Compound, composition, surface treatment agent, article, and method for producing article

Abstract

Provided is a new compound useful as a surface treatment agent capable of forming a surface treatment layer with excellent light resistance and abrasion resistance on a base material.　A compound represented by formula (1).　(1): T-O-(Si(R2)2-O)p-(SiR3R4-O)q-(SiR5R6-O)r-T, wherein: T is (R1)3Si-, a monovalent cyclic polysiloxane residue, or a monovalent cage polysiloxane residue; R1 is a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group; R2, R3, and R5 are hydrogen atoms or hydrocarbon groups; R4 is -L1-Si(R)nL3-n; L1 is -O- or an alkylene group; R is a hydrocarbon group; L is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; R6 is a predetermined group; n is an integer of 0-2; p is a number of 1 or more; q is a number of 2 or more; r is a number of 0 or more; and s is a number of 1 or more.

Description

Compound, composition, surface treatment agent, article, and method for manufacturing article

[0001] The present disclosure relates to compounds, compositions, surface treatments, articles, and methods for making articles.

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Documents 1 and 2 describe silane compounds having specific siloxane groups that are used in the above-mentioned surface treatment agents.

[0004] International Publication No. 2023 / 017830 International Publication No. 2021 / 187184

[0005] On the other hand, when a surface treatment layer was formed using the silane compound described in Patent Document 1, it was found that further improvement was required in the light resistance of the surface treatment layer that was formed. Also, when a surface treatment layer was formed using the silane compound described in Patent Document 2, it was found that further improvement was required in the abrasion resistance of the surface treatment layer that was formed.

[0006] The present disclosure has been made in consideration of these circumstances, and the problem to be solved by one embodiment of the present invention is to provide novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer having excellent light resistance and abrasion resistance on a substrate.The problem to be solved by one embodiment of the present invention is to provide a surface treatment agent capable of forming a surface treatment layer having excellent light resistance and abrasion resistance on a substrate.The problem to be solved by one embodiment of the present invention is to provide an article having a surface treatment layer having excellent light resistance and abrasion resistance, and a method for producing the article.

[0007] The present disclosure includes the following aspects: [1] A compound represented by formula (1): TO—(Si(R ２ ) ２ -O) ｐ -(SiR ３ R ４ -O) ｑ -(SiR５ R ６ -O) ｒ -T (1) Each T is independently (R １ ) ３ Si—, a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue, R １ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group, and R ２ , R ３ and R ５ are each independently a hydrogen atom or a hydrocarbon group, R ４ Is, -L １ -Si(R) ｎ L ３－ｎ and L １ is —O— or an alkylene group; each R is independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ , or —O—Si(R ９ ) ３ and R ７ are each independently a hydrogen atom or a hydrocarbon group, R ８ and R ９ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group, n is an integer of 0 to 2, p is a number of 1 or more, q is a number of 2 or more, r is a number of 0 or more, and s is a number of 1 or more. [2] The compound according to [1] above, wherein p is a number of 2 to 600. [3] The compound according to [1] or [2] above, wherein q is a number of 2 to 30. [4] r is a number of 1 or more, and R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ R for r ６ is -O-(Si(R ７ ) ２-O) ｓ -Si(R ８ ) ３

[0023] The compound according to any one of [1] to [3] above, wherein the ratio of the number of repeating units represented by the formula (I) to the number of repeating units represented by the formula (I) is 0.2 to 0.8. [5] A composition comprising the compound according to any one of [1] to [4] above and a liquid medium. [6] A surface treatment agent comprising the compound according to any one of [1] to [4] above. [7] A surface treatment agent comprising the compound according to any one of [1] to [4] above and a liquid medium. [8] A method for producing an article, comprising treating a substrate with the surface treatment agent according to [6] above to produce an article having a surface treatment layer formed on the substrate. [9] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to [6] above.

[10] The article according to [9] above, which is an optical member.

[11] The article according to

[10] above, which is a display or a touch panel.

[12] A method for manufacturing an article, comprising: surface-treating a substrate using the surface treatment agent described in [7] above; and manufacturing an article having a surface-treated layer formed on the substrate.

[13] An article comprising a substrate and a surface-treated layer disposed on the substrate and surface-treated with the surface treatment agent described in [7] above.

[14] The article described in

[13] above, which is an optical member.

[15] The article described in

[14] above, which is a display or a touch panel.

[0008] According to one embodiment of the present invention, there are provided novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer having excellent light resistance and abrasion resistance on a substrate. According to one embodiment of the present invention, there is provided a surface treatment agent capable of forming a surface treatment layer having excellent light resistance and abrasion resistance on a substrate. According to one embodiment of the present invention, there are provided an article having a surface treatment layer having excellent light resistance and abrasion resistance, and a method for producing the article.

[0009] In the present specification, when a numerical range is indicated using "to", the numerical values ​​before and after "to" are included as the minimum and maximum values, respectively. In the numerical ranges described in stages in the present specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Furthermore, in the numerical ranges described in the present specification, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In the present specification, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In the present specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In the present specification, Me means a methyl group, and Et means an ethyl group.

[0010] [Compound] The compound of the present disclosure is a compound represented by formula (1) described below. When the compound of the present disclosure is used, a surface treatment layer excellent in light resistance and abrasion resistance can be formed. The reason for this is unclear, but is presumed as follows. In the compound of the present disclosure, each unit of the compound is bonded by a siloxane bond, which has a relatively high bond energy, and therefore it is thought that a surface treatment layer excellent in light resistance can be formed. Furthermore, in formula (1) described below, there are two or more repeating units containing a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and therefore it is thought that a surface treatment layer excellent in abrasion resistance can be formed.

[0011] The compounds of the present disclosure will be described in detail below.

[0012] The compound of the present disclosure is a compound represented by the following formula (1): TO—(Si(R ２ ) ２ -O) ｐ -(SiR ３ R ４ -O) ｑ -(SiR ５ R ６ -O) ｒ -T (1) Each T is independently (R １ ) ３Si—, a monovalent cyclic polysiloxane residue, or a monovalent cage-like polysiloxane residue, R １ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group, and R ２ , R ３ and R ５ are each independently a hydrogen atom or a hydrocarbon group, R ４ Is, -L １ -Si(R) ｎ L ３－ｎ and L １ is —O— or an alkylene group; each R is independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ , or —O—Si(R ９ ) ３ and R ７ are each independently a hydrogen atom or a hydrocarbon group, R ８ and R ９ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group, n is an integer of 0 to 2, p is a number of 1 or more, q is a number of 2 or more, r is a number of 0 or more, and s is a number of 1 or more.

[0013] The numbers p, q, r, and s in formula (1) are each average values ​​calculated from data obtained by measuring the compound by nuclear magnetic resonance (NMR).

[0014] In formula (1), each T is independently １ ) ３ Si-, a monovalent cyclic polysiloxane residue, or a monovalent cage-like polysiloxane residue. T in formula (1) may be different from each other or may represent the same group.

[0015] R １Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred.

[0016] R １ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and still more preferably a methyl group.

[0017] Multiple R １ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0018] (R １ ) ３ Examples of the group represented by Si- include a methyldiethylsilyl group, a methylethylpropylsilyl group, a methylethylbutylsilyl group, a methyldipropylsilyl group, a methylpropylbutylsilyl group, a methyldibutylsilyl group, a dimethylethylsilyl group, a dimethylpropylsilyl group, a dimethylbutylsilyl group, a trimethylsilyl group, a triethylsilyl group, a tri-n-propylsilyl group, a tri-isopropylsilyl group, and a trialkylsilyloxy group having any of these groups. １ is preferably a trialkylsilyloxy group, more preferably a trimethylsilyloxy group or a triethylsilyloxy group.

[0019] The monovalent cyclic polysiloxane residue is preferably a group represented by formula (T1).

[0020]

[0021] In formula (T1), R ３each independently represents a hydrocarbon group, a hydrocarbon group having a substituent, or —O—SiR ５１ ３ where s is an integer of 1 to 4, and R ５１ are each independently a hydrocarbon group or a trialkylsilyloxy group, and * is a bonding position.

[0022] R ３ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group.

[0023] R ３ The alkyl group as one embodiment of the hydrocarbon group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 1 to 4. Specifically, R ３ The alkyl group represented by the formula (I) is preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an isobutyl group, or a heptyl group, and more preferably a methyl group.

[0024] R ３ Examples of the hydrocarbon group contained in the hydrocarbon group having a substituent represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the substituted alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 2 to 4.

[0025] R ３ Examples of the substituent in the hydrocarbon group having a substituent represented by the formula: include a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, a trifluoromethyl group, and —SiR ５２ ３ Examples of the group include a group represented by the following formula: ５２are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0026] R ５２ The hydrocarbon group represented by R ３ The hydrocarbon groups represented by R ５２ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8, still more preferably 1 to 4, and particularly preferably 1. The three alkyl groups contained in the trialkylsilyloxy group may be the same or different from each other.

[0027] The Three Rs ５２ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0028] R ３ -O-SiR ５１ ３ In the group represented by ５１ are each independently a hydrocarbon group or a trialkylsilyloxy group. ５１ The hydrocarbon group represented by R ３ The hydrocarbon groups represented by R ５１ The trialkylsilyloxy group represented by R ５２ Examples thereof include the same as the trialkylsilyloxy group represented by the following formula:

[0029] Multiple R ３ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0030] Examples of the monovalent cyclic polysiloxane residue include the following groups: * indicates a bonding position.

[0031]

[0032]

[0033] The monovalent cage-like polysiloxane residue is preferably a group represented by formula (T2).

[0034]

[0035] In formula (T2), R ４ are each independently a hydrocarbon group or a trialkylsilyloxy group, and * indicates the bonding position.

[0036] R ４ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group or a branched alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or an isobutyl group is more preferred, and an isobutyl group is even more preferred.

[0037] R ４ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and still more preferably a methyl group.

[0038] Multiple R ４ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0039] Examples of the monovalent cage-like polysiloxane residue include the following groups: * indicates a bonding site.

[0040]

[0041] In formula (1), R ２ , R ３ and R ５ are each independently a hydrogen atom or a hydrocarbon group. ２ , R ３ and R ５ The hydrocarbon group represented by R １Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred. R ２ , R ３ and R ５ The number of carbon atoms in R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2. ２ , R ３ and R ５ may be the same group or different groups.

[0042] In formula (1), p is a number of 1 or more. p is preferably a number from 2 to 600, more preferably a number from 3 to 500, still more preferably a number from 4 to 50, particularly preferably a number from 5 to 30, and most preferably a number from 6 to 25.

[0043] In formula (1), -(Si(R ２ ) ２ Specific examples of the repeating unit represented by —O)— include the following.

[0044]

[0045] In formula (1), R ４ Is, -L １ -Si(R) ｎ L ３－ｎ The plurality of R present in formula (1) ４ may be the same or different from each other.

[0046] R ４ Medium, L １ is —O— or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 60, more preferably 1 to 40, and even more preferably 1 to 30. The number of carbon atoms in the alkylene group may be 1 to 10, 1 to 5, 1 to 3, or 1 or 2. L １ As the group, —O— is preferred from the viewpoint of better light resistance.

[0047] R４ In the formula, R is each independently a hydrocarbon group. Examples of the hydrocarbon group represented by R include R １ Examples of the hydrocarbon groups include those represented by the following formula:

[0048] R ４ In the formula, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group upon hydrolysis. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH upon hydrolysis. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0049] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, and isocyanato groups (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0050] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0051] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. L is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, from the viewpoint of less outgassing during coating and better storage stability of the compound.

[0052] R ４ wherein n is each independently an integer of 0 to 2. n is preferably 0 or 1, and more preferably 0. The presence of a plurality of Ls strengthens the adhesion of the surface treatment layer to the substrate. When n is 1 or less, the plurality of Ls present in one molecule may be the same or different from each other. From the viewpoint of the ease of availability of raw materials and the ease of production of the compound, it is preferable that the plurality of Ls are the same. When n is 2, the plurality of Rs present in one molecule may be the same or different from each other. From the viewpoint of the ease of availability of raw materials and the ease of production of the compound, it is preferable that the plurality of Rs are the same.

[0053] In formula (1), q is a number of 2 or more. In order to improve the abrasion resistance of the surface treatment layer, q is preferably a number from 2 to 30, more preferably a number from 3 to 20, still more preferably a number from 4 to 15, and particularly preferably a number from 4 to 10. ３ R ４ —O] may be the same or different from each other.

[0054] In formula (1), -(SiR ３ R ４ Specific examples of the repeating unit represented by —O)— include the following.

[0055]

[0056] In formula (1), R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ , or —O—Si(R ９ ) ３ is.

[0057] R ６ Medium, R ７are each independently a hydrogen atom or a hydrocarbon group. ７ As for R １ Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred. R ７ The number of carbon atoms is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0058] R ８ and R ９ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group. ８ The hydrocarbon group represented by R ７ In a preferred embodiment, the hydrocarbon group represented by R ７ The same as: ８ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same. ９ The hydrocarbon group represented by R ７ Examples of hydrocarbon groups include those represented by the following formula: ８ may be the same or different from each other. ９ is a hydrocarbon group, R ９ Two of the hydrocarbon groups represented by R ７ It is preferable that one hydrocarbon group is a linear alkyl group having 2 to 30 carbon atoms or a branched alkyl group having 2 to 30 carbon atoms. When the one hydrocarbon group is a linear alkyl group or a branched alkyl group, the number of carbon atoms is preferably 3 to 30, and more preferably 4 to 20. R ８ and R ９ The trialkylsilyloxy group represented by the formula (R １ ) ３ A group in which —O— is linked to the bond of Si— ((R １ ) ３Examples include groups represented by the formula: Si—O—.

[0059] R ６ In this formula, s is a number of 1 or more. In order to improve the fingerprint resistance of the surface treatment layer, s is preferably a number of 2 to 40, more preferably a number of 3 to 30, still more preferably a number of 4 to 25, and particularly preferably a number of 5 to 20. ７ ) ２ —O] may be the same or different from each other.

[0060] In formula (1), r is a number equal to or greater than 0. In order to provide a surface treatment layer with better fingerprint resistance, r is preferably a number equal to or greater than 1, more preferably a number from 1 to 20, more preferably a number from 2 to 15, even more preferably a number from 2 to 10, and particularly preferably a number from 2 to 5. When r is a number equal to or greater than 1, in terms of fingerprint resistance, R ６ At least one of the following is —O—(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ When r is a number of 1 or more, it is also preferable that R ６ At least one of the following is —O—Si(R ９ ) ３ In addition, when r is a number of 1 or more, the ratio of R to r is preferably 1 or more, in terms of better light resistance. ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ It is also preferred that the ratio of the number of repeating units of [SiR ５ R ６ When r is a number of 2 or more, at least one R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ and at least one R ６is —O—Si(R ９ ) ３ It is also preferable that:

[0061] In formula (1), -(SiR ５ R ６ Specific examples of the repeating unit represented by —O)— include the following. In the following repeating units, s is defined as above. In addition, in the following repeating units, t represents an integer of 0 to 28.

[0062]

[0063] In formula (1), the same type of repeating units may be bonded consecutively, different types of repeating units may be bonded alternately, or each repeating unit may be bonded in a random order. From the viewpoint of being more excellent in one or more of light fastness, abrasion resistance, and fingerprint resistance, the compound represented by formula (1) is preferably an alternating copolymer in which different types of repeating units are bonded alternately, or a random copolymer in which each repeating unit is bonded in a random order.

[0064] The number average molecular weight (Mn) of the compound of the present disclosure is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. When Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. When Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range and solubility is improved, resulting in excellent handleability during film formation.

[0065] [Composition] The composition of the present disclosure may contain the compound of the present disclosure, and components other than the compound of the present disclosure are not particularly limited. The composition of the present disclosure preferably contains the compound of the present disclosure and a liquid medium. When a liquid medium is contained, the composition of the present disclosure may be in a liquid state, and may be a solution or a dispersion. The composition of the present disclosure may contain the compound of the present disclosure, and may contain impurities such as by-products produced in the manufacturing process of the compound of the present disclosure.

[0066] The content of the compound of the present disclosure is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the compound of the present disclosure is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, relative to the total amount of the composition of the present disclosure. The composition of the present disclosure may contain only one type of liquid medium, or two or more types.

[0067] The liquid medium is preferably an organic solvent.

[0068] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, the organic solvent is preferably a hydrocarbon organic solvent or an ester organic solvent.

[0069] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of the ester-based organic solvent include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol diacetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol. Examples of the glycol monopropyl ether include glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0070] In addition, examples of the organic solvent include halogen-based organic solvents, fluorine-containing organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds other than the compounds of the present disclosure.

[0071] Specific examples of halogen-containing organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane. Specific examples of fluorine-containing organic solvents include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３) (e.g., Novec™ 7000 manufactured by Sumitomo 3M Co.), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co.), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec™ 7200 manufactured by Sumitomo 3M Co.), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Co.), where the perfluoroalkyl group and the alkyl group may be linear or branched, and CF ３ CH ２ OCF ２ CHF ２ (e.g., Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (e.g., 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (e.g., Amorea (registered trademark) AS-300 manufactured by AGC Corporation)). Examples of nitrogen-containing compounds include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone. Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide. Examples of siloxane compounds other than the compounds of the present disclosure include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0072] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, based on the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99 mass%, more preferably 95 to 99.98 mass%, even more preferably 97 to 99.97 mass%, and particularly preferably 98 to 99.95 mass%, based on the total amount of the composition of the present disclosure.

[0073] The composition of the present disclosure may contain other components in addition to the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include additives, and specific examples include catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0074] Examples of the catalyst that can be used include any appropriate acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, and nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, and urea compounds). Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0075] Other components also include metal compounds having a hydrolyzable group (hereinafter also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include metal compounds represented by any of formulas (M1) to (M3).

[0076] M (X ｂ１ ) ｍ１ (X ｂ２ ) ｍ２ (X ｂ３ ) ｍ３ ... (M1) Si (X ｂ４ ) (Xｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0077] In formula (M1), M is a trivalent or tetravalent metal atom, and X ｂ１ are each independently a hydrolyzable group, ｂ２ are each independently a siloxane skeleton-containing group, ｂ３ are each independently a hydrocarbon chain-containing group, m1 is an integer of 2 to 4, m2 and m3 are each independently an integer of 0 to 2, and when M is a trivalent metal atom, m1 + m2 + m3 is 3, and when M is a tetravalent metal atom, m1 + m2 + m3 is 4.

[0078] In formula (M2), X ｂ４ is a hydrolyzable silane oligomer residue, and X ｂ５ are each independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0079] In formula (M3), X ｂ６ and X ｂ７ are each independently a hydrolyzable group or a hydroxyl group, and Y ｂ１ is a divalent organic group.

[0080] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0081] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (1) has the same meaning as the hydrolyzable group represented by L in the formula (1), and the preferred embodiments are also the same.

[0082] X ｂ２The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be either linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The upper limit of the number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include *-(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0083] X ｂ３ The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be linear or branched, with linear being preferred. The hydrocarbon chain may be saturated or unsaturated, with saturated hydrocarbon chain being preferred. The hydrocarbon chain-containing group preferably has 1 to 3 carbon atoms, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0084] Preferably, m1 is 3 or 4.

[0085] The compound represented by formula (M1) is preferably a compound represented by any one of formulas (M1-1) to (M1-5) in which M is Si, and more preferably a compound represented by formula (M1-1). The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0086] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0087] In formula (M2), X ｂ４ The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group or an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O-*, etc. Here, * represents a bonding site with an adjacent atom.

[0088] In formula (M2), X ｂ５ Examples of the hydrolyzable group represented by X include the same hydrolyzable group represented by L in the above formula (1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. ｂ５ As the group, a hydrolyzable group is preferred.

[0089] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0090] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and X ｂ７ Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group or an isocyanato group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group or an ethoxy group is more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0091] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms.２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH ２ CH ２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) - and -C ６ H ４ - are listed.

[0092] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３, (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , and (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0093] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0094] The total content of the compound of the present disclosure and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass of the composition before heating and the mass after heating for 4 hours in a convection dryer at 120°C.

[0095] The composition of the present disclosure contains a liquid medium, and is therefore useful for coating applications and can be used as a coating liquid.

[0096] In addition to Compound 1 and the liquid medium, the composition of the present disclosure may contain other components other than Compound 1 and the liquid medium, as long as the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of hydrolyzable silyl groups. The content of other components in the composition of the present disclosure is preferably 10% by mass or less, more preferably 1% by mass or less.

[0097] The other components include a compound represented by the following formula (2): [Y １ ３ Y ２ -(O) ｓ１ -Y ３ ] ｓ２ Y ４ (Si(Y ５ ) ｓ３ (Y ６ ) ３－ｓ３ ) ｓ４ ...(2) In formula (2), Y ２ is Si, Sn, or Ge, and Y １ are each independently a hydrocarbon group or a trialkylsilyloxy group, s1 is 0 or 1, and Y ３ are each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue; Y ４ represents a single bond or an (s2+s4)-valent linking group, ５ are each independently a hydrocarbon group; ６ are each independently a hydrolyzable group or a hydroxyl group; s3 are each independently an integer of 0 to 2; and s2 and s4 are each independently an integer of 1 or more.

[0098] Compound (2) includes Y ３ is an alkylene chain or a polyalkylene oxide chain. Specific examples of compound (2) include the following compounds: In the formula, α is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0099]

[0100] When the other component in the composition of the present disclosure is compound (2), the content of compound (2) is preferably 50% by mass or less, more preferably 40% by mass or less.

[0101] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure contains the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may contain the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent of the present disclosure is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0102] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0103] The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure contains a reactive silyl group (Si(R) ｎ L ３－ｎ )) is contained in a state in which hydrolysis of part or all of the silanol groups has progressed and dehydration condensation reaction of the silanol groups has progressed.

[0104] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0105] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0106] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0107] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0108] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0109] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0110] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0111] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0112] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0113] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0114] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0115] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0116] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0117] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0118] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0119] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0120] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0121] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0122] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0123] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0124] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0125] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly alternately depositing them in separate boats. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0126] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0127] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0128] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0129] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0130] The content of the liquid medium is preferably 0.01 to 20% by mass, more preferably 0.1 to 10% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0131] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0132] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0133] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0134] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0135] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0136] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0137] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0138] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0139] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0140] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0141] The present invention will be explained in more detail below using examples, but the present invention is not limited to these examples.

[0142] [Synthesis of Compound A1] Tetramethoxysilane (13 g) and toluene (10 g) were added to 3.0 g of trimethylsilyl-terminated poly(dimethylsiloxane-co-methylhydrosiloxane) (Aldrich product, product number: 482196), and the mixture was stirred until homogeneous. Thereafter, tris(pentafluorophenyl)borane (0.06 g) was added, and the mixture was stirred at 25°C for 2 hours. Low-boiling point components were removed by distillation to obtain 5.8 g of Compound A1 having the following structure. The structure of Compound A1 was confirmed by the following NMR data. In the formula below, "Me" represents a methyl group. In addition, in the formula below, the bonding order of the repeating units is random. The same applies to the notation of "Me" and the number of repeating units in the formulas of the following examples.

[0143]

[0144] 1 ​H-NMR (400MHz, CDCl3): δ3.73-3.03(m,63H),0.31-0.37(m,81H).

[0145] [Synthesis of Compound A2] Tetrahydrofuran (THF) (101 g) was added to hexamethylcyclotrisiloxane (76 g) and stirred until dissolved. Then, a solution of lithium trimethylsilanol salt (5.1 g) suspended in THF (20 g) was added and stirred at 25°C for 2 hours. Thereafter, chlorodimethylsilane (10.5 g) was added and stirred at 25°C for 1 hour. After adding hexane and water for extraction, the solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 25 g of Compound A2 having the following structure. In Compound A2, the average value of n was 17. The structure of Compound A2 was confirmed by the following NMR data.

[0146]

[0147] 1 H-NMR (400MHz, CDCl3): δ4.63 (hept, J=2.8Hz, 1H), 0.21-0.08 (m, 6H), 0.07-0.12 (m, 111H).

[0148] [Synthesis of Compound A3] Dichloromethane (100 g) and trichloroisocyanuric acid (14 g) were added to Compound A2 (10 g), and the mixture was stirred at 25°C for 3 hours. Thereafter, the reaction solution was filtered to remove insoluble matter, and the filtrate was then distilled off to remove low-boiling components. Methanol (30 g) was added to the obtained crude liquid, and the mixture was stirred at 60°C for 2 hours. After stirring, hexane and water were added for extraction, and the low-boiling components were distilled off to remove the low-boiling components. The obtained crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), and 5.2 g of Compound A3 was obtained. The average value of n in Compound A3 was 17. The structure of Compound A3 was confirmed by the following NMR data.

[0149]

[0150] 1 ​​H-NMR (400MHz, CDCl3): δ3.46(s,3H),0.32-0.05(m,118H).

[0151] [Synthesis of Compound A4] Compound A3 (11 g) and toluene (10 g) were added to trimethylsilyl-terminated poly(dimethylsiloxane-co-methylhydrosiloxane) (3.0 g, Aldrich product, product number: 482196) and stirred until homogenous. Tris(pentafluorophenyl)borane (0.06 g) was then added and stirred at 25°C for 2 hours. Thereafter, tetramethoxysilane (13 g) and tris(pentafluorophenyl)borane (0.06 g) were added and stirred at 25°C for 2 hours. After stirring, low-boiling point components were removed by distillation to obtain 16 g of Compound A4. The structure of Compound A4 was confirmed by the following NMR data.

[0152]

[0153] 1 H-NMR (400MHz, CDCl3): δ3.73-3.03(m,36H),0.31-0.37(m,432H).

[0154] [Synthesis of Compound A5] Dichloromethane (20 g) and chlorodimethylsilane (4.0 g) were added to 1-octadecene (5.0 g) and stirred until homogenous. After stirring, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg) was further added, and the mixture was stirred at 25°C for 24 hours. After stirring, low-boiling point components were removed by distillation, and then methanol (30 g) was added, and the mixture was stirred at 60°C for 2 hours. After stirring, hexane and water were added for extraction, and the low-boiling point components were removed by distillation. The obtained crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), yielding 4.2 g of Compound A5. The structure of Compound A5 was confirmed by the following NMR data.

[0155]

[0156] 1 ​​H-NMR (400MHz, CDCl3): δ3.40(s,3H),1.47-0.63(m,37H),0.08(s,6H).

[0157] [Synthesis of Compound A6] Compound A5 (3.0 g) and toluene (10 g) were added to 3.0 g of trimethylsilyl-terminated poly(dimethylsiloxane-co-methylhydrosiloxane) (Aldrich product, product number: 482196), and the mixture was stirred until homogeneous. After stirring, tris(pentafluorophenyl)borane (0.06 g) was added, and the mixture was stirred at 25°C for 2 hours. Thereafter, tetramethoxysilane (13 g) and tris(pentafluorophenyl)borane (0.06 g) were added, and the mixture was stirred at 25°C for 2 hours. After stirring, low-boiling point components were removed by distillation, yielding 6.3 g of Compound A6. The structure of Compound A6 was confirmed by the following NMR data.

[0158]

[0159] 1 H-NMR (400MHz, CDCl3): δ3.67-3.13(m,36H),1.45-0.54(m,111H),0.26-0.37(m,99H).

[0160] [Synthesis of Compound A7] Compound A5 (1.0 g), Compound A3 (7.0 g), and toluene (10 g) were added to trimethylsilyl-terminated poly(dimethylsiloxane-co-methylhydrosiloxane) (Aldrich product, product number: 482196) (3.0 g), and the mixture was stirred until homogeneous. After stirring, tris(pentafluorophenyl)borane (0.06 g) was added, and the mixture was stirred at 25°C for 2 hours. Thereafter, tetramethoxysilane (13 g) and tris(pentafluorophenyl)borane (0.06 g) were added, and the mixture was stirred at 25°C for 2 hours. After stirring, low-boiling point components were removed by distillation, yielding 12 g of Compound A7. The structure of Compound A7 was confirmed by the following NMR data.

[0161]

[0162] 1 ​​H-NMR (400MHz, CDCl3): δ3.67-3.13(m,36H),1.45-0.54(m,37H),0.36-0.38(m,321H).

[0163] [Compound C1] Compound C1 having the following structure was obtained with reference to the method described in WO 2023 / 017830.

[0164]

[0165] [Compound C2] Compound C2 having the following structure was obtained with reference to the method described in JP 2017-201010 A: In the following formula, n represents 9.

[0166]

[0167] [Production of Article] A substrate was surface-treated using the above-mentioned compound. The surface treatment method was a dry coating method. Chemically strengthened glass was used as the substrate.

[0168] Dry coating was performed using a vacuum deposition apparatus (product name "VTR-350M", manufactured by ULVAC). A 20% by mass ethyl acetate solution (0.5 g) of each compound was filled into a molybdenum boat in the vacuum deposition apparatus, and the pressure in the vacuum deposition apparatus was adjusted to 1×10 －３ The boat was evacuated to a pressure of 10 Pa or less. The boat was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate. The substrate on which the compound had been deposited was heat-treated at 200°C for 30 minutes, yielding an article having a surface-treated layer on the surface of the substrate.

[0169] [Evaluation] The water repellency and abrasion resistance of the articles obtained by the dry coating method were evaluated by the following methods.

[0170] <Water repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle. The evaluation criteria are as follows: A is a level that is not problematic in practical use. A: The water contact angle is 105° or more. B: The water contact angle is less than 105°.

[0171] <Abrasion Resistance> In accordance with JIS L0849:2013 (corresponding to ISO:105-X12:2001), the surface treatment layer of the article was subjected to a reciprocating traverse test using a reciprocating traverse tester (manufactured by KNT Corporation) with steel wool Bonstar (#0000) reciprocating 10,000 times at a pressure of 98.07 kPa and a speed of 320 cm / min, and the water contact angle after the friction test was measured. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the above-mentioned water repellency evaluation method. Abrasion resistance was evaluated based on the degree of decrease in water contact angle after the friction test. The smaller the degree of decrease in water contact angle, the more excellent the abrasion resistance. The evaluation criteria are as follows: A and B are levels that are acceptable for practical use. Degree of decrease in water contact angle = (initial water contact angle) - (water contact angle after friction test) A: The degree of decrease in water contact angle was 3.0° or less. B: The degree of decrease in water contact angle was more than 3.0° and 5.0° or less. C: The degree of decrease in the water contact angle was more than 5.0° and 10.0° or less. D: The degree of decrease in the water contact angle was more than 10.0°.

[0172] <Fingerprint Resistance> First, a 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp was prepared. Next, 70 μL of artificial fingerprint fluid (manufactured by Isekyu Co., Ltd.) was dropped onto a rag, and the rag was brought into contact with the fingerprint stamp, allowing the fingerprint stamp to adhere to the artificial fingerprint fluid for 1 minute. After the artificial fingerprint fluid was applied to the fingerprint stamp, the fingerprint stamp was attached to a new rag for 20 seconds to remove excess artificial fingerprint fluid from the fingerprint stamp. Subsequently, an article with a surface treatment layer formed thereon was placed on a hot plate adjusted to 23°C, and the fingerprint stamp was stamped against the surface treatment layer. The article with the artificial fingerprint fluid attached was placed in a sliding device (product name "HHS-2000," manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and then placed in the sliding device. The artificial fingerprint liquid adhering to the surface treatment layer was wiped off in one direction with a wiping cloth under a load of 100 g. The haze of the wiped area was measured using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.) to evaluate fingerprint resistance. The evaluation criteria are as follows: A is a level that is practically acceptable. A: The haze value is less than 0.1%. B: The haze value is 0.1% or more.

[0173] <Lightfastness> The surface treatment layer of the article was irradiated with light (650 W / m2, 300-700 nm) for 500 hours at a black panel temperature of 63°C using a desktop xenon arc lamp accelerated lightfastness tester (SUNTEST XLS+: product name, manufactured by Toyo Seiki Seisakusho). The water contact angle of the surface treatment layer was then measured using the method described above. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the water repellency evaluation method described above. Lightfastness was evaluated based on the decrease in water contact angle after the friction test. The smaller the decrease in water contact angle, the more excellent the lightfastness. The evaluation criteria were as follows: A and B indicate levels that are acceptable for practical use. Decrease in water contact angle = (initial water contact angle) - (water contact angle after light irradiation). A: The decrease in water contact angle was 3.0° or less. B: The decrease in water contact angle was more than 3.0° and 5.0° or less. C: The decrease in the water contact angle was more than 5.0°.

[0174] The evaluation results are shown in Table 1.

[0175] Examples 1 to 4 are working examples, and Examples 5 and 6 are comparative examples.

[0176]

[0177] As shown in Table 1, it was found that the compounds of Examples 1 to 4 can form a surface treatment layer excellent in abrasion resistance and light resistance. On the other hand, it was found that the compound of Example 5 has poor light resistance. Also, it was found that the compound of Example 6 has poor abrasion resistance. Furthermore, a comparison between Example 1 and Example 2 confirmed that when r in the above formula (1) is a number of 1 or more, the fingerprint resistance is superior. A comparison between Example 2 and Examples 3 and 4 confirmed that when r in the above formula (1) is a number of 1 or more and R ６ is —O—Si(R ９ ) ３ It was confirmed that the abrasion resistance was superior when the repeating unit represented by the formula (1) was contained. ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ and for r, R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ It has been confirmed that when the ratio of the number of repeating units is 0.2 to 0.8, the abrasion resistance, fingerprint resistance, and light resistance are superior.

[0178] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, and rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the surface treatment agents can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and antireflection films.

[0179] This application claims priority based on Japanese Patent Application No. 2023-103333, filed on June 23, 2023, the disclosure of which is incorporated herein in its entirety.

Claims

1. A compound represented by formula (1): T-O-(Si(R ２ ) ２ -O) ｐ -(SiR ３ R ４ -O) ｑ -(SiR ５ R ６ -O) ｒ -T (1) Each T is independently (R １ ) ３ Si-, a monovalent cyclic polysiloxane residue or a monovalent cage-shaped polysiloxane residue; R １ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group; R ２ , R ３ and R ５ are each independently a hydrogen atom or a hydrocarbon group; R ４ Is, -L １ -Si(R) ｎ L ３－ｎ And L １ is -O- or an alkylene group; each R is independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ Or -O-Si(R ９ ) ３ And R ７ are each independently a hydrogen atom or a hydrocarbon group; R ８ and R ９ are each independently a hydrogen atom, a hydrocarbon group, or a trialkylsilyloxy group, n is an integer from 0 to 2, p is a number of 1 or more, q is a number of 2 or more, r is a number of 0 or more, and s is a number of 1 or more.

2. The compound according to claim 1, wherein p is a number from 2 to 600.

3. The compound according to claim 1, wherein q is a number from 2 to 30.

4. r is a number equal to or greater than 1, and R ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ R for r ６ is -O-(Si(R ７ ) ２ -O) ｓ -Si(R ８ ) ３ The compound according to claim 1, wherein the ratio of the number of repeating units is from 0.2 to 0.

8.

5. A composition comprising a compound according to any one of claims 1 to 4 and a liquid medium.

6. A surface treatment agent comprising the compound according to any one of claims 1 to 4.

7. A surface treatment agent comprising the compound according to any one of claims 1 to 4 and a liquid medium.

8. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 6; and manufacturing an article having a surface treatment layer formed on the substrate.

9. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 6.

10. The article of claim 9 which is an optical component.

11. The article according to claim 10, which is a display or a touch panel.

12. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 7; and manufacturing an article having a surface treatment layer formed on the substrate.

13. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 7.

14. The article of claim 13 which is an optical component.

15. The article according to claim 14, which is a display or a touch panel.