Solid product, optical member, method for manufacturing solid product, surface formation method, spectacles, touch panel, smartphone, and tablet terminal

Abstract

This solid product has a silicon-oxide-containing layer and a polymer brush on the silicon-oxide-containing layer, the solid product being characterized in that the polymer brush has a moiety having a C14-65 alkyl group, and the moiety having an alkyl group is bonded to the silicon oxide via the oxygen atom.

Description

Solid body, optical member, solid body manufacturing method, surface forming method, eyeglasses, touch panel, smartphone, and tablet terminal

[0001] The present disclosure relates to a solid material having excellent scratch resistance and long-lasting antifouling properties, a method for producing the same, an optical element having the solid material, and eyeglasses, touch panels, smartphones, and tablet devices having the optical element.The present disclosure relates to a laminate having excellent scratch resistance and long-lasting antifouling properties, a method for producing the same, an optical element having the laminate, and eyeglasses, touch panels, smartphones, and tablet devices having the optical element.The present disclosure also relates to a surface-forming material and a surface-forming method for forming a surface having excellent scratch resistance and long-lasting antifouling properties.

[0002] Optical components such as optical filters and eyeglass lenses, as well as products such as touch panels and smartphones, have an anti-fouling film formed on their outermost surface to prevent adhesion of dirt such as fingerprints, sebum, sweat, and cosmetics and to facilitate removal. Anti-fouling films are required to have excellent anti-fouling properties (water repellency and oil repellency) and scratch resistance, and organic fluorine-containing compounds (PFAS), such as perfluorooctanoic acid (PFOA) and perfluorosulfonic acid (PFOS), are often used. However, PFAS is a substance that may have an impact on the environment and ecosystems, and various countries are currently considering regulating it. As a result, it may become impossible to use PFAS in anti-fouling films in the future. Therefore, there is a demand for anti-fouling films that do not contain PFAS.

[0003] As an antifouling film that does not contain PFAS, an antifouling coating agent containing a quaternary ammonium chloride of an amino-modified silicone compound and an aliphatic amine alkylene oxide adduct has been disclosed (Patent Document 1). Patent Document 1 discloses that a hard surface obtained using this antifouling coating agent has excellent properties in terms of antifouling properties.

[0004] On the other hand, it is generally known that a molecular organization (polymer brush) in which string-like polymers are grown on the surface of a material and structured like a toothbrush can result in a surface with excellent durability. Polymer brushes can be formed by applying a base layer with polymerization initiator functionality to the surface of the material and then polymerizing the base layer. Patent Document 2 discloses a polymer brush-forming substrate equipped with a polymerization initiator layer and a precursor liquid for producing the polymer brush-forming substrate.

[0005] JP 2012-241187 A International Publication No. 2019 / 131872

[0006] The inventors' investigations revealed that the silicone-based antifouling film disclosed in Patent Document 1 had excellent antifouling properties. However, it had poor scratch resistance, and scratches were formed when repeatedly wiping off stains, resulting in a decrease in antifouling properties over long periods of use. Patent Document 2 also discloses a substrate for forming polymer brushes equipped with a polymerization initiation layer and a precursor solution for producing the substrate. However, the inventors recognized that Patent Document 2 utilizes a polymerization reaction, making it difficult to control the molecular weight of the polymer brushes formed, and therefore difficult to control the structure of the polymer brushes. In addition, Patent Document 2 does not mention the scratch resistance or long-term antifouling properties of the formed polymer brushes. The solutions described in Patent Documents 1 and 2 are not sufficient in terms of achieving both scratch resistance and long-term antifouling properties in the antifouling film. Therefore, a surface that offers both excellent scratch resistance and long-term antifouling properties is desired.

[0007] The present disclosure provides a solid material having both excellent scratch resistance and long-term anti-fouling properties, a method for producing the same, an optical element, eyeglasses, a touch panel, a smartphone, and a tablet terminal. The present disclosure also provides a laminate having both excellent scratch resistance and long-term anti-fouling properties, a method for producing the same, an optical element, eyeglasses, a touch panel, a smartphone, and a tablet terminal. The present disclosure also provides a surface-forming material and a surface-forming method for forming a surface having excellent scratch resistance and long-term anti-fouling properties.

[0008] The solid material of the present disclosure is a solid material having a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide, wherein the polymer brush constitutes the surface of the solid material, and the polymer brush has a moiety having an alkyl group having from 14 to 65 carbon atoms, and the moiety having the alkyl group is bonded to the silicon oxide via an oxygen atom. The optical member of the present disclosure is an optical member having the above solid material. The eyeglasses of the present disclosure are eyeglasses having the above optical member. The touch panel of the present disclosure is a touch panel having the above optical member. The smartphone of the present disclosure is a smartphone having the above optical member. The tablet terminal of the present disclosure is a tablet terminal having the above optical member.

[0009] The present disclosure also provides a method for producing a solid material, the method comprising: a first vapor deposition step of vacuum-depositing a first vapor deposition material containing silicon oxide to form a layer containing the silicon oxide; and a second vapor deposition step of vacuum-depositing a second vapor deposition material containing a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group to form the polymer brush, in this order.

[0010] The laminate of the present disclosure is a laminate having a first layer and a polymer brush layer on the first layer, wherein the first layer contains silicon oxide, the polymer brush layer constitutes the surface of the laminate, and the polymer brush contained in the polymer brush layer has a moiety having an alkyl group having from 14 to 65 carbon atoms, and the moiety having the alkyl group is bonded to the silicon oxide via an oxygen atom. The optical member of the present disclosure is an optical member having the above laminate. The eyeglasses of the present disclosure are eyeglasses having the above optical member. The touch panel of the present disclosure is a touch panel having the above optical member. The smartphone of the present disclosure is a smartphone having the above optical member. The tablet terminal of the present disclosure is a tablet terminal having the above optical member.

[0011] The present disclosure also provides a method for producing a laminate, the method comprising: a first vapor deposition step of vacuum-depositing a first vapor deposition material containing silicon oxide to form the first layer; and a second vapor deposition step of vacuum-depositing a second vapor deposition material containing a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group to form the polymer brush layer, in this order.

[0012] Furthermore, the surface-forming material of the present disclosure is a surface-forming material that includes a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group. Additionally, the surface-forming method of the present disclosure is a surface-forming method using a vacuum deposition method, comprising, in this order: a first deposition step of vacuum-depositing a first deposition material containing silicon oxide to form a layer containing silicon oxide; and a second deposition step of vacuum-depositing a second deposition material containing the first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group.

[0013] According to the present disclosure, it is possible to provide a solid material having a surface that is both excellent in scratch resistance and long-term antifouling properties, a manufacturing method thereof, a laminate and a manufacturing method thereof, an optical element, eyeglasses, a touch panel, a smartphone, and a tablet terminal. The present disclosure also provides a surface-forming material and a surface-forming method that form a surface that is both excellent in scratch resistance and long-term antifouling properties.

[0014] Schematic diagram showing the configuration of a solid or laminate of the present disclosure.

[0015] Preferred embodiments of the present disclosure will be described below, including a solid body and a manufacturing method thereof, a laminate and a manufacturing method thereof, an optical element, eyeglasses, a smartphone, a tablet device, and a surface-forming material and a surface-forming method. The present disclosure is not limited to the following embodiments. In the present disclosure, the expressions "XX or more and YY or less" and "XX to YY" used to represent a numerical range refer to a numerical range including the lower and upper limits, which are the endpoints, unless otherwise specified. Furthermore, when a numerical range is described in stages, the upper and lower limits of each numerical range can be arbitrarily combined. In the present disclosure, a polymer brush refers to a structure in which string-like polymers are immobilized on the surface of a substrate, e.g., a molecular organization in which string-like polymers are arranged like a brush on the surface of a substrate. In the present disclosure, the moiety having an alkyl group and the moiety having a dimethylsilicone chain correspond to the string-like polymer.

[0016] In the method for manufacturing a substrate for forming a polymer brush described in Patent Document 2, a monomer is applied to a substrate or a substrate is immersed in a monomer, and a polymerization reaction is carried out to form a polymer brush. When a polymer brush is formed by such a polymerization reaction, it is difficult to control the molecular weight of the polymer brush, and therefore it is thought that it is difficult to control the structure of the polymer brush. Therefore, it is speculated that the antifouling film described in Patent Document 2 does not necessarily have sufficient scratch resistance and long-term antifouling properties.

[0017] According to the present disclosure, it is believed that the polymer brush has a moiety having an alkyl group with a specific carbon number, thereby forming a high-density, uniform brush-like molecular organization, resulting in a solid product having a surface that is excellent in scratch resistance and long-term antifouling properties. Furthermore, according to the manufacturing method of the present disclosure, the polymer brush is formed by vacuum-depositing a vapor deposition material including a first compound having a moiety having an alkyl group with a specific carbon number and a hydroxyl group, which makes it easy to control the molecular length of the polymer brush, making it easy to form a high-density, uniform brush-like molecular organization, and enabling the production of a solid product having a surface that is excellent in scratch resistance and long-term antifouling properties.

[0018] According to the present disclosure, the polymer brushes contained in the polymer brush layer have a moiety having an alkyl group with a specific carbon number, which is believed to form a high-density, uniform brush-like molecular organization, resulting in a laminate with excellent scratch resistance and long-lasting antifouling properties. Furthermore, according to the manufacturing method of the present disclosure, forming the polymer brush layer by vacuum-depositing a vapor deposition material including a first compound having a moiety having an alkyl group with a specific carbon number and a hydroxyl group makes it easy to control the molecular length of the polymer brushes, which is believed to facilitate the formation of a high-density, uniform brush-like molecular organization, and enable the production of a laminate with excellent scratch resistance and long-lasting antifouling properties.

[0019] <Solid> A solid having a surface according to the present disclosure will now be described. The solid has a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide. The polymer brush forms the surface of the solid. The polymer brush also has a moiety having an alkyl group having 14 to 65 carbon atoms. The moiety having the alkyl group having 14 to 65 carbon atoms is further bonded to the silicon oxide via an oxygen atom.

[0020] The polymer brush has a moiety having an alkyl group having 14 to 65 carbon atoms. The number of carbon atoms in the alkyl group is preferably 16 to 60, more preferably 18 to 60, and even more preferably 18 to 40. The alkyl group may be linear or branched, but is preferably a linear alkyl group. The moiety having the alkyl group preferably has a linear aliphatic structure, more preferably a linear alkyl group. This structure results in the formation of a high-density, uniform brush-like molecular organization, resulting in a solid material with a surface that is excellent in scratch resistance and long-lasting antifouling properties.

[0021] The alkyl group-containing moiety is represented by the general formula: ｎ H ２ｎ＋１]-. In the formula, n represents the number of carbon atoms in the alkyl group, and n is preferably in the range of 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. When the number of carbon atoms in the alkyl group is within the above range, a high-density, uniform brush-like molecular structure is formed, resulting in a solid material having a surface that is excellent in scratch resistance and long-lasting anti-fouling properties. If the number of carbon atoms is less than 14, it is difficult to form a high-density, uniform brush-like molecular structure, resulting in decreased scratch resistance and anti-fouling properties. On the other hand, if the number of carbon atoms exceeds 65, it is difficult to form a high-density, uniform brush-like molecular structure, resulting in decreased scratch resistance and anti-fouling properties. The number of carbon atoms in the alkyl group can be adjusted by changing the type of the first compound having the alkyl group moiety and the hydroxyl group.

[0022] The alkyl group-containing moiety may further include an oxyethylene group -(CH ２ ) ２ -O- and oxypropylene group -(CH(CH ３ ) CH ２ The moiety having the alkyl group and the oxyethylene group may be a group represented by the general formula: [C ｎ’ H ２ｎ’＋１ ]-O-[(CH ２ ) ２ O] ｍ -. In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene group. In the moiety having an alkyl group and an oxyethylene group, n'+2m, which represents the total number of carbon atoms in the alkyl group and the oxyethylene group, is preferably in the range of 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. The alkyl group may be linear or branched, but is preferably a linear alkyl group. Furthermore, the moiety having an alkyl group and an oxyethylene group is preferably a linear alkyl group having an oxyethylene group.

[0023] When the total number of carbon atoms in the alkyl group and the oxyethylene group is within the above range, a high-density, uniform brush-like molecular structure is formed, and a solid product having a surface with excellent scratch resistance and long-lasting stain resistance is likely to be obtained. If the carbon number is less than 14, it is difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and stain resistance are likely to decrease. On the other hand, if the carbon number exceeds 65, it is difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and stain resistance are likely to decrease.

[0024] The degree of polymerization of the oxyethylene group is not particularly limited, but may be 1-20, 1-15, or 1-10.

[0025] The number of carbon atoms in the alkyl group, the total number of carbon atoms in the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having a moiety having an alkyl group and an oxyalkylene group and a hydroxyl group.

[0026] In the layer containing silicon oxide, the silicon oxide is SiO ｘ (x is, for example, 1 to 2), and compounds represented by the formula: ２ ・Al ２ O ３ SiO in complex inorganic oxides such as ２Here, the silicon oxide-containing layer is bonded to the alkyl group-containing moiety forming the polymer brush via an oxygen atom. That is, the alkyl group-containing moiety is bonded to the silicon oxide via an oxygen atom. This improves the durability of the polymer brush and the scratch resistance of the solid material. Here, the bonding is a covalent bond. The bonding via an oxygen atom may be a direct bond between the alkyl group-containing moiety forming the polymer brush and the silicon oxide-containing layer, or an indirect bond via another linking group. Furthermore, the silicon oxide-containing layer can form active sites in the silicon oxide contained in the layer. As a result, the alkyl group-containing moiety in the polymer brush is more likely to bond to the silicon oxide via an oxygen atom. That is, the polymer brush is more likely to be formed on the surface of the solid material. Methods for forming such active sites include forming a silicon oxide-containing layer using the first vapor deposition process described below, and modifying the surface of the substrate by irradiating it with ultraviolet light, plasma, or ion beams. Compounds that can be contained in the silicon oxide-containing layer include SiO ２ (silicon dioxide), Al ２ O ３ Added SiO ２ (alumina-added silicon dioxide), etc. However, the silicon oxide-containing compound is not limited to these. In addition, the silicon oxide-containing layer may be formed of ITO (indium tin oxide), TiO ２ The inorganic oxide may be a composite oxide.

[0027] <Laminate> A laminate according to the present disclosure will be described. The laminate has a first layer and a polymer brush layer on the first layer. The first layer contains silicon oxide. The polymer brush layer forms the surface of the laminate. In addition, the polymer brush contained in the polymer brush layer has a moiety having an alkyl group having 14 to 65 carbon atoms. Furthermore, the moiety having an alkyl group having 14 to 65 carbon atoms is bonded to the silicon oxide via an oxygen atom.

[0028] The polymer brushes contained in the polymer brush layer have a moiety having an alkyl group having from 14 to 65 carbon atoms. The number of carbon atoms in the alkyl group is preferably from 16 to 60, more preferably from 18 to 60, and even more preferably from 18 to 40. The alkyl group may be linear or branched, but is preferably a linear alkyl group. The moiety having the alkyl group preferably has a linear aliphatic structure, more preferably a linear alkyl group. This structure results in the formation of a high-density, uniform brush-like molecular structure, resulting in a laminate with excellent scratch resistance and long-lasting stain resistance.

[0029] The alkyl group-containing moiety is represented by the general formula: ｎ H ２ｎ＋１ ]-. In the formula, n represents the number of carbon atoms in the alkyl group, and n is preferably in the range of 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. When the number of carbon atoms in the alkyl group is within the above range, a high-density, uniform brush-like molecular structure is formed, resulting in a laminate with excellent scratch resistance and long-lasting stain resistance. If the number of carbon atoms is less than 14, it is difficult to form a high-density, uniform brush-like molecular structure, resulting in reduced scratch resistance and stain resistance. , resulting in reduced scratch resistance and stain resistance. Furthermore, if the number of carbon atoms exceeds 65, it is difficult to form a high-density, uniform brush-like molecular structure, resulting in reduced scratch resistance and stain resistance. The number of carbon atoms in the alkyl group can be adjusted by changing the type of the first compound having an alkyl group and a hydroxyl group.

[0030] The alkyl group-containing moiety may further include an oxyethylene group -(CH ２ ) ２ -O- and oxypropylene group -(CH(CH ３ ) CH ２ The moiety having the alkyl group and the oxyethylene group may be a group represented by the general formula: [C ｎ’ H ２ｎ’＋１]-O-[(CH ２ ) ２ O] ｍ -. In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene group. In the moiety having an alkyl group and an oxyethylene group, n'+2m, which represents the total number of carbon atoms in the alkyl group and the oxyethylene group, is preferably in the range of 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. The alkyl group may be linear or branched, but is preferably a linear alkyl group. Furthermore, the moiety having an alkyl group and an oxyethylene group is preferably a linear alkyl group having an oxyethylene group.

[0031] When the total number of carbon atoms in the alkyl group and the oxyethylene group is within the above range, a high-density, uniform brush-like molecular structure is formed, resulting in a laminate with excellent scratch resistance and long-lasting stain resistance. If the carbon number is less than 14, it becomes difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and stain resistance decrease. On the other hand, if the carbon number exceeds 65, it becomes difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and stain resistance decrease.

[0032] The degree of polymerization of the oxyethylene group is not particularly limited, but may be 1-20, 1-15, or 1-10.

[0033] The number of carbon atoms in the alkyl group, the total number of carbon atoms in the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having a moiety having an alkyl group and an oxyalkylene group and a hydroxyl group.

[0034] The first layer contains silicon oxide. Silicon oxide is SiO ｘ (x is, for example, 1 to 2), and compounds represented by the formula: ２ ・Al ２ O ３ SiO in complex inorganic oxides such as ２Here, the first layer is a layer containing silicon oxide that bonds to the alkyl group-containing moieties that form the polymer brush via oxygen atoms. That is, the alkyl group-containing moieties are bonded to the silicon oxide via oxygen atoms. This improves the durability of the polymer brush and the scratch resistance of the laminate. Here, the bonding is a covalent bond. The bonding via oxygen atoms may be a direct bond between the alkyl group-containing moieties that form the polymer brush and the silicon oxide-containing layer, or an indirect bond via another linking group. Furthermore, the inclusion of a silicon oxide-containing layer allows active sites to be formed in the silicon oxide contained in the layer. As a result, the alkyl group-containing moieties in the polymer brush are more likely to bond to the silicon oxide via oxygen atoms. That is, the polymer brush is more likely to be formed on the surface of a solid object. Methods for forming such active sites include forming a silicon oxide-containing layer using the first vapor deposition process described below, and modifying the surface of a substrate by irradiating it with ultraviolet light, plasma, or ion beams. Compounds that can be contained in the first layer include SiO ２ (silicon dioxide), Al ２ O ３ (Alumina), Al ２ O ３ Added SiO ２ (alumina-added silicon dioxide), etc. However, the silicon oxide-containing compound is not limited to these. In addition, the first layer may be made of ITO (indium tin oxide), TiO ２ The inorganic oxide may be a composite oxide.

[0035] In the solid material and laminate of the present disclosure, the polymer brush preferably further contains a moiety having a dimethylsilicone chain with a silicon number of 3 or more and 110 or less. By containing a moiety having a dimethylsilicone chain, it is possible to further improve water repellency and oil repellency (stain resistance). The moiety having a dimethylsilicone chain is represented by the general formula: -[Si(CH ３ ) ２ O] ｉ- is a moiety having a structure represented by the symbol i. In the formula, i represents the degree of polymerization of the dimethylsilicone chain, i.e., the number of silicon atoms in the dimethylsilicone chain. The preferred range for i is 3 or more and 110 or less, more preferably 3 or more and 100 or less, and even more preferably 3 or more and 50 or less.

[0036] The moiety having a dimethylsilicone chain may further have an alkylene group such as a methylene group or an ethylene group. The number of carbon atoms in the alkylene group is not particularly limited, but may be, for example, 1 to 6, 1 to 3, or 1 to 2. By having the moiety having a dimethylsilicone chain further have an alkylene group, it is possible to adjust the water repellency and lipophilicity.

[0037] The molecular weight of the moiety having a dimethylsilicone chain is preferably 200 or more and 8000 or less, more preferably 240 or more and 7600 or less, and even more preferably 300 or more and 7600 or less. It may also be 300 or more and 8000 or less. By having the molecular weight within the above range, it is possible to further enhance the water repellency and lipophilicity of the dimethylsilicone chain. By changing the moiety having a dimethylsilicone chain and the type of second compound having a reactive functional group, it is possible to adjust the number of silicon atoms in the dimethylsilicone chain, to have an alkylene group in the moiety having a dimethylsilicone chain, and to adjust the molecular weight of the moiety having a dimethylsilicone chain.

[0038] In the solid material and laminate of the present disclosure, the mass ratio of the portion having a dimethyl silicone chain to the portion having the alkyl group in the polymer brush is determined by measuring the peak intensity attributable to the portion having an alkyl group when the surface of the solid material or laminate is measured with a micro-Raman spectrometer. Ａ and the peak intensity derived from the portion having the dimethyl silicone chain is P Ｂ When P Ｂ / P Ａ It is expressed as: P Ｂ / P Ａis preferably 0.0 to 1.1, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By being in the above range, scratch resistance can be made even better. Ｂ / P Ａ may be 0.3 to 0.7, and within this range, the solid material or laminate can have better antifouling properties. Ｂ / P Ａ can be adjusted by the mass ratio of the content of the second compound having a moiety having a dimethylsilicone chain and a reactive functional group to the content of the first compound having a moiety having an alkyl group and a hydroxyl group in the surface-forming material.

[0039] P Ｂ / P Ａ can be determined by the following method. The area on the surface of the solid or laminate to be measured with a micro-Raman spectrometer is determined. The area is determined by the magnification of the objective lens attached to the device, the wavelength of the excitation laser, and the aperture diameter. Hereinafter, the determined area will also be referred to as the measurement area. Next, the measurement area is irradiated with excitation laser light, and the scattered light generated is measured to obtain a peak. The measurement conditions are as follows: - Measurement device: Micro-Raman spectrometer manufactured by Thermo Fisher Scientific - Objective lens magnification: 10x - Excitation laser wavelength: 532 nm - Aperture diameter: 25 μm - Measurement area: 2 μm Of the peaks in the obtained Raman spectrum, the peak derived from the C-C bond is considered to be the peak derived from the part having an alkyl group, and the peak intensity of the peak is determined as P Ａ Furthermore, among the peaks in the obtained Raman spectrum, the peak derived from the Si—C bond is regarded as the peak derived from the part having the dimethyl silicone chain, and the peak intensity of this peak is expressed as P Ｂ The obtained P Ａ and P Ｂ From P Ｂ / P Ａ Calculate.

[0040] <Method for Producing Solid Material> Next, a method for producing a solid material according to the present disclosure will be described. The method for producing a solid material includes, in this order, a first vapor deposition step of vacuum-depositing a first vapor deposition material containing silicon oxide to form a layer containing the silicon oxide, and a second vapor deposition step of vacuum-depositing a second vapor deposition material containing a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group.

[0041] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form a layer containing silicon oxide. By performing such a first vapor deposition step, the layer containing silicon oxide can be used as a base layer. Furthermore, by forming a layer containing silicon oxide through the first vapor deposition step, active sites can be formed in the silicon oxide contained in the layer. Known materials can be used as the substrate for vacuum vapor deposition. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, but examples thereof include SiO ２ and Al ２ O ３ Added SiO ２ The first deposition material may further include Al ２ O ３ , ITO, TiO ２ Here, silicon oxide may contain inorganic oxides such as SiO ｘ (x is, for example, 1 to 2), and compounds represented by the formula: ２ ・Al ２ O ３ SiO in complex inorganic oxides such as ２ The conditions for the vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0042] In the second vapor deposition step, a second vapor deposition material including a first compound having a hydroxyl group and a moiety having an alkyl group with 14 to 65 carbon atoms is vacuum-deposited to form a polymer brush. By performing this second vapor deposition step after the first vapor deposition step, a polymer brush can be formed on a layer containing silicon oxide. Furthermore, the moiety having an alkyl group with 14 to 65 carbon atoms contained in the polymer brush can bond to the silicon oxide contained in the first layer via an oxygen atom. It is presumed that this oxygen atom originates from the hydroxyl group contained in the first compound. Here, the bonding mode is a covalent bond. The first compound having an alkyl group and a hydroxyl group contained in the second vapor deposition material is not particularly limited, but examples thereof include linear aliphatic alcohols and aliphatic alcohols with a branched structure, and may be a compound represented by the general formula: [C ｎ H ２ｎ＋１ ]-OH. The hydroxyl group in the formula may be located at the terminal or inside of the alkyl group, but is preferably located at the terminal. The first compound having a hydroxyl group can bond to the silicon oxide contained in the silicon oxide-containing layer. In the formula, n represents the number of carbon atoms in the alkyl group, and n preferably ranges from 14 to 65, more preferably from 16 to 60, even more preferably from 18 to 60, and particularly preferably from 18 to 40. Specific examples of the first compound having a moiety containing an alkyl group and a hydroxyl group include compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0043] <Laminate Manufacturing Method> Next, a method for manufacturing a laminate according to the present disclosure will be described. The laminate manufacturing method includes, in this order, a first vapor deposition step of vacuum-depositing a first vapor deposition material containing silicon oxide to form the first layer, and a second vapor deposition step of vacuum-depositing a second vapor deposition material containing a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group.

[0044] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form a first layer. By carrying out such a first vapor deposition step, silicon oxide can be contained in the first layer. Furthermore, by forming a layer containing silicon oxide through the first vapor deposition step, active sites can be formed in the silicon oxide contained in the layer. Known materials can be used as the substrate for vacuum vapor deposition. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, but examples thereof include SiO ２ and Al ２ O ３ Added SiO ２ The first deposition material may further include Al ２ O ３ , ITO, TiO ２ Here, silicon oxide may contain inorganic oxides such as SiO ｘ (x is, for example, 1 to 2), and compounds represented by the formula: ２ ・Al ２ O ３ SiO in complex inorganic oxides such as ２ The conditions for the vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0045] In the second vapor deposition step, a second vapor deposition material including a first compound having a hydroxyl group and a moiety having an alkyl group with 14 to 65 carbon atoms is vacuum-deposited to form a polymer brush layer. By performing this second vapor deposition step after the first vapor deposition step, the polymer brush layer can be formed on the first layer. Furthermore, the moiety having an alkyl group with 14 to 65 carbon atoms in the polymer brush can bond to the silicon oxide in the first layer via an oxygen atom. It is presumed that this oxygen atom originates from the hydroxyl group in the first compound. Here, the bond is a covalent bond. The first compound having an alkyl group and a hydroxyl group contained in the second vapor deposition material is not particularly limited, but examples include linear aliphatic alcohols and aliphatic alcohols with a branched structure, and may be a compound represented by the general formula: [C ｎ H ２ｎ＋１]-OH. The hydroxyl group in the formula may be located at the terminal or inside of the alkyl group, but is preferably located at the terminal. The first compound having a hydroxyl group allows it to bond with the silicon oxide contained in the first layer. In the formula, n represents the number of carbon atoms in the alkyl group, and n preferably ranges from 14 to 65, more preferably from 16 to 60, even more preferably from 18 to 60, and particularly preferably from 18 to 40. Specific examples of the first compound having an alkyl group moiety and a hydroxyl group include compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0046] In the method for producing a solid material and the method for producing a laminate, the first compound may be a linear alcohol alkoxylate or an alcohol alkoxylate having a branched structure, and may be represented by the general formula: [C ｎ’ H ２ｎ’＋１ ]-O-[(CH ２ ) ２ O] ｍ A linear alcohol ethoxylate represented by -H is preferred. By having a hydroxyl group at the end of the alkoxylate, it can bond to the silicon oxide contained in the silicon oxide-containing layer or the silicon oxide contained in the first layer. In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene group. The total number of carbon atoms in the linear alcohol ethoxylate, n' + 2m, is preferably in the range of 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. The degree of polymerization of the oxyethylene group is not particularly limited, but may be 1 to 20, 1 to 15, or 1 to 10. Specific examples of linear alcohol alkoxylates include compounds A-11, A-12, A-13, and A-14 shown in Table 1.

[0047] In the methods for producing a solid material and a laminate, the first compound may be a single compound or a combination of two or more compounds. That is, the first compound may be at least one compound selected from the group consisting of linear aliphatic alcohols, aliphatic alcohols having a branched structure, linear alcohol alkoxylates, and alcohol alkoxylates having a branched structure. For example, linear aliphatic alcohols include 1-stearyl alcohol, 1-icosanol, 1-triacontanol, and 1-hexacontanol, and linear alcohol ethoxylates include ethylene glycol monohexadecyl ether, ethylene glycol monooctadecyl ether, ethylene glycol monooctacosyl ether, and decaethylene glycol tetracontyl ether.

[0048] In the methods for producing a solid material and a laminate, the second vapor deposition material may contain, in addition to the first compound, a second compound having a moiety with a dimethylsilicone chain and a reactive functional group. The second compound having a moiety with a dimethylsilicone chain and a reactive functional group is not particularly limited, but may be a compound represented by the general formula: R-[Si(CH ３ ) ２ O] ｉPreferably, the compound has a structure represented by -R'. In the formula, i represents the degree of polymerization of the dimethylsilicone chain, i.e., the number of silicon atoms in the dimethylsilicone chain. The preferred range for i is 3 or more and 110 or less, more preferably 3 or more and 100 or less, and even more preferably 3 or more and 50 or less. At least one selected from the group consisting of R and R' in the formula is a reactive functional group capable of bonding to the silicon oxide-containing layer or the first layer containing silicon oxide via an oxygen atom. Here, this oxygen atom is presumed to be derived from the reactive functional group contained in the second compound. That is, the reactive functional group is not limited as long as it can bond to silicon oxide, but examples include alkoxy groups such as methoxy and ethoxy groups, and hydroxyl groups. Of these, methoxy groups are preferred. When at least one selected from the group consisting of R and R' is a reactive functional group capable of bonding to the silicon oxide-containing layer or the first layer containing silicon oxide via an oxygen atom, the second compound can bond to the silicon oxide contained in the silicon oxide-containing layer or the silicon oxide contained in the first layer. Here, the bond is a covalent bond.

[0049] Among the group consisting of R and R', the functional group that is not a reactive functional group is not particularly limited, and examples thereof include alkyl groups such as methyl groups and ethyl groups, hydrogen, etc. Among these, the methyl group is preferred.

[0050] The method for producing a solid material and the method for producing a laminate may include a third vapor deposition step of vapor depositing a second compound before or after the second vapor deposition step.

[0051] The molecular weight of the second compound is preferably 200 or more and 8000 or less, more preferably 240 or more and 7600 or less, and even more preferably 300 or more and 7600 or less. It may also be 300 or more and 8000 or less. Specific examples of the second compound include compounds B-1, B-2, and B-3 shown in Table 1.

[0052] In the second deposition material, the mass ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. The mass ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7, and by setting it in the above range, P Ｂ / P Ａ It becomes easier to keep the value within the above range.

[0053] <Surface Forming Method> Next, a surface forming method according to the present disclosure will be described. The surface forming method is a surface forming method using a vacuum deposition method. The surface forming method includes, in this order, a first deposition step of vacuum-depositing a first deposition material containing silicon oxide to form a layer containing silicon oxide, and a second deposition step of vacuum-depositing a second deposition material containing a first compound having a moiety having an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group.

[0054] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form a layer containing silicon oxide. By carrying out such a first vapor deposition step, a layer containing silicon oxide can be formed. Furthermore, by forming a layer containing silicon oxide through the first vapor deposition step, active sites can be formed in the silicon oxide contained in the layer. Known materials can be used as the substrate for vacuum vapor deposition. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, but examples thereof include SiO ２ and Al ２ O ３ Added SiO ２ The first deposition material may further include Al ２ O ３ , ITO, TiO ２ Here, silicon oxide may contain inorganic oxides such as SiO ｘ (x is, for example, 1 to 2), and compounds represented by the formula: ２ ・Al ２ O ３ SiO in complex inorganic oxides such as ２The conditions for the vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0055] In the second vapor deposition step of the surface formation method, a second vapor deposition material including a first compound having a moiety with an alkyl group having 14 to 65 carbon atoms and a hydroxyl group is vacuum-deposited. By performing such a second vapor deposition step after the first vapor deposition step, the resulting solid surface has excellent scratch resistance and long-term antifouling properties. Examples of the first compound include the first compounds described in the section on the manufacturing method of a solid or the manufacturing method of a laminate.

[0056] The second vapor deposition material in the surface formation method may contain, in addition to the first compound, a second compound having a moiety with a dimethyl silicone chain and a reactive functional group. The second compound may be any of the second compounds described in the solid material manufacturing method or laminate manufacturing method. The surface formation method may also include a third vapor deposition step of vapor-depositing the second compound before or after the second vapor deposition step. By vapor-depositing the second compound, the resulting solid surface has better water repellency and oil repellency (fouling resistance).

[0057] In the second vapor deposition material, the mass ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By setting it within the above range, the obtained solid surface will have better scratch resistance. Furthermore, the mass ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7, and within this range, the obtained solid surface will have better antifouling properties.

[0058] <Surface-forming material> Next, the surface-forming material according to the present disclosure will be described. The surface-forming material includes a first compound having a moiety with an alkyl group having from 14 to 65 carbon atoms and a hydroxyl group. As the first compound, the first compounds described in the section on the method for producing a solid material or the section on the method for producing a laminate can be used. By including the first compound in the surface-forming material, the surface obtained by performing surface treatment on a substrate using the surface-forming material will have excellent both scratch resistance and long-term antifouling properties. The surface-forming material can be used as the second vapor deposition material in the section on the method for producing a solid material, the section on the method for producing a laminate, or the section on the surface-forming method.

[0059] The surface-forming material may contain a second compound having a moiety having a dimethyl silicone chain and a reactive functional group. The second compound may be any of the second compounds described in the section on the method for producing a solid material or the method for producing a laminate. By including the second compound in the surface-forming material, the surface obtained by surface-treating a substrate with the surface-forming material will have better water repellency and oil repellency (fouling resistance).

[0060] In the surface-forming material, the mass ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By setting it within the above range, the surface obtained by performing surface treatment of a substrate using the surface-forming material will have better scratch resistance. Furthermore, the mass ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7, and within this range, the surface obtained by performing surface treatment of a substrate using the surface-forming material can have better antifouling properties.

[0061] Optical Members Optical members include optical filters, optical lenses, eyeglass lenses, photographic lenses, display cover glasses, and various films.

[0062] <Eyeglasses> The eyeglasses are eyeglasses having the optical member of the present disclosure. Eyeglasses encompass all devices worn around the eyes, and are not limited to ordinary eyeglasses for vision correction, but also include fashion glasses, protective goggles, head-mounted displays, sunglasses, and smart glasses. <Touch Panel> The touch panel is a touch panel having the optical member of the present disclosure. The touch panel according to the present disclosure is used in all devices having a touch panel. Examples of devices having a touch panel include smartphones and tablet terminals. That is, smartphones have the optical member of the present disclosure. Furthermore, tablet terminals have the optical member of the present disclosure.

[0063] The analytical method of the present disclosure is described below. <Method for confirming that a moiety having an alkyl group is bonded to silicon oxide via an oxygen atom> Whether a moiety having an alkyl group is bonded to silicon oxide via an oxygen atom can be confirmed by the following procedure. A first vapor deposition material containing silicon oxide is vacuum-deposited on each of substrate A made of borosilicate glass and substrate B made of borosilicate glass, to form a layer containing silicon oxide. By forming a layer containing silicon oxide through this first vapor deposition process, active sites can be formed in the silicon oxide contained in the layer. Thereafter, while maintaining the vacuum state after the formation of the layer containing silicon oxide, substrate A is vacuum-deposited with a second vapor deposition material, thereby obtaining a solid material of the present disclosure. After the formation of the layer containing silicon oxide, substrate B is removed from the vacuum deposition apparatus and exposed to air at atmospheric pressure, thereby performing a treatment to eliminate the active sites of the silicon oxide contained in the layer, and then vacuum-deposits the second vapor deposition material.

[0064] Substrates A and B, on which the second deposition material was vacuum-deposited, were heated in a vacuum. The temperatures at which alkyl-containing moieties were detected using a mass spectrometer (product name: infiTOF-DUO, manufactured by Nippon Kanomax Co., Ltd.) were compared, confirming that the alkyl-containing moieties were bonded to silicon oxide via oxygen atoms. Because the alkyl-containing moieties were bonded to silicon oxide via oxygen atoms in substrate A, the temperature at which the alkyl-containing moieties were detected was higher than in substrate B. The measurement conditions were as follows: temperature range: room temperature to 1000°C; heating rate: 10°C / min; atmosphere: reduced pressure (5×10-7 Pa or less); and mass measurement range: m / z 1 to 1000. Furthermore, the fact that the alkyl-containing moieties were bonded to silicon oxide via oxygen atoms using the above method indicates that the solid had polymer brushes on the silicon oxide-containing layer.

[0065] 1 is a schematic diagram showing the configuration of a solid or laminate according to a first embodiment of the present disclosure, illustrating an example of the configuration of a solid or laminate in which a first layer (layer containing silicon oxide) 12 containing silicon oxide is formed on a substrate 11, and polymer brushes 13 are formed on the first layer 12. Note that Fig. 1 is a schematic representation of a configuration having polymer brushes, and does not represent the actual thicknesses of the substrate 11, first layer 12, and polymer brushes 13 to exact proportions.

[0066] (Substrate 11) The substrate 11 may be a solid material capable of forming the first layer 12 containing silicon oxide and the polymer brush 13, and examples thereof include glass, ceramics, resin, or a film made of metal, glass, resin, etc. When the above-described material is used as the substrate for an optical component having a solid material or laminate of the present disclosure, the substrate is preferably capable of transmitting visible light or light of a specific wavelength. The thickness of the substrate is not particularly limited and can be appropriately set depending on the application.

[0067] (Silicon Oxide-Containing First Layer 12) The silicon oxide-containing first layer 12 is the silicon oxide-containing first layer of the present disclosure. There are no particular restrictions on the thickness of the layer 12, but examples include 2 nm to 50 nm and 4 nm to 20 nm.

[0068] (Polymer Brush 13) The polymer brush 13 is a polymer brush on the first layer containing silicon oxide according to the present disclosure. There are no particular limitations on the thickness of the polymer brush 13, but examples include 1 nm to 10 nm and 1 to 5 nm. By having the thickness within the above range, it is easy to obtain a solid or laminate that has excellent scratch resistance and long-term antifouling properties.

[0069] The present disclosure will be described in more detail below with reference to examples, but the present disclosure is not limited to the following examples.

[0070] Example 1 Preparation of Surface-Forming Material Table 2 shows combinations of component A (first compound) and component B (second compound), and the mass ratio of component B to component A. Table 1 shows the structures of substances corresponding to the symbols in Table 2. In Example 1, 30 mg of 1-triacontanol (manufactured by Tokyo Chemical Industry Co., Ltd., product name: 1-Triacontanol), which is A-3 in Table 1, was used as component A and was charged into a metal container as a surface-forming material (Production Example 1).

[0071] (Preparation of a layer containing silicon oxide) SiO ２ (Canon Optron Inc., product name: SiO2-E-1-2) was used as the first deposition material, and SiO was deposited on a 3 mm thick borosilicate glass substrate 11. ２ A first layer 12 containing silicon oxide and having a thickness of 10 nm was formed by vapor deposition using a vacuum vapor deposition apparatus (dome diameter Φ 900 mm, deposition distance 890 mm). The thickness of the first layer 12 containing silicon oxide was measured using a spectroscopic ellipsometry (JA WOOLLAM - ESM300) and was found to be 10 nm.

[0072] (Preparation of Polymer Brush) Using the surface-forming material according to Production Example 1 as the second deposition material, a polymer brush 13 was formed on a first layer 12 containing silicon oxide by deposition using a vacuum deposition apparatus (dome diameter Φ 900 mm, deposition distance 890 mm), thereby obtaining an optical element. The thickness of the polymer brush 13 was measured using a spectroscopic ellipsometer (JA WOOLLAM - ESM300) and found to be 3 nm.

[0073] (Evaluation of Scratch Resistance) The scratch resistance of the surface of the prepared optical member was evaluated according to the following method. First, the water contact angle of the surface of the prepared optical member was measured according to the method described below. ２ A friction test was conducted using steel wool (manufactured by Japan Steel Wool Co., Ltd., grade #0000, wire diameter: approximately 0.012 mm) cut into strips. The steel wool was brought into contact with the surface of the optical component and reciprocated. The applied load was adjusted to 9.8 kgf, and the friction was performed at a reciprocating speed of 60 reciprocations per minute and a travel distance of 15 mm. The friction was repeated 1,000 times. The water contact angle was then measured. The water contact angle is the angle between the solid surface and the tangent to the water droplet surface at the point where the solid and the water droplet come into contact. Here, the smaller the difference in water contact angle before and after friction, the fewer scratches there are on the surface. In other words, the smaller the difference in water contact angle before and after friction, the higher the scratch resistance. Furthermore, if the difference in water contact angle before and after friction is small and the evaluation of antifouling property, described below, is good, it can be determined that the material has excellent long-term antifouling properties.

[0074] The water contact angle was measured using a contact angle meter (CA-X150, manufactured by Kyowa Interface Science Co., Ltd.). The specific measurement procedure is as follows: 2.5 μL of ion-exchanged water was dropped onto the surface of the optical component. From an image obtained 5 seconds after the drop, the angle formed by the tangent to the water droplet surface at the point where the water droplet and the surface of the optical component came into contact with each other and the surface of the optical component was measured. The evaluation results of scratch resistance are shown in Table 3.

[0075] (Evaluation of Antifouling Properties) The surfaces of the prepared optical components were evaluated for their antifouling properties according to the following method. The degree of repulsion of highlighter ink and ease of wiping were used as evaluation indices for antifouling properties, and evaluation was performed based on the following criteria. The results are shown in Table 3. (Evaluation Criteria) A: After the pen tip was attached to the surface, the ink was repelled into balls within 5 seconds, and all of the ink could be wiped off with clint paper. B: After the pen tip was attached to the surface, the ink was not repelled even after 5 seconds, and all of the ink could be wiped off by rubbing with clint paper. C: After the pen tip was attached to the surface, the ink was not repelled even after 5 seconds, and it could not be wiped off by rubbing with clint paper.

[0076] [Examples 2 to 21] Surface-forming materials were prepared as in Example 1, as Production Examples 2 to 21, except that the compounds shown in Table 1 as Component A and Component B were used in the combinations and mass ratios of Component B to Component A shown in Table 2. Optical members were obtained using the obtained Production Examples 2 to 21. In addition, evaluations of scratch resistance and antifouling properties were carried out in the same manner as in Example 1. The results are shown in Table 3. The P content of the obtained solid matter or laminate was Ｂ / P Ａ was measured using a micro-Raman spectrometer, and found to be consistent with the mass ratio of component B to component A in the surface-forming material.

[0077] [Example 22] SiO as the first deposition material ２ (Canon Optron Inc., product name: SiO2-E-1-2) and Al ２ O ３ An optical member was obtained in the same manner as in Example 1, except that Al2O3-A-1-2 (manufactured by Canon Optron Inc.) was used. ２ O ３ The mass ratio of SiO ２ The weight ratio was adjusted to 0.01 relative to the mass of the sample. Furthermore, scratch resistance and stain resistance were evaluated in the same manner as in Example 1. The results are shown in Table 3.

[0078] Comparative Examples 1 to 3 Surface-forming materials were prepared in the same manner as in Example 1, except that the compounds shown in Table 1 as Component A and Component B were used in the combinations and mass ratios of Component B to Component A shown in Table 2, and these were designated as Comparative Production Examples 1 to 3. Optical members were obtained using the obtained Comparative Production Examples 1 to 3. Furthermore, evaluations of scratch resistance and antifouling properties were carried out in the same manner as in Example 1. The results are shown in Table 3.

[0079] Comparative Example 4: To a mixed solution of 0.01 M aqueous HCl (1 part by volume), tetraethoxysilane (2.8 parts by volume), and ethanol (8 parts by volume), chloromethylphenylethyltrimethoxysilane (0.564 parts by volume) was added and stirred at room temperature for 24 hours to prepare a precursor solution. This precursor solution was dropped onto a silicon wafer, spin-coated (2000 rpm / 10 seconds), and then dried at room temperature for 24 hours to form a polymerization initiation layer on the silicon wafer surface. 2-(dimethylamino)ethyl methacrylate (5.5 parts by volume), copper(II) chloride (4 parts by volume), N,N,N',N'',N''-pentamethyldiethylenetriamine (7 parts by volume), sodium ascorbate (1 part by volume), and water (1 part by volume) were mixed to prepare a polymerization solution. The silicon wafer with the polymerization initiation layer formed thereon was immersed in this polymerization solution for 2 hours to form a polymer brush on the surface of the silicon wafer substrate, resulting in an optical component. Furthermore, scratch resistance and antifouling properties were evaluated in the same manner as in Example 1. As a result, the contact angle before rubbing was 65°, and the contact angle after 1000 rubbings was 7°. The evaluation result of the antifouling property was C.

[0080] 11: Substrate 12: First layer containing silicon oxide (layer containing silicon oxide) 13: Polymer brush

Claims

1. A solid having a layer containing silicon oxide and polymer brushes on the layer containing silicon oxide, the polymer brushes constitute a surface of the solid body; the polymer brush has a moiety having an alkyl group having 14 to 65 carbon atoms; the moiety having the alkyl group is bonded to the silicon oxide via an oxygen atom, A solid material, characterized in that the polymer brush further has a portion having a dimethylsilicone chain having a silicon number of 3 or more and 110 or less, and the portion having the dimethylsilicone chain is bonded to the silicon oxide via an oxygen atom.

2. The moiety having the alkyl group further comprises an oxyethylene group -(CH ２ ) ２ The solid according to claim 1, having -O-.

3. The solid material according to claim 1 or 2, wherein the moiety having an alkyl group has a linear aliphatic structure.

4. The moiety having the alkyl group is an oxyethylene group -(CH ２ ) ２ The solid material according to any one of claims 1 to 3, wherein the alkyl group is a straight chain alkyl group having -O-.

5. (delete)

6. 2. The solid material according to claim 1, wherein the molecular weight of the portion having a dimethyl silicone chain is 200 or more and 8,000 or less.

7. An optical member comprising the solid material according to any one of claims 1 to 4 and 6.

8. A pair of spectacles comprising the optical member according to claim 7.

9. A touch panel comprising the optical member according to claim 7.

10. A smartphone comprising the optical member according to claim 7.

11. A tablet terminal comprising the optical member according to claim 7.

12. A method for producing the solid material according to any one of claims 1 to 4 and 6, comprising the steps of: a first deposition step of vacuum-depositing a first deposition material containing silicon oxide to form a layer containing the silicon oxide; and a second vapor deposition step of vacuum-depositing a second vapor deposition material including a first compound having a moiety having an alkyl group having 14 to 65 carbon atoms and a hydroxyl group to form the polymer brush, The second vapor deposition material further includes a second compound having a moiety having a dimethylsilicone chain and a reactive functional group.

13. The method for producing a solid material according to claim 12, wherein the first compound is a straight chain aliphatic alcohol.

14. The method for producing a solid material according to claim 12 or 13, wherein the first compound is a linear alcohol ethoxylate.

15. (delete)

16. The method for producing a solid material according to any one of claims 12 to 14, wherein in the second deposition material, a ratio of a content of the second compound to a content of the first compound is 0.1 or more and 1.0 or less.

17. A surface formation method using a vacuum deposition method, comprising the steps of: A first deposition step of vacuum-depositing a first deposition material containing silicon oxide to form a layer containing silicon oxide; and a second vapor deposition step of vacuum-depositing a second vapor deposition material including a first compound having a moiety having an alkyl group having 14 to 65 carbon atoms and a hydroxyl group, The second deposition material further includes a second compound having a moiety having a dimethylsilicone chain and a reactive functional group.

18. The method for forming a surface according to claim 17, wherein the first compound is a straight chain aliphatic alcohol.

19. The method for forming a surface according to claim 17 or 18, wherein the first compound is a linear alcohol ethoxylate.

20. (delete)

21. The surface formation method according to any one of claims 17 to 19, wherein in the second deposition material, a ratio of the content of the second compound to the content of the first compound is 0.1 or more and 1.0 or less.

22. A solid object having a surface formed by the surface forming method according to any one of claims 17 to 19 and 21.

23. An optical member comprising the solid material according to claim 22.

24. A pair of spectacles comprising the optical member according to claim 23.

25. A touch panel comprising the optical member according to claim 23.

26. A smartphone comprising the optical member according to claim 23.

27. A tablet terminal comprising the optical member according to claim 23.