ABSORBER, COMPOSITION, ABSORBING FILM, OPTICAL FILTER, IMAGING DEVICE, AND INFRARED SENSOR

Abstract

To provide an absorber and applications thereof.SOLUTION: The present invention provides an absorber that exhibits excellent compatibility with and solubility in various solvents and resin components as an organic absorber, has excellent heat resistance, and can stably maintain optical properties when kept under high-temperature conditions or high-temperature and high-humidity conditions. The present application can provide an absorbing film to which the absorber is applied and in which desired optical properties are ensured. The present application can also provide applications of the absorber or the absorbing film, and can provide, e.g., an optical filter, a solid-state imaging device and / or an infrared sensor that contain the absorber or absorbing film.SELECTED DRAWING: Figure 7

Description

[Technical field]

[0001] The present application relates to an absorbent and its uses. [Background technology]

[0002] Absorbents, for example those capable of absorbing light in the infrared region, can be used in a variety of applications.

[0003] For example, imaging devices and infrared sensors using CCD (Charge-Coupled Device) or CMOS (complementary metal-oxide-semiconductor) image sensors contain silicon photodiodes that are sensitive to the near-infrared region, and therefore the above-mentioned absorbents can be used.

[0004] There are various methods for applying such absorbents, but usually, a method using a coating liquid in which the absorbent dissolved in a solvent and a resin component are mixed is applied. Therefore, it is necessary for the absorbent to exhibit excellent solubility and compatibility with the above-mentioned solvent and resin component. If the solubility and compatibility of the absorbent with the solvent or resin component are poor, the desired spectral characteristics cannot be obtained for the absorbing film to which the absorbent is applied, or the optical characteristics are deteriorated due to the phenomenon of the absorbent precipitating in the absorbing film. However, it is a difficult task to secure an absorbent that simultaneously exhibits excellent solubility and compatibility with various types of solvents and resin components.

[0005] Absorbents can be classified into inorganic absorbents and organic absorbents, and organic absorbents are easy to apply and easy to control the wavelength of light absorbed, so they can effectively reduce the transmittance of the light to be targeted.However, organic absorbents have lower heat resistance than inorganic absorbents, so after being exposed to high temperature conditions or high temperature and high humidity conditions, the optical properties of the absorbent or the film containing the absorbent may deteriorate. Summary of the Invention [Problem to be solved by the invention]

[0006] The present application aims to provide an absorbent and its uses. The present application aims to provide an absorbent that, as an organic absorbent, shows excellent compatibility and solubility in various solvents and resin components, has excellent heat resistance, and can stably maintain optical properties even when maintained under high temperature conditions or high temperature and high humidity conditions. The present application also aims to apply the absorbent and ensure desired optical properties. The present application also aims to provide uses of the absorbent, for example, to provide an absorbing film, an optical filter, a solid-state imaging device, and / or an infrared sensor formed using the absorbent. [Means for solving the problem]

[0007] Of the physical properties mentioned in this specification, those whose results are affected by the measurement temperature are those measured at room temperature unless otherwise specified. The term room temperature means a natural temperature without heating or cooling, and for example, any one of temperatures within the range of 10°C to 30°C, such as about 23°C or about 25°C. In addition, in this specification, the unit of temperature is Celsius (°C) unless otherwise specified.

[0008] Of the physical properties mentioned in this specification, those whose results are affected by the measurement pressure are those measured at normal pressure unless otherwise specified. The term normal pressure refers to the natural pressure without pressure increase or decrease, and usually means the atmospheric pressure level of about 740mmHg to 780mmHg.

[0009] In this specification, when humidity affects the measurement results of a physical property, the physical property is measured at room temperature and / or normal pressure at natural humidity without any special adjustment.

[0010] When optical properties (eg, refractive index) referred to in this application vary with wavelength, the optical properties are for light of 520 nm wavelength unless otherwise specified.

[0011] In this application, the term transmittance, reflectance, or absorptance means the actual transmittance (measured transmittance), actual reflectance (measured reflectance), or actual absorptance (measured absorptance) confirmed at a specific wavelength or within a wavelength range of a specific region, unless otherwise specified. In this specification, the term transmittance, reflectance, or absorptance is the transmittance, reflectance, or absorptance based on an incident angle of 0 degrees, unless otherwise specified.

[0012] In this application, unless otherwise specified, the term average transmittance refers to the result of measuring the transmittance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in a specified wavelength range, and then calculating the arithmetic average of the measured transmittance. For example, the average transmittance in the wavelength range of 350 nm to 360 nm is the arithmetic average of the transmittance measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0013] In this specification, the term "maximum transmittance" refers to the maximum transmittance measured at each wavelength, increasing the wavelength by 1 nm from the shortest wavelength in a given wavelength range. For example, the maximum transmittance in the wavelength range of 350 nm to 360 nm is the highest transmittance measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0014] In this application, unless otherwise specified, the term average reflectance refers to the result of measuring the reflectance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in a specified wavelength range, and calculating the arithmetic average of the measured reflectance. For example, the average reflectance in the wavelength range of 350 nm to 360 nm is the arithmetic average of the reflectances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0015] In this specification, the term "maximum reflectance" refers to the maximum reflectance measured at each wavelength, increasing the wavelength by 1 nm from the shortest wavelength in a given wavelength range. For example, the maximum reflectance in the wavelength range of 350 nm to 360 nm is the highest reflectance measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0016] In this application, unless otherwise specified, the term average absorptance refers to the result of measuring the absorptance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in a given wavelength range, and then calculating the arithmetic average of the measured absorptance. For example, the average absorptance in the wavelength range of 350 nm to 360 nm is the arithmetic average of the absorptance measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0017] In this specification, the term "maximum absorptance" refers to the maximum absorptance measured at each wavelength, increasing the wavelength by 1 nm from the shortest wavelength in a given wavelength range. For example, the maximum absorptance in the wavelength range of 350 nm to 360 nm is the highest absorptance measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0018] In this specification, the incidence angle is an angle based on the normal line of the surface to be evaluated. For example, the transmittance of an optical filter at an incidence angle of 0 degrees means the transmittance of light incident in a direction substantially parallel to the normal line of the optical filter surface. For example, an incidence angle of 40 degrees is a value for incident light that forms an angle of substantially 40 degrees with the normal line in a clockwise or counterclockwise direction. This definition of the incidence angle is equally applied to other characteristics such as transmittance.

[0019] In this specification, the term alkyl group means an alkyl group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may be optionally substituted with one or more substituents. This applies to all alkyl groups mentioned in this specification unless otherwise specified.

[0020] In the present specification, the term "alkoxy group" refers to an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkoxy group may be linear, branched, or cyclic. The alkoxy group may be optionally substituted with one or more substituents. This applies to all alkoxy groups mentioned in the present specification unless otherwise specified.

[0021] In this specification, the term alkenyl group refers to an alkenyl group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may be optionally substituted with one or more substituents. This applies to all alkenyl groups mentioned in this specification unless otherwise specified.

[0022] In this specification, the term "alkynyl group" refers to an alkynyl group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may be optionally substituted with one or more substituents. This applies to all alkynyl groups mentioned in this specification unless otherwise specified.

[0023] In this specification, the term "aryl group" refers to a monovalent residue derived from an aromatic hydrocarbon, and the aryl group may be an aryl group having 6 to 36 carbon atoms, 6 to 30 carbon atoms, 6 to 24 carbon atoms, 6 to 18 carbon atoms, or 6 to 12 carbon atoms, such as a phenyl group, a tolyl group, a xylyl group, or a naphthyl group. The aryl group may also be optionally substituted with one or more substituents. This applies to all aryl groups mentioned in this specification unless otherwise specified.

[0024] In the present specification, the term "arylalkyl group" refers to an alkyl group substituted with at least one aryl group, and the specific types of the alkyl group and the aryl group are as described above. This applies to all arylalkyl groups mentioned in the present specification unless otherwise specified.

[0025] In this specification, the term alkylidene group refers to a divalent functional group obtained by removing two hydrogen atoms from an alkane, and a functional group obtained by removing a hydrogen atom from one carbon atom of an alkane. Such an alkylidene group may be an alkylidene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkylidene group may be linear, branched, or cyclic. The alkylidene group may be optionally substituted with one or more substituents. This point applies to all alkylidene groups mentioned in this specification unless otherwise specified.

[0026] In this specification, the term alkylene group refers to a divalent functional group obtained by removing two hydrogen atoms from an alkane, and means a functional group obtained by removing one hydrogen atom from each of two different carbon atoms of an alkane. Such an alkylene group may be an alkylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkylene group may be linear, branched, or cyclic. The alkylene group may be optionally substituted with one or more substituents. This point applies to all alkylene groups mentioned in this specification unless otherwise specified.

[0027] In the present specification, the term alkenylene group may be an alkenylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkenylene group may be linear, branched, or cyclic. The alkenylene group may be optionally substituted with one or more substituents. This applies to all alkenylene groups mentioned in the present specification unless otherwise specified.

[0028] In the present specification, the term alkynylene group may be an alkynylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkynylene group may be linear, branched, or cyclic. The alkynylene group may be optionally substituted with one or more substituents. This applies to all alkynylene groups mentioned in the present specification unless otherwise specified.

[0029] The present application relates to absorbents. The term absorbent means a compound capable of absorbing light in any wavelength range.

[0030] The absorbent of the present application may be a compound represented by the following chemical formula 1, or a compound containing a moiety represented by chemical formula 1. In chemical formula 1, due to the silyl group linked to the nitrogen atom, the absorbent can exhibit excellent heat resistance as well as the desired optical properties, and exhibit excellent compatibility with the resin component and / or the solvent. [Chemical formula 1]

[0031] [ka]

[0032] In Chemical Formula 1, A1 to A3 may each independently be hydrogen, a halogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, or an arylalkyl group.

[0033] In Chemical Formula 1, L1 may be a divalent functional group represented by -U1-T1-U2-T2-U3-. In the divalent functional group, T1 and T2 are each independently an oxygen atom or are not present, and U1 to U3 are each independently an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group or are not present. The absence of any symbol means that the atoms on both sides of the symbol are directly connected. For example, when T1 is not present and other elements are present, the divalent functional group is represented by -U1-U2-T2-U3-.

[0034] Among R1 to R8 in Chemical Formula 1, R1 and R2, or R1 to R6, or R3 to R6, or R5 to R8 may be linked to an absorbing group or may form the absorbing group together.

[0035] The phrase "linked to or forming an absorbent" means that the absorbent of the present application as a whole exhibits the property of absorbing light of a desired wavelength due to the structure formed by or linked to R1 and R2, or R1 to R6, or R3 to R6, or R5 to R8. The absorbent will be described later.

[0036] Among R1 to R8 in Chemical Formula 1, the other substituents that are linked to the above absorbing groups or that do not form absorbing groups may each independently be hydrogen, halogen, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an aryl group, an arylalkyl group, an alkylcarbonylamino group, an arylalkylcarbonylamino group, an alkylsulfonylamino group, a haloalkylsulfonylamino group, an arylalkylsulfonylamino group, or an amino group.

[0037] In Chemical Formula 1, the dotted lines are single bonds between nitrogen and carbon, or double bonds between nitrogen and carbon. However, the two dotted lines in Chemical Formula 1 do not necessarily form double bonds. That is, if a double bond exists, one of the two dotted lines is a double bond and the other is a single bond. In addition, if both the dotted lines in Chemical Formula 1 are single bonds, there is no cation symbol in Chemical Formula 1.

[0038] The absorptive group means a portion of the absorbent that has a structure capable of absorbing light of a desired wavelength as a whole. For example, the absorptive group may be a skeleton or structure having a so-called resonance structure and / or a conjugated bond.

[0039] The absorption of light by absorbents, especially organic absorbents, is explained as being due to the energy difference ΔE between the ground state and the excited state, which can also be explained as the energy difference between the HOMO (Highest Unoccupied Molecular Orbital) and the LUMO (Lowest Unoccupied Molecular Orbital).

[0040] Generally, organic absorbents contain resonance structures and / or conjugated bonds as absorbing groups capable of exhibiting light absorbing effects. Therefore, among the above R1 to R8, R1 and R2, or R1 to R6, or R3 to R6, or R5 to R8 contain resonance structures and / or conjugated bonds, and are connected to or form a skeleton for the absorbent to exhibit the desired light absorbing properties as a whole.

[0041] In the present application, the specific type of the absorption group or skeleton is not particularly limited. As is well known, the resonance effect means the interaction between a lone electron pair of a molecule and an adjacent π-bond electron pair, and the substituent or skeleton that causes such a resonance effect is known. In addition, a conjugated bond is a system in which two or more double bonds are formed with one single bond between them, and it is known that the more such conjugated bonds are increased, the smaller the energy difference is, and the absorption band shifts to the long wavelength side.

[0042] For example, the absorption group may be a skeleton or structure that allows the compound of the present application to exhibit an absorption maximum within a wavelength range of 600 nm to 950 nm. That is, the compound may exhibit an absorption maximum wavelength within a range of 600 nm to 950 nm. The lower limit of the absorption maximum wavelength may be 600 nm, 610 nm, 620 nm, 630 nm, 640 nm, 650 nm, 660 nm, 670 nm, 680 nm, 690 nm, 700 nm, 710 nm, 720 nm, 730 nm, 740 nm, 750 nm, 760 nm, 770 nm, 780 nm, or 790 nm in other examples. The upper limit of the absorption maximum wavelength may be about 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, 770nm, 760nm, 750nm, 740nm, 730nm, 720nm, 710nm, 700nm, 690nm, 680nm, 670nm, 660nm, 650nm, 640nm, 630nm, 620nm, or 610nm. The absorption maximum wavelength may be equal to or greater than any one of the lower limits described above and equal to or less than any one of the upper limits described above.

[0043] As described above, the resonance structure and conjugated bond determine the energy difference ΔE between the ground state and excited state of a compound or the energy difference between the highest unoccupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO), and the absorption maximum wavelength is determined by this energy difference. Therefore, the structure of the absorption group can be determined so that the compound has an absorption maximum wavelength in the above-mentioned range.

[0044] The alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, alkylene group, alkylidene group, alkenyl group, alkynyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, haloalkylsulfonylamino group, arylalkylsulfonylamino group, alkylsulfonylamino group, and amino group of Chemical Formula 1 may be optionally substituted with one or more substituents. In this case, examples of the substituent include halogen such as fluorine and chlorine, alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, hydroxy group, cyano group, nitro group, carboxyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, arylalkylsulfonylamino group, alkylsulfonylamino group, and amino group, but are not limited thereto.

[0045] In Chemical Formula 1, A1 to A3 may each independently be an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group, or may be an alkyl group in appropriate examples, but are not limited thereto.

[0046] In Chemical Formula 1, the divalent functional group represented by -U1-T1-U2-T2-U3- can, in appropriate examples, satisfy any one of the following conditions 1 to 3.

[0047] For example, the divalent functional group may be a functional group in which T1, T2, U1, and U3 do not exist, and U2 is an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group (condition 1). In this case, the divalent functional group may be represented by -U2-.

[0048] In another example, the divalent functional group may be such that U1 and U3 are not present, one of T1 and T2 is oxygen, the other is not present, and U2 is an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group (condition 2). In this case, the divalent functional group is a functional group represented by -O-U2- or -U2-O-.

[0049] In another example, the divalent functional group may be such that U3 and T2 are absent, T1 is an oxygen atom, and U1 and U2 are each independently an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group (condition 3). In such a case, the functional group is a functional group represented by -U1-O-U2-.

[0050] Among R1 to R8 in Chemical Formula 1, the substituents that do not form an absorbing group or are not linked to an absorbing group may each be independently hydrogen, a halogen, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an alkylsulfonylamino group, or an amino group, in appropriate examples, or may be hydrogen, an alkyl group, an alkylsulfonylamino group, or an amino group, but are not limited thereto.

[0051] The compound (absorbent) of the present application may have a molar weight at an appropriate level. For example, the lower limit of the molar weight may be about 400 g / mol, 450 g / mol, 500 g / mol, 550 g / mol, 600 g / mol, 650 g / mol, 700 g / mol, or 750 g / mol. The upper limit of the molar weight may be about 2,000 g / mol, 1,900 g / mol, 1,800 g / mol, 1,700 g / mol, 1,600 g / mol, 1,500 g / mol, 1,400 g / mol, 1,300 g / mol, 1,200 g / mol, 1,100 g / mol, 1,000 g / mol, 950 g / mol, 900 g / mol, 850 g / mol, or 800 g / mol. The molar mass may be equal to or greater than any one of the lower limits mentioned above and equal to or less than any one of the upper limits mentioned above.

[0052] The absorbent may have excellent heat resistance. For example, the absorbent may have a 5% thermal decomposition temperature (hereinafter referred to as "Td5%") within a predetermined range. For example, the lower limit of the Td5% of the absorbent may be about 150°C, 160°C, 170°C, 180°C, 190°C, 200°C, 210°C, 220°C, 230°C, 240°C, 250°C, 255°C, or 260°C. The upper limit of the Td5% may be about 400°C, 380°C, 360°C, 340°C, 320°C, 300°C, 280°C, 275°C, 270°C, 265°C, 260°C, 255°C, or 240°C. The Td5% may be equal to or greater than any one of the lower limits described above, and equal to or less than any one of the upper limits described above.

[0053] Td5% is a value determined through TGA (Thermogravimetric analysis) analysis, and is measured in the temperature range of 25°C to 800°C, at a heating rate of 10°C / min, and at a temperature of 60 cm 3 This is the value at 95% weight loss (Td5%) observed under nitrogen (N2) atmosphere conditions at 1000 g / min.

[0054] In one example, the absorbent of the present application may be a so-called squarylium-based compound, that is, the structure of Formula 1 together with the above-mentioned absorbing group can provide the framework of the squarylium-based compound.

[0055] In this case, the absorbent may be, in one example, a compound represented by the following chemical formula 2: [Chemical formula 2]

[0056] [ka]

[0057] The structure of Chemical Formula 2 may be a structure in which R1 to R6, R3 to R6, or R5 to R8 in the structure of Chemical Formula 1 are linked to an adsorbent or form an adsorbent.

[0058] In Chemical Formula 2, A4 to A9 may each independently be a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, or an arylalkyl group.

[0059] In Chemical Formula 2, L2 and L3 may each independently be the same substituents as L1 in Chemical Formula 1 (including appropriate examples).

[0060] In chemical formula 2, R 11 ~R 16 and R 21 ~R 26 may each independently be a hydrogen atom, a halogen atom, a hydroxy group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an aryl group, an arylalkyl group, an alkylcarbonylamino group, a haloalkylsulfonylamino group, an arylalkylcarbonylamino group, an alkylsulfonylamino group, an amino group, or an arylalkylsulfonylamino group.

[0061] The alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, alkylene group, alkylidene group, alkenyl group, alkynyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, arylalkylsulfonylamino group, alkylsulfonylamino group, and amino group of Chemical Formula 2 may be optionally substituted with one or more substituents. In this case, examples of the substituents include halogen such as fluorine and chlorine, alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, hydroxy group, cyano group, nitro group, carboxyl group, alkylsulfonylamino group, and amino group, but are not limited thereto.

[0062] In Chemical Formula 2, A4 to A9 may each independently be an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group, or an alkyl group in appropriate examples, but are not limited thereto.

[0063] In chemical formula 2, R11 ~R 16 and R 21 ~R 26 In appropriate examples, each independently is or may be, but is not limited to, a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an alkylsulfonylamino group, or an amino group.

[0064] Compounds of formula 2 may exhibit the absorption maximum wavelength, molar mass, and / or Td5% described above.

[0065] In another example, the absorbent may be a compound represented by the following formula 3: [Chemical formula 3]

[0066] [ka]

[0067] The structure of Chemical Formula 3 may be a structure in which R1 to R6, R3 to R6, or R5 to R8 in the structure of Chemical Formula 1 are linked to an adsorbent or form an adsorbent.

[0068] In chemical formula 3, A7~A 12 may each independently be hydrogen, a halogen, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, or an arylalkyl group.

[0069] In Chemical Formula 3, L4 and L5 may each independently be the same substituents as L1 in Chemical Formula 1 (including appropriate examples).

[0070] In chemical formula 3, R 31 ~R 38 and R 41 ~R 48may each independently be a hydrogen atom, a halogen atom, a hydroxy group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an alkylcarbonylamino group, an arylalkylcarbonylamino group, a haloalkylsulfonylamino group, an amino group, an arylalkylsulfonylamino group, an alkylsulfonylamino group, an aryl group, or an arylalkyl group.

[0071] The alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, alkylene group, alkylidene group, alkenyl group, alkynyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, arylalkylsulfonylamino group, alkylsulfonylamino group, and amino group in Chemical Formula 3 may be optionally substituted with one or more substituents. In this case, examples of the substituents include halogen such as fluorine and chlorine, alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, hydroxy group, cyano group, nitro group, carboxyl group, alkylsulfonylamino group, and amino group, but are not limited thereto.

[0072] In chemical formula 3, A7~A 12 In appropriate examples, each independently may be, but is not limited to, an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group.

[0073] In chemical formula 3, R 31 ~R 38 and R 41 ~R 48 In appropriate examples, each independently is or may be, but is not limited to, a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an alkylsulfonylamino group, or an amino group.

[0074] Compounds of formula 3 may exhibit the absorption maximum wavelength, molar mass and / or Td5% as described above.

[0075] In another example, the absorbent may be a compound represented by the following formula 4: [Chemical formula 4]

[0076] [ka]

[0077] The structure of Chemical Formula 4 may be a structure formed by linking R1 and R2 in the structure of Chemical Formula 1 to an adsorbent or forming an adsorbent.

[0078] In chemical formula 4, A 13 ~A 18 may each independently be hydrogen, a halogen, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, or an arylalkyl group.

[0079] In Chemical Formula 4, L6 and L7 may each independently be the same substituents as L1 in Chemical Formula 1 (including appropriate examples).

[0080] In chemical formula 4, R 51 ~R 57 and R 61 ~R 67 may each independently be a hydrogen atom, a halogen atom, a hydroxy group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an aryl group, an amino group, an alkylcarbonylamino group, a haloalkylsulfonylamino group, an arylalkylcarbonylamino group, an alkylsulfonylamino group, an arylalkylsulfonylamino group, or an arylalkyl group.

[0081] The alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, alkylene group, alkylidene group, alkenyl group, alkynyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, arylalkylsulfonylamino group, alkylsulfonylamino group, and amino group of Chemical Formula 4 may be optionally substituted with one or more substituents. In this case, examples of the substituents include halogen such as fluorine and chlorine, alkyl group, alkenyl group, alkynyl group, alkoxy group, aryl group, arylalkyl group, hydroxy group, cyano group, nitro group, carboxyl group, alkylsulfonylamino group, and amino group, but are not limited thereto.

[0082] In chemical formula 4, A 13 ~A 18 may each independently be, but is not limited to, an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group, in appropriate examples.

[0083] In chemical formula 4, R 51 ~R 57 and R 61 ~R 67 In appropriate examples, each independently is or may be, but is not limited to, a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an alkylsulfonylamino group, or an amino group.

[0084] Compounds of formula 4 may exhibit the above-mentioned maximum absorption wavelengths, molar masses and / or Td5%.

[0085] In the present application, there is no particular limitation on the method for producing the absorbents, for example, the absorbents of Chemical Formulae 2 to 4. Various methods for producing squarylium-based compounds are known in the art, and in the present application, a compound having a desired structure can be synthesized with reference to such known methods.

[0086] The present application also relates to an absorbent composition comprising the absorbent. The term absorbent composition may refer to a mixture containing an absorbent and other components or a mixture containing two or more absorbents. Such an absorbent composition basically contains the absorbent of Chemical Formula 1, and may further contain other necessary components. For example, the composition may further contain a resin component that acts as a binder. In this case, there is no particular limitation on the type of resin component applied, and known resin components used to form an absorbing film, for example, a near-infrared absorbing film, may be applied. In the present application, the absorbent component may exhibit appropriate compatibility or solubility with various known resin components.

[0087] Examples of the resin component include, but are not limited to, one or more of cyclic olefin (COP) resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, and silicone resins, as well as various other organic resins or organic-inorganic hybrid resins.

[0088] Although not particularly limited, the absorbent of the present application can be mixed with a silicone resin, which is one of the known resin components that act as a binder, to form an absorbent film that exhibits excellent performance. Therefore, in one example, the resin component may be a silicone resin.

[0089] When applying a resin component, there is no particular limit to its ratio. For example, the resin component may be present such that the weight ratio of the absorbent to 100 parts by weight of the resin component is in the range of 0.001 parts by weight to 10 parts by weight. The lower limit of the weight ratio of the absorbent to 100 parts by weight of the resin component may be about 0.001 parts by weight, 0.005 parts by weight, 0.01 parts by weight, 0.05 parts by weight, 0.1 parts by weight, 0.5 parts by weight, 1 part by weight, 1.1 parts by weight, 1.2 parts by weight, 1.3 parts by weight, or 1.4 parts by weight in other examples, and the upper limit may be about 10 parts by weight, 9 parts by weight, 8 parts by weight, 7 parts by weight, 6 parts by weight, 5 parts by weight, 4 parts by weight, 3 parts by weight, 2 parts by weight, or 1.5 parts by weight. The above ratio may be equal to or greater than any one of the lower limits described above, and equal to or less than any one of the upper limits described above.

[0090] For example, the absorbent composition may further contain a solvent for dispersing the absorbent and / or the resin component. In such a case, the type of the solvent to be applied is not particularly limited, and a known solvent used for forming an absorbing film, for example, a near-infrared absorbing film, may be applied. In the present application, the absorbent component may exhibit appropriate compatibility and solubility in various known solvents.

[0091] Examples of solvents include, but are not limited to, methylene chloride, cyclohexanone, toluene, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol methyl ether acetate, diethylene glycol monoethyl ether 3-methoxybutanol, ethylene glycol monobutyl ether acetate, 4-hydroxy-4-methyl-2-pentanone, gamma butyrolactone, cyclohexanone, pyridone, chloroform, 1,4-dioxane, cyclohexanone, ortho-dichlorobenzene, chlorobenzene, aliphatic alcohols having two or more carbon atoms (e.g., isobutyl alcohol, isopropyl alcohol, ethanol, isopropanol, butanol, etc.), butyl acetate, tetrahydrofuran, or xylene.

[0092] When a solvent is used, the ratio is not particularly limited, and the ratio can be adjusted within a range that allows suitable dispersion of the absorbent and / or resin component.

[0093] The absorbent composition may contain other necessary components in addition to the above-mentioned components, for example, an absorbent of a different type from the absorbent of Chemical Formula 1.

[0094] The present application also relates to uses of the absorbent composition or the absorbent. For example, the present application relates to an absorbent film to which the absorbent composition or the absorbent is applied. Such an absorbent film may contain at least a resin component and the absorbent. In this case, the specific type of the resin component and the ratio of the resin component to the absorbent are as described in the absorbent composition section.

[0095] The absorbing film may be a film that can absorb light within a predetermined wavelength range. In one example, the absorbing film may be an infrared absorbing film or a near infrared absorbing film. Such an absorbing film may exhibit absorption characteristics in at least a part of the wavelength range, for example, within a wavelength range of about 600 nm to 950 nm.

[0096] For example, the absorbing film may exhibit a maximum absorption wavelength within the range of 600 nm to 950 nm. In other examples, the lower limit of the maximum absorption wavelength may be 600 nm, 610 nm, 620 nm, 630 nm, 640 nm, 650 nm, 660 nm, 670 nm, 680 nm, 690 nm, 700 nm, 710 nm, 720 nm, 730 nm, 740 nm, 750 nm, 760 nm, 770 nm, 780 nm, or 790 nm. The upper limit of the absorption maximum wavelength may be about 950 nm, 940 nm, 930 nm, 920 nm, 910 nm, 900 nm, 890 nm, 880 nm, 870 nm, 860 nm, 850 nm, 840 nm, 830 nm, 820 nm, 810 nm, 800 nm, 790 nm, 780 nm, 770 nm, 760 nm, 750 nm, 740 nm, 730 nm, 720 nm, 710 nm, 700 nm, 690 nm, 680 nm, 670 nm, 660 nm, 650 nm, 640 nm, 630 nm, 620 nm, or 610 nm. The absorption maximum wavelength may be equal to or greater than any one of the lower limits described above and equal to or less than any one of the upper limits described above.

[0097] The absorbing film having such properties can be applied to various devices such as optical filters and infrared sensors, and has excellent optical properties such as preventing the shift phenomenon caused by the incident angle, and has excellent physical properties such as excellent heat resistance.

[0098] For example, the absorbing film may have an absolute value of ΔA in the following formula 1 of 20% or less. [Formula 1] △A=100×(A f -A i ) / A i In formula 1, A f is the transmittance at the absorption maximum wavelength of the absorbing film maintained at 85° C. and 85% relative humidity for 120 hours, and A i is the transmittance at the absorption maximum wavelength of the absorbing film before being maintained at 85° C. and a relative humidity of 85% for 120 hours, and the absorption maximum wavelength is within the wavelength range of 600 nm to 950 nm.

[0099] In other examples, the upper limit of the absolute value of ΔA in formula 1 may be about 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8%, or 7%, and the lower limit may be about 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, or 8%. The absolute value of ΔA may be equal to or greater than any one of the lower limits described above and equal to or less than any one of the upper limits described above.

[0100] In formula 1, A f and A i In formula 1, A may be about 20% or less. f and A i In other examples, the respective upper limits may be about 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8%, or 7%, and the lower limits may be about 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, or 8%. f and A i Each of the above may be equal to or greater than any one of the above-mentioned lower limits, and may be equal to or less than any one of the above-mentioned upper limits.

[0101] The absorbing film may have an absolute value of Δλ in the following formula 2 of 10% or less. [Formula 2] △λ=100×(λ f -λ i ) / λ i In equation 2, λ f is the absorption maximum wavelength of the absorbing film maintained at 85° C. and 85% relative humidity for 120 hours, and λ i is the maximum absorption wavelength of the absorbing film before being maintained at 85° C. and 85% relative humidity for 120 hours, and the maximum absorption wavelength is within the wavelength range of 600 nm to 950 nm.

[0102] In other examples, the upper limit of the absolute value of Δλ in Equation 2 may be about 10%, 9%, 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, or 0.5%, and the lower limit may be about 0%, 0.5%, or 1%. The absolute value of Δλ may be equal to or greater than any one of the above-mentioned lower limits and equal to or less than any one of the above-mentioned upper limits.

[0103] In equation 2, λ f and λ i may each be in the range of 600 nm to 950 nm. f and λ i In other examples, the respective lower limits may be 600 nm, 610 nm, 620 nm, 630 nm, 640 nm, 650 nm, 660 nm, 670 nm, 680 nm, 690 nm, 700 nm, 710 nm, 720 nm, 730 nm, 740 nm, 750 nm, 760 nm, 770 nm, 780 nm, or 790 nm. f and λ i The respective upper limits may be about 950 nm, 940 nm, 930 nm, 920 nm, 910 nm, 900 nm, 890 nm, 880 nm, 870 nm, 860 nm, 850 nm, 840 nm, 830 nm, 820 nm, 810 nm, 800 nm, 790 nm, 780 nm, 770 nm, 760 nm, 750 nm, 740 nm, 730 nm, 720 nm, 710 nm, 700 nm, 690 nm, 680 nm, 670 nm, 660 nm, 650 nm, 640 nm, 630 nm, 620 nm, or 610 nm. f and λ i Each of these may be equal to or greater than any one of the lower limits mentioned above, and may be equal to or less than any one of the upper limits.

[0104] Due to the absorption properties, the absorbing film can be applied to various devices such as optical filters and infrared sensors, and can efficiently achieve the desired properties.

[0105] In the present application, the absorbent film can be formed by a known method as long as the absorbent composition or absorbent of the present application is applied. For example, the absorbent composition can be coated by an appropriate method, and if necessary, a curing or drying process can be performed to form the absorbent film. There is no particular limit to the thickness of the absorbent film, and it can be adjusted in consideration of the desired characteristics. In one example, the absorbent film may have a thickness within the range of about 0.5 to 20 μm.

[0106] The present application also relates to an optical filter. The optical filter may include a substrate layer and the above-mentioned absorbing film formed on one or both sides of the substrate layer. FIG. 1 is a diagram showing an example of an optical filter in which an absorbing film 200 is formed on one side of a substrate layer 100. The optical filter of the present application can exhibit excellent performance by including the above-mentioned absorbing film, for example, the optical filter can realize a visible light transmission band with high transmittance while efficiently and accurately blocking unnecessary infrared light.

[0107] There is no particular limitation on the type of transparent substrate applied to the optical filter, and a known transparent substrate for optical filters can be used. In one example, the base layer may be a so-called infrared absorbing substrate. The infrared absorbing substrate is a substrate that exhibits absorption characteristics in at least a part of the infrared region. So-called blue glass, which exhibits the above characteristics by containing copper, is a typical example of an infrared absorbing substrate. Such an infrared absorbing substrate is useful for constructing an optical filter that blocks light in the infrared region, but is disadvantageous in terms of ensuring high transmittance in the visible light region due to the above absorption characteristics, and is also disadvantageous in terms of durability. In the present application, by selecting an infrared absorbing substrate and combining it with the specific absorbing film, an optical filter that efficiently blocks desired light, exhibits high transmittance characteristics in the visible light region, and has excellent durability can be provided.

[0108] The infrared absorbing substrate may be a substrate exhibiting an average transmittance of 75% or more in the range of 425 nm to 560 nm. In other examples, the average transmittance may be in the range of 77% or more, 79% or more, 81% or more, 83% or more, 85% or more, 87% or more, or 89% or more, and / or in the range of 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0109] The infrared absorbing substrate may be a substrate that exhibits a maximum transmittance of 80% or more in the range of 425 nm to 560 nm. In other examples, the maximum transmittance may be in the range of 82% or more, 84% or more, 86% or more, 88% or more, or 90% or more, and / or 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0110] The infrared absorbing substrate may be a substrate exhibiting an average transmittance of 75% or more in the range of 350 nm to 390 nm. In other examples, the average transmittance may be in the range of 77% or more, 79% or more, 81% or more, or 83% or more, and / or in the range of 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, 88% or less, 86% or less, or 84% or less.

[0111] The infrared absorbing substrate may be a substrate that exhibits a maximum transmittance of 80% or more in the range of 350 nm to 390 nm. In other examples, the maximum transmittance may be in the range of 82% or more, 84% or more, 86% or more, or 87% or more, and / or 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, or 88% or less.

[0112] The infrared absorbing substrate may have a transmittance of 10% to 45% at a wavelength of 700 nm. In other examples, the transmittance may be about 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less, or 29% or less, or about 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, or 28% or more.

[0113] The infrared absorbing substrate may be a substrate exhibiting an average transmittance within a range of 5% to 30% within a range of 700 nm to 800 nm. In other examples, the average transmittance may be within a range of 7% or more, 9% or more, 11% or more, 13% or more, 15% or more, 15.5% or more, 16% or more, or 16.5% or more, and / or within a range of 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less, or 17% or less.

[0114] The infrared absorbing substrate may be a substrate that exhibits a maximum transmittance within a range of 10% to 45% within a range of 700 nm to 800 nm. In other examples, the maximum transmittance may be within a range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, or 28% or more, and / or within a range of 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less, or 29% or less.

[0115] The infrared absorbing substrate may be a substrate exhibiting an average transmittance in the range of 3% to 20% in the range of 800 nm to 1000 nm. In other examples, the average transmittance may be further adjusted to within the range of 5% or more, 7% or more, 9% or more, or 11% or more, and / or 18% or less, 16% or less, 14% or less, or 12% or less.

[0116] The infrared absorbing substrate may be a substrate that exhibits a maximum transmittance in the range of 5% to 30% in the range of 800 nm to 1000 nm. In other examples, the maximum transmittance may be in the range of 7% or more, 9% or more, 11% or more, 13% or more, or 15% or more, and / or in the range of 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less, or 16% or less.

[0117] As the infrared absorbing substrate, a substrate showing an average transmittance in the range of 10% to 50% in the range of 1000 nm to 1200 nm can be applied. In other examples, the average transmittance can be further adjusted within the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, or 25% or more, and / or within the range of 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, 36% or less, 34% or less, 32% or less, 30% or less, 28% or less, or 26% or less.

[0118] As the infrared absorbing substrate, a substrate showing a maximum transmittance in the range of 10% to 70% in the range of 1000 nm to 1200 nm can be used. In other examples, the maximum transmittance may be in the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, 28% or more, 30% or more, 32% or more, 34% or more, or 36% or more, and / or in the range of 68% or less, 66% or less, 64% or less, 62% or less, 60% or less, 58% or less, 56% or less, 54% or less, 52% or less, 50% or less, 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, or 37% or less.

[0119] The infrared absorbing substrate can be combined with the absorbing film of the present application to form the desired optical filter. As such a substrate, a substrate known as infrared absorbing glass can be used. Such glass is an absorbing glass manufactured by adding CuO or the like to fluorophosphate glass or phosphate glass. Therefore, in one example, in the present application, a CuO-containing fluorophosphate glass substrate or a CuO-containing phosphate glass substrate may be used as the infrared absorbing substrate. Phosphate glass also includes silicophosphate glass in which a part of the glass skeleton is composed of SiO2. Such absorbing glass is publicly known, and for example, glass disclosed in Korean Patent Registration No. 10-2056613 and other commercially available absorbing glasses (for example, commercially available products from Hoya, Schott, PTOT, etc.) can be used.

[0120] Such an infrared absorbing substrate contains copper. In the present application, a substrate having a copper content in the range of 1% by weight to 7% by weight can be used. In other examples, the copper content may be about 1.5% by weight or more, 2% by weight or more, 2.5% by weight or more, 2.6% by weight or more, 2.7% by weight or more, or 2.8% by weight or more, or about 6.5% by weight or less, 6% by weight or less, 5.5% by weight or less, 5% by weight or less, 4.5% by weight or less, 4% by weight or less, 3.5% by weight or less, 3% by weight or less, or 2.9% by weight or less. A substrate having such a copper content is likely to exhibit the above-mentioned optical properties, and can be combined with the above-mentioned absorbing film to form an optical filter with desired properties.

[0121] The copper content can be confirmed using an X-ray fluorescence analysis device (WD XRF, Wavelength Dispersive X-Ray Fluorescence Spectrometry). When the test piece (base layer) is irradiated with X-rays using the device, characteristic secondary X-rays are generated from the individual elements of the test piece, and the device detects the secondary X-rays at wavelengths specific to each element. The intensity of the secondary X-rays is proportional to the element content, so quantitative analysis can be performed through the intensity of the secondary X-rays measured at element-specific wavelengths.

[0122] The thickness of the infrared absorbing substrate can be adjusted within a range of, for example, about 0.03 mm to 5 mm, but is not limited thereto.

[0123] The optical filter of the present application may further include other known components necessary in addition to the above-mentioned base layer and absorbing film. For example, the optical filter may further include a dielectric film. For example, the optical filter may further include a so-called dielectric film on one or both sides of the base layer.

[0124] 2 and 3 show an example of an optical filter to which a dielectric film 300 is added, and show a case where the dielectric film 300 is formed on one or both sides of a laminated structure including a base layer 100 and an absorbing film 200. Such a dielectric film is a film formed by repeatedly laminating a dielectric material with a low refractive index and a dielectric material with a high refractive index, and is used to form a so-called IR reflection layer and an AR (Anti-reflection) layer, and such a known dielectric film for forming an IR reflection layer or an AR layer can be applied in the present application. Therefore, the dielectric film may be a multilayer structure including at least two types of sublayers each having a different refractive index from each other, or may include a multilayer structure in which two types of sublayers are repeatedly laminated.

[0125] The material forming the dielectric film, i.e., the type of material forming each sub-layer is not particularly limited, and known materials can be applied. Usually, SiO2 or fluorides such as Na5Al3F14, Na3AlF6, or MgF2 are applied to manufacture the low refractive index sub-layer, and amorphous silicon, TiO2, Ta2O5, Nb2O5, ZnS, or ZnSe can be applied to manufacture the high refractive index sub-layer, but the materials applied in this application are not limited to the above.

[0126] The method for forming the dielectric film is not particularly limited, and for example, the dielectric film may be formed by applying a known deposition method. In the art, a method for controlling the reflection and transmission characteristics of the dielectric film by taking into consideration the deposition thickness of the sub-layer, the number of layers, etc. is known, and in the present application, the dielectric film may be formed by such a known method.

[0127] In one example, the dielectric film included in the optical filter of the present application may have a shortest wavelength of 710 nm or more at which the reflectance of 50% is shown in the wavelength range of 600 nm to 900 nm, or the shortest wavelength may not exist. In addition, when the shortest wavelength does not exist, the maximum reflectance of the dielectric film is less than 50% in the wavelength range of 600 nm to 900 nm. When the shortest wavelength exists, the shortest wavelength at which the reflectance of 50% is shown may be, in other examples, 715 nm or more, 720 nm or more, 725 nm or more, 730 nm or more, 735 nm or more, 740 nm or more, 745 nm or more, 750 nm or more, or 754 nm or more, or may be 900 nm or less, 850 nm or less, 800 nm or less, 790 nm or less, 780 nm or less, 770 nm or less, or about 760 nm or less. The shortest wavelength at which the reflectance of 50% is shown may be within the range between any one of the lower limits and the upper limit of the above-mentioned lower limits, and in this case, the upper limit may be 900 nm.

[0128] By controlling the reflection characteristics of the dielectric film as described above, it is possible to prevent the so-called petal flare phenomenon. The petal flare phenomenon refers to a phenomenon in which red lines that are not visible to the naked eye are reflected in a photograph when a light-emitting object is photographed, and is often called petal flare because the red lines take on a shape resembling a petal based on the light-emitting object. The frequency of petal flare is increasing as the sensitivity of sensors included in imaging devices increases and the transmittance of optical filters and the like is increased to obtain clearer photographs.

[0129] One of the causes of the petal flare phenomenon is thought to be repeated reflection of near-infrared light within an imaging device equipped with an optical filter. Normally, the dielectric film formed on an optical filter, particularly the so-called IR film, is formed to reflect and block light in the near-infrared region, so the shortest wavelength at which the dielectric film shows a reflectance of 50% is close to visible light, usually less than 710 nm. However, such a dielectric film promotes reflection of near-infrared light within the imaging device, which causes the petal flare phenomenon.

[0130] However, in the present application, by applying the above-mentioned absorbing film, even when the shortest wavelength at which the dielectric film shows 50% reflectance is adjusted to 710 nm or more, it is possible to effectively block infrared light and prevent the petal flare phenomenon. The design method for adjusting the reflectance characteristics of the dielectric film is publicly known.

[0131] The optical filter may further include an absorbing film (hereinafter, ultraviolet absorbing film) that exhibits an absorbing property against ultraviolet light as an absorbing film distinct from the absorbing film. However, such an absorbing film is not essential, and for example, an ultraviolet absorber described later may be introduced into one absorbing film together with an absorber of Chemical Formula 1. In one example, the ultraviolet absorbing film may be designed to exhibit an absorption maximum in a wavelength region of about 300 nm to 390 nm. The ultraviolet absorbing film may contain only an ultraviolet absorber, or may contain two or more ultraviolet absorbers if necessary.

[0132] For example, as the ultraviolet absorber, a known absorber that exhibits an absorption maximum in the wavelength region of about 300 nm to 390 nm can be used. Examples of such an absorber include ABS 407 from Exiton; UV381A, UV381B, UV382A, UV386A, and VIS404A from QCR Solutions Corp; and ADA1225, ADA3209, ADA3216, ADA3217, ADA3218, ADA3230, ADA5205, ADA3217, ADA2055, ADA6798, ADA3102, ADA3204, ADA3210, ADA2041, ADA3201, ADA3202, ADA3215, ADA3219, ADA3225, ADA3232, ADA4160, ADA5278, ADA5762, ADA6826, and ADA7 from HW Sands. 226, ADA4634, ADA3213, ADA3227, ADA5922, ADA5950, ADA6752, ADA7130, ADA8212, ADA2984, ADA2999, ADA3220, ADA3228, ADA3235, ADA3240, ADA3211, ADA3221, ADA5220, ADA7158; CRYSTALYN's DLS381B, DLS381C, DLS382A, DLS386A, DLS404A, DLS405A, DLS405C, DLS403A, and the like, but are not limited thereto.

[0133] The material and method of constructing such an ultraviolet absorbing film are not particularly limited, and known materials and methods can be applied. Usually, the ultraviolet absorbing film is formed using a material in which an ultraviolet absorber capable of showing the desired absorption maximum is mixed with a transparent resin. In this case, the resin component applied to the absorbent composition can be applied as the transparent resin.

[0134] In addition to the above-mentioned layers, various other layers may be added as necessary to the optical filter as long as the desired effect is not impaired.

[0135] The present application also relates to an imaging device including the optical filter. In this case, the configuration method of the imaging device and the application method of the optical filter are not particularly limited, and known configurations and application methods can be applied. In addition, the use of the optical filter of the present application is not limited to imaging devices, and it can be applied to various other uses that require near-infrared blocking (for example, display devices such as PDPs, etc.).

[0136] The present application also relates to an infrared sensor including the above-mentioned absorbing film. The configuration of the infrared sensor is not particularly limited as long as it includes the absorbing film of the present application, and can be configured by introducing the absorbing film of the present application into a known motion sensor, proximity sensor, or gesture sensor, for example.

[0137] Furthermore, the applications of the absorbent composition or absorbing film of the present application are not limited to optical filters, infrared sensors and / or imaging devices, but can also be applied to various other applications requiring infrared blocking (e.g., display devices such as PDPs, etc.). Effect of the Invention

[0138] The present application can provide an absorbent and uses thereof. The present application can provide an absorbent that, as an organic absorbent, exhibits excellent compatibility and solubility in various solvents and resin components, has excellent heat resistance, and can stably maintain optical properties even when maintained under high temperature conditions or high temperature and high humidity conditions. The present application can provide an absorbing film that uses the absorbent and ensures desired optical properties. The present application can also provide uses of the absorbent or absorbing film, and can provide, for example, an optical filter, a solid-state imaging device, and / or an infrared sensor that include the absorbent or absorbing film. [Brief description of the drawings]

[0139] [Figure 1] 1 illustrates an exemplary structure of an optical filter of the present application. [Diagram 2] 1 illustrates an exemplary structure of an optical filter of the present application. [Diagram 3] 1 illustrates an exemplary structure of an optical filter of the present application. [Figure 4] 4 shows the absorption spectra of the absorbents produced in the examples and comparative examples. [Diagram 5] 4 shows the absorption spectra of the absorbents produced in the examples and comparative examples. [Figure 6] 4 shows the absorption spectra of the absorbents produced in the examples and comparative examples. [Figure 7] FIG. 13 is a graph showing the light absorption characteristics of an absorbing film containing an absorbent according to an embodiment or a comparative example before and after a high-temperature, high-humidity evaluation. [Figure 8] FIG. 13 is a graph showing the light absorption characteristics of an absorbing film containing an absorbent according to an embodiment or a comparative example before and after a high-temperature, high-humidity evaluation. [Figure 9] FIG. 13 is a graph showing the light absorption characteristics of an absorbing film containing an absorbent according to an embodiment or a comparative example before and after a high-temperature, high-humidity evaluation. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0140] The optical filter of the present application will be specifically described below with reference to examples. However, the scope of the optical filter of the present application is not limited to the following examples.

[0141] 1. Method for measuring maximum absorption The absorption maximum was evaluated by the usual method. Specifically, the sample was dissolved in chloroform for about 10 -5 After dissolving at a concentration of M, the concentration was evaluated using a measurement device (Agilent, Varian Cary 4000).

[0142] 2. Evaluation of transmittance spectrum The transmittance spectrum was measured using a spectrophotometer (manufacturer: Perkinelmer, product name: Lambda750 spectrophotometer) using a test piece obtained by cutting the measurement object (e.g., an absorbing film) to a width and length of 10 mm and 10 mm, respectively. The transmittance spectrum was measured for each wavelength and incident angle according to the manual of the above equipment. The test piece was placed on a straight line between the measurement beam and the detector of the spectrophotometer, and the transmittance spectrum was confirmed while changing the incident angle of the measurement beam from 0 degrees to 40 degrees. Unless otherwise specified, the results of the transmittance spectrum in this example are the results when the incident angle is 0 degrees. An incident angle of 0 degrees is a direction substantially parallel to the surface normal direction of the test piece.

[0143] In the transmittance spectrum, the average transmittance in a given wavelength range is the result of measuring the transmittance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in the wavelength range, and calculating the arithmetic average of the measured transmittances, and the maximum transmittance is the maximum transmittance among the transmittances measured while increasing the wavelength by 1 nm. For example, the average transmittance in the wavelength range of 350nm to 360nm is the arithmetic average of the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm, and 360nm, and the maximum transmittance in the wavelength range of 350nm to 360nm is the highest transmittance among the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm, and 360nm.

[0144] 3. Method for measuring solubility The solubility of the absorbent was evaluated by evaluating the solubility of the absorbent in a solvent (MC, Methylene Chloride) at room temperature (about 25°C) and judging according to the following criteria.

[0145] <Solubility criteria> A: When the solubility is 1% by mass or more B: When the solubility is 0.5% by mass or more and less than 1% by mass C: When the solubility is 0.2% by mass or more and less than 0.5% by mass D: When the solubility is less than 0.2% by mass

[0146] 4. Analysis of thermal decomposition temperature (Td5%) Thermogravimetric analysis (TGA) was performed using a Scinco TGA N-1000. Approximately 3 mg of sample (absorbent) was used for the analysis. The temperature range was 25°C to 800°C, the heating rate was 10°C / min, and the heating time was 60 cm. 3 The analysis was performed in a nitrogen (N2) atmosphere at 10000 / min. The Td decomposition temperature was the value at 95% weight loss (Td5%).

[0147] 5.Mass analysis (Maldi-tof) Mass analysis of the synthesized compounds was performed using a MALDI TOF Voyager DE-STR (Applied Biosystems, USA) in reflector mode to positive mode, and analyzed using a dithranol matrix.

[0148] Example 1. Preparation of compound (A1) The compound of the following formula A1 was synthesized according to the following reaction scheme 1. [Reaction Scheme 1]

[0149] [ka]

[0150] 1.5 g (0.0054 mol) of compound A in reaction formula 1, 0.4 g (0.0027 mol) of squaric acid, and 1.5 g of triethyl orthoformate were dissolved in 15 mL of n-butanol and reacted at 95°C for 4 hours. After the reaction, the mixture was cooled to room temperature (about 25°C), 300 mL of ethanol was added, and the precipitate obtained by stirring for more than 6 hours was filtered under reduced pressure to obtain the target compound (chemical formula A1) (0.7 g, 40%) (Maldi-tof m / z 629.52 [M+H] + ).

[0151] 4 shows the absorption spectrum of the compound of formula A1. It can be seen from FIG. 4 that the compound of formula A1 has a maximum absorption wavelength of about 652 nm.

[0152] Example 2. Preparation of compound (A2) The compound of the following chemical formula A2 was synthesized according to the following reaction scheme 2. [Reaction Scheme 2]

[0153] [ka]

[0154] 2.5g (0.0076mol) of compound B in reaction formula 2, 0.43g (0.0038mol) of squaric acid, and 2.5g of triethyl orthoformate were dissolved in 25mL of n-butanol and reacted at 95℃ for 4 hours. After the reaction, the mixture was cooled to room temperature (about 25℃), 300mL of ethanol was added, and the precipitate obtained by stirring for more than 6 hours was filtered under reduced pressure to obtain the target compound (chemical formula A2) (1.3g, 47.6%) (Maldi-tof m / z 729.8[M+H]+).

[0155] 5 is an absorption spectrum of the compound of the chemical formula A2. It can be seen from FIG. 5 that the compound of the chemical formula A2 has a maximum absorption wavelength of about 772 nm.

[0156] Comparative Example 1. Preparation of Compound (A3) The compound of the following formula A3 was synthesized according to the following reaction scheme 3. [Reaction Scheme 3]

[0157] [ka]

[0158] 3.9g (0.015mol) of compound C in reaction formula 3, 0.9g (0.0079mol) of squaric acid, and 2g of triethyl orthoformate were dissolved in 30mL of n-butanol and reacted at 95°C for 4 hours. After the reaction, the mixture was cooled to room temperature (about 25°C), 300mL of ethanol was added, and the precipitate obtained by stirring for more than 6 hours was filtered under reduced pressure to obtain the target compound (chemical formula A3) (1.2g, 27.2%) (Maldi-tof m / z 568.90[M+H] + ).

[0159] 6 shows the absorption spectrum of the compound of formula A3, which shows that the compound of formula A3 has a maximum absorption wavelength of about 738 nm.

[0160] Table 1 summarizes the properties of the absorbents of Examples 1 and 2, and Comparative Example 1. In Table 1, Td5% means the 5% thermal decomposition temperature.

[0161] [Table 1]

[0162] Test example 1. A silicone resin (Dow Chemical, RSN-0217) as a resin component, an absorbent, and a solvent (cyclohexanone) were mixed to prepare a coating liquid. The mixing ratio of the resin component, absorbent, and solvent was 69.3:0.99:29.7 by weight ratio (resin:absorbent:solvent). The above coating liquid was coated on a transparent substrate (SCHOTT, glass substrate) and maintained at 140°C for about 2 hours to prepare an absorbent film with a thickness of about 6 μm. The absorbent of Example 1, Example 2, or Comparative Example 1 was applied as the absorbent.

[0163] Table 2 summarizes the transmittance of the absorbing film in the ultraviolet and near infrared regions before and after a reliability evaluation. The reliability evaluation involved maintaining the absorbing film at 85°C and 85% relative humidity for 120 hours. In Table 2, B indicates the result before the reliability evaluation, and A indicates the result after the reliability evaluation. Also in Table 2, Λmax indicates the transmittance at the absorption maximum.

[0164] In Table 2, △ indicates the rate of change (%) of each characteristic before and after the reliability evaluation, and is calculated as 100 × (AB) / B. Here, A is the value shown as A in Table 2, and B is the value shown as B in Table 2. In Table 2, T max is the maximum transmittance in the wavelength range, T ave is the average transmittance in the wavelength range, T min means the minimum transmittance within the wavelength region.

[0165] [Table 2]

[0166] Test example 2. As the absorbing film produced in Test Example 1, the absorption spectrum of the absorbing film produced using the absorbent of Example 1 is shown in FIG. 7, the absorption spectrum of the absorbing film produced using the absorbent of Example 2 is shown in FIG. 8, and the absorption spectrum of the absorbing film produced using the absorbent of Comparative Example 1 is shown in FIG. 9. In FIG. 7 to FIG. 9, A-1, A-2, and A-3 mean the evaluations of the absorbing films of Examples 1 and 2, and Comparative Example 1, respectively, and the results indicated as "before high temperature and high humidity" are the results immediately after the absorbing film was produced, and the results indicated as "after high temperature and high humidity" are the results after the absorbing film was subjected to a high temperature and high humidity evaluation. The high temperature and high humidity evaluation is an evaluation in which the absorbing film is maintained at a temperature of 85°C and a relative humidity of 85% for 120 hours.

[0167] From a comparison of Figs. 7 to 9, it can be confirmed that the absorbing film using the absorbent of the embodiment shows almost no change in the absorption characteristics before and after the high-temperature, high-humidity evaluation, and maintains the same characteristics, whereas when the absorbent of the comparative example is applied, the absorption characteristics are almost lost after the high-temperature, high-humidity evaluation.

[0168] The main results shown in Figures 7 to 9 are summarized in Table 3. f is the transmittance at the absorption maximum wavelength of the absorbing film maintained at 85° C. and 85% relative humidity for 120 hours, and λ f is the maximum absorption wavelength at this time, and A i is the transmittance at the absorption maximum wavelength of the absorbing film before being maintained at 85° C. and 85% relative humidity for 120 hours, and λ i is the maximum absorption wavelength at this time. In Table 3, △A is 100 × (A f -A i ) / A i The value calculated by Δλ is 100×(λ f -λ i ) / λ i This is the value calculated using

[0169] [Table 3]

[0170] 4 to 6, 7 to 9, and Table 3, it can be seen that the absorbents of the Examples and Comparative Examples have similar spectral characteristics of the absorbents themselves, but when applied to an absorbing film, they show a large difference in absorption characteristics and absorption characteristics after high-temperature and high-humidity evaluation. From these points, it can be confirmed that the absorbent of the present application has excellent compatibility with the resin component forming the absorbing film due to its unique structure, has excellent heat resistance, and can effectively form an absorbing film with excellent performance. [Explanation of symbols]

[0171] 100 Base material layer 200 Absorbing membrane 300 Dielectric Film

Claims

1. Represented by the following chemical formula 2: [Chemical formula 2] 【Chemistry 2】 In the above Chemical Formula 2, A ４ ~A ９ are each independently a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, or an arylalkyl group; L ２ and L ３ are each independently -U 1 -T 1 -U 2 -T 2 -U 3 -, T 1 and T 2 are each independently an oxygen atom or are not present, U 1 to U 3 are each independently an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group or are not present, R １１ ~R １６ and R ２１ ~R ２６ are each independently a hydrogen, a halogen, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an aryl group, an arylalkyl group, an amino group, an alkylcarbonylamino group, an arylalkylcarbonylamino group, a haloalkylsulfonylamino group, an alkylsulfonylamino group, or an arylalkylsulfonylamino group.

2. Represented by the following chemical formula 3: [Chemical formula 3] 【Chemistry 3】 In the above Chemical Formula 3, A ７ ~A １２ are each independently a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, or an arylalkyl group; L ４ and L ５ are each independently -U 1 -T 1 -U 2 -T 2 -U 3 -, T 1 and T 2 are each independently an oxygen atom or are not present, U 1 to U 3 are each independently an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group or are not present, R ３１ ~xR ３８ and R ４１ ~R ４８ are each independently a hydrogen, a halogen, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, an alkyl group, an alkoxy group, an aryl group, an arylalkyl group, an amino group, an alkylcarbonylamino group, an arylalkylcarbonylamino group, a haloalkylsulfonylamino group, an alkylsulfonylamino group, or an arylalkylsulfonylamino group.

3. A composition comprising a resin component and the absorbent according to claim 1 or 2.

4. 4. The composition according to claim 3, wherein the resin component comprises one or more selected from the group consisting of a cyclic olefin resin, a polyarylate resin, a polysulfone resin, a polyethersulfone resin, a polyparaphenylene resin, a polyarylene ether phosphine oxide resin, a polyimide resin, a polyetherimide resin, a polyamideimide resin, an acrylic resin, a polycarbonate resin, a polyethylene naphthalate resin, and a silicone resin.

5. The composition of claim 3 , wherein the resin component comprises a silicone resin.

6. The composition according to claim 3, comprising 0.001 to 10 parts by weight of said absorbent per 100 parts by weight of said resin component.

7. The composition of claim 3 further comprising a solvent.

8. An absorbent film comprising a resin component and the absorbent according to claim 1 or 2.

9. 9. The absorbing film according to claim 8, wherein the resin component comprises one or more selected from the group consisting of cyclic olefin resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, and silicone resins.

10. The absorbing membrane of claim 8 , wherein the resin component comprises a silicone resin.

11. The absorbing film of claim 8, which exhibits an absorption maximum in the wavelength range of 600 nm to 950 nm.

12. The absolute value of ΔA in the following formula 1 is 20% or less, [Formula 1] △A=100×(A ｆ -A ｉ ) / A ｉ In the above formula 1, A ｆ is the transmittance at the absorption maximum wavelength of the absorbing film maintained at 85° C. and 85% relative humidity for 120 hours, and A ｉ is the transmittance at the absorption maximum wavelength of said absorbing film before being maintained at 85° C. and 85% relative humidity for 120 hours, said absorption maximum wavelength being in the wavelength range of 600 nm to 950 nm.

13. The absolute value of Δλ in the following formula 2 is 10% or less, [Formula 2] △λ=100×(λ) ｆ -l ｉ ) / l ｉ In the above formula 2, λ ｆ is the absorption maximum wavelength of the absorbing film maintained at 85° C. and 85% relative humidity for 120 hours, λ ｉ is the absorption maximum wavelength of said absorbing film before being maintained at 85° C. and 85% relative humidity for 120 hours, said absorption maximum wavelength being in the wavelength range of 600 nm to 950 nm.

14. The absorbent film according to claim 8, comprising 0.001 to 10 parts by weight of said absorbent per 100 parts by weight of the resin component.

15. A base layer; An optical filter comprising: the absorbing film according to claim 8 formed on one or both surfaces of the base layer.

16. An imaging device comprising the optical filter of claim 15.

17. An infrared sensor comprising the absorbing film of claim 8.

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