Adjustable Shape Trim Coil

Abstract

A method, system, apparatus, and computer program for controlling etch rate and plasma uniformity using a magnetic field are presented. The substrate processing apparatus includes a vacuum chamber including a processing region for processing substrates. The apparatus further includes a magnetic field sensor configured to detect a signal indicative of a residual magnetic field associated with the vacuum chamber. At least one magnetic field source is configured to generate one or more supplemental magnetic fields in the processing region of the vacuum chamber. A magnetic field controller is coupled to the magnetic field sensor and the at least one magnetic field source. The magnetic field controller is configured to adjust at least one characteristic of the one or more supplemental magnetic fields to cause the one or more supplemental magnetic fields to reduce the residual magnetic field to a predetermined value.

Description

[Technical field]

[0001] [Priority claim] This application claims the benefit of priority to U.S. Patent Application No. 63 / 049,924, filed July 9, 2020, the entirety of which is incorporated herein by reference.

[0002] The subject matter disclosed herein generally relates to methods, systems, and machine-readable storage media for controlling etch rate and plasma uniformity using a magnetic field in a capacitively coupled plasma (CCP) used in semiconductor manufacturing, where the magnetic field is generated by an adjustable shape trim coil. [Background technology]

[0003] Substrate processing equipment is used to process substrates (e.g., semiconductor substrates) by techniques including etching, physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD), plasma enhanced atomic layer deposition (PEALD), pulsed deposited layer (PDL), plasma enhanced pulsed deposited layer (PEPDL), and resist removal. One type of substrate processing equipment is a plasma processing equipment using a CCP with a vacuum chamber including an upper electrode and a lower electrode, in which radio frequency (RF) power is applied between the electrodes to excite a process gas into a plasma to process a substrate in the reaction chamber.

[0004] In substrate processing equipment such as a CCP vacuum chamber for manufacturing substrates, the etch uniformity and ion gradients at the substrate are affected by the plasma density uniformity, which has shown sensitivity to weak magnetic fields. For example, the plasma density uniformity in a CCP vacuum chamber can be affected by magnetic fields associated with the magnetic chamber components (which may have a magnetic field strength of 5-10 Gauss) as well as other external magnetic fields, including the Earth's magnetic field (which may have a magnetic field strength of 0.25-0.65 Gauss) or other ambient magnetic fields (which may have a magnetic field strength of 0.4-0.5 Gauss).

[0005] Currently, controlling the plasma uniformity, especially at the center of the substrate, is difficult due to residual magnetic fields inside the chamber. The main factors to control the uniformity are changing the dimensions of the ground electrode in the chamber, changing the gas and chemical flows, or changing the frequency content of the supplied radio frequency (RF). However, magnetization of the process chamber parts and exposure to external magnetic fields create residual magnetic fields in the chamber. The residual magnetic fields affect the plasma density uniformity and vary significantly from chamber to chamber within a manufacturing site and between chambers at different manufacturing sites. The present disclosure seeks to address, among other things, the shortcomings associated with the prior art for plasma density uniformity, including the shortcomings of the residual magnetic fields.

[0006] The Background Art set forth herein is intended to present the contents of the present disclosure generally. Please note that the information set forth in this section is presented to provide those skilled in the art with some context for the subject matter of the invention disclosed below, and should not be considered admitted prior art. In particular, the inventions of the presently named inventors are not expressly or implicitly admitted as prior art to the present disclosure to the extent that they are described in this Background Art section and in a manner of description that is not prior art at the time of filing. Summary of the Invention

[0007] Methods, systems, and computer programs are presented for controlling etch rate and plasma uniformity using a magnetic field of an adjustable shape trim coil during semiconductor manufacturing. One general aspect includes a substrate processing apparatus. The apparatus includes a vacuum chamber, a magnetic field sensor, an adjustable shape trim coil (AGTC), and a magnetic field controller. The vacuum chamber includes a processing region for processing a substrate using a capacitively coupled plasma (CCP). The magnetic field sensor is configured to detect a residual magnetic field in the vacuum chamber. The AGTC is configured to generate a supplemental magnetic field in the processing region of the vacuum chamber. The magnetic field controller is coupled to the magnetic field sensor and the AGTC. The magnetic field controller is configured to adjust at least one parameter of the AGTC to cause the supplemental magnetic field to reduce the residual magnetic field to a predetermined value.

[0008] One general aspect includes a method for processing a substrate using a vacuum chamber. The method includes detecting a residual magnetic field in a processing region of the vacuum chamber. The processing region is for processing the substrate. The method includes determining a magnitude of the residual magnetic field. At least one parameter of the AGTC is adjusted based on the determined magnitude of the residual magnetic field. A supplemental magnetic field in the processing region of the vacuum chamber is generated using the AGTC, where the supplemental magnetic field reduces the residual magnetic field to a predetermined value.

[0009] One general aspect includes a non-transitory machine-readable storage medium including instructions that, when executed by a machine, cause the machine to perform operations including detecting a residual magnetic field in a processing region of a vacuum chamber for processing a substrate. Executing the instructions further causes the machine to determine a magnitude of the residual magnetic field. Executing the instructions further causes the machine to adjust at least one parameter of the AGTC based on the determined magnitude of the residual magnetic field. Executing the instructions further causes the machine to generate a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC that reduces the residual magnetic field to a predetermined value. [Brief description of the drawings]

[0010] The various accompanying drawings merely depict exemplary embodiments of the present disclosure and are not to be considered as limiting its scope.

[0011] [Figure 1] A vacuum chamber, such as an etch chamber, for manufacturing substrates using CCP, according to an exemplary embodiment.

[0012] [Diagram 2] A vacuum chamber surrounded by a magnetic shield structure for improved control of etch rate and plasma uniformity, according to an exemplary embodiment.

[0013] [Figure 3A]1 is a perspective view of a vacuum chamber with a residual magnetic field in a processing region including a CCP in accordance with an illustrative embodiment.

[0014] [Figure 3B] 3B is a top view of the vacuum chamber of FIG. 3A in accordance with an exemplary embodiment.

[0015] [Figure 3C] 3B is a side view of the vacuum chamber of FIG. 3A in accordance with an exemplary embodiment.

[0016] [Figure 4] 1 is an example of an adjustable shape trim coil (AGTC) according to an exemplary embodiment.

[0017] [Diagram 5] 5 is a tension maintenance assembly that may be used in the AGTC of FIG. 4 in an exemplary embodiment.

[0018] [Figure 6A] 5A-5C are exemplary configurations of the AGTC of FIG. 4 using different coil geometries in exemplary embodiments. [Figure 6B] 5A-5C are exemplary configurations of the AGTC of FIG. 4 using different coil geometries in exemplary embodiments.

[0019] [Figure 7A] FIG. 2 illustrates a perspective view of a vacuum chamber with an AGTC used as a magnetic field source to cancel residual magnetic fields, according to an exemplary embodiment.

[0020] [Figure 7B] FIG. 7B is a side view of the vacuum chamber of FIG. 7A showing mounting options for the AGTC in accordance with an exemplary embodiment.

[0021] [Figure 8] FIG. 1 is a perspective view of a vacuum chamber with multiple AGTCs configured as Helmholtz pairs to generate magnetic fields to cancel residual magnetic fields, according to an illustrative embodiment.

[0022] [Figure 9] FIG. 1 is a perspective view of a vacuum chamber with multiple AGTCs configured as multiple Helmholtz pairs to generate multiple magnetic fields to cancel residual magnetic fields, according to an example embodiment.

[0023] [Figure 10] FIG. 1 illustrates a top view of a vacuum chamber using pairs of AGTCs to generate different magnetic fields to cancel out residual magnetic fields, according to an exemplary embodiment.

[0024] [Figure 11] A vacuum chamber equipped with different types of magnetic sensors and magnetic field controllers to configure one or more supplemental magnetic fields to cancel the residual magnetic field, according to an exemplary embodiment.

[0025] [Figure 12] A configuration of a vacuum chamber in a manufacturing facility in which the disclosed techniques may be used to reduce, nullify, or homogenize multiple residual magnetic fields within the vacuum chamber, according to an exemplary embodiment.

[0026] [Figure 13] 4 is a flow chart of a method for processing a substrate using a magnetic field in a semiconductor manufacturing tool, in accordance with an example embodiment.

[0027] [Figure 14] FIG. 1 is a block diagram illustrating an example machine on which one or more exemplary method embodiments may be implemented or controlled. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0028] The exemplary method, system, and computer program are directed to controlling etch rate and plasma uniformity using magnetic fields in a CCP semiconductor manufacturing apparatus. The examples merely embody possible variations. Unless otherwise specified, components and functions are optional and may be combined or subdivided, and operations may be sequentially modified or combined or subdivided. In the following description, for the purpose of explanation, some specific details are set forth to provide a thorough understanding of the exemplary embodiments. However, it will be apparent to one skilled in the art that the subject matter of the present invention may be practiced without these specific details.

[0029] Substrate center uniformity is difficult to control because it depends on the etch process conditions. As conditions change, the uniformity will change. Static solutions for controlling wafer center uniformity (e.g., adjusting the dimensions of the ground electrode) may not be implemented efficiently over a wide range of process conditions. Solutions involving process parameters may introduce undesirable side effects when modified to address uniformity.

[0030] The techniques described herein use a supplemental magnetic field generated by an adjustable shape trim coil (AGTC) to control a residual magnetic field in a vacuum chamber, which may affect the etch rate and plasma uniformity at the center of the substrate. Specifically, one or more AGTCs may be used to generate one or more corresponding supplemental (or trim) magnetic fields to counteract the residual magnetic field in the vacuum chamber. In an exemplary embodiment, one or more magnetic field sensors may be used to detect the residual magnetic field (ΔB) in the processing region of the vacuum chamber. For example, the magnetic sensor may detect a vertical component (Bz) and a horizontal component (Bh) of the residual magnetic field. In some aspects, the magnetic sensor may detect the magnitude and direction of the residual magnetic field (which may be determined based on the magnitude and direction of each of the vertical and horizontal components of the residual magnetic field) and may adjust one or more parameters of the AGTC accordingly (e.g., the shape of the AGTC, the circumference of the coil conductor forming the AGTC, and the current through the coil conductor).

[0031] In an exemplary embodiment, the techniques disclosed herein can use sensors to detect non-uniformity of a physical quantity of a substrate surface before or after processing of the substrate (e.g., non-uniformity of a lithography mask of the substrate, or non-uniformity of a sub-micron feature of the substrate). The AGTC can be configured to generate a magnetic field based on the detected non-uniformity (e.g., non-uniform mask) (e.g., by setting the shape of the AGTC, the circumference of the coil conductor forming the AGTC, and the current through the coil conductor) to achieve a non-uniform etch corresponding to the non-uniform mask after the substrate is processed, resulting in a uniform substrate surface after processing. In an exemplary embodiment, setting the parameters of the AGTC based on the detected non-uniformity can be performed independently of (and in preference to) the detected residual magnetic field. In an exemplary embodiment, at least one AGTC can be configured to cancel (e.g., reduce) the residual magnetic field, but at least one other (e.g., second) AGTC can be used to generate a non-uniform etch based on the detected non-uniformity of the physical quantity of the substrate surface.

[0032] Various techniques and options for constructing the magnetic shield structure and the at least one magnetic field source are described in relation to FIGS.

[0033] 1 depicts a vacuum chamber 100 (e.g., an etch chamber) for fabricating substrates using CCP, according to one embodiment. Exciting an electric field between two electrodes is one way to obtain a radio frequency (RF) gas discharge in the vacuum chamber. The discharge obtained when an oscillating voltage is applied between the electrodes is called a CCP discharge.

[0034] The plasma 102 may be formed using stable source gases to obtain a variety of chemically reactive by-products generated by dissociation of various molecules caused by electron-neutron collisions. The chemical aspect of the etch involves the reaction of neutral gas molecules and their dissociated by-products with molecules of the surface to be etched and with the resulting volatile molecules, which may be removed. When the plasma is formed, positive ions are accelerated out of the plasma, through a space charge sheath that separates the plasma from the chamber walls, and impact the wafer surface with sufficient energy to remove material from the wafer surface. This is known as ion bombardment or ion sputtering. However, some industrial plasmas do not produce ions with enough energy to efficiently etch a surface by physical means alone.

[0035] A controller 116 manages the operation of the vacuum chamber 100 by controlling different components within the chamber, such as an RF generator 118, a gas source 122, and a gas pump 120. In one embodiment, fluorocarbon gases such as CF4 and C4F8 are used in the dielectric etching process for their anisotropic and etch selectivity capabilities, although the principles described herein can be applied to other plasma generating gases. Fluorocarbon gases are easily dissociated into chemically reactive by-products, including small molecules and atomic radicals. These chemically reactive by-products etch the dielectric material.

[0036] The vacuum chamber 100 represents a processing chamber with an upper electrode 104 and a lower electrode 108. The upper electrode 104 may be grounded or connected to an RF generator (not shown), and the lower electrode 108 is connected to the RF generator 118 via a matching network 114. The RF generator 118 provides RF power at one or more (e.g., two or three) different RF frequencies. At least one of the three RF frequencies may be turned on or off depending on the desired configuration of the vacuum chamber 100 for a particular operation. In the embodiment shown in FIG. 1, the RF generator 118 is configured to provide frequencies of, for example, 2 MHz, 27 MHz, and 60 MHz, although other frequencies are possible.

[0037] The vacuum chamber 100 includes a gas showerhead at the upper electrode 104 for injecting gas provided by a gas source 122 into the vacuum chamber 100, and a perforated confinement ring 112 that allows gas to be pumped out of the vacuum chamber 100 by a gas pump 120. In an exemplary embodiment, the gas pump 120 is a turbomolecular pump, although other types of gas pumps may be used.

[0038] When a substrate 106 is present in the vacuum chamber 100, a silicon focus ring 110 is placed adjacent to the substrate 106 to provide a uniform RF field at the bottom of the plasma 102 for uniform etching of the surface of the substrate 106. The embodiment of Figure 1 shows a triode reactor configuration in which the upper electrode 104 is surrounded by a symmetric RF ground electrode 124. An insulator 126 is a dielectric that separates the ground electrode 124 from the upper electrode 104. Other embodiments of the vacuum chamber 100 are possible without changing the scope of the disclosed embodiments.

[0039] Substrate 106 may include, for example, a wafer (e.g., a wafer having a diameter of 100 mm, 150 mm, 200 mm, 300 mm, 450 mm, or more) and may include, for example, a wafer including an elemental semiconductor material (e.g., silicon (Si) or germanium (Ge)) or a compound semiconductor material (e.g., silicon germanium (SiGe) or gallium arsenide (GaAs)). In addition, other substrates include dielectric materials (on which semiconductor materials may be applied), such as, for example, quartz or sapphire.

[0040] Each frequency generated by the RF generator 118 may be selected for a specific purpose in the substrate manufacturing process. In the example of FIG. 1, RF power is provided at, for example, 400 kHz and 60 MHz, with the 400 kHz RF power providing ion energy control and the 60 MHz power providing control of plasma concentration and chemical dissociation patterns. In an exemplary embodiment, other RF powers may be used. In other embodiments, RF power may be provided to the primary electrode or other electrodes supporting the substrate to control plasma characteristics. This configuration in which each RF power can be turned on or off allows for certain processes that use very low ion energy on the substrate or wafer, and certain processes that require low ion energy (e.g., 700 or 200 eV) (e.g., soft etching of low-k materials).

[0041] In another embodiment, 60 MHz RF power is used on the top electrode 104 to obtain ultra-low energy and ultra-high density. This configuration allows for chamber cleaning with high density plasma when the substrate 106 is not in the vacuum chamber 100 while minimizing sputtering on the electrostatic chuck (ESC) surface. Since the ESC surface is exposed when the substrate 106 is not present and any ion energy on the substrate should be avoided, the bottom 2 MHz and 27 MHz power supplies may be turned off during cleaning.

[0042] In some aspects, the vacuum chamber 100 is exposed to external magnetic fields, such as the Earth's magnetic field, or other ambient magnetic fields (e.g., magnetic fields from magnetic components of the vacuum chamber, such as the hoist shown in FIG. 2), or similar components of a building or nearby facility. In this regard, the vacuum chamber 100 may be surrounded by a magnetic shield structure to reduce the residual magnetic field ΔB 130 that may penetrate its processing region 134. The presence of the residual magnetic field 130 in the vacuum chamber 100 is undesirable, as the residual magnetic field 130 may adversely affect the etch rate and plasma uniformity, particularly near a central region 132 of the substrate 106 in the processing region 134. Various techniques using at least one AGTC to further reduce or eliminate the residual magnetic field 130 are described in conjunction with FIGS. 2-14. Although the techniques and embodiments relating to the AGTC are described in conjunction with a CCP substrate processing apparatus, the present disclosure is not limited thereto, and the disclosed techniques may be used in conjunction with other types of substrate processing apparatus.

[0043] 2 depicts a vacuum chamber surrounded by a magnetic shield structure to improve control of etch rate and plasma uniformity, according to an exemplary embodiment. Referring to FIG. 2, a vacuum chamber, such as the vacuum chamber 100 of FIG. 1, may be surrounded by a magnetic shield structure 200 to reduce the effects of an external magnetic field (Be) 202, which includes a vertical component (Bz) 204 and a horizontal component (Bh) 206.

[0044] In an exemplary embodiment, magnetic shield structure 200 includes upper shield portion 210 and lower shield portion 218, each of which may include multiple shield sub-portions as shown in FIG. 2. For example, upper shield portion 210 may include shield sub-portions 212, 214, 216, and 217. Lower shield portion 218 may include shield sub-portions 220, 222, and 224. In some aspects, magnetic shield structure 200 may include one or more openings 228 to accommodate various equipment used in the vacuum chamber (e.g., openings to accommodate RF components and communication links, ventilators, gas supplies, heaters, high voltage clamps, substrate feeding mechanisms, etc.).

[0045] In an exemplary embodiment, magnetic shield structure 200 may be made of a high magnetic permeability material that is at least 40 mils thick. In an exemplary embodiment, the various shielding sub-sections of magnetic shield structure 200 may be bolted (or securely attached by other means) to various surfaces of the vacuum chamber.

[0046] In an exemplary embodiment, the shield sub-section 224 may be formed as a tunnel surrounding a vacuum chamber opening 226 used to load and unload substrates into and from a processing region involving the CCP.

[0047] Due to imperfections in the magnetic shield structure 200 (e.g., one or more openings 228 for accommodating vacuum chamber equipment), a residual magnetic field (ΔB) 208 can exist beneath the magnetic shield structure 200 and within the vacuum chamber 100 due to the external magnetic field (Be) 202 and external magnetic fields from magnetic chamber components (e.g., magnetic hoist 230). As such residual magnetic field 208 is within the vacuum chamber 100, FIG. 2 refers to the residual magnetic field 208 as ΔBi. In an exemplary embodiment, one or more supplemental magnetic fields may be generated within the vacuum chamber 100 using at least one AGTC, with parameters (e.g., shape, perimeter, and current) of the at least one AGTC configured to counteract the effects of the residual magnetic field 208 (e.g., reduce or eliminate the magnitude of the residual magnetic field 208 and / or change the direction of the residual magnetic field 208 to achieve uniformity among multiple shielded vacuum chambers at the same manufacturing site).

[0048] Additionally, any external magnetic chamber parts (e.g., hoist 230) may be demagnetized and / or shielded to further reduce the residual magnetic field 208. In some embodiments, the hoist 230 may be magnetized to approximately 5-10 Gauss, which is the field that can contribute to the residual magnetic field 208. Specifically, the specific magnetic field of a particular unshielded chamber (e.g., a chamber at a particular geographic location in a particular fab running a particular recipe on a slope metric of an etched feature shape of a particular customer product) can be estimated. The magnetic material of the hoist 230 is magnetized to provide an estimate so that chamber-to-chamber matching can be optimized.

[0049] Without the use of the magnetic shield structure 200, the residual magnetic field 208 may have a magnitude of 0.5 Gauss in the vertical component (Bz) and 0.4 Gauss in the horizontal component. In some embodiments, the use of the magnetic shield structure 200 can result in a reduction in the residual magnetic field 208 of about 60% (i.e., 0.1-0.2 Gauss). In some embodiments, by using one or more supplemental magnetic fields generated using the disclosed techniques, the residual magnetic field 208 in the vacuum chamber 100 may be reduced to less than 0.1 Gauss.

[0050] In an exemplary embodiment, the AGTC described herein can be configured (e.g., mounted) in close proximity to the hoist 230. In this regard, the magnetic properties and effects caused by the magnetic field of the AGTC (coupled with a moveable spool assembly using a current controlled power source and / or a fixed current) can provide a supplemental magnetic field in the vicinity of the hoist 230 that can be used instead to magnetize the hoist 230.

[0051] In an exemplary embodiment, a shield may be used spatially around the AGTC (e.g., in association with installed or required magnetic components such as a hoist or motor core) to have a stable engineered magnetic circuit for the AGTC.

[0052] In an exemplary embodiment, the magnetization of the hoist 230 itself, and / or the shielding structures of the chambers (e.g., chambers 210 and 218), and / or other flux plates may be used (a) as a magnetic perturbation or correction source, and (b) as a shield-like component that is part of the AGTC.

[0053] In an exemplary embodiment, the magnetic shield structure 200 is configured as a compartment structure surrounding the vacuum chamber 100, and each side of the compartment structure may be approximately 23 inches to 28 inches long. In an exemplary embodiment, the vacuum chamber opening 226 may be approximately 2 inches high.

[0054] 3A depicts a perspective view 300 of a vacuum chamber 302 with a residual magnetic field in a processing region including a CCP, according to an example embodiment. With reference to FIG. 3A, the vacuum chamber 302 may be exposed to a first external magnetic field 306 and a second external magnetic field 308. The vacuum chamber 302 may include a magnetic shielding structure (e.g., a magnetic field structure such as the magnetic shielding structure 200 of FIG. 2) that is not visible in FIG. 3A.

[0055] The vacuum chamber 302 includes a processing region 304, which may be a space filled with CCPs. External magnetic fields 306 and 308 penetrate the vacuum chamber 302, generating a residual magnetic field (ΔBi) 310. The residual magnetic field 310 may include a vertical component (Bz) 316 and a horizontal component (Bh) 318. In some embodiments (e.g., the embodiment shown in FIG. 8), the horizontal component 318 may be zero, and a supplemental magnetic field having only a vertical component may be generated in the vacuum chamber 302 to cancel the vertical component 316. In other embodiments (e.g., the embodiment shown in FIG. 10), the vertical component 316 may be zero, and a supplemental magnetic field having only a horizontal component may be generated in the vacuum chamber 302 to cancel the horizontal component 318.

[0056] FIG 3B illustrates a top view of the vacuum chamber 302 of FIG 3A according to an exemplary embodiment. FIG 3C illustrates a side view of the vacuum chamber 302 of FIG 3A according to an exemplary embodiment. With reference to FIG 3C, the vacuum chamber 302 can include a top plate 312 and various equipment 314 (e.g., RF components and communication links, gas supplies, heaters, high voltage clamps, substrate supplies, etc.) used in connection with substrate processing in the processing region 304. The top plate 312 can include thermocouples and auxiliary components to handle gas flow, power for temperature control, mechanical components associated with gas vacuum functions, etc.

[0057] In an exemplary embodiment, the top plate 312 or fixture 314 may be used to mount at least one magnetic field source (e.g., at least one AGTC) capable of generating one or more supplemental magnetic fields to counteract residual magnetic fields in the vacuum chamber 302. The at least one AGTC may be used to generate a magnetic field based on a non-uniform mask such that after substrate processing, a non-uniform etch corresponding to the non-uniform mask is performed, resulting in a uniform substrate surface after processing.

[0058] 4 depicts an exemplary adjustable shape trim coil (AGTC) 400 according to an exemplary embodiment. With reference to FIG. 4, the AGTC 400 comprises a frame 402 having a plurality of tension adjustment assemblies 404, 406, 408, 410, 412, 414, 416, and 418. The frame 402 also supports a horizontal drive screw 420 that is mechanically coupled to a central spool assembly 424 and a vertical drive screw 422. The central spool assembly 424 comprises a spool 425 and drive motors 426 and 428. The drive motor 426 may be used to move the vertical drive screw 422 along with the central spool assembly 424 horizontally along the horizontal drive screw 420. The drive motor 428 may be used to move the central spool assembly 424 vertically along the vertical drive screw 422. Although FIG. 4 illustrates a square frame 402, the disclosure is not limited thereto and the frame 402 can have other shapes, such as circular, rectangular, etc.

[0059] Each of the tension adjustment assemblies 404-418 is coupled to a corresponding string 430, 432, 434, 436, 438, 440, 442, and 444, respectively. Additionally, each of the tension adjustment assemblies 404-418 may include appropriate circuitry, interfaces, or cords configured to adjust (e.g., tighten or loosen) the length of the corresponding string 430-444. In an exemplary embodiment, each tension adjustment assembly may include a motor, spring, or other type of mechanism for adjusting the length of the string. Although FIG. 4 shows two tension adjustment assemblies on either side of the frame 402, the disclosure is not limited in this respect and the tension adjustment assemblies 404-418 may be located in other configurations along a portion of the frame 402.

[0060] Each of the strings 430, 432, 434, 436, 438, 440, 442, and 444 includes a corresponding set of circumferential guide rollers 446, 448, 450, 452, 454, 456, 458, and 460. Each of the circumferential guide roller sets 446-460 is configured to support a coil conductor 462 that forms a coil within the frame 402. Specifically, each circumferential guide roller set may include two rollers (or other support structure) that support the coil conductor on either side to allow movement of the coil conductor as the corresponding string of the circumferential guide roller set moves within the frame 402. The coil conductor is fed by a wire feed assembly 465 such that different lengths of the coil conductor 462 are set and supported by each circumferential guide roller set, thereby allowing the circumferential length of the coil conductor 462 to be altered for different configurations of the AGTC 400. The coil conductors 462 are coupled to a voltage supply assembly 464 that can control the voltage and current therethrough.

[0061] As shown in FIG. 4, one end of each of the strings 430-444 is attached to a corresponding tension adjustment assembly 404-418, and the other end of each string is threaded through an opening in a spool 425 in a central spool assembly 424 and attached to a tension maintenance assembly 506 (see FIG. 5).

[0062] In operation, the substrate processing apparatus control circuitry (e.g., controller 116) can adjust the shape of the AGTC 400 by positioning the central spool assembly 424 within a particular location surrounded by the frame 402 by moving the central spool assembly along the horizontal drive screw 420 and / or the vertical drive screw 422. Additionally, the shape of the AGTC 400 can be adjusted by adjusting the length of each of the tension strings 430-444, which causes movement of the corresponding peripheral guide roller sets 446-460 and corresponding movement of the coil conductor 462 to create a unique shape of the AGTC 400 (e.g., an exemplary AGTC shape is shown in FIGS. 6A and 6B). After the length of each tension string is adjusted by the tension adjustment assemblies 404-418, the other end of each tension string threaded through the spool 425 of the central spool assembly 424 is coupled to a tension maintenance assembly 506 such that tension is maintained in each tension string.

[0063] Figure 5 depicts a diagram 500 of a tension maintenance assembly 506 that may be used in the AGTC of Figure 4 in an exemplary embodiment. Referring to Figure 5, diagram 500 depicts a perspective view of tension adjustment assemblies 406 and 416 of AGTC 400 coupled to corresponding strings 432 and 442, respectively. As shown in Figure 5, coil conductor 462 is supported on either side by peripheral guide roller sets 448 and 458.

[0064] In an exemplary embodiment, the tension adjustment assemblies 416 and 406 include corresponding drive motors 504 and 502 configured to tighten or loosen the tension strings 442 and 432 at a first end of the string. A second end of the string is threaded onto a spool 425 of a central spool assembly 424 and coupled to a tension maintenance assembly 506, as shown in FIG. 5. In an exemplary embodiment, the tension maintenance assembly 506 includes a tensioning mechanism 508, which may be a spring, a drive motor, or another mechanism. Although the tension maintenance assembly 506 is shown having one tensioning mechanism 508, the disclosure is not limited in this respect and separate tensioning mechanisms may be used for each of the tension strings 430-444. In an exemplary embodiment, the controller 116 may individually set the length of each of the tension strings 430-444, and each of the tension adjustment assemblies 404-418 may be adjusted accordingly to achieve a desired coil shape formed by the coil conductor 462. In this case, the function of the tension maintenance assembly 506 is to remove any slack strings and ensure that the desired string length does not change.

[0065] 6A and 6B depict exemplary configurations of the AGTC of FIG. 4 using different coil geometries in an exemplary embodiment. Specifically, FIG. 6A depicts an exemplary shape 600A of the AGTC 400 when the center spool assembly 424 is moved to the top left of the frame 402. FIG. 6B depicts an exemplary shape 600B of the AGTC 400 when the center spool assembly 424 is moved to the bottom right of the frame 402. As shown in FIGS. 6A and 6B, different shapes of the AGTC can be set by moving the center spool assembly 424 to different positions within the frame 402 using the drive screws 420 and 422 and using strings 430-444 of different lengths. In this regard, shapes 600A and 600B are merely examples to illustrate the multiple possibilities of various shapes of AGTCs that can be realized using the disclosed technology.

[0066] In an exemplary embodiment, after the controller 116 sets the position of the central spool assembly 424, the shape of the AGTC 400 or the circumference of the coil conductor can be adjusted by adjusting the length of the strings 430-444 (as well as by making the coil conductor tighter or looser with the wire feed assembly 465). Additionally, a voltage feed assembly 464 can be used to adjust the voltage or current of the AGTC 400. In this regard, parameters of the AGTC that can be adjusted based on a detected residual magnetic field or a detected non-uniformity of the substrate surface (e.g., a lithography mask) include the coil shape, the circumference of the coil conductor, and the current through the coil conductor.

[0067] In an exemplary embodiment, multiple parameters of the AGTC can be adjusted (e.g., periodically / dynamically, during substrate processing) based on sensed residual magnetic field and / or substrate non-uniformity. For example, both the shape (or perimeter) and current of the AGTC can be adjusted based on the proximity of the AGTC to one or more magnetic field sources (e.g., a hoist that is a residual magnetic field source), the strength of the residual magnetic field, the direction of the residual magnetic field, etc.

[0068] In an exemplary embodiment, one or more supplemental (or trim) magnetic fields may be generated by at least one AGTC using techniques disclosed herein (e.g., shown in Figures 7A-9) to counter residual magnetic fields (e.g., residual magnetic field 310) present in the vacuum chamber 302 or to combat non-uniformities on the substrate surface.

[0069] 7A illustrates a perspective view 700A of a vacuum chamber 702 with an AGTC used as a magnetic field source to counteract the residual magnetic field, according to an exemplary embodiment. Referring to FIG. 7A, the vacuum chamber 702 may be subjected to a residual magnetic field 710 (including a primarily vertical component Bz) measured at a location 708 (which may be within a processing region of the vacuum chamber). An AGTC 704 (which may be similar to the AGTC 400) may be configured to generate a supplemental (or trim) magnetic field 706 within the vacuum chamber 702. The supplemental (or trim) magnetic field is also shown as Bt 712, which has a similar magnitude in a direction opposite to that of the residual magnetic field 710.

[0070] In an exemplary embodiment, the residual magnetic field 710 may be detected and measured by a magnetic field sensor located at or near the location 708. An exemplary magnetic field sensor that may be used to detect the residual magnetic field is described in connection with FIG. 11. Additionally, a magnetic field controller (which may be, for example, controller 116, see FIG. 11) may be used to adjust one or more parameters of the AGTC 704 to adjust the supplemental magnetic field 712. For example, the magnetic field controller may change the magnitude of the supplemental magnetic field 712 by adjusting the current (e.g., direct current (DC)), shape, or perimeter of the AGTC 704.

[0071] In some embodiments, the current may be adjusted such that the magnitude of the supplemental magnetic field 712 drives the magnitude of the residual magnetic field 710 to zero. In other embodiments, the magnetic field controller may adjust the current through the AGTC 704 such that the resulting residual magnetic field 710 (after the supplemental magnetic field 712 is applied) achieves a target magnitude and / or direction (e.g., a predefined residual magnetic field magnitude, Bfab, that matches the residual magnetic field magnitudes (e.g., Bz~Bfab) of other vacuum chambers associated with the manufacturing process).

[0072] In an exemplary embodiment, the magnetic field controller may use sensors (e.g., sensors shown in FIG. 11 ) to detect non-uniformities (e.g., non-uniformities of a lithography mask on the substrate) along a surface of a substrate being processed in the vacuum chamber 702, which non-uniformities can be detected prior to processing or in situ that are communicated to the magnetic field controller. The magnetic field controller then sets one or more parameters of the AGTC 704 to produce a magnetic field that causes non-uniform etching of the substrate to match the detected non-uniformities of the substrate surface.

[0073] FIG 7B is a side view 700B of the vacuum chamber of FIG 7A according to an exemplary embodiment, depicting mounting options for the AGTC. With reference to FIG 7B, in an exemplary embodiment, the AGTC 704 may be mounted inside the vacuum chamber 702 proximate to the processing region 714. In an exemplary embodiment, the AGTC 704 may be mounted on a pedestal 718 secured to a top plate 716 of the vacuum chamber 702. In an exemplary embodiment, the AGTC 704 may be attached to an inner surface of the vacuum chamber 702 (e.g., the top surface shown in FIG 7B) via a coupling 720.

[0074] In an exemplary embodiment, the vacuum chamber 702 may be surrounded by a magnetic shield structure, such as magnetic shield structure 200. In an exemplary embodiment, the AGTC 704 may be secured within the magnetic shield structure but outside of the vacuum chamber 702 (e.g., on an inner surface of the magnetic shield structure). In an exemplary embodiment, the AGTC 704 may be located outside of the magnetic shield structure and the vacuum chamber 702.

[0075] In an exemplary embodiment, multiple AGTCs may be used as magnetic field sources to generate one or more supplemental magnetic fields (e.g., the supplemental magnetic fields shown in Figures 8, 9, and 10), and each coil may be positioned differently using the options described above in connection with Figures 7A and 7B.

[0076] FIG. 8 illustrates a perspective view 800 of a vacuum chamber having multiple AGTCs configured as a Helmholtz pair to generate a magnetic field to cancel the residual magnetic field, according to an exemplary embodiment. With reference to FIG. 8, a vacuum chamber 802 may be subjected to a residual magnetic field 812 (including a primarily vertical component Bz) measured at a location 810 (which may be within a processing region of the vacuum chamber 802). Multiple AGTCs (e.g., two AGTCs) 804 and 806 (which may be similar to AGTC 400) may be configured to generate a supplemental (or trim) magnetic field 808 within the vacuum chamber 802. The supplemental (or trim) magnetic field 808 is also shown as Bt 814 having a similar magnitude in a direction opposite to that of the residual magnetic field 812.

[0077] In an exemplary embodiment, the AGTCs 804 and 806 may be configured as a Helmholtz pair. In an exemplary embodiment, the residual magnetic field 812 may be detected and measured by a magnetic field sensor located at or near the location 810. In addition, a magnetic field controller (e.g., the magnetic field controller shown in FIG. 11 ) may be used to adjust one or more parameters of the AGTCs 804 and 806 to result in different characteristics of the supplemental magnetic field 814. For example, the magnetic field controller may adjust the current in the Helmholtz pair of the AGTCs 804-806 to change the magnitude of the supplemental magnetic field 814. In some aspects, the current in the AGTCs may be adjusted such that the magnitude of the supplemental magnetic field 814 drives the magnitude of the residual magnetic field 812 to zero. In other aspects, the magnetic field controller may adjust the current through the Helmholtz pair such that the resulting residual magnetic field 812 (after the supplemental magnetic field 814 is applied) achieves a target magnitude and / or direction. In some embodiments, the magnetic coils of AGTCs 804 and 806 may be more localized than the flattened spiral shown in the figure to function as a traditional Helmholtz pair.

[0078] In an exemplary embodiment, one or more AGTCs can be installed at different locations around the vacuum chamber 802, with each AGTC generating a supplemental field with a supplemental field of a preset magnitude and direction. In some aspects, each supplemental magnetic field can also be dynamically set (e.g., the magnitude and / or direction of each supplemental magnetic field can be set based on periodic measurements of the residual field in or around the vacuum chamber) such that a desired magnitude and / or direction of the residual magnetic field is achieved after the supplemental magnetic field is activated.

[0079] In an exemplary embodiment, the vacuum chamber 802 may be surrounded by a magnetic shielding structure, such as the magnetic shielding structure 200. In an exemplary embodiment, the AGTCs 804 and 806 of the Helmholtz pair may be fixed within the magnetic shielding structure (e.g., on an inner surface of the magnetic shielding structure) other than outside the vacuum chamber 802. In an exemplary embodiment, the AGTCs 804 and 806 of the Helmholtz pair may be located outside the magnetic shielding structure and the vacuum chamber 802.

[0080] 9 depicts a perspective view 900 of a vacuum chamber 902 having multiple AGTCs configured as multiple Helmholtz pairs to generate multiple magnetic fields to cancel residual magnetic fields, according to an example embodiment. With reference to FIG. 9, the vacuum chamber 902 may be subjected to a residual magnetic field (not shown in FIG. 9). Multiple AGTCs 904-914 (which may be similar to AGTC 400) may be configured to generate supplemental (or trim) magnetic fields 922-926 within the vacuum chamber 902.

[0081] In an exemplary embodiment, the AGTCs 904-914 may be configured as a Helmholtz pair (e.g., coils 904 and 906 are configured as a first Helmholtz pair along the Z-axis, coils 908 and 910 are configured as a second Helmholtz pair along the X-axis, and coils 912 and 914 are configured as a third Helmholtz pair along the Y-axis). In an exemplary embodiment, the residual magnetic field may be detected and measured by a magnetic field sensor located at or near the processing region of the vacuum chamber 902. In addition, a magnetic field controller (e.g., the magnetic field controller shown in FIG. 11) may be used to adjust one or more characteristics of the supplemental magnetic fields 922, 924, and 926 (having corresponding magnetic field lines 916, 918, and 920). For example, the magnetic field controller may change the magnitude of each of the supplemental magnetic fields 922, 924, and 926 by adjusting the currents in the AGTCs 904-914 of the Helmholtz pairs. In some embodiments, the current (or other parameters of the AGTC) may be adjusted such that the magnitude of the supplemental magnetic fields 922-926 drives the magnitude of the residual magnetic field to zero. In other embodiments, the magnetic field controller may adjust the current through the Helmholtz pair such that the resulting residual magnetic field (after one or more supplemental magnetic fields are applied) achieves a target magnitude and / or direction.

[0082] In an exemplary embodiment, the magnetic field controller may use one or more magnetic field sensors to detect the residual magnetic field in the vacuum chamber 902 or to detect non-uniformity of the substrate surface. The magnetic field controller may then determine how many AGTCs of the configured Helmholtz pairs may be activated based on the direction and / or magnitude of the desired supplemental magnetic field. For example, if the residual magnetic field is associated with a direction that matches the direction of only one of the supplemental magnetic fields 922-926, only the corresponding Helmholtz pair associated with the matching direction is activated. In addition, if the direction of the residual magnetic field is a combination of two or more directions of the supplemental magnetic fields 922-926, the corresponding Helmholtz pair associated with such direction is activated. In an exemplary embodiment, the magnetic field controller may activate one or more available Helmholtz pairs (e.g., to achieve residual magnetic field uniformity among multiple vacuum chambers in a fabrication facility) based on the desired magnitude and / or direction of the resulting magnetic field.

[0083] In an exemplary embodiment, the vacuum chamber 902 may be surrounded by a magnetic shielding structure, such as the magnetic shielding structure 200. In an exemplary embodiment, the AGTCs 904-914 of the Helmholtz pair may be fixed within the magnetic shielding structure (e.g., on an inner surface of the magnetic shielding structure) other than outside the vacuum chamber 902. In an exemplary embodiment, the AGTCs 904-914 of the Helmholtz pair may be located outside the magnetic shielding structure and the vacuum chamber 902.

[0084] FIG. 10 illustrates a top view 1000 of a vacuum chamber using pairs of AGTCs that generate different magnetic fields to cancel residual magnetic fields, according to an exemplary embodiment. Referring to FIG. 10, a vacuum chamber 1002 includes a processing region 1004 for processing a substrate using CCP (or other techniques). FIG. 10 further illustrates AGTCs 1006, 1008, 1010, and 1012, which are similar to AGTCs 912, 914, 908, and 910, respectively, in FIG. 9, and may also be similar to AGTC 400 in FIG. 4. In an exemplary embodiment, the AGTCs 1010 and 1012 may be activated (e.g., as a Helmholtz pair) to generate a horizontal supplemental magnetic field Btb. In an exemplary embodiment, the AGTCs 1006 and 1008 may be activated (e.g., as a Helmholtz pair) to generate another horizontal supplemental magnetic field Btz, which may be perpendicular to the horizontal supplemental magnetic field Btb (as shown in FIG. 10). In an exemplary embodiment, such horizontal supplemental magnetic fields may be generated with the same or different magnitudes, separately or together, based on the desired magnitude and direction of the resulting residual magnetic field within the vacuum chamber 1002.

[0085] 11 depicts a vacuum chamber 1102 having different types of magnetic sensors and magnetic field control devices for configuring one or more supplemental magnetic fields to counteract the residual magnetic field, according to an exemplary embodiment. With reference to FIG. 11, the vacuum chamber 1102 may be shielded (e.g., with the magnetic shield structure 200) and exposed to an external magnetic field with a vertical component 1104 and a horizontal component 1106, resulting in a residual magnetic field 1108 within the vacuum chamber 1102.

[0086] In an exemplary embodiment, the vacuum chamber 1102 includes a magnetic field controller 1118. The magnetic field controller 1118 may be the same as the controller 116. Additionally, the magnetic field controller 1118 may include suitable circuitry, logic, interfaces, and / or code and may be configured to receive magnetic field sensor data or substrate surface non-uniformity data and adjust one or more parameters of the at least one AGTC to produce a supplemental magnetic field generated by the at least one AGTC. In an exemplary embodiment, a smart wafer 1112 may be loaded into a processing region of the vacuum chamber 1102 through the opening 1110. The smart wafer 1112 may include multiple magnetic field sensors 1114 configured to detect and measure residual magnetic fields (e.g., residual magnetic field 1108) after being placed in the processing region in the vacuum chamber 1102. In an exemplary embodiment, the magnetic field controller 1118 may detect and measure residual magnetic fields, such as the residual magnetic field 1108, as well as substrate surface non-uniformity using one or more independent magnetic field sensors 1116 to set parameters of the at least one AGTC.

[0087] In an exemplary embodiment, the magnetic field controller 1118 may use the magnetic field sensors 1114 and / or 1116 to detect the magnitude and direction of the residual magnetic field 1108. The magnetic field controller 1118 adjusts at least one parameter of the AGTC to generate a supplemental magnetic field that counteracts the residual magnetic field 1108 (or reduces or increases the residual magnetic field to a predetermined value). For example, the magnetic field controller may adjust the current, shape, or perimeter of the AGTC to generate a desired supplemental magnetic field. Additionally, the magnetic field controller 1118 may activate or deactivate one or more of a plurality of available AGTCs to achieve zero residual magnetic field or a residual magnetic field of a desired magnitude and direction to achieve uniformity with other vacuum chambers in the manufacturing facility.

[0088] The magnetic field controller 1118 may activate or deactivate one or more of the multiple available AGTCs and adjust one or more parameters of the activated AGTCs based on the detected non-uniformity of the substrate surface. In this regard, the generated supplemental magnetic field results in a non-uniform etch that counteracts and matches the detected surface non-uniformity, contributing to a more uniform surface after the substrate is processed.

[0089] In an exemplary embodiment, the magnetic field sensor 1114 and / or 1116 may be used for initial measurements so that the magnetic field controller 1118 can make adjustments that result in the generation of a supplemental magnetic field of the desired magnitude and direction. Periodic measurements and adjustments may be made using the magnetic field sensor 1114 and / or 1116. In an exemplary embodiment, a separate magnetic field sensor 1116 may be used for automatic (dynamic) measurements and adjustments in the characteristics of the supplemental magnetic field. In an exemplary embodiment, one magnetic field sensor (or a set of magnetic field sensors) may be used for one magnetic field source such that different sensors may be associated with different magnetic field sources. In an exemplary embodiment, the magnetic field controller 1118 may wirelessly communicate with the magnetic field sensors 1114 and 1116 to receive sensor data.

[0090] FIG. 12 illustrates an arrangement 1200 of vacuum chambers in a manufacturing facility where the disclosed techniques can be used to reduce, nullify, or homogenize multiple residual magnetic fields in the vacuum chambers, according to an exemplary embodiment. Referring to FIG. 12, the arrangement 1200 is installed in a semiconductor manufacturing facility and may include multiple vacuum chambers, such as vacuum chambers 1202, 1204, 1206, 1208, 1210, and 1212. Each vacuum chamber may be magnetically shielded and exposed to a different external magnetic field, resulting in a different residual magnetic field in each vacuum chamber. Specifically, vacuum chambers 1202, 1204, 1206, 1208, 1210, and 1212 are associated with corresponding residual magnetic fields 1214, 1216, 1218, 1220, 1222, and 1224. In an exemplary embodiment, one or more techniques described herein may be used to null each residual magnetic field in the vacuum chambers or achieve a uniform residual magnetic field of the same magnitude and direction in each vacuum chamber.

[0091] FIG. 13 is a flow chart of a method 1300 for processing a substrate using a magnetic field in a semiconductor manufacturing facility, according to an exemplary embodiment. The method 1300 includes operations 1302, 1304, 1306, and 1308, and may be implemented by a magnetic field controller, such as the magnetic field controller 1118 of FIG. 11, the controller 116 of FIG. 1, or the processor 1402 of FIG. 14. Referring to FIG. 13, in operation 1302, a residual magnetic field is detected in a processing region of a vacuum chamber used to process a substrate (e.g., a semiconductor substrate). For example, the residual magnetic field 310 is detected in the processing region 304 of the vacuum chamber 302. In operation 1304, a magnitude of the residual magnetic field is determined. For example, the magnetic field controller 1118 can determine the magnitude of the residual magnetic field using either or both of the sensors 1114 and 1116. In operation 1306, at least one parameter of the AGTC is adjusted based on the determined magnitude of the residual magnetic field. For example, the magnetic field controller 1118 adjusts the shape, perimeter, and / or current of the AGTC based on the determined magnitude of the residual magnetic field (e.g., as described in connection with FIGS. 4-10). In operation 1308, a supplemental magnetic field is generated in the treatment region using the configured AGTC, where the supplemental magnetic field reduces the residual magnetic field to a predetermined value (e.g., brings the residual magnetic field to zero or reduces it to a predetermined value).

[0092] FIG. 14 is a block diagram depicting an example machine 1400 upon which one or more example process embodiments described herein may be implemented or controlled. In another embodiment, the machine 1400 may operate as an independent device or may be connected (e.g., networked) to other machines. In a networked arrangement, the machine 1400 may operate as a server machine or a client machine, or both, in a server-client network environment. In an example, the machine 1400 may function as a peer machine in a peer-to-peer (P2P) (or other distributed) network environment. Furthermore, although only a single machine 1400 is shown, the term "machine" may also be interpreted to include a group of machines that individually or cooperatively execute a set (or sets) of instructions to implement one or more methodologies described herein (e.g., via cloud computing, software as a service (SaaS), or other computer cluster configurations).

[0093] The examples described herein may include or be implemented by logic, some components, or mechanisms. Circuitry is a collection of circuits that implement tangible objects including hardware (e.g., simple circuits, gates, logic). Circuitry members are prone to flexing over time, and the underlying hardware may change. Circuitry includes members that, when in operation, can perform specific operations, either alone or in combination. In an example, the hardware of the circuitry may be invariably designed (e.g., physically embedded) to perform specific operations. In an example, the hardware of the circuitry may include variably connected physical components (e.g., execution units, transistors, simple circuits) that include computer-readable media that are physically altered (e.g., magnetically, electrically, by movable placement of invariant dense particles) to encode instructions for specific operations. When connecting physical components, the electrical properties of the underlying hardware components change (e.g., from insulator to conductor or vice versa). The instructions enable the embedded hardware (e.g., execution unit or loading mechanism) to form the circuitry elements within the hardware through variable connections to perform certain portions of the operations during operation. Thus, the computer-readable medium is communicatively connected to other elements of the circuitry during operation of the device. In some aspects, any of the physical components may be used for one or more elements of one or more circuitry. For example, during operation, an execution unit may be used for a first circuit of a first circuitry at one time and reused by a second circuit of the first circuitry or by a third circuit of the second circuitry at a different time.

[0094] The machine (e.g., a computer system) 1400 includes a hardware processor 1402 (e.g., a central processing unit (CPU), a hardware processor core, or a combination thereof), a graphics processing unit (GPU) 1403, a main memory 1404, and a static memory 1406, some or all of which may communicate with each other via an interlink (e.g., a bus) 1408. The machine 1400 may further include a display device 1410, an alphanumeric input device 1412 (e.g., a keyboard), and a user interface (UI) navigation device 1414 (e.g., a mouse). In an example, the display device 1410, the alphanumeric input device 1412, and the UI navigation device 1414 may be touch screen display screens. Additionally, the machine 1400 may include a mass storage device (e.g., a drive unit) 1416, a signal generator 1418 (e.g., a speaker), a network interface device 1420, and one or more sensors 1421 (e.g., a Global Positioning System (GPS) sensor, a compass, an accelerometer, or another sensor). The machine 1400 may include an output controller 1428 (e.g., a serial connection (e.g., Universal Serial Bus (USB), a parallel connection, or other wired or wireless (e.g., infrared (IR), near field communication (NFC)) connection) to communicate with or control one or more peripheral devices (e.g., a printer, a card reader).

[0095] In an exemplary embodiment, the hardware processor 1402 may be the same as the controller 116 and may be configured to perform at least the functions of the magnetic field control device 1118 described above in connection with FIG.

[0096] The mass storage device 1416 may comprise a machine-readable medium 1422 on which is stored one or more data structures or instructions 1424 (e.g., software) that embody or are used in one or more of the techniques or functions described herein. The instructions 1424 may reside, completely or at least partially, within the main memory 1404, the static memory 1406, the hardware processor 1402, or the GPU 1403 during execution thereof by the machine 1400. In an example, one or a combination of the hardware processor 1402, the GPU 1403, the main memory 1404, the static memory 1406, or the mass storage device 1416 may constitute a machine-readable medium.

[0097] Although the machine-readable medium 1422 is illustrated as a single medium, the term “machine-readable medium” may include a single medium or multiple media (e.g., a centralized or distributed database, and / or associated caches and services) configured to store one or more instructions 1424.

[0098] The term "machine-readable medium" may include a medium capable of storing, encoding, or executing instructions 1424 for execution by the machine 1400 and instructions 1424 that cause the machine 1400 to perform one or more of the techniques of this disclosure, or a medium capable of storing, encoding, or executing data structures used in or associated with such instructions 1424. Non-limiting examples of machine-readable media may include solid-state memory, as well as optical and magnetic media. In an example, the machine-readable media include a machine-readable medium 1422 that comprises a plurality of particles having a fixed (e.g., stationary) mass. Thus, the machine-readable media are not transitory propagating signals. Particular examples of machine-readable media may include non-volatile memory, such as semiconductor memory devices (e.g., electrically programmable read-only memory (EPROM), electrically erasable programmable read-only memory (EEPROM)), flash memory devices, magnetic disks (such as internal hard disks and removable disks), magneto-optical disks, and CD-ROM and DVD-ROM disks.

[0099] The instructions 1424 may further be transmitted or received over a communications network 1426 using a transmission medium via the network interface device 1420 .

[0100] The prior art embodiments may be realized by any number of specifications, configurations, or exemplary arrangements of hardware and software. It should be understood that the functional units or capabilities described herein may be referred to or categorized as components or modules, particularly to better emphasize their implementation independence. Such components may be embodied in any number of software or hardware forms. For example, a component or module may be implemented as a hardware circuit including custom Very Large Scale Integrated Circuits (VLSI) or gate arrays, off-the-shelf semiconductors (e.g., logic chips), transistors, or other discrete components. A component or module may be implemented in a programmable hardware device, such as a field programmable gate array, programmable array logic, programmable logic device, or the like. A component or module may be implemented in software for execution by various types of processors. An identified component or module of executable code may include, for example, one or more physical or logical blocks of computer instructions, which may be organized, for example, as an object, a process step, or a function. Nonetheless, the executable files of the identified components or modules need not be physically located together, but may include heterogeneous instructions stored in different locations which, when logically combined, comprise the components or modules and achieve a predetermined purpose for them.

[0101] In fact, an executable code component or module may be a single instruction or multiple instructions, and may be distributed among several different code segments among different programs, and among several memory devices or processing systems. In particular, some aspects of the described process (e.g., rewriting the code and analyzing the code) may be performed in a processing system (e.g., a computer in a data center) different from the processing system in which the code is located (e.g., a computer embedded in a sensor or robot). Similarly, operational data is identified and illustrated in the components or modules herein, and may be embodied in any suitable form and organized in any suitable type of data structure. The operational data may be collected as one data set or distributed in different locations, including different storage devices, and may exist at least in part as merely electronic signals on a system or network. The components or modules, including agents operable to perform a desired function, may be passive or active.

[0102] Additional notes and examples

[0103] Example 1 is a substrate processing apparatus comprising a vacuum chamber including a processing region for processing a substrate, an adjustable shape trim coil (AGTC) configured to generate a supplemental magnetic field in the processing region of the vacuum chamber, and a magnetic field controller coupled to the AGTC and configured to adjust at least one parameter of the AGTC to cause the supplemental magnetic field to reduce a residual magnetic field in the vacuum chamber to a predetermined value.

[0104] In Example 2, the subject matter of Example 1 includes subject matter in which the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, a current passing through the coil conductor, a relative position of the AGTC to a magnetic component, and a length position of the coil conductor forming the AGTC that includes a magnetic material to geometrically direct, concentrate, or shield magnetic flux from the current passing through the coil conductor.

[0105] In Example 3, the subject matter of Example 2 includes a magnetic field sensor configured to detect a residual magnetic field in a vacuum chamber, the magnetic field sensor being a wafer sensor located in a processing region of the vacuum chamber.

[0106] In Example 4, the subject matter of Example 3 includes subject matter where the wafer sensor comprises an array of magnetic field sensors configured to measure a magnitude of a residual magnetic field at a plurality of locations within the processing region, and the magnetic field controller adjusts at least one parameter of the AGTC based on the measured magnitude.

[0107] In Example 5, the subject matter of Example 4 includes subject matter where the magnetic field control device adjusts current through a coil conductor of the AGTC to cause the magnitude of the supplemental magnetic field to match an average magnitude obtained from the magnitude of the residual magnetic field measured at multiple locations.

[0108] In Example 6, the subject matter of Example 5 includes subject matter where the magnetic field controller adjusts at least one parameter of the AGTC to cause the magnitude of the supplemental magnetic field to match the average magnitude, and the direction of the supplemental magnetic field is opposite to the direction of the residual magnetic field.

[0109] In Example 7, the subject matter of Examples 1-6 includes subject matter where the AGTC is attached to a support structure that is attached to a surface of a top plate of the vacuum chamber.

[0110] In Example 8, the subject matter of Examples 1-7 includes at least another AGTC (eg, a second AGTC) configured to generate at least another supplemental magnetic field in a processing region of the vacuum chamber.

[0111] In Example 9, the subject of Example 8 is Generated by AGTC A supplementary magnetic field and at least another supplementary magnetic field of The subject matter includes that either or both are generated in a direction opposite to the vertical component (Bz) of the remanent magnetic field.

[0112] In Example 10, the subject matter of Example 9 includes subject matter where at least another AGTC is configured to generate at least another supplemental magnetic field in an opposite direction to the horizontal component (Bh) of the remanent magnetic field.

[0113] In Example 11, the subject matter of Examples 8-10 includes subject matter where the AGTC and at least another AGTC are configured as a Helmholtz pair configured to generate a supplemental magnetic field along a vertical axis or a horizontal axis of the vacuum chamber.

[0114] In Example 12, the subject matter of Examples 2-11 includes the subject matter where the AGTC further includes a plurality of tension adjustment assemblies coupled to a corresponding plurality of strings, each string of the plurality of strings including a peripheral guide roller set for guiding a portion of the coil conductor.

[0115] In Example 13, the subject matter of Example 12 includes subject matter where the magnetic field control device is configured to adjust a length of one or more strings of the plurality of strings using a corresponding tension adjustment assembly of the plurality of tension adjustment assemblies to change a shape of the AGTC based on the residual magnetic field.

[0116] In Example 14, the subject matter of Examples 12-13 includes subject matter where the AGTC includes a wire feed assembly, and the magnetic field control device is configured to adjust a circumference of the coil conductor by the wire feed assembly and by adjusting a length of one or more tension strings of the plurality of tension strings with a corresponding tension adjustment assembly of the plurality of tension adjustment assemblies.

[0117] In Example 15, the subject matter of Examples 12-14 includes the subject matter where the AGTC further comprises a central spool assembly configured to receive one end of each of the plurality of tension strings, the other end of each of the plurality of tension strings being attached to the plurality of tension adjustment assemblies, and the magnetic field control device is configured to move the central spool assembly by at least one drive motor along the vertical drive screw or the horizontal drive screw to adjust a shape of the AGTC.

[0118] Example 16 is a method for processing a substrate using a vacuum chamber, comprising: detecting a residual magnetic field in a processing region of the vacuum chamber for processing the substrate; determining a magnitude of the residual magnetic field; adjusting at least one parameter of an adjustable shape trim coil (AGTC) based on the determined magnitude of the residual magnetic field; and generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, wherein the supplemental magnetic field reduces the residual magnetic field to a predetermined value.

[0119] In Example 17, the subject matter of Example 16 includes subject matter where the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current passing through the coil conductor.

[0120] In Example 18, the subject matter of Example 17 includes the subject matter where the step of determining the magnitude further includes a step of determining a magnitude of a vertical component (Bz) of the residual magnetic field and a step of determining a magnitude of a horizontal component (Bh) of the residual magnetic field.

[0121] In Example 19, the subject matter of Example 18 includes setting at least one parameter of the AGTC to generate a supplemental magnetic field to reduce a magnitude of a vertical component of the residual magnetic field, and configuring at least another AGTC to generate at least another supplemental magnetic field to reduce a magnitude of a horizontal component of the residual magnetic field.

[0122] In Example 20, the subject matter of Examples 18-19 includes subject matter where the substrate is unprocessed or processed, and the method further includes detecting a non-uniformity in a physical quantity of the substrate or a sub-micron feature of the substrate, and further adjusting at least one parameter of the AGTC based on the detected non-uniformity.

[0123] In Example 21, the subject matter of Example 20 includes adjusting at least one parameter of the AGTC during substrate processing.

[0124] Example 22 is a machine-readable storage medium including instructions that, when executed by the machine, cause the machine to perform operations of detecting a residual magnetic field in a processing region of a vacuum chamber for processing a substrate, determining a magnitude of the residual magnetic field, adjusting at least one parameter of an adjustable shape trim coil (AGTC) based on the determined magnitude of the residual magnetic field, and generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, the supplemental magnetic field reducing the residual magnetic field to a predetermined value.

[0125] In Example 23, the subject matter of Example 22 includes subject matter where the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current passing through the coil conductor.

[0126] In Example 24, the subject matter of Example 23 includes where the operations further include determining a magnitude of a vertical component (Bz) of the residual magnetic field and determining a magnitude of a horizontal component (Bh) of the residual magnetic field.

[0127] In Example 25, the subject matter of Example 24 includes the operations further including setting at least one parameter of the AGTC to generate a supplemental magnetic field to reduce a magnitude of a vertical component of the residual magnetic field, and configuring at least another AGTC to generate at least another supplemental magnetic field to reduce a magnitude of a horizontal component of the residual magnetic field.

[0128] Example 26 is at least one machine-readable medium including instructions that, when executed by a processing circuitry, cause the processing circuitry to perform operations to implement any of Examples 1-25.

[0129] Example 27 is an apparatus including means for carrying out any of Examples 1 to 25.

[0130] Example 28 is a system for carrying out any one of Examples 1 to 25.

[0131] Example 29 is a method for carrying out any of Examples 1-25.

[0132] Throughout this specification, examples may include components, operations, or structures that are described as a singular example. Although individual operations of one or more methods are illustrated and described as separate operations, one or more individual operations may be performed simultaneously, and the operations need not be performed in the order described. Structures and functions presented as separate components for example configurations may be implemented as composite structures or elements. Similarly, structures and functions presented as single components may be implemented as separate components. These and other changes, modifications, additions, and improvements fall within the scope of the inventive subject matter.

[0133] The embodiments described herein are described in sufficient detail to enable those skilled in the art to practice the teachings of the disclosure. Other embodiments may be used and derived therefrom, such that structural and logical substitutions and changes may be made without departing from the scope of the disclosure. Thus, the detailed description should not be taken as limiting, and the scope of the various embodiments is defined only by the appended claims, along with the full scope of equivalents to which they are entitled.

[0134] The claims may not recite every single feature disclosed herein, since the embodiments focus on only a portion of the features. Moreover, the embodiments may include fewer features than are disclosed in a particular example. Thus, the following claims are hereby incorporated into the Detailed Description, with each claim standing on its own as an individual embodiment.

[0135] The term "or" as used herein may be interpreted in either an inclusive or exclusive sense. Also, multiple examples may be provided as a single example of a resource, operation, or structure described herein. In addition, boundaries between various resources, operations, modules, institutions, and data stores are somewhat arbitrary, and certain operations are described in terms of specific example configurations. Other arrangements of functionality may be provided and fall within the scope of various embodiments of the disclosure. In general, structures and functions presented as separate resources in an example configuration may be implemented as composite structures or resources. Similarly, structures and functions presented as a single resource may be implemented as separate resources. These and other changes, modifications, additions, and improvements fall within the scope of the embodiments of the disclosure, as set forth in the appended claims. Accordingly, the specification and drawings should be regarded as illustrative and not restrictive. The present invention can be realized, for example, in the following manner. Application example 1: A substrate processing apparatus, comprising: a vacuum chamber including a processing region for processing the substrate; an adjustable geometry trim coil (AGTC) configured to generate a supplemental magnetic field in the processing volume of the vacuum chamber; a magnetic field controller coupled to the AGTC and configured to adjust at least one parameter of the AGTC to cause the supplemental magnetic field to reduce a residual magnetic field in the vacuum chamber to a predetermined value; The substrate processing apparatus includes: Application example 2: The device according to Application Example 1, The at least one parameter of the AGTC is The shape of the AGTC, The perimeter of the coil conductor forming the AGTC; a current passing through the coil conductor; the relative position of the AGTC with respect to a magnetic component; and a length of the coil conductor forming the AGTC including magnetic material to geometrically direct, concentrate, or shield magnetic flux from the current passing through the coil conductor; The device is at least one of: Application example 3: The device according to Application Example 2, further comprising: An apparatus comprising: a magnetic field sensor configured to detect the residual magnetic field within the vacuum chamber, the magnetic field sensor being a wafer sensor located in the processing region of the vacuum chamber. Application example 4: The device according to Application Example 3, the wafer sensor comprises an array of magnetic field sensors configured to measure a magnitude of the residual magnetic field at a plurality of locations within the processing region; The magnetic field control device adjusts the at least one parameter of the AGTC based on the measured magnitude. Application example 5: The device according to Application Example 4, The magnetic field control device adjusts the current through the coil conductor of the AGTC to cause the magnitude of the supplemental magnetic field to match an average magnitude obtained from the measured magnitudes of the residual magnetic field at the multiple locations. Application example 6: The device of Application Example 5, The magnetic field control device adjusts the at least one parameter of the AGTC to cause the magnitude of the supplemental magnetic field to match the average magnitude, and a direction of the supplemental magnetic field is opposite to a direction of the residual magnetic field. Example 7: The device according to Application Example 1, The AGTC is mounted to a support structure that is attached to a surface of a top plate of the vacuum chamber. Application example 8: The device of Application Example 1, further comprising: An apparatus comprising: at least another AGTC configured to generate at least another supplemental magnetic field in the processing region of the vacuum chamber. Example 9: The device of Application Example 8, The apparatus, wherein either or both of the supplementary magnetic field and the at least another supplementary magnetic field AGTC are generated in a direction opposite to a vertical component (Bz) of the residual magnetic field. Example 10: The device of Application Example 9, The at least another AGTC is configured to generate the at least another supplemental magnetic field in an opposite direction to a horizontal component (Bh) of the residual magnetic field. Example 11: The device of Application Example 8, The apparatus, wherein the AGTC and the at least another AGTC are configured as a Helmholtz pair, the Helmholtz pair configured to generate the supplemental magnetic fields along a vertical or horizontal axis of the vacuum chamber. Application example 12: The device according to Application Example 2, The AGTC further comprises a plurality of tension adjustment assemblies coupled to a corresponding plurality of strings, each string of the plurality of strings including a peripheral guide roller set for guiding a portion of the coil conductor. Application example 13: The apparatus of application example 12, the magnetic field control device is configured to adjust a length of one or more of the plurality of strings using a corresponding one of the plurality of tension adjustment assemblies to change the shape of the AGTC based on the residual magnetic field. Example 14: The apparatus of application example 12, the AGTC comprises a wire feed assembly; the magnetic field control device is configured to adjust the circumferential length of the coil conductor by adjusting a length of one or more of the plurality of tension strings with the wire feed assembly and with a corresponding one of the plurality of tension adjustment assemblies. Application example 15: The apparatus of application example 12, The AGTC further comprises a central spool assembly configured to receive one end of each of the plurality of strings, the other end of each of the plurality of strings being attached to the plurality of tension adjustment assemblies; The magnetic field control device is configured to move the central spool assembly along a vertical drive screw or a horizontal drive screw using at least one drive motor to adjust the shape of the AGTC. Application example 16: 1. A method for processing a substrate using a vacuum chamber, comprising: detecting a residual magnetic field within a processing volume of the vacuum chamber for processing the substrate; determining the magnitude of the residual magnetic field; adjusting at least one parameter of an adjustable geometry trim coil (AGTC) based on the determined magnitude of the residual magnetic field; generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, the supplemental magnetic field reducing the remanent magnetic field to a predetermined value; A method comprising: Example 17: The method of application example 16, The method of claim 1, wherein the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current passing through the coil conductor. Example 18: The method of application example 17, The step of determining the size further comprises: determining a magnitude of a vertical component (Bz) of the residual magnetic field; determining a magnitude of the horizontal component (Bh) of the residual magnetic field; A method comprising: Example 19: The method of application example 18, further comprising: setting the at least one parameter of the AGTC to generate the supplemental magnetic field to reduce the magnitude of the vertical component of the residual magnetic field; configuring at least another AGTC to generate at least another supplemental magnetic field to reduce the magnitude of the horizontal component of the residual magnetic field; A method comprising: Example 20: The method of application example 18, The substrate may be untreated or treated; The method further comprises: detecting a non-uniformity of a physical quantity of the substrate or a sub-micron feature of the substrate; adjusting the at least one parameter of the AGTC based on the detected non-uniformity; A method comprising: Example 21: The method of application example 20, further comprising: adjusting the at least one parameter of the AGTC during the processing of the substrate. Example 22: A machine-readable storage medium containing instructions that, when executed by a machine, detecting a residual magnetic field within a processing volume of a vacuum chamber for processing a substrate; determining a magnitude of the residual magnetic field; adjusting at least one parameter of an adjustable geometry trim coil (AGTC) based on the determined magnitude of the residual magnetic field; generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, the supplemental magnetic field reducing the remanent magnetic field to a predetermined value; A machine-readable storage medium that causes the machine to execute the above. Example 23: The machine-readable storage medium of application example 22, 11. A machine-readable storage medium, wherein the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current passing through the coil conductor. Application 24: The machine-readable storage medium of application example 23, The operation further comprises: determining a magnitude of a vertical component (Bz) of the residual magnetic field; determining a magnitude of the horizontal component (Bh) of the residual magnetic field; 1. A machine-readable storage medium comprising: Example 25: The machine-readable storage medium of application example 24, The operation further comprises: setting the at least one parameter of the AGTC to generate the supplemental magnetic field to reduce the magnitude of the vertical component of the residual magnetic field; configuring at least another AGTC to generate at least another supplemental magnetic field to reduce the magnitude of the horizontal component of the residual magnetic field; 1. A machine-readable storage medium comprising:

Claims

1. A substrate processing apparatus, comprising: a vacuum chamber including a processing region for processing the substrate; an adjustable geometry trim coil (AGTC) configured to generate a supplemental magnetic field in the processing volume of the vacuum chamber; a magnetic field controller coupled to the AGTC and configured to adjust at least one parameter of the AGTC to cause the supplemental magnetic field to reduce a residual magnetic field in the vacuum chamber to a predetermined value; The substrate processing apparatus includes:

2. 2. The apparatus of claim 1, The at least one parameter of the AGTC is The shape of the AGTC; the circumference of the coil conductor forming the AGTC; a current passing through the coil conductor; the relative position of the AGTC with respect to the magnetic component; and a length of the coil conductor forming the AGTC that includes a magnetic material to geometrically direct, focus, or shield magnetic flux from the current passing through the coil conductor; The device is at least one of:

3. 3. The apparatus of claim 2, further comprising: An apparatus comprising: a magnetic field sensor configured to detect the residual magnetic field within the vacuum chamber, the magnetic field sensor being a wafer sensor located in the processing region of the vacuum chamber.

4. 4. The apparatus of claim 3, the wafer sensor comprises an array of magnetic field sensors configured to measure a magnitude of the residual magnetic field at a plurality of locations within the processing region; The magnetic field controller adjusts the at least one parameter of the AGTC based on the measured magnitude.

5. 5. The apparatus of claim 4, The magnetic field control device adjusts the current through the coil conductor of the AGTC to cause the magnitude of the supplemental magnetic field to match an average magnitude derived from the measured magnitudes of the residual magnetic field at the multiple locations.

6. 6. The apparatus of claim 5, The magnetic field control device adjusts the at least one parameter of the AGTC to cause the magnitude of the supplemental magnetic field to match the average magnitude, and a direction of the supplemental magnetic field is opposite to a direction of the residual magnetic field.

7. 2. The apparatus of claim 1, The apparatus wherein the AGTC is mounted to a support structure that is attached to a surface of a top plate of the vacuum chamber.

8. 2. The apparatus of claim 1, further comprising: An apparatus comprising: at least another AGTC configured to generate at least another supplemental magnetic field in the processing region of the vacuum chamber.

9. 9. The apparatus of claim 8, An apparatus, wherein either or both of the supplemental magnetic field generated by the AGTC and the at least another supplemental magnetic field are generated in a direction opposite to a vertical component (Bz) of the residual magnetic field.

10. 10. The apparatus of claim 9, The at least another AGTC is configured to generate the at least another supplemental magnetic field in an opposite direction to a horizontal component (Bh) of the residual magnetic field.

11. 9. The apparatus of claim 8, The apparatus, wherein the AGTC and the at least another AGTC are configured as a Helmholtz pair, the Helmholtz pair configured to generate the supplemental magnetic fields along a vertical or horizontal axis of the vacuum chamber.

12. 3. The apparatus of claim 2, The AGTC further comprises a plurality of tension adjustment assemblies coupled to a corresponding plurality of strings, each string of the plurality of strings including a peripheral guide roller set for guiding a portion of the coil conductor.

13. 13. The apparatus of claim 12, the magnetic field control device is configured to adjust a length of one or more of the plurality of strings using a corresponding one of the plurality of tension adjustment assemblies to change the shape of the AGTC based on the residual magnetic field.

14. 13. The apparatus of claim 12, the AGTC comprises a wire feed assembly; the magnetic field control device is configured to adjust the circumferential length of the coil conductor by adjusting a length of one or more of the plurality of tension strings with the wire feed assembly and with a corresponding one of the plurality of tension adjustment assemblies.

15. 13. The apparatus of claim 12, The AGTC further comprises a central spool assembly configured to receive one end of each of the plurality of strings, the other end of each of the plurality of strings being attached to the plurality of tension adjustment assemblies; The magnetic field control device is configured to move the central spool assembly along a vertical drive screw or a horizontal drive screw using at least one drive motor to adjust the shape of the AGTC.

16. 1. A method for processing a substrate using a vacuum chamber, comprising: detecting a residual magnetic field within a processing volume of the vacuum chamber for processing the substrate; determining the magnitude of the residual magnetic field; adjusting at least one parameter of an adjustable geometry trim coil (AGTC) based on the determined magnitude of the residual magnetic field; generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, the supplemental magnetic field reducing the remanent magnetic field to a predetermined value; A method comprising:

17. 17. The method of claim 16, The method of claim 1, wherein the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current passing through the coil conductor.

18. 20. The method of claim 17, The step of determining the size further comprises: determining a magnitude of a vertical component (Bz) of the residual magnetic field; determining a magnitude of the horizontal component (Bh) of the residual magnetic field; A method comprising:

19. 20. The method of claim 18 further comprising: setting the at least one parameter of the AGTC to generate the supplemental magnetic field to reduce the magnitude of the vertical component of the residual magnetic field; configuring at least another AGTC to generate at least another supplemental magnetic field to reduce the magnitude of the horizontal component of the residual magnetic field; A method comprising:

20. 20. The method of claim 18, The substrate may be untreated or treated; The method further comprises: detecting a non-uniformity of a physical quantity of the substrate or a sub-micron feature of the substrate; adjusting the at least one parameter of the AGTC based on the detected non-uniformity; A method comprising:

21. 21. The method of claim 20 further comprising: adjusting the at least one parameter of the AGTC during the processing of the substrate.

22. A machine-readable storage medium containing instructions that, when executed by a machine, detecting a residual magnetic field within a processing volume of a vacuum chamber for processing a substrate; determining a magnitude of the residual magnetic field; adjusting at least one parameter of an adjustable geometry trim coil (AGTC) based on the determined magnitude of the residual magnetic field; generating a supplemental magnetic field in the processing region of the vacuum chamber using the AGTC, the supplemental magnetic field reducing the remanent magnetic field to a predetermined value; A machine-readable storage medium that causes the machine to execute the above.

23. 23. The machine-readable storage medium of claim 22, 11. A machine-readable storage medium, wherein the at least one parameter of the AGTC is at least one of a shape of the AGTC, a circumference of a coil conductor forming the AGTC, and a current through the coil conductor.

24. 24. The machine-readable storage medium of claim 23, The operation further comprises: determining a magnitude of a vertical component (Bz) of the residual magnetic field; determining a magnitude of the horizontal component (Bh) of the residual magnetic field; 1. A machine-readable storage medium comprising:

25. 25. The machine-readable storage medium of claim 24, The operation further comprises: setting the at least one parameter of the AGTC to generate the supplemental magnetic field to reduce the magnitude of the vertical component of the residual magnetic field; configuring at least another AGTC to generate at least another supplemental magnetic field to reduce the magnitude of the horizontal component of the residual magnetic field; 1. A machine-readable storage medium comprising:

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