Base material treatment method

Abstract

The purpose of the present disclosure is to provide a novel surface treatment method for a base material comprising an antireflection film.　This treatment method for a base material comprising an antireflection film includes: carrying out a treatment for smoothing at least a partial region of a surface of the antireflection film; forming a layer including SiO2 on a surface of the antireflection film after the treatment for smoothing at least a partial region of the surface of the antireflection film; and forming a surface treated layer by applying a surface treatment agent to at least a partial region of the surface of the layer including the SiO2.

Description

Substrate treatment method

[0001] The present disclosure relates to a method for treating a substrate.

[0002] Various methods have been proposed for treating a substrate provided with an anti-reflection coating.

[0003] Patent Document 1 describes a method of applying a functional layer to a glass substrate and chemically strengthening the glass substrate by ion exchange, and describes a method of treating the surface of the functional layer with oxygen plasma as one method of activating the surface of the functional layer.

[0004] Patent Documents 2 and 3 describe that the surface of an anti-reflection film is subjected to a plasma treatment and then treated with a fluorine-containing silane compound.

[0005] Patent Publication No. 2017-528411 China Publication No. 112267093 International Publication No. 3033 / 014566

[0006] The present disclosure aims to provide a new method for treating the surface of a substrate provided with an anti-reflection coating.

[0007] The present disclosure provides the following aspects: [1] A method for treating a substrate provided with an anti-reflection film, comprising: performing a treatment to smooth at least a partial region of a surface of the anti-reflection film; ２ forming a layer containing the SiO ２ [2] A treatment method comprising: applying a surface treatment agent to at least a partial region of the surface of a layer containing the SiO ２ The arithmetic mean roughness Ra of the surface of the layer containing １ is the arithmetic mean roughness Ra of the surface of the anti-reflection film ０ [3] The treatment method according to [1] or [2], wherein the treatment for smoothing at least a partial region of the surface of the anti-reflection film is an ion cleaning treatment. [4] The treatment for smoothing at least a partial region of the surface of the anti-reflection film and the treatment for smoothing at least a partial region of the surface of the anti-reflection film are performed by ion cleaning. ２ The formation of the layer containing SiO ２ The amount of OH groups on the surface of the layer containing１ is the amount of OH groups C on the surface of the anti-reflection film before the treatment for smoothing at least a part of the surface of the anti-reflection film. ０ [5] The processing method according to any one of [1] to [3], wherein the treatment for smoothing at least a partial region of the surface of the antireflective film is performed by plasma irradiation, and the voltage in the plasma irradiation is 140 V or more. [6] The processing method according to any one of [1] to [5], wherein the treatment for smoothing at least a partial region of the surface of the antireflective film is performed by plasma irradiation, and the gas flow rate in the plasma irradiation is 40 sccm or more. [7] The processing method according to any one of [1] to [6], wherein the treatment for smoothing at least a partial region of the surface of the antireflective film is performed by plasma irradiation, and the current in the plasma irradiation is 0.3 A or more. [8] The processing method according to any one of [1] to [7], wherein the treatment for smoothing at least a partial region of the surface of the antireflective film is performed by plasma irradiation, and the plasma irradiation time in the plasma irradiation is 100 to 700 seconds. [9] The processing method according to any one of [1] to [7], wherein the treatment for smoothing at least a partial region of the surface of the antireflective film is performed by plasma irradiation, and the plasma irradiation time in the plasma irradiation is 100 to 700 seconds. ２ The method for treating according to any one of [1] to [8], wherein the layer containing the compound is formed by vapor deposition.

[10] The method for treating according to any one of [1] to [9], wherein the surface treatment agent contains a fluorine-containing silane compound.

[11] The fluorine-containing silane compound is represented by the following formula (1) or (2): [In the formula: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - or a fluoroalkyl group; R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ - or a fluoroalkylene group; Rf １ each occurrence independently represents a C optionally substituted by one or more fluorine atoms; １－１６ Rf is an alkyl group; ２is a C optionally substituted by one or more fluorine atoms; １－６ is an alkylene group; R Ｆ is, independently in each occurrence, a divalent fluoropolyether group; p is 0 or 1; q is, independently in each occurrence, 0 or 1; R Ｓｉ is independently in each occurrence a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded; Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ are each independently a single bond or a divalent to decavalent organic group; α is an integer of 1 to 9; β is an integer of 1 to 9; and γ is each independently an integer of 1 to 9.

[12] The treatment for smoothing at least a partial region of the surface of the antireflective coating is performed by plasma irradiation, wherein a voltage in the plasma irradiation is 100 V or more and 180 V or less, a gas flow rate in the plasma irradiation is 40 sccm or more and 60 sccm or less, and a plasma irradiation time in the plasma irradiation is 100 seconds or more and 700 seconds or less, and ＳｉＯ２ The layer containing the surface treatment agent is formed by vapor deposition, and the surface treatment agent is represented by the following formula (1'): Ｆ１ -X Ａ -R Ｓｉ (1') [wherein: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - or a fluoroalkyl group; Rf １ each occurrence independently represents a C optionally substituted by one or more fluorine atoms; １－１６ is an alkyl group; R Ｆ is independently in each occurrence a divalent fluoropolyether group; q is independently in each occurrence 0 or 1; R Ｓｉis independently in each occurrence a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded; Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ are each independently a single bond or a divalent to decavalent organic group. Ｓｉ is represented by the following formula (S3): -SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ (S3) [wherein: R ａ１ is independently at each occurrence -Z １ -SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ and Z １ is independently at each occurrence -(CH ２ ) ｚ１ -O-(CH ２ ) ｚ２ -; z1 is an integer from 0 to 6; z2 is an integer from 0 to 6; R ２１ is independently at each occurrence -Z １’ -SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ and Z １’ is independently in each occurrence an oxygen atom or a divalent organic group; １’ The structure written as ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) bonded to R ２１’ is independently at each occurrence -Z １” -SiR ２２” ｑ１” R ２３” ｒ１” and Z１” is independently in each occurrence an oxygen atom or a divalent organic group; R ２２” is independently in each occurrence a hydroxyl group or a hydrolyzable group; R ２３” are each independently in each occurrence a hydrogen atom or a monovalent organic group; q1" are each independently in each occurrence an integer from 0 to 3, r1" are each independently in each occurrence an integer from 0 to 3, and the sum of q1" and r1" is (SiR ２２” ｑ１” R ２３” ｒ１” ) units is 3; ２２’ is independently in each occurrence a hydroxyl group or a hydrolyzable group; R ２３’ are each independently in each occurrence a hydrogen atom or a monovalent organic group; p1' is each independently in each occurrence an integer of 0 to 3, q1' is each independently in each occurrence an integer of 0 to 3, and r1' is each independently in each occurrence an integer of 0 to 3, and the sum of p', q1' and r1' is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units is 3; ２２ is independently in each occurrence a hydroxyl group or a hydrolyzable group; R ２３ are each independently in each occurrence a hydrogen atom or a monovalent organic group, p1 is each independently in each occurrence an integer of 0 to 3, q1 is each independently in each occurrence an integer of 0 to 3, and r1 is each independently in each occurrence an integer of 0 to 3, and the sum of p1, q1, and r1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ ) units is 3; ｂ１ is independently in each occurrence a hydroxyl group or a hydrolyzable group; R ｃ１are each independently in each occurrence a hydrogen atom or a monovalent organic group, k1 is each independently in each occurrence an integer of 0 to 3, l1 is each independently in each occurrence an integer of 0 to 3, and m1 is each independently in each occurrence an integer of 0 to 3, and the sum of k1, l1, and m1 is (SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ ) unit, 3.].

[0008] The present disclosure can provide a new method for treating the surface of a substrate having an anti-reflection coating.

[0009] The treatment method of the present disclosure is a method for treating a substrate provided with an anti-reflection film, comprising the steps of: performing a treatment to smooth at least a partial region of the surface of the anti-reflection film; and forming a SiO 2 layer on the surface of the anti-reflection film after the treatment to smooth at least a partial region of the surface of the anti-reflection film. ２ forming a layer containing the SiO ２ and applying a surface treatment agent to at least a partial region of the surface of the layer containing the compound to form a surface-treated layer, wherein the surface treatment agent contains a fluorine-containing silane compound.

[0010] According to the present disclosure, a new method for treating the surface of a substrate having an anti-reflection film can be provided.

[0011] Anti-reflection coatings are typically formed by stacking multiple layers with different refractive indices, and may have a rough surface and poor abrasion resistance. Furthermore, the layers constituting the anti-reflection coating do not necessarily have good reactivity with silane compounds, and the surface treatment layer formed on such an anti-reflection coating may have poor durability. In a preferred embodiment, the treatment method of the present disclosure maintains the transparency of a substrate provided with an anti-reflection coating, and improves the durability, particularly the abrasion resistance, of the surface treatment layer. While the present disclosure should not be interpreted as being limited to a specific theory, the reason why the treatment method of the present disclosure exhibits such effects is believed to be as follows.

[0012] That is, in the processing method of the present disclosure, after the surface of the anti-reflection film is smoothed, SiO ２ The inventors have found through their investigations that this treatment can flatten the surface of the anti-reflection film and increase the amount of OH groups on the surface of the anti-reflection film. ２ It is believed that if a surface treatment agent is further applied to the surface of the layer containing the compound (I), a uniform and dense surface treatment layer can be formed, and the durability, particularly the abrasion resistance, will be excellent.

[0013] The treatment method of the present disclosure is applied to a substrate provided with an anti-reflection film, which can suppress reflection of light incident on the surface of the anti-reflection film.

[0014] Typically, the antireflection film may include two or more layers having different refractive indices. By including two or more layers having different refractive indices, incident light may be reflected at the interface between the two layers having different refractive indices, and the reflected light at the different interfaces may cancel each other out, thereby suppressing reflection of incident light as a whole antireflection film.

[0015] The antireflective coating may preferably contain one selected from the group consisting of a metal, an alloy, a metal oxide, a metal nitride, a metal sulfide, and a metal fluoride, and more preferably contain one selected from the group consisting of a metal, a metal oxide, and a metal nitride.

[0016] Examples of the metals include Al, Au, Ag, Cu, Fe, Zn, Cr, and Ni, and preferably Al, Au, Ag, and Cu. Examples of the alloys include alloys containing the above metals, specifically SUS and brass. Examples of the metal oxides include SiO ２ , TiO ２ , Al ２ O ３ , ZrO ２ , Nb ２ O ５ , CeO ２ , HfO ２ , Ta ２ O ５ and ZrTiO ３ Examples of the metal nitride include Si ３ N４ , AlN, SiN, and SiAlN. The metal sulfides include ZnS. The metal fluorides include MgF. ２ and CeF ３ Examples include:

[0017] The anti-reflection film may preferably include a high refractive index layer having a relatively high refractive index and a low refractive index layer having a relatively low refractive index.

[0018] The refractive index of the high refractive index layer may be preferably 1.7 or more, more preferably 1.7 or more and 2.8 or less, and even more preferably 1.8 or more and 2.6 or less, based on light having a wavelength of 550 nm.

[0019] The refractive index of the low refractive index layer may be preferably less than 1.7, more preferably 1.2 or more and 1.65 or less, and even more preferably 1.2 or more and 1.6 or less, based on light having a wavelength of 550 nm.

[0020] The difference in refractive index between the high refractive index layer and the low refractive index layer may be preferably 0.5 or more and 1.5 or less, and more preferably 0.7 or more and 1.2 or less.

[0021] In a preferred embodiment, the antireflection film is a laminate in which the high refractive index layers and the low refractive index layers are alternately laminated. The total number of high refractive index layers and low refractive index layers in the antireflection film is preferably 3 to 10, more preferably 5 to 8. The outermost layer of the antireflection film may be either a high refractive index layer or a low refractive index layer, and is preferably a low refractive index layer.

[0022] The arithmetic mean roughness Ra of the anti-reflection film surface ０ is preferably 1 nm or more and 50 nm or less, more preferably 2 nm or more and 30 nm or less, and even more preferably 3 nm or more and 10 nm or less. In the present disclosure, the arithmetic mean roughness can be measured in accordance with JIS B 0601. In one embodiment, the arithmetic mean roughness Ra ０ may be the arithmetic mean roughness of the surface of the anti-reflective coating before a process for smoothing at least a partial area of ​​the surface of the anti-reflective coating is performed.

[0023] The substrate may typically be a transparent substrate, and may be either a resin substrate or a glass substrate, preferably a glass substrate.

[0024] Examples of the glass constituting the glass substrate include sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, and quartz glass, and these glasses may be chemically strengthened, but are not limited to these. The glass constituting the glass substrate is preferably chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, or chemically strengthened borosilicate glass. The thickness of the glass substrate can typically be 0.1 mm or more and 1 mm or less.

[0025] Examples of resins constituting the resin substrate include, but are not limited to, polyester resin, acrylic resin, polyolefin resin, polycarbonate resin, polyethersulfone resin, polyarylate resin, polyamide resin, polyimide resin, cellulose resin, and polystyrene resin. The thickness of the resin substrate can typically be 0.1 mm or more and 1 mm or less.

[0026] In the treatment method of the present disclosure, a substrate provided with an anti-reflection coating is subjected to a treatment (hereinafter also referred to as a "surface smoothing treatment") to smooth at least a portion of the surface of the anti-reflection coating. Such a surface smoothing treatment may be any treatment that improves the surface smoothness before and after the treatment. Examples of such a surface smoothing treatment include ion cleaning treatment, flame treatment, and UV ozone treatment, with ion cleaning treatment being preferred. The ion cleaning treatment can remove excess ions that may be present on the anti-reflection coating surface.

[0027] The ion cleaning treatment includes corona treatment, plasma treatment, flame treatment and glow treatment, with plasma treatment being preferred.

[0028] The plasma treatment can be typically carried out by irradiating with plasma.

[0029] Examples of the plasma include vacuum plasma such as microwave plasma and high-frequency plasma; and atmospheric pressure plasma, with atmospheric pressure plasma being preferred. Process gases used to generate the plasma include oxygen, nitrogen, fluorine, hydrogen, argon, and air, with oxygen and / or argon being preferred.

[0030] The voltage in the plasma irradiation may be preferably 100 V or more, more preferably 120 V or more and 240 V or less, even more preferably 140 V or more and 220 V or less, and even more preferably 150 V or more and 180 V or less. When the voltage in the plasma irradiation is within this range, the surface of the antireflection film can be made smoother.

[0031] The gas flow rate in the plasma irradiation is preferably 10 sccm or more, more preferably 20 sccm or more and 100 sccm or less, even more preferably 30 sccm or more and 80 sccm or less, and even more preferably 40 sccm or more and 60 sccm or less. By setting the gas flow rate in the plasma irradiation within this range, the surface of the anti-reflection coating can be made smoother.

[0032] The current in the plasma irradiation is preferably 0.3 A or more, more preferably 0.5 A to 10 A, even more preferably 1 A to 8 A, and still more preferably 3 A to 6 A. When the current in the plasma irradiation is within this range, the surface of the antireflection film can be made smoother.

[0033] The plasma irradiation time in the plasma irradiation may be preferably from 100 to 1,000 seconds, more preferably from 100 to 700 seconds. When the plasma irradiation time is within this range, the surface of the antireflection coating can be made smoother and the transparency of the substrate can be more easily maintained.

[0034] In one embodiment, when ion cleaning is performed by plasma irradiation using Ar as the process gas, the plasma irradiation time for the plasma irradiation may be preferably from 100 to 700 seconds. By setting the plasma irradiation time within this range, the surface of the antireflection coating can be made smoother and the transparency of the substrate can be more easily maintained.

[0035] In one embodiment, the process gas is O ２ When ion cleaning is performed by irradiating the substrate with plasma as a solution, the plasma irradiation time in the plasma irradiation may be preferably 100 seconds or more and 800 seconds or less, more preferably 180 seconds or more and 600 seconds or less. When the plasma irradiation time is within this range, the surface of the antireflection coating can be made smoother and the transparency of the substrate can be more easily maintained.

[0036] The plasma irradiation may be carried out at an irradiation distance of preferably 1 mm or more and 300 mm or less, more preferably 1.5 mm or more and 200 mm or less, and even more preferably 2 mm or more and 100 mm or less. The irradiation distance may be preferably 1 mm or more, more preferably 1.5 mm or more, even more preferably 2 mm or more, and preferably 300 mm or less, more preferably 200 mm or less, and even more preferably 100 mm or less. By irradiating the plasma at such an irradiation distance, the surface of the display panel can be made suitable for forming a surface treatment layer while maintaining the functionality of the electronic device. In the present disclosure, the irradiation distance may be the linear distance from the plasma emission position to the irradiation target.

[0037] The surface of the anti-reflection film after the surface smoothing treatment is coated with SiO ２ A layer containing SiO is formed. ２ By forming a layer containing the above, adhesion to the surface treatment agent can be improved.

[0038] The SiO ２ In the layer containing SiO ２ The content of may be preferably 80% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and even more preferably 95% by mass or more and 100% by mass or less.

[0039] The SiO ２ The layer containing SiO ２ In addition, other metal oxides may be contained. ２ O ３ , TiO ２ In addition, the above-mentioned SiO ２ The layer containing may contain at least one composite oxide made from elements of Groups 4, 5 and 13 of the periodic table.

[0040] The SiO ２ The layer containing SiO may be formed by a liquid phase method or a gas phase method, but is not limited to these. Examples of the liquid phase method include, but are not limited to, a sol-gel method, a liquid phase deposition method, a co-precipitation method, etc. Examples of the gas phase method include, but are not limited to, a sputtering method, a vapor deposition method, etc. In one embodiment, the layer containing SiO ２ The layer containing the compound (I) is preferably formed by a vapor phase method, more preferably by a vapor deposition method.

[0041] The vapor deposition method may be a physical vapor deposition method or a chemical vapor deposition method, preferably a physical vapor deposition method. Examples of the physical vapor deposition method include a sputtering method, an ion-assisted method, and a vacuum deposition method, preferably an ion-assisted method.

[0042] In the physical vapor deposition method, a film (layer) can be obtained by physically evaporating a vapor deposition source and depositing the vapor deposition source on a vapor deposition target. The evaporation of the vapor deposition source can be typically performed by irradiating the vapor deposition source with an electron beam (EB irradiation).

[0043] The acceleration voltage during the electron beam irradiation may be preferably 700 V or more and 1,500 V or less, more preferably 800 V or more and 1,300 V or less, and even more preferably 900 V or more and 1,200 V or less. The acceleration current during the electron beam irradiation may be preferably 200 mA or more and 800 mA or less, more preferably 300 mA or more and 700 mA or less, and even more preferably 400 mA or more and 600 mA or less.

[0044] The evaporation source may be SiO ２ Such metal oxides include metal oxides containing SiO２ Other than that, Al ２ O ３ , TiO ２ The SiO content in the vapor deposition source may be preferably 80% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and particularly preferably 95% by mass or more and 100% by mass or less.

[0045] During the deposition, the deposition source may be heated. The temperature of the deposition source may be preferably 600° C. or higher and 1,400° C. or lower, more preferably 700° C. or higher and 1,300° C. or lower, and even more preferably 800° C. or higher and 1,200° C. or lower.

[0046] The deposition may be carried out under vacuum. The pressure during deposition is preferably 1.0×10 －４ Pa or more 1.0×10 －１ Pa or less, more preferably 1.0 × 10 －３ Pa or more 5.0×10 －２ Pa or less, more preferably 1.0 × 10 －２ Pa or more 3.0×10 －２ Pa or less.

[0047] In one embodiment, the deposition may be carried out in the presence of an ion-assist gas. The presence of an ion-assist gas can improve the adhesion and film-forming properties of the resulting film to an anti-reflection film (i.e., an anti-reflection film after a surface smoothing treatment). The ion-assist gas may be O ２ Gas is one example.

[0048] The flow rate of the ion assist gas may be preferably 20 sccm or more and 80 sccm or less, more preferably 30 sccm or more and 70 sccm or less, and even more preferably 40 sccm or more and 60 sccm or less.

[0049] The above surface smoothing treatment and SiO ２ The formation of the layer containing SiO ２ The arithmetic mean roughness Ra of the surface of the layer containing １ However, the thickness can be preferably 0.1 nm or more and 5 nm or less, more preferably 0.5 nm or more and 4 nm or less, and even more preferably 1 nm or more and 3 nm or less.

[0050] The above surface smoothing treatment and SiO ２ The formation of the layer containing SiO ２ The arithmetic mean roughness Ra of the surface of the layer containing １ is the arithmetic mean roughness Ra of the anti-reflection film before the surface smoothing treatment ０ It is preferably 50% or less, more preferably 20% or less, and even more preferably 10% or less, and can be carried out so as to be, for example, 0.2% or more.

[0051] The above surface smoothing treatment and SiO ２ The formation of the layer containing SiO ２ The amount of OH groups on the surface of the layer containing １ is the amount of OH groups C on the surface of the anti-reflection film before the surface smoothing treatment. ０ The amount of OH groups can be measured by TOF-SIMS.

[0052] The SiO ２ The thickness of the layer containing SiO may be preferably 0.1 nm or more and 10 nm or less, more preferably 1 nm or more and 6 nm or less. ２ When the thickness of the layer containing the compound falls within this range, the amount of OH groups can be secured, the surface smoothness can be improved, and further, the transparency of the substrate can be more easily maintained.

[0053] In one embodiment, when ion cleaning is performed by plasma irradiation using Ar as the process gas, SiO ２ The thickness of the layer containing SiO may be preferably 0.1 nm or more and 10 nm or less, more preferably 1 nm or more and 6 nm or less. ２ When the thickness of the layer containing the compound falls within this range, the amount of OH groups can be secured, the surface smoothness can be improved, and further, the transparency of the substrate can be more easily maintained.

[0054] In another embodiment, the process gas is O ２ When ion cleaning is performed by irradiating plasma as SiO ２The thickness of the layer containing SiO may be preferably 0.1 nm or more and 6 nm or less, more preferably 1 nm or more and 3 nm or less. ２ When the thickness of the layer containing the compound falls within this range, the amount of OH groups can be secured, the surface smoothness can be improved, and further, the transparency of the substrate can be more easily maintained.

[0055] The SiO ２ A surface treatment layer is formed by applying a surface treatment agent to at least a partial region of the surface of the layer containing the compound (I), which can impart one or more properties selected from water repellency, oil repellency, slipperiness, fingerprint resistance, antifouling properties, antireflection properties, antifogging properties, etc.

[0056] The surface treatment agent can be applied to the surface of the display panel so as to coat the surface. The coating method is not particularly limited. For example, a wet coating method or a dry coating method can be used, and the wet coating method is preferably used.

[0057] Examples of wet coating methods include dip coating, spin coating, brush coating, flow coating, spray coating, roll coating, gravure coating and similar methods, with spray coating being preferred.

[0058] The surface treatment agent is preferably formed into a layer so that the surface treatment agent of the present disclosure is present together with a catalyst for hydrolysis and dehydration condensation in the layer. Conveniently, in the case of a wet coating method, the surface treatment agent of the present disclosure may be diluted with a solvent, and then the catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately before application to the surface of a substrate.

[0059] Any suitable acid or base can be used as the catalyst. Examples of acid catalysts that can be used include acetic acid, formic acid, and trifluoroacetic acid. Examples of base catalysts that can be used include ammonia and organic amines.

[0060] After application of the surface treatment agent, the surface may be dried as needed. Such drying promotes hydrolysis and dehydration condensation of the fluorine-containing silane compound, which will be described later, and can remove the solvent and the like.

[0061] The precursor layer may be dried at a temperature of preferably 0°C or higher and 60°C or lower, more preferably 5°C or higher and 50°C or lower, and even more preferably 10°C or higher and 30°C or lower, for a time of preferably 1 hour or higher and 48 hours or lower, more preferably 3 hours or higher and 24 hours or lower, and even more preferably 6 hours or higher and 12 hours or lower.

[0062] The thickness of the surface treatment layer is not particularly limited, and is preferably in the range of 1 to 50 nm, 1 to 30 nm, and more preferably 1 to 15 nm, from the viewpoints of optical performance, abrasion resistance, and antifouling properties.

[0063] The surface treatment agent preferably contains a fluorine-containing silane compound.

[0064] The fluorine-containing silane compound is a compound containing at least a fluorine-containing group and a silane, and is preferably represented by the following formula (1) or (2): [In the formula: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - and R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ -; Rf １ each occurrence independently represents a C optionally substituted by one or more fluorine atoms; １－１６ Rf is an alkyl group; ２ is a C optionally substituted by one or more fluorine atoms; １－６ is an alkylene group; R Ｆ is, independently in each occurrence, a divalent fluoropolyether group; p is 0 or 1; q is, independently in each occurrence, 0 or 1; R Ｓｉ is independently in each occurrence a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded; Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａare each independently a single bond or a divalent to decavalent organic group; α is an integer of 1 to 9; β is an integer of 1 to 9; and γ is each independently an integer of 1 to 9.

[0065] In the above formula (1), R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - or a fluoroalkyl group. Ｆ１ is preferably Rf １ -R Ｆ -O ｑ -, and in another embodiment, R Ｆ１ is preferably a fluoroalkyl group. Ｆ１ is Rf １ -R Ｆ -O ｑ When the formula (1) is -, the compound represented by formula (1) contains a fluoropolyether group and corresponds to a fluoropolyether group-containing silane compound.

[0066] In the above formula (2), R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ - or a fluoroalkylene group. Ｆ２ is preferably Rf ２ ｐ -R Ｆ -O ｑ -, and in another embodiment, R Ｆ２ is preferably a fluoroalkylene group. Ｆ２ is Rf ２ ｐ -R Ｆ -O ｑ When the formula (2) is -, the compound represented by formula (2) contains a fluoropolyether group and corresponds to a fluoropolyether group-containing silane compound.

[0067] In the above formula, Rf １ each occurrence independently represents a C optionally substituted by one or more fluorine atoms;１－１６ It is an alkyl group.

[0068] The C optionally substituted with one or more fluorine atoms １－１６ "C" in the alkyl group １－１６ The "alkyl group" may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C １－６ Alkyl groups, especially C １－３ alkyl group, more preferably a straight-chain C １－６ Alkyl groups, especially C １－３ It is an alkyl group.

[0069] The above Rf １ is preferably a C substituted by one or more fluorine atoms １－１６ alkyl group, more preferably CF ２ H-C １－１５ A perfluoroalkylene group, more preferably C １－１６ It is a perfluoroalkyl group.

[0070] Above C １－１６ The perfluoroalkyl group may be a straight chain or a branched chain, and preferably is a straight chain or branched chain C １－６ Perfluoroalkyl groups, especially C １－３ perfluoroalkyl groups, more preferably linear C １－６ Perfluoroalkyl groups, especially C １－３ Perfluoroalkyl groups, specifically —CF ３ , -CF ２ CF ３ , or -CF ２ CF ２ CF ３ is.

[0071] In the above formula, Rf ２ is a C optionally substituted by one or more fluorine atoms; １－６ It is an alkylene group.

[0072] The C optionally substituted with one or more fluorine atoms １－６ "C" in the alkylene group １－６The "alkylene group" may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C １－３ alkylene groups, more preferably linear C １－３ It is an alkylene group.

[0073] The above Rf ２ is preferably a C substituted by one or more fluorine atoms １－６ is an alkylene group, more preferably C １－６ A perfluoroalkylene group, more preferably C １－３ It is a perfluoroalkylene group.

[0074] Above C １－６ The perfluoroalkylene group may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C １－３ A perfluoroalkylene group, more preferably a linear C １－３ Perfluoroalkylene groups, specifically —CF ２ -, -CF ２ CF ２ - or -CF ２ CF ２ CF ２ - is.

[0075] In the above formula, p is 0 or 1. In one embodiment, p is 0. In another embodiment, p is 1.

[0076] In the above formula, q is independently at each occurrence 0 or 1. In one embodiment, q is 0. In another embodiment, q is 1.

[0077] In the above formulas (1) and (2), R Ｆ is independently at each occurrence a divalent fluoropolyether group.

[0078] R Ｆ is preferably the following: ｈ１ R Ｆａ ２ｈ１ ) ｈ３ - (OC ｈ２ R Ｆａ ２ｈ２－２ ) ｈ４ - [In the formula: RＦａ are each independently a hydrogen atom, a fluorine atom, or a chlorine atom in each occurrence, h1 is an integer of 1 to 6, h2 is an integer of 4 to 8, h3 is an integer of 0 or greater, and h4 is an integer of 0 or greater, provided that the combination of h3 and h4 is 1 or greater, preferably 2 or greater, and more preferably 5 or greater, and the order of occurrence of the repeating units enclosed in parentheses with h3 and h4 is arbitrary in the formula.

[0079] In one embodiment, R Ｆ R can be linear or branched. Ｆ is preferably represented by the formula: -(OC ６ F １２ ) ａ - (OC ５ F １０ ) ｂ - (OC ４ F ８ ) ｃ - (OC ３ R Ｆａ ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ - [In the formula: R Ｆａ are each independently a hydrogen atom, a fluorine atom, or a chlorine atom in each occurrence, and a, b, c, d, e, and f are each independently an integer of 0 to 200, and the sum of a, b, c, d, e, and f is 1 or more. The order of occurrence of each repeating unit enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula. However, all R Ｆａ is a hydrogen atom or a chlorine atom, then at least one of a, b, c, e and f is 1 or greater.]

[0080] R Ｆａ is preferably a hydrogen atom or a fluorine atom, and more preferably a fluorine atom. Ｆａ is a hydrogen atom or a chlorine atom, at least one of a, b, c, e and f is 1 or more.

[0081] a, b, c, d, e and f may preferably each independently be an integer of 0 to 100.

[0082] The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. The sum of a, b, c, d, e, and f is preferably 200 or less, more preferably 100 or less, and even more preferably 60 or less, and may be, for example, 50 or less or 30 or less.

[0083] These repeating units may be linear or branched, and may contain a ring structure. For example, -(OC ６ F １２ )- is -(OCF ２ CF ２ CF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ CF ２ CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF ２ CF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF ２ CF ２ CF (CF ３ ))-, etc. ５ F １０ )- is -(OCF ２ CF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF２ CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF ２ CF (CF ３ ))-, etc. ４ F ８ )- is -(OCF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )) -, -(OC(CF ３ ) ２ CF ２ ) -, -(OCF ２ C (CF ３ ) ２ )-,-(OCF(CF ３ )CF(CF ３ ))-,-(OCF(C ２ F ５ )CF ２ )-and-(OCF ２ CF (C ２ F ５ ))-. ３ F ６ ) - (i.e., in the above formula, R Ｆａ is a fluorine atom) is -(OCF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ )-and-(OCF ２ CF (CF ３))-. ２ F ４ )- is -(OCF ２ CF ２ )-and-(OCF(CF ３ ))-.

[0084] In one embodiment, the repeating unit is linear. By making the repeating unit linear, the surface smoothness, abrasion resistance, etc. of the surface treatment layer can be improved.

[0085] In one embodiment, the repeating unit is branched. By making the repeating unit branched, the dynamic friction coefficient of the surface treatment layer can be increased.

[0086] In one embodiment, R Ｆ may contain a ring structure.

[0087] The ring structure may be a three-, four-, five-, or six-membered ring as shown below.

[0088] [In the formula, * indicates the bonding position.]

[0089] The ring structure may be preferably a four-membered ring, a five-membered ring, or a six-membered ring, more preferably a four-membered ring or a six-membered ring.

[0090] The repeating unit having a ring structure may preferably be the following unit.

[0091] [In the formula, * indicates the bonding position.]

[0092] In one embodiment, the repeating unit is linear. By making the repeating unit linear, the surface smoothness, abrasion resistance, etc. of the surface treatment layer can be improved.

[0093] In one embodiment, the repeating unit is branched. By making the repeating unit branched, the dynamic friction coefficient of the surface treatment layer can be increased.

[0094] In one embodiment, R Ｆis independently a group represented by any one of the following formulas (f1) to (f6) in each occurrence: —(OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ - (f1) [wherein d is an integer of 1 to 200, and e is 0 or 1]; - (OC ４ F ８ ) ｃ - (OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ - (f2) [wherein c and d each independently represent an integer of 0 or more and 30 or less, e and f each independently represent an integer of 1 or more and 200 or less, the sum of c, d, e and f is 2 or more, and the order of occurrence of each repeating unit enclosed in parentheses with the subscript c, d, e or f is arbitrary in the formula.]; - (R ６ -R ７ ) ｇ - (f3) [wherein, R ６ is OCF ２ or O.C. ２ F ４ and R ７ is O.C. ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ or a combination of two or three groups independently selected from these groups, and g is an integer of 2 to 100. ６ -R ７ ) ｇ -R ｒ - (R ７’ -R ６’ ) ｇ’ - (f4) [wherein, R ６ is OCF２ or O.C. ２ F ４ and R ７ is O.C. ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ or a combination of two or three groups independently selected from these groups; ６’ is OCF ２ or O.C. ２ F ４ and R ７’ is O.C. ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ or a combination of two or three groups independently selected from these groups, g is an integer from 2 to 100, g' is an integer from 2 to 100, R ｒ teeth,

[0095] (wherein * indicates the bond position). ]; -(OC ６ F １２ ) ａ - (OC ５ F １０ ) ｂ - (OC ４ F ８ ) ｃ - (OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ- (f5) [In the formula, e is an integer of 1 or more and 200 or less, a, b, c, d, and f are each independently an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.] - (OC ６ F １２ ) ａ - (OC ５ F １０ ) ｂ - (OC ４ F ８ ) ｃ - (OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ - (f6) (In the formula, f is an integer of 1 or more and 200 or less, a, b, c, d, and e each independently are an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.)

[0096] In the above formula (f1), d is preferably an integer of 5 to 200, more preferably 10 to 100, and even more preferably 15 to 50, for example, an integer of 25 to 35. ３ F ６ is preferably (OCF ２ CF ２ CF ２ ), (OCF (CF ３ )CF ２ ) or (OCF ２ CF (CF ３ )), more preferably (OCF ２ CF ２ CF ２ ) in the above formula (f1). ２ F ４ ) is preferably (OCF ２ CF ２ ) or (OCF(CF ３ )), more preferably (OCF ２ CF ２In one embodiment, e is 0. In another embodiment, e is 1.

[0097] In the formula (f2), e and f are each independently an integer of preferably 5 to 200, more preferably 10 to 200. The sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. In one aspect, the formula (f2) is preferably -(OCF ２ CF ２ CF ２ CF ２ ) ｃ -(OCF ２ CF ２ CF ２ ) ｄ -(OCF ２ CF ２ ) ｅ -(OCF ２ ) ｆ In another embodiment, formula (f2) is a group represented by -(OC ２ F ４ ) ｅ -(OCF ２ ) ｆ It may be a group represented by -.

[0098] In the above formula (f3), R ６ is preferably OC ２ F ４ In the above (f3), R ７ is preferably OC ２ F ４ , O.C. ３ F ６ and O.C. ４ F ８ or a combination of two or three groups independently selected from these groups, more preferably OC ３ F ６ and O.C. ４ F ８ is a group selected from ２ F ４ , O.C. ３ F ６ and O.C. ４ F ８The combination of two or three groups independently selected from the group consisting of, but not limited to, —OC ２ F ４ O.C. ３ F ６ -, -OC ２ F ４ O.C. ４ F ８ -, -OC ３ F ６ O.C. ２ F ４ -, -OC ３ F ６ O.C. ３ F ６ -, -OC ３ F ６ O.C. ４ F ８ -, -OC ４ F ８ O.C. ４ F ８ -, -OC ４ F ８ O.C. ３ F ６ -, -OC ４ F ８ O.C. ２ F ４ -, -OC ２ F ４ O.C. ２ F ４ O.C. ３ F ６ -, -OC ２ F ４ O.C. ２ F ４ O.C. ４ F ８ -, -OC ２ F ４ O.C. ３ F ６ O.C. ２ F ４ -, -OC ２ F ４ O.C. ３ F ６ O.C. ３ F ６ -, -OC ２ F ４ O.C. ４ F ８ O.C. ２ F ４ -, -OC ３ F６ O.C. ２ F ４ O.C. ２ F ４ -, -OC ３ F ６ O.C. ２ F ４ O.C. ３ F ６ -, -OC ３ F ６ O.C. ３ F ６ O.C. ２ F ４ -, and -OC ４ F ８ O.C. ２ F ４ O.C. ２ F ４ In the formula (f3), g is preferably an integer of 3 or more, more preferably an integer of 5 or more. The g is preferably an integer of 50 or less. In the formula (f3), OC ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ may be either a straight chain or a branched chain, and is preferably a straight chain. In this embodiment, the above formula (f3) is preferably -(OC ２ F ４ -OC ３ F ６ ) ｇ -or- (OC ２ F ４ -OC ４ F ８ ) ｇ - is.

[0099] In the above formula (f4), R ６ , R ７ and g have the same meanings as those in formula (f3) above, and have the same embodiments. ６’ , R ７’ and g′ are R ６ , R ７ and g have the same meaning and similar aspects.ｒ is preferably

[0100] [wherein * indicates the bonding position], and more preferably

[0101] [wherein * indicates the bonding position.]

[0102] In the above formula (f5), e is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

[0103] In the above formula (f6), f is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

[0104] In one embodiment, the R Ｆ is a group represented by the above formula (f1).

[0105] In one embodiment, the R Ｆ is a group represented by the above formula (f2).

[0106] In one embodiment, the R Ｆ is a group represented by the above formula (f3).

[0107] In one embodiment, the R Ｆ is a group represented by the above formula (f4).

[0108] In one embodiment, the R Ｆ is a group represented by the above formula (f5).

[0109] In one embodiment, the R Ｆ is a group represented by the above formula (f6).

[0110] In one embodiment, the fluorine-containing silane compound contained in the surface treatment layer preferably contains a structure represented by the above formula (f1), (f2), (f3), (f5) or (f6), more preferably contains a structure represented by the above formula (f1) or (f2), and even more preferably contains a structure represented by the above formula (f1), from the viewpoint of the slipperiness of the surface treatment layer.

[0111] In another aspect, the fluorine-containing silane compound that can be contained in the surface treatment layer preferably contains a structure represented by the above formula (f1), (f2), (f3), (f4), (f5) or (f6), more preferably contains a structure represented by the above formula (f1) or (f2), and even more preferably contains a structure represented by the above formula (f2).

[0112] The above R Ｆ In the formula, the ratio of e to f (hereinafter referred to as the "e / f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, even more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85. By setting the e / f ratio to 10 or less, the slipperiness, abrasion resistance, and chemical resistance (e.g., resistance to artificial sweat) of the surface treatment layer obtained from this compound are further improved. The smaller the e / f ratio, the more improved the slipperiness and abrasion resistance of the surface treatment layer. On the other hand, by setting the e / f ratio to 0.1 or more, the stability of the compound can be further increased. The larger the e / f ratio, the more improved the stability of the compound.

[0113] R Ｆ１ The fluoroalkyl group represented by the formula (I) is a group in which a hydrogen atom contained in an alkyl group is replaced with a fluorine atom, and may be linear or branched. Ｆ１ The fluoroalkyl group represented by the formula (I) is preferably C １－５０ fluoroalkyl groups, more preferably C １－２０ fluoroalkyl groups, more preferably C １－１６ fluoroalkyl groups, such as C １－１０ Fluoroalkyl groups, and further C １－６ Fluoroalkyl groups, especially C １－３In one embodiment, R Ｆ１ is a perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms. In this embodiment, the perfluoroalkyl group is preferably a linear or branched C １－５０ Perfluoroalkyl groups, more preferably linear or branched C １－２０ Perfluoroalkyl groups, more preferably linear or branched C １－１６ perfluoroalkyl groups, for example, linear or branched C １－１０ Perfluoroalkyl groups, and also linear or branched C １－６ Perfluoroalkyl groups, especially linear or branched C １－３ It may be a perfluoroalkyl group.

[0114] R Ｆ２ The fluoroalkylene group represented by the formula (I) is a group in which a hydrogen atom contained in an alkylene group is replaced with a fluorine atom, and may be linear or branched. Ｆ２ The fluoroalkylene group represented by the formula (I) is preferably C １－５０ Fluoroalkylene groups, more preferably C １－２０ Fluoroalkylene group, more preferably C １－１６ Fluoroalkylene groups, such as C １－１０ Fluoroalkylene groups, further C １－６ Fluoroalkylene groups, especially C １－３ It may be a fluoroalkylene group. Ｆ２ is a perfluoroalkylene group in which all hydrogen atoms are substituted with fluorine atoms. In this embodiment, the perfluoroalkylene group is preferably a linear or branched C １－５０ perfluoroalkylene groups, more preferably linear or branched C １－２０ Perfluoroalkylene groups, more preferably linear or branched C １－１６ perfluoroalkylene groups, for example, linear or branched C １－１０Perfluoroalkylene groups, and also linear or branched C １－６ Perfluoroalkylene groups, especially linear or branched C １－３ It may also be a perfluoroalkylene group.

[0115] In the above fluorine-containing silane compound, R Ｆ１ and R Ｆ２ The number average molecular weight of the portion is not particularly limited, but is, for example, 500 to 30,000, preferably 1,500 to 30,000, and more preferably 2,000 to 10,000. Ｆ１ and R Ｆ２ The number average molecular weight of １９ The value is measured by F-NMR.

[0116] In another embodiment, R Ｆ１ and R Ｆ２ The number average molecular weight of the moiety may be from 500 to 30,000, preferably from 1,000 to 20,000, more preferably from 2,000 to 15,000, even more preferably from 2,000 to 10,000, for example from 3,000 to 6,000.

[0117] In another embodiment, R Ｆ１ and R Ｆ２ The number average molecular weight of the moiety can be from 4,000 to 30,000, preferably from 5,000 to 10,000, and more preferably from 6,000 to 10,000.

[0118] In the above formulas (1) and (2), R Ｓｉ is independently in each occurrence a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a silicon atom bonded to a monovalent organic group, and at least one R Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0119] Here, the term "hydrolyzable group" refers to a group that can undergo a hydrolysis reaction, that is, a group that can be eliminated from the main skeleton of a compound by a hydrolysis reaction. Examples of the hydrolyzable group include -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NRｊ ２ , -NHR ｊ , —NCO, halogen (wherein R ｊ is a substituted or unsubstituted C １－４ (representing an alkyl group) and the like.

[0120] In a preferred embodiment, R Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0121] In a preferred embodiment, R Ｓｉ is represented by the following formula (S1), (S2), (S3), or (S4): It is a group represented by the following formula:

[0122] In the above formula, R １１ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0123] R １１ is preferably, independently at each occurrence, a hydrolyzable group.

[0124] R １１ is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ (i.e., an alkoxy group). ｊ Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0125] In the above formula, R１２ is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0126] R １２ In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0127] In the above formula, n1 is (SiR １１ ｎ１ R １２ ３－ｎ１ ) units are each independently an integer of 0 to 3, provided that R Ｓｉ is a group represented by formula (S1) or (S2), the terminal R Ｓｉ In the moiety (hereinafter also simply referred to as the "terminal moiety" of formula (1) and formula (2)), n1 is 1 to 3 (SiR １１ ｎ１ R １２ ３－ｎ１ In other words, in such a terminal portion, all n1s do not simultaneously become 0. In other words, in the terminal portion of formula (1) and formula (2), there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0128] n1 is (SiR １１ ｎ１ R １２ ３－ｎ１ ) units are each independently an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3.

[0129] In the above formula, X １１ is independently in each occurrence a single bond or a divalent organic group. Such a divalent organic group is preferably -R ２８ -O ｘ -R ２９ - (wherein, R ２８ and R ２９ is, in each occurrence, independently a single bond or C １－２０ is an alkylene group, and x is 0 or 1. １－２０The alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. １－２０ The alkylene group is preferably C １－１０ Alkylene group, more preferably C １－６ Alkylene group, more preferably C １－３ It is an alkylene group.

[0130] In one embodiment, X １１ is independently at each occurrence -C １－６ Alkylene -O-C １－６ Alkylene- or -O-C １－６ It is alkylene-.

[0131] In a preferred embodiment, X １１ each occurrence independently represents a single bond or a straight-chain C １－６ an alkylene group, preferably a single bond or a straight-chain C １－３ Alkylene group, more preferably a single bond or a straight chain C １－２ It is preferably a linear C alkylene group. １－２ It is an alkylene group.

[0132] In the above formula, R １３ is independently in each occurrence a hydrogen atom or a monovalent organic group. Such a monovalent organic group is preferably C １－２０ It is an alkyl group. １－２０ The alkyl group may be straight-chain or branched, but is preferably straight-chain.

[0133] In a preferred embodiment, R １３ each occurrence independently represents a hydrogen atom or a straight-chain C １－６ is an alkyl group, preferably a hydrogen atom or a straight-chain C １－３ It is an alkyl group, preferably a hydrogen atom or a methyl group.

[0134] In the above formula, t is independently in each occurrence an integer of 2 or greater.

[0135] In a preferred embodiment, t is independently in each occurrence an integer from 2 to 10, preferably an integer from 2 to 6.

[0136] In the above formula, R １４ is independently in each occurrence a hydrogen atom, a halogen atom or -X １１ -SiR １１ ｎ１ R １２ ３－ｎ１ Such a halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom, more preferably a fluorine atom. In a preferred embodiment, R １４ is a hydrogen atom.

[0137] In the above formula, R １５ is independently in each occurrence a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.

[0138] In one embodiment, R １５ is independently in each occurrence an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.

[0139] In a preferred embodiment, R １５ is a single bond.

[0140] In one embodiment, formula (S1) is the following formula (S1-a): [In the formula, R １１ , R １２ , R １３ , X １１ and n1 are as defined in formula (S1) above; t1 and t2, each occurring independently, are an integer of 1 or more, preferably an integer of 1 to 10, more preferably an integer of 2 to 10, for example, an integer of 1 to 5 or an integer of 2 to 5; the order of occurrence of the repeating units enclosed in parentheses with t1 and t2 is arbitrary in the formula.]

[0141] In a preferred embodiment, formula (S1) is the following formula (S1-b): [In the formula, R １１ , R １２ , R １３ , X １１ , n1 and t are defined as in formula (S1) above.

[0142] In the above formula, R ａ１is independently at each occurrence -Z １ -SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ is.

[0143] Above Z １ In each occurrence, each independently represents an oxygen atom or a divalent organic group. １ The structure written as ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ )

[0144] In a preferred embodiment, Z １ is a divalent organic group.

[0145] In a preferred embodiment, Z １ Is Z １ Preferably, in formula (S3), (Si-Z １ —Si) does not contain a siloxane bond.

[0146] Above Z １ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ１ -O-(CH ２ ) ｚ２ - (wherein z1 is an integer of 0 to 6, for example, an integer of 1 to 6, and z2 is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH ２ ) ｚ３ -phenylene-(CH ２ ) ｚ４ - (wherein z3 is an integer of 0 to 6, for example, an integer of 1 to 6, and z4 is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６It may be substituted with one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0147] In a preferred embodiment, Z １ is C １－６ Alkylene group or -(CH ２ ) ｚ３ -phenylene-(CH ２ ) ｚ４ -, preferably -phenylene-(CH ２ ) ｚ４ - is. Z １ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0148] In another preferred embodiment, the Z １ is C １－３ In one embodiment, Z is an alkylene group. １ is -CH ２ CH ２ CH ２ In another embodiment, Z １ is -CH ２ CH ２ -It can be.

[0149] The above R ２１ is independently at each occurrence -Z １’ -SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ is.

[0150] Above Z １’ In each occurrence, each independently represents an oxygen atom or a divalent organic group. １’ The structure written as ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ )

[0151] In a preferred embodiment, Z １’ is a divalent organic group.

[0152] In a preferred embodiment, Z １’Is Z １’ Preferably, in formula (S3), (Si-Z １’ —Si) does not contain a siloxane bond.

[0153] Above Z １’ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ１’ -O-(CH ２ ) ｚ２’ - (wherein z1' is an integer of 0 to 6, for example, an integer of 1 to 6, and z2' is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH ２ ) ｚ３’ -phenylene-(CH ２ ) ｚ４’ - (wherein z3' is an integer of 0 to 6, for example, an integer of 1 to 6, and z4' is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0154] In a preferred embodiment, Z １’ is C １－６ Alkylene group or -(CH ２ ) ｚ３’ -phenylene-(CH ２ ) ｚ４’ -, preferably -phenylene-(CH ２ ) ｚ４’ - is. Z １’ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0155] In another preferred embodiment, the Z １’ is C １－３ In one embodiment, Z is an alkylene group. １’ is -CH ２ CH ２ CH ２In another embodiment, Z １’ is -CH ２ CH ２ -It can be.

[0156] The above R ２１’ is independently at each occurrence -Z １” -SiR ２２” ｑ１” R ２３” ｒ１” is.

[0157] Above Z １” In each occurrence, each independently represents an oxygen atom or a divalent organic group. １” The structure written as ２２” ｑ１” R ２３” ｒ１” )

[0158] In a preferred embodiment, Z １” is a divalent organic group.

[0159] In a preferred embodiment, Z １” Is Z １” Preferably, in formula (S3), (Si-Z １” —Si) does not contain a siloxane bond.

[0160] Above Z １” is preferably C １－６ Alkylene group, -(CH ２ ) ｚ１” -O-(CH ２ ) ｚ２” - (wherein z1" is an integer of 0 to 6, for example, an integer of 1 to 6, and z2" is an integer of 0 to 6, for example, an integer of 1 to 6), or - (CH ２ ) ｚ３” -phenylene-(CH ２ ) ｚ４” - (wherein z3" is an integer of 0 to 6, for example, an integer of 1 to 6, and z4" is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C１－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0161] In a preferred embodiment, Z １” is C １－６ Alkylene group or -(CH ２ ) ｚ３” -phenylene-(CH ２ ) ｚ４” -, preferably -phenylene-(CH ２ ) ｚ４” - is. Z １” is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0162] In another preferred embodiment, the Z １” is C １－３ In one embodiment, Z is an alkylene group. １” is -CH ２ CH ２ CH ２ In another embodiment, Z １” is -CH ２ CH ２ -It can be.

[0163] The above R ２２” is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0164] The above R ２２” is preferably, independently at each occurrence, a hydrolyzable group.

[0165] The above R ２２” is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ(i.e., an alkoxy group). ｊ Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0166] The above R ２３” is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0167] The above R ２３” In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0168] The above q1" is independently an integer of 0 to 3 in each occurrence, and the above r1" is independently an integer of 0 to 3 in each occurrence. The sum of q1" and r1" is (SiR ２２” ｑ１” R ２３” ｒ１” ) units, it is 3.

[0169] The above q1″ is (SiR ２２” ｑ１” R ２３” ｒ１” ) units are each independently an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3.

[0170] The above R ２２’ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0171] R ２２’ is preferably, independently at each occurrence, a hydrolyzable group.

[0172] R ２２’is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ (i.e., an alkoxy group). ｊ Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0173] The above R ２３’ is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0174] R ２３’ In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0175] The above p1' is independently an integer of 0 to 3 in each occurrence, q1' is independently an integer of 0 to 3 in each occurrence, and r1' is independently an integer of 0 to 3 in each occurrence. The sum of p', q1', and r1' is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units, it is 3.

[0176] In one embodiment, p1′ is 0.

[0177] In one embodiment, p1′ is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units may each independently be an integer from 1 to 3, an integer from 2 to 3, or 3. In a preferred embodiment, p1′ is 3.

[0178] In one embodiment, q1′ is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units are each independently an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0179] In one embodiment, p1′ is 0 and q1′ is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units are each independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3.

[0180] The above R ２２ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0181] R ２２ is preferably, independently at each occurrence, a hydrolyzable group.

[0182] R ２２ is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ (i.e., an alkoxy group). ｊExamples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0183] The above R ２３ is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0184] R ２３ In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0185] The above p1 is independently an integer of 0 to 3 in each occurrence, q1 is independently an integer of 0 to 3 in each occurrence, and r1 is independently an integer of 0 to 3 in each occurrence. The sum of p1, q1, and r1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ ) units, it is 3.

[0186] In one embodiment, p1 is 0.

[0187] In one embodiment, p1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ ) units may each independently be an integer from 1 to 3, an integer from 2 to 3, or 3. In a preferred embodiment, p1 is 3.

[0188] In one embodiment, q1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ｒ１ ) units are each independently an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0189] In one embodiment, p1 is 0 and q1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ ) units are each independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3.

[0190] In the above formula, R ｂ１ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0191] The above R ｂ１ is preferably, independently at each occurrence, a hydrolyzable group.

[0192] The above R ｂ１ is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ (i.e., an alkoxy group). ｊ Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0193] In the above formula, R ｃ１is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0194] The above R ｃ１ In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0195] The above k1 is independently an integer of 0 to 3 in each occurrence, l1 is independently an integer of 0 to 3 in each occurrence, and m1 is independently an integer of 0 to 3 in each occurrence. The sum of k1, l1, and m1 is (SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ ) units, it is 3.

[0196] In one embodiment, k1 is (SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ ) units are each independently an integer of 1 to 3, preferably 2 or 3, more preferably 3. In a preferred embodiment, k1 is 3.

[0197] In the above formulas (1) and (2), R Ｓｉ When is a group represented by formula (S3), preferably, at least two Si atoms having hydroxyl groups or hydrolyzable groups bonded thereto are present in the terminal portions of formula (1) and formula (2).

[0198] In a preferred embodiment, the group represented by formula (S3) is -Z １ -SiR ２２ ｑ１ R ２３ ｒ１ (wherein q1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1 is an integer of 0 to 2), -Z １’ -SiR ２２’ ｑ１’ R ２３’ｒ１’ (wherein q1' is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1' is an integer of 0 to 2), or -Z １” -SiR ２２” ｑ１” R ２３” ｒ１” (wherein q1″ is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1″ is an integer of 0 to 2). Z １ , Z １’ , Z １” , R ２２ , R ２３ , R ２２’ , R ２３’ , R ２２” , and R ２３” has the same meaning as above.

[0199] In a preferred embodiment, in formula (S3), R ２１’ When present, at least one, preferably all, R ２１’ In the formula, q1″ is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0200] In a preferred embodiment, in formula (S3), R ２１ When present, at least one, preferably all, R ２１ In the formula (I), p1' is 0, and q1' is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0201] In a preferred embodiment, in formula (S3), R ａ１ When present, at least one, preferably all, R ａ１ In the formula (I), p1 is 0, and q1 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0202] In a preferred embodiment, in formula (S3), k1 is 2 or 3, preferably 3; p1 is 0; and q1 is 2 or 3, preferably 3.

[0203] R ｄ１ is independently at each occurrence -Z ２ -CR ３１ｐ２ R ３２ ｑ２ R ３３ ｒ２ is.

[0204] Z ２ In each occurrence, Z is independently a single bond, an oxygen atom, or a divalent organic group. ２ The structure written as follows is (CR ３１ ｐ２ R ３２ ｑ２ R ３３ ｒ２ )

[0205] In a preferred embodiment, Z ２ is a divalent organic group.

[0206] Above Z ２ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ５ -O-(CH ２ ) ｚ６ - (wherein z5 is an integer of 0 to 6, for example, an integer of 1 to 6, and z6 is an integer of 0 to 6, for example, an integer of 1 to 6), or - (CH ２ ) ｚ７ -phenylene-(CH ２ ) ｚ８ - (wherein z7 is an integer of 0 to 6, for example, an integer of 1 to 6, and z8 is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0207] In a preferred embodiment, Z ２ is C １－６ Alkylene group or -(CH ２ ) ｚ７ -phenylene-(CH ２ ) ｚ８ -, preferably -phenylene-(CH２ ) ｚ８ - is. Z ２ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0208] In another preferred embodiment, the Z ２ is C １－３ In one embodiment, Z is an alkylene group. ２ is -CH ２ CH ２ CH ２ In another embodiment, Z ２ is -CH ２ CH ２ -It can be.

[0209] R ３１ is independently at each occurrence -Z ２’ -CR ３２’ ｑ２’ R ３３’ ｒ２’ is.

[0210] Z ２’ In each occurrence, Z is independently a single bond, an oxygen atom, or a divalent organic group. ２’ The structure written as follows is (CR ３２’ ｑ２’ R ３３’ ｒ２’ )

[0211] Above Z ２’ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ５’ -O-(CH ２ ) ｚ６’ - (wherein z5' is an integer of 0 to 6, for example, an integer of 1 to 6, and z6' is an integer of 0 to 6, for example, an integer of 1 to 6), or - (CH ２ ) ｚ７’ -phenylene-(CH ２ ) ｚ８’ - (wherein z7' is an integer of 0 to 6, for example, an integer of 1 to 6, and z8' is an integer of 0 to 6, for example, an integer of 1 to 6). １－６The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0212] In a preferred embodiment, Z ２’ is C １－６ Alkylene group or -(CH ２ ) ｚ７’ -phenylene-(CH ２ ) ｚ８’ -, preferably -phenylene-(CH ２ ) ｚ８’ - is. Z ２’ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0213] In another preferred embodiment, the Z ２’ is C １－３ In one embodiment, Z is an alkylene group. ２’ is -CH ２ CH ２ CH ２ In another embodiment, Z ２’ is -CH ２ CH ２ -It can be.

[0214] The above R ３２’ is independently at each occurrence -Z ３ -SiR ３４ ｎ２ R ３５ ３－ｎ２ is.

[0215] Above Z ３ In each occurrence, Z is independently a single bond, an oxygen atom, or a divalent organic group. ３ The structure written as ３４ ｎ２ R ３５ ３－ｎ２ )

[0216] In one embodiment, Z ３is an oxygen atom.

[0217] In one embodiment, Z ３ is a divalent organic group.

[0218] Above Z ３ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ５” -O-(CH ２ ) ｚ６” - (wherein z5" is an integer of 0 to 6, for example, an integer of 1 to 6, and z6" is an integer of 0 to 6, for example, an integer of 1 to 6), or - (CH ２ ) ｚ７” -phenylene-(CH ２ ) ｚ８” - (wherein z7" is an integer of 0 to 6, for example, an integer of 1 to 6, and z8" is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0219] In a preferred embodiment, Z ３ is C １－６ Alkylene group or -(CH ２ ) ｚ７” -phenylene-(CH ２ ) ｚ８” -, preferably -phenylene-(CH ２ ) ｚ８” - is. Z ３ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0220] In another preferred embodiment, the Z ３ is C １－３ In one embodiment, Z is an alkylene group. ３ is -CH ２ CH ２ CH ２ In another embodiment, Z ３is -CH ２ CH ２ -It can be.

[0221] The above R ３４ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0222] R ３４ is preferably, independently at each occurrence, a hydrolyzable group.

[0223] R ３４ is preferably, independently at each occurrence, -OR ｊ , -OCOR ｊ , —O—N═CR ｊ ２ , -NR ｊ ２ , -NHR ｊ , —NCO, or halogen (wherein R ｊ is a substituted or unsubstituted C １－４ alkyl group), and more preferably -OR ｊ (i.e., an alkoxy group). ｊ Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R ｊ is a methyl group, and in another embodiment, R ｊ is an ethyl group.

[0224] The above R ３５ is independently a hydrogen atom or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0225] The above R ３５ In the formula (I), the monovalent organic group is preferably C １－２０ alkyl group, more preferably C １－６ It is preferably an alkyl group, more preferably a methyl group.

[0226] In the above formula, n2 is (SiR ３４ ｎ２ R３５ ３－ｎ２ ) units are each independently an integer of 0 to 3, provided that R Ｓｉ is a group represented by formula (S4), n2 is 1 to 3 in the terminal portion of formula (1) and formula (2) (SiR ３４ ｎ２ R ３５ ３－ｎ２ ) unit is present. That is, in such a terminal portion, all n2s do not become 0 at the same time. In other words, in the terminal portion of formula (1) and formula (2), there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0227] n2 is (SiR ３４ ｎ２ R ３５ ３－ｎ２ ) units are each independently an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3.

[0228] The above R ３３’ is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0229] The above R ３３’ In the formula (I), the monovalent organic group is preferably C １－２０ Alkyl group or -(C ｓ H ２ｓ ) ｔ１ -(O-C ｓ H ２ｓ ) ｔ２ (wherein s is an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), and more preferably C １－２０ alkyl group, more preferably C １－６ An alkyl group, particularly preferably a methyl group.

[0230] In one embodiment, R ３３’ is a hydroxyl group.

[0231] In another embodiment, R ３３’ is a monovalent organic group, preferably C１－２０ alkyl group, more preferably C １－６ It is an alkyl group.

[0232] The above q2' is independently an integer of 0 to 3 in each occurrence, and the above r2' is independently an integer of 0 to 3 in each occurrence. The sum of q2' and r2' is (CR ３２’ ｑ２’ R ３３’ ｒ２’ ) units, it is 3.

[0233] q2' is (CR ３２’ ｑ２’ R ３３’ ｒ２’ ) units are each independently an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3.

[0234] R ３２ is independently at each occurrence -Z ３ -SiR ３４ ｎ２ R ３５ ３－ｎ２ This is -Z ３ -SiR ３４ ｎ２ R ３５ ３－ｎ２ is the above R ３２’ This has the same meaning as the description in

[0235] The above R ３３ is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0236] The above R ３３ In the formula (I), the monovalent organic group is preferably C １－２０ Alkyl group or -(C ｓ H ２ｓ ) ｔ１ -(O-C ｓ H ２ｓ ) ｔ２(wherein, s is independently in each occurrence an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), more preferably C １－２０ alkyl group, more preferably C １－６ An alkyl group is particularly preferred, and a methyl group is particularly preferred.

[0237] In one embodiment, R ３３ is a hydroxyl group.

[0238] In another embodiment, R ３３ is a monovalent organic group, preferably C １－２０ alkyl group, more preferably C １－６ It is an alkyl group.

[0239] The above p2 is independently an integer of 0 to 3 in each occurrence, q2 is independently an integer of 0 to 3 in each occurrence, and r2 is independently an integer of 0 to 3 in each occurrence. The sum of p2, q2, and r2 is (CR ３１ ｐ２ R ３２ ｑ２ R ３３ ｒ２ ) units, it is 3.

[0240] In one embodiment, p2 is 0.

[0241] In one embodiment, p2 is (CR ３１ ｐ２ R ３２ ｑ２ R ３３ ｒ２ ) units may each independently be an integer from 1 to 3, an integer from 2 to 3, or 3. In a preferred embodiment, p2 is 3.

[0242] In one embodiment, q2 is (CR ３１ ｐ２ R ３２ ｑ２ R ３３ ｒ２ ) units are each independently an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0243] In one embodiment, p2 is 0 and q2 is (CR ３１ ｐ２ R ３２ ｑ２ R ３３ ｒ２ ) units are each independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3.

[0244] The above R ｅ１ is independently at each occurrence -Z ３ -SiR ３４ ｎ２ R ３５ ３－ｎ２ This is -Z ３ -SiR ３４ ｎ２ R ３５ ３－ｎ２ is the above R ３２’ This has the same meaning as the description in

[0245] The above R ｆ１ is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group in each occurrence. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0246] The above R ｆ１ In the formula (I), the monovalent organic group is preferably C １－２０ Alkyl group or -(C ｓ H ２ｓ ) ｔ１ -(O-C ｓ H ２ｓ ) ｔ２ (wherein s is an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), and more preferably C １－２０ alkyl group, more preferably C １－６ An alkyl group is particularly preferred, and a methyl group is particularly preferred.

[0247] In one embodiment, R ｆ１ is a hydroxyl group.

[0248] In another embodiment, R ｆ１ is a monovalent organic group, preferably C１－２０ alkyl group, more preferably C １－６ It is an alkyl group.

[0249] The above k2 is independently an integer of 0 to 3 in each occurrence, l2 is independently an integer of 0 to 3 in each occurrence, and m2 is independently an integer of 0 to 3 in each occurrence. The sum of k2, l2, and m2 is (CR ｄ１ ｋ２ R ｅ１ ｌ２ R ｆ１ ｍ２ ) units, it is 3.

[0250] In the above formulas (1) and (2), R Ｓｉ When is a group represented by formula (S4), preferably, at least two Si atoms having hydroxyl groups or hydrolyzable groups bonded thereto are present in the terminal portions of formula (1) and formula (2).

[0251] In one embodiment, R Ｓｉ is a group represented by formula (S4), n2 is 1 to 3, preferably 2 or 3, and more preferably 3 (SiR ３４ ｎ２ R ３５ ３－ｎ２ ) units are present in each terminal portion of formula (1) and formula (2) at two or more, for example, 2 to 27, preferably 2 to 9, more preferably 2 to 6, even more preferably 2 to 3, and particularly preferably 3.

[0252] In a preferred embodiment, in formula (S4), R ３２’ When present, at least one, preferably all, R ３２’ In the formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0253] In a preferred embodiment, in formula (S4), R ３２ When present, at least one, preferably all, R ３２ In the formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0254] In a preferred embodiment, in formula (S4), Rｅ１ When present, at least one, preferably all, R ａ１ In the formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0255] In a preferred embodiment, in formula (S4), k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.

[0256] The above R ｇ１ and R ｈ１ is independently at each occurrence -Z ４ -SiR １１ ｎ１ R １２ ３－ｎ１ , -Z ４ -SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ , -Z ４ -CR ｄ１ ｋ２ R ｅ１ ｌ２ R ｆ１ ｍ２ Here, R １１ , R １２ , R ａ１ , R ｂ２ , R ｃ１ , R ｄ１ , R ｅ１ , R ｆ１ , n1, k1, l1, m1, k2, l2, and m2 have the same meanings as above.

[0257] In a preferred embodiment, R ｇ１ and R ｈ１ are each independently -Z ４ -SiR １１ ｎ１ R １２ ３－ｎ１ is.

[0258] Above Z ４ In each occurrence, Z is independently a single bond, an oxygen atom, or a divalent organic group. ４ The structure written as １１ ｎ１ R１２ ３－ｎ１ )

[0259] In one embodiment, Z ４ is an oxygen atom.

[0260] In one embodiment, Z ４ is a divalent organic group.

[0261] Above Z ４ is preferably C １－６ Alkylene group, -(CH ２ ) ｚ５” -O-(CH ２ ) ｚ６” - (wherein z5" is an integer of 0 to 6, for example, an integer of 1 to 6, and z6" is an integer of 0 to 6, for example, an integer of 1 to 6), or - (CH ２ ) ｚ７” -phenylene-(CH ２ ) ｚ８” - (wherein z7" is an integer of 0 to 6, for example, an integer of 1 to 6, and z8" is an integer of 0 to 6, for example, an integer of 1 to 6). １－６ The alkylene group may be straight-chain or branched, but is preferably straight-chain. These groups may contain, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ Alkenyl groups, and C ２－６ It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0262] In a preferred embodiment, Z ４ is C １－６ Alkylene group or -(CH ２ ) ｚ７” -phenylene-(CH ２ ) ｚ８” -, preferably -phenylene-(CH ２ ) ｚ８” - is. Z ３ is such a group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0263] In another preferred embodiment, the Z ４ is C １－３ In one embodiment, Z is an alkylene group. ４is -CH ２ CH ２ CH ２ In another embodiment, Z ４ is -CH ２ CH ２ -It can be.

[0264] In one embodiment, R Ｓｉ is a group represented by formula (S2), (S3), (S4) or (S5): These compounds can form a surface treatment layer having high surface slip properties.

[0265] In one embodiment, R Ｓｉ is a group represented by formula (S3), (S4), or (S5). These compounds have multiple hydrolyzable groups at one end, and therefore can form a surface treatment layer that adheres strongly to the substrate and has high abrasion resistance.

[0266] In one embodiment, R Ｓｉ is a group represented by formula (S3) or (S4). These compounds can have multiple hydrolyzable groups branched from one Si atom or C atom at one end, and therefore can form a surface treatment layer with even higher abrasion resistance.

[0267] In one embodiment, R Ｓｉ is a group represented by formula (S1).

[0268] In one embodiment, R Ｓｉ is a group represented by formula (S2).

[0269] In one embodiment, R Ｓｉ is a group represented by formula (S3).

[0270] In one embodiment, R Ｓｉ is a group represented by formula (S4).

[0271] In one embodiment, R Ｓｉ is a group represented by formula (S5).

[0272] In the above formulas (1) and (2), X Ａ is a fluoropolyether moiety (R ) that mainly provides water repellency and surface slipperiness. Ｆ１ and R Ｆ２) and the portion (R Ｓｉ ) and the linker. Ａ may be a single bond or any other group as long as the compounds represented by formulas (1) and (2) can exist stably.

[0273] In the above formula (1), α is an integer of 1 to 9, and β is an integer of 1 to 9. These α and β are X Ａ The sum of α and β can vary depending on the valence of X Ａ For example, X Ａ When X is a decavalent organic group, the sum of α and β is 10, and for example, α can be 9 and β can be 1, α can be 5 and β can be 5, or α can be 1 and β can be 9. Ａ When is a divalent organic group, α and β are 1.

[0274] In the above formula (2), γ is an integer of 1 to 9. γ is X Ａ That is, γ can vary depending on the valence of X Ａ is the value obtained by subtracting 1 from the valence of

[0275] X Ａ are each independently a single bond or a divalent to decavalent organic group;

[0276] Above X Ａ The divalent to decavalent organic group in the formula (I) is preferably a divalent to octavalent organic group. In one embodiment, the divalent to decavalent organic group is preferably a divalent to tetravalent organic group, more preferably a divalent organic group. In another embodiment, the divalent to decavalent organic group is preferably a trivalent to octavalent organic group, more preferably a trivalent to hexavalent organic group.

[0277] In one embodiment, X Ａ represents a single bond or a divalent organic group, α is 1, and β is 1.

[0278] In one embodiment, X Ａ represents a single bond or a divalent organic group, and γ is 1.

[0279] In one embodiment, X Ａ is a trivalent to hexavalent organic group, α is 1, and β is 2 to 5.

[0280] In one embodiment, X Ａ is a trivalent to hexavalent organic group, and γ is 2 to 5.

[0281] In one embodiment, X Ａ is a trivalent organic group, α is 1, and β is 2.

[0282] In one embodiment, X Ａ is a trivalent organic group, and γ is 2.

[0283] X Ａ is a single bond or a divalent organic group, the formulas (1) and (2) are represented by the following formulas (1') and (2').

[0284] In one embodiment, X Ａ is a single bond.

[0285] In another embodiment, X Ａ is a divalent organic group.

[0286] In one embodiment, X Ａ is, for example, a single bond or the following formula: -(R ５１ ) ｐ５ -(X ５１ ) ｑ５ - [In the formula: R ５１ is a single bond, -(CH ２ ) ｓ５ - or an o-, m- or p-phenylene group, preferably -(CH ２ ) ｓ５ -, s5 is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 or 2; X ５１ is -(X ５２ ) ｌ５ represents -, and X ５２ each occurrence independently represents an —O—, —S—, o-, m-, or p-phenylene group, —C(O)O—, —Si(R ５３ ) ２ -, -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ --, --CONR５４ --, --O-CONR ５４ -, -NR ５４ - and - (CH ２ ) ｎ５ represents a group selected from the group consisting of -, ５３ is independently in each occurrence a phenyl group, C １－６ Alkyl group or C １－６ represents an alkoxy group, preferably a phenyl group or C １－６ R is an alkyl group, more preferably a methyl group; ５４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ represents an alkyl group (preferably a methyl group), m5, in each occurrence, is independently an integer of 1 to 100, preferably an integer of 1 to 20, n5, in each occurrence, is independently an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, l5, in each occurrence, is independently an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, p5 is 0 or 1, q5 is 0 or 1, wherein at least one of p5 and q5 is 1, and the order of occurrence of the repeating units enclosed in parentheses with p5 or q5 is arbitrary. Ａ (Typically X Ａ hydrogen atom) is a fluorine atom, C １－３ Alkyl group and C １－３ In a preferred embodiment, X Ａ is not substituted with these groups.

[0287] In a preferred embodiment, the X Ａ are each independently -(R ５１ ) ｐ５ -(X ５１ ) ｑ５ -R ５２ - is. R ５２ is a single bond, -(CH ２ ) ｔ５ - or an o-, m- or p-phenylene group, preferably -(CH ２ )ｔ５ t5 is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3. ５２ (Typically R ５２ hydrogen atom) is a fluorine atom, C １－３ Alkyl group and C １－３ In a preferred embodiment, R ５６ is not substituted with these groups.

[0288] Preferably, the X Ａ are each independently a single bond, C １－２０ an alkylene group, —R ５１ -X ５３ -R ５２ - or -X ５４ -R ５２ - [wherein, R ５１ and R ５２ has the same meaning as above, and X ５３ -O-, -S-, -C(O)O-, -CONR ５４ -, -O-CONR ５４ -, -Si(R ５３ ) ２ -, -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ -, -O-(CH ２ ) u５ -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ -, -O-(CH ２ ) u５ -Si(R ５３ ) ２ —O—Si(R ５３ ) ２ -CH ２ CH ２ -Si(R ５３ ) ２ —O—Si(R ５３ ) ２ -, -O-(CH ２ ) u５-Si(OCH ３ ) ２ OSi(OCH ３ ) ２ -, -CONR ５４ - (CH ２ ) u５ -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ -, -CONR ５４ - (CH ２ ) u５ -N(R ５４ ) -, or -CONR ５４ -(o-, m- or p-phenylene)-Si(R ５３ ) ２ - (wherein, R ５３ , R ５４ and m5 are as defined above, and u5 is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3; ５４ is -S-, -C(O)O-, -CONR ５４ -, -O-CONR ５４ -, -CONR ５４ - (CH ２ ) u５ -(Si(R ５４ ) ２ O) ｍ５ -Si(R ５４ ) ２ -, -CONR ５４ - (CH ２ ) u５ -N(R ５４ ) -, or -CONR ５４ -(o-, m- or p-phenylene)-Si(R ５４ ) ２ - (wherein each symbol has the same meaning as above).

[0289] More preferably, the above X Ａ are each independently a single bond, C １－２０ an alkylene group, —(CH ２ ) ｓ５ -X ５３ -, -(CH ２ ) ｓ５ -X５３ - (CH ２ ) ｔ５ - -X ５４ - or -X ５４ - (CH ２ ) ｔ５ - [wherein, X ５３ , X ５４ , s5 and t5 have the same meanings as above.]

[0290] More preferably, the above X Ａ are each independently a single bond, C １－２０ an alkylene group, —(CH ２ ) ｓ５ -X ５３ - (CH ２ ) ｔ５ - or -X ５４ - (CH ２ ) ｔ５ wherein each symbol has the same meaning as defined above.

[0291] In a preferred embodiment, the X Ａ are each independently a single bond C １－２０ an alkylene group, —(CH ２ ) ｓ５ -X ５３ - or -(CH ２ ) ｓ５ -X ５３ - (CH ２ ) ｔ５ - [wherein, X ５３ is -O-, -CONR ５４ -, or -O-CONR ５４ - and R ５４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ represents an alkyl group, s5 is an integer of 1 to 20, and t5 is an integer of 1 to 20.

[0292] In a preferred embodiment, the X Ａ are each independently -(CH ２ ) ｓ５ -O-(CH ２ ) ｔ５ --CONR ５４ - (CH ２ )ｔ５ - [wherein, R ５４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ represents an alkyl group, s5 is an integer of 1 to 20, and t5 is an integer of 1 to 20.

[0293] In one embodiment, the X Ａ are each independently a single bond, C １－２０ an alkylene group, —(CH ２ ) ｓ５ -O-(CH ２ ) ｔ５ -, -(CH ２ ) ｓ５ -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ - (CH ２ ) ｔ５ -, -(CH ２ ) ｓ５ -O-(CH ２ ) u５ -(Si(R ５３ ) ２ O) ｍ５ -Si(R ５３ ) ２ - (CH ２ ) ｔ５ - or -(CH ２ ) ｓ５ -O-(CH ２ ) ｔ５ -Si(R ５３ ) ２ - (CH ２ ) u５ -Si(R ５３ ) ２ -(C v H ２v ) - [wherein, R ５３ , m5, s5, t5 and u5 are as defined above, and v5 is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 or 3.]

[0294] In the above formula, -(C v H ２v )- may be a straight chain or a branched chain, for example, -CH ２ CH２ -, -CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -It can be.

[0295] Above X Ａ are each independently a fluorine atom, C １－３ Alkyl group and C １－３ Fluoroalkyl groups (preferably C １－３ In one embodiment, X may be substituted with one or more substituents selected from the group consisting of alkyl, aryl, aryls ... Ａ is non-substituted.

[0296] In addition, the above X Ａ The left side of each equation is R Ｆ１ or R Ｆ２ and the right side is R Ｓｉ Combine with.

[0297] In one embodiment, X Ａ are each independently —O—C １－６ It may be other than an alkylene group.

[0298] In another embodiment, X Ａ Examples of the group include the following: [In the formula, R ４１ are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or C １－６ an alkoxy group, preferably a methyl group; D is —CH ２ O (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ -, -CF ２ O (CH ２ ) ３ -, -(CH ２ ) ２ -, -(CH ２ ) ３ -, -(CH ２ )4-, -CONH-(CH ２ ) ３-, -CON(CH ３ )-(CH ２ ) ３ -, -CON(Ph)-(CH ２ ) ３ - (wherein Ph means phenyl), and (In the formula, R ４２ are each independently a hydrogen atom, C １－６ or an alkyl group of C １－６ E represents an alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group; ２ ) ｎ - (n is an integer of 2 to 6), and D is R of the molecular main chain. Ｆ１ or R Ｆ２ and E is R Ｓｉ binds to.]

[0299] Above X Ａ Specific examples of include: a single bond, —CH ２ OCH ２ -, -CH ２ O (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ -, -CH ２ O (CH ２ ) ４ -, -CH ２ O (CH ２ ) ５ -, -CH ２ O (CH ２ ) ６ -, -CH ２ O (CH ２ ) ３ Si(CH ３ ) ２ OSi(CH ３ ) ２ (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ Si(CH ３ ) ２ OSi(CH ３ ) ２ OSi(CH ３) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ３ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) １０ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２０ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ H ２ CHFOCF ２ -、 -CH ２ H ２ CHFOCF ２ CF ２ -、 -CH ２ H ２ CHFOCF ２ CF２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CHFCF２ OCF(CF ３ )CF ２ OCF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCF ２ CHFOCF ２ CF ２ CF ２ -C(O)NH-CH ２ -、 -CH ２ OCH ２ (CH) ２ ) ７ CH ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ２ -、 -CH ２ OCH ２ CH ２ CH ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ３ -、 -CH ２ OCH ２ CH ２ CH ２ Si(OCH ２ CH ３ ) ２ OSi (OCH) ２ CH３ ) ２ (CH ２ ) ３ -、 -CH ２ SO ２ CH ２ CH ２ H. ３ ) ２ HUNTER ３ ) ２ (CH ２ ) ２ -、 -CH ２ SO ２ CH ２ CH ２ H. ２ CH ３ ) ２ HUNTER ２ CH ３ ) ２ (CH ２ ) ２ -、 -(CH ２ ) ２ -Si(CH ３ ) ２ -(CH ２ ) ２ -、 -CH ２ -、 -(CH ２ ) ２ -、 -(CH ２ ) ３ -、 -(CH ２ ) ４ -、 -(CH ２ ) ５ -、 -(CH ２ ) ６ -、 -CO-、 -CONH-、 -CONH-CH ２ -、 -CONH-(CH ２ ) ２ -、 -CONH-(CH ２ ) ３ -、 -CONH-(CH ２ ) ４ -、 -CONH-(CH ２ ) ５ -、 -CONH-(CH ２ ) ６ -、 -CON(CH ３ )-CH ２ -、 -CON(CH ３ )-(CH２ ) ２ -, -CON(CH ３ )-(CH ２ ) ３ -, -CON(CH ３ )-(CH ２ ) ４ -, -CON(CH ３ )-(CH ２ ) ５ -, -CON(CH ３ )-(CH ２ ) ６ -, -CON(Ph)-CH ２ -(wherein Ph means phenyl), -CON(Ph)-(CH ２ ) ２ -(wherein Ph means phenyl), -CON(Ph)-(CH ２ ) ３ -(wherein Ph means phenyl), -CON(Ph)-(CH ２ ) ４ -(wherein Ph means phenyl), -CON(Ph)-(CH ２ ) ５ -(wherein Ph means phenyl), -CON(Ph)-(CH ２ ) ６ - (wherein Ph means phenyl), -CONH-(CH ２ ) ２ NH (CH ２ ) ３ -, -CONH-(CH ２ ) ６ NH (CH ２ ) ３ -, -CH ２ O-CONH-(CH ２ ) ３ -, -CH ２ O-CONH-(CH ２ ) ６ -, -S-(CH ２ ) ３ -, -(CH ２ ) ２ S (CH ２ ) ３ -, -CONH-(CH ２ ) ３ Si(CH ３ )２ HUNTER ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ HUNTER ３ ) ２ HUNTER ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２ H ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ３ H ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) １０ H ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２０ H ３ ) ２ (CH ２ ) ２ -、 -C(O)O-(CH ２ )３ -, -C(O)O-(CH ２ ) ６ -, -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ - (CH ２ ) ２ -Si(CH ３ ) ２ - (CH ２ ) ２ -, -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ - (CH ２ ) ２ -Si(CH ３ ) ２ -CH(CH ３ ) -, -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ - (CH ２ ) ２ -Si(CH ３ ) ２ - (CH ２ ) ３ -, -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ - (CH ２ ) ２ -Si(CH ３ ) ２ -CH(CH ３ )-CH ２ -, -OCH ２ -, -O(CH ２ ) ３ -, -OCFHCF ２ -, Examples include:

[0300] In yet another embodiment, X Ａ are each independently represented by the formula: -(R １６ ) ｘ１ -(CFR １７ ) ｙ１ - (CH２ ) ｚ１ In the formula, x1, y1, and z1 each independently represent an integer of 0 to 10, the sum of x1, y1, and z1 is 1 or more, and the order of the repeating units enclosed in parentheses in the formula is arbitrary.

[0301] In the above formula, R １６ each occurrence independently represents an oxygen atom, phenylene, carbazolylene, -NR １８ - (wherein, R １８ represents a hydrogen atom or an organic group) or a divalent organic group. １８ is an oxygen atom or a divalent polar group.

[0302] The "divalent polar group" is not particularly limited, but examples thereof include -C(O)-, -C(=NR １９ )-, and -C(O)NR １９ - (wherein R １９ represents a hydrogen atom or a lower alkyl group). The "lower alkyl group" is, for example, an alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, or n-propyl, which may be substituted with one or more fluorine atoms.

[0303] In the above formula, R １７ are each independently a hydrogen atom, a fluorine atom, or a lower fluoroalkyl group, preferably a fluorine atom. The "lower fluoroalkyl group" is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group or a pentafluoroethyl group, and even more preferably a trifluoromethyl group.

[0304] In yet another embodiment, X Ａ Examples of include the following groups: [In the formula, R ４１ are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or C １－６ The alkoxy group is preferably a methyl group; Ａ In the group, any number of T's may be RＦ１ or R Ｆ２ The following groups are attached to: ２ O (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ -, -CF ２ O (CH ２ ) ３ -, -(CH ２ ) ２ -, -(CH ２ ) ３ -, -(CH ２ )4-, -CONH-(CH ２ ) ３ -, -CON(CH ３ )-(CH ２ ) ３ -, -CON(Ph)-(CH ２ ) ３ - (wherein Ph means phenyl), or [In the formula, R ４２ are each independently a hydrogen atom, C １－６ or an alkyl group of C １－６ represents an alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group.], and some of the other Ts are R Ｓｉ and if present, the remaining Ts are each independently a methyl group, a phenyl group, C １－６ It is an alkoxy group, a radical scavenger group, or an ultraviolet absorbing group.

[0305] The radical scavenging group is not particularly limited as long as it can capture radicals generated by light irradiation, and examples thereof include residues of benzophenones, benzotriazoles, benzoic acid esters, phenyl salicylates, crotonic acids, malonic acid esters, organoacrylates, hindered amines, hindered phenols, and triazines.

[0306] The ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet light, and examples thereof include residues of benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or alkoxycinnamates, oxamides, oxanilides, benzoxazinones, and benzoxazoles.

[0307] In a preferred embodiment, preferred radical scavenging groups or ultraviolet absorbing groups include groups represented by the following formulas:

[0308] In this embodiment, X Ａ may each independently be a trivalent to decavalent organic group.

[0309] In yet another embodiment, X Ａ Examples of include the following groups: [In the formula, R ２５ , R ２６ and R ２７ are each independently a divalent to hexavalent organic group, and R ２５ is at least one R Ｆ１ and bonded to R ２６ and R ２７ Each of the groups is at least one R Ｓｉ binds to.]

[0310] In one embodiment, the R ２５ is a single bond, C １－２０ Alkylene group, C ３－２０ Cycloalkylene group, C ５－２０ arylene group, —R ５７ -X ５８ -R ５９ -, -X ５８ -R ５９ - or -R ５７ -X ５８ -. ５７ and R ５９ are each independently a single bond, C １－２０ Alkylene group, C ３－２０ a cycloalkylene group, or C ５－２０ The X is an arylene group. ５８is —O—, —S—, —CO—, —O—CO— or —COO—.

[0311] In one embodiment, the R ２６ and R ２７ are each independently a hydrocarbon or a group having at least one atom selected from N, O and S at the end or in the main chain of the hydrocarbon, and preferably C １－６ alkyl group, -R ３６ -R ３７ -R ３６ -, -R ３６ -CHR ３８ ２ -, etc. Here, R ３６ are each independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms. ３７ is N, O or S, preferably N or O. ３８ is -R ４５ -R ４６ -R ４５ -, -R ４６ -R ４５ -or-R ４５ -R ４６ -. Here, R ４５ are each independently an alkyl group having 1 to 6 carbon atoms. ４６ is N, O or S, preferably O.

[0312] In this embodiment, X Ａ may each independently be a trivalent to decavalent organic group.

[0313] In yet another embodiment, X Ａ For example, the following: [In the formula, X ａ is a single bond or a divalent organic group.

[0314] Above X ａ is a single bond or a divalent linking group directly bonded to the isocyanuric ring. ａis preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a sulfide bond, and more preferably a single bond, an alkylene group having 1 to 10 carbon atoms, or a divalent organic group having 1 to 10 carbon atoms and containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a sulfide bond.

[0315] X ａ The following formula: -(CX １２１ X １２２ ) ｘ１ -(X ａ１ ) ｙ１ - (CX １２３ X １２４ ) ｚ１ - (wherein, X １２１ ~X １２４ are each independently H, F, OH, or —OSi(OR １２１ ) ３ (wherein three R １２１ are each independently an alkyl group having 1 to 4 carbon atoms, and ａ１ is -C(=O)NH-, -NHC(=O)-, -O-, -C(=O)O-, -OC(=O)-, -OC(=O)O-, or -NHC(=O)NH- (the left side of each bond is CX １２１ X １２２ ), x1 is an integer of 0 to 10, y1 is 0 or 1, and z1 is an integer of 1 to 10.

[0316] Above X ａ１ is preferably —O— or —C(═O)O—.

[0317] Above X ａ The following formula: -(CF ２ ) ｍ１１ - (CH ２ ) ｍ１２ -O-(CH ２ ) ｍ１３ - (wherein m11 is an integer of 1 to 3, m12 is an integer of 1 to 3, and m13 is an integer of 1 to 3), a group represented by -(CF ２ )ｍ１４ - (CH ２ ) ｍ１５ -O-CH ２ CH(OH)-(CH ２ ) ｍ１６ - (wherein m14 is an integer of 1 to 3, m15 is an integer of 1 to 3, and m16 is an integer of 1 to 3), a group represented by -(CF ２ ) ｍ１７ - (CH ２ ) ｍ１８ - (wherein m17 is an integer of 1 to 3, and m18 is an integer of 1 to 3), a group represented by -(CF ２ ) ｍ１９ - (CH ２ ) ｍ２０ -O-CH ２ CH(OSi(OCH ３ ) ３ )-(CH ２ ) ｍ２１ - (wherein m19 is an integer of 1 to 3, m20 is an integer of 1 to 3, and m21 is an integer of 1 to 3), or -(CH ２ ) ｍ２２ A group represented by the formula: - (wherein m22 is an integer of 1 to 3) is particularly preferred.

[0318] Above X ａ is not particularly limited, but specifically includes -CH ２ -, -C ２ H ４ -, -C ３ H ６ -, -C ４ H ８ -, -C ４ H ８ -O-CH ２ -, -CO-O-CH ２ -CH(OH)-CH ２ -, - (CF ２ ) ｎ５ -(n5 is an integer from 0 to 4), -(CF ２ ) ｎ５ - (CH ２ ) ｍ５ -(n5 and m5 each independently represents an integer of 0 to 4), -CF ２ CF ２ CH２ OCH ２ CH(OH)CH ２ -, -CF ２ CF ２ CH ２ OCH ２ CH(OSi(OCH ３ ) ３ ) CH ２ - etc.

[0319] In this embodiment, X Ａ may each independently be a divalent or trivalent organic group.

[0320] The fluorine-containing silane compound represented by the above formula (1) or (2) is not particularly limited, but may be 5×10 ２ ~1 x 10 ５ Within this range, it is preferable from the viewpoint of abrasion resistance that the average molecular weight is 2,000 to 32,000, more preferably 2,500 to 12,000. Note that the "average molecular weight" refers to a number average molecular weight, and the "average molecular weight" is １９ The value is measured by F-NMR.

[0321] The content of the fluorine-containing silane compound represented by the formula (1) or (2) may be preferably 90% by mass or more and 100% by mass or less, more preferably 95% by mass or more and 100% by mass or less, based on 100% by mass of the total amount of the fluorine-containing silane compounds.

[0322] The content of the fluoropolyether group-containing silane compound is preferably 0.02 to 40.0 mass%, more preferably 0.02 to 30.0 mass%, even more preferably 0.04 to 25.0 mass%, and particularly preferably 0.05 to 20.0 mass%, based on 100 mass% of the surface treatment agent. By setting the content of the fluoropolyether group-containing silane compound within the above range, higher water and oil repellency can be obtained. In the composition of the present disclosure, the nonvolatile content may be the portion obtained by excluding the solvent from the total amount of the composition.

[0323] The content of the fluorine-containing silane compound is preferably 0.02 to 40.0 mass%, more preferably 0.02 to 30.0 mass%, even more preferably 0.04 to 25.0 mass%, and particularly preferably 0.05 to 20.0 mass%, based on 100 mass% of the surface treatment agent. By setting the content of the fluorine-containing silane compound within the above range, higher water and oil repellency can be obtained.

[0324] The surface treatment agent may further contain a solvent. The inclusion of a solvent improves the handleability of the composition. When a layer is formed using such a composition, the formed layer can be a continuous thin film. Furthermore, such a composition can contribute to the formation of a thin film of any thickness.

[0325] The solvent is not particularly limited, but examples thereof include perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (e.g., perfluorohexane, perfluoromethylcyclohexane, and perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (e.g., bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited) (the perfluoroalkyl group and the alkyl group may be linear or branched), or CF ３ CH ２ OCF ２ CHF ２ (For example, Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.)). These solvents can be used alone or as a mixture of two or more. Among them, hydrofluoroethers are preferred, and perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) and / or perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) is particularly preferred.

[0326] The boiling point (atmospheric pressure) of the solvent may be preferably less than 105°C, more preferably 90°C or less, and even more preferably 80°C or less. When the solvent has a boiling point within the above range, the surface treatment agent of the present disclosure, when applied to a substrate, evaporates relatively easily without the need for heating or the like, thereby reducing the time and energy required for the surface treatment process. The lower limit of the boiling point is not particularly limited, but may be, for example, 30°C or higher, preferably 50°C or higher.

[0327] The content of the solvent may be preferably 50 to 99.7 mass%, more preferably 60 to 99.7 mass%, even more preferably 70 to 99.7 mass%, and particularly preferably 80 to 99.7 mass%, based on 100 mass% of the total of the surface treatment agent.

[0328] The surface treatment agent of the present disclosure may further contain a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro(poly)ether compound (hereinafter collectively referred to as "fluorine-containing oil"), a (non-reactive) silicone compound that can be understood as a silicone oil (hereinafter referred to as "silicone oil"), alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers, etc. Note that these other components are components different from the above-mentioned fluorine-containing silane compound and solvent.

[0329] The fluorine-containing oil is not particularly limited, but examples thereof include compounds represented by the following general formula (4) (perfluoro(poly)ether compounds): ５ - (OC ４ F ８ ) ａ” - (OC ３ F ６ ) ｂ” - (OC ２ F ４ ) ｃ” -(OCF ２ ) ｄ” -Rf ６ ...(4) In the formula, Rf ５ is a C optionally substituted by one or more fluorine atoms; １－１６ Alkyl groups (preferably C １-１６ Rf represents a perfluoroalkyl group ６ is a C optionally substituted by one or more fluorine atoms; １－１６ Alkyl groups (preferably C １－１６ Rf represents a perfluoroalkyl group, a fluorine atom, or a hydrogen atom; ５ and Rf ６ More preferably, each independently represents C １－３It is a perfluoroalkyl group. a", b", c", and d" respectively represent the number of four types of repeating units of perfluoro(poly)ether constituting the main skeleton of the polymer, and are each independently an integer of 0 to 300, and the sum of a", b", c", and d" is greater than 30, preferably 40 to 300, and more preferably 50 to 300. The order of occurrence of each repeating unit enclosed in parentheses with the subscript a", b", c", or d" is arbitrary in the formula. Of these repeating units, -(OC ４ F ８ )- is -(OCF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )) -, -(OC(CF ３ ) ２ CF ２ ) -, -(OCF ２ C (CF ３ ) ２ )-,-(OCF(CF ３ )CF(CF ３ ))-,-(OCF(C ２ F ５ )CF ２ )- and (OCF ２ CF (C ２ F ５ ))-, but preferably -(OCF ２ CF ２ CF ２ CF ２ )-. -(OC ３ F ６ )- is -(OCF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ )- and (OCF ２ CF (CF ３))-, and preferably -(OCF ２ CF ２ CF ２ )-. -(OC ２ F ４ )- is -(OCF ２ CF ２ )- and (OCF(CF ３ ))-, but preferably -(OCF ２ CF ２ )-.

[0330] Examples of the perfluoro(poly)ether compound represented by the general formula (4) include compounds represented by the following general formulas (4a) and (4b) (which may be one type or a mixture of two or more types): ５ -(OCF ２ CF ２ CF ２ ) ｂ” -Rf ６ ...(4a) Rf ５ -(OCF ２ CF ２ CF ２ CF ２ ) ａ” -(OCF ２ CF ２ CF ２ ) ｂ” -(OCF ２ CF ２ ) ｃ” -(OCF ２ ) ｄ” -Rf ６ ...(4b) In these formulas, Rf ５ and Rf ６ is as defined above; in formula (4a), b" is an integer of 1 or more and 100 or less; in formula (4b), a" and b" are each independently an integer of 0 or more and 30 or less, and c" and d" are each independently an integer of 1 or more and 300 or less. The order of occurrence of each repeating unit enclosed in parentheses with the subscripts a", b", c", and d" is arbitrary in the formula.

[0331] From another viewpoint, the fluorine-containing oil is a compound represented by the general formula Rf ３ -F (wherein, Rf３ is C ５－１６ The compound may be a compound represented by the formula (I) below, which is a perfluoroalkyl group. Also, it may be a chlorotrifluoroethylene oligomer.

[0332] The above-mentioned fluorinated oil may have a number average molecular weight of preferably 1000 or more, more preferably 1500 or more, and even more preferably 2000 or more. The above-mentioned fluorinated oil may also have a number average molecular weight of preferably 30000 or less, more preferably 20000 or less, and even more preferably 10000 or less. The molecular weight of the fluorinated oil can be measured using GPC.

[0333] The fluorinated oil may be contained in an amount of, for example, 0 to 50% by mass, preferably 0 to 30% by mass, and more preferably 0 to 5% by mass, relative to the surface treatment agent. In one embodiment, the surface treatment agent of the present disclosure is substantially free of fluorinated oil. "Substantially free of fluorinated oil" means that the surface treatment agent does not contain any fluorinated oil, or may contain a very small amount of fluorinated oil.

[0334] In one embodiment, the number average molecular weight of the fluorine-containing oil may be smaller than the number average molecular weight of the fluorine-containing silane compound. By setting the number average molecular weight in this range, it is possible to form a cured product having high abrasion resistance and high surface slippage while suppressing a decrease in the transparency of the surface treatment layer obtained from such a compound.

[0335] The fluorine-containing oil contributes to improving the surface slip properties of the layer formed by the surface treatment agent of the present disclosure.

[0336] The silicone oil may be, for example, a linear or cyclic silicone oil having 2,000 or less siloxane bonds. The linear silicone oil may be a so-called straight silicone oil or a modified silicone oil. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. Examples of modified silicone oils include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, or the like. Examples of cyclic silicone oils include cyclic dimethylsiloxane oil.

[0337] In the surface treatment agent of the present disclosure, the silicone oil may be contained in an amount of, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass, relative to a total of 100 parts by mass of the fluorine-containing silane compounds of the present disclosure (when two or more types are used, the total of these, the same applies hereinafter).

[0338] The silicone oil contributes to improving the surface slipperiness of the surface treatment layer.

[0339] Examples of the alcohols include alcohols having 1 to 6 carbon atoms which may be substituted with one or more fluorine atoms, such as methanol, ethanol, isopropanol, tert-butanol, and CF ３ CH ２ OH, CF ３ CF ２ CH ２ OH, (CF ３ ) ２ Addition of these alcohols to the surface treatment agent improves the stability of the surface treatment agent and also improves the compatibility of the fluorine-containing silane compound with the solvent.

[0340] The alcohol is contained in the surface treatment agent in an amount, in terms of molar ratio, of preferably 0.1 to 5 times, more preferably 0.5 to 3 times, and even more preferably 0.8 to 1.2 times, the amount of the metal compound. By setting the content ratio of the alcohol within the above range, the stability of the surface treatment layer can be further improved.

[0341] Examples of the catalyst include acids (for example, acetic acid, trifluoroacetic acid, etc.), bases (for example, ammonia, triethylamine, diethylamine, etc.), and transition metals (for example, Ti, Ni, Sn, etc.).

[0342] The catalyst promotes the hydrolysis and dehydration condensation of the fluorine-containing silane compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.

[0343] In addition to the above, other components include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, and the like.

[0344] According to the present disclosure, a new surface treatment method for a substrate having an anti-reflection coating can be provided, and in one aspect, the transparency of the substrate can be maintained and the durability, particularly the abrasion resistance, of the surface treatment layer can be improved in the substrate having an anti-reflection coating. Therefore, the surface treatment method of the present disclosure can be preferably used for various substrates, for example, substrates for electronic devices.

[0345] Such electronic devices include portable terminal devices such as smartphones, tablets, notebook PCs, and cameras; wearable devices such as smart watches; and display devices such as televisions, liquid crystal displays, organic EL displays, and inorganic EL displays.

[0346] The present invention will be explained in more detail with reference to the following examples, but the present invention is not limited to these examples.

[0347] Production Example 1: CF ３ O (CF ２ CF ２ O) ２０ (CF ２ O) １６CF ２ CH ２ OCH ２ CH ２ CH ２ Si[CH ２ CH ２ CH ２ Si(OCH ３ ) ３ ] ３ A surface treatment agent was prepared by dissolving a fluorine-containing compound represented by the formula (I) in hydrofluoroether (Novec HFE7200, manufactured by 3M) to a concentration of 20 wt %.

[0348] As a substrate having an antireflection (AR) layer (hereinafter also referred to as "AR substrate"), a glass substrate / Si ３ N ４ / SiO ２ / Si ３ N ４ / SiO ２ / Si ３ N ４ / SiO ２ AR substrate (AR1 substrate) and glass substrate / Si ３ N ４ / SiO ２ / Si ３ N ４ / SiO ２ / Si ３ N ４ / SiO ２ / Si ３ N ４ / SiO ２ An AR substrate (AR2 substrate) having the following structure was used.

[0349] Comparative Example 1 Using a 1300φ deposition device manufactured by Optorun, the AR1 substrate was subjected to surface smoothing treatment and SiO ２ Only the surface treatment agent was vapor-deposited without performing any film formation.

[0350] Examples 1 to 3 Using a 1300φ vapor deposition device manufactured by Optorun, SiO ２ No film formation was performed, and only plasma treatment with Ar gas was performed under the conditions shown in Table 1, and then the surface treatment agent was vapor-deposited.

[0351] Examples 4 to 14 Using a 1300φ deposition apparatus manufactured by Optorun, an AR1 substrate was subjected to plasma treatment with Ar gas and SiO ２ After the film formation, a surface treatment agent was vapor-deposited.

[0352] Comparative Example 2 Using a 1900φ deposition device manufactured by Shincron, the AR2 substrate was subjected to surface smoothing treatment and SiO ２ Only the surface treatment agent was vapor-deposited without performing any film formation.

[0353] Example 15 Using a 1900φ evaporation device manufactured by Shincron, SiO was deposited on an AR2 substrate. ２ No film formation was performed, and O ２ After only the plasma treatment with gas was carried out, the surface treatment agent was vapor-deposited.

[0354] Examples 16 to 21 Using a 1900φ deposition device manufactured by Shincron Co., Ltd., O was deposited on an AR2 substrate under the conditions shown in Table 1. ２ Gas plasma treatment and SiO ２ After the film formation, a surface treatment agent was vapor-deposited.

[0355] The treated substrates were evaluated as follows. <Abrasion Resistance> The substrate on which the surface treatment layer was formed was placed horizontally, and steel wool (count #0000, dimensions 10 mm x 10 mm) was brought into contact with the exposed upper surface of the surface treatment layer. A load of 1,000 gf was applied thereto. Thereafter, the steel wool was moved back and forth with the load applied (distance: 30 mm (reciprocating), speed: 60 rpm). The static contact angle (degrees) of water was measured every certain number of reciprocating movements. The evaluation was stopped when the measured contact angle became less than 95 degrees. The number of reciprocating movements at which the measured value became less than 95 degrees is shown in the table below. <Optical Properties> The transmittance of the substrate on which the surface treatment layer was formed was measured using a haze meter NDH 7000SP (Nippon Denshoku Industries Co., Ltd.) in accordance with ISO 14782.

[0356] The results are shown below. In the table, "-" indicates that no measurement data was available.

[0357]

[0358] In Examples 4 to 14 and 16 to 21, the AR substrate was subjected to plasma treatment, and then SiO ２ A layer containing the above-mentioned compound was formed on the substrate, and a surface treatment layer was further formed on the substrate. It was confirmed that a substrate having good abrasion resistance, good transparency, and excellent optical properties was obtained.

[0359] In particular, in Examples 4 to 14, in which the surface smoothing treatment was carried out by plasma irradiation using Ar as the process gas, it was confirmed that a substrate having excellent abrasion resistance and optical properties could be obtained by setting the plasma irradiation time to 700 seconds or less. ２ It was confirmed that particularly good abrasion resistance and optical properties were obtained when the thickness of the layer containing the compound was in the range of 1 to 6 nm.

[0360] On the other hand, the process gas is O ２ In Examples 18 to 23, in which the surface smoothing treatment was carried out by plasma irradiation as SiO , it was confirmed that a substrate excellent in abrasion resistance and optical properties could be obtained by setting the plasma irradiation time to 180 to 600 seconds. ２ It was confirmed that particularly good abrasion resistance and optical properties were obtained when the thickness of the layer containing the compound was in the range of 1 to 3 nm.

[0361] According to the present disclosure, a new surface treatment method for a substrate having an anti-reflection coating can be provided, and in one aspect, the transparency of the substrate can be maintained and the durability, particularly the abrasion resistance, of the surface treatment layer can be improved in the substrate having an anti-reflection coating. Therefore, the surface treatment method of the present disclosure can be preferably used for various substrates, for example, substrates for electronic devices.

Claims

1. A method for treating a substrate having an anti-reflective coating, comprising the steps of: carrying out a process for smoothing at least a portion of the surface of the anti-reflective coating; The surface of the anti-reflection film after the treatment for smoothing at least a part of the surface of the anti-reflection film is coated with SiO. ２ forming a layer comprising: The SiO ２ and applying a surface treatment agent to at least a partial area of ​​a surface of the layer comprising the above to form a surface treatment layer.

2. The SiO ２ The arithmetic mean roughness Ra of the surface of the layer containing １ is the arithmetic mean roughness Ra of the surface of the anti-reflection coating ０ The method according to claim 1, wherein the surface roughness is 60% or less.

3. The method according to claim 1 , wherein the process for smoothing at least a partial area of ​​the surface of the anti-reflective coating is an ion cleaning process.

4. A process for smoothing at least a part of the surface of the anti-reflection film and a process for forming a SiO ２ The formation of the layer containing SiO ２ The amount of OH groups on the surface of the layer containing １ is the amount of OH groups C on the surface of the anti-reflection film before the treatment for smoothing at least a portion of the surface of the anti-reflection film. ０ The method of claim 1, wherein the concentration of the ion exchange resin is 1.4 times or more.

5. the treatment of smoothing at least a portion of the surface of the anti-reflection coating is carried out by plasma irradiation; The method according to claim 1 , wherein the voltage in the plasma irradiation is 140 V or more.

6. The process of smoothing at least a portion of the surface of the anti-reflective coating is carried out by plasma irradiation; The processing method according to claim 1 , wherein a gas flow rate in said plasma irradiation is 40 sccm or more.

7. the treatment of smoothing at least a portion of the surface of the anti-reflection coating is carried out by plasma irradiation; The processing method according to claim 1 , wherein a current in the plasma irradiation is 0.3 A or more.

8. The process of smoothing at least a portion of the surface of the anti-reflective coating is carried out by plasma irradiation; 2. The method according to claim 1, wherein the plasma exposure time is 100 to 700 seconds.

9. The SiO ２ The method of claim 1 , wherein the layer comprising is formed by vapor deposition.

10. The method according to claim 1 , wherein the surface treatment agent comprises a fluorine-containing silane compound.

11. The fluorine-containing silane compound is represented by the following formula (1) or (2): 【Chemistry 1】 [In the formula: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - or a fluoroalkyl group; R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ - or a fluoroalkylene group; Rf １ each occurrence independently represents a C which may be substituted by one or more fluorine atoms; １－１６ is an alkyl group; Rf ２ C optionally substituted with one or more fluorine atoms １－６ is an alkylene group; R Ｆ is independently at each occurrence a divalent fluoropolyether group; p is 0 or 1; q, independently at each occurrence, is 0 or 1; R Ｓｉ is independently in each occurrence a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded; At least one R Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ each independently represents a single bond or a divalent to decavalent organic group; α is an integer from 1 to 9; β is an integer from 1 to 9; Each γ is independently an integer from 1 to 9. The method according to claim 10, further comprising at least one fluorine-containing silane compound represented by the formula:

12. The process of smoothing at least a portion of the surface of the anti-reflective coating is carried out by plasma irradiation; The voltage in the plasma irradiation is 100 V or more and 180 V or less, The gas flow rate in the plasma irradiation is 40 sccm or more and 60 sccm or less, The plasma irradiation time in the plasma irradiation is 100 seconds or more and 700 seconds or less, electricity ＳｉＯ２ The layer comprising is formed by vapor deposition, The surface treatment agent has the following formula (1'): R Ｆ１ -X Ａ -R Ｓｉ (1’) [In the formula: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - or a fluoroalkyl group; Rf １ each occurrence independently represents a C which may be substituted by one or more fluorine atoms; １－１６ is an alkyl group; R Ｆ is independently at each occurrence a divalent fluoropolyether group; q, independently at each occurrence, is 0 or 1; R Ｓｉ is independently in each occurrence a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded; At least one R Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ are each independently a single bond or a divalent to decavalent organic group. In the above, R Ｓｉ is expressed by the following formula (S3): -SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ (S3) [In the formula: R ａ１ is independently at each occurrence -Z １ -SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ and Z １ is independently at each occurrence -(CH ２ ) ｚ１ -O-(CH ２ ) ｚ２ - and z1 is an integer from 0 to 6; z2 is an integer from 0 to 6; R ２１ is independently at each occurrence -Z １’ -SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ and Z １’ is independently at each occurrence an oxygen atom or a divalent organic group; Z １’ The structure written as ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) to R ２１’ is independently at each occurrence -Z １” -SiR ２２” ｑ１” R ２３” ｒ１” and Z １” is independently at each occurrence an oxygen atom or a divalent organic group; R ２２” is independently at each occurrence a hydroxyl group or a hydrolyzable group; R ２３” is independently at each occurrence a hydrogen atom or a monovalent organic group; q1″ is, independently at each occurrence, an integer from 0 to 3; r1″ is, independently at each occurrence, an integer from 0 to 3; and the sum of q1″ and r1″ is (SiR ２２” ｑ１” R ２３” ｒ１” ) units is 3; R ２２’ is independently at each occurrence a hydroxyl group or a hydrolyzable group; R ２３’ is independently at each occurrence a hydrogen atom or a monovalent organic group; p1' is, independently at each occurrence, an integer from 0 to 3; q1' is, independently at each occurrence, an integer from 0 to 3; r1' is, independently at each occurrence, an integer from 0 to 3; and the sum of p', q1' and r1' is (SiR ２１’ ｐ１’ R ２２’ ｑ１’ R ２３’ ｒ１’ ) units is 3; R ２２ is independently at each occurrence a hydroxyl group or a hydrolyzable group; R ２３ is independently at each occurrence a hydrogen atom or a monovalent organic group; p1 is independently at each occurrence an integer from 0 to 3; q1 is independently at each occurrence an integer from 0 to 3; r1 is independently at each occurrence an integer from 0 to 3; and the sum of p1, q1 and r1 is (SiR ２１ ｐ１ R ２２ ｑ１ R ２３ ｒ１ ) units is 3; R ｂ１ is independently at each occurrence a hydroxyl group or a hydrolyzable group; R ｃ１ is independently at each occurrence a hydrogen atom or a monovalent organic group; k1 is, independently at each occurrence, an integer from 0 to 3; l1 is, independently at each occurrence, an integer from 0 to 3; m1 is, independently at each occurrence, an integer from 0 to 3; and the sum of k1, l1 and m1 is (SiR ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ ) units, it is 3. The treatment method according to claim 1 , further comprising a fluorine-containing silane compound represented by the following group:

Images