and 12103 provided on the side mirrors, respectively, and an imaging range 12114 indicates the imaging range of the imaging unit 12104 provided on the rear bumper or back door. For example, an overhead image of the vehicle 12100 viewed from above is obtained by superimposing the image data captured by the imaging units 12101 to 12104.

[0128] At least one of the imaging units 12101 to 12104 may have a function of acquiring distance information. For example, at least one of the imaging units 12101 to 12104 may be a stereo camera made up of a plurality of imaging elements, or may be an imaging element having pixels for detecting a phase difference.

[0129] For example, the microcomputer 12051 can extract, as a preceding vehicle, a three-dimensional object that is the closest three-dimensional object on the travel path of the vehicle 12100 and travels at a predetermined speed (for example, 0 km / h or more) in approximately the same direction as the vehicle 12100, by calculating the distance to each three-dimensional object in the imaging ranges 12111 to 12114 and the change over time of this distance (relative speed with respect to the vehicle 12100) based on the distance information obtained from the imaging units 12101 to 12104. Furthermore, the microcomputer 12051 can set a vehicle distance to be secured in advance in front of the preceding vehicle, and perform automatic brake control (including follow-up stop control) and automatic acceleration control (including follow-up start control). In this way, cooperative control can be performed for the purpose of automatic driving that travels autonomously without relying on the driver's operation.

[0130] For example, the microcomputer 12051 classifies and extracts three-dimensional object data on three-dimensional objects into two-wheeled vehicles, ordinary vehicles, large vehicles, pedestrians, utility poles, and other three-dimensional objects based on distance information obtained from the imaging units 12101 to 12104, and can use the data for automatic obstacle avoidance. For example, the microcomputer 12051 distinguishes obstacles around the vehicle 12100 into obstacles that are visible to the driver of the vehicle 12100 and obstacles that are difficult to see. Then, the microcomputer 12051 determines a collision risk indicating the risk of collision with each obstacle, and when the collision risk is equal to or greater than a set value and a collision is possible, the microcomputer 12051 can provide driving assistance for collision avoidance by outputting an alarm to the driver via the audio speaker 12061 or the display unit 12062, or by performing forced deceleration or avoidance steering via the drive system control unit 12010.

[0131] At least one of the imaging units 12101 to 12104 may be an infrared camera that detects infrared rays. For example, the microcomputer 12051 can recognize a pedestrian by determining whether or not a pedestrian is present in the captured images of the imaging units 12101 to 12104. The recognition of such a pedestrian is performed, for example, by a procedure of extracting feature points in the captured images of the imaging units 12101 to 12104 as infrared cameras, and a procedure of performing pattern matching processing on a series of feature points that indicate the contour of an object to determine whether or not the object is a pedestrian. When the microcomputer 12051 determines that a pedestrian is present in the captured images of the imaging units 12101 to 12104 and recognizes the pedestrian, the audio / image output unit 12052 controls the display unit 12062 to superimpose a rectangular contour line for emphasis on the recognized pedestrian. The audio / image output unit 12052 may also control the display unit 12062 to display an icon or the like indicating a pedestrian at a desired position.

[0132] An example of a vehicle control system to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the imaging unit 12031 among the configurations described above. Specifically, the image sensors in Figs. 21 and 22 can be applied to the imaging unit 12031. By applying the technology according to the present disclosure to the imaging unit 12031, it is possible to suppress the performance degradation of the capacitor due to the bonding process, so that a better captured image can be obtained and driver fatigue can be reduced.

[0133] <5. Application example to endoscopic surgery system> The technology according to the present disclosure (the present technology) may be applied to, for example, an endoscopic surgery system.

[0134] FIG. 30 is a diagram showing an example of a schematic configuration of an endoscopic surgery system to which the technology according to the present disclosure (the present technology) can be applied.

[0135] 30 shows a state in which an operator (doctor) 11131 is performing surgery on a patient 11132 on a patient bed 11133 using an endoscopic surgery system 11000. As shown in the figure, the endoscopic surgery system 11000 is composed of an endoscope 11100, other surgical tools 11110 such as an insufflation tube 11111 and an energy treatment tool 11112, a support arm device 11120 that supports the endoscope 11100, and a cart 11200 on which various devices for endoscopic surgery are mounted.

[0136] The endoscope 11100 is composed of a lens barrel 11101, a region of a predetermined length from the tip of which is inserted into a body cavity of a patient 11132, and a camera head 11102 connected to the base end of the lens barrel 11101. In the illustrated example, the endoscope 11100 is configured as a so-called rigid scope having a rigid lens barrel 11101, but the endoscope 11100 may be configured as a so-called flexible scope having a flexible lens barrel.

[0137] An opening into which an objective lens is fitted is provided at the tip of the lens barrel 11101. A light source device 11203 is connected to the endoscope 11100, and light generated by the light source device 11203 is guided to the tip of the lens barrel by a light guide extending inside the lens barrel 11101, and is irradiated via the objective lens toward an observation target in the body cavity of the patient 11132. The endoscope 11100 may be a direct-viewing endoscope, an oblique-viewing endoscope, or a side-viewing endoscope.

[0138] An optical system and an image sensor are provided inside the camera head 11102, and reflected light (observation light) from an observation target is collected on the image sensor by the optical system. The observation light is photoelectrically converted by the image sensor to generate an electrical signal corresponding to the observation light, i.e., an image signal corresponding to an observation image. The image signal is transmitted to a camera control unit (CCU) 11201 as RAW data.

[0139] The CCU 11201 is configured with a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), etc., and performs overall control of the operations of the endoscope 11100 and the display device 11202. Furthermore, the CCU 11201 receives an image signal from the camera head 11102, and performs various types of image processing on the image signal, such as development processing (demosaic processing), for displaying an image based on the image signal.

[0140] Under the control of the CCU 11201, the display device 11202 displays an image based on an image signal that has been subjected to image processing by the CCU 11201.

[0141] The light source device 11203 is composed of a light source such as an LED (Light Emitting Diode), and supplies the endoscope 11100 with irradiation light when photographing an operation site or the like.

[0142] The input device 11204 is an input interface for the endoscopic surgery system 11000. A user can input various information and instructions to the endoscopic surgery system 11000 via the input device 11204. For example, the user inputs an instruction to change the imaging conditions (type of irradiated light, magnification, focal length, etc.) of the endoscope 11100.

[0143] The treatment tool control device 11205 controls the driving of the energy treatment tool 11112 for cauterizing tissue, incising, sealing blood vessels, etc. The insufflation device 11206 sends gas into the body cavity of the patient 11132 via the insufflation tube 11111 to inflate the body cavity for the purpose of securing the field of view of the endoscope 11100 and securing the working space of the surgeon. The recorder 11207 is a device capable of recording various information related to the surgery. The printer 11208 is a device capable of printing various information related to the surgery in various formats such as text, image, or graph.

[0144] The light source device 11203 that supplies irradiation light to the endoscope 11100 when photographing the surgical site can be composed of a white light source composed of, for example, an LED, a laser light source, or a combination of these. When the white light source is composed of a combination of RGB laser light sources, the output intensity and output timing of each color (each wavelength) can be controlled with high precision, so that the white balance of the captured image can be adjusted in the light source device 11203. In this case, it is also possible to capture images corresponding to each of the RGB colors in a time-division manner by irradiating the observation object with laser light from each of the RGB laser light sources in a time-division manner and controlling the driving of the image sensor of the camera head 11102 in synchronization with the irradiation timing. According to this method, a color image can be obtained without providing a color filter to the image sensor.

[0145] The light source device 11203 may be controlled to change the intensity of the light it outputs at predetermined time intervals. The driving of the image sensor of the camera head 11102 may be controlled in synchronization with the timing of the change in the light intensity to obtain images in a time-division manner, and the images may be synthesized to generate an image with a high dynamic range that is free of so-called blackout and whiteout.

[0146] The light source device 11203 may be configured to supply light of a predetermined wavelength band corresponding to the special light observation. In the special light observation, for example, by utilizing the wavelength dependency of light absorption in body tissue, a narrow band light is irradiated compared to the irradiated light (i.e., white light) during normal observation, and a predetermined tissue such as blood vessels on the mucous membrane surface is photographed with high contrast, so-called narrow band imaging is performed. Alternatively, in the special light observation, a fluorescent observation may be performed in which an image is obtained by fluorescence generated by irradiating an excitation light. In the fluorescent observation, it is possible to irradiate an excitation light to a body tissue and observe the fluorescence from the body tissue (autofluorescence observation), or to locally inject a reagent such as indocyanine green (ICG) into the body tissue and irradiate the body tissue with excitation light corresponding to the fluorescent wavelength of the reagent to obtain a fluorescent image. The light source device 11203 may be configured to supply narrow band light and / or excitation light corresponding to such special light observation.

[0147] FIG. 31 is a block diagram showing an example of the functional configuration of the camera head 11102 and the CCU 11201 shown in FIG.

[0148] The camera head 11102 has a lens unit 11401, an imaging unit 11402, a drive unit 11403, a communication unit 11404, and a camera head control unit 11405. The CCU 11201 has a communication unit 11411, an image processing unit 11412, and a control unit 11413. The camera head 11102 and the CCU 11201 are connected to each other by a transmission cable 11400 so as to be able to communicate with each other.

[0149] The lens unit 11401 is an optical system provided at the connection portion with the lens barrel 11101. Observation light taken in from the tip of the lens barrel 11101 is guided to the camera head 11102 and enters the lens unit 11401. The lens unit 11401 is configured by combining a plurality of lenses including a zoom lens and a focus lens.

[0150] The imaging unit 11402 is composed of an imaging element. The imaging element constituting the imaging unit 11402 may be one (so-called single-plate type) or multiple (so-called multi-plate type). When the imaging unit 11402 is composed of a multi-plate type, for example, each imaging element may generate an image signal corresponding to each of RGB, and a color image may be obtained by combining the image signals. Alternatively, the imaging unit 11402 may be configured to have a pair of imaging elements for acquiring image signals for the right eye and the left eye corresponding to 3D (Dimensional) display. By performing 3D display, the surgeon 11131 can more accurately grasp the depth of the biological tissue in the surgical site. Note that when the imaging unit 11402 is composed of a multi-plate type, multiple lens units 11401 may be provided corresponding to each imaging element.

[0151] Furthermore, the imaging unit 11402 does not necessarily have to be provided in the camera head 11102. For example, the imaging unit 11402 may be provided inside the lens barrel 11101, immediately behind the objective lens.

[0152] The driving unit 11403 is configured by an actuator, and moves the zoom lens and focus lens of the lens unit 11401 by a predetermined distance along the optical axis under the control of the camera head control unit 11405. This allows the magnification and focus of the image captured by the imaging unit 11402 to be appropriately adjusted.

[0153] The communication unit 11404 is configured by a communication device for transmitting and receiving various information to and from the CCU 11201. The communication unit 11404 transmits the image signal obtained from the imaging unit 11402 to the CCU 11201 via the transmission cable 11400 as RAW data.

[0154] Furthermore, the communication unit 11404 receives a control signal for controlling the driving of the camera head 11102 from the CCU 11201, and supplies the control signal to the camera head control unit 11405. The control signal includes information on the imaging conditions, such as information specifying the frame rate of the captured image, information specifying the exposure value at the time of capturing the image, and / or information specifying the magnification and focus of the captured image.

[0155] The image capturing conditions such as the frame rate, exposure value, magnification, and focus may be appropriately specified by a user, or may be automatically set by the control unit 11413 of the CCU 11201 based on an acquired image signal. In the latter case, the endoscope 11100 is equipped with a so-called AE (Auto Exposure) function, AF (Auto Focus) function, and AWB (Auto White Balance) function.

[0156] The camera head control unit 11405 controls the driving of the camera head 11102 based on a control signal received from the CCU 11201 via the communication unit 11404.

[0157] The communication unit 11411 is configured with a communication device for transmitting and receiving various information to and from the camera head 11102. The communication unit 11411 receives an image signal transmitted from the camera head 11102 via the transmission cable 11400.

[0158] Furthermore, the communication unit 11411 transmits, to the camera head 11102, a control signal for controlling the driving of the camera head 11102. The image signal and the control signal can be transmitted by electrical communication, optical communication, or the like.

[0159] The image processing unit 11412 performs various types of image processing on the image signal, which is RAW data sent from the camera head 11102 .

[0160] The control unit 11413 performs various controls related to imaging of the surgical site etc. by the endoscope 11100 and display of the captured image obtained by imaging the surgical site etc. For example, the control unit 11413 generates a control signal for controlling the driving of the camera head 11102.

[0161] Further, the control unit 11413 causes the display device 11202 to display the captured image showing the surgical site, etc., based on the image signal that has been image-processed by the image processing unit 11412. At this time, the control unit 11413 may recognize various objects in the captured image using various image recognition techniques. For example, the control unit 11413 can recognize surgical tools such as forceps, specific living body parts, bleeding, mist when the energy treatment tool 11112 is used, etc., by detecting the shape and color of the edge of an object included in the captured image. When the control unit 11413 causes the display device 11202 to display the captured image, it may use the recognition result to superimpose various types of surgery support information on the image of the surgical site. By superimposing and presenting the surgery support information to the surgeon 11131, the burden on the surgeon 11131 can be reduced and the surgeon 11131 can proceed with the surgery reliably.

[0162] The transmission cable 11400 connecting the camera head 11102 and the CCU 11201 is an electrical signal cable for communication of electrical signals, an optical fiber for optical communication, or a composite cable of these.

[0163] Here, in the illustrated example, communication is performed wired using a transmission cable 11400, but communication between the camera head 11102 and the CCU 11201 may also be performed wirelessly.

[0164] An example of an endoscopic surgery system to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the imaging unit 11402 among the configurations described above. Specifically, the image sensors in Figs. 21 and 22 can be applied to the imaging unit 11402. By applying the technology according to the present disclosure to the imaging unit 11402, it is possible to suppress the performance degradation of the capacitor due to the bonding process, so that a clearer image of the surgical site can be obtained, and the surgeon can reliably confirm the surgical site.

[0165] Although an endoscopic surgery system has been described as an example here, the technology disclosed herein may also be applied to other systems, such as a microsurgery system.

[0166] The present technology can also be configured as follows. (1) A first substrate; a second substrate bonded to the first substrate; a first electrode provided in the first substrate, one surface of which is located on the same plane as a bonding surface between the first substrate and the second substrate; a second electrode provided in the second substrate, one surface of which is located on the same plane as the bonding surface and bonded to one surface of the first electrode; At least one of a first capacitor provided in the first substrate, one electrode of which is electrically connected to the other surface of the first electrode, and a second capacitor provided in the second substrate, one electrode of which is electrically connected to the other surface of the second electrode. Semiconductor device. (2) The first electrode and the second electrode are copper electrodes made of pure copper or a copper alloy. The semiconductor device according to (1) above. (3) the first electrode includes a first electrode pad having one surface located on the same plane as the bonding surface, and a first via extending from the other surface of the first electrode pad; The second electrode includes a second electrode pad having one surface located on the same plane as the bonding surface, and a second via extending from the other surface of the second electrode pad. The semiconductor device according to (1) or (2). (4) The first electrode and the second electrode are each provided in plurality, a plurality of the first capacitors and / or the second capacitors; Two or more of the plurality of first capacitors or two or more of the plurality of second capacitors are electrically connected to the same wiring. The semiconductor device according to any one of (1) to (3). (5) At least one of the first capacitor and the second capacitor includes two electrodes facing each other and an insulating film disposed between the two electrodes. The semiconductor device according to any one of (1) to (4). (6) At least one of the first capacitor and the second capacitor has a multi-layer structure in which the electrodes and the insulating films are alternately and repeatedly arranged. The semiconductor device according to any one of (1) to (4). (7) At least one of the first capacitor and the second capacitor has a bottom and a sidewall extending from an edge of the bottom in a direction intersecting the bottom. The semiconductor device according to any one of (1) to (4). (8) The material of the electrodes of the first capacitor and the second capacitor is tantalum, tantalum nitride, titanium, titanium nitride, tungsten nitride, zirconium nitride, or cobalt. The semiconductor device according to any one of (1) to (7). (9) The insulating film of the first capacitor and the second capacitor is a single layer film made of any one of tantalum oxide, hafnium oxide, aluminum oxide, silicon nitride, and zirconium oxide, or a multilayer film made of a combination of these. The semiconductor device according to any one of (1) to (8). (10) A sensor substrate on which a plurality of photoelectric conversion units are arranged; a logic board joined to the sensor board and integrating a circuit for processing an electrical signal from the photoelectric conversion unit; a first electrode provided in the sensor substrate, one surface of which is located on the same plane as a bonding surface between the sensor substrate and the logic substrate; a second electrode provided in the logic substrate, one surface of which is located on the same plane as the bonding surface and bonded to one surface of the first electrode; At least one of a first capacitor provided in the sensor substrate, one electrode of which is electrically connected to the other surface of the first electrode, and a second capacitor provided in the logic substrate, one electrode of which is electrically connected to the other surface of the second electrode. Solid-state imaging device. (11) At least one of the first capacitor and the second capacitor constitutes a charge storage capacitance section for storing signal charges generated in the photoelectric conversion section when a global shutter operation is performed. The solid-state imaging device according to (10) above. (12) a logic substrate bonded to the sensor substrate and integrating a circuit for processing an electrical signal from the photoelectric conversion substrate; a first electrode provided within the sensor substrate, one surface of which is flush with a bonding surface between the sensor substrate and the logic substrate; a second electrode provided within the logic substrate, one surface of which is flush with the bonding surface and bonded to one surface of the first electrode; and at least one of a first capacitor provided within the sensor substrate, one electrode of which is electrically connected to the other surface of the first electrode, and a second capacitor provided within the logic substrate, one electrode of which is electrically connected to the other surface of the second electrode; an optical lens that forms an image of image light from a subject on an imaging surface of the solid-state imaging device; a signal processing circuit for performing signal processing on a signal output from the solid-state imaging device; electronic equipment. [Explanation of symbols]

[0167] 1...semiconductor device, 2...first substrate, 3...second substrate, 4...interlayer insulating film, 5a...first wiring layer, 5b...second wiring layer, 5c...third wiring layer, 5d...fourth wiring layer, 6...interlayer insulating film, 7, 7a, 7b...first electrode, 8...first electrode pad, 9...first via, 10...first capacitor, 11...electrode, 12...electrode, 13...insulating film, 14...interlayer insulating film, 15a...first wiring layer, 15b...second wiring layer, 15c...third wiring layer, 15d...fourth wiring layer, 15e...fifth wiring layer, 15f...sixth wiring layer, 16...interlayer insulating film, 17, 17a, 17b...second electrode, 18...second electrode pad, 19...second via, 20...second capacitor, 21...electrode, 22...electrode, 23...insulating film, 24...substrate connection region, 25...pixel region, 26...I / O section, 27...driver, 28, 29...insulating film, 30, 30a to 30e...electrodes, 31, 32...insulating film, 33...bottom, 34, 35...side wall, 36...color filter, 37...microlens

Claims

1. A first substrate; a second substrate laminated on the first substrate and bonded to the first substrate; a first interlayer insulating film forming an outermost layer on the side of the second substrate in the first substrate; a first multilayer wiring layer provided in the first interlayer insulating film on a side farther from the second substrate; a first electrode provided on the second substrate side in the first interlayer insulating film, the first electrode having one surface located on the same plane as a bonding surface between the first substrate and the second substrate, and a first via extending from the other surface of the first electrode pad to the first multilayer wiring side; a second interlayer insulating film forming an outermost layer on the first substrate side in the second substrate; a second multilayer wiring layer provided in the second interlayer insulating film on a side farther from the first substrate; a second electrode provided on the first substrate side in the second interlayer insulating film, one surface of which is located on the same plane as the bonding surface and bonded to one surface of the first electrode pad, and a second via extending from the other surface of the second electrode pad to the second multilayer wiring side; at least one of a first capacitor provided between the first multilayer wiring layer and the first via, one electrode of which is connected to the first via, and a second capacitor provided between the second multilayer wiring layer and the second via, one electrode of which is connected to the second via. Semiconductor device.

2. The first electrode and the second electrode are copper electrodes made of pure copper or a copper alloy. The semiconductor device according to claim 1 .

3. The first electrode and the second electrode are each provided in a plurality of numbers, a plurality of the first capacitors and / or the second capacitors; Two or more of the plurality of first capacitors or two or more of the plurality of second capacitors are electrically connected to the same wiring. The semiconductor device according to claim 1 .

4. At least one of the first capacitor and the second capacitor includes two electrodes facing each other and an insulating film disposed between the two electrodes. The semiconductor device according to claim 1 .

5. At least one of the first capacitor and the second capacitor has a multi-layer structure in which electrodes and insulating films are alternately and repeatedly arranged. The semiconductor device according to claim 1 .

6. At least one of the first capacitor and the second capacitor has a bottom and a sidewall extending from an edge of the bottom in a direction intersecting the bottom. The semiconductor device according to claim 1 .

7. The material of the electrodes of the first capacitor and the second capacitor is tantalum, tantalum nitride, titanium, titanium nitride, tungsten nitride, zirconium nitride, or cobalt. The semiconductor device according to claim 1 .

8. The insulating film of the first capacitor and the second capacitor is a single layer film made of any one of tantalum oxide, hafnium oxide, aluminum oxide, silicon nitride, and zirconium oxide, or a multilayer film made of a combination of these. The semiconductor device according to claim 1 .

9. A sensor substrate on which a plurality of photoelectric conversion units are arranged; a logic substrate that is laminated on and joined to the sensor substrate and that integrates a circuit for processing an electrical signal from the photoelectric conversion unit; a first interlayer insulating film forming an outermost layer on the logic substrate side of the sensor substrate; a first multilayer wiring layer provided in the first interlayer insulating film on a side farther from the logic substrate; a first electrode provided on the logic substrate side in the first interlayer insulating film, the first electrode having one surface located on the same plane as a bonding surface between the sensor substrate and the logic substrate, and a first via extending from the other surface of the first electrode pad to the first multilayer wiring layer side; a second interlayer insulating film forming an outermost layer on the side of the sensor substrate in the logic substrate; a second multilayer wiring layer provided in the second interlayer insulating film on a side farther from the sensor substrate; a second electrode provided on the sensor substrate side in the second interlayer insulating film, one surface of which is located on the same plane as the bonding surface and bonded to one surface of the first electrode pad, and a second via extending from the other surface of the second electrode pad to the second multilayer wiring side; at least one of a first capacitor provided between the first multilayer wiring layer and the first via, one electrode of which is connected to the first via, and a second capacitor provided between the second multilayer wiring layer and the second via, one electrode of which is connected to the second via. Solid-state imaging device.

10. At least one of the first capacitor and the second capacitor constitutes a charge storage capacitance section for storing signal charges generated in the photoelectric conversion section when a global shutter operation is performed. The solid-state imaging device according to claim 9 .

11. a sensor substrate on which a plurality of photoelectric conversion units are arranged; a logic substrate which is laminated on and joined to the sensor substrate and on which a circuit for processing an electric signal from the photoelectric conversion units is integrated; a first interlayer insulating film forming an outermost layer on the logic substrate side of the sensor substrate; a first multilayer wiring layer provided on a side of the first interlayer insulating film farther from the logic substrate; a first electrode pad provided on the logic substrate side of the first interlayer insulating film, one surface of which is located on the same plane as a joining surface between the sensor substrate and the logic substrate, and a first electrode having a first via extending from the other surface of the first electrode pad to the first multilayer wiring layer side; a second interlayer insulating film forming a layer, a second multilayer wiring layer provided in the second interlayer insulating film on a side farther from the sensor substrate, a second electrode pad provided on the sensor substrate side in the second interlayer insulating film, one surface of which is located on the same plane as the bonding surface and bonded to one surface of the first electrode pad, and a second electrode having a second via extending from the other surface of the second electrode pad to the second multilayer wiring side, and at least one of a first capacitor provided between the first multilayer wiring layer and the first via, one electrode of which is connected to the first via, and a second capacitor provided between the second multilayer wiring layer and the second via, one electrode of which is connected to the second via; an optical lens that forms an image of image light from a subject on an imaging surface of the solid-state imaging device; a signal processing circuit for performing signal processing on a signal output from the solid-state imaging device; electronic equipment.

Images