Partition for aiming

Abstract

To provide a partition for aiming that can be easily carried and does not require a large storage area.SOLUTION: A partition 10 for aiming comprises a pair of support members 20 arranged separately from each other, a support base material 30 supported by the pair of support members 20, and a plurality of front plates 40 arranged in parallel on at least one surface 30a of the support base material 30.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to an aiming partition.

Background Art

[0002] The automobile maintenance system has been expanded from the conventional "disassembly and maintenance" in which the engine, brakes, etc. are removed, to maintenance or modification (electronic control device maintenance) that affects the operation of the device without performing such removal as described above. The automobile maintenance system has added an "automatic operation device" mounted on an automobile that performs automatic driving at level 3 or higher of automatic driving as a device to be maintained, and its name has been changed to the automobile specific maintenance system.

[0003] The automobile specific maintenance system positions the adjustment of cameras, radars, etc. that monitor the front used for automatic brakes, etc. and the maintenance of the automatic operation device as "electronic control device maintenance" in addition to the conventional disassembly and maintenance. The automobile specific maintenance system also defines the requirements for workplaces, employees, tools, etc. required for the maintenance of the automatic operation device.

[0004] In order for the electronic control device to operate correctly, it is necessary to perform calibration and adjustment work called aiming. Currently, automobiles are equipped with child control devices such as collision damage reduction brakes. Specifically, aiming is calibration work to ensure that electronic control devices such as collision damage reduction brakes and systems for dealing with driver abnormalities operate normally after maintenance.

[0005] To perform aiming, an aiming target corresponding to the vehicle type is placed in front of the automobile (in front of the millimeter-wave radar arranged at the tip of the automobile). After installing the aiming target, the calibration and adjustment work of the millimeter-wave radar is performed by performing optical axis learning using a scan tool.

[0006] Furthermore, in order to perform aiming, it is necessary to prepare the working environment so that the millimeter-wave radar can function properly. For example, the environment must be such that there are no objects that absorb the radio waves emitted from the millimeter-wave radar within the search range of the target for aiming by the millimeter-wave radar.

[0007] When performing aiming operations, a stable electromagnetic wave propagation environment is necessary. However, if there are metals or other materials in the work environment that reflect electromagnetic waves, these will affect the work environment, so it is necessary to remove such materials (see, for example, Non-Patent Document 1). [Prior art documents] [Non-patent literature]

[0008] [Non-Patent Document 1] First Group Co., Ltd., Basic Knowledge of Aiming. A comprehensive explanation of the work process, necessary tools, and environment. [online], [Searched September 17, 2021], Internet<URL:https: / / cars-enjoy.com / biz / media / ?p=206> [Overview of the project] [Problems that the invention aims to solve]

[0009] However, due to the working environment, it was sometimes impossible to remove metal and other materials, which presented a challenge in performing accurate aiming work.

[0010] The present invention has been made in view of the above circumstances, and aims to provide an aiming partition that is easy to transport and does not require a large storage space, in order to provide a stable working environment that is not affected by metals and other objects in the working environment. [Means for solving the problem]

[0011] The present invention provides the following aiming partition. [1] An aiming partition comprising a pair of support members spaced apart from each other, a base material supported by the pair of support members, and a plurality of front panels arranged in parallel on at least one side of the base material. [2] The front panel has an electromagnetic wave absorbing layer, a spacer layer, and a reflective layer. The aiming partition according to [1], wherein the electromagnetic wave absorbing layer, the spacer layer, and the reflective layer are stacked in this order. [3] The aiming partition according to [1] or [2], wherein the plurality of front panels are arranged in parallel and spaced apart from each other on at least one surface of the base material. [4] The aiming partition according to any one of [1] to [3], wherein the distance between adjacent front panels among the plurality of front panels is 4 mm or less. [5] The base material is removable from the support member, as described in any of [1] to [4]. [6] The base material is flexible, and the aiming partition is as described in any of [1] to [5]. [7] The supporting member is made of a non-metallic material, and is an aiming partition according to any one of [1] to [6]. [8] The aiming partition according to any one of [1] to [7], wherein the base material is made of a non-metallic material. [9] The spacer layer is made of foam, and the aiming partition is as described in any of [2] to [8].

[10] The aiming partition according to any one of [2] to [9], wherein the reflective layer is made of a metal plate. [Effects of the Invention]

[0012] According to the present invention, it is possible to provide an aiming partition that is easy to transport and does not require a large storage space. [Brief explanation of the drawing]

[0013] [Figure 1]It is a perspective view schematically showing an aiming partition according to an embodiment of the present invention. [Figure 2] It is a side view schematically showing a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 3] It is a cross-sectional view of a plane along the thickness in an electromagnetic wave absorber, schematically showing a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 4] It is a cross-sectional view of a plane along the thickness in an electromagnetic wave absorber, schematically showing a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 5] It is a top view showing an example of an electromagnetic wave absorption layer of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 6] It is a top view showing an example of a first electromagnetic wave absorption pattern of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 7] It is a top view showing an example of a first unit of a first electromagnetic wave absorption pattern of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 8] It is a top view showing an example of a second electromagnetic wave absorption pattern of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 9] It is a top view showing an example of a second unit of a second electromagnetic wave absorption pattern constituting an electromagnetic wave absorber according to an embodiment of the present invention. [Figure 10] It is a top view showing an example of a third electromagnetic wave absorption pattern of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 11] It is a top view showing an example of a third unit of a third electromagnetic wave absorption pattern of a front panel constituting an aiming partition according to an embodiment of the present invention. [Figure 12] It is a cross-sectional view taken along line VIII-VIII of FIG. 5. [Figure 13]It is a plan view schematically showing a front panel constituting an aiming partition according to an embodiment of the present invention.

Mode for Carrying Out the Invention

[0014] An embodiment of the aiming partition of the present invention will be described. Note that this embodiment is specifically described to better understand the gist of the invention, and does not limit the present invention unless otherwise specified.

[0015] In this specification, the “electromagnetic wave absorption pattern” is an aggregate of units that are geometric figures, and means an object that selectively absorbs electromagnetic waves of a certain frequency. It can be said that the “electromagnetic wave absorption pattern” has a function similar to that of a so-called antenna. In this specification, the “electromagnetic wave in the millimeter wave band” means an electromagnetic wave with a wavelength of 1 mm to 15 mm. It can also be said that the “electromagnetic wave in the millimeter wave band” is an electromagnetic wave with a frequency of 30 GHz to 300 GHz. In this specification, “~” indicating a numerical range means including the numerical values described before and after it as the lower limit value and the upper limit value.

[0016] [Aiming partition] Hereinafter, an embodiment example to which the present invention is applied will be described. The figures used in the following description may show the main parts enlarged for the sake of clarity of the features of the present invention, and the dimensional ratios of each component are not necessarily the same as the actual values.

[0017] FIG. 1 is a perspective view schematically showing the aiming partition of this embodiment. FIG. 2 is a side view schematically showing the front panel constituting the aiming partition of this embodiment. As shown in FIG. 1, the aiming partition 10 of this embodiment includes a pair of support members 20, a support base material 30, and a front panel 40.

[0018] The pair of support members 20 are arranged spaced apart from each other at a predetermined interval. Furthermore, the pair of support members 20 are arranged so that their longitudinal direction aligns with the vertical direction. Alternatively, the pair of support members 20 may be arranged so that their longitudinal direction aligns approximately with the vertical direction, as long as they are long enough to support the front panel.

[0019] As shown in Figure 1, it is preferable that the aiming partition 10 has a crossbar 50 between a pair of support members 20. Furthermore, it is preferable that the support base material 30 is fixed to the pair of support members 20 and the crossbar 50. This allows the front panel 40 to be supported more stably by the support members 20.

[0020] The support base material 30 is rectangular in shape when viewed from above. The support base material 30 is fixed to a pair of support members 20. In Figure 1, the support base material 30 is positioned from one support member 20A to the other support member 20B. One longitudinal edge 30A of the support base material 30 is fixed to one support member 20A, and the other longitudinal edge 30B of the support base material 30 is fixed to the other support member 20B. The support base material 30 only needs to be positioned so that its short side is aligned with the vertical or approximately vertical direction when fixed to the pair of support members 20, and the position where it connects to the pair of support members 20 is not particularly limited.

[0021] The size (area) of the support base material 30 when viewed from above is appropriately adjusted according to the projected area when viewing the vehicle being aimed using the aiming partition 10 from the front. The size of the support base material 30 when viewed from above is preferably, for example, 2m in height and 2.5m in width, but multiple small aiming partitions may be arranged to achieve the aforementioned size. When multiple small aiming partitions are arranged, reducing the gaps between the partitions will suppress radio wave leakage. In this specification, "height" refers to the vertical direction of the paper, and "width" refers to the horizontal direction of the paper.

[0022] The front panel 40 is rectangular in shape when viewed from above. Multiple front panels 40 are arranged in parallel on one surface 30a of the support base material 30. Multiple front panels 40 may also be arranged on the other surface of the support base material 30 (the surface opposite to the surface 30a). When multiple front panels 40 are arranged on one surface 30a and the other surface of the support base material 30, it is preferable that the total area formed by the multiple front panels 40 is different from that of the other. This allows for the use of different front panels on the support base material 30 depending on the projected area when viewing the vehicle from the front while aiming using the aiming partition 10.

[0023] "Front board" It is preferable that the multiple front plates 40 are spaced apart from each other on at least one surface 30a of the support base material 30 and arranged in parallel in the vertical and horizontal directions of the support base material 30. This makes it possible to provide flexibility to the support base material 30 on which the multiple front plates 40 are provided.

[0024] The spacing between adjacent front panels 40 is preferably 4 mm or less, and more preferably 2 mm or less. If the spacing between the front panels 40 is 4 mm or less, the transmission of radio waves through the aiming partition 10 can be suppressed. If radio waves transmit through the aiming partition 10, the aiming work cannot be performed properly. Note that adjacent front panels 40 do not need to be adjacent to each other, but they may also be touching each other.

[0025] As shown in Figure 2, the front panel 40 has an electromagnetic wave absorbing layer 110, a spacer layer 120, and a reflective layer 130. Furthermore, the electromagnetic wave absorbing layer 110, the spacer layer 120, and the reflective layer 130 are stacked in this order.

[0026] Figures 3 and 4 schematically show the front panel in this embodiment and are cross-sectional views of the surface along the thickness of the front panel. Furthermore, the front panel 40 in this embodiment may include a protective layer 140 formed on the surface of the electromagnetic wave absorbing layer 110.

[0027] The reflective layer 130 is positioned on the other side (back surface) 110b of the electromagnetic wave absorbing layer 110. The spacer layer 120 is positioned between the electromagnetic wave absorbing layer 110 and the reflective layer 130. That is, the electromagnetic wave absorbing layer 110 and the reflective layer 130 are laminated with the spacer layer 120 in between. The protective layer 140 is formed on one side (front surface) 110a of the electromagnetic wave absorbing layer 110.

[0028] "Electromagnetic wave absorption layer" The electromagnetic wave absorbing layer 110 consists of a frequency-selective surface (FSS). A frequency-selective surface is a surface that can block only electromagnetic waves of a specific frequency by forming a continuous structure with a shape smaller than the wavelength using a conductive material or the like. The electromagnetic wave absorbing layer 110 may be a single layer as shown in Figure 3, or it may include a substrate 111 and an electromagnetic wave absorbing pattern 112 formed on the substrate 111 as shown in Figure 4. If the electromagnetic wave absorbing layer 110 is a single layer, the electromagnetic wave absorbing layer 110 is made of the same material as the electromagnetic wave absorbing pattern 112 described later.

[0029] Figure 5 is a top view showing an example of an electromagnetic wave absorbing layer in this embodiment. As shown in Figure 5, the electromagnetic wave absorbing layer 110 is an electromagnetic wave absorbing film having a flat substrate 111 and an electromagnetic wave absorbing pattern 112 formed on one surface 111a of the substrate 111. The electromagnetic wave absorbing pattern 112 consists of a first electromagnetic wave absorbing pattern 161, a second electromagnetic wave absorbing pattern 162, and a third electromagnetic wave absorbing pattern 163.

[0030] (First electromagnetic wave absorption pattern) Figure 6 is a top view showing the first electromagnetic wave absorption pattern 161. As shown in Figure 6, the first electromagnetic wave absorption pattern 161 is composed of a plurality of first units u1. Each of the first units u1 is a geometric figure. In other words, the first electromagnetic wave absorption pattern 161 can be described as a collection of the first unit u1, which is a geometric figure. Each of the first units u1 functions as a single antenna. The first electromagnetic wave absorption pattern 161 may be, for example, a fine-line pattern of FSS elements.

[0031] In the first electromagnetic wave absorption pattern 161, multiple first arrays R1 are formed, in which multiple first units u1 are arranged along the direction indicated by the double-headed arrow P in Figure 6. It can also be said that the first electromagnetic wave absorption pattern 161 has multiple first arrays R1. The first electromagnetic wave absorption pattern 161 can be constructed by forming multiple first arrays R1 on the substrate 111 at predetermined intervals along the direction indicated by the double-headed arrow P. There are no particular restrictions on the spacing between multiple first sequences R1. The spacing between first sequences R1 may be regular or irregular.

[0032] Figure 7 is a top view showing the first unit u1. Figure 7 is a top view showing the first unit u1 that constitutes the first electromagnetic wave absorption pattern 161. As shown in Figure 7, the shape of the first unit u1 is a cross shape that is symmetrical both vertically and horizontally. Specifically, the first unit u1 has one cross section S1 and four ends T1. The cross section S1 is composed of a straight section parallel to the x-axis direction and a straight section parallel to the y-axis direction in Figure 7. Each of the straight ends T1 is attached to both ends of the straight section parallel to the x-axis direction and to both ends of the straight section parallel to the y-axis direction, perpendicular to each straight section.

[0033] By adjusting the x-axis length L1 of the first unit u1 and the x-axis lengths W1 of each of the four ends T1, the electromagnetic wave absorption characteristics of the first unit u1, which functions as a single antenna, can be adjusted. The electromagnetic wave absorption characteristics can be adjusted in the y-axis direction in a similar manner.

[0034] However, the shape of the first unit is not limited to a cross shape. The shape of the first unit is not particularly limited as long as the frequency value at which the amount of electromagnetic waves absorbed by the first electromagnetic wave absorption pattern 161 shows a maximum value is A [GHz]. For example, the shapes of the first unit, a geometric figure, can include circles, rings, straight lines, squares, polygons, H-shapes, Y-shapes, V-shapes, and so on.

[0035] In the electromagnetic wave absorbing layer 110, the shapes of the multiple first units u1 are identical to each other. However, the shapes of the multiple first units u1 do not have to be identical. In other examples of the present invention, the shapes of the multiple first units may be identical or different to each other, as long as the absorption characteristics can be adjusted to the target frequency.

[0036] The first electromagnetic wave absorption pattern 161 selectively absorbs electromagnetic waves with a frequency of A [GHz]. The frequency value A [GHz] is the frequency value at which the amount of electromagnetic wave absorbed by the first electromagnetic wave absorption pattern 161 shows a maximum value in the range of 20 GHz to 110 GHz. The frequency value A [GHz] at which the amount of electromagnetic wave absorption by the first electromagnetic wave absorption pattern 161 reaches its maximum can be determined, for example, by the following methods X and Y.

[0037] Method X: An electromagnetic wave is irradiated onto a standard film described later while varying the frequency within the range of 20 GHz to 110 GHz. The frequency of the electromagnetic wave at which the amount of electromagnetic wave absorbed by the standard film reaches its maximum value is defined as A [GHz]. Method Y: From a substrate and an electromagnetic wave absorbing film having multiple electromagnetic wave absorbing patterns formed on the substrate, the electromagnetic wave absorbing patterns are removed from the substrate so that only a single electromagnetic wave absorbing pattern remains. Next, the film having only the single electromagnetic wave absorbing pattern is irradiated with electromagnetic waves while varying the frequency within the range of 20 GHz to 110 GHz, and the frequency of the electromagnetic wave at which the amount of electromagnetic wave absorption by the film reaches its maximum is defined as A [GHz].

[0038] A standard film comprises a standard substrate which is in the shape of a flat plate and a standard pattern formed on the standard substrate. The details of the standard substrate can be the same as those of substrate 111. Therefore, the details of the standard substrate will be explained in detail in the description of substrate 111 below.

[0039] A standard pattern consists only of multiple standard units, each having the same shape. In the case of a standard film, it can be said that a standard pattern consisting of only one type of shape is formed on the standard substrate. A standard pattern can be formed by a fine-line pattern of a typical FSS element. Typically, the standard pattern is the same electromagnetic wave absorption pattern as the first electromagnetic wave absorption pattern 161. In a standard pattern, the shapes of multiple standard units are not particularly limited as long as they are identical figures. Examples of standard unit shapes include circles, rings, lines, squares, polygons, crosses, H-shapes, Y-shapes, and V-shapes. Typically, the shape of a standard unit is identical to the first unit u1.

[0040] In a standard film, multiple standard units are arranged on a standard substrate such that the distance between the edges of the shapes is 1 mm. For example, if the shape of a standard unit is a cross shape, the intersection of the cross is the center of the shape, and the edges of the shape are the parts furthest from the center along the direction of each of the two straight lines that make up the cross.

[0041] The material of the standard unit constituting the standard pattern is not particularly limited, as long as it is such that the amount of electromagnetic waves absorbed by the standard film can be maximized when the standard film is irradiated with electromagnetic waves while varying the GHz range from 20 GHz to 110 GHz. The details of the material for the standard unit can be the same as those for the first unit.

[0042] The amount of electromagnetic waves absorbed by the standard film can be calculated using the following formula (1). Absorption amount = Input signal - Reflection characteristics (S11) - Transmission characteristics (S21) ... (1) The input signal is an indicator of the intensity of electromagnetic waves at the irradiation source when electromagnetic waves are irradiated onto a standard film. The reflection characteristic (S11) is an indicator of the intensity of electromagnetic waves reflected by a standard film when electromagnetic waves are irradiated onto the standard film from an irradiation source. The reflection characteristic (S11) can be measured, for example, by the free-space method using a vector network analyzer. Transmission characteristics (S21) are an indicator of the intensity of electromagnetic waves transmitted through a standard film when electromagnetic waves are irradiated onto the standard film from an irradiation source. Transmission characteristics (S21) can be measured, for example, using the free-space method with a vector network analyzer.

[0043] The frequency A [GHz] can be determined, for example, by the following method. First, electromagnetic waves are irradiated onto a standard film while varying the frequency within the range of 20 GHz to 110 GHz, and the amount of electromagnetic waves absorbed by the standard film is calculated using the above formula (1). Next, an absorption spectrum diagram is created by plotting the changed frequencies on the horizontal axis and the absorption amount calculated by equation (1) on the vertical axis. Typically, in this absorption spectrum diagram, there is one value on the horizontal axis corresponding to the frequency at which the absorption amount is maximum. Therefore, a single peak is formed in the plot where the absorption amount of the electromagnetic wave is at its maximum. Thus, the frequency of the electromagnetic wave at which the absorption amount of the electromagnetic wave is maximum can be denoted as A [GHz].

[0044] In method X, if the value of frequency A can be predicted in advance, the frequency of the electromagnetic wave irradiated onto the standard film may be varied within a range narrower than 20 GHz to 110 GHz. For example, the frequency of the electromagnetic wave irradiated onto the standard film may be varied within the range of 50 GHz to 110 GHz.

[0045] The first electromagnetic wave absorption pattern 161 absorbs electromagnetic waves whose frequency is A [GHz] as determined by the method X described above. In the electromagnetic wave absorbing layer 110 of this embodiment, the frequency value A is preferably 20 GHz to 110 GHz, more preferably 60 GHz to 100 GHz, even more preferably 65 GHz to 95 GHz, and particularly preferably 70 GHz to 90 GHz. When the frequency value A is within the above numerical range, the electromagnetic wave absorbing layer 110 can absorb electromagnetic waves in the millimeter wave region, making it easier to apply to automobile parts, roadside components, building exterior wall materials, windows, communication equipment, radio telescopes, etc.

[0046] In method Y, similar to method X, the amount of electromagnetic wave absorption by the film can be measured. Specifically, electromagnetic waves are irradiated onto the film while varying the frequency within the range of 20 to 110 [GHz], and the amount of electromagnetic wave absorbed by the film is calculated using the above formula (1). Next, an absorption spectrum diagram is created by plotting frequency on the horizontal axis and the amount of absorption calculated by equation (1) on the vertical axis. Typically, in this absorption spectrum diagram, there is one value on the horizontal axis corresponding to the frequency at which the absorption amount is maximum. Therefore, a single peak is formed in the plot where the absorption amount of the electromagnetic wave is at its maximum value. In this way, the frequency of the electromagnetic wave at which the absorption amount of the electromagnetic wave is maximum can be defined as A [GHz].

[0047] The material of the first unit u1 is not particularly limited, as long as its absorption characteristics can be adjusted to the desired frequency. Examples of materials for the first unit include fine metal wires, conductive thin films, and conductive paste fixatives. Examples of metal materials include copper, aluminum, tungsten, iron, molybdenum, nickel, titanium, silver, gold, or alloys containing two or more of these metals (for example, stainless steel, carbon steel, brass, phosphor bronze, zirconium copper alloy, beryllium copper, iron nickel, nichrome, nickel titanium, Kanthal, Hastelloy, rhenium tungsten, etc.). Examples of materials for conductive thin films include metal particles, carbon nanoparticles, and carbon fibers.

[0048] The distance between the ends of the first unit u1 is not particularly limited, as long as the absorption characteristics can be adjusted to the desired frequency. For example, the spacing between the ends of the first unit u1 figure may all be the same or they may be different. However, it is preferable that the spacing between the ends of the first unit u1 figure be the same, as this makes it easier to design an electromagnetic wave absorbing film that is less affected by the surrounding environment and improves the accuracy of the frequency band of absorbed electromagnetic waves during manufacturing.

[0049] (Second electromagnetic wave absorption pattern) Figure 8 is a top view showing the second electromagnetic wave absorption pattern 162. As shown in Figure 8, the second electromagnetic wave absorption pattern 162 is composed of multiple second units u2. Each of the second units u2 is a geometric figure. In other words, the second electromagnetic wave absorption pattern 162 can be said to be a collection of second units u2, which are geometric figures. Each of the second units u2 functions as a single antenna. The second electromagnetic wave absorption pattern 162 may be, for example, a fine-line pattern of FSS elements.

[0050] In the second electromagnetic wave absorption pattern 162, a second array R2 is formed in which a plurality of second units u2 are arranged along the direction indicated by the double-headed arrow P in Figure 8. It can also be said that the second electromagnetic wave absorption pattern 162 has a plurality of second arrays R2. The second electromagnetic wave absorption pattern 162 can be constructed by forming the second array R2 on the substrate 111 at predetermined intervals along the direction indicated by the double-headed arrow P. There are no particular restrictions on the spacing between multiple second sequences R2. The spacing between the second sequences R2 may be regular or irregular.

[0051] Figure 9 is a top view showing the second unit u2. As shown in Figure 9, the shape of the second unit u2 is a cross shape that is symmetrical both vertically and horizontally. Specifically, the second unit u2 has one cross section S2 and four ends T2. The cross section S2 is composed of a straight section parallel to the x-axis direction and a straight section parallel to the y-axis direction in Figure 9. Each of the straight ends T2 is in contact with both ends of the straight section parallel to the x-axis direction and both ends of the straight section parallel to the y-axis direction, perpendicular to each respective straight section.

[0052] In the electromagnetic wave absorbing layer 110, the x-axis length L2 of the second unit u2 is shorter than the x-axis length L1 of the first unit u1. In addition, the x-axis or y-axis length W2 of each of the four end portions T2 is shorter than the W1 of each of the four end portions T1 of the first unit u1. By adjusting the x-axis length L2 of the second unit u2 and the x-axis lengths W2 of each of the four ends T2, the electromagnetic wave absorption characteristics of the second unit u2, which functions as a single antenna, can be adjusted. The electromagnetic wave absorption characteristics can be adjusted in the y-axis direction in a similar manner.

[0053] In the electromagnetic wave absorbing layer 110, the shapes of the multiple second units u2 are identical to each other. However, the shapes of the multiple second units u2 do not have to be identical. In other examples of the present invention, the shapes of the multiple second units may be identical or different to each other, as long as the absorption characteristics can be adjusted to the desired frequency.

[0054] The second electromagnetic wave absorption pattern 162 selectively absorbs electromagnetic waves with a frequency of B [GHz] that satisfies the following equation (2). The frequency value B [GHz] is the frequency value at which the amount of electromagnetic wave absorbed by the second electromagnetic wave absorption pattern 162 reaches its maximum value. The frequency value B [GHz] satisfies the following equation (2). 1.037×A≦B≦1.30×A...Equation (2)

[0055] As shown in equation (2) above, the second electromagnetic wave absorption pattern 162 absorbs electromagnetic waves with frequencies from 1.037 × A [GHz] to 1.30 × A [GHz]. Preferably, the second electromagnetic wave absorption pattern 162 absorbs electromagnetic waves with frequencies from 1.17 × A [GHz] to 1.30 × A [GHz]. Since the second electromagnetic wave absorption pattern 162 absorbs electromagnetic waves with frequencies of 1.037 × A [GHz] or higher, the peak of electromagnetic wave absorption by the second electromagnetic wave absorption pattern 162 and the peak of electromagnetic wave absorption by the first electromagnetic wave absorption pattern 161 overlap sufficiently in the frequency band higher than A [GHz]. As a result, compared to a film having the first electromagnetic wave absorption pattern 161 alone, the frequency band of electromagnetic waves that can be absorbed by the entire electromagnetic wave absorbing film is extended to the frequency band higher than A [GHz]. Since the second electromagnetic wave absorption pattern 162 absorbs electromagnetic waves with frequencies below 1.30 × A [GHz], the frequency difference between the peak of electromagnetic wave absorption by the second electromagnetic wave absorption pattern 162 and the peak of electromagnetic wave absorption by the first electromagnetic wave absorption pattern 161 becomes smaller in the frequency band above A [GHz]. As a result, a single peak is formed where the amount of electromagnetic wave absorbed by the entire electromagnetic wave absorption film reaches its maximum value. Therefore, since the second electromagnetic wave absorption pattern 162 absorbs electromagnetic waves with frequencies from 1.037 × A [GHz] to 1.30 × A [GHz], the amount of electromagnetic waves absorbed by the entire electromagnetic wave absorption film is extended to the higher frequency band.

[0056] However, the shape of the second unit is not limited to a cross shape. The shape of the second unit is not particularly limited as long as the absorption characteristics can be adjusted to the target frequency. For example, the shape of the figure that is the second unit can be a circle, ring, straight line, square, polygon, H-shape, Y-shape, V-shape, etc.

[0057] The material of the second unit constituting the second electromagnetic wave absorption pattern 162 is not particularly limited as long as it can absorb electromagnetic waves of B [GHz], and is not particularly limited as long as the absorption characteristics can be adjusted to the target frequency. The material of the second unit is the same as that described for the material of the first unit, u1.

[0058] The distance between the ends of the second unit u2 is not particularly limited, as long as the absorption characteristics can be adjusted to the desired frequency. For example, the spacing between the ends of the second unit u2 figure may all be the same or they may be different. However, it is preferable that the spacing between the ends of the second unit u2 figure be the same, as this makes it easier to design an electromagnetic wave absorbing film that is less affected by the surrounding environment and improves the accuracy of the frequency band of absorbed electromagnetic waves during manufacturing.

[0059] (Third electromagnetic wave absorption pattern) Figure 10 is a top view showing the third electromagnetic wave absorption pattern 163. As shown in Figure 10, the third electromagnetic wave absorption pattern 163 is composed of multiple third units u3. Each of these third units u3 is a geometric figure. In other words, the third electromagnetic wave absorption pattern 163 can be described as a collection of these geometric third units u3. Each of the third units u3 functions as a single antenna. The third electromagnetic wave absorption pattern 163 may be, for example, a fine-line pattern of FSS elements.

[0060] In the third electromagnetic wave absorption pattern 163, a third array R3 is formed in which a plurality of third units u3 are arranged along the direction indicated by the double-headed arrow P in Figure 10. It can also be said that the third electromagnetic wave absorption pattern 163 has a plurality of third arrays R3. The third electromagnetic wave absorption pattern 163 can be constructed by forming the third array R3 on the substrate 111 at predetermined intervals along the direction indicated by the double-headed arrow P. There are no particular restrictions on the spacing between multiple third sequences R3. The spacing between third sequences R3 may be regular or irregular.

[0061] Figure 11 is a top view showing the third unit u3. As shown in Figure 11, the shape of the third unit u3 is a cross shape that is symmetrical both vertically and horizontally. Specifically, the third unit u3 has one cross section S3 and four ends T3. The cross section S3 is composed of a straight section parallel to the x-axis direction and a straight section parallel to the y-axis direction in Figure 11. Each of the straight ends T3 is attached to both ends of the straight section parallel to the x-axis direction and to both ends of the straight section parallel to the y-axis direction, perpendicular to each respective straight section.

[0062] In the electromagnetic wave absorbing layer 110, the x-axis length L3 of the third unit u3 is longer than the x-axis length L1 of the first unit u1. In addition, the x-axis or y-axis length W3 of each of the four end portions T3 is longer than the W1 of each of the four end portions T1 of the first unit u1. By adjusting the x-axis length L3 of the third unit u3 and the x-axis lengths W3 of each of the four ends T3, the electromagnetic wave absorption characteristics of the third unit u3, which functions as a single antenna, can be adjusted. The electromagnetic wave absorption characteristics can be adjusted in the y-axis direction in a similar manner.

[0063] In the electromagnetic wave absorbing layer 110, the shapes of the multiple third units u3 are identical to each other. However, the shapes of the multiple third units u3 do not have to be identical. In other examples of the present invention, the shapes of the multiple third units may be identical or different, as long as the absorption characteristics can be adjusted to the target frequency.

[0064] The third electromagnetic wave absorption pattern 163 selectively absorbs electromagnetic waves with a frequency C [GHz] that satisfies the following equation (3). The frequency value C [GHz] is the frequency value at which the amount of electromagnetic wave absorption by the third electromagnetic wave absorption pattern 163 reaches its maximum value. The frequency value C [GHz] satisfies the following equation (3). 0.60×A≦C≦0.963×A...Equation (3)

[0065] As shown in equation (3) above, the third electromagnetic wave absorption pattern 163 absorbs electromagnetic waves with frequencies from 0.60 × A [GHz] to 0.963 × A [GHz]. Preferably, the third electromagnetic wave absorption pattern 163 absorbs electromagnetic waves with frequencies from 0.60 × A [GHz] to 0.83 × A [GHz]. Since the third electromagnetic wave absorption pattern 163 absorbs electromagnetic waves with frequencies of 0.60 × A [GHz] or higher, the frequency difference between the peak of electromagnetic wave absorption by the third electromagnetic wave absorption pattern 163 and the peak of electromagnetic wave absorption by the first electromagnetic wave absorption pattern 161 becomes smaller in the frequency band lower than A [GHz]. As a result, a single peak is formed where the amount of electromagnetic wave absorbed by the entire electromagnetic wave absorption layer 20 reaches its maximum value. Since the third electromagnetic wave absorption pattern 163 absorbs electromagnetic waves with frequencies of 0.963 × A [GHz] or less, the peak of electromagnetic wave absorption by the third electromagnetic wave absorption pattern 163 and the peak of electromagnetic wave absorption by the first electromagnetic wave absorption pattern 161 sufficiently overlap in the frequency band lower than A [GHz]. As a result, the frequency band of electromagnetic waves that can be absorbed by the entire electromagnetic wave absorption film is extended to the frequency band lower than A [GHz] compared to a film having the first electromagnetic wave absorption pattern 161 alone. Therefore, since the third electromagnetic wave absorption pattern 163 absorbs electromagnetic waves with frequencies from 0.60 × A [GHz] to 0.963 × A [GHz], the amount of electromagnetic waves absorbed by the entire electromagnetic wave absorption layer 110 is extended to the lower frequency band.

[0066] However, the shape of the third unit u3 is not limited to a cross shape. The shape of the third unit u3 is not particularly limited as long as the absorption characteristics can be adjusted to the target frequency. For example, the shape of the figure of the third unit can be a circle, ring, straight line, square, polygon, H-shape, Y-shape, V-shape, etc.

[0067] The material of the third unit u3 constituting the third electromagnetic wave absorption pattern 163 is not particularly limited as long as it can absorb electromagnetic waves of C [GHz], and is not particularly limited as long as the absorption characteristics can be adjusted to the target frequency. The material of the third unit u3 is the same as that described for the material of the first unit u1.

[0068] The spacing between the ends of the third unit u3 is not particularly limited, as long as the absorption characteristics can be adjusted to the desired frequency. For example, the spacing between the edges of the third unit u3 figure may all be the same or they may be different. However, it is preferable that the spacing between the edges of the third unit u3 figure be the same, as this makes it easier to design an electromagnetic wave absorbing film that is less affected by the surrounding environment and improves the accuracy of the frequency band of absorbed electromagnetic waves during manufacturing.

[0069] In the electromagnetic wave absorbing layer 110 shown in Figure 5, the first array R1, the second array R2, and the third array R3 are arranged along the direction indicated by the double arrow P so that they are adjacent to each other. In this way, because the first array R1, the second array R2, and the third array R3 are arranged adjacent to each other on the substrate 111, the frequency bands of electromagnetic waves selectively absorbed by the second electromagnetic wave absorbing pattern 162 and the frequency bands of electromagnetic waves selectively absorbed by the third electromagnetic wave absorbing pattern 163 overlap, with respect to the frequency value A [GHz] of the peak position of the electromagnetic waves selectively absorbed by the first electromagnetic wave absorbing pattern 161. As a result, the electromagnetic wave absorption range absorbed by the entire electromagnetic wave absorbing layer 110 is easily extended to both the high-frequency and low-frequency sides, with respect to the frequency value A [GHz] of the peak position.

[0070] The intervals d1 between the first unit u1 and the second unit u2, d2 between the second unit u2 and the third unit u3, and d3 between the third unit u3 and the first unit u1, as shown in Figure 5, may be the same or different from each other. The interval d1 can be, for example, 0.2mm to 4mm, 0.3mm to 2mm, or 0.5mm to 1mm. The interval d2 can be, for example, 0.2mm to 4mm, 0.3mm to 2mm, or 0.5mm to 1mm. The spacing d3 can be, for example, 0.2mm to 4mm, 0.3mm to 2mm, or 0.5mm to 1mm. If intervals d1, d2, and d3 are each within the aforementioned numerical range, the absorption range of electromagnetic waves absorbed by the entire electromagnetic wave absorption layer 110 is more likely to be further extended with respect to the peak frequency value A [GHz].

[0071] In the electromagnetic wave absorbing layer 110, the shapes of the first unit u1, the second unit u2, and the third unit u3 are identical. However, the shapes of the first unit u1, the second unit u2, and the third unit u3 do not have to be identical. That is, in other examples of the present invention, the shapes of the first unit u1, the second unit u2, and the third unit u3 may be identical or different.

[0072] The electromagnetic wave absorbing layer 110 may have a plurality of second electromagnetic wave absorbing patterns 162. For example, in addition to the second electromagnetic wave absorbing pattern 2, the electromagnetic wave absorbing layer 110 may further have the following electromagnetic wave absorbing patterns 162a and 162b. Electromagnetic wave absorption pattern 162a: An electromagnetic wave absorption pattern in which the frequency value at which the amount of absorbed electromagnetic waves is maximized satisfies the following equation (4) and is D [GHz]. Electromagnetic wave absorption pattern 62b: An electromagnetic wave absorption pattern in which the frequency value at which the amount of absorbed electromagnetic waves is maximized satisfies the following equation (5) at E [GHz]. 1.037×A≦D<1.09×A...Equation (4) 1.09×A≦E<1.17×A...Equation (5) In equations (4) and (5) above, A is the frequency [GHz] specified by method X or method Y described above.

[0073] When the electromagnetic wave absorption layer 110 further has an electromagnetic wave absorption pattern 162a and an electromagnetic wave absorption pattern 162b in addition to the second electromagnetic wave absorption pattern 162, the value of the frequency at which the absorption amount of the electromagnetic waves absorbed by the second electromagnetic wave absorption pattern 162 shows a maximum value is preferably 1.17×A [GHz] to 1.30×A [GHz]. In this case, the effect of expanding the high-frequency side of the frequency band of the electromagnetic waves that can be absorbed by the entire electromagnetic wave absorption layer 110 is more remarkable, and the effect of the present invention can be obtained more remarkably.

[0074] The electromagnetic wave absorption layer 110 may have a plurality of third electromagnetic wave absorption patterns. For example, in addition to the third electromagnetic wave absorption pattern 163, the electromagnetic wave absorption layer 110 may further have the following electromagnetic wave absorption pattern 163a and electromagnetic wave absorption pattern 163b. Electromagnetic wave absorption pattern 163a: An electromagnetic wave absorption pattern in which the value of the frequency at which the absorption amount of the absorbed electromagnetic waves shows a maximum value is F [GHz] satisfying the following formula (6). Electromagnetic wave absorption pattern 163b: An electromagnetic wave absorption pattern in which the value of the frequency at which the absorption amount of the absorbed electromagnetic waves shows a maximum value is G [GHz] satisfying the following formula (7). 0.91×A < F ≦ 0.963×A ··· Formula (6) 0.83×A < G ≦ 0.91×A ··· Formula (7) In the following formula (6) and the following formula (7), A is the frequency [GHz] specified by the above method X or method Y.

[0075] When the electromagnetic wave absorption layer 110 further has an electromagnetic wave absorption pattern 163a and an electromagnetic wave absorption pattern 163b in addition to the third electromagnetic wave absorption pattern 163, the value of the frequency at which the absorption amount of the electromagnetic waves absorbed by the third electromagnetic wave absorption pattern 163 shows a maximum value is preferably 0.60×A [GHz] to 0.83×A [GHz]. In this case, the effect of expanding the low-frequency side of the frequency band of the electromagnetic waves that can be absorbed by the entire electromagnetic wave absorption layer 110 is more remarkable, and the effect of the present invention can be obtained more remarkably.

[0076] FIG. 12 is a cross-sectional view taken along the line VIII-VIII of the electromagnetic wave absorption layer 110 in FIG. 5. The base material 111 has two opposing surfaces 111a and 111b. A first electromagnetic wave absorption pattern 161, a second electromagnetic wave absorption pattern 162, and a third electromagnetic wave absorption pattern 163 are formed on one surface 111a of the base material 111. As shown in Figure 12, a plurality of first units u1, a plurality of second units u2, and a plurality of third units u3 are provided on one surface 111a of the base material 111.

[0077] The substrate 111 is not particularly limited as long as it is flat and capable of forming a first electromagnetic wave absorption pattern 161, a second electromagnetic wave absorption pattern 162, and a third electromagnetic wave absorption pattern 163 on one of its surfaces 111a. The substrate 111 may have a single-layer structure or a multi-layer structure.

[0078] The thickness K of the substrate 111 may be, for example, 5 μm to 500 μm, 15 μm to 200 μm, or 25 μm to 100 μm. The thickness H1 of the first electromagnetic wave absorption pattern 161, the thickness H2 of the second electromagnetic wave absorption pattern 162, and the thickness H3 of the third electromagnetic wave absorption pattern 163 are not particularly limited. Thicknesses H1, H2, and H3 can be arbitrarily changed according to the desired characteristics. Furthermore, thicknesses H1, H2, and H3 may be the same or different from each other. Thicknesses H1, H2, and H3 can be, for example, 1 μm to 100 μm, 5 μm to 50 μm, or 10 μm to 30 μm. The thicker each of thicknesses H1, H2, and H3, the better the electromagnetic wave absorption, but the higher the manufacturing cost. This point may be taken into consideration when setting the thicknesses H1, H2, and H3.

[0079] The material of the base material 111 can be appropriately selected depending on the application of the front panel 40. For example, the base material 111 may be made of a transparent material to ensure the transparency of the front panel 40. Alternatively, the base material 111 may be made of a flexible material to ensure the conformability of the front panel 40 to curved surfaces. The surface of the base material 111 may be made smooth to improve the transparency and three-dimensional moldability of the front panel 40.

[0080] For example, the base material 111 can be made of resin. The resin may be either a thermoplastic resin or a thermosetting resin. However, when considering the three-dimensional moldability of the front plate 40, it is preferable that the base material 111 includes a thermoplastic resin. Examples of thermoplastic resins include polyolefin resins, polyester resins, polyacrylic resins, polystyrene resins, polyimide resins, polyimidoamide resins, polyamide resins, polyurethane resins, polycarbonate resins, polyarylate resins, melamine resins, epoxy resins, urethane resins, silicone resins, and fluororesins. Specific examples of polyolefin resins include polypropylene and polyethylene. Specific examples of polyester resins include polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate.

[0081] As the thermosetting resin, for example, epoxy resin compositions, resin compositions that cure by urethane reaction, and resin compositions that cure by radical polymerization reaction can be used. These may be used individually or in combination of two or more. Epoxy resin compositions are compositions comprising epoxy resin and a curing agent. Specific examples of epoxy resins include polyfunctional epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, biphenyl type epoxy resins, and dicyclopentadiene type epoxy resins. Specific examples of curing agents include amine compounds and phenolic curing agents. Examples of resin compositions that harden by a urethane reaction include resin compositions containing a (meth)acrylic polyol and a polyisocyanate compound.

[0082] Examples of resin compositions that harden by radical polymerization include (meth)acrylic resins and unsaturated polyesters having radical polymerizable groups in their side chains. Examples of (meth)acrylic resins include resins obtained by reacting a polymer of vinyl monomers having reactive groups with a monomer having groups that can react with reactive groups derived from vinyl monomers and also having radical polymerizable groups; and epoxy acrylates having (meth)acrylic groups obtained by reacting (meth)acrylic acid or the like with the terminals of epoxy resin. Specific examples of vinyl monomers having reactive groups include acrylic monomers such as hydroxy(meth)acrylate and glycidyl(meth)acrylate. Specific examples of monomers that have a group that can react with a reactive group derived from a vinyl monomer and also have a radical polymerizable group include (meth)acrylic acid and isocyanate group-containing (meth)acrylates. Examples of unsaturated polyesters include those obtained by condensing a carboxylic acid (such as fumaric acid) having an unsaturated group with a diol. The base material 111 may contain optional components as long as they do not impair the effects of the present invention. Examples of optional components include inorganic fillers, colorants, curing agents, antioxidants, light stabilizers, flame retardants, conductive agents, antistatic agents, plasticizers, and the like.

[0083] Examples of inorganic fillers include metal particles, metal oxide particles, metal hydroxide particles, and metal nitride particles. More specifically, examples include silver particles, copper particles, aluminum particles, nickel particles, zinc oxide particles, aluminum oxide particles, aluminum nitride particles, silicon oxide particles, magnesium oxide particles, aluminum nitride particles, titanium particles, boron nitride particles, silicon nitride particles, silicon carbide particles, diamond particles, graphite particles, carbon nanotube particles, metallic silicon particles, carbon fiber particles, fullerene particles, and glass particles. Specific examples of colorants include inorganic pigments, organic pigments, and dyes. These may be used individually or in combination of two or more.

[0084] The thickness, dielectric constant, electrical conductivity, and magnetic permeability of the base material 111 can be set as appropriate, taking into consideration further improvements in the electromagnetic wave absorption performance of the front panel 40. When considering the electrical characteristics of the electromagnetic waves to be absorbed, the substrate 111 may be a layer with a high dielectric constant. If the substrate 111 is a layer with a high dielectric constant, the thickness of the front plate 40 can be made relatively thinner.

[0085] The electromagnetic wave absorbing layer 110 can be fabricated, for example, by the following method. First, a base material 111 is prepared. Next, a first electromagnetic wave absorption pattern 161, a second electromagnetic wave absorption pattern 162, and a third electromagnetic wave absorption pattern 163 are formed on one surface 111a of the base material 111. Here, when forming the first electromagnetic wave absorption pattern 161, it is formed such that the frequency value at which the amount of electromagnetic waves absorbed by the first electromagnetic wave absorption pattern 161 shows a maximum value is A [GHz]. When forming the second electromagnetic wave absorption pattern 162, it is formed such that the frequency value at which the amount of electromagnetic waves absorbed by the second electromagnetic wave absorption pattern 162 shows a maximum value is B [GHz]. When forming the third electromagnetic wave absorption pattern 163, it is formed such that the frequency value at which the amount of electromagnetic waves absorbed by the third electromagnetic wave absorption pattern 163 shows a maximum value is C [GHz]. The order in which the first electromagnetic wave absorption pattern 161, the second electromagnetic wave absorption pattern 162, and the third electromagnetic wave absorption pattern 163 are formed is not particularly limited. The first electromagnetic wave absorption pattern 161, the second electromagnetic wave absorption pattern 162, and the third electromagnetic wave absorption pattern 163 may be formed in the same process, or they may be formed in separate processes.

[0086] The method for forming each electromagnetic wave absorption pattern is not particularly limited, as long as it can form a predetermined frequency. Examples of methods for forming each electromagnetic wave absorption pattern include the following: A printing method for printing each electromagnetic wave absorption pattern onto one surface 111a of a substrate 111 using a conductive paste. A developing method for developing each electromagnetic wave absorption pattern on one surface 111a of a substrate 111. A method for forming a metal thin film on one surface 111a of a substrate 111 by sputtering, vacuum deposition, or lamination of metal foils, and then forming a pattern of the metal thin film on one surface 111a of the substrate 111 by photolithography. A method for arranging a metal wire on one surface 111a of a base material 111.

[0087] In the printing method, each electromagnetic wave absorption pattern is printed on one surface 111a of the substrate 111 to form the geometric units u1, u2, and u3. The printing method is not particularly limited. Examples include screen printing, gravure printing, and inkjet printing. Examples of conductive pastes used for printing include paste-like compositions comprising at least one selected from the group consisting of metal particles, carbon nanoparticles, and carbon fibers, and a binder resin component. Examples of metal particles include copper, silver, nickel, and aluminum. Examples of binder resin components include thermoplastic resins such as polyester resin, (meth)acrylic resin, polystyrene resin, and polyamide resin; and thermosetting resins such as epoxy resin, amino resin, and polyimide resin. However, the metal particles and binder resin components are not limited to these examples. The conductive paste may further contain a black pigment such as carbon black. The inclusion of a black pigment in the conductive paste can suppress the metallic luster of the metal powder constituting the printed electromagnetic wave absorption pattern, thereby reducing the reflection of ambient light.

[0088] In the development method, an electromagnetic wave absorption pattern is developed on one surface 111a of the substrate 111 to form the geometric units u1, u2, and u3. There are two types of development methods: negative-type development, where the developed material appears in the exposed areas without being covered by an exposure mask, and positive-type development, where the developed material appears in the unexposed areas covered by an exposure mask. In other words, in negative-type development, each unit u1, u2, and u3 is formed as the developed material in the opposite shape to the exposure mask. On the other hand, in positive-type development, each unit u1, u2, and u3 is formed as the developed material in the same shape as the exposure mask. Silver is usually used as the metal for the developed material.

[0089] One example of a method for forming electromagnetic wave absorption patterns using photolithography is the following method. First, a resist is applied to the surface of the substrate 111, heat-treated, and then the solvent is removed from the resist. Next, a desired pattern is exposed to the resist, and the resist pattern is developed to form a layer consisting of the resist pattern. Then, a vapor-deposited film is formed over the entire surface on the substrate and the layer consisting of the resist pattern, and both the layer consisting of the resist pattern and the vapor-deposited film on top of it are removed simultaneously using a resist stripping agent. This allows an electromagnetic wave absorption pattern to be formed on the surface of the substrate. As another example, a thin metal film is provided on a substrate 111, a resist is applied to a portion of the surface of the thin metal film, and then heat-treated. Next, the thin metal film in the areas where the resist is not applied is removed by etching. After that, the resist is removed as necessary to form an electromagnetic wave absorption pattern. A metal plating layer, not shown, may be further provided on the surface of each unit u1, u2, u3 that constitutes each electromagnetic wave absorption pattern.

[0090] Specific examples of metals constituting the metal wire include the same metals as those mentioned above as the material for each unit u1, u2, and u3. In addition, the metal wire may be plated with tin, zinc, silver, nickel, chromium, nickel-chromium alloy, solder, etc., and its surface may be coated with carbon materials, polymers, etc. Examples of carbon materials used to coat the surface of the metal wire include carbon black, activated carbon, hard carbon, soft carbon, mesoporous carbon, amorphous carbon such as carbon fiber; graphite; fullerene; graphene; and carbon nanotubes.

[0091] "Spacer layer" The spacer layer 120 is provided on the other surface 111b of the substrate 111 of the electromagnetic wave absorbing layer 110. The spacer layer 120 has two surfaces 120a and 120b. One surface 120a of the spacer layer 120 is in contact with the other surface 111b of the base material 111. The other surface 120b of the spacer layer 120 is provided with a reflective layer 130. The spacer layer 120 may have a single-layer structure or a multi-layer structure.

[0092] The material of the spacer layer 120 can be appropriately selected depending on the application of the partition. For example, the spacer layer 120 may be made of a transparent material to provide transparency to the partition. Alternatively, the spacer layer 120 may be made of a flexible material to provide conformability to curved surfaces of the partition. Flexible materials include plastic film, rubber, paper, cloth, nonwoven fabric, foam, and rubber sheet. Among these, foam is preferred because it makes the front panel 40 lightweight. As a specific example of the resin constituting the plastic film, for example, the same type of thermoplastic resin as described above for the base material 111 can be used. As the foam, for example, a foamed sheet can be used, which is made by foaming the resin that constitutes the plastic film and forming it into a sheet. Specific examples of foamed sheets include polyethylene foam, polypropylene foam, polyurethane foam, and the like.

[0093] When considering the wavelength shortening effect of the spacer layer 120, the thickness of the spacer layer 120 is appropriately changed according to the wavelength of the electromagnetic wave to be absorbed and the relative permittivity of the spacer layer 120. When considering the wavelength shortening effect of the spacer layer 120, it is preferable that the thickness of the spacer layer 120 in the z-axis direction satisfies the following equation (8). (Thickness of spacer layer 120 in the z-axis direction) = (λ) × (1 / 4) / (ε) 1 / 2...Equation (8) In equation (8) above, λ is the wavelength of the incoming electromagnetic wave, and ε is the relative permittivity of the spacer layer 120. The thickness of the spacer layer 120 in the z-axis direction may be adjusted as appropriate for absorption characteristics. For example, it can be changed within a range of 0.1 to 3.0 times the thickness of the spacer layer 120 in the z-axis direction obtained by equation (8).

[0094] When the relationship between the thickness of the spacer layer 120 in the z-axis direction and the wavelength λ satisfies equation (8) above, the front plate 40 becomes a so-called λ / 4 structure. This further increases the maximum value of the amount of electromagnetic wave absorbed by the front plate 40. The thickness of the spacer layer 120 can be appropriately set according to the wavelength λ of the electromagnetic wave to be absorbed. For example, the thickness of the spacer layer 120 may be 25 μm to 5000 μm, 50 μm to 4500 μm, or 100 μm to 4000 μm. The spacer layer 120 may be made of a material with a high dielectric constant. If the spacer layer 120 is a layer with a high dielectric constant, the thickness of the spacer layer 120 can be made relatively thinner. When considering the dielectric constant of the spacer layer 120, it is preferable that the spacer layer 120 contains at least one selected from the group consisting of barium titanate, titanium oxide, and strontium titanate.

[0095] By increasing the dielectric constant of the spacer layer 120, the thickness of the spacer layer 120 can be reduced. This makes the front panel 40 lighter.

[0096] It is preferable that the two surfaces 120a and 120b of the spacer layer 120 are adhesive. This allows the front plate 40 and the reflective layer 130 to be bonded to each of the two surfaces 120a and 120b. For example, the two surfaces 120a and 120b can be made adhesive by employing a multilayer structure in which the two surfaces 120a and 120b are adhesive layers containing adhesive. Details and preferred embodiments of the adhesive layer can be the same as those described for the adhesive layer on the substrate 111.

[0097] "Reflective layer" The reflective layer 130 has two surfaces 130a and 130b. One surface 130a of the reflective layer 130 is in contact with the other surface 120b of the spacer layer 120. The reflective layer 130 is not particularly limited as long as it is capable of reflecting electromagnetic waves that fly onto the surface of the front plate 40 and pass through the front plate 40. Of the electromagnetic waves that fly onto the front plate 40, some are reflected by the electromagnetic wave absorption layer 110 or absorbed by the electromagnetic wave absorption layer 110. On the other hand, electromagnetic waves that are neither reflected nor absorbed by the electromagnetic wave absorption layer 110 pass through the electromagnetic wave absorption layer 110. Electromagnetic waves that pass through the electromagnetic wave absorption layer 110 are reflected by the reflective layer 130 toward the electromagnetic wave absorption layer 20. For example, if the reflective layer 130 is conductive in the planar direction of the two surfaces 130a and 130b, it can reflect electromagnetic waves that have passed through the electromagnetic wave absorption layer 110. Specifically, the reflective layer 130 may be made by laminating a metal foil such as copper foil or a metal plate such as copper plate onto a resin film such as polyethylene terephthalate. Instead of metal foil or metal plate, a mesh sheet made of a surface conductive film such as ITO or metal wire may be used. Among these, metal plates are preferred in terms of their high conductivity.

[0098] Considering the reflective properties of the reflective layer 130, a metal wire, a conductive thread, a twisted yarn containing a metal wire and a conductive thread, or a conductive thin film may be provided on the other surface 130b of the reflective layer 130. The conductive thin film can be provided on surface 130b by printing methods such as screen printing, gravure printing, or inkjet printing; sputtering or vacuum deposition; or photolithography.

[0099] When the spacer layer 120 is formed on an object that has conductivity, such as a metal, the object that has conductivity, such as a metal, acts as the reflective layer 130, and therefore the reflective layer 130 can be omitted.

[0100] For the purpose of applying the front panel 40 to the surface of various articles, the other surface 130b of the reflective layer 130 may be made adhesive. If the other surface 130b of the reflective layer 130 is made adhesive, a release film may be provided to cover surface 130b. The release film is removed when the front panel 40 is used. Covering the adhesive surface with a release film improves handling during distribution. For example, by adopting a multilayer structure in which the other surface 130b of the reflective layer 130 is an adhesive layer containing an adhesive, the other surface 130b of the reflective layer 130 can be made adhesive.

[0101] Examples of adhesives include heat-seal adhesives that bond using heat, adhesives that become adhesive when wet, and pressure-sensitive adhesives (adhesives) that bond using pressure. Among these, adhesives (pressure-sensitive adhesives) are preferred from the viewpoint of simplicity. Specific examples of adhesives include acrylic adhesives, urethane adhesives, rubber adhesives, polyester adhesives, silicone adhesives, and polyvinyl ether adhesives. Among these, at least one selected from the group consisting of acrylic adhesives, urethane adhesives, and rubber adhesives is preferred, with acrylic adhesives being more preferred.

[0102] Examples of acrylic adhesives include the following acrylic polymers. An acrylic polymer (1) comprising structural units derived from alkyl (meth)acrylate having a linear alkyl group or a branched alkyl group (i.e., a polymer obtained by polymerizing at least alkyl (meth)acrylate as a monomer). Acrylic polymers (2) containing constituent units derived from (meth)acrylates having a cyclic structure (i.e., polymers obtained by polymerizing at least (meth)acrylates having a cyclic structure). The acrylic polymer may be a homopolymer or a copolymer. If the acrylic polymer is a copolymer, the copolymerization form is not particularly limited. The acrylic copolymer may be a block copolymer, a random copolymer, or a graft copolymer.

[0103] As an acrylic adhesive, the following acrylic copolymer (Q) is preferred. Acrylic copolymer (Q): A copolymer comprising a constituent unit (q1) derived from an alkyl (meth)acrylate having a chain-like alkyl group having 1 to 20 carbon atoms (hereinafter referred to as "monomer component (q1')") and a constituent unit (q2) derived from a functional group-containing monomer (hereinafter referred to as "monomer component (q2')". The acrylic copolymer (Q) may further contain other constituent units (q3) other than constituent units (q1) and (q2). Constituent unit (q3) is a constituent unit derived from other monomer components (q3') other than monomer components (q1') and (q2').

[0104] From the viewpoint of improving adhesive properties, the number of carbon atoms in the chain alkyl group of the monomer component (q1') is preferably 1 to 12, more preferably 4 to 8, and even more preferably 4 to 6. Specific examples of the monomer component (q1') include, for example, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, and stearyl (meth)acrylate. Among these, butyl (meth)acrylate and 2-ethylhexyl (meth)acrylate are preferred, and butyl (meth)acrylate is more preferred. These may be used individually or in combination of two or more types.

[0105] Examples of monomer components (q2') include hydroxyl group-containing monomers, carboxyl group-containing monomers, epoxy group-containing monomers, amino group-containing monomers, cyano group-containing monomers, keto group-containing monomers, and alkoxysilyl group-containing monomers. Among these, hydroxyl group-containing monomers and carboxyl group-containing monomers are preferred. Specific examples of hydroxyl group-containing monomers include, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. Among these, 2-hydroxyethyl (meth)acrylate is preferred. Specific examples of carboxyl group-containing monomers include (meth)acrylic acid, maleic acid, fumaric acid, itaconic acid, etc., with (meth)acrylic acid being preferred. Specific examples of epoxy group-containing monomers include, for example, glycidyl (meth)acrylate. Specific examples of amino group-containing monomers include, for example, diaminoethyl (meth)acrylate. Specific examples of cyano group-containing monomers include, for example, acrylonitrile. These may be used individually or in combination of two or more types.

[0106] Examples of monomer components (q3') include cyclic (meth)acrylates such as cyclohexyl (meth)acrylate, benzyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, imide (meth)acrylate, and acryloylmorpholine; vinyl acetate; and styrene. These may be used individually or in combination of two or more types.

[0107] The content of the constituent unit (q1) is preferably 50% to 99.5% by mass, more preferably 55% to 99% by mass, even more preferably 60% to 97% by mass, and particularly preferably 65% ​​to 95% by mass, based on 100% by mass of the total constituent units of the acrylic copolymer (Q). The content of the constituent unit (q2) is preferably 0.1 to 50% by mass, more preferably 0.5 to 40% by mass, even more preferably 1.0 to 30% by mass, and particularly preferably 1.5 to 20% by mass, based on 100% by mass of all constituent units of the acrylic copolymer (Q). The content of the constituent unit (q3) is preferably 0 to 40% by mass, more preferably 0 to 30% by mass, even more preferably 0 to 25% by mass, and particularly preferably 0 to 20% by mass, based on 100% by mass of the total constituent units of the acrylic copolymer (Q).

[0108] Acrylic copolymers may be crosslinked with a crosslinking agent. Examples of crosslinking agents include epoxy crosslinking agents, isocyanate crosslinking agents, aziridine crosslinking agents, and metal chelate crosslinking agents. When crosslinking acrylic copolymers, functional groups derived from monomer components (q2') can be used as crosslinking sites that react with the crosslinking agent.

[0109] For the purpose of improving impact resistance, etc., the adhesive layer may be made of a material that hardens with energy rays such as ultraviolet rays, visible energy rays, infrared rays, and electron beams. In this case, the adhesive layer contains an energy ray curable component. Examples of energy ray curable components include compounds having two or more UV-polymerizable functional groups in a single molecule, for instance, when the energy ray is ultraviolet light. Specific examples of compounds having two or more UV-polymerizable functional groups in one molecule include trimethylolpropane tri(meth)acrylate, ethoxylated isocyanuric acid tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate, 1,4-butylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, dicyclopentadiene dimethoxydi(meth)acrylate, polyethylene glycol di(meth)acrylate, oligoester(meth)acrylate, urethane(meth)acrylate oligomer, epoxy-modified(meth)acrylate, and polyether(meth)acrylate. These may be used individually or in combination of two or more types.

[0110] If the adhesive layer is energy ray curable, it is preferable to use a photopolymerization initiator in combination. The photopolymerization initiator increases the curing speed. Specific examples of photopolymerization initiators include, for example, benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexylphenyl ketone, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, 2-chloroanthraquinone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2-benzothiazole-N,N-diethyldithiocarbamate, and oligo{2-hydroxy-2-methyl-1-[4-(1-propenyl)phenyl]propanone}.

[0111] "Protective layer" The protective layer 140 is preferably provided on one surface 120a of the electromagnetic wave absorbing layer 110. If the electromagnetic wave absorbing layer 110 has a base material 111 and an electromagnetic wave absorbing pattern 112, the protective layer 140 is provided on one surface 111a of the base material 111 so as to cover the electromagnetic wave absorbing layer 110. The protective layer 140 is not particularly limited as long as it can protect the electromagnetic wave absorption layer 110.

[0112] The thickness of the protective layer 140 is preferably 1 μm to 500 μm, more preferably 3 μm to 100 μm, and even more preferably 5 μm to 50 μm. If the thickness of the protective layer 140 is greater than or equal to the lower limit, it can adequately follow and protect the irregularities of the electromagnetic wave absorbing layer 110. If the thickness of the protective layer 140 is less than or equal to the upper limit, seepage of the composition constituting the protective layer 140 from the sides is suppressed, and flexibility can be given to the partition.

[0113] The protective layer 140 is composed of a cured product of a composition containing a modified polyolefin resin and a polyphenylene ether resin having reactive groups. By using a cured product of this composition, a protective layer with low dielectric properties can be obtained, and changes in frequency characteristics can be suppressed.

[0114] The modified polyolefin resin is not particularly limited, but examples include acid-modified polyolefin resins and silane-modified polyolefin resins. Acid-modified polyolefin resins are preferred due to their excellent adhesive strength.

[0115] The content of modified polyolefin resin in the protective layer 140 is preferably more than 50% by mass of the total amount of the protective layer 140, more preferably 55% by mass or more, and even more preferably 60% by mass or more. The upper limit of the content of modified polyolefin resin in the protective layer 140 may be 90% by mass or less, or 80% by mass or less, of the total amount of the protective layer 140. If the content of modified polyolefin resin falls below the above lower limit, the protective layer 140 will have high dielectric properties, and the reflection attenuation of the electromagnetic wave absorber will increase.

[0116] The polyphenylene ether resin having a reactive group is not particularly limited, but a polyphenylene ether resin in which the reactive group contains an ethylenically unsaturated bond is preferred. Specific examples of reactive groups in a polyphenylene ether resin having a reactive group containing an ethylenically unsaturated bond include vinyl groups, allyl groups, acryloyl groups, methacryloyl groups, cyclopentenyl groups, vinylbenzyl groups, vinylnaphthyl groups, and the like. A vinylbenzyl group is more preferred as the reactive group because it is easier to obtain a composition with lower dielectric properties.

[0117] The content of the polyphenylene ether resin having reactive groups in the protective layer 140 is preferably 1% to 50% by mass, and more preferably 10% to 50% by mass, of the total amount of the protective layer 140. If the content of the polyphenylene ether resin having reactive groups is above the lower limit, the glass transition temperature after curing will be higher, and the resistance to high temperature and high humidity will be higher. If the content of the polyphenylene ether resin having reactive groups is below the upper limit, the adhesive strength will be lower, and the protective layer 140 may peel off from the electromagnetic wave absorbing layer 110.

[0118] The above composition preferably further contains at least one compound having an alicyclic skeleton and a cyclic ether group. The compound having an alicyclic skeleton and a cyclic ether group is not particularly limited, but examples include polyglycidyl ethers of polyhydric alcohols having at least one alicyclic structure, and cycloalkene oxide compounds such as cyclohexene oxide and cyclopentene oxide-containing compounds obtained by epoxidizing cyclohexene or cyclopentene ring-containing compounds with an oxidizing agent. Among these, from the viewpoint of providing high adhesive strength, the compound having an alicyclic skeleton and a cyclic ether group is preferably a compound that is liquid at 25°C.

[0119] The content of compounds having an alicyclic skeleton and cyclic ether groups is preferably 1% by mass or more, and more preferably 2% to 15% by mass, of the total amount of the protective layer 140 in the total amount of the composition. If the content of compounds having an alicyclic skeleton and cyclic ether groups is below the above upper limit, the adhesive strength will be low, and the protective layer 140 may peel off from the electromagnetic wave absorbing layer 110.

[0120] The above composition may further contain a curing agent. The inclusion of a curing agent is preferable because it allows the curing reaction to proceed more efficiently. The curing agent is not particularly limited as long as it initiates the curing reaction. However, due to its excellent stability over time and productivity, a curing agent that initiates the curing reaction by heating is preferably used. Examples of curing agents that initiate a curing reaction upon heating include thermal cationic polymerization initiators and other thermally reactive curing agents.

[0121] The size (area) of the front panel 40 when viewed from above is not particularly limited, but for example, the vertical length is preferably 5 cm or more and 30 cm or less, and more preferably 7 cm or more and 20 cm or less. If the vertical length of the front panel 40 is greater than or equal to the lower limit, the number of spacings within the partition can be reduced, and the transmission of electromagnetic waves can be suppressed. If the vertical length of the front panel 40 is less than or equal to the upper limit, for example, the partition can be rolled up into a size diameter that is easy to carry.

[0122] The size (area) of the front panel 40 when viewed from above is not particularly limited, but for example, the horizontal length is preferably 5 cm or more and 30 cm or less, and more preferably 7 cm or more and 20 cm or less. If the horizontal length of the front panel 40 is greater than or equal to the lower limit, the number of spacings within the partition can be reduced, and the transmission of electromagnetic waves can be suppressed. If the horizontal length of the front panel 40 is less than or equal to the upper limit, for example, the partition can be rolled up into a size diameter that is easy to carry.

[0123] The proportion of the surface area of ​​the multiple front plates 40 occupied by the multiple front plates 40 on one surface 30a or the other surface of the support base material 30, that is, the proportion of the total area of ​​the multiple front plates 40 to 100% of the total area of ​​one surface 30a or the other surface of the support base material 30, is not particularly limited, but is preferably 90% or more and 100%, and more preferably 95% or more and 99.9%. If the proportion of the total area of ​​the multiple front plates 40 is above the lower limit, sufficient absorption is achieved. If the proportion of the total area of ​​the multiple front plates 40 is below the upper limit, electromagnetic waves will pass through the sheet, and the absorption effect will not be sufficiently obtained.

[0124] [Manufacturing method for the front panel] The front panel 40 can be manufactured, for example, by the following method. A composition is prepared containing a modified polyolefin resin and a polyphenylene ether resin having a reactive group. The composition is obtained by adding a modified polyolefin resin and a polyphenylene ether resin having a reactive group to a solvent, stirring and mixing them, and dissolving the resin in the solvent. The composition may optionally contain various additives in addition to the modified polyolefin resin and the polyphenylene ether resin having reactive groups. Examples of additives include silane coupling agents and curing agents. The curing agent is not particularly limited as long as it initiates the curing reaction. Because of its excellent stability over time and productivity, a curing agent that initiates the curing reaction by heating is preferred. The inclusion of a curing agent in the above composition is preferable because it allows the curing reaction to proceed more efficiently. Examples of curing agents that initiate the curing reaction by heating include thermal cationic polymerization initiators and other heat-reactive curing agents. As the silane coupling agent, known silane coupling agents can be used. Among these, organosilicon compounds having at least one alkoxysilyl group in the molecule are preferred. The solvent is not particularly limited as long as it can dissolve the modified polyolefin resin and the polyphenylene ether resin having a reactive group, but examples include aromatic hydrocarbon solvents such as benzene and toluene; ester solvents such as ethyl acetate and butyl acetate; isoketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone n; aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane; and alicyclic hydrocarbon solvents such as cyclopentane, cyclohexane and methylcyclohexane.

[0125] The above composition is applied to one surface 110a of the electromagnetic wave absorbing layer 110 prepared as described above, and the resulting coating is heated and cured to form a protective layer 140 on the electromagnetic wave absorbing layer 110. The method of coating the composition is not particularly limited. Examples of coating methods include printing methods such as screen printing, gravure printing, and inkjet printing.

[0126] The above composition is applied to the release surface of a release film, and the resulting coating is dried to form an adhesive layer. The release surface of another release film is then bonded onto this adhesive layer to obtain an adhesive sheet. Next, one side of the release film of the adhesive sheet is peeled off, and the exposed side of the adhesive sheet is attached to the other side 120b of the electromagnetic wave absorbing layer 110.

[0127] Next, the other side of the release film on the adhesive sheet is peeled off, and the material that will become the spacer layer 120 is attached to the other side of the exposed adhesive sheet. Next, the material that will become the reflective layer 130 is attached to the other surface 120b of the spacer layer 120 via the adhesive sheet, in the same manner as with the spacer layer 120. The front panel 40 is obtained by the above method.

[0128] The front panel 40 can accommodate a wide frequency band if the electromagnetic wave absorbing layer 110 includes a base material 111 and an electromagnetic wave absorbing pattern 112 provided on the base material 111, and the electromagnetic wave absorbing pattern 112 consists of a first electromagnetic wave absorbing pattern 161, a second electromagnetic wave absorbing pattern 162, and a third electromagnetic wave absorbing pattern 163.

[0129] "Support member" The length of the support member 20 is adjusted as appropriate according to the size (area) of the front panel 40 when viewed from above. Examples of materials that make up the support member 20 include non-metallic materials such as resin and wood, and metal. In order to further improve the effect of preparing the working environment for aiming with the aiming partition 10, it is preferable that the support member 20 be made of a non-metallic material that hardly reflects electromagnetic waves.

[0130] The means used to fix the support base material 30 to the support member 20 include adhesives, screws, bolts and nuts, etc. The material of the means for fixing the support base material 30 is preferably a non-metallic material that does not reflect electromagnetic waves, such as resin or wood. Conductive materials such as metals are not suitable for fixing the support base material 30 because they reflect electromagnetic waves.

[0131] The support base material 30, which has the front panel 40, may be removable from the support member 20. In order to make the support base material 30 removable from the support member 20, a frame material shaped to conform to the outer shape of the support base material 30 may be provided on the support member 20, and the support base material 30 may be inserted into the frame material or fitted into the frame material. Alternatively, a hook or the like may be provided on the outer edge of the support base material 30, and the support base material 30 may be hooked onto the support member 20 and fixed in place. In this way, the aiming partition 10 can be disassembled into the support member 20 and the front panel 40, making it easy to transport and eliminating the need for a large storage space.

[0132] "Base material" The support base material 30 is preferably flexible. When the support base material 30 is flexible, it can be a resin sheet, paper, woven fabric, etc. The resin that makes up the resin sheet is not particularly limited, but for example, the resin that makes up the base material 111 can be used. Because the support base material 30 is flexible, the support base material 30 with the front plate 40 can be rolled up. In this way, the aiming partition 10 is easy to transport and does not require a large storage space.

[0133] "Sandbar" As shown in Figure 1, the support beam 50 is provided, for example, along the lateral direction of the support base material 30. Examples of materials that make up the crossbar 50 include non-metallic materials that hardly reflect electromagnetic waves, such as resin and wood, and metals. In order to further improve the effect of preparing the working environment for aiming with the aiming partition 10, it is preferable that the crossbar 50 be made of a non-metallic material that hardly reflects electromagnetic waves.

[0134] The aiming partition 10 of this embodiment comprises a pair of support members 20 arranged spaced apart from each other, a support base material 30 fixed to the pair of support members 20, and a plurality of front panels arranged in parallel on at least one surface 30a of the support base material 30. Therefore, it is lightweight, easy to transport, and does not require a large storage space. Accordingly, the aiming partition 10 of this embodiment makes it possible to easily create a suitable working environment for automobile aiming.

[0135] In Figure 1, the front panel 40 is shown as an example where it is rectangular in plan view, but the aiming partition of the present invention is not limited to this. In the aiming partition of the present invention, the front panel may be triangular in plan view, as shown in Figure 13. As shown in Figure 13, adjacent front panels 40 in the lateral direction of the support base material 30 are arranged so that the orientation of the vertices of their respective triangles is staggered in the vertical direction of the support base material 30. Also, adjacent front panels 40 in the vertical direction of the support base material 30 are arranged so that the bases of their respective triangles face each other. This allows the front panels 40 to be spaced apart from each other on at least one surface 30a of the support base material 30 and arranged in parallel in the vertical and lateral directions of the support base material 30. [Industrial applicability]

[0136] The aiming partition of the present invention can be suitably used for automobile aiming. [Explanation of Symbols]

[0137] 10. Partition for aiming 20 Support members 30 Supporting base material 40 Front plate 50 slats 110 Electromagnetic wave absorption layer 111 Base material 112 Electromagnetic wave absorption patterns 120 Spacer layer 130 Reflective layer 140 Protective layer 161 First electromagnetic wave absorption pattern 162 Second electromagnetic wave absorption pattern 163 Third electromagnetic wave absorption pattern

Claims

1. An aiming partition comprising a pair of support members arranged at a distance from each other, a support base supported by the pair of support members, and a plurality of front panels arranged in parallel on at least one surface of the support base.

2. the front plate has an electromagnetic wave absorbing layer, a spacer layer, and a reflective layer; 2. The aiming partition according to claim 1, wherein the electromagnetic wave absorbing layer, the spacer layer, and the reflective layer are laminated in this order.

3. The aiming partition according to claim 1 or 2, wherein the plurality of front panels are arranged in parallel and spaced apart from each other on at least one surface of the support base material.

4. The aiming partition according to any one of claims 1 to 3, wherein the spacing between adjacent front panels among the plurality of front panels is 4 mm or less.

5. The aiming partition according to any one of claims 1 to 4, wherein the support substrate is removable from the support member.

6. The aiming partition according to any one of claims 1 to 5, wherein the supporting substrate is flexible.

7. The aiming partition according to any one of claims 1 to 6, wherein the support member is made of a non-metallic material.

8. The aiming partition according to any one of claims 1 to 7, wherein the substrate is made of a non-metallic material.

9. The aiming partition according to any one of claims 2 to 8, wherein the spacer layer is made of a foam.

10. The aiming partition according to any one of claims 2 to 9, wherein the reflective layer is made of a metal plate.

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