Laser annealing of qubits using a diffraction beam splitter

Abstract

Apparatus and methods are described for laser annealing of quantum bit devices using multiple optical beams. According to embodiments, a method for conditioning a quantum bit device can include generating an optical beam, splitting the optical beam into multiple optical beams, and annealing a Josephson junction of the quantum bit device by projecting the multiple optical beams onto a region of the quantum bit device adjacent to the Josephson junction. The disclosed techniques can also be applied to annealing other types of electrical components in a variety of microscale integrated circuit devices.

Description

Technical Field

[0001] This application relates to laser annealing of electrical components of a quantum bit device using a plurality of optical beams generated using a diffractive beam splitter.

Background Art

[0002] In quantum computing, a quantum bit, i.e., a qubit, is the unit of quantum information (the quantum analogue of a classical bit). A qubit is a two-state quantum mechanical system. In a large multi-qubit system, the resonance frequency of a qubit needs to be precisely controlled to avoid signaling collisions between qubits. Due to semiconductor process variations, the original resonance frequency during qubit fabrication usually deviates from the design target. Laser annealing techniques have been developed to adjust the qubit frequency after fabrication. However, due to the micro-scale size and design constraints of qubits, these laser annealing techniques are technically quite difficult.

Summary of the Invention

[0003] The following presents an overview for providing a basic understanding of one or more embodiments of the present disclosure. This overview is not intended to identify key or important elements or to detail any scope of particular embodiments or any scope of the claims. Its sole purpose is to present concepts in a simplified form as an introduction to the more detailed description that follows. In one or more embodiments described herein, an apparatus and method for laser annealing of electrical components of a quantum bit device using a plurality of optical beams are described. The disclosed techniques can also be applied to annealing other types of electrical components of various micro-scale integrated circuit devices.

[0004] According to the embodiment, a method for forming a qubit may include preparing a substrate having a Josephson junction positioned between two electrostatic plates, and annealing the Josephson junction by projecting multiple optical beams onto a region of the substrate located between the Josephson junction and the two electrostatic plates. In various implementations, the multiple optical beams include Gaussian beams, and the method further includes generating a Gaussian beam by passing a laser-generated Gaussian beam through a diffractive optical element. In some implementations, projection includes generating an illumination pattern on the region that includes spatially separated optical spots. The multiple optical beams indirectly heat the Josephson junction, resulting in the annealing of the Josephson junction.

[0005] According to another embodiment, a method for forming a qubit may include preparing a substrate having a Josephson junction positioned between two superconducting leads, and annealing the Josephson junction by projecting a plurality of optical beams onto regions of the substrate adjacent to the Josephson junction and the two superconducting leads.

[0006] In another embodiment, a method for tuning a qubit device may include generating an optical beam, splitting the optical beam into multiple optical beams, and annealing the Josephson junction of the qubit device by projecting the multiple optical beams onto a region of the qubit device adjacent to the Josephson junction.

[0007] Another embodiment relates to an apparatus for annealing a microscale integrated device. The apparatus may comprise a light source that generates an optical beam, a diffraction beam splitter that splits the optical beam into multiple optical beams, and a lens system that projects the multiple optical beams onto a microscale integrated device for annealing the microscale integrated device. In one or more implementations, the lens system includes a first lens that focuses the multiple optical beams into an image plane, and a second lens that receives the image plane and projects the image plane onto the microscale integrated device for annealing the microscale integrated device. In various embodiments, the image plane comprises multiple spatially separated optical spots, each generated by the multiple optical beams.

[0008] In another embodiment, an apparatus for annealing electrical components of a microscale integrated device may include a light source for generating an optical beam and a diffraction beam splitter for splitting the optical beam into multiple optical beams. The apparatus may further include a lens system for projecting the multiple optical beams onto a region of the microscale integrated device adjacent to the electrical components.

[0009] In some embodiments, the elements described with respect to the disclosed methods and systems can be implemented by a computer and embodied in various forms, such as devices, computer systems, or other forms. [Brief explanation of the drawing]

[0010] [Figure 1] This is a diagram of an exemplary qubit device in one or more embodiments, in which a projected annealing pattern is formed on top. [Figure 2] This is a diagram illustrating an exemplary apparatus for annealing electrical components of a microscale integrated device, according to one or more embodiments. [Figure 3] Figures (A) to (D) show different annealing patterns formed on a qubit device according to one or more embodiments. [Figure 4] This is a diagram of another exemplary apparatus for annealing electrical components of a microscale integrated device, according to one or more embodiments. [Figure 5] This is a diagram of another exemplary system for annealing electrical components of a microscale integrated device, according to one or more embodiments. [Figure 6] This is a diagram of another exemplary system for annealing electrical components of a microscale integrated device, according to one or more embodiments. [Figure 7] This is a diagram of another exemplary system for annealing electrical components of a microscale integrated device, according to one or more embodiments. [Figure 8] This is a higher-order flowchart of an exemplary, non-limiting method for forming a qubit, according to one or more embodiments. [Figure 9] This is a higher-order flowchart of an exemplary, non-limiting method for tuning a qubit device according to one or more embodiments. [Figure 10] This is a higher-order flow diagram of an exemplary, non-limiting method for tuning electrical components of a microscale integrated device, according to one or more embodiments. [Figure 11] This is an illustrative, non-limiting block diagram of an operating environment that facilitates one or more embodiments described herein. [Modes for carrying out the invention]

[0011] The following detailed description is illustrative only and is not intended to limit the embodiments, the application or use of the embodiments, or both. Furthermore, it is not intended to be bound by any express or implied information presented in the preceding "Technical Field," "Summary of the Invention," or "Modes for Carrying Out the Invention" sections.

[0012] The subject matter of the disclosure generally relates to the field of qubit fabrication for quantum computing, and more specifically, to assigning a design frequency to a qubit following the formation of a Josephson junction. While the disclosure is not necessarily limited to such applications, various aspects of the disclosure can be understood by using this context through discussions of various examples.

[0013] In one or more embodiments, a qubit may include a Josephson junction formed on a substrate between two electrostatic plates. The qubit further includes superconducting leads formed on both sides of the Josephson junction, which connect the Josephson junction to the electrostatic plates. The subject of the disclosure is to provide a system for indirectly annealing a Josephson junction by heating an area of ​​the substrate around the Josephson junction using multiple (e.g., two or more) optical beams. In particular, the optical beams are generated by splitting a single optical beam into two or more beams using a diffraction beam splitter. In various embodiments, the single optical beam includes a Gaussian beam. The disclosed system further includes one or more projection components (e.g., relay lens units) that project the optical beams onto an area of ​​the substrate around the Josephson junction. In particular, the projected optical beams form an illumination pattern on the substrate that includes two or more spatially separated optical spots, but these optical spots do not overlap with the Josephson junction, the superconducting leads, or the electrostatic plates. Multiple optical beams or spots indirectly heat the Josephson junction, resulting in annealing of the junction and altering its resistance / resonant frequency.

[0014] By avoiding direct laser irradiation of the Josephson junction, the disclosed technique minimizes displacement and damage to the Josephson junction (particularly the presence of lift-off residue). In addition, by using multiple optical beams, the disclosed annealing technique produces a uniform junction temperature even in the event of laser alignment errors. In particular, the disclosed technique eliminates the precise optical path alignment constraints required by previous systems employing annular illumination techniques. Such systems use an axicon to shape the laser into an annular form around the Josephson junction. However, these systems require extremely precise beam alignment to ensure that the annular illumination is positioned directly above the center of the Josephson junction; otherwise, the annular laser beams will intersect and damage the superconducting leads. This precise beam alignment is difficult to achieve with annular illumination patterns because the ring size changes significantly with even slight focal variations. Furthermore, extreme alignment is required to precisely align the light source beam through the cone point of the axicon to generate the illumination ring. Furthermore, the axicon generates a Bessel function behind the focal plane, making the focal plane extremely sensitive to alignment errors.

[0015] While various embodiments of the disclosed annealing technique are described for use in annealing qubit-Josephson junctions, the disclosed technique can also be applied to anneal qubits and other types of electrical components in other microscale integrated circuit devices to alter the state or properties of those electrical components. For example, such other electrical components could include, but are not limited to, thin-film metal structures, thin-film metal structures formed of superconducting metals, thin-film wires, air bridges, electrodes, capacitors, or resonators, or combinations thereof.

[0016] Next, one or more embodiments will be described with reference to the drawings, where the same reference numerals are consistently used to refer to the same elements. Please note that the various structures depicted in the drawings (e.g., different layers, substrates, wafers, electrical components, etc.) are illustrative only and not to scale. In the following description, many specific details are given for illustrative purposes and to give a more thorough understanding of one or more embodiments. However, it is clear that in various cases one or more embodiments can be practiced without these specific details. In addition, certain elements are omitted in a particular appearance for clarity or conciseness or both, where the description does not necessarily focus on the omitted elements. Furthermore, since the same or similar reference numerals used throughout the drawings are used to indicate the same or similar features, elements, or structures, a detailed description of the same or similar features, elements, or structures will not be repeated for each of the drawings.

[0017] As used herein, unless otherwise specified, terms such as “on,” “overlying,” “atop,” “on top,” “positioned on,” or “positioned atop” mean that the first element is on top of the second element, and there may be an intervening element between the first and second elements. As used herein, unless otherwise specified, terms used directly in relation to terms such as “on,” “overlying,” “atop,” “on top,” “positioned,” “positioned atop,” “contacting,” and “directly contacting,” or the term “direct contact,” mean that the first and second elements are connected without an intervening element between them. As used herein, terms such as “upper,” “lower,” “above,” “below,” “directly above,” and “directly The terms “below)”, “aligned with”, “adjacent to”, “right”, “left”, “vertical”, “horizontal”, “top”, “bottom”, and their derivatives relate to the disclosed structure as oriented in the drawings. In this specification, the term “aligned with” is used to mean that an element is positioned precisely along the same vertical or horizontal line as another element. For example, as used herein, the term “aligned with” may mean that the first element is directly above or directly below the second element.

[0018] The terms "substantially" or "substantially similar" refer to cases where differences in length, height, or orientation do not result in a practical difference between a clear description (e.g., an expression excluding the term substantially similar) and substantially similar variants. In one embodiment, "substantial" (and its derivatives) refers to a difference up to, for example, a 10% deviation in value or a 10° deviation in angle due to generally accepted engineering or manufacturing tolerances for similar devices.

[0019] The terms "substrate", "wafer", and "chip" are used interchangeably herein unless the context explicitly states specific differences between the terms. The term "device chip" refers herein to a "chip", "substrate", or "wafer" that corresponds to or includes electrical components or devices. The terms "electrical device", "electrical component", "electrical element", "electrical structure", etc. are used interchangeably herein unless the context explicitly states specific differences between the terms.

[0020] Next, referring to FIG. 1, an exemplary qubit device 100 is shown with a projected annealing pattern formed on top, according to one or more embodiments. In this example, the projected annealing pattern includes four spatially separated optical spots 110. As will be described in more detail below, this four-spot illumination pattern can be generated by aligning and projecting a corresponding optical beam through one or more of the disclosed laser annealing systems (e.g., system 200 shown in FIG. 2 and additional systems disclosed herein) that utilize a diffractive beam splitter onto the qubit device 100.

[0021] According to the embodiment shown, the qubit device 100 includes a Josephson junction 104 formed on a substrate 102 between two electrostatic plates (also referred to as electrostatic pads) 112. The qubit device 100 further includes contact regions 108 formed on both sides of a lead 106 and electrically connecting the lead 106 to the electrostatic plates 112. In some embodiments, these contact regions 108 can be removed. For example, in embodiments where the lead 106 and the electrostatic plates 112 are fabricated in separate steps or from different metals or both, the contact regions 108 can be included in the qubit device 100. For example, in some embodiments, the lead 106 can be made of aluminum (Al), and the electrostatic plates 112 can be made of niobium (Nb). In these implementations, the contact regions 108 can be formed of Al, Nb, AlNb, or another superconducting material to provide a superconducting contact to the electrostatic plates 112 for the lead 106.

[0022] The material used for the substrate 102 can be various. Some suitable materials for the substrate 102 include silicon, sapphire, magnesium oxide (MgO), or a combination thereof. The qubit device 100 further includes leads 106 formed on both sides of the Josephson junction 104 and electrically connecting the Josephson junction 104 to the electrostatic plates 112. In particular, the leads 106 are formed on both sides of the Josephson junction 104 between both ends of the Josephson junction 104 and the electrostatic plates 112.

[0023] In various embodiments, the lead 106 is formed of a superconducting material such as, but not limited to, aluminum (Al), aluminum oxide (AlOx), niobium (Nb), niobium nitride (NbN), niobium carbonitride (NbCN), niobium titanium nitride (NbTiN), and lead (Pb). In these embodiments, the lead 106 may be a superconducting lead or may correspond to a superconducting lead. However, other conductive or superconducting metal materials can be employed as the lead 106.

[0024] In various embodiments, the Josephson junction 104 can consist of superconducting upper and lower layers made of Al, with the upper and lower layers in contact at an internal contact point of aluminum oxide. In these embodiments, the Josephson junction 104 can be considered as a three-layer structure of aluminum / aluminum oxide / aluminum (Al / AlOx / Al). Each (or, in some implementations, one or more) Al layer of the Al / AlOx / Al three-layer structure can be connected to an electrostatic plate 112. In some implementations, Al / AlOx / Al can be superconducting at a superconducting critical temperature of 1.2 Kelvin (K). In these embodiments, the Josephson junction 104 can be fabricated on a substrate 102 using Al as the starting compound to form the Al / AlOx / Al three-layer structure. The material of the substrate 102 can be further selected to reduce the dielectric loss tangent at low temperatures. The substrate material can also include a material that is selectively etchable for superconductivity and a dielectric material used for the Josephson junction 104 (e.g., a high-resistivity silicon wafer).

[0025] In addition, or alternatively, the substrate 102 can be formed from one or more silicon wafers, and a bilayer of resist can also be spun on one or more silicon wafers, the resist consisting of a copolymer methyl methacrylate (MIVIA) layer followed by a thin layer of polymethyl methacrylate (PMMA). In these embodiments, the Josephson junction 104 can be formed on the substrate 104 by writing a pattern for the Josephson junction 104 into the resist using electron beam lithography. The Josephson junction 104 can then be developed in a MIBK:IPA solution (methyl isobutyl ketone (MIBK) isopropyl alcohol (IPA)) (1:3) for about 1 minute, thereby removing all areas exposed by the electron beam. The MIVIA layer is more sensitive to the electron beam, creating an area of ​​PMMA underneath that is cut off. Thus, a bridge suspended from PMMA, also called a Dolan bridge, can be created without the MMA underneath. The entire sample can then be placed in an electron beam deposition apparatus, in which Al is evaporated at two angles with oxidation (in an inert atmosphere) between the Al evaporations. The resulting Josephson junction 104 is formed in the overlapping area. The remaining resist and unwanted metal can be removed by placing the sample in acetone. Using this lift-off technique, a sample of 0.01 square micrometers (μm) can be obtained. 2 ) ~ approx. 1.0μm 2 It is possible to create a joining area within that range.

[0026] The electrostatic plate 112 may also be formed of one or more superconducting materials, including, but not limited to, Al, AlOx, Nb, NbN, NbCN, NbTiN, and Pb. In exemplary embodiments, the electrostatic plate 112 may include a layered structure of niobium, aluminum, aluminum oxide, aluminum, and niobium. The position and size of the electrostatic plate 112 relative to the Josephson junction 104 may vary. In exemplary embodiments, the electrostatic plates 112 may be spaced about 1.0 to 100 μm apart from each other, with the Josephson junction 104 located in between. In another exemplary embodiment, the electrostatic plate 112 may have a width of about 5.0 to about 500 μm (e.g., a dimension substantially parallel to the Josephson junction 104), a length of about 1.0 to about 200 micrometers (e.g., a dimension substantially perpendicular to the Josephson junction 104), and a height of about 10 to about 500 nanometers (e.g., a thickness) from the surface of the substrate 102.

[0027] Figure 2 shows an exemplary system 200 for annealing electrical components of a microscale integrated device 207, according to one or more embodiments. For example, system 200 can be used to anneal the Josephson junction 104 of a qubit device 100, as well as other electrical components of the qubit device 100 or other microscale integrated devices or both. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0028] System 200 includes a laser unit 202, an imaging unit 208, a stage unit 206, and a controller 204. The laser unit 202 provides a laser 212 for annealing one or more electrical components of a microscale integrated device 207 placed on the stage 240 of the stage unit 206. For example, in various embodiments, the microscale integrated device 207 may be or be equivalent to a qubit device 100, and System 200 may be used to anneal the Josephson junction 104 of the qubit device 100 by indirectly heating the Josephson junction 104. The laser unit 202 further includes several components, including a diffraction beam splitter 230 provided to split the laser beam into a plurality of optical beams 203 for controlling and manipulating the laser 212 prior to projection onto the microscale integrated device 207. These components will be discussed in more detail below. The imaging unit 208 may include a camera and other components that facilitate aligning the optical beam 203 to a target region of the microscale integrated device 207. For example, in various embodiments where the microscale integrated device 207 corresponds to a qubit device 100, the target region may include a region of the substrate 102 around or adjacent to the Josephson junction 104 and leads 106.

[0029] In various embodiments, the laser unit 202, imaging unit 208, and stage unit 206 can be physically coupled / mounted to each other to form an integrated device. In other embodiments, one or more of the laser unit 202, imaging unit 208, or stage unit 206, or any combination thereof, can be physically detachable but positioned in close proximity to each other. The controller 204 can be coupled to the laser unit 202, imaging unit 208, or stage unit 206, or any combination thereof, in a communicative, operational, or both manner. In some embodiments, the controller 204 can also be physically coupled / mounted to one or more of the laser unit 202, imaging unit 208, and stage unit. The controller may include hardware or software, or both, provided for electrically controlling one or more operations of the laser unit 202, imaging unit 208, or stage unit 206, or any combination thereof (e.g., via one or more wired or wireless or both communication signals).

[0030] In the embodiments shown, the laser source includes a diode pump 210 that generates a laser 212. In some implementations, the laser 212 generated by the diode pump 210 can be a 532 nanometer (nm) (2x frequency) solid-state laser (e.g., a second-harmonic generation (SHG) laser). In various embodiments, the laser 212 may be or may be equivalent to a Gaussian beam. Prior to the diffracting beam splitter 230, the laser unit 202 further includes an isolator 214, a half-wave plate 216, a first polarizing beam splitter 218 coupled to a damper 220, a wedge 222 coupled to a silicon photodiode 224, an electron shutter 226, and a steering mirror 228.

[0031] According to system 200, the laser 212 first passes through isolator 214 (as indicated by arrow 201), and the isolator 214 directs the laser beam flow toward the half-wave plate 216 in the desired direction. The power of the focused laser beam is then actively controlled / calibrated using the half-wave plate 216 and the first polarizing beam splitter 218 / damp 210, and this laser beam is adaptively adjusted based on the pick-off beam generated via the wedge 222 and measured using the downstream silicon photodiode 224. In various embodiments, this power adjustment can be measured and controlled via controller 204. In this regard, the half-wave plate 216 shifts the polarization direction of the beam. In some embodiments, the half-wave plate 216 may have an adjustable rotation (e.g., electronically controlled via controller 204) to adjust the overall attenuation to a desired power level (e.g., by rotating the polarization incident on the first polarizing beam splitter 218, which is a polarizer) (e.g., also electronically controlled and adjusted using controller 204). In some embodiments, the first polarizing beam splitter 218 may be an optical filter that allows certain polarizations of the light waves associated with the beam to pass through the optical filter and light waves of other polarizations to be blocked, or may include such an optical filter. In some embodiments, the first polarizing beam splitter 216 may convert the indistinct or mixed polarizations of the light waves associated with the beam into a clear, polarized beam of light.

[0032] The laser beam passes further through the wedge 222 and strikes the electron shutter 226. In some embodiments, the electron shutter 226 can control the annealing time of the beam. For example, the electron shutter 226 can be opened to allow the subsequent downstream optical beam 203 to strike the microscale integrated device 207 for a desired time (e.g., 10 seconds, 20 seconds, 30 seconds, 1 minute, etc.). The electron shutter 226 can be set to close automatically after a predetermined time (e.g., as controlled via the controller 204). The laser power level and pulse duration can be controlled to achieve a desired resistance level of the Josephson junction 104 being annealed.

[0033] The steering mirror 228 further directs the optical beam towards the beam diffraction beam splitter 230. In various embodiments, the steering mirror 228 can correspond to a mechanical mirror mount that directs the beam towards the beam diffraction beam splitter 230 by pattern recognition.

[0034] The diffraction beam splitter 230 splits the incident beam into two or more output optical beams 203, the output optical beams being at slightly different angles from each other. In various embodiments, the diffraction beam splitter includes a holographic optical element that gives the incident beam precise angles (e.g., a 0.5-degree shift) in the positive and negative angles relative to a reference plane to generate the output beams 203. In some embodiments, the diffraction beam splitter 230 also suppresses underacted or directional light.

[0035] The number of optical beams 203 produced by the diffraction beam splitter 230 may vary. In various embodiments, the diffraction beam splitter 230 may include a 2×2 diffraction beam splitter that splits a single incident beam into four distinct optical beams. For example, in the embodiment shown in Figure 2, two lines are drawn as optical beams 203 (and optical beam 205), but in embodiments where the diffraction beam splitter 230 includes a 2×2 diffraction beam splitter, each of these lines may correspond to two parallel (vertically stacked) beams (e.g., four beams in total). In these embodiments, the final beam illumination pattern projected onto the microscale integrated device 207 may correspond to the four-spot pattern illustrated in Figure 1. For example, referring again to Figure 1, in various embodiments, the optical spot 110 corresponds to four optical beams produced by the 2×2 diffraction beam splitter and projected onto the substrate 102 via the laser unit 202. In this example, the illumination pattern includes four substantially uniform spatial optical spots positioned in a target area of ​​the substrate 102 around the Josephson junction 104 and leads 106. The distance (D) between the illumination spots 110 can be adjusted / controlled so that the optical spots are positioned close together around the Josephson junction 104 and leads 106. In some embodiments, the distance D can be between about 5 μm and about 20 μm, more preferably between about 10 μm and about 15 μm.

[0036] In other embodiments, the diffraction beam splitter 203 can be configured to generate 2-beam, 3-beam, 5-beam, 6-beam, and so on, in predetermined illumination patterns tailored to different applications.

[0037] Figures 3(A) to 3(D) illustrate different illumination patterns that can be formed on the qubit device 100 using different diffraction beam splitters according to one or more embodiments. Figure 3(A) illustrates an exemplary illumination pattern projected just outside the Josephson junction 104 on the substrate 102 and corresponding to a single Gaussian beam. This embodiment illustrates heating / annealing of the qubit device 100 with the diffraction beam splitter 230 removed from the annealing path. Figure 3(B) illustrates an exemplary illumination pattern including two optical spots positioned at adjacent corners of the Josephson junction 104 on the substrate 102 and which can be generated by a 2×1 diffraction beam splitter. Figure 3(C) illustrates an exemplary illumination pattern including two optical spots positioned directly above and directly below the Josephson junction 104 on both sides of the Josephson junction 104 on the substrate 102 and which can be generated by another 2×1 diffraction beam splitter. Figure 3(D) illustrates an exemplary illumination pattern including six optical spots that can be generated by a 2×3 diffraction beam splitter, positioned directly above and directly below the Josephson junction 104 on the substrate 102, respectively. Various other illumination patterns are also conceivable.

[0038] Referring again to Figure 2, according to system 200, the laser unit 202 further includes a lens system comprising an aspherical lens 232, and a relay lens unit including a first objective lens 234, a second polarizing beam splitter 236, and a second objective lens 238. In the shown embodiment, the aspherical lens 232 is located immediately behind the diffracting beam splitter 230. In this embodiment, the optical beam 203 produced by the beam splitter 230 can pass through the aspherical lens 232, which can direct and focus the optical beam 203 to the downstream relay lens unit. In some embodiments, the aspherical lens can reduce or eliminate spherical aberration and other optical aberrations present in the optical beam 203 (e.g., astigmatism).

[0039] In various embodiments, the aspherical lens 232 is provided to focus the optical beam 203 onto the image plane 233 and create a desired illumination pattern (e.g., an illumination pattern with four optical spots as shown in Figure 1, or the illumination patterns shown in Figures 3(A) to 3(D)) for projection onto a target area of ​​the microscale integrated device 207 (e.g., an area of ​​the substrate 102 adjacent to, around, or both of, the electrical component to be annealed). In this respect, the image plane 233 corresponds to a virtual plane between the aspherical lens 232 and the first objective lens 234, at the effective focal length of the aspherical lens 232 and the working distance of the first objective lens 234. A relay lens unit is further provided to project the image plane / illumination pattern onto the target area of ​​the microscale integrated device 207. In the embodiments shown, the projected illumination pattern includes a plurality of optical beams 205 or optical spots corresponding to optical beams. The imaging unit 208 facilitates the alignment of the optical beam 205 with the target region of the microscale integrated device 207.

[0040] In some embodiments, the first objective lens 234 and the second objective lens 238 can effectively reduce the illumination pattern produced by the optical beam 203 output from the diffraction beam splitter 230 and projected onto the image plane 233. In some embodiments, the reduction can be about one-fifth. For example, in an embodiment in which the diffraction beam splitter 230 produces four separate optical beams corresponding to the illumination pattern in Figure 1, the output spacing between the optical beams 203 may be about 50 μm. With a one-fifth reduction, the relay lens unit can reduce the spacing between the optical beams 203 from about 50 μm so that the spacing between the optical beams 205 in the final illumination pattern is about 10 μm.

[0041] In some embodiments, the first objective lens 234 may include a low-magnification objective lens, and the second objective lens 238 may include a long-wide-range (WD) objective lens. In some implementations, the low-magnification objective lens may have a working distance of about 100 millimeters (mm). In various embodiments, the low-magnification objective lens may achieve some of the reduction of the optical beam 203 described above, and the long-WD objective lens may further reduce the magnification of the illumination pattern output by the low-magnification objective lens.

[0042] In various embodiments, the second polarizing beam splitter 236 can split the optical beam / illumination pattern output by the first objective lens into two orthogonal linearly polarized portions. Each portion can be essentially a mirror image, i.e., a copy of the other. The second polarizing beam splitter 236 reflects the first portion at a 90-degree angle toward the second objective lens 238 and the microscale integrated device 207, while the second portion passes through the second polarizing beam splitter 236 and leaves the microscale integrated device 207. In some embodiments, the first and second portions can each retain some of the original physical properties of the laser beam / illumination pattern before it was split by the second polarizing beam splitter 236 (for example, each portion is identical to one another and identical to the beam before splitting). For example, if the beam has a wavelength of 532 nm, each portion will have the same 532 nm wavelength. In addition, each portion can correspond to a copy of an essentially identical illumination pattern. In various embodiments, the first part may include S-polarized light and the second part may include P-polarized light (or vice versa). In this respect, P-polarized light (from the German word "parallel") has an electric field polarized parallel to the plane of incidence, while S-polarized light (from the German word "senkrecht") is perpendicular to this plane.

[0043] The output of the second objective lens 238 includes an optical beam 205 having a desired illumination pattern projected onto a target area of ​​the integrated microscale device 207. For example, in various embodiments where the microscale integrated device 207 corresponds to the qubit device 100, the target area may include portions of the substrate 102 adjacent to or surrounding (but not overlapping) the Josephson junction 104 and leads 106. This results in heating of the substrate 102 and indirect heating of the Josephson junction 104 to a desired temperature, which leads to annealing of the Josephson junction 104 and modification of the state or properties of the Josephson junction 104. In the shown embodiment, the stage unit 206 may include a stage 240 and a water pump 242. In this embodiment, the stage 240 may be a dual stage with a thermoelectric cooler and a thermal mount provided for cooling the stage in connection with the annealing process, or may include such a stage. In some embodiments, the stage 240 may also be, or correspond to, a three-directionally mechanically movable X / Y / Z stage to facilitate alignment of the target area of ​​the microscale integrated device 207 on the line-of-sight of the second objective lens 238. In these embodiments, the stage 240 may be manually adjustable, or adjusted / moved as controlled via the controller 204, or both.

[0044] In various embodiments, heating a target region of the substrate 102 surrounding the Josephson junction 104 can be used to change the resistance of the Josephson junction 104. The power level of the diode pump 210 and the exposure duration (e.g., the pulse duration of the optical beam controlled via the electron shutter 226) can control the desired resistance obtained. For example, in one implementation configuration, a low-power laser beam with a wavelength of 532 nm can be used to generate an optical beam 205, which can then be projected onto a region of the substrate surrounding the Josephson junction 104 for about 1 second. Applying a low-power optical beam for 1 second can increase the resistance of the Josephson junction 104 (e.g., at a low power level, the laser can provide sufficient thermal energy to increase the resistance of the Josephson junction). By increasing the resistance, the frequency of the qubit associated with the Josephson junction can be reduced.

[0045] In some embodiments, the diode pump 210 may have four power settings, with the first two power settings considered as "low power," the third as "medium power," and the fourth as "high power." During approximately 20 seconds of annealing in the low power setting, the resistance of the Josephson junction 104 can increase in the range of 2% to 100%. In addition, during the duration of beam annealing of the Josephson junction 104 contained within the qubit during the low power setting, the frequency of the qubit is found to decrease by 0.5% to 1.5%. The resistance change of the Josephson junction 104 and the frequency change of the qubit device 100 can remain even after the beam is removed.

[0046] In an annealing session of approximately 20 seconds with a medium power setting, the resistance of the Josephson junction 104 can increase by 13% to 4%. It is observed that the resistance change increases to its maximum (13%) after approximately 1 to 5 seconds of exposure, and to its minimum (4%) during extended exposure of the Josephson junction by beam 205 (e.g., 15 to 20 seconds). In other words, the resistance increases rapidly after the initial 5 seconds of indirect exposure to beam 205 with a medium power setting, and then increases slowly during the rest of the exposure. In addition, the frequency of the qubit device 100 can decrease by 1.5% to 2.5% while beam 205 is indirectly applied to the Josephson junction 104 contained in the qubit with a medium power setting. The resistance change of the Josephson junction 104 and the frequency change of the qubit device 100 can remain unchanged even after the beam is removed.

[0047] Indirectly annealing the Josephson junction 104 with a high-power setting beam 205 for approximately 20 seconds can be used to reduce the resistance of the Josephson junction 104 by 2% to 12%. It is observed that the resistance change decreases to a minimum (1%) during the initial exposure of the Josephson junction to the beam 205 (e.g., 1 to 5 seconds), and to a maximum (7%) during extended exposure of the Josephson junction to the beam (e.g., 15 to 20 seconds). In other words, the resistance decreases slowly after the initial 5 seconds of indirect exposure to the beam 205 at a high power setting, and then decreases sharply during the subsequent exposure to the beam 205. In addition, during the duration of indirect annealing of the Josephson junction 104 contained within the qubit with the beam at a high power setting, the frequency of the qubit device 100 may increase by 1% to 6% (e.g., the qubit frequency may have the opposite sign change at a high power setting). The resistance changes of the Josephson junction and the frequency changes of the qubits can remain unchanged even after the beam has been removed.

[0048] Figure 4 shows another exemplary system 400 for annealing electrical components of a microscale integrated device, according to one or more embodiments. System 400 is identical to system 500, with the addition of a beam splitter exchanger 402 to the laser unit. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0049] In some embodiments, the laser unit 202 may include a beam splitter exchanger 402 that can be incorporated into the laser unit 202 and provides different diffraction beam splitter options (e.g., as different settings) that can be rotated or swapped as desired for various use cases. Different diffraction beam splitter options can provide different illumination patterns with different numbers and arrangements of optical beams. In these embodiments, the controller 204 can control the mechanical rotation of different beamforming settings and different diffraction beam splitters. For example, in some embodiments, the beam splitter exchanger 402 can switch the diffraction beam splitter between two or more different types of diffraction beam splitters that provide different illumination patterns (e.g., the four patterns shown in Figure 1, the different illumination patterns shown in Figures 3(A) to 3(D)). The beam splitter exchanger 402 may also be prepared to remove the entire diffraction beam splitter and use a single Gaussian beam as an alternative annealing capability. In this regard, system 400 can be used to switch between annealing using a single Gaussian beam and annealing using multiple Gaussian beams.

[0050] Figure 5 shows another exemplary system 500 for annealing electrical components of microscale integrated devices, according to one or more embodiments. The shown system 500 includes the same or similar components, features, and functionalities as systems 200 and 300, with some additional or alternative components (these reference numerals are asterisked for ease of identification and distinction). Components in system 500 are depicted using rectangles, as opposed to structural icons used in system 200, for ease of illustration. Some components shown in Figures 2 and 3 have been omitted in system 500 for simplification. Please note that these components are not actually removed. Repeated descriptions of similar elements used in individual embodiments are omitted for simplification.

[0051] System 500 is provided to apply a heat source (e.g., laser 212) to one or more electrical components of the microscale integrated device 508 to change the state or properties of one or more electrical components. In various embodiments, the microscale integrated device 508 may be or may include a qubit (e.g., qubit device 100), and one or more electrical components may include a Josephson junction (e.g., Josephson junction 104). In these embodiments, as discussed with reference to Figure 2 and System 200, System 500 can be used to indirectly heat and anneal the Josephson junction using multiple laser beams. In addition, or alternatively, one or more other electrical components may include, but are not limited to, thin-film metal structures, thin-film metal structures formed of superconducting metals, thin-film wires, air bridges, electrodes, capacitors, or resonators, or combinations thereof. The type of microscale integrated device 508 may vary and may include other types of semiconductor devices.

[0052] System 500 includes a laser unit 202, a stage unit 206, a controller 204, and an imaging unit 208. The laser unit 202 may include substantially identical and similar features and functionalities to those described above with reference to systems 200 and 300, with the addition of a beam expander / reducer 502 between the electronic shutter 226 and the steering mirror 228, and a first beam blocker 502 coupled to a second polarizing beam splitter 504. System 500 also incorporates a power meter 506 into the stage unit 206. The imaging unit 208 may include a light source 510, a non-polarizing beam splitter 512, a tube lens 514, a camera 516, and a second beam blocker 518.

[0053] A beam expander / reducer 502 may be provided to expand or reduce the size / diameter of the laser beam before it passes through the diffraction beam splitter 230. For example, in some embodiments, the beam expander / reducer 502 can invert the beam size to reduce it by 1 / 5 or expand it by 5 times. Reducing the beam size by 1 / 5 can increase the beam intensity (e.g., optical intensity or light intensity). In some embodiments, the intensity can be based on power per unit area (e.g., downstream beams, such as a particular Josephson junction 104, concentrate more power in a smaller area). In some embodiments, the beam expander / reducer 502 can be used to adjust the beam size and to adjust the field of view of the camera 516 of the imaging unit 208. For example, in one embodiment, the beam expander / reducer 502 can reduce the beam width / diameter from about 2 millimeters (mm) to about 400 μm, which is about 1 / 5 of the original width. Next, the first objective lens 224 or the second objective lens 238, or both, can reduce the size of one or more beams to about 10 μm. In other embodiments, the beam expander / reducer 502 can be configured to increase the beam size.

[0054] A first beam blocker 504 may be provided to block a second portion of the beam produced by a second polarizing beam splitter 236, which is oriented away from the stage unit. In this regard, as discussed above, in some embodiments, the second polarizing beam splitter 236 can split the optical beam / illumination pattern output by the first objective lens 234 into two orthogonal linearly polarized portions. Each portion can be essentially a mirror image, i.e., a copy of the other. The second polarizing beam splitter 236 reflects the first portion at a 90-degree angle toward the second objective lens 238 and the microscale integrated device 508, while the second portion passes through the second polarizing beam splitter 236 and leaves the microscale integrated device 508. In some embodiments, the first beam blocker 504 can provide an optional safety feature to block exposure to the second portion of the beam split by the second polarizing beam splitter 236 (e.g., by a sensitive person or object). The first portion of the beam can pass through the second objective lens 238 and be projected onto the microscale integrated device 508 to heat it. According to system 500, a power meter 506 can measure the power level of the first portion of the beam projected onto the sample from the second objective lens 238. For example, the power meter 506 can collect power readings of the beam projected onto the microscale integrated device 508 periodically, automatically, or both. In some embodiments, the power meter 506 can be mounted on a rail (not shown) and controlled by an actuator.

[0055] In some embodiments, a first portion of the beam (e.g., beam 205) may be back-reflected as a reflected portion of the beam, coexisting with the first portion but propagating in the opposite direction, through a second objective lens 238 and a second polarizing beam splitter 236 behind the microscale integrated device 508. In some embodiments, when the reflected beam strikes the second polarizing beam splitter 236, the second polarizing beam splitter 236 can split the reflected beam into a third beam portion and a fourth beam portion. In some embodiments, this reflected third portion can be directed to an unpolarized beam splitter 512 required for imaging.

[0056] In some embodiments, the unpolarized beam splitter 512 can split this reflected third portion into a fifth and a sixth portion. It should be noted again that the fifth and sixth portions of the beam may each retain some of the original physical properties of the beam before it was split by the unpolarized beam splitter 512. In addition, any of the components described below may constitute any of the beam portions.

[0057] In some embodiments, the unpolarized beam splitter 512 may be additionally struck by light from a light source 510. The type of light source 510 may vary. In some embodiments, the light source may correspond to an incoherent light source. For example, the light source may include one or more light-emitting diodes (LEDs) that provide white light or green light or white light. In addition, or alternatively, the light source may include a monochromatic light source. The light source 510 may have a range of 50 nanometers (nm). The unpolarized beam splitter 512 may split the monochromatic light into first and second parts of the light. Note that the first and second parts of the light may each retain some of the physical properties of the light (e.g., the hue of the light) before being split by the unpolarized beam splitter 512. In addition, any of the components described below may correspond to any of the parts of the light.

[0058] The unpolarized beam splitter 512 can split the light from the light source 510, as well as a third portion of the beam that is independent of the polarization of the light and beam. In some embodiments, the second beam blocker 518 may receive the first portion of the light from the light source 510 and the fifth portion of the beam from the unpolarized beam splitter 512. In some embodiments, the first portion of the light and the fifth portion of the beam may be stopped from traveling along the imaging path.

[0059] In some embodiments, the second portion of the light can travel along the imaging path from the unpolarized beam splitter 512 to the second polarized beam splitter 236. The unpolarized beam splitter 512 can then split the second portion of the light from the light source 510 into a third portion and a fourth portion of the light. In some embodiments, the third portion of the light may strike the first beam blocker 504. In this case, the third portion of the light stops traveling along the imaging path. In some embodiments, the fourth portion of the light propagating to the microscale integrated device 508 may strike the second objective lens 237. In this case, the microscale integrated device 508 may have a reflected fourth portion of the light, which coexists with the fourth portion of the light but propagates in the opposite direction. The reflected fourth portion of the light is then split by the second polarized beam splitter 236 to become the fifth and sixth portions of the light. The sixth portion of the light propagates toward the unpolarized beam splitter 512 and may be further divided into a seventh and an eighth portion of the light. The seventh portion of the light may propagate toward the light source 510.

[0060] In some embodiments, the eighth portion of the light and the sixth portion of the beam can travel through an imaging path from an unpolarized beam splitter 512 to a tube lens 514. The tube lens 514 has a focal length of 200 mm and can assist with imaging and alignment. In some embodiments, the eighth portion of the light and the sixth portion of the beam, coming from the tube lens 514, can travel to a camera 516. The camera 516 can record the interaction of the beam 205 (or a portion of the beam 205 or both) on the microscale integrated device 508 and assist in the alignment of the beam 205 with the electronic components to be annealed on the microscale integrated device 508.

[0061] Figure 6 shows another exemplary system 600 for annealing electrical components of a microscale integrated device, according to one or more embodiments. System 600 is substantially identical to system 500, except for the position of the aspherical lens 232. As indicated by the dashed rectangle 601, in some embodiments the aspherical lens 232 can be positioned between the steering mirror 228 and the diffracting beam splitter 230. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0062] Figure 7 shows another exemplary system 700 for annealing electrical components of microscale integrated devices, according to one or more embodiments. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0063] Embodiments of the systems described herein may include one or more machine-executable components embodied in one or more machines (for example, embodied in one or more computer-readable storage media associated with one or more machines). When such components are executed by one or more machines (e.g., processors, computers, computing devices, virtual machines, etc.), they can cause one or more machines to perform the operations described. For example, system 700 may include a computing device 702 that can be connected communicatively, operably, or both to a laser unit 202, an imaging unit 208, or a stage unit 206 or a combination thereof. The computing device may include (or be operably coupled to) a controller 204 that may include, or contain, a computer-executable component for controlling one or more operations of the laser unit 202, the imaging unit 208, or a stage unit 206 or a combination thereof.

[0064] For example, in the shown embodiment, the controller 204 may include a laser unit control component 704, an imaging unit control component 708, and a stage unit control component 708. In various embodiments, the laser control component may include computer-executable instructions for controlling one or more operations of the laser unit 202 automatically, in response to user input (e.g., via a suitable input device), or both. For example, referring to Figures 6 and 7, the laser unit control component 704 may control the power level of the laser 212, the exposure time of the electron shutter 226, and the setting of the diffraction beam splitter 230 and the corresponding switching of illumination patterns (e.g., as controlled via the beam splitter exchanger 402). The imaging unit control component 706 may control one or more operations of the camera 516, the tube lens 514, the light source 510, the unpolarized beam splitter 512, and the second beam blocker 518. Referring to Figures 5, 6, and 7, the stage unit control component 708 can control the operation of one or more of the power meter 506, the stage 240, or the water pump 242, or a combination thereof.

[0065] The computing system 500 may further include, or be operably coupled to, at least one memory 716 and at least one processor 714. In various embodiments, at least one memory 716 may store executable instructions (e.g., provided by a controller 204) which, when executed by at least one processor 714, facilitate the execution of operations defined by executable instructions. The computing device 702 may also include a display 712. In some embodiments, image data captured by a camera 516 may be rendered on the display 712 in relation to facilitating the alignment of an optical beam 205 with a target area on a microscale integrated device 508. The computing device 702 may further include a device bus 710 that communicatively couples the controller, display, processor, and memory 716. Examples of the processor 714, the memory 716, and other suitable computer or computing-based elements can be seen with reference to Figure 11 and can be used in relation to implementing one or more of the systems or components shown and described in reference to Figure 7 or other drawings disclosed herein.

[0066] The computing system 702 may include any type of component, machine, device, mechanism, apparatus, or equipment or combination thereof that has a processor, or may enable active or operational communication with a wired or wireless or both network, or both. All such embodiments are envisioned. For example, the computing system 702 may be, or include, a server device, a computing device, a general-purpose computer, a special-purpose computer, a tablet computing device, a handheld device, a server-class computing machine or database or both, a laptop computer, a notebook computer, a desktop computer, a mobile phone, a smartphone, an industrial or home device or both, a digital assistant, a multimedia internet-enabled telephone, or any other type of device or combination thereof.

[0067] Figure 8 is a higher-order flowchart of an exemplary, non-limiting method 800 for forming a qubit (e.g., qubit device 100) in one or more embodiments. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0068] In 802, method 800 may include providing a substrate (e.g., substrate 102) having a Josephson junction (e.g., Josephson junction 104) positioned between two electrostatic plates (e.g., electrostatic plate 112). For example, in various embodiments, the substrate may be provided on a stage of a laser annealing apparatus or system (e.g., system 200, system 300, system 500, system 600, system 700, etc.) and positioned in line of sight of one or more beam projection components of the annealing apparatus (e.g., low-magnification objective lens 234, polarizing beam splitter 236, and long-WD objective lens 238). In 804, method 800 may include annealing the Josephson junction by projecting a plurality of optical beams (e.g., optical beam 110, optical beam 205, etc.) onto a region of the substrate located between the Josephson junction and the two electrostatic plates (e.g., using a low-magnification objective lens 234, a polarizing beam splitter 236, and a long-WD objective lens 238).

[0069] Figure 9 is a higher-order flowchart of an exemplary, non-limiting method 900 for tuning a qubit device (e.g., qubit device 100) according to one or more embodiments. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0070] In 902, method 900 may include generating an optical beam (e.g., optical beam 201 using a diode pump 210 and laser 212). In 904, method 900 may include splitting the optical beam into multiple optical beams (e.g., optical beam 203 using a diffraction beam splitter 230). In 906, method 900 may include annealing the Josephson junction of a qubit device (e.g., Josephson junction 104) by projecting multiple optical beams onto a region of the qubit device (e.g., qubit device 100) adjacent to the Josephson junction (e.g., using a low-magnification objective lens 234, a polarizing beam splitter 236, and a long-WD objective lens 238).

[0071] Figure 10 is a higher-order flowchart of an exemplary, non-limiting method 900 for tuning electrical components of a microscale integrated device (e.g., microscale integrated device 308) according to one or more embodiments. Repeated descriptions of similar elements used in individual embodiments are omitted for simplicity.

[0072] In 1002, method 1000 may include generating an optical beam (e.g., optical beam 201 using a diode pump 210 and a laser 212). In 1004, method 900 may include splitting the optical beam into multiple optical beams (e.g., optical beam 203 using a diffraction beam splitter 230). In 1006, method 100 may include annealing the electrical components of a microscale integrated device (e.g., a qubit device 100) by projecting multiple optical beams onto the area of ​​the microscale integrated device (e.g., a qubit device 100) around the electrical components (e.g., using a low-magnification objective lens 234, a polarizing beam splitter 236, and a long-WD objective lens 238).

[0073] For the sake of simplicity, please note that in some situations, computer implementation methods are described and explained herein as a series of actions. It should be understood and acknowledged that the innovations of the subject matter are not limited by the illustrated actions, the order of actions, or both. For example, actions can occur in various orders, simultaneously, or both, and together with other actions not presented and described herein. Furthermore, not all illustrated actions are required to implement a computer implementation method in accordance with the subject matter of disclosure. In addition, as those skilled in the art will understand and acknowledge, computer implementation methods can alternatively be represented as a series of interconnected states via state diagrams or events. Furthermore, it should be understood that computer implementation methods disclosed hereafter and throughout this specification may be stored in a manufactured article to facilitate transfer and movement to a computer. Where used herein, the term "manufactured article" is intended to encompass computer programs accessible from any computer-readable device or storage medium.

[0074] Figure 11 can provide a non-limiting context for various aspects of the subject matter of disclosure and is intended to give a general description of a preferred environment in which various aspects of the subject matter of disclosure may be implemented. Figure 11 is an illustrative, non-limiting block diagram of an exemplary operating environment that can facilitate one or more embodiments described herein. Repeated descriptions of similar elements employed in other embodiments described herein are omitted for simplicity.

[0075] Referring to Figure 11, a preferred operating environment 1100 for implementing various aspects of the present disclosure may also include a computer 1112. The computer 1112 may also include a processing unit 1114, system memory 1116, and a system bus 1118. The system bus 1118 connects system components, including but not limited to the system memory 1116, to the processing unit 1114. The processing unit 1114 can be any of the various available processors. Dual microprocessors and other multiprocessor architectures can also be employed as the processing unit 1114. System Bus 1118 can be any of several types of bus structures, including, but is not limited to, a memory bus or memory controller, a peripheral bus or external bus, or a local bus, or a combination thereof, and uses any of the diverse available bus architectures, including Industrial Standard Architecture (ISA), Microchannel Architecture (MCA), Extended ISA (EISA), Intelligent Drive Electronics (IDE), VESA Local Bus (VLB), Peripheral Component Interconnect (PCI), CardBus, Universal Serial Bus (USB), Advanced Graphics Port (AGP), FireWire (IEEE1194), and Small Computer Systems Interface (SCSI).

[0076] System memory 1116 may also include volatile memory 1120 and non-volatile memory 1122. The Basic Input / Output System (BIOS), which contains basic routines for transmitting information between elements within the computer 1112, such as during startup, is stored in non-volatile memory 1122. The computer 1112 may also include removable / non-removable, volatile / non-volatile computer storage media. For example, Figure 11 illustrates disk storage 1124. Disk storage 1124 may also include, but is not limited to, devices such as magnetic disk drives, floppy(R) disk drives, tape drives, Jaz(R) drives, Zip(R) drives, LS-110 drives, flash memory cards, or memory sticks. Disk storage 1124 may also include storage media separately or in combination with other storage media. To facilitate connection of disk storage 1124 to the system bus 1118, removable or non-removable interfaces, such as interface 1126, are typically used. Figure 11 also depicts software that acts as an intermediary between the user and the basic computer resources described within a preferred operating environment 1100. Such software may also include, for example, an operating system 1128. The operating system 1128, which can be stored in disk storage 1124, functions to control and allocate the resources of computer 1112.

[0077] The system application 1130 leverages resource management by the operating system 1128 through program modules 1132 and program data 1134, which are stored, for example, in either system memory 1116 or disk storage 1124. It should be understood that this disclosure can be implemented with various operating systems or combinations of operating systems. The user inputs commands or information to the computer 1112 through an input device 1136. Examples of input devices 1136 include, but are not limited to, pointing devices such as mice, trackballs, styluses, touchpads, keyboards, microphones, joysticks, gamepads, satellite receivers, scanners, TV tuner cards, digital cameras, digital video cameras, and webcams. These devices, and other input devices, are connected to the processing unit 1114 via the system bus 1118 through interface ports 1138. Interface ports 1138 include, for example, serial ports, parallel ports, game ports, and Universal Serial Bus (USB). Output device 1140 uses some of the same type of ports as input device 1136. Therefore, for example, a USB port can be used to provide input to computer 1112 and to output information from computer 1112 to output device 1140. Output adapter 1142 is provided to indicate that some output devices 1140, such as monitors, speakers, and printers, require particularly special adapters among the other output devices 1140. Output adapter 1142 includes, but is not limited to, video cards and sound cards that provide means of connection between output device 1140 and system bus 1118. Note that other devices, or systems of devices, or both, such as remote computer 1144, provide both input and output functions.

[0078] Computer 1112 can operate in a networked environment using logical connections to one or more remote computers, such as remote computer 1144. Remote computer 1144 may be a computer, server, router, network PC, workstation, microprocessor-based appliance, peer device, or other common network node, and may also include many or all of the elements typically described for computer 1112. For simplicity, only the memory storage device 1146 is illustrated with remote computer 1144. Remote computer 1144 is logically connected to computer 1112 via network interface 1148, and then physically connected via communication connection 1150. Network interface 1148 encompasses wired, wireless, or both communication networks, such as local area networks (LANs), wide area networks (WANs), and cellular networks. LAN technologies include Fiber Distributed Data Interface (FDDI), Copper Distributed Data Interface (CDDI), Ethernet, Token Ring, and others. WAN technologies include, but are not limited to, point-to-point links, circuit-switched networks such as Integrated Services Digital Network (ISDN) and their variations, packet-switched networks, and digital subscriber lines (DSL). Communication connection 1150 refers to the hardware / software used to connect the network interface 1148 to the system bus 1118. Communication connection 1150 is shown inside computer 1112 for clarity in the illustration, but may also be located outside computer 1112. Other examples of hardware / software for connection to the network interface 1148 include, for illustrative purposes only, internal and external technologies such as modems including general telephone-grade modems, cable modems and DSL modems, ISDN adapters, and Ethernet(R) cards.

[0079] One or more embodiments described herein may be a system, method, apparatus, or computer program product or combination thereof at any possible level of technical detail of integration. The computer program product may include a computer-readable storage medium having computer-readable program instructions for causing a processor to execute an aspect of one or more embodiments. The computer-readable storage medium may be a tangible device capable of holding and storing instructions for use by an instruction execution device. The computer-readable storage medium may be, but is not limited to, an electronic storage device, a magnetic storage device, an optical storage device, an electromagnetic storage device, a semiconductor storage device, or any preferred combination thereof. A non-exclusive enumeration of more specific examples of computer-readable storage media includes: portable computer diskettes, hard disks, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), static random access memory (SRAM), portable compact disk read-only memory (CD-ROM), digital versatile disks (DVDs), memory sticks, floppy(R) disks, mechanically encoded devices such as punched cards or grooved structures on which instructions are recorded, and any preferred combination thereof. As used herein, computer-readable storage media should not be construed as transient signals themselves, such as radio waves or other freely propagating electromagnetic waves, electromagnetic waves propagating through waveguides or other transmission media (e.g., light pulses passing through optical fiber cables), or electrical signals transmitted through wires. In this regard, in various embodiments, computer-readable storage media as used herein may include non-transient and tangible computer-readable storage media.

[0080] The computer-readable program instructions described herein can be downloaded from a computer-readable storage medium to an individual computing / processing device, or to an external computer or external storage device via a network, such as the Internet, a local area network, a wide area network, or a wireless network, or a combination thereof. The network may include copper transmission cables, optical transmission fibers, wireless transmissions, routers, firewalls, switches, gateway computers, or edge servers, or a combination thereof. The network adapter card or network interface of each computing / processing device receives computer-readable program instructions from the network and transfers the computer-readable program instructions for storage on a computer-readable storage medium within the individual computing / processing device. Computer-readable program instructions for performing the operation of one or more embodiments may be source code or object code written in any combination of one or more programming languages, including assembler instructions, instruction set architecture (ISA) instructions, machine instructions, machine-dependent instructions, microcode, firmware instructions, state setting data, configuration data for integrated circuits, or object-oriented programming languages ​​such as Smalltalk(R) and C++, and procedural programming languages ​​such as the "C" programming language or similar programming languages. All computer-readable program instructions can be executed on the user's computer, some as standalone software packages on the user's computer, some on the user's computer and some on a remote computer, or all on a remote computer or a server.In the latter scenario, the remote computer can connect to the user's computer via any type of network, including a local area network (LAN) or a wide area network (WAN), or the connection may be made to an external computer (for example, via the Internet using an Internet service provider). In some embodiments, electronic circuits, including, for example, programmable logic circuits, field-programmable gate arrays (FPGAs), or programmable logic arrays (PLAs), can be personalized by executing computer-readable program instructions by utilizing state information of computer-readable program instructions in order to implement aspects of one or more embodiments.

[0081] Aspects of one or more embodiments are described herein with reference to flowcharts or block diagrams, or both, of methods, apparatus (systems), and computer program products according to the embodiments. It will be understood that each block in a flowchart or block diagram, or both, and combinations of blocks in a flowchart or block diagram, or both, can be implemented by computer-readable program instructions. These computer-readable program instructions may be instructions that are provided to a processor of a general-purpose computer, a special-purpose computer, or another programmable data processing device to create a machine in which instructions executed via the processor of a computer or other programmable data processing device create means for implementing the functions / operations specified in one or more blocks of a flowchart or block diagram, or both. These computer-readable program instructions may also be stored in a computer-readable storage medium on which the instructions are stored, so as to provide a product containing instructions that implement the modes of functions / operations specified in one or more blocks of a flowchart and block diagram, and instruct computers, programmable data processing devices, and other devices to function in a particular way. Computer-readable program instructions may also be loaded onto a computer, other programmable data processing device, or other device to create a computer implementation process that executes a set of operable functions on the computer, other programmable device, or other device, so that the instructions executed on the computer, other programmable device, or other device implement the functions / operations specified in one or more blocks of a flowchart and block diagram.

[0082] The flowcharts and block diagrams in the drawings illustrate the architecture, functionality, and operation of possible implementations of systems, methods, and computer program products according to the various embodiments described herein. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of instructions, containing one or more executable instructions for implementing a specified logical function. In some alternative implementations, the functions shown in a block may occur in a different order than shown in the drawings. For example, two consecutively shown blocks may actually be executed substantially simultaneously, or blocks may sometimes be executed in reverse order depending on the functionality involved. It should also be noted that each block in a block diagram and a flowchart, as well as combinations of blocks in a block diagram and a flowchart, may be implemented by a special-purpose hardware-based system that performs a specified function or operation, or executes a combination of special-purpose hardware and computer instructions.

[0083] While the subject matter has been described above in the general context of computer executable instructions for computer program products running on one or more computers, those skilled in the art will understand that this disclosure can also be implemented in combination with other program modules. Generally, program modules include routines, programs, components, data structures, etc., that perform a specific task or implement a specific abstract data type. Furthermore, those skilled in the art will understand that the computer implementation methods of the present invention can be practiced in single-processor or multi-processor computer systems, minicomputing devices, mainframe computers, and other computer system configurations, including computers, handheld computing devices (e.g., PDAs, telephones), microprocessor-based or programmable, home or professional electronic devices. The illustrated embodiments can also be practiced in a distributed computing environment where tasks are performed by remote processing devices linked through a communication network. However, some, if not all, embodiments of this disclosure can be practiced in a standalone computer. In a distributed computing environment, program modules can reside on both local and remote memory storage devices. For example, in one or more embodiments, a computer executable component may include, or be composed of, one or more distributed memory units and execute from memory. As used herein, the terms “memory” and “memory unit” are interchangeable. Furthermore, one or more embodiments described herein may execute the code of a computer executable component in a distributed manner, for example, by a combination or cooperative operation of multiple processors, and may execute code from one or more distributed memory units.As used herein, the term “memory” may include a single memory or memory unit located in one place, or multiple memories or memory units located in one or more places.

[0084] As used in this application, the terms “component,” “system,” “platform,” and “interface” may refer to, and may include, computer-related entities or entities relating to operable machines with one or more special functionalities. Entities disclosed herein may be hardware, a combination of hardware and software, software, or running software. For example, a component may be, but is not limited to, a process running on a processor, a processor, an object, an executable file, a thread of execution, a program, and a computer. Exemplarily, both an application running on a server and the server may be components. One or more components may reside in a process or a thread of execution, and components may be concentrated on one computer, distributed across two or more computers, or both. In another example, individual components may be executed from various computer-readable media storing various data structures. Components can communicate via local, remote, or both processes, such as by following a signal containing one or more data packets (for example, data from one component interacts with another component via a signal within a local system, within a distributed system, or across a network such as the Internet with other systems, or a combination thereof). As another example, a component can be a device having special functionality provided by mechanical parts operated by electrical or electronic circuits, which are operated by software or firmware applications run by a processor. In such cases, the processor can be internal or external to the device and can run at least part of the software or firmware application.As yet another example, a component can be a device that provides special functionality through electronic components without mechanical parts, in which case the electronic components may include a processor or other means for running software or firmware that at least partially grants the functionality of the electronic components. In one embodiment, the component may emulate the electronic components via a virtual machine, for example, within a cloud computing system.

[0085] As used herein, the term “facilitate” is in the context of a system, device, or component that “facilitates” one or more actions or operations in relation to the nature of a complex computing environment in which multiple components or multiple devices or combinations thereof may be involved in several computing operations. Non-exclusive examples of actions that may or may not involve multiple components or multiple devices or combinations thereof include sending and receiving data, establishing connections between devices, and determining intermediate results toward obtaining an outcome (e.g., employing machine learning and artificial intelligence to determine intermediate results). In this regard, computing devices or components can facilitate operations by playing any role in achieving them. Therefore, when describing the operation of a component herein, and when an operation is described as being facilitated by the component, it should be understood that the operation may optionally be completed with the cooperation of one or more other computing devices or components, including, but not limited to, sensors, antennas, auditory or visual output devices, and other devices.

[0086] In addition, the term “or” is intended to mean an inclusive “or” rather than an exclusive “or.” That is, unless otherwise specified or it is clear from the context, “X utilizes A or B” is intended to mean any of the natural inclusive sortings. That is, if X utilizes A, X utilizes B, or X utilizes both A and B, “X utilizes A or B” is satisfied under any of the aforementioned cases. Furthermore, where used in the specification of this subject matter and the accompanying drawings, the articles “a” and “an” should generally be interpreted as meaning “one or more” unless otherwise specified or it is clear from the context that they refer to the singular form. Where used herein, the terms “example” or “exemplary” or both are used to mean serving as an example, case, or illustration. To avoid doubt, the subject matter disclosed herein is not limited by such examples. In addition, any embodiment or design described herein as “example,” “exemplary,” or both is not necessarily to be construed as being preferable or advantageous to other embodiments or designs, nor is it intended to exclude equivalent exemplary structures and techniques known to those skilled in the art.

[0087] As adopted in the subject matter specification, the term “processor” can refer to substantially any computing processing unit or device, including, but not limited to, single-core processors, single processors with software multithreading capabilities, multi-core processors, multi-core processors with software multithreading capabilities, multi-core processors with hardware multithreading technology, parallel platforms, and parallel platforms with distributed shared memory. In addition, a processor can refer to integrated circuits, application-specific integrated circuits (ASICs), digital signal processors (DSPs), field-programmable gate arrays (FPGAs), programmable logic controllers (PLCs), composite programmable logic devices (CPLDs), discrete gate or transistor logic, discrete hardware components, or any combination thereof designed to perform the functions described herein. Furthermore, processors can leverage nanoscale architectures such as molecular and quantum dot-based transistors, switches, and gates, but not limited to, to optimize space use or improve the performance of user equipment. Processors can also be implemented as combinations of computing processing units. In this disclosure, terms such as “memory,” “storage,” “data memory,” “data storage,” “database,” and substantially any other information storage component relating to the operation and functionality of the component are used to refer to an entity embodied within a “memory component,” “memory,” or a component containing memory. It should be understood that the memory or memory component described herein, or both, may be either volatile memory or non-volatile memory, or may include both volatile and non-volatile memory.Examples of non-volatile memory include, but are not limited to, read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable ROM (EEPROM), flash memory, or non-volatile random-access memory (RAM) (e.g., ferroelectric RAM (FeRAM)). Examples of volatile memory include, for example, RAM that can operate as external cache memory. Examples of RAM include, but are not limited to, synchronous RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data-rate SDRAM (DDR SDRAM), enhanced SDRAM (ESDRAM), sync-link DRAM (SLDRAM), direct Rambus RAM (DRRAM), direct Rambus dynamic RAM (DRDRAM), and Rambus dynamic RAM (RDRAM). In addition, the memory components disclosed herein in relation to systems or computer implementations are intended to include, but not limited to, these and any other suitable types of memory.

[0088] The above descriptions include only examples of systems and computer implementations. Of course, it is impossible to describe all possible combinations of components or computer implementations for the purpose of illustrating this disclosure, but a person skilled in the art will understand that many further combinations and arrangements of this disclosure are possible. Furthermore, to the extent that terms such as “includes,” “has,” and “possesses” are used in the modes for carrying out the invention, claims, appendices, and drawings, such terms are intended to be inclusive in a manner similar to how “comprising” is interpreted when “comprising” is adopted as a transitional clause in a claim.

[0089] While various embodiments have been described for illustrative purposes, it is not intended to be exhaustive or to limit the scope to the disclosed embodiments. Many variations and modifications will be apparent to those skilled in the art without departing from the scope and concept of the described embodiments. The terminology used herein has been chosen to best describe the principles of the embodiments, their practical applications, or any technical improvements over the technology available on the market, or to enable others skilled in the art to understand the embodiments disclosed herein.

Claims

1. A method for forming a qubit, A substrate having a Josephson junction is prepared, positioned between two electrostatic plates. Annealing the Josephson junction involves passing a laser beam through a path including a diffractive optical element and a lens system to split it into multiple optical beams, and generating an illumination pattern including multiple spatially separated optical spots projected onto a region of the substrate located between the Josephson junction and the two electrostatic plates. Methods that include...

2. The plurality of optical beams include a plurality of Gaussian beams, and the method, The plurality of Gaussian beams are generated by passing the laser-generated Gaussian beam through the diffractive optical element. The method according to claim 1, further comprising:

3. The method according to claim 1 or 2, wherein the lens system includes an aspherical lens that focuses the plurality of optical beams onto the image plane and creates the plurality of optical spots projected onto the region of the substrate.

4. The method according to claim 3, wherein the spatially separated optical spots are separated by a distance of less than 20.0 micrometers from each other.

5. The method according to any one of claims 1 to 4, wherein the plurality of optical spots include at least four spatially separated optical spots.

6. The method according to any one of claims 1 to 5, wherein the Josephson junction includes an aluminum / aluminum oxide / aluminum triple-layer Josephson junction.

7. The method according to any one of claims 1 to 6, wherein the plurality of optical beams indirectly heat the Josephson junction, causing the Josephson junction to anneal.

8. As a result of the annealing, the resistance of the Josephson junction is changed. The method according to any one of claims 1 to 7, further comprising:

9. The method according to any one of claims 1 to 8, wherein the path is provided with a steering mirror in front of the diffractive optical element.

10. A method for forming a qubit, A substrate having a Josephson junction positioned between two superconducting leads is prepared, The Josephson junction is annealed by passing a laser beam through a path including a diffractive optical element and a lens system to split it into multiple optical beams, and generating an illumination pattern including multiple spatially separated optical spots projected onto the region of the substrate adjacent to the Josephson junction and the two superconducting leads. Methods that include...

11. The method according to claim 10, wherein the lens system includes an aspherical lens that focuses the plurality of optical beams onto the image plane and creates the plurality of optical spots projected onto the region of the substrate.

12. The method according to claim 11, wherein the spatially separated optical spots are separated by a distance of less than 20.0 micrometers from each other.

13. The method according to any one of claims 10 to 12, wherein the plurality of optical spots include at least four spatially separated optical spots.

14. The method according to any one of claims 10 to 13, wherein the plurality of optical beams indirectly heat the Josephson junction, causing the Josephson junction to anneal.

15. As a result of the annealing, the resistance of the Josephson junction is changed. The method according to any one of claims 10 to 14, further comprising:

16. A method for tuning a qubit device, Generating an optical beam, The Josephson junction of the qubit device is annealed by passing the optical beam through a path including a diffractive optical element and a lens system to split it into multiple optical beams, and generating an illumination pattern including multiple spatially separated optical spots that are projected onto the region of the qubit device adjacent to the Josephson junction. Methods that include...

17. The method according to claim 16, wherein the lens system includes an aspherical lens that focuses the plurality of optical beams onto the image plane and creates the plurality of optical spots projected onto a substrate region.

18. The method according to claim 16 or 17, wherein the plurality of optical spots include at least four spatially separated optical spots.

19. As a result of the annealing, the resistance of the Josephson junction is changed. The method according to any one of claims 16 to 18, further comprising:

20. An apparatus for annealing a microscale integrated device including a Josephson junction positioned between two electrostatic plates, A light source that generates an optical beam, A diffraction beam splitter that divides the optical beam into multiple optical beams, A lens system that generates an illumination pattern including a plurality of spatially separated optical spots projected onto a region of the microscale integrated device located between the Josephson junction and the two electrostatic plates, in order to anneal the Josephson junction of the microscale integrated device, A device equipped with the following features.

21. The aforementioned lens system A first lens that focuses the plurality of optical beams onto the image plane, A second lens that receives the image plane and projects the image plane onto the microscale integrated device for annealing the microscale integrated device, The apparatus according to claim 20, comprising:

22. The apparatus according to claim 21, wherein the image plane includes a plurality of spatially separated optical spots, each generated by the plurality of optical beams.

23. The apparatus according to any one of claims 20 to 22, wherein the microscale integrated device comprises a qubit device.

24. The apparatus according to any one of claims 20 to 23, configured to carry out the method described in any one of claims 1 to 19.

25. The method according to any one of claims 1 to 19, carried out by the apparatus according to any one of claims 20 to 23.

26. Use of the apparatus according to any one of claims 20 to 23 for annealing the Josephson junction.

27. A system comprising the apparatus according to any one of claims 20 to 23 and a qubit including the Josephson junction formed on a substrate between the two electrostatic plates, wherein the apparatus is configured to anneal the Josephson junction.

28. The system according to claim 27, wherein the qubit further includes superconducting leads formed on both sides of the Josephson junction, and the superconducting leads connect the Josephson junction to the electrostatic plate.

29. An apparatus for annealing electrical components of microscale integrated devices, A light source that generates an optical beam, A diffraction beam splitter that divides the optical beam into multiple optical beams, A lens system that generates an illumination pattern including a plurality of spatially separated optical spots projected onto the region adjacent to the electrical component of the microscale integrated device adjacent to the electrical component, and A device equipped with the following features.

30. The apparatus according to claim 29, wherein the electrical component includes a Josephson junction and the microscale integrated device includes a qubit.

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