Exposure device

Abstract

This exposure device comprises: a light source; an illumination optical system that illuminates a mask with light from the light source; and a projection optical system that projects a pattern formed on the mask onto a substrate. The exposure device exposes the substrate while moving the mask and the substrate in a scanning direction. The light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane including a first direction. When a direction corresponding to the first direction is coincident with the scanning direction in an image of the light source formed on a surface of the mask via the illumination optical system, a boundary between adjacent light source elements among the plurality of light source elements is not continuous in the first direction.

Description

exposure equipment

[0001] This relates to an exposure device.

[0002] In recent years, liquid crystal display panels have come into widespread use as display elements for personal computers, televisions, and the like. Liquid crystal display panels are manufactured by forming a circuit pattern of thin film transistors on a plate (glass substrate) using a photolithography technique. An exposure apparatus is used for this photolithography process, which projects and exposes an original pattern formed on a mask onto a photoresist layer on the plate via a projection optical system. One such exposure apparatus has been proposed, which uses a light-emitting diode (LED) as a light source. A configuration using a fly's-eye lens in an exposure apparatus using an LED as a light source is known (see, for example, Patent Document 1).

[0003] In exposure apparatuses that use LEDs as light sources, it is necessary to make the illuminance uniform.

[0004] Japanese Patent Application Laid-Open No. 2016-200787

[0005] According to a first aspect of the disclosure, an exposure apparatus has a light source, an illumination optical system that illuminates a mask with light from the light source, and a projection optical system that projects a pattern formed on the mask onto a substrate, and exposes the substrate while moving the mask and the substrate in a scanning direction, wherein the light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane that includes a first direction, and when a direction corresponding to the first direction in an image of the light source formed on the surface of the mask via the illumination optical system coincides with the scanning direction, the boundaries between adjacent light source elements among the plurality of light source elements are not continuous in the first direction.

[0006] According to a second aspect of the disclosure, an exposure apparatus has a light source, an illumination optical system that illuminates a mask with light from the light source, and a projection optical system that projects a pattern formed on the mask onto a substrate, and exposes the substrate while moving the mask and the substrate in a scanning direction, wherein the light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane, and when a secondary light source of the light source is formed at a position optically conjugate to an image of the light source formed on the surface of the mask in a direction perpendicular to the surface of the mask, the boundaries between adjacent light source elements in the secondary light source are not continuous in the scanning direction.

[0007] According to a third aspect of the disclosure, an exposure apparatus is an exposure apparatus that illuminates a mask with light from a light source unit, projects a pattern formed on the mask onto a substrate, and exposes the substrate while moving the mask and the substrate in a scanning direction, the light source unit including a first light source having a plurality of first light source elements arranged on a two-dimensional plane including a first direction, a second light source having a plurality of second light source elements arranged on a two-dimensional plane including a second direction, a combining optical element that combines light emitted from the first light source and the second light source, and a light source that combines light emitted from the combining optical element. and an illumination optical system that forms an image of the first light source and an image of the second light source on the surface of the mask using the emitted combined light, wherein when a direction in the image of the first light source that corresponds to the first direction coincides with the scanning direction, the boundaries between adjacent first light source elements among the plurality of first light source elements are not continuous in the first direction, and when a direction in the image of the second light source that corresponds to the second direction coincides with the scanning direction, the boundaries between adjacent second light source elements among the plurality of second light source elements are not continuous in the second direction.

[0008] According to a fourth aspect of the disclosure, an exposure apparatus is an exposure apparatus that exposes a substrate while moving a mask and a substrate in a scanning direction, and includes a light source and a magnifying optical system, a light source unit that illuminates the mask, and a projection optical system that projects a pattern formed on the mask onto the substrate, wherein the light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane, and no optical elements are provided in the optical path between the light source unit and the mask.

[0009] The configurations of the embodiments described below may be modified as appropriate, and at least a portion of the configuration may be replaced with other components. Furthermore, components that are not particularly limited in terms of their placement may be placed in any position that can achieve their function, not limited to the placement disclosed in the embodiments.

[0010] FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus according to the first embodiment. FIG. 2 is a schematic diagram showing the configuration of an illumination unit according to the first embodiment. FIG. 3(A) is a plan view showing the configuration of a light source array, and FIG. 3(B) is a diagram showing the internal configuration of the light source unit. FIG. 4 is a schematic diagram showing the configuration of an illumination unit equipped with a fly's eye lens. FIG. 5(A) is a diagram showing the attitude of the light source array (light source unit) in the first embodiment, and FIG. 5(B) is a diagram showing an image of the light-emitting portion of the light source array formed on the surface of a mask in the first embodiment. FIG. 6 is a schematic diagram showing the configuration of an illumination unit according to Comparative Example 1. FIG. 7(A) is a diagram showing the attitude of the light source array (light source unit) in the illumination unit according to Comparative Example 1, and FIG. 7(B) is a diagram showing an image of the light-emitting portion of the light source array formed on the surface of a mask in Comparative Example 1. Fig. 8(A) is a diagram showing an image of a light-emitting portion of a light source array and an area where scan averaging was performed, which were used in a simulation of the illuminance distribution on a plate after scan averaging in Comparative Example 1, and Fig. 8(B) is a graph showing the illuminance distribution after scan averaging in a non-scanning direction perpendicular to the scanning direction. Fig. 9 is a schematic diagram showing the configuration of an illumination unit according to Comparative Example 2. Fig. 10(A) is a diagram showing an image of a light-emitting portion of a light source array and an area where scan averaging was performed, which were used in a simulation of the illuminance distribution on a plate after scan averaging in Comparative Example 2, and Fig. 10(B) is a graph showing the illuminance distribution after scan averaging in a non-scanning direction perpendicular to the scanning direction. Fig. 11(A) is a diagram showing an image of a light-emitting portion of a light source array and an area where scan averaging was performed, which were used in a simulation of the illuminance distribution on a plate after scan averaging in the example, and Fig. 11(B) is a graph showing the illuminance distribution after scan averaging in a non-scanning direction perpendicular to the scanning direction. Fig. 12(A) is a diagram showing the arrangement of LED packages in a light source array according to Modification 1, and Fig. 12(B) is a diagram showing an image of the light-emitting portion of the light source array formed on the surface of a mask in Modification 1. Fig. 13(A) is a diagram showing Modification 2 in which the attitude of the light source array according to Modification 1 is changed, and Fig. 13(B) is a diagram showing an image of the light-emitting portion of the light source array formed on the surface of a mask in Modification 2.FIG. 14(A) is a diagram showing the arrangement of LED packages in a light source array according to Modification 3, and FIG. 14(B) is a diagram showing an image of the light-emitting portions of the light source array formed on the surface of a mask in Modification 3. FIG. 15(A) is a diagram showing Modification 4 in which the attitude of the light source array according to Modification 3 is changed, and FIG. 15(B) is a diagram showing an image of the light-emitting portions of the light source array formed on the surface of a mask in Modification 4. FIG. 16(A) is a diagram showing the arrangement of LED packages in a light source array according to Modification 5, and FIG. 16(B) is a diagram showing an image of the light-emitting portions of the light source array formed on the surface of a mask in Modification 5. FIG. 17(A) is a diagram showing Modification 6 in which the attitude of the light source array according to Modification 5 is changed, and FIG. 17(B) is a diagram showing an image of the light-emitting portions of the light source array formed on the surface of a mask in Modification 6. FIG. 18 is a diagram schematically showing the configuration of an illumination unit according to Modification 7. FIG. 19 is a schematic diagram showing the configuration of an illumination unit according to a second embodiment. FIG. 20 is a schematic diagram showing the configuration of an exposure apparatus according to a third embodiment. FIG. 21 is a schematic diagram showing the configuration of an illumination unit according to a fourth embodiment. FIG. 22 is a schematic diagram showing the configuration of an illumination unit according to the fifth embodiment.

[0011] First Embodiment An exposure apparatus 10 according to a first embodiment will be described with reference to FIGS. 1 to 11B.

[0012] (Configuration of Exposure Apparatus) FIG. 1 is a diagram that shows roughly the configuration of an exposure apparatus 10 according to the first embodiment.

[0013] The exposure apparatus 10 is a scanning stepper (scanner) that drives a mask MSK and a glass substrate (hereinafter referred to as "plate") P in the same direction and at the same speed relative to a projection optical system PL, thereby transferring a pattern formed on the mask MSK onto the plate P. The plate P is a rectangular glass substrate used in, for example, a liquid crystal display device (flat panel display), and has at least one side or diagonal length of 500 mm or more.

[0014] In the following, the direction in which the mask MSK and plate P are driven during scanning exposure (scanning direction) is referred to as the X-axis direction, the direction in the horizontal plane perpendicular to this is referred to as the Y-axis direction, the direction perpendicular to the X-axis and Y-axis is referred to as the Z-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are referred to as the θx, θy, and θz directions, respectively.

[0015] The exposure apparatus 10 includes an illumination optical system IOP, a mask stage MST that holds a mask MSK, a projection optical system PL, a body 70 that supports these, a substrate stage PST that holds a plate P, and a control system for these. The control system provides overall control of each component of the exposure apparatus 10.

[0016] The body 70 includes a base (vibration isolation table) 71, columns 72A and 72B, an optical surface plate 73, a support 74, and a slide guide 75. The base (vibration isolation table) 71 is placed on a floor F and supports the columns 72A, 72B, etc., while isolating vibrations from the floor F. The columns 72A and 72B each have a frame shape, with the column 72A being placed inside the column 72B. The optical surface plate 73 has a flat plate shape and is fixed to the ceiling of the column 72A. The support 74 is supported by the ceiling of the column 72B via a slide guide 75. The slide guide 75 includes an air ball lifter and a positioning mechanism, and positions the support 74 (i.e., the mask stage MST, described later) at an appropriate position in the X-axis direction relative to the optical surface plate 73.

[0017] The illumination optical system IOP is disposed above the body 70. The illumination optical system IOP irradiates the mask MSK with illumination light IL. The detailed configuration of the illumination optical system IOP will be described later.

[0018] The mask stage MST is supported by a support 74. A mask MSK having a pattern surface (the lower surface in FIG. 1 ) on which a circuit pattern is formed is fixed to the mask stage MST by, for example, vacuum suction (or electrostatic suction). The mask stage MST is driven by a drive system including, for example, a linear motor at a predetermined stroke in the scanning direction (X-axis direction), and is also driven slightly in the non-scanning directions (Y-axis direction and θz direction).

[0019] Position information of the mask stage MST in the XY plane (including rotation information in the θz direction) is measured by an interferometer system. The interferometer system measures the position of the mask stage MST by irradiating a measurement beam onto a movable mirror (or a mirror-finished reflective surface (not shown)) provided at the end of the mask stage MST and receiving the reflected light from the movable mirror. The measurement results are supplied to a control device CNT, which drives the mask stage MST via a drive system in accordance with the measurement results of the interferometer system.

[0020] The projection optical system PL is supported on an optical surface plate 73 below (on the -Z side of) the mask stage MST. The projection optical system PL is configured similarly to the projection optical system disclosed in, for example, U.S. Pat. No. 5,729,331. The projection optical system PL includes multiple (e.g., seven) projection optical units 100 (multi-lens projection optical units) arranged, for example, in a staggered pattern, to project the pattern image of the mask MSK. This forms a rectangular image field with the Y-axis direction as its longitudinal direction. Here, four projection optical units 100 are arranged at predetermined intervals in the Y-axis direction, and the remaining three projection optical units 100 are arranged at predetermined intervals in the Y-axis direction, spaced apart from the four projection optical units 100 on the +X side. Each of the multiple projection optical units 100 is, for example, a bilaterally telecentric, 1x1 system that forms an erect, normal image. The multiple projection areas of the staggered projection optical units 100 are collectively referred to as the exposure area. In this embodiment, four projection optical units 100 and three projection optical units 100 are arranged at regular intervals in the Y-axis direction, but the number of modules of the projection optical units 100 arranged at regular intervals in the Y-axis direction may be less than three or more than four. Furthermore, although two rows of the projection optical units 100 are arranged in the X-axis direction, the number of rows of the projection optical units 100 arranged in the X-axis direction may be one row or less, or three or more rows.

[0021] When an illumination area on the mask MSK is illuminated by illumination light IL from the illumination optical system IOP, the illumination light IL that has passed through the mask MSK forms a projected image (partial erect image) of the circuit pattern of the mask MSK within that illumination area, via the projection optical system PL, in an irradiation area (exposure area (conjugate to the illumination area)) on a plate P arranged on the image plane side of the projection optical system PL. Here, a resist (sensitizer) is applied to the surface of the plate P. By synchronously driving the mask stage MST and the substrate stage PST, i.e., by driving the mask MSK in the scanning direction (X-axis direction) relative to the illumination area (illumination light IL) and driving the plate P in the same scanning direction relative to the exposure area (illumination light IL), the plate P is exposed and the pattern of the mask MSK is transferred onto the plate P.

[0022] The substrate stage PST is placed on a base (vibration isolation table) 71 below (on the -Z side of) the projection optical system PL. A plate P is held on the substrate stage PST via a substrate holder (not shown).

[0023] Position information of the substrate stage PST in the XY plane (including rotation information (yawing amount (amount of rotation θz in the θz direction), pitching amount (amount of rotation θy in the θy direction), and rolling amount (amount of rotation θx in the θx direction))) is measured by an interferometer system. The interferometer system measures the position of the substrate stage PST by irradiating a measurement beam from the optical surface plate 73 onto a movable mirror (or a mirror-finished reflective surface (not shown)) provided at the end of the substrate stage PST, and receiving the reflected light from the movable mirror. The measurement results are supplied to the control device CNT, and the control device CNT drives the substrate stage PST in accordance with the measurement results of the interferometer system.

[0024] In the exposure apparatus 10, alignment measurement (e.g., EGA, etc.) is performed prior to exposure, and the plate P is exposed using the results in the following procedure. First, in accordance with instructions from the control device CNT, the mask stage MST and the substrate stage PST are synchronously driven in the X-axis direction. This performs scanning exposure on the first shot area on the plate P. When scanning exposure on the first shot area is completed, the control device CNT moves (steps) the substrate stage PST to a position corresponding to the second shot area. Then, scanning exposure is performed on the second shot area. Similarly, the control device CNT repeats stepping between shot areas of the plate P and scanning exposure on the shot areas to transfer the pattern of the mask MSK to all shot areas on the plate P.

[0025] (Configuration of illumination optical system IOP) Next, the configuration of the illumination optical system IOP in this embodiment will be described. The illumination optical system IOP comprises a plurality of illumination units 90 corresponding to the plurality of projection optical units 100 that the projection optical system PL comprises.

[0026] 2 is a diagram schematically illustrating the configuration of the illumination unit 90. As shown in FIG. 2, the illumination unit 90 includes a light source unit OPU and an illumination optical system 80.

[0027] (Configuration of Light Source Unit OPU) The light source unit OPU includes a light source array 20 and a magnifying optical system 30 .

[0028] FIG. 3A is a plan view schematically illustrating the configuration of the light source array 20. The light source array 20 includes a plurality of LED (Light Emitting Diode) packages 23 (5×5 in FIG. 3A ) arranged in an array on a substrate 21, for example. That is, the light source unit OPU is an LED light source. The number of LED packages 23 may be changed as needed. Here, the two directions in which the LED packages 23 are arranged are defined as the X1 direction and the Y1 direction. The X1 direction and the Y1 direction are orthogonal to each other. The direction orthogonal to the X1 direction and the Y1 direction is defined as the Z1 direction. The Z1 direction is approximately parallel to the optical axis OA of light emitted by a light-emitting unit 231, which will be described later.

[0029] Each of the multiple LED packages 23 has a light-emitting portion 231, and the peak wavelength of light emitted from the light-emitting portion 231 is, for example, in the range of 360 to 370 nm, 380 to 390 nm, or 400 to 410 nm. That is, the light-emitting portion 231 is an ultraviolet LED (UV LED). The light-emitting surface of the light-emitting portion 231 is square, and the length of one side is L. The LED packages 23 are arranged at a pitch P1. The pitch P1 is the distance between the centers of adjacent LED packages 23. The LED packages 23 may be arranged not on a substrate but on, for example, a heat sink.

[0030] In this embodiment, a plurality of rows of the LED packages 23 are arranged side by side in the X1 direction and spaced apart in the Y1 direction. In the following description, among the LED packages 23 included in each of the plurality of rows spaced apart in the Y1 direction, the LED packages 23 included in a row (referred to as the first row) and arranged side by side in the X1 direction may be referred to as the first LED package 23, and the LED packages 23 included in a row (referred to as the second row) adjacent to the first row in the Y1 direction and arranged side by side in the X1 direction may be referred to as the second LED package 23. Furthermore, the LED packages 23 included in a row (referred to as the third row) adjacent to the second row in the Y1 direction and arranged side by side in the X1 direction may be referred to as the third LED package 23.

[0031] Therefore, in this embodiment, it can also be said that the multiple LED packages 23 include a first LED package 23 arranged side by side in the X1 direction, and a second LED package 23 spaced apart from the first LED package 23 in the Y1 direction and arranged side by side in the X1 direction.

[0032] FIG. 3B is a diagram schematically illustrating the internal configuration of the light source unit OPU.

[0033] 3B , the magnifying optical system 30 is an optical system for forming a magnified image (secondary light source image) of the light-emitting portion 231 of each LED package 23 on a predetermined plane PP. The predetermined plane PP is the emission surface of the magnifying optical system 30 or its vicinity. The magnifying optical system 30 includes a plurality of lens units 31 arranged to correspond to the arrangement of the LED packages 23. Each of the lens units 31 is a double-telecentric optical system that enlarges and projects the light-emitting portion 231 at a magnification M that is equal to or greater than (the arrangement pitch P1 of the LED packages 23) / (the length L of one side of the light-emitting surface of the light-emitting portion 231).

[0034] In the present embodiment, the lens unit 31 includes four plano-convex lenses, but is not limited to this. The lens unit 31 may include, for example, two biconvex lenses or three biconvex lenses. The lens unit 31 may also include, for example, a plano-convex lens and a biconvex lens. In the present embodiment, the magnifying optical system 30 is configured to form a magnified image (secondary light source image) of the light-emitting unit 231 on a predetermined plane PP, but is not limited to this. The predetermined plane PP may also be configured to serve as a pupil plane.

[0035] 2 again, the configuration of the illumination optical system 80 will be described. The illumination optical system 80 includes a relay optical system 81, a condenser optical system 86 including an aperture stop 85, and an illuminance correction filter 87. Note that the illumination optical system 80 may be configured without the illuminance correction filter 87.

[0036] The relay optical system 81 relays light from the light source unit OPU (light source array 20 ) to the condenser optical system 86 .

[0037] The aperture stop 85 is disposed at a position that is optically nearly conjugate with the entrance pupil plane of the projection optical system PL, and has a variable opening for defining the range that contributes to illumination by the secondary light source. The aperture stop 85 changes the aperture diameter of the variable opening to set a σ value (the ratio of the aperture diameter of the secondary light source image on the pupil plane of the projection optical system to the aperture diameter of the pupil plane) that determines the illumination conditions to a desired value. The light from the secondary light source that passes through the aperture stop 85 is condensed by a condenser optical system 86, and then its illuminance is corrected by an illuminance correction filter 87, and the light illuminates a mask MSK on which a predetermined pattern is formed.

[0038] 2, the illumination optical system 80 according to this embodiment does not include a fly-eye lens. Here, the configuration of an illumination unit that includes a fly-eye lens will be described.

[0039] 4 is a diagram schematically illustrating the configuration of an illumination unit 900 equipped with a fly's eye lens. The illumination unit 900 includes a light source unit OPU and an illumination optical system 800. The configuration of the light source unit OPU is the same as the configuration of the light source unit OPU according to the first embodiment, and therefore detailed description thereof will be omitted.

[0040] The illumination optical system 800 includes a relay optical system 810 , a condensing optical system 811 , a fly-eye lens FEL, an aperture stop 85 , a condenser optical system 860 , and an illumination correction filter 87 .

[0041] The relay optical system 810 relays light from the light source unit OPU (light source array 20) to the condensing optical system 811. The condensing optical system 811 guides the light from the relay optical system 810 to the incident end of the fly-eye lens FEL.

[0042] The fly-eye lens FEL is formed by closely arranging a large number of lens elements, each having a positive refractive power, in a row and column so that their optical axes are parallel to the reference optical axis AX. Each lens element constituting the fly-eye lens FEL has a rectangular cross section similar to the shape of the illumination field to be formed on the mask MSK (and consequently the shape of the exposure area to be formed on the plate P).

[0043] Therefore, the light beam incident on the fly-eye lens FEL is wavefront split by the multiple lens elements, and one light source image is formed on or near the rear focal plane (exit surface) of each lens element. That is, a substantial surface light source consisting of multiple light source images is formed on or near the rear focal plane (exit surface) of the fly-eye lens FEL. The light beam from the surface light source formed on or near the rear focal plane (exit surface) of the fly-eye lens FEL is incident on an aperture stop 85 arranged nearby. Note that in FIG. 4, the rear focal plane (exit surface) of the fly-eye lens FEL and the light source array 20 are optically conjugate.

[0044] The aperture stop 85 and the illumination correction filter 87 are the same as those in the first embodiment, and therefore detailed description thereof will be omitted.

[0045] In the illumination unit 900 shown in FIG. 4, the illuminance of the light irradiated onto the mask MSK is made uniform by using a fly-eye lens FEL. However, the fabrication of a fly-eye lens is costly. Therefore, from the viewpoint of cost reduction, it is preferable not to use a fly-eye lens. On the other hand, if the fly-eye lens is omitted from the illumination unit 900, the uniformity of the illuminance of the light irradiated onto the mask MSK is impaired.

[0046] As described above, the illumination optical system 80 according to this embodiment does not include a fly's eye lens. Therefore, unless some countermeasure is taken, the uniformity of the illuminance of the light irradiated onto the surface of the mask MSK will decrease. If the illuminance of the light irradiated onto the surface of the mask MSK is non-uniform, the illuminance of the exposure light irradiated onto the plate P (illumination light passing through the mask MSK) will also be non-uniform, resulting in a decrease in exposure accuracy.

[0047] Therefore, in the illumination unit 90 of this embodiment, the attitude of the light source array 20 and the installation position of the light source unit OPU are adjusted so that the exposure accuracy does not decrease even if the illuminance of the light from the light source unit OPU that is irradiated directly onto the surface of the mask MSK without passing through an illuminance homogenizing element (e.g., a fly's eye lens) is uneven.

[0048] First, the orientation of the light source array 20 will be specifically described. FIG. 5A is a diagram showing the orientation of the light source array 20 (light source unit OPU) in this embodiment, and FIG. 5B is a diagram showing an image IMG20 of the light-emitting portions 231 of the light source array 20 formed on the surface of the mask MSK. FIG. 5A shows the coordinate system (XYZ coordinate system) in the exposure apparatus 10 and the coordinate system (X1Y1Z1 coordinate system) in the light source array 20. Also, in FIG. 5A, a direction included in the X1Y1 plane and intersecting the X1 and Y1 directions is defined as a first direction DR1. In FIG. 5B, a direction corresponding to the first direction DR1 in the image IMG20 of the light-emitting portions 231 of the light source array 20 formed on the surface of the mask MSK shown in FIG. 5B is defined as a second direction DR2. In this embodiment, the second direction DR2 corresponding to the first direction DR1 coincides with the scanning direction (X-axis direction). That is, the first direction DR1 is set in Fig. 5A so that the second direction DR2 corresponding to the first direction DR1 in the image IMG20 of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK is parallel to the scanning direction. Also, Fig. 5B shows the coordinate system (XYZ coordinate system) in the exposure apparatus 10, and in the image IMG20 of the light-emitting units 231 of the light source array 20 shown in Fig. 5B, the direction corresponding to the X1 direction is shown as the X2 direction, and the direction corresponding to the Y1 direction is shown as the Y2 direction.

[0049] 2 , in this embodiment, the light source array 20 is located above the mask MSK. That is, the direction perpendicular to the light-emitting surfaces of the LED packages 23 and the direction perpendicular to the surface of the mask MSK are substantially parallel. In this embodiment, as shown in FIG. 5A , the attitude of the light source array 20 (light source unit OPU) is adjusted so that a boundary B1 between first LED packages 23 adjacent to each other in the X1 direction and a boundary B3 between second LED packages 23 adjacent to each other in the X1 direction are not continuous in the scanning direction (X-axis direction), and a boundary B2 between the first LED package 23 and the second LED package 23 adjacent to each other in the Y1 direction are not continuous in the scanning direction (X-axis direction).

[0050] This configuration can be rephrased as follows: When the second direction DR2 corresponding to the first direction DR1 in the image IMG20 of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK via the illumination optical system 80 coincides with the scanning direction (X-axis direction), the boundary between adjacent LED packages 23 is not continuous in the first direction DR1.

[0051] When the attitude of the light source array 20 is adjusted in this manner, as shown in Figure 5 (B), in the image IMG20 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK, the portion IMB1 corresponding to the boundary B1 between adjacent first LED packages 23 and the portion IMB3 corresponding to the boundary B3 between adjacent second LED packages 23 are not continuous in the second direction DR2 (scanning direction) corresponding to the first direction DR1, and the portion IMB2 corresponding to the boundary B2 between adjacent first LED packages 23 and second LED packages 23 is not continuous in the second direction DR2 (scanning direction).

[0052] In the image IMG20 of the light-emitting portion 231 of the light source array 20, the illuminance at portions IMB1 to IMB3 corresponding to the boundaries B1 to B3, respectively, is lower than the illuminance at portion IMC23 corresponding to the light-emitting portion 231 of the LED package 23. Therefore, the illuminance of the image IMG20 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK is non-uniform. However, as shown in FIG. 5B , the portions IMB1 to IMB3 corresponding to the boundaries B1 to B3, respectively, in the image IMG20 of the light-emitting portion 231 of the light source array 20 are not continuous in the scanning direction. Therefore, when the plate P is subjected to scanning exposure, the illuminance distribution after scanning averaging on the plate P becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect. This makes it possible to suppress a decrease in exposure accuracy. This point will be explained in more detail.

[0053] 6 is a schematic diagram showing the configuration of an illumination unit 900A according to Comparative Example 1. The illumination unit 900A according to Comparative Example 1 includes a light source unit OPU and an illumination optical system 80.

[0054] The illumination unit 900A according to Comparative Example 1 and the illumination unit 90 according to the first embodiment differ in the posture of the light source unit OPU (light source array 20). This point will be described with reference to FIG.

[0055] FIG. 7A is a diagram showing the orientation of the light source array 20 (light source unit OPU) in the illumination unit 900A according to Comparative Example 1, and FIG. 7B is a diagram showing an image IMG21 of the light-emitting portions 231 of the light source array 20 formed on the surface of the mask MSK in the illumination unit 900A according to Comparative Example 1. In FIG. 7A, a direction included in the X1Y1 plane and parallel to the Y1 direction is defined as the third direction DR3, and a direction corresponding to the third direction DR3 in the image IMG21 of the light-emitting portions 231 of the light source array 20 shown in FIG. 7B is defined as the fourth direction DR4. In Comparative Example 1, the fourth direction DR4 is parallel to the scanning direction (X-axis direction). That is, the third direction DR3 is set in FIG. 7A so that the fourth direction DR4 corresponding to the third direction DR3 in the image IMG21 of the light-emitting portions 231 of the light source array 20 formed on the surface of the mask MSK is parallel to the scanning direction. In addition, in FIG. 7B, in the image IMG21 of the light-emitting portion 231 of the light source array 20, the direction corresponding to the X1 direction is shown as the X3 direction, and the direction opposite to the Y1 direction is shown as the Y3 direction.

[0056] As shown in Figure 7 (A), in comparative example 1, the boundary B2 between adjacent first LED packages 23 and second LED packages 23 in the Y1 direction is not continuous in the third direction DR3, but the boundary B1 between adjacent first LED packages 23 in the X1 direction and the boundary B3 between adjacent second LED packages 23 are continuous in the third direction DR3.

[0057] That is, in Comparative Example 1, when the fourth direction DR4 corresponding to the third direction DR3 in the image IMG21 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK via the illumination optical system 80 coincides with the scanning direction (X-axis direction), the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are continuous in the third direction DR3.

[0058] In the image IMG21 of the light-emitting portion 231 of the light source array 20 shown in FIG. 7B , the illuminance at portions IMB1 and IMB3 corresponding to boundaries B1 and B3 is lower than the illuminance at portion IMC23 corresponding to the LED package 23. Therefore, the illuminance of the image IMG21 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK is non-uniform. In Comparative Example 1, as shown in FIG. 7B , portion IMB1 corresponding to boundary B1 and portion IMB3 corresponding to boundary B3 are continuous in the fourth direction DR4 (scanning direction). Therefore, when the plate P is subjected to scanning exposure, portions IMB1 and IMB3 with low illuminance are continuous in the scanning direction, and the illuminance after scanning averaging at positions corresponding to portions IMB1 and IMB3 with low illuminance is lower than at other positions.

[0059] In this embodiment, in the image IMG20 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK, when the second direction DR2 corresponding to the first direction DR1 included in the two-dimensional plane in which the LED packages 23 are two-dimensionally arranged coincides (is parallel to) the scanning direction, in the first direction DR1, the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous, and the boundary B2 between adjacent first LED packages 23 and second LED packages 23 is not continuous (see Figure 5 (A)).

[0060] 5B , the portions IMB1 and IMB3 corresponding to the boundaries B1 and B3, which have lower illuminance than the portion IMC23 corresponding to the LED package 23, are not continuous in the scanning direction. That is, when the plate P is subjected to scanning exposure, the portion IMC23 with high illuminance and the portion IMB1 or IMB3 with low illuminance alternately illuminate the plate P. Therefore, due to the averaging effect, the illuminance distribution after scanning averaging on the plate P becomes uniform in the direction perpendicular to the scanning direction.

[0061] Next, the installation position of the light source unit OPU will be described. In this embodiment, as shown in Fig. 2, the light source unit OPU is disposed at a position defocused from a plane CP1 optically conjugate with the plane of the mask MSK. More specifically, the position of the exit surface of the magnifying optical system 30 provided in the light source unit OPU is disposed at a position defocused from the plane CP1 optically conjugate with the plane of the mask MSK.

[0062] In this embodiment, the light source unit OPU is defocused by shifting it from the conjugate plane CP1 in a direction away from the mask MSK, but the light source unit OPU may also be defocused by shifting it from the conjugate plane CP1 in a direction closer to the mask MSK.

[0063] By disposing the light source unit OPU at a position defocused from the plane CP1 optically conjugate with the plane of the mask MSK, the boundary between the portion IMC23 corresponding to the LED package 23 and the portions IMB1 to IMB3 corresponding to the boundaries B1 to B3 in the image IMG20 of the light-emitting portion 231 of the light source array 20 becomes blurred, thereby improving the uniformity of the illuminance in the image IMG20 of the light-emitting portion 231 of the light source array 20. Therefore, the illuminance distribution after scan averaging on the plate P can be made more uniform in the direction orthogonal to the scanning direction.

[0064] [Simulation] The illuminance distribution after scan averaging on the plate P was simulated for Comparative Example 1, Comparative Example 2, and this embodiment.

[0065] Comparative Example 1 is a case where the plate P is subjected to scanning exposure using the illumination unit 900A described with reference to Figures 6 and 7A. In Comparative Example 1, the boundaries between adjacent LED packages 23 in the light source array 20 are continuous in the scanning direction. Furthermore, the light source unit OPU is disposed at a position corresponding to a surface CP1 common to the surface of the mask MSK.

[0066] 8A is a diagram showing an image IMG21 of the light-emitting unit 231 of the light source array 20 used in a simulation of the illuminance distribution after scan averaging on the plate P in Comparative Example 1, and a region R1 where scan averaging was performed. The image IMG21 of the light-emitting unit 231 of the light source array 20 illustrates an image viewed from the -Z side (the plate P side). In FIG. 8A, the shaded area is a region where the transmission of illumination light is restricted by a field diaphragm (not shown).

[0067] 8B is a graph showing the illuminance distribution after scan averaging in the non-scanning direction (Y-axis direction) perpendicular to the scanning direction (X-axis direction). The horizontal axis represents the position in the non-scanning direction, and as shown in FIG. 8A, the position of one end of region R1 in the non-scanning direction is set to 0, and the position of the other end is set to 100. The vertical axis represents the illuminance uniformity, showing the ratio of the illuminance after scan averaging at each position to the highest illuminance after scan averaging in the non-scanning direction. In other words, the highest illuminance after scan averaging in the non-scanning direction is shown as 100%.

[0068] 8B, the portion where the illuminance uniformity drops is the portion where a portion IMB1 corresponding to the boundary B1 between the first LED packages 23 and a portion IMB3 corresponding to the boundary B3 between the second LED packages 23 are continuous in the scanning direction in the image IMG21 of the light-emitting portion 231 of the light source array 20. As shown in FIG. 8B, in Comparative Example 1, the fluctuation range of the illuminance after the scan averaging is about 30%.

[0069] 9 is a schematic diagram showing the configuration of an illumination unit 900B according to Comparative Example 2. In Comparative Example 2, the light source unit OPU is disposed at a position defocused from a plane CP1 optically conjugate with the plane of the mask MSK. The other configurations are the same as those of Comparative Example 1.

[0070] 10A is a diagram showing an image IMG22 of the light-emitting unit 231 of the light source array 20 used in a simulation of the illuminance distribution after scan averaging on the plate P in Comparative Example 2, and a region R3 where scan averaging was performed. The image IMG22 of the light-emitting unit 231 of the light source array 20 illustrates an image viewed from the -Z side (the plate P side). In FIG. 10A, the shaded area is a region where the transmission of illumination light is restricted by a field diaphragm (not shown).

[0071] 10(B) is a graph showing the illuminance distribution after scan averaging in the non-scanning direction perpendicular to the scanning direction. The horizontal axis represents the position in the non-scanning direction, and as shown in FIG. 10(A), the position of one end of region R3 in the non-scanning direction is set to 0, and the position of the other end is set to 100. The vertical axis represents the illuminance uniformity, showing the ratio of the illuminance after scan averaging at each position to the highest illuminance after scan averaging in the non-scanning direction. In other words, the highest illuminance after scan averaging in the non-scanning direction is shown as 100%.

[0072] 10B , in Comparative Example 2, the fluctuation range of the illuminance after scan averaging is 2% or less, but exceeds 1%. As such, it can be seen that the uniformity of the illuminance after scan averaging in the non-scanning direction can be improved by disposing the light source unit OPU at a position defocused from the plane CP1 optically conjugate with the surface of the mask MSK. However, it is preferable that the fluctuation range of the illuminance after scan averaging be 1% or less, and the uniformity of the illuminance in Comparative Example 2 is insufficient.

[0073] (Example) The example corresponds to the first embodiment. That is, in the example, the attitude of the light source array 20 was adjusted so that the boundaries between adjacent LED packages 23 were not continuous in the scanning direction, and the light source unit OPU was positioned at a position defocused from the plane CP1 optically conjugate with the surface of the mask MSK.

[0074] FIG. 11A shows an image IMG20 of the light-emitting units 231 of the light source array 20 used in a simulation of the illuminance distribution after scan averaging on the plate P in the example, and a region R2 where scan averaging was performed. Region R2 is the region where the illumination light passes through a field stop (not shown), i.e., the illumination light irradiation region. The image IMG20 of the light-emitting units 231 of the light source array 20 illustrates an image viewed from the -Z side (the plate P side). In FIG. 11A, the hatched portion is the region where the transmission of the illumination light is restricted by a field stop (not shown). Also, in FIG. 11A, the arrangement direction of the images of the light-emitting units 231 of the LED package 23 (the direction corresponding to the Y1 direction in the image IMG20 of the light-emitting units 231 of the light source array 20) is indicated by a straight line LINE1.

[0075] 11(B) is a graph showing the illuminance distribution after scan averaging in the non-scanning direction perpendicular to the scanning direction. The horizontal axis represents the position in the non-scanning direction, and as shown in FIG. 11(A), the position of one end of region R2 in the non-scanning direction is set to 0, and the position of the other end is set to 100. The vertical axis represents the illuminance uniformity, showing the ratio of the illuminance after scan averaging at each position to the highest illuminance after scan averaging in the non-scanning direction. In other words, the highest illuminance after scan averaging in the non-scanning direction is shown as 100%.

[0076] 11B , in the example, the fluctuation range of the illuminance after scan averaging is 1% or less. In this way, it was confirmed that the illuminance distribution after scan averaging can be made uniform by adjusting the attitude of the light source array 20 so that the boundaries between adjacent LED packages 23 of the light source array 20 are not continuous in the first direction DR1 (corresponding to the scanning direction in the first embodiment) and by arranging the light source unit OPU at a position defocused from the plane CP1 optically conjugate with the surface of the mask MSK.

[0077] If the arrangement pitch of the images of the light source elements is a, the width of the region (irradiation region) R2 in the scanning direction (X direction) is b, and the angle (crossing angle) formed between the direction corresponding to the Y1 direction (indicated by the straight line LINE1) and the scanning direction (X direction) in the image IMG20 of the light-emitting section 231 of the light source array 20 is θ, then it is preferable that the following holds: sin θ = na / b (n is an integer). When the crossing angle θ satisfies the above conditional expression, the boundary of the direction corresponding to the Y1 direction crosses any position in the non-scanning direction n times, and therefore the illuminance after scan averaging in the non-scanning direction can be made more uniform.

[0078] As described above in detail, according to this embodiment, the exposure apparatus 10 includes the light source array 20, the illumination optical system 80 that illuminates the mask MSK with light from the light source array 20, and the projection optical system PL that projects a pattern formed on the mask MSK onto the plate P, and is an exposure apparatus that exposes the plate P while moving the mask MSK and the plate P in the scanning direction. The light source array 20 includes a plurality of LED packages 23 that are two-dimensionally arranged on a two-dimensional plane (X1Y1 plane) that includes the first direction DR1, and when the second direction DR2 corresponding to the first direction DR1 in an image IMG20 of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK via the illumination optical system 80 coincides with the scanning direction, the boundaries B1, B2, B3 between adjacent LED packages 23 among the plurality of LED packages 23 are not continuous in the first direction DR1. As a result, as described above, in the image IMG20 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK, the portions IMB1, IMB2, and IMB3 corresponding to the boundaries B1, B2, and B3 where the illuminance is lower are not continuous in the second direction DR2 (scanning direction). Therefore, even if the fly's eye lens is omitted, the illuminance distribution on the plate P after scan averaging can be made uniform. Furthermore, because the fly's eye lens can be omitted, the component costs of the exposure apparatus 10 can be reduced.

[0079] In this embodiment, the plurality of LED packages 23 include a first LED package 23 arranged side by side in the X1 direction and a second LED package 23 spaced apart from the first LED package 23 in the Y1 direction and arranged side by side in the X1 direction, the X1 direction and the Y1 direction intersect with the first direction DR1. By adjusting the attitude of the light source array 20 so that the X1 direction and the Y1 direction intersect with the first direction DR1 in this manner, it is possible to prevent portions IMB1, IMB2, and IMB3 corresponding to boundaries B1, B2, and B3, where illuminance is reduced, from continuing in the second direction DR2 (scanning direction) in the image IMG20 of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK.

[0080] Furthermore, in this embodiment, the light source unit OPU is disposed at a position defocused from a plane CP1 optically conjugate with the surface of the mask MSK. As a result, in the image IMG20 of the light-emitting portion 231 of the light source array 20 formed on the surface of the mask MSK, the boundaries between the portion IMC23 corresponding to the LED package 23 and the portions IMB1, IMB2, and IMB3 corresponding to the boundaries B1, B2, and B3 are blurred, making it possible to make the illuminance distribution on the plate P after scan averaging more uniform.

[0081] In the first embodiment, even when the light source unit OPU is disposed on a plane optically conjugate with the surface of the mask MSK, the effect of making the illuminance distribution after scan averaging on the plate P uniform can be achieved by adjusting the attitude of the light source array 20. That is, when the second direction DR2 corresponding to the first direction DR1 included in the X1Y1 plane coincides with the scanning direction in the image IMG20 of the light-emitting portions 231 of the light source array 20 formed on the surface of the mask MSK via the illumination optical system 80, the effect of making the illuminance distribution after scan averaging on the plate P uniform can be achieved simply by making the boundaries between adjacent LED packages 23 not continuous in the first direction DR1. The same applies to the following modified examples.

[0082] (Variation 1) In the first embodiment, the orientation of the light source array 20 is changed so that the boundaries between adjacent LED packages 23 among the plurality of LED packages 23 are not continuous in the first direction DR1. However, this is not limited to this. For example, the arrangement of the LED packages 23 on the substrate 21 may be changed so that the boundaries between adjacent LED packages 23 are not continuous in the first direction DR1.

[0083] Figure 12(A) is a diagram showing the arrangement of LED packages 23 in a light source array 20Z according to variant example 1, and Figure 12(B) is a diagram showing an image IMG20Z of the light-emitting portion 231 of the light source array 20Z formed on the surface of the mask MSK in variant example 1.

[0084] In Figure 12 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction parallel to the Y1 direction is the first direction DR1, and the direction corresponding to the first direction DR1 in the image IMG20Z of the light-emitting portion 231 of the light source array 20Z shown in Figure 12 (B) is the second direction DR2.

[0085] As shown in FIG. 12A , in Modification 1, the multiple LED packages 23 include first LED packages 23 arranged side by side in the X1 direction and second LED packages 23 spaced apart from the first LED packages 23 in the Y1 direction and arranged side by side in the X1 direction. Furthermore, the positions of the first LED packages 23 in the X1 direction are different from the positions of the second LED packages 23 in the X1 direction. As a result, a boundary B1 between adjacent first LED packages 23 and a boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1. Furthermore, a boundary B2 between adjacent first and second LED packages 23 is also not continuous in the first direction DR1. That is, the boundaries between adjacent LED packages 23 are not continuous in the first direction DR1.

[0086] As shown in FIG. 12B , in the image IMG20Z of the light-emitting units 231 of the light source array 20Z formed on the surface of the mask MSK, the first direction DR1 and the corresponding second direction DR2 are parallel to the scanning direction (X-axis direction). Because the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1, in the image IMG20Z of the light-emitting units 231 of the light source array 20Z, the portions IMB1Z and IMB3Z corresponding to the boundaries B1 and B3 are not continuous in the second direction DR2 (scanning direction). Similarly, the portion IMB2Z corresponding to the boundary B2 is also not continuous in the second direction DR2. As a result, when the plate P is scanned and exposed with light from the light source array 20Z, the illuminance distribution on the plate P after scanning averaging becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect.

[0087] As shown in variant example 1, by making the position in the X1 direction of the first LED package 23 arranged in a row in the X1 direction different from the position in the X1 direction of the second LED package 23 spaced apart from the first LED package 23 in the Y1 direction and arranged in a row in the X1 direction, the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 may not be continuous in the first direction DR1.

[0088] (Variation 2) The attitude of the light source array 20A according to Variation 1 may be changed. Fig. 13A is a diagram showing Variation 2 in which the attitude of the light source array 20Z according to Variation 1 is changed, and Fig. 13B is a diagram showing an image IMG20Z of the light-emitting portions 231 of the light source array 20Z formed on the surface of the mask MSK in Variation 2.

[0089] In Figure 13 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction intersecting the X1 direction and the Y1 direction is the first direction DR1, and the direction corresponding to the first direction DR1 in the image IMG20Z of the light-emitting portion 231 of the light source array 20Z shown in Figure 13 (B) is the second direction DR2.

[0090] 13A , in Modification 2, the light source array 20Z shown in FIG. 12A is rotated around the Z1 axis. In Modification 2, too, the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1. Furthermore, the boundary B2 between adjacent first LED packages 23 and second LED packages 23 is also not continuous in the first direction DR1.

[0091] As shown in FIG. 13B , in the image IMG20Z of the light-emitting units 231 of the light source array 20Z formed on the surface of the mask MSK, the first direction DR1 and the corresponding second direction DR2 are parallel to the scanning direction (X-axis direction). Because the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1, in the image IMG20Z of the light-emitting units 231 of the light source array 20Z, the portions IMB1Z and IMB3Z corresponding to the boundaries B1 and B3 are not continuous in the second direction DR2 (scanning direction). Furthermore, the portion IMB2Z corresponding to the boundary B2 is also not continuous in the second direction DR2. Therefore, even in the second modification, the averaging effect results in a uniform illuminance distribution on the plate P after scan averaging in a direction perpendicular to the scanning direction.

[0092] As in variant example 2, in the image IMG20Z of the light-emitting portion 231 of the light source array 20Z formed on the surface of the mask MSK, when the second direction DR2 corresponding to the first direction DR1 is parallel to the scanning direction (X-axis direction), the posture of the light source array 20Z in variant example 1 may be changed to the extent that the boundary B2 between the first LED package 23 and the second LED package 23 is not continuous in the first direction DR1.

[0093] (Variant 3) Figure 14(A) is a diagram showing the arrangement of LED packages 23 in a light source array 20Y according to variant 3, and Figure 14(B) is a diagram showing an image IMG20Y of the light-emitting portion 231 of the light source array 20Y formed on the surface of the mask MSK in variant 3.

[0094] In Figure 14 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction parallel to the Y1 direction is the first direction DR1. In the image IMG20Y of the light-emitting portion 231 of the light source array 20Y shown in Figure 14 (B), the direction corresponding to the first direction DR1 is the second direction DR2.

[0095] 14(A) , in Modification 3, the multiple LED packages 23 include a first LED package 23 arranged side by side in the X1 direction, a second LED package 23 spaced apart from the first LED package 23 in the Y1 direction and arranged side by side in the X1 direction, and a third LED package 23 spaced apart from the second LED package 23 in the Y1 direction and arranged side by side in the X1 direction. Furthermore, the positions of the first LED package 23 in the X1 direction, the positions of the second LED package 23 in the X1 direction, and the positions of the third LED package 23 in the X1 direction are all different. As a result, a boundary B1 between adjacent first LED packages 23, a boundary B3 between adjacent second LED packages 23, and a boundary B5 between adjacent third LED packages 23 are not continuous in the first direction DR1. Furthermore, the boundary B2 between adjacent first and second LED packages 23 is not continuous in the first direction DR1, and the boundary B4 between adjacent second and third LED packages 23 is not continuous in the first direction DR1.

[0096] 14B , in the image IMG20Y of the light-emitting unit 231 of the light source array 20Y formed on the surface of the mask MSK, the second direction DR2 corresponding to the first direction DR1 is parallel to the scanning direction (X-axis direction). Because the boundary B1 between adjacent first LED packages 23, the boundary B3 between adjacent second LED packages 23, and the boundary B5 between adjacent third LED packages 23 are not continuous in the first direction DR1, in the image IMG20Y of the light-emitting unit 231 of the light source array 20Y, portions IMB1Y, IMB3Y, and IMB5Y corresponding to the boundaries B1, B3, and B5 are not continuous in the second direction DR2 (scanning direction). Furthermore, portions IMB2Y and IMB4Y corresponding to the boundaries B2 and B4 are not continuous in the second direction DR2. Therefore, also in the third modification, when the plate P is subjected to scanning exposure, the illuminance distribution after scanning averaging on the plate P becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect.

[0097] As shown in variant example 3, when multiple LED packages 23 arranged in a row in the X1 direction are spaced apart in the Y1 direction, the arrangement positions of the LED packages 23 may be made different for each row so that the boundaries between adjacent LED packages 23 are not continuous in the first direction DR1.

[0098] (Variation 4) The attitude of the light source array 20Y according to Variation 3 may be changed. Fig. 15A is a diagram showing Variation 4 in which the attitude of the light source array 20Y according to Variation 3 is changed, and Fig. 15B is a diagram showing an image IMG20Y of the light-emitting portions 231 of the light source array 20Y formed on the surface of the mask MSK in Variation 4.

[0099] In Figure 15 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction intersecting the X1 direction and the Y1 direction is the first direction DR1, and the direction corresponding to the first direction DR1 in the image IMG20Y of the light-emitting portion 231 of the light source array 20Y shown in Figure 15 (B) is the second direction DR2.

[0100] 15A, in Modification 4, the light source array 20Y shown in Fig. 14A is rotated around the Z1 axis. The posture of the light source array 20Y is adjusted so that, in an image IMG20Y of the light-emitting portions 231 of the light source array 20Y, the X2 and Y2 directions corresponding to the X1 and Y1 directions intersect with the scanning direction.

[0101] In the fourth modification, the boundary B1 between adjacent first LED packages 23, the boundary B3 between adjacent second LED packages 23, and the boundary B5 between adjacent third LED packages 23 are also discontinuous in the first direction DR1. Furthermore, the boundary B2 between adjacent first and second LED packages 23 is discontinuous in the first direction DR1, and the boundary B4 between adjacent second and third LED packages 23 is also discontinuous in the first direction DR1.

[0102] 15B , in the image IMG20Y of the light-emitting unit 231 of the light source array 20Y formed on the surface of the mask MSK, the second direction DR2 corresponding to the first direction DR1 is parallel to the scanning direction (X-axis direction). Because the boundary B1 between adjacent first LED packages 23, the boundary B3 between adjacent second LED packages 23, and the boundary B5 between adjacent third LED packages 23 are not continuous in the first direction DR1, in the image IMG20Y of the light-emitting unit 231 of the light source array 20Y, portions IMB1Y, IMB3Y, and IMB5Y corresponding to the boundaries B1, B3, and B5 are not continuous in the second direction DR2 (scanning direction). Furthermore, because the boundaries B2 and B4 are not continuous in the first direction DR1, portions IMB2Y and IMB4Y corresponding to the boundaries B2 and B4 are not continuous in the second direction DR2. As a result, when the plate P is subjected to scanning exposure, the illuminance distribution after scanning averaging on the plate P becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect.

[0103] As in variant example 4, when the second direction DR2 corresponding to the first direction DR1 in the image IMG20Y of the light-emitting portion 231 of the light source array 20Y formed on the surface of the mask MSK is parallel to the scanning direction (X-axis direction), the posture of the light source array 20Y in variant example 3 may be changed to the extent that the boundary B2 between the first LED package 23 and the second LED package 23 and the boundary B4 between the second LED package 23 and the third LED package 23 are not continuous in the first direction DR1.

[0104] (Variant 5) Figure 16(A) is a diagram showing the arrangement of LED packages 23 in a light source array 20X relating to variant 5, and Figure 16(B) is a diagram showing an image IMG20X of the light-emitting portion 231 of the light source array 20X formed on the surface of the mask MSK in variant 5.

[0105] In Figure 16 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction intersecting the X1 and Y1 directions is the first direction DR1, and the direction corresponding to the first direction DR1 in the image IMG20X of the light-emitting portion 231 of the light source array 20X shown in Figure 16 (B) is the second direction DR2.

[0106] 16(A) , in Modification 5, the plurality of LED packages 23 includes a plurality of first LED packages 23 arranged side by side in the X1 direction and a plurality of second LED packages 23 spaced apart from the first LED packages 23 in the Y1 direction and arranged side by side in the X1 direction. A boundary B1 between adjacent first LED packages 23 and a boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1. Furthermore, a boundary B2 between the first LED package 23 and the second LED package 23 adjacent in the Y1 direction is not continuous in the first direction DR1.

[0107] 16B , in the image IMG20X of the light-emitting units 231 of the light source array 20X formed on the surface of the mask MSK, the first direction DR1 and the corresponding second direction DR2 are parallel to the scanning direction (X-axis direction). Because the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1, the portions IMB1X and IMB3X corresponding to the boundaries B1 and B3 in the image IMG20X of the light-emitting units 231 of the light source array 20X are not continuous in the second direction DR2 (scanning direction). As a result, when the plate P is subjected to scanning exposure, the illuminance distribution on the plate P after scanning averaging becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect.

[0108] (Variation 6) The attitude of the light source array 20X according to Variation 5 may be changed. Fig. 17A is a diagram showing Variation 6 in which the attitude of the light source array 20X according to Variation 5 is changed, and Fig. 17B is a diagram showing an image IMG20X of the light-emitting portions 231 of the light source array 20X formed on the surface of the mask MSK in Variation 6.

[0109] In Figure 17 (A), the LED packages 23 are included in a two-dimensional plane (X1Y1 plane) in which they are arranged two-dimensionally, and the direction intersecting the X1 direction and the Y1 direction is the first direction DR1, and the direction corresponding to the first direction DR1 in the image IMG20X of the light-emitting portion 231 of the light source array 20X shown in Figure 17 (B) is the second direction DR2.

[0110] As shown in FIG. 17A, in the sixth modification, the light source array 20X is rotated around the Z1 axis from the state shown in FIG. 16A.

[0111] In the sixth modification, the boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1. In addition, the boundary B2 between adjacent first LED packages 23 and second LED packages 23 is not continuous in the first direction DR1.

[0112] 17B , in the image IMG20X of the light-emitting units 231 of the light source array 20X formed on the surface of the mask MSK, the first direction DR1 and the corresponding second direction DR2 are parallel to the scanning direction (X-axis direction). The boundary B1 between adjacent first LED packages 23 and the boundary B3 between adjacent second LED packages 23 are not continuous in the first direction DR1, and the boundary B2 between adjacent first and second LED packages 23 are not continuous in the first direction DR1. Therefore, in the image IMG20X of the light-emitting units 231 of the light source array 20X, portions IMB1X, IMB2X, and IMB3X corresponding to the boundaries B1, B2, and B3 are not continuous in the second direction DR2 (scanning direction). As a result, when the plate P is subjected to scanning exposure, the illuminance distribution on the plate P after scanning averaging becomes uniform in the direction perpendicular to the scanning direction due to the averaging effect.

[0113] As in the sixth modification, the attitude of the light source array 20X according to the fifth modification may be changed to the extent that the boundaries B1, B2, and B3 are not continuous in the first direction DR1.

[0114] (Variation 7) In the first embodiment and variations 1 to 6 thereof, the direction orthogonal to the light-emitting surface of the LED package 23 and the direction orthogonal to the surface of the mask MSK are substantially parallel to each other, but the direction orthogonal to the light-emitting surface of the LED package 23 may intersect with the direction orthogonal to the surface of the mask MSK. Fig. 18 is a diagram schematically showing the configuration of an illumination unit 90A according to Variation 7.

[0115] 18 , the direction perpendicular to the light-emitting surface of the LED package 23 intersects with the direction perpendicular to the surface of the mask MSK. In the illumination optical system 80A according to the seventh modification, the relay optical system 81A includes a mirror M1 that reflects light from the light source unit OPU, thereby changing the traveling direction of the light from the light source unit OPU to a direction perpendicular to the surface of the mask MSK.

[0116] In this way, even when the direction orthogonal to the light-emitting surfaces of the LED packages 23 intersects with the direction orthogonal to the surface of the mask MSK, the illuminance distribution after scan averaging on the plate P can be made uniform in the direction orthogonal to the scanning direction by adjusting the attitude of the light source array 20 or changing the arrangement of the LED packages 23 included in the light source array 20. Specifically, in the image IMG20 of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK, when a second direction DR2 corresponding to a first direction DR1 included in a two-dimensional plane in which the LED packages 23 are two-dimensionally arranged is parallel to the scanning direction, it is only necessary to make the boundaries between adjacent LED packages 23 not continuous in the first direction DR1.

[0117] In the illumination unit 90A, it can be considered that the secondary light sources of the light-emitting units 231 of the light source array 20 are formed at positions optically conjugate with the images of the light-emitting units 231 of the light source array 20 formed on the surface of the mask MSK in the direction perpendicular to the surface of the mask MSK. Therefore, the posture of the light source array 20 may be adjusted or the arrangement of the LED packages 23 included in the light source array 20 may be changed so that the boundaries between adjacent LED packages 23 in the secondary light source are not continuous in the scanning direction.

[0118] Furthermore, by disposing the light source unit OPU at a position defocused from the plane CP2 optically conjugate with the plane of the mask MSK, it is possible to further improve the illuminance uniformity, as in the first embodiment. Note that in FIG. 18, any of the light source arrays 20Z, 20Y, and 20X may be used instead of the light source array 20.

[0119] Second Embodiment The lighting unit to which the light source units according to the first embodiment and its modifications are applied is not limited to the lighting unit 90 according to the first embodiment and the lighting unit 90A according to Modification 7. Fig. 19 is a schematic diagram showing the configuration of a lighting unit 90B according to a second embodiment.

[0120] The illumination unit 90B includes a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80B. The first light source unit OPU1 includes a light source array 20A and a magnifying optical system 30A, and the second light source unit OPU2 includes a light source array 20B and a magnifying optical system 30B. The configurations of the light source array 20A and the light source array 20B are the same as any of the light source arrays 20, 20X, 20Y, and 20Z described above, and therefore detailed descriptions thereof will be omitted. Furthermore, the configurations of the magnifying optical systems 30A and 30B are the same as the magnifying optical system 30 described above, and therefore detailed descriptions thereof will be omitted.

[0121] The illumination optical system 80B includes a first focusing optical system 83A including a first dichroic mirror DM1, a second focusing optical system 83B, a second dichroic mirror DM2, a relay optical system 81B, a condenser optical system 86 including an aperture stop 85, and an illuminance correction filter 87.

[0122] The first focusing optical system 83A forms a pupil of the magnified image of the light-emitting unit 231 formed by the magnifying optical system 30A. That is, the rear focal position of the first focusing optical system 83A is the pupil position. The first focusing optical system 83A has a first dichroic mirror DM1 in the optical path, which reflects at least a portion of the light with a peak wavelength of 385 nm. This causes the light beam to be incident on the second dichroic mirror DM2. Note that the first focusing optical system 83A may be configured without the first dichroic mirror DM1. In this case, the arrangement of the first light source unit OPU1 and the arrangement of each lens in the first focusing optical system 83A may be appropriately adjusted so that the light beam is incident on the second dichroic mirror DM2. Furthermore, the first focusing optical system 83A may be configured with a single lens or a lens group including multiple lenses.

[0123] The second focusing optical system 83B forms a pupil of the magnified image of the light-emitting unit 231 formed by the magnifying optical system 30B. That is, the rear focal position of the second focusing optical system 83B is the pupil position. The second focusing optical system 83B may be composed of a single lens or a lens group including multiple lenses.

[0124] The second dichroic mirror DM2 transmits at least a portion of the light with a peak wavelength of 385 nm and reflects at least a portion of the light with a peak wavelength of 365 nm, thereby forming a composite image by superimposing the pupil image formed by the first focusing optical system 83A and the pupil image formed by the second focusing optical system 83B.

[0125] The relay optical system 81B relays the light from the second dichroic mirror DM2 to the condenser optical system 86.

[0126] In the light source array 20A, when a first direction DR1 included in a two-dimensional plane on which the LED packages 23 are two-dimensionally arranged is set, and a direction corresponding to the first direction DR1 in the image of the light-emitting units 231 of the light source array 20A coincides with the scanning direction, the boundaries between adjacent LED packages 23 among the plurality of LED packages 23 are not continuous in the first direction DR1. Furthermore, in the light source array 20B, when a first direction DR1 included in a two-dimensional plane on which the LED packages 23 are two-dimensionally arranged is set, and a direction corresponding to the first direction DR1 in the image of the light-emitting units 231 of the light source array 20B coincides with the scanning direction, the boundaries between adjacent LED packages 23 among the plurality of LED packages 23 are not continuous in the first direction DR1.

[0127] In the second embodiment, the light source units OPU1 and OPU2 are arranged on a plane optically conjugate with the plane of the mask MSK, but the light source unit OPU1 may be arranged at a position defocused from the plane optically conjugate with the plane of the mask MSK, and the light source unit OPU2 may be arranged at a position defocused from the plane optically conjugate with the plane of the mask MSK, thereby further improving the illuminance uniformity.

[0128] The other configurations are the same as those of the above embodiment, and therefore detailed description will be omitted. In this way, the light source unit according to any one of the first embodiment and its modifications can be applied to an exposure apparatus having a plurality of light source units.

[0129] Third Embodiment FIG. 20 is a schematic diagram showing the configuration of an exposure apparatus 10C according to a third embodiment.

[0130] In the exposure apparatus 10C, the illumination unit 90C includes a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80C. The first light source unit OPU1 and the second light source unit OPU2 are the same as those in the second embodiment, and therefore detailed description thereof will be omitted.

[0131] The illumination optical system 80C includes a first focusing optical system 83A1, a second focusing optical system 83B1, a third dichroic mirror DM3, a relay optical system 81C, a condenser optical system 86C including an aperture stop 85, and an illuminance correction filter 87.

[0132] The first focusing optical system 83A1 is disposed on or near the predetermined plane PP, and forms a pupil of the magnified image of the light-emitting unit 231 formed by the magnifying optical system 30A. The first focusing optical system 83A1 may be composed of a single lens, or may be composed of a lens group including a plurality of lenses.

[0133] The second focusing optical system 83B1 is disposed on or near the predetermined plane PP, and forms a pupil of the magnified image of the light-emitting unit 231 formed by the magnifying optical system 30B. The second focusing optical system 83B1 may be composed of a single lens, or may be composed of a lens group including a plurality of lenses.

[0134] The third dichroic mirror DM3 transmits at least a portion of the light with a peak wavelength of 385 nm and reflects at least a portion of the light with a peak wavelength of 365 nm, thereby forming a composite image by superimposing the pupil image formed by the first focusing optical system 83A1 and the pupil image formed by the second focusing optical system 83B1.

[0135] The relay optical system 81C relays the light from the third dichroic mirror DM3 to the condenser optical system 86C.

[0136] The light of the composite image that passes through the aperture stop 85 is subjected to the condensing action of the condenser optical system 86C, and then its illuminance is corrected by the illuminance correction filter 87, and illuminates a mask MSK on which a predetermined pattern is formed.

[0137] In exposure apparatus 10C, projection optical system PL is an Offner type optical system that is supported below (on the -Z side of) mask stage MST by optical surface plate 73. Projection optical system PL forms, for example, an arc-shaped image field with its longitudinal direction in the Y-axis direction.

[0138] When an illumination area on the mask MSK is illuminated by illumination light IL from the illumination optical system IOP, the illumination light IL that has passed through the mask MSK forms a projected image (partial erect image) of the circuit pattern of the mask MSK within the illumination area in an irradiation area (exposure area (conjugate to the illumination area)) on the plate P that is arranged on the image plane side of the projection optical system PL. This exposes the plate P, and the pattern of the mask MSK is transferred onto the plate P.

[0139] As shown in the third embodiment, the light source unit according to any one of the first embodiment and its modifications can be applied to an exposure apparatus 10C that is equipped with an Offner type projection optical system PL.

[0140] In the third embodiment, the light source units OPU1 and OPU2 are arranged on a plane optically conjugate with the plane of the mask MSK, but by arranging the light source unit OPU1 at a position defocused from the plane optically conjugate with the plane of the mask MSK and by arranging the light source unit OPU2 at a position defocused from the plane optically conjugate with the plane of the mask MSK, the illuminance uniformity can be further improved.

[0141] The wavelengths of the light emitted by the first light source unit OPU1 and the second light source unit OPU2 are not limited to those described above, and the first light source unit OPU1 and the second light source unit OPU2 may be constructed by appropriately combining LED packages that emit light having a peak wavelength in the range of 360 to 440 nm.

[0142] For example, the peak wavelength of the light emitted from the light-emitting portion 231 of the LED package 23 may be in the range of 400 to 410 nm. For example, the first light source unit OPU1 may be configured to emit light with a peak wavelength of 405 nm, and the second light source unit OPU2 may be configured to emit light with a peak wavelength of 365 nm. Alternatively, the first light source unit OPU1 may be configured to emit light with a peak wavelength of 395 nm, and the second light source unit OPU2 may be configured to emit light with a peak wavelength of 385 nm. The combination of the wavelengths of the light emitted from the first light source unit OPU1 and the second light source unit OPU2 is not limited to these examples. Note that, when the combination of the wavelengths of the light emitted from the first light source unit OPU1 and the second light source unit OPU2 is a combination other than that described in this embodiment, it is preferable to change the material of the dichroic mirror appropriately depending on the wavelengths used.

[0143] Fourth Embodiment FIG. 21 is a schematic diagram showing the configuration of an illumination unit 90D according to a fourth embodiment.

[0144] The illumination unit 90D includes a light source unit OPU and an illumination optical system 80D. The light source unit OPU is the same as that in the first embodiment, so a detailed description thereof will be omitted. The illumination optical system 80D does not include the relay optical system 81 in the illumination optical system 80 of the first embodiment. Even with this configuration, the illuminance distribution on the plate P after scan averaging is uniform, as in the first embodiment.

[0145] Furthermore, by disposing the light source unit OPU at a position defocused from the plane CP3 optically conjugate with the plane of the mask MSK, it is possible to further improve the illuminance uniformity, as in the first embodiment. Note that in FIG. 21 , any of the light source arrays 20Z, 20Y, and 20X may be used instead of the light source array 20.

[0146] Fifth Embodiment FIG. 22 is a schematic diagram showing the configuration of an illumination unit 90E according to a fifth embodiment.

[0147] The illumination unit 90E includes a light source unit OPU. The configuration of the light source unit OPU is the same as that of the first embodiment, so detailed description will be omitted. The illumination unit 90E does not include the illumination optical system 80 of the first embodiment. That is, it does not include any optical elements in the optical path between the light source unit OPU and the mask MSK. Even with this configuration, the illuminance distribution after scan averaging on the plate P can be made uniform. In the fifth embodiment, the distance from the light source unit OPU to the surface of the mask MSK is not particularly limited. However, if this distance is too long, the illuminance of the illuminated area on the surface of the mask MSK decreases. Therefore, to maintain the illuminance at a desired value, it is necessary to increase the number of LED packages 23. From the viewpoint of not requiring too many LED packages 23, the distance from the light source unit OPU to the surface of the mask MSK may be 100 to 500 mm, or may be 100 to 300 mm. Note that the surface of the mask MSK here refers to the pattern surface on which the circuit pattern is formed. 22, any one of light source arrays 20Z, 20Y, and 20X may be used instead of light source array 20. Although the fifth embodiment is configured such that no optical element is provided in the optical path between light source unit OPU and mask MSK, an illuminance correction filter 87 may be provided in the optical path between light source unit OPU and mask MSK.

[0148] In the above embodiment and its modifications, the exposure apparatus has been described as being used to manufacture liquid crystal display devices (flat panel displays), but the exposure apparatus may also be used to manufacture semiconductors by exposing silicon wafers.

[0149] The above-described embodiment is a preferred example of the present invention, but the present invention is not limited to this and can be modified in various ways without departing from the spirit of the present invention.

[0150] 10, 10C Exposure apparatus 20, 20A, 20B, 20X, 20Y, 20Z Light source array 23 LED package 80, 80A, 80B, 80C, 80D Illumination optical system 90, 90A, 90B, 90C, 90D, 90E Illumination unit 100 Projection optical unit B1, B2, B3, B4, B5 Boundary CP1, CP2, CP3 Conjugate surface DM2 Second dichroic mirror DM3 Third dichroic mirror DR1 First direction DR2 Second direction MSK Mask OPU Light source unit OPU1 First light source unit OPU2 Second light source unit PL Projection optical system P Glass substrate

Claims

1. An exposure apparatus having a light source, an illumination optical system which illuminates a mask with light from the light source, and a projection optical system which projects a pattern formed on the mask onto a substrate, and which exposes the substrate while moving the mask and the substrate in a scanning direction, wherein the light source includes a plurality of light source elements which are arranged two-dimensionally on a two-dimensional plane which includes a first direction, and when a direction corresponding to the first direction in an image of the light source formed on the surface of the mask via the illumination optical system coincides with the scanning direction, the boundaries between adjacent light source elements among the plurality of light source elements are not continuous in the first direction.

2. The exposure apparatus of claim 1, wherein the plurality of light source elements include a plurality of first light source elements arranged side by side in a second direction, and a plurality of second light source elements arranged side by side in the second direction and spaced apart from the plurality of first light source elements in a third direction perpendicular to the second direction, and the second direction and the third direction intersect with the first direction.

3. The exposure apparatus of claim 2, wherein in the image of the light source formed on the surface of the substrate via the illumination optical system, the mask, and the projection optical system, the angle between the direction corresponding to the third direction and the scanning direction is θ, the arrangement pitch of the images of the multiple light source elements is a, and the width in the scanning direction of the irradiation area formed on the surface of the substrate is b, then sin θ = na / b (n is an integer).

4. The exposure apparatus of claim 1, wherein the plurality of light source elements include a plurality of first light source elements arranged side by side in the second direction, and a plurality of second light source elements arranged side by side in the second direction and spaced apart from the plurality of first light source elements in a third direction perpendicular to the second direction, and the arrangement positions of the plurality of first light source elements in the second direction are different from the arrangement positions of the plurality of second light source elements in the second direction.

5. The exposure apparatus according to claim 4, wherein the second direction and the third direction intersect with the first direction.

6. An exposure apparatus according to any one of claims 1 to 5, wherein the light source is disposed at a position defocused from a plane optically conjugate with the mask plane.

7. An exposure apparatus having a light source, an illumination optical system which illuminates a mask with light from the light source, and a projection optical system which projects a pattern formed on the mask onto a substrate, and which exposes the substrate while moving the mask and the substrate in a scanning direction, wherein the light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane, and when a secondary light source of the light source is formed at a position optically conjugate to an image of the light source formed on the surface of the mask in a direction perpendicular to the surface of the mask, the boundaries between adjacent light source elements in the secondary light source are not continuous in the scanning direction.

8. An exposure apparatus according to any one of claims 1 to 7, wherein the light source is an LED light source.

9. The exposure apparatus according to claim 8, wherein the plurality of light source elements are a plurality of LED elements.

10. An exposure apparatus according to any one of claims 1 to 9, wherein the peak wavelength of the light emitted from the light source is within the range of 360 to 370 nm.

11. An exposure apparatus according to any one of claims 1 to 9, wherein the peak wavelength of the light emitted from the light source is within a range of 380 to 390 nm.

12. An exposure apparatus according to any one of claims 1 to 9, wherein the peak wavelength of the light emitted from the light source is within a range of 400 to 410 nm.

13. An exposure apparatus which illuminates a mask with light from a light source unit, projects a pattern formed on the mask onto a substrate, and exposes the substrate while moving the mask and the substrate in a scanning direction, wherein the light source unit includes: a first light source having a plurality of first light source elements arranged in a two-dimensional plane including a first direction; a second light source having a plurality of second light source elements arranged in a two-dimensional plane including a second direction; a combining optical element which combines light emitted from the first light source and the second light source; and an illumination optical system which forms an image of the first light source and an image of the second light source on the surface of the mask by the combined light emitted from the combining optical element; and when a direction corresponding to the first direction in the image of the first light source coincides with the scanning direction, boundaries between adjacent first light source elements among the plurality of first light source elements are not continuous in the first direction, an exposure apparatus, wherein when a direction in an image of the second light source corresponding to the second direction coincides with the scanning direction, boundaries between adjacent second light source elements among the plurality of second light source elements are not continuous in the second direction.

14. An exposure apparatus according to any one of claims 1 to 13, wherein the substrate has at least one side length or diagonal length of 500 mm or more.

15. An exposure apparatus which exposes a substrate while moving a mask and substrate in a scanning direction, comprising: a light source unit which includes a light source and a magnifying optical system and illuminates the mask; and a projection optical system which projects a pattern formed on the mask onto the substrate, wherein the light source includes a plurality of light source elements arranged two-dimensionally on a two-dimensional plane, and no optical elements are provided in the optical path between the light source unit and the mask.

16. The exposure apparatus according to claim 15, wherein the distance between the light source unit and the surface of the mask on which the pattern is formed is 100 to 500 mm.

17. The exposure apparatus according to claim 15 or 16, wherein the plurality of light source elements are a plurality of LED elements.

18. An exposure apparatus according to any one of claims 15 to 17, wherein boundaries between adjacent light source elements among the plurality of light source elements are not continuous in the scanning direction.

19. An exposure apparatus as described in any one of claims 15 to 18, wherein the plurality of light source elements include a plurality of first light source elements arranged side by side in a first direction, and a plurality of second light source elements arranged side by side in a second direction perpendicular to the first direction and spaced apart from the plurality of first light source elements in a second direction perpendicular to the first direction, and wherein the first direction and the second direction intersect with the scanning direction.

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