Light control screen, light control system, and light control method

Abstract

A light control screen (100), a light control system, and a light control method. The light control screen (100) comprises a first conductive structure (110), a second conductive structure (120), a light-responsive structure (130), and a bistable display structure (140). The light-responsive structure (130) is located between the first conductive structure (110) and the second conductive structure (120). The bistable display structure (140) is located between the first conductive structure (110) and the second conductive structure (120) and located on one side of or inside the light-responsive structure (130). Using electrical properties of the light-responsive structure (130) for color development and erasure does not require extra signal processing flow for regions, so that the response is fast; the light-responsive structure (130) is conductive only in a region irradiated by light, and acts as an insulator in other regions, thereby realizing local erasure of the conductive part; and the present invention is beneficial to manufacturing large-size screens.

Description

Light control screen, light control system and light control method Technical Field

[0001] The present invention relates to the field of multi-stable display technology, and in particular to a light control screen, a method for preparing a light control screen, a light control system and a square light control method. Background Art

[0002] Compared to traditional LCD display technology, bi-stable display technology (such as electronic ink screens, LCD tablets, and LCD blackboards) consumes energy only when the displayed content changes, significantly reducing power consumption. Furthermore, because bi-stable display technology primarily relies on reflected light, it avoids the blue light emission issues of traditional LCD display technology, making it more eye-friendly.

[0003] However, the bi-stable display technology still has certain defects:

[0004] 1) When the electronic ink screen needs to display a specific image, a complex circuit needs to be designed;

[0005] 2) LCD handwriting tablets / LCD blackboards can only achieve full-screen erasing, and cannot achieve partial erasing; if partial erasing is to be achieved, a complex circuit structure needs to be designed, resulting in high costs.

[0006] Currently, there is no effective solution to the problems existing in related technologies, such as the need to design complex circuits to display specific images on electronic ink screens and the inability to achieve local erasure of LCD handwriting tablets / LCD blackboards at low cost.

[0007] Summary of the Invention

[0008] The purpose of the present invention is to address the deficiencies in the prior art and provide a light-control screen, a method for preparing a light-control screen, a light-control system and a square light-control method, so as to solve the problems existing in the related art such as the need to design complex circuits to display specific images on electronic ink screens and the inability to achieve local erasure of liquid crystal handwriting tablets / liquid crystal blackboards at low cost.

[0009] To achieve the above object, the technical solution adopted by the present invention is:

[0010] In a first aspect, a light control screen is provided, comprising:

[0011] a first conductive structure;

[0012] a second conductive structure, the second conductive structure being arranged opposite to the first conductive structure;

[0013] a light-responsive structure disposed between the first conductive structure and the second conductive structure, configured to be in a non-conductive state in the absence of light irradiation and in a conductive state in the presence of light irradiation, wherein the wavelength of the light is 200 nm to 2000 nm;

[0014] A bistable display structure is arranged between the first conductive structure and the second conductive structure and is located on one side or inside the photoresponsive structure, and is used to be in a locally erased state under voltage regulation and when the photoresponsive structure is in a conductive state.

[0015] In some embodiments, the first conductive structure includes:

[0016] First grassroots level;

[0017] The first conductive layer is disposed on a side of the first base layer close to the second conductive structure.

[0018] In some embodiments, the second conductive structure includes:

[0019] Second grassroots level;

[0020] The second conductive layer is disposed on a side of the second base layer close to the first conductive structure.

[0021] In some embodiments, the photoresponsive structure comprises:

[0022] A first photoresponsive layer is disposed between the first conductive structure and the bistable display structure.

[0023] In some embodiments, the photoresponsive structure comprises:

[0024] A second photoresponsive layer is disposed between the second conductive structure and the bistable display structure.

[0025] In some embodiments, the bi-stable display structure includes:

[0026] A liquid crystal display layer is arranged between the first conductive structure and the second conductive structure and is located on one side of the light response structure, and is used to be in a local erased state under voltage regulation and when the light response structure is in a conductive state.

[0027] In some embodiments, the bi-stable display structure includes:

[0028] An ink display layer is provided between the first conductive structure and the second conductive structure and is located on the inner side of the light response structure, and is used to be in a local erase state under voltage regulation and when the light response structure is in a conductive state.

[0029] In a second aspect, a method for preparing a light-regulating screen is provided, which is used to prepare the light-regulating screen as described in the first aspect, comprising:

[0030] (Preparing a First Conductive Structure)

[0031] forming a first conductive layer on a surface of the first base layer to form a first conductive structure;

[0032] (Preparing the Second Conductive Structure)

[0033] forming a second conductive layer on the surface of the second base layer to form a second conductive structure;

[0034] (Preparation of Photoresponsive Structures)

[0035] forming a first photoresponsive layer on the surface of the first conductive layer;

[0036] (Preparing light-regulating screens)

[0037] The first base layer, the first conductive layer, the first light response layer, the liquid crystal display layer, the second conductive layer, and the second base layer are assembled to form a light control screen.

[0038] A method for preparing a light-regulating screen is also provided, for preparing the light-regulating screen according to the first aspect, comprising:

[0039] (Preparing a First Conductive Structure)

[0040] forming a first conductive layer on a surface of the first base layer to form a first conductive structure;

[0041] (Preparing the Second Conductive Structure)

[0042] forming a second conductive layer on the surface of the second base layer to form a second conductive structure;

[0043] (Preparation of Photoresponsive Structures)

[0044] forming a second photoresponsive layer on the surface of the second conductive layer;

[0045] (Preparing light-regulating screens)

[0046] The first base layer, the first conductive layer, the liquid crystal display layer, the second light response layer, the second conductive layer, and the second base layer are assembled to form a light control screen.

[0047] A method for preparing a light-regulating screen is also provided, for preparing the light-regulating screen according to the first aspect, comprising:

[0048] (Preparing a First Conductive Structure)

[0049] forming a first conductive layer on a surface of the first base layer to form a first conductive structure;

[0050] (Preparing the Second Conductive Structure)

[0051] forming a second conductive layer on the surface of the second base layer to form a second conductive structure;

[0052] (Preparation of Photoresponsive Structures)

[0053] forming a first photoresponsive layer on the surface of the first conductive layer and forming a second photoresponsive layer on the surface of the second conductive layer;

[0054] (Preparing light-regulating screens)

[0055] The first base layer, the first conductive layer, the first light response layer, the liquid crystal display layer, the second light response layer, the second conductive layer, and the second base layer are assembled to form a light control screen.

[0056] A method for preparing a light-regulating screen is also provided, for preparing the light-regulating screen according to the first aspect, comprising:

[0057] (Preparing a First Conductive Structure)

[0058] forming a first conductive layer on a surface of the first base layer to form a first conductive structure;

[0059] (Preparing the Second Conductive Structure)

[0060] forming a second conductive layer on the surface of the second base layer to form a second conductive structure;

[0061] (Preparation of Photoresponsive Structures)

[0062] forming a first photoresponsive layer on the surface of the first conductive layer and forming a second photoresponsive layer on the surface of the second conductive layer;

[0063] (Preparing light-regulating screens)

[0064] The first base layer, the first conductive layer, the first light response layer, the ink display layer, the second light response layer, the second conductive layer, and the second base layer are assembled to form a light control screen.

[0065] In a third aspect, a light control system is provided, comprising:

[0066] The light control screen according to the first aspect; or

[0067] A light-regulating screen prepared by the preparation method described in the second aspect.

[0068] In some embodiments, further comprising:

[0069] A control device is connected to the light regulating screen and is used to adjust the voltage applied to the light regulating screen.

[0070] In some embodiments, further comprising:

[0071] A light regulating device is provided, wherein the light regulating device emits light to the light regulating screen to change the state of the light response structure of the light regulating screen, wherein the wavelength of the light is 200nm to 2000nm.

[0072] In a fourth aspect, a light control method is provided, comprising:

[0073] Get voltage regulation instructions;

[0074] adjusting the voltage applied to the first conductive structure / the second conductive structure according to the voltage adjustment instruction so as to place the bistable display structure in a partial erasing mode;

[0075] When the bistable display structure is in a local erase mode, determining whether the light-responsive structure receives light irradiation, wherein the wavelength of the light is 200 nm to 2000 nm;

[0076] When the light-responsive structure receives light, the light-responsive structure is in a conducting state, so that the bistable display structure illuminated by the light is in a partially erased state;

[0077] When the light-responsive structure is not irradiated with light, the light-responsive structure is in a non-conducting state, so that the bistable display structure is not in a partially erased state.

[0078] In some embodiments, further comprising:

[0079] Get voltage regulation instructions;

[0080] The voltage applied to the first conductive structure / the second conductive structure is adjusted according to the voltage adjustment instruction, so that the bi-stable display structure is in a writing mode.

[0081] In some embodiments, further comprising:

[0082] Get voltage regulation instructions;

[0083] adjusting the voltage applied to the first conductive structure / the second conductive structure according to the voltage adjustment instruction so as to place the bi-stable display structure in a writing mode;

[0084] When the bistable display structure is in a writing mode, determining whether the light-responsive structure receives light irradiation, wherein the wavelength of the light is 200 nm to 2000 nm;

[0085] When the light-responsive structure receives light, the light-responsive structure is in a conducting state, so that the bistable display structure illuminated by the light is in a writing state;

[0086] When the light-responsive structure does not receive light irradiation, the light-responsive structure is in a non-conducting state, so that the bistable display structure is not in a writing state.

[0087] In some embodiments, further comprising:

[0088] Get voltage regulation instructions;

[0089] The voltage applied to the first conductive structure / the second conductive structure is adjusted according to the voltage adjustment instruction, so that the bi-stable display structure is in a global erase mode.

[0090] In some embodiments, further comprising:

[0091] detecting an irradiation range of the light when the light-responsive structure receives light irradiation;

[0092] classifying the light-responsive structure into a conducting area and a non-conducting area according to the irradiation range;

[0093] The bistable display structure is classified into an erasable area and a non-erasable area according to the conductive area and the non-conductive area.

[0094] In some embodiments, further comprising:

[0095] detecting an irradiation range of the light when the light-responsive structure receives light irradiation;

[0096] classifying the light-responsive structure into a conducting area and a non-conducting area according to the irradiation range;

[0097] The bistable display structure is classified into a writable area and a non-writing area according to the conductive area and the non-conductive area.

[0098] Compared with the prior art, the light control screen, the method for preparing the light control screen, the light control system and the square light control method of the present invention have the following technical effects:

[0099] 1) Low system power consumption: In writing mode, the light-controlled screen consumes virtually no power, relying solely on the properties of the bistable material display layer for color display. In erasing mode, during local erasing, most circuits are inactive due to the insulating effect of the light-responsive structure, while global erasing requires only a few high-voltage pulses, resulting in low power consumption.

[0100] 2) Fast response: The physical properties of the bistable material and the electrical properties of the photoresponsive structure are used for color development and erasure. There is no additional signal processing process in the region, and the response is extremely fast.

[0101] 3) Super-resolution: Compared with pixel displays, the light-controlled screen has an extremely high resolution; Partial erasure: During partial erasure, except for the area illuminated by light, the other areas of the light-responsive structure still act as an insulator, and only the illuminated area is conductive, enabling partial erasure of handwriting in the conductive area;

[0102] 4) Low cost: Compared with traditional methods, the present invention does not require complex circuit design and additional sensor structure, which is more conducive to the production of large-scale screens (such as electronic blackboards) and large-scale promotion. BRIEF DESCRIPTION OF THE DRAWINGS

[0103] FIG1 is a cross-sectional view (1) of a light control screen according to an embodiment of the present invention;

[0104] FIG2 is a cross-sectional view (II) of a light control screen according to an embodiment of the present invention;

[0105] FIG3 is a cross-sectional view of a light control screen according to an embodiment of the present invention (III)

[0106] FIG4 is a cross-sectional view (four) of a light control screen according to an embodiment of the present invention;

[0107] FIG5 is a framework diagram of a light control system according to an embodiment of the present invention.

[0108] The accompanying drawings are numerals 100, light-control screen; 110, first conductive structure; 111, first base layer; 112, first conductive layer; 120, second conductive structure; 121, second base layer; 122, second conductive layer; 130, light-responsive structure; 131, first light-responsive layer; 132, second light-responsive layer; 140, bistable display structure; 141, liquid crystal display layer; 142, ink display layer;

[0109] 200, control device;

[0110] 300. Light control device. DETAILED DESCRIPTION

[0111] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0112] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0113] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but they are not intended to limit the present invention.

[0114] Example 1

[0115] This embodiment relates to the light-regulating screen and the method for manufacturing the light-regulating screen of the present invention.

[0116] An illustrative embodiment of the present invention. As shown in Figures 1 to 3, a light-controlled screen 100 includes a first conductive structure 110, a second conductive structure 120, a light-responsive structure 130, and a bi-stable display structure 140. The second conductive structure 120 is disposed opposite the first conductive structure 110; the light-responsive structure 130 is disposed between the first conductive structure 110 and the second conductive structure 120, and is configured to be in a non-conductive state in the absence of light exposure and in a conductive state in the presence of light exposure; the bi-stable display structure 140 is disposed between the first conductive structure 110 and the second conductive structure 120, and is located on the side of / or inside the light-responsive structure 130, and is configured to be in a partially erased state under voltage control and when the light-responsive structure 130 is in a conductive state.

[0117] The wavelength of light is 200nm to 2000nm, which means that light includes ultraviolet light, visible light, and infrared light.

[0118] The working principle of the present invention is as follows:

[0119] The light control screen 100 includes a writing mode, a local erasing mode, and a global erasing mode;

[0120] When the light control screen 100 is in the partial erasing mode, it has the following two states:

[0121] In the absence of light, the photoresponsive structure 130 is in a non-conductive state. At this time, regardless of whether a voltage is applied to the bistable display structure 140 or whether the direction of the voltage applied to the bistable display structure 140 is adjusted, the electric field intensity of the bistable display structure 140 is limited.

[0122] When irradiated with light, the photoresponsive structure 130 is in a conducting state. At this time, the electric field intensity of the bistable display structure 140 is enhanced, and the bistable display structure 140 can be operated.

[0123] In the present invention, there is no limit to the size of the light control screen 100. Specifically, the size of the light control screen 100 is 5 inches to 200 inches, including but not limited to 5.4 inches, 7.9 inches, 8.3 inches, 9.7 inches, 10.2 inches, 10.5 inches, 10.9 inches, 11 inches, 12.9 inches, 14 inches, 16 inches, 21.5 inches, 24 inches, 27 inches, 32 inches, 43 inches, 48 ​​inches, 50 inches, 55 inches, 65 inches, 75 inches, 85 inches, 100 inches, 148 inches, and 168 inches.

[0124] In the present invention, the light control screen 100 can be used as a handwriting board, a display screen, or an electronic blackboard.

[0125] In this embodiment, there are three implementation methods as follows:

[0126] 1) As shown in FIG1 , the bistable display structure 140 is disposed between the second conductive structure 120 and the light-responsive structure 130 ;

[0127] 2) As shown in FIG. 2 , the bistable display structure 140 is disposed between the first conductive structure 110 and the light-responsive structure 130 ;

[0128] 3) As shown in FIG. 3 , the bistable display structure 140 is disposed inside the light-responsive structure 130 .

[0129] As shown in Figures 1 to 3 , the first conductive structure 110 includes a first base layer 111 and a first conductive layer 112. The first conductive layer 112 is disposed on a side of the first base layer 111 close to the second conductive structure 120.

[0130] The first base layer 111 is made of a light-transmitting material, including but not limited to a flexible material and a non-flexible material, such as glass, plastic film, PET, etc.

[0131] In some embodiments, the first base layer 111 is a light-colored material or a dark-colored material.

[0132] When the first base layer 111 is made of a light-colored material, the light transmittance of the first base layer 111 is 15% to 90%.

[0133] Preferably, the light transmittance of the first base layer 111 is 30% to 90%. More preferably, the light transmittance of the first base layer 111 is 50% to 90%. More preferably, the light transmittance of the first base layer 111 is 75% to 90%.

[0134] When the first base layer 111 is made of a dark material, the light transmittance of the first base layer 111 is 0% to 80%.

[0135] Preferably, the light transmittance of the first base layer 111 is 0% to 60%. More preferably, the light transmittance of the first base layer 111 is 0% to 50%. More preferably, the light transmittance of the first base layer 111 is 0% to 35%.

[0136] The thickness of the first base layer 111 is not limited and is determined according to the requirements of the light control screen 100 .

[0137] In some embodiments, the thickness of the first base layer 111 is 100 um to 1 cm.

[0138] The size of the first conductive layer 112 matches the size of the first base layer 111. Generally, the length of the first conductive layer 112 is equal to the length of the first base layer 111, and the width of the first conductive layer 112 is equal to the width of the first base layer 111.

[0139] The first conductive layer 112 is made of a conductive material, including but not limited to indium tin oxide (ITO), TCO conductive glass (FTO), polyethylene dioxythiophene (PEDOT), etc.

[0140] In some embodiments, the thickness of the first conductive layer 112 is 2 nm to 100 um.

[0141] 1 to 3 , the second conductive structure 120 includes a second base layer 121 and a second conductive layer 122 . The second conductive layer 122 is disposed on a side of the second base layer 121 close to the first conductive structure 110 .

[0142] Specifically, the second conductive layer 122 is disposed on a side of the second base layer 121 close to the first conductive layer 112 .

[0143] The second base layer 121 may be made of materials including, but not limited to, flexible materials and non-flexible materials, such as glass, plastic film, PET, and the like.

[0144] In some embodiments, the second base layer 121 is a light-colored material or a dark-colored material.

[0145] When the second base layer 121 is made of a light-colored material, the light transmittance of the second base layer 121 is 15% to 90%.

[0146] Preferably, the light transmittance of the second base layer 121 is 30% to 90%. More preferably, the light transmittance of the second base layer 121 is 50% to 90%. More preferably, the light transmittance of the second base layer 121 is 75% to 90%.

[0147] When the second base layer 121 is made of a dark material, the light transmittance of the second base layer 121 is 0% to 80%.

[0148] Preferably, the light transmittance of the second base layer 121 is 0% to 60%. More preferably, the light transmittance of the second base layer 121 is 0% to 50%. More preferably, the light transmittance of the second base layer 121 is 0% to 35%.

[0149] Regarding the first base layer 111 and the second base layer 121 , at least one of the first base layer 111 and the second base layer 121 is made of a light-colored material.

[0150] The size of the second base layer 121 matches the size of the first base layer 111. Generally, the length of the second base layer 121 is equal to the length of the first base layer 111, and the width of the second base layer 121 is equal to the width of the first base layer 111.

[0151] The thickness of the second base layer 121 is not limited and is determined according to the requirements of the light control screen 100 .

[0152] In some embodiments, the thickness of the second base layer 121 is 100 um to 1 cm.

[0153] The size of the second conductive layer 122 matches the size of the second base layer 121. Generally, the length of the second conductive layer 122 is equal to the length of the second base layer 121, and the width of the second conductive layer 122 is equal to the width of the second base layer 121.

[0154] The second conductive layer 122 is made of a transparent conductive material, including but not limited to indium tin oxide (ITO), TCO conductive glass (FTO), polyethylene dioxythiophene (PEDOT), etc.

[0155] In some embodiments, the thickness of the second conductive layer 122 is 2 nm to 100 um.

[0156] As shown in FIG1 , the photoresponsive structure 130 includes a first photoresponsive layer 131 , wherein the first photoresponsive layer 131 is disposed between the first conductive structure 110 and the bistable display structure 140 .

[0157] Specifically, the first photoresponsive layer 131 is disposed between the first conductive layer 112 and the bistable display structure 140 .

[0158] The size of the first photoresponsive layer 131 matches the size of the first conductive layer 112. Generally, the length of the first photoresponsive layer 131 is equal to the length of the first conductive layer 112, and the width of the first photoresponsive layer 131 is equal to the width of the first conductive layer 112.

[0159] The first photoresponsive layer 131 is made of a photosensitive material, or a material that forms a rectifying structure with the first conductive layer 112, such as a PN junction or a Schottky junction, for example, titanium dioxide, gallium nitride, zinc oxide, perovskite, mercury cadmium telluride, etc.

[0160] The thickness of the first light-responsive layer 131 is not limited and is determined according to the requirements of the light-regulating screen 100 .

[0161] In some embodiments, the thickness of the first photoresponsive layer 131 is 2 nm to 100 um.

[0162] As shown in FIG2 , the photoresponsive structure 130 includes a second photoresponsive layer 132 , wherein the second photoresponsive layer 132 is disposed between the second conductive structure 120 and the bistable display structure 140 .

[0163] Specifically, the second photoresponsive layer 132 is disposed between the second conductive layer 122 and the bistable display structure 140 .

[0164] The size of the second photoresponsive layer 132 matches the size of the second conductive layer 122. Generally, the length of the second photoresponsive layer 132 is equal to the length of the second conductive layer 122, and the width of the second photoresponsive layer 132 is equal to the width of the second conductive layer 122.

[0165] The second photoresponsive layer 132 is made of a photosensitive material, or a material that forms a rectifying structure with the second conductive layer 122, such as a PN junction or a Schottky junction, for example, titanium dioxide, gallium nitride, zinc oxide, perovskite, mercury cadmium telluride, etc.

[0166] The thickness of the second light-responsive layer 132 is not limited and is determined according to the requirements of the light-regulating screen 100 .

[0167] In some embodiments, the thickness of the second photoresponsive layer 132 is 2 nm to 100 um.

[0168] As shown in Figures 1 and 2, the bistable display structure 140 includes a liquid crystal display layer 141. The liquid crystal display layer 141 is disposed between the first conductive structure 110 and the second conductive structure 120 and is located on one side of the photoresponsive structure 130. The liquid crystal display layer 141 is configured to be in a partially erased state under voltage control and when the photoresponsive structure 130 is in a conductive state.

[0169] Specifically, the liquid crystal display layer 141 is disposed between the first conductive layer 112 and the second conductive layer 122 , and is located on one side of the first photoresponsive layer 131 and / or one side of the second photoresponsive layer 132 .

[0170] In this embodiment, there are several implementation methods as follows:

[0171] 1) As shown in FIG1 , the liquid crystal display layer 141 is disposed between the second conductive layer 122 and the first photoresponsive layer 131;

[0172] 2) As shown in FIG2 , the liquid crystal display layer 141 is disposed between the first conductive layer 112 and the second photoresponsive layer 132;

[0173] 3) As shown in FIG. 3 , the liquid crystal display layer 141 is disposed between the first photoresponsive layer 131 and the second photoresponsive layer 132 .

[0174] The size of the liquid crystal display layer 141 matches the size of the first photoresponsive layer 131 / the second photoresponsive layer 132. Generally, the length of the liquid crystal display layer 141 is no greater than the length of the first photoresponsive layer 131 / the second photoresponsive layer 132, and the width of the liquid crystal display layer 141 is no greater than the width of the first photoresponsive layer 131 / the second photoresponsive layer 132.

[0175] The liquid crystal display layer 141 is made of liquid crystal material, such as cholesteric liquid crystal material.

[0176] The thickness of the liquid crystal display layer 141 is not limited and is determined according to the requirements of the light control screen 100 .

[0177] In some embodiments, the thickness of the liquid crystal display layer 141 is 10 nm to 100 um.

[0178] For the light control screen 100 shown in FIG1 , the preparation method thereof is as follows:

[0179] (Preparing the First Conductive Structure 110)

[0180] A first conductive layer 112 is formed on a surface of the first base layer 111 to form a first conductive structure 110;

[0181] (Preparing the Second Conductive Structure 120)

[0182] forming a second conductive layer 122 on a surface of the second base layer 121 to form a second conductive structure 120;

[0183] (Preparing Photoresponsive Structure 130)

[0184] forming a first photoresponsive layer 131 on the surface of the first conductive layer 112;

[0185] (Preparing Light Control Screen 100)

[0186] The first base layer 111 , the first conductive layer 112 , the first light response layer 131 , the liquid crystal display layer 141 , the second conductive layer 122 , and the second base layer 121 are assembled to form the light control screen 100 .

[0187] Furthermore, before the step (preparing the light control screen 100), the method further includes:

[0188] (Preparing Bistable Display Structure 140)

[0189] The liquid crystal display layer 141 is formed on the surface of the second conductive layer 122 .

[0190] For the light control screen 100 shown in FIG2 , the preparation method thereof is as follows:

[0191] (Preparing the First Conductive Structure 110)

[0192] A first conductive layer 112 is formed on a surface of the first base layer 111 to form a first conductive structure 110;

[0193] (Preparing the Second Conductive Structure 120)

[0194] forming a second conductive layer 122 on a surface of the second base layer 121 to form a second conductive structure 120;

[0195] (Preparing Photoresponsive Structure 130)

[0196] forming a second photoresponsive layer 132 on the surface of the second conductive layer 122;

[0197] (Preparing Light Control Screen 100)

[0198] The first base layer 111 , the first conductive layer 112 , the liquid crystal display layer 141 , the second light response layer 132 , the second conductive layer 122 , and the second base layer 121 are assembled to form the light control screen 100 .

[0199] Furthermore, before the step (preparing the light control screen 100), the method further includes:

[0200] (Preparing Bistable Display Structure 140)

[0201] A liquid crystal display layer 141 is formed on the surface of the first conductive layer 112 .

[0202] For the light control screen 100 shown in FIG3 , the preparation method thereof is as follows:

[0203] (Preparing the First Conductive Structure 110)

[0204] A first conductive layer 112 is formed on a surface of the first base layer 111 to form a first conductive structure 110;

[0205] (Preparing the Second Conductive Structure 120)

[0206] forming a second conductive layer 122 on a surface of the second base layer 121 to form a second conductive structure 120;

[0207] (Preparing Photoresponsive Structure 130)

[0208] A first photoresponsive layer 131 is formed on the surface of the first conductive layer 112 , and a second photoresponsive layer 132 is formed on the surface of the second conductive layer 122 ;

[0209] (Preparing Light Control Screen 100)

[0210] The first base layer 111 , the first conductive layer 112 , the first light response layer 131 , the liquid crystal display layer 141 , the second light response layer 132 , the second conductive layer 122 , and the second base layer 121 are assembled to form the light control screen 100 .

[0211] Furthermore, before the step (preparing the light control screen 100), the method further includes:

[0212] (Preparing Bistable Display Structure 140)

[0213] The liquid crystal display layer 141 is formed on the surface of the first photoresponsive layer 131 or the second photoresponsive layer 132 .

[0214] Regarding step (preparing the first conductive structure 110 ), a first conductive layer 112 is formed on the surface of the first base layer 111 by any one or more combinations of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical deposition, coating and printing.

[0215] In some embodiments, a 125 μm PET film is used as the first base layer 111 , and a 200 nm ITO layer is sputtered on the surface of the first base layer 111 in an inert gas (argon) atmosphere using magnetron sputtering technology to form a first conductive layer 112 .

[0216] Regarding step (preparing the second conductive structure 120 ), a second conductive layer 122 is formed on the surface of the second base layer 121 by any one or more combinations of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical deposition, coating and printing.

[0217] In some embodiments, a 125 μm PET film is used as the second base layer 121 , and a 200 nm ITO layer is sputtered to form the second conductive layer 122 in the presence of an inert gas (argon) by using magnetron sputtering technology.

[0218] For step (preparing the photoresponsive structure 130), a first photoresponsive layer 131 is formed on the surface of the first conductive layer 112 by any one or more combinations of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical deposition, coating, and printing; or, a second photoresponsive layer 132 is formed on the surface of the second conductive layer 122 by any one or more combinations of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical deposition, coating, and printing.

[0219] In some of the embodiments, magnetron sputtering technology is used to form a 100 nm zinc oxide layer as the first photoresponse layer 131 by sputtering on the surface of the first conductive layer 112 in a mixed atmosphere of oxygen and argon (4:71), or a 100 nm zinc oxide layer as the second photoresponse layer 132 by sputtering on the surface of the second conductive layer 122.

[0220] For the step (preparing the light-regulating screen 100 ), the assembly method includes, but is not limited to, roll-to-roll assembly.

[0221] For step (preparing the bistable display structure 140), the liquid crystal paste is uniformly distributed between the first light-responsive layer 131 and the second conductive layer 122, or between the first conductive layer 112 and the second light-responsive layer 132, by extrusion coating, pouring, or other common methods, and then cured (such as by UV curing) and edge-sealed (such as by using UV curing glue or other adhesives).

[0222] In some embodiments, the liquid crystal paste includes liquid crystal (such as cholesteric liquid crystal), spacers, prepolymers, and photoinitiators.

[0223] In some embodiments, the liquid crystal paste is prepared as follows:

[0224] Liquid crystal (such as cholesteric liquid crystal), prepolymer, and photoinitiator are stirred and mixed at 40° C. in a mass ratio of 70:28:2 for 5 hours to obtain a mixed slurry;

[0225] 0.4% by mass of 500 nm spacers were mixed with the mixed paste to obtain a liquid crystal paste.

[0226] The method of using the light control screen 100 of the present invention is as follows:

[0227] 1) Writing mode

[0228] There is no need to apply voltage to the first conductive layer 112 and the second conductive layer 122 . The liquid crystal display layer 141 can sense physical squeezing by relying on its own bistability effect, thereby realizing the display of written notes.

[0229] 2) Erase mode

[0230] Applying a voltage to the first conductive layer 112 and the second conductive layer 122 to put the liquid crystal display layer 141 into an erase mode;

[0231] When no light is irradiated on the first light response layer 131 / the second light response layer 132, the first light response layer 131 / the second light response layer 132 is in a non-conducting state, and the first light response layer 131 / the second light response layer 132 limits the electric field intensity of the liquid crystal display layer 141. Although the liquid crystal display layer 141 is in the erase mode, the liquid crystal display layer 141 is not in the erase state.

[0232] When light is irradiated on the first photoresponse layer 131 / the second photoresponse layer 132, the first photoresponse layer 131 / the second photoresponse layer 132 is in a conductive state, and the first photoresponse layer 131 / the second photoresponse layer 132 does not limit the electric field strength of the liquid crystal display layer 141. Under the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the liquid crystal display layer 141 increases, and the liquid crystal display layer 141 is in an erased state, thereby achieving local erase (applying a continuous low voltage or a low voltage pulse to the first conductive layer 112 and the second conductive layer 122) or global erase (applying a high voltage pulse to the first conductive layer 112 and the second conductive layer 122).

[0233] The technical effects of the present invention are as follows:

[0234] 1) Low system power consumption: In writing mode, the light-controlled screen consumes virtually no power, relying solely on the properties of the liquid crystal display layer for physical extrusion sensing and color display. In erasing mode, during local erasing, most circuits are inactive due to the insulating effect of the light-responsive structure, while global erasing requires only a few high-voltage pulses, resulting in low power consumption.

[0235] 2) Fast response: The physical properties of the liquid crystal display layer (cholesteric liquid crystal material) and the electrical properties of the light-responsive structure are used for color development and erasure. There is no additional regional signal processing process, and the response is extremely fast.

[0236] 3) Super resolution: Compared with pixel displays, light-controlled screens have extremely high resolution;

[0237] 4) Partial erasure: During partial erasure, except for the area illuminated by light, the other areas of the light-responsive structure still act as an insulator, and only the area illuminated by light is conductive, enabling partial erasure of handwriting in the conductive area;

[0238] 5) Low cost: Compared with traditional resistance pressure type, the present invention does not require complex circuit design and additional sensing structure, which is more conducive to the production of large-size screens (such as electronic blackboards) and large-scale promotion.

[0239] Example 2

[0240] This embodiment relates to the light-regulating screen and the method for manufacturing the light-regulating screen of the present invention.

[0241] An exemplary embodiment of the present invention. As shown in FIG4 , a light-controllable screen 100 includes a first conductive structure 110, a second conductive structure 120, a light-responsive structure 130, and a bi-stable display structure 140. The second conductive structure 120 is disposed opposite the first conductive structure 110; the light-responsive structure 130 is disposed between the first and second conductive structures 110, 120, and is configured to be non-conductive in the absence of light and conductive in the presence of light; and the bi-stable display structure 140 is disposed between the first and second conductive structures 110, 120, and within the light-responsive structure 130.

[0242] In this embodiment, the structures and materials of the first conductive structure 110 and the second conductive structure 120 are substantially the same as those in the first embodiment, and are not described again herein.

[0243] As shown in FIG4 , the photoresponsive structure 130 includes a first photoresponsive layer 131 and a second photoresponsive layer 132 . The first photoresponsive layer 131 is disposed between the first conductive structure 110 and the bistable display structure 140 ; ​​the second photoresponsive layer 132 is disposed between the second conductive structure 120 and the bistable display structure 140 .

[0244] Specifically, the first photoresponsive layer 131 is disposed between the first conductive layer 112 and the bistable display structure 140 ; ​​and the second photoresponsive layer 132 is disposed between the second conductive layer 122 and the bistable display structure 140 .

[0245] The structures and materials of the first photoresponse layer 131 and the second photoresponse layer 132 are substantially the same as those in Example 1, and are not described in detail herein.

[0246] As shown in FIG4 , the bistable display structure 140 includes an ink display layer 142. The ink display layer 142 is disposed between the first conductive structure 110 and the second conductive structure 120 and within the photoresponsive structure 130, and is configured to be in a partially erased state under voltage control and when the photoresponsive structure 130 is in a conductive state.

[0247] Specifically, the ink display layer 142 is disposed between the first photoresponsive layer 131 and the second photoresponsive layer 132 .

[0248] The size of the ink display layer 142 matches the size of the first photoresponsive layer 131 / the second photoresponsive layer 132. Generally, the length of the ink display layer 142 is no greater than the length of the first photoresponsive layer 131 / the second photoresponsive layer 132, and the width of the ink display layer 142 is no greater than the width of the first photoresponsive layer 131 / the second photoresponsive layer 132.

[0249] As shown in FIG. 4 , the ink display layer 142 is composed of electronic ink capsules and a transparent adhesive, wherein the electronic ink capsules are composed of dyed positive charges and negative charges.

[0250] The thickness of the ink display layer 142 is not limited and is determined according to the requirements of the light control screen 100 .

[0251] In some embodiments, the thickness of the ink display layer 142 is 10 nm to 100 um.

[0252] The light control screen 100 of this embodiment is prepared as follows:

[0253] (Preparing the First Conductive Structure 110)

[0254] A first conductive layer 112 is formed on a surface of the first base layer 111 to form a first conductive structure 110;

[0255] (Preparing the Second Conductive Structure 120)

[0256] forming a second conductive layer 122 on a surface of the second base layer 121 to form a second conductive structure 120;

[0257] (Preparing Photoresponsive Structure 130)

[0258] forming a first photoresponsive layer 131 on the surface of the first conductive layer 112;

[0259] forming a second photoresponsive layer 132 on the surface of the second conductive layer 122;

[0260] (Preparing Light Control Screen 100)

[0261] The first base layer 111 , the first conductive layer 112 , the first light response layer 131 , the ink display layer 142 , the second light response layer 132 , the second conductive layer 122 , and the second base layer 121 are assembled to form the light control screen 100 .

[0262] Furthermore, before the step (preparing the light control screen 100), the method further includes:

[0263] (Preparing Bistable Display Structure 140)

[0264] The ink display layer 142 is formed between the first photoresponsive layer 131 and the second photoresponsive layer 132 .

[0265] The steps (preparing the first conductive structure 110 ), the step (preparing the second conductive structure 120 ), and the step (preparing the light-responsive structure 130 ) are substantially the same as those in Example 1 and are not described in detail herein.

[0266] For step (preparing the bistable display structure 140), the preparation method is as follows:

[0267] The electronic ink capsules are laid on the second conductive layer 122 to ensure contact between each electronic ink capsule and the electrode. The first conductive structure 110 is placed above the electronic ink capsules. Transparent adhesive is injected between the electronic ink capsules to reduce the distance between the electrode and the electronic ink capsules.

[0268] The method of using the light control screen 100 of the present invention is as follows:

[0269] 1) Writing mode

[0270] Applying a forward voltage to the first conductive layer 112 and the second conductive layer 122 to put the ink display layer 142 in a writing mode;

[0271] When no light is irradiated on the first light response layer 131 / the second light response layer 132, the first light response layer 131 / the second light response layer 132 is in a non-conducting state, and the first light response layer 131 / the second light response layer 132 limits the electric field intensity of the ink display layer 142. Although the ink display layer 142 is in the writing mode, the ink display layer 142 is not in the writing state.

[0272] When light is irradiated on the first light response layer 131 / the second light response layer 132, the first light response layer 131 / the second light response layer 132 is in a conductive state, and the first light response layer 131 / the second light response layer 132 does not limit the electric field strength of the ink display layer 142. Under the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, and the ink display layer 142 is in a writing state, thereby achieving writing.

[0273] 2) Partial erase mode

[0274] Applying a reverse voltage (continuous low voltage or low voltage pulse) to the first conductive layer 112 and the second conductive layer 122 to put the ink display layer 142 into a local erasing mode;

[0275] When no light is irradiated on the first photoresponse layer 131 / the second photoresponse layer 132 , the first photoresponse layer 131 / the second photoresponse layer 132 is in a non-conducting state, and the first photoresponse layer 131 / the second photoresponse layer 132 limits the electric field intensity of the ink display layer 142 . Although the ink display layer 142 is in the erasing mode, the ink display layer 142 is not in the erasing state.

[0276] When light is irradiated on the first light response layer 131 / the second light response layer 132, the first light response layer 131 / the second light response layer 132 is in a conductive state, and the first light response layer 131 / the second light response layer 132 does not limit the electric field strength of the ink display layer 142. Under the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, and the ink display layer 142 is in an erased state, thereby achieving local erasure.

[0277] 3) Global Erase Mode

[0278] A reverse voltage (high voltage pulse) is applied to the first conductive layer 112 and the second conductive layer 122 to put the ink display layer 142 into a global erasing mode.

[0279] The technical effects of the present invention are as follows:

[0280] 1) Low system power consumption: In writing mode and erasing mode, most circuits are not conducting due to the insulation effect of the light-responsive structure, resulting in low power consumption;

[0281] 2) Fast response: The electrical properties of the ink display layer and light-responsive structure are used for color development and erasure. There is no additional regional signal processing process, and the response is extremely fast.

[0282] 3) Super resolution: Compared with pixel displays, light-controlled screens have extremely high resolution;

[0283] 4) Partial erasure: During partial erasure, except for the area illuminated by light, the other areas of the light-responsive structure still act as an insulator, and only the area illuminated by light is conductive, enabling partial erasure of handwriting in the conductive area;

[0284] 5) Partial writing: When performing partial writing, except for the area illuminated by light, the other areas of the light-responsive structure still play an insulating role, and only the area illuminated by light is conductive, so local writing can be achieved without the need for a large number of electrodes;

[0285] 5) Low cost: Compared with traditional resistance pressure type, the present invention does not require complex circuit design and additional sensing structure, which is more conducive to the production of large-size screens (such as electronic blackboards) and large-scale promotion.

[0286] Example 3

[0287] This embodiment relates to the light control system of the present invention.

[0288] An illustrative embodiment of the present invention is shown in FIG5 , which shows a light control system including the light control screen 100 as described in Example 1 or Example 2.

[0289] Furthermore, the light control system further includes a control device 200 , which is connected to the light control screen 100 and is used to adjust the voltage applied to the light control screen 100 .

[0290] Specifically, the control device 200 is connected to at least the first conductive structure 110 and the second conductive structure 120 , and is used to adjust the voltage applied to the first conductive structure 110 and the second conductive structure 120 .

[0291] More specifically, the control device 200 is connected to at least the first conductive layer 112 and the second conductive layer 122 , and is configured to adjust the voltage applied to the first conductive layer 112 and the second conductive layer 122 .

[0292] The control device 200 has the following working modes:

[0293] 1) The control device 200 directly controls the light control screen 100 to put the light control screen 100 into the writing mode or the erasing mode, for example, by switching the light control screen 100 with a key;

[0294] 2) The control device 200 obtains a control signal from the outside to put the light-regulating screen 100 into the writing mode or the erasing mode, for example, by obtaining the control signal through a wireless connection.

[0295] The control device 200 comprises at least a control circuit, a power module and a drive module. The power module is connected to the control circuit; the drive module is connected to the control circuit, the first conductive layer 112 and the second conductive layer 122 respectively.

[0296] In some embodiments, the control circuit includes but is not limited to a single chip microcomputer and a low power consumption circuit.

[0297] In some embodiments, the driving module includes but is not limited to logic gate circuits, chips, etc., such as STC and STM.

[0298] Furthermore, the control device 200 further includes a communication module, wherein the communication module is connected to the control circuit and is used to communicate with the outside world.

[0299] In some embodiments, the communication module includes but is not limited to a Bluetooth sensor, an antenna, etc., such as a SKYLAB Bluetooth module and a 2.4G wireless module.

[0300] Furthermore, the light control system further includes a light control device 300 , wherein the light control device 300 emits light toward the light control screen 100 to change the state of the light response structure 130 of the light control screen 100 .

[0301] The wavelength of light is 200nm to 2000nm.

[0302] In some embodiments, the light control device 300 is further connected to the control device 200 for communication, and is configured to send a control signal to the control device 200 so as to cause the control device 200 to switch the operating mode of the light control screen 100 .

[0303] The light control device 300 at least includes a light emitting module, which emits light toward the light control screen 100 to change the state of the light response structure 130 .

[0304] Specifically, the light emitting module emits light toward the first light response layer 131 / the second light response layer 132 , so that the areas of the first light response layer 131 / the second light response layer 132 irradiated by the light are in a conductive state.

[0305] The technical effects of the present invention are as follows:

[0306] 1) Fast response: The electrical properties of the photoresponsive structure are used for color development and erasure, without any additional signal processing in the region, resulting in extremely fast response;

[0307] 2) Partial erasure: When performing partial erasure, the light control device emits light to the light control screen. Except for the area illuminated by the light, the other areas of the light-responsive structure still act as an insulator, and only the area illuminated by the light is conductive, which can achieve partial erasure of handwriting in the conductive area;

[0308] 3) Low cost: Compared with traditional resistance pressure type, the present invention does not require complex circuit design and additional sensing structure, which is more conducive to large-scale promotion.

[0309] Example 4

[0310] This embodiment relates to the light control method of the present invention.

[0311] An exemplary embodiment of the present invention provides a light control method, comprising:

[0312] Step S602: obtaining a voltage regulation instruction;

[0313] Step S604: adjusting the voltage applied to the first conductive structure / the second conductive structure according to the voltage adjustment instruction, so that the bistable display structure is in a partial erasing mode;

[0314] Step S606: When the bistable display structure is in the partial erasure mode, determining whether the light-responsive structure receives light irradiation;

[0315] Step S608: When the light-responsive structure receives light, the light-responsive structure is in a conducting state, so that the bistable display structure illuminated by the light is in a partially erased state;

[0316] Step S610: When the light-responsive structure is not irradiated by light, the light-responsive structure is in a non-conducting state, so that the bistable display structure is not in a partially erased state.

[0317] Among them, step S608 and step S610 are parallel steps.

[0318] In step S502, the voltage adjustment instruction includes a first voltage adjustment instruction, a second voltage adjustment instruction, and a third voltage adjustment instruction. The first voltage adjustment instruction is used to instruct the application of a continuous low voltage or a low voltage pulse to the first conductive structure / the second conductive structure, the second voltage adjustment instruction is used to instruct the application of a high voltage pulse to the first conductive structure / the second conductive structure, and the third voltage adjustment instruction is used to instruct the application of a reverse voltage to the first conductive structure / the second conductive structure.

[0319] The first voltage adjustment instruction and the second voltage adjustment instruction are applicable to the light control screen 100 described in Example 1; and the third voltage adjustment instruction is applicable to the light control screen 100 described in Example 2.

[0320] In step S604, there are several implementations as follows:

[0321] 1) After the voltage applied to the first conductive structure / the second conductive structure is adjusted according to the first voltage adjustment instruction, the bistable display structure (the liquid crystal display layer 141) is in a partial erase mode;

[0322] 2) After the voltage applied to the first conductive structure / the second conductive structure is adjusted according to the second voltage adjustment instruction, the bistable display structure (the liquid crystal display layer 141) is in a global erase mode;

[0323] 3) After the voltage applied to the first conductive structure / the second conductive structure is adjusted according to the third voltage adjustment instruction, the bistable display structure (ink display layer 142) is in the partial erasing mode.

[0324] Through the above steps, the local conduction characteristics of the light-responsive structure can be utilized to achieve local erasure of the light-controlled screen.

[0325] Furthermore, the light control method further includes:

[0326] Step S702: obtaining a voltage regulation instruction;

[0327] Step S704: adjusting the voltage applied to the first conductive structure / the second conductive structure according to the voltage adjustment instruction, so that the bistable display structure is in a writing mode;

[0328] Step S706: when the bistable display structure is in the writing mode, determining whether the light response structure receives light irradiation;

[0329] Step S708: When the light-responsive structure receives light, the light-responsive structure is in a conducting state, so that the bistable display structure illuminated by the light is in a writing state;

[0330] Step S710: When the light-responsive structure does not receive light irradiation, the light-responsive structure is in a non-conducting state, so that the bistable display structure is not in a writing state.

[0331] Among them, steps S702 to S710 and steps S602 to S610 are parallel steps.

[0332] Furthermore, step S702 is the same step as step S702.

[0333] In step S702, the voltage adjustment instruction includes a fourth voltage adjustment instruction, wherein the fourth voltage adjustment instruction is used to instruct to apply a forward voltage to the first conductive structure / the second conductive structure.

[0334] In this case, the bi-stable display structure is the ink display layer 142 .

[0335] If the bistable display structure is the liquid crystal display layer 141 , only steps S702 to S704 need to be performed.

[0336] Furthermore, the light control method further includes:

[0337] Step S802: When the light-responsive structure receives light, detect the light irradiation range;

[0338] Step S804: classify the light-responsive structure into a conducting area and a non-conducting area according to the irradiation range;

[0339] Step S806 : Classify the bistable display structure into erasable areas and non-erasable areas according to the conductive areas and the non-conductive areas.

[0340] Furthermore, it also includes:

[0341] Step S808 : Classify the bistable display structure into a writable area and a non-writing area according to the conductive area and the non-conductive area.

[0342] Among them, steps S802 to S808 are performed after step S608 and step S708.

[0343] For the light control screen 100 of Example 1, the light control method is as follows:

[0344] Step S901: obtaining a voltage regulation instruction;

[0345] Step S902: When the voltage adjustment instruction is the first voltage adjustment instruction, adjust the voltage applied to the first conductive structure / the second conductive structure to put the bistable display structure into a partial erasing mode;

[0346] Step S903: When the voltage adjustment instruction is the second voltage adjustment instruction, adjust the voltage applied to the first conductive structure / the second conductive structure to put the bistable display structure into a global erase mode;

[0347] Step S904: when the bistable display structure is in the partial erasure mode, determining whether the light response structure receives light irradiation;

[0348] Step S905: When the light response structure receives light irradiation, detecting the irradiation range of the light;

[0349] Step S906: classify the light-responsive structure into a conducting area and a non-conducting area according to the irradiation range;

[0350] Step S907 : Classify the bistable display structure into erasable areas and non-erasable areas according to the conductive areas and the non-conductive areas.

[0351] For the light control screen 100 of Example 2, the light control method is as follows:

[0352] Step S1001: obtaining a voltage regulation instruction;

[0353] Step S1002: When the voltage adjustment instruction is the fourth voltage adjustment instruction, adjust the voltage applied to the first conductive structure / the second conductive structure to put the bi-stable display structure into a writing mode;

[0354] Step S1003: When the voltage adjustment instruction is the third voltage adjustment instruction, adjust the voltage applied to the first conductive structure / the second conductive structure to put the bistable display structure into a partial erasing mode;

[0355] Step S1004: when the bistable display structure is in the writing mode or the partial erasing mode, determining whether the light response structure receives light irradiation;

[0356] Step S1005: When the light response structure receives light irradiation, detecting the irradiation range of the light;

[0357] Step S1006: classify the light-responsive structure into a conducting area and a non-conducting area according to the irradiation range;

[0358] Step S1007 : Classify the bistable display structure into erasable areas (writable areas) and non-erasable areas (non-writing areas) according to the conducting areas and the non-conducting areas.

[0359] The technical effects of the present invention are as follows:

[0360] 1) Partial erasability: When performing partial erasing, the light control device is used to emit light to the light control screen. Except for the area illuminated by the light, the other areas of the light response structure still act as an insulator, and only the area illuminated by the light is conductive, which can achieve partial erasure of the handwriting in the conductive area.

[0361] Example 5

[0362] This embodiment relates to a specific implementation of the light control screen of the present invention.

[0363] A partially erasable light-controllable screen comprises a first conductive film, a second conductive film, an ultraviolet-responsive layer, and a cholesteric liquid crystal layer. The first conductive film comprises a first substrate and a first conductive layer; the second conductive film comprises a second substrate and a second conductive layer; the ultraviolet-responsive layer can be formed on either the first or second conductive film; and the cholesteric liquid crystal layer is disposed between the first and second conductive films and on one side of the ultraviolet-responsive layer.

[0364] One of the first conductive film and the second conductive film is a transparent conductive film, and the other is a dark conductive film. In this embodiment, the first conductive film is a transparent conductive film, the second conductive film is a dark conductive film, the ultraviolet responsive layer is formed on the second conductive film, and the cholesteric liquid crystal layer is disposed between the first conductive film and the ultraviolet responsive layer.

[0365] The material of the first substrate is not limited, and is preferably polyethylene terephthalate (PET), other flexible materials or non-flexible transparent materials may also be used. The transmittance of the first substrate is preferably 15% to 90%, and most preferably 75% to 90%.

[0366] The material and manufacturing process of the first conductive layer are not limited, and conductive materials and processes used in liquid crystal writing tablets well known to those skilled in the art can be used.

[0367] In some embodiments, the manufacturing process of the first conductive film is as follows: a 125 μm PET film is used as the first substrate, and a 200 nm ITO layer as the first conductive layer is sputtered in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0368] The material of the second substrate is not limited, and any flexible material or non-flexible dark material can be used. The transmittance of the second substrate is preferably 0% to 80%, and most preferably 0% to 35%.

[0369] The material and manufacturing process of the second conductive layer are not limited, and conductive materials and processes used in liquid crystal writing tablets well known to those skilled in the art can be used.

[0370] In some embodiments, the second conductive film is manufactured as follows: a 125 μm dark PET film is used as the second substrate, and a 200 nm thick ITO layer is sputtered as the second conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0371] The material of the ultraviolet response layer is not limited, and any material that is high-resistance, sensitive to ultraviolet light, or can form a pn junction or Schottky contact with the first conductive layer or the second conductive layer can be used.

[0372] The location of the UV response layer is not limited and can be on a transparent conductive film or a dark conductive film. The manufacturing process is also not limited and can adopt a well-known coating process or spin coating process.

[0373] In some embodiments, the UV response layer is prepared as follows: a 100 nm zinc oxide layer is sputtered as the UV response layer on the second conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71).

[0374] The raw material of the cholesteric liquid crystal layer is liquid crystal paste, and its main components are cholesteric liquid crystal, spacer, prepolymer, and photoinitiator. The specific components are not limited, and materials well known to those skilled in the art can be used.

[0375] In some of the embodiments, the preparation process of the cholesteric liquid crystal layer is as follows: the cholesteric liquid crystal, prepolymer, and photoinitiator are stirred and mixed at a mass ratio of 70:28:2 at 40°C for 5 hours, and then 0.4% by mass of 500nm spacers are mixed with the mixed slurry to obtain a liquid crystal slurry.

[0376] In this embodiment, the assembly method of the light-control screen is as follows: the liquid crystal slurry is evenly distributed between the first conductive film (transparent conductive film) and the second conductive film (dark conductive film) by extrusion coating, pouring or other common methods, cured by ultraviolet irradiation and sealed with ultraviolet curing glue or other adhesives.

[0377] The method of using this embodiment is as follows:

[0378] 1) Writing mode

[0379] Without applying voltage to the first conductive film and the second conductive film, when physically squeezed, the cholesteric liquid crystal layer changes from a planar state to a focal conic state, thereby leaving handwriting on the light-regulating screen and realizing the writing function;

[0380] 2) Partial erase mode

[0381] A bias voltage of continuous low voltage or low voltage pulse is applied between the first conductive film and the second conductive film, and the ultraviolet response layer forms an inverse pn junction structure or a Schottky contact with the second conductive layer in the second conductive film (dark conductive film), or the ultraviolet response layer itself is in a high-resistance state. Under the low voltage bias, the circuit is not conductive, and the cholesteric liquid crystal layer still maintains a focal conic state. Under external ultraviolet irradiation, the ultraviolet response layer irradiated by the ultraviolet light is conductive, so that when a low voltage is applied to the cholesteric liquid crystal layer at the corresponding part, the liquid crystal state of the part changes from the focal conic state to the planar state, thereby achieving local handwriting erasure;

[0382] 3) Global Erase Mode

[0383] A high voltage pulse is applied as a bias between the first conductive film and the second conductive film. The higher voltage will break down the reverse pn junction or Schottky contact, or according to the voltage divider law, there will be a higher voltage in the cholesteric liquid crystal layer, causing the entire liquid crystal in the cholesteric liquid crystal layer to be transformed into a planar state, thereby achieving full-screen erasure of handwriting.

[0384] Example 6

[0385] This embodiment relates to a specific implementation of the light control screen of the present invention.

[0386] A partially erasable light-controllable screen includes a first conductive film, a second conductive film, a first ultraviolet-responsive layer, a second ultraviolet-responsive layer, and an electronic ink layer. The first conductive film includes a first substrate and a first conductive layer; the second conductive film includes a second substrate and a second conductive layer; the first ultraviolet-responsive layer is formed on the first conductive film; the second ultraviolet-responsive layer is formed on the second conductive film; and the electronic ink layer is disposed between the first and second ultraviolet-responsive layers.

[0387] The material of the first substrate is not limited, and is preferably polyethylene terephthalate (PET). Other flexible materials or non-flexible transparent materials may also be used.

[0388] The material and manufacturing process of the first conductive layer are not limited, and conductive materials and processes used in liquid crystal writing tablets well known to those skilled in the art can be used.

[0389] In some embodiments, the manufacturing process of the first conductive film is as follows: a 125 μm PET film is used as the first substrate, and a 200 nm ITO layer as the first conductive layer is sputtered in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0390] The material of the second substrate is not limited, and is preferably polyethylene terephthalate (PET). Other flexible materials or non-flexible transparent materials may also be used.

[0391] The material and manufacturing process of the second conductive layer are not limited, and conductive materials and processes used in liquid crystal writing tablets well known to those skilled in the art can be used.

[0392] In some embodiments, the second conductive film is manufactured as follows: a 125 μm PET film is used as the second substrate, and a 200 nm thick ITO layer is sputtered as the second conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0393] The material of the first ultraviolet responsive layer is not limited, and any material may be high-resistance, sensitive to ultraviolet light, or capable of forming a pn junction or Schottky contact with the first conductive layer.

[0394] In some embodiments, the manufacturing process of the first ultraviolet response layer is as follows: on the first conductive film, a 100nm zinc oxide layer is sputtered as the first ultraviolet response layer using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71).

[0395] The material of the second ultraviolet responsive layer is not limited, and any material may be high-resistance, sensitive to ultraviolet light, or capable of forming a pn junction or Schottky contact with the first conductive layer.

[0396] In some embodiments, the second ultraviolet response layer is prepared as follows: a 100 nm zinc oxide layer is sputtered on the second conductive film in a mixed atmosphere of oxygen and argon (4:71) using magnetron sputtering technology as the second ultraviolet response layer.

[0397] There is no limitation on the material and manufacturing process of the electronic ink layer, and any material commonly used in the same field can be used.

[0398] In some embodiments, the manufacturing process of the electronic ink layer is as follows: laying the electronic ink capsules on the second conductive layer to ensure the contact between each electronic ink capsule and the electrode, covering the electronic ink capsules with a first conductive film, injecting a transparent adhesive between the electronic ink capsules, and reducing the distance between the electrode and the electronic ink capsules.

[0399] The method of using this embodiment is as follows:

[0400] 1) Writing mode

[0401] A forward voltage is applied between the first conductive film and the second conductive film. Under the action of the first ultraviolet response layer and the second ultraviolet response layer, when there is no ultraviolet light irradiation, the electric field of the electronic ink layer is small and no display can be achieved. When there is ultraviolet light irradiation, the first ultraviolet response layer and the second ultraviolet response layer are turned on, and the ions of the corresponding charge in the electronic ink layer move to the upper part of the electronic ink layer, thereby achieving the display of the ultraviolet irradiated handwriting.

[0402] 2) Partial erase mode

[0403] A reverse voltage is applied between the first conductive film and the second conductive film. Under the action of the first ultraviolet response layer and the second ultraviolet response layer, when there is no ultraviolet light irradiation, the electric field of the electronic ink layer is small and erasure cannot be achieved; when there is ultraviolet light irradiation, the first ultraviolet response layer and the second ultraviolet response layer are turned on, and the electric field strength of the electronic ink layer becomes larger, thereby achieving local erasure.

[0404] The above description is only a preferred embodiment of the present invention and does not limit the implementation mode and protection scope of the present invention. For those skilled in the art, it should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the description and illustrations of the present invention should be included in the protection scope of the present invention.

Claims

1. A light control screen, characterized in that: include: a first conductive structure; a second conductive structure, the second conductive structure being arranged opposite to the first conductive structure; A light-responsive structure, the light-responsive structure being disposed between the first conductive structure and the second conductive structure, and being configured to be in a non-conductive state when there is no light irradiation and in a conductive state when there is light irradiation, wherein the wavelength of the light is 200nm to 2000nm; A bistable display structure is arranged between the first conductive structure and the second conductive structure and is located on one side or inside the photoresponsive structure, and is used to be in a local erased state under voltage regulation and when the photoresponsive structure is in a conductive state.

2. The light control screen according to claim 1, characterized in that: The first conductive structure comprises: First grassroots level; A first conductive layer, the first conductive layer is disposed on a side of the first base layer close to the second conductive structure; and / or The second conductive structure comprises: Second base layer; The second conductive layer is disposed on a side of the second base layer close to the first conductive structure.

3. The light control screen according to claim 1, characterized in that: The photoresponsive structure comprises: A first photoresponsive layer, wherein the first photoresponsive layer is disposed between the first conductive structure and the bistable display structure; and / or A second photoresponsive layer is disposed between the second conductive structure and the bistable display structure.

4. The light control screen according to claim 1, characterized in that: The bistable display structure comprises: A liquid crystal display layer, wherein the liquid crystal display layer is disposed between the first conductive structure and the second conductive structure and is located on one side of the light-responsive structure, and is used to be in a writing state and a global erasing state under the action of voltage regulation, and to be in a local erasing state under the action of voltage regulation and when the light-responsive structure is in a conducting state; or An ink display layer is arranged between the first conductive structure and the second conductive structure and is located on the inner side of the light response structure, and is used to be in a writing state, a global erasing state, and a local erasing state under voltage regulation and when the light response structure is in a conductive state.

5. A method for preparing a light-regulating screen, for preparing the light-regulating screen as claimed in any one of claims 1 to 4, characterized in that: include: (Preparing a First Conductive Structure) forming a first conductive layer on the surface of the first base layer to form a first conductive structure; (Preparing the Second Conductive Structure) forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Preparation of Photoresponsive Structures) forming a first photoresponsive layer on the surface of the first conductive layer; and / or forming a second photoresponsive layer on the surface of the second conductive layer; (Preparation of light-controlled screens) Assembling the first base layer, the first conductive layer, the first light response layer, the liquid crystal display layer, the second conductive layer, and the second base layer to form a light control screen; or Assembling a first base layer, a first conductive layer, a liquid crystal display layer, a second light response layer, a second conductive layer, and a second base layer to form a light control screen; or Assembling a first base layer, a first conductive layer, a first light response layer, a liquid crystal display layer, a second light response layer, a second conductive layer, and a second base layer to form a light control screen; or The first base layer, the first conductive layer, the first light response layer, the ink display layer, the second light response layer, the second conductive layer and the second base layer are assembled to form a light control screen.

6. A light control system, characterized in that: include: The light control screen as claimed in any one of claims 1 to 4; or A light-regulating screen prepared by the preparation method as claimed in claim 5.

7. The light control system according to claim 6, characterized in that: Also includes: A control device is connected to the light regulating screen and is used to adjust the voltage applied to the light regulating screen.

8. The light control system according to claim 6 or 7, characterized in that: Also includes: A light regulating device, wherein the light regulating device emits light to the light regulating screen to change the state of the light response structure of the light regulating screen, wherein the wavelength of the light is 200nm to 2000nm.

9. A light control method, characterized in that: include: Get voltage regulation instructions; adjusting the voltage applied to the first conductive structure / the second conductive structure according to the voltage adjustment instruction so that the bistable display structure is in a local erasing mode; When the bistable display structure is in a local erasure mode, determining whether the light response structure is irradiated with light, wherein the wavelength of the light is 200 nm to 2000 nm; When the light-responsive structure is irradiated with light, the light-responsive structure is in a conducting state, so that the bistable display structure irradiated with light is in a partially erased state; When the photo-responsive structure is not irradiated with light, the photo-responsive structure is in a non-conducting state, so that the bistable display structure is not in a partially erased state.

10. The light control method according to claim 9, characterized in that: Also includes: When the light-responsive structure is irradiated with light, detecting the irradiation range of the light; Classifying the photoresponsive structure into a conducting area and a non-conducting area according to the irradiation range; The bistable display structure is classified into an erasable area and a non-erasable area according to the conducting area and the non-conducting area.

Images