Display panel and display apparatus

Abstract

The present disclosure provides a display panel and a display apparatus. The display panel comprises: a substrate layer (100) and a touch electrode layer (300). A plurality of sub-pixel structures (200) are provided on one side of the substrate layer (100). The touch electrode layer (300) comprises a first electrode layer (310), a touch insulating layer (320) and a second electrode layer (330) which are stacked. The orthographic projection of the second electrode layer (330) on the substrate layer (100) covers the orthographic projection of the touch insulating layer (320) on the substrate layer (100), the edge of the orthographic projection of the second electrode layer (330) on the substrate layer (100) surrounds the edge of the orthographic projection of the touch insulating layer (320) on the substrate layer (100), or the edge of the orthographic projection of the second electrode layer (330) on the substrate layer (100) at least partially coincides with the edge of the orthographic projection of the touch insulating layer (320) on the substrate layer (100).

Description

Display panel and display device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application No. 202310729185.9 filed on June 19, 2023, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present disclosure relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0004] At present, with the continuous development of display technology, OLED (Organic Light-Emitting Diode) is being used more and more widely in flexible display technology. Flexible OLED display panels can be used in folding screens, scroll screens and other display screen technologies that can be bent or bent. In order to thin the display screen, the original external film material will be integrated into a thin film inside the flexible display panel. In order to improve the display effect of the display panel, some optical film layers will also be added inside the flexible display panel. With the increase of the number of integrated film layers inside the display panel, high-temperature baking or other high-temperature process flows will increase, which will easily cause the stress concentration of some inorganic layers to increase. The risk of fracture of the stress-concentrated film under external force increases. Combined with the bending of the film layer of the flexible display panel, the drop reliability of the display panel will be greatly reduced, and the product yield will be reduced.

[0005] Summary of the Invention

[0006] Some embodiments of the present disclosure provide a display panel and a display device, which can improve the stress concentration problem in the display panel, thereby improving the drop reliability of the display panel and improving product yield.

[0007] In a first disclosed aspect, a display panel is provided, comprising: a substrate layer, a plurality of sub-pixel structures being disposed on one side of the substrate layer; and a touch electrode layer disposed on a side of the sub-pixel structures away from the substrate layer. The touch electrode layer comprises a plurality of first hollows, the orthographic projections of the first hollows on the substrate layer overlapping the orthographic projections of the sub-pixel structures on the substrate layer. The touch electrode layer comprises a first electrode layer, a touch insulating layer, and a second electrode layer, which are stacked together. The touch insulating layer is disposed between the first electrode layer and the second electrode layer, and the second electrode layer is disposed on a side of the touch insulating layer away from the substrate layer. The orthographic projection of the second electrode layer on the substrate layer overlaps the orthographic projection of the touch insulating layer on the substrate layer, and an edge of the orthographic projection of the second electrode layer on the substrate layer surrounds an edge of the orthographic projection of the touch insulating layer on the substrate layer, or an edge of the orthographic projection of the second electrode layer on the substrate layer at least partially overlaps an edge of the orthographic projection of the touch insulating layer on the substrate layer.

[0008] In combination with the first aspect of the present disclosure, in some embodiments, the orthographic projection of the touch insulation layer on the substrate layer covers the orthographic projection of the first electrode layer on the substrate layer, the edge of the orthographic projection of the touch insulation layer on the substrate layer surrounds the edge of the orthographic projection of the first electrode layer on the substrate layer, or the edge of the orthographic projection of the touch insulation layer on the substrate layer at least partially overlaps with the edge of the orthographic projection of the first electrode layer on the substrate layer.

[0009] In combination with the first aspect of the present disclosure, in some embodiments, the orthographic projection of the second electrode layer on the substrate layer covers the orthographic projection of the first electrode layer on the substrate layer, the edge of the orthographic projection of the second electrode layer on the substrate layer surrounds the edge of the orthographic projection of the first electrode layer on the substrate layer, or the edge of the orthographic projection of the second electrode layer on the substrate layer at least partially overlaps with the edge of the orthographic projection of the first electrode layer on the substrate layer.

[0010] In combination with the first aspect of the present disclosure, in some embodiments, the touch electrode layer includes multiple sensing areas, the touch insulation layer of each sensing area includes at least one jumper via, and the first electrode layer and the second electrode layer of the same sensing area are electrically connected through at least one jumper via.

[0011] In conjunction with the first aspect of the present disclosure, in some embodiments, the display panel further comprises: a cover insulating layer disposed on a side of the touch electrode layer away from the substrate layer; and a filter layer disposed on a side of the cover insulating layer away from the substrate layer. The cover insulating layer has a thickness greater than or equal to 0, is made of an organic material, and a process temperature range for preparing the cover insulating layer overlaps with a process temperature range that the pixel structure can withstand.

[0012] In conjunction with the first aspect of the present disclosure, in some embodiments, the display panel further includes an encapsulation layer disposed between the sub-pixel structure and the touch electrode layer. The encapsulation layer includes a first inorganic layer, a first organic layer, and a second inorganic layer stacked together, with the first organic layer disposed between the first and second inorganic layers. When the thickness of the cover insulating layer is greater than 0, the thickness of the first organic layer is less than or equal to 8 μm.

[0013] In combination with the first aspect of the present disclosure, in some embodiments, the thickness of the covering insulating layer is greater than or equal to 1 μm; and / or the thickness range of the first organic layer is greater than or equal to 6 μm; and / or the process temperature for preparing the covering insulating layer is less than or equal to 150°C; and / or the process temperature that the sub-pixel structure can withstand is less than or equal to 120°C.

[0014] In combination with the first aspect of the present disclosure, in some embodiments, the thickness of the covering insulating layer ranges from 1 μm to 3 μm; and / or the pixel structure includes a light-emitting layer, and the light-emitting layer can withstand a process temperature less than or equal to 120°C; and / or the baking process temperature for preparing the covering insulating layer is less than or equal to 85°C.

[0015] In combination with the first aspect of the present disclosure, in some embodiments, the thickness of the covering insulating layer ranges from 1.2 μm to 1.5 μm; and / or the elongation at break of the film layer of the covering insulating layer is greater than or equal to 57‰; and / or the elongation at break of the organic material of the covering insulating layer is greater than 6%; and / or the adhesion of the filter layer on the covering insulating layer is greater than 5B, where B represents that the adhesion test mode is cohesive failure; and / or the visible light transmittance of the covering insulating layer is greater than or equal to 95%.

[0016] In conjunction with the first aspect of the present disclosure, in some embodiments, the display panel further comprises: an organic planarization layer disposed on a side of the filter layer away from the substrate layer. The process temperature range for preparing the organic planarization layer overlaps with the process temperature range that the sub-pixel structure can withstand.

[0017] In combination with the first aspect of the present disclosure, in some embodiments, the filter layer includes a light-shielding layer, the light-shielding layer includes multiple second hollows, a color filter film is arranged in the second hollows, the orthographic projection of the second hollows on the substrate layer covers the orthographic projection of the sub-pixel structure on the substrate layer, and the orthographic projection of the light-shielding layer on the substrate layer covers the orthographic projection of the touch electrode layer on the substrate layer; when the thickness of the covering insulating layer is equal to 0, the light-shielding layer is directly connected to the touch electrode layer, and the light-shielding layer and the touch electrode layer are insulated from each other.

[0018] In combination with the first aspect of the present disclosure, in some embodiments, the light-shielding layer is doped with an insulating material, and the insulating material includes acrylic resin and / or epoxy resin.

[0019] In combination with the first aspect of the present disclosure, in some embodiments, the orthographic projection of each first hollowing out on the substrate layer covers the orthographic projection of at least one second hollowing out on the substrate layer.

[0020] In a second aspect of the present disclosure, a display device is provided, comprising the display panel according to the first aspect of the present disclosure. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] FIG1 is a schematic partial structural diagram of a display panel according to some embodiments of the present disclosure;

[0022] FIG2 is a schematic diagram of a partial pixel arrangement of a display panel according to some embodiments of the present disclosure;

[0023] FIG3 is a schematic partial structural diagram of a display panel according to some other embodiments of the present disclosure;

[0024] FIG4 is a schematic structural diagram of a touch electrode layer according to some embodiments of the present disclosure;

[0025] FIG5 is a schematic partial structural diagram of some other embodiments of the present disclosure;

[0026] FIG6 is a schematic diagram of a partial structure of a sensing area of ​​a display panel according to some embodiments of the present disclosure;

[0027] FIG7 is a schematic partial structural diagram of a display panel according to some further embodiments of the present disclosure;

[0028] FIG8 is a schematic diagram of a partial structure of a display panel according to some other embodiments of the present disclosure; and

[0029] FIG9 is a schematic structural diagram of a display device according to some embodiments of the present disclosure. DETAILED DESCRIPTION

[0030] In order to better understand the technical solutions provided by the embodiments of the present disclosure, the technical solutions of the embodiments of the present disclosure are described in detail below through the accompanying drawings and specific embodiments. It should be understood that the embodiments of the present disclosure and the specific features in the embodiments are detailed descriptions of the technical solutions of the embodiments of the present disclosure, rather than limitations on the technical solutions of the present disclosure. In the absence of conflict, the embodiments of the present disclosure and the technical features in the embodiments can be combined with each other.

[0031] In this article, relational terms such as first and second are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply the existence of any such actual relationship or order between these entities or operations. Moreover, the terms "comprise", "include" or any other variants thereof are intended to cover non-exclusive inclusion, so that the process, method, article or equipment comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or also include elements inherent to such process, method, article or equipment. In the absence of further restrictions, the elements defined by the statement "comprising a ..." do not exclude the presence of other identical elements in the process, method, article or equipment comprising the elements. The term "two or more" includes two or more than two cases.

[0032] At present, with the continuous development of display technology, the application of OLED in flexible display technology is becoming more and more extensive. Flexible OLED display panels can be applied to display technologies that can be bent or folded, such as folding screens and scroll screens. In order to thin the display screen, the original external film material will be integrated into the internal film of the flexible display panel, and in order to improve the display effect of the display panel, some optical film layers will also be added inside the flexible display panel. However, with the increase in the number of integrated film layers inside the display panel, the increase in high-temperature baking or other high-temperature process flows can easily cause increased stress concentration in some inorganic layers. The risk of fracture of the stress-concentrated film under the action of external force increases. Combined with the bending of the film layer of the flexible display panel, the drop reliability of the display panel will be greatly reduced, and the product yield will be reduced.

[0033] In view of this, some embodiments of the present disclosure provide a display panel and a display device, which can improve the stress concentration problem in the display panel, thereby improving the drop reliability of the display panel and improving product yield.

[0034] Some embodiments of the present disclosure provide a display panel. FIG1 is a schematic partial structural diagram of a display panel according to some embodiments of the present disclosure. As shown in FIG1 , the display panel includes: a substrate layer 100, a sub-pixel structure 200, and a touch electrode layer 300. A plurality of sub-pixel structures 200 are provided on one side of the substrate layer 100. The touch electrode layer 300 is provided on the side of the sub-pixel structure 200 away from the substrate layer 100. The touch electrode layer 300 includes a plurality of first hollows 301, and the orthographic projections of the first hollows 301 on the substrate layer 100 cover the orthographic projections of the sub-pixel structure 200 on the substrate layer 100. That is, the touch electrode layer 300 needs to avoid the light emitting area of ​​the sub-pixel structure 200, and the provision of the first hollows 301 can avoid the sub-pixel structure 200. The touch electrode layer 300 includes a first electrode layer 310, a touch insulating layer 320, and a second electrode layer 330 that are stacked. The touch insulation layer 320 is disposed between the first electrode layer 310 and the second electrode layer 330. The second electrode layer 330 is disposed on the side of the touch insulation layer 320 facing away from the substrate layer 100. The orthographic projection of the second electrode layer 330 on the substrate layer 100 overlaps the orthographic projection of the touch insulation layer 320 on the substrate layer 100. The edge of the orthographic projection of the second electrode layer 330 on the substrate layer 100 surrounds the edge of the orthographic projection of the touch insulation layer 320 on the substrate layer 100. In other words, it can be understood that the second electrode layer 330 completely covers the touch insulation layer 320 on the side of the touch insulation layer 320 facing away from the substrate layer 100. One of the first electrode layer 310 and the second electrode layer 330 can serve as a transmitting electrode, and the other can serve as a receiving electrode. The transmitting electrode can be used to transmit sensing signals, and the receiving electrode can be used to receive sensing feedback signals. The sensing signals and sensing feedback signals can be analyzed to determine touch location, thereby implementing touch functionality.

[0035] 1 , the sub-pixel structure 200 may include a red sub-pixel R, a green sub-pixel G, and a blue sub-pixel B. It should be noted that the sub-pixel structure 200 shown in FIG1 is merely illustrative and does not constitute a specific limitation of the present disclosure.

[0036] FIG2 is a schematic diagram of a schematic partial pixel arrangement of a display panel according to some embodiments of the present disclosure. As shown in FIG2 , the dotted line indicates the boundary of the touch insulating layer 320, and the boundary of the touch insulating layer 320 is surrounded by the boundary of the second electrode layer 330. As shown in FIG1 and FIG2 , a first hollow 301 corresponds to a sub-pixel structure 200. It should be noted that the pixel arrangement shown in FIG2 is only schematic and is not a specific limitation of the embodiments of the present disclosure. It should also be noted that, for the sake of clarity, the size of the sub-pixel structure 200 shown in FIG1 and FIG2 is reduced accordingly, and the size of the touch electrode layer 300 between the sub-pixel structures 200 is enlarged. The ratio of the size of the touch electrode layer 300 to the size of the sub-pixel structure 200 is only schematic and is not a specific limitation of the embodiments of the present disclosure.

[0037] Figure 3 is a schematic partial structural diagram of a display panel according to other embodiments of the present disclosure. As shown in Figure 3 , the edge of the orthographic projection of the second electrode layer 330 on the substrate layer 100 can at least partially overlap with the edge of the orthographic projection of the touch insulating layer 320 on the substrate layer 100. In other words, it can be understood that the edge of the second electrode layer 330 is at least partially flush with the edge of the touch insulating layer 320. As shown in Figure 3 , if the edge of the second electrode layer 330 is completely flush with the edge of the touch insulating layer 320, the second electrode layer 330 can fully cover the touch insulating layer 320.

[0038] It should be noted that Figure 4 is a schematic structural diagram of a touch electrode layer according to some embodiments of the present disclosure. As shown in Figure 4, the touch insulating layer 320 can cover the first electrode layer 310, and the second electrode layer 330 can partially cover the touch insulating layer 320, i.e., the edges of the touch insulating layer 320 are exposed. During the etching process for etching the pattern of the second electrode layer 330, the edges of the touch insulating layer 320 exposed by the second electrode layer 330 may corrode, which can be understood as over-etching. This can erode a pit 302. The distance between the edge of the pit 302 and the edge of the touch insulating layer 320 is small, forming a localized tip 303. In a foldable display device or a curved display device assembled with a flexible display panel, due to the bending and flexing of the film layer, the localized tip 303 can become a stress concentration point during a drop. This stress concentration point can cause the film layer to break, or it can cause other overlying film layers to break, resulting in poor display performance. As a result, the reliability of the display panel is significantly reduced. In addition, the drop test failure rate in the product reliability test will increase, and the product yield will decrease.

[0039] To address the above-mentioned issues, the display panels provided in some embodiments of the present disclosure utilize a second electrode layer 330 that covers the touch insulation layer 320. The edges of the second electrode layer 330 overlap, or the edges of the second electrode layer 330 are partially flush with or partially cover, the edges of the touch insulation layer 320. This prevents the touch insulation layer 320 from being exposed relative to the edges of the second electrode layer 330. This prevents over-etching of the touch insulation layer 320 during the patterning process of the second electrode layer 330, and prevents the exposed edges of the touch insulation layer 320 from forming sharp edges. Consequently, the second electrode layer 330 covers or is flush with the edges of the touch insulation layer 320. This eliminates sharp stress concentration points formed at the edges of the touch insulation layer 320, improving the drop reliability and yield of the display panel without changing the type and number of film layers.

[0040] FIG5 is a schematic partial structural diagram of a display panel according to another embodiment of the present disclosure. As shown in FIG5 , the touch insulating layer 320 may include a bridging via 321 , through which the first electrode layer 310 and the second electrode layer 330 at both ends of the bridging via 321 may be electrically connected.

[0041] In some embodiments, the touch electrode layer 300 may include multiple sensing areas. The first electrode layers 310 of each sensing area are electrically connected, and the second electrode layers 330 of each sensing area are electrically connected to each other. The first electrode layers 310 of adjacent sensing areas are insulated from each other, and the second electrode layers 330 of adjacent sensing areas are insulated from each other. Each sensing area can serve as a touch sensing unit, that is, each sensing area can serve as a touch sensor, having the same transmitting electrode and the same receiving electrode.

[0042] Figure 6 is a schematic diagram of the partial structure of a sensing area of ​​a display panel according to some embodiments of the present disclosure. As shown in Figure 6, the touch insulation layer 320 of each sensing area includes at least one cross-via 321, and the first electrode layer 310 and the second electrode layer 330 of the same sensing area are electrically connected through at least one cross-via 321. When the first electrode layer 310 serves as a transmitting electrode and the second electrode layer 330 serves as a receiving electrode, the transmitted sensing signal can be sequentially transmitted through the first electrode layer 310, the cross-via 321, and the second electrode layer 330 to the sensing surface of the display panel. The touch sensing feedback signal can be transmitted to the touch driver chip through the second electrode layer 330, and combined with the transmitted sensing signal, it is analyzed to determine whether a touch has occurred at the corresponding position.

[0043] 5 and 6 , in some embodiments, each first hollow 301 corresponds to a plurality of sub-pixel structures 200. As shown in FIG6 , each first hollow 301 may correspond to nine sub-pixel structures 200. It should be noted that the number of sub-pixel structures 200 corresponding to each first hollow 301 shown in FIG6 is merely illustrative. In other embodiments, each first hollow 301 may also correspond to three sub-pixel structures 200, six sub-pixel structures 200, or twelve sub-pixel structures 200, etc., which is not specifically limited in the present disclosure.

[0044] As shown in Figure 5, in some embodiments, the orthographic projection of the touch insulation layer 320 on the substrate layer 100 covers the orthographic projection of the first electrode layer 310 on the substrate layer 100, and the edge of the orthographic projection of the touch insulation layer 320 on the substrate layer 100 surrounds the edge of the orthographic projection of the first electrode layer 310 on the substrate layer 100.

[0045] 3 , in some other embodiments, the edge of the orthographic projection of the touch insulating layer 320 on the substrate layer 100 may at least partially overlap with the edge of the orthographic projection of the first electrode layer 310 on the substrate layer 100. The overlap between the edge of the touch insulating layer 320 and the edge of the first electrode layer 310 ensures that the touch insulating layer 320 fully covers the first electrode layer 310, thereby ensuring the insulation effect of the touch insulating layer 320.

[0046] Referring to Figure 5, in some embodiments, the orthographic projection of the second electrode layer 330 on the substrate layer 100 covers the orthographic projection of the first electrode layer 310 on the substrate layer 100, and the edge of the orthographic projection of the second electrode layer 330 on the substrate layer 100 surrounds the edge of the orthographic projection of the first electrode layer 310 on the substrate layer 100.

[0047] 3 , in some other embodiments, the edge of the orthographic projection of the second electrode layer 330 on the substrate layer 100 may at least partially overlap with the edge of the orthographic projection of the first electrode layer 310 on the substrate layer 100 .

[0048] In some embodiments, both the first electrode layer 310 and the second electrode layer 330 may adopt a metal stacked structure of Ti (titanium)-Al (aluminum)-Ti (titanium), which is not specifically limited in the embodiments of the present disclosure. The thickness of Ti may range from 30nm to 70nm, for example, 37nm, 45nm, 50nm, 53nm, or 67nm, and the thickness of Al may range from 100nm to 200nm, for example, 120nm, 150nm, 160nm, 170nm, or 185nm. In some embodiments, the thickness of the first electrode layer 310 may be 200nm, and the thickness of the second electrode layer 330 may be 400nm. The touch insulating layer 320 may be made of an inorganic material, such as silicon nitride, and the thickness of the touch insulating layer 320 may range from 200nm to 400nm, for example, 150nm, 230nm, 310nm, 370nm, or 385nm.

[0049] Figure 7 is a schematic partial structural diagram of a display panel according to further embodiments of the present disclosure. As shown in Figure 7, the display panel may further include: a driving backplane BP, an encapsulation layer 400, a buffer insulating layer (buffer), a cover insulating layer 500, a filter layer 600, and an organic planar layer 700. The driving backplane BP is used to drive the sub-pixel structure 200 to emit light. The sub-pixel structure 200 includes a pixel definition layer (PDL) and a light-emitting layer. The light-emitting layer is disposed within a hollow portion of the pixel definition layer (PDL). The light-emitting layer includes a red light-emitting layer R1, a green light-emitting layer G1, and a blue light-emitting layer B1, depending on the color of the sub-pixel structure 200. To simplify the drawing, the anode and cathode in the sub-pixel structure 200 are not shown. The encapsulation layer 400 can protect the light-emitting layer. The filter layer 600 includes a light-shielding layer BM, which includes a plurality of second hollow portions 601. Color filters are disposed within the second hollow portions 601. The color filters corresponding to the colors of the light-emitting layers include red filter film r, green filter film g, and blue filter film b. The orthographic projection of the second hollow 601 on the substrate layer 100 overlaps the orthographic projection of the sub-pixel structure 200 on the substrate layer 100, and the orthographic projection of the light shielding layer BM on the substrate layer 100 overlaps the orthographic projection of the touch electrode layer 300 on the substrate layer 100. The first hollow 301 is connected to the second hollow 601. The first hollow 301 and the second hollow 601 can be arranged one-to-one, or one-to-many. Figure 7 is merely illustrative and is not specifically limited in this embodiment of the present disclosure.

[0050] In some embodiments, the thickness of the cover insulating layer 500 is greater than or equal to 0. When the thickness of the cover insulating layer 500 is equal to 0, the cover insulating layer 500 is removed; when the thickness of the cover insulating layer 500 is greater than 0, the cover insulating layer 500 is retained.

[0051] 7 , the cover insulating layer 500 can be disposed on a side of the touch electrode layer 300 away from the substrate layer 100; and the filter layer 600 can be disposed on a side of the cover insulating layer 500 away from the substrate layer 100. The cover insulating layer 500 is made of an organic material, and the process temperature range for preparing the cover insulating layer 500 overlaps with the process temperature range that the pixel structure 200 can withstand.

[0052] It should be noted that in order to achieve lightweight and thin display panels and improve color saturation, a color filter layer solution can be used instead of the external polarizer solution. However, the color filter layer solution requires five additional exposure, development, and baking processes. This process will increase stress concentration in the inorganic material covering insulating layer and the inorganic layer above the covering insulating layer. The stress concentration points are uniformly formed in the covering insulating layer, which becomes a vulnerable point for stress and will break under the action of external force, resulting in poor display and poor drop reliability of the display panel.

[0053] In the display panels provided by some embodiments of the present disclosure, the cover insulating layer 500 is made of an organic material. Since the elastic modulus of the organic material is greater than that of the inorganic material, stress concentration points are not concentrated on the cover insulating layer 500, resulting in the elimination of the stress concentration layer. Replacing the inorganic silicon nitride material with an organic film layer can solve the problem of high stress in inorganic thin films, thereby improving the reliability of film fracture caused by drop stress concentration. In addition, the preparation process of the organic cover insulating layer 500 involves certain temperature settings. For example, the organic material is prepared through a coating and curing process to obtain the cover insulating layer 500, and the curing temperature is generally higher than room temperature. The light-emitting layer in the sub-pixel structure 200 is generally not resistant to high temperatures, so the cover insulating layer 500 needs to be prepared using an organic material that cures at a low temperature. If the process temperature required to prepare the cover insulating layer 500 overlaps with the process temperature range that the sub-pixel structure 200 can withstand, the temperature in the overlapping area can be ensured to both ensure the successful preparation of the cover insulating layer 500 and ensure that the sub-pixel structure 200 is not affected by the process temperature of the cover insulating layer 500.

[0054] Referring to Figure 7, in some embodiments, the encapsulation layer 400 is disposed between the sub-pixel structure 200 and the touch electrode layer 300. The encapsulation layer 400 includes a first inorganic layer 410, a first organic layer 420, and a second inorganic layer 430, which are stacked. The first organic layer 420 is disposed between the first inorganic layer 410 and the second inorganic layer 430. The thickness of the first organic layer 420 can be less than or equal to 8 μm, for example, 4 μm, 5 μm, 6 μm, or 7 μm. In some embodiments, the thickness of the first organic layer 420 can also be greater than or equal to 6 μm, and the thickness of the first organic layer 420 can be between 6 μm and 8 μm, for example, 6 μm, 7 μm, or 8 μm.

[0055] Since films made from organic materials are typically thicker than those made from inorganic materials, which has some impact on light transmittance, the thickness of the first organic layer 420 of the encapsulation layer 400 can be reduced to compensate for the transmittance loss caused by the cover insulating layer 500. Typically, the thickness of the organic layer of the encapsulation layer is between 10 μm and 12 μm. In some embodiments of the present disclosure, the thickness of the first organic layer 420 of the encapsulation layer 400 can be reduced to 6 μm to 8 μm, for example, 6.5 μm, 6.7 μm, 7.3 μm, 7.6 μm, etc., thereby improving light transmittance and reducing the impact of the thickness of the cover insulating layer 500 on transmittance.

[0056] In some embodiments, the thickness of the cover insulating layer 500 may be greater than or equal to 1 μm. In other embodiments, the thickness of the cover insulating layer 500 may range from 1 μm to 3 μm, for example, the thickness of the cover insulating layer 500 may be 1 μm, 2 μm, or 3 μm. In still other embodiments, the thickness of the cover insulating layer 500 may range from 1.2 μm to 1.5 μm, for example, the thickness of the cover insulating layer 500 may be 1.2 μm, 1.3 μm, 1.35 μm, 1.4 μm, 1.45 μm, or 1.5 μm.

[0057] In some embodiments, a low-temperature optical resist (OC) material with a thickness of 1 μm to 1.5 μm can be applied to the side of the touch electrode layer 300 away from the substrate layer 100. After exposure and development, the material is baked at 85°C for 1 hour to form the cover insulating layer 500. It should be noted that the negative photoresist for temperature-curable OC undergoes vacuum or pre-baking, exposure and development, and a post-bake at 85°C. The post-bake temperature can range from 85°C to 150°C. The material can also withstand the following reliability tests: corrosion by acids and bases within a concentration of 5%, solvents, stripping solutions, and copper etchants; resistance to oxygen ICP dry etching; resistance to metal plating at 25°C-100°C; and resistance to high humidity at 100°C / 85%. The material also has a stable sheet resistance within the range of 5.0E×1012-1014 ohms and a transmittance of 99%.

[0058] In some embodiments, the process temperature for preparing the cover insulating layer 500 may be less than or equal to 150°C, for example, 85°C to 150°C, such as 85°C, 100°C, or 150°C. The sub-pixel structure can withstand a process temperature less than or equal to 120°C. The light-emitting layer can withstand a process temperature less than or equal to 120°C.

[0059] In some embodiments, the baking process temperature for preparing the capping insulating layer 500 is less than or equal to 85° C.

[0060] In some embodiments, the elongation at break of the film covering the insulating layer 500 is greater than or equal to 57‰; for example, it may be 57.4‰, such as 60‰ or 65‰, etc., which passes the drop test of the display panel.

[0061] In some embodiments, the elongation at break of the organic material forming the capping insulating layer 500 may be greater than 6%.

[0062] In some embodiments, the adhesion of the filter layer 600 to the cover insulating layer 500 is greater than 5B. It should be noted that the adhesion test refers to applying a vertical, uniform pulling force on the bonding surface of the sample at a specified speed to measure the force required to break the adhesion between the coatings or between the coating and the substrate, and the unit is N / cm 2 . The adhesion calculation method is to divide the load value when the sample is pulled apart and damaged by the cross-sectional area of ​​the test column of the tested coating, which is the adhesion of the coating. The types of damage include: adhesion damage represented by A; cohesive damage represented by B; adhesive self-damage or the topcoat part of the tested coating is pulled apart represented by C; if there are two or more types of damage, the percentage of the damaged area should be indicated, and it is effective if it is greater than 70%. If the adhesion is greater than 5B, it means that the adhesion test damage form is cohesive damage, and the destructive force is greater than 5N / cm 2 .

[0063] In some embodiments, the visible light transmittance of the cover insulating layer 500 is greater than or equal to 95%.

[0064] In some embodiments, the organic planar layer 700 is disposed on a side of the filter layer 600 away from the substrate layer 100 ; the process temperature range for preparing the organic planar layer 700 overlaps with the process temperature range that the sub-pixel structure can withstand.

[0065] Figure 8 is a schematic diagram of a partial structure of a display panel according to other embodiments of the present disclosure. Compared to Figure 7 , Figure 8 removes the cover insulating layer 500 between the touch electrode layer 300 and the filter layer 600. Specifically, the thickness of the cover insulating layer 500 is zero. The light shielding layer BM is directly connected to the touch electrode layer 300, and the light shielding layer BM is insulated from the touch electrode layer 300. This prevents the light shielding layer BM from transferring charges from other external layers into the touch electrode layer 300, thereby preventing changes in the induced charge on the touch electrode layer 300 and ensuring touch accuracy on the touch electrode layer 300.

[0066] In some embodiments, the light shielding layer BM may be doped with an insulating material. For example, the light shielding layer BM may be doped with acrylic resin and / or epoxy resin.

[0067] In some embodiments, a light shielding material with a thickness of 1 μm to 1.5 μm may be coated first, then exposed and developed, and then baked at 85° C. for 1 hour to form the light shielding layer BM.

[0068] After the light shielding layer BM is set, a color filter film can be set with a thickness ranging from 1 μm to 1.5 μm. Then, after exposure and development, and baking at 85° C. for 1 hour, the color filter film pattern is formed.

[0069] After the color filter film is set, a flat organic material with a thickness of 2.5μm to 5μm can be applied. The organic flat layer 700 pattern is formed through exposure, development, and baking at 85°C for 1 hour. It should be noted that the organic flat layer 700 can be made of the same organic material as the insulating layer 500. Organic materials have excellent fluidity, and after film formation and leveling, they effectively encapsulate the uneven topography of the underlying layer. Furthermore, the organic film can also passivate sharp metal corners, effectively encapsulating them.

[0070] In some embodiments of the present disclosure, the display panels provided by doping the light-shielding layer BM with an insulating material eliminate the need for an additional cover insulating layer, simplifying the display panel's film layer configuration while ensuring that the touch electrode layer 300 is in an insulating environment. Removing the cover insulating layer 500 eliminates stress concentration issues associated with inorganic insulating layers and also improves light transmittance.

[0071] Some embodiments of the present disclosure provide a display device. Figure 9 is a schematic structural diagram of a display device according to some embodiments of the present disclosure. As shown in Figure 9, the display device may include: a display panel 1000 provided in any of the embodiments above.

[0072] It should be noted that the display devices provided in some embodiments of the present disclosure may include smart phones, tablet computers, laptops, televisions, and smart wearable devices, etc. Smart wearable devices may include smart watches, augmented reality (AR) devices, and virtual reality (VR) devices, etc.

[0073] In the display device provided by some embodiments of the present disclosure, the second electrode layer 330 of the touch electrode layer 300 in the display panel 1000 covers the touch insulation layer 320. Alternatively, the edge of the second electrode layer 330 partially overlaps or partially overlaps the edge of the touch insulation layer 320. This prevents the touch insulation layer 320 from being exposed relative to the edge of the second electrode layer 330. This prevents over-etching of the touch insulation layer 320 during the etching process of the second electrode layer 330, thereby preventing the formation of localized sharp points at the exposed edge of the touch insulation layer 320. Therefore, the second electrode layer 330 covering or being flush with the edge of the touch insulation layer 320 eliminates sharp stress concentration points formed at the edge of the touch insulation layer 320. This improves the drop reliability and yield of the display panel without changing the type and number of film layers.

[0074] It should be noted that, in the above embodiments, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant description of other embodiments.

[0075] The above embodiments are only used to illustrate the technical solutions of the present disclosure, rather than to limit them. Although the present disclosure has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present disclosure.

[0076] Although some embodiments of the present disclosure have been described, those skilled in the art may make additional changes and modifications to these embodiments once they have learned the basic creative concepts. Therefore, the appended claims are intended to be interpreted as including the embodiments described above and all changes and modifications that fall within the scope of the present disclosure.

[0077] Obviously, those skilled in the art may make various changes and modifications to the present disclosure without departing from the spirit and scope of the present disclosure. Thus, if these modifications and variations of the present disclosure fall within the scope of the claims of the present disclosure and their equivalents, the present disclosure is intended to include these modifications and variations.

Claims

1. A display panel, comprising: A substrate layer, wherein a plurality of sub-pixel structures are arranged on one side of the substrate layer; as well as A touch electrode layer, disposed on a side of the sub-pixel structure away from the substrate layer, the touch electrode layer comprising a plurality of first hollows, the orthographic projections of the first hollows on the substrate layer covering the orthographic projections of the sub-pixel structure on the substrate layer; The touch electrode layer comprises a first electrode layer, a touch insulating layer and a second electrode layer which are stacked, the touch insulating layer is arranged between the first electrode layer and the second electrode layer, and the second electrode layer is arranged on a side of the touch insulating layer away from the substrate layer; The orthographic projection of the second electrode layer on the substrate layer covers the orthographic projection of the touch insulating layer on the substrate layer, the edge of the orthographic projection of the second electrode layer on the substrate layer surrounds the edge of the orthographic projection of the touch insulating layer on the substrate layer, or the edge of the orthographic projection of the second electrode layer on the substrate layer at least partially overlaps with the edge of the orthographic projection of the touch insulating layer on the substrate layer.

2. The display panel according to claim 1, wherein: The orthographic projection of the touch insulating layer on the substrate layer covers the orthographic projection of the first electrode layer on the substrate layer, the edge of the orthographic projection of the touch insulating layer on the substrate layer surrounds the edge of the orthographic projection of the first electrode layer on the substrate layer, or the edge of the orthographic projection of the touch insulating layer on the substrate layer at least partially overlaps with the edge of the orthographic projection of the first electrode layer on the substrate layer.

3. The display panel according to claim 1, wherein: The orthographic projection of the second electrode layer on the substrate layer covers the orthographic projection of the first electrode layer on the substrate layer, the edge of the orthographic projection of the second electrode layer on the substrate layer surrounds the edge of the orthographic projection of the first electrode layer on the substrate layer, or the edge of the orthographic projection of the second electrode layer on the substrate layer at least partially overlaps with the edge of the orthographic projection of the first electrode layer on the substrate layer.

4. The display panel according to claim 1, wherein: The touch electrode layer includes a plurality of sensing areas, the touch insulating layer of each sensing area includes at least one jumper via, and the first electrode layer and the second electrode layer of the same sensing area are electrically connected through the at least one jumper via.

5. The display panel according to any one of claims 1 to 4, further comprising: A covering insulating layer, disposed on a side of the touch electrode layer away from the substrate layer; as well as A filter layer, disposed on a side of the cover insulating layer away from the substrate layer; The thickness of the cover insulating layer is greater than or equal to 0, the material of the cover insulating layer includes an organic material, and the process temperature range for preparing the cover insulating layer overlaps with the process temperature range that the pixel structure can withstand.

6. The display panel according to claim 5, further comprising an encapsulation layer disposed between the sub-pixel structure and the touch electrode layer; the encapsulation layer comprises a first inorganic layer, a first organic layer, and a second inorganic layer stacked, and the first organic layer is disposed between the first inorganic layer and the second inorganic layer; When the thickness of the cap insulating layer is greater than 0, the thickness of the first organic layer is less than or equal to 8 μm.

7. The display panel according to claim 6, wherein: The thickness of the cover insulating layer is greater than or equal to 1 μm; and / or, The thickness of the first organic layer is greater than or equal to 6 μm; and / or, The process temperature for preparing the cover insulating layer is less than or equal to 150° C.; and / or, The sub-pixel structure can withstand a process temperature less than or equal to 120° C.

8. The display panel according to claim 7, wherein: The thickness of the cover insulating layer is in the range of 1 μm to 3 μm; and / or, The pixel structure comprises a light-emitting layer, and the light-emitting layer can withstand a process temperature less than or equal to 120° C.; and / or, The baking process temperature for preparing the cover insulating layer is less than or equal to 85°C.

9. The display panel according to claim 8, wherein: The thickness of the cover insulating layer is in the range of 1.2 μm to 1.5 μm; and / or, The elongation at break of the film layer covering the insulating layer is greater than or equal to 57‰; and / or, The elongation at break of the organic material of the covering insulating layer is greater than 6%; and / or, The adhesion of the filter layer on the cover insulating layer is greater than 5B, where B represents that the adhesion test mode is cohesive failure; and / or, The visible light transmittance of the cover insulating layer is greater than or equal to 95%.

10. The display panel according to claim 5, further comprising an organic planar layer, disposed on a side of the filter layer away from the substrate layer; The process temperature range for preparing the organic planar layer overlaps with the process temperature range that the sub-pixel structure can withstand.

11. The display panel according to claim 5, wherein: The filter layer includes a light shielding layer, the light shielding layer includes a plurality of second hollows, a color filter film is arranged in the second hollows, the orthographic projection of the second hollows on the substrate layer covers the orthographic projection of the sub-pixel structure on the substrate layer, and the orthographic projection of the light shielding layer on the substrate layer covers the orthographic projection of the touch electrode layer on the substrate layer; When the thickness of the cover insulating layer is equal to 0, the light shielding layer is directly connected to the touch electrode layer, and the light shielding layer and the touch electrode layer are insulated from each other.

12. The display panel according to claim 11, wherein: The light shielding layer is doped with insulating material, and the insulating material includes acrylic resin and / or epoxy resin.

13. The display panel according to claim 11, wherein: The orthographic projection of each of the first hollowing out on the substrate layer covers the orthographic projection of at least one of the second hollowing out on the substrate layer.

14. A display device comprising the display panel according to any one of claims 1 to 13.

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