Substrate Processing Equipment

Abstract

To make a turntable lighter with a simple structure while still being able to hold the substrate under normal circumstances.SOLUTION: A switching mechanism does not normally apply the magnetic field of a drive magnet to a rotating magnet 47c, and only applies the magnetic field of the drive magnet to the rotating magnet 47c when a substrate W is being transferred, thereby rotating each movable pin 29 to the transfer position. Therefore, under normal circumstances, each movable pin 29 is rotated to the holding position by the magnetic force from a fixed magnet 57. Only when the substrate W is being transferred, each movable pin 29 is rotated to the transfer position by the magnetic force of the switching mechanism. Since springs, cam plates, lifting plates, etc. are not required, the weight of the turntable can be reduced with a simple configuration.SELECTED DRAWING: Figure 7

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus that performs predetermined processing on substrates (hereinafter simply referred to as substrates), such as semiconductor wafers, substrates for liquid crystal displays and organic EL (Electroluminescence) display devices, glass substrates for photomasks, substrates for optical disks, substrates for magnetic disks, ceramic substrates, and substrates for solar cells, while supporting the substrates on a turntable and rotating them. [Background technology]

[0002] Conventionally, this type of device has been equipped with a rotating table, a motor, a processing liquid supply nozzle, multiple support pins, a first lifting plate, a spring, a cam plate, a shaft, a second lifting plate, and an air cylinder (see, for example, Patent Document 1).

[0003] The substrate processing apparatus supports a substrate on the upper surface of a turntable using a plurality of support pins. The lower surface of the substrate is spaced apart from the upper surface of the turntable. The substrate processing apparatus supplies a processing liquid to the substrate from a processing liquid supply nozzle while rotating the substrate together with the turntable using a motor. This allows the substrate to undergo a predetermined processing.

[0004] A plurality of support pins are attached to the outer periphery of the turntable so as to be rotatable around a vertical axis. Each support pin is rotatable between a holding position where it contacts and supports the periphery of the substrate and a transfer position where it transfers the substrate. Each holding pin has a shaft attached to it that protrudes horizontally from its body. The shaft is inserted into a hole in the cam plate. The cam plate is connected to a first lifting plate. The top surface of the first lifting plate is connected to the underside of the turntable by a spring. The spring is a compression coil spring that normally urges the first lifting plate downward so as to separate it from the underside of the turntable. Therefore, the first lifting plate is normally urged downward. As a result, the cam plate is moved downward, and the support pins are normally rotated to the holding position.

[0005] The first lift plate has a magnet attached to its underside. The second lift plate is positioned below the first lift plate at a distance. The second lift plate has a magnet attached to its upper surface. The magnets on the first and second lift plates are positioned with their repulsive poles facing each other. The second lift plate is moved by an air cylinder between a position close to the first lift plate and a position far away from it. The air cylinder normally retracts its operating shaft, positioning the second lift plate far from the first lift plate. When transferring a substrate, the air cylinder moves the second lift plate to a position close to the first lift plate. This causes the first lift plate to repel magnetic forces, compressing the spring and lifting the cam plate. Each support pin rotates to the transfer position accordingly.

[0006] In a substrate processing apparatus configured as described above, each support pin is maintained in its holding position under normal circumstances. Therefore, even if the air cylinder malfunctions or a power outage occurs, causing the air cylinder's operating shaft to retract, the substrate is still held on the turntable. As a result, the substrate does not come off the turntable, which has the advantage of preventing damage to the substrate. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] JP 2014-146747 A (Fig. 2) Summary of the Invention [Problem to be solved by the invention]

[0008] However, the conventional example having such a configuration has the following problems. That is, while conventional devices can hold a substrate under normal conditions, they hold the substrate using the elastic force of a spring, and then release the substrate by using magnetic force to release the elastic force. Therefore, because components such as springs, cam plates, and lifting plates are required, the structure of the turntable becomes complicated and heavy. Furthermore, during maintenance to replace multiple support pins that require periodic replacement, the turntable must be removed. Because the turntable is heavy, the burden on the worker during maintenance increases.

[0009] The present invention has been made in consideration of the above circumstances, and aims to provide a substrate processing apparatus that can hold substrates under normal conditions while reducing the weight of the turntable with a simple configuration.

[0010] The present invention has been made in view of the above circumstances, and has an object to provide a substrate processing apparatus that can hold and release a substrate by rotating it using only magnetic force. [Means for solving the problem]

[0011] In order to achieve the above object, the present invention has the following configuration: That is, in a substrate processing apparatus for performing a predetermined process on a substrate, the present invention comprises a turntable configured to be rotatable about a vertical axis, a rotation drive means for rotationally driving the turntable in a horizontal plane, and a holding mechanism for holding the substrate in a horizontal position while spaced apart from the upper surface of the turntable, the holding mechanism being rotatable about the vertical axis on the upper surface on the outer periphery of the turntable, and including a plurality of support pins that rotate between a holding position where they abut against the peripheral edge of the substrate to restrict movement of the substrate in the horizontal direction and a transfer position where they are spaced apart from the peripheral edge of the substrate to allow movement of the substrate, and a plurality of support pins that are configured to switch between the holding position and the transfer position by switching the magnetic poles of the surrounding magnetic fields. a first magnetic force unit that rotates each of the support pins at any time, and a second magnetic force unit that always applies a magnetic field to the first magnetic force unit to rotate each of the support pins to the holding position, a third magnetic force unit that has a magnetic force greater than that of the second magnetic force unit, and a switching mechanism that does not normally apply the magnetic field of the third magnetic force unit to the first magnetic force unit, and applies the magnetic field of the third magnetic force unit to the first magnetic force unit only when a substrate is to be transferred, to rotate each of the support pins to the transfer position, and further comprises a cover that is arranged below the turntable to cover the rotation drive means and is resistant to a processing liquid that is supplied to the substrate, the rotation drive means; The third magnetic portion is disposed within the cover. the first magnetic portion is disposed outside the cover, and the second magnetic portion is disposed outside the cover. It is characterized by the following.

[0012] [Actions and Effects] According to the present invention, the switching mechanism does not normally apply the magnetic field of the third magnetic unit to the first magnetic unit, but applies the magnetic field of the third magnetic unit to the first magnetic unit only when a substrate is being transferred, thereby rotating each support pin to the transfer position. Therefore, under normal circumstances, each support pin is rotated to the holding position by the magnetic force of the second magnetic unit. On the other hand, each support pin is rotated to the transfer position by the magnetic force of the third magnetic unit of the switching mechanism only when a substrate is being transferred. As a result, springs, cam plates, lift plates, etc. are not required, allowing for a simple configuration and a lightweight turntable. Furthermore, the lightweight turntable can be easily removed during maintenance to replace multiple support pins that require periodic replacement. This also reduces the burden on workers during maintenance.

[0013] Since the third magnetic part is disposed inside the cover, there is no need to provide chemical resistance to the third magnetic part, which helps to reduce costs. Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the upper surface of the cover has a downward recess, the lower part of the first magnetic force section and the lower part of the second magnetic force section are accommodated in the recess, and the third magnetic force section faces the first magnetic force section across the cover when magnetic force is applied to the first magnetic force section. Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the first magnetic force unit is connected to the lower end of the support pin protruding from the underside of the turntable, and the second magnetic force unit is arranged to the side of the first magnetic force unit on the underside of the turntable. The magnetic force of the second magnetic portion is applied to the first magnetic portion from the side, so the degree of rotation when the support pin is in the holding position can be easily adjusted by the position of the second magnetic portion.

[0014] The present specification also discloses the following invention relating to a substrate processing apparatus.

[0015] In the above-described substrate processing apparatus, it is preferable that the first magnetic force unit and the second magnetic force unit are arranged on the same circumference centered on the rotation center of the turntable in a plan view.

[0016] Both the first magnetic portion and the second magnetic portion are positioned so that they can be seen from the outer periphery, making maintenance easy.

[0019] Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the switching mechanism includes a lifting mechanism that raises and lowers the third magnetic force section, and that the lifting mechanism moves the third magnetic force section closer to the first magnetic force section and rotates the support pin to the transfer position by an upward movement, and moves the third magnetic force section away from the first magnetic force section and rotates the support pin to the holding position by a downward movement, and that the downward movement is the normal operation.

[0020] The lifting mechanism of the switching mechanism causes the third magnetic section to lift, rotating each support pin to the transfer position, and the lowering of the third magnetic section causes each support pin to rotate to the holding position. Normally, the lowering operation occurs, so even if the lifting mechanism stops operating due to a power outage or other reason and the lowering operation occurs, each support pin remains in the holding position. Therefore, the substrate does not come off the turntable, preventing damage to the substrate.

[0021] In the above-described substrate processing apparatus, it is preferable that the third magnetic force unit is disposed closer to the rotation center of the turntable than the first magnetic force unit and the second magnetic force unit in a plan view.

[0022] The third magnetic part can be positioned closer to the rotation center of the turntable, which allows for a more compact switching mechanism.

[0023] Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the turntable has a plurality of through holes penetrating from the top surface to the bottom surface, each support pin is inserted into the through hole, and the turntable is formed so that only the periphery of the through hole is lower than the top surface and has a cutout portion cut out toward the outer peripheral surface of the turntable.

[0024] The cutouts allow the processing liquid to be easily discharged laterally, preventing the processing liquid flowing laterally from the top surface of the turntable from accumulating at the locations where the support pins are attached, thereby preventing the generation of particles due to the accumulating processing liquid.

[0025] Furthermore, in the above-described substrate processing apparatus, the turntable is provided with a support plate that supports the support pins on the underside of the positions at which the support pins are arranged, and the support plate has one end that follows the arc of the turntable, another end that is on the opposite side of the arc of the turntable from the one end, an attachment portion for the support pin formed on the one end side, a round screw hole portion formed on the other end side for screwing to the turntable, and a long screw hole portion formed on the one end side and having a long axis in the radial direction of the turntable for screwing to the turntable, and it is preferable that the one end be moved in the radial direction of the turntable with the screw in the long screw hole portion loosened, to adjust the position of the support pin in the radial direction of the turntable.

[0026] With the screws in the long screw holes of the support plate loosened, one end can be moved in the radial direction of the turntable to adjust the position of the support pins in the radial direction of the turntable. This allows for easy adjustment to ensure proper support of the substrate in the radial direction. In other words, it allows for easy adjustment to eliminate so-called core wobble. As a result, the in-plane processing uniformity can be improved.

[0027] Furthermore, in the above-described substrate processing apparatus, the support pin preferably comprises a cylindrical shaft portion and a support piece formed on the upper portion of the shaft portion and abutting the underside and outer edge of the outer periphery of the substrate to support the substrate, the support piece preferably having an elliptical shape in a planar view, and when the support pin is rotated to the holding position, the long axis of the support piece preferably aligns with the outer edge of the turntable.

[0028] By rotating the support pins to the holding position, the long axes of the support pieces are aligned with the outer periphery of the turntable. This reduces air resistance on the support pieces when the turntable is rotating, and suppresses airflow turbulence around the support pins. As a result, uneven processing of the substrate at the periphery near the support pins can be suppressed. [Effects of the Invention]

[0029] In the substrate processing apparatus according to the present invention, the switching mechanism does not normally apply the magnetic field of the third magnetic unit to the first magnetic unit, but applies the magnetic field of the third magnetic unit to the first magnetic unit only when a substrate is being transferred, thereby rotating each support pin to the transfer position. Therefore, during normal operation, each support pin is rotated to the holding position by the magnetic force of the second magnetic unit. Meanwhile, each support pin is rotated to the transfer position by the magnetic force of the third magnetic unit of the switching mechanism only when a substrate is being transferred. As a result, springs, cam plates, lift plates, etc. are not required, allowing for a simple configuration and a lightweight turntable. Furthermore, the lightweight turntable allows for easy removal during maintenance to replace multiple support pins, which require periodic replacement. This also reduces the burden on workers during maintenance. [Brief explanation of the drawings]

[0030] [Figure 1] 1 is a diagram showing an overall configuration of a substrate processing apparatus according to an embodiment; [Figure 2] (a) is a plan view showing the entire turntable, and (b) is an enlarged view of a part of it. [Figure 3] (a) is a bottom view showing the entire turntable, and (b) is an enlarged view of a part of it. [Figure 4] FIG. [Figure 5] FIG. 101 is a cross-sectional view taken along the line 101-101 in FIGS. 4 and 6. [Figure 6] FIG. [Figure 7] FIG. 10 is a perspective view of the movable pin as seen from below. [Figure 8] FIG. [Figure 9] 10A and 10B are diagrams illustrating the positional relationship of magnets when the movable pin is held in a position; [Figure 10] 10A and 10B are diagrams illustrating the positional relationship of magnets at the transfer position of the movable pin. DETAILED DESCRIPTION OF THE INVENTION

[0031] An embodiment of the present invention will now be described with reference to the drawings.

[0032] Fig. 1 is a diagram showing the overall configuration of a substrate processing apparatus according to an embodiment. Fig. 2(a) is a plan view showing the entire turntable, and Fig. 2(b) is an enlarged view of a part thereof. Fig. 3(a) is a bottom view showing the entire turntable, and Fig. 3(b) is an enlarged view of a part thereof.

[0033] The substrate processing apparatus according to the embodiment is a single-wafer processing apparatus that processes each substrate W. This substrate processing apparatus includes a base unit 1, a chuck unit 3, a splash prevention cup 5, a supply nozzle 7, and a control unit 9.

[0034] The base unit 1 rotates the chuck unit 3 and releases the chuck unit 3 from holding the substrate W. The chuck unit 3 rotates while holding the substrate W in a horizontal position. The splash prevention cup 5 prevents the processing liquid supplied from the supply nozzle 7 to the substrate W from splashing around. The splash prevention cup 5 is raised and lowered between a processing height (solid line in FIG. 1) and a delivery height (two-dot chain line in FIG. 1) that is below the processing height.

[0035] The base unit 1 includes an electric motor 11 and a switching mechanism 13. The electric motor 11 and the switching mechanism 13 are disposed within a chemical-resistant cover 15. In other words, the cover 15 covers the electric motor 11 and the switching mechanism 13. Because the electric motor 11 and the switching mechanism 13 are disposed within the cover 15, there is no need to treat them to be resistant to the processing liquid or to construct them from materials resistant to the processing liquid. This allows the cost of the base unit 1 to be reduced.

[0036] The electric motor 11 has a rotating shaft 17 extending in the vertical direction. The rotating shaft 17 rotates around a vertical axis P1. The rotating shaft 17 is made of a conductive metal material. The rotating shaft 17 is electrically connected to a ground wire (not shown) so as to be conductive. The electric motor 11 outputs the rotational position of the rotating shaft 17 from an encoder 19. The rotating shaft 17 is rotatably supported by a bearing 21 and extends upward from the cover 15. A chuck unit 3 is attached to the upper part of the rotating shaft 17.

[0037] The chuck unit 3 described above corresponds to the "holding mechanism" in the present invention, and the electric motor 11 corresponds to the "rotation driving means" in the present invention.

[0038] The chuck unit 3 includes a rotating table 23 and a holding mechanism 25. As shown in FIG. 2(a), the rotating table 23 has a circular shape in a plan view. The rotating table 23 is made of, for example, a material that is resistant to the processing liquid supplied from the supply nozzle 7. Specifically, for example, fluororesin can be used. More specifically, PEEK (polyether ether ketone) can be used.

[0039] The holding mechanism 25 includes, for example, two fixed pins 27 and two movable pins 29. The rotating table 23 includes through holes 31 at positions corresponding to the two fixed pins 27 and the two movable pins 29. Each through hole 31 penetrates from the top surface to the bottom surface of the rotating table 23. The two fixed pins 27 and the two movable pins 29 are inserted into the through holes 31, respectively. The rotating table 23 has cutout portions 33 formed around the through holes 31. The cutout portions 33 are formed lower than the top surface of the rotating table 23. The cutout portions 33 are U-shaped in a plan view.

[0040] The cutout portion 33 allows the processing liquid to be easily discharged laterally. Therefore, the processing liquid flowing laterally from the upper surface of the turntable 23 can be prevented from accumulating at the locations where the fixed pins 27 and the movable pins 29 are attached. Therefore, it is possible to prevent particles from being generated due to the accumulating processing liquid.

[0041] The fixed pin 27 and the movable pin 29 correspond to the "support pin" in the present invention.

[0042] Reference is now made to Figure 4. Figure 4 is a longitudinal cross-sectional view of the fixing pin.

[0043] The fixed pin 27 includes a lower pin portion 35 and an upper pin portion 37. The lower pin portion 35 is provided at the bottom of the rotating table 23. The lower pin portion 35 is connected to the upper pin portion 37 via the through-hole 31. The lower pin portion 35 includes a pin support portion 35a, a fixing screw 35b, a balance weight 35c, a cover member 35d, and a fixed seal 35e. A fixing screw 35b is threaded into the top of the pin support portion 35a to fix the upper pin portion 37 to the pin support portion 35a. A balance weight 35c is attached to the bottom of the fixing screw 35b. The balance weight 35c is used to balance the weight of the movable pin 29. A cover member 35d is attached to the bottom of the balance weight 35c. The cover member 35d fixes the balance weight 35c to the pin support portion 35a. Lid member 35d is fixed to pin support portion 35a by stationary seal 35e. Upper pin portion 37 is attached to the upper portion of pin support portion 35a via stationary seal 35f. Stationary seal 35f prevents processing liquid from entering the interior and corroding fixing screws 35b and the like.

[0044] The upper pin portion 37 includes a shaft portion 37a and a support piece 37b. The support piece 37b includes a protrusion 37c. The shaft portion 37a is fixed to the pin support portion 35a by a fixing screw 35b while placed on the fixed seal 35f. The support piece 37b has an elliptical shape in a plan view. The support piece 37b abuts against the lower surface and outer edge of the outer periphery of the substrate W to support the substrate W. The support piece 37b has an inclined surface 37d formed on the axis P1 side. The inclined surface 37d has an inclination that gradually increases from the axis P1 toward the outer periphery of the turntable 23. The inclined surface 37d abuts against the lower surface of the substrate W. The support piece 37b has a protrusion 37c formed on the outer periphery side of the fixing screw 35b in a plan view. The protrusion 37c abuts against the outer periphery of the substrate W to restrict outward movement of the substrate W. The fixing pin 27 is attached so that the major axis of the elliptical shape of the support piece 37b is aligned along the outer periphery of the turntable 23.

[0045] The fixed pin 27 has a shim 39 that can be inserted into the contact portion between the upper pin portion 37 and the upper surface of the pin support portion 35a. The shim 39 is a thin stainless steel plate. The height of the upper pin portion 37 of the fixed pin 27 from the upper surface of the turntable 23 can be adjusted by changing the shims 39 to ones with different thicknesses or by increasing or decreasing the number of shims 39. This allows the support height of the substrate W to be adjusted, and the substrate W can be adjusted so that it is horizontal. The fixed seals 35e and 35f are elastic members that are chemical-resistant. Specifically, the fixed seals 35e and 35f are preferably made of, for example, fluororubber (vinylidene fluoride (FKM), tetrafluoroethylene-propylene (FEPM), tetrafluoroethylene-vinyl ether (FFKM), etc.

[0046] As shown in FIG. 3(a), the lower pin portion 35 of the fixing pin 27 is screwed to the underside of the rotating table 23 via a pin cover 41. Note that, for illustrative purposes, the pin cover 41 is not shown in FIG. 4. Of the components constituting the fixing pin 27 described above, the pin support portion 35a and the support piece 37b are preferably made of a chemical-resistant conductive material. More preferably, they are made of a conductive PEEK material containing carbon nanotubes. This ensures conductivity.

[0047] Ground wires 43 are provided on the underside of the rotating table 23. Specifically, as shown in FIGS. 2(a) and 3(a), four ground wires 43 are arranged to provide electrical continuity between the two fixed pins 27 and the two movable pins 29. The ground wires 43 are electrically conductive and are preferably made of a conductive PEEK material containing carbon nanotubes. The outer peripheral ends of the ground wires 43 are attached to the pin support portion 35a so as to be electrically connected. The end of the ground wire 43 on the axis P1 side is attached to the rotating shaft 17 so as to be electrically connected. The rotating shaft 17 is connected to the ground wires via the electric motor 11.

[0048] Now, reference is made to Fig. 5. Fig. 5 is a cross-sectional view taken along the line 101-101 in Figs.

[0049] The turntable 23 has a groove 45 formed on its underside so as to have a cross shape in a plan view. The groove 45 has an inverted trapezoidal cross section. The above-mentioned ground wire 43 is fitted into the groove 45. The cross section of the ground wire 43 is shaped so that it roughly matches the groove 45. The ground wire 43 is formed to have an outer shape slightly smaller than the groove 45. Therefore, the ground wire 43 can be attached to the groove 45 by passing it through the groove 45 in the radial direction along the surface of the turntable 23. This allows the ground wire 43 to be loosely passed through the groove 45. This prevents the phenomenon of deformation over time when a load is applied (called creep), which can occur in resin materials. This prevents the ground wire 43 from deforming and becoming less conductive.

[0050] If the turntable 23 is made of a non-conductive material such as PEEK, the attached particles may become electrically charged and become difficult to detach. This can cause the substrate W to become contaminated with particles. In this embodiment, the fixed pin 27 and the movable pin 29 described below are grounded by providing a ground wire 43. This prevents charging and thus the above-mentioned problem. Furthermore, although conductive PEEK material containing carbon nanotubes is very expensive, in this embodiment, only a portion of the turntable 23 that is cross-shaped in plan view is made of conductive PEEK material, rather than the entire turntable 23. This prevents the above-mentioned problem while keeping costs down.

[0051] Next, reference is made to Figure 6. Figure 6 is a vertical cross-sectional view of the movable pin.

[0052] The movable pin 29 includes a lower pin portion 47 and an upper pin portion 49. The lower pin portion 47 is provided at the bottom of the rotating table 23. The lower pin portion 47 is connected to the upper pin portion 49 via the through-hole 31. The lower pin portion 47 includes a pin support 47a, a rotary magnet 47c, a cover member 47d, a fixed seal 47e, a bearing 47f, a fixed seal 47g, and a cylindrical member 47h.

[0053] A fixing screw 47b is threaded into the upper portion of the pin support portion 47a to fix the upper pin portion 49 to the pin support portion 47a. A rotary magnet 47c is attached to the lower portion of the fixing screw 47b. The rotary magnet 47c is connected to the lower end of the movable pin 29. As will be described later, this rotary magnet 47c rotates the movable pin 29 by switching the magnetic poles around it. A cover member 47d is attached to the lower portion of the rotary magnet 47c. The cover member 47d fixes the rotary magnet 47c to the pin support portion 47a. The cover member 47d is fixed to the pin support portion 47a by a fixed seal 47e. The pin support portion 47a is attached to the through hole 31 by a fixed seal 47g via a bearing 47f and a cylindrical member 47f. The pin support portion 47a is fixed only to the inner ring of the bearing 47f, and not to the outer ring of the bearing 47f. The outer ring of the bearing 47f is fixed to the through hole 31. The cylindrical member 47 is attached to the upper part of the pin support portion 47a with the lower surface thereof spaced apart from the upper surface of the pin support portion 47a.

[0054] The cylindrical member 47h is fixed only to the outer ring of the bearing 47f and the underside of the turntable 23. The underside of the cylindrical member 47h is positioned away from the pin support 47a. The bearing 47f does not have a seal between its inner and outer rings. Therefore, fluid can pass through the bearing 47f between the inner and outer rings. The bearing 47f is made of a material that is resistant to the processing liquid. For example, the inner and outer rings of the bearing 47f are preferably made of conductive resin. The bearing 47f is preferably made of a conductive PEEK material containing carbon nanotubes. Furthermore, the rolling elements of the bearing 47f are preferably made of silicon carbide (SiC) to ensure wear resistance and conductivity. The fluid that flows down the bearing 47f is discharged to the surrounding area through a flow path 47i in the gap between the underside of the cylindrical member 47h and the pin support 47a. Therefore, in combination with the effect of the notch 33, it is possible to more effectively prevent the processing liquid from accumulating at the base of the movable pin 29 on the turntable 23.

[0055] The upper pin portion 49 includes a shaft portion 49a and a support piece 49b. The support piece 49b includes a protrusion 49c. The shaft portion 49a is fixed to the pin support portion 47a by a fixing screw 47b while being placed on a fixed seal 47g. The support piece 47b has an elliptical shape in a plan view. The support piece 47b abuts against the lower surface and outer edge of the outer periphery of the substrate W to support the substrate W. The support piece 47b has an inclined surface 49d formed on the axis P1 side. The inclined surface 49d is gradually inclined from the axis P1 toward the outer periphery of the turntable 23. The inclined surface 49d abuts against the lower surface of the substrate W. The support piece 49b has a protrusion 49c formed on the outer periphery side of the fixing screw 47b in a plan view. The protrusion 49c abuts against the outer periphery of the substrate W to restrict outward movement of the substrate W. Like the fixed pin 27, the movable pin 29 can have a shim 51 inserted into the contact portion between the upper pin portion 49 and the upper surface of the pin support portion 47a. The height of the upper pin portion 49 of the movable pin 29 from the upper surface of the turntable 23 can be adjusted by changing the shims 51 to ones with different thicknesses or by increasing or decreasing the number of shims 51. This allows the surface height of the substrate W to be adjusted. This is also called surface wobble adjustment. The material of the fixed seals 47e and 47g is preferably the same as that of the fixed seals 35e and 35f described above. The movable pin 29 is configured to be rotatable around the axis P2 by means of a bearing 47f.

[0056] As shown in Figures 3(a) and 3(b), the lower pin portion 47 of the movable pin 29 is fixed to the underside of the turntable 23 by a support plate 53 with screws. Note that the support plate 53 is not shown in Figure 6 for illustrative purposes. Of the components that make up the movable pin 29 described above, the lower pin portion 47 and the upper pin portion 37 are preferably made of a chemical-resistant conductive material. More preferably, they are made of a conductive PEEK material containing carbon nanotubes. This ensures conductivity.

[0057] The movable pin 29 is attached so that, when rotated to the holding position, the long axis of the elliptical shape of the support piece 49b is aligned along the outer periphery of the turntable 23, similar to the fixed pin 27. Therefore, when the movable pin 29 is rotated to the holding position, the long axes of the support pieces 37b, 49b are aligned along the outer periphery of the turntable 23. Therefore, air resistance at the support pieces 37b, 49b can be reduced when the turntable 23 rotates, and turbulence of the airflow around the fixed pin 27 and the movable pin 29 can be suppressed. As a result, uneven processing at the peripheral portion of the substrate W near the fixed pin 27 and the movable pin 29 can be suppressed.

[0058] 2(a) and 3(a), the outer peripheral end of the ground wire 43 is attached so as to be electrically connected to the lower pin portion 47. The end of the ground wire 43 on the axis P1 side is attached so as to be electrically connected to the rotating shaft 17.

[0059] Please refer to Figures 3 and 7. Figure 7 is a perspective view of the movable pin as seen from below.

[0060] The support plate 53 has one end 53a, the other end 53b, an attachment portion 53c, a round screw hole 53d, and an elongated screw hole 53e. The support plate 53 is made of a material that is resistant to the processing liquid. The material is preferably a fluororesin, and more preferably PEEK.

[0061] One end 53a is a portion of the support plate 53 along an arc that corresponds to the outer periphery of the rotating table 23. The other end 53b is a portion on the opposite side of the one end 53a in the arc that corresponds to the outer periphery of the rotating table 23. The mounting portion 53c is a portion formed on the one end 53a side to which the movable pin 29 is attached. The round screw hole portion 53d is formed on the other end 53b side and is an attachment hole for screwing to the rotating table 23. The elongated screw hole portion 53e is formed on the one end 53a side and is an attachment hole for screwing to the rotating table 23. The hole is an elongated hole with a long axis in the radial direction of the rotating table 23.

[0062] As described above, the support plate 53 has the elongated screw hole 53e. Therefore, with the screw in the elongated screw hole 53e loosened, the one end 53a can be moved in the radial direction of the turntable 23 to adjust the position of the movable pin 29 in the radial direction of the turntable 23. This allows easy adjustment so that the support of the substrate W in the radial direction of the turntable 23 is appropriate. In other words, adjustment can be easily made so that the center of rotation of the turntable 23 and the center of the substrate W coincide with each other, eliminating so-called "center wobble." As a result, the in-plane processing uniformity of the substrate W can be improved.

[0063] The support plate 53 has a storage section 55 formed adjacent to the mounting section 53c. The storage section 55 is located on the underside of the turntable 23 and is formed to the side of the rotary magnet 47c. The storage section 55 houses a fixed magnet 57. The fixed magnet 57 constantly applies a magnetic field to the rotary magnet 47c. The rotary magnet 47c, to which the magnetic field is applied by the fixed magnet 57, is attracted by the magnetic force of the fixed magnet 57, rotates, and comes to rest in a stable state. Therefore, the movable pin 29 rotates around the axis P2 and comes to rest. This position is the holding position. The holding position is a position where the protrusion 49c abuts against the edge of the substrate W, as shown by the solid line in FIG. 2(b). On the other hand, the transfer position is a state where the movable pin 29 rotates around the axis P2, the protrusion 49c is separated from the edge of the substrate W, and the lower peripheral edge of the substrate W abuts against the inclined surface 49d and is supported, as shown by the two-dot chain line in FIG. 2(b). Therefore, when the movable pin 29 is in the delivery position, a transport arm (not shown) can deliver the substrate W. Since the fixed magnet 57 is disposed to the side of the rotating magnet 47c, the degree of rotation when the movable pin 29 reaches the holding position can be easily adjusted by the position of the fixed magnet 57.

[0064] As shown in Figures 3(a) and 3(b), the fixed magnet 57 and the rotary magnet 47c are arranged on the same circumference centered on the rotation center P1 of the turntable 23 in a plan view. Because of this arrangement, both the fixed magnet 57 and the rotary magnet 47c can be seen from the outer periphery, as shown in Figure 7. This makes maintenance easy.

[0065] Please refer to Figures 1 and 8 to 10. Figure 8 is a plan view of the switching mechanism. Figure 9 is a diagram showing the positional relationship of the magnets when the movable pin is in the holding position. Figure 10 is a diagram showing the positional relationship of the magnets when the movable pin is in the delivery position.

[0066] The switching mechanism 13 includes an air cylinder 59, a support arm 61, and a drive magnet 63. The air cylinder 59 includes an operating shaft 65 that extends and contracts in the vertical direction. The support arm 61 is attached to the operating shaft 65. The support arm 61 has a length that spans the two movable pins 29. Drive magnets 63 are attached to both ends of the support arm 61. In a plan view, the drive magnet 63 is located closer to the inner periphery of the turntable 23 than the rotating magnet 47c. In other words, the drive magnet 63 is arranged closer to the axis P1 of the turntable 23 than the rotating magnet 47c and the fixed magnet 57. The drive magnet 63 generates a stronger magnetic force than the fixed magnet 57.

[0067] When the switching mechanism 13 is at the holding position for holding the substrate W, it retracts the operating shaft 65 of the air cylinder 59 so that the drive magnet 63 is positioned at the lowered position shown by the solid line in Fig. 1. This state is the position in the normal state, and is the state that is reached when the power supply is cut off due to, for example, a power outage or power supply trouble. In plan view, the positional relationship is as shown in Fig. 9. That is, a magnetic force is applied to the rotary magnet 47c of the movable pin 29 by only the fixed magnet 57, and the rotary magnet 47c and the fixed magnet 57 are attracted to each other by the magnetic force, causing the movable pin 29 to rotate to the holding position.

[0068] On the other hand, at the transfer position where the substrate W is released, the switching mechanism 13 extends the operating shaft 65 of the air cylinder 59 so that the drive magnet 63 is positioned at the raised position shown by the two-dot chain line in Fig. 1. In plan view, this results in the positional relationship shown in Fig. 10. That is, a magnetic force greater than that imparted to the rotary magnet 47c of the movable pin 29 by the drive magnet 63 is applied to the rotary magnet 47c by the fixed magnet 57. Then, the rotary magnet 47c is attracted to the drive magnet 63, and the movable pin 29 is rotated to the transfer position.

[0069] The above-mentioned rotating magnet 47c, fixed magnet 57, and drive magnet 63 are preferably neodymium magnets. Neodymium magnets are rare earth magnets whose main components are neodymium, iron, and boron. Neodymium magnets generate a strong magnetic field.

[0070] In a plan view, the switching mechanism 13 is disposed closer to the axis P1 of the turntable 23 than the rotary magnet 47c and the fixed magnet 57. Therefore, the drive magnet 63 can be disposed closer to the axis P1 of the turntable 23. This allows the switching mechanism 13 to be made smaller.

[0071] The above-mentioned rotating magnet 47c corresponds to the "first magnetic force section" in the present invention, the fixed magnet 57 corresponds to the "second magnetic force section" in the present invention, and the drive magnet 63 corresponds to the "third magnetic force section" in the present invention.

[0072] The control unit 9 is composed of a CPU, memory, etc. The control unit 9 controls the supply of processing liquid from the supply nozzle 7 and the oscillation of the supply nozzle 7 between the standby position and the supply position. The standby position is a position where the discharge port of the supply nozzle 7 is above the axis P1 as shown in FIG. 1. The standby position is a position where the discharge port of the supply nozzle 7 is laterally spaced from the splash prevention cup 5. The control unit 9 controls the elevation of the splash prevention cup 5 between the processing height and the transfer height. The control unit 9 controls the rotation of the electric motor 11. For example, the control unit 9 increases the rotation speed at a predetermined acceleration toward the processing speed, and once the processing speed is reached, maintains the processing speed for the processing time. After the processing time has elapsed, the control unit 9 decreases the rotation speed at a predetermined negative acceleration and stops the motor. The control unit 9 receives a signal from the encoder 19. When stopping the electric motor 11, the control unit 9 refers to the output from the encoder 19. The control unit 9 stops the electric motor 11 so that it is in the positional relationship shown in FIG. 8. Specifically, the rotation of the electric motor 11 is controlled so that the rotary magnets 47c of the two movable pins 29 and the drive magnet 63 of the switching mechanism 13 face each other in the radial direction of the turntable 23. The control unit 9 controls the elevation and lowering of the drive magnet 63 by the switching mechanism 13.

[0073] The substrate processing apparatus having the above-described configuration processes the substrate W, for example, as follows. Note that, under normal circumstances, the control unit 9 does not operate the switching mechanism 13. That is, the drive magnet 63 is located in the lowered position shown by the solid line in FIG. 1. Under normal circumstances, the rotary magnet 47c is attracted and rotated by the magnetic force of the fixed magnet 57, as shown in FIG. 9. Therefore, the movable pin 29 is in the holding position shown by the solid line in FIG. 2(b).

[0074] The control unit 9 moves the anti-scattering cup to the delivery height and operates the switching mechanism 13 to move the drive magnet 63 to the raised position. The raised position is the position shown by the two-dot chain line in FIG. 1. Then, as shown in FIG. 10, the rotary magnet 47c is attracted by the drive magnet 63. Therefore, the movable pin 29 is set to the delivery position shown by the two-dot chain line in FIG. 2(b).

[0075] The control unit 9 moves a transport arm (not shown) holding the substrate W to be processed above the turntable 23, and then lowers the transport arm to place the substrate W on the inclined surface 37d of the fixed pin 27 and the inclined surface 49d of the movable pin 29.

[0076] The above operation corresponds to the "transfer process" in the present invention.

[0077] After the transport arm retracts outward, the control unit 9 raises the anti-scattering cup to the processing height. The control unit 9 operates the switching mechanism 13 to lower the drive magnet 63 to the lowered position shown by the solid line in FIG. 1. Then, as shown in FIG. 9, the rotary magnet 47c is released from attraction by the drive magnet 63. Therefore, the rotary magnet 47c is attracted by the magnetic force of the fixed magnet 57 and rotated. This places the movable pin 29 in the holding position shown by the solid line in FIG. 2(b).

[0078] The above operation corresponds to the "holding process" of the present invention.

[0079] The control unit 9 operates the supply nozzle 7 to swing the supply nozzle 7 from the standby position to the processing position, and then causes the supply nozzle 7 to supply the processing liquid while rotating the electric motor 11 at the processing speed, thereby performing processing while supplying the processing liquid to the substrate W for the processing time.

[0080] The above operation corresponds to the "processing step" in the present invention.

[0081] After a predetermined time has elapsed, the substrate W is unloaded by performing the above series of operations in reverse.

[0082] According to this embodiment, the switching mechanism 13 does not normally apply the magnetic field of the drive magnet 63 to the rotary magnet 47c, but only applies the magnetic field of the drive magnet 63 to the rotary magnet 47c when the substrate W is being transferred, thereby rotating each movable pin 29 to the transfer position. Therefore, during normal operation, each movable pin 29 is rotated to the holding position by the magnetic force of the fixed magnet 57. On the other hand, each movable pin 29 is rotated to the transfer position by the magnetic force of the drive magnet 63 of the switching mechanism 13 only when the substrate W is being transferred. As a result, springs, cam plates, lift plates, etc. are not required, allowing for a simple configuration and a lightweight turntable. Furthermore, the lightweight turntable 23 allows for easy removal during maintenance to replace the two fixed pins 27 and two movable pins 29, which require periodic replacement. This also reduces the burden on the worker during maintenance.

[0083] The present invention is not limited to the above-described embodiment, but can be modified as follows.

[0084] (1) In the above-described embodiment, the rotary magnet 47c and the fixed magnet 57 are arranged on the same circumference with the axis P1 as the center. However, the present invention is not limited to this configuration. In other words, the rotary magnet 47c and the fixed magnet 57 may be arranged in the radial direction of the turntable 23.

[0085] (2) In the above-described embodiment, the fixed magnet 57 is disposed to the side of the rotary magnet 47c. However, the present invention is not limited to this configuration. In other words, the position of the fixed magnet 57 is not limited as long as it can rotate the movable pin 29 to the holding position by applying a magnetic field to the rotary magnet 47c.

[0086] (3) In the above-described embodiment, the switching mechanism 13 is configured with the air cylinder 59, but the present invention is not limited to this configuration. In other words, any configuration may be used as long as it can move the drive magnet 63 between a position close to the rotary magnet 47c and a position distant from the rotary magnet 47c.

[0087] (4) In the above-described embodiment, the rotary table 23 has the notch 33, but this configuration is not essential to the present invention.

[0088] (5) In the above-described embodiment, the support plate 53 is configured to adjust the position of the movable pin 29 in the radial direction of the turntable 23. However, this configuration is not essential to the present invention. If so-called core wobble does not significantly affect processing, this configuration may be omitted to reduce costs.

[0089] (6) In the above-described embodiment, the support pieces 37b and 49b of the fixed pin 27 and the movable pin 29 have an elliptical shape in a plan view. However, the present invention is not limited to this configuration. For example, the support pieces 37b and 49b may have a circular shape in a plan view.

[0090] (7) In the above-described embodiment, the chuck unit 3 is provided with two fixed pins 27 and two movable pins 29. However, the present invention is not limited to this number.

[0091] (8) In the above-described embodiment, the substrate processing apparatus performs processing by supplying a processing liquid through the supply nozzle 7. However, the present invention can be applied to any substrate processing apparatus that performs a predetermined process while rotating the substrate W. [Industrial Applicability]

[0092] As described above, the present invention is suitable for a substrate processing apparatus and a substrate processing method that perform a predetermined process on a substrate while the substrate is supported on a turntable. [Explanation of symbols]

[0093] W: Substrate 1 … Base unit 3... Chuck unit 5...Shatterproof cup 7 ... supply nozzle 9...Control section 11... Electric motor 13...Switching mechanism 15... Cover 17...rotation axis 23... Rotating table 25 … Holding mechanism 27 ... Fixing pin 29... Movable pin 31 ... Through hole 33 ... Cutout 35... Lower pin part 37 ... Upper pin part 37a … Shaft part 37b … Support piece 37d… Slanted surface 41 ... Pin cover 43... Ground wire 47 ... Lower pin part 47c... Rotating magnet 49 ... Upper pin part 49a ... Shaft 49b … Support piece 49d… Slanted surface 53 ... Support plate 57... Fixed magnet 59...Air cylinder 63 ... Drive magnet

Claims

1. A substrate processing apparatus for performing a predetermined process on a substrate, a rotating table configured to be rotatable around a vertical axis; a rotation driving means for rotating the rotary table in a horizontal plane; a holding mechanism that holds the substrate in a horizontal position while spaced apart from the upper surface of the turntable; Equipped with The holding mechanism includes: a plurality of support pins that are rotatably provided around a vertical axis on the upper surface of the outer periphery of the turntable, and that rotate between a holding position where they contact the periphery of the substrate to restrict horizontal movement of the substrate, and a transfer position where they are spaced apart from the periphery of the substrate to allow movement of the substrate; a first magnetic portion that rotates each of the support pins between the holding position and the delivery position by switching the surrounding magnetic poles; a second magnetic force unit that constantly applies a magnetic field to the first magnetic force unit to rotate each of the support pins to the holding position; Equipped with a switching mechanism including a third magnetic force unit having a magnetic force greater than that of the second magnetic force unit, which does not normally apply the magnetic field of the third magnetic force unit to the first magnetic force unit, and applies the magnetic field of the third magnetic force unit to the first magnetic force unit only when a substrate is transferred, thereby rotating each of the support pins to the transfer position; Equipped with a cover disposed below the turntable to cover the rotation drive means, the cover having resistance to a processing liquid supplied to the substrate; the rotation driving means and the third magnetic portion are disposed within the cover, the first magnetic portion is disposed outside the cover, The substrate processing apparatus is characterized in that the second magnetic force unit is disposed outside the cover.

2. In the substrate processing apparatus according to claim 1, The upper surface of the cover has a downward recess, a lower portion of the first magnetic force portion and a lower portion of the second magnetic force portion are accommodated in the recess; The substrate processing apparatus according to claim 1, wherein the third magnetic force unit faces the first magnetic force unit across the cover when a magnetic force is applied to the first magnetic force unit.

3. In the substrate processing apparatus according to claim 1 or 2, the first magnetic portion is connected to a lower end of the support pin protruding from a lower surface of the rotary table, The substrate processing apparatus is characterized in that the second magnetic force unit is disposed on the lower surface of the rotary table to the side of the first magnetic force unit.

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