Cleaning device, image forming apparatus, electrode manufacturing apparatus, and cleaning method

Abstract

To provide a wiping device which can suppress a secular change in wiping performance.SOLUTION: A wiping device according to an aspect of the present invention for wiping a nozzle surface of a head comprises: a sheet-like first wiping member which is arranged opposed to the nozzle surface at a position apart by a prescribed distance from the nozzle surface; a first mechanism which moves the first wiping member; a second mechanism which relatively moves the first wiping member in a direction along the nozzle surface; and a control unit which controls the operation of each of the first mechanism and second mechanism. The control unit controls the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism to wipe the nozzle surface.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The present invention relates to a wiping device, an image forming apparatus, an electrode manufacturing apparatus, and a wiping method.

Background Art

[0002] Conventionally, in order to maintain the ejection state of a head having a nozzle surface formed with a plurality of nozzles for ejecting a liquid, a wiping device for wiping liquid or the like adhering to the nozzle surface is known.

[0003] The wiping device has an absorber that is disposed opposite to the nozzle holes of the nozzle plate and absorbs the liquid extruded from a pressurizing mechanism, and fixes the distance between the ejection surface of the nozzle plate and the absorber at a constant interval and then absorbs the liquid into the absorber by a suction mechanism (see, for example, Patent Document 1).

Summary of the Invention

Problems to be Solved by the Invention

[0004] There is a demand for a wiping device to suppress changes in wiping performance over time.

[0005] An object of the present invention is to provide a wiping device capable of suppressing changes in wiping performance over time.

Means for Solving the Problems

[0006] A wiping device according to an aspect of the present invention is a wiping device for wiping a nozzle surface of a head, and includes a sheet-shaped first wiping member disposed opposite to the nozzle surface at a position separated from the nozzle surface by a predetermined distance, a first mechanism for moving the first wiping member, a second mechanism for relatively moving the first wiping member in a direction along the nozzle surface, and a control unit for controlling operations of the first mechanism and the second mechanism, wherein the control unit controls the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism to wipe the nozzle surface. , the first mechanism is provided on the side opposite to the nozzle surface with the first wiping member interposed therebetween, and has a support member for supporting the first wiping member. A first water-repellent film is provided on the nozzle surface, and a second water-repellent film having higher water repellency than the first water-repellent film is provided on the surface of the support member facing the first wiping member. to be.

Advantages of the Invention

[0007] According to the present invention, it is possible to provide a wiping device capable of suppressing the change over time in wiping performance.

Brief Description of the Drawings

[0008]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Modes for Carrying Out the Invention

[0009] Hereinafter, modes for carrying out the invention will be described in detail with reference to the drawings. In each drawing, the same reference numerals are assigned to the same components, and redundant descriptions will be omitted as appropriate.

[0010] Also, the embodiments shown below illustrate a wiping device, an image forming apparatus, and an electrode manufacturing apparatus for embodying the technical idea of the present invention, and the present invention is not limited to the embodiments shown below. The dimensions, materials, shapes, relative arrangements, etc. of the components described below are not intended to limit the scope of the present invention only to those, but are intended to be illustrative unless specifically described. Also, the sizes and positional relationships of the members shown in the drawings may be exaggerated for clarity of explanation.

[0011] The wiping device 50 according to the embodiment wipes the nozzle surface of a head having a nozzle surface on which a plurality of nozzles for discharging liquid are formed. The wiping device 50 includes a sheet-like first wiping member disposed facing the nozzle surface at a position separated from the nozzle surface by a predetermined distance along a direction orthogonal to the nozzle surface, a first mechanism for moving the first wiping member, a second mechanism for relatively moving the first wiping member in a direction along the nozzle surface, and a control unit for controlling the operations of the first mechanism and the second mechanism. The control unit causes the nozzle surface to be wiped by controlling the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism.

[0012] Wiping the nozzle surface means removing liquid or the like adhering to the nozzle surface by wiping off the nozzle surface. By wiping the nozzle surface, the discharging state of the head can be maintained. The movement of the first wiping member means that the sheet-like first wiping member is wound around a rotating support such as a plurality of rollers, and the sheet-like first wiping member moves in response to the rotation of the rotating support. In the present specification and claims, removal only needs to be able to wipe off at least liquid or the like, and the amount of liquid or the like wiped off is not limited.

[0013] The wiping device 50 suppresses the nozzle surface and the water-repellent film provided on the nozzle surface from being scraped and the discharge performance from changing over time by wiping the liquid adhering to the nozzle surface without contacting the nozzle surface with the above configuration.

[0014] The wiping device 50 maintains the freshness of the first wiping member provided at a position facing the nozzle face by controlling the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism. "Maintaining freshness" means wiping the nozzle face using a part of the sheet-like first wiping member that is still fresh for wiping, in other words, wiping without using the first wiping member whose liquid absorption performance has decreased due to absorbing liquid. The part that is fresh for wiping is mainly a part of the sheet-like first wiping member that has not been used for wiping, but may also be a part that has been used for wiping and can be reused. The wiping device 50 suppresses changes in wiping performance over time by wiping while maintaining the freshness of the first wiping member.

[0015] In the present specification and claims, the term "sheet-like" refers to a flat or band-like shape, but the ratio of each side and the thickness are not important.

[0016] Hereinafter, an electrode manufacturing apparatus 100 will be described as an example, which has a wiping apparatus 50 according to an embodiment and manufactures electrodes for use in electrochemical elements by forming an electrode material layer such as an active material on an electrode substrate. The electrode substrate is, for example, a current collector used in electricity storage devices such as batteries and capacitors, power generation devices such as fuel cells, solar power generation devices, etc. The electrode manufacturing apparatus 100 discharges a liquid in which various materials such as a powdered active material or a catalyst composition are dispersed, onto the electrode substrate, and then fixes and dries the liquid to form an electrode material layer on the electrode substrate.

[0017] [Embodiment] <Overall configuration example of electrode manufacturing apparatus 100> Fig. 1 is a diagram illustrating an example of the overall configuration of an electrode manufacturing apparatus 100. Fig. 1 shows the inside of the electrode manufacturing apparatus 100 seen through in a direction substantially perpendicular to a transport direction 20 of an electrode substrate 2.

[0018] As shown in FIG. 1, the electrode manufacturing apparatus 100 includes an unwinding unit 1, a coating unit 3, a curing unit 4, a drying unit 5, and a winding unit 6. The coating unit 3 includes a plurality of liquid ejection units 30a, 30b, 30c, and 30d, and wiping devices 50a, 50b, 50c, and 50d.

[0019] While the electrode manufacturing apparatus 100 conveys the electrode substrate 2 along the conveyance direction 20 by the unwinding unit 1 and the winding unit 6, the liquid ejected from each of the liquid ejection units 30a, 30b, 30c, and 30d included in the coating unit 3 is applied onto the electrode substrate 2. The electrode manufacturing apparatus 100 irradiates ultraviolet rays on the liquid applied onto the electrode substrate 2 by the curing unit 4 to cure it, and blows warm air by the drying unit 5 to dry it, thereby forming a continuous and uniform film on the electrode substrate 2. In addition, in the present embodiment, a form having both the curing unit 4 and the drying unit 5 will be described, but a form having either one of them may also be used.

[0020] The unwinding unit 1 rotates the unwinding roll 12 that can rotate with the electrode substrate 2 wound thereon, and unwinds the electrode substrate 2 wound around the roll, thereby moving and conveying the electrode substrate 2 from the unwinding unit 1 toward the coating unit 3. The winding unit 6 winds the electrode substrate 2 around the rotated winding roll 7 to wind up the electrode substrate 2, thereby moving and conveying the electrode substrate 2 from the drying unit 5 toward the winding unit 6.

[0021] In addition to the unwinding unit 1 and the winding unit 6, conveyance rollers and the like without reference numerals are also used as conveyance means for conveying the electrode substrate 2. The conveyance means of the electrode substrate 2 is constituted by the conveyance rollers, the unwinding unit 1, and the winding means.

[0022] The electrode substrate 2 is continuous along the conveyance direction 20. The electrode manufacturing apparatus 100 conveys the electrode substrate 2 along the conveyance path between the unwinding unit 1 and the winding unit 6. Also, the length of the electrode substrate 2 along the conveyance direction 20 is at least longer than the conveyance path between the unwinding unit 1 and the winding unit 6. The electrode manufacturing apparatus 100 is capable of continuously forming a film on the electrode substrate 2 that is continuous along the conveyance direction 20.

[0023] The liquid is composed of a liquid that realizes the function of the membrane. It may be any liquid as long as it has the viscosity and surface tension that can be discharged by the liquid discharge unit, and is not particularly limited. However, it is preferably a liquid whose viscosity becomes 30 [mPa·s] or less at normal temperature and normal pressure, or by heating or cooling.

[0024] More specifically, it includes solutions, suspensions, emulsions, etc. containing solvents such as water and organic solvents, electrode materials such as dyes, pigments, and active substances, functional additive materials such as polymerizable compounds, resins, and surfactants, biocompatible materials such as DNA, amino acids, proteins, and calcium, and edible materials such as natural pigments. These can be used, for example, in applications such as printing liquids, surface treatment liquids, and liquids for forming various devices such as components of electronic elements and light-emitting elements and electronic circuit resist patterns.

[0025] The coating unit 3 coats the liquid discharged from each of the liquid discharge units 30a, 30b, 30c, and 30d onto the electrode substrate 2.

[0026] Since the liquid discharge units 30a, 30b, 30c, and 30d have the same configuration, when not particularly distinguished, they are collectively referred to as the liquid discharge unit 30. In this embodiment, the liquid discharge units 30a, 30b, 30c, and 30d discharge the same type of liquid. However, the number of the liquid discharge units 30 is not limited to four, and any number may be used.

[0027] The liquid discharge unit 30 has a plurality of nozzle rows in which a plurality of nozzles are arranged. The electrode manufacturing apparatus 100 has the liquid discharge unit 30 such that the discharge direction of the liquid discharged from the nozzles faces the electrode substrate 2.

[0028] The electrode substrate 2 is, for example, a non-permeable base material such as a metal sheet, on which a layer mainly composed of particles is provided. The layer mainly composed of particles provided on the non-permeable base material is, for example, a graphite layer or the like.

[0029] The non-permeable base material includes metal sheets such as aluminum, copper, stainless steel, nickel, platinum, resin films such as polypropylene films, polyethylene terephthalate films, and nylon films.

[0030] The wiping devices 50a, 50b, 50c, and 50d are provided to be paired with the liquid discharge parts 30a, 30b, 30c, and 30d, and maintain the discharge state of the heads each of the liquid discharge parts 30a, 30b, 30c, and 30d has.

[0031] Since the wiping devices 50a, 50b, 50c, and 50d have the same configuration, they are collectively referred to as the wiping device 50 when not particularly distinguished. The wiping device 50 is provided in the number corresponding to the number of the liquid discharge parts 30.

[0032] Also, the wiping device 50 may be configured to include a number less than the number of the liquid discharge parts and wipe a plurality of liquid discharge parts with one wiping device. The moving direction of the wiping member may be a direction intersecting the conveyance direction on the electrode substrate plane, or may be a direction parallel to the conveyance direction.

[0033] In terms of being able to perform wiping operations corresponding to each liquid discharge part, the number of wiping devices is preferably provided in the number corresponding to the number of one liquid discharge part. In terms of operation efficiency, a configuration in which one wiping device wipes a plurality of liquid discharge parts is preferable.

[0034] Also, from the viewpoint of miniaturization, the moving direction of the wiping member is preferably parallel to the moving direction of the wiping member.

[0035] The curing part 4 has light sources 45a and 45b. When not distinguishing the light sources 45a and 45b, they are collectively referred to as the light source 45. The light source 45 has a curing function of irradiating ultraviolet rays to the liquid applied on the electrode substrate 2 to cure the liquid layer into a resin layer.

[0036] The light source 45 is, for example, a mercury lamp such as a low, medium, or high-pressure mercury lamp, a tungsten lamp, an arc lamp, an excimer lamp, an excimer laser, a semiconductor laser, a high-output UV-LED, a YAG laser, a laser system combining a laser and a nonlinear optical crystal, a high-frequency induction ultraviolet ray generator, an electron beam irradiation device such as EB curing, an X-ray irradiation device, or the like. Among these, from the viewpoint of simplifying the system, a high-frequency induction ultraviolet ray generator, a high-pressure or low-pressure mercury lamp, a semiconductor laser, or the like is preferable. Further, the light source 45 may be provided with a condenser mirror or a scanning optical system.

[0037] The drying unit 5 has heaters 80a, 80b, and 80c. When not distinguishing between the heaters 80a, 80b, and 80c, they are collectively referred to as the heater 80. The heater 80 heats the liquid formed on the electrode substrate 2 to dry the residual solvent in the liquid, and promotes or dries the curing of the liquid. The heater 80 has a function as a curing or drying means or a heating or heating mechanism.

[0038] The heater 80 is, for example, an infrared lamp, a roller (heat roller) incorporating a heating element, a blower that blows out warm air or hot air, a furnace into which boiler-type hot air using steam or the like is introduced, or the like.

[0039] <Configuration Example of Liquid Discharge Unit 30> FIG. 2 is a diagram illustrating the configuration of the liquid discharge unit 30. FIG. 2 is a view of the liquid discharge units 30a, 30b, 30c, and 30d as viewed from the liquid discharge direction side. The electrode substrate 2 is conveyed along the conveyance direction 20 in a state facing the liquid discharge units 30a, 30b, 30c, and 30d.

[0040] The liquid discharge unit 30 is a line-type liquid discharge unit. The "line-type liquid discharge unit" is one in which nozzles for discharging liquid are arranged over the entire width in the width direction (the direction orthogonal to the conveyance direction 20) of the electrode substrate 2.

[0041] As shown in FIG. 2, each of the liquid discharge units 30a, 30b, 30c, and 30d has four heads 9 arranged in a direction substantially orthogonal to the conveyance direction 20. The head 9 has a nozzle surface 11 on which a plurality of nozzles 10 for discharging liquid are formed. The plurality of nozzles 10 are arranged in a direction substantially orthogonal to the conveyance direction 20. The head 9 can discharge liquid from each of the plurality of nozzles 10. Note that the head 9 is a general term for the four heads that each of the liquid discharge units 30a, 30b, 30c, and 30d has.

[0042] By arranging four heads 9 in a direction substantially orthogonal to the conveyance direction 20, liquid can be discharged over the entire width in the width direction of the electrode substrate 2. In FIG. 2, a configuration in which one liquid discharge unit 30 has four heads 9 is illustrated, but the liquid discharge unit 30 may include at least one head 9. The width of the liquid discharge unit 30 does not necessarily have to be the entire width of the electrode substrate 2 and can be appropriately determined.

[0043] The means for applying a stimulus to the liquid in the head 9 to discharge the liquid can be appropriately selected according to the purpose. For example, a pressure device, a piezoelectric element, a vibration generating device, an ultrasonic oscillator, light, etc. can be used. Specifically, the means for discharging the liquid is a piezoelectric actuator such as a piezoelectric element, a shape memory alloy actuator using a metal phase change due to a temperature change, an electrostatic actuator using electrostatic force, etc.

[0044] Among the above, it is particularly preferable to apply a voltage to a piezoelectric element adhered to a position called a pressure chamber (also referred to as a liquid chamber, etc.) in the liquid flow path in the head 9. In this head 9, when a voltage is applied, the piezoelectric element bends, and the volume of the pressure chamber decreases, thereby pressurizing the liquid in the pressure chamber and discharging the liquid as droplets from the nozzle.

[0045] The liquid discharge unit 30 may include a head unit. The head unit is an aggregate of functional components and mechanisms related to liquid discharge from the liquid discharge unit 30. The head unit includes, for example, a combination of at least one of a supply mechanism, a maintenance and recovery mechanism, and a liquid discharge head movement mechanism with the liquid discharge unit 30.

[0046] <Configuration Example of the Wiping Device 50> FIG. 3 is a diagram illustrating the configuration of the wiping device 50 according to the first embodiment. FIG. 3 shows the inside of the wiping device 50 as viewed from a direction substantially orthogonal to the direction in which the plurality of nozzles 10 in the head 9 are arranged.

[0047] As shown in FIG. 3, the wiping device 50 includes a first wiping member 51, a first mechanism 52, a second mechanism 53, a second wiping member 54, and a control unit 60. The first wiping member 51, the first mechanism 52, and the second wiping member 54 are supported by a support 55, and are integrally movable in the moving direction 40 by the second mechanism 53.

[0048] The first wiping member 51 is a sheet-like member disposed facing the nozzle surface 11 at a position separated from the nozzle surface 11 by a predetermined distance along a direction orthogonal to the nozzle surface 11 of the head 9. By being disposed close to the nozzle surface 11, the first wiping member 51 utilizes the capillary action to suck up and absorb the liquid 15 adhering to the nozzle surface 11. Here, the capillary action refers to a physical phenomenon in which the liquid 15 located inside the thin tubular structure moves inside the tube. The capillary action is also called capillary phenomenon.

[0049] In the present embodiment, the first wiping member 51 is formed of, for example, a nonwoven fabric, a woven fabric, a knitted fabric, a porous body, or the like. The mesh structure in the nonwoven fabric, the woven fabric, or the knitted fabric or the pores of the porous body function as a thin tubular structure, and when the first wiping member 51 approaches the nozzle surface 11, the liquid 15 located inside the tubular structure of the first wiping member 51 is sucked up and absorbed by the first wiping member 51.

[0050] In this way, by using the capillary action, the liquid or the like adhering to the nozzle surface is sucked up and absorbed by the first wiping member, so that the wiping device of the present embodiment can wipe the liquid or the like on the nozzle surface without contacting the nozzle surface.

[0051] In terms of ink absorbency, the material of the non-woven fabric, woven fabric, or knitted fabric is preferably, for example, cotton, hemp, silk, pulp, nylon, vinylon, polyester, polypropylene, polyethylene, rayon, cupra, acrylic, polylactic acid, etc. It is also possible to mix fibers of multiple materials instead of only one type of fiber. In terms of ink absorbency, the material of the porous body is preferably, for example, polyurethane, polyolefin, PVA (Polyvinyl Alcohol), etc.

[0052] When the liquid discharged from the head 9 contains a large number of particles, the first wiping member 51 is preferably composed of a non-woven fabric having multiple layers from the viewpoints of particle adsorbency and solvent absorbency in the liquid. The non-woven fabric having multiple layers preferably has a porosity of 0.60 or more and 0.85 or less in the first layer, and a porosity of 0.80 or more and 0.99 or less in at least one layer other than the first layer.

[0053] The first mechanism 52 is a mechanism unit that moves the first wiping member 51. The first mechanism 52 includes a winding roll shaft 521, a first transmission member 522, a first motor 523, an unwinding roll shaft 524, a support member 525, a first support rotating body 526, and a second support rotating body 527.

[0054] The winding roll shaft 521 is a roll shaft that winds up the first wiping member 51 by winding the first wiping member 51 around its outer peripheral surface while rotating. The winding roll shaft 521 is rotationally driven by the first motor 523 via the first transmission member 522.

[0055] The unwinding roll shaft 524 is a supply roller that unwinds the first wiping member 51 wound around its outer peripheral surface while rotating. The unwinding roll shaft 524 rotates passively as the winding roll shaft 521 rotates.

[0056] In the first mechanism 52, the first wiping member 51 is wound around the unwinding roll shaft 524, and an initial state is a state where one end of the first wiping member 51 is connected to the winding roll shaft 521. From the initial state, the first mechanism 52 can move the first wiping member 51 along the moving direction 31 indicated by the arrow by rotating the winding roll shaft 521 by the first motor 523. When all of the first wiping member 51 wound around the unwinding roll shaft 524 is wound onto the winding roll shaft 521, the winding roll shaft 521 and the unwinding roll shaft 524 are exchanged in the set and return to the initial state.

[0057] The support member 525 is provided on the side opposite to the nozzle surface 11 with the first wiping member 51 interposed therebetween, and is a member that supports the first wiping member 51. The support member 525 supports the first wiping member 51 in a state where the first wiping member 51 is close to the nozzle surface 11 and is non-contact with the nozzle surface 11.

[0058] The support member 525 is pre-positioned so that the distance between the first wiping member 51 supported by the support member 525 and the nozzle surface 11 becomes a predetermined distance in the direction orthogonal to the nozzle surface 11 of the head 9. However, the support member 525 may be configured to be movable in the direction orthogonal to the nozzle surface 11 of the head 9 in order to make the distance between the first wiping member 51 supported by the support member 525 and the nozzle surface 11 variable.

[0059] When the liquid discharged from the head 9 contains a large amount of particles, from the viewpoint of the nozzle surface 11 and the water-repellent film protection provided on the nozzle surface 11, the material of the support member 525 is preferably a rubber having a rubber hardness of 70° or less.

[0060] The first support rotating body 526 is provided on the upstream side of the support member 525 in the moving direction 31, and is a rotating body that supports the first wiping member 51. The second support rotating body 527 is provided on the downstream side of the support member 525 in the moving direction 31, and is a rotating body that supports the first wiping member 51.

[0061] When the first wiping member 51 moves, the roll diameter of the first wiping member 51 wound around the unwinding roll shaft 524 and the roll diameter of the first wiping member 51 wound around the winding roll shaft 521 gradually change. As a result, the contact angle of the first wiping member with respect to the support member 525 changes, and the movement of the first wiping member 51 may become unstable. By providing the first support rotating body 526 and the second support rotating body 527, the contact angle of the first wiping member with respect to the support member 525 does not change according to the movement of the first wiping member 51 and becomes constant. Therefore, the movement of the first wiping member 51 can be stabilized.

[0062] The second mechanism 53 is a mechanism unit that relatively moves the first wiping member 51 in a direction along the nozzle surface 11. The second mechanism 53 includes a rack 531, a second transmission member 532, and a second motor 533.

[0063] The rack 531 is provided at the bottom of the support 55. The second transmission member 532 is arranged to mesh with the rack 531. When the second transmission member 532 rotates by the second motor 533, the support 55 moves along the moving direction 40. The moving direction 40 corresponds to the direction along the nozzle surface 11.

[0064] Since the head 9 is provided independently of the support 55, when the support 55 moves, the first wiping member 51, the first mechanism 52, and the second wiping member 54 can relatively move in a direction along the nozzle surface 11 with respect to the head 9. Note that a configuration may be adopted in which the support 55 is fixed and the head 9 moves to cause relative movement.

[0065] The moving speed of the first wiping member 51 along the moving direction 31 by the first mechanism 52 is preferably a speed equal to or higher than the moving speed of the first wiping member 51 along the moving direction 40 by the second mechanism 53. Thereby, the wiping device 50 can easily wipe the nozzle surface 11 using the unused portion of the first wiping member 51, and can maintain higher wiping performance.

[0066] The moving mechanism in the second mechanism 53 is not limited to a rack and pinion mechanism and can be appropriately changed according to the specifications of the wiping device 50 and the like.

[0067] The second wiping member 54 is a member provided at a position facing the nozzle surface 11 so as to be able to contact the nozzle surface 11. The second wiping member 54 wipes the nozzle surface 11 by being moved along the moving direction 40 by the second mechanism 53 while being in contact with the nozzle surface 11.

[0068] For the second wiping member 54, for example, a non-woven fabric, a rubber-like member, etc. can be applied. However, from the viewpoint of obtaining good wiping performance and preventing frictional deterioration of the nozzle surface 11, it is preferable to apply a blade-shaped rubber member. Note that the second wiping member 54 is not an essential component in this embodiment, and the wiping device 50 does not necessarily have to include the second wiping member 54.

[0069] The control unit 60 mainly controls the operations of the first mechanism and the second mechanism respectively. FIG. 4 is a block diagram illustrating the functional configuration of the control unit 60. The control unit 60 includes a wiping operation control unit 61, a first movement control unit 62, and a second movement control unit 63. The control unit 60 can implement these functions with an electric circuit, and can also implement some of these functions by software (CPU; Central Processing Unit). Further, the control unit 60 may implement these functions by a plurality of circuits or a plurality of software.

[0070] The first movement control unit 62 controls the movement by the first mechanism 52. The first movement control unit 62 can control, for example, the start and stop of the movement of the first wiping member 51, or the movement speed of the first wiping member 51 by the first mechanism 52.

[0071] The second movement control unit 63 controls the movement by the second mechanism 53. The second movement control unit 63 can control, for example, the start and stop of the movement of the first wiping member 51 by the second mechanism 53, or the movement speed of the first wiping member 51.

[0072] The wiping operation control unit 61 controls the wiping operation of the wiping device 50 using the first movement control unit 62 and the second movement control unit 63.

[0073] In the present embodiment, the control unit 60 moves the first wiping member 51 by the first mechanism 52 using the first movement control unit 62, and relatively moves the first wiping member 51 by the second mechanism 53 using the second movement control unit 63, thereby wiping the nozzle surface 11.

[0074] Also in the present embodiment, the control unit 60 causes the second mechanism 53 to perform a wiping operation of relatively moving the first wiping member 51 a plurality of times, and then, in a state where the nozzle surface 11 and the second wiping member 54 are in contact, causes the second mechanism 53 to perform a wiping operation of relatively moving the second wiping member 54 along the moving direction 40.

[0075] <Configuration example of the support member> FIGS. 5 and 6 are diagrams illustrating the configuration of the support member in the wiping device 50. FIG. 5 is a diagram showing the support member 525 which is the first example, and FIG. 6 is a diagram showing the support member 525a which is the second example.

[0076] In FIG. 5, the distance L corresponds to a predetermined distance between the first wiping member 51 and the nozzle surface 11 in a direction orthogonal to the nozzle surface 11 of the head 9. From the viewpoint of preferably sucking the liquid by capillary action, the distance L is preferably 5 mm or less. On the other hand, if the distance L is short, the first wiping member 51 and the nozzle surface 11 may come into contact due to a positioning error or a movement error of the first wiping member 51 or the like. Therefore, the distance L is preferably 0.5 mm or more. Accordingly, the distance L is more preferably 0.5 mm or more and 5 mm or less.

[0077] The support member 525 faces the first wiping member 51 and includes a plane 528 parallel to the nozzle surface 11. By the support member 525 including the plane 528, the area where the first wiping member 51 supported by the support member 525 faces the nozzle surface 11 becomes large, and the absorbability of the liquid 15 is improved.

[0078] In FIG. 6, the support member 525a has a curvature along the moving direction 40 of the first wiping member 51 by the second mechanism 53, and includes a cylindrical surface 529 that has no curvature in a direction substantially orthogonal to the moving direction 40 in a direction parallel to the nozzle surface 11. Since the support member 525a includes the cylindrical surface 529, the first wiping member 51 supported by the support member 525a can smoothly move on the support member 525a. Therefore, the wiping device 50 can maintain the freshness of the first wiping member 51 well.

[0079] Further, in the present embodiment, a first water-repellent film is provided on the nozzle surface 11. Also, a second water-repellent film having higher water repellency than the first water-repellent film is provided on the plane 528 or the cylindrical surface 529 of the support member 525 facing the first wiping member 51. With this configuration, the wiping device 50 can suppress the liquid 15 absorbed by the first wiping member 51 from adhering to the plane 528 by the water-repellent action of the second water-repellent film.

[0080] <Operating effects of the wiping device 50> As described above, the wiping device 50 wipes the nozzle surface 11 of the head 9. The wiping device 50 includes a sheet-like first wiping member 51 disposed facing the nozzle surface 11 at a position separated from the nozzle surface 11 by a predetermined distance, a first mechanism 52 that moves the first wiping member 51, a second mechanism 53 that relatively moves the first wiping member 51 in a direction along the nozzle surface 11, and a control unit 60 that controls the operations of the first mechanism 52 and the second mechanism 53. The control unit 60 wipes the nozzle surface 11 by controlling the movement of the first wiping member 51 by the first mechanism 52 and the relative movement of the first wiping member 51 by the second mechanism 53.

[0081] Since the wiping device 50 can wipe the liquid 15 adhering to the nozzle surface 11 without contacting the nozzle surface 11, it is possible to suppress a change over time in the discharge performance due to wear of the nozzle surface 11 and the water-repellent film (first water-repellent film) provided on the nozzle surface 11.

[0082] Further, the wiping device 50 moves the first wiping member 51 by the first mechanism 52 and relatively moves the first wiping member 51 by the second mechanism 53. As a result, the wiping device 50 can maintain the freshness of the first wiping member 51 provided at the position facing the nozzle surface 11, so that the change in wiping performance over time can be suppressed.

[0083] Also, the timing of moving the first wiping member 51 by the first mechanism 52 and the timing of the first wiping member 51 by the second mechanism 53 may be different. That is, after removing the liquid 15 attached to the nozzle surface by the first wiping member by relatively moving the first wiping member 51 by the second mechanism 53, the freshness of the first wiping member 51 may be maintained by moving the first wiping member 51 by the first mechanism 52.

[0084] Also, in the present embodiment, the wiping device 50 further has a second wiping member 54 provided at a position facing the nozzle surface 11 so as to be able to contact the nozzle surface 11. After relatively moving the first wiping member 51 by the second mechanism 53, the control unit 60 relatively moves the second wiping member 54 in the direction along the nozzle surface 11 by the second mechanism 53 in a state where the nozzle surface 11 and the second wiping member 54 are in contact. As a result, the wiping device 50 can perform a wiping operation by contact after performing a non-contact wiping operation, so that a small amount of liquid 15 attached to the nozzle surface 11 can be removed more favorably.

[0085] Also, in the present embodiment, the first mechanism 52 is provided on the side opposite to the nozzle surface 11 with the first wiping member 51 interposed therebetween and has a support member 525 that supports the first wiping member 51. Since the wiping device 50 can support the first wiping member 51 by the support member 525 in a state where the first wiping member 51 and the nozzle surface 11 are non-contact, the change in discharge performance over time can be suppressed, and the first wiping member 51 can be moved to suppress the change in wiping performance over time.

[0086] Since the electrode manufacturing apparatus 100 discharges a liquid having abrasiveness or a liquid having a high solid content such as alumina or titanium oxide from the head 9, the nozzle surface 11 and the water-repellent film provided on the nozzle surface are easily scraped off. Therefore, the wiping device 50 is more effective when applied to the electrode manufacturing apparatus 100. However, the present invention is not limited to this, and the wiping device 50 can also be applied to an image forming apparatus or the like that forms an image on a recording medium with the liquid discharged from the head 9, and the above-described effects can be obtained.

[0087] Further, in the electrode manufacturing apparatus 100, when a liquid containing alumina, titanium oxide, or the like is discharged onto the surface of the active material on the current collector so that the alumina or titanium oxide covers the active material layer, for example, when forming a functional film having an insulating function, there is a concern that the active material cannot be covered with alumina or titanium oxide if the wiping performance changes over time. In addition, when discharging an active material onto a current collector to form an active material layer, there is a concern that if the wiping performance changes over time, a desired active material layer cannot be formed and excellent electrochemical element performance cannot be obtained.

[0088] The electrode manufacturing apparatus 100 according to the present embodiment is preferable in that it can solve the above concerns.

[0089] [Second Embodiment] The wiping device 50a according to the second embodiment will be described. In addition, components having the same or identical functions as those in the first embodiment are denoted by the same reference numerals, and redundant descriptions are appropriately omitted.

[0090] FIG. 7 is a diagram illustrating the configuration of the wiping device 50a. FIG. 7 shows the inside of the wiping device 50a as viewed through in the direction in which the plurality of nozzles 10 in the head 9 are arranged. The wiping device 50a includes a holding member 56, a biasing member 57, and a third mechanism 58.

[0091] The holding member 56 includes a butting surface 561 that abuts against the head 9 and holds the support member 525. The head 9 includes a head base 91, and the butting surface 561 is butted against a surface substantially parallel to the nozzle surface 11 of the head base 91.

[0092] The biasing member 57 is a member having elasticity such as a spring that biases the holding member 56 in the translational direction 41. The biasing member 57 is provided between the holding member 56 and the housing member 59, and biases the surface 562 on the side opposite to the abutting surface 561 of the biasing member 57. The housing member 59 is a box-shaped member that houses the holding member 56, the biasing member 57, and the third mechanism 58.

[0093] The third mechanism 58 is a mechanism unit that moves the holding member 56 toward the head 9. The third mechanism 58 includes a third transmission member 581 and a third motor 582, and converts the rotational motion of the third motor 582 into a translational motion by the third transmission member 581, thereby moving the housing member 59 along the translational direction 41. The translational direction 41 is an example of a predetermined direction.

[0094] The support member 525 is moved by the third mechanism 58 so that the abutting surface 561 abuts against the head base 91, and the holding member 56 is positioned by being biased by the biasing member 57. Thereby, the wiping device 50a can accurately secure the distance L between the support member 525 and the nozzle surface 11, and can wipe the nozzle surface 11 while suppressing the change over time of the discharge performance. In addition, other effects are the same as those of the first embodiment.

[0095] Although the embodiments have been described above, the present invention is not limited to the specifically disclosed embodiments, and various modifications and changes are possible without departing from the scope of the claims.

[0096] In the above-described embodiment, the configuration in which the liquid discharge units 30a, 30b, 30c, and 30d discharge the same type of liquid has been illustrated, but the same effects can be obtained even when the liquid discharge units 30a, 30b, 30c, and 30d discharge different types of liquid.

[0097] The numbers such as ordinal numbers and quantities used in the description of the embodiments are all exemplified for specifically explaining the technology of the present invention, and the present invention is not limited to the exemplified numbers. Also, the connection relationships between components are exemplified for specifically explaining the technology of the present invention, and the connection relationships for realizing the functions of the present invention are not limited thereto.

[0098] Also, the embodiment includes a wiping method. For example, the wiping method is a wiping method by a wiping device that wipes the nozzle surface of the head, and the wiping device includes a step of moving a first wiping member by a first mechanism and a step of controlling the first mechanism by a control unit. The control unit causes the nozzle surface to be wiped by moving the first wiping member by the first mechanism. By such a wiping method, the same effects as those of the above-described wiping device can be obtained.

[0099] Each function of the embodiment described above can be realized by one or more processing circuits. Here, the "processing circuit" in this specification includes a processor programmed to execute each function by software like a processor implemented by an electronic circuit, an ASIC (Application Specific Integrated Circuit) designed to execute each function described above, a DSP (digital signal processor), an FPGA (field programmable gate array), and devices such as conventional circuit modules.

Explanation of Reference Numerals

[0100] 1 Pay-out section 12 Pay-out roll 2 Electrode substrate 3 Coating section 30, 30a, 30b, 30c, 30d Liquid ejection section 4 Curing section 5 Drying section 6 Take-up section 7 Take-up roll 9 Head 91 Head base 10 Nozzle 11 Nozzle surface 15 Liquid 20 Conveying direction 31 Moving direction 40 Moving direction 41 Translation direction (an example of a predetermined direction) 45 Light source 50 Wiping device 51 First wiping member 52 First mechanism 521 Take-up roll shaft 522 First transmission member 523 First motor 524 Pay-out roll shaft 525 Support member 526 First support rotating body 527 Second support rotating body 528 Plane 529 Cylindrical surface 53 Second mechanism 531 Rack 532 Second transmission member 533 Second motor 54 Second wiping member 55 Support body 56 Holding member 561 Contact surface 562 Surface 57 Biasing member 58 Third mechanism 581 Third transmission member 582 Third motor 59 Housing member 60 Control unit 61 Wiping operation control unit 62 First movement control unit 63 Second movement control unit 80 Heater 100 Electrode manufacturing apparatus (an example of an image forming apparatus) L Distance

Prior art documents

Patent documents

[0101]

Patent Document 1

Claims

1. A wiping device for wiping a nozzle surface of a head, comprising: a sheet-like first wiping member disposed opposite to the nozzle surface at a position spaced apart from the nozzle surface by a predetermined distance; a first mechanism for moving the first wiping member; a second mechanism for relatively moving the first wiping member in a direction along the nozzle surface; a control unit for controlling operations of the first mechanism and the second mechanism respectively; the control unit wipes the nozzle surface by controlling the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism; the first mechanism is provided on the side opposite to the nozzle surface with a support member sandwiching the first wiping member, and has a support member for supporting the first wiping member; a first water-repellent film is provided on the nozzle surface; a second water-repellent film having higher water repellency than the first water-repellent film is provided on the surface of the support member facing the first wiping member. A wiping device.

2. A wiping device for wiping a nozzle surface of a head, comprising: a sheet-like first wiping member disposed opposite to the nozzle surface at a position spaced apart from the nozzle surface by a predetermined distance; a first mechanism for moving the first wiping member; a second mechanism for relatively moving the first wiping member in a direction along the nozzle surface; a control unit for controlling operations of the first mechanism and the second mechanism respectively; the control unit wipes the nozzle surface by controlling the movement of the first wiping member by the first mechanism and the relative movement of the first wiping member by the second mechanism; the first mechanism is provided on the side opposite to the nozzle surface with a support member sandwiching the first wiping member, and has a support member for supporting the first wiping member; the wiping device further comprises: a holding member including a contact surface that abuts against the head and holding the support member; a biasing member for biasing the holding member in a predetermined direction; a third mechanism for moving the holding member toward the head; the support member is moved by the third mechanism so that the contact surface abuts against the head, and the holding member is positioned by being biased by the biasing member. A wiping device.

3. The wiping device according to claim 1 or 2, wherein the control unit moves the first wiping member by the first mechanism while relatively moving the first wiping member by the second mechanism.

4. The wiping device according to any one of claims 1 to 3, wherein the head discharges liquid.

5. The wiping device according to any one of claims 1 to 4, wherein the predetermined distance is 5 mm or less.

6. The wiping device according to any one of claims 1 to 5, wherein the predetermined distance is 0.5 mm or more and 5 mm or less.

7. The moving speed of the first wiping member by the first mechanism is a speed equal to or higher than the moving speed of the first wiping member by the second mechanism, and the wiping device according to any one of claims 1 to 6.

8. Further comprising a second wiping member provided so as to be capable of contacting the nozzle surface at a position facing the nozzle surface, After the control unit relatively moves the first wiping member by the second mechanism, in a state where the nozzle surface and the second wiping member are in contact, the control unit moves the second wiping member along the nozzle surface by the second mechanism. The wiping device according to claim 7, which is relatively moved in the direction.

9. The wiping device according to any one of claims 1 to 8, wherein the support member includes a plane parallel to the nozzle surface.

10. The wiping device according to any one of claims 1 to 8, wherein the support member includes a cylindrical surface having a curvature along the moving direction of the first wiping member by the second mechanism.

11. A first support rotating body provided on the upstream side of the support member in the moving direction of the first wiping member and supporting the first wiping member, A second support rotating body provided on the downstream side of the support member in the moving direction of the first wiping member and supporting the first wiping member, and the wiping device according to any one of claims 1 to 10.

12. The wiping device according to any one of claims 1 to 11, and The head, and An image forming apparatus that forms an image on a recording medium by discharging a liquid from the head.

13. The wiping device according to any one of claims 1 to 11, and The head, and An electrode manufacturing apparatus that manufactures an electrode by discharging a liquid from the head.

14. A wiping method by a wiping device that wipes a nozzle surface of a head, wherein the wiping device A step of moving a first wiping member by a first mechanism, A step of relatively moving the first wiping member in a direction along the nozzle surface by a second mechanism, A step of controlling the operation of the first mechanism by a control unit, and The control unit wipes the nozzle surface by moving the first wiping member by the first mechanism, The first mechanism is provided on the side opposite to the nozzle surface with the first wiping member interposed therebetween, and has a support member that supports the first wiping member. A first water-repellent film is provided on the nozzle surface. A wiping method in which a second water-repellent film having higher water repellency than the first water-repellent film is provided on the surface of the support member facing the first wiping member.

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