Pupil plane beam scanning for metrology

Abstract

The metrology measurement device may include one or more illumination sources, a beam splitter configured to receive illumination from the one or more illumination sources from an illumination path and direct the illumination along a measurement path, and an objective lens. The objective lens may direct illumination from the measurement path to the sample, collect light from the sample, and direct the collected light along the measurement path to the beam splitter so that the beam splitter can direct the collected light along the collection path to a detector. The device may further include a pupil plane scanner along the measurement path with a pupil relay and a deflector in the relay pupil plane to adjust the position of the illumination spot on the sample by adjusting the deflector without changing the position of the illumination pupil distribution or the position of the distribution of collected light along the collection path.

Description

[Technical field]

[0001] The present disclosure relates generally to metrology systems, and more particularly, to positioning illumination light in metrology systems. [Background technology]

[0002] Metrology systems used in semiconductor manufacturing processes, such as, but not limited to, overlay metrology systems, typically characterize a metrology target located on a sample. In some diffraction-based metrology techniques, metrology measurements are generated based on the angular distribution of light (e.g., reflected and / or diffracted light) from the sample. Additionally, it may be desirable to selectively control the position of the illumination spot on the sample before or during the measurement. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] US Patent Application Publication No. 2002 / 0048025 [Patent Document 2] International Publication No. 2020 / 057900 [Patent Document 3] U.S. Patent No. 10101676 Summary of the Invention [Problem to be solved by the invention]

[0004] However, conventional techniques for spot scanning can generally introduce deviations in the distribution of the illumination light on the sample or the collected light on the detector, which can adversely affect metrology measurements. It would therefore be desirable to provide systems and methods for overcoming these shortcomings. [Means for solving the problem]

[0005] In accordance with one or more exemplary embodiments of the present disclosure, a metrology measurement apparatus is disclosed. In one exemplary embodiment, the apparatus includes one or more illumination sources. In another exemplary embodiment, the apparatus includes a beam splitter for receiving illumination from one or more illumination sources from an illumination path and directing the illumination along a measurement path. In another exemplary embodiment, the apparatus includes an objective lens for directing illumination from the measurement path to the sample. In another exemplary embodiment, the illumination is configured to provide a selected illumination pupil distribution in a pupil plane of the objective lens that defines an angle of incidence of the illumination on the sample, and further configured to provide an illumination spot on the sample having a spot size smaller than a field of view of the objective lens. In another exemplary embodiment, the objective lens further collects light from the sample and directs the collected light along the measurement path. In another exemplary embodiment, the beam splitter further receives the collected light from the measurement path and directs the collected light along the collection path to one or more detectors. In another exemplary embodiment, the apparatus includes a pupil plane scanner located between the objective lens and the beam splitter along the measurement path. In another exemplary embodiment, the pupil plane scanner includes a pupil relay between the objective lens and the beam splitter along the measurement path to relay a pupil plane from the objective lens to one or more relay pupil planes located between the objective lens and the beam splitter along the measurement path and to one or more deflectors located at at least one of the one or more relay pupil planes. In another exemplary embodiment, adjusting an angular position of the one or more deflectors adjusts a position of the illumination spot on the sample without changing a position of the illumination pupil distribution or a position of the distribution of the collected light along the collection path.

[0006] A metrology system is disclosed in accordance with one or more exemplary embodiments of the present disclosure. In one exemplary embodiment, the system includes an illumination source. In another exemplary embodiment, the system includes a pupil plane detector. In another exemplary embodiment, the system includes a translatable stage configured to position the sample. In another exemplary embodiment, the system includes a beam splitter that receives illumination from the illumination source and directs the illumination along a measurement path. In another exemplary embodiment, the system includes an objective lens for directing illumination from the measurement path to the sample, the objective lens further collecting light from the sample and directing the collected light along the measurement path. In another exemplary embodiment, the beam splitter further receives the collected light from the measurement path and directs the collected light along the collection path to the pupil plane detector. In another exemplary embodiment, the system includes an optical relay between the objective lens and the beam splitter along the measurement path, the optical relay providing one or more relay pupil planes between the objective lens and the beam splitter, the optical relay further providing a relay field plane between the objective lens and the beam splitter. In another exemplary embodiment, the system includes one or more deflectors disposed at the one or more relay pupil planes. In another exemplary embodiment, adjusting the one or more deflectors adjusts the position of illumination from the illumination source on the sample while maintaining a stable optical path of the collected light along the collection path. In another exemplary embodiment, the system includes a feedback detector disposed at a relay field of view plane to image the position of illumination from the illumination source on the sample. In another exemplary embodiment, the system includes a controller communicatively coupled to the translatable stage and the feedback detector, receiving one or more images from the feedback detector including the position of illumination from the illumination source on the sample, and sending control signals to the one or more deflectors to position the illumination from the illumination source based on the one or more images from the feedback detector. Receive one or more measurement images from the pupil plane detector over a measurement spot selected for measurement, and generate one or more metrology measurements based on the one or more measurement images.

[0007] A metrology method is disclosed in accordance with one or more exemplary embodiments of the present disclosure. In one exemplary embodiment, the method includes illuminating a sample by directing illumination from an illumination source through a beam splitter, along a measurement path, and through an objective lens. In another exemplary embodiment, the method includes collecting light from the sample using an objective lens, and directing the collected light along the measurement path through a beam splitter to a detector located at a pupil plane. In another exemplary embodiment, the method includes adjusting a position of illumination from the illumination source on the sample using one or more deflectors located at one or more relay pupil planes between the objective lens and the beam splitter, where adjusting the one or more deflectors adjusts a position of illumination from the illumination source on the sample while maintaining a stable position of the collected light on the detector.

[0008] It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not necessarily restrictive of the invention as claimed. The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention and, together with the general description, serve to explain the principles of the invention. [Brief description of the drawings]

[0009] The numerous advantages of the present disclosure may be better understood by those skilled in the art by reference to the accompanying drawings: [Figure 1A] FIG. 1 is a conceptual diagram of a metrology system including a metrology tool having a pupil plane scanner in accordance with one or more embodiments of the present disclosure. [Figure 1B] FIG. 1 is a conceptual diagram of a metrology tool in accordance with one or more embodiments of the present disclosure. [Figure 1C] FIG. 1 is a schematic diagram of a pupil plane scanner with a single deflector providing multi-axis angular deflection in accordance with one or more embodiments of the present disclosure. [Figure 1D] FIG. 2 is a schematic diagram of a pupil plane scanner having two deflectors in accordance with one or more embodiments of the present disclosure. [Diagram 2]1 is a flow diagram illustrating steps performed in a metrology method in accordance with one or more embodiments of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Reference will now be made in detail to the disclosed subject matter, which is illustrated in the accompanying drawings. The present disclosure has been specifically shown and described with respect to certain embodiments and certain features thereof. The embodiments described herein are to be construed as illustrative and not restrictive. It will be readily apparent to those skilled in the art that various changes and modifications in form and detail may be made therein without departing from the spirit and scope of the present disclosure.

[0011] Embodiments of the present disclosure are directed to systems and methods for positioning an illumination spot in a metrology system based on a deflector located at a pupil plane common to both the illumination and collection paths. In this manner, the position of the illumination spot on the sample may be controlled without affecting the angular distribution of illumination on the sample (e.g., illumination pupil distribution) and without affecting the angular distribution of collected light from the sample (e.g., collection pupil distribution). It is contemplated that the systems and methods disclosed herein may enable precise positioning of the illumination spot on the sample before and / or during the measurement without adversely affecting the measurement itself. For example, the illumination spot may be modulated, scanned, or otherwise varied within a selected region of the sample (e.g., a cell of a metrology target) during the measurement without affecting the position of either the illumination pupil distribution or the collection pupil distribution. This may be useful, but is not limited to, to mitigate speckle associated with coherent illumination and noise associated with target edge roughness. As another example, the illumination spot may be sequentially positioned at different locations of the sample (e.g., different cells of a metrology target) for successive measurements without requiring translation of the sample between measurements, which may increase throughput and measurement stability.

[0012] In some embodiments, the metrology system includes a pupil plane scanner located in a measurement path common to both the illumination and collection paths. For example, the measurement path can be located between the objective lens and the beam splitter in a configuration in which a single objective lens is used to illuminate the sample and collect light from the sample for measurement. In one embodiment, the pupil plane scanner includes a pupil plane relay for relaying the pupil plane from the objective lens (e.g., associated with the back focal plane of the objective lens) to one or more relay pupil planes along the measurement path, and one or more deflectors located in at least one of the relay pupil planes. In this manner, by adjusting the angle of the deflector at the relay pupil plane, the position of the illumination spot on the sample can be changed. However, because the deflector is in a pupil plane common to the illumination and collection paths, adjusting the angle of the deflector does not affect the position of either the illumination or collection pupil distribution. As a result, spot positioning or scanning is achieved while maintaining a stable angular illumination distribution on the sample as well as a stable distribution of light in the collection pupil.

[0013] It is contemplated herein that this configuration may be particularly useful, but not limited to, diffraction-based metrology or scatterometry where the metrology measurement is based on illuminating a metrology target with illumination over a limited angular range and collection of selected diffraction orders. In these systems, variations in the collection pupil distribution associated with positioning or scanning of the illumination beam may manifest as measurement errors and / or reduce measurement sensitivity.

[0014] In another embodiment, the metrology system further includes a field plane imaging detector for imaging the position of the illumination spot on the sample. Such a field plane imaging detector may be used for feedback to monitor or control the positioning of the illumination spot and may generally be located at any suitable field plane in the system. For example, the metrology system may include a beam splitter in the measurement plane and a field plane imaging detector located at a relay field plane (e.g., an intermediate field plane). As another example, the metrology system may include a beam splitter in the collection plane and a field plane imaging detector positioned at the collection field plane.

[0015] As used throughout this disclosure, the term "specimen" generally refers to a substrate formed from a semiconductor or non-semiconductor material (e.g., a wafer, etc.). For example, the semiconductor or non-semiconductor material may include, but is not limited to, monocrystalline silicon, gallium arsenide, and indium phosphide. The specimen may include one or more layers. For example, such layers may include, but are not limited to, resist (including photoresist), dielectric materials, conductive materials, and semiconductor materials. Many different types of such layers are known in the art, and the term specimen as used herein is intended to encompass specimens on which all types of such layers may be formed. The one or more layers formed on the specimen may be patterned or unpatterned. For example, the specimen may include multiple dies, each die having repeatable patterned features. The formation and processing of such layers of material may ultimately result in a completed device. Many different types of devices may be formed on the specimen, and the term specimen as used herein is intended to encompass specimens on which any type of device known in the art is fabricated. Furthermore, for purposes of this disclosure, the terms specimen and wafer should be construed as interchangeable. Moreover, for the purposes of this disclosure, the terms patterning device, mask and reticle should be considered interchangeable.

[0016] 1A-2, systems and methods for pupil plane scanning are described in greater detail in accordance with one or more embodiments of the present disclosure.

[0017] FIG. 1A is a conceptual diagram of a metrology system 100 including a metrology tool 102 having a pupil plane scanner 104 in accordance with one or more embodiments of the present disclosure.

[0018] The metrology tool 102 may include any type of optical metrology tool known in the art suitable for generating metrology measurements of the specimen 106 based on interrogation of the specimen 106 with the optical illumination 108. Furthermore, the metrology tool 102 may generate any type of metrology measurements of the specimen 106. In one embodiment, the metrology tool 102 is an overlay metrology tool that provides overlay measurements or measurements of overlay errors associated with the relative displacement of features patterned by multiple lithography exposures on the same or different layers of the specimen 106. In another embodiment, the metrology tool 102 provides measurements of one or more process parameters associated with one or more fabrication steps, such as, but not limited to, the intensity or dose of one or more lithography steps. In another embodiment, the metrology tool 102 provides measurements of one or more patterned features on the specimen 106, such as, but not limited to, critical dimension (CD) measurements or sidewall angle measurements.

[0019] The metrology tool 102 may generate the metrology measurements using any optical characterization technique known in the art. For example, the metrology tool 102 may generate one or more images of the metrology system 100, and the metrology measurements are generated based on the images. Furthermore, the images may include any combination of field plane images or pupil plane images of the sample 106 and the angular distribution of light from the sample 106 in response to the incident illumination 108.

[0020] The metrology tool 102 may further be configurable according to various recipes that define illumination and / or collection conditions. For example, a recipe may include, but is not limited to, the wavelength of the illumination 108, the detection wavelength of the light emanating from the sample 106, the spot size of the illumination 108 on the sample 106, the angle of the incident illumination 108, the polarization of the incident illumination 108, the position of the illumination 108 on the sample 106 (e.g., the position of the illumination spot), etc.

[0021] As described in more detail below, the pupil plane scanner 104 may be disposed in a measurement path common to both the illumination and collection paths and may include one or more deflectors disposed at one or more pupil planes. In this manner, by adjusting the angle of one or more deflectors, the position of the illumination spot (or the illumination distribution of one or more illumination spots) on the sample 106 may be adjusted without adjusting the position of the illumination or collection pupil distribution. Furthermore, it should be understood that the pupil plane scanner 104 may be operated in a scanning mode or a static mode. For example, the pupil plane scanner 104 may be used to provide a selected illumination distribution that is static during a measurement. As another example, the pupil plane scanner 104 may be used to scan or otherwise modulate the position of one or more illumination spots during a measurement.

[0022] In another embodiment, the metrology system 100 includes a controller 110 communicatively coupled to the metrology tool 102 and / or any components therein.

[0023] In another embodiment, the controller 110 includes one or more processors 112. For example, the one or more processors 112 may be configured to execute a set of program instructions maintained in the memory device 114 or memory. The one or more processors 112 of the controller 110 may include any processing element known in the art. In this sense, the one or more processors 112 may include any microprocessor-type device configured to execute algorithms and / or instructions.

[0024] The one or more processors 112 of the controller 110 may include any processor or processing element known in the art. For purposes of this disclosure, the term "processor" or "processing element" may be broadly defined to encompass any device having one or more processing or logic elements (e.g., one or more microprocessor devices, one or more application specific integrated circuits (ASIC) devices, one or more field programmable gate arrays (FPGAs), or one or more digital signal processors (DSPs)). In this sense, the one or more processors 112 may include any device configured to execute algorithms and / or instructions (e.g., program instructions stored in a memory). In an embodiment, the one or more processors 112 may be embodied as a desktop computer, a mainframe computer system, a workstation, an image computer, a parallel processor, a networked computer, or any other computer system configured to execute programs that operate or are configured to operate with the metrology system 100 as described throughout this disclosure. Additionally, different subsystems of the metrology system 100 may include processors or logic elements suitable for performing at least some of the steps described in this disclosure. Therefore, the above description should not be construed as a limitation on the embodiments of the present disclosure, but merely as an example. Furthermore, the steps described throughout the present disclosure may be performed by a single controller, or alternatively, by multiple controllers. Furthermore, the controller 110 may include one or more controllers housed within a common housing or multiple housings. In this manner, any controller or combination of controllers may be packaged separately as a module suitable for integration into the measurement system 100.

[0025] The memory device 114 may include any storage medium known in the art suitable for storing program instructions executable by the associated one or more processors 112. For example, the memory device 114 may include a non-transitory memory medium. As another example, the memory device 114 may include, but is not limited to, a read-only memory (ROM), a random access memory (RAM), a magnetic or optical memory device (e.g., disk), a magnetic tape, a solid-state drive, and the like. Additionally, it is noted that the memory device 114 may be housed within a common controller housing along with one or more processors 112. In one embodiment, the memory device 114 may be located remotely relative to the physical location of the one or more processors 112 and the controller 110. For example, one or more processors 112 of the controller 110 may access a remote memory (e.g., a server) accessible via a network (e.g., the Internet, an intranet, etc.).

[0026] In this manner, the controller 110 may direct or receive data (e.g., through control signals) from the metrology tool 102 or any components therein. The controller 110 may be further configured to perform any of a variety of process steps described throughout this disclosure, including, but not limited to, directing the pupil plane scanner 104 to position an illumination spot, directing the metrology tool 102 to generate one or more images based on one or more selected recipes, receiving images from the metrology tool 102, or generating metrology data based on the received images.

[0027] In one embodiment, the metrology system 100 includes a user interface 116 communicatively coupled to the controller 110. In one embodiment, the user interface 116 may include, but is not limited to, one or more desktops, laptops, tablets, etc. In another embodiment, the user interface 116 includes a display used to display data of the metrology system 100 to a user. The display of the user interface 116 may include any display known in the art. For example, the display may include, but is not limited to, a liquid crystal display (LCD), an organic light emitting diode (OLED)-based display, or a CRT display. Those skilled in the art should recognize that any display device that can be integrated with the user interface 116 is suitable for implementation in the present disclosure. In another embodiment, a user may input selections and / or commands in response to data displayed to the user via a user input device of the user interface 116.

[0028] 1B is a conceptual diagram of a metrology tool 102, in accordance with one or more embodiments of the present disclosure. In one embodiment, the metrology tool 102 includes at least one illumination source 118 configured to generate illumination 108.

[0029] The illumination 108 from the illumination source 118 may include light of one or more selected wavelengths, including, but not limited to, ultraviolet (UV) radiation, visible light, or infrared (IR) radiation. Additionally, the illumination 108 from the illumination source 118 may have any temporal profile, including, but not limited to, a continuous wave (CW) profile, a pulsed profile, or a modulated profile.

[0030] The illumination source 118 may generally include any type of illumination source suitable for providing at least one illumination beam. In one embodiment, the illumination source 118 is a laser source. For example, the illumination source 118 may include, but is not limited to, one or more narrowband laser sources, broadband laser sources, supercontinuum laser sources, white light laser sources, or the like. In this regard, the illumination source 118 may provide an illumination beam having high coherence (e.g., high spatial coherence and / or temporal coherence). In another embodiment, the illumination source 118 includes a laser-sustained plasma (LSP) source. For example, the illumination source 118 may include, but is not limited to, an LSP lamp, an LSP bulb, or an LSP chamber suitable for housing one or more elements capable of emitting broadband illumination when excited into a plasma state by a laser source. In another embodiment, the illumination source 118 includes a lamp source. For example, the illumination source 118 may include, but is not limited to, an arc lamp, a discharge lamp, an electrodeless lamp, and the like. In this regard, the illumination source 118 may provide an illumination beam having low coherence (eg, low spatial coherence and / or temporal coherence).

[0031] In another embodiment, the metrology tool 102 directs an illumination beam to the sample 106 via an illumination path 120. For example, the metrology tool 102 may include an objective lens 122 that focuses the illumination beam onto the sample 106. Additionally, the sample 106 may be disposed on a sample stage 124 suitable for fixing the sample 106, and may be further configured to position the sample 106 (e.g., a metrology target on the sample 106) within the field of view of the objective lens 122.

[0032] The illumination path 120 may include one or more optical components suitable for modifying and / or conditioning the illumination beam and for directing the illumination beam to the sample 106. In one embodiment, the illumination path 120 includes one or more illumination path lenses 126 (e.g., for collimating the illumination beam, relaying a pupil plane and / or a field plane, etc.). In another embodiment, the illumination path 120 includes one or more illumination path optics 128 for shaping or otherwise controlling the illumination beam. For example, the illumination path optics 128 may include, but are not limited to, one or more illumination field stops, one or more illumination pupil stops, one or more polarizers, one or more filters, one or more beam splitters, one or more diffusers, one or more homogenizers, one or more apodizers, one or more beam shapers, or one or more mirrors (e.g., static mirrors, translatable mirrors, scanning mirrors, etc.). Additionally, the illumination path optics 128 may be positioned at any suitable location within the illumination path 120, such as, but not limited to, an illumination pupil plane 130 or an illumination field plane 132. For example, the metrology tool 102 may include one or more relay optics (eg, including one or more illumination path lenses 126 ) to provide an illumination pupil plane 130 and / or an illumination field plane 132 .

[0033] The metrology tool 102 can direct the illumination 108 to the sample 106 with any spatial and angular profile for measurement. For example, the illumination 108 directed to the sample 106 can be shaped as at least one illumination beam (e.g., an illumination lobe, etc.) having a limited angular profile. In this regard, the metrology tool 102 can provide dipole illumination, orthogonal illumination, etc. Additionally, periodic features on the sample 106 (e.g., metrology target features, device features, etc.) can diffract the illumination beam into discrete diffraction orders that can form the basis of a measurement.

[0034] The illumination 108 can be shaped into one or more illumination beams using various techniques. In one embodiment, the metrology tool 102 includes a pupil mask at the illumination pupil plane 130 having one or more apertures for defining the one or more illumination beams. In another embodiment, the one or more illumination beams are generated directly by one or more illumination sources 118. For example, the one or more illumination sources 118 may provide two or more illumination beams through two or more optical fibers, with the light output from each optical fiber being an illumination lobe of the illumination beam. As another example, the illumination source 118 can generate two or more illumination beams by diffracting the illumination 108 from the illumination source 118 into two or more diffraction orders, with the illumination beam being formed from at least some of the diffraction orders. Efficient generation of multiple illumination lobes through controlled diffraction is generally described in U.S. Patent Application Publication No. 2020 / 0124408, entitled Efficient Illumination Shaping for Scatterometry Overlay, published April 23, 2020, which is incorporated herein by reference in its entirety.

[0035] Additionally, the illumination 108 may be shaped to illuminate a portion of the sample 106 that is smaller than the field of view of the objective lens 122. In this regard, the illumination 108 may be in the form of an illumination spot on the sample 106. For example, the metrology tool 102 may include a field stop disposed in the illumination field plane 132 to control the size and / or shape of the illumination spot. Additionally, the position of the illumination spot on the sample may be adjusted by the pupil plane scanner 104.

[0036] In another embodiment, the metrology tool 102 includes one or more detectors 134 configured to capture light or other radiation (e.g., collected light 136) emanating from the sample 106 through a collection path 138. The collection path 138 can include one or more optical elements suitable for modifying and / or conditioning the collected light 136 from the sample 106. In one embodiment, the collection path 138 includes one or more collection path lenses 140 (e.g., for collimating the illumination beam, relaying pupil and / or field planes, etc.), which may, but need not, include the objective lens 122. In another embodiment, the collection path 138 includes one or more collection path optics 142 that shape or otherwise control the collected light 136. For example, the collection path optics 142 may include, but are not limited to, one or more field stops, one or more pupil stops, one or more polarizers, one or more filters, one or more beam splitters, one or more diffusers, one or more homogenizers, one or more apodizers, one or more beam shapers, or one or more mirrors (e.g., static mirrors, translatable mirrors, scanning mirrors, etc.). Furthermore, the collection path optics 142 may be positioned at any suitable location within the collection path 138, such as, but not limited to, at a collection pupil plane 144 or a collection field plane 146. For example, the metrology tool 102 may include one or more relay optics (e.g., including one or more collection path lenses 140) to provide the collection pupil plane 144 and / or the collection field plane 146.

[0037] The detector 134 may be located at any selected location within the collection path 138. In one embodiment, the metrology tool 102 includes a detector 134 at a collection field plane 146 or its conjugate (e.g., as shown in FIG. 1B ) to generate an image of the sample 106. In another embodiment, the metrology tool 102 includes a detector 134 at a collection pupil plane 144 (e.g., a diffraction plane) or its conjugate to generate a pupil image. In this regard, the pupil image may correspond to an angular distribution of light from the sample 106 on the detector 134. For example, diffraction orders associated with the diffraction of the illumination 108 by the sample 106 (e.g., an overlay target on the sample 106) may be imaged or otherwise observed in the collection pupil plane 144. In a general sense, the detector 134 may capture any combination of reflected (or transmitted), scattered, or diffracted light from the sample 106.

[0038] The metrology tool 102 may generally include any number or type of detectors 134 suitable for capturing light from the sample 106 exhibiting overlay. In one embodiment, the detectors 134 include one or more detectors 134 suitable for characterizing a static sample. In this regard, the metrology tool 102 may operate in a stationary mode in which the sample 106 is stationary during measurement. For example, the detectors 134 may include, but are not limited to, a two-dimensional pixel array, such as a charge-coupled device (CCD) or a complementary metal-oxide semiconductor (CMOS) device. In this regard, the detectors 134 may generate a two-dimensional image (e.g., a field plane image or a pupil plane image) in a single measurement.

[0039] In one embodiment, the detector 134 includes one or more detectors 134 suitable for characterizing a moving sample (e.g., a scanning sample). In this regard, the metrology tool 102 can operate in a scanning mode in which the sample 106 is scanned across a measurement field of view during a measurement. Measurements on moving samples and associated metrology target layouts are generally described in U.S. patent application Ser. No. 16 / 586,504 (September 27, 2019), U.S. patent application Ser. No. 16 / 598,146 (October 10, 2019), and U.S. patent application Ser. No. 17 / 140,999 (January 4, 2021), all of which are incorporated herein by reference in their entireties. For example, the detector 134 may include a 2D pixel array having a capture time and / or refresh rate sufficient to capture one or more images during a scan within a selected image tolerance (e.g., image blur, contrast, sharpness, etc.). As another example, the detector 134 can include a line scan detector that continuously generates images of one line of pixels at a time. As another example, the detector 134 may include a time-delay integration (TDI) detector. The TDI detector can generate continuous images of the sample 106 when the motion of the sample 106 is synchronized to a charge transfer clock signal in the TDI detector. In particular, the TDI detector includes clock pulses for acquiring charge from an exposure on a row of pixels and transferring the charge between adjacent rows of pixels along the scan direction. When the motion of the sample 106 along the scan direction is synchronized with the charge transfer in the TDI detector, the charge accumulates continuously during the scan. This process continues until the charge reaches the last row of pixels and is subsequently read out from the detector. In this way, the image of the object is accumulated over a longer time frame than is possible with a simple line-scan camera. This relatively long acquisition time reduces the photon noise level in the image. Furthermore, the synchronous motion of the image and the charge prevents blurring of the recorded image.

[0040] 1B, the objective lens 122 can be common to both the illumination path 120 and the collection path 138. In this manner, the objective lens 122 can simultaneously direct illumination 108 to the sample 106 and capture collected light 136 from the sample 106. Additionally, the metrology tool 102 can include a beam splitter 148 to facilitate the combined use of the objective lens 122 for illumination and collection of light.

[0041] 1C-1D, pupil plane scanning is described in more detail in accordance with one or more embodiments of the present disclosure.

[0042] In one embodiment, the metrology tool 102 includes a pupil plane scanner 104 in a measurement path 150 that is common to both the illumination path 120 and the collection path 138. For example, in the non-limiting configuration of the metrology tool 102 shown in Figures 1B-1D, the measurement path 150 can be located between the beam splitter 148 and the objective lens 122. However, it should be understood that Figures 1C and 1D are provided for illustrative purposes only, and that the pupil plane scanner 104 can be located in any measurement path that is common to both the illumination path and the collection path.

[0043] In one embodiment, the pupil plane scanner 104 includes a pupil relay 152 formed from one or more optics configured to generate one or more relay pupil planes 154 disposed along the measurement path 150, and one or more deflectors 156 disposed at at least one of the relay pupil planes 154. In this regard, the pupil plane scanner 104 can adjust the position of the illumination 108 on the sample 106 (e.g., the position of the illumination spot on the sample 106) within the field of view of the objective lens 122 without translating the sample 106. For example, the pupil relay 152 can relay a pupil plane 158 from the objective lens 122 (e.g., which is a back focal plane associated with the objective lens 122) to one or more relay pupil planes 154.

[0044] It is contemplated herein that the deflector 156 may, but need not, be precisely located on the relay pupil plane 154. For example, as shown in FIG. 1C, the relay pupil plane 154 and the deflector 156 are aligned to be coplanar. In one example, the pupil relay 152 adjusts the tilt of the relayed pupil plane 154 to match the deflector 156. In some embodiments, the deflector 156 may be located at the relay pupil plane 154 but may be tilted relative to the relay pupil plane 154. However, misalignment of the deflector 156 and the relay pupil plane 154 may result in negligible measurement error or error within a selected tolerance for a particular application.

[0045] Deflector 156 may include any type of optical deflector known in the art suitable for altering the angle of light in pupil relay 152. In one embodiment, deflector 156 includes a rotatable or tiltable mirror (e.g., a mirror with an adjustable tip and / or tilt). Furthermore, the mirror may be actuated using any technique known in the art. For example, deflector 156 may include, but is not limited to, a galvanometer, a piezoelectric mirror, or a microelectromechanical system (MEMS) device. As another example, deflector may include, but is not limited to, an acousto-optical deflector or an electro-optical deflector.

[0046] It is contemplated herein that by adjusting the angle of the deflector 156 located at the relay pupil plane 154 common to both the illumination path 120 and the collection path 138, the position of the illumination 108 on the sample 106 can be adjusted without affecting the position of the collected light 136 along the optical path specific to the collection path 138 (e.g., after the collected light 136 passes through the beam splitter 148). In particular, the collected light 136 may be stationary at the collection pupil plane 144 and / or the collection field plane 146 while the deflector 156 is being adjusted. In this regard, metrology measurements based on the collected light 136 may not be affected by the adjustment of the deflector 156. For example, the distribution of light on the detector 134 at the collection pupil plane 144 may be stable while the deflector 156 is being adjusted. It is contemplated herein that this may be particularly beneficial for diffraction-based or scatterometry-based metrology where metrology measurements are generated based on a distribution of light at collection pupil plane 144 (e.g., a distribution of one or more diffraction orders in collection pupil plane 144). As another example, the distribution of light on the collection field stop at collection field plane 146 may be stable while deflector 156 is adjusted.

[0047] In addition, because the pupil plane scanner 104 is disposed along the measurement path 150 common to both the illumination path 120 and the collection path 138, the distribution of illumination 108 in the illumination pupil plane 130 and / or the illumination field plane 132, which are disposed only in the illumination path 120 (e.g., before the beam splitter 148 in the configuration of Figures 1B-1D), may remain stable while the deflector 156 is being adjusted. In this manner, the angular distribution of illumination 108 may be defined in the illumination pupil plane 130, which is common only to the illumination path 120, and is not affected by adjustments to the position of illumination 108 on the sample 106.

[0048] It is further contemplated herein that the pupil plane scanner 104 may include any number of deflectors 156 disposed at any number of relay pupil planes 154. FIG. 1C is a schematic diagram of a pupil plane scanner 104 with a single deflector 156 providing multi-axis (e.g., two-axis) angular deflection, in accordance with one or more embodiments of the present disclosure. In this regard, the single deflector 156 of FIG. 1C may be used to adjust the position of the illumination 108 on the sample 106 along two directions simultaneously. FIG. 1D is a schematic diagram of a pupil plane scanner 104 having two deflectors 156, in accordance with one or more embodiments of the present disclosure. In this regard, each of the deflectors 156 of FIG. 1D may be used to adjust the position of the illumination 108 on the sample 106 along a single direction. Furthermore, by orienting the two deflectors 156 to provide angular adjustment along different angular directions (e.g., orthogonal directions), the position of the illumination 108 on the sample 106 may be adjusted in two directions.

[0049] In another embodiment, the metrology tool 102 includes a feedback detector 160 for monitoring or otherwise observing the position of the illumination 108 on the specimen 106. The feedback detector 160 may generally be located at any suitable viewing plane within the metrology tool 102. Additionally, the feedback detector 160 may include any type of detector known in the art, including, but not limited to, a two-dimensional sensor for generating an image of the specimen 106 in which the position of the illumination 108 on the specimen 106 is visible.

[0050] In one embodiment, metrology tool 102 includes a field of view relay 162 in measurement path 150 to provide a relay field of view plane 164, and feedback detector 160 is located at relay field of view plane 164. For example, as shown in FIG. 1C , field of view relay 162 can include a beam splitter 166 in measurement path 150 arranged to direct a portion of collected light 136 towards feedback detector 160 for observation or monitoring. As another example, although not shown, feedback detector 160 can be located at any suitable collection field plane 146 along collection path 138.

[0051] In another embodiment, the feedback detector 160 is communicatively coupled to the controller 110. In this regard, the controller 110 may control or adjust the position of the illumination 108 on the sample 106 based on an image of the sample 106 generated by the feedback detector 160. For example, the controller 110 may perform one or more image processing steps to determine the position of the illumination 108 relative to any imaged features of the sample 106, such as, but not limited to, a metrology target feature or a device feature.

[0052] 2 is a flow diagram illustrating steps performed in a metrology method 200, in accordance with one or more embodiments of the present disclosure. Applicant notes that the embodiments and enabling techniques described herein above in the context of metrology system 100 should be construed as extending to method 200. However, it is further noted that method 200 is not limited to the architecture of metrology system 100.

[0053] In one embodiment, the method 200 includes illuminating 202 the sample by directing illumination from an illumination source through a beam splitter, along a measurement path, and through an objective lens.

[0054] In another embodiment, the method 200 includes a step 204 of collecting light from the sample using an objective lens and directing the collected light along a measurement path through a beam splitter to a detector located at a pupil plane.

[0055] In another embodiment, the method 200 includes adjusting 206 the position of illumination from the illumination source on the sample using one or more deflectors located at one or more relay pupil planes between the objective lens and the beam splitter. In this manner, adjusting the one or more deflectors adjusts the position of illumination from the illumination source on the sample while maintaining a stable position of the collected light on the detector. For example, the method 200 step 206 can be performed using a pupil plane scanner 104 located along the measurement path 150 common to the illumination path 120 and the collection path 138 as described with respect to the metrology system 100, although this is not required. In this manner, the method 200 step 206 can be performed by one or more deflectors located at a relay pupil plane common to the paths of illumination directed to the sample and the collected light received from the sample.

[0056] In another embodiment, step 206 of method 200 may include capturing one or more field plane images of the sample in which the position of the illumination on the sample is visible, and may further include controlling the position of the illumination on the sample based on the one or more field plane images.

[0057] Referring again generally to Figures 1A-2, it is contemplated herein that pupil-based scanning (e.g., using the pupil plane scanner 104 described herein) can facilitate accurate and efficient metrology measurements in a number of applications.

[0058] In one embodiment, the pupil plane scanner 104 is configured to adjust the position of the illumination spot on the sample prior to a metrology measurement. For example, the pupil plane scanner 104 can precisely adjust the position of the illumination 108 on the metrology target or a portion thereof (e.g., a cell of the metrology target) prior to the measurement. It is contemplated herein that the pupil plane scanner 104 can provide faster and / or more accurate alignment of the illumination 108 on the sample 106 than the sample stage 124 alone. For example, the sample stage 124 may generally require a period after movement for the stage to settle prior to the measurement. According to an embodiment of the present disclosure, the sample stage 124 can position the metrology target within the field of view of the objective lens 122 and the pupil plane scanner 104 as a coarse alignment, and the pupil plane scanner 104 can provide fine alignment to a desired portion of the metrology target.

[0059] In another embodiment, the pupil plane scanner 104 can facilitate rapid measurement of multiple locations (e.g., multiple cells of a metrology target) within the field of view of the objective lens 122. For example, a particular metrology measurement or set of metrology measurements may be based on metrology data from multiple cells of the metrology target. However, as discussed above, sequentially repositioning the illumination 108 over multiple cells of the metrology target may require stage settling time before each measurement. According to an embodiment of the present disclosure, once the metrology target is positioned within the field of view of the objective lens 122, the pupil plane scanner 104 can rapidly position the illumination 108 over each desired cell to facilitate rapid measurements and high throughput.

[0060] In another embodiment, the pupil plane scanner 104 can scan or otherwise modulate the position of the illumination 108 within a defined region during a measurement. For example, scanning or modulating the position of the illumination 108 within a time frame relevant to the measurement (e.g., an integration time of the detector 134, etc.) can reduce speckle caused by the coherent illumination 108 and / or noise associated with roughness of the features of the measurement target. Additionally, the pupil plane scanner 104 can provide any selected pattern of the illumination 108 on the sample 106, including, but not limited to, a raster scan pattern, a random pattern, or a pseudo-random pattern.

[0061] The subject matter described herein illustrates different components that are sometimes included within or connected to other components. It should be understood that such depicted architectures are merely exemplary, and that in fact many other architectures that achieve the same functionality may be implemented. In a conceptual sense, any arrangement of components to achieve the same functionality is effectively "associated" such that the desired functionality is achieved. Thus, any two components herein that are combined to achieve a particular functionality can be considered to be "associated" with each other such that the desired functionality is achieved, regardless of the architecture or intermediate components. Similarly, any two components so associated can also be considered to be "connected" or "coupled" with each other to achieve the desired functionality, and any two components capable of being so associated can also be considered to be "couplable" with each other to achieve the desired functionality. Specific examples of components that can be coupled include, but are not limited to, physically interactable and / or physically interacting components and / or wirelessly interactable and / or wirelessly interacting components and / or logically interactable and / or logically interacting components.

[0062] It is believed that the present disclosure and many of its attendant advantages will be understood from the foregoing description, and it will be apparent that various changes can be made in the form, construction and arrangement of the elements without departing from the disclosed subject matter or sacrificing all of its material advantages. The forms described are merely illustrative, and it is the intent of the following claims to embrace and include such modifications. It is to be understood, further, that the invention is defined by the appended claims.

Claims

1. A metrology measurement device, comprising: one or more illumination sources; a beam splitter configured to receive illumination from the one or more illumination sources from an illumination path and direct the illumination along a measurement path; an objective configured to direct illumination from the measurement path to a sample, the illumination configured to provide an illumination pupil distribution in a pupil plane of the objective defining an angle of incidence of the illumination on the sample, the illumination further configured to provide an illumination spot on the sample having a spot size smaller than a field of view of the objective, the objective further configured to collect light from the sample and direct the collected light along the measurement path, the beam splitter further configured to receive the collected light from the measurement path and direct the collected light along the collection path to one or more detectors; a pupil plane scanner disposed along a measurement path between the objective lens and the beam splitter, a pupil relay along the measurement path between the objective lens and the beam splitter, the pupil relay relaying a pupil plane from the objective lens to one or more relay pupil planes located between the objective lens and the beam splitter along the measurement path; one or more deflectors located in at least one of the one or more relayed pupil planes, the adjusting of the angular position of the one or more deflectors adjusting a position of the illumination spot on the sample without changing a position of an illumination pupil distribution or a position of a distribution of collected light along the collection path; A metrology measuring device comprising:

2. The metrology measurement apparatus of claim 1 , wherein the one or more deflectors are configured to adjust a position of the illumination spot on the sample prior to a measurement.

3. 2. The metrology measurement apparatus of claim 1, wherein the one or more deflectors are configured to sequentially adjust a position of the illumination spot relative to the two or more cells to be measured for consecutive measurements of the two or more cells without translating the sample.

4. 2. The metrology measurement apparatus of claim 1, wherein the one or more deflectors are configured to modulate a position of the illumination spot within a selected region of the specimen during measurement to reduce at least one of speckle or roughness of features on a metrology target on the specimen.

5. The metrology measurement device of claim 4 , wherein the selected area of ​​the specimen comprises a cell of a metrology target.

6. 2. The metrology measurement apparatus of claim 1, wherein at least one of the one or more detectors is positioned at a pupil plane along the collection path, and adjusting the one or more deflectors adjusts a position of the illumination spot on the sample while maintaining a stable distribution of light at the at least one of the one or more detectors.

7. A collection field stop disposed at a field plane along the collection path.

2. The metrology measurement apparatus of claim 1, further comprising: adjusting the one or more deflectors adjusts a position of the illumination spot on the sample while maintaining a stable distribution of light on the collection field stop.

8. An illumination field stop located at the field plane along the illumination path 2. The metrology measurement apparatus of claim 1, further comprising: adjusting the one or more deflectors adjusts a position of the illumination spot on the specimen while maintaining a stable distribution of light on the illumination field stop.

9. an additional beam splitter in the measurement path; a field plane relay that relays a field plane corresponding to the sample through the additional beam splitter to a relay field plane located outside the measurement path; a feedback detector disposed at the relayed field plane to image the illumination spot onto the sample; and The metrology measurement device of claim 1 further comprising:

10. A controller communicatively coupled to the one or more deflectors and the feedback detector. and wherein the controller further comprises: receiving one or more images from the feedback detector including a position of the illumination spot on the sample; Sending control signals to the one or more deflectors to adjust a position of the illumination spot on the sample based on the one or more images. The metrology measurement device of claim 9 , comprising one or more processors configured to execute program instructions that cause the metrology measurement device to:

11. The metrology measurement device of claim 1 , wherein at least one of the one or more deflectors is a tiltable mirror.

12. The metrology measurement device of claim 11 , wherein the tiltable mirror is at least one of a piezoelectric tilt mirror or a galvanometer.

13. The metrology measurement device of claim 1 , wherein at least one of the one or more deflectors is an acousto-optic deflector.

14. The metrology measurement device of claim 1 , wherein at least one of the one or more deflectors is a micro-electro-mechanical system (MEMS).

15. The metrology measurement apparatus of claim 1 , wherein the one or more deflectors include a dual-axis deflector configured to adjust a position of the illumination spot along two orthogonal directions on the sample.

16. The one or more deflectors include: a first uniaxial deflector configured to adjust a position of the illumination spot along a first direction on the sample and located at a first of one or more relay pupil planes; a second uniaxial deflector located in a second of the one or more relay pupil planes and configured to adjust a position of the illumination spot along a second direction on the sample that is orthogonal to the first direction; The metrology measurement device of claim 1 , comprising:

17. 1. A measurement system comprising: An illumination source; A pupil plane detector; and a translatable stage configured to position the sample; a beam splitter configured to receive illumination from the illumination source and direct the illumination along a measurement path; an objective configured to direct the illumination from the measurement path to the sample, the objective configured to collect light from the sample and direct the collected light along the measurement path, and an objective configured to receive the collected light from the measurement path and direct the collected light along a collection path to a pupil plane detector; an optical relay along the measurement path between the objective lens and the beam splitter, the optical relay providing one or more relay pupil planes between the objective lens and the beam splitter and further providing a relay field plane between the objective lens and the beam splitter; one or more deflectors disposed at the one or more relay pupil planes, where adjusting the one or more deflectors adjusts a position of the illumination from an illumination source on the sample while maintaining a stable optical path of collected light along a collection path; a feedback detector disposed at the relay field plane for imaging the position of illumination from the illumination source on the sample; a controller communicatively coupled to the transformable stage and the feedback detector, receiving one or more images from the feedback detector including a position of illumination from the illumination source on the sample; sending control signals to the one or more deflectors to position illumination from the illumination source onto a measurement spot selected for measurement based on one or more images from the feedback detector; receiving one or more measurement images from the pupil plane detector; generating one or more metrology measurements based on the one or more metrology images. a controller including one or more processors configured to execute program instructions to cause A measurement system including:

18. The one or more processors: sending the control signal to the one or more deflectors to adjust a position of illumination from the illumination source on the sample around a measurement spot during a measurement.

20. The metrology system of claim 17, further configured to execute program instructions to cause the system to:

19. The one or more processors: transmitting the control signal to the one or more deflectors to maintain a position of illumination from the illumination source on the sample over a measurement spot during a measurement while the sample is moving.

20. The metrology system of claim 17 configured to execute program instructions to cause the system to:

20. A field stop disposed at a field plane along the collection path.

20. The metrology system of claim 17, further comprising: adjusting the one or more deflectors adjusts a position of illumination on the sample while maintaining a stable distribution of light at the field stop.

21. The metrology system of claim 17 , wherein at least one of the one or more deflectors is a tiltable mirror.

22. 22. The metrology system of claim 21, wherein the tiltable mirror is at least one of a piezoelectric tilt mirror or a galvanometer.

23. The metrology system of claim 17 , wherein at least one of the one or more deflectors is an acousto-optic deflector.

24. The metrology system of claim 17 , wherein at least one of the one or more deflectors is a micro-electro-mechanical system (MEMS).

25. 20. The metrology system of claim 17, wherein the one or more deflectors include a dual-axis deflector configured to adjust a position of illumination from the illumination source along two orthogonal directions on the sample.

26. The one or more deflectors include: a first uniaxial deflector disposed at a first of the one or more relay pupil planes configured to adjust a position of illumination from the illumination source along a first direction on the sample; a second single-axis deflector located at a second of the one or more relay pupil planes and configured to adjust a position of illumination from the illumination source along a second direction on the sample that is orthogonal to the first direction; The measurement system of claim 17 , comprising:

27. A measurement method comprising: illuminating the sample by directing illumination from an illumination source through a beam splitter, along a measurement path, and through an objective lens; collecting light from the sample using the objective lens and directing the collected light along the measurement path through the beam splitter to a detector located at a pupil plane; adjusting a position of illumination from an illumination source on the sample using one or more deflectors located at one or more relay pupil planes between the objective lens and the beam splitter, where adjusting the one or more deflectors adjusts a position of illumination from the illumination source on the sample while maintaining a stable position of collected light on the detector; Measurement methods including.

Images