Semiconductor device, power conversion device, and method for manufacturing the same

Abstract

To provide a semiconductor device with high insulation reliability.SOLUTION: A semiconductor device comprises: a field insulation film 3 that is formed onto a first conductive type epitaxial layer 32; a front surface electrode 4 extended onto an inner peripheral end of the field insulation film 3; and an outer peripheral electrode 5 extended onto the outer peripheral end of the field insulation film 3. A front layer part of the epitaxial layer 32 is connected to the front surface electrode 4, and a second conductive type termination well region 2 extended from the outer peripheral end of the front surface electrode 4 to an outer side is formed. A half insulation film 7 is formed so as to cover one part of the field insulation film 3 so as to be separated from the front surface electrode 4 and the outer peripheral electrode 5. The half insulation film 7 is connected to the epitaxial layer 32 through an open formed in the field insulation film 3 in each region of an inner side and a region of an outer side from the outer peripheral end of the termination well region 2.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present disclosure relates to a semiconductor device, and more particularly to a semiconductor device having a surface protection film. [Background technology]

[0002] In vertical semiconductor devices used in power devices, etc., a technique is known in which a p-type guard ring region (termination well region) is provided in the so-called termination region on the outer periphery of an n-type semiconductor layer in order to ensure voltage resistance. In a semiconductor device having a guard ring region, the electric field generated when a reverse voltage is applied to the main electrode of the semiconductor device is mitigated by a depletion layer formed by a pn junction between the n-type semiconductor layer and the p-type guard ring region.

[0003] For example, the following Patent Document 1 discloses a semiconductor device having a semi-insulating film provided on the outer end of a p-type guard ring via an insulating film, and surface electrodes connected to the inner end and the outer end of the semi-insulating film, respectively. This structure keeps the potential gradient in the termination region of the semiconductor device constant, and more effectively reduces the electric field.

[0004] Furthermore, the surface electrodes of the semiconductor device, except for the region where wire bonding is performed, may be covered with a polyimide as a surface protective film or may be sealed with a sealant such as gel. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Publication No. 6-275852 Summary of the Invention [Problem to be solved by the invention]

[0006] Surface protection films such as polyimide and sealing materials such as gels are prone to contain moisture under high humidity conditions. This moisture may adversely affect the surface electrode. Specifically, the surface electrode may dissolve in moisture, or react with moisture to cause an insulating material to precipitate. In such cases, peeling is likely to occur at the interface between the surface electrode and the surface protection film or sealing gel. The cavity on the outer periphery of the surface electrode caused by the peeling of the surface protection film or sealing gel may act as a leak path and may impair the insulation reliability of the semiconductor device. In addition, regardless of the presence or absence of a surface protection film, if an insulating material precipitates on the surface electrode, stress may be applied to materials other than the surface electrode, which may impair the insulation reliability of the semiconductor device.

[0007] The present disclosure has been made to solve the above problems, and has an object to provide a semiconductor device with high insulation reliability. [Means for solving the problem]

[0008] A semiconductor device according to the present disclosure includes a semiconductor layer of a first conductivity type, a field insulating film formed on a surface of the semiconductor layer, a surface electrode which is an inner electrode formed on the surface of the semiconductor layer inside the field insulating film and riding on an inner peripheral edge of the field insulating film, a peripheral electrode formed on the surface of the semiconductor layer outside the field insulating film and riding on an outer peripheral edge of the field insulating film, a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending outward beyond the outer peripheral edge of the surface electrode, a semi-insulating film which covers a portion of the field insulating film and is formed at a distance from the surface electrode and the outer peripheral electrode, and a back electrode formed on a back surface side of the semiconductor layer. a moisture-resistant insulating film covering a part of the field insulating film and covering at least one of an outer peripheral end of the surface electrode and an inner peripheral end of the outer peripheral electrode; the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of an inner region and an outer region of an outer periphery of the well region. A part of the semi-insulating film is disposed on the moisture-resistant insulating film. . Effect of the Invention

[0009] According to the semiconductor device according to the present disclosure, it is possible to prevent the deposition of an insulating material on the front surface electrode, which contributes to improving the insulation reliability of the semiconductor device. [Brief description of the drawings]

[0010] [Figure 1] 1 is a partial cross-sectional view showing a configuration of a semiconductor device according to a first embodiment. [Diagram 2] 1 is a plan view showing a configuration of a semiconductor device according to a first embodiment. [Diagram 3] 1 is a partial cross-sectional view showing a configuration of a semiconductor device according to a first modification of the first embodiment. [Figure 4] 11 is a partial cross-sectional view showing a configuration of a semiconductor device according to a second modification of the first embodiment. FIG. [Diagram 5] 11 is a partial cross-sectional view showing a configuration of a semiconductor device according to a third modification of the first embodiment. FIG. [Figure 6] 11 is a partial cross-sectional view showing a configuration of a semiconductor device according to a third modification of the first embodiment. FIG. [Figure 7] 11 is a partial cross-sectional view showing a configuration of a semiconductor device according to a third modification of the first embodiment. FIG. [Figure 8] 11 is a partial cross-sectional view showing a configuration of a semiconductor device according to a third modification of the first embodiment. FIG. [Figure 9] FIG. 11 is a partial cross-sectional view showing the configuration of a semiconductor device according to a second embodiment. [Figure 10] FIG. 11 is a plan view showing a configuration of a semiconductor device according to a second embodiment. [Figure 11] FIG. 11 is a partial cross-sectional view showing the configuration of a unit cell of a semiconductor device according to a second embodiment. [Figure 12] 11 is a plan view showing a configuration of a semiconductor device according to a first modification of the second embodiment. FIG. [Figure 13] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to Modification 2 of the second embodiment. FIG. [Figure 14] 13 is a plan view showing a configuration of a semiconductor device according to Modification 2 of the second embodiment. FIG. [Figure 15]13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a third modification of the second embodiment. FIG. [Figure 16] 13 is a plan view showing a configuration of a semiconductor device according to a third modification of the second embodiment. FIG. [Figure 17] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 18] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 19] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 20] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 21] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 22] 13 is a partial cross-sectional view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 23] 13 is a partial plan view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Figure 24] 13 is a partial plan view showing a configuration of a semiconductor device according to a fourth modification of the second embodiment. FIG. [Diagram 25] 11 is a block diagram showing a configuration of a power conversion system to which a power conversion device according to a third embodiment is applied. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, an embodiment of the technology according to the present disclosure will be described. In this specification, the "active region" of a semiconductor device is defined as a region through which a main current flows when the semiconductor device is in an on-state, and the "termination region" of the semiconductor device is defined as a region surrounding the active region. In addition, the "outside" of the semiconductor device means a direction from the center to the outer periphery of the semiconductor device, and the "inside" of the semiconductor device means a direction opposite to the "outside". In addition, the conductivity types of the impurities are described assuming that the "first conductivity type" is n-type and the "second conductivity type" is p-type, but conversely, the "first conductivity type" may be p-type and the "second conductivity type" may be n-type.

[0012] Here, the term "MOS" has traditionally been used to represent a stacked structure of metal-oxide-semiconductor, and is an acronym for Metal-Oxide-Semiconductor. However, in particular in field-effect transistors having a MOS structure (hereinafter simply referred to as "MOS transistors"), the materials of the gate insulating film and gate electrode have been improved in recent years from the viewpoint of integration and improvements in manufacturing processes. For example, in MOS transistors, polycrystalline silicon has been adopted instead of metal as the material of the gate electrode, mainly from the viewpoint of forming the source and drain in a self-aligned manner. In addition, from the viewpoint of improving electrical characteristics, a material with a high dielectric constant is used for the gate insulating film, but the material is not necessarily limited to oxide.

[0013] Therefore, the term "MOS" is not necessarily limited to a metal-oxide-semiconductor layered structure, and the same is true in this specification. In other words, in light of common technical knowledge, "MOS" is defined not only as an abbreviation for Metal-Oxide-Semiconductor, but also broadly as including a conductor-insulator-semiconductor layered structure.

[0014] In the following description, even if it is stated that "on" or "covering", it does not prevent the presence of an intervening object between the components. For example, even if it is stated that "B is provided on A" or "B covers A", other components may be provided between A and B. In the following description, terms that indicate specific positions or directions, such as "top", "bottom", "side", "bottom", "front" or "back", may be used, but these terms are used for convenience of explanation and do not relate to the directions in actual use.

[0015] The drawings shown below are schematic. Therefore, the size, position and relationship of elements shown in the drawings may not be accurate and may be changed as appropriate. Furthermore, the size and position of elements shown in different drawings may not be accurate and may be changed as appropriate.

[0016] In each drawing, components having the same names and functions as those shown in other drawings are given the same reference numerals, and therefore, in order to avoid redundant explanations, explanations of elements similar to those previously explained using other drawings may be omitted.

[0017] <Embodiment 1> [Device configuration] Fig. 1 is a partial cross-sectional view of a Schottky barrier diode (SBD) 100, which is a semiconductor device according to a first embodiment. Fig. 2 is a plan view of the SBD 100, and Fig. 1 corresponds to a cross-sectional view taken along line AA in Fig. 2. The left side of Fig. 1 is an active region through which a main current flows when the SBD 100 is in an on-state, and the right side of Fig. 1 is a termination region, which is a region outside the active region of the SBD 100. Hereinafter, the region corresponding to the active region will be referred to as the "inner region RI," and the region corresponding to the termination region will be referred to as the "outer region RO."

[0018] 1, SBD 100 is formed using an epitaxial substrate 30 that includes a single crystal substrate 31 and an epitaxial layer 32 formed thereon. Single crystal substrate 31 is a semiconductor substrate made of n-type (first conductivity type) silicon carbide (SiC), and epitaxial layer 32 is a semiconductor layer made of SiC epitaxially grown on single crystal substrate 31. In other words, SBD 100 is a SiC-SBD. In this embodiment, epitaxial substrate 30 having a 4H polytype is used.

[0019] 1 is defined as the "front side" and the bottom side as the "rear side", and hereinafter, the main surface on the rear side of epitaxial substrate 30 is referred to as the "rear side S1" and the main surface on the front side as the "front surface S2". In addition, rear surface S1 of epitaxial substrate 30 is also the main surface of single crystal substrate 31, and therefore may be referred to as the "rear surface S1 of single crystal substrate 31". Similarly, front surface S2 of epitaxial substrate 30 is also the main surface of epitaxial layer 32, and therefore may be referred to as the "front surface S2 of epitaxial layer 32".

[0020] A p-type (second conductivity type) termination well region 2 is selectively formed in the surface layer portion on the front side of the epitaxial layer 32 in the termination region. The termination well region 2 is a frame-shaped (ring-shaped) region surrounding the active region in a plan view, and functions as a so-called guard ring. As shown in FIG. 1, the inner end (also called the "inner peripheral end") of the termination well region 2 is defined as the boundary between an inner region RI, which is the active region, and an outer region RO, which is the termination region.

[0021] The n-type region of epitaxial layer 32 excluding terminal well region 2 is drift layer 1 through which a current flows due to drift. The impurity concentration of drift layer 1 is lower than the impurity concentration of single crystal substrate 31. Therefore, single crystal substrate 31 has a lower resistivity than drift layer 1. Here, the impurity concentration of drift layer 1 is 1×10 14 / cm 3 More than 1×10 17 / cm 3 The following is the result.

[0022] The termination well region 2 may include a plurality of regions having different impurity concentrations. The number of termination well regions 2 is not limited to one, and for example, a plurality of termination well regions 2 spaced apart from each other and arranged in a nested manner may be provided in the outer region RO. In other words, the termination well region 2 may be divided into a plurality of regions.

[0023] A field insulating film 3, a surface electrode 4, a peripheral electrode 5, a semi-insulating film 7, and a surface protective film 10 are provided on a surface S2 of the epitaxial substrate 30. A back surface electrode 11 is provided on a back surface S1 of the epitaxial substrate 30. Note that in the plan view of Fig. 2, only the epitaxial substrate 30 and the front surface electrode 4 are shown, and other elements are not shown.

[0024] The field insulating film 3 covers a part of the termination well region 2 and extends beyond the outer end (also referred to as the "peripheral end") of the termination well region 2 to the outside of the termination well region 2. The field insulating film 3 also has a plurality of openings that expose the surface S2 of the epitaxial substrate 30. Specifically, the field insulating film 3 has openings that expose the surface S2 of the active region of the epitaxial substrate 30, an opening that exposes the surface S2 of the termination well region 2 in the outer region RO, and an opening that exposes the surface S2 of a region outside the termination well region 2, across the inner region RI and the outer region RO.

[0025] The surface electrode 4 is formed across the inner region RI and the outer region RO, and is connected to at least a part of the surface S2 of the epitaxial substrate 30 through an opening in the field insulating film 3. In this embodiment, the surface electrode 4 is provided across the entire inner region RI, and is connected to the termination well region 2 in the outer region RO. The termination well region 2 is connected to the outer periphery of the surface electrode 4, and extends beyond the outer periphery of the surface electrode 4. In addition, the outer periphery of the surface electrode 4 rides up onto the inner periphery of the field insulating film 3.

[0026] The material of the front electrode 4 may be any metal that forms a Schottky junction with the drift layer 1, which is an n-type SiC semiconductor, and may be, for example, Ti (titanium), Mo (molybdenum), Ni (nickel), Au (gold), or W (tungsten).The front electrode 4 may have a laminated structure in which any of the metals Al (aluminum), Cu (copper), Mo, and Ni, or an Al alloy such as Al-Si, is laminated on any of the above materials.

[0027] The peripheral electrode 5 is provided outside the termination well region 2 and spaced apart from the termination well region 2, and is connected to at least a part of the surface S2 of the outer region RO of the epitaxial substrate 30. In this embodiment, the inner peripheral end of the peripheral electrode 5 rides up onto the outer peripheral end of the field insulating film 3.

[0028] The material for the peripheral electrode 5 can be any of the metals Ti (titanium), Mo (molybdenum), Ni (nickel), Au (gold), W (tungsten), Al (aluminum), and Cu (copper), or an Al alloy such as Al-Si. The peripheral electrode 5 may also have a laminated structure made of two or more of these materials.

[0029] The semi-insulating film 7 is provided on at least a part of the field insulating film 3 in the outer region RO. The semi-insulating film 7 is separated from the surface electrode 4 and the peripheral electrode 5 so as not to come into contact with the surface electrode 4 and the peripheral electrode 5. The semi-insulating film 7 is connected to the surface S2 of the epitaxial layer 32 through an opening formed in the field insulating film 3 in each of the region inside and outside the outer peripheral end of the termination well region 2. Specifically, the semi-insulating film 7 is connected to the surface S2 of the termination well region 2 and the surface S2 of the termination well region 2 through an opening formed in the field insulating film 3.

[0030] The material of the semi-insulating film 7 may be SInSiN (Semi-Insulated SiN) or SIPOS (Semi-Insulated Polycrystalline Silicon). In the present embodiment, SInSiN is used as the material of the semi-insulating film 7, and the resistivity of the semi-insulating film 7 is 1×10 12 The resistivity is less than Ω·cm. Note that it is sufficient that the lower portion of semi-insulating film 7 that is in contact with surface S2 of epitaxial substrate 30 has semi-insulating properties. Therefore, semi-insulating film 7 may have a layered structure in which, for example, a highly moisture-resistant SiN film is layered on a semi-insulating material.

[0031] The surface protective film 10 is formed on the semi-insulating film 7, and covers the outer peripheral end of the surface electrode 4 and the peripheral electrode 5. The material of the surface protective film 10 is preferably an insulating resin material capable of relieving stress, such as polyimide or polybenzoxal. Note that when the SBD 100 is used covered with a sealing gel having a low elasticity, such as silicone gel, the surface protective film 10 may be omitted.

[0032] In the inner region RI, the surface protective film 10 has an opening that exposes a region where wire bonding of the surface electrode 4 is performed, etc. In the outer region RO, the surface protective film 10 has an opening that exposes a region where dicing of the epitaxial substrate 30 is performed, etc.

[0033] FIG. 1 shows a cross section (cross section along line AA in FIG. 2) of the termination portion of SBD 100 according to embodiment 1, but the region in which semi-insulating film 7 contacts surface S2 of epitaxial substrate 30 through an opening in field insulating film 3 does not need to be formed around the entire periphery of surface electrode 4 in a plan view, and may be divided into multiple regions spaced apart from each other.

[0034] In this embodiment, the material of the epitaxial substrate 30 is SiC. SiC semiconductors have a wider band gap than Si semiconductors, and compared to Si semiconductor devices, SiC semiconductor devices have superior voltage resistance, high allowable current density, and high heat resistance, allowing high-temperature operation. However, the material of the epitaxial substrate 30 is not limited to SiC, and may be Si or other wide band gap semiconductors such as gallium nitride (GaN).

[0035] Furthermore, the semiconductor device according to the present embodiment may be a diode other than an SBD, for example, a pn junction diode or a Junction Barrier Schottky (JBS) diode.

[0036] [Variation 1] Fig. 3 is a cross-sectional view showing the configuration of an SBD 101 which is a semiconductor device according to a first modification of the first embodiment. In the SBD 101 of Fig. 3, the termination well region 2 is divided into multiple regions. The field insulating film 3 has an opening above each of the multiple termination well regions 2. The semi-insulating film 7 is connected to each of the divided termination well regions 2 through the openings formed in the field insulating film 3, and is also connected to the surface S2 of the epitaxial substrate 30 in a region outside the outermost termination well region 2.

[0037] [Variation 2] Fig. 4 is a cross-sectional view showing the configuration of an SBD 102 which is a semiconductor device according to Modification 2 of Embodiment 1. In SBD 102 of Fig. 4, field insulating film 3 has an opening spanning the inside and outside of the outer periphery of termination well region 2. Semi-insulating film 7 is connected to surface S2 of epitaxial substrate 30 via the opening formed in field insulating film 3, spanning termination well region 2 and the region outside termination well region 2.

[0038] [Variation 3] Fig. 5 is a cross-sectional view showing the configuration of an SBD 103 which is a semiconductor device according to Modification 2 of Embodiment 1. In the SBD 103 of Fig. 5, a moisture-resistant insulating film 8 is formed so as to cover the outer peripheral end of the surface electrode 4 and the inner peripheral end of the outer peripheral electrode 5. In the inner region RI, the moisture-resistant insulating film 8 is provided with an opening which exposes a region of the surface electrode 4 where wire bonding and the like are performed.

[0039] As the material for the moisture-resistant insulating film 8, a highly moisture-resistant insulating film such as SiN, SiON, or SiOC is used. In the present embodiment, the material for the moisture-resistant insulating film 8 is SiN, and the resistivity thereof is 1×10 12 The thickness of this SiN is 100 nm or more and 2000 nm or less, preferably 300 nm or more and 1500 nm or less, more preferably 500 nm or more and 1000 nm or less, and can be, for example, 500 nm.

[0040] 6, the moisture-resistant insulating film 8 may have openings at the same positions as the openings of the field insulating film 3 on the termination well region 2 and in a region outside the termination well region 2. In other words, the openings provided on the termination well region 2 and the openings provided in the region outside the termination well region 2 may be formed to penetrate the moisture-resistant insulating film 8 and the field insulating film 3.

[0041] 7, the semi-insulating film 7 may be formed so as to ride up on the moisture-resistant insulating film 8 and have openings on the front electrode 4 and the peripheral electrode 5 at the same positions as the openings of the moisture-resistant insulating film 8. Even in this case, the semi-insulating film 7 is formed so as not to be connected to the front electrode 4 and the peripheral electrode 5.

[0042] 8, the moisture-resistant insulating film 8 may completely cover the peripheral electrode 5. In this case, an opening is provided in the semi-insulating film 7 and the moisture-resistant insulating film 8 to expose a region where dicing or the like of the epitaxial substrate 30 is to be performed. The field insulating film 3 may be formed so as to extend from under the peripheral end of the peripheral electrode 5 to the region where dicing or the like of the epitaxial substrate 30 is to be performed.

[0043] [Operation] Next, the operation of the SBD 100 of the first embodiment described with reference to Fig. 1 will be described. When a negative voltage is applied to the rear electrode 11 with respect to the potential of the front electrode 4, the SBD 100 enters a state in which a current flows from the front electrode 4 to the rear electrode 11, i.e., the SBD 100 enters a conductive state (ON state). Conversely, when a positive voltage is applied to the rear electrode 11 with respect to the potential of the front electrode 4, the SBD 100 enters a blocking state (OFF state).

[0044] When the SBD 100 is in the off state, a large electric field is applied to the surface of the active region of the drift layer 1 and near the pn junction interface between the drift layer 1 and the termination well region 2. The voltage to the back electrode 11 when this electric field reaches a critical electric field and avalanche breakdown occurs is defined as the maximum voltage (avalanche voltage). Typically, the rated voltage is set so that the SBD 100 is used within a voltage range in which avalanche breakdown does not occur.

[0045] In the off state, a depletion layer spreads from the surface of the active region of the drift layer 1 and the pn junction interface between the drift layer 1 and the termination well region 2 in a direction toward the single crystal substrate 31 (downward) and toward the periphery of the drift layer 1 (rightward). The depletion layer also spreads from the pn junction interface between the drift layer 1 and the termination well region 2 into the termination well region 2, and the extent of the spread largely depends on the concentration of the termination well region 2. In other words, when the concentration of the termination well region 2 becomes high, the spread of the depletion layer in the termination well region 2 is suppressed, and the tip position of the depletion layer inside the termination well region 2 becomes close to the boundary between the termination well region 2 and the drift layer 1.

[0046] Now consider the case where the SBD 100 is in the off state under high humidity. If the surface protective film 10 is made of polyimide or the like, the surface protective film 10 will contain a lot of moisture under high humidity. When this moisture reaches the surfaces of the surface electrode 4 and the peripheral electrode 5, the surface electrode 4 acts as a cathode and the peripheral electrode 5 acts as an anode due to the voltage applied to the SBD 100 in the off state. Even if the surface protective film 10 is not formed, a lot of moisture will permeate the sealing gel and reach the SBD 100, and similarly the surface electrode 4 will act as a cathode and the peripheral electrode 5 will act as an anode.

[0047] In the vicinity of the front electrode 4 serving as the cathode, an oxygen reduction reaction represented by the following chemical formula (1) and a hydrogen production reaction represented by the following chemical formula (2) occur with respect to the moisture.

[0048] O 2 + 2H 2 O + 4e - → 4OH - (1) H 2 O + e - → OH - + 1 / 2H 2 (2)

[0049] As a result, the concentration of hydroxide ions increases in the vicinity of the surface electrode 4. The hydroxide ions chemically react with the surface electrode 4. For example, if the surface electrode 4 is made of aluminum, the aluminum may become aluminum hydroxide through the above chemical reaction. Furthermore, aluminum hydroxide may become aluminum oxide depending on the surrounding temperature, pH, and the like.

[0050] In addition, in the vicinity of the peripheral electrode 5 serving as the anode, for example, when the peripheral electrode 5 is made of aluminum, the aluminum is Al 3 + It dissolves and reacts with the surrounding moisture to become aluminum hydroxide or aluminum oxide.

[0051] The aluminum hydroxide or aluminum oxide precipitates as an insulator on the surfaces of the front electrode 4 and the peripheral electrode 5. This precipitation causes the films on the front electrode 4 and the peripheral electrode 5 to crack or be pushed up and peel off. If the peeling progresses and a cavity is formed above the field insulating film 3, moisture will enter the cavity. The moisture that has entered the cavity may cause excessive leakage current or air discharge in the cavity, which may lead to element destruction in the SBD. Furthermore, if volume expansion occurs due to the precipitation of the insulator, stress is applied to the field insulating film 3 and the epitaxial substrate 30 below the front electrode 4 and the peripheral electrode 5, which may cause physical destruction of the SBD 100 and lead to element destruction.

[0052] The above-mentioned precipitation reaction of aluminum hydroxide or aluminum oxide is accelerated by the electric field strength. In particular, the outer peripheral edge of front electrode 4 and the inner peripheral edge of outer electrode 5 are prone to high electric fields, and when epitaxial substrate 30 is made of silicon carbide, a high electric field strength is generated in outer region RO, accelerating the precipitation reaction of aluminum hydroxide or aluminum oxide.

[0053] In addition, in the semiconductor device of Patent Document 1 described above, the semi-insulating film 7 is connected to the outer peripheral end of the surface electrode 4 and the inner peripheral end of the outer peripheral electrode 5, and moisture in the surface protective film 10 reaches the ends of the surface electrode 4 and the outer peripheral electrode 5 through the semi-insulating film 7, and electrons are exchanged between the surface electrode 4 and the outer peripheral electrode 5 through the semi-insulating film 7, further accelerating the deposition reaction of aluminum hydroxide or aluminum oxide. Furthermore, a potential gradient is likely to occur around the outer peripheral end of the surface electrode 4 and the inner peripheral end of the outer peripheral electrode 5 due to the conductivity of the semi-insulating film 7, and the deposition reaction of aluminum hydroxide or aluminum oxide may also be accelerated by the electric field strength.

[0054] In contrast, in the SBD 100 of the first embodiment, the semi-insulating film 7 is separated from the surface electrode 4 and the peripheral electrode 5 so as not to come into contact with the surface electrode 4 and the peripheral electrode 5. This prevents direct exchange of electrons between the semi-insulating film 7 and the surface electrode 4 or the peripheral electrode 5, and also prevents a potential gradient from occurring around the outer peripheral end of the surface electrode 4 and the inner peripheral end of the peripheral electrode 5 due to the conductivity of the semi-insulating film 7. As a result, deposition of aluminum hydroxide or aluminum oxide on the surfaces of the surface electrode 4 and the peripheral electrode 5 can be suppressed.

[0055] Furthermore, in SBD 100 of the first embodiment, semi-insulating film 7 is connected to surface S2 of epitaxial substrate 30 through openings formed in field insulating film 3 in both the region above termination well region 2 and the region outside termination well region 2. As a result, in the off state, a gentle potential gradient is formed in the region in which semi-insulating film 7 is formed. This makes it possible to suppress excessive electric field concentration around termination well region 2.

[0056] The above effects can also be obtained in SBDs 101 to 104 described in the first to third modifications of the first embodiment.

[0057] In the SBD 101 shown in FIG. 3, the semi-insulating film 7 is connected to a plurality of spaced apart termination well regions 2 through an opening in the field insulating film 3, so that the potentials of the plurality of termination well regions 2 are fixed, and electric field concentration around the termination well regions 2 can be more effectively alleviated.

[0058] 4, the semi-insulating film 7 is connected to the surface S2 of the epitaxial substrate 30 through an opening formed in the field insulating film 3, across the termination well region 2 and the region outside the termination well region 2. This allows fixed charges generated when a high electric field is generated around the termination well region 2 to be discharged through the semi-insulating film 7, thereby improving the reliability of the semiconductor device when a high voltage is applied.

[0059] 5, a moisture-resistant insulating film 8 is formed so as to cover the outer circumferential edge of the surface electrode 4 and the inner circumferential edge of the peripheral electrode 5. This prevents moisture from reaching the outer circumferential edge of the surface electrode 4 and the inner circumferential edge of the peripheral electrode 5. As a result, the precipitation reaction of aluminum hydroxide or aluminum oxide at the outer circumferential edge of the surface electrode 4 and the inner circumferential edge of the peripheral electrode 5 can be further suppressed.

[0060] 6, the moisture-resistant insulating film 8 has an opening at the same position as the opening of the field insulating film 3, in the area above the termination well region 2 in the outer region RO and outside the termination well region 2. Therefore, the opening of the field insulating film 3 in the outer region RO can be formed simultaneously with the opening of the moisture-resistant insulating film 8. As a result, damage to the surface S2 of the epitaxial substrate 30 due to multiple overetchings can be avoided, and the reliability of the semiconductor device when a high voltage is applied can be improved.

[0061] 7, the semi-insulating film 7 rides up on the moisture-resistant insulating film 8, and has openings on the front electrode 4 and the peripheral electrode 5 in the same regions as the openings in the moisture-resistant insulating film 8. Even in this case, the semi-insulating film 7 is separated from the front electrode 4 and the peripheral electrode 5 without contacting them, which prevents aluminum hydroxide or aluminum oxide from precipitating on the surfaces of the front electrode 4 and the peripheral electrode 5. Furthermore, the openings in the moisture-resistant insulating film 8 provided on the front electrode 4 and the peripheral electrode 5 can be formed simultaneously when the openings in the semi-insulating film 7 are formed, which avoids damage to the surfaces of the front electrode 4 and the peripheral electrode 5 due to multiple overetching operations, and improves the reliability of the semiconductor device when a high voltage is applied.

[0062] 8, the moisture-resistant insulating film 8 is formed so as to completely cover the peripheral electrode 5. This prevents moisture from reaching the surface of the peripheral electrode 5. As a result, the precipitation reaction of aluminum hydroxide or aluminum oxide on the surface of the peripheral electrode 5 can be further suppressed.

[0063] [Manufacturing method] A method for manufacturing the SBD 100 according to the first embodiment will now be described.

[0064] First, n-type impurities are introduced at a relatively high concentration (n + ) is prepared. In this embodiment, the single crystal substrate 31 is a SiC substrate having a 4H polytype and an off-angle of 4 degrees or 8 degrees.

[0065] Next, epitaxial growth of SiC is performed on the single crystal substrate 31, and the n-type impurity concentration is 1×10 14 / cm 3 More than 1×10 17 / cm 3 The following epitaxial layer 32 is formed. As a result, an epitaxial substrate 30 consisting of a single crystal substrate 31 and an epitaxial layer 32 is obtained.

[0066] Next, a resist mask having a predetermined pattern is formed on the epitaxial layer 32 by a photolithography process, and the resist mask is used as an implantation mask to ion-implant p-type impurities (acceptors) such as Al or B (boron), thereby forming a p-type termination well region 2 in the upper portion of the epitaxial layer 32. The dose of the termination well region 2 is 0.5×10 13 / cm 2 5×10 or more 13 / cm 2 The following is preferred, for example 1.0×10 13 / cm 2 Let us assume that.

[0067] The implantation energy of the ion implantation for forming the terminal well region 2 is, for example, 100 keV or more and 700 keV or less in the case of Al. In this case, the dose [cm -2 The impurity concentration calculated from 17 / cm 3 More than 1×10 19 / cm 3 The result is as follows.

[0068] When forming the termination well region 2, a resist mask is patterned so that multiple loop-shaped p-type impurity regions are formed in a nested manner, thereby forming a termination well region 2 divided into multiple regions as in the SBD 101 in Fig. 3. Furthermore, by repeating the steps of patterning the resist mask and ion implantation, a termination well region 2 consisting of multiple regions with different impurity concentrations can be formed.

[0069] After the formation of the termination well region 2, annealing is performed in an inert gas atmosphere such as argon (Ar) gas at a temperature of 1300° C. to 1900° C. for 30 seconds to 1 hour using a heat treatment device. This annealing activates the impurities added by ion implantation.

[0070] Next, a 1 μm thick SiO 2 film serving as the field insulating film 3 is formed on the surface S2 of the epitaxial substrate 30 by, for example, a CVD method. 2Then, a SiO film is deposited by a photolithography process. 2 A resist mask having a predetermined pattern is formed on the film, and the resist mask is used as an etching mask to etch SiO 2 The field insulating film 3 is formed by etching the SiO2 film. In this etching, the SiO2 film is removed from the region where the front electrode 4 and the peripheral electrode 5 are in contact with the surface S2 of the epitaxial substrate 30, and from the region where the semi-insulating film 7 is in contact with the surface S2 of the epitaxial substrate 30. That is, the SiO2 film is removed from the region where the front electrode 4 is formed, the region where the peripheral electrode 5 is formed, on the terminal well region 2, and in the region outside the terminal well region 2. 2 6 is formed, the SiO 2 film on the termination well region 2 and the region outside the termination well region 2 is removed in this step. 2 Do not remove the membrane.

[0071] Next, for example, a Ti film having a thickness of 100 nm and an Al film having a thickness of 3 μm are formed in this order on the epitaxial layer 32 by, for example, a sputtering method. After that, a resist mask having a predetermined pattern is formed on the Al film by a photolithography process, and the Al film is subjected to RIE (Reactive Ion Etching) using the resist mask as an etching mask, thereby forming the surface electrode 4 and the peripheral electrode 5.

[0072] 5 to 8, a SiN film is formed as the moisture-resistant insulating film 8. At this time, silane gas (SiH 4 ) and ammonia gas (NH 3 ) or nitrogen gas (N 2 ) flow rate ratio, deposition temperature, power density, etc., the resistivity of the SiN film can be increased to 1×10 12The resistivity of the SiN film is correlated with the refractive index, and the refractive index is generally 2.2 or less. After that, a resist mask having a predetermined pattern is formed on the SiN film by a photolithography process, and the SiN film is etched using the resist mask as an etching mask to form the moisture-resistant insulating film 8. Here, when the SBD 104 shown in FIG. 6 is formed, in this process, an opening in the moisture-resistant insulating film 8 and an opening in the field insulating film 3 may be simultaneously formed on the termination well region 2 and in a region outside the termination well region 2 (specifically, a region connecting the semi-insulating film 7 and the surface S2 of the epitaxial substrate 30). That is, an opening that penetrates the moisture-resistant insulating film 8 and the field insulating film 3 to expose a part of the epitaxial layer 32 may be formed. When the SBD 105 or SBD 106 shown in FIG. 7 or FIG. 8 is formed, the SiN film is not removed in this process except in the region connecting the semi-insulating film 7 and the surface S2 of the epitaxial substrate 30.

[0073] The SiN film that becomes the moisture-resistant insulating film 8 can also be formed by thermal CVD. In this case, the SiN film is stoichiometrically 3 N 4 The composition is close to Si 3 N 4 The refractive index of is about 2.0 or more and 2.1 or less. Therefore, the SiN film formed by thermal CVD has better moisture resistance and insulation properties, but the film formation temperature is much higher than that of plasma CVD. Therefore, when a material containing Al is used for the material of the surface electrode 4, etc., the film formation temperature exceeds the melting point of Al, and the SiN film cannot be formed by thermal CVD. When the material of the surface electrode 4, etc. is, for example, Cu, etc., and does not contain Al, it is possible to form a SiN film by thermal CVD.

[0074] Next, a SInSiN film that will become the semi-insulating film 7 is formed by, for example, plasma CVD. At this time, silane gas (SiH 4 ) and other flow rates, the resistivity of the SInSiN film was increased to 1×10 12The resistivity of the SInSiN film is correlated with the refractive index, and the refractive index generally exceeds 2.2, but may be 2.2 or less due to changes in the bonding state in the film depending on the manufacturing method, etc. Thereafter, a resist mask having a predetermined pattern is formed on the SInSiN film by a photolithography process, and the SInSiN film is etched using the resist mask as an etching mask to form the semi-insulating film 7. Here, when forming the SBD 105 and SBD 106 in FIG. 7 and FIG. 8, an opening in the semi-insulating film 7 and an opening in the moisture-resistant insulating film 8 may be simultaneously formed in this process, except for the region where the semi-insulating film 7 and the surface S2 of the epitaxial substrate 30 are connected. In other words, an opening may be formed that penetrates the semi-insulating film 7 and the moisture-resistant insulating film 8 to expose a part of the surface electrode 4 and a part of the peripheral electrode 5 or the field insulating film 3.

[0075] When forming the material for the semi-insulating film 7, a SiN film having high moisture resistance and insulating properties may be formed on the SInSiN film, so that the semi-insulating film 7 has a laminated structure.

[0076] In the example shown in FIG. 8, the field insulating film 3 is also provided in the region outside the peripheral electrode 5, thereby suppressing damage to the epitaxial substrate 30 when etching the SiN film and the SInSiN film.

[0077] Next, for example, photosensitive polyimide is applied, and a surface protection film 10 having a predetermined pattern is formed by a photolithography process. Note that if the SBD 100 is used covered with a sealing gel having a low elasticity, such as silicone gel, the formation of the surface protection film 10 may be omitted.

[0078] Thereafter, a back surface electrode 11 is formed on the back surface S1 of the epitaxial substrate 30 by, for example, a sputtering method, thereby obtaining the configuration of the SBD 100 shown in FIG.

[0079] The back electrode 11 may be formed before or after the process of forming the front electrode 4 and the peripheral electrode 5. The material of the back electrode 11 may be a metal containing one or more of Ti, Ni, Al, Cu, and Au. The thickness of the back electrode 11 is preferably 50 nm or more and 2 μm or less. For example, the back electrode 11 may be formed of a two-layer film (Ti / Au) of Ti and Au, each having a thickness of 1 μm or less.

[0080] [summary] The first embodiment and its modifications suppress the deposition of insulating material on the surfaces of the front electrode 4 and the peripheral electrode 5. In addition, the potential gradient in the termination region becomes gentler, suppressing excessive electric field concentration, thereby improving the insulation reliability of the SBD.

[0081] <Embodiment 2> [Device configuration] FIG. 9 is a partial cross-sectional view showing the configuration of a MOSFET 200 which is a semiconductor device according to a second embodiment. FIG. 10 is a plan view of the MOSFET 200, and FIG. 9 is a cross-sectional view taken along line BB in FIG. 10. FIG. 11 is a cross-sectional view showing the configuration of a unit cell UC which is a minimum unit structure of a MOSFET formed in an inner region RI which is an active region. A plurality of unit cells UC shown in FIG. 11 are arranged in the inner region RI of the MOSFET 200 (the outermost unit cell UC is shown in the left end portion of FIG. 9). In FIGS. 9 to 11, elements having the same functions as those of the SBD 100 according to the first embodiment shown in FIGS. 1 and 2 are denoted by the same reference numerals, and therefore descriptions overlapping with those of the first embodiment will be omitted here.

[0082] 9, MOSFET 200 is formed using epitaxial substrate 30 including single crystal substrate 31 and epitaxial layer 32 formed thereon. Single crystal substrate 31 is a semiconductor substrate made of n-type (first conductivity type) silicon carbide (SiC), and epitaxial layer 32 is a semiconductor layer made of SiC epitaxially grown on single crystal substrate 31. That is, MOSFET 200 is a SiC-MOSFET. In this embodiment, epitaxial substrate 30 having a polytype of 4H is used.

[0083] A p-type (second conductivity type) element well region 9 is selectively formed in a surface layer portion on the front side of the epitaxial layer 32 in the active region. In addition, an n-type source region 18 and a p-type contact region 19 having a higher peak impurity concentration than the element well region 9 are selectively formed in a surface layer portion of the element well region 9.

[0084] A p-type termination well region 20 is selectively formed in a surface layer portion on the front side of the epitaxial layer 32 in the termination region so as to surround the active region. The termination well region 20 includes a high concentration region 21 that contacts the boundary between the inner region RI and the outer region RO, and a low concentration region 22 that extends outward from the high concentration region 21 so as to surround the high concentration region 21 and has a lower peak concentration of impurities than the high concentration region 21. Furthermore, a termination contact region 29 that has a higher peak concentration of impurities than the high concentration region 21 is provided in a surface layer portion of the high concentration region 21. The conductivity type of the termination contact region 29 may be n-type.

[0085] The n-type region of epitaxial layer 32 excluding the above impurity regions (element well region 9, source region 18, contact region 19, and termination well region 20) is drift layer 1 through which current flows due to drift. The impurity concentration of drift layer 1 is lower than the impurity concentration of single crystal substrate 31. Therefore, single crystal substrate 31 has a lower resistivity than drift layer 1. Here, the impurity concentration of drift layer 1 is 1×10 14 / cm 3 More than 1×10 17 / cm 3 The following is the result.

[0086] The termination well region 20 is a frame-shaped (ring-shaped) region surrounding the active region in a plan view, and functions as a so-called guard ring. As shown in Fig. 9, the inner edge of the termination well region 20 is defined as a boundary, and the inner side is defined as an inner region RI, which is an active region, and the outer side is defined as an outer region RO, which is a termination region.

[0087] On the surface S2 of the epitaxial substrate 30 in the active region, a gate insulating film 12 is formed so as to straddle the source region 18, the element well region 9, and the drift layer 1, and a gate electrode 13 is formed thereon. The surface portion of the element well region 9 covered with the gate insulating film 12 and the gate electrode 13, i.e., the portion between the source region 18 and the drift layer 1 in the element well region 9, is a channel region in which an inversion channel is formed when the MOSFET 200 is turned on.

[0088] In the active region, the gate electrode 13 is covered with an interlayer insulating film 14, and a source electrode 41, which is a surface electrode, is formed on the interlayer insulating film 14. Thus, the gate insulating film 12 and the gate electrode 13 are electrically insulated by the interlayer insulating film 14. As shown in FIG. 10, the source electrode 41 is provided across the entire inner region RI.

[0089] The source electrode 41 is connected to the source region 18 and the contact region 19 through a contact hole formed in the interlayer insulating film 14. The source electrode 41 and the contact region 19 form an ohmic contact. In addition, a back surface electrode 11 functioning as a drain electrode is formed on the back surface S1 of the epitaxial substrate 30.

[0090] 9, the gate insulating film 12, the gate electrode 13, the interlayer insulating film 14, and a part of the source electrode 41 extend beyond the boundary between the inner region RI and the outer region RO to the outer region RO. The source electrode 41 drawn out to the outer region RO is connected to the termination contact region 29 in the termination well region 20 through a contact hole formed in the interlayer insulating film 14 so as to form an ohmic contact or a Schottky contact. The gate electrode 13 drawn out to the outer region RO is disposed on the high concentration region 21 of the termination well region 20 via the gate insulating film 12, and extends in a frame shape in a plan view, similar to the high concentration region 21.

[0091] A gate wiring electrode 42 formed on the interlayer insulating film 14 is connected to the gate electrode 13 extended to the outer region RO through an opening provided in the interlayer insulating film 14. The gate wiring electrode 42 is a control wiring electrode for receiving a gate signal (control signal) for controlling an electrical path between the source electrode 41 and the back electrode 11, which is a drain electrode, and is provided apart from the source electrode 41 and is electrically insulated from the source electrode 41.

[0092] As shown in Fig. 10, the gate wiring electrode 42 includes a gate wiring 42w provided so as to surround the source electrode 41, and a gate pad 42p to which wire bonding is performed. In this embodiment, the source electrode 41 is rectangular in a plan view, and the gate pad 42p is provided so as to enter a recess formed on one side of the rectangular source electrode 41. The gate wiring electrode 42 shown in Fig. 9 corresponds to the gate wiring 42w. Note that in the plan view of Fig. 10, only the epitaxial substrate 30, the source electrode 41, and the gate wiring electrode 42 are shown, and other elements are not shown.

[0093] In FIG. 10, the gate wiring 42w and the gate pad 42p are directly connected to each other, but the gate wiring 42w and the gate pad 42p may be configured to be spaced apart from each other and electrically connected to each other through the gate electrode 13 below the interlayer insulating film 14.

[0094] The field insulating film 3 is provided on the surface S2 of the outer region RO of the epitaxial substrate 30, covers a part of the high concentration region 21 and the whole of the low concentration region 22, and extends to the vicinity of the edge of the epitaxial substrate 30. The field insulating film 3 is not provided in the inner region RI. That is, the field insulating film 3 has an opening that includes the inner region RI.

[0095] 9, the outer peripheral ends of the gate electrode 13 and the interlayer insulating film 14 overlap with the inner peripheral end of the field insulating film 3, but the inner peripheral end of the field insulating film 3 may be connected to the side surface of the outer peripheral end of the interlayer insulating film 14 without overlapping with the inner peripheral end of the field insulating film 3. Also, the field insulating film 3 and the interlayer insulating film 14 may be an integrated film formed at the same time.

[0096] The peripheral electrode 5 is provided on the surface S2 of the epitaxial substrate 30, spaced apart from the termination well region 20. The inner peripheral end of the peripheral electrode 5 runs over the outer peripheral ends of at least one of the field insulating film 3 and the interlayer insulating film 14. In FIG. 9, the inner peripheral end of the peripheral electrode 5 runs over the outer peripheral ends of both the field insulating film 3 and the interlayer insulating film 14.

[0097] The semi-insulating film 7 is provided on at least a part of the field insulating film 3 and the interlayer insulating film 14 in the outer region RO. The semi-insulating film 7 is separated from the gate wiring electrode 42 and the peripheral electrode 5 so as not to contact the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. The semi-insulating film 7 is connected to the surface S2 of the epitaxial substrate 30 through openings formed in the field insulating film 3 and the interlayer insulating film 14 on the termination well region 20 and in a region outside the termination well region 20.

[0098] In FIG. 9, the semi-insulating film 7 is connected to the surface S2 of the low-concentration region 22 of the termination well region 20 through an opening formed in the field insulating film 3 and the interlayer insulating film 14, but it may also be connected to the surface S2 of the high-concentration region 21 or the termination contact region 29.

[0099] The surface protective film 10 is provided so as to cover the outer peripheral edge of the source electrode 41, the inner peripheral edge and the outer peripheral edge of the gate wiring electrode 42, and the outer peripheral electrode 5. The surface protective film 10 has openings formed above the source electrode 41 and the gate pad 42p. When the MOSFET 200 is used while being covered with a sealing gel having a low elastic modulus, such as silicone gel, the surface protective film 10 may be omitted.

[0100] FIG. 9 shows a cross section (cross section along line BB in FIG. 10) of the termination portion of MOSFET 200 according to embodiment 2. However, the region in which semi-insulating film 7 contacts surface S2 of epitaxial substrate 30 through openings in field insulating film 3 and interlayer insulating film 14 does not need to be formed over the entire periphery surrounding source electrode 41 and gate wiring electrode 42 in plan view, and may be divided into multiple regions spaced apart from each other.

[0101] In the present embodiment, the epitaxial substrate 30 has been described as being made of SiC. SiC has a wider band gap than Si, and a SiC semiconductor device using SiC has superior voltage resistance, high allowable current density, and high heat resistance compared to a Si semiconductor device using Si, and therefore can operate at high temperatures. However, the material of the epitaxial substrate 30 is not limited to SiC, and may be made of other wide band gap semiconductors, for example, gallium nitride (GaN). In addition, silicon (Si), for example, may be used instead of the wide band gap semiconductor. In addition, the semiconductor device may be a transistor other than a MOSFET, for example, a JFET (Junction FET) or an IGBT (Insulated Gate Bipolar Transistor).

[0102] [Variation 1] 12 is a partial cross-sectional view showing a configuration of a MOSFET 201 which is a semiconductor device according to Modification 1 of Embodiment 2. In MOSFET 201 of FIG. 12, a moisture-resistant insulating film 8 is formed to cover the outer peripheral end of source electrode 41, gate wiring 42w, and the inner peripheral end of outer peripheral electrode 5.

[0103] In the inner region RI, the moisture-resistant insulating film 8 has an opening for exposing a region where wire bonding or the like of the source electrode 41 is performed. The entire region of the gate wiring 42w is covered with the moisture-resistant insulating film 8, but an opening is provided in the moisture-resistant insulating film 8 in a region where wire bonding or the like of the gate pad 42p is performed.

[0104] [Variation 2] Fig. 13 is a partial cross-sectional view showing a configuration of a MOSFET 202 which is a semiconductor device according to Modification 2 of the second embodiment. Fig. 14 is a plan view of the MOSFET 202, and a cross-sectional view taken along line CC in Fig. 14 corresponds to Fig. 13. For convenience, Fig. 14 shows only the source electrode 41 and the gate wiring electrode 42 of the top surface configuration of the MOSFET 202. The MOSFET 202 shown in Fig. 14 differs from the MOSFET 200 shown in Fig. 10 in that the gate wiring 42w does not surround the source electrode 41 but is provided so as to enter a recess formed deep in one side of the rectangular source electrode 41 in a plan view.

[0105] In the MOSFET 202, the semi-insulating film 7 is also provided on at least a part of the field insulating film 3 and the interlayer insulating film 14 in the outer region RO. The semi-insulating film 7 is separated from the source electrode 41, the gate wiring electrode 42 (not shown in FIG. 13 ), and the peripheral electrode 5 so as not to contact the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. The semi-insulating film 7 is connected to the surface S2 of the epitaxial substrate 30 in the region on the termination well region 20 and outside the termination well region 20 through an opening formed in the field insulating film 3 and the interlayer insulating film 14.

[0106] [Variation 3] Fig. 15 is a partial cross-sectional view showing a configuration of a MOSFET 203 which is a semiconductor device according to Modification 3 of Embodiment 2. Fig. 16 is a plan view of MOSFET 203, and a cross-sectional view taken along line DD in Fig. 16 corresponds to Fig. 15. For convenience, Fig. 16 shows only a source electrode 41 and a gate wiring electrode 42 of the top surface configuration of MOSFET 203.

[0107] 16, the source electrode 41 includes a source pad 41p having a rectangular shape in a plan view, and a source wiring 41w which is a surface wiring formed to surround a gate wiring electrode 42 including a gate wiring 42w. In the MOSFET 203 shown in FIG. 16, the gate wiring 42w is opened in a plan view, and the source wiring 41w and the source pad 41p are directly connected to each other through the opening of the gate wiring 42w, but the source wiring 41w and the source pad 41p may be separated from each other and electrically connected to each other by providing a conductive film other than the source electrode 41, the gate wiring electrode 42, and the gate electrode 13, or may be electrically connected to each other via a termination contact region 29.

[0108] In the MOSFET 203, the semi-insulating film 7 is also provided on at least a part of the field insulating film 3 and the interlayer insulating film 14 in the outer region RO. The semi-insulating film 7 is separated from and does not contact the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. The semi-insulating film 7 is connected to the surface S2 of the epitaxial substrate 30 through openings formed in the field insulating film 3 and the interlayer insulating film 14 on the termination well region 20 and in a region outside the termination well region 20.

[0109] [Variation 4] 17 is a partial cross-sectional view showing a configuration of a MOSFET 204 which is a semiconductor device according to Variation 4 of Embodiment 2. In MOSFET 204 of FIG. 17, the outer peripheral end of gate electrode 13 is located outside the outer peripheral end of gate wiring electrode 42. Also, on field insulating film 3, outer peripheral lead electrode 15 is provided which is connected to outer peripheral electrode 5 through an opening formed in interlayer insulating film 14. The inner peripheral end of outer peripheral lead electrode 15 is located inside the inner peripheral end of outer peripheral electrode 5. Semi-insulating film 7 is not connected to surface S2 of epitaxial substrate 30, and is connected to gate electrode 13 and outer peripheral lead electrode 15 through an opening formed in interlayer insulating film 14.

[0110] 18, the semi-insulating film 7 may be connected to an inner circumferential extraction electrode 17 provided on the field insulating film 3 at a distance from the gate electrode 13 through an opening formed in the interlayer insulating film 14, without being connected to the gate electrode 13. In a region not shown, the inner circumferential extraction electrode 17 is connected to the source electrode 41 through an opening formed in the interlayer insulating film 14, and is routed to a region outside the gate electrode 13 in plan view. The inner circumferential extraction electrode 17 may also be connected to the termination well region 20 through an opening formed in the field insulating film 3, without being connected to the source electrode 41.

[0111] In the MOSFET 204 and MOSFET 205 shown as the fourth modification, the gate wiring 42w is provided to surround the source electrode 41 as in the plan view of the MOSFET 200 shown in FIG. 10, but the gate wiring 42w may be provided not to surround the source electrode 41 but to enter a recess formed deep on one side of the rectangular source electrode 41 in a plan view as in the plan view of the MOSFET 202 shown in FIG. 14. In this case, as in the MOSFET 206 shown in FIG. 19, the semi-insulating film 7 is connected to the gate electrode 13 through an opening formed in the interlayer insulating film 14 outside the source electrode 41. As in the MOSFET 207 shown in FIG. 20, an inner peripheral lead electrode 17 connected to the source electrode 41 through an opening formed in the interlayer insulating film 14 may be provided on the field insulating film 3, and the semi-insulating film 7 may be connected to the inner peripheral lead electrode 17 through an opening formed in the interlayer insulating film 14 outside the source electrode 41.

[0112] 16, a source wiring 41w may be formed to surround a gate wiring electrode 42 including a gate wiring 42w. In this case, as in the MOSFET 208 shown in FIG. 21, an inner peripheral lead electrode 17 is provided on the field insulating film 3 and connected to the source wiring 41w through an opening formed in the interlayer insulating film 14, and a semi-insulating film 7 is connected to the inner peripheral lead electrode 17 through an opening formed in the interlayer insulating film 14 on the outer side of the source wiring 41w.

[0113] Similarly to the SBD 101 shown in FIG. 3, the low concentration region 22 of the termination well region 20 may be divided into a plurality of regions. In the MOSFET 209 shown in FIG. 22, a plurality of auxiliary electrodes 6 are formed on the interlayer insulating film 14, and the plurality of low concentration regions 22 are connected to each of the plurality of low concentration regions 22 through openings formed in the interlayer insulating film 14 and the field insulating film 3. An auxiliary extraction electrode 16 is formed on the field insulating film 3 around each of the auxiliary electrodes 6. The auxiliary extraction electrode 16 is formed so that a part of it protrudes from under the auxiliary electrode 6, and the auxiliary electrode 6 is connected to the adjacent auxiliary extraction electrodes 16 through openings formed in the interlayer insulating film 14. The semi-insulating film 7 is not connected to the auxiliary electrode 6, but is connected to the auxiliary extraction electrode 16 through openings provided in the interlayer insulating film 14. Therefore, the auxiliary extraction electrode 16 is connected to the semi-insulating film 7 and the auxiliary electrode 6 through openings formed in the interlayer insulating film 14. The semi-insulating film 7 and the auxiliary electrode 6 are connected to each other through the auxiliary extraction electrodes 16.

[0114] The auxiliary electrode 6 does not have to be formed continuously on each low concentration region 22, and may be formed intermittently (partially interrupted). Figures 23 and 24 are partial plan views showing configuration examples of the vicinity of the auxiliary electrode 6 when the auxiliary electrode 6 has an intermittent shape. The up-down direction in Figures 23 and 24 corresponds to the depth direction in Figure 22. Figures 23 and 24 show an opening T in the interlayer insulating film 14 provided to connect the semi-insulating film 7 and the auxiliary extraction electrode 16.

[0115] In the region where the auxiliary electrode 6 is interrupted, that is, in the region where the auxiliary electrodes 6 on the same low concentration region 22 are spaced apart, a semi-insulating film 7 may be formed as shown in Fig. 23. Also, as shown in Fig. 24, an opening T that connects the semi-insulating film 7 and the auxiliary extraction electrode 16 may be disposed in the region where the auxiliary electrode 6 is interrupted.

[0116] In addition, a moisture-resistant insulating film 8 may be formed so as to cover the auxiliary electrode 6 .

[0117] [Operation] The operation of the MOSFET 200 according to the second embodiment shown in FIG. 9 will be described in two separate states.

[0118] The first state is a state in which a positive voltage equal to or greater than the threshold value is applied to the gate electrode 13. Hereinafter, this state will be referred to as the "on state." In the on state, an inversion channel is formed in the channel region. The inversion channel becomes a path for electrons, which are carriers, to flow between the source region 18 and the drift layer 1. In the on state, when a high voltage is applied to the back electrode 11 with respect to the source electrode 41, a current flows through the single crystal substrate 31 and the drift layer 1. The voltage between the source electrode 41 and the back electrode 11 at this time is called the on voltage, and the current flowing between the source electrode 41 and the back electrode 11 is called the on current. The on current flows only through the inner region RI where the channel exists, and does not flow through the outer region RO.

[0119] The second state is a state in which a voltage less than the threshold value is applied to the gate electrode 13. Hereinafter, this state will be referred to as the "off state." In the off state, an inversion channel is not formed in the channel region, so no on-current flows. Therefore, when a high voltage is applied between the source electrode 41 and the rear electrode 11, this high voltage is maintained. At this time, the voltage between the gate electrode 13 and the source electrode 41 is much smaller than the voltage between the source electrode 41 and the rear electrode 11, so that a high voltage is also applied between the gate electrode 13 and the rear electrode 11.

[0120] Also in the outer region RO, a high voltage is applied between each of the gate wiring electrode 42 and the gate electrode 13 and the back surface electrode 11. Just as an electrical contact with the source electrode 41 is formed in the element well region 9 in the inner region RI, an electrical contact with the source electrode 41 is formed in the termination contact region 29 in the outer region RO, so that application of a high electric field to the gate insulating film 12 and the interlayer insulating film 14 is prevented.

[0121] In the off state, the outer region RO operates similarly to the SBD 100 in the off state described in the first embodiment. That is, a high electric field is applied near the pn junction interface between the drift layer 1 and the termination well region 20, and avalanche breakdown occurs when a voltage exceeding the critical electric field is applied to the back electrode 11. Usually, the rated voltage is determined so that the MOSFET 200 is used within a range in which avalanche breakdown does not occur.

[0122] In the off state, a depletion layer spreads from the pn junction interfaces between the drift layer 1 and the element well region 9 and the termination well region 20 in a direction toward the single crystal substrate 31 (downward) and toward the periphery of the drift layer 1 (to the right).

[0123] Here, consider a case where the MOSFET 200 is turned off under high humidity. If the surface protective film 10 is made of polyimide or the like, it contains a lot of moisture under high humidity. When this moisture reaches the surfaces of the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5, the source electrode 41 and the gate wiring electrode 42 act as a cathode and the peripheral electrode 5 acts as an anode due to the voltage applied to the MOSFET 200 in the off state. Even if the surface protective film 10 is not formed, a lot of moisture penetrates the sealing gel and reaches the MOSFET 200, and similarly the source electrode 41 and the gate wiring electrode 42 act as a cathode and the peripheral electrode 5 acts as an anode. In addition, when a voltage equal to or lower than that of the source electrode 41 is applied to the gate electrode 13, the gate wiring electrode 42 acts as a cathode and the source electrode 41 acts as an anode.

[0124] The oxygen reduction reaction and hydrogen generation reaction described in the first embodiment occur near the source electrode 41 and the gate wiring electrode 42, which serve as the cathodes. As a result, the concentration of hydroxide ions increases near the source electrode 41 and the gate wiring electrode 42. The hydroxide ions chemically react with the source electrode 41 and the gate wiring electrode 42. For example, if the source electrode 41 and the gate wiring electrode 42 are made of aluminum, the aluminum may become aluminum hydroxide due to the above chemical reaction. Furthermore, the aluminum hydroxide may become aluminum oxide depending on the surrounding temperature, pH, and the like.

[0125] In addition, in the vicinity of the peripheral electrode 5 serving as the anode, for example, when the peripheral electrode 5 is made of aluminum, the aluminum is Al 3 + It dissolves and reacts with the surrounding moisture to become aluminum hydroxide or aluminum oxide.

[0126] Such a reaction occurs similarly depending on the polarity when the gate wiring electrode 42 is a cathode and the source electrode 41 is an anode, or vice versa.

[0127] The aluminum hydroxide or aluminum oxide precipitates as an insulator on the surfaces of the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. This precipitation causes the films on the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5 to crack or be pushed up and peel off, and when the peeling progresses and a cavity is formed in the upper part of the field insulating film 3 and the interlayer insulating film 14, moisture enters the cavity. The moisture that enters the cavity may cause an excessive leakage current or an aerial discharge in the cavity, which may cause the MOSFET 200 to break down. In addition, if volume expansion occurs due to the precipitation of the insulator, stress is applied to the films under the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5 and the epitaxial substrate 30, which may cause physical destruction of the MOSFET 200 and cause the element to break down.

[0128] The above-mentioned precipitation reaction of aluminum hydroxide or aluminum oxide is accelerated by the electric field strength. In particular, the outer peripheral edge of the gate wiring electrode 42 and the inner peripheral edge of the outer peripheral electrode 5 are prone to a high electric field, and when the epitaxial substrate 30 is made of silicon carbide, a high electric field strength is generated in the outer region RO, accelerating the precipitation reaction of aluminum hydroxide or aluminum oxide. Also, the outer peripheral edge of the source electrode 41 and the inner peripheral edge of the gate wiring electrode 42 become a high electric field due to the voltage applied to the gate wiring electrode 42, accelerating the precipitation reaction of aluminum hydroxide or aluminum oxide.

[0129] Furthermore, when the semi-insulating film 7 is connected to the ends of the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5, moisture reaches the ends of the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5 through the semi-insulating film 7, and electrons are exchanged with the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5 through the semi-insulating film 7, further accelerating the deposition reaction of aluminum hydroxide or aluminum oxide. Furthermore, due to the conductivity of the semi-insulating film 7, a potential gradient is likely to occur around the peripheral end of the source electrode 41, the inner and outer ends of the gate wiring electrode 42, and the inner end of the peripheral electrode 5, and the electric field strength may also accelerate the deposition reaction of aluminum hydroxide or aluminum oxide.

[0130] In addition, the voltage applied to the gate wiring electrode 42 constantly changes during operation of the MOSFET 200, and the gate wiring electrode 42 repeatedly becomes an anode and a cathode with respect to the source electrode 41. At this time, electrons move back and forth between the source electrode 41 and the gate wiring electrode 42, and depending on the speed of the movement, the precipitation reaction of aluminum hydroxide or aluminum oxide may be accelerated.

[0131] In contrast, in the MOSFET 200 of the second embodiment, the semi-insulating film 7 is separated from the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5 so as not to come into contact with the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5. As a result, no direct exchange of electrons occurs between the semi-insulating film 7 and the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5, and no potential gradient is generated around the outer peripheral end of the source electrode 41, the inner peripheral end and outer peripheral end of the gate wiring electrode 42, and the inner peripheral end of the outer peripheral electrode 5 due to the conductivity of the semi-insulating film 7. As a result, it is possible to suppress the deposition of aluminum hydroxide or aluminum oxide on the surfaces of the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5.

[0132] In MOSFET 200 of the second embodiment, semi-insulating film 7 is connected to surface S2 of epitaxial substrate 30 through openings formed in field insulating film 3 and interlayer insulating film 14 on termination well region 2 and in a region outside termination well region 2. As a result, a gentle potential gradient is formed in the region where semi-insulating film 7 is formed in the off state. This makes it possible to suppress excessive electric field concentration around termination well region 2.

[0133] Furthermore, when the semi-insulating film 7 is connected to the surface S2 of the epitaxial substrate 30 in the region on the high concentration region 21 or the termination contact region 29 of the termination well region 20, a gentle potential gradient is formed from a potential closer to the source electrode 41 to a potential closer to the back surface electrode 11. Thus, the occurrence of excessive electric field concentration around the termination well region 2 can be more effectively suppressed.

[0134] The above effects can also be obtained in the MOSFETs 201 to 209 described in the first to fourth modifications of the second embodiment.

[0135] 12, the moisture-resistant insulating film 8 is formed to cover the outer peripheral edge of the source electrode 41, the gate wiring 42w, and the inner peripheral edge of the outer peripheral electrode 5. This prevents moisture from reaching the outer peripheral edge of the source electrode 41, the gate wiring 42w, and the inner peripheral edge of the outer peripheral electrode 5. As a result, the precipitation reaction of aluminum hydroxide or aluminum oxide at the outer peripheral edge of the source electrode 41, the gate wiring 42w, and the inner peripheral edge of the outer peripheral electrode 5 can be further suppressed.

[0136] In the MOSFET 202 and the MOSFET 203 shown in Figures 13 to 16, the semi-insulating film 7 is formed at a distance from the source electrode 41 even in the region where the source electrode 41 is located outside the gate wiring electrode 42, and the precipitation reaction of aluminum hydroxide or aluminum oxide at the outer circumferential edge of the source electrode 41 can be suppressed.

[0137] In the MOSFETs 204 to 208 shown in FIGS. 17 to 21, the semi-insulating film 7 is not connected to the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5, so that it is possible to suppress the deposition of aluminum hydroxide or aluminum oxide on the surfaces of the source electrode 41, the gate wiring electrode 42, and the outer peripheral electrode 5. In addition, the semi-insulating film 7 is connected to the gate electrode 13 or the inner peripheral lead electrode 17 and the outer peripheral lead electrode 15 through an opening formed in the interlayer insulating film 14, so that in the off state, a gentle potential gradient is formed in a region from a potential closer to the source electrode 41 or the gate electrode 13 to a potential closer to the back surface electrode 11. Therefore, it is possible to suppress the occurrence of excessive electric field concentration around the terminal well region 20. Furthermore, since a contact hole connecting the semi-insulating film 7 and the surface S2 of the epitaxial substrate 30 is not formed, it is possible to avoid damage to the surface S2 of the epitaxial substrate 30 due to overetching, and to improve the reliability of the semiconductor device when a high voltage is applied.

[0138] 22, the semi-insulating film 7 is not connected to the auxiliary electrode 6, and therefore it is possible to prevent aluminum hydroxide or aluminum oxide from precipitating on the surface of the auxiliary electrode 6. Furthermore, the semi-insulating film 7 is connected to the auxiliary extraction electrode 16 through an opening formed in the interlayer insulating film 14, and therefore a gentle potential gradient is formed around each of the divided low-concentration regions 22, and therefore it is possible to prevent excessive electric field concentration from occurring.

[0139] [Manufacturing method] Next, a method for manufacturing the MOSFET 200 according to the second embodiment will be described.

[0140] First, similarly to the first embodiment, n-type impurities are introduced at a relatively high concentration (n + ) is prepared. The single crystal substrate 31 is a SiC substrate having a 4H polytype and has an off-angle of 4 degrees or 8 degrees.

[0141] Next, epitaxial growth of SiC was performed on the single crystal substrate 31, and the n-type impurity concentration was 1×10 14 / cm 3 More than 1×10 17 / cm 3 The following epitaxial layer 32 is formed. As a result, an epitaxial substrate 30 consisting of a single crystal substrate 31 and an epitaxial layer 32 is obtained.

[0142] Next, by combining the formation of a resist mask by a photolithography process and an ion implantation process using this resist mask as an implantation mask, the process of forming an impurity region in the upper part of the epitaxial layer 32 is repeated to form a termination well region 20, an element well region 9, a contact region 19, a source region 18 and a termination contact region 29 in the upper part of the epitaxial layer 32.

[0143] In these ion implantations, N (nitrogen) or the like is used as the n-type impurity, and Al, B or the like is used as the p-type impurity. The element well region 9 and the high concentration region 21 of the termination well region 20 can be formed together. The contact region 19 and the termination contact region 29 can be formed together. The termination contact region 29 may be formed together with the source region 18.

[0144] The impurity concentration of the element well region 9 and the high concentration region 21 of the termination well region 20 is 1.0×10 18 / cm 3 Above 1.0×10 20 / cm 3 The impurity concentration of the source region 18 is 1.0×10 19 / cm 3 Above 1.0×10 21 / cm 3 The dose of the low concentration region 22 of the termination well region 20 is set to 0.5×10 13 / cm 2 5×10 or more 13 / cm 2 It is preferable to set the value to 1.0×10 or less.13 / cm 2 The impurity concentrations of the contact region, the terminal contact region 29 and the peripheral contact region 25 are set to be higher than the impurity concentration of the element well region 9.

[0145] The implantation energy of the ion implantation is, for example, 100 keV or more and 700 keV or less in the case of Al. In this case, the dose [cm -2 The impurity concentration of the low concentration region 22 calculated from 17 / cm 3 More than 1×10 19 / cm 3 The implantation energy of the ion implantation is set to, for example, 20 keV or more and 300 keV or less in the case of N.

[0146] Then, annealing is performed in a heat treatment device in an inert gas atmosphere such as argon (Ar) gas at a temperature of 1300°C to 1900°C for 30 seconds to 1 hour. This annealing activates the impurities added by ion implantation.

[0147] Next, a 1 μm thick SiO 2 film that will become the field insulating film 3 is formed on the surface of the epitaxial substrate 30 by, for example, a CVD method. 2 Then, by photolithography and etching, a SiO 2 film is deposited on the inner region RI, a part of the region on the high concentration region 21 of the outer region RO, and the region for connecting the peripheral electrode 5 to the epitaxial substrate 30. 2 To remove the film, SiO 2 The film is patterned, whereby field insulating film 3 is formed on surface S2 of epitaxial substrate 30.

[0148] Next, the surface S2 of the epitaxial layer 32 that is not covered with the field insulating film 3 is thermally oxidized to form a SiO 2Then, a conductive polycrystalline silicon film that will become the gate electrode 13 is formed on the gate insulating film 12 and on part of the field insulating film 3 by low pressure CVD. Furthermore, the polycrystalline silicon film is patterned by photolithography and etching processes to form the gate electrode 13. At the same time, the outer peripheral extraction electrode 15, the inner peripheral extraction electrode 17, and the auxiliary extraction electrode 16 can be formed.

[0149] Next, the SiO 2 that will become the interlayer insulating film 14 is formed by the CVD method. 2 Then, a SiO 2 Contact holes are formed so as to penetrate the interlayer insulating film 14 and reach the contact region 19 and the source region 18, respectively. At the same time, contact holes are formed in the outer region RO so as to penetrate the interlayer insulating film 14 and reach the gate electrode 13. In addition, a contact hole is formed from the outer periphery of the epitaxial layer 32 to the SiO 2 The membrane is removed.

[0150] SiO to be the interlayer insulating film 14 2 In the film etching step, contact holes for connecting the semi-insulating film 7 to surface S2 of the epitaxial substrate 30 are also formed at the same time. When manufacturing MOSFET 209 from MOSFET 204 shown in Figures 17 to 24, contact holes for connecting the semi-insulating film 7 to surface S2 of the epitaxial substrate 30 are not formed in this step, but contact holes for connecting the semi-insulating film 7 to the outer peripheral lead electrode 15, the inner peripheral lead electrode 17, and the auxiliary lead electrode 16, a contact hole for connecting the source electrode 41 to the inner peripheral lead electrode 17, a contact hole for connecting the outer peripheral electrode 5 to the outer peripheral lead electrode 15, and a contact hole for connecting the auxiliary electrode 6 to the auxiliary lead electrode 16 are formed.

[0151] The interlayer insulating film 14 may be configured to overlap the field insulating film 3. An opening provided in the field insulating film 3 for connecting the peripheral electrode 5 to the epitaxial substrate 30 may be formed when the interlayer insulating film 14 is patterned. The field insulating film 3 and the interlayer insulating film 14 may be formed in the same process, and the field insulating film 3 and the interlayer insulating film 14 may be formed as an integrated film.

[0152] Next, a material layer that will become the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5 is formed on the surface S2 of the epitaxial substrate 30 by a sputtering method or a vapor deposition method, and the material layer is patterned by a photolithography process and an etching process. When manufacturing a MOSFET 209 shown in FIG. 22, an auxiliary electrode 6 can be formed at the same time in this process. For example, a metal containing one or more of Ti, Ni, Al, Cu, and Au, or an Al alloy such as Al-Si, is used as the material layer that will become the source electrode 41, the gate wiring electrode 42, the peripheral electrode 5, and the auxiliary electrode 6. A silicide film may be formed in advance by a heat treatment on the part of the epitaxial substrate 30 that contacts such a material layer.

[0153] 12, when forming the moisture-resistant insulating film 8, a SiN film is formed by, for example, plasma CVD, and the SiN film is patterned by photolithography and etching processes to form the moisture-resistant insulating film 8. Then, a SInSiN film that serves as the semi-insulating film 7 is formed by, for example, plasma CVD, and the semi-insulating film 7 is patterned by photolithography and etching processes to form the semi-insulating film 7. In forming the semi-insulating film 7, a SiN film with high moisture resistance and insulation properties may be formed on the SInSiN film, so that the semi-insulating film 7 has a laminated structure.

[0154] Next, for example, photosensitive polyimide is applied so as to cover the source electrode 41, the gate wiring electrode 42, the peripheral electrode 5, the field insulating film 3, the interlayer insulating film 14, the semi-insulating film 7, the moisture-resistant insulating film 8 and the surface S2 of the epitaxial substrate 30, and a surface protective film 10 having a predetermined pattern is formed by a photolithography process. Note that when the MOSFET 200 is used covered with a sealing gel having a low elasticity such as silicone gel, the formation of the surface protective film 10 may be omitted.

[0155] Thereafter, a back surface electrode 11 is formed on the back surface S1 of the epitaxial substrate 30 by, for example, a sputtering method, thereby obtaining the configuration of the MOSFET 200 shown in FIG.

[0156] The back electrode 11 may be formed before or after the process of forming the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. The material of the back electrode 11 may be a metal containing one or more of Ti, Ni, Al, Cu, and Au. The thickness of the back electrode 11 is preferably 50 nm or more and 2 μm or less. For example, the back electrode 11 may be formed of a two-layer film (Ti / Au) of Ti and Au, each having a thickness of 1 μm or less.

[0157] [summary] The configurations of the second embodiment and its modified example suppress the deposition of insulating materials on the ends of the source electrode 41, the gate wiring electrode 42, and the peripheral electrode 5. In addition, the potential gradient in the termination region is made gentler to suppress excessive electric field concentration, thereby improving the insulation reliability of the MOSFET.

[0158] <Embodiment 3> In the third embodiment, an example will be shown in which the semiconductor devices according to the first and second embodiments are applied to a power conversion device. Here, a case will be described in which the semiconductor devices according to the first and second embodiments are applied to a three-phase inverter as a power conversion device.

[0159] FIG. 25 is a block diagram illustrating a schematic configuration of a power conversion system to which a power conversion device 2000 according to the third embodiment is applied.

[0160] The power conversion system shown in Fig. 25 includes a power supply 1000, a power conversion device 2000, and a load 3000. The power supply 1000 is a DC power supply, and supplies DC power to the power conversion device 2000. The power supply 1000 can be configured from various sources, for example, a DC system, a solar cell, or a storage battery, or may be configured from a rectifier circuit or an AC / DC converter connected to an AC system. The power supply 1000 may also be configured from a DC / DC converter that converts DC power output from a DC system into a predetermined power.

[0161] The power conversion device 2000 is a three-phase inverter connected between the power source 1000 and the load 3000, converts DC power supplied from the power source 1000 into AC power, and supplies the AC power to the load 3000. As shown in Fig. 25, the power conversion device 2000 has a main conversion circuit 2001 that converts DC power into AC power and outputs it, a drive circuit 2002 that outputs drive signals that drive each switching element of the main conversion circuit 2001, and a control circuit 2003 that outputs a control signal for controlling the drive circuit 2002 to the drive circuit 2002.

[0162] The load 3000 is a three-phase motor driven by AC power supplied from the power conversion device 2000. The load 3000 is not limited to a specific application, but is a motor mounted on various electric devices, and is used as a motor for, for example, a hybrid vehicle, an electric vehicle, a railroad car, an elevator, or an air conditioner.

[0163] The power conversion device 2000 will be described in detail below. The main conversion circuit 2001 has switching elements and freewheel diodes (not shown), and converts DC power supplied from the power source 1000 into AC power by switching the switching elements, and supplies the AC power to the load 3000. There are various specific circuit configurations of the main conversion circuit 2001, but the main conversion circuit 2001 according to this embodiment is a two-level three-phase full bridge circuit, and can be configured with six switching elements and six freewheel diodes connected in reverse parallel to each switching element. The semiconductor device according to the above-mentioned embodiment 1 or 2 is applied to at least one of the switching elements and freewheel diodes of the main conversion circuit 2001. Two switching elements of the six switching elements are connected in series to form upper and lower arms, and each upper and lower arm forms each phase (U phase, V phase, W phase) of the full bridge circuit. The output terminals of each upper and lower arm, i.e., the three output terminals of the main conversion circuit 2001, are connected to the load 3000.

[0164] The drive circuit 2002 generates drive signals for driving the switching elements of the main conversion circuit 2001 and supplies them to the control electrodes of the switching elements of the main conversion circuit 2001. Specifically, in accordance with a control signal from a control circuit 2003 (described later), the drive circuit 2002 outputs to the control electrodes of each switching element a drive signal for turning the switching element on and a drive signal for turning the switching element off. When maintaining a switching element in the on state, the drive signal is a voltage signal (on signal) that is greater than the threshold voltage of the switching element, and when maintaining a switching element in the off state, the drive signal is a voltage signal (off signal) that is smaller than the threshold voltage of the switching element.

[0165] The control circuit 2003 controls the switching elements of the main conversion circuit 2001 so that the desired power is supplied to the load 3000. Specifically, the control circuit 2003 calculates the time (on time) for each switching element of the main conversion circuit 2001 to be in the on state based on the power to be supplied to the load 3000. For example, the main conversion circuit 2001 can be controlled by pulse width modulation (PWM) control, which modulates the on time of the switching element according to the voltage to be output. Then, the control circuit 2003 outputs a control command (control signal) to the drive circuit 2002 so that an on signal is output to the switching element that should be in the on state at each time point, and an off signal is output to the switching element that should be in the off state. The drive circuit 2002 outputs an on signal or an off signal as a drive signal to the control electrode of each switching element according to this control signal.

[0166] In the power converter according to the present embodiment, the semiconductor device according to the first embodiment can be applied as the freewheeling diode of the main conversion circuit 2001, and the semiconductor device according to the second embodiment can be applied as the switching element. When the semiconductor devices according to the first and second embodiments are applied to the power converter 2000 in this manner, they are usually embedded in gel or resin before use, but these materials cannot completely block moisture, and the configurations shown in the first and second embodiments maintain the insulation and protection of the semiconductor device. This makes it possible to improve reliability.

[0167] In the present embodiment, an example has been described in which the power conversion device to which the semiconductor device according to the first and second embodiments is applied is a two-level three-phase inverter, but the semiconductor device according to the first and second embodiments can be applied to various power conversion devices. For example, the power conversion device may be a multi-level one such as a three-level one. When supplying power to a single-phase load, the power conversion device may be a single-phase inverter. When supplying power to a DC load or the like, the power conversion device may be a DC / DC converter or an AC / DC converter.

[0168] Furthermore, the power conversion device to which the semiconductor device according to the first and second embodiments is applied is not limited to those that use an electric motor as a load, and can be used, for example, as a power supply device for an electric discharge machine, a laser processing machine, an induction heating cooker, or a contactless power supply system, and can also be used as a power conditioner for a solar power generation system, a power storage system, etc.

[0169] It is possible to freely combine the respective embodiments, and to appropriately modify or omit the respective embodiments. For example, the high concentration region 21 and the terminal contact region 29 shown in the second embodiment may be provided in the terminal well region 2 of the semiconductor device shown in the first embodiment, or the laminated structure of the moisture-resistant insulating film 8 and the semi-insulating film 7 shown in the first embodiment may be provided in the semiconductor device shown in the second embodiment.

[0170] The above description is illustrative in all respects, and it is understood that countless variations not illustrated can be assumed. For example, it is also possible to modify, add, or omit any component, and to extract at least one component in at least one embodiment and combine it with a component in another embodiment.

[0171] Additionally, unless a contradiction arises, a component described in each of the above embodiments as being provided with "one" may be provided with "one or more." Furthermore, the components constituting the technology according to the present disclosure are conceptual units, and one component may include multiple structures, or one component may be part of a structure. Additionally, the components of the technology according to the present disclosure include structures having other structures or shapes as long as they perform the same function. [Explanation of symbols]

[0172] 1 drift layer, 2 termination well region, 3 field insulating film, 4 surface electrode, 5 outer peripheral electrode, 6 auxiliary electrode, 7 semi-insulating film, 8 moisture-resistant insulating film, 9 element well region, 10 surface protective film, 11 back electrode, 12 gate insulating film, 13 gate electrode, 14 interlayer insulating film, 15 outer peripheral lead electrode, 16 auxiliary lead electrode, 17 inner peripheral lead electrode, 18 source region, 19 contact region, 20 termination well region, 21 high concentration region, 22 low concentration region, 29 termination contact region, 30 epitaxial substrate, 31 single crystal substrate, 32 epitaxial layer, 41 source electrode, 41p source pad, 41w source wiring, 42 gate wiring electrode, 42p gate pad, 42w gate wiring, 100-106 SBD, 200-209 MOSFET, S1 back surface of epitaxial substrate, S2 front surface of epitaxial substrate, UC Unit cell, RI inner region, RO outer region, 1000 power supply, 2000 power conversion device, 2001 main conversion circuit, 2002 drive circuit, 2003 control circuit, 3000 load.

Claims

1. A semiconductor layer of a first conductivity type; a field insulating film formed on a surface of the semiconductor layer; a surface electrode which is an inner peripheral electrode formed on a surface of the semiconductor layer on the inner side of the field insulating film and which runs onto an inner peripheral end of the field insulating film; a peripheral electrode formed on a surface of the semiconductor layer outside the field insulating film and extending over an outer peripheral edge of the field insulating film; a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending beyond an outer circumferential edge of the surface electrode; a semi-insulating film covering a portion of the field insulating film and spaced apart from the surface electrode and the peripheral electrode; a back electrode formed on a back surface side of the semiconductor layer; a moisture-resistant insulating film covering a portion of the field insulating film and covering at least one of an outer peripheral end of the surface electrode and an inner peripheral end of the outer peripheral electrode; the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of a region inside and a region outside an outer periphery of the well region, A part of the semi-insulating film is disposed on the moisture-resistant insulating film. Semiconductor device.

2. A semiconductor layer of a first conductivity type; a field insulating film formed on a surface of the semiconductor layer; an interlayer insulating film formed on a surface of the semiconductor layer inside the field insulating film and on the field insulating film; an inner circumferential electrode formed on a surface of the semiconductor layer, the inner circumferential electrode including a surface electrode and a control wiring electrode spaced apart from the surface electrode, the inner circumferential electrode extending over the interlayer insulating film; a peripheral electrode formed on a surface of the semiconductor layer outside the field insulating film and the interlayer insulating film and extending over an outer peripheral edge of at least one of the field insulating film and the interlayer insulating film; a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending beyond an outer peripheral end of the inner peripheral electrode; a semi-insulating film covering at least a portion of the field insulating film and the interlayer insulating film and spaced apart from the inner electrode and the outer electrode; a back electrode formed on a back surface side of the semiconductor layer; a moisture-resistant insulating film covering a part of the field insulating film and covering at least one of an inner peripheral end and an outer peripheral end of the control wiring electrode, an outer peripheral end of the surface electrode, and an inner peripheral end of the outer peripheral electrode; the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of a region inside and a region outside an outer periphery of the well region, A part of the semi-insulating film is disposed on the moisture-resistant insulating film. Semiconductor device.

3. the moisture-resistant insulating film covers the entire surface of the peripheral electrode; 3. The semiconductor device according to claim 1 or 2.

4. the well region has a high concentration region in a surface layer portion, the semi-insulating film is connected to the well region via the high concentration region; The semiconductor device according to claim 1 .

5. The well region is formed by dividing it into a plurality of parts, the semi-insulating film is connected to each of the plurality of well regions through an opening formed in the field insulating film; The semiconductor device according to claim 1 .

6. the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film so as to span the inside and outside of the outer periphery of the well region; The semiconductor device according to claim 1 .

7. A semiconductor layer of a first conductivity type; a field insulating film formed on a surface of the semiconductor layer; an interlayer insulating film formed on a surface of the semiconductor layer inside the field insulating film and on the field insulating film; an inner circumferential electrode formed on a surface of the semiconductor layer, the inner circumferential electrode including a surface electrode and a control wiring electrode spaced apart from the surface electrode, the inner circumferential electrode extending over the interlayer insulating film; a peripheral electrode formed on a surface of the semiconductor layer outside the field insulating film and the interlayer insulating film and extending over an outer peripheral edge of at least one of the field insulating film and the interlayer insulating film; a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending beyond an outer peripheral end of the inner peripheral electrode; a semi-insulating film covering at least a portion of the field insulating film and the interlayer insulating film and spaced apart from the inner electrode and the outer electrode; a back electrode formed on a back surface side of the semiconductor layer, the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of a region inside and a region outside an outer periphery of the well region, The well region is formed by dividing it into a plurality of parts, a plurality of auxiliary electrodes formed on the interlayer insulating film and connected to the plurality of well regions through openings formed in the interlayer insulating film and the field insulating film; an auxiliary lead electrode formed on the field insulating film so as to extend from under the auxiliary electrode and connected to the semi-insulating film and the auxiliary electrode through an opening formed in the interlayer insulating film; Equipped with the semi-insulating film and the auxiliary electrode are connected via the auxiliary extraction electrode. Semiconductor device.

8. a moisture-resistant insulating film covering the auxiliary electrode; The semiconductor device according to claim 7.

9. The semiconductor layer is formed of a wide band gap semiconductor. The semiconductor device according to claim 1 .

10. The wide band gap semiconductor is silicon carbide. The semiconductor device according to claim 9.

11. A conversion circuit including the semiconductor device according to any one of claims 1 to 10, which converts input power and outputs the converted power; a drive circuit that outputs a drive signal for driving the semiconductor device to the semiconductor device; a control circuit that outputs a control signal for controlling the drive circuit to the drive circuit; A power conversion device comprising:

12. A semiconductor layer of a first conductivity type; a field insulating film formed on a surface of the semiconductor layer; a surface electrode which is an inner peripheral electrode formed on a surface of the semiconductor layer on the inner side of the field insulating film and which runs onto an inner peripheral end of the field insulating film; a peripheral electrode formed on a surface of the semiconductor layer outside the field insulating film and extending over an outer peripheral edge of the field insulating film; a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending beyond an outer circumferential edge of the surface electrode; a semi-insulating film covering a portion of the field insulating film and spaced apart from the surface electrode and the peripheral electrode; a back electrode formed on a back surface side of the semiconductor layer; a moisture-resistant insulating film covering a portion of the field insulating film and covering at least one of an outer peripheral end of the surface electrode and an inner peripheral end of the outer peripheral electrode; the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of an inner region and an outer region of an outer periphery of the well region; A method for manufacturing a semiconductor device, comprising: forming the moisture-resistant insulating film so as to cover the surface electrode, the peripheral electrode and the field insulating film; forming an opening penetrating both the moisture-resistant insulating film and the field insulating film to expose a portion of the semiconductor layer by etching both the moisture-resistant insulating film and the field insulating film using a same etching mask; A method for manufacturing a semiconductor device comprising the steps of:

13. A semiconductor layer of a first conductivity type; a field insulating film formed on a surface of the semiconductor layer; an interlayer insulating film formed on a surface of the semiconductor layer inside the field insulating film and on the field insulating film; an inner circumferential electrode formed on a surface of the semiconductor layer, the inner circumferential electrode including a surface electrode and a control wiring electrode spaced apart from the surface electrode, and extending over the interlayer insulating film; a peripheral electrode formed on a surface of the semiconductor layer outside the field insulating film and the interlayer insulating film and extending over an outer peripheral edge of at least one of the field insulating film and the interlayer insulating film; a well region of a second conductivity type formed in a surface layer portion of the semiconductor layer, connected to the surface electrode, and extending beyond an outer peripheral end of the inner peripheral electrode; a semi-insulating film covering at least a portion of the field insulating film and the interlayer insulating film and spaced apart from the inner peripheral electrode and the outer peripheral electrode; a back electrode formed on a back surface side of the semiconductor layer; a moisture-resistant insulating film covering a part of the field insulating film and covering at least one of an inner peripheral end and an outer peripheral end of the control wiring electrode, an outer peripheral end of the surface electrode, and an inner peripheral end of the outer peripheral electrode; the semi-insulating film is connected to the semiconductor layer through an opening formed in the field insulating film in each of an inner region and an outer region of an outer periphery of the well region; A method for manufacturing a semiconductor device, comprising: forming the moisture-resistant insulating film so as to cover the surface electrode, the peripheral electrode and the field insulating film; forming an opening penetrating both the moisture-resistant insulating film and the field insulating film to expose a portion of the semiconductor layer by etching both the moisture-resistant insulating film and the field insulating film using a same etching mask; A method for manufacturing a semiconductor device comprising the steps of:

14. A method for manufacturing a semiconductor device according to claim 1 or 2, comprising the steps of: forming the semi-insulating film so as to cover the moisture-resistant insulating film; an etching step of etching both the semi-insulating film and the moisture-resistant insulating film using a same etching mask to form openings penetrating both the semi-insulating film and the moisture-resistant insulating film to expose portions of the front surface electrode and the peripheral electrode; A method for manufacturing a semiconductor device comprising the steps of:

15. A method for manufacturing a semiconductor device according to claim 1 or 2, comprising the steps of: forming the semi-insulating film so as to cover the moisture-resistant insulating film; an etching step of etching both the semi-insulating film and the moisture-resistant insulating film using a same etching mask to form an opening penetrating both the semi-insulating film and the moisture-resistant insulating film to expose the front surface electrode and a part of the field insulating film; A method for manufacturing a semiconductor device comprising the steps of:

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