Light source device and light emitting unit

Abstract

A light source device according to one embodiment of the present art uses energy beam irradiation to convert a liquid raw material into plasma and extract radiation, the light source device comprising a light-emitting unit. The light-emitting unit has a rotating body and a shielding body. The rotating body is capable of rotating about a rotation axis in a direction intersecting the direction of gravity and has an adhesion region to which the liquid raw material adheres. The shielding body has a space part for rotatably accommodating the rotating body, a first energy beam passage part through which an energy beam radiated onto the adhesion region passes, a radiation passage part through which passes radiation generated as a result of the liquid raw material adhering to the adhesion region being irradiated with the energy beam passing through the first energy beam passage part, and a shielding part for shielding the position in the adhesion region that is irradiated with the energy beam as viewed from the direction of the rotation axis.

Description

[Technical Field]

[0001] The present invention relates to a light source device and a light-emitting unit that generate X-rays, extreme ultraviolet light, and the like. [Background technology]

[0002] Traditionally, X-rays have been used for medical, industrial, and research purposes. In the medical field, X-rays are used for applications such as chest X-rays, dental X-rays, and CT (Computer Tomogram). In the industrial field, X-rays are used for applications such as non-destructive testing to observe the inside of materials such as structures and welds, and non-destructive tomographic testing. In the research field, X-rays are used for applications such as X-ray diffraction to analyze the crystalline structure of materials, and X-ray spectroscopy (X-ray fluorescence analysis) to analyze the constituent elements of materials.

[0003] Extreme ultraviolet light (hereinafter referred to as "EUV (Extreme Ultra Violet) light") with a wavelength of 13.5 nm, which is in the soft X-ray region with a relatively long wavelength among X-rays, has recently been used as exposure light. Here, the base material of a mask for EUV lithography on which a fine pattern is formed is a reflective mirror having a laminated structure in which a multilayer film (e.g., molybdenum and silicon) for reflecting EUV light is provided on a substrate made of low-thermal expansion glass. An EUV mask is then constructed by patterning a material that absorbs radiation with a wavelength of 13.5 nm on the multilayer film.

[0004] Furthermore, the size of unacceptable defects in EUV masks is significantly smaller than that of conventional ArF masks, making them difficult to detect. Therefore, EUV mask inspection is typically performed using actinic inspection, which uses radiation with a wavelength that matches the working wavelength of lithography. For example, inspection using radiation with a wavelength of 13.5 nm allows for defect detection with a resolution better than 10 nm.

[0005] Generally, EUV light source devices include DPP (Discharge Produced Plasma) light source devices, LDP (Laser Assisted Discharge Produced Plasma) light source devices, and LPP (Laser Produced Plasma) light source devices.

[0006] The DPP light source device applies a high voltage between electrodes to which gaseous plasma raw material (discharge gas) containing EUV radiating species is supplied, generating high-density, high-temperature plasma through discharge, and utilizes the extreme ultraviolet light emitted from it.

[0007] LDP light source devices are an improved version of DPP light source devices, and for example, they supply liquid high-temperature plasma raw material (e.g., Sn (tin) or Li (lithium)) containing EUV-emitting species to the surface of an electrode (discharge electrode) that generates a discharge, irradiate the raw material with an energy beam (e.g., electron beam or laser beam) to vaporize the raw material, and then generate high-temperature plasma through discharge.

[0008] LPP light source devices generate high-temperature plasma by exciting EUV-emitting species with a laser beam, etc. A known light source device of this type generates plasma by focusing laser light on tiny droplets of tin (Sn) or lithium (Li) or other target material for EUV radiation, which are ejected in the form of liquid droplets. [Prior art documents] [Patent documents]

[0009] [Patent Document 1] Japanese Patent Application Laid-Open No. 2014-216286 Summary of the Invention [Problem to be solved by the invention]

[0010] The light source device described in Patent Document 1 comprises a disk-shaped rotating body, a motor that rotates the rotating body, a cover-like structure that surrounds the rotating body via a gap, and a first storage tank that is provided inside the cover-like structure and stores liquid high-temperature plasma raw material, with a portion of the rotating body immersed in the high-temperature plasma raw material.

[0011] As the rotor rotates, a liquid high-temperature plasma raw material is applied to part of the rotor's surface. An opening is provided in part of the cover-like structure to expose the surface of the rotor on which the high-temperature plasma raw material is applied. An energy beam from the energy beam supply device is irradiated onto the high-temperature plasma raw material through the opening, generating EUV radiation.

[0012] This method corresponds to the so-called LPP method, but instead of supplying liquid plasma raw material as droplets, it uses the centrifugal force of a rotor to supply the liquid plasma raw material to the area irradiated by the energy beam. Therefore, compared to methods such as focusing a laser beam on droplets, it is possible to obtain high-intensity radiation with a relatively simple configuration.

[0013] Although debris is generated when the plasma raw material is irradiated with an energy beam, the cover-like structure surrounds the rotor, preventing the debris from scattering.

[0014] Thus, there is a need for a technology that can prevent debris generated by irradiation with an energy beam from scattering outside the shield.

[0015] In view of the above circumstances, an object of the present technology is to provide a light source device and a light-emitting unit that can suppress the scattering of debris outside a shielding body. [Means for solving the problem]

[0016] In order to achieve the above object, a light source device according to one embodiment of the present technology is a light source device that converts a liquid raw material into plasma by irradiating it with an energy beam to extract radiation, and includes a light-emitting unit. The light-emitting unit includes a rotating body and a shielding body. The rotating body is rotatable about a rotation axis in a direction intersecting the direction of gravity, and has an adhesion region on which the liquid source is adhered. The shielding body has a space portion that rotatably accommodates the rotating body, a first energy beam passing portion through which the energy beam irradiated to the adhesion region passes, a radiation passing portion through which the radiation generated when the energy beam that has passed through the first energy beam passing portion is irradiated to the liquid raw material adhered to the adhesion region passes, and a shielding portion that shields the irradiation position of the energy beam on the adhesion region when viewed from the direction of the rotation axis.

[0017] In this light source device, an energy beam is irradiated onto the area of ​​the rotating body where the liquid raw material is attached. Also, when viewed from the direction of the rotation axis of the rotating body, the irradiation position of the energy beam is shielded. This makes it possible to prevent debris generated by the irradiation of the energy beam from scattering outside the shield.

[0018] The shielding body may have a front portion where the first energy beam passing portion, the radiation passing portion, and the shielding portion are provided, a back portion facing the front portion, and a side portion. In this case, the space portion may be a space surrounded by the front portion, the back portion, and the side portion.

[0019] The shield may have a second energy beam passing portion provided on the front portion and through which the energy beam reflected by the attachment region passes.

[0020] The first energy beam passing portion, the radiation passing portion, and the second energy beam passing portion may each be located within a different opening provided in the front portion.

[0021] The front portion may be provided with three openings, i.e., a first opening, a second opening, and a third opening, in which the first energy beam passing portion may be located within the first opening, the radiation passing portion may be located within the second opening, and the second energy beam passing portion may be located within the third opening.

[0022] The light source device may further include a beam source that irradiates the energy beam. In this case, the beam source may cause the energy beam to be incident on each of the first energy beam passing portion and the attachment region in a direction oblique to the rotation axis.

[0023] The liquid source may be tin, lithium, gadolinium, terbium, gallium, bismuth, indium, or an alloy containing at least one of these materials.

[0024] The light source device may further include a chamber capable of maintaining a vacuum atmosphere and in which the shielding body is disposed, and a first exhaust section connected to communicate with the space portion of the shielding body and capable of evacuating the space portion.

[0025] The shield may have a connection portion to which the first exhaust portion is connected. In this case, the connection portion may include at least one of a connection port provided on the side portion, a connection port provided on the front portion, or a connection port provided on the back portion.

[0026] The light source device may further include a gas supply unit that generates a gas flow from the outside of the shield toward the space.

[0027] The gas supply section may have a gas supply port located near at least one of the first energy beam passing section or the radiation passing section.

[0028] The first exhaust section may include an exhaust device disposed outside the chamber, and a debris trap disposed between the chamber and the exhaust device to capture debris generated by irradiation of the energy beam onto the attachment region.

[0029] The light source device may further include a second exhaust section that is connected to communicate with the internal space of the chamber and is capable of evacuating the internal space so that the pressure in the space of the shielding body becomes lower than the pressure outside the shielding body.

[0030] A light-emitting unit according to an embodiment of the present technology converts a liquid raw material into plasma by irradiating it with an energy beam to extract radiation, and includes the rotating body and the shielding body. [Effects of the Invention]

[0031] According to the present invention, it is possible to suppress the scattering of debris generated by irradiation with an energy beam to the outside of the shielding body. Note that the effects described here are not necessarily limited to those described herein, and any of the effects described in this disclosure may be employed. [Brief explanation of the drawings]

[0032] [Figure 1] 1 is a schematic diagram showing an example of the configuration of a light source device according to a first embodiment of the present invention. [Figure 2] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 3] FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. [Figure 4] FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. [Figure 5] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 6A] FIG. 6 is a cross-sectional view taken along line BB in FIG. 5. [Figure 6B] FIG. 6 is a cross-sectional view taken along line BB in FIG. 5. [Figure 7] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 8] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 9] FIG. 9 is a cross-sectional view taken along line CC in FIG. 8. [Figure 10] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 11A] FIG. 11 is a cross-sectional view taken along line DD in FIG. [Figure 11B] FIG. 11 is a cross-sectional view taken along line EE in FIG. [Figure 12] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 13] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 14] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 15] FIG. 1 is a schematic diagram showing an example of the configuration of a debris trap. [Figure 16] FIG. 10 is a schematic diagram showing an example of a connection position of a pipe member. [Figure 17] FIG. 10 is a schematic diagram showing an example of a connection position of a pipe member. [Figure 18] FIG. 10 is a schematic diagram showing an example of a connection position of a pipe member. [Figure 19] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 20] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. [Figure 21] FIG. 2 is a schematic diagram showing a configuration example of a plasma generation mechanism. DETAILED DESCRIPTION OF THE INVENTION

[0033] Hereinafter, embodiments of the present technology will be described with reference to the drawings.

[0034] First Embodiment [Basic configuration of light source device] FIG. 1 is a schematic diagram showing an example of the configuration of a light source device according to a first embodiment of the present invention. The light source device 100 is an LPP type light source device that converts the plasma raw material 1 into plasma by irradiating it with an energy beam EB, and extracts the radiation R. In this disclosure, radiation R includes light (electromagnetic waves) emitted from plasma P, such as light in the soft X-ray region, such as EUV light, and hard X-rays with higher energy.

[0035] When EUV light is emitted as the radiation R, an EUV raw material is used as the plasma raw material 1. For example, liquid tin (Sn) or lithium (Li) is used as the raw material for emitting EUV light. Sn and Li are solid at room temperature, but when irradiated with the energy beam EB, they are used in a liquid state. When X-rays are emitted as the radiation R, an X-ray raw material is used as the plasma raw material 1. The X-ray raw material is, for example, a metal that is liquid at room temperature, such as gallium (Ga), a gallium alloy, or an Sn compound.

[0036] FIG. 1 is a diagram showing a schematic cross section of the light source device 100 taken horizontally at a position at a predetermined height from the installation surface, as viewed from above. In FIG. 1, cross sections of parts that do not need to be explained, such as cross-sectional configuration, are omitted in order to make it easier to understand the configuration and operation of the light source device 100. In the following description, the X direction may be referred to as the left-right direction (the positive side of the X axis is the right side, and the negative side is the left side), the Y direction as the front-rear direction (the positive side of the Y axis is the front side, and the negative side is the rear side), and the Z direction as the height direction (the positive side of the Z axis is the upper side, and the negative side is the lower side). Of course, the application of the present technology is not limited to the orientation in which the light source device 100 is used.

[0037] The light source device 100 includes a housing 2, a vacuum chamber 3, an energy beam entrance chamber 4, a radiation exit chamber 5, a plasma generation mechanism 6, a control unit 7, and a raw material supply device 30. In Fig. 1, the raw material supply device 30 is schematically illustrated by a dashed line frame.

[0038] 1, the housing 2 is configured so that its outer shape is roughly cubic. However, the shape of the housing 2 is not limited to a cubic shape, and any three-dimensional shape may be used. The housing 2 has an emission hole 2a formed in the front surface, an incidence hole 2b formed in the right side surface, a through-hole 2c formed in the rear surface, and a through-hole 2d formed in the left side surface. The material of the housing 2 is not limited, and for example, a metal housing is used.

[0039] In this embodiment, the emission axis EA of the radiation R is set to pass through the emission hole 2a on the front surface and extend in the Y direction (front-rear direction). The radiation R, such as X-rays or EUV light, is extracted along the emission axis EA and emitted forward from the emission hole 2a. In this embodiment, the incidence axis IA of the energy beam EB is set so as to extend obliquely leftward toward the rear side from the incidence hole 2b on the right side surface. 1, a beam source 8 that emits an energy beam EB is installed outside the housing 2. The beam source 8 is installed so that the energy beam EB enters the inside of the housing 2 along an incident axis IA. An electron beam or a laser beam can be used as the energy beam EB. The beam source 8 may be configured in any way that can emit the energy beam EB.

[0040] The light source device 100 is provided with a chamber section C including a plurality of chambers. Specifically, the chamber section C has a vacuum chamber 3, an energy beam incident chamber (hereinafter simply referred to as an incident chamber) 4, and a radiation exit chamber (hereinafter simply referred to as an exit chamber) 5. The vacuum chamber 3, the incident chamber 4, and the exit chamber 5 are spatially connected to one another. That is, the vacuum chamber 3 and the incident chamber 4 are connected to one another. Similarly, the vacuum chamber 3 and the exit chamber 5 are connected to one another.

[0041] The entrance chamber 4 is formed to be located on an entrance axis IA of the energy beam EB, and the exit chamber 5 is formed to be located on an exit axis EA of the radiation R. In addition, the vacuum chamber 3 is provided with a mechanism for generating plasma P.

[0042] In this embodiment, the chamber section C (vacuum chamber 3, entrance chamber 4, and exit chamber 5) is composed of a chamber main body 9, an outer protrusion 9a that protrudes forward from the front surface of the chamber main body 9, and two inner protrusions 9b and 9c that protrude inward from the inner surface of the chamber main body 9. The chamber body 9, the outer protrusion 9a, and the two inner protrusions 9b and 9c that constitute the chamber C are made of a metal material.

[0043] The chamber main body 9 is configured so that its outer shape is roughly a rectangular parallelepiped, and is disposed so that its front, rear, left, and right faces face the front, rear, left, and right faces of the housing 2, respectively. The chamber body 9 is also disposed so that the front right corner between the front surface and the right side surface is positioned on the incident axis IA of the energy beam EB.

[0044] 1, an emission hole 9d is formed in the front surface of the chamber body 9. The emission hole 9d is formed at a position aligned with the emission hole 2a in the front surface of the housing 2 on the emission axis EA of the radiation R. An outer protrusion 9a is configured to protrude forward from the periphery of the emission hole 9d of the chamber body 9. The outer protrusion 9a is configured to protrude farther forward than the emission hole 2a of the housing 2 so as to be inscribed within the emission hole 2a of the housing 2. Furthermore, on the inner side of the chamber body 9, an inner protrusion 9b is formed so as to protrude inward from the periphery of the emission hole 9d. The space surrounded by the outer protrusion 9a and the inner protrusion 9b functions as the emission chamber 5. The outer protrusion 9a and the inner protrusion 9b, which are members that constitute the emission chamber 5, can also be called the emission chamber. The outer protrusion 9 a and the inner protrusion 9 b may be formed integrally with the chamber body 9 or may be formed separately and then connected to the chamber body 9 .

[0045] The exit chamber 5 is configured to have a cone shape with the exit axis EA of the radiation R as its central axis. The exit chamber 5 is configured so that, in the direction of the exit axis EA of the radiation R, the cross-sectional area is large in the center and becomes smaller as the exit chamber approaches the front and rear ends. In other words, the exit chamber 5 has a shape that narrows as it approaches the front and rear ends. The exit chamber 5 is also provided with openings (apertures) at the front and rear ends to allow the radiation R to pass through.

[0046] A utilization device such as a mask inspection device is connected to the front end of the extraction chamber 5 (the front end of the outer protrusion 9a). In the example shown in FIG. 1, an application chamber 10 is connected as a chamber that forms part of the utilization device. The pressure inside the application chamber 10 may be atmospheric pressure. Furthermore, the inside of the application chamber 10 may be purged by introducing a gas (e.g., an inert gas) through a gas injection path as needed. Furthermore, the gas inside the application chamber 10 may be exhausted by exhaust means not shown.

[0047] A filter film 11 is provided between the extraction chamber 5 and the application chamber 10 to physically separate the region where plasma P is generated from the application chamber 10. The filter film 11 is made of a material that is permeable to radiation, and prevents the plasma raw material 1 and debris that are scattered as plasma P is generated from entering the application chamber 10.

[0048] A collector (condensing mirror) 12 is disposed inside the exit chamber 5 to guide and condense the radiation R that has entered the exit chamber 5 into the utilization device (inside the application chamber 10). In Fig. 1, the components of the radiation R that enter the exit chamber 5 and are condensed are shown by hatching.

[0049] A shielding member (central obscuration) 13 is also disposed inside the emission chamber 5. The shielding member 13 is disposed on the emission axis EA of the radiation R so as to be aligned with the emission hole 9d of the chamber body 9, the emission hole 2a of the housing 2, and the filter film 11. In this embodiment, the shielding member 13 can block radiation components that are not collected by the collector 12.

[0050] An entrance window 14 is formed in the front right corner of the chamber body 9. The entrance window 14 is formed at a position aligned with the entrance hole 2b on the right side surface of the housing 2 on the entrance axis IA of the energy beam EB. Furthermore, an inner protrusion 9c is configured on the inner side of the right front corner of the chamber body 9 so as to protrude from a position surrounding the entrance window 14 along the direction of the entrance axis IA of the energy beam EB. Of the internal space of chamber main body 9, the space surrounded by inner protrusion 9c functions as incident chamber 4. Inner protrusion 9c and the front right corner of chamber main body 9, which constitute incident chamber 4, can also be called the incident chamber itself. The inner protrusion 9c may be formed integrally with the chamber body 9, or may be formed separately and then connected to the chamber body 9.

[0051] The incident chamber 4 is configured to have a cone shape with the incident axis IA of the energy beam EB as its central axis. The incident chamber 4 is configured so that its cross-sectional area decreases toward the inner end of the chamber body 9 in the direction of the incident axis IA of the energy beam EB. In other words, the incident chamber 4 has a shape that narrows toward the inner end. Furthermore, the incident chamber 4 has an opening (aperture) at its inner end that allows the energy beam EB to pass through.

[0052] A capture mechanism for capturing scattered plasma raw material 1 and debris is placed inside the injection chamber 4. In the example shown in Fig. 1, the capture mechanism is a rotary window 15, which is a plate-shaped rotating member that transmits the energy beam EB and captures the plasma raw material 1 and debris. By rotating the rotary window 15, the effective area of ​​the beam transmission region of the rotary window 15 increases, making it possible to reduce the frequency with which the rotary window 15 is replaced.

[0053] 1, the extraction chamber 5 and the incidence chamber 4 are provided with gas injection paths 16a and 16b, respectively, and gas is supplied from a gas supply device (not shown) to the extraction chamber 5 and the incidence chamber 4. A gas having a high transmittance to the radiation R is supplied to the extraction chamber 5. A gas having a high transmittance to the energy beam EB is supplied to the incidence chamber 4.

[0054] The gases supplied to the exit chamber 5 and the entrance chamber 4 may be the same or different. For example, argon or helium can be used as gases that have high transmittance for both the energy beam EB and the radiation R. In addition, the types of gases supplied to the exit chamber 5 and the entrance chamber 4 are not limited. By supplying gas, the internal pressure of the emission chamber 5 and the injection chamber 4 can be set to a pressure higher than the internal pressure of the vacuum chamber 3, making it possible to suppress the intrusion of debris and the like.

[0055] Of the internal space of the chamber body 9, the space excluding the internal space of the inner protrusion 9b that functions as the emission chamber 5 and the internal space of the inner protrusion 9c that functions as the incidence chamber 4 functions as the vacuum chamber 3. The part that constitutes the vacuum chamber 3 itself can also be called the vacuum chamber. The vacuum chamber 3 corresponds to one embodiment of the chamber capable of maintaining a vacuum atmosphere according to the present technology.

[0056] 1, the chamber body 9 has a portion that protrudes from the housing 2 through a through-hole 2d on the left side surface of the housing 2 to the outside, and the tip of the portion is connected to an exhaust pump 17. The specific configuration of the exhaust pump 17 is not limited, and any pump such as a vacuum pump may be used. The vacuum chamber 3 is evacuated by the exhaust pump 17, reducing the pressure in the vacuum chamber 3. This suppresses the attenuation of the radiation R generated in the vacuum chamber 3. The inside of the vacuum chamber 3 does not necessarily have to be a vacuum atmosphere as long as it is a reduced pressure atmosphere relative to the entrance chamber 4 and the exit chamber 5. Also, an inert gas may be supplied into the vacuum chamber 3.

[0057] In this embodiment, gas nozzle 18 is installed so as to extend in the left-right direction toward the region between entrance axis IA and exit axis EA. Gas nozzle 18 is installed on the right side surface of chamber main body 9 via a seal member or the like. Gas nozzle 18 is connected to a gas supply device (not shown) and supplies gas into chamber main body 9. 1, gas is sprayed from the gas nozzle 18 from the right side of the region between the incident axis IA and the exit axis EA to the left along the left-right direction, thereby making it possible to move debris emitted from the plasma P in a direction away from the incident axis IA and the exit axis EA.

[0058] The plasma generation mechanism 6 is a mechanism for generating plasma P in the vacuum chamber 3 and emitting radiation R (X-rays, EUV light). The plasma generation mechanism 6 includes a disk-shaped rotor 20 for supplying raw material, and a raw material container 21 that contains the liquid plasma raw material 1. The rotor 20 and the raw material container 21 are placed inside the vacuum chamber 3.

[0059] 1, an energy beam EB is incident on a disk-shaped rotating body 20. The rotating body 20 is placed in a vacuum chamber 3 so that an irradiation position I of the energy beam EB is located at the intersection of an entrance axis IA and an exit axis EA. The shape of the rotating body is not limited to a disk shape, and a polygonal rotating body, for example, may be used.

[0060] Raw material container 21 is provided so that rotor 20 is immersed therein, and liquid plasma raw material 1 is supplied to rotor 20. For example, rotor 20 is rotatably held while immersed in the liquid plasma raw material 1 in raw material container 21, and plasma raw material 1 adheres to the surface of rotor 20. As rotor 20 rotates in this state, plasma raw material 1 is supplied to irradiation position I of rotor 20. Then, when energy beam EB is incident on irradiation position I of rotor 20, plasma P is generated.

[0061] In this way, raw material container 21 is provided inside vacuum chamber 3, stores liquid plasma raw material 1, and supplies the liquid plasma raw material 1 to the irradiation position I of energy beam EB. The rest of the configuration of plasma generation mechanism 6 will be explained in detail later.

[0062] The control unit 7 controls the operation of each of the components of the light source device 100. For example, the control unit 7 controls the operations of the beam source 8 and the exhaust pump 17. The control unit 7 also controls the operations of various motors, the raw material supply device 30, and the like, which will be described later. The control unit 7 has hardware circuits necessary for a computer, such as a CPU, memory (RAM, ROM), etc. The CPU loads a control program stored in the memory into the RAM and executes it, thereby performing various processes. The control unit 7 may be implemented by a programmable logic device (PLD) such as a field programmable gate array (FPGA), or other devices such as an application specific integrated circuit (ASIC). In FIG. 1, the control unit 7 is illustrated as a schematic functional block, but the position where the control unit 7 is configured may be designed arbitrarily.

[0063] 1, in this embodiment, a radiological diagnostic section 19 is configured on the front side of the chamber main body 9 in an area spatially connected to the vacuum chamber 3. The radiological diagnostic section 19 is configured at a position where radiation R, which is emitted in a direction different from the emission axis EA of the radiation R, is incident. The radiological diagnostic unit 19 measures the state of radiation R from the plasma P. Here, the state of radiation R refers to the physical state of radiation R, such as the intensity, wavelength, and spectrum of radiation R. For example, the radiological diagnostic unit 19 is configured by a detector that detects the presence or absence of radiation R and a measuring instrument that measures the output of radiation. The measurement results by the radiological diagnosis unit 19 are used for diagnosing radiation R and for controlling the operation of the raw material supply device 30, which will be described below.

[0064] The raw material supply device 30 supplies the plasma raw material 1 into the raw material container 21. The specific configuration of the raw material supply device 30 and the timing at which the raw material supply device 30 supplies the plasma raw material 1 are not limited.

[0065] [Plasma generation mechanism] FIG. 2 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. 3 and 4 are cross-sectional views taken along line AA in FIG. 2 shows the plasma generation mechanism 6 as viewed from above in FIG. 1 (positive side in the Y direction). Also shown are a beam source 8 and an energy beam EB emitted by the beam source 8. Note that in FIG. 1, the energy beam EB is emitted from the upper right side (corresponding to the front left side in FIG. 2) of the rotating body 20 by the beam source 8, but in FIG. 2, the energy beam EB is emitted from the front right side. As described above, the energy beam EB is emitted from opposite directions in FIGS. 1 and 2, but these emission directions are merely examples, and the specific emission direction is not limited.

[0066] The plasma generation mechanism 6 has a rotor 20, a source material container 21, and a cover structure 40. The rotor 20 and source material container 21 are shown by dashed lines in Fig. 2. Note that the source material container 21 is not shown in Figs. 3 and 4.

[0067] The rotor 20 has a disk portion 44 and a shaft portion 45. The disk portion 44 is disk-shaped and has a front surface 41 and a back surface 42. The front surface 41 is the front side in FIG. 2 and the left side in FIGS. 3 and 4. The back surface 42 is the back side in FIG. 2 and the right side in FIGS. 3 and 4. A portion of the lower side of the rotor 20 is immersed in the plasma raw material 1 contained in the raw material container 21. Therefore, a portion of the lower side of the rotor's front surface 41 is a region immersed in the plasma raw material 1. Hereinafter, this region will be referred to as the immersion region 43. For example, if the raw material container 21 contains a large amount of plasma raw material 1, most of the rotor's front surface 41 will be immersed, and the area of ​​the immersion region 43 will be large. The shape of the immersion region 43 can vary depending on the size and shape of the rotor 20 and the raw material container 21. Similarly, a portion of the lower side of the back surface 42 is also immersed in the plasma raw material 1.

[0068] The shaft portion 45 has an elongated cylindrical shape and is disposed so that its circular surface abuts against the center of the back surface 42 of the rotating body 20. In this embodiment, the rotating body 20 is configured to be rotatable about a predetermined rotation axis. Specifically, the rotating body 20 rotates about a rotation axis H that is parallel to the Y direction. The rotation axis H is indicated by a black circle in FIG. 2, and by a dashed line in FIGS. 3 and 4.

[0069] The shaft portion 45 is disposed so as to extend along the rotation axis H. That is, the shaft portion 45 is disposed parallel to the Y direction. Therefore, the disk portion 44 and the shaft portion 45 rotate integrally with the rotation axis H as the central axis. As shown in FIG. 2, in this example, the rotation direction is counterclockwise when viewed from the positive side of the Y direction, but the rotation direction may also be clockwise.

[0070] Furthermore, in this embodiment, the direction of the rotation axis H is a direction that intersects with the direction of gravity. Specifically, the direction of the rotation axis H is the Y direction, which is a direction that intersects with the direction of gravity (Z direction). This is not a limitation, and for example, a direction that is obliquely inclined with respect to the direction of gravity is also included in the direction that intersects with the direction of gravity. Therefore, not only the case where the rotating body 20 rotates while being arranged parallel to the XZ plane as in this example, but also the case where the rotating body rotates while being arranged obliquely with respect to the XZ plane is included in the scope of the present technology. Alternatively, the direction of the rotation axis H may be any direction that intersects with the direction of gravity.

[0071] The portion of the surface 41 of the rotor 20 above the immersion region 43 is the region where the plasma raw material 1 adheres. Specifically, the rotation of the rotor 20 lifts the plasma raw material 1, and the plasma raw material 1 is carried by the region of the surface 41 that is not immersed in the plasma raw material 1. Hereinafter, this region will be referred to as the adhesion region 46. The adhesion region 46 is the region of the surface 41 above the immersion region 43. The adhesion region 46 can also be said to be a carrier that carries the plasma raw material 1. Similarly, the upper side of the back surface 42 also becomes the adhesion region 46 where the plasma raw material 1 adheres.

[0072] The cover structure 40 is disk-shaped and has disk portions 47 and 48 and a side portion 49. The disk portions 47 and 48 are circular flat plates and are arranged parallel to the XZ plane with their centers positioned on the rotation axis H. The disk portion 47 is arranged on the front side in FIG. 2, and the disk portion 48 is arranged on the back side so that they face each other. The side portion 49 has a ring shape when viewed from the front direction in FIG. 2, and is formed between the disk portions 47 and 48.

[0073] The cover structure 40 also has a space S surrounded by the disk portions 47 and 48 and the side portion 49. That is, the space S is also a disk-shaped space. In this embodiment, the rotating body 20 is rotatably housed in the space S. Specifically, as shown in FIGS. 3 and 4, when a cross section of the plasma generation mechanism 6 is viewed, the rotating body 20 is housed so that the rectangular disk portion 44 appears to be surrounded by the larger rectangular cover structure 40.

[0074] This allows the rotating body 20 to rotate smoothly in the space S. For example, depending on the shape of the cover structure 40, the rotating body 20 may hit the disk portions 47 and 48 or the side portion 49 of the cover structure 40 during rotation, which may impede rotation. In this example, the shapes of the cover structure 40 and the space S are appropriately designed, so this type of rotation impediment does not occur. The specific shapes of the cover structure 40 and the space S are not limited, and any shape that can rotatably accommodate the rotating body 20 may be adopted.

[0075] The space S also contains a raw material container 21. For example, the raw material container 21 is placed in the lower part of the space S, and the lower part of the rotor 20 is immersed in the plasma raw material 1 contained in the raw material container 21. The raw material container 21 may be placed in any position that does not interfere with the rotation of the rotor 20. The space S corresponds to an embodiment of the space portion according to the present technology.

[0076] A circular opening 50 is provided in the disk portion 47 on the front side. When viewed from the front side in FIG. 2, the opening 50 is provided at the top of the disk portion 47, slightly to the left of the center. The specific configuration of the position, shape, size, etc. of the opening 50 is not limited. For example, the opening 50 may be polygonal or the like.

[0077] A circular through-hole 51 is provided in the disk portion 48 on the back side. The through-hole 51 is provided in the center of the disk portion 48. As shown in FIGS. 3 and 4 , the shaft portion 45 of the rotating body 20 passes through the through-hole 51, and the right end portion is exposed from the cover structure 40. The right end portion is connected to a motor or the like, and the control unit 7 controls the driving of the motor or the like, thereby realizing the rotation of the rotating body 20.

[0078] The position and shape of the through-hole 51 are not limited, and any configuration may be adopted that allows rotation of the rotor 20. Furthermore, for example, a mechanism such as a mechanical seal may be provided between the shaft portion 45 and the through-hole 51 as appropriate. This allows the rotor 20 to rotate smoothly while maintaining the air pressure in the space S.

[0079] The rotor 20, raw material container 21, and cover structure 40 are made of a rigid material such as metal. Alternatively, a material with low reactivity with the plasma raw material 1, energy beam EB, and radiation R may be used as appropriate to prevent deterioration due to reaction with these. Other specific configurations are not limited.

[0080] The cover structure 40 corresponds to an embodiment of a shield according to the present technology. The disk portion 47 on the front side corresponds to one embodiment of the front portion according to the present technology. The rear disk portion 48 corresponds to one embodiment of the rear portion according to the present technology. The plasma generation mechanism 6 corresponds to one embodiment of a light-emitting unit according to the present technology that converts a liquid raw material into plasma by irradiating it with an energy beam and extracts radiation.

[0081] [Energy beams and radiation] As shown in Fig. 2, in this embodiment, an energy beam EB is emitted by a beam source 8. Fig. 3 schematically illustrates the optical path of the energy beam EB up to the surface 41 of the rotating body 20. The energy beam EB is emitted from the beam source 8 toward an opening 50. That is, the energy beam EB is emitted from the front right toward the back left in Fig. 2. This direction corresponds to the direction from the bottom left to the top right in Fig. 3.

[0082] 2, the energy beam EB passes through the opening 50 and is irradiated onto the surface 41 of the rotor 20 at a position slightly to the left of the opening 50. In this embodiment, the positions of the opening 50 and the beam source 8 are appropriately adjusted so that the irradiation position I is located above the adhesion region 46. In other words, for example, the energy beam EB is not irradiated onto the immersion region 43.

[0083] The specific position of the irradiation position I is not limited, and the energy beam EB may be irradiated to any position on the attachment region 46. In addition, although the irradiation position I is schematically illustrated as a point in Figure 2 etc., the energy beam EB may be irradiated over a wide range on the attachment region 46, and the irradiation position I may become a wide irradiated surface.

[0084] Irradiation with the energy beam EB generates plasma P at irradiation position I, and radiation R is emitted. The radiation R is emitted in all directions toward the front side in FIG. 2, although the intensity varies depending on the emission angle. In FIG. 2, a portion of the emitted radiation R that passes through the opening 50 is schematically shown by arrows. Similarly, in FIG. 4, this portion of the radiation R is shown by a hatched pattern.

[0085] The radiation R that passes through the opening 50 enters, for example, the emission chamber 5 and is then utilized by a utilization device. That is, in this example, of the radiation R emitted at the irradiation position I, only a portion of the radiation R that passes through the opening 50 is extracted and utilized. On the other hand, the radiation R that does not pass through the opening 50 is not utilized.

[0086] In this embodiment, an incident region 52 through which the energy beam EB irradiated onto the attachment region 46 passes is provided in the disk portion 47 on the front side of the cover structure 40. Specifically, a portion of the opening 50 through which the energy beam EB passes becomes the incident region 52. In FIG. 3, the outline of the incident region 52 is schematically shown by a dashed ellipse. In this manner, the incident region 52 is a region located within the opening 50. Note that the incident region 52 is not shown in FIG. 2.

[0087] Alternatively, for example, when the energy beam EB is emitted toward the entire surface of the opening 50, the incident region 52 is an area that covers the entire surface of the opening 50. In this way, the shape of the incident region 52 depends on the emission direction, emission diameter, etc. of the energy beam EB, and there are no specific limitations on the shape of the incident region 52. The incident region 52 corresponds to an embodiment of a first energy beam passing portion according to the present technology.

[0088] In this embodiment, a passing area 53 through which the radiation R passes is provided in the disk portion 47. In this example, the radiation R passes through the entire surface of the opening 50, so the shape of the passing area 53 is generally the same as the shape of the opening 50. In Fig. 4, the general shape of the passing area 53 is schematically shown by an ellipse drawn with a dashed line. Note that the passing area 53 is not shown in Fig. 2.

[0089] In this way, even when the shape of the passing area 53 is roughly the same as the shape of the opening 50, this also falls within the fact that the passing area 53 is located within the opening 50. In addition, there are no specific limitations on the shape of the passing area 53. The passing region 53 corresponds to an embodiment of the radiation passing portion according to the present technology.

[0090] In this embodiment, the incident region 52 and the passing region 53 are located within one and the same opening 50. This makes it possible to realize the plasma generation mechanism 6 with a simple configuration. However, the present invention is not limited to this, and for example, two openings 50 may be provided in the disk portion 47, with the incident region 52 located within one opening 50 and the passing region 53 located within the other opening 50. Alternatively, three or more openings 50 may be formed in the disk portion 47. These embodiments will be described in detail later.

[0091] 3 and 4 show a gas supply unit 82 and a gas nozzle 18 that supply gas into the vacuum chamber 3. Also shown in Figures 2 to 4 is an exhaust device 83 connected to the vacuum chamber 3. The specific configuration of these will be described in detail later.

[0092] [Debris shielding] In the plasma generation mechanism 6, debris 87 is generated by irradiation with the energy beam EB. Specifically, the debris 87 is emitted from the irradiation position I toward the front in FIG. 2. Although the debris is emitted at various angles, it is known that the most debris is emitted particularly toward the positive side of the Y direction (the front side in FIG. 2, the left side in FIGS. 3 and 4). Hereinafter, this direction will be referred to as the front. In FIGS. 3 and 4, the debris 87 emitted toward the front is schematically illustrated by a hatched pattern. In this way, the debris 87 is emitted in greatest quantity to and collides with the portion of the inner surface of the disk portion 47 (the surface facing the space S) that faces the irradiation position I.

[0093] In this embodiment, the disk portion 47 is provided with a shielding portion 102 that shields the irradiation position I of the energy beam EB on the attachment region 46 when viewed from the direction of the rotation axis H. For example, when viewed from the front side of FIG. 2, a predetermined range of the disk portion 47 centered on the irradiation position I becomes the shielding portion 102. In FIG. 2, this range is schematically shown by a dashed circle.

[0094] As a result, debris 87 emitted from irradiation position I toward the front is blocked by shielding portion 102, preventing debris 87 from scattering outside cover structure 40. Because shielding portion 102 is provided at the front, which is the direction in which most debris 87 is emitted, it is possible to effectively prevent debris 87 from scattering.

[0095] The shielding portion 102 is not limited to the portion of the dashed circle as shown in Fig. 2. For example, if a circle of a larger diameter centered on the irradiation position I is considered, this portion also shields the irradiation position I, and therefore can be said to be the shielding portion 102. Alternatively, if the entire disk portion 47 is considered, this also shields the irradiation position I in the same way, and therefore the entire disk portion 47 can also be called the shielding portion 102. In this way, any portion that is part of the disk portion 47 and shields the irradiation position I can be called the shielding portion 102.

[0096] Even when the irradiation position I is shielded by an extremely narrow area of ​​the disk portion 47, this area can be said to be the shielding portion 102. In fact, the shielding portion 102 can suppress the scattering of a certain amount of debris 87, thereby achieving the above-mentioned effect. There are no other limitations on the specific size or shape of the shielding portion 102. For example, the irradiation position I may be shielded by a polygonal shielding portion 102.

[0097] On the other hand, even if it is a part of the disk portion 47, a part that does not shield the irradiation position I does not become the shielding portion 102. For example, when considering a circular portion 56 (shown by a dashed circle in FIG. 2) located to the left of the center of the disk portion 47, the portion 56 does not shield the irradiation position I, and therefore does not become the shielding portion 102. In other words, when considering a certain portion, if the portion does not include the irradiation position I when viewed from the front side of FIG. 2, the portion does not become the shielding portion 102.

[0098] Furthermore, if the disk portion 47 is not located in front of the irradiation position I, the disk portion 47 does not have the shielding portion 102. For example, if we consider a disk portion 47 in which the opening 50 is provided in front of the irradiation position I, no matter what part of the disk portion 47 is considered, that part cannot be considered to shield the irradiation position I. Therefore, such a disk portion 47 is a disk portion 47 that does not have the shielding portion 102.

[0099] That is, if the disk portion 47 exists in front of the irradiation position I as in this example, the disk portion 47 will have the shielding portion 102. On the other hand, if the disk portion 47 does not exist in front of the irradiation position I, the disk portion 47 will not have the shielding portion 102.

[0100] In this embodiment, the energy beam EB is incident on each of the incident region 52 and the attachment region 46 in a direction oblique to the rotation axis H. Specifically, the incident direction of the energy beam EB is from the lower left to the upper right in FIG. 3A , which is a direction that intersects with the rotation axis H. For example, if the energy beam EB is incident from the left side parallel to the rotation axis H, providing the shielding portion 102 in front of the irradiation position I would block the energy beam EB, and therefore the shielding portion 102 cannot be provided in the front. By configuring the energy beam EB to be incident obliquely as in this example, it is possible to provide the shielding portion 102 in the front.

[0101] [Exhaust system] 2 to 4, in this embodiment, the plasma generation mechanism 6 further includes an exhaust device 84 and a tubular member 85. The cover structure 40 is provided with a connection port 86. Note that the exhaust device 84, the tubular member 85, and the connection port 86 are not shown in FIG.

[0102] The connection port 86 is an opening to which the pipe member 85 is connected. As shown in Fig. 2, the connection port 86 is provided on the left side of the side portion 49 of the cover structure 40. This is not a limitation, and the connection port 86 may be provided on the right side or upper side of the side portion 49, for example. Other than that, the specific configuration of the connection port 86, such as its shape and size, is not limited. The connection port 86 corresponds to an embodiment of the connection portion according to the present technology.

[0103] The pipe member 85 is a member having a cylindrical shape. The pipe member 85 extends in the left-right direction in FIG. 2 and is disposed so as to penetrate the left side surface of the vacuum chamber 3. The right end of the pipe member 85 is connected to the connection port 86. The specific configuration of the pipe member 85, such as its diameter, is not limited.

[0104] The exhaust device 84 is a pump such as a vacuum pump, and is disposed outside (on the left side) of the vacuum chamber 3. The exhaust device 84 is also connected to the left end of the pipe member 85. That is, the exhaust device 84 and the pipe member 85 are connected so as to communicate with the space S of the cover structure 40.

[0105] In this embodiment, the space S is evacuated by the exhaust device 84 and the pipe member 85. Specifically, by operating the exhaust device 84, gas in the space S is sucked through the pipe member 85, and the space S is evacuated (decompressed).

[0106] The specific configuration of the exhaust device 84 is not limited, and any device capable of exhausting the space S, such as a pump other than a vacuum pump, may be used. Furthermore, the exhaust device 84 may be connected directly to the cover structure 40 without using the pipe member 85. The exhaust device 84 and the pipe member 85 correspond to an embodiment of a first exhaust unit according to the present technology.

[0107] 3 and 4, the debris 87 accumulates around the irradiation position I. Although not shown, the debris 87 may wrap around the periphery (lateral side) of the side portion 49 of the cover structure 40 or the periphery (rear side) of the disk portion 48 on the rear side. In other words, the debris 87 may accumulate in various positions in the space S.

[0108] In this embodiment, the debris 87 present in the space S is removed by driving the exhaust device 84. Specifically, as shown in Figures 3 and 4, the debris 87 is sucked through the tubular member 85 and released to the outside of the vacuum chamber 3 through the exhaust device 84. Figures 3 and 4 show how the debris 87 present around (on the front side of) the irradiation position I is sucked toward the upper side of the figure, but debris 87 present on the side and back sides is also sucked in similarly. In other words, all of the debris 87 filling the space S is sucked toward the upper side of the figure.

[0109] As described above, in the plasma generation mechanism 6 according to this embodiment, the energy beam EB is irradiated onto the attachment region 46 where the plasma raw material 1 is attached to the rotor 20. Furthermore, when viewed from the direction of the rotation axis H of the rotor 20, the irradiation position I of the energy beam EB is shielded. This makes it possible to prevent debris 87 generated by irradiation with the energy beam EB from scattering outside the cover structure 40.

[0110] In this embodiment, the cover structure 40 is disk-shaped, and the rotor 20 is housed in a space S surrounded by the disk portions 47 and 48 and the side portion 49. This makes it possible to suppress the scattering of debris 87 without impeding the rotation of the rotor 20.

[0111] In this embodiment, the energy beam EB and the radiation R pass through the circular opening 50. This allows the energy beam EB to be incident with high precision, and the radiation R to be extracted with high precision.

[0112] In this embodiment, the space S of the cover structure 40 is evacuated, which makes it possible to efficiently remove debris 87 generated by irradiation with the energy beam EB.

[0113] Debris 87 has the property of absorbing laser light. Therefore, if debris 87 is present on the optical path of energy beam EB as shown in Figure 3, the energy beam EB is absorbed and attenuated by debris 87 before reaching irradiation position I. In other words, the amount of radiation R generated at irradiation position I decreases.

[0114] Furthermore, since the debris 87 has the property of absorbing radiation such as EUV light, the radiation R generated at the irradiation position I is absorbed by the debris 87 remaining around the irradiation position I. This further reduces the output of the radiation R.

[0115] Furthermore, the debris 87 adheres to various locations within the plasma generation mechanism 6. For example, if the debris 87 accumulates on the boundary (the portion of the ridgeline thickness) of the hollow opening 50, and if the temperature at that location is low, the debris 87 does not melt and may narrow the opening 50. In this case, the area into which the energy beam EB can be incident becomes narrower, which may result in a decrease in the output of the radiation R. In the worst case scenario, the debris 87 may completely block the opening 50, causing the light source device 100 to stop functioning.

[0116] In addition to the opening 50, debris 87 adheres to various other locations, such as the inner surface of the cover structure 40 and the surface of the rotor 20. This may cause problems in driving the plasma generation mechanism 6 or may deteriorate various mechanisms.

[0117] In this technology, the debris 87 is removed by the exhaust device 84, which suppresses the absorption of the energy beam EB by the debris 87. Furthermore, the absorption of the radiation R by the debris 87 is also suppressed. As a result, it becomes possible to suppress a decrease in the output of the radiation R. Furthermore, since the debris 87 is less likely to adhere to various mechanisms, it becomes possible to prevent a decrease in the diameter of the opening 50 and deterioration of various mechanisms.

[0118] Moreover, in the present technology, a connection port 86 is provided in the cover structure 40, a pipe member 85 is connected to the connection port 86, and an exhaust device 84 is connected to the pipe member 85. By adopting such a connection configuration, it becomes possible to efficiently remove debris 87.

[0119] Furthermore, in this technology, a connection port 86 is provided on the side portion 49 of the cover structure 40. Debris 87 generated at the irradiation position I may be scattered outward by centrifugal force due to the rotation of the rotor 20, and may become distributed in large quantities around the side portion 49. By providing the connection port 86 on the side portion 49, it becomes possible to efficiently remove such debris 87.

[0120] Furthermore, in this technique, the rotating body 20 is immersed in the plasma raw material 1 contained in the raw material container 21. This makes it possible to efficiently attach the plasma raw material 1 to the rotating body 20.

[0121] <Second embodiment> A more detailed embodiment of the plasma generation mechanism 6 according to the present technology will be described as a second embodiment. In the following description, the description of the same parts as those in the configuration and operation of the plasma generation mechanism 6 described in the above embodiment may be omitted or simplified.

[0122] [Two-hole configuration] FIG. 5 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. 6A and 6B are cross-sectional views taken along line BB in FIG. In the figures from FIG. 5 onwards, the vacuum chamber 3, the exhaust device 84 and the like may be omitted from the illustration. In this embodiment, the cover structure 40 has an exit region 60 provided on the disk portion 47, through which the energy beam EB reflected by the attachment region 46 passes. The disk portion 47 also has two openings 61 and 62, with the entrance region 52 located within the opening 61 and the passing region 53 and the exit region 60 each located within the opening 62.

[0123] Aperture 61 is circular and is provided slightly to the left of the center on the top of disk portion 47 in Fig. 5. That is, aperture 61 is provided in the same position as aperture 50 in Fig. 2. Aperture 62 is also circular and is provided in a position point-symmetrical to aperture 61 with irradiation position I as the reference. Aperture 61, irradiation position I, and aperture 62 are aligned in a line along the optical axis (Y direction, left-right direction) of energy beam EB.

[0124] The energy beam EB emitted by the beam source 8 travels from the front right to the rear left in FIG. 5 (from the lower left to the upper right in FIG. 6A) and is irradiated onto the adhesion region 46. It is then reflected at irradiation position I and travels from the rear right to the front left in FIG. 5 (from the lower right to the upper left in FIG. 6A). In FIG. 4, the reflected energy beam EB is schematically shown by an arrow.

[0125] The exit region 60 is the region of the opening 62 through which the energy beam EB passes. In Fig. 6A, the outline of the exit region 60 is schematically shown by a dashed ellipse. Note that the exit region 60 is not shown in Fig. 5. In this example, the reflected light of the energy beam EB is emitted in the same angular range as the incident light, so the reflected light does not pass through the entire range of the opening 62, and the exit region 60 is a part of the area included in the opening 62.

[0126] On the other hand, when the energy beam EB is emitted toward the entire area of ​​the opening 61, the angular range of the reflected light also becomes wider, and the emission area 60 may become an area covering the entire surface of the opening 62. In this way, the shape of the emission area 60 depends on the emission direction, emission diameter, etc. of the energy beam EB.

[0127] In this example, radiation R is emitted toward the front side from irradiation position I in Fig. 5 as the center, but only a portion of the radiation R that passes through opening 62 is used. In Fig. 5, this portion of radiation R is schematically shown by an arrow. In Fig. 6B, this portion of radiation R is shown by a hatched pattern. In reality, radiation R is also emitted from the opening 61 side, but this radiation R is not shown in the illustration.

[0128] 5, a mixture of radiation R and energy beam EB is emitted from the opening 62. Here, the angular range of radiation R is wider than the angular range of energy beam EB, so it is possible to extract only radiation R by appropriately blocking the central portion of the emitted light with a damper or the like.

[0129] In this embodiment, the radiation R passes through an opening 62 that is different from the opening 61 through which the incident light of the energy beam EB passes. This makes it possible to efficiently extract the radiation R. Note that the radiation R that has passed through the opening 61 side may be extracted and used.

[0130] Furthermore, since the cover structure 40 has the exit region 60, it is possible to prevent deterioration of the cover structure 40 due to the energy beam EB being reflected inside the cover structure 40. Furthermore, in this embodiment, the passage region 53 and the exit region 60 are located within the common opening 62, so that the plasma generation mechanism 6 can be realized with a simple configuration. The emission region 60 corresponds to an embodiment of the second energy beam passing portion according to the present technology.

[0131] Alternatively, the entrance region 52 and the passage region 53 may be located within the opening 61, and the exit region 60 may be located within the opening 62. That is, a configuration may be adopted in which the radiation R is extracted from the opening 61 on the opposite side in FIG.

[0132] Arc-shaped opening FIG. 7 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. As shown in FIG. In this embodiment, at least one of the entrance region 52, the passage region 53, and the exit region 60 is located within an arc-shaped opening. As shown in Fig. 7, in this example, a circular opening 61 and an arc-shaped opening 65 are provided in the disk portion 47. The opening 61 is provided in the same position as the opening 61 in Fig. 5.

[0133] The opening 65 has an arc shape that extends from the top to the bottom of the irradiation position I. This shape can also be described as a C-shape or the left half of a doughnut shape. It can also be said that the shape is formed by connecting the openings arranged above and below the irradiation position I in an arc shape.

[0134] 7, the radiation R emitted from the opening 65 is schematically shown by arrows. In this way, in this example, the radiation R is emitted over a wide angle range, so that it is possible to extract even more radiation R, and the utilization efficiency of the radiation R is improved.

[0135] There are no limitations on the specific shape of opening 65. For example, opening 65 may be provided in an arc shape with a wider angle range. Alternatively, opening 65 may have the shape of an elongated hole where two openings are connected in a straight line, or a shape where the openings are connected in a curved line other than an arc.

[0136] In this example, the passage area 53 and the emission area 60 are located within the arc-shaped opening 65, but the entrance area 52 may also be located within the arc-shaped opening. That is, the opening 61 may be arc-shaped. Alternatively, in the single-hole configuration of FIG. 2, the opening 50 may have an arc-shape. In this case, the entrance area 52 and the passage area 53 are located within the arc-shaped opening 50.

[0137] 5 to 7, the entrance region 52, the passing region 53, and the exit region 60 are located within openings provided in the disk portion 47 and do not include the outer periphery of the disk portion 47. That is, the openings 61 and 62 in FIG. 5 and the opening 65 in FIG. 7 are all closed openings within the disk portion 47. By configuring the openings in this manner, it is possible to accurately input and output the energy beam EB and extract the radiation R. Note that in this example, all of the openings are configured to not include the outer periphery of the disk portion 47, but at least one of the openings may be configured to not include the outer periphery of the disk portion 47 and the other openings may be configured to include the outer periphery (not closed within the disk portion 47).

[0138] It should be noted that the entrance area 52, the passage area 53, and the exit area 60 may all be located within one opening. For example, such a configuration can be realized by making the opening an elongated hole.

[0139] [Damper] FIG. 8 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. As shown in FIG. FIG. 9 is a cross-sectional view taken along line CC in FIG. In this embodiment, the entrance region 52 and the passing region 53 are each located within an opening 61, and the passing region 53 is located within an opening 62. The cover structure 40 also includes a damper 68 that shields the opening 62 and absorbs the energy beam EB reflected by the attachment region 46.

[0140] In this example, openings 61 and 62 are provided at the same positions as in FIG. 5 . Damper 68 has a disk shape and has a diameter slightly larger than that of opening 62. Damper 68 is disposed at the position of opening 62 so as to close opening 62. There are no particular restrictions on the specific shape of damper 68, and any shape that can close opening 62 is acceptable. For example, if opening 62 is polygonal, then damper 68 should also have a polygonal shape that is slightly larger than opening 62.

[0141] The damper 68 is formed, for example, from a material that has high absorbency of the energy beam EB. For example, molybdenum and tungsten are used as materials that are resistant to tin melting. Copper and gold are used as materials with good thermal conductivity. Other materials that can be used include titanium, iron, nickel, aluminum, tantalum, and all compounds containing these (SUS, 64 titanium, TZM, etc.). Alternatively, these substances may be used as base metals, and the surface may be coated with any compound such as an oxide, nitride, or fluoride. The specific configuration of the damper 68 is not limited thereto.

[0142] 9, the reflected light of the energy beam EB is incident on the back surface of the damper 68 (the surface on the side of the space S) and is absorbed. For example, if the damper 68 were not provided, the reflected light would repeatedly reflect off the inner surface of the cover structure 40, which could result in deterioration of the inner surface. By providing the damper 68, the reflected light is absorbed without being reflected, and deterioration of the cover structure 40 is suppressed.

[0143] In this example, only a portion of the radiation R that passes through the opening 61 is extracted and utilized. That is, the incident area 52 and the passing area 53 are located within the common opening 61. This makes it possible to realize the plasma generation mechanism 6 with a simple configuration.

[0144] In the single-hole configuration shown in Fig. 2, damper 68 may be placed at the position shown in Fig. 8. That is, damper 68 does not necessarily have to be placed so as to block the opening. Even if damper 68 is placed at a position where there is no opening, the same effect can be achieved.

[0145] <Third embodiment> [Three-hole configuration] FIG. 10 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. As shown in FIG. Fig. 11 is a cross-sectional view of Fig. 10. Fig. 11A shows a cross-sectional view taken along line DD in Fig. 10. Fig. 11B shows a cross-sectional view taken along line EE in Fig. 10.

[0146] In this embodiment, three openings 71 , 72 and 73 are provided in the disk portion 47 , the entrance area 52 is located in the opening 71 , the passing area 53 is located in the opening 72 , and the exit area 60 is located in the opening 73 .

[0147] Opening 71 is circular and is provided in the same position as opening 61 in Fig. 5. Opening 72 is also circular and is provided in the same position as opening 62 in Fig. 5. Opening 73 is circular and is provided below irradiation position I. Therefore, openings 71, 72, and 73 are provided at the 3 o'clock, 6 o'clock, and 9 o'clock directions, respectively, with irradiation position I as the center.

[0148] 5, the energy beam EB travels from the front right to the rear left in FIG. 10 (from the lower left to the upper right in FIG. 11A) and enters the space S through the opening 71. It is further reflected at the irradiation position I, travels from the rear right to the front left in FIG. 10 (from the lower right to the upper left in FIG. 11A), and is emitted from the opening 73.

[0149] On the other hand, in this example, only a portion of the radiation R that passes through the opening 72 arranged on the lower side is extracted and used. In Fig. 11B, the radiation R is indicated by a hatched pattern. The passing area 53 of the radiation R is an area that covers almost the entire front surface of the opening 72.

[0150] In this manner, in this embodiment, the entrance region 52, the passage region 53, and the exit region 60 are located in different openings. Since the energy beam EB is not mixed and emitted from the opening 72 through which the radiation R is extracted, the radiation R can be extracted more efficiently.

[0151] The radiation R may be extracted from the opening 71 or 73. Also in this example, a configuration in which the opening 71, 72 or 73 has an arc shape or a configuration in which the opening 71, 72 or 73 is blocked by a damper 68 can be adopted. The opening 71 corresponds to an embodiment of the first opening according to the present technology. The opening 72 corresponds to an embodiment of the second opening according to the present technology. The opening 73 corresponds to an embodiment of the third opening according to the present technology.

[0152] <Fourth embodiment> [Configuration with opening open] 12 to 14 are schematic diagrams showing configuration examples of the plasma generation mechanism 6. In each of these examples, at least one of the entrance region 52, the passage region 53, and the exit region 60 is provided in the disk portion 47 and is located within an opening including the outer periphery of the disk portion 47. That is, all of the openings shown in FIGS. 12 to 14 are open openings within the disk portion 47.

[0153] For example, in Fig. 12, opening 76 is open upward and is provided so as to include the upper part of the outer periphery of disk portion 47. Similarly, opening 77 in Fig. 13 is provided so as to include the upper arc of disk portion 47. Opening 78 in Fig. 14 is provided so as to include the right and left arcs of disk portion 47.

[0154] By configuring the opening in this way, it is possible to accurately input and output the energy beam EB and extract the radiation R. For example, compared to when the opening is closed within the disk portion 47, it is possible to provide an opening with a larger area, which makes it possible to reliably input and output the energy beam EB. In addition, it is possible to extract the radiation R over a wide range, which improves the utilization efficiency of the light source device 100.

[0155] 12, opening 76 has a shape that is a part of a shape in which two circles are linearly connected. Specifically, the shape of opening 76 corresponds to the shape of the lower half of two circles of the same shape that are arranged in the vertical direction (Z direction) and the two circles connected vertically, cut out by the arc at the top of disk portion 47. In other words, opening 76 has a shape of an elongated hole that extends in the vertical direction and is open upward.

[0156] This makes it possible to extract radiation R over a wide range, for example, and improves the utilization efficiency of the light source device 100. The opening 76 may be arranged in the left-right or diagonal direction and may open left-right or diagonally. In this example, the energy beam EB is incident from the right side, but it may also be incident from above, etc. Alternatively, the device may be used in such a way that the energy beam EB is incident on one end of a long hole and radiation R is extracted from the other end.

[0157] 13, the opening 77 has a shape surrounded by the arc and one chord of the disk portion 47. Specifically, the shape of the opening 77 is surrounded by the upper arc of the disk portion 47 and a chord extending along the left-right direction (X direction).

[0158] This makes it possible to extract a wider range of radiation R. Note that a configuration in which the opening 77 is oriented in a different direction may be employed, such as when the opening 77 has a shape surrounded by a right-hand arc and a chord extending in the vertical direction.

[0159] In this example, the rear disk portion 48 has a circular shape with no opening, which makes it possible to prevent the plasma raw material 1 from scattering from the rear side.

[0160] 14, the opening 78 has a shape surrounded by the arc and two parallel chords of the disk portion 47. Specifically, the shape of the opening 78 is surrounded by the left and right arcs of the disk portion 47 and two parallel upper and lower chords that each extend in the left-right direction.

[0161] In this case as well, it is possible to extract radiation R from a wide range. Note that a configuration in which the opening 78 is arranged in a different direction may be employed, such as when the opening 78 has a shape surrounded by upper and lower arcs and two chords extending in the up and down directions.

[0162] <Fifth embodiment> [Debris Trap] Figure 15 is a schematic diagram showing an example of the configuration of the debris trap. In this embodiment, the plasma generation mechanism 6 further has a debris trap 90 and a tubular member 91. In this example, as in Figure 3, a connection port 86 is provided on the side part 49 of the cover structure 40. Furthermore, as shown in Figure 15, a tubular member 85, debris trap 90, tubular member 91, and exhaust device 84 are connected to the connection port 86 in this order. Note that although Figure 15 shows the exhaust device 84 connected to the right side of the debris trap 90, this is a schematic representation of the connected state, and the specific direction of connection is not limited.

[0163] The debris trap 90 captures debris 87 generated by irradiation of the attachment region 46 with the energy beam EB. As the debris trap 90, for example, a foil trap with a rotation function (a rotating foil trap) or a foil trap that is fixed and does not rotate (a fixed foil trap) is used.

[0164] The rotary foil trap has multiple foils (thin films or thin flat plates) arranged radially around a centrally located rotation axis, and captures debris 87 by rotating the multiple foils around the rotation axis.

[0165] The fixed foil trap mainly captures debris 87 that moves at high speed (particularly ions, neutral atoms, electrons, etc. of the plasma raw material 1 that move at high speed). As a fixed foil trap, for example, similar to a rotary foil trap, one that has a central axis and includes multiple foils (thin films or thin flat plates) arranged radially from the central axis may be used. Alternatively, a fixed foil trap of a different type from the rotary foil trap may be used, such as one in which thin flat plates are arranged in parallel.

[0166] A foil trap that combines a rotating foil trap and a fixed foil trap may be used as the debris trap 90. The specific configuration of the debris trap 90 is not limited, and any mechanism that can capture the debris 87 may be used.

[0167] The pipe member 91 has, for example, a shape similar to that of the pipe member 85. The specific configuration of the pipe member 91 is not limited. In this example, the debris trap 90 and the exhaust device 84 are connected by the pipe member 91, but the specific connection method is not limited, and for example, the connection may be made without the pipe member 91. Similarly, the debris trap 90 may be connected directly to the side part 49 of the cover structure 40 without the pipe member 85.

[0168] Debris 87 sucked in by the exhaust device 84 may solidify inside the exhaust device 84, which may cause the device to malfunction. In this embodiment, the sucked debris 87 is captured by the debris trap 90, so the amount of debris 87 entering the exhaust device 84 is reduced. In other words, it is possible to prevent malfunction of the exhaust device 84.

[0169] Alternatively, measures may be taken in the exhaust device 84 itself. That is, a mechanism equivalent to the debris trap 90 may be provided inside the exhaust device 84. In this case, it is possible to achieve the same effect without providing the debris trap 90 on the path of the debris 87.

[0170] The debris trap 90 may also be a bent portion of the pipe member 85. For example, in FIG. 3, the pipe member 85 is an L-shaped pipe bent to the right halfway, and the exhaust device 84 is connected to it from the right side. This causes the debris 87 to slow down to some extent at the bent portion of the pipe member 85, and some of the debris 87 adheres to the bent portion. Therefore, the amount of debris 87 entering the exhaust device 84 is reduced. Furthermore, since the speed of the entering debris 87 is also reduced, deterioration of the exhaust device 84 due to collisions with the debris 87 is suppressed.

[0171] This makes it possible to realize the plasma generation mechanism 6 with a simpler configuration than when a foil trap is provided as the debris trap 90. Of course, there are no limitations on how the tubular member 85 is bent, and the tubular member 85 may be bent in another shape, such as an S-shape. Any other shape may be selected depending on the configuration of the device.

[0172] Sixth Embodiment [Pipe connection position] 16 is a schematic diagram showing an example of the connection position of tubular member 85. In this example, connection port 86 of tubular member 85 is provided in disk portion 47 on the front side of cover structure 40. Specifically, connection port 86 is provided at a position facing irradiation position I. In this example, irradiation position I is shielded by a portion of tubular member 85 facing irradiation position I, and therefore this portion corresponds to the shielding portion.

[0173] In this example, the pipe member 85 is connected in the front direction where the most debris 87 is released, making it possible to instantly and efficiently remove the debris 87 generated at the irradiation position I. Furthermore, particularly when the pipe member 85 is bent midway as in this example, the debris 87 is decelerated and captured at the bent portion, suppressing deterioration of the exhaust device 84.

[0174] Alternatively, the connection port 86 may be provided at another position on the front-side disk portion 47 that does not face the irradiation position I. In this case, the pipe member 85 is also connected at a position relatively close to the irradiation position I, so that the debris 87 is efficiently removed.

[0175] 17 is a schematic diagram showing an example of the connection position of the tubular member 85. In this example, the connection port 86 of the tubular member 85 is provided in the disk portion 48 on the back side of the cover structure 40. Debris 87 generated at the irradiation position I may pass around the periphery of the side portion 49 of the cover structure 40 and wrap around to the back side. In this example, the tubular member 85 is connected to the back side, so that such debris 87 can be efficiently removed.

[0176] Furthermore, debris 87 that has made its way behind the rotor 20 may adhere to the shaft 45, and may solidify, impeding the rotation of the rotor 20. In this example, the debris 87 that has made its way behind the rotor 20 is removed, preventing such rotational impediments. In particular, by providing the connection port 86 near the shaft 45, debris 87 that has come close to the shaft 45 can be efficiently removed, making it possible to more reliably prevent rotational impediments. Alternatively, the connection port 86 may be provided on the lower side of FIG. 17 (the right side of FIG. 2).

[0177] Fig. 18 is a schematic diagram showing an example of the connection position of the pipe member 85. In the example of Fig. 2, the pipe member 85 is connected to the left side of the side portion 49, but the pipe member 85 may be connected to another position on the side portion 49.

[0178] In this example, when the side portion 49 is divided into two by a plane that is perpendicular to the perpendicular line drawn from the irradiation position I to the rotation axis H and that includes the rotation axis H, the connection port 86 is provided on the side portion 49 on which the irradiation position I is located, above the plasma raw material 1 contained in the raw material container 21.

[0179] That is, in Fig. 18, side portion 49 is shown by dashed lines and solid lines, and connection port 86 is provided in the portion shown by the solid line. In Fig. 18, a perpendicular line 94 extending from irradiation position I to rotation axis H is shown by a dashed line. Because rotation axis H extends along the Y direction, perpendicular line 94 is a line segment parallel to the XZ plane (the plane of Fig. 18).

[0180] 18, plane 95 is indicated by a dashed line. Plane 95 is perpendicular to the perpendicular line (perpendicular line 94) drawn from irradiation position I to rotation axis H, and corresponds to a plane that includes rotation axis H. In other words, plane 95 is perpendicular to the XZ plane and includes rotation axis H.

[0181] When side portion 49 is divided into two by plane 95, when viewed from the Y direction as shown in Figure 18, side portion 49, which has a circular shape, is divided by plane 95 into an upper left semi-arc and a lower right semi-arc. Of these, the side portion 49 on the side where irradiation position I is located corresponds to the upper left semi-arc. The part of the upper left semi-arc above plasma raw material 1 corresponds to the solid line portion in Figure 18. In other words, connection port 86 is provided at any position within this solid line portion.

[0182] Debris 87 is generated around irradiation position I, and as a result of centrifugal force, etc., it is distributed in relatively large quantities in the solid line portion of side portion 49. In this example, connection port 86 is provided at the position of the solid line portion, making it possible to remove debris 87 even more efficiently.

[0183] A plurality of connection ports 86 may be provided in the cover structure 40. That is, the connection ports 86 may be at least one of the connection port 86 provided in the side portion 49, the connection port 86 provided in the front-side disk portion 47, and the connection port 86 provided in the rear-side disk portion 48.

[0184] For example, by providing one connection port 86 on each of the disk portion 47, the disk portion 48, and the side portion 49, it becomes possible to efficiently remove debris 87 that exists in various positions. Alternatively, connection ports 86 may be provided only in the minimum necessary positions, such as two locations on the disk portions 47 and 48. Furthermore, for example, if it is desired to focus on removing debris 87 on the back side, multiple connection ports 86 may be provided on the back side disk portion 48.

[0185] The pipe member 85 may be branched midway and connected to different parts of the cover structure 40. In this case, for example, only one exhaust device 84 is provided, and the pipe member 85 connected to the single exhaust device 84 is branched into three parts, one each connected to the disk portion 47, the disk portion 48, and the side portion 49. This eliminates the need to provide multiple exhaust devices 84, and makes it possible to realize the plasma generation mechanism 6 with a simple configuration.

[0186] Seventh Embodiment [Cover structure configuration] FIG. 19 is a schematic diagram showing a configuration example of the plasma generation mechanism 6. In this example, the cover structure 40 is configured in a block shape with a thickness in the Y direction. The left part of the cover structure 40 in FIG. 19 houses the rotor 20 as in FIG. 3, and a pipe member 85 and an exhaust device 84 are connected to the upper side. On the other hand, a space for housing a motor 98 is provided in the right part of the cover structure 40. In addition, a space is provided through which the shaft 45 of the rotor 20 passes, and a mechanical seal 99 is provided between the space and the shaft 45.

[0187] By configuring the plasma generation mechanism 6 in this manner, the motor 98 is stably disposed, and fluctuation in the rotation of the rotating body 20 is suppressed. Additionally, mechanisms other than the motor 98 may be disposed inside the cover structure 40. Alternatively, the cover structure 40 and the vacuum chamber 3 may be configured integrally.

[0188] Figure 20 is a schematic diagram showing a configuration example of the plasma generation mechanism 6. In this example, the cover structure 40 is also configured in a block shape, but an exhaust device 84 is connected to the right side of the cover structure 40 in Figure 20. Specifically, a flow path for debris 87 is provided inside the cover structure 40 so as to extend in the Y direction from a position facing the back surface 42 of the rotating body 20. The right end of the flow path serves as a connection port 86, to which a pipe member 85 and an exhaust device 84 are connected.

[0189] Even when the cover structure 40 is block-shaped in this way, it is possible to adopt a configuration in which the pipe member 85 is connected to the back side, thereby efficiently removing the debris 87. In addition, the pipe member 85 may be connected to any appropriate position in accordance with the configuration of other mechanisms.

[0190] <Other embodiments> The present technology is not limited to the above-described embodiments, and various other embodiments can be realized. [Gas supply section] Light source device 100 may have a gas supply unit 82 that generates a gas flow from the outside of cover structure 40 toward space S. Figure 3 schematically shows a state in which gas supply unit 82 is connected to vacuum chamber 3 via gas nozzle 18.

[0191] A gas such as argon is introduced into the gas nozzle 18 by the gas supply unit 82. The introduced gas passes through the inside of the gas nozzle 18 and moves to a space inside the vacuum chamber 3 and outside the cover structure 40 (hereinafter referred to as the external space T of the cover structure 40). As a result, the pressure in the external space T becomes higher than the pressure in the space S, and a gas flow from the external space T toward the space S occurs.

[0192] This makes it possible to prevent the debris 87 present in the space S from leaking out through the opening 50 into the external space T. In other words, it becomes possible to keep the debris 87 in the space S and to exhaust the debris 87 more efficiently.

[0193] Furthermore, the gas supply unit 82 may have a gas supply port located near at least one of the incident region 52 of the energy beam EB and the passage region 53 of the radiation R. For example, the tip of the gas nozzle 18 corresponds to the gas supply port, and the gas nozzle 18 is arranged so that the tip portion extends near the opening 50. This generates a strong gas flow around the opening 50, making it possible to reliably prevent the leakage of debris 87. In addition, adhesion of debris 87 to the opening 50 is further suppressed.

[0194] 3 merely schematically illustrates the gas supply unit 82 and the gas nozzle 18, and the specific configuration, such as the connection position of each, is not limited. For example, a plurality of gas supply units 82 and gas nozzles 18 may be connected, or the gas nozzle 18 may be a circular shower head or the like. Furthermore, any type of gas other than argon gas may be used as long as the present technology can be realized.

[0195] In this example, the light source device 100 is connected to communicate with the external space T of the cover structure 40 and has an exhaust device 83 that can exhaust the external space T. For example, the exhaust pump 17 shown in FIG. 1 can be the exhaust device 83, but the specific configuration is not limited thereto.

[0196] By lowering the driving ratio of the exhaust device 83 on the vacuum chamber 3 side relative to the exhaust device 84 on the cover structure 40 side, the space S is strongly exhausted and the external space T is weakly exhausted. This causes a gas flow from the external space T toward the space S. With this configuration, it is also possible to prevent the leakage of debris 87. The exhaust device 83 corresponds to an embodiment of a second exhaust unit according to the present technology. The external space T of the cover structure 40 corresponds to the internal space of the chamber according to the present technology.

[0197] [Disc section configuration] FIG. 21 is a schematic diagram showing an example of the configuration of the plasma generation mechanism 6. In this example, the disk portions 47 and 48 are flat plates having a shape including a part of a circle and a flat bottom. Specifically, the shape of the disk portion 47 is such that the upper half is semicircular and the lower half is rectangular (oblong). In other words, the semicircle corresponds to the shape of a part of a circle, and the rectangle corresponds to the shape including the flat bottom. The disk portion 48 on the back side also has the same shape as the disk portion 47.

[0198] 21, it is possible to increase the volume of the raw material container 21 and accommodate a larger amount of plasma raw material 1. Note that the disk sections 47 and 48 may have other shapes that include a flat bottom, such as a shape in which the lower half is trapezoidal or a rectangular shape with rounded corners.

[0199] Opening Location The specific position of the opening is not limited, and the opening may be configured at any position within the range that the present technology can realize. For example, when viewed from the direction of the rotation axis H, the opening is provided inside the irradiation position I with the rotation axis H as the reference.

[0200] That is, the opening is provided so that the distance between the rotation axis H and the opening is shorter than the distance between the rotation axis H and the irradiation position I. Examples of such openings include opening 50 in FIG. 2, opening 61 in FIG. 5, and openings 71 and 72 in FIG. 10. Debris generated at irradiation position I is scattered outward due to the centrifugal force of the rotation of the rotor 20. By locating the opening inside the irradiation position I, it is possible to reduce the amount of debris passing through the opening, and it is possible to prevent debris from scattering outside the cover structure 40.

[0201] Conversely, the opening may be provided outside the irradiation position I with respect to the rotation axis H. Depending on the arrangement of other mechanisms, it may be effective to provide the opening outside the irradiation position, and such an opening arrangement may also be adopted as appropriate.

[0202] Number of openings Four or more openings may be provided in the disk portion 47. In this case, the energy beam EB may be incident or emitted, or the radiation R may be extracted, through two or more openings. Furthermore, monitor light of the energy beam EB or the radiation R may be extracted from the openings, and the state of the light may be monitored. In addition, any configuration may be adopted within the scope that makes it possible to realize the present technology, such as a configuration in which any of the openings is arc-shaped, a configuration in which the openings are closed by a damper 68, or a configuration in which the openings have different shapes.

[0203] [Skimmer] The plasma generation mechanism 6 may have a skimmer that adjusts the thickness of the plasma raw material 1 adhering to the attachment region 46. The skimmer is, for example, a structure with a channel structure, and is placed immediately before the irradiation position I of the rotor 20 (such as immediately above and to the right of the irradiation position I), with a predetermined gap between them so that the rotor 20 is sandwiched between them. Of course, the specific configuration of the skimmer is not limited. The skimmer functions as a scraper that scrapes off part of the plasma raw material 1 adhering to the attachment region 46 of the rotor 20.

[0204] This makes it possible to supply the plasma raw material 1 almost uniformly to the irradiation position I, and stabilize the intensity of the radiation R. Note that a mechanism other than a skimmer that can adjust the thickness of the plasma raw material 1 may also be provided.

[0205] [Type of plasma raw material] The plasma raw material 1 can be tin, lithium, gadolinium, terbium, gallium, bismuth, indium, or an alloy containing at least one of these materials. For example, if EUV light is extracted as the radiation R and the EUV light is used in a microscope, bismuth is used as the material. Also, if X-rays are generated as the radiation R, indium is used as the material. By using these materials, it is possible to generate high-quality radiation R. There are no other limitations on the specific type of plasma raw material 1.

[0206] [Types of energy beams and radiation] There are no limitations on the specific types of the energy beam EB and the radiation R. For example, laser light can be used as the energy beam EB. This makes it possible to generate high-quality radiation R. Furthermore, for example, extreme ultraviolet light (EUV light) or X-rays can be generated as the radiation R. This makes it possible to use the radiation R efficiently.

[0207] [Application to DPP and LDP] This technology can also be applied to a DPP light source device or an LPP light source device. In this case, for example, two rotating bodies are housed in a common cover structure 40, and one or more exhaust devices 84 are connected to the cover structure 40. Exhaust of debris 87 may be achieved in any other manner.

[0208] The light source device, plasma generation mechanism, cover structure, disk portion, shielding portion, opening, exhaust device, tubular member, debris trap, gas supply portion, gas nozzle, damper, etc. described with reference to the drawings are merely one embodiment and can be arbitrarily modified without departing from the spirit of the present technology. In other words, any other configuration, etc. for implementing the present technology may be adopted.

[0209] In the present disclosure, when the word "approximately" is used, this is used merely to facilitate understanding of the description, and the use or non-use of the word "approximately" does not have any special meaning. That is, in the present disclosure, concepts that define shape, size, positional relationship, state, etc., such as "center," "central," "uniform," "equal," "same," "orthogonal," "parallel," "symmetrical," "extended," "axial direction," "circular," "cylindrical," "arc-shaped," "rectangular," "rectangular," "polygonal," "ring-shaped," "cubic," "cuboid," "cylindrical," "disc-shaped," and "cone-shaped," are concepts that include "substantially center," "substantially central," "substantially uniform," "substantially equal," "substantially the same," "substantially orthogonal," "substantially parallel," "substantially symmetrical," "substantially extended," "substantially axial," "substantially circular," "substantially cylindrical," "substantially arc-shaped," "substantially rectangular," "substantially rectangular," "substantially polygonal," "substantially ring-shaped," "substantially cubic," "substantially rectangular," "substantially cylindrical," "substantially disc-shaped," and "substantially cone-shaped," etc. For example, states that fall within a predetermined range (e.g., a range of ±10%) based on standards such as "perfectly centered," "perfectly central," "perfectly uniform," "perfectly equal," "perfectly the same," "perfectly orthogonal," "perfectly parallel," "perfectly symmetrical," "perfectly extended," "perfectly axial," "perfectly circular," "perfectly cylindrical," "perfectly arc-shaped," "perfectly rectangular," "perfectly oblong," "perfectly polygonal," "perfectly ring-shaped," "perfectly cubic," "perfectly rectangular," "perfectly cylindrical," "perfectly disk-shaped," and "perfectly cone-shaped" are also included. Therefore, even if the word "approximately" is not added, a concept expressed by adding "approximately" may be included. Conversely, a state expressed by adding "approximately" does not exclude a perfect state.

[0210] In the present disclosure, expressions using "more than," such as "greater than A" and "smaller than A," are expressions that comprehensively include both concepts that include equivalent to A and concepts that do not include equivalent to A. For example, "greater than A" is not limited to cases that do not include equivalent to A, but also includes "greater than or equal to A." Furthermore, "smaller than A" is not limited to "less than A," but also includes "equal to or less than A." When implementing the present technology, specific settings and the like can be appropriately adopted from the concepts included in "greater than A" and "smaller than A" so that the effects described above can be achieved.

[0211] It is also possible to combine at least two of the features of the present technology described above. That is, the various features described in each embodiment may be arbitrarily combined without distinction between the embodiments. Furthermore, the various effects described above are merely examples and are not limiting, and other effects may also be achieved. [Explanation of symbols]

[0212] 1...Plasma raw material 3...Vacuum chamber 6...Plasma generation mechanism 8...Beam source 18...Gas nozzle 20...Rotating body 21...Raw material container 40...Cover structure 43...Immersion area 46...Attachment area 50, 61, 62, 65, 71~73, 76~78...Aperture 52...Incidence area 53…passing area 60...Emission area 82...Gas supply unit 83, 84...Exhaust system 85...Pipe member 86...Connection port 87...Debris 90...Debris trap 100...Light source device 102...Shielding part

Claims

1. A light source device that converts a liquid raw material into plasma by irradiating it with an energy beam to extract radiation, a rotating body that is rotatable about a rotation axis that is in a direction intersecting the direction of gravity and has an adhesion area on which the liquid source is adhered; a shielding body having a space portion that rotatably accommodates the rotating body, a first energy beam passing portion through which the energy beam irradiated onto the attachment region passes, a radiation passing portion through which the radiation generated by the energy beam having passed through the first energy beam passing portion being irradiated onto the liquid raw material adhered to the attachment region passes, and a shielding portion that shields the irradiation position of the energy beam on the attachment region when viewed from the direction of the rotation axis; The light emitting unit has Light source device.

2. The light source device according to claim 1 , the shielding body has a front portion on which the first energy beam passing portion, the radiation passing portion, and the shielding portion are each provided, a back portion facing the front portion, and a side portion; The space is a space surrounded by the front portion, the back portion, and the side portion. Light source device.

3. 3. The light source device according to claim 2, The shield has a second energy beam passing portion provided on the front portion and through which the energy beam reflected by the attachment region passes. Light source device.

4. The light source device according to claim 3, The first energy beam passing portion, the radiation passing portion, and the second energy beam passing portion are each located within a different opening provided in the front portion. Light source device.

5. The light source device according to claim 4, The front surface is provided with three openings, namely, a first opening, a second opening, and a third opening; the first energy beam passing portion is located within the first opening; the radiation passing portion is located within the second opening, The second energy beam passing portion is located within the third opening. Light source device.

6. 3. The light source device according to claim 1 or 2, further comprising: a beam source for irradiating the energy beam; The beam source causes the energy beam to be incident on each of the first energy beam passing portion and the attachment region in a direction oblique to the rotation axis. Light source device.

7. 3. The light source device according to claim 1, The liquid source is tin, lithium, gadolinium, terbium, gallium, bismuth, indium, or an alloy containing at least one of these materials. Light source device.

8. The light source device according to claim 2, further comprising: a chamber capable of maintaining a vacuum atmosphere and in which the shield is disposed; a first exhaust section connected to communicate with the space section of the shielding body and capable of exhausting the space section. Light source device.

9. The light source device according to claim 8, the shield has a connection portion to which the first exhaust portion is connected, The connection portion includes at least one of a connection port provided on the side portion, a connection port provided on the front portion, and a connection port provided on the rear portion. Light source device.

10. 10. The light source device according to claim 8 or 9, further comprising: A gas supply unit is provided to generate a gas flow from the outside of the shield toward the space. Light source device.

11. The light source device according to claim 10, The gas supply unit has a gas supply port located near at least one of the first energy beam passing portion and the radiation passing portion. Light source device.

12. 10. The light source device according to claim 8, The first exhaust unit includes an exhaust device disposed outside the chamber, and a debris trap disposed between the chamber and the exhaust device, which traps debris generated by irradiation of the attachment region with the energy beam. Light source device.

13. 10. The light source device according to claim 8 or 9, further comprising: a second exhaust section that is connected to communicate with the internal space of the chamber and is capable of exhausting the internal space so that the pressure in the space of the shield becomes lower than the pressure outside the shield; Light source device.

14. A light-emitting unit that converts a liquid raw material into plasma by irradiating it with an energy beam and extracts radiation, a rotating body that is rotatable about a rotation axis that is in a direction intersecting the direction of gravity and has an adhesion area on which the liquid source is adhered; a shielding body having a space portion that rotatably accommodates the rotating body, a first energy beam passing portion through which the energy beam irradiated onto the attachment region passes, a radiation passing portion through which the radiation generated by the energy beam having passed through the first energy beam passing portion being irradiated onto the liquid raw material adhered to the attachment region passes, and a shielding portion that shields the irradiation position of the energy beam on the attachment region when viewed from the direction of the rotation axis; A light-emitting unit comprising:

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