Vacuum chamber and film formation device

Abstract

A vacuum chamber constituting a film formation device includes: a first wall member forming an outer wall of the vacuum chamber; a second wall member fixed to the first wall member and forming an outer wall of the vacuum chamber; and a fixing means for fixing the first wall member to the second wall member. The first wall member includes: a first space forming portion forming an internal space of the vacuum chamber; and a first flange portion around the first space forming potion. The second wall member includes a second space forming portion forming an internal space of the vacuum chamber and a second flange portion around the second space forming portion. The fixing means fixes the first flange portion and the second flange portion. The vacuum chamber has a reinforcing structure for preventing misalignment of a fixing position between the first flange portion and the second flange portion.

Description

Vacuum chamber and film forming device

[0001] The present invention relates to a vacuum chamber and a film forming apparatus.

[0002] A film formation technique for forming a film on a substrate is known. The film formation is performed by maintaining a vacuum inside a chamber in a film formation apparatus. Patent Document 1 discloses a vacuum chamber that is provided in a processing apparatus such as a sputtering apparatus or an etching apparatus and that performs a predetermined process. Such a vacuum chamber is sometimes divided into multiple components for convenience during transportation, etc.

[0003] Japanese Patent Application Laid-Open No. 2006-137995

[0004] In a vacuum chamber that can be divided into multiple components, the multiple components are assembled by fastening them together. After assembly, when the inside of the vacuum chamber is evacuated, the pressure difference between the inside and outside can cause the fastening positions that fasten the components to shift. If the fastening positions that fasten the components to shift, the degree of vacuum inside the vacuum chamber can decrease.

[0005] The present invention provides a technology that can prevent the fixed positions of components from shifting and prevent a decrease in the degree of vacuum inside the vacuum chamber, even in a vacuum chamber that can be divided into multiple components.

[0006] According to the present invention, there is provided a vacuum chamber constituting a film forming apparatus, comprising: a first wall member forming an outer wall of the vacuum chamber; a second wall member fixed to the first wall member and forming the outer wall of the vacuum chamber; and fixing means for fixing the first wall member to the second wall member, wherein the first wall member comprises: a first space forming portion forming an internal space of the vacuum chamber; and a first flange portion around the first space forming portion; the second wall member comprises: a second space forming portion forming the internal space of the vacuum chamber; and a second flange portion around the second space forming portion, the fixing means fixes the first flange portion to the second flange portion, and the vacuum chamber has a reinforcing structure for preventing deviation of the fixed positions of the first flange portion and the second flange portion.

[0007] According to the present invention, even in a vacuum chamber that can be divided into a plurality of members, it is possible to suppress displacement of the fixing positions between the members and prevent a decrease in the degree of vacuum inside the vacuum chamber.

[0008] 7 is a schematic diagram of a film forming apparatus according to one embodiment of the present invention. FIG. 7 is a diagram illustrating the operation of the film forming apparatus of FIG. 2. FIG. 7 is a diagram illustrating the operation of the film forming apparatus of FIG. 2. FIG. 7 is a diagram illustrating the operation of the film forming apparatus of FIG. 2. FIG. 7 is a diagram illustrating the operation of the film forming apparatus of FIG. 2. FIG. 7 is a diagram illustrating the operation of the film forming apparatus of FIG. 2. A perspective view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A view taken in the direction of an arrow C in FIG. 7. A view taken in the direction of an arrow D in FIG. 7. A diagram showing an example of the shape of a reinforcing structure. A diagram showing an example of the shape of a reinforcing structure. A perspective view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A perspective view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A perspective view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber. A cross-sectional view of a vacuum chamber.

[0009] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0010] <First Embodiment> <Film Forming Apparatus> Fig. 1 is a schematic diagram of a film forming apparatus 1 according to one embodiment of the present invention. The film forming apparatus 1 is an apparatus that forms a film of a vapor deposition material on a substrate 101, and forms a thin film of the vapor deposition material in a predetermined pattern using a mask 102. The material of the substrate 101 on which a film is formed in the film forming apparatus 1 can be appropriately selected from materials such as glass, resin, and metal. The substrate 101 is, for example, a glass substrate on which TFTs (Thin Film Transistors) are formed or a silicon wafer on which semiconductor elements are formed.

[0011] The deposition material may be an organic material, an inorganic material (metal, metal oxide, etc.), or the like. The film formation apparatus 1 is applicable to, for example, manufacturing apparatuses for manufacturing electronic devices such as display devices (such as flat panel displays), thin-film solar cells, and organic photoelectric conversion elements (organic thin-film imaging elements), as well as optical components, and is particularly applicable to manufacturing apparatuses for manufacturing organic EL panels. In the following description, an example will be described in which the film formation apparatus 1 forms a film on the substrate 101 by vacuum deposition, but the present invention is not limited to this, and various film formation methods such as sputtering, CVD, and ALD can be applied.

[0012] The film forming apparatus 1 has a box-shaped vacuum chamber 2. The internal space of the vacuum chamber 2 is maintained in a vacuum atmosphere or an inert gas atmosphere such as nitrogen gas. In this embodiment, the vacuum chamber 2 is connected to a vacuum pump (not shown). A vapor deposition unit 10 is disposed in the internal space of the vacuum chamber 2. The vapor deposition unit 10 includes a vapor deposition source that releases a vapor deposition material upward. A shutter 10a that restricts and releases the release of the vapor deposition material is disposed above the vapor deposition unit 10. The shutter 10a is opened and closed by an opening / closing mechanism (not shown). FIG. 1 shows the shutter 10a in a closed state, restricting the release of the vapor deposition material from the vapor deposition unit 10. An adhesion prevention plate 2a is also disposed above the vapor deposition unit 10. The adhesion prevention plate 2a prevents the vapor deposition material from undesirably adhering to the following components disposed above the internal space of the vacuum chamber 2.

[0013] A substrate support plate 3 that supports the substrate 101 in a horizontal position is provided in the internal space of the vacuum chamber 2. In this embodiment, the substrate support plate 3 is an electrostatic chuck that attracts and holds the substrate 101 to its lower surface by electrostatic force. A cooling plate 4 is fixed on the substrate support plate 3. The cooling plate 4 is equipped with, for example, a water cooling mechanism, and cools the substrate 101 via the substrate support plate 3 during film formation.

[0014] The substrate support plate 3 and the cooling plate 4 are suspended from the magnetic plate 5 via the support portion 5a so as to be displaceable in the Z direction. The magnetic plate 11 is a plate that attracts the mask 102 by magnetic force. During film formation, the substrate 101 is sandwiched between the magnetic plate 5 and the mask 102 by magnetic force, thereby improving the adhesion between the substrate 101 and the mask 102. The mask 102 may be made of metal. Alternatively, the mask 102 may be made of silicon. If the mask 102 is made of silicon, fine patterns can be formed on the mask by applying microfabrication technology. The mask 102 may also be provided with a magnetic material such as Fe, Co, or Ni. By providing the mask 102 with a magnetic material, the mask 102 can be brought into close contact with the substrate 101 by the magnetic force of the magnetic plate, even if the mask 102 is non-magnetic.

[0015] The film forming apparatus 1 includes a mask support unit 6 that supports the mask 102 during film formation. In this embodiment, the mask support unit 6 also transfers the substrate 101 between the transport unit 121 and the substrate support plate 3. The mask support unit 6 includes a pair of support members 6a spaced apart in the X direction. Each support member 6a is raised and lowered by a corresponding actuator 6b. In this embodiment, an actuator 6b is provided for each support member 6a, but a single actuator 6b may be used to raise and lower the pair of support members 6a. The actuator 6b may be, for example, an electric cylinder or an electric ball screw mechanism. The support member 6a includes a claw portion F1 at its lower end. The peripheral edge of the substrate 101 or the mask 102 is placed on the claw portion F1. In the example of FIG. 1, the mask 102 is placed on the claw portion F1. The pair of support members 6a are raised and lowered synchronously to raise and lower the substrate 101 or the mask 102.

[0016] The film forming apparatus 1 includes an alignment unit 8 that aligns the substrate 101 and the mask 102. The alignment apparatus 8 includes a drive mechanism 80 and a plurality of measurement units SR. The drive mechanism 80 includes a distance adjustment unit 81, a support shaft 82, a stand 83, and a position adjustment unit 84.

[0017] The distance adjustment unit 81 is a mechanism for raising and lowering the support shaft 82 in the Z direction, and includes, for example, an electric cylinder or an electric ball screw mechanism. A magnet plate 5 is fixed to the lower end of the support shaft 82, and raising and lowering the support shaft 82 raises and lowers the substrate support plate 3 via the magnet plate 5. By raising and lowering the substrate support plate 3, the distance between the substrate 101 and the mask 102 is adjusted, and the substrate 101 and the mask 102 supported by the substrate support plate 3 are moved closer to or farther apart in the thickness direction (Z direction) of the substrate 101. In other words, the distance adjustment unit 81 brings the substrate 101 and the mask 102 closer to or farther apart in the overlapping direction. Note that the "distance" adjusted by the distance adjustment unit 81 is the so-called vertical distance (or perpendicular distance), and the distance adjustment unit 81 can also be said to be a unit that adjusts the vertical position of the substrate 101. The distance adjustment unit 81 is mounted on the position adjustment unit 84 via a stand 83.

[0018] The position adjustment unit 84 adjusts the relative position of the substrate 101 with respect to the mask 102 by displacing the substrate support plate 3 on the X-Y plane. In other words, the position adjustment unit 80 can also be said to be a unit that adjusts the horizontal positions of the mask 102 and the substrate 101. The position adjustment unit 80 can displace the substrate support plate 6 in a rotational direction (θ direction) around axes in the X, Y, and Z directions. In this embodiment, the position of the mask 102 is fixed and the substrate 101 is displaced to adjust their relative positions, but the mask 102 may also be displaced to adjust the position, or both the substrate 101 and the mask 102 may be displaced.

[0019] The position adjustment unit 84 includes a fixed plate 84a and a movable plate 84b. The fixed plate 84a and the movable plate 84b are rectangular frame-shaped plates, and the fixed plate 84a is fixed onto the upper wall 20 of the vacuum chamber 2. An actuator is provided between the fixed plate 84a and the movable plate 84b to displace the movable plate 84b relative to the fixed plate 84a in the X-direction, Y-direction, and rotational directions around the Z-direction axes.

[0020] A frame-shaped base 83 is mounted on the movable plate 84b, and the base 83 supports the distance adjustment unit 81. When the movable plate 84b is displaced, the base 83 and the distance adjustment unit 81 are displaced together. This allows the substrate 101 to be displaced in the X-direction, Y-direction, and rotational directions around the Z-direction axes. Openings are formed in the upper wall 2b through which the support shaft 82 and support members 6a and 7a pass. These openings are sealed with sealing members (such as bellows) (not shown), maintaining airtightness within the vacuum chamber 2.

[0021] The measurement unit SR measures the positional misalignment between the substrate 101 and the mask 102. In this embodiment, the measurement unit SR is an imaging device (camera) that captures images. The measurement unit SR is disposed on the upper wall portion 2b and is capable of capturing images inside the vacuum chamber 2. Alignment marks (not shown) are formed on the substrate 101 and the mask 102, respectively. The measurement unit SR captures images of each alignment mark on the substrate 101 and the mask 102. The amount of positional misalignment between the substrate 101 and the mask 102 is calculated based on the position of each alignment mark, and the position adjustment unit 84 adjusts the relative positions of the substrate 101 and the mask 102 to eliminate the amount of positional misalignment.

[0022] The control device 9 controls the entire film forming apparatus 1. The control device 9 includes a processing unit 90, a storage unit 91, an input / output interface (I / O) 92, and a communication unit 93. The processing unit 90 is a processor typified by a CPU, and controls the film forming apparatus 1 by executing a program stored in the storage unit 92. The storage unit 91 is a storage device such as a ROM, RAM, or HDD, and stores various control information in addition to the program executed by the processing unit 90. The I / O 92 is an interface that transmits and receives signals between the processing unit 90 and an external device. The communication unit 93 is a communication device that communicates with a higher-level device or another control device via a communication line.

[0023] <Control Example> A description will be given of a control example of the film forming apparatus 1 executed by the processing unit 90 of the control unit 9. Figures 2A to 6B are explanatory diagrams of the operation of the film forming apparatus 1, showing an example from loading of the substrate 101 to film formation and unloading.

[0024] 2A shows the state in which the substrate 101 has been carried into the vacuum chamber 2. The substrate 101 is carried below the substrate support plate 3 by the transfer robot 121. The substrate attraction surface 3a on the underside of the substrate support plate 3 is horizontal. Next, the mask support unit 6 transfers the substrate 101 from the transfer robot 121 to the substrate support plate 3. 2B of FIG. 2 shows this operation. By raising the support member 6a, the peripheral edge of the substrate 101 is placed on the claws F1, and the substrate 101 is raised from the transfer robot 121 and pressed against the substrate attraction surface 3a of the substrate support plate 3. The electrostatic chuck of the substrate support plate 3 is activated to attract and hold the substrate 101.

[0025] Next, the mask 102 is carried into the vacuum chamber 2. 3A in FIG. 3 shows the state in which the mask 102 has been carried into the vacuum chamber 2. The mask 102 is carried into the vacuum chamber 2 from a storage chamber (not shown) by the transfer robot 131. The mask 102 is positioned directly below the substrate 101. Next, the mask 102 is transferred from the transfer robot 131 to the mask support unit 6 and positioned at the alignment position. 3B in FIG. 3 shows this operation. By raising the support member 6a, the periphery of the mask 102 is placed on the claw portion F1, and the mask 102 is raised from the transfer robot 131. The mask 102 is supported by the support member 6a, and by further raising, it is positioned at the alignment position. In this embodiment, the mask 102 is raised to be positioned at the alignment position, but a configuration in which the substrate 101 is lowered to be positioned at the alignment position may also be used.

[0026] Next, an alignment operation is performed. As shown in 4A of FIG. 4, the measurement unit SR measures the relative positions of the alignment marks on the substrate 101 and the mask 102. If the measurement result (the amount of misalignment between the substrate 101 and the mask 102) is within the allowable range, the alignment operation is terminated. If the measurement result is outside the allowable range, a control amount (the amount of displacement of the substrate 101) is set based on the measurement result to bring the amount of misalignment within the allowable range.

[0027] The "amount of misalignment" is defined as the distance and direction (X, Y, θ) of the misalignment. Based on the set control amount, the position adjustment unit 80 is operated as shown in FIG. 4B. This displaces the substrate support plate 3 on the XY plane, and the relative position of the substrate 101 with respect to the mask 102 is adjusted.

[0028] Whether or not the measurement results are within the allowable range can be determined, for example, by calculating the distances between the alignment marks and comparing the average value or sum of squares of the distances with a preset threshold value.

[0029] After adjusting the relative positions, the measurement unit SR again measures the relative positions of the alignment marks on the substrate 101 and the mask 102. If the measurement result is within the tolerance range, the alignment operation is terminated. If the measurement result is outside the tolerance range, the relative position of the substrate 101 with respect to the mask 102 is adjusted again. Thereafter, measurement and relative position adjustment are repeated until the measurement result falls within the tolerance range.

[0030] Next, a film formation operation is performed. First, the substrate 101 is placed on the mask 102. 5A in FIG. 5 shows this operation. When the substrate support plate 3 is lowered, the substrate 101 is placed on the mask 102, and the entire surface to be processed of the substrate 101 comes into contact with the mask 102. The magnetic plate 5 abuts on the cooling plate 4, and from above, the magnetic plate 5, cooling plate 4, substrate support plate 3, substrate 101, and mask 102 are in close contact. The magnetic force of the magnetic plate 5 attracts the mask 102, allowing the mask 102 and the substrate 101 to be in close contact with each other overall.

[0031] 5B, the shutter 10a is opened to release the deposition material from the deposition unit 10. The deposition material is deposited on the substrate 101 through the mask 102.

[0032] When this film formation is completed, the mask 102 and the substrate 101 are each unloaded. 6A in Fig. 6 shows the operation of unloading the mask 102. First, the magnetic plate 5 is raised, and the substrate 101 and the mask 102 are separated from each other. After the hand portion of the transport robot 131 is advanced below the mask 102, the support member 6a of the mask support unit 6 is lowered, and the mask 102 is transferred from the support member 6a to the transport robot 131. The transport robot 131 transports the mask 102 to a storage chamber (not shown).

[0033] Next, the substrate 101 on which the film has been formed is carried out. The support members 6a of the mask support unit 6 are raised, and the substrate 101 is supported from below by the claws F1. The suction of the substrate support unit 3 to the substrate 101 is released, and the substrate 101 is transferred to the support members 6a. After the hand portion of the transfer robot 121 is advanced below the substrate 101, the support members 6a of the mask support unit 6 are lowered as shown in FIG. 6B , and the substrate 101 is transferred from the support members 6a to the transfer robot 121. The transfer robot 121 transfers the substrate 101 to a transfer path (not shown). This completes the operations from carrying in the substrate 101, to film formation, and carrying it out.

[0034] <Configuration Example of Vacuum Chamber> The configuration of the vacuum chamber 2 will be described with reference to Figures 7 to 9B. Figure 7 is a perspective view showing a configuration example of the vacuum chamber 2 in this embodiment. In the following description, each component of the film forming apparatus 1 described above will be omitted.

[0035] As shown in FIG. 7 , the vacuum chamber 2 constituting the film forming apparatus 1 in this embodiment includes a wall member 21 and a wall member 22 that form the outer wall of the vacuum chamber 2. The wall member 21 includes a flange portion 210. The wall member 22 includes a flange portion 220. In the vacuum chamber 2, the flange portion 210 and the flange portion 220 are fixed to each other by a fixing portion 23. The fixing portion 23 fixes the flange portion 210 and the flange portion 220 at multiple positions. The fixing portion 23 fixes the flange portion 210 and the flange portion 220 to each other, thereby fixing the wall member 21 and the wall member 22 to each other. The fixing portion 23 is, for example, a fastening member such as a bolt or a nut. The fastening member may be, for example, a screw, a rivet, a pin, an adhesive, or solder. When the fixing portion 23 is removed, the wall member 21 including the flange portion 210 and the wall member 22 including the flange portion 220 can be separated. In this way, the vacuum chamber 2 has a dividable configuration, which improves convenience during transportation of the vacuum chamber 2. For example, even if the vacuum chamber 2 is large, the vacuum chamber 2 can be divided and transported.

[0036] Please refer to Figures 8A and 8B. Figures 8A and 8B are cross-sectional views of the vacuum chamber 2. Figure 8A corresponds to the cross-sectional view of the vacuum chamber 2 as viewed in the direction of the arrow A in Figure 7. That is, Figure 8A corresponds to the cross-sectional view of the vacuum chamber 2 as viewed in the horizontal direction (Y direction). Figure 8B corresponds to the cross-sectional view of the vacuum chamber 2 as viewed in the direction of the arrow B in Figure 7. That is, Figure 8B corresponds to the cross-sectional view of the vacuum chamber 2 as viewed in the height direction (Z direction).

[0037] 8A and 8B , the flange portion 210 of the wall member 21 and the flange portion 220 of the wall member 22 abut against each other and are fixed by the fixing portion 23 to form an internal space. The wall member 21 has an upper wall portion 21a and a lower wall portion 21b in the vertical direction (height direction) of the vacuum chamber 2, and side wall portions 21c, 21d, and 21e in the horizontal direction. The surface of the wall member 21 facing the wall member 22 is open. The wall member 21 has a space-forming portion R1 that forms the internal space of the vacuum chamber 2. The space-forming portion R1 is a portion surrounded by the wall member 21. The space-forming portion R1 is formed by the upper wall portion 21a, the lower wall portion 21b, the side wall portion 21c, the side wall portion 21d, and the side wall portion 21e of the wall member 21. The wall member 22 has an upper wall portion 22a and a lower wall portion 22b in the vertical direction (height direction) of the vacuum chamber 2, and side wall portions 22c, 22d, and 22e in the horizontal direction. The wall member 22 has an opening on the surface facing the wall member 21. The wall member 22 has a space-forming portion R2 that forms the internal space of the vacuum chamber 2. The space-forming portion R2 is a portion surrounded by the wall member 22. The space-forming portion R2 is formed by the upper wall portion 22a, the lower wall portion 22b, the side wall portion 22c, the side wall portion 22d, and the side wall portion 22e of the wall member 22. The space-forming portion R1 has a depth of length L1 in the X direction of the vacuum chamber 2. The space-forming portion R2 has a depth of length L2 in the X direction of the vacuum chamber 2. As shown in FIG. 8A , the space-forming portions R1 and R2 have the same height L3 in the Z direction of the vacuum chamber 2. As shown in FIG. 8B , the space-forming portion R1 and the space-forming portion R2 have the same width L4. That is, the space-forming portion R1 is a portion that is larger than the space-forming portion R2. Specifically, the space-forming portion R1 is a portion that has a larger formed volume in the internal space. The formed volume can also be referred to as the volume of the internal space. In other words, the space-forming portion R1 is also a portion that has a larger outer surface area than the space-forming portion R2.

[0038] When the internal space is evacuated using a vacuum pump (not shown) or the like, an internal / external pressure difference occurs. The internal / external pressure difference is the pressure difference between the internal space of the vacuum chamber 2 and the outside. The wall member 21 is also a portion with lower rigidity against the internal / external pressure difference than the wall member 22. For example, even if the pressure difference per unit area of ​​the wall member 21 and the wall member 22 is the same, the space-forming portion R1 is larger than the space-forming portion R2, so the wall member 21 is subjected to a greater force due to the internal / external pressure difference than the wall member 22. Note that in this embodiment, the wall member 21 and the wall member 22 have the same thickness, but they may have different thicknesses. When a greater force due to the internal / external pressure difference is applied to the wall member 21 than to the wall member 22, a load is applied to the flange portion 210, for example, in the direction D1 shown in FIG. 8A or the direction D2 shown in FIG. 8B. In other words, a shear force may be generated in the fixing portion 23 in the direction D1 shown in FIG. 8A or the direction D2 shown in FIG. 8B. When a shear force is generated in the fixing portion 23, the fixing positions of the flange portion 210 and the flange portion 220 fixed by the fixing portion 23 may become misaligned. If the fixing positions become misaligned, the degree of vacuum in the internal space of the vacuum chamber 2 may decrease. In this embodiment, the reinforcing structure 24 of the flange portion 210, which will be described later, can prevent the fixing positions from becoming misaligned.

[0039] 7 to 8B , the flange portion 210 is formed around the space forming portion R1. The flange portion 220 is formed around the space forming portion R2. The vacuum chamber 2 has a reinforcing structure 24 that prevents the flange portions 210 and 220 from shifting from their fixed positions. The height H1 of the flange portion 210 is higher than the height H2 of the flange portion 220. In this embodiment, the reinforcing structure 24 is the portion of the height H1 of the flange portion 210 that is higher than the height H2 of the flange portion 220.

[0040] Also refer to Figures 9A and 9B. Figure 9A corresponds to a view taken in the direction of arrow C in Figure 7. Figure 9B corresponds to a view taken in the direction of arrow D in Figure 7. As shown in Figure 9A, the reinforcement structure 24 in this embodiment has a structure in which the flange portion 210 is larger than the flange portion 220. Specifically, the reinforcement structure 24 has a structure in which the flange portion 210 has a larger volume than the flange portion 220. Furthermore, when the flange portion 210 is viewed from the flange portion 220 side, the area of ​​the flange portion 210 is larger than that of the flange portion 220. The reinforcement structure 24 can also be said to have a structure in which the flange portion 210 has a larger area than the flange portion 220. By making the flange portion 210 larger than the flange portion 220, the strength of the flange portion 210 can be made higher than that of the flange portion 220. In other words, the reinforcement structure 24 can also be said to have a structure in which the flange portion 210 has a higher strength than the flange portion 220. According to this embodiment, the vacuum chamber 2 has a reinforcement structure 24 in which the flange portion 210 is larger than the flange portion 220. This prevents the fixed positions of the flange portion 210 and the flange portion 220 from shifting, even in the case of a vacuum chamber 2 that can be divided into multiple members, such as the wall member 21 and the wall member 22. Therefore, it is possible to prevent a decrease in the degree of vacuum in the internal space of the vacuum chamber 2. Second Embodiment In the first embodiment, an example was described in which the outer shape of the reinforcement structure 24 of the flange portion 210 is quadrangular (rectangular), as shown in FIGS. 9A and 9B . The shape of the reinforcement structure 24 of the flange portion 210 is not limited to this. The shape of the reinforcement structure 24 of the flange portion 210 can be designed as appropriate. FIGS. 10A and 10B show other example shapes of the reinforcement structure 24 of the flange portion 210.

[0041] The outer shape of the reinforcing structure 24 is not limited to a rectangle, and may be another polygonal shape. Fig. 10A shows an example in which the reinforcing structure 24 of the flange portion 210 is octagonal. The outer shape of the reinforcing structure 24 is also not limited to a polygonal shape, and may be another shape. For example, as shown in Fig. 10B, the outer shape of the reinforcing structure 24 may have curved corners. Even if the flange portion 210 has the outer shape shown in Fig. 10A or 10B, by having the reinforcing structure 24 larger than the flange portion 220, it is possible to prevent the fixed position from shifting.

[0042] Third Embodiment In the first and second embodiments, examples have been described in which the reinforcement structure 24 is flat. The shape of the reinforcement structure 24 is not limited to a flat plate shape. Figures 11A and 11B show examples of other shapes of the reinforcement structure 24. Figure 11A is a perspective view of the vacuum chamber 2 in this embodiment. Figure 11B corresponds to a cross-sectional view of the vacuum chamber 2 in Figure 11A when viewed in direction A.

[0043] 11A and 11B , the reinforcement structure 24 in this embodiment has a structure in which the flange portion 210 surrounds the outer periphery of the flange portion 220. Specifically, in the reinforcement structure 24 of this embodiment, the flange portion 210 is larger than the flange portion 220. Furthermore, the reinforcement structure 24 is formed so that the flange portion 210 surrounds the outer periphery of the flange portion 220, and the flange portion 210 fits into the flange portion 220. In other words, the reinforcement structure 24 in this embodiment has a structure in which the outer periphery of the flange portion 210 protrudes toward the flange portion 220. Furthermore, the reinforcement structure 24 in this embodiment can also be said to have a structure in which the flange portion 210 hooks onto the outer periphery of the flange portion 220. For example, it is assumed that a force generated by the internal and external pressure difference is applied to the wall member 21 when the internal space of the vacuum chamber 2 is evacuated. In such a case, even if a shear force occurs in flange portion 210 in the D1 direction as shown in Figure 11B, flange portion 210 is fitted to flange portion 220, thereby preventing the fixed positions of flange portion 210 and flange portion 220 from shifting.

[0044] Fourth Embodiment In the first to third embodiments, a configuration has been described in which the flange portion 210 has a reinforcing structure 24. The reinforcing structure 24 may be a structure that is attached to the flange portion 210. Figures 12A and 12B show examples of the reinforcing structure 24 attached to the flange portion 210 in this embodiment. Figure 12A is a perspective view of the vacuum chamber 2 in this embodiment. Figure 12B corresponds to a cross-sectional view of the vacuum chamber in Figure 12A as viewed in the direction of the arrow A.

[0045] As shown in FIGS. 12A and 12B , the vacuum chamber 2 in this embodiment has a rib attached to the flange portion 210 as a reinforcing structure 24. As shown in FIG. 12A , the rib is formed across the space-forming portion R4 and the flange portion 210. Alternatively, multiple ribs may be provided on the flange portion 210. As shown in FIGS. 12A and 12B , the rib may be provided corresponding to the position of the fixing portion 23. By providing the rib corresponding to the fixing position of the fixing portion 23, it is possible to alleviate the load generated near the fixing portion 23 during evacuation, etc. In other words, the rib as the reinforcing structure 24 also serves as a support structure for supporting the flange portion 210. In this way, providing the rib as the reinforcing structure 24 on the flange portion 210 can increase the strength of the flange portion 210. Furthermore, by fixing the rib as the reinforcing structure 24 to the wall member 21, the strength of the wall member 21 can also be increased. This prevents the fixing positions of the flange portion 210 and the flange portion 220 from shifting. In this embodiment, an example has been shown in which the rib, which is the reinforcing structure 24, is provided in the Z-X plane direction, but it may also be provided in the Z-Y plane direction, for example. Also, in this embodiment, as shown in Fig. 12B, the flange portion 210 and the flange portion 220 may have the same height H3. It is to be noted that the flange portion 210 and the flange portion 220 may have different heights.

[0046] Fifth Embodiment In the fourth embodiment, a configuration was described in which a rib serving as the reinforcing structure 24 is attached to the flange portion 210. The reinforcing structure 24 may be attached to the flange portion 210 and the flange portion 220. Figures 13A and 13B show examples of the reinforcing structure 24 that can be attached to the flange portion 210 and the flange portion 220 in this embodiment. Figure 13A is a perspective view of the vacuum chamber 2 in this embodiment. Figure 13B corresponds to a cross-sectional view of the vacuum chamber 2 in Figure 13A as viewed in the direction of the arrow A.

[0047] As shown in FIGS. 13A and 13B , in the vacuum chamber 2 of this embodiment, a reinforcing structure 24 is attached to the flange portion 210 and the flange portion 220. The reinforcing structure 24 includes, for example, a fixing plate 240 and a fastening member 241. The reinforcing structure 24 is attached so as to restrain relative misalignment of the fixing surfaces of the flange portion 210 and the flange portion 220. Specifically, as shown in FIG. 13B , the flange portion 210 and the flange portion 220 in this embodiment may have the same height H3. However, the flange portion 210 and the flange portion 220 may have different heights. The reinforcing structure 24 is provided across the flange portion 210 and the flange portion 220. The reinforcing structure 24 fixes the outer circumferential edge of the flange portion 210 to the outer circumferential edge of the flange portion 220. In other words, the reinforcing structure 24 fixes the end face of the flange portion 210 to the end face of the flange portion 220. Furthermore, the reinforcing structure 24 fixes the flange portion 210 and the flange portion 220 at a position different from that of the fixing portion 23. While the fixing portion 23 fixes the flange portion 210 and the flange portion 220 at a position closer to the internal space of the vacuum chamber 2, the reinforcing structure 24 fixes the flange portion 210 and the flange portion 220 at a position farther from the internal space than the fixing portion 23. In other words, the reinforcing structure 24 is also a fixing member that increases the fixed portion between the flange portion 210 and the flange portion 220. In this way, by fixing the outer circumferential edge of the flange portion 210 and the outer circumferential edge of the flange portion 220 with the reinforcing structure 24, it is possible to prevent the fixed positions of the flange portion 210 and the flange portion 220 from shifting.

[0048] The reinforcing structure 24 is also a component that can be retrofitted to the vacuum chamber 2. Because the reinforcing structure 24 can be retrofitted to the vacuum chamber 2, a structure that prevents the fixed positions of the flange portion 210 and the flange portion 220 from shifting can be easily provided to the vacuum chamber 2. The reinforcing structure 24 is also a component that can be partially attached. Because the reinforcing structure 24 can be partially attached to the vacuum chamber 2, it can be reinforced appropriately based on the configuration, shape, etc. of the vacuum chamber 2.

[0049] Sixth Embodiment In the first to fifth embodiments, the reinforcing structure 24 that reinforces the flange portion 210 has been described. The reinforcing structure 24 may be, for example, a structure that reinforces the wall member 21. Figures 14A and 14B show examples of the reinforcing structure 24 that reinforces the wall member 21 in this embodiment. Figure 14A is a perspective view of the vacuum chamber 2 in this embodiment. Figure 14B corresponds to a cross-sectional view of the vacuum chamber in Figure 14A when viewed in direction A.

[0050] As shown in FIG. 14A , the wall member 21 in this embodiment has a reinforcing structure 24 that is larger than the wall member 22. Specifically, as shown in FIG. 14B , the reinforcing structure 24 is configured such that the plate thickness T1 of the wall member 21 is larger than the plate thickness T2 of the wall member 22. According to this embodiment, the wall member 21 can be made thicker on the space-forming portion R1 side, which has a larger surface area than the space-forming portion R2, than the wall member 22, thereby increasing the rigidity of the wall member 21. This prevents deformation of the wall member 21, even when the wall member 21 is subjected to a large force generated by the internal and external pressure difference when the internal space is evacuated. Therefore, it is possible to prevent a load from being applied to the flange portion 210 in the direction D1 in FIG. 14B due to the wall member 21 receiving the force generated by the internal and external pressure difference. This prevents misalignment between the flange portion 210 and the flange portion 220.

[0051] Other Embodiments In the first to sixth embodiments, examples have been described in which the vacuum chamber 2 can be divided into a wall member 21 including a flange portion 210 and a wall member 22 including a flange portion 220. The vacuum chamber 2 is not limited to being divisible into two wall members, and may be divided into three or more wall members. FIG. 15 shows an example of a vacuum chamber 2 in which the wall member can be divided into three. FIG. 15 is a cross-sectional view of the vacuum chamber 2 in this embodiment. The vacuum chamber in this embodiment includes a wall member 21, a wall member 22, and a wall member 22′. The wall member 21 in this embodiment includes an upper wall portion 21a and a lower wall portion 21b in the vertical direction (height direction) of the vacuum chamber 2, and side wall portions 21d and 21e (not shown) in the horizontal direction. The wall member 21 in this embodiment has portions that open to the wall member 22 side and the wall member 22′ side. The space-forming portion R1 is a portion surrounded by the wall member 21. The space forming portion R1 is formed by an upper wall portion 21a, a lower wall portion 21b, and side wall portions 21d and 21e (not shown) of the wall member 21. Furthermore, the wall member 21 in this embodiment has a flange portion 210 and a flange portion 210'. The flange portion 210 of the wall member 21 and the flange portion 220 of the wall member 22 are fixed by a fixing portion 23. The flange portion 210' of the wall member 21 and the flange portion 220' of the wall member 22' are fixed by a fixing portion 23. The wall member 22 is similar to that in the first embodiment, and therefore its description is omitted. Furthermore, the wall member 22' has the same configuration as the wall member 22, and therefore its description is omitted. Thus, even if the vacuum chamber 2 is configured to be divided into three or more wall members, the provision of the reinforcing structure 24 as described above can prevent misalignment of the fixing positions between the multiple members. Although the reinforcing structure 24 in this embodiment has been described as having the same structure as that shown in the first embodiment, it may have the structure shown in the second to sixth embodiments.

[0052] Furthermore, in the first to sixth embodiments, examples have been shown in which the fixing portion 23 penetrates and fixes the flange portion 210 and the flange portion 220, but this is not limited to this. Refer to FIG. 16 . FIG. 16 shows another example of a cross-sectional view of the vacuum chamber 2 as viewed in the direction of the arrow A in FIG. 7 . FIG. 16 corresponds to a cross-sectional view of the vacuum chamber 2 when the vacuum chamber 2 is viewed from the horizontal direction (the Y direction). As shown in FIG. 16 , the fixing portion 23′ may be inserted from the flange portion 220 side and fix the flange portion 210 and the flange portion 220 together by biting into the flange portion 210. Note that the insertion direction of the fixing portion 23′ is not limited to the direction shown in the figure. For example, the fixing portion 23′ may be inserted from the flange portion 210 side and fix the flange portion 210 and the flange portion 220 together by biting into the flange portion 220.

[0053] Furthermore, in the first to sixth embodiments, examples were shown in which the height L3 of the wall member 21 and the height L3 of the wall member 22 were equal, and the width L4 of the wall member 21 and the width L4 of the wall member 22 were equal, but this is not limited to this. See FIGS. 17A and 17B . FIGS. 17A and 17B are cross-sectional views of the vacuum chamber 2. FIG. 17A shows another example of a cross-sectional view of the vacuum chamber 2 as viewed in the direction indicated by the arrow A in FIG. 7 . FIG. 17A corresponds to the cross-sectional view of the vacuum chamber 2 when viewed from the horizontal direction (Y direction). FIG. 17B shows another example of a cross-sectional view of the vacuum chamber 2 as viewed in the direction indicated by the arrow B in FIG. 7 . FIG. 17B corresponds to the cross-sectional view of the vacuum chamber 2 when viewed from the height direction (Z direction). As shown in FIG. 17A , the height L3 of the wall member 21 and the height L3′ of the wall member 22 may be different heights. Specifically, the height L3 of the wall member 21 may be greater than the height L3′ of the wall member 22. 17B, ​​the width L4 of the wall member 21 and the width L4' of the wall member 22 may be different. Specifically, the width L4 of the wall member 21 may be larger than the width L4' of the wall member 22.

[0054] Furthermore, in the first to sixth embodiments, an example was shown in which the flange portion 210 is formed from the end of the wall member 21 toward the outside of the chamber 2, but this is not limited to this. See FIGS. 18A and 18B. FIGS. 18A and 18B are cross-sectional views of the vacuum chamber 2. FIGS. 18A and 18B show another example of a cross-sectional view of the vacuum chamber 2 as viewed in the direction of the arrow A in FIG. 7. FIGS. 18A and 18B correspond to cross-sectional views of the vacuum chamber 2 when the vacuum chamber 2 is viewed from the horizontal direction (Y direction). As shown in FIGS. 18A and 18B, the flange portion 210′ ​​may include a portion 210′a that is formed from the end of the wall member 21 toward the inside of the chamber 2. The inside of the chamber 2 is, in other words, the internal space side of the chamber 2.

[0055] The vacuum chamber 2 may also have an appropriate configuration for use as the film forming apparatus 1. The vacuum chamber 2 may have, for example, the following configuration. For example, a seal member may be provided between the flange portion 210 and the flange portion 220. The seal member is, for example, an elastic member such as an O-ring. The seal member can increase the airtightness of the internal space of the vacuum chamber 2. The flange portion 210 may also have a groove in which the seal member is provided. The groove may also be provided in the flange portion 220. The groove may also be provided in the flange portion 210 and the flange portion 220. The vacuum chamber 2 may also have an observation window or the like in a wall member or the like that allows the internal space of the vacuum chamber to be viewed. Doors may be provided on the side wall portions 21c to 21e of the wall member 21 and the side wall portions 22c to 22e of the wall member 22. The doors may have a shape that bulges outward from the internal space of the vacuum chamber 2. The vacuum chamber 2 may also include piping for evacuating the internal space, opening it to the atmosphere, and introducing gases used in the film formation process. The vacuum chamber 2 may also include a transfer port for transferring the substrate 101, the mask 102, etc. into the internal space.

[0056] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention.

[0057] This application claims priority based on Japanese Patent Application No. 2023-141516, filed on August 31, 2023, the entire contents of which are incorporated herein by reference.

[0058] REFERENCE SIGNS LIST 1 Film forming apparatus, 2 Vacuum chamber, 21 Wall member, 22 Wall member, 23 Fixing portion, 24 Reinforcement structure, 210 Flange portion, 220 Flange portion

Claims

1. A vacuum chamber constituting a film forming apparatus, comprising: a first wall member forming an outer wall of the vacuum chamber; a second wall member fixed to the first wall member and forming the outer wall of the vacuum chamber; and fixing means for fixing the first wall member to the second wall member, wherein the first wall member comprises a first space forming portion forming an internal space of the vacuum chamber and a first flange portion around the first space forming portion, the second wall member comprises a second space forming portion forming an internal space of the vacuum chamber and a second flange portion around the second space forming portion, the fixing means fixes the first flange portion to the second flange portion, and the vacuum chamber has a reinforcing structure for preventing deviation of the fixed positions of the first flange portion and the second flange portion.

2. The vacuum chamber according to claim 1, characterized in that the first space forming portion has a larger forming volume in the internal space than the second space forming portion.

3. The vacuum chamber according to claim 1, characterized in that the first space forming portion is a portion having an outer surface area larger than that of the second space forming portion.

4. A vacuum chamber as described in claim 1, characterized in that the first wall member has a lower rigidity against the internal / external pressure difference than the second wall member.

5. A vacuum chamber as described in claim 2 or 3, characterized in that the reinforcing structure is a structure in which the plate thickness of the first wall member is greater than the plate thickness of the second wall member.

6. A vacuum chamber as claimed in any one of claims 2 to 4, characterized in that the reinforcing structure is a portion of the first flange portion which is stronger than the second flange portion.

7. A vacuum chamber according to any one of claims 2 to 4, characterized in that the reinforcing structure is a structure in which the first flange portion is larger than the second flange portion.

8. A vacuum chamber according to any one of claims 2 to 4, characterized in that the reinforcing structure is a structure in which the first flange portion surrounds the outer periphery of the second flange portion.

9. A vacuum chamber as described in any one of claims 2 to 4, characterized in that the reinforcing structure includes a rib formed across the first flange portion and the first space forming portion.

10. The vacuum chamber according to claim 9, wherein the rib is provided at a position corresponding to the fixed position.

11. A vacuum chamber as described in any one of claims 2 to 4, characterized in that the reinforcing structure is a fixing member that spans and fixes the first flange portion and the second flange portion.

12. The vacuum chamber according to claim 1, wherein the fixing means is a fastening member.

13. A film forming apparatus comprising the vacuum chamber according to claim 1.

Images