Optical semiconductor device, optical transmission device including optical semiconductor device, and method for manufacturing optical transmission device

Abstract

This method for manufacturing an optical transmission device of the present disclosure includes: a step for disposing, on a sub-mount (40), an optical semiconductor device (1) equipped with a semiconductor laser (2) formed on a semiconductor substrate (11), a light modulation element (4) formed on the semiconductor substrate (11), an electrostatic withstand voltage element (5) formed on the semiconductor substrate (11), and a temporary electrode (10) for electrically connecting the light modulation element (4) and the electrostatic withstand voltage element (5) in parallel; a step for electrically connecting the optical semiconductor device (1) and a drive circuit (48); and a step for electrically disconnecting the temporary electrode (10) of the optical semiconductor device (1) that is disposed on the sub-mount (40). Thereby, it is possible to provide an optical transmission device capable of high-speed modulation operation while improving electrostatic breakdown withstand voltage during mounting.

Description

[Technical Field]

[0001] The present disclosure relates to an optical semiconductor device, an optical transmission device including the optical semiconductor device, and a method for manufacturing the optical transmission device. [Background technology]

[0002] An electroabsorbtion modulated laser (EML) is an optical semiconductor device that integrates a semiconductor laser and an optical modulation element, which absorbs part of the incident light when an electric field is applied, on the same semiconductor substrate. Compared to direct modulation methods that directly modulate the light intensity, EMLs have less degradation of the signal waveform and enable high-speed, long-distance optical fiber transmission.

[0003] The expansion of data traffic has led to a demand for faster EML operation. To modulate EMLs at high speeds, the capacitance of the optical modulator must be reduced. However, reducing the capacitance of the optical modulator reduces the electrostatic breakdown voltage of the optical modulator. A decrease in the electrostatic breakdown voltage of the optical modulator also reduces the electrostatic breakdown voltage of the EML, potentially leading to damage to the EML due to static electricity applied by machinery or workers during mounting the EML on a substrate or during testing of its characteristics. For this reason, various measures are taken to eliminate static electricity during EML mounting and testing. For example, to eliminate static electricity from workers, workers wear work clothes made of antistatic materials, or the humidity of the work environment is controlled and the work environment is constantly electrically neutralized using ionizers. However, these measures have their limitations, and semiconductor devices with an electrostatic breakdown voltage of approximately 100 V or less are at high risk of damage during mounting and testing.

[0004] As a technique for preventing a semiconductor device from being destroyed by static electricity, Patent Document 1 (Japanese Patent Laid-Open Publication No. 2004-6548) discloses a technique for improving the electrostatic breakdown voltage of a semiconductor laser by forming a voltage-resistant element. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP2004-6548 Public Relations Summary of the Invention [Problem to be solved by the invention]

[0006] However, when the technology described in Patent Document 1, which is intended for semiconductor lasers, is applied to an optical modulation element of an EML, although the electrostatic breakdown voltage is improved, the capacitance of the optical modulation element increases, which poses a problem that it cannot be used for high-speed modulation. The present disclosure has been made to solve the above-mentioned problems, and aims to provide a method for manufacturing an optical transmission device capable of high-speed modulation operation while improving electrostatic breakdown voltage resistance during implementation, and an optical semiconductor device suitable for such a method. [Means for solving the problem]

[0007] A semiconductor laser formed on a semiconductor substrate, an optical modulation element formed on a semiconductor substrate, It is formed by having an i-type semiconductor layer between a p-type semiconductor layer and an n-type semiconductor layer. A method for manufacturing an optical transmission device, comprising the steps of: arranging, on a submount, an optical semiconductor device including an electrostatic discharge element and a temporary electrode that electrically connects an optical modulation element and the electrostatic discharge element in parallel; electrically connecting the optical semiconductor device to a drive circuit; and electrically disconnecting the temporary electrode of the optical semiconductor device arranged on the submount. [Effects of the Invention]

[0008] According to the present disclosure, it is possible to provide an optical transmission device capable of high-speed modulation operation while improving electrostatic breakdown voltage resistance during mounting, and an optical semiconductor device suitable for such an optical transmission device. [Brief explanation of the drawings]

[0009] [Figure 1]1 is a top view of an optical semiconductor device 1 according to a first embodiment. [Figure 2] 1 is a schematic cross-sectional view taken along line AA of an optical semiconductor device 1 according to a first embodiment. [Figure 3] FIG. 2 is a schematic cross-sectional view taken along the line BB of the optical semiconductor device 1 according to the first embodiment. [Figure 4] FIG. 2 is a schematic cross-sectional view taken along the line CC of the optical semiconductor device 1 according to the first embodiment. [Figure 5] 1 is a top view of the optical semiconductor device 1 according to the first embodiment, with the temporary electrode 10 cut away. [Figure 6] FIG. 2 is a schematic cross-sectional view of the optical semiconductor device 1 according to the first embodiment taken along the line DD, with the temporary electrode 10 cut away. [Figure 7] 3 is an equivalent circuit diagram of the optical semiconductor device 1 according to the first embodiment before static electricity is applied to the optical semiconductor device 1. FIG. [Figure 8] 3 is an equivalent circuit diagram after static electricity is applied to the optical semiconductor device 1 according to the first embodiment. FIG. [Figure 9] The change over time in the voltage applied to the light modulation element 4 when 100V of static electricity is applied. [Figure 10] FIG. 10 is a perspective view of the optical transmission device in a step of mounting an optical semiconductor device on a submount. [Figure 11] FIG. 10 is a perspective view of the optical transmission device in a process of electrically connecting the optical semiconductor device and the driver circuit. [Figure 12] FIG. 10 is a perspective view of the optical transmission device in a step of electrically disconnecting temporary electrodes of the optical semiconductor device mounted on the submount. [Figure 13] FIG. 10 is a cross-sectional view illustrating an optical semiconductor device according to a fourth embodiment. [Figure 14] FIG. 11 is a top view of an optical semiconductor device according to a fifth embodiment. [Figure 15] FIG. 13 is a top view of an optical semiconductor device according to a sixth embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0010] An example of a semiconductor optical integrated device according to the present disclosure will be described below, but the present disclosure is not limited to the following embodiment and can be implemented by modifying it as desired without departing from the gist of the present disclosure. For convenience, repeated explanations may be omitted.

[0011] Embodiment 1 FIG. 1 is a top view of an optical semiconductor device 1 according to a first embodiment. FIG. 2 is a schematic cross-sectional view taken along line A-A of the optical semiconductor device 1 according to the first embodiment. FIG. 3 is a schematic cross-sectional view taken along line B-B of the optical semiconductor device 1 according to the first embodiment, showing a cross section of the semiconductor laser 2. FIG. 4 is a schematic cross-sectional view taken along line C-C of the optical semiconductor device 1 according to the first embodiment, showing cross sections of the optical modulation element 4 and the electrostatic breakdown resistance element 5. FIG. 5 is a top view of the optical semiconductor device 1 according to the first embodiment, with the temporary electrode 10 cut away. FIG. 6 is a schematic cross-sectional view taken along line D-D of the optical semiconductor device 1 according to the first embodiment, with the temporary electrode 10 cut away. FIG. 7 is an equivalent circuit diagram before static electricity is applied to the optical semiconductor device 1 according to the first embodiment, and FIG. 8 is an equivalent circuit diagram after static electricity is applied to the optical semiconductor device 1 according to the first embodiment.

[0012] First, as shown in FIGS. 1 and 2, an optical semiconductor device 1 according to a first embodiment includes a semiconductor laser 2, a separator 3, an optical modulation element 4, and an electrostatic discharge (ESD) element 5. An anode electrode 6 is formed on the surface of the semiconductor laser 2, an anode electrode 7 is formed on the surface of the optical modulation element 4, and an anode electrode 9 is formed on the surface of the electrostatic discharge (ESD) element 5. A bonding pad electrode 8 is connected to the anode electrode 7 on the optical modulation element 4. The anode electrode 7 on the optical modulation element 4 is also connected to the anode electrode 9 on the electrostatic discharge (ESD) element 5 via a temporary electrode 10. The semiconductor laser 2 includes a distributed feedback laser. The optical modulation element 4 includes an electro-absorption semiconductor modulator, which absorbs and modulates the laser light emitted from the semiconductor laser 2 when an electrical signal is input to the anode electrode 7 via the bonding pad electrode 8. The wavelength band of light may be any wavelength band used in optical communications. For example, wavelength bands of light used in optical fiber communications are generally divided into short wavelength bands and long wavelength bands, with the 1.3 μm band and the 1.55 μm band being used as examples of long wavelength bands. The separator 3 separates the p-type contact layer 18a connected to the anode electrode 6 of the semiconductor laser 2 from the p-type contact layer 18b connected to the anode electrode 7 of the optical modulator 4, electrically isolating the semiconductor laser 2 from the optical modulator 4. The mesa stripe 16 is continuously formed on the semiconductor laser 2, separator 3, and optical modulator 4, and is a waveguide for propagating the laser light emitted from the semiconductor laser 2. In each figure, the z direction is the direction of the optical axis (propagation direction) of the laser light emitted by the semiconductor laser 2, the x direction is the direction perpendicular to the z direction and the y direction in which each semiconductor layer included in the optical semiconductor device 1 extends, and the y direction is the direction perpendicular to the z direction and the x direction. This is the direction in which the semiconductor layers included in the optical semiconductor device 1 are stacked.

[0013] 3, the semiconductor laser 2 is formed of a semiconductor layered structure, including a semiconductor substrate 11, which is an n-type InP substrate, an n-type guide layer 12, an i-type active layer 13, a diffraction grating 14, a p-type guide layer 15, a p-type InP cladding layer 17, a p-type InGaAs contact layer 18a, a buried layer 27, an insulating film 21, an anode electrode 6, and a cathode electrode 26 formed on the back surface of the semiconductor substrate 11. As an example, the guide layer 12, the active layer 13, the diffraction grating 14, and the guide layer 15 are made of III-V alloy semiconductors such as InAlGaAs and InGaAsP, the active layer 13 has a multiple quantum well (MQW) structure, and the buried layer 27 is made of Fe-doped semi-insulating InP. Note that applicable semiconductors are not limited to the above-mentioned III-V alloy semiconductors, and other semiconductor materials may also be used. The surface of the contact layer 18a is covered with an insulating film 21 except for the portion where the anode electrode 6 is to be formed, and the anode electrode 6 is connected to the contact layer 18a through the portion where the insulating film 21 is not formed. The anode electrode 6 is composed of a first electrode layer 22 in contact with the contact layer 18a, which is a semiconductor layer, and a second electrode layer 23 formed on the first electrode layer 22. The first electrode layer 22 not only improves adhesion to the contact layer 18a but also serves as a barrier metal that prevents the metal of the second electrode layer 23 from diffusing into the contact layer 18a. As an example of the first electrode layer 22 and the second electrode layer 23, an electrode structure is used in which the first electrode layer 22 is made of Ti / Pt / Au, starting from the layer in contact with the contact layer 18a, and the second electrode layer 23 is made of Au. The cathode electrode 26 is composed of a first electrode layer 24 and a second electrode layer 25. The first electrode layer 24 not only improves adhesion to the semiconductor substrate 11 but also serves as a barrier metal that prevents the metal of the second electrode layer 25 from diffusing into the semiconductor substrate 11. As an example of the first electrode layer 24 and the second electrode layer 25, the first electrode layer 24 has an electrode structure of AuGe / Ni / Ti / Pt / Au in that order from the layer in contact with the semiconductor substrate 11, and the second electrode layer 25 has an electrode structure of Au. Note that the electrode structures of the first electrode layer 22, the second electrode layer 23, the first electrode layer 24, and the second electrode layer 25 are not limited to the above-mentioned combinations, and any combination can be applied.

[0014] 4, the optical modulation element 4 is formed of a semiconductor laminated structure, and includes a semiconductor substrate 11, a guide layer 12, an i-type light absorption layer 20, a guide layer 15, a cladding layer 17, a buried layer 27, a p-type InGaAs contact layer 18b, an insulating film 21, an anode electrode 7, and a cathode electrode 26. As an example, the light absorption layer 20 is made of an I-type material such as InAlGaAs or InGaAsP. An MQW structure made of II-V group alloy semiconductors is used. Note that applicable semiconductors are not limited to the above-mentioned III-V group alloy semiconductors; other semiconductor materials can also be used. The surface of the contact layer 18b is covered with an insulating film 21, except for the portion where the anode electrode 7 is formed. The anode electrode 7 is connected to the contact layer 18b through the portion where the insulating film 21 is not formed. The anode electrode 7 is composed of a first electrode layer 22 in contact with the semiconductor contact layer 18b and a second electrode layer 23 formed on the first electrode layer 22. Generally, the optical modulation element 4 has a narrow width to confine light within the mesa stripe 16, and therefore the anode electrode 7 formed directly above it is also narrow. For this reason, a wide-area bonding pad electrode 8 is connected to the anode electrode 7, and a modulation signal is input to the optical modulation element 4 via the bonding pad electrode 8.

[0015] Next, as shown in FIG. 4, the electrostatic discharge protection element 5 is formed of a semiconductor layered structure and includes a semiconductor substrate 11, a guide layer 12, a light absorption layer 20, a guide layer 15, a cladding layer 17, a contact layer 18b, an insulating film 21, an anode electrode 9, and a cathode electrode 26. The surface of the contact layer 18b is covered with an insulating film 21 except for the portion where the anode electrode 9 is to be formed, and the anode electrode 9 is connected to the contact layer 18b through the portion where the insulating film 21 is not formed. The anode electrode 9 is composed of a first electrode layer 22 in contact with the contact layer 18b, which is a semiconductor layer, and a second electrode layer 23 formed on the first electrode layer 22. The anode electrode 9 is connected to the anode electrode 7 on the optical modulator 4 via a temporary electrode 10. The electrostatic discharge protection element 5 has at least a portion of the same layer structure as the optical modulator 4, and can be formed using the same manufacturing process. Here, "having the same layer structure" means that the thickness and composition of the two layer structures are the same. In the case where the two layer structures are multilayer structures, this means that the thickness and composition of each layer constituting the multilayer structure are the same. Furthermore, the electrostatic discharge protection element 5 can have any planar shape as long as it is electrically connected to the light modulation element 4. While FIG. 1 shows an example in which the planar shape of the anode electrode 9 of the electrostatic discharge protection element 5 is rectangular, it is not limited to this and may be, for example, elliptical. Furthermore, since the electrostatic capacitance of the electrostatic discharge protection element 5 is greater, the effect of improving the electrostatic breakdown voltage is greater. Therefore, the effect of improving the electrostatic breakdown voltage is greater as the planar shape, i.e., the area of ​​the anode electrode 9, is larger.

[0016] Next, a description will be given of the operation of the optical semiconductor device 1 according to the embodiment 1. Note that the method of driving the optical semiconductor device 1 shown below is an example, and various modifications are possible within the scope of the present disclosure. First, in the semiconductor laser 2, applying a voltage between the anode electrode 6 and the cathode electrode 26 causes electron-hole recombination, resulting in light emission. The generated light is reflected by the diffraction grating 14 and travels back and forth within the semiconductor laser 2. During this travel, stimulated emission occurs, amplifying the light intensity. When a certain threshold is reached, laser oscillation occurs, and the semiconductor laser 2 emits laser light toward the optical modulator 4. In the optical modulator 4, applying a negative voltage from the anode electrode 7 to the cathode electrode 26 via the bonding pad electrode 8 causes light absorption due to the quantum confined Stark effect of the optical absorption layer 20. In other words, the intensity of the laser light emitted from the optical modulator 4 is modulated in response to the voltage applied to the optical modulator 4. The modulated laser light is emitted externally from the optical semiconductor device 1 and used as a signal light in optical communications. Furthermore, because the upper limit of modulation speed is primarily inversely proportional to the capacitance of the optical modulator 4, the capacitance of the optical modulator 4 is extremely small for high-speed modulation applications. Now, let us assume that a voltage caused by static electricity is applied to the light modulation element 4. The application of the voltage caused by static electricity causes a current to flow through the light modulation element 4, but because the electrostatic breakdown resistance element 5 is connected in parallel to the light modulation element 4, part of the current is distributed to the electrostatic breakdown resistance element 5. As part of the current flows through the electrostatic breakdown resistance element 5, the voltage applied to the light modulation element 4 decreases, and the electrostatic breakdown resistance of the light modulation element 4 improves.

[0017] Next, equivalent circuit diagrams using a human body model (HBM) for the case where static electricity is applied to the optical semiconductor device from the human body are shown in FIGS. 7 and 8. This equivalent circuit is composed of a voltage source 28, a protective resistor 30, a discharge capacitance 29, a discharge resistor 32, a switch 31, a capacitance 33 of the optical modulation element 4, and a capacitance 34 of the electrostatic discharge protection element 5. First, the state before static electricity is applied to the optical semiconductor device, that is, the state where a charge is charged to the human body as static electricity, is shown as charge being charged to the discharge capacitance 29 via the voltage source 28, as shown in FIG. 7. Then, the state where static electricity is applied to the optical semiconductor is shown as switch 31 switching from the protective resistor 30 side to the discharge resistor 32 side, as shown in FIG. 8. When switch 31 is switched, the charge stored in the discharge capacitance 29 flows to the optical modulation element 4 and the electrostatic discharge protection element 5. At this time, the voltage 35 applied to the light modulation element 4 is determined by the ratio of the combined capacitance of the electrostatic capacitance 33 and the electrostatic capacitance 34 to the discharge capacitance 29, and the larger the combined capacitance, the lower the voltage 35 applied to the light modulation element 4. Here, when static electricity of 100 V is applied, the time of voltage applied to the light modulation element 4 is An example of the change is shown in FIG. 9. In FIG. 9, the dotted line indicates the case where there is no electrostatic breakdown element 5, and the solid line indicates the case where the electrostatic breakdown element 5 is connected in parallel to the optical modulation element 4. In the HBM, the discharge capacitance 29 is 100 pF and the discharge resistance 32 is 1.5 kΩ. For example, in the case of an optical semiconductor device with a modulation speed of 100 Gbps, the electrostatic capacitance 33 of the optical modulation element 4 is extremely small, about 0.1 pF. Therefore, if there is no electrostatic breakdown element 5, the voltage 35 applied to the optical modulation element 4 will be 100 V. If the electrostatic breakdown voltage of the optical modulation element 4 is 80 V, the optical modulation element 4 will be destroyed by static electricity. On the other hand, if an electrostatic breakdown element 5 of 50 pF is connected in parallel to the optical modulation element 4, the combined capacitance will be 50.1 pF, and the voltage 35 applied to the optical modulation element 4 will be reduced to about 67 V. If the electrostatic breakdown voltage of the optical modulation element 4 is 80 V, connecting the electrostatic breakdown element 5 in parallel will reduce the combined capacitance. This can prevent the light modulation element 4 from being damaged by static electricity.

[0018] The optical semiconductor device 1 according to the first embodiment is characterized by the ability to disconnect the electrostatic discharge element 5, which is used to increase electrostatic breakdown voltage, from the optical modulation element 4. The electrostatic discharge element is useful for preventing damage to semiconductor elements in the optical semiconductor device due to static electricity applied by a machine or an operator while the optical semiconductor device is being mounted on a substrate or during testing of its characteristics. However, the electrostatic discharge element becomes unnecessary after the optical semiconductor device is mounted in an optical transmission device such as a transceiver that has a built-in electrostatic protection circuit. In fact, in a semiconductor device that performs high-speed modulation, it is necessary to reduce the capacitance of components related to high-speed operation, including the modulation element, and it is undesirable for the electrostatic discharge element to add capacitance to the modulation element. In other words, when an optical semiconductor device requiring increased electrostatic breakdown voltage is mounted or tested, the electrostatic discharge element is electrically connected, and is electrically disconnected after the optical semiconductor device is mounted in an optical transmission device such as a transceiver. The first embodiment is an optical semiconductor device that satisfies this objective. FIG. 5 is a top view of the optical semiconductor device 1 according to the first embodiment shown in FIG. 1 , in which the electrical connection between the optical modulation element 4 and the electrostatic discharge element 5 is cut off. FIG. 6 is a schematic cross-sectional view of the optical modulation element 4 and the electrostatic discharge element 5 taken along the dashed line DD in FIG. 5 . In FIG. 1 , the optical modulation element 4 and the electrostatic discharge element 5 are electrically connected via the temporary electrode 10. Therefore, to cut off the electrical connection between them, the temporary electrode 10 is simply removed. The optical semiconductor device 1 according to the first embodiment is characterized in that the optical modulation element 4 and the electrostatic discharge element 5 are electrically connected via the temporary electrode 10, which makes it easier to cut off the electrical connection between them compared to, for example, when both are formed by a single electrode. Methods for cutting the electrical connection include, for example, cutting the temporary electrode 10 by scratching or laser trimming. However, the present invention is not limited to these exemplary methods, and any other method, such as dissolving the temporary electrode 10 using a heat treatment or a chemical treatment, can also be applied. After mounting the optical semiconductor device 1 on an optical transmission device such as a transceiver, the temporary electrode 10 is cut off to form the structure shown in Figures 5 and 6, thereby eliminating the effect of the capacitance of the electrostatic breakdown voltage-resistant element 5 on the optical modulation element 4 and enabling the optical semiconductor device 1 to operate as a semiconductor device performing high-speed modulation.

[0019] Next, the effects of the first embodiment will be explained in comparison with the prior art. Patent Document 1 has a structure in which the electrical connection between the semiconductor laser and the electrostatic breakdown element cannot be severed. If an electrostatic breakdown element is also provided for the optical modulation element, the electrostatic capacitance of the electrostatic breakdown element is added to the optical modulation element. As a result, the optical modulation element cannot operate at high speed due to the increased capacitance, making it unusable for high-speed modulation applications. On the other hand, the technology disclosed herein improves the electrostatic breakdown resistance of the optical modulation element without complicating the manufacturing process or requiring additional components, and further allows the electrical connection between the electrostatic breakdown element and the optical modulation element to be subsequently severed. Therefore, the technology can also be applied to optical semiconductor devices that perform high-speed modulation.

[0020] Next, a brief description will be given of a method for manufacturing the optical semiconductor device 1. An n-type guide layer 12 is crystal-grown on the surface of a semiconductor substrate 11 by MOCVD (Metal Organic Chemical Vapor Deposition). An active layer 13, a light absorption layer 20, and a semiconductor laser 2 are formed on the surface of the guide layer 12 by crystal growth by MOCVD and dry etching using an SiO2 mask in the regions of the semiconductor laser 2, the separation section 3, and the optical modulation element 4. A diffraction grating 14 and a p-type guide layer 15 are formed. An SiO2 mask having the same shape as the surface of the mesa stripe 16 is formed on the surface of the guide layer 15, and the mesa stripe 16 is formed by dry etching using this SiO2 mask. Thereafter, buried layer 27 is grown by crystal growth on the exposed portions on both sides of the mesa stripe 16. The SiO2 mask is removed, and p-type cladding layer 17, contact layer 18a, and contact layer 18b are grown by crystal growth in this order on the surfaces of buried layer 27 and mesa stripe 16. The contact layer 18b on the isolation portion 3 is then removed by wet etching using a photoresist mask.

[0021] Next, an insulating film 21 made of SiN, SiO2, or the like is formed on the surfaces of the semiconductor laser 2, the separator 3, and the optical modulator 4 by plasma CVD or the like. In the areas where electrodes are to be formed, openings are formed in the insulating film 21 by combining photolithography and etching using hydrofluoric acid or the like. Thereafter, a first electrode layer 22 having a Ti / Pt / Au structure and a second electrode layer 23 including an Au layer are formed, starting from the semiconductor layer side. The formation method involves electron beam evaporation, plating, or the like, and lifting off unnecessary portions together with a photoresist film, thereby forming anode electrodes 6, 7, and 9 each including the first electrode layer 22 and the second electrode layer 23 in the openings of the insulating film 21. At this time, a bonding pad electrode 8 connected to the anode electrode 7 and a temporary electrode 10 connecting the anode electrode 7 and the anode electrode 9 are simultaneously formed. The underside of the semiconductor substrate 11 is then polished, and a cathode electrode 26 is formed on the underside of the semiconductor substrate 11. Cathode electrode 26 is composed of first electrode layer 24 having an AuGe / Ni / Ti / Pt / Au structure and second electrode layer 25 including an Au layer. Note that the electrode structures of first electrode layer 22, second electrode layer 23, first electrode layer 24, and second electrode layer 25 shown here are merely examples and are not intended to limit the electrode structures; any electrode structure can be applied as long as it does not deviate from the contents of this disclosure. By the above steps, optical semiconductor device 1 according to embodiment 1 can be manufactured.

[0022] The materials described in the first embodiment are merely examples and are not limiting. While the active layer 13 and the light absorption layer 20 have an MQW structure, the quantum well layer may be a single layer, or may not be a quantum well. While FIG. 2 illustrates an example in which the separation unit 3 and the optical modulation element 4 are formed using the same semiconductor stack, they may be formed using semiconductors with different compositions. While FIG. 2 illustrates an example in which the diffraction grating 14 is formed on the active layer 13, it may also be formed below the active layer 13. While the cladding layer 17, contact layer 18a, and contact layer 18b are formed in common in the regions of the semiconductor laser 2, separation unit 3, and optical modulation element 4, they may also be formed individually in separate processes. While FIG. 4 illustrates an example in which the electrostatic breakdown protection element 5 has the same layer structure as the optical modulation element 4, it may also have the same layer structure as the semiconductor laser 2. While FIG. 1 illustrates an example in which the mesa stripes 16 of the semiconductor laser 2, separation unit 3, and optical modulation element 4 are the same width, the widths of the respective mesa stripes need not be the same. 3 and 4, the semiconductor laser 2 and the optical modulation element 4 have a buried structure, but they may have another structure such as a ridge structure. Also, instead of connecting the anode electrode 7 of the optical modulation element 4 and the anode electrode 9 of the electrostatic breakdown protection element 5 with the temporary electrode 10, the anode electrode 7 and the anode electrode 9 may be connected by wire bonding.

[0023] Next, a method for manufacturing an optical transmission device to which the optical semiconductor device 1 is applied will be described. A manufacturing method for an optical transmission device using optical semiconductor device 1 includes the steps of mounting the optical semiconductor device on a submount, electrically connecting the optical semiconductor device to a driver circuit, and electrically disconnecting the temporary electrodes of the optical semiconductor device mounted on the submount, and the optical transmission device in each manufacturing step is shown in Figures 10, 11, and 12. Figure 10 is a perspective view of the optical transmission device in the step of mounting the optical semiconductor device on a submount, Figure 11 is a perspective view of the optical transmission device in the step of electrically connecting the optical semiconductor device to a driver circuit, and Figure 12 is a perspective view of the optical transmission device in the step of electrically disconnecting the temporary electrodes of the optical semiconductor device mounted on the submount.

[0024] First, in the process of mounting an optical semiconductor device on a submount, as shown in FIG. 10 , the optical semiconductor device 1 is mounted on a submount 40 of an optical transmission device 49. Mounting to the submount 40 can be achieved, for example, by die-bonding using solder. The submount 40 has signal lines 42 and 43 for transmitting electrical signals and is die-bonded to a substrate 41. Typically, the substrate 41 functions as a heat sink for dissipating heat generated by the optical semiconductor device 1 to the outside or as a thermoelectric controller for regulating the temperature of the optical semiconductor device 1. The substrate 41 also includes a drive circuit 48 for inputting and outputting electrical signals to and from the optical semiconductor device 1. The drive circuit 48 includes not only the optical semiconductor device 1 but also an electrical circuit for controlling the thermoelectric controller of the substrate 41 and a circuit for preventing electrostatic discharge (ESD) to the optical semiconductor device 1. Additionally, a photodiode element for monitoring the optical output of the optical semiconductor device 1 is mounted on the submount 40 or the substrate 41, but illustration and description thereof are omitted.

[0025] Next, in the process of electrically connecting the optical semiconductor device and the drive circuit, as shown in FIG. 11 , wire wiring is performed to input and output electrical signals between the drive circuit 48 and the optical semiconductor device 1. First, wire bonding is performed from the bonding pad electrode 8 connected to the optical modulation element 4 of the optical semiconductor device 1 to the signal line 42 on the submount 40. Next, wire bonding is performed from the anode electrode 6 of the semiconductor laser 2 of the optical semiconductor device 1 to the signal line 43 on the submount 40. Next, wire bonding is performed from the signal lines 42 and 43 to the drive circuit 48. Note that, for example, Au wires are used as the wires for the wire wiring, but this is not limited to this. Furthermore, the order in which wire bonding is performed is not limited to the order described above.

[0026] Next, in the process of electrically disconnecting the temporary electrodes of the optical semiconductor device mounted on the submount, as shown in FIG. 12 , the temporary electrodes 10 are cut to electrically disconnect the optical modulation element 4 and the electrostatic discharge element 5. By connecting the wires 44 and 46, the optical modulation element 4 is connected to the ESD protection circuit of the drive circuit 48, eliminating the need for the electrostatic discharge element 5. The temporary electrodes 10 can be cut, for example, by scratching them with a probe needle to peel them off and thereby disconnecting the electrical connection between the optical modulation element 4 and the electrostatic discharge element 5. The method for cutting the temporary electrodes 10 is not limited to scratching; any cutting method appropriate for the material and shape of the temporary electrodes 10 can be used. For example, laser trimming can also be used. By cutting the temporary electrodes 10, the capacitance of the electrostatic discharge element 5 is electrically disconnected from the optical modulation element 4. Therefore, an optical transmission device 49 capable of high-speed modulation operation is provided.

[0027] By applying the manufacturing method for an optical transmission device configured in this manner, the temporary electrodes of the optical semiconductor device can be cut after the optical semiconductor device is mounted on the optical transmission device, making it possible to provide an optical transmission device capable of high-speed modulation operation while applying an optical semiconductor device with an optical modulation element having a high electrostatic breakdown voltage resistance.

[0028] As described above, the optical semiconductor device of the first embodiment is an optical semiconductor device that includes a semiconductor laser formed on a semiconductor substrate, an optical modulation element formed on the semiconductor substrate, an electrostatic breakdown element formed on the semiconductor substrate, and a temporary electrode that electrically connects the optical modulation element and the electrostatic breakdown element in parallel, and in which the capacitance of the electrostatic breakdown element is separated from the optical modulation element by electrically disconnecting the temporary electrode. The optical semiconductor device configured in this manner can increase the electrostatic breakdown voltage of the optical modulation element. Furthermore, since the temporary electrodes can be cut after mounting on an optical transmission device, the capacitance of the electrostatic breakdown voltage-resistant element can be separated from the capacitance of the optical modulation element, allowing the optical semiconductor device and the optical transmission device equipped with it to operate for high-speed modulation.

[0029] Therefore, by applying the optical semiconductor device shown in embodiment 1, it is possible to provide an optical transmission device capable of high-speed modulation operation while improving the electrostatic breakdown voltage during implementation, and an optical semiconductor device suitable for such an optical transmission device.

[0030] Embodiment 2 The optical semiconductor device of the second embodiment differs from the first embodiment in that the first electrode layer of the temporary electrode 10 does not contain Ti. It is known from electrode technology applied to semiconductor devices that the inclusion of Ti in the lower layer of the electrode improves the adhesion between the electrode and the object on which the electrode is formed. In other words, the absence of Ti in the first electrode layer, which is the lower layer of the temporary electrode 10, weakens the adhesion between the temporary electrode 10 and the insulating film 21 compared to when Ti is included, and the temporary electrode 10 can be cut more easily.

[0031] By applying an optical semiconductor device configured in this manner, it is possible to increase the electrostatic breakdown voltage resistance of the optical modulation element 4. Furthermore, since the temporary electrodes 10 can be cut more easily after mounting on an optical transmission device, the capacitance of the electrostatic breakdown resistance element 5 can be separated from the capacitance of the optical modulation element 4, allowing it to be operated for high-speed modulation.

[0032] Therefore, by applying the optical semiconductor device shown in embodiment 2, it is possible to improve the electrostatic breakdown voltage resistance during mounting while more easily separating the capacitance of the electrostatic breakdown-resistant element from the capacitance of the optical modulation element, thereby providing an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for such a device.

[0033] Embodiment 3 The optical semiconductor device of Embodiment 3 differs from Embodiment 1 in that the first electrode layer of the anode electrode 9 of the electrostatic discharge element 5 does not contain Ti. The absence of Ti in the first electrode layer underlying the anode electrode 9 weakens the adhesion between the anode electrode 9 and the contact layer 18b compared to when Ti is contained, making it easier to peel off the anode electrode 9. For example, the anode electrode 9 of the electrostatic discharge element 5 can be torn off by pinching the end of the anode electrode 9 with tweezers and lifting it from the semiconductor surface. In particular, since the anode electrode 9 of the electrostatic discharge element 5 is expected to be formed over as large an area as possible, this improves workability compared to directly cutting the temporary electrode 10 as in Embodiment 1. Furthermore, removing the anode electrode 9 essentially corresponds to cutting the temporary electrode 10, and therefore provides the same effect as directly cutting the temporary electrode 10. As in the second embodiment, the first electrode layer of the temporary electrode 10 does not contain Ti, and the first electrode layer of the anode electrode 9 does not contain Ti, so that the anode electrode 9 can be peeled off together with the temporary electrode 10, and the effect of separating the capacitance of the electrostatic breakdown resistance element 5 from the capacitance of the optical modulation element 4 can be obtained more easily and efficiently.

[0034] By applying the optical semiconductor device configured in this manner, it is possible to increase the electrostatic breakdown voltage resistance of the optical modulation element 4. Furthermore, after mounting on the optical transmission device, the temporary electrodes 10 can be cut off more easily and efficiently, so that the capacitance of the electrostatic breakdown resistance element 5 can be separated from the capacitance of the optical modulation element 4, allowing it to be operated for high-speed modulation.

[0035] Therefore, by applying the optical semiconductor device shown in embodiment 3, it is possible to improve the electrostatic breakdown voltage resistance during mounting, while more easily and efficiently separating the capacitance of the electrostatic breakdown-resistant element from the capacitance of the optical modulation element, thereby providing an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for such a device.

[0036] Embodiment 4 FIG. 13 is a schematic cross-sectional view of an optical semiconductor device according to the fourth embodiment. The optical semiconductor device of the fourth embodiment differs from the first embodiment in that the temporary electrode 10 is made of a metal film 19 having a melting point lower than that of the metal film constituting the anode electrode 7 of the optical modulator 4. Other basic effects are the same as those of the first embodiment, but the electrical connection between the optical modulator 4 and the electrostatic discharge protection element 5 can be more easily severed compared to the first embodiment. Specifically, a current is passed from the bonding pad electrode 8 of the optical modulator 4 to the anode electrode 9 of the electrostatic discharge protection element 5, or in the opposite direction, and the generated Joule heat melts the temporary electrode 10, which has a low melting point, thereby severing the electrical connection between the optical modulator 4 and the electrostatic discharge protection element 5. The metal film 19 constituting the temporary electrode 10 can be made of, for example, AuSn solder, Sn-Ag solder, Sn-Cu solder, or the like, and can be selected arbitrarily based on the relative melting points of the other electrodes. Furthermore, the current value at which the temporary electrode 10 melts can be adjusted by adjusting the cross-sectional area, length, and other factors of the metal film 19, as well as the material.

[0037] By applying an optical semiconductor device configured in this manner, it is possible to increase the electrostatic breakdown voltage resistance of the optical modulation element 4. Furthermore, after mounting on an optical transmission device, the temporary electrodes 10 can be easily cut off by heat, so that the capacitance of the electrostatic breakdown resistance element 5 can be separated from the capacitance of the optical modulation element 4, allowing it to be operated for high-speed modulation.

[0038] Therefore, by applying the optical semiconductor device shown in embodiment 4, it is possible to improve the electrostatic breakdown voltage resistance during mounting, while easily separating the capacitance of the electrostatic breakdown-resistant element from the capacitance of the optical modulation element by heat, thereby providing an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for this.

[0039] Embodiment 5. FIG. 14 is a top view of an optical semiconductor device according to the fifth embodiment. An optical semiconductor device 36 shown in embodiment 5 differs from embodiment 1 in that a temporary electrode 37 connects the anode electrode 7 of the optical modulation element 4 and the anode electrode 6 of the semiconductor laser 2. By connecting the anode electrode 7 of the optical modulation element 4 and the anode electrode 6 of the semiconductor laser 2, the semiconductor laser 2 can function as an electrostatic discharge (ESD) element in the optical semiconductor device 36, without the need to form a separate ESD element. This is particularly effective when a characteristic test of the optical semiconductor device is not performed before mounting the optical semiconductor device in an optical transmission device such as a transceiver, and since there is no need to form an anode electrode of the ESD element compared to embodiments 1, 2, 3, and 4, the material cost for the electrode can be reduced.

[0040] By applying the optical semiconductor device configured in this manner, it is possible to increase the electrostatic breakdown voltage resistance of the optical modulation element 4 without forming a separate electrostatic breakdown element. Furthermore, since the temporary electrode 37 can be cut after mounting on the optical transmission device, the capacitance of the semiconductor laser 2 can be separated from the capacitance of the optical modulation element 4, allowing it to be operated for high-speed modulation.

[0041] Therefore, by applying the optical semiconductor device shown in the fifth embodiment, it is possible to provide an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for the same, while improving the electrostatic breakdown voltage resistance during mounting without forming an electrostatic breakdown voltage resistance element separately.

[0042] Embodiment 6 FIG. 15 is a top view of an optical semiconductor device according to the sixth embodiment. An optical semiconductor device 38 shown in the sixth embodiment differs from the first embodiment in that the anode electrode 9 of the electrostatic discharge protection element 5 and the anode electrode 6 of the semiconductor laser 2 are connected by a temporary electrode 39. The connection of the anode electrode 9 of the electrostatic discharge protection element 5 and the anode electrode 6 of the semiconductor laser 2 by the temporary electrode 39 means, in other words, that both the semiconductor laser 2 and the electrostatic discharge protection element 5, which is separate from the semiconductor laser 2, function as an electrostatic discharge protection element. In other words, by connecting the anode electrode 9 of the electrostatic discharge protection element 5 and the anode electrode 6 of the semiconductor laser 2 by the temporary electrode 39, the capacitance of the electrostatic discharge protection element 5 and the capacitance of the semiconductor laser 2 are connected to the optical modulation element 4, thereby making it possible to further improve the electrostatic discharge protection voltage compared to the case where only one of the elements is connected.

[0043] By applying the optical semiconductor device configured in this manner, it is possible to further increase the electrostatic breakdown voltage of the optical modulation element 4 compared to embodiment 1. Furthermore, since the temporary electrodes 10 can be cut after mounting on the optical transmission device, the capacitance of the electrostatic breakdown-resistant element 5 and the semiconductor laser 2 can be separated from the capacitance of the optical modulation element 4, and it can be operated for high-speed modulation.

[0044] Therefore, by applying the optical semiconductor device shown in embodiment 6, it is possible to provide an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for this, while further improving the electrostatic breakdown voltage during implementation.

[0045] A variation of the sixth embodiment. In the sixth embodiment, an example has been shown in which the temporary electrode 39 connects the anode electrode 9 of the electrostatic discharge protection element 5 to the anode electrode 6 of the semiconductor laser 2. However, as a modified example, the temporary electrode 39 may connect the anode electrode 6 of the semiconductor laser 2 to the anode electrode 7 of the optical modulation element 4 or the bonding pad electrode 8. In other words, the temporary electrode 39 may connect the anode electrode 7 or the bonding pad electrode 8 of the optical modulation element 4 to the anode electrode 6 of the semiconductor laser 2 without going through the anode electrode 9 of the electrostatic discharge protection element 5. In this case, as in the sixth embodiment, both the semiconductor laser 2 and the electrostatic discharge protection element 5 separate from the semiconductor laser 2 function as electrostatic discharge protection elements, and even if either the electrostatic discharge protection element 5 or the semiconductor laser 2 fails to function as an electrostatic discharge protection element, the other one can still function as an electrostatic discharge protection element, thereby improving the manufacturing yield.

[0046] By applying the optical semiconductor device configured in this manner, it is possible to improve the yield and increase the electrostatic breakdown voltage resistance of the optical modulation element 4. Furthermore, since the temporary electrodes 10 and 39 can be cut after mounting on the optical transmission device, the capacitance of the electrostatic breakdown resistance element 5 and the semiconductor laser 2 can be separated from the capacitance of the optical modulation element 4, allowing it to be operated for high-speed modulation.

[0047] Therefore, by applying the optical semiconductor device shown in the modified example of the sixth embodiment, it is possible to improve the yield while improving the electrostatic breakdown voltage during mounting, and to provide an optical transmission device capable of high-speed modulation operation and an optical semiconductor device suitable for this.

[0048] In addition, in the present disclosure, it is possible to freely combine the respective embodiments, and to appropriately modify or omit the respective embodiments within a range that does not cause contradictions. [Explanation of symbols]

[0049] 1 Optical semiconductor device 2. Semiconductor laser 3 Separation part 4. Light modulation element 5. Electrostatic discharge protection element 6 anode electrode 7 Anode electrode 8 Bonding pad electrode 9 Anode electrode 10 Temporary electrode 11 Semiconductor substrate 12 Guide Layer 13 Active layer 14 Diffraction Grating 15 Guide Layer 16 Mesa Stripe 17 Cladding layer 18a Contact layer 18b Contact layer 19 Metal Film 20 Light absorption layer 21 insulating film 22 First electrode layer 23 Second electrode layer 24 First electrode layer 25 Second electrode layer 26 cathode electrode 27 Buried Layer 28 Voltage Source 29 Discharge capacity 30 Protection resistor 31 Switch 32 Discharge resistor 33 Capacitance 34 Capacitance 35 Voltage 36 Optical semiconductor devices 37 Temporary electrode 38 Optical semiconductor devices 39 Temporary Electrode 40 Submount 41 PCB 42 Signal Line 43 Signal Line 44 wires 45 wire 46 wires 47 Wire 48 Drive Circuit 49 Optical Transmission Equipment

Claims

1. a step of disposing, on a submount, an optical semiconductor device including: a semiconductor laser formed on a semiconductor substrate; an optical modulation element formed on the semiconductor substrate; an electrostatic breakdown protection element formed by having an i-type semiconductor layer between a p-type semiconductor layer and an n-type semiconductor layer formed on the semiconductor substrate; and a temporary electrode electrically connecting the optical modulation element and the electrostatic breakdown protection element in parallel; electrically connecting the optical semiconductor device to a driving circuit; a step of electrically disconnecting the temporary electrodes of the optical semiconductor device disposed on the submount; A method for manufacturing an optical transmission device comprising:

2. a semiconductor laser formed on a semiconductor substrate; an optical modulation element formed on the semiconductor substrate; an electrostatic breakdown protection element formed by having an i-type semiconductor layer between a p-type semiconductor layer and an n-type semiconductor layer formed on the semiconductor substrate; a temporary electrode electrically connecting the optical modulation element and the electrostatic breakdown resistance element in parallel; Equipped with the temporary electrode is electrically disconnected, thereby disconnecting the capacitance of the electrostatic breakdown protection element from the light modulation element; An optical semiconductor device characterized by:

3. the first electrode layer of the temporary electrode is made of a metal that does not contain Ti; 3. The optical semiconductor device according to claim 2, wherein

4. the first electrode layer of the anode electrode of the electrostatic breakdown protection element is made of a metal that does not contain Ti; 4. The optical semiconductor device according to claim 2, wherein:

5. the temporary electrode is made of a metal having a melting point lower than that of a metal constituting the anode electrode of the light modulation element; 5. The optical semiconductor device according to claim 2, wherein:

6. the electrostatic breakdown voltage protection element is the semiconductor laser; 6. The optical semiconductor device according to claim 2, wherein:

7. the electrostatic breakdown protection element includes the semiconductor laser and another electrostatic breakdown protection element separate from the semiconductor laser; 7. The optical semiconductor device according to claim 2, wherein:

8. an anode electrode of the semiconductor laser is connected to an anode electrode of the optical modulation element via an anode electrode of an electrostatic breakdown protection element separate from the semiconductor laser; 8. The optical semiconductor device according to claim 7,

9. an anode electrode of the semiconductor laser is connected to an anode electrode of the optical modulation element without passing through an anode electrode of an electrostatic breakdown protection element separate from the semiconductor laser; 8. The optical semiconductor device according to claim 7,

10. An optical semiconductor device according to any one of claims 2 to 9; a driving circuit electrically connected to the optical semiconductor device; An optical transmission device comprising:

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