Method and system for determining exposure time and / or intensity used to obtain desired features of a relief structure

Abstract

1. A method for determining the exposure time and / or intensity to be used to obtain desired features of a relief structure, in particular a desired floor thickness, comprising the steps of: exposing a first side of a relief precursor to electromagnetic radiation, wherein the exposure is carried out in an area having a first position A and a second position B, and wherein the exposure time and exposure intensity values ​​are known for a plurality of points between the first position A and the second position B, and the exposure time and / or exposure intensity are automatically controlled to vary at the plurality of points; determining one or more points from the plurality of points that represent the desired feature; and determining the required exposure time and / or exposure intensity for the desired feature based on the determined one or more points and the known values.

Description

[Technical Field]

[0001] The field of the invention relates to methods and systems for determining the exposure conditions, particularly exposure time and / or exposure intensity, to be used to obtain the desired characteristics of a relief structure, more particularly the desired floor thickness of a printing plate or printing sleeve. [Background technology]

[0002] The relief structure can be created by transferring image information to the imageable layer and removing portions of the imageable layer, and the resulting relief can then be used to transfer information onto a substrate in a printing step.

[0003] Exemplary relief precursors are printing plates or printing sleeve precursors. Digitally imageable flexible printing precursors are known and typically comprise at least a dimensionally stable support layer, a photosensitive layer, and a digitally imageable layer. In conventional printing precursors, the digitally imageable layer is a mask layer attached to the photosensitive layer. In digital images, the layer may be, for example, a laser ablatable layer.

[0004] To produce the relief structure, the relief precursor is exposed to electromagnetic radiation and developed by removing the unexposed material.

[0005] Exposure systems for printing precursors are known. The exposure system can include radiation means for front exposure and / or radiation means for back exposure. Back exposure is performed through a dimensionally stable support, resulting in a floor permanently fixed to the support. Back exposure is typically performed using a set of UV light tubes. Back exposure forms a solid layer (floor) on which relief features can be generated. Front exposure can also be performed using a set of UV light tubes, or using a movable UV radiation source such as a movable laser or LED bar.

[0006] However, it is necessary to know the correct exposure conditions, especially for back exposure of the relief precursor, and more specifically to obtain the desired floor thickness. Prior art methods for determining the exposure conditions usually rely on external means that are complex, prone to error, and time consuming. Therefore, there is a need in the art for improved methods of said determination. Summary of the Invention

[0007] It is an object of embodiments of the present invention to provide improved systems and methods for determining exposure conditions, particularly exposure time and / or exposure intensity, of a relief precursor used to obtain desired characteristics of a relief structure, particularly a desired floor thickness of a printing plate or printing sleeve. More specifically, it is an object to provide methods and systems that allow for faster and more reliable determination of exposure conditions to obtain desired characteristics without the need for complex tools or tedious handling of the relief precursor.

[0008] According to a first aspect of the present invention, there is provided a method for determining the exposure time and / or exposure intensity to be used to obtain desired characteristics of a relief structure, in particular a desired floor thickness, the method comprising the following steps: exposing a first side of the relief precursor to electromagnetic radiation, the exposure being carried out in an area having a first position A and a second position B, and being carried out such that values ​​of exposure time and exposure intensity are known for a plurality of points between said first position A and said second position B, and the exposure time and / or exposure intensity are automatically controlled to be different at said plurality of points; Optionally, exposing a second side of the relief precursor in a portion between the first position A and the second position B; Optionally, developing the relief precursor by removing unexposed material of the relief precursor; Optionally, drying the developed relief precursor; Optionally, curing the developed relief precursor; determining one or more points from the plurality of points that represent a desired feature; determining an exposure time and / or exposure intensity required for the desired feature based on the determined one or more points and the known values; Includes.

[0009] Such a method determines exposure conditions in a more reliable and error-free manner than prior art methods. By exposing a series of points using different exposure times and / or exposure intensities, an exposure profile is obtained that allows for the precise identification of a desired feature in the developed relief precursor, e.g., a desired floor thickness, and for subsequent exposures of the relief precursor to be performed using the associated known values. Furthermore, the method can be easily performed by an exposure system, and the step of determining one or more points representing the desired feature can be performed using simple means.

[0010] The exposure time and / or exposure intensity required for the desired feature can be determined by any or a combination of selection, calculation, and / or derivation. For example, if one of the determined one or more points exactly corresponds to the desired feature, a known value corresponding to this point can be selected. In another example, if two points are close to the desired feature, an average of the known values ​​corresponding to the two points can be calculated.

[0011] Preferably, the step of determining one or more points among the plurality of points that represent the desired characteristic is performed after developing the relief precursor. Additionally, other steps, such as pre-treatment and / or post-treatment steps, can be performed before the step of determining one or more points among the plurality of points that represent the desired characteristic. Such pre-treatment steps can include, for example, pre-cleaning the printing plate. Post-treatment steps can include rinsing, drying, post-exposure using, for example, UVA and / or UVC light, thermal treatment, and combinations thereof. More generally, any steps typically performed when producing a relief precursor can also be performed during the calibration method to determine the exposure time and / or exposure intensity used to obtain the desired characteristics of the relief structure.

[0012] Furthermore, it should be noted that various development conditions will affect the characteristics of the developed relief precursor, such as the solvent used, temperature, washout rate, etc. If any of these conditions change, the calibration method may be repeated.

[0013] According to a preferred embodiment, the first side of the relief precursor is the backside of the precursor and the desired feature is the floor thickness of the developed relief precursor.

[0014] According to an exemplary embodiment, the exposure is performed successively in a direction between positions A and B, preferably in a direction extending along the length of the relief precursor, thereby forming successive exposures between a first position A and a second position B. to exposure was A continuous area is formed. to exposure was The area results in a more efficient use of the area available on the relief precursor for exposure. Furthermore, precision can be increased. Because high precision can be obtained with a single relief precursor, less waste is formed with respect to the relief precursor and less unexposed material remains afterwards, especially in the development step where the unexposed material is removed.

[0015] According to an exemplary embodiment, the exposure time and / or exposure intensity are automatically controlled to be different at the plurality of points. In this way, a more efficient and faster process is achieved while reducing the need for manual handling steps. Those skilled in the art will understand that several combinations of exposure time and / or exposure intensity can be performed for the plurality of points. The exposure time and / or exposure intensity values ​​are controlled to vary at the plurality of points. Preferably, the exposure time and exposure intensity are controlled to be different when viewed along a line connecting the first position A and the second position B. Automatically controlling the exposure time and / or exposure intensity to be different at the plurality of points means that this step can be performed based on programmed instructions, without the need for an operator to manually perform an action during exposure. For example, the intensity can be automatically adjusted using computer instructions, and / or the exposure time can be automatically adjusted using computer instructions.

[0016] According to an exemplary embodiment, the exposure time and exposure intensity are known as a function, preferably a continuous function, of the position along the line between the first position A and the second position B. to exposure was The regions result in efficient use of the available exposable area of ​​the relief precursor.

[0017] According to exemplary embodiments, the function may be a linear function or a step function, resulting in a wedge-shaped section or a section including multiple steps after development. Alternatively, the function may be a more complex function that may result in a more complex shape, such as a wave, a hyperbolic function, a polynomial function, or a series of gradients. Furthermore, it should be noted that the exposure time and / or exposure intensity may vary two-dimensionally in the region between the first and second positions. In this way, even more complex shapes, such as a pyramidal or conical shape of the floor, may be obtained.

[0018] According to an exemplary embodiment, the method further includes exposing a first reference area from the first side with a predetermined intensity during a maximum exposure time and / or not exposing a second reference area from the first side before developing the precursor. The first reference area has a fully cured photosensitive layer of the relief precursor, with a floor thickness corresponding to the thickness of the photosensitive layer. The second reference area has no cured material and represents a floor thickness of 0. If material is present in the second reference area, proper development conditions may not be met and may need to be corrected. The method further includes, after developing the relief precursor, verifying the first and / or second reference areas and, if necessary, optionally determining a correction factor therefrom.

[0019] According to an exemplary embodiment, the second reference area is covered with a layer opaque to electromagnetic radiation, making the covered area of ​​the relief precursor less susceptible to radiation. Therefore, the unexposed material located in the second area is removed during precursor development. Therefore, since there is no material present, the second area can be used as a reference when measuring the desired feature, preferably the floor thickness.

[0020] According to an exemplary embodiment, the method further includes, before the developing step, exposing a third reference area from the second side at a predetermined intensity during a predetermined exposure time, and after the developing step, verifying the third reference area and, if necessary, optionally determining a correction factor thereon.

[0021] According to an exemplary embodiment, the second side of the precursor is covered with a layer that is opaque to electromagnetic radiation, while the third reference area is not covered by a layer. Alternatively, the layer is transparent to electromagnetic radiation in the area above the third reference area and opaque in the remainder of the area of ​​the layer covering the second side. The third reference area optionally at least partially overlaps the exposure area between positions A and B and / or the first or second reference area.

[0022] Optionally, a correction factor is determined based on the verification of the first, second, and / or third reference areas. The correction factor can then be used to determine and / or correct errors or defects in the measured thickness. This is particularly desirable when unexposed or undeveloped material remains after development of the relief precursor. Alternatively, the first, second, and / or third reference areas can be used for calibration when determining one or more points among a plurality of points that represent a desired feature.

[0023] According to an exemplary embodiment, the exposure intensity is constant and the exposure time is varied during the exposure step: a longer exposure time in one particular region will result in a greater thickness compared to a shorter exposure time in another region, when the intensity in both regions is held constant.

[0024] According to an exemplary embodiment, the method further comprises a step of exposing the relief precursor using an exposure unit comprising an electromagnetic radiation source and a movable shutter between the relief precursor and the electromagnetic radiation source, wherein during the exposing step the exposure time is controlled by relative movement of the shutter with respect to the relief precursor, the relative movement being preferably parallel to the relief precursor.

[0025] Preferably, the shutter moves from a start position, where the shutter shields the area between the first position A and the second position B, toward the second position B, to an end position, where the shutter allows full exposure of the area between the first position A and the second position B. In this way, the exposure time at multiple points between the first position A and the second position B varies. The shutter can be moved at a constant speed to obtain a relief precursor having a linear thickness profile, preferably a wedge profile. Alternatively, the shutter can remain fixed for a certain time between the start and end positions to form a relief precursor having a step profile. In yet other embodiments, the shutter speed can be varied continuously or discontinuously between the start and end positions.

[0026] According to another exemplary embodiment, the intensity is varied by exposing different regions between a first position A and a second position B to different exposure intensities. In this way, regions receiving a higher intensity are developed with a greater thickness compared to regions receiving a lower intensity. This can be achieved, for example, by using an LED bar for back exposure that is controlled to move to several positions between positions A and B and deliver a different intensity for a certain period of time at each position. Another possibility is to move the LED bar at a constant speed and vary the intensity continuously or in steps. In a further configuration, an LED array or set of light tubes covering the entire size of the precursor can be used, with specific LEDs or tubes belonging to the array's regions being controlled to deliver different intensities in different regions.

[0027] Another method for varying the intensity is to use one or more radiation control layers configured to at least partially block or reduce the radiation emitted by the electromagnetic radiation source onto the relief precursor. For example, the radiation control layer can be configured to be more transparent in certain areas of the layer and less transparent in other areas. Alternatively or additionally, multiple radiation control layers with different transparencies (e.g., multiple tiles positioned adjacent to each other on the relief precursor) can be used. This allows the one or more radiation control layers to control the exposure intensity received by the relief precursor. The radiation control layer can also be a film with regions of different optical densities, allowing known intensities to pass through different regions. Such graded transmittance wedges are available, for example, from Stouffer Industries, Agfa, or Kodak. Using a radiation control layer with regions of different optical densities allows a greater number of different intensities to be applied in one single exposure step, saving time and materials. Another possibility for a radiation control layer is to use a mask film in which regions with different tonal values ​​are represented. Such a mask film can be obtained by ablating a non-transparent mask layer or by varying the transparency of the layer. The structure of the regions may be transparent lines or dots of a specific size and number per unit area, allowing only a defined portion of the applied light to pass through. Such mask films are available, for example, from Miraclon (Flexcel) or Folex (LADF). In yet another embodiment, a tile pattern is used that includes a first tile having a first known transparency and a second tile having a second known transparency that is different from the first transparency.

[0028] According to an exemplary embodiment, development of the relief precursor is performed by treating the unexposed material with a fluid and / or by heating the exposed precursor and transferring the unexposed material to another material, preferably a nonwoven web. This removes the unexposed material, leaving behind the developed relief precursor, whose desired features, particularly its thickness, can be measured and / or identified. The development step may be performed in an in-line configuration, where the precursor is automatically transferred from the exposure station to the development station, or in a stand-alone device, where the precursor is manually transferred. It is clear that during the calibration method, the same conditions are preferably used for the development step and / or other steps that affect the desired features as those used for manufacturing the relief structure. Steps that may affect the desired features are, for example, pre-treatment and / or post-treatment steps.

[0029] Preferably, the determination of one or more of said plurality of points representing the desired feature is performed at the same positions of the relief precursor that were subjected to the exposure step, and therefore preferably the determination is performed by measuring one or more points without moving the relief precursor after the exposing step.

[0030] According to an exemplary embodiment, the thickness of the developed precursor is measured at multiple points between a first position A and a second position B. This results in a thickness profile. The step of determining one or more of the multiple points that represent the desired feature can then be based on the thickness profile. Preferably, the thickness profile is a wedge profile. Those skilled in the art will appreciate that different profiles are possible, such as a wave, a series of triangles, or a staircase-like step profile. The thickness can be measured by any one of mechanical, optical, and / or acoustic methods, preferably a non-contact method. While floor thickness determination may be performed in a separate device, it is preferably performed in the exposure unit. When performed in the exposure unit, the developed precursor may be positioned exactly as it was during exposure, allowing the thickness value to be related to the exact position and exposure conditions performed. For best results, precursor alignment marks or other positioning tools can be used for repositioning, which reduces measurement errors.

[0031] The relief precursor has a length direction and a width direction. Preferably, the first and second positions correspond to first and second edges extending in the width direction of the relief precursor. Alternatively, the first and second positions may correspond to edges extending in a direction other than 90° to the length direction or the width direction. The corresponding edges may also be curved.

[0032] According to an exemplary embodiment, the exposure is carried out to obtain a developed relief precursor having a substantially wedge shape, said shape resulting in an easy to handle and convenient shape having different thicknesses at multiple points between the top and bottom positions of the wedge, thereby providing shapes with a multitude of different thicknesses for which corresponding exposure conditions can be derived.

[0033] According to an exemplary embodiment, determining one or more of the plurality of points that represent the desired feature comprises measuring the thickness of the developed relief precursor by one of mechanical, optical and / or acoustic methods, preferably by a non-contact method. Alternatively, the thickness may be measured without developing the relief precursor. The latter can be done, for example, by a non-contact acoustic method that detects density differences.

[0034] From the results of the previous step, exposure conditions for the desired floor thickness can be selected, and these selected conditions are then used to produce a relief structure with the desired floor thickness.

[0035] According to another aspect of the present invention, there is provided a method for producing a relief structure comprising carrying out any one of the method embodiments as described above, the method comprising determining, e.g. selecting, an exposure time and / or exposure intensity for a desired characteristic, e.g. a desired floor thickness, and producing the relief structure using the selected exposure time and / or exposure intensity.

[0036] Preferably, the relief structure is a flexographic printing plate, a letterpress plate, a relief printing plate, a (flexible) printed circuit board, an electronic element, a microfluidic element, a microreactor, a migration cell, a photonic crystal, an optical element, or a Fresnel lens.

[0037] According to another aspect of the present invention, there is provided a system configured to determine an exposure time and / or exposure intensity to be used for exposing a relief precursor to obtain desired characteristics of the relief structure, in particular a desired floor thickness. The system comprises a holding means, an exposure unit, a control module, a measurement unit, and a determination module. The holding means is configured to support a relief precursor whose first side is exposed by the exposure unit to electromagnetic radiation between a first position A and a second position B of the precursor. Optionally, the exposure unit is configured to expose a second side of the precursor between said positions. The control module is configured to control the exposure values, in particular the exposure time and / or exposure intensity, for a plurality of points between the first and second positions such that the exposure time and / or exposure intensity automatically varies at said plurality of points. The optional developing unit is configured to develop the exposed relief precursor to remove unexposed material. The measurement unit is configured to measure the developed relief precursor to determine one or more points among said plurality of points that represent desired characteristics. The determination module is configured to determine the exposure time and / or intensity required to obtain the desired features based on the determined one or more points and values ​​set by the control module. Additionally, the system can comprise pre-treatment and / or post-treatment means configured to pre-treat and / or post-treat the relief precursor, for example with a pre-clean.

[0038] The present system allows for faster and more reliable determination of exposure conditions used to obtain desired features, preferably a desired floor thickness, without the need for complex tools or tedious handling of the relief precursor. Additionally, the system can be used to pursue development stability and / or exposure efficiency of the development process of the relief precursor, preferably a polymer printing plate or sleeve.

[0039] The exposure may be a back exposure that hardens the polymer printing plate or sleeve precursor to achieve a stable back floor structure. Because it is desired to achieve a back floor structure with a constant selected thickness, it is necessary to know appropriate exposure conditions, such as exposure intensity and exposure time. By providing a determination module that determines the conditions based on one or more points measured by the measurement unit and one or more associated values ​​set by the control module, the exposure conditions for achieving the desired characteristics can be derived. This can improve the accuracy of deriving the desired characteristics.

[0040] According to a preferred embodiment, the exposure unit comprises a backside exposure means configured to expose the backside of the relief precursor, the desired feature being a desired floor thickness.

[0041] According to an exemplary embodiment, the control module controls the exposure to occur continuously in a direction between the first and second positions, preferably in a direction extending in the length direction L of the relief precursor. to exposure was The control module is configured to control the exposure units to expose in other directions, such as the width direction or at angles other than 90° to the width direction. Those skilled in the art will appreciate that the control module may be configured to control the exposure units to expose in other directions, such as the width direction or at angles other than 90° to the width direction. Sequential exposure results in more efficient use of the available exposable area on the relief precursor. In doing so, less area of ​​the relief precursor is wasted, and more specifically, less unexposed material is removed, especially in the development step when unexposed material is removed.

[0042] According to an exemplary embodiment, the determination module is configured to receive the exposure time and exposure intensity as a function of position along a line between the first and second positions on the precursor. In this manner, the exposure time and exposure intensity values ​​can be associated with positions on the relief precursor.

[0043] According to an exemplary embodiment, the function received by the determination module is a linear function or a step function. Those skilled in the art will appreciate that other functions are possible that may result in more complex shapes. For example, the shape may be a wave, a series of triangles, or a hill. Furthermore, it should be noted that the exposure time and / or exposure intensity may vary two-dimensionally between the first and second positions, resulting in even more complex shapes, such as a pyramid or cone shape.

[0044] According to an exemplary embodiment, the exposure unit includes an electromagnetic radiation source and one or more radiation control layers configured to at least partially block or reduce radiation emitted by the electromagnetic radiation source to the one or more radiation control layers. In this manner, the radiation source can be of one type, emitting one type of intensity toward the relief precursor, while the relief precursor receives different intensities at multiple points on the radiation control layer. For example, a single radiation control layer can be configured to be more transparent in certain areas of the layer and less transparent in others. Alternatively, multiple tiles with different transparencies can be used. This allows the one or more radiation control layers to control the exposure intensity received by the relief precursor. The radiation control layer can also be a film with regions of different optical densities, allowing known intensities to pass through different regions. Such graded transmittance wedges are available, for example, from Stouffer Industries, Agfa, or Kodak. Another possibility for the radiation control layer is the use of a mask film, which represents regions with different color values. Such a mask film can be obtained by ablating a non-transparent mask layer or by varying the transparency of the layer. The structure of the areas may be transparent lines or dots with a specific size and number per unit area, allowing only a defined portion of the applied light to pass through. Such mask films are available, for example, from Miraclon (Flexcel) or Folex (LADF). One or more radiation control layers are arranged between the electromagnetic radiation source and the relief precursor, for example, directly on the relief precursor, on a support plate supporting the relief precursor, or at a distance from the relief precursor. According to another possibility, the support plate can be implemented as a radiation control layer.

[0045] The exposure unit can include any light source known to those skilled in the art, such as a fluorescent lamp, a flashlight, a mercury lamp, a xenon lamp, a light-emitting diode (LED), a light-emitting screen (liquid crystal display, plasma display, organic light-emitting display), a projection system (micromirror projection), a laser, or a combination thereof.

[0046] Preferably, the exposure unit comprises a radiation source emitting electromagnetic radiation in the range of 200 to 2000 nm, preferably 250 to 900 nm, more preferably 250 to 450 nm, and most preferably 250 to 410 nm. 2 ~2000mW / cm 2 , preferably 5 mW / cm 2 ~1000mW / cm 2 , more preferably 10 mW / cm 2 ~500mW / cm 2 , most preferably 10 mW / cm 2 ~250mW / cm 2 The relief precursor is configured to be exposed to an exposure intensity or range of exposure intensities of 0.1 to 1.0001.

[0047] Preferably, the radiation source extends substantially in a plane intended to be parallel to the relief precursor, however, in other embodiments the plane of the radiation source may be tilted relative to a plane parallel to the relief precursor.

[0048] According to an exemplary embodiment, the control module is configured to control the exposure time such that the exposure unit is configured and / or controlled to expose at a substantially constant exposure intensity and the exposure time is varied, preferably the intensity is substantially constant across the area of ​​the precursor and has a deviation of less than ±10%, preferably ±5%, more preferably ±2%.

[0049] According to another exemplary embodiment, the exposure unit may comprise an electromagnetic radiation source and a movable shutter between the relief precursor and the radiation source, the control module being configured to control a relative movement between the shutter and the relief precursor, the relative movement preferably being parallel to the relief precursor, to control the exposure time.

[0050] According to an exemplary embodiment, the control module is configured to control movement of the shutter from a start position, in which the shutter blocks an area between a first position and a second position, in the direction of the second position, to an end position, in which the shutter allows full exposure of the area between the first position and the second position.

[0051] The relative movement is preferably performed at one or more speeds in the range of 0.2 mm / sec to 50 mm / sec, which allows exposure times of 0.5 seconds to 15 minutes.

[0052] According to an exemplary embodiment, the control module is configured to vary the exposure intensity between different regions between the first position and the second position. For example, the radiation source may be an array of LEDs comprising multiple subsets of one or more LEDs, each subset being individually controllable. The control module may be configured to individually control the multiple subsets so that the variation in radiation intensity in a given surface region is within a predetermined range. Further details regarding such exemplary embodiments may be found in Dutch Patent Application No. 2023537 in the name of the applicant, which is incorporated herein by reference.

[0053] According to an exemplary embodiment, the optional development unit is configured to treat the unexposed material of the relief precursor using a fluid and / or heat the exposed precursor to transfer the unexposed material to another material, preferably a nonwoven web.

[0054] According to an exemplary embodiment, the measurement unit is configured to measure the thickness of the developed precursor at multiple points between a first position and a second position to obtain a thickness profile, and the determination module is configured to determine one or more points among the multiple points that represent the desired feature based on the obtained thickness profile. The measurement unit can be moved relative to the relief precursor, preferably in a plane parallel to the precursor, but also in an inclined or vertical plane. This allows multiple measurements to be taken at multiple points on the relief precursor. The movement of the measurement unit can be performed by a moving means. Alternatively, the relief precursor can be moved to the opposite side of the measurement unit. For example, the moving means can move the holding means and / or the relief precursor relative to the measurement unit.

[0055] Preferably, the exposure unit comprises at least one of a set of light tubes, preferably a set of fluorescent tubes, a plurality of LEDs, and combinations thereof.

[0056] In an exemplary embodiment, the system can include a housing having an inlet and an outlet, and optionally, a relief precursor can be automatically delivered to a location on a support structure through the inlet, exposed, and then removed from the system through the outlet. In other words, embodiments of the present invention allow for a fully automated in-line system to be built. The inlet and outlet can be on the same side or on opposite sides. The inlet and outlet can be configured to be connected to other units.

[0057] The system can include a conveying system for automatically conveying the relief precursor in a conveying direction. The conveying system can include conveying means selected from the group including an endless belt, a pair of chains or belts (with pusher blocks), a pair of lead screws, a creep drive, a friction drive, and combinations thereof.

[0058] The transport system may further comprise at least one attachment means for attaching the relief precursor to the transport means. The attachment means may be a transport bar having a plurality of pins extending through the edge of the relief precursor. Alternatively, a clamping means for clamping the relief precursor may be used. The transport bar may be configured to be coupled to the leading edge of the relief precursor, and the transport system may be configured to pull the transport bar together with the coupled relief precursor through the housing. If the transport system comprises two lead screws, the ends of the transport bar may be provided with coupling means adapted to be coupled to the lead screws.

[0059] In an exemplary embodiment, the system further comprises cooling means configured to cool the relief plate precursor and / or the exposure unit. For example, at least one cooling means can cool the electromagnetic radiation source and / or the holding means (e.g., a transparent plate) and / or the surface of the relief precursor and / or the shutter. The cooling means can use a fluid or gas, such as water or air, for cooling.

[0060] Additional components may be part of the system. Such additional components may be selected from the group including a power supply, an additional electromagnetic radiation source, a cooling system, clamping means, additional transport means, a motor, a sensor, and combinations thereof. The additional radiation source may be selected from the group including an LED, a fluorescent lamp, a flash lamp, a linear set of light tubes, a (scanning) laser, an LCD screen, a projection system (e.g., with a movable mirror), a laser, and combinations thereof (which may be fixed and / or movable). The additional radiation source may irradiate at least a partial area, preferably the entire area, of one or both sides of the relief precursor. The additional radiation source may be positioned such that the radiation source can be moved between the additional radiation source and the relief precursor. Optionally, the additional radiation source may be provided on either side of the relief precursor. The additional radiation source may be controlled to expose the relief precursor before, during, or after exposure by the first radiation source.

[0061] Optionally, the control module controls components of the system and of other units in the process chain, so as to coordinate the various operations that need to be performed on the relief precursor. The control module may be a single centralized controller or a distributed control module with multiple control units.

[0062] Optionally, one or more sensors may be provided, such as an optical sensor, a magnetic sensor, a proximity sensor, a temperature sensor, an overheat sensor, a flow rate sensor, an intensity sensor, a pressure sensor, a thickness sensor, etc. The movement of the radiation source and the actuation of the radiation source may further be controlled depending on sensor data measured by the one or more sensors. A sensor of the one or more sensors may detect the size and / or thickness of the relief precursor, and these data may be used, for example, to control the size of the exposure area, the exposure time and / or the exposure intensity.

[0063] Optionally, the system may include one or more additional processing units selected from the group including a loading and unloading unit, an imaging unit, a liquid development unit, a thermal development unit, a drying unit, a post-processing unit, a pre-processing unit, a storage unit, and combinations thereof.

[0064] According to a further aspect of the present invention, there is provided a computer program comprising computer-executable instructions for controlling exposure values, in particular exposure time and / or exposure intensity, for a plurality of points between a first position and a second position, when the program is run on a computer, such that exposure time and / or exposure intensity is automatically varied at said plurality of points. The control of exposure values, in particular exposure time and / or intensity, may be performed according to any one of the embodiments disclosed above.

[0065] According to a further aspect of the present invention, there is provided a computer device or other hardware device programmed to control exposure values, particularly exposure time and / or exposure intensity, for a plurality of points between a first position and a second position, such that the exposure time and / or exposure intensity is automatically varied at said plurality of points. According to another aspect, there is provided a data storage device encoding a program in machine-readable and machine-executable form for controlling exposure values, particularly exposure time and / or intensity, for a plurality of points between a first position and a second position, such that the exposure time and / or exposure intensity is automatically varied at said plurality of points. The control of exposure values, particularly exposure time and / or intensity, may be performed according to any one of the embodiments disclosed above.

[0066] The accompanying drawings are used to illustrate presently preferred, non-limiting, exemplary embodiments of the system and method of the present invention. These and other advantages of the features and objects of the present invention will become more apparent and the invention will be better understood from the following detailed description when read in conjunction with the accompanying drawings. [Brief explanation of the drawings]

[0067] [Figure 1] 1 illustrates schematically an exemplary embodiment of a system for determining exposure conditions, particularly exposure time and / or exposure intensity, used to obtain a desired characteristic, more particularly floor thickness, of a printing plate or sleeve. [Figure 2] 1 is a schematic top view of a relief precursor having an exposed region between a first location A and a second location B. FIG. [Figure 3] 1 is a simplified schematic side view of an exemplary embodiment of the present invention in which the exposure unit comprises a radiation control layer; [Figure 4] 1 is a simplified schematic side view of an exemplary embodiment of the present invention in which the exposure unit includes a movable shutter; [Figure 5] 1 is a schematic side view of another exemplary embodiment of the present invention, showing an exposure unit having a movable radiation source; [Figure 6] FIG. 10 is a schematic side view of another exemplary embodiment of the present invention showing an exposure unit having radiation sources that emit at different intensities. [Figure 7A] 1A-1C are schematic side views of a relief precursor showing some possible thickness profiles. [Figure 7B] 10A-10C are schematic side views of a relief precursor showing different possible thickness profiles. [Figure 7C] 10A-10C are schematic side views of a relief precursor illustrating yet another possible thickness profile. [Figure 7D] 10A-10C are schematic side views of a relief precursor illustrating yet another possible thickness profile. [Figure 7E] 10A-10C are schematic side views of a relief precursor illustrating yet another possible thickness profile. [Figure 8A] 1 is a schematic top view of an exposed relief precursor showing different regions exposed under certain exposure conditions. FIG. [Figure 8B] 1A-1C are schematic top views of an exposed relief precursor showing different regions exposed under different exposure conditions. [Figure 8C] 10A-10C are schematic top views of an exposed relief precursor showing different regions exposed under further exposure conditions. [Figure 9] 1 is a schematic perspective view of an exemplary embodiment of a system for exposing and determining exposure conditions of a relief precursor; FIG. [Figure 10A] FIG. 1 illustrates a top view of one embodiment of a radiation-control layer. [Figure 10B] 10 shows a top view of another embodiment of a radiation-control layer. [Figure 10C] FIG. 10 shows a top view of yet another embodiment of a radiation-control layer. [Figure 11] 1 illustrates an example of calibration using an exemplary embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0068] 1 shows a schematic diagram of a system for determining the exposure time and / or exposure intensity to be used to obtain desired characteristics of a relief structure P, in particular the desired floor thickness t of a printing plate or sleeve. The system comprises a holding means 10, an exposure unit 20, a control module 30, an optional development unit 40, a measurement unit 50 and a determination module 60.

[0069] The holding means 10 is configured to support a relief precursor P, the backside of which will be exposed with electromagnetic radiation by the exposure unit 20, between a first position A and a second position B of the precursor P, in particular between a first edge A of the exposure area and a second edge B of the exposure area. The holding means 10 may be a transparent plate, a glass plate, a frame, a hanging grip, a clamp or a combination thereof that holds and / or supports the relief precursor. A moving means (not shown) may be configured to move the relief precursor P relative to the exposure unit 20. The moving means may also be controlled by the control module 30.

[0070] The exposure unit 20 preferably comprises a back exposure means 20a configured to expose the back side of the precursor P between said positions. Additionally or alternatively, the exposure unit 20 can comprise a front exposure means 20b configured to expose the front side of the relief precursor P. Preferably, the exposure unit 20 comprises any of a plurality of LEDs, a set of light tubes, a fluorescent lamp, a flash lamp, a mercury lamp, a xenon lamp, a set of light tubes, a laser, a lightning screen, e.g. an LCD-, OLED- or plasma-screen, a light projection system with a movable mirror, a solar collection system, and combinations thereof.

[0071] The control module 30 is configured to control the parameters of the exposure, in particular the exposure time and / or the exposure intensity, for a plurality of points between the first position A and the second position B, such that the exposure time and / or the exposure intensity varies at said plurality of points. The control module may further be configured to control other components of the system, for example the movable light source or means of movement for the precursor, the shutter, the LED array, the sensor, the measurement unit 50 and / or the development unit 40.

[0072] The developing unit 40 is configured to develop the relief precursor to remove unexposed material. The developing unit 40 is configured to use a fluid to wash the unexposed material from the relief precursor and / or heat the exposed precursor to transfer the unexposed material to another material, preferably a nonwoven web. Removal of material from the exposed precursor can be performed by heating and using a developing material, e.g., a web or film, in contact with the precursor to remove the liquefied material. Additionally or alternatively, the developing unit 40 may be configured to develop the relief precursor by brushing, rinsing, drying and / or heating, treating the relief precursor with a gas or liquid, or a combination thereof.

[0073] The measurement unit 50 is configured to measure the developed relief precursor to determine one or more points among the plurality of points that represent a desired characteristic. The measurement unit 50 can use different methods, such as mechanical, optical, and / or acoustic methods, to measure the thickness of the developed relief precursor. Preferably, non-contact measurement methods are used. The measurement unit 50 can use one or more sensors, such as a proximity sensor, a pressure sensor, a density sensor, and preferably a thickness sensor. Examples of mechanical sensors are a moving wheel, a moving stylus or plate, a spring, or a combination thereof. Examples of non-contact sensors are a spectral analysis sensor, a spectral reflectance analysis sensor, a chromatic confocal sensor, a single-channel or dual-channel sensor, a non-contact laser thickness gauge, etc. Optionally, additional or alternative sensors can be provided, such as an optical sensor, a magnetic sensor, a temperature sensor, a superheat sensor, a flow rate sensor, or an intensity sensor.

[0074] The determination module 60 is configured to determine the exposure time and / or intensity required to obtain the desired characteristics based on the determined one or more points and the values ​​set by the control module 30 .

[0075] The relief precursor P has an exposed area between a first position A and a second position B, the exposed area between these positions comprising a wedge shape with a thickness profile, the wedge shape having a thickness that decreases when viewed in the direction from the first position A to the second position B. Alternatively, different shapes are possible, as explained in relation to Figures 2 to 8C.

[0076] 2 shows a schematic top view of a relief precursor P having a length L and a width W. The first position A and the second position B extend in the width direction of the relief precursor. Alternatively, the first and second positions extend in a direction other than 90° to the length or width direction of the relief precursor. Positions A and B may also be curved.

[0077] The exposure region between a first position A and a second position B is shown showing a top view of the wedge described above in connection with Figure 1. The first position A receives a longer exposure time and / or a higher exposure intensity than the second position B. Looking lengthwise from A to B, the thickness gradually decreases due to the shorter exposure time and / or lower exposure intensity.

[0078] The length L of the precursor may be in the range of 10 mm to 2000 mm, preferably 20 mm to 1500 mm, more preferably 50 mm to 1000 mm, and most preferably 50 mm to 350 mm.

[0079] The measurement unit 50 can measure the thickness profile between positions A and B for multiple points along the length L. Additionally, the measurement unit 50 can measure the thickness along a line extending in the width direction located at multiple points, and an average of the measurements along the line can be used to create the thickness profile between positions A and B. Possible thickness profiles are shown in Figures 7A to 7E, where the thickness profile is shown in a cross-section of the relief precursor. Alternatively, the measurement unit can measure the thickness of the entire top surface of the exposed area. In this way, a measured 2D thickness profile is obtained.

[0080] The determination module 60 can be configured to receive the exposure time and exposure intensity as a function of position along a line between the first and second positions. In this manner, the exposure time and exposure intensity can be related to the thickness profile measured for multiple points between the positions.

[0081] 3 is a schematic side view of an exemplary embodiment similar to that of FIG. 1. Identical or similar components are designated by the same reference numerals. The exposure unit 20 comprises a radiation source 23 and an optional radiation control layer 24. Alternatively, the holding means 10 may comprise the radiation control layer 24. The radiation source 23 emits electromagnetic radiation in the range of 200 to 2000 nm, preferably 250 to 900 nm, more preferably 250 to 450 nm, and most preferably 250 to 410 nm. The radiation source 23 has a power of 1 mW / cm. 2 ~2000mW / cm 2 , preferably 5 mW / cm 2 ~1000mW / cm 2 , more preferably 10 mW / cm 2 ~500mW / cm 2 , most preferably 10 mW / cm 2 ~250mW / cm 2 The radiation source 23 is configured to expose the relief precursor with an exposure intensity in the range of . The radiation source 23 may emit at a substantially constant exposure intensity or the exposure intensity of the radiation source 23 may be varied. The electromagnetic radiation source 23 is preferably selected from the group comprising an LED, a fluorescent lamp, a flash lamp, a set of linearly arranged light tubes, a (scanning) laser, an LCD screen, an optical projection system (with a movable mirror), and / or combinations thereof.

[0082] The radiation control layer 24 can be used to vary the exposure intensity received by the relief precursor. The radiation control layer 24 may be configured to be more transparent to electromagnetic radiation near a first location A, with the transparency of the control layer 24 gradually decreasing near location B. Alternatively, the transparency of the radiation control layer 24 may vary differently, for example, the transparency may decrease in a stepwise manner.

[0083] Figures 10A, 10B, and 10C show three embodiments of radiation-control layers. In the example of Figure 10C, the radiation-control layer 24 is configured to be more transparent in certain areas of the layer and less transparent in other areas. For example, the radiation-control layer 24 can be a film with regions of different optical density, with known intensities passing through the different regions. Such graduated transmittance wedges are available, for example, from Stouffer Industries, Agfa, or Kodak. For example, the layer can be gradually more transparent in one direction.

[0084] 10A, a plurality of radiation-control layers 24 are provided, shaped as tiles having different transparencies. Such tiles can be positioned, for example, against a first side and / or a second side of the relief precursor, depending on which side is to be exposed. The pattern of tiles 24 can, for example, comprise four tiles having four different transparencies.

[0085] In the example of FIG. 10B, the radiation-control layer 24 is a mask film, and regions S1, S2, S3, and S4 with different color values ​​are represented. Such mask films can be obtained by varying the transparency of the layer or by ablating a non-transparent mask layer. For example, region S1 can be a hole (completely transparent), and regions S2, S3, and S4 can have different ablation depths. Such mask films are available, for example, from Miraclon (Flexcel) or Folex (LADF).

[0086] Figure 4 is a schematic side view of an exemplary embodiment similar to that of Figure 1. Identical or similar components are designated with identical reference numerals. Exposure unit 20 comprises a movable shutter 25 and a radiation source 23.

[0087] The movable shutter 25 is preferably opaque and / or non-reflective to electromagnetic radiation in the ranges disclosed above. The shutter 25 is preferably a planar structure, such as a sheet, curtain, folding sheet, or combinations thereof, that is moved by a moving means (not shown). The moving means may comprise any one of the group including an endless belt, a chain, a lead screw, a motor such as a linear motor, a piston, a gear such as a gear with a cog rail, a friction wheel, a gear, and combinations thereof.

[0088] Relative movement of the shutter 25 allows multiple points between positions A and B to receive different exposure times. The movable shutter 25 can move at a constant speed from a start position, where the shutter blocks the area between first position A and second position B, to an end position, where the shutter allows full exposure of the area between the first and second positions, toward second position B. In this manner, a wedge shape is formed. The relative movement can also be performed in stages, thereby forming a hardened area with a stepped thickness profile. Alternatively, the movement can be varied to form more complex shapes.

[0089] Preferably, the shutter 25 moves at a speed in the range of 0.2 mm / s to 50 mm / s, allowing exposure times of the relief precursor P between 0.5 seconds and 15 minutes. For parts of the trajectory of the relative movement where no exposure is required, the speed can be faster. Alternatively, another and / or different relative movement between the radiation source 23 and the relief precursor P may be provided by moving the holding means 10 and / or the relief precursor P itself.

[0090] FIG. 5 is a schematic side view of an exemplary embodiment similar to that of FIG. 1. Identical or similar components are designated with identical reference numerals. The radiation source 23 in FIG. 5 is movable. Relative movement between the radiation source 23 and the relief precursor P causes different exposure times and therefore different thicknesses. The relative movement can be with a constant acceleration to gradually decrease the thickness between positions A and B. Alternatively, the movement of the radiation source 23 can be gradual, causing a step-shaped thickness. The intensity of the radiation source 23 can be kept substantially constant or can be varied to create more complex shapes.

[0091] Figure 6 shows an embodiment similar to that of Figure 1. Identical or similar components are designated by the same reference numerals. The exposure unit 20 comprises three radiation sources 23 configured to emit at different intensities, thereby forming hardened regions with a graded thickness profile. By exposing the relief precursor P with a constant, decreasing intensity, a wedge shape can be obtained. Alternatively, the exposure unit 20 may comprise more than three radiation sources 23.

[0092] Figures 7A-7B show various possible thickness profiles: Figure 7A shows a stepped thickness profile; Figure 7B shows a wedge-shaped thickness profile; and Figures 7C-7E show examples of more complex shapes resulting from different exposure times and / or intensities received at multiple points between positions A and B.

[0093] 8A shows a top view of a relief precursor P having a length L and width W, with exposed regions 90, 91, and 92 having different thickness profiles. Region 90 shows a stepwise decrease in thickness from position A to position B. Region 91 shows a gradual decrease in thickness. Reference region 92 is an unexposed or fully exposed region to serve as a control against which measured thicknesses can be referenced and / or used to calibrate measurement unit 50.

[0094] Figures 8B and 8C show that thickness can vary two-dimensionally in steps or gradually due to changes in exposure conditions in directions other than the length direction. In Figure 8B, the exposure region between positions A and B forms a grid in which certain regions are exposed to higher intensities and / or longer exposure times. Reference region 92 can be used as a reference against which the measured thickness can be based. Figure 8C shows that the thickness gradually decreases when looking from a point at the first position A to a point at the second position B.

[0095] FIG. 9 illustrates a schematic diagram of a system 1000 that implements the teachings of the above-described systems and methods.

[0096] The system 1000 comprises a transport system 210, 220, 230 having at least one, preferably at least two, and even more preferably at least three, transport bars 100 intended to be coupled to a relief precursor. For example, as shown in FIG. 9, four transport bars 100 can be provided in the transport systems 210, 220, 230. The transport bars 100 are coupled to the leading edge 3 of the relief precursor P and preferably extend longer than the entire length of the leading edge, so that, as will be seen further, the ends of the transport bars 100 can be coupled to the transport mechanisms of the transport systems 210, 220. It should be noted that it is also possible to couple multiple relief precursors to the transport bar 100. Preferably, the length of the transport bar 100 is between 100 mm and 1000 mm, more preferably between 1000 mm and 4000 mm.

[0097] The system 1000 comprises a plate bonding station 300 configured to bond a relief precursor P to the carrier bar 100, and an exposure and development section 400 configured to expose and develop the relief precursor. The exposure and development section 400 comprises the exposure unit 20 and the development unit 40 described above, particularly in relation to Figures 1 and 3 to 6.

[0098] The transport system 210 is controlled, for example using the control module 800, to move the transport bar 100 with the relief plate precursor bonded thereto through the exposure and development section 400 where the relief plate precursor P is exposed and developed.

[0099] FIG. 11 shows an example of calibration using an exemplary embodiment similar to that of FIG. 1. In the example of FIG. 11, the desired development conditions were first set, e.g., washout rate = 350 mm / min, temperature = 35°C, solvent = nylosolv® A, etc., and then the backside of the plate was exposed using variable exposure times at different positions on the plate. The exposure time was varied linearly, and the relief depth (corresponding to the plate thickness minus the floor height) was measured. The results are shown in the graph of FIG. 11. As can be seen, the relief depth decreases with exposure time. In other words, the floor height increases with exposure time. In this example, the target relief depth is 550 microns, so the selected exposure time is approximately 16 seconds.

[0100] In embodiments not shown, a post-treatment unit can be provided to perform a post-treatment on the relief precursor, such as drying, post-exposing, heating, cooling, etc. Furthermore, in embodiments not shown, a pre-treatment unit can be provided to perform a pre-treatment on the relief precursor, said pre-treatment being selected from the group comprising cutting, ablation, exposure to electromagnetic radiation, and combinations thereof.

[0101] Optionally, the pre-exposure or post-exposure can be carried out using a radiation source selected from the group comprising an LED, a fluorescent lamp, a flash lamp, a set of linearly arranged light tubes, a (scanning) laser, an LCD screen, an optical projection system (with a movable mirror), and combinations thereof. During the pre-exposure step, the layer of the relief precursor can be modified in an imagewise manner.

[0102] The relief precursor generally comprises a support layer and at least one photosensitive layer. The support layer may be flexible metal, a natural or artificial polymer, paper, or a combination thereof. Preferably, the support layer is a flexible metal or polymer film or sheet. In the case of flexible metal, the support layer may comprise a thin film, a sieve-like structure, a mesh-like structure, a woven or nonwoven fabric structure, or a combination thereof. Steel, copper, nickel, or aluminum sheets are preferred and may be approximately 50 to 1000 μm thick. In the case of polymer films, the films are dimensionally stable but flexible and can be made, for example, from polyalkylenes, polyesters, polyethylene terephthalate, polybutylene terephthalate, polyamides, and polycarbonates, polymers reinforced with woven, nonwoven, or layered fibers (e.g., glass fibers, carbon fibers, polymer fibers), or combinations thereof. Polyethylene and polyester foils are preferably used, and the thickness of the polyethylene and polyester foils may be approximately 100 to 300 μm, preferably 100 to 200 μm.

[0103] The relief precursor can support at least one additional layer. For example, the additional layer can be any one of a directly engravable layer (e.g., by laser), a solvent or water-developable layer, a thermally developable layer, a photosensitive layer, or a combination of a photosensitive layer and a mask layer. Optionally, one or more additional layers can be provided on top of the additional layer. Such one or more additional layers can include a cover layer on top of all other layers that is removed before the imageable layer is imaged. The one or more additional layers can include a relief layer and an antihalation layer between the support layer and the relief layer or on the side of the support layer opposite the relief layer. The one or more additional layers can include the relief layer, the imageable layer, and one or more barrier layers between the relief layer and the imageable layer that prevent oxygen diffusion. One or more adhesive layers can be located between the different layers mentioned above to ensure proper adhesion of the different layers.

[0104] In a preferred embodiment, the relief precursor comprises a support layer made of a polymeric polyester material and an additional layer made of a directly engravable material, such as a resin material. An optional layer may then be a laser-ablation layer. In an exemplary embodiment, the relief precursor may include at least a dimensionally stable support layer, a relief layer, and an imageable mask layer. Optionally, additional layers may be present. A cover layer may be present on top of all other layers, which is removed before the imageable mask layer is imaged. An antihalation layer may be present between the support layer and the relief layer, or the antihalation layer may be located on the side of the support layer opposite the relief layer. One or more barrier layers that prevent oxygen diffusion may be present between the relief layer and the imageable mask layer. One or more adhesive layers may be located between the different layers to ensure proper adhesion of the different layers. One or more layers may be removable by treatment with a liquid. The liquids used may be the same or different for the different layers. Preferably, the liquids used are different.

[0105] In a preferred embodiment, the relief precursor comprises a photosensitive layer and a mask layer. The mask layer can be ablated or change transparency during processing, forming a mask with transparent and opaque regions. Preferably, the mask layer and / or barrier layer are removed in a pre-cleaning section of the system because they may contain materials that could cause problems in further process steps or during use of the final relief. Under the transparent regions of the mask, the photosensitive layer undergoes a change in solubility and / or flowability upon irradiation. This change is used to generate the relief in one or more subsequent steps by removing portions of the photosensitive layer. The change in solubility and / or flowability can be achieved by photoinduced polymerization and / or crosslinking, making the irradiated regions less soluble. In other cases, electromagnetic radiation can cause bond breaking or protective group cleavage, making the irradiated regions more soluble. Preferably, a process using photoinduced crosslinking and / or polymerization is used.

[0106] Liquids that can be used to remove material from exposed precursors include, among others, water, aqueous solutions, solvents, and combinations thereof. The nature of the liquid used will depend on the nature of the precursor used. If the layer to be removed is soluble, emulsifiable, or dispersible in water or an aqueous solution, water or an aqueous solution can be used. If the layer is soluble, emulsifiable, or dispersible in an organic solvent or mixture, an organic solvent or mixture can be used. In the case of organically developable precursors, different organic solvents or mixtures thereof can be used.

[0107] Removal of uncured material from the exposed precursor can also be achieved by heating and removing the liquefied material with a developer material. Removal of the softened material is achieved by continuously contacting the softened material with an absorbent material. The absorbent developer material can be a nonwoven fabric of polyamide, polyester, cellulose, or inorganic fibers, onto which the softened material adheres and is then removed. Such methods are described, for example, in U.S. Pat. No. 3,264,103, U.S. Pat. No. 5,175,072, WO 96 / 14603, or WO 01 / 88615. Alternatively, WO 01 / 90818 proposed treating the exposed relief precursor with a hot gas or fluid jet to remove the uncured material. EP 469735 and WO 01 / 18604 describe apparatus capable of carrying out the above-mentioned methods.

[0108] While the principles of the present invention have been described above with reference to specific embodiments, it should be understood that this description is made only by way of example and not as a limitation on the scope of protection determined by the appended claims.

Claims

1. A method for determining an exposure time and / or exposure intensity to be used to obtain desired characteristics of a relief structure, in particular a desired floor thickness, comprising: exposing a first side of a relief precursor to electromagnetic radiation, said exposure being carried out in an area having a first position A and a second position B, and being carried out such that values ​​of the exposure time and the exposure intensity are known for a plurality of points between said first position A and said second position B, and said exposure time and / or said exposure intensity are automatically controlled to vary at said plurality of points; determining one or more points from the plurality of points that represent the desired feature; determining an exposure time and / or exposure intensity required for the desired feature based on the determined one or more points and the known values; Including, The method, wherein the exposing step is performed continuously in a direction between the position A and the position B, thereby forming a continuously exposed area between the first position A and the second position B.

2. The method of claim 1 , wherein the first side is a backside and the desired characteristic is a desired floor thickness.

3. 3. The method of claim 1, further comprising developing the relief precursor by removing unexposed material of the relief precursor, wherein determining one or more points of the plurality of points that represent the desired feature is performed after the developing step.

4. The method of any one of claims 1 to 3, wherein the exposure time and the exposure intensity are known as a function of position along a line between the first position A and the second position B.

5. The method of claim 4 , wherein the function is a linear function or a step function.

6. 6. The method of claim 1, further comprising the steps of: developing the relief precursor by removing unexposed material of the relief precursor; exposing a first reference area from the first side with a predetermined intensity during a maximum exposure time and / or not exposing a second reference area from the first side before the developing step; and verifying the first and / or second reference areas after the developing step.

7. The method of claim 6 , wherein the second reference area is covered by a layer that is opaque to electromagnetic radiation.

8. 8. The method of any one of claims 1 to 7, further comprising the steps of: developing the relief precursor by removing unexposed material of the relief precursor; exposing a third reference area from a second side of the relief precursor for a predetermined exposure time with a predetermined intensity before the developing step; and verifying the third reference area after the developing step.

9. 9. The method of claim 8, wherein the second side of the precursor is covered by a layer that is opaque to electromagnetic radiation, and the third reference area is not covered by the layer or the layer is transparent to electromagnetic radiation in a region above the third reference area.

10. The method of any one of claims 1 to 9, wherein during the exposing step, the exposure intensity is constant and the exposure time is varied.

11. 11. The method according to any one of claims 1 to 10, wherein the exposing step is performed by an exposure unit comprising an electromagnetic radiation source and a movable shutter between the relief precursor and the electromagnetic radiation source, and wherein the exposure time during the exposing step is controlled by relative movement of the shutter with respect to the relief precursor.

12. 12. The method of claim 11, wherein during exposure, the shutter moves in the direction of the second position B from a start position where the shutter blocks the area between the first position A and the second position B to an end position where the shutter allows full exposure of the area between the first position A and the second position B.

13. 13. The method according to any one of claims 1 to 12, wherein during the exposing step, the exposure intensity is varied by exposing different areas between the first position A and the second position B with different exposure intensities.

14. The method according to any one of claims 1 to 13, wherein exposure to electromagnetic radiation is carried out through one or more radiation control layers (24) configured to at least partially block or reduce radiation emitted by an electromagnetic radiation source (23) onto said relief precursor P.

15. 15. The method of any one of claims 1 to 14, comprising developing the relief precursor by removing unexposed material of the relief precursor, wherein developing the relief precursor is performed by treating the unexposed material with a fluid and / or by heating the exposed precursor and transferring the unexposed material to another material.

16. 16. The method of any one of claims 1 to 15, wherein a thickness of the developed precursor is measured at a plurality of points between the first position A and the second position B to obtain a thickness profile, and determining one or more points among the plurality of points that represent the desired characteristic is based on the obtained thickness profile.

17. 17. The method according to any one of claims 1 to 16, wherein the relief precursor has a length direction and a width direction, and the first and second positions correspond to first and second edges extending in the width direction of the relief precursor.

18. A method according to any one of the preceding claims, wherein the exposing step is carried out so as to obtain a developed relief precursor having substantially a wedge shape.

19. 19. The method of any one of claims 1 to 18, wherein determining one or more of the plurality of points that represent the desired feature comprises measuring a thickness of the developed relief precursor by one of mechanical, optical and / or acoustic methods.

20. 20. A method for producing a relief structure, comprising the method of any one of claims 1 to 19, wherein the determined exposure time and / or exposure intensity is used to produce the relief structure.

21. 21. The method of claim 20, wherein the relief structure is a flexographic printing plate, a letterpress plate, a relief printing plate, a (flexible) printed circuit board, an electronic element, a microfluidic element, a microreactor, a migration cell, a photonic crystal, an optical element, or a Fresnel lens.

22. A system configured to determine an exposure time and / or exposure intensity to be used to obtain desired characteristics of a relief structure, in particular a desired floor thickness, comprising: a holding means (10) configured to support a relief precursor P; an exposure unit (20) configured to expose a first side of the relief precursor to electromagnetic radiation between a first position A and a second position B of the precursor; a control module (30) configured to control the values ​​of the exposure time and / or the exposure intensity at at least a plurality of points between the first position A and the second position B such that the exposure time and / or the exposure intensity varies along the plurality of points; a measuring unit (50) configured to measure the relief precursor to determine one or more points of the plurality of points that represent the desired feature; a determination module (60) configured to determine an exposure time and / or exposure intensity required for the desired feature based on the determined one or more points and the value set by the control module; Equipped with The control module (30) is configured to control the exposure unit (20) so that the exposure is performed continuously in a direction between the first position and the second position, thereby forming a continuously exposed area (15) between the first position and the second position.

23. 23. The system of claim 22, wherein the exposure unit comprises a back exposure means (20) configured to expose a back side of the relief precursor, and wherein the desired feature is a desired floor thickness.

24. 24. The system of claim 22 or 23, wherein the determination module (60) is configured to receive the exposure time and / or the exposure intensity as a function of a position along a line between the first position A and the second position B.

25. 25. The system of claim 24, wherein the function received by the decision module (60) is a linear function or a step function.

26. The system of any one of claims 22 to 25, wherein the exposure unit (20) comprises an electromagnetic radiation source (23) and one or more radiation control layers (24) configured to at least partially block or reduce radiation emitted by the electromagnetic radiation source (23) onto the relief precursor P.

27. 27. The system of claim 22, wherein the control module (30) is configured to control the exposure time such that the exposure time varies, and the exposure unit (20) is configured to expose at a constant exposure intensity.

28. 28. The system according to any one of claims 22 to 27, wherein the exposure unit comprises an electromagnetic radiation source (23) and a movable shutter (25) between the relief precursor P and the radiation source (23), and wherein the control module (30) is configured to control a relative movement M between the shutter (25) and the relief precursor so as to control the exposure time.

29. 29. The system of claim 28, wherein the control module (30) is configured to control movement of the shutter (25) from a start position where the shutter blocks an area between the first position A and the second position B toward the second position B to an end position where the shutter allows full exposure of the area between the first position A and the second position B.

30. The system of any one of claims 22 to 29, wherein the control module (30) is configured to vary the exposure intensity between different regions between the first position and the second position.

31. 31. The system of any one of claims 22 to 30, wherein the system comprises a developing unit configured to develop the exposed relief precursor to remove unexposed material, the developing unit (40) configured to treat the unexposed material of the relief precursor using a fluid and / or to heat the exposed precursor to transfer the unexposed material to another material.

32. 32. The system of claim 22, wherein the measurement unit (50) is configured to measure the thickness of the developed precursor at a plurality of points between the first position A and the second position B to obtain a thickness profile, and the determination module (60) is configured to determine one or more points among the plurality of points that represent the desired characteristic based on the obtained thickness profile.

33. The system of any one of claims 22 to 32, wherein the exposure unit (20) comprises at least one of a set of light tubes, a plurality of LEDs, and combinations thereof.

Images