Preparation method for patterned quantum dot film, and full-color display

Abstract

Provided are a preparation method for a patterned quantum dot film, and a full-color display. The method comprises the steps of: preparing a recessed template provided with a plurality of recesses; performing surface treatment on the recessed template, wherein the surface of the recessed template comprises the recesses and a flat top; spin-coating the surface of the recessed template with a first quantum dot polymer material, and removing a first quantum dot polymer film on the flat top of the recessed template; transferring first quantum dot polymer films at the bottoms of the recesses in the recessed template to a target substrate; and transferring second quantum dot polymer films to the same target substrate, wherein the first quantum dot polymer films and the second quantum dot polymer films are alternately arranged on the same target substrate. According to the provided preparation method for the patterned quantum dot film and full-color display, high-resolution and high-thickness patterned quantum dot films having no adverse effects on the optical performance of a quantum dot material can be prepared.

Description

Preparation method of patterned quantum dot film and full-color display

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application number 202311188805.9, filed with the State Intellectual Property Office of China on September 14, 2023, entitled “A method for preparing a patterned quantum dot film and a full-color display,” the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present application relates to the technical field of patterned quantum dot films, and more specifically, to a method for preparing a patterned quantum dot film and a full-color display. Background Art

[0004] As a crucial component of information technology and the terminal human-machine interface of the information chain, display is one of the cornerstones of my country's electronic information industry. Currently, a variety of new display technologies are developing rapidly, including liquid crystal displays (LCDs), organic light-emitting diode (OLED) displays, and micron-sized light-emitting diode (mini / micro-LED) displays. LCD technology has matured after years of development and is currently the mainstream for small and medium-sized display products. However, it still suffers from technical issues such as limited color richness, dull colors, limited viewing angles, and slow response speeds. While OLED displays offer advantages in response speed, contrast, viewing angles, flexibility, and transparency, they also suffer from high costs and the "burn-in" phenomenon caused by varying pixel lifespans. Mini / micro-LED displays, a new display technology that miniaturizes and arrays LED devices, offer high brightness, high color saturation, ultra-high resolution, high power efficiency, and excellent stability. However, they still face significant challenges in mass transfer and driver circuit design.

[0005] Quantum dots, as light-conversion materials with excellent properties such as high color purity, easily tunable emission wavelength, high quantum yield, and solution processability, can help overcome the barriers to these various display technologies. For example, quantum dots can be applied to active light-emitting devices such as blue-light OLEDs or mini / micro-LEDs to achieve full-color displays. However, two aspects remain to be considered: first, the stability, toxicity, synthesis scale, and cost of the quantum dot materials themselves. Second, appropriate micro-nanofabrication technologies must be developed for patterning and integrating them to produce high-resolution patterned quantum dot films. Currently, the main methods for patterning quantum dots include photolithography, transfer printing, and traditional inkjet printing. Photolithography significantly damages the optical properties of perovskite quantum dot materials, making this method less suitable for use. The films obtained by transfer printing are too thin to effectively absorb blue light, making them unsuitable for preparing quantum dot films for light conversion. Traditional inkjet printing cannot achieve high resolution and may exhibit coffee ring effects and uneven film morphology.

[0006] Therefore, how to prepare a high-resolution and high-thickness patterned quantum dot film without adversely affecting the optical properties of the quantum dot material itself is a technical problem that needs to be urgently solved by those skilled in the art.

[0007] Summary of the Invention

[0008] The purpose of this application is to provide a method for preparing a patterned quantum dot film to solve the problem that the existing technology cannot prepare a high-resolution and high-thickness patterned quantum dot film without adversely affecting the optical properties of the quantum dot material itself.

[0009] Another object of the present application is to provide a full-color display to solve the problem that the existing technology cannot produce high-resolution and high-thickness patterned quantum dot films without adversely affecting the optical properties of the quantum dot material itself.

[0010] This application is implemented as follows:

[0011] On the one hand, an embodiment of the present application provides a method for preparing a patterned quantum dot film, the method comprising the following steps:

[0012] preparing a concave template, wherein the concave template is provided with a plurality of grooves arranged at intervals;

[0013] Performing surface treatment on the concave plate, wherein the surface of the concave plate includes grooves and table surfaces;

[0014] Spin coating a first quantum dot polymer material on the surface of the concave template, and removing the first quantum dot polymer film on the surface of the concave template;

[0015] Transferring the first quantum dot polymer film at the bottom of each groove in the concave template to the target substrate;

[0016] The second quantum dot polymer film is transferred to the same target substrate, wherein the first quantum dot polymer film and the second quantum dot polymer film are alternately arranged on the same target substrate.

[0017] On the other hand, an embodiment of the present application further provides a full-color display, which is prepared by any of the methods described above.

[0018] On the other hand, an embodiment of the present application further provides a full-color display, which includes the patterned quantum dot film as described above.

[0019] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, preferred embodiments are given below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application for which protection is claimed, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0021] FIG1 is a schematic flow chart of a method for preparing a patterned quantum dot film according to an embodiment of the present application;

[0022] FIG2 is a cross-sectional schematic diagram corresponding to step S10 provided in an embodiment of the present application;

[0023] FIG3 is a top view of a concave plate provided in an embodiment of the present application;

[0024] FIG4 is a schematic structural diagram of a concave plate provided in an embodiment of the present application;

[0025] FIG5 is a profile diagram of a cross section of a concave plate provided in an embodiment of the present application;

[0026] FIG6 is one of the cross-sectional schematic diagrams corresponding to step S30 provided in an embodiment of the present application;

[0027] FIG7 is a second cross-sectional schematic diagram corresponding to step S30 provided in an embodiment of the present application;

[0028] FIG8 is one of the cross-sectional schematic diagrams corresponding to step S40 provided in an embodiment of the present application;

[0029] FIG9 is a second cross-sectional schematic diagram corresponding to step S40 provided in an embodiment of the present application;

[0030] FIG10 is a third cross-sectional schematic diagram corresponding to step S40 provided in an embodiment of the present application;

[0031] FIG11 is a cross-sectional schematic diagram corresponding to step S50 provided in an embodiment of the present application;

[0032] FIG12 is a second cross-sectional schematic diagram corresponding to step S50 provided in an embodiment of the present application;

[0033] FIG13 is a top view of a monochrome patterned quantum dot film provided in an embodiment of the present application;

[0034] FIG14 is a schematic structural diagram of a monochrome patterned quantum dot film provided in an embodiment of the present application;

[0035] FIG15 is a profile diagram of a cross section of a monochrome patterned quantum dot film provided in an embodiment of the present application.

[0036] Icon: 100 - intaglio template; 110 - first quantum dot polymer film; 120 - polymer part; 130 - target substrate; 140 - second quantum dot polymer film. DETAILED DESCRIPTION

[0037] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work fall within the scope of protection of the present application.

[0038] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0039] In the description of this application, it should be noted that the terms "middle", "upper", "parallel", "inside", "outside", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, or are the orientations or positional relationships in which the product of the application is usually placed when in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on this application.

[0040] In existing technologies, quantum dot patterning methods primarily include photolithography, transfer printing, and traditional inkjet printing. Photolithography significantly damages the optical properties of perovskite quantum dot materials, making it less suitable for use. Transfer printing produces films that are too thin to effectively absorb blue light, making them unsuitable for preparing quantum dot films for light conversion. Traditional inkjet printing cannot achieve high resolution and may result in coffee ring effects and uneven film morphology.

[0041] Therefore, how to prepare a high-resolution and high-thickness patterned quantum dot film without adversely affecting the optical properties of the quantum dot material itself is a technical problem that needs to be urgently solved by those skilled in the art.

[0042] On the one hand, an embodiment of the present application provides a method for preparing a patterned quantum dot film, the method comprising the following steps:

[0043] preparing a concave template, wherein the concave template is provided with a plurality of grooves arranged at intervals;

[0044] Performing surface treatment on the concave plate, wherein the surface of the concave plate includes grooves and table surfaces;

[0045] Spin coating a first quantum dot polymer material on the surface of the concave template, and removing the first quantum dot polymer film on the surface of the concave template;

[0046] Transferring the first quantum dot polymer film at the bottom of each groove in the concave template to the target substrate;

[0047] The second quantum dot polymer film is transferred to the same target substrate, wherein the first quantum dot polymer film and the second quantum dot polymer film are alternately arranged on the same target substrate.

[0048] In some embodiments, the method for preparing a concave template comprises:

[0049] providing a substrate;

[0050] Spin-coated photoresist on the substrate surface;

[0051] patterning the photoresist;

[0052] The substrate is etched based on the patterned photoresist to form a recessed template.

[0053] In some embodiments, the surface treatment is an OTS treatment.

[0054] In some embodiments, the method of spin-coating the first quantum dot polymer material on the surface of the concave template and removing the first quantum dot polymer film on the concave template mesa comprises:

[0055] Spin coating a first quantum dot polymer material having viscosity on the surface of the concave template, wherein the first quantum dot polymer material is located on the table and the bottom of the groove of the concave template, and the thickness of the first quantum dot polymer composite material is less than or equal to the depth of the groove in the concave template;

[0056] After the first quantum dot polymer material is formed into a film, the first quantum dot polymer film on the concave template table is removed.

[0057] In some embodiments, the method of transferring the first quantum dot polymer film at the bottom of each groove in the concave template to the target substrate includes:

[0058] Spin coating or pouring a polymer material with viscoelastic properties on the surface of the intaglio template again;

[0059] After the polymer material with viscoelastic properties is solidified into a film, the film is removed, and the first quantum dot polymer film at the bottom of each groove of the concave template is transferred to the target substrate.

[0060] In some embodiments, after the step of preparing the intaglio plate, the method further comprises: measuring the depth of the intaglio plate.

[0061] In some embodiments, a method of measuring the depth of a gravure plate comprises:

[0062] Obtaining a profile curve diagram of a cross section of a silicon intaglio template;

[0063] Get the two y-axis values ​​corresponding to the highest point and lowest point of the contour curve;

[0064] The depth of the intaglio plate is calculated by subtracting the y-axis value corresponding to the lowest point of the contour curve from the y-axis value corresponding to the highest point of the contour curve.

[0065] In some embodiments, after transferring the second quantum dot polymer film to the same target substrate, the method further comprises measuring the thickness of the patterned quantum dot film.

[0066] In some embodiments, a method of measuring the thickness of a patterned quantum dot film comprises:

[0067] Obtaining a profile curve graph of a cross section of the patterned quantum dot film;

[0068] Get the two y-axis values ​​corresponding to the lowest point of the concave curve and the lowest point of the contour curve in the contour curve;

[0069] The thickness of the patterned quantum dot film is calculated by subtracting the y-axis value corresponding to the lowest point of the concave curve in the profile curve from the y-axis value corresponding to the lowest point of the profile curve.

[0070] On the other hand, an embodiment of the present application further provides a patterned quantum dot film, which is prepared by any of the methods described above.

[0071] On the other hand, an embodiment of the present application further provides a full-color display, which includes the patterned quantum dot film as described above.

[0072] Compared with the existing technology, this application has the following beneficial technical effects:

[0073] (1) No adverse effect on the optical properties of the quantum dot material itself. This application uses a template method to prepare a patterned quantum dot light conversion film. The quantum dot polymer material is spin-coated on the surface of a concave template. After the film is formed, it is transferred to a clean target substrate. The preparation method of the patterned quantum dot film provided in this application does not damage the optical properties of the quantum dot material itself during the entire preparation process. This method has good applicability.

[0074] (2) Uniform morphology and high resolution. This application uses photolithography and etching techniques to prepare a concave mold with high resolution, high groove depth, high verticality, and uniformity. Therefore, the patterned quantum dot film prepared using this concave mold has high resolution. In addition, the prepared concave mold is surface treated to have a low surface energy, which facilitates the subsequent peeling of the quantum dot polymer film and ensures that the final patterned quantum dot film has a uniform morphology.

[0075] (3) High thickness, enabling effective blue light absorption. The present application spin-coates a quantum dot polymer material on the surface of a silicon concave template. This material enhances the stability of the quantum dots, ensuring that a micron-level high-thickness film is ultimately prepared, thereby achieving effective absorption and conversion of blue light.

[0076] (4) Achieving full-color display. The method for preparing the patterned quantum dot film provided in this application can be used to prepare a light conversion film for a display, and the patterned quantum dot film can be combined with a blue light OLED or mini / micro-LED to achieve full-color display.

[0077] The following describes some embodiments of the present application in detail with reference to the accompanying drawings. In the absence of conflict, the following embodiments and features therein may be combined with each other.

[0078] Please refer to FIG1 , which is a schematic flow chart of a method for preparing a patterned quantum dot film provided in an embodiment of the present application. The specific steps of the method are as follows.

[0079] Step S10: preparing a concave template, wherein the concave template is provided with a plurality of grooves arranged at intervals.

[0080] In the examples of this application, a template method was used to prepare a patterned quantum dot film with a micron-level thickness. This method has no adverse effects on the optical properties of the perovskite quantum dot material itself and has excellent applicability. Furthermore, because the template itself has high resolution, the patterned quantum dot film prepared using this template also has high resolution.

[0081] In order to obtain a template with high resolution, the present application adopts photolithography technology and etching technology to prepare a concave template 100 containing multiple grooves, and the specific preparation steps are as follows.

[0082] First, a layer of photoresist is spin-coated on the surface of a substrate. Next, the mask and the photoresist-coated substrate are placed in the optical path of a lithography machine. The lithography machine uses a light source to generate ultraviolet light of a specific wavelength and projects the light onto the substrate through a lens system.

[0083] When light shines on the mask, the pattern on the mask will either block or transmit the light. In the transmissive portion, the light passes through the transparent areas of the mask and is projected onto the photoresist, causing it to solidify. In the blocked portion, the light is absorbed by the mask and cannot reach the photoresist surface.

[0084] After the photoresist is cured, the substrate surface not protected by the photoresist is processed by etching, so that a pattern corresponding to the photoresist pattern can be formed on the substrate, thereby obtaining the intaglio plate 100 shown in Figure 2.

[0085] Optionally, to ensure that the prepared intaglio template 100 has higher reusability stability than an elastic template, the present embodiment uses a silicon wafer as the substrate. A patterned photoresist mask is prepared on the silicon surface using the above-mentioned photolithography method, and then the silicon wafer is etched using deep silicon etching technology. After etching is completed, the photoresist mask is removed, thereby obtaining a silicon intaglio template with high resolution, high groove depth, high verticality, and uniformity.

[0086] In order to ensure that the prepared intaglio plate 100 has high resolution, the dimensions of the intaglio plate 100 need to be measured after the preparation is completed.

[0087] Figure 3 is a top view of the intaglio plate provided in an embodiment of the present application, and the corresponding schematic structural diagram of the intaglio plate is shown in Figure 11. To measure the depth of the intaglio plate 100, first, a profile curve corresponding to the cross section of the intaglio plate 100 is drawn along the curve ab shown in Figure 3. The resulting profile of the cross section of the intaglio plate is shown in Figure 5.

[0088] Next, randomly select two points A and B on the curve ab. In order to measure the depth of the intaglio plate 100, in the embodiment of the present application, the highest point of the intaglio plate 100 is taken as point A, and the lowest point of the intaglio plate 100 is taken as point B. The positions of point A and point B on the curve ab are shown in FIG3 , and their positions in the intaglio plate 100 are shown in FIG4 .

[0089] Please refer to Figure 5, which shows a profile of the cross section of the intaglio plate 100. Vertical lines R and M correspond to points A and B in Figure 4, respectively. The point where vertical line R intersects the profile curve of the intaglio plate cross section is point A in Figure 4. A horizontal line parallel to the x-axis is drawn through this intersection and intersected with the y-axis to obtain the y-axis value at the highest point of the intaglio plate 100. Vertical line M intersects the profile curve of the intaglio plate cross section at point B in Figure 4. A horizontal line parallel to the x-axis is drawn through this intersection and intersected with the y-axis to obtain the y-axis value at the lowest point of the intaglio plate 100.

[0090] Finally, the depth ΔZ of the groove in the intaglio plate 100 is obtained by subtracting the y-axis value corresponding to the lowest point B of the intaglio plate 100 from the y-axis value corresponding to the highest point A of the intaglio plate 100. The distance ΔX between the selected highest point A and lowest point B along the curve ab in the two-dimensional plane is obtained by subtracting the x-axis value corresponding to the vertical line R from the x-axis value corresponding to the vertical line M. In this embodiment of the present application, the final measurement results of ΔZ = -26.4136 μm and ΔX = 0.2593 mm are obtained using the above method.

[0091] Step S20: performing surface treatment on the concave plate, wherein the surface of the concave plate includes grooves and mesas.

[0092] To ensure that the final patterned quantum dot film has a complete morphology, during the peeling process of the quantum dot polymer film, it is necessary to ensure that the viscosity between the quantum dot polymer film and the intaglio template 100 is lower than the viscosity between the quantum dot polymer film and the polymer member 120. Therefore, the intaglio template 100 needs to be surface treated, wherein the surface of the intaglio template includes grooves and mesas.

[0093] Preferably, the surface of the intaglio template 100 is treated with OTS. The advantage of this is that the surface modified with the OTS self-assembled monolayer has a lower surface energy, which is beneficial for the subsequent peeling of the quantum dot polymer film.

[0094] In step S30 , the first quantum dot polymer material is spin-coated on the surface of the concave template, and the first quantum dot polymer film 110 on the surface of the concave template 100 is removed.

[0095] The quantum dot film contains red and green quantum dots. The principle is that the blue light OLED or mini / micro-LED in the backlight module emits blue light. When the blue light passes through the quantum dot film, part of the blue light is converted into red light by the red quantum dots, and part of the blue light is converted into green light by the green quantum dots. The unconverted blue light and the green and red light emitted by the quantum dots together form white light, which becomes the backlight source of the LCD display.

[0096] In the present embodiment, the final patterned quantum dot film includes a first quantum dot polymer film 110 and a second quantum dot polymer film 140. Optionally, the first quantum dot polymer film is green and the second quantum dot polymer film is red. This application uses the first quantum dot polymer film 110 as an example, and its preparation method is as follows.

[0097] Please refer to Figure 6. First, the surface of the concave template 100 obtained in step S20 is spin-coated with a first quantum dot polymer composite material with viscosity, wherein the first quantum dot polymer material is located on the table top and the bottom of the groove of the concave template, and the thickness of the first quantum dot polymer composite material is less than or equal to the depth of the groove in the concave template 100.

[0098] In the embodiment of the present application, the light conversion layer uses a composite material of quantum dot polymer, which has the advantage of enhancing the stability of quantum dots and can be spin-coated to obtain a quantum dot film with a thickness of micrometer level, which is conducive to the effective absorption and conversion of blue light.

[0099] Please refer to Figure 7. After the first quantum dot polymer composite material is formed into a film, the surface energy of the intaglio template 100 is reduced due to the OTS treatment of the surface thereof. The viscosity between the first quantum dot polymer film 110 and the intaglio template is relatively small. Therefore, the first quantum dot polymer film 110 on the surface of the intaglio template 100 can be removed by using tape or etching technology, which is conducive to the subsequent formation of a patterned quantum dot film.

[0100] In step S40 , the first quantum dot polymer film 110 at the bottom of each groove in the concave template is transferred to the target substrate 130 .

[0101] Referring to Figures 7 to 10, the surface of the intaglio template 100 shown in Figure 7 is again spin-coated or cast with a polymer material having viscoelastic properties to obtain the intaglio template 100 shown in Figure 8. After the polymer material having viscoelastic properties is solidified into a film, a polymer component 120 is obtained and demolded. As shown in Figure 9, since the viscosity between the first quantum dot polymer film 110 and the polymer component 120 is greater than the viscosity between the first quantum dot polymer film 110 and the intaglio template 100, the first quantum dot polymer film 110 at the bottom of each groove in the intaglio template 100 can be picked up by the polymer component 120. Finally, as shown in Figure 10, the first quantum dot polymer film 110 is transferred to a clean target substrate 130 via the polymer component 120, wherein the viscosity between the first quantum dot polymer film 110 and the target substrate 130 is greater than the viscosity between the first quantum dot polymer film 110 and the polymer component 120.

[0102] In step S50 , the second quantum dot polymer film 140 is transferred to the same target substrate 130 , wherein the first quantum dot polymer film 110 and the second quantum dot polymer film 140 are alternately arranged on the same target substrate 130 .

[0103] 11 and 12 , the above steps are repeated to prepare a second quantum dot polymer film 140 . As shown in FIG11 , the second quantum dot polymer film 140 is transferred to the same target substrate 130 via the polymer element 120 . Next, the second quantum dot polymer film 140 and the first quantum dot polymer film 110 are alternately arranged on the same target substrate 130 as shown in FIG12 , and combined with active light-emitting devices such as blue OLED or mini / micro-LED to achieve full-color display.

[0104] Since the thickness of the patterned quantum dot film affects its absorption and conversion of blue light, and ultimately affects the full-color display effect of the display, after the step of preparing the patterned quantum dot film is completed, the thickness of the patterned quantum dot film needs to be tested.

[0105] Please refer to Figures 13 to 15, which show the profilometer test results of the single-color patterned quantum dot film, wherein the single-color patterned quantum dot film refers to the first quantum dot polymer film or the second quantum dot polymer film.

[0106] Figure 13 is a top view of a single-color patterned quantum dot film provided in an embodiment of the present application, and a corresponding schematic structural diagram of the single-color patterned quantum dot film is shown in Figure 14. To measure the thickness of the single-color patterned quantum dot film, a profile curve corresponding to the cross-section of the single-color patterned quantum dot film is first drawn along curve ef shown in Figure 13 . The resulting profile of the cross-section of the single-color patterned quantum dot film is shown in Figure 15 .

[0107] Next, any two points E and F are selected on the curve ef. In order to measure the thickness of the monochrome patterned quantum dot film, in the embodiment of the present application, the highest point of the monochrome patterned quantum dot film is taken as point F, and the lowest point of the monochrome patterned quantum dot film is taken as point E. The positions of points E and F on the curve ef are shown in Figure 13, and their positions in the monochrome patterned quantum dot film are shown in Figure 14.

[0108] Please refer to Figure 15, which shows a contour diagram of the cross section of the monochrome patterned quantum dot film. Among them, the vertical line R and the vertical line M correspond to points E and F in Figure 14, respectively. The point where the vertical line R intersects with the contour curve of the cross section of the monochrome patterned quantum dot film is point E in Figure 14. A horizontal line parallel to the x-axis is drawn through the intersection and intersects with the y-axis to obtain the y-axis value at the lowest point of the monochrome patterned quantum dot film. The point where the vertical line M intersects with the contour curve of the cross section of the monochrome patterned quantum dot film is point F in Figure 14. A horizontal line parallel to the x-axis is drawn through the intersection and intersects with the y-axis to obtain the y-axis value at the highest point of the monochrome patterned quantum dot film.

[0109] Finally, the thickness ΔZ of the monochrome patterned quantum dot film is obtained by subtracting the y-axis value corresponding to the lowest point E from the y-axis value corresponding to the highest point F. The distance ΔX between the selected highest and lowest points F along the curve fe on the two-dimensional plane is obtained by subtracting the x-axis value corresponding to the vertical line R from the x-axis value corresponding to the vertical line M. In this embodiment, the above method was used to measure ΔZ = 8.7231 μm and ΔX = 0.1482 mm.

[0110] Optionally, an embodiment of the present application further provides a patterned quantum dot film, which is prepared by any of the methods described above.

[0111] Optionally, an embodiment of the present application further provides a full-color display, which includes the patterned quantum dot film as described above.

[0112] In summary, the present invention provides a method for preparing a patterned quantum dot film and a full-color display. First, a concave plate with multiple grooves is prepared. The concave plate is then surface treated. A first quantum dot polymer material is then spin-coated on the surface of the concave plate. The first quantum dot polymer film located on the surface of the concave plate is removed. The first quantum dot polymer film at the bottom of each groove in the concave plate is then transferred to a target substrate. Finally, a second quantum dot polymer film is prepared using the same method and placed alternately with the first quantum dot polymer film on the same target substrate.

[0113] The method for preparing a patterned quantum dot film and the full-color display provided herein enable the production of high-resolution and high-thickness patterned quantum dot films without adversely affecting the optical properties of the quantum dot material itself. By measuring the depth of the intaglio mold and the thickness of the single-color patterned quantum dot film, the final patterned quantum dot film is further ensured to have high resolution and thickness, achieving highly efficient blue light conversion, thereby effectively addressing the technical barriers existing in existing OLED or mini / micro-LED display technologies.

[0114] The above description is merely a preferred embodiment of the present application and is not intended to limit the present application. Various modifications and variations are possible for those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present application shall be included within the scope of protection of the present application.

[0115] It will be apparent to those skilled in the art that the present application is not limited to the details of the exemplary embodiments described above and that the present application can be implemented in other specific forms without departing from the spirit or essential characteristics of the present application. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the present application is defined by the appended claims, not the foregoing description, and all variations within the meaning and range of equivalents of the claims are intended to be included therein. Any reference sign in a claim should not be construed as limiting the claim to which it relates. Industrial Applicability

[0116] The method for preparing a patterned quantum dot film and the full-color display provided herein enable the production of high-resolution and high-thickness patterned quantum dot films without adversely affecting the optical properties of the quantum dot material itself. By measuring the depth of the intaglio mold and the thickness of the single-color patterned quantum dot film, the final patterned quantum dot film is further ensured to have high resolution and thickness, achieving highly efficient blue light conversion, thereby effectively addressing the technical barriers existing in existing OLED or mini / micro-LED display technologies.

Claims

1. A method for preparing a patterned quantum dot film, characterized in that: The method comprises the following steps: preparing a concave template, wherein the concave template is provided with a plurality of grooves arranged at intervals; Performing surface treatment on the concave plate, wherein the surface of the concave plate includes grooves and a table top; Spin coating a first quantum dot polymer material on the surface of the concave template, and removing the first quantum dot polymer film on the concave template table; Transferring the first quantum dot polymer film at the bottom of each groove in the concave template to the target substrate; The second quantum dot polymer film is transferred to the same target substrate, wherein the first quantum dot polymer film and the second quantum dot polymer film are alternately arranged on the same target substrate.

2. The method for preparing a patterned quantum dot film according to claim 1, characterized in that: The method for preparing the concave template comprises: providing a substrate; Spin-coated photoresist on the substrate surface; patterning the photoresist; The substrate is etched based on the patterned photoresist to form a concave template.

3. The method for preparing a patterned quantum dot film according to claim 1 or 2, characterized in that: The surface treatment is OTS treatment.

4. The method for preparing a patterned quantum dot film according to any one of claims 1 to 3, characterized in that: The method of spin coating a first quantum dot polymer material on the surface of a concave template and removing the first quantum dot polymer film on the concave template table comprises: Spin coating a first quantum dot polymer material with viscosity on the surface of the concave template, wherein the first quantum dot polymer material is located on the table and the bottom of the groove of the concave template, and the thickness of the first quantum dot polymer composite material is less than or equal to the depth of the groove in the concave template; After the first quantum dot polymer material is formed into a film, the first quantum dot polymer film on the concave template table is removed.

5. The method for preparing a patterned quantum dot film according to any one of claims 1 to 4, characterized in that: The method of transferring the first quantum dot polymer film at the bottom of each groove in the concave template to the target substrate comprises: Spin coating or pouring a polymer material with viscoelastic properties on the surface of the concave template again; After the polymer material with viscoelastic properties is cured into a film, it is demolded, and the first quantum dot polymer film at the bottom of each groove of the concave template is transferred to the target substrate.

6. The method for preparing a patterned quantum dot film according to any one of claims 1 to 5, characterized in that: After the step of preparing the concave template, the method further comprises: measuring the depth of the concave template.

7. The method for preparing a patterned quantum dot film according to claim 6, characterized in that: Methods for measuring the depth of the intaglio plate include: Obtaining a profile curve diagram of a cross section of a silicon intaglio template; Get the two y-axis values ​​corresponding to the highest point and the lowest point of the contour curve; The depth of the concave plate is calculated by subtracting the y-axis value corresponding to the lowest point of the contour curve from the y-axis value corresponding to the highest point of the contour curve.

8. The method for preparing a patterned quantum dot film according to any one of claims 1 to 7, characterized in that: After the step of transferring the second quantum dot polymer film to the same target substrate, the method further comprises: measuring the thickness of the patterned quantum dot film.

9. The method for preparing a patterned quantum dot film according to claim 8, characterized in that: Methods for measuring the thickness of patterned quantum dot films include: Obtaining a profile graph of a cross section of a patterned quantum dot film; Get the two y-axis values ​​corresponding to the lowest point of the concave curve and the lowest point of the contour curve in the contour curve; The thickness of the patterned quantum dot film is calculated by subtracting the y-axis value corresponding to the lowest point of the concave curve in the profile curve from the y-axis value corresponding to the lowest point of the profile curve.

10. A patterned quantum dot film, characterized in that: The patterned quantum dot film is prepared by the method described in any one of claims 1 to 9.

11. A full-color display, characterized in that: The full-color display comprises the patterned quantum dot film as claimed in claim 10.

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