Heat Treatment Equipment

Abstract

To provide a technique which can enhance uniformity in heat treatment.SOLUTION: A heat treatment apparatus comprises: a treatment container which has a roofed cylindrical shape with an opening at a lower end, and which internally forms a first space; a lid which closes the opening at the lower end; a support part which is provided so as to penetrate the lid, and which has a shaft part and a mounting part located on the shaft part; a boat which is disposed on the mounting part, and which holds a plurality of substrates in a manner vertically aligned on multiple stages; a partition member which is provided in the vicinity of the shaft part with a gap between itself and a lower surface of the mounting part so as to form a second space that is partitioned from the first space; and a heat insulation material provided in the second space. The treatment container has an exhaust port on a portion of its lateral wall. In the circumferential direction of the treatment container, the gap has: a first gap including at least an angular position where the exhaust port is provided; and a second gap provided at an angular position excluding that of the first gap. The first gap is wider than the second gap.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to a thermal processing apparatus. [Background technology]

[0002] A substrate processing apparatus is known that houses a boat holding a plurality of substrates arranged in multiple stages in a reaction vessel having an opening at the bottom, and performs a heat treatment on the plurality of substrates with the opening closed by a lid (see, for example, Patent Document 1). In Patent Document 1, a cover is provided to cover the lid, and a heat insulating section is installed in the space covered by the cover. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. 2018 / 150537 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique that can improve the uniformity of heat treatment. [Means for solving the problem]

[0005] A heat treatment apparatus according to one embodiment of the present disclosure comprises a processing vessel having a cylindrical shape with a ceiling and an open lower end, forming a first space inside; a lid that covers the opening at the lower end; a support portion that penetrates the lid, the support portion having an axis portion and a mounting portion located on top of the axis portion; a boat that is placed on the mounting portion and holds multiple substrates arranged in multiple tiers in the vertical direction; a partition member that is arranged around the axis portion with a gap between it and the underside of the mounting portion, forming a second space that is partitioned from the first space; and an insulating material that is arranged in the second space; the processing vessel has an exhaust port in a portion of its side wall, and in the circumferential direction of the processing vessel, the gap includes at least a first gap that includes an angular position where the exhaust port is provided, and a second gap that is provided at an angular position excluding the first gap, and the first gap is wider than the second gap. [Effects of the Invention]

[0006] According to the present disclosure, the uniformity of the heat treatment can be improved. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a schematic view showing a heat treatment apparatus according to the first embodiment. [Figure 2] FIG. 2 is a cross-sectional view taken along the line II-II in FIG. [Figure 3] FIG. 3 is a cross-sectional view taken along the line III-III in FIG. [Figure 4] FIG. 4 is a perspective view of the plate as seen obliquely from above. [Figure 5] FIG. 5 is a schematic view showing a heat treatment apparatus according to the second embodiment. [Figure 6] FIG. 6 is a perspective view of the partition member as seen obliquely from above. [Figure 7] FIG. 7 is a schematic view showing a heat treatment apparatus according to the third embodiment. [Figure 8] FIG. 8 is a perspective view showing the protruding portion. [Figure 9] FIG. 9 is a schematic view showing a heat treatment apparatus according to the fourth embodiment. [Figure 10] FIG. 10 is a perspective view of the plate as seen obliquely from above. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding reference numerals are used to designate the same or corresponding members or components, and redundant descriptions will be omitted.

[0009] [First embodiment] A heat treatment apparatus according to a first embodiment will be described with reference to Fig. 1 to Fig. 4. Fig. 1 is a schematic view showing the heat treatment apparatus according to the first embodiment. Fig. 2 is a cross-sectional view taken along the line II-II in Fig. 1. Fig. 3 is a cross-sectional view taken along the line III-III in Fig. 1. Fig. 4 is a perspective view of a plate viewed obliquely from above.

[0010] The heat treatment apparatus 1A according to the first embodiment is a batch-type apparatus that performs heat treatment on multiple substrates W at once. The substrates W are, for example, semiconductor wafers. The heat treatment is, for example, a film formation process. The heat treatment apparatus 1A includes a processing vessel 10, a gas supply unit 30, a heating unit 50, a heat insulation unit 60, and a control unit 90.

[0011] The processing chamber 10 can have a reduced pressure inside and accommodates a substrate W. The processing chamber 10 has an inner tube 11 and an outer tube 12.

[0012] The inner tube 11 has a cylindrical shape with a ceiling and an open lower end. The outer tube 12 has a cylindrical shape with a ceiling and an open lower end that covers the outside of the inner tube 11. The inner tube 11 and the outer tube 12 are arranged coaxially to form a double-tube structure. The inner tube 11 and the outer tube 12 are made of, for example, quartz.

[0013] The inner tube 11 has a first cylindrical portion 11a, an expanded diameter portion 11b, a second cylindrical portion 11c, and a top plate 11d. The first cylindrical portion 11a, the expanded diameter portion 11b, and the second cylindrical portion 11c are arranged in this order from top to bottom. The first cylindrical portion 11a is arranged to include a height region from above the upper end of a boat 18 (described later) to the lower end of the boat 18. The first cylindrical portion 11a has a first inner diameter. The expanded diameter portion 11b is located below the first cylindrical portion 11a. The expanded diameter portion 11b expands from the first inner diameter to a second inner diameter from top to bottom. The second inner diameter is larger than the first inner diameter. The second cylindrical portion 11c is located below the expanded diameter portion 11b. The second cylindrical portion 11c has a second inner diameter. The top plate 11d closes the opening at the upper end of the first cylindrical portion 11a.

[0014] The inner pipe 11 has a protrusion 11e formed by protruding a portion of the side wall outward. The protrusion 11e is formed along the longitudinal direction (vertical direction) of the inner pipe 11. The protrusion 11e forms an accommodation section therein for accommodating an injector 31, which will be described later. A rectangular exhaust port 11f extending along the vertical direction is formed in the side wall of the inner pipe 11 opposite the protrusion 11e. Specifically, the exhaust port 11f is formed to extend from the first cylindrical portion 11a to near the upper end of the second cylindrical portion 11c of the inner pipe 11. The processing gas in the processing vessel 10 is exhausted through the exhaust port 11f.

[0015] The lower end of the outer tube 12 is supported by an annular flange member 13 made of, for example, stainless steel, and is airtightly attached via a sealing member 15 such as an O-ring. A circular plate-shaped support member 12a is provided on the inner wall below the outer tube 12. The support member 12a supports the lower end of the inner tube 11. A gas outlet 12b is provided on the side wall of the outer tube 12, above the support member 12a. An exhaust passage (not shown) is connected to the gas outlet 12b. A pressure adjustment valve and a vacuum pump (neither of which are shown) are sequentially installed in the exhaust passage. A lid 14 is airtightly attached to the opening at the lower end of the outer tube 12 via a sealing member 68 such as an O-ring. The lid 14 airtightly closes the opening at the lower end of the processing vessel 10, i.e., the opening of the outer tube 12. The lid 14 is made of a metal such as stainless steel.

[0016] A rotation mechanism 16 is provided in the center of the lid 14. The rotation mechanism 16 includes, for example, a magnetic fluid seal. An arm (not shown) of a lifting mechanism consisting of a boat elevator is connected to the lower part of the rotation mechanism 16. The rotation mechanism 16 moves up and down by raising and lowering the arm. A support part 17 is connected to the upper part of the rotation mechanism 16. The support part 17 is rotatable relative to the lid 14. The support part 17 is made of, for example, quartz. The support part 17 has a shaft part 17a and a mounting part 17b. The lower part of the shaft part 17a is connected to the rotation mechanism 16. The mounting part 17b is located above the shaft part 17a. The mounting part 17b has a disk shape with a larger diameter than the shaft part 17a when viewed in a plan view from above. The mounting part 17b supports the boat 18. The boat 18 holds a plurality of (e.g., 25 to 200) substrates W arranged in multiple stages in a vertical direction in a horizontal position. The boat 18 is made of, for example, quartz or silicon carbide. The boat 18 moves up and down integrally with the lid 14, the rotation mechanism 16, and the support part 17 by raising and lowering the arm. This allows the boat 18 to be inserted into and removed from the processing vessel 10.

[0017] The gas supply unit 30 has an injector 31. The injector 31 extends linearly near the inner surface of the inner tube 11 in the arrangement direction (vertical direction) of the multiple substrates W, bends in an L-shape at the bottom of the inner tube 11, and extends to the outside of the inner tube 11 through the outer tube 12. The injector 31 is made of, for example, quartz. A gas source (not shown) of the processing gas is connected to the end of the injector 31 outside the inner tube 11 via a gas supply path (not shown). A plurality of discharge holes 31h are provided in a portion of the injector 31 located inside the inner tube 11. The discharge holes 31h are provided at predetermined intervals along the extension direction of the injector 31. The processing gas from the gas source flows into the injector 31 from the gas supply path and is discharged into the inner tube 11 from each discharge hole 31h. The inner diameter of the inner pipe 11 is narrowed in a height region where the boat 18 is located, and an exhaust port 11f is provided opposite the injector 31. In this case, it is possible to promote the flow of the processing gas discharged from each discharge hole 31h toward the substrate W. The interval between each discharge hole 31h is set, for example, to be the same as the interval between the substrates W held in the boat 18. The position in the height direction of each discharge hole 31h is set, for example, to the midpoint between the substrates W adjacent in the vertical direction. In this case, each discharge hole 31h can efficiently supply the processing gas to the opposing surfaces between the adjacent substrates W.

[0018] The gas supply unit 30 may mix multiple types of process gases and discharge the mixed process gas from one injector. The gas supply unit 30 may further include an injector that discharges another process gas in addition to the injector 31.

[0019] The heating unit 50 includes a chamber heater 51. The chamber heater 51 has a cylindrical shape with a ceiling that surrounds the processing vessel 10 on the radially outer side of the processing vessel 10 and covers the ceiling of the processing vessel 10. The chamber heater 51 heats the sides and ceiling of the processing vessel 10, thereby heating each substrate W accommodated in the processing vessel 10.

[0020] The heat insulating section 60 includes a partition member 61 , a heat insulating material 62 , a heater 63 , a radiation plate 64 , a reflector plate 65 , and a plate 66 .

[0021] The partitioning member 61 is placed on the lid 14. The partitioning member 61 is located inside the processing vessel 10 when the opening at the bottom of the processing vessel 10 is airtightly closed by the lid 14. The partitioning member 61 is made of, for example, quartz. The partitioning member 61 includes an inner wall portion 61a, an outer wall portion 61b, a ceiling wall portion 61c, and a flange portion 61d.

[0022] The inner wall 61a is provided around the shaft 17a. The inner wall 61a has a cylindrical shape. The lower end of the inner wall 61a is placed on the lid 14 via a sealing member 67 such as an O-ring. A narrow space B1 is provided between the inner surface of the inner wall 61a and the outer surface of the shaft 17a. A purge gas is supplied from a purge gas source PG to the narrow space B1. The purge gas is supplied from the lower side to the upper side of the processing vessel 10. The purge gas prevents the processing gas discharged into the inner tube 11 from flowing into the rotation mechanism 16. The purge gas is, for example, nitrogen gas.

[0023] The outer wall portion 61b is provided around the inner wall portion 61a. The outer wall portion 61b has a cylindrical shape. The outer wall portion 61b is provided coaxially with the inner wall portion 61a. The lower end of the outer wall portion 61b is placed on the lid 14.

[0024] The ceiling wall 61c connects the upper end of the inner wall 61a to the upper end of the outer wall 61b and closes the upper portion of the space between the inner wall 61a and the outer wall 61b. The ceiling wall 61c has an annular plate shape. The ceiling wall 61c, together with the lid 14, the inner wall 61a, and the outer wall 61b, forms a second space A2 separated from the first space A1 inside the processing vessel 10. The first space A1 can be switched between an atmospheric atmosphere and a vacuum atmosphere. The second space A2 is the environment outside the processing vessel 10. The second space A2 is maintained in, for example, an atmospheric atmosphere or an inert gas atmosphere. The inert gas is, for example, nitrogen gas. The ceiling wall 61c faces the mounting portion 17b with a gap therebetween.

[0025] The flange portion 61d extends outward from the lower portion of the outer wall portion 61b. A seal member 68 such as an O-ring is provided between the upper surface of the outer edge of the flange portion 61d and the lower end of the outer tube 12.

[0026] The heat insulating material 62 is provided in the second space A2. The heat insulating material 62 is placed on, for example, the lid 14. The heat insulating material 62 suppresses heat radiation from the opening at the bottom end of the processing vessel 10. The heat insulating material 62 has a structure in which a fibrous heat insulating material is molded into a cylindrical shape. However, the heat insulating material 62 is not limited to a fibrous heat insulating material. For example, the heat insulating material 62 may have a structure in which heat insulating plates made of quartz, silicon carbide, or the like are stacked at intervals in the vertical direction.

[0027] The heater 63 includes a top plate heater 63a, an outer cylindrical heater 63b, and an injector heater 63c. The heater 63 may further include another heater.

[0028] The top plate heater 63a is provided between the top wall portion 61c and the heat insulating material 62. By providing the top plate heater 63a, the uniform heating length in the vertical direction within the processing vessel 10 is improved. The top plate heater 63a has, for example, a circular plate shape. The top plate heater 63a may be, for example, a carbon-based heater. In this case, the temperature rise / fall characteristics are improved and the temperature recovery time can be shortened. The top plate heater 63a may also be a heater other than a carbon-based heater. Because the second space A2 is a space partitioned from the first space A1, an inexpensive heater such as a sheath heater or a Kanthal wire heater can be used. In this case, costs can be significantly reduced compared to using a carbon-based heater.

[0029] The outer cylindrical heater 63b is provided between the outer wall portion 61b and the heat insulating material 62. The outer cylindrical heater 63b heats the outer wall portion 61b. This makes it possible to prevent by-products from adhering to the surface of the outer wall portion 61b. The outer cylindrical heater 63b has, for example, a cylindrical shape and is installed on the lid 14. The outer cylindrical heater 63b may be, for example, a sheath-type heater. In this case, far infrared rays are emitted, which easily heats the outer wall portion 61b made of quartz.

[0030] The injector heater 63c is provided between the outer wall 61b and the heat insulating material 62. The injector heater 63c has a rod shape extending in the vertical direction. The injector heater 63c is provided, for example, at the same angular position as the injector 31 in the circumferential direction of the processing vessel 10. In this case, the processing gas can be heated before being discharged from each discharge hole 31h, thereby preventing the temperature of the processing gas discharged toward the substrate W held in the lower part of the boat 18 from decreasing.

[0031] The radiation plate 64 is provided between the top wall portion 61c and the top plate heater 63a. The radiation plate 64 absorbs radiation from the substrate W side before dissipating it downward, and then radiates it toward the substrate W. This allows the substrate W to be heated efficiently. The radiation plate 64 is made of, for example, alumina or silicon carbide. In this case, the radiation rate of the radiation plate 64 is high, and therefore the heating efficiency of the substrate W is improved.

[0032] The reflector 65 is provided between the heat insulating material 62 and the top plate heater 63a. The reflector 65 reflects excess radiation to the underside of the top plate heater 63a, improving the heating performance of the top plate heater 63a. The reflector 65 is formed, for example, from a gold-plated plate. The gold-plated plate has high reflectivity and can efficiently reflect excess radiation to the underside of the top plate heater 63a. The gold-plated plate is chemically stable, making it easy to suppress deterioration.

[0033] The plate 66 is installed on the ceiling wall 61c. The plate 66 is made of, for example, quartz. In a plan view from the axial direction of the processing vessel 10, the plate 66 has a C-shape that opens toward the exhaust port 11f. This forms a first gap G1, which includes at least the angular position where the exhaust port 11f is provided, and a second gap G2, which is provided at an angular position excluding the first gap G1, between the lower surface of the support member 17 and the upper surface of the partition member 61 in the circumferential direction of the processing vessel 10. The first gap G1 is wider than the second gap G2. In this case, the purge gas supplied to the narrow space B1 is guided to the exhaust port 11f through the first gap G1. This prevents the purge gas supplied to the narrow space B1 from flowing into the boat 18, thereby reducing the influence of the purge gas on the heat treatment of the substrates W held in the boat 18. As a result, the uniformity of the heat treatment can be improved. The exhaust port 11f is preferably provided at least at the same height as the first gap G1. In this case, the purge gas that passes through the first gap G1 is easily guided to the exhaust port 11f. The exhaust port 11f is formed to extend from the first cylindrical portion 11a of the inner pipe 11 to near the upper end of the second cylindrical portion 11c. Because the second inner diameter of the lower portion of the inner pipe 11 is larger than the first inner diameter due to the expanded diameter portion 11b, the purge gas that passes through the first gap G1 and the second gap G2 is less likely to flow into the boat 18. That is, the distance between the inner surface of the inner pipe 11 and the outer peripheral surface of the mounting portion 17b is sufficiently smaller than the distance between the inner surface of the inner pipe 11 and the outer wall portion 61b of the partitioning member 61. Therefore, the purge gas flows into the space between the inner pipe 11 and the outer wall portion 61b of the partitioning member 61 and is guided to the exhaust port 11f formed in the expanded diameter portion 11b and the second cylindrical portion 11c. As a result, the purge gas is prevented from flowing into the boat 18, reducing its effect on the heat treatment of the substrates W held in the boat 18. In the first embodiment, an example has been described in which the exhaust port 11f extends from the first cylindrical portion 11a to near the upper end of the second cylindrical portion 11c of the inner pipe 11, but this is not limiting. The exhaust port 11f may be configured to extend from the first cylindrical portion 11a to partway along the expanded diameter portion 11b of the inner pipe 11. As long as the exhaust port 11f is formed at least partway along the expanded diameter portion 11b, the same effects can be achieved.

[0034] The control unit 90 controls the operation of each part of the heat treatment apparatus 1A, for example. The control unit 90 may be, for example, a computer. The computer program that controls the operation of each part of the heat treatment apparatus 1A is stored in a storage medium. The storage medium may be, for example, a flexible disk, a compact disk, a hard disk, a flash memory, a DVD, or the like.

[0035] As described above, in the heat treatment apparatus 1A according to the first embodiment, the heat insulating material 62 is provided in the second space A2, which is separated from the first space A1 by the partitioning member 61. In this case, the surface area of ​​the first space A1 is reduced, thereby reducing the amount of process gas consumed. In contrast, when the heat insulating material 62 is provided in the first space A, the process gas flows into the heat insulating material 62, increasing the amount of process gas consumed.

[0036] Furthermore, according to the heat treatment apparatus 1A of the first embodiment, a heat insulating material 62 is provided in the second space A2, which is separated from the first space A1 by the partitioning member 61. In this case, the volume of the first space A1 is reduced, thereby shortening the time required to switch the first space A1 between the atmospheric atmosphere and the vacuum atmosphere. In contrast, when the heat insulating material 62 is provided in the first space A1, the volume of the first space A1 is increased by at least the volume of the heat insulating material 62, thereby lengthening the time required to switch the first space A1 between the atmospheric atmosphere and the vacuum atmosphere.

[0037] Furthermore, according to the heat treatment apparatus 1A of the first embodiment, a heat insulating material 62 is provided in the second space A2, which is separated from the first space A1 by the partitioning member 61. In this case, the surface area of ​​the first space A1 is reduced, thereby reducing the amount of by-products adhering to the surface of the process gas and suppressing particle generation. Furthermore, a top plate heater 63a and an outer cylindrical heater 63b are provided in the second space A2. In this case, the surface of the partitioning member 61 can be heated by the top plate heater 63a and the outer cylindrical heater 63b, which makes it easier to suppress the adhesion of by-products to the surface of the partitioning member 61. In contrast, when the heat insulating material 62 is provided in the first space A1, the surface area of ​​the first space A1 is increased, thereby increasing the amount of by-products adhering to the surface of the process gas. Furthermore, without the top plate heater 63a and the outer cylindrical heater 63b, the temperature of the heat insulating material 62 cannot be locally controlled, making it easier for by-products to adhere to the heat insulating material 62.

[0038] Furthermore, according to the heat treatment apparatus 1A of the first embodiment, a heat insulating material 62 is provided in the second space A2, which is separated from the first space A1 by the partitioning member 61. In this case, by-products may adhere to the surface of the partitioning member 61, but the by-products do not adhere to the heat insulating material 62. This reduces the time required to remove the by-products by cleaning. In contrast, when the heat insulating material 62 is provided in the first space A1, by-products adhere to the heat insulating material 62, which increases the time required to remove the by-products by cleaning.

[0039] Furthermore, the heat treatment apparatus 1A according to the first embodiment includes a C-shaped plate 66 installed on the ceiling wall 61c and opening toward the exhaust port 11f in a plan view from the axial direction of the processing vessel 10. This provides a first gap G1, which includes at least the angular position where the exhaust port 11f is located, and a second gap G2, which is located at an angular position excluding the first gap G1, between the lower surface of the support member 17 and the upper surface of the partition member 61 in the circumferential direction of the processing vessel 10. The first gap G1 is wider than the second gap G2. In this case, the purge gas supplied to the narrow space B1 is guided to the exhaust port 11f through the first gap G1. This prevents the purge gas supplied to the narrow space B1 from flowing into the boat 18, thereby reducing the impact on the heat treatment of the substrates W held in the boat 18. As a result, the uniformity of the heat treatment can be improved.

[0040] Second Embodiment A heat treatment apparatus according to a second embodiment will be described with reference to Figures 5 and 6. Figure 5 is a schematic view showing the heat treatment apparatus according to the second embodiment. Figure 6 is a perspective view of a partition member as seen obliquely from above.

[0041] The heat treatment apparatus 1B according to the second embodiment differs from the heat treatment apparatus 1A according to the first embodiment in that it does not have a plate 66 and a first gap G1 is formed by a groove 61e formed in a top wall portion 61c of a partition member 61. The rest of the configuration may be the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0042] The ceiling wall 61c has a groove 61e on its upper surface, extending from the inner side to the outer side in the radial direction. The groove 61e is provided in the circumferential direction of the processing vessel 10, at least at an angular position where the exhaust port 11f is provided. Thus, a first gap G1, which includes at least the angular position where the exhaust port 11f is provided, and a second gap G2, which is provided at an angular position excluding the first gap G1, are formed between the lower surface of the support 17 and the upper surface of the partition member 61 in the circumferential direction of the processing vessel 10. The first gap G1 is wider than the second gap G2. In this case, the purge gas supplied to the narrow space B1 is guided to the exhaust port 11f through the first gap G1. This prevents the purge gas supplied to the narrow space B1 from flowing into the boat 18, thereby reducing the influence of the purge gas on the heat treatment of the substrates W held in the boat 18. As a result, the uniformity of the heat treatment can be improved.

[0043] As described above, the heat treatment apparatus 1B according to the second embodiment can achieve the same effects as the heat treatment apparatus 1A according to the first embodiment.

[0044] Third Embodiment A heat treatment apparatus according to a third embodiment will be described with reference to Figures 7 and 8. Figure 7 is a schematic view showing the heat treatment apparatus according to the third embodiment. Figure 8 is a perspective view showing the protruding portion.

[0045] The heat treatment apparatus 1C according to the third embodiment differs from the heat treatment apparatus 1A according to the first embodiment in that it has a protruding portion 11g that is provided at the same height as the first gap G1 and protrudes radially outward from the side wall. Other configurations may be the same as those of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0046] The inner pipe 11 has a protruding portion 11g that protrudes radially outward from the side wall. The protruding portion 11g is provided at the same height as the first gap G1. By providing the protruding portion 11g, even if the purge gas supplied to the narrow space B1 passes through the second gap G2, the purge gas flows circumferentially through a buffer space formed inside the protruding portion 11g and is guided to the exhaust port 11f. The exhaust port 11f is provided to include the protruding portion 11g. For example, the exhaust port 11f is provided in the protruding portion 11g and in the side wall of the inner pipe 11 above the protruding portion 11g.

[0047] As described above, the heat treatment apparatus 1C according to the third embodiment can achieve the same effects as the heat treatment apparatus 1A according to the first embodiment.

[0048] [Fourth embodiment] A heat treatment apparatus according to a fourth embodiment will be described with reference to Fig. 9 and Fig. 10. Fig. 9 is a schematic view showing the heat treatment apparatus according to the fourth embodiment. Fig. 10 is a perspective view of a plate viewed obliquely from above.

[0049] The heat treatment apparatus 1D according to the fourth embodiment differs from the heat treatment apparatus 1A according to the first embodiment in that a labyrinth structure is provided in the second gap G2. The rest of the configuration may be the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0050] The plate 66 is placed on the ceiling wall 61c. The plate 66 is made of, for example, quartz. When viewed from above in the axial direction of the processing vessel 10, the plate 66 has a C-shape that opens toward the exhaust port 11f. A plurality of protrusions 66a and recesses 66b are alternately provided on the upper surface of the plate 66 along the radial direction. The protrusions 66a and recesses 66b are arranged concentrically.

[0051] On the underside of the mounting portion 17b, protrusions 17c are provided at positions facing the recesses 66b. Each protrusion 17c is provided, for example, over the entire circumferential direction. Alternatively, each protrusion 17c may be provided only at positions where the plate 66 is provided in the circumferential direction.

[0052] In the heat treatment apparatus 1D, a labyrinth structure is formed in the second gap G2 by the convex portion 66a and the concave portion 66b on the upper surface of the plate 66 and the convex portion 17c on the lower surface of the mounting portion 17b. On the other hand, no labyrinth structure is formed in the first gap G1. In this case, the purge gas supplied to the narrow space B1 passes through the first gap G1 and is guided to the exhaust port 11f. On the other hand, the purge gas supplied to the narrow space B1 is less likely to pass through the second gap G2. This prevents the purge gas supplied to the narrow space B1 from flowing into the boat 18, thereby reducing the impact on the heat treatment of the substrates W held in the boat 18. As a result, the uniformity of the heat treatment can be improved. Furthermore, the formation of the labyrinth structure prevents the process gas in the process vessel 10 from back-diffusing into the narrow space B1. As a result, the process gas is less likely to form a film on the surfaces of the shaft portion 17a and the inner wall portion 61a, thereby suppressing the adhesion of by-products.

[0053] As described above, the heat treatment apparatus 1D according to the fourth embodiment can achieve the same effects as the heat treatment apparatus 1A according to the first embodiment.

[0054] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive, and the above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0055] 1A, 1B, 1C, 1D Heat treatment equipment 11 Inner tube 11f Exhaust vent 14 Lid 17 Support part 17a Shaft 17b Placement section 18 Boat 61 Partition members 62 Insulation G1 First gap G2 Second gap W substrate

Claims

1. a processing vessel having a cylindrical shape with a ceiling and an open bottom end, and forming a first space therein; a lid that closes the opening at the lower end; a support portion provided to penetrate the lid, the support portion having a shaft portion and a mounting portion located on an upper portion of the shaft portion; a boat that is placed on the mounting portion and holds a plurality of substrates arranged in multiple stages in the vertical direction; a partition member provided around the shaft portion with a gap between it and a lower surface of the mounting portion, the partition member forming a second space partitioned from the first space; A heat insulating material provided in the second space; Equipped with The processing vessel has an exhaust port provided in a part of a side wall, In a circumferential direction of the processing vessel, the gap includes a first gap including an angular position where at least the exhaust port is provided, and a second gap provided at an angular position excluding the first gap, The first gap is wider than the second gap. Heat treatment equipment.

2. The exhaust port is provided at least at the same height as the first gap. The heat treatment apparatus according to claim 1 .

3. The partition member is an inner wall portion provided around the shaft portion; an outer wall portion provided around the inner wall portion and coaxially with the inner wall portion; a top wall portion connecting an upper end of the inner wall portion and an upper end of the outer wall portion and closing an upper portion of a space between the inner wall portion and the outer wall portion; and the top wall portion has a groove on its upper surface that extends from the inner side to the outer side in the radial direction and forms the first gap; The heat treatment apparatus according to claim 1 .

4. The partition member is an inner wall portion provided around the shaft portion; an outer wall portion provided around the inner wall portion and coaxially with the inner wall portion; a top wall portion connecting an upper end of the inner wall portion and an upper end of the outer wall portion and closing an upper portion of a space between the inner wall portion and the outer wall portion; and Further, a plate is provided on the top wall portion, When viewed from above in the axial direction of the processing vessel, the plate has a C-shape that opens toward the exhaust port. The heat treatment apparatus according to claim 1 .

5. the processing vessel includes a first cylindrical portion having a first inner diameter, a second cylindrical portion having a second inner diameter larger than the first inner diameter, and an expanded diameter portion provided between the first cylindrical portion and the second cylindrical portion; the first cylindrical portion, the expanded diameter portion, and the second cylindrical portion are provided in this order from an upper side to a lower side of the processing vessel, The expanded diameter portion is provided at the same height as the first gap. The heat treatment apparatus according to claim 1 .

6. The exhaust port is formed to extend from the first cylindrical portion to at least the expanded diameter portion. The heat treatment apparatus according to claim 5 .

7. the processing vessel has a protruding portion that protrudes radially outward from a side wall, The protruding portion is provided at the same height as the first gap. The heat treatment apparatus according to claim 1 .

8. The heating element further includes a heater provided between the ceiling wall portion and the heat insulating material in the second space. The heat treatment apparatus according to claim 4 .

9. an injector extending in the processing chamber along an arrangement direction of the plurality of substrates; a heater disposed inside the partition member at an angular position corresponding to the injector in the circumferential direction of the processing vessel, the heater extending along the arrangement direction; Further comprising: The heat treatment apparatus according to claim 1 .

10. The second gap is provided with a labyrinth structure. The heat treatment apparatus according to claim 1 .

11. a purge gas source that supplies a purge gas between the shaft portion and the partition member; The heat treatment apparatus according to claim 1 .

12. a second processing vessel having a cylindrical shape with a ceiling and covering the outside of the processing vessel; The heat treatment apparatus according to any one of claims 1 to 9.

Images