Substrate Processing Equipment

Abstract

To provide a technique capable of reducing a pressure fluctuation in an exhaust pipe with high accuracy.SOLUTION: A substrate processing apparatus comprises: a tower 40; a plurality of individual exhaust pipes 21; a collection exhaust pipe 22; a switching part 23; an external air conduction part 24; and a control part. The tower 40 contains a plurality of processing units 10 that is provided in parallel to a vertical direction. The switching part 23 switches a connection and a disconnection of the plurality of individual exhaust pipes 21 and the collection exhaust pipe 22. The external air conduction part 24 includes a flow path introducing an external air from an external part into the collection exhaust pipe 22. The control part controls an introduction area of the external air conduction part 24 on the basis of an individual introduction area corresponded to each of the plurality of processing units 10 and a switching state of the switching part 23. The individual introduction area corresponded to each of the plurality of processing units 10 is set in accordance with each installation position of the plurality of processing units 10.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present disclosure relates to a substrate processing apparatus. [Background technology]

[0002] Substrate processing apparatuses for processing substrates have been proposed in the past (for example, Patent Document 1). In Patent Document 1, the substrate processing apparatus includes multiple processing units stacked vertically. Each processing unit includes a processing chamber, and a processing fluid such as a processing liquid is supplied to the substrate within the processing chamber. This causes the substrate to be processed in accordance with the processing fluid. Gas within the processing chamber is exhausted to the outside through an exhaust system, which will be described later.

[0003] In Patent Document 1, the processing unit is capable of sequentially supplying an acidic chemical solution, an alkaline chemical solution, and an organic solvent. When the processing unit supplies an acidic chemical solution, the gas discharged from the processing chamber includes gas and mist generated from the acidic chemical solution. At this time, the fluid category of the exhaust gas is acidic gas. When the processing unit supplies an alkaline chemical solution, the gas discharged from the processing chamber includes gas and mist generated from the alkaline chemical solution. At this time, the fluid category of the exhaust gas is alkaline gas. When the processing unit supplies an organic solvent, the gas discharged from the processing chamber includes gas and mist generated from the organic solvent. At this time, the fluid category of the exhaust gas is organic gas.

[0004] The exhaust system discharges these exhaust gases to individual exhaust units corresponding to the fluid categories. In Patent Document 1, the exhaust system includes a collecting pipe, multiple exhaust pipes, a flow path switching unit, and an outside air inlet. The collecting pipes are provided corresponding to the fluid categories. That is, a collecting pipe for acidic gases, a collecting pipe for alkaline gases, and a collecting pipe for organic gases are provided. These collecting pipes are provided vertically above stacked units including multiple processing units stacked vertically.

[0005] A plurality of exhaust pipes are provided corresponding to a plurality of treatment sections, with the upstream end of each exhaust pipe connected to a treatment chamber of the treatment section and the downstream end of each exhaust pipe connected to a flow path switching unit. The flow path switching unit directs exhaust gas from the exhaust pipes to a collecting pipe corresponding to the fluid section. In other words, exhaust gas from the treatment section is directed to one of three collecting pipes depending on the fluid section. Since the treatment sections sequentially switch and supply the treatment liquid, exhaust gas from the treatment sections flows by switching the collecting pipes sequentially.

[0006] Since pressure fluctuations in the collecting pipe are undesirable, pressure fluctuations in the collecting pipe are suppressed by allowing external gas to flow from the outside air inlet into the collecting pipe, to which exhaust gas from the processing unit does not flow. For example, the flow path switching unit is connected to the downstream end of the outside air inlet, and directs external gas from the outside inlet into the collecting pipe that is not connected to the exhaust pipe. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Japanese Patent Application Publication No. 2020-47897 Summary of the Invention [Problem to be solved by the invention]

[0008] Because multiple treatment units are stacked vertically and the collecting pipe is located vertically above the stacked units, the lengths of the exhaust pipes from the treatment units to the collecting pipe are different. Therefore, exhaust gas from the highest treatment unit flows into the collecting pipe through the shortest exhaust pipe, and exhaust gas from the lowest treatment unit flows into the collecting pipe through the longest exhaust pipe. Therefore, the amount of pressure fluctuation in the collecting pipe due to changes in the fluid division of the exhaust gas from the treatment unit also depends on the installation position of the treatment unit. It is difficult to suppress such pressure fluctuations with high accuracy.

[0009] Therefore, an object of the present disclosure is to provide a technique that can reduce pressure fluctuations in an exhaust pipe with higher accuracy. [Means for solving the problem]

[0010] A first aspect is a substrate processing apparatus including: a first tower including a plurality of first processing units arranged side by side in a vertical direction, each processing a substrate; a plurality of first individual exhaust pipes through which gases exhausted from the plurality of first processing units flow; a first collective exhaust pipe; a first switching unit that switches between connecting and blocking communication between each of the plurality of first individual exhaust pipes and the first collective exhaust pipe; a first outside air introduction unit that has a flow path that introduces outside air from outside into the first collective exhaust pipe and has a variable introduction area of ​​the flow path; and a control unit that controls the introduction area of ​​the first outside air introduction unit based on individual introduction areas corresponding to each of the plurality of first processing units and a switching state of the first switching unit, wherein the individual introduction areas corresponding to each of the plurality of first processing units are set according to the installation positions of the plurality of first processing units. The control unit controls the introduction area based on the sum of the individual introduction areas corresponding to the first treatment units that are disconnected from the first collecting exhaust pipe among the plurality of first treatment units, and the individual introduction area is set to a larger value as the installation position of the first treatment unit among the plurality of first treatment units increases. .

[0012] No. 2 The embodiment is 1 of In a substrate processing apparatus according to this aspect, the first outside air introduction section includes a single introduction pipe provided in the first collecting exhaust pipe, and a movable member that adjusts the introduction area of ​​the single introduction pipe and is controlled by the control section.

[0013] No. 3 The embodiment of a first tower including a plurality of first processing units arranged side by side in a vertical direction and each processing a substrate; a plurality of first individual exhaust pipes through which gases exhausted from the plurality of first processing units flow, a first collective exhaust pipe; a first switching unit that switches between connecting and blocking communication between each of the plurality of first individual exhaust pipes and the first collective exhaust pipe; a first outside air introduction unit that has a flow path that introduces outside air from outside into the first collective exhaust pipe and has an introduction area of ​​the flow path that is variable; and a control unit that controls the introduction area of ​​the first outside air introduction unit based on individual introduction areas corresponding to each of the plurality of first processing units and a switching state of the first switching unit; a storage unit that stores in advance individual area data indicating the individual introduction areas corresponding to the plurality of first processing units; the individual introduction areas corresponding to the plurality of first processing units are set according to the installation positions of the plurality of first processing units, and the first outside air introduction section includes a single introduction pipe provided in the first collecting exhaust pipe and a movable member that adjusts the introduction area of ​​the single introduction pipe and is controlled by the control section, The control unit controls the movable member based on the switching state and the individual area data.

[0014] No. 4 The embodiment is 1 ofIn a substrate processing apparatus according to this aspect, the first outside air introduction section includes a plurality of introduction pipes having the individual introduction areas corresponding to the plurality of first processing units, respectively, and a plurality of opening / closing valves that respectively switch the opening and closing of the plurality of introduction pipes, and the control unit controls the plurality of opening / closing valves based on the switching state.

[0015] No. 5 The aspects are as follows: 4 a second tower arranged horizontally next to the first tower, including a plurality of second processing units arranged vertically, each processing a substrate; a plurality of second individual exhaust pipes through which gases exhausted from the second processing units flow; a second collective exhaust pipe; a second switching unit that switches between connecting and blocking communication between each of the second individual exhaust pipes and the second collective exhaust pipe; and a second outside air introduction unit that has a flow path that introduces outside air from outside into the second collective exhaust pipe, the introduction area of ​​the flow path being variable, wherein the control unit controls the introduction area of ​​the second outside air introduction unit based on the individual introduction areas set corresponding to each of the second processing units and the switching state of the second switching unit, and wherein the individual introduction areas corresponding to the second processing units are different from one another. [Effects of the Invention]

[0016] According to the first aspect, the individual introduction area corresponding to the first processing unit is set according to the installation position of the first processing unit, so that it is possible to reduce pressure fluctuations caused by differences in the installation position of the first processing unit, i.e., it is possible to reduce pressure fluctuations in the first collecting exhaust pipe with higher accuracy.

[0017] Moreover, The exhaust gas from the first exhaust manifold and the blocked processing unit can be supplemented with outside air, thereby reducing pressure fluctuations with greater precision.

[0018] No. 2 and 3 According to this aspect, maintenance is easy.

[0019] No. 4 According to this aspect, since it is not necessary to calculate the individual introduction area, the calculation load on the control unit can be reduced.

[0020] No. 5 According to this aspect, exhaust gas from the first treatment unit may flow into the first exhaust collecting pipe, but not from the second treatment unit. Similarly, exhaust gas from the second treatment unit may flow into the second exhaust collecting pipe, but not from the first treatment unit. Therefore, pressure fluctuations caused by the difference in pressure between the first tower and the second tower can be more reliably reduced. [Brief explanation of the drawings]

[0021] [Figure 1] FIG. 1 is a plan view schematically showing an example of the configuration of a substrate processing apparatus according to a first embodiment. [Figure 2] 1 is a side view schematically showing an example of the configuration of a substrate processing apparatus according to a first embodiment. [Figure 3] FIG. 2 is a diagram schematically illustrating an example of the connection relationship of an exhaust system according to the first embodiment. [Figure 4] FIG. 2 is a functional block diagram illustrating an example of an internal configuration of a control unit. [Figure 5] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit located at the highest position is in communication with the exhaust collection pipe. [Figure 6] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit at the next highest position is in communication with the exhaust collection pipe. [Figure 7] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit located at the lowest position is in communication with the exhaust collection pipe. [Figure 8] FIG. 10 is a plan view schematically showing an example of the configuration of a substrate processing apparatus according to a second embodiment. [Figure 9] FIG. 10 is a side view schematically showing an example of the configuration of a substrate processing apparatus according to a second embodiment. [Figure 10]FIG. 10 is a diagram schematically illustrating an example of the connection relationship of an exhaust system according to a second embodiment. [Figure 11] FIG. 10 is a perspective view schematically illustrating an example of the configuration of an area adjusting member. [Figure 12] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit located at the highest position is in communication with the exhaust collection pipe. [Figure 13] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit at the next highest position is in communication with the exhaust collection pipe. [Figure 14] FIG. 10 is a diagram schematically illustrating an example of a state in which only the processing unit located at the lowest position is in communication with the exhaust collection pipe. DETAILED DESCRIPTION OF THE INVENTION

[0022] Hereinafter, embodiments will be described with reference to the accompanying drawings. The drawings are schematic, and for the sake of convenience, components may be omitted or simplified as appropriate. The relative sizes and positions of components shown in the drawings are not necessarily accurately depicted and may be changed as appropriate. An XYZ Cartesian coordinate system may be shown in the drawings to explain the relative positions of the components. Hereinafter, the Z axis is an axis extending along the vertical direction, and the X and Y axes are axes extending along the horizontal direction. Hereinafter, one side of the X axis direction may be referred to as the +X side, and the other side of the X axis direction may be referred to as the -X side. The same applies to the Y axis.

[0023] In the following description, the same components are denoted by the same reference numerals, and their names and functions are also the same. Therefore, detailed descriptions of them may be omitted to avoid duplication.

[0024] Furthermore, in the following description, even if ordinal numbers such as "first" or "second" are used, these terms are used for convenience to facilitate understanding of the contents of the embodiments, and are not limited to the ordering that may result from these ordinal numbers.

[0025] When expressions indicating relative or absolute positional relationships (e.g., "in one direction," "along one direction," "parallel," "orthogonal," "center," "concentric," "coaxial," etc.) are used, unless otherwise specified, the expressions not only strictly represent the positional relationship but also represent a state in which there is a relative displacement in terms of angle or distance within a range in which tolerance or equivalent functionality is obtained. When expressions indicating an equal state (e.g., "identical," "equal," "homogeneous," etc.) are used, the expressions not only represent a state in which there is strict quantitative equality but also represent a state in which there is a difference in which tolerance or equivalent functionality is obtained, unless otherwise specified. When expressions indicating a shape (e.g., "rectangular shape" or "cylindrical shape," etc.) are used, the expressions not only represent a geometrically strict shape but also represent a shape with, for example, irregularities or chamfers within a range in which equivalent effects are obtained, unless otherwise specified. When the expressions "comprise," "include," "have," "includes," "includes," or "have" are used to describe one component, the expressions are not exclusive expressions that exclude the presence of other components. When the phrase "at least one of A, B, and C" is used, the phrase includes A only, B only, C only, any two of A, B, and C, and all of A, B, and C.

[0026] First Embodiment <Outline of substrate processing equipment> Fig. 1 is a plan view schematically showing an example of the configuration of a substrate processing apparatus 100 according to a first embodiment, and Fig. 2 is a side view schematically showing an example of the configuration of the substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 is a single-wafer processing apparatus that processes substrates W one by one in processing units 10, which will be described later.

[0027] The substrate W is, for example, a semiconductor substrate having a disk shape. In addition to semiconductor substrates, various substrates can be used for the substrate W, such as glass substrates for photomasks, glass substrates for liquid crystal displays, glass substrates for plasma displays, substrates for FED (Field Emission Displays), substrates for organic EL (Electro-Luminescence) display devices, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, ceramic substrates, and solar cell substrates. The shape of the substrate is not limited to a disk shape, and various other shapes, such as a rectangular plate shape, can be used.

[0028] 1 and 2, the substrate processing apparatus 100 includes an indexer unit 110, an apparatus main body 120, and a control unit 90. The indexer unit 110 and the apparatus main body 120 are arranged side by side in the X-axis direction. In the example of FIGS. 1 and 2, the apparatus main body 120 is arranged on the +X side of the indexer unit 110.

[0029] <Indexer section> The indexer section 110 is an interface section for loading and unloading substrates W between the apparatus main body 120 and the outside. Here, a substrate container (hereinafter referred to as a carrier) C storing a plurality of substrates W is loaded into the indexer section 110 from the outside.

[0030] The indexer section 110 includes a plurality of load ports 111 and an indexer robot 112. Each load port 111 holds a carrier C that has been loaded from outside. In the example of FIG. 1, the plurality of load ports 111 are arranged side by side in the Y-axis direction. The indexer robot 112 is a transport unit that transports substrates W between each carrier C and the apparatus main body 120, and is arranged on the +X side of the plurality of load ports 111. The indexer robot 112 sequentially takes out unprocessed substrates W from the carrier C and transports the substrates W to the apparatus main body 120, and sequentially receives processed substrates W from the apparatus main body 120 and stores the substrates W in the carrier C. The carrier C storing the processed substrates W is then transported to the outside from the load port 111.

[0031] <Device body> The apparatus main body 120 is a part for processing the substrate W, and includes a plurality of processing units 10, an exhaust system 20, and a center robot 30.

[0032] 1 and 2, the multiple processing units 10 form multiple towers 40. In other words, each tower 40 includes multiple processing units 10 arranged side by side in the vertical direction. In the example of FIG. 1, four towers 40A to 40D are provided as the multiple towers 40. Specifically, in a plan view, the towers 40A to 40D are respectively provided at the vertices of an imaginary quadrangle. Here, the towers 40A and 40B are arranged side by side in the X-axis direction, the towers 40C and 40D are arranged side by side in the X-axis direction, the towers 40A and 40C are arranged side by side in the Y-axis direction, and the towers 40B and 40D are arranged side by side in the Y-axis direction.

[0033] 2, three processing units 10a to 10c are shown as the multiple processing units 10 that make up each tower 40. The processing units 10a to 10c are arranged in this order from vertically above to vertically below. That is, the processing unit 10a is arranged at the topmost position, and the processing unit 10c is arranged at the bottommost position.

[0034] The center robot 30 is located at a position surrounded by a plurality of towers 40 in a plan view. The center robot 30 carries the unprocessed substrate W received from the indexer robot 112 into the processing unit 10. The processing unit 10 processes the substrate W. The center robot 30 carries out the processed substrate W from the processing unit 10 and hands the substrate W to the indexer robot 112.

[0035] 1 and 2, the outline of the processing chamber in each processing unit 10 is indicated by a dashed rectangle. Various components (not shown), such as a substrate holder and a nozzle, are provided inside the processing chamber of the processing unit 10. The processing unit 10 can supply multiple types of processing fluids to the substrate W held by the substrate holder via the nozzle. When the processing fluid is a liquid, for example, the substrate holder includes a rotation mechanism for rotating the substrate W, and the processing unit 10 further includes a cup surrounding the periphery of the substrate holder. The nozzle supplies the processing fluid toward the main surface of the rotating substrate W. The processing fluid supplied onto the substrate W flows radially outward from the main surface of the substrate W, splashes from the periphery of the substrate W, and is received by the cup. The processing fluid acts on the substrate W, causing the substrate W to undergo processing according to the processing fluid. The processing fluid received in the cup is appropriately collected.

[0036] The processing fluids used in the processing unit 10 are classified into a plurality of fluid categories. In this embodiment, the plurality of fluid categories include an acidic chemical solution, an alkaline chemical solution, and an organic solvent. The processing fluid may also be a gas.

[0037] Acidic chemical solutions include, for example, DHF (dilute hydrofluoric acid), SC2 (hydrochloric acid-hydrogen peroxide solution), BHF (buffered hydrofluoric acid), sulfuric acid, SPM (sulfuric acid-hydrogen peroxide solution), and fluoronitric acid (a mixture of hydrofluoric acid and nitric acid). Alkaline chemical solutions include, for example, SC1 (ammonia-hydrogen peroxide solution), ammonia water, ammonium fluoride solution, and TMAH (tetramethylammonium hydroxide). Organic solvents include solvents such as IPA (isopropyl alcohol), methanol, ethanol, HFE (hydrofluoroether), and acetone. The organic solvent may be a mixture, for example, a mixture of IPA and acetone, or a mixture of IPA and methanol.

[0038] 1, the substrate processing apparatus 100 is also provided with an acidic chemical liquid supply unit 81, an alkaline chemical liquid supply unit 82, and an organic solvent supply unit 83. The acidic chemical liquid supply unit 81, the alkaline chemical liquid supply unit 82, and the organic solvent supply unit 83 are provided on the +X side of the apparatus main body 120. The acidic chemical liquid supply unit 81 stores an acidic chemical liquid and supplies the acidic chemical liquid to the nozzle portion of the processing unit 10. The alkaline chemical liquid supply unit 82 stores an alkaline chemical liquid and supplies the alkaline chemical liquid to the nozzle portion of the processing unit 10. The organic solvent supply unit 83 stores an organic solvent and supplies the organic solvent to the nozzle portion of the processing unit 10.

[0039] In addition, a fan filter unit (FFU) is provided above each processing chamber, and the fan filter unit creates a downward airflow within the processing chamber. Gas within the processing chamber of each processing unit 10 is exhausted to the outside of the substrate processing apparatus 100 through an exhaust system 20. Hereinafter, the gas exhausted from the processing chamber of the processing unit 10 is referred to as exhaust gas.

[0040] <Exhaust system> When the processing fluid is a liquid, the exhaust gas discharged from each processing unit 10 contains vaporized components (gas) and mist from the processing fluid. Therefore, during the period when an acidic chemical solution is supplied to the substrate W as the processing fluid from the nozzle of the processing unit 10, the exhaust gas contains the gas and mist of the acidic chemical solution. Here, the fluid classification of the exhaust gas is also introduced. The fluid classification of the exhaust gas is acidic gas. During the period when an alkaline chemical solution is supplied to the substrate W, the exhaust gas contains the gas and mist of the alkaline chemical solution. Hereinafter, this fluid classification of the exhaust gas will be referred to as alkaline gas. During the period when an organic solvent is supplied to the substrate W, the exhaust gas contains the gas and mist of the organic solvent. Hereinafter, this fluid classification of the exhaust gas will be referred to as organic gas. It is desirable that these exhaust gases be discharged separately according to their fluid classification. The same applies when the processing fluid is gas.

[0041] Fig. 3 is a diagram schematically illustrating an example of the connections of the exhaust system 20 according to the first embodiment. Although Fig. 3 illustrates the connections of various pipes in the exhaust system 20 in a two-dimensional manner, the actual pipes are arranged three-dimensionally.

[0042] The exhaust system 20 is a piping system for discharging exhaust gas from each processing unit 10 to the outside of the substrate processing apparatus 100, and in this embodiment, the exhaust gas is discharged to the outside through an exhaust path that corresponds to the fluid classification of the exhaust gas.

[0043] In the example of FIGS. 1 to 3, the exhaust system 20 includes an individual exhaust pipe 21, a collective exhaust pipe 22, a switching unit 23, and an outside air introduction unit 24.

[0044] The individual exhaust pipes 21 are provided corresponding to the processing units 10, and as a more specific example, are provided in a one-to-one correspondence with the processing units 10. The upstream ends of the individual exhaust pipes 21 are connected to the corresponding processing units 10, and exhaust gas from the processing units 10 flows into the upstream ends of the individual exhaust pipes 21. Therefore, exhaust gas from the corresponding processing units 10 flows into the individual exhaust pipes 21.

[0045] 3, the individual exhaust pipe 21 may be provided with a pressure adjusting unit 211. The pressure adjusting unit 211 includes, for example, a pressure sensor (not shown) that measures the pressure inside the processing chamber of the processing unit 10, and a flow regulator (e.g., a damper) that adjusts the flow rate of the exhaust gas flowing through the individual exhaust pipe 21. The control unit 90 can adjust the pressure inside the processing chamber within a predetermined range by controlling the flow regulator based on the pressure sensor.

[0046] Exhaust gas from the treatment unit 10 flows through the individual exhaust pipe 21. The fluid classification of this exhaust gas changes depending on the content of the treatment in the treatment unit 10 (that is, the fluid classification of the treatment fluid).

[0047] The switching unit 23 guides the exhaust gas from the individual exhaust pipes 21 to the collecting exhaust pipe 22 according to its fluid classification. In other words, the switching unit 23 switches between communication and blocking between each of the individual exhaust pipes 21 and the collecting exhaust pipe 22. Hereinafter, the collecting exhaust pipe 22 for acidic gases, the collecting exhaust pipe 22 for alkaline gases, and the collecting exhaust pipe 22 for organic gases will be referred to as collecting exhaust pipes 22i to 22k, respectively. The switching unit 23 is provided in a one-to-one correspondence with the individual exhaust pipes 21, and is connected to the processing unit 10 via the individual exhaust pipe 21. In other words, the switching unit 23 is connected to the downstream end of the individual exhaust pipe 21.

[0048] Each switching section 23 includes a plurality of branch exhaust pipes 231 provided corresponding to the fluid sections, and a plurality of on-off valves 232. Herein, since there are three fluid sections, three branch exhaust pipes 231 are provided for each processing unit 10. Hereinafter, the branch exhaust pipe 231 for acidic gas, the branch exhaust pipe 231 for alkaline gas, and the branch exhaust pipe 231 for organic gas will be referred to as branch exhaust pipes 231i to 231k, respectively. The upstream ends of the branch exhaust pipes 231i to 231k are connected to the individual exhaust pipe 21, and the downstream ends of the branch exhaust pipes 231i to 231k are connected to the collective exhaust pipes 22i to 22k, respectively.

[0049] The on-off valve 232 is provided in the branch exhaust pipe 231 and switches between opening and closing the branch exhaust pipe 231. The on-off valve 232 may be, for example, a butterfly valve or another type of valve. Hereinafter, the on-off valves 232 provided in the branch exhaust pipes 231i to 231k will also be referred to as on-off valves 232i to 232k, respectively.

[0050] The control unit 90 controls the on-off valve 232 corresponding to the processing unit 10 in accordance with the fluid category of the exhaust gas from the processing unit 10. Specifically, when the fluid category of the exhaust gas is an acidic gas, the control unit 90 opens the on-off valve 232i and closes the on-off valves 232j and 232k. As a result, the exhaust gas that flows from the processing unit 10 into the switching unit 23 through the individual exhaust pipes 21 flows into the collecting exhaust pipe 22i for acidic gases through the branch exhaust pipe 231i. Furthermore, when the fluid category of the exhaust gas is an alkaline gas, the control unit 90 opens the on-off valve 232j and closes the on-off valves 232i and 232k. As a result, the exhaust gas from the processing unit 10 flows into the collecting exhaust pipe 22j for alkaline gases. Furthermore, when the fluid category of the exhaust gas is an organic gas, the control unit 90 opens the on-off valve 232k and closes the on-off valves 232i and 232j. As a result, the exhaust gas from the processing unit 10 flows into the exhaust collection pipe 22k for organic gases.

[0051] As described above, the switching unit 23 guides the exhaust gas from the individual exhaust pipes 21 to the collective exhaust pipe 22 according to the fluid classification.

[0052] 2, the switching units 23 are provided at positions horizontally adjacent to the corresponding processing units 10. Therefore, the height positions of the switching units 23 corresponding to the processing units 10a to 10c are different from one another. Specifically, the switching unit 23 corresponding to the processing unit 10a is located vertically above both of the switching units 23 corresponding to the processing units 10b and 10c, the switching unit 23 corresponding to the processing unit 10c is located vertically below both of the switching units 23 corresponding to the processing units 10a and 10b, and the switching unit 23 corresponding to the processing unit 10b is located between the switching units 23 corresponding to the processing units 10a and 10c.

[0053] 1 to 3, a collecting exhaust pipe 22 is provided for each tower 40 and for each fluid section. That is, collecting exhaust pipes 22i to 22k are provided in tower 40A, and collecting exhaust pipes 22i to 22k separate from tower 40A are provided in tower 40B. The same is true for towers 40C and 40D. In this example, four towers 40 are provided and there are three fluid sections, so a total of 12 collecting exhaust pipes 22 are provided.

[0054] 2, each collecting exhaust pipe 22 includes a vertical exhaust pipe 221 and a horizontal exhaust pipe 222. The vertical exhaust pipe 221 is provided at a position adjacent to the corresponding tower 40 in the horizontal direction (e.g., the X-axis direction) and extends along the Z-axis direction. The downstream ends of the branch exhaust pipes 231 corresponding to the processing units 10a to 10c are connected to the vertical exhaust pipe 221 at different height positions. In other words, the branch exhaust pipe 231 corresponding to the processing unit 10a, which is provided at the highest position, is connected to the vertical exhaust pipe 221 at a connection position vertically above both of the branch exhaust pipes 231 corresponding to the processing units 10b and 10c. For example, focusing on the branch exhaust pipe 231i, the connection position Pa between the branch exhaust pipe 231i corresponding to the processing unit 10a and the vertical exhaust pipe 221 is higher than the connection position Pb between the branch exhaust pipe 231i corresponding to the processing unit 10b and the vertical exhaust pipe 221, and the connection position Pb is higher than the connection position Pc between the branch exhaust pipe 231i corresponding to the processing unit 10c and the vertical exhaust pipe 221.

[0055] In each collecting exhaust pipe 22, the lower end of the vertical exhaust pipe 221 is closed, and the upper end of the vertical exhaust pipe 221 is connected to a horizontal exhaust pipe 222. In the example shown in FIGS. 1 and 2, the horizontal exhaust pipe 222 is installed vertically above the tower 40 and extends horizontally (mainly in the X-axis direction). Specifically, the horizontal exhaust pipe 222 is installed directly above the tower 40, extends across the tower 40 in the X-axis direction, and bends toward the -Y side on the +X side of the alkaline chemical solution supply unit 82. In the example shown in FIG. 1, the horizontal exhaust pipes 222 of the collecting exhaust pipes 22i, 22j, and 22k corresponding to the same tower 40 are installed side by side in the horizontal direction. The downstream end of each horizontal exhaust pipe 222 is connected to factory piping and, via the factory piping, is connected to exhaust equipment appropriate for the fluid category. The cross-sectional shape of the horizontal exhaust pipe 222 perpendicular to the longitudinal direction is, for example, rectangular. However, the cross-sectional shape of the horizontal exhaust pipe 222 is not limited to rectangular and may be other shapes.

[0056] In the example of FIGS. 1 and 2, the exhaust manifold 22 corresponding to the tower 40C is i The horizontal exhaust pipe 222 is a collective exhaust pipe 22 corresponding to the tower 40D. i In this example, the exhaust pipe 222 corresponding to the tower 40C is aligned with the horizontal exhaust pipe 222 in the Z-axis direction. i The horizontal exhaust pipe 222 is a collective exhaust pipe 22 corresponding to the tower 40D. i The exhaust pipes 22j and 22k extend so as to overlap with the horizontal exhaust pipes 222 in a plan view. The same applies to the exhaust pipe collections 22j and 22k, and also to the towers 40A and 40B.

[0057] The outside air introduction section 24 is a component for reducing pressure fluctuations within the collecting exhaust pipe 22 by introducing gas from the outside (hereinafter referred to as outside air) into the collecting exhaust pipe 22. In the example of FIGS. 1 and 2, an outside air introduction section 24 is provided in each collecting exhaust pipe 22. That is, an outside air introduction section 24 is provided in a one-to-one correspondence with a collecting exhaust pipe 22. In the example of FIGS. 1 and 2, the outside air introduction section 24 corresponds to the -X side end of the horizontal exhaust pipe 222. The -X side end of the horizontal exhaust pipe 222 is open, and outside air can flow into the horizontal exhaust pipe 222 from this opening (inlet). The -X side end of the horizontal exhaust pipe 222 can be understood as a single introduction pipe provided in the collecting exhaust pipe 22 that introduces outside air. That is, the outside air introduction section 24 has a flow path that introduces outside air into the collecting exhaust pipe 22, and this flow path corresponds to the flow path of the introduction pipe (the end of the horizontal exhaust pipe 222).

[0058] The area of ​​the flow path of the intake pipe (hereinafter referred to as the intake area) is variable and can be controlled by the control unit 90. For example, the outside air intake unit 24 includes a damper 242 and a drive unit 243 that adjusts the opening degree of the damper 242 (see FIG. 2). The damper 242 includes a plate-shaped movable member 244 that is rotatably provided within the end (the intake pipe of the outside air intake unit 24) on the -X side of the horizontal exhaust pipe 222. The movable member 244 is rotatable between a fully closed position that substantially blocks the intake pipe of the outside air intake unit 24 and a fully open position that substantially fully opens the intake pipe of the outside air intake unit 24. The intake area can be adjusted by rotating the movable member 244 between the fully closed position and the fully open position. The opening degree of the damper 242 is represented by a rotation angle. Here, the opening degree at which the outside air intake unit 24 is substantially fully closed is defined as 0 degrees, and the opening degree at which the outside air intake unit 24 is substantially fully open is defined as 90 degrees.

[0059] The drive unit 243 displaces (here, rotates) the movable member 244. For example, the drive unit 243 includes a motor. The drive unit 243 is controlled by the control unit 90, and adjusts the rotational position of the movable member 244. Specifically, the control unit 90 controls the drive unit 243 based on the switching state of the switching unit 23, thereby adjusting the rotational position of the movable member 244 and adjusting the introduction area of ​​the outside air introduction unit 24. As will be described in detail later, the control unit 90 adjusts the introduction area, thereby making it possible to reduce pressure fluctuations in the collecting exhaust pipe 22 with higher precision.

[0060] Hereinafter, the outside air introduction sections 24 provided in the exhaust collection pipes 22i to 22k will also be referred to as outside air introduction sections 24i to 24k, respectively.

[0061] <Control unit> The control unit 90 comprehensively controls the substrate processing apparatus 100. Specifically, the control unit 90 controls the indexer robot 112, the processing units 10, the exhaust system 20 (specifically, the switching unit 23, the driving unit 243, etc.), and the center robot 30.

[0062] FIG. 4 is a functional block diagram illustrating an example of the internal configuration of the control unit 90. The control unit 90 is an electronic circuit and includes, for example, a data processing unit 91 and a storage unit 92. In the specific example of FIG. 4, the data processing unit 91 and the storage unit 92 are connected to each other via a bus 93. The data processing unit 91 may be, for example, an arithmetic processing device such as a CPU (Central Processor Unit). The storage unit 92 may include a non-transitory storage unit (e.g., a ROM (Read Only Memory) or a hard disk) 921 and a temporary storage unit (e.g., a RAM (Random Access Memory)) 922. The non-transitory storage unit 921 may store, for example, a program that defines the processing to be performed by the control unit 90. The data processing unit 91 executes this program, allowing the control unit 90 to perform the processing defined in the program. Of course, some or all of the processing performed by the control unit 90 may be performed by hardware such as a dedicated logic circuit.

[0063] <Exhaust operation> The control unit 90 controls the switching unit 23 based on the fluid classification of the exhaust gas from the treatment unit 10, and directs the exhaust gas to the collecting exhaust pipe 22 according to the fluid classification. Because the fluid classification of the exhaust gas from each treatment unit 10 changes sequentially, the control unit 90 changes the switching state of the switching unit 23 in accordance with the change in fluid classification, and appropriately directs the exhaust gas from each treatment unit 10 to the collecting exhaust pipe 22. Therefore, as will be described in detail below, the flow rate of the exhaust gas flowing into each collecting exhaust pipe 22 varies according to the change in the switching state of the switching unit 23.

[0064] For example, in tower 40A, when the fluid category of the exhaust gas from processing units 10a to 10c is acidic gas, control unit 90 opens on-off valve 232i corresponding to processing units 10a to 10c. As a result, the exhaust gas from processing units 10a to 10c flows through collecting exhaust pipe 22i. In the example of FIG. 3, the flow of these exhaust gases is schematically indicated by solid arrows in the piping. Here, when the processing fluid supplied to processing unit 10b changes, for example, from an acidic chemical solution to an alkaline chemical solution, control unit 90 closes on-off valve 232i corresponding to processing unit 10b and opens on-off valve 232j corresponding to processing unit 10b. As a result, the flow destination of the exhaust gas switches from collecting exhaust pipe 22i to collecting exhaust pipe 22j. In the example of FIG. 3, the exhaust gas after this switch is schematically indicated by dashed arrows in the piping. This switching reduces the flow rate of exhaust gas flowing into the exhaust collecting pipe 22i by the amount of the processing unit 10b, and increases the flow rate of exhaust gas flowing into the exhaust collecting pipe 22j by the amount of the processing unit 10b.

[0065] In this way, when the number of processing units 10 communicating with each exhaust collecting pipe 22 changes, the flow rate of exhaust gas flowing through each exhaust collecting pipe 22 changes.

[0066] Therefore, the control unit 90 controls the outside air introduction section 24 provided in each collecting exhaust pipe 22 to adjust the introduction area. In the above-described operation example, the introduction area of ​​the outside air introduction section 24i is increased and the introduction area of ​​the outside air introduction section 24j is reduced in response to the switching between opening and closing of the on-off valves 232i and 232j corresponding to the processing unit 10b. By increasing the introduction area of ​​the outside air introduction section 24i, the decrease in the exhaust gas from the processing unit 10b in the collecting exhaust pipe 22i can be compensated for by the outside air, and pressure fluctuations in the collecting exhaust pipe 22i can be reduced. In addition, by reducing the introduction area of ​​the collecting exhaust pipe 22j, the amount of outside air flowing into the collecting exhaust pipe 22j can be reduced, so that the amount of outside air flowing into the collecting exhaust pipe 22j due to the exhaust gas from the processing unit 10b flowing into the collecting exhaust pipe 22j can be reduced. j This can reduce pressure fluctuations.

[0067] In this way, the control unit 90 controls the outside air introduction unit 24 based on the switching states of the multiple switching units 23, thereby reducing pressure fluctuations in each of the collecting exhaust pipes 22. The following description focuses on the collecting exhaust pipe 22i as a representative example.

[0068] The branch exhaust pipes 231i corresponding to the processing units 10a to 10c are connected to the vertical exhaust pipes 221 of the collecting exhaust pipe 22i at different height positions. Therefore, the flow path lengths from the processing units 10a to 10c to the horizontal exhaust pipes 222 of the collecting exhaust pipe 22i are different from one another. Specifically, the flow path lengths are shorter in the order of the processing units 10a to 10c. In other words, the flow path length from the processing unit 10a to the horizontal exhaust pipe 222 is the shortest, and the flow path length from the processing unit 10c to the horizontal exhaust pipe 222 is the longest.

[0069] Therefore, even when only one processing unit 10 is in communication with the collective exhaust pipe 22i, the pressure in the collective exhaust pipe 22i is determined depending on which of the processing units 10a to 10c is in communication with the collective exhaust pipe 22i. i They may differ from each other depending on whether they are in communication with

[0070] Below, we will explain the switching state in which only one processing unit 10 is connected to the collecting exhaust pipe 22i. Figures 5 to 7 are diagrams that schematically show an example of a state when only one processing unit 10 is connected to the collecting exhaust pipe 22i. In the example of Figure 5, only the processing unit 10a, which is located at the highest position, is connected to the collecting exhaust pipe 22i. Since the exhaust gas from the processing unit 10a flows through the collecting exhaust pipe 22i via the shortest flow path, the exhaust gas easily flows through the collecting exhaust pipe 22i. For this reason, in Figure 5, the exhaust gas flowing from the processing unit 10a through the collecting exhaust pipe 22i is schematically shown with a thick arrow.

[0071] In the example of Figure 6, only the processing unit 10b, which is located in the next highest position, is connected to the collecting exhaust pipe 22i. Because the exhaust gas from processing unit 10b flows through collecting exhaust pipe 22i via a longer flow path than the flow path corresponding to processing unit 10a, the exhaust gas flows less easily through collecting exhaust pipe 22i than the exhaust gas from processing unit 10a. For this reason, in Figure 6, the exhaust gas flowing through collecting exhaust pipe 22i from processing unit 10b is indicated by an arrow that is thinner than the arrow indicating the exhaust gas from processing unit 10a in Figure 5.

[0072] In the example of Figure 7, only the processing unit 10c, which is located at the lowest position, is connected to the collecting exhaust pipe 22i. Because the exhaust gas from the processing unit 10c flows through the collecting exhaust pipe 22i via the longest flow path, the exhaust gas flows least easily through the collecting exhaust pipe 22i. For this reason, in Figure 7, the exhaust gas flowing through the collecting exhaust pipe 22i from the processing unit 10c is indicated by an arrow that is thinner than the arrows indicating the exhaust gas in Figures 5 and 6.

[0073] As described above, the flow rate of the gas flowing through the exhaust collecting pipe 22i varies depending on the processing unit 10 that communicates with the exhaust collecting pipe 22i, which leads to pressure fluctuations.

[0074] Therefore, even if the number of processing units 10 communicating with the collecting exhaust pipe 22i is the same, the introduction area of ​​the outside air introduction section 24i is adjusted depending on the processing units 10 communicating with the collecting exhaust pipe 22i. Specifically, when only processing unit 10a communicates with the collecting exhaust pipe 22i (FIG. 5), the introduction area of ​​the outside air introduction section 24i is set to be relatively small. When only processing unit 10b communicates with the collecting exhaust pipe 22i (FIG. 6), the introduction area of ​​the outside air introduction section 24i is set to be larger than when only processing unit 10a communicates. When only processing unit 10c communicates with the collecting exhaust pipe 22i (FIG. 7), the introduction area of ​​the outside air introduction section 24i is set to be larger than when only processing unit 10b communicates. This makes it possible to reduce pressure fluctuations in the collecting exhaust pipe 22i with greater precision.

[0075] Specifically, the setting of the introduction area of ​​the outside air introduction section 24i is realized by the operation described below. Here, the adjustment amount of the introduction area of ​​the outside air introduction section 24 (hereinafter referred to as individual introduction area) is set in advance for each of the processing units 10a to 10c. Hereinafter, the individual introduction areas corresponding to the processing units 10a to 10c will be referred to as individual introduction areas A1 to A3, respectively. Specific settings of the individual introduction areas A1 to A3 will be described in detail later.

[0076] Here, if the open state of the on-off valve 232i is represented by "1" and the closed state of the on-off valve 232i is represented by "0," the switching states of the three switching parts 23 for the collecting exhaust pipe 22i are eight as shown below. That is, if the open / closed states of the on-off valves 232i corresponding to the processing units 10a to 10c are arranged in this order, there are eight switching states: (000), (001), (010), (100), (011), (101), (110), and (111).

[0077] As will be described in detail below, the control unit 90 sets the introduction area A based on the sum of the individual introduction areas corresponding to the processing units 10 that are isolated from the collecting exhaust pipe 22 among the multiple processing units 10. As a specific example, the control unit 90 controls the introduction area A of the outside air introduction part 24i provided in the collecting exhaust pipe 22i based on the following formula.

[0078] A=Σ(αn·An)(n=1~3) ···(1) Here, α1 to α3 correspond to the processing units 10a to 10c, respectively, and when the on-off valve 232i is open, αn = 0, and when the on-off valve 232i is closed, αn = 1. For example, when the on-off valve 232i corresponding to the processing unit 10a is open, α1 = 0, and when the on-off valve 232i corresponding to the processing unit 10a is closed, α1 = 1.

[0079] Table 1 below shows an example of the introduction area A based on formula (1).

[0080] [Table 1]

[0081] As can be seen from Table 1, the individual introduction area An corresponding to the processing unit 10 that is isolated from the collecting exhaust pipe 22i is used to calculate the introduction area A. For example, in the switching state (100), the processing units 10b and 10c are isolated from the collecting exhaust pipe 22i, and the sum of the individual introduction areas A2 and A3 corresponding to these processing units 10b and 10c becomes the introduction area A.

[0082] The individual introduction areas A1 to A3 are set to different values, specifically, to values ​​corresponding to the installation positions of the corresponding processing units 10. More specifically, the higher the installation position of the processing units 10, the larger the individual introduction areas A1 to A3 are set to. Thus, the individual introduction area A1 is set to a value larger than both the individual introduction areas A2 and A3, the individual introduction area A2 is set to a value between the individual introduction areas A1 and A3, and the individual introduction area A3 is set to a value smaller than both the individual introduction areas A1 and A2. Therefore, the introduction area A becomes larger toward the bottom and toward the right in Table 1. The individual introduction areas A1 to A3 can be set to values ​​corresponding to the flow rates of gas exhausted from the processing units 10a to 10c, respectively, for example.

[0083] Individual area data indicating the individual introduction areas A1 to A3 corresponding to the processing units 10 is stored in advance in, for example, the storage unit 94. The storage unit 94 is a non-transitory storage unit, such as a memory or a hard disk. In the example of FIG. 4, the storage unit 94 is also connected to the bus 93. The control unit 90 reads out the individual area data from the storage unit 94 and determines the individual introduction areas A1 to A3 corresponding to the processing units 10 based on the individual area data.

[0084] The individual introduction area An can also be expressed as the product of a constant K and a weighting coefficient ωn. In this case, the weighting coefficient ωn may be set according to the installation position of the processing unit 10.

[0085] The control unit 90 calculates the introduction area A using equation (1) based on the switching state of the switching unit 23, and controls the drive unit 243 of the outside air introduction unit 24i so that the introduction area of ​​the outside air introduction unit 24i becomes the calculated introduction area A.

[0086] Hereinafter, the control of the outside air introduction section 24 based on the formula (1) will be described, as a representative example, in which only one processing unit 10 is in communication with the collective exhaust pipe 22i. Fig. 5 shows the switching state (100), Fig. 6 shows the switching state (010), and Fig. 7 shows the switching state (001).

[0087] According to formula (1), in the switching state (100) where only the processing unit 10a is connected to the collecting exhaust pipe 22i, the introduction area A(100) is controlled to (A2+A3), in the switching state (010) where only the processing unit 10b is connected to the collecting exhaust pipe 22i, the introduction area A(010) is controlled to (A1+A3), and in the switching state (001) where only the processing unit 10c is connected to the collecting exhaust pipe 22i, the introduction area A(001) is controlled to (A1+A2).

[0088] The individual introduction areas A1 to A3 become smaller as the last digit of the symbol becomes larger, so introduction area A(100) is smaller than introduction area A(010), which is smaller than introduction area A(001). Therefore, in the example of Fig. 5, the outside air flowing into the collecting exhaust pipe 22i through the outside air introduction section 24i is shown with a thin arrow, in the example of Fig. 6, the outside air flowing into the collecting exhaust pipe 22i through the outside air introduction section 24i is shown with a thicker arrow than in Fig. 5, and in the example of Fig. 7, the outside air flowing into the collecting exhaust pipe 22i through the outside air introduction section 24i is shown with a thicker arrow than in Fig. 6.

[0089] As described above, even if the number of processing units 10 communicating with the collecting exhaust pipe 22i is the same, the introduction area A is made smaller the higher the installation position of the processing units 10 communicating with the collecting exhaust pipe 22i. This allows outside air to flow into the collecting exhaust pipe 22i at an appropriate flow rate according to the ease of flow of exhaust gas flowing through the collecting exhaust pipe 22i. Therefore, pressure fluctuations in the collecting exhaust pipe 22i can be reduced with higher precision. The same applies to the collecting exhaust pipes 22j and 22k.

[0090] In the above example, the individual introduction areas A1 to A3 are each set corresponding to the flow rate of exhaust gas from the processing units 10a to 10c. This allows outside air equivalent to the exhaust gas from the processing unit 10 that is disconnected from the collecting exhaust pipe 22i to be replenished into the collecting exhaust pipe 22i through the outside air introduction section 24i. For example, in the switching state (100), the processing unit 10a is connected to the collecting exhaust pipe 22i, and the processing units 10b and 10c are disconnected from the collecting exhaust pipe 22i. The introduction area A is adjusted to (A2 + A3). This allows outside air equivalent to the exhaust gas from the processing units 10b and 10c to flow into the collecting exhaust pipe 22i through the outside air introduction section 24i. Therefore, an amount of gas equivalent to the amount of exhaust gas from the processing units 10a to 10c flows through the collecting exhaust pipe 22i. This is also true for other switching states, so pressure fluctuations in the collecting exhaust pipe 22i caused by changes in the switching state can ideally be eliminated.

[0091] In the above example, the outside air introduction section 24 includes a single introduction pipe (the -X side end of the horizontal exhaust pipe 222) provided in the exhaust collecting pipe 22, and a movable member 244 for adjusting the introduction area. This allows the number of movable members 244 for adjusting the introduction area to be reduced compared to when multiple introduction pipes are provided in the exhaust collecting pipe 22, thereby reducing manufacturing costs. Furthermore, maintenance of the substrate processing apparatus 100 is also easy.

[0092] In addition, in the above example, individual area data indicating the individual introduction area corresponding to the processing unit 10 is pre-stored in the memory unit 94, and the control unit 90 controls the rotational position of the movable member 244 based on the individual area data and the switching state of the switching unit 23.

[0093] Although the above example describes the collective exhaust pipe 22i, the same applies to the collective exhaust pipes 22j and 22k. In this case, the individual introduction areas A1 to A3 may be set for each fluid section. That is, in each tower 40, the individual introduction area A1 used to calculate the introduction area corresponding to the outside air introduction sections 24i, 24j, and 24k may be set independently of each other. The same applies to the individual introduction areas A2 and A3. In this way, the individual introduction areas A1 to A3 suitable for each fluid section can be set.

[0094] In the example shown in FIGS. 1 and 2, a collecting exhaust pipe 22i is provided for each tower 40. That is, a collecting exhaust pipe 22i corresponding to tower 40A, a collecting exhaust pipe 22i corresponding to tower 40B, a collecting exhaust pipe 22i corresponding to tower 40C, and a collecting exhaust pipe 22i corresponding to tower 40D are provided. This prevents exhaust gases from different towers 40 from mixing into the collecting exhaust pipe 22i. In this embodiment, the individual introduction areas A1 to A3 can be set independently for each tower 40, allowing the individual introduction areas A1 to A3 to be set appropriately for each tower 40. This allows pressure fluctuations in each collecting exhaust pipe 22i due to differences between towers 40 to be reduced with higher accuracy. The same applies to the collecting exhaust pipes 22j and 22k.

[0095] Here, the terms in the Summary of the Invention correspond to those in the Detailed Description of the Invention. One of the towers 40A-40D corresponds to the first tower, and the other corresponds to the second tower. The processing unit 10 belonging to one of the towers 40A-40D (i.e., the first tower) corresponds to the first processing unit, and the processing unit 10 belonging to the other one (i.e., the second tower) corresponds to the second processing unit. The individual exhaust pipe 21 connected to the first processing unit corresponds to the first individual exhaust pipe, and the individual exhaust pipe 21 connected to the second processing unit corresponds to the second individual exhaust pipe. The switching unit 23 connected to the first individual exhaust pipe corresponds to the first switching unit, and the switching unit 23 connected to the second individual exhaust pipe corresponds to the second switching unit. Each of the collective exhaust pipes 22i-22k connected to the first switching unit corresponds to the first collective exhaust pipe, and each of the collective exhaust pipes 22i-22k connected to the second switching unit corresponds to the second collective exhaust pipe. Each of the outside air introduction sections 24i to 24k provided in the first exhaust collection pipe corresponds to a first outside air introduction section, and each of the outside air introduction sections 24i to 24k provided in the second exhaust collection pipe corresponds to a second outside air introduction section.

[0096] <Second embodiment> Fig. 8 is a plan view schematically showing an example of the configuration of the substrate processing apparatus 100 according to the second embodiment, and Fig. 9 is a side view schematically showing an example of the configuration of the substrate processing apparatus 100 according to the second embodiment. In the example of Fig. 8, one collective exhaust pipe 22i is provided for two towers 40 adjacent to each other in the X-axis direction. That is, a collective exhaust pipe 22i common to towers 40A and 40B, and a collective exhaust pipe 22i common to towers 40C and 40D are provided. The same applies to the collective exhaust pipes 22j and 22k.

[0097] As in the first embodiment, the horizontal exhaust pipes 222 of the collective exhaust pipe 22 are provided vertically above the tower 40. The cross-sectional shape perpendicular to the longitudinal direction of the horizontal exhaust pipes 222 is, for example, rectangular. In the examples of FIGS. 8 and 9, the vertical width of the cross-sectional shape is wider than the horizontal width. This makes it possible to reduce the total width (horizontal width) of the three horizontal exhaust pipes 222 arranged adjacent to each other in the horizontal direction. This makes it possible to prevent the horizontal exhaust pipes 222 from obstructing the airflow of the fan filter unit provided directly above the processing unit 10. The -X side end of the horizontal exhaust pipe 222 is closed, not open.

[0098] Fig. 10 is a diagram schematically illustrating an example of the connections of the exhaust system 20 according to the second embodiment. Note that, although Fig. 10 illustrates the connections of various pipes in the exhaust system 20 in a two-dimensional manner, the actual pipes are arranged three-dimensionally.

[0099] In the second embodiment, the outside air introduction section 24 provided in each collecting exhaust pipe 22 includes a plurality of introduction pipes 25 corresponding one-to-one to the plurality of processing units 10. Here, a total of six processing units 10 belonging to two towers 40 correspond to one collecting exhaust pipe 22, and therefore six introduction pipes 25 are provided for each collecting exhaust pipe 22. In the example of Figures 8 to 10, in each collecting exhaust pipe 22, the six introduction pipes 25 are arranged side by side in the longitudinal direction of the horizontal exhaust pipe 222 (here, the X-axis direction).

[0100] 9, the downstream end of the inlet pipe 25 is connected to the upper surface of the horizontal exhaust pipe 222 of the exhaust collecting pipe 22. The inlet pipe 25 extends vertically upward from the downstream end, and its upper end opens vertically upward. Outside air flows into the inlet pipe 25 from the upstream opening of the inlet pipe 25, and then flows through the inlet pipe 25 into the horizontal exhaust pipe 222. The cross-sectional shape of the inlet pipe 25 perpendicular to the direction in which the outside air flows may be rectangular, or may be, for example, circular.

[0101] The outside air introduction section 24 includes an area adjustment member 251 and an on-off valve 252 for each introduction pipe 25. The on-off valve 252 is provided in the introduction pipe 25 and switches the on-off state of the introduction pipe 25 between open and closed. The on-off valve 252 may be, for example, a butterfly valve, or may be another type of valve.

[0102] Area adjustment member 251 is a member that adjusts the flow path area (individual introduction area) of introduction pipe 25. FIG. 11 is a perspective view that schematically shows an example of the configuration of area adjustment member 251. In the example of FIG. 11, area adjustment member 251 includes a pair of plate-like members 253. Plate-like members 253 are attached to the upper end opening of introduction pipe 25. Specifically, an attachment plate 250 is provided at the upper end of introduction pipe 25, and a pair of plate-like members 253 are attached onto attachment plate 250. The pair of plate-like members 253 are arranged side by side in an arrangement direction that is parallel to the upper end opening of introduction pipe 25.

[0103] Each plate-like member 253 has a plurality of elongated holes 254 formed in the arrangement direction. The elongated holes 254 penetrate the plate-like member 253 in its thickness direction. The plate-like member 253 is attached to the mounting plate 250 by screws 255 passing through the elongated holes 254 and threading into screw holes provided in the mounting plate 250. With this structure, the attachment position of the plate-like member 253 relative to the mounting plate 250 can be changed within the range of the longitudinal direction (arrangement direction) of the elongated holes 254. This makes it possible to adjust the distance between the pair of plate-like members 253, and thereby adjust the area of ​​the opening on the upstream side of the introduction pipe 25 (individual introduction area).

[0104] The individual introduction area of ​​the introduction pipe 25 is set to a larger value as the corresponding processing unit 10 is located higher. Here, the collective exhaust pipe 22i provided corresponding to the tower 40A and the tower 40B will be described. A total of six introduction pipes 25 are provided in this collective exhaust pipe 22i corresponding to the three processing units 10a to 10c of the tower 40A and the three processing units 10a to 10c of the tower 40B. Hereinafter, the introduction pipes 25 will be distinguished by the alphabet at the end of the reference numeral of the tower 40 and the alphabet at the end of the reference numeral of the processing unit 10. For example, introduction pipe 25Aa is the introduction pipe 25 corresponding to the processing unit 10a of the tower 40A.

[0105] The individual introduction area of ​​introduction pipe 25Aa is set to a value corresponding to the flow rate of exhaust gas from processing unit 10a of tower 40A, the individual introduction area of ​​introduction pipe 25Ab is set to a value corresponding to the flow rate of exhaust gas from processing unit 10b of tower 40A, and the individual introduction area of ​​introduction pipe 25Ac is set to a value corresponding to the flow rate of exhaust gas from processing unit 10c of tower 40A. Similarly, the individual introduction area of ​​introduction pipe 25Ba is set to a value corresponding to the flow rate of exhaust gas from processing unit 10a of tower 40B, the individual introduction area of ​​introduction pipe 25Bb is set to a value corresponding to the flow rate of exhaust gas from processing unit 10b of tower 40B, and the individual introduction area of ​​introduction pipe 25Bc is set to a value corresponding to the flow rate of exhaust gas from processing unit 10c of tower 40B.

[0106] Here, the individual introduction area of ​​the introduction pipe 25Aa is set larger than the individual introduction area of ​​the introduction pipe 25Ab, which is set larger than the individual introduction area of ​​the introduction pipe 25Ac. This is because the higher the installation position of the processing unit 10, the easier it is for the exhaust gas to flow and the greater the flow rate. Similarly, the individual introduction area of ​​the introduction pipe 25Ba is set larger than the individual introduction area of ​​the introduction pipe 25Bb, which is set larger than the individual introduction area of ​​the introduction pipe 25Bc. Such individual introduction area settings are realized by the user adjusting the area adjustment member 251 corresponding to each introduction pipe 25.

[0107] Outside air flows into the collective exhaust pipe 22i through the introduction pipes 25 of the outside air introduction section 24i whose on-off valves 252 are open. Therefore, the introduction area A of the outside air introduction section 24i can be defined as the sum of the individual introduction areas of the introduction pipes 25 whose on-off valves 252 are open. In other words, the introduction area A is adjusted by the on-off valves 252. For example, when all six on-off valves 252 are open, the introduction area A is the sum of the individual introduction areas of the six introduction pipes 25, and when the on-off valve 252 of only the introduction pipe 25Aa is open, the introduction area A is the individual introduction area of ​​the introduction pipe 25Aa.

[0108] The control unit 90 controls the introduction area of ​​the outside air introduction unit 24i so that outside air corresponding to the exhaust gas from the processing unit 10 that is isolated from the collecting exhaust pipe 22i flows into the collecting exhaust pipe 22i. In other words, the control unit 90 controls the plurality of on-off valves 252 based on the switching states of the plurality of switching units 23. Specifically, the control unit 90 opens the on-off valve 252 of the introduction pipe 25 corresponding to the processing unit 10 that is isolated from the collecting exhaust pipe 22i, and causes the outside air to flow into the collecting exhaust pipe 22i. communication In other words, in each collecting exhaust pipe 22, the open / close states of the on-off valve 252 of the on-off valve 252 corresponding to the same processing unit 10 are opposite to each other. For example, in the tower 40A, the open / close state of the on-off valve 252 of the on-off valve 252 of the on-off pipe 25Aa corresponding to the processing unit 10a is controlled opposite to the open / close state of the on-off valve 232i corresponding to the processing unit 10a.

[0109] Below, we will explain the exhaust operation when only one processing unit 10 in tower 40A is connected to the collecting exhaust pipe 22i. For simplicity's sake, the following explanation will ignore tower 40B. FIGS. 12 to 14 are schematic diagrams illustrating an example of a state in which only one processing unit 10 is connected to the collecting exhaust pipe 22i. In the example of FIG. 12, only the highest processing unit 10a is connected to the collecting exhaust pipe 22i. In other words, in the example of FIG. 12, the on-off valve 232i corresponding to processing unit 10a is open, and the on-off valves 232i corresponding to processing units 10b and 10c are closed. In this case, exhaust gas from processing unit 10a flows through the collecting exhaust pipe 22i via the shortest path, making it easier for the exhaust gas to flow through the collecting exhaust pipe 22i.

[0110] At this time, the control unit 90 controls the on-off valve 252 of the inlet pipe 25 in a manner opposite to the open / close state of the on-off valve 232i. That is, the control unit 90 closes the on-off valve 252 of the inlet pipe 25Aa and opens the on-off valves 252 of the inlet pipes 25Ab and 25Ac. In other words, the control unit 90 controls the introduction area A of the outside air introduction part 24i to the sum of the individual introduction areas of the inlet pipes 25Ab and 25Ac. As a result, outside air flows into the collective exhaust pipe 22i through the inlet pipes 25Ab and 25Ac. Since the individual introduction areas of the inlet pipes 25Ab and 25Ac are set to values ​​corresponding to the flow rates of the exhaust gases from the processing units 10b and 10c, the amount of exhaust gas from the processing units 10b and 10c in the collective exhaust pipe 22i can be compensated for by the outside air.

[0111] In the example of Fig. 13, only the processing unit 10b, which is located at the next highest position, is connected to the collecting exhaust pipe 22i. That is, in the example of Fig. 13, the on-off valve 232i corresponding to the processing unit 10b is open, and the on-off valves 232i corresponding to the processing units 10a and 10c are closed. The exhaust gas from processing unit 10b flows through the collecting exhaust pipe 22i via a longer flow path than the flow path corresponding to processing unit 10a, and therefore the exhaust gas flows less easily through the collecting exhaust pipe 22i than the exhaust gas from processing unit 10a.

[0112] At this time, the control unit 90 controls the on-off valve 252 of the inlet pipe 25 in a manner opposite to the open / close state of the on-off valve 232i. That is, the control unit 90 closes the on-off valve 252 of the inlet pipe 25Ab and opens the on-off valves 252 of the inlet pipes 25Aa and 25Ac. In other words, the control unit 90 controls the introduction area A of the outside air introduction section 24i to the sum of the individual introduction areas of the inlet pipes 25Aa and 25Ac. As a result, outside air flows into the collective exhaust pipe 22i through the inlet pipes 25Aa and 25Ac. Since the individual introduction areas of the inlet pipes 25Aa and 25Ac are set to values ​​corresponding to the flow rates of the exhaust gases from the processing units 10a and 10c, the amount of exhaust gas from the processing units 10a and 10c in the collective exhaust pipe 22i can be compensated for by the outside air.

[0113] Since the individual inlet area of ​​the inlet pipe 25Aa is set larger than the inlet area of ​​the inlet pipe 25Ab, the flow rate of outside air flowing into the collective exhaust pipe 22i in FIG. 13 is larger than the flow rate of outside air flowing into the collective exhaust pipe 22i in FIG.

[0114] In the example of Fig. 14, only the processing unit 10c, which is located at the lowest position, is in communication with the collecting exhaust pipe 22i. That is, in the example of Fig. 14, the on-off valve 232i corresponding to the processing unit 10c is open, and the on-off valves 232i corresponding to the processing units 10a and 10b are closed. The exhaust gas from the processing unit 10c flows through the collecting exhaust pipe 22i via the longest flow path, and therefore the exhaust gas flows least easily through the collecting exhaust pipe 22i.

[0115] At this time, the control unit 90 controls the on-off valve 252 of the inlet pipe 25 in a manner opposite to the open / close state of the on-off valve 232i. That is, the control unit 90 closes the on-off valve 252 of the inlet pipe 25Ac and opens the on-off valves 252 of the inlet pipes 25Aa and 25Ab. In other words, the control unit 90 controls the introduction area A of the outside air introduction part 24i to the sum of the individual introduction areas of the inlet pipes 25Aa and 25Ab. As a result, outside air flows into the collective exhaust pipe 22i through the inlet pipes 25Aa and 25Ab. Since the individual introduction areas of the inlet pipes 25Aa and 25Ab are set to values ​​corresponding to the flow rates of the exhaust gases from the processing units 10a and 10b, the amount of exhaust gas from the processing units 10a and 10b in the collective exhaust pipe 22i can be compensated for by the outside air.

[0116] Since the individual inlet area of ​​the inlet pipe 25Ab is set larger than the inlet area of ​​the inlet pipe 25Ac, the flow rate of outside air flowing into the collective exhaust pipe 22i in FIG. 14 is larger than the flow rate of outside air flowing into the collective exhaust pipe 22i in FIG. 13.

[0117] As described above, even if the number of processing units 10 communicating with the collecting exhaust pipe 22i is the same, the higher the installation position of the processing units 10 communicating with the collecting exhaust pipe 22i, the smaller the introduction area A. This allows outside air to flow into the collecting exhaust pipe 22i at an appropriate flow rate according to the ease of flow of the exhaust gas flowing through the collecting exhaust pipe 22i. This makes it possible to reduce pressure fluctuations in the collecting exhaust pipe 22i with higher accuracy. Furthermore, by setting the individual introduction areas of the introduction pipes 25 to values ​​equivalent to the flow rate of the exhaust gas from the corresponding processing units 10, the flow rate of gas flowing into the collecting exhaust pipe 22i can be kept approximately constant regardless of the switching state of the switching unit 23. This makes it possible to reduce pressure fluctuations in the collecting exhaust pipe 22i with even higher accuracy. The same applies to the collecting exhaust pipes 22j and 22k.

[0118] Furthermore, in the second embodiment, the control unit 90 does not need to calculate the introduction area of ​​the outside air introduction unit 24. Therefore, the calculation load on the control unit 90 can be reduced.

[0119] In the above example, the horizontal exhaust pipes 222 of the collective exhaust pipe 22i are provided in common to two towers 40 (for example, tower 40A and tower 40B). However, this is not necessarily limited to this. For example, similar to the first embodiment, a collective exhaust pipe 22i may be provided for each tower 40.

[0120] Although the substrate processing apparatus 100 has been described in detail above, the above description is merely illustrative in all respects and is not intended to be limiting. It is understood that countless variations not illustrated can be envisioned without departing from the scope of this disclosure. The configurations described in the above embodiments and variations can be combined or omitted as appropriate as long as they are not mutually inconsistent. [Explanation of symbols]

[0121] 100 Substrate processing apparatus 10, 10a to 10c: First processing unit, second processing unit (processing unit) 21 First individual exhaust pipe, second individual exhaust pipe (individual exhaust pipe) 22 First exhaust manifold, second exhaust manifold (exhaust manifold) 23 1st switching section, 2nd switching section (switching section) 24 First outside air intake section, second outside air intake section (outside air intake section) 25 Introductory pipe 252 On-off valve 90 Control Unit

Claims

1. a first tower including a plurality of first processing units arranged vertically, each of which processes a substrate; a plurality of first individual exhaust pipes through which gases discharged from the plurality of first processing units flow, respectively; A first collecting exhaust pipe; a first switching unit that switches between communication and cut-off between each of the plurality of first individual exhaust pipes and the first collective exhaust pipe; a first outside air introduction section having a flow path for introducing outside air from the outside into the first collecting exhaust pipe, the introduction area of ​​the flow path being variable; a control unit that controls the introduction area of ​​the first outside air introduction unit based on individual introduction areas corresponding to each of the plurality of first processing units and a switching state of the first switching unit; Equipped with the individual introduction areas corresponding to the plurality of first treatment units are set according to installation positions of the plurality of first treatment units, the control unit controls the introduction area based on a sum of the individual introduction areas corresponding to the first processing units that are disconnected from the first collecting exhaust pipe among the plurality of first processing units, The substrate processing apparatus, wherein the individual introduction area is set to a larger value for a first processing unit that is installed higher among the plurality of first processing units. , substrate processing equipment.

2. The substrate processing apparatus according to claim 1 , The first outside air introduction section is a single inlet pipe provided in the first collecting exhaust pipe; a movable member that adjusts the introduction area of ​​the single introduction pipe and is controlled by the control unit; A substrate processing apparatus comprising:

3. A first tower including a plurality of first processing units arranged vertically, each of which processes a substrate; a plurality of first individual exhaust pipes through which gases discharged from the plurality of first processing units flow, respectively; A first collecting exhaust pipe; a first switching unit that switches between communication and cut-off between each of the plurality of first individual exhaust pipes and the first collective exhaust pipe; a first outside air introduction section having a flow path for introducing outside air from the outside into the first collecting exhaust pipe, the introduction area of ​​the flow path being variable; a control unit that controls the introduction area of ​​the first outside air introduction unit based on individual introduction areas corresponding to each of the plurality of first processing units and a switching state of the first switching unit; a storage unit that stores in advance individual area data that indicates the individual introduction areas corresponding to the plurality of first processing units; Equipped with the individual introduction areas corresponding to the plurality of first treatment units are set according to installation positions of the plurality of first treatment units, The first outside air introduction section is a single inlet pipe provided in the first collecting exhaust pipe; a movable member that adjusts the introduction area of ​​the single introduction pipe and is controlled by the control unit; Including, The control unit controls the movable member based on the switching state and the individual area data.

4. The substrate processing apparatus according to claim 1 , The first outside air introduction section is a plurality of inlet pipes each having the individual inlet areas corresponding to the plurality of first processing units; a plurality of on-off valves that respectively switch the opening and closing of the plurality of introduction pipes; Including, The control unit controls the plurality of on-off valves based on the switching state.

5. 5. The substrate processing apparatus according to claim 1, a second tower arranged in a horizontal direction next to the first tower, the second tower including a plurality of second processing units arranged in a vertical direction, each of the second processing units processing a substrate; a plurality of second individual exhaust pipes through which gases discharged from the plurality of second processing units flow, respectively; A second collecting exhaust pipe; a second switching unit that switches between communication and cut-off between each of the plurality of second individual exhaust pipes and the second collective exhaust pipe; a second outside air introduction section having a flow path for introducing outside air from the outside into the second collecting exhaust pipe, the introduction area of ​​the flow path being variable; Equipped with the control unit controls the introduction area of ​​the second outside air introduction unit based on individual introduction areas set corresponding to each of the plurality of second processing units and a switching state of the second switching unit, The individual introduction areas corresponding to the plurality of second processing units are different from one another.

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