Method and computing device for compensating for liquid-transmitted acoustic disturbance excitations of an optical component of a lithography system, said optical component being temperature-controlled using a liquid, compensation system, lithography system, and method for producing a control device

Abstract

The invention relates to a method for compensating for liquid-transmitted acoustic disturbance excitations of an optical component (110) of a lithography system (1), said optical component being temperature-controlled using a liquid, wherein the disturbance excitations of the optical component (110), as a first optical component (110), are compensated for using a second optical component (112) of the lithography system (1), said second optical component not being temperature-controlled using a liquid. The method has the steps of: a) receiving (S1) a first and second actual value (y1, y2) of a position (P1, P2) corresponding to the first and second optical component (110, 112), and b) controlling (S3) the position (P2) of the second component (112) to an adapted target value (r2) of the position (P2) of the second optical component (112), said target value being based on the initial target value (ri) of the position (P2) of the second optical component (112) and the first actual value (y1) of the position (P1) of the first optical component (110).

Description

[0001] Carl Zeiss SMT GmbH 1 Method and computing device for compensating liquid-transmitted acoustic disturbances of a liquid-tempered optical component of a lithography system, compensation system, lithography system and method for producing a control device. The present invention relates to a method and a computing device for compensating liquid-transmitted acoustic disturbances of a liquid-tempered optical component of a lithography system, a compensation system and a lithography system with such a computing device and a method for producing a control device for controlling a position of a liquid-tempered optical component of a lithography system. The content of the priority application DE 10 2023 212251.0 is incorporated by reference in its entirety. included (incorporation by reference).Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system equipped with an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, such as a silicon wafer, in order to transfer the mask structure to the light-sensitive coating of the substrate. Driven by the pursuit of ever smaller structures in the manufacture of integrated circuits, EUV lithography systems are currently being developed that use light with a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm.Since most materials absorb light of this wavelength, such EUV lithography systems must use reflective optics, i.e., mirrors, instead of the previously used refractive optics, i.e., lenses. The demands on the accuracy and precision of the imaging properties of lithography systems are constantly increasing. From a dynamic perspective, it is therefore important to minimize the influence of interference on the movement of various components of the lithography system. For example, very precise positioning of optical components, especially mirrors, and mechanical components, especially sensor frames, of the lithography system is required. Dynamic interference excitations of optical and mechanical components can be generated, for example, by the movement of other components of the lithography system.Furthermore, due to increasing thermal requirements, it is necessary to cool optical and mechanical components of the lithography system, in particular mirrors and sensor frames. Cooling requires a cooling device with cooling lines through which a cooling liquid is transported to the component to be cooled. This leads to a further source of dynamic disturbances in the form of acoustic disturbances. Acoustic disturbances are transmitted, for example, as longitudinal waves through the cooling liquid in the cooling lines to the component to be cooled. Against this background, one object of the present invention is to provide an improved method and an improved computing device for compensating for liquid-transmitted acoustic disturbances of a liquid-tempered optical component of a lithography system.According to a first aspect, a method for compensating for liquid-transmitted acoustic disturbances of a liquid-tempered optical component of a lithography system is proposed. The disturbances of the optical component as a first optical component are compensated for using a non-liquid-tempered second optical component of the lithography system. The method comprises the steps: a) receiving a first and second actual value of a position corresponding to the first and second optical components, and b) controlling the position of the second optical component to an adjusted target value of the position of the second optical component, which is based on an initial target value of the position of the second optical component and the first actual value of the position of the first optical component.Consequently, the position of the second optical component is controlled to a target position, which incorporates the actual position of the first optical component. A position error of the liquid-tempered first optical component is thus forwarded to a control loop of the non-liquid-tempered second optical component. The control loop of the non-liquid-tempered second optical component consequently corrects the position errors of both the first and the second optical component. The proposed control architecture Carl Zeiss SMT GmbH 3 thus makes it possible to at least partially compensate for a position error of the liquid-tempered first optical component due to liquid-transmitted acoustic disturbances by controlling the position of the second optical component.In particular, a position error of the first optical component can lead to an imaging error of the first optical component. This imaging error is compensated for by the proposed position control of the second optical component, which changes the imaging properties of the second optical component. The adjusted target value of the position of the second optical component is, for example, a sum of the initial target value of the position of the second optical component and the first actual value of the position of the first optical component. The initial target value of the position of the second optical component is, in particular, a target value for the position of the second optical component, which corresponds to the desired value for the position of the second optical component in a case in which a position error of the first optical component is not corrected or the position error of the first optical component is zero.Acoustic disturbances are transmitted via fluid sound waves (i.e., pressure waves or pressure fluctuations, e.g., longitudinal waves) of the fluid in the fluid lines to fluid-temperature-controlled components, such as the first optical component. For example, the first optical component is mechanically connected to one or more fluid lines to transport the fluid to and from the first optical component. This results in a force transfer to the first optical component at the surfaces of the first optical component where the pressure fluctuations impinge. Acoustic disturbances can be caused by flow-induced vibrations (FIV) of the fluid. Flow-induced vibrations are generated, for example, by pumps, valves, line deflections, and changes in line cross-section (so-called "FIV sources").Acoustic disturbances can also be transmitted to the liquid by transferring mechanical vibrations from other components via support elements of the liquid lines. Carl Zeiss SMT GmbH 4 If pressure fluctuations occur in a liquid line used to temperature-control (e.g., cool) an optical component, the position of the optical component can be undesirably changed by the acoustic disturbances. This leads to an aberration of the optical component and thus of the lithography system. Position control of the liquid-temperature-controlled first optical component can – especially with conventional controller architecture – lead to superposition of the resonances of the disturbance and the transfer function of the controller used. Since the second optical component is not liquid-temperature-controlled, the second optical component is not subject to liquid-transmitted acoustic disturbances.Thus, the actuators of the second optical component can advantageously be used to compensate for position changes of the first optical component indirectly (namely, via the position change of the second optical component). The lithography system is, for example, an EUV or DUV lithography system. EUV stands for "extreme ultraviolet" (EUV) and refers to a wavelength of the working light in the range of 0.1 nm to 30 nm, in particular 13.5 nm. Furthermore, DUV stands for "deep ultraviolet" (DUV) and refers to a wavelength of the working light between 30 nm and 250 nm. The EUV or DUV lithography system comprises an illumination system and a projection system.In particular, with the EUV or DUV lithography system, the image of a mask (reticle) illuminated by the illumination system is projected by means of the projection system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, for example a wafer and / or silicon wafer, in order to transfer the mask structure to the light-sensitive coating of the substrate. The lithography system has, for example, a temperature control device (e.g., cooling device) which comprises one or more liquid lines for transporting a temperature control liquid (e.g., cooling liquid, such as water) to the first optical component. The first and / or second optical component is, for example, a mirror of the lithography system. The first and / or second optical component is, for example, an optical component of a projection system of the lithography system.The Carl Zeiss SMT GmbH 5 first and / or second optical component is, in particular, a component that must be held in a precise position with only small tolerances during operation of the lithography system. A cooling device of the lithography system is configured, for example, to cool the first optical component of the lithography system. The second optical component, on the other hand, is an untemperatured, e.g., uncooled, optical component. The cooling device can, for example, also be configured to cool other optical and / or mechanical components of the lithography system—with the exception of the second optical component. The cooling device serves, in particular, to avoid high temperatures and temperature fluctuations of the first optical component (and, if applicable, other components to be cooled).In particular, mirrors of an EUV lithography system (as an example of a first optical component) heat up due to the absorption of high-energy EUV radiation. The resulting high temperatures and temperature fluctuations in the mirror and the associated thermal deformation of the mirror can lead to wavefront aberrations and thus impair the imaging properties of the mirrors. To avoid thermally induced deformations, optical components of the lithography system are actively cooled. The temperature control device (e.g., cooling device) has, for example, a temperature control unit (e.g., cooling unit) for controlling the temperature (e.g., cooling) of the liquid. The temperature control device has one or more liquid lines for transporting the liquid. The liquid line(s) is / are made of metal, such as stainless steel.The temperature control device also comprises one or more pumps for generating a required flow rate of the liquid in the line and one or more valves for controlling the flow through the line. The temperature control device can be a cooling device for cooling the first optical component or a heating device for heating the first optical component. According to one embodiment of the first aspect, the method comprises a step of regulating the position of the first optical component to a first target value of the position of the first optical component based on the first actual value. Carl Zeiss SMT GmbH 6In this embodiment, in addition to regulating the position of the second optical component, the position of the first optical component is also regulated.Since the first optical component is liquid-temperature-controlled and thus subject to acoustic disturbances, a control error when controlling the position of the first optical component can be relatively large. The (e.g. remaining) control error when controlling the position of the first optical component is then at least partially compensated for by the adjusted target value when controlling the position of the second optical component. According to a further embodiment of the first aspect, controlling the position of the first optical component comprises: determining a first manipulated variable based on a first deviation of the first actual value from the first target value, and controlling a first actuator device for positioning the first optical component based on the first manipulated variable. The position of the first optical component is thus controlled by means of feedback control.In particular, the first actual position is fed back for determining the first deviation. The first actuator device is configured, for example, to adjust the position of the first optical component with respect to six degrees of freedom of the first optical component. The six degrees of freedom include, in particular, three translational degrees of freedom (in three spatial directions spanning a three-dimensional space) and three rotational degrees of freedom (with respect to a rotation around the three spatial directions). According to a further embodiment of the first aspect, controlling the position of the second optical component comprises: determining a second manipulated variable based on a second deviation of the second actual value from the adjusted target value, and controlling a second actuator device for positioning the second optical component based on the second manipulated variable.The position of the second optical component is thus controlled by means of feedback control. In particular, the second actual position is fed back for determining the second deviation. Carl Zeiss SMT GmbH 7The second actuator device is configured, for example, to adjust the position of the second optical component with respect to six degrees of freedom of the second optical component. The six degrees of freedom include, in particular, three translational degrees of freedom (in three spatial directions, which span a three-dimensional space) and three rotational degrees of freedom (with respect to a rotation around the three spatial directions). The following relationships apply, for example, to controlling the position of the first and / or the second optical component. The first or second manipulated variable is determined based on an actual-setpoint deviation of the position of the corresponding optical component.This enables position control based on feedback of the measured current value (i.e., the first or second actual value) of the position of the corresponding optical component. The first or second actual value of the position of the corresponding optical component is, for example, measured and fed back to an input of a corresponding position controller device. The first setpoint value of the position of the first optical component and / or the initial setpoint value of the position of the second optical component is, for example, a static value, so that the position of the corresponding optical component is controlled to a rest position corresponding to the static value.However, the initial setpoint value of the position of the corresponding optical component can also change over time, so that the goal of the corresponding control is for the position of the corresponding optical component to follow a predetermined time-dependent path (trajectory). The first or second deviation (i.e. the corresponding control deviation) is determined in particular by negatively adding (subtracting) the first or second actual value to the first or adjusted setpoint value. The first and / or second manipulated variable is determined in particular such that the current position of the corresponding optical component (controlled variable) is adapted to the first or adjusted setpoint value (reference variable). The first or second manipulated variable is in particular a measure of a position change to be applied to the corresponding optical component by means of the first or second actuator device.According to a further embodiment of the first aspect, the position of the first optical component is controlled in a first pre-determined control frequency range, which differs from a pre-determined interference frequency range of the acoustic disturbances of the first optical component. As a result, the control frequency range for controlling the position of the first optical component can be preset in a frequency range in which acoustic disturbances are low and / or non-existent. Consequently, resonance transmissions of disturbances and the transfer function of the controller can be avoided or reduced. The fact that the first pre-determined control frequency range is different from the pre-determined interference frequency range means, for example, that the first pre-determined control frequency range and the pre-determined interference frequency range do not overlap, are disjoint, and / or (e.g., directly) adjoin one another.For example, an upper limit frequency of the first pre-determined control frequency range is less than or equal to a lower limit frequency of the pre-determined interference frequency range. For example, a lower limit frequency of the first pre-determined control frequency range is greater than or equal to an upper limit frequency of the pre-determined interference frequency range. For example, the pre-determined interference frequency range is 1 to 60 Hz, 60 to 150 Hz, and / or 80 to 200 Hz. For example, the first pre-determined control frequency range is 60 to 120 Hz and the pre-determined interference frequency range is 1 to 60 Hz. For example, the first pre-determined control frequency range is 40 to 80 Hz and the pre-determined interference frequency range is 80 to 200 Hz. For example, the first pre-determined The control frequency range is 1 to 40 Hz or 1 to 60 Hz and the pre-determined interference frequency range is 60 to 150 Hz. A main source of mechanical vibrations in the lithography system is, for example,A mask holder (reticle stage) and a substrate holder (wafer stage) of the lithography system. The mask holder is used to support and move a mask to be imaged. Furthermore, the substrate holder is used to support and move a substrate on which an image of the mask is imaged. Mechanical vibrations of the lithography system can be transmitted via support elements to fluid lines for tempering (e.g., cooling) the first optical component. Carl Zeiss SMT GmbH 9 Vibrations in the form of acoustic vibrations are transmitted to the first optical component via the fluid in the fluid lines. The interference excitations from the mask holder (reticle stage) and the substrate holder (wafer stage), for example, have high amplitudes at frequencies in the range of 60 to 150 Hz. In this case, the pre-determined interference frequency range is, for example, 60 to 150 Hz.Furthermore, in this case, the control frequency range for controlling the position of the first optical component is preset in a frequency range that lies at frequencies lower than 60 to 150 Hz. For example, the control frequency range for controlling the position of the first optical component is preset to a range of less than or equal to 40 Hz (e.g., 1 Hz to 40 Hz). The first control frequency range and / or the interference frequency range is / are determined, for example, before the first commissioning of the lithography system and / or before the production of a control device for controlling the position of the first optical component. The pre-determined interference frequency range is determined, for example, using acceleration sensors in three (e.g., mutually perpendicular) spatial directions. The acceleration sensors are, for example, on the first optical component and / or a frame (e.g.,Carrier) of the first optical component in order to detect the interference excitation at the location of the first optical component. According to a further embodiment of the first aspect, the first pre-determined control frequency range is a frequency range in which the first deviation is less than 10%, less than 5%, less than 3%, less than 1%, less than 0.1% and / or less than 0.01% of the first target value. According to a further embodiment of the first aspect, the position of the first optical component is controlled in a pre-determined first control frequency range, the position of the second optical component is controlled in a pre-determined second control frequency range, and the first and second control frequency ranges are different from one another.This allows the two control devices to be designed to adapt to positional disturbances that occur for a liquid-temperature-controlled optical component and a non-liquid-temperature-controlled optical component, respectively. Carl Zeiss SMT GmbH 10 The fact that the first and second control frequency ranges differ from one another means, for example, that the first and second control frequency ranges have different widths and / or that the first control frequency range is smaller than the second control frequency range. For example, the first and second control frequency ranges overlap (e.g., partially) and / or the first control frequency range is a subrange of the second control frequency range. The second pre-determined control frequency range is, for example, a frequency range in which the second deviation is less than 10%, less than 5%, less than 3%, less than 1%, less than 0.1% and / or less than 0.01% of the second setpoint.According to a further embodiment of the first aspect: the position of the first optical component and / or the second optical component is controlled using a controller device that has at least one proportional controller element, at least one integral controller element, and at least one derivative controller element, and / or the pre-determined first control frequency range for controlling the position of the first optical component is preset by increasing the number of integral controller elements of the controller device. For example, the position of the first optical component is controlled using a first controller device. Furthermore, the position of the second optical component is controlled, for example, using a second controller device. The respective controller device has, for example, a controller unit (e.g., a software unit) and a controller component (e.g., a hardware component).In addition, the respective controller component comprises, for example, at least one proportional controller element, at least one integral controller element, and at least one derivative controller element. The first and / or second controller device comprises, for example, a PID controller (i.e., a controller with exactly one proportional controller element, exactly one integral controller element, and exactly one derivative controller element). Alternatively, in the first controller device, the number of integral controller elements of the controller device can be increased compared to the number of proportional controller elements and derivative controller elements. The first Carl Zeiss SMT GmbH 11 controller device comprises, for example, a PI3D controller (i.e., with exactly one proportional controller element, three integral controller elements, and exactly one derivative controller element).By increasing the number of integral control elements of the first control device for controlling the position of the first optical component, the first control frequency range can be shifted to lower frequencies. This allows the first control frequency range for controlling the position of the liquid-temperature-controlled first optical component to be shifted to a frequency range in which interference excitations are low and / or non-existent. This allows resonance transmissions to be avoided even more effectively.According to a further embodiment of the first aspect: the first and second optical components are arranged consecutively with respect to a beam path of the lithography system, the first and second optical components are both arranged in an imaging beam path of the lithography system, the first and second optical components are both components of a projection system of the lithography system, and / or the first and second optical components are both configured to image a mask on a substrate arranged in an image plane of the lithography system and / or the projection system of the lithography system. The first and second optical components are thus arranged such that they are part of the same optical system in which a beam path is forwarded between a plurality of optical elements. Consequently, beams that have already passed through the first optical component (e.g.were reflected at it), or vice versa. The fact that the first and second optical components are arranged one after the other with respect to a beam path of the lithography system includes, for example, the case that they are arranged directly one after the other. In an arrangement that follows one after the other, no further optical elements (e.g., mirrors) are arranged between the first and second optical components with respect to the beam path. The fact that the first and second optical components are arranged one after the other with respect to a beam path of the lithography system can, however, also include, for example, the case that further optical elements (e.g., mirrors) are arranged between the first and second optical components with respect to the beam path.According to a further embodiment of the first aspect, the method comprises a step of regulating the pressure of a liquid in a liquid line configured to control the temperature of the liquid in the first optical component. An actual pressure value of the liquid pressure is received, a further manipulated variable is determined based on a pressure deviation of the actual pressure value from a desired pressure value, and a further actuator device of a pressure-changing device is controlled based on the determined further manipulated variable to change the pressure of the liquid in the liquid line. This allows pressure fluctuations in the liquid to be actively suppressed. In particular, a pressure fluctuation in the liquid can be compensated before it is passed on to the first optical component to be temperature-controlled (e.g., to be cooled).This allows a change in the position of the first optical component caused by pressure fluctuations in the fluid to be reduced or avoided. The setpoint pressure is, for example, zero. However, the setpoint pressure can also have another preset value other than zero. The pressure of the fluid in the fluid line is controlled in particular in such a way that the pressure deviation of the actual pressure value from the setpoint pressure value is kept as small as possible. For example, the pressure-changing device has an expansion chamber fluidically connected to a fluid line for receiving the fluid. The expansion chamber also comprises means for changing a volume of the expansion chamber. Thus, a pressure of the fluid can be changed by changing the volume of the expansion chamber.According to a further embodiment of the first aspect, the position of the first optical component is controlled in a pre-determined first control frequency range, the pressure of the liquid in the liquid line is controlled in a pre-determined further control frequency range, and the first and the further control frequency ranges are different from one another. Carl Zeiss SMT GmbH 13 Thus, the pressure control is carried out in such a way that pressure fluctuations are compensated for at frequencies at which the control of the position of the first optical component does not function well (i.e., control errors are large). For example, the further pre-determined control frequency range is a frequency range in which the pressure deviation is less than 10%, less than 5%, less than 3%, less than 1%, less than 0.1%, and / or less than 0.01% of the pressure setpoint.According to a second aspect, a computing device for compensating for liquid-transmitted acoustic disturbances of a liquid-temperature-controlled optical component of a lithography system is proposed. The disturbances of the optical component as a first optical component are compensated using a non-liquid-temperature-controlled second optical component of the lithography system. The computing device comprises: a receiving unit for receiving a first and second actual value of a position corresponding to the first and second optical components, and a control unit for controlling the position of the second optical component to an adjusted target value of the position of the second optical component, which is based on an initial target value of the position of the second optical component and the first actual value of the position of the first optical component.In embodiments, the controller unit for controlling the position of the second optical component is a second controller unit. Furthermore, the computing device has a first controller unit for controlling a position of the first optical component. In embodiments, the computing device comprises a first and / or second control device for controlling a first or second actuator device based on the first or second determined manipulated variable, respectively. According to a third aspect, a compensation system for compensating for liquid-transmitted acoustic disturbances of a liquid-temperature-controlled optical component of a lithography system is proposed. The disturbances of the optical component as a first optical component are compensated using a non-liquid-temperature-controlled second optical component of the lithography system.The compensation system comprises: the liquid-tempered first optical component, the non-liquid-tempered second optical component, Carl Zeiss SMT GmbH 14 an actuator device for adjusting a position of the second optical component, and a computing device as described above for determining a manipulated variable based on a deviation of the second actual value from the adjusted target value, and for controlling the actuator device to position the second optical component based on the manipulated variable. The manipulated variable according to the third aspect corresponds in particular to the second manipulated variable described above. Furthermore, the deviation according to the third aspect corresponds in particular to the second deviation described above. Furthermore, the actuator device according to the third aspect corresponds in particular to the second actuator device described above.According to a fourth aspect, a lithography system, in particular an EUV lithography system, is proposed. The lithography system has a computing device as described above or a compensation system as described above. According to a fifth aspect, a method for producing a control device for controlling a position of a liquid-temperature-controlled optical component of a lithography system is proposed. The method comprises the steps of: determining an interference frequency range of acoustic interference excitations of the optical component, and setting up a control component of the control device such that the position of the optical component is controlled in a pre-determined control frequency range that is different from the pre-determined interference frequency range.The method serves in particular for producing the above-described first controller device for controlling the position of the above-described liquid-temperature-controlled first optical component of the lithography system. The pre-determined control frequency range corresponds, for example, to the above-described first pre-determined control frequency range. Setting up the controller component of the controller device is, for example, setting up a controller hardware component of the controller device. The respective computing device, receiving unit, controller unit, and control device described above or below, and other units, devices, and apparatuses described herein, can be implemented in hardware and / or software. In a hardware implementation, the respective unit can be designed, for example, as a computer or as a microprocessor.In a software implementation, the respective unit can be embodied as a computer program product, as a function, as a routine, as an algorithm, as part of a program code, or as an executable object. Furthermore, the corresponding unit can also be embodied as part of a higher-level control system of the lithography system. "One" is not necessarily to be understood as being limited to exactly one element. Rather, multiple elements, such as two, three, or more, can also be provided. Any other counting term used here should not be understood as implying a limitation to the exact number of elements stated. Rather, numerical deviations upwards and downwards are possible, unless otherwise stated. The embodiments and features described for the method according to the first aspect apply accordingly to the second to fifth aspects, and vice versa.Further possible implementations of the invention also include combinations of features or embodiments described above or below with regard to the exemplary embodiments, which are not explicitly mentioned. In this case, a person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention. Further advantageous refinements and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention is explained in more detail below using preferred embodiments with reference to the accompanying figures. Fig. 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography; Fig. 2 shows a projection system and a compensation system of the projection exposure system from Fig.1 according to a respective embodiment, wherein the compensation system is configured to compensate for liquid-borne acoustic interference excitations of a liquid-tempered optical component of the projection system; Carl Zeiss SMT GmbH 16 Fig. 3 shows a first controller device of the compensation system from Fig. 2 according to an embodiment; Fig. 4 shows a second controller device of the compensation system from Fig. 2 according to an embodiment; Fig. 5 shows a flow diagram of a method for compensating for liquid-borne acoustic interference excitations of a liquid-tempered optical component of the projection system from Fig. 2 according to an embodiment; Fig. 6 shows a block diagram of a first and second control loop of the compensation system from Fig. 2 according to an embodiment; Fig. 7 shows a second control loop of the compensation system from Fig. 2 according to a further embodiment;8 illustrates a frequency range of an acoustic disturbance excitation and several controller frequency ranges of the compensation system from Fig. 2 according to one embodiment; Fig. 9 shows a controller component of the first or second controller device from Fig. 3 or 4 according to one embodiment; Fig. 10 shows a controller component of the first controller device from Fig. 3 according to another embodiment; Fig. 11 shows a third control loop of the compensation system from Fig. 2 according to one embodiment; and Fig. 12 shows a flow diagram of a method for manufacturing a controller device of the compensation system from Fig. 2 for controlling a position of a liquid-tempered optical component of the projection system from Fig. 2. In the figures, identical or functionally equivalent elements have been provided with the same reference numerals unless otherwise stated.Furthermore, Carl Zeiss SMT GmbH 17 should be noted that the representations in the figures are not necessarily to scale. Fig. 1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of an illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, illumination optics 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the illumination system 2. In this case, the illumination system 2 does not include the light source 3. A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be displaced via a reticle displacement drive 9, in particular in a scanning direction. In the fig.For the purpose of explanation, Figure 1 shows a Cartesian coordinate system with an x-direction x, a y-direction y and a z-direction z. The x-direction x runs perpendicular into the drawing plane. The y-direction y runs horizontally and the z-direction z runs vertically. The scanning direction in Figure 1 runs along the y-direction y. The z-direction z runs perpendicular to the object plane 6. The projection exposure system 1 comprises projection optics 10. The projection optics 10 serve to image the object field 5 into an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible. A structure on the reticle 7 is imaged onto a light-sensitive layer of a wafer 13 arranged in the region of the image field 11 in the image plane 12. The wafer 13 is held by a wafer holder 14.The wafer holder 14 can be displaced, in particular along the y-direction y, via a wafer displacement drive 15. The displacement of the reticle 7, on the one hand, via the reticle displacement drive 9, and the displacement of the wafer 13, on the other hand, via the wafer displacement drive 15, can be synchronized with each other. The light source 3 is an EUV radiation source. The light source 3 emits, in particular, EUV radiation 16, which is also referred to below as Carl Zeiss SMT GmbH 18 useful radiation, illumination radiation, or illumination light. The useful radiation 16 has, in particular, a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source.The light source 3 can be a free-electron laser (FEL). The illumination radiation 16 emanating from the light source 3 is bundled by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and / or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 17 can be exposed to the illumination radiation 16 at grazing incidence (GI), i.e., at angles of incidence greater than 45°, or at normal incidence (NI), i.e., at angles of incidence less than 45°. The collector 17 can be structured and / or coated, on the one hand, to optimize its reflectivity for the useful radiation and, on the other hand, to suppress stray light. After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18.The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4. The illumination optics 4 comprise a deflecting mirror 19 and, downstream of this in the beam path, a first facet mirror 20. The deflecting mirror 19 can be a flat deflecting mirror or, alternatively, a mirror with a beam-influencing effect beyond the pure deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful light wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first facet mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field facet mirror.The first facet mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Only a few of these first facets 21 are shown in Fig. 1 as examples. Carl Zeiss SMT GmbH 19 The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or partially circular edge contour. The first facets 21 can be designed as flat facets or alternatively as convexly or concavely curved facets. As is known, for example, from DE 102008009600 A1, the first facets 21 themselves can each also be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, please refer to DE 102008009600 A1.Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e., along the y-direction y. In the beam path of the illumination optics 4, a second facet mirror 22 is arranged downstream of the first facet mirror 20. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil facet mirror. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1614008 B1, and US 6,573,978. The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.The second facets 23 can also be macroscopic facets, which can, for example, be round, rectangular, or hexagonal in shape, or alternatively, facets composed of micromirrors. In this regard, reference is also made to DE 102008009600 A1. The second facets 23 can have flat or, alternatively, convex or concavely curved reflection surfaces. The illumination optics 4 thus forms a double-faceted system. This basic principle is also referred to as a fly's eye integrator. Carl Zeiss SMT GmbH 20 It can be advantageous not to arrange the second facet mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second facet mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as described, for example, in DE 102017220586 A1.With the help of the second facet mirror 22, the individual first facets 21 are imaged into the object field 5. The second facet mirror 22 is the last bundle-forming or actually the last mirror for the illumination radiation 16 in the beam path in front of the object field 5. In a further embodiment of the illumination optics 4 (not shown), a transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5, which transmission optics contributes in particular to the imaging of the first facets 21 into the object field 5. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (GI mirrors, grazing incidence mirrors).In the embodiment shown in Fig. 1, the illumination optics 4 has exactly three mirrors after the collector 17, namely the deflecting mirror 19, the first facet mirror 20, and the second facet mirror 22. In a further embodiment of the illumination optics 4, the deflecting mirror 19 can also be omitted, so that the illumination optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22. The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optics into the object plane 6 is generally only an approximate imaging. The projection optics 10 comprises a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1. Carl Zeiss SMT GmbH 21 In the example shown in Fig.1, the projection optics 10 comprises six mirrors M1 to M6.Alternatives with four, eight, ten, twelve, or a different number of mirrors Mi are also possible. The projection optics 10 are doubly obscured optics. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optics 10 has a numerical aperture on the image side that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75. Reflection surfaces of the mirrors Mi can be designed as freeform surfaces without a rotational symmetry axis. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one rotational symmetry axis of the reflection surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16.These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon. The projection optics 10 have a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12. The projection optics 10 can, in particular, be anamorphic. In particular, it has different image scales βx, βy in the x- and y-directions x, y. The two magnifications βx, βy of the projection optics 10 are preferably (βx, βy) = (+ / - 0.25, + / - 0.125). A positive magnification β means an image without image inversion. A negative sign for the magnification β means an image with image inversion.The projection optics 10 thus results in a reduction in the ratio 4:1 in the x-direction x, i.e., in the direction perpendicular to the scanning direction. The projection optics 10 results in a reduction of 8:1 in the y-direction y, i.e., in the scanning direction. Carl Zeiss SMT GmbH 22 Other image scales are also possible. Image scales with the same sign and absolutely identical in the x- and y-directions x, y, for example, with absolute values ​​of 0.125 or 0.25, are also possible. The number of intermediate image planes in the x- and y-directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can be different. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from US 2018 / 0074303 A1.Each of the second facets 23 is assigned to exactly one of the first facets 21 to form a respective illumination channel for illuminating the object field 5. This can result in particular in illumination according to the Köhler principle. The far field is broken down into a plurality of object fields 5 with the aid of the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 respectively assigned to them. The first facets 21 are each imaged onto the reticle 7 by an assigned second facet 23, superimposed on one another, to illuminate the object field 5. The illumination of the object field 5 is in particular as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.By arranging the second facets 23, the illumination of the entrance pupil of the projection optics 10 can be geometrically defined. By selecting the illumination channels, in particular the subset of the second facets 23 that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil filling. A likewise preferred pupil uniformity in the region of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels. Further aspects and details of the illumination of the object field 5 and in particular of the entrance pupil of the projection optics 10 are described below. Carl Zeiss SMT GmbH 23 The projection optics 10 can in particular have a homocentric entrance pupil. This can be accessible.It may also be inaccessible. The entrance pupil of the projection optics 10 cannot usually be precisely illuminated with the second facet mirror 22. When the projection optics 10 telecentrically images the center of the second facet mirror 22 onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found in which the pairwise determined distance of the aperture rays is minimal. This surface represents the entrance pupil or a surface conjugated to it in spatial space. In particular, this surface exhibits a finite curvature. The projection optics 10 may have different positions of the entrance pupil for the tangential and for the sagittal beam path. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7.With the help of this optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account. In the arrangement of the components of the illumination optics 4 shown in Fig. 1, the second facet mirror 22 is arranged in a surface conjugated to the entrance pupil of the projection optics 10. The first facet mirror 20 is arranged tilted to the object plane 6. The first facet mirror 20 is arranged tilted to an arrangement plane defined by the deflection mirror 19. The first facet mirror 20 is arranged tilted to an arrangement plane defined by the second facet mirror 22. Fig. 2 shows an example of a projection system 100 with a projection optics 102 of the lithography system 1 from Fig. 1 according to one embodiment. In Fig.2, several exemplary frame structures (support structures) 104, 106, 108 of the projection system 100 are schematically illustrated.Also shown in Fig. 1 are a first optical component 110 and a second optical component 112 of the projection system 100. The first and second optical components 110, 112 are each, for example, mirrors. For example, the mirrors 110, 112 are two of the mirrors M1 to M6 from Fig. 1. In the following, the first and second optical components 110, 112 are described as first and second mirrors 110, 112, without being limited thereto. Although not shown in Fig. 2, the projection system 100 may also have further mirrors and / or optical components in addition to the first and second mirrors 110, 112. The frame structure 108 is, for example, a sensor frame of the projection system 100. On the sensor frame 108, for example, a sensor device 114 is arranged, with which a current position P1, P2 (actual values ​​y1(t) and y2(t) corresponding to the position P1, P2, see Fig.6) of the first and second mirrors 110, 112 relative to the sensor frame 108 can be measured. The sensor device 114 is only schematically indicated in Fig. 2. The sensor device 114 has one or more sensors attached to the sensor frame 108, such as interferometers. For example, a current position y1(t) of the first mirror 110 and a current position y2(t) of the second mirror 112 are detected using laser beams 116. For example, the current positions y1(t), y2(t) of the first and second mirrors 110, 112 are detected with respect to six degrees of freedom. The six degrees of freedom include, in particular, three translational degrees of freedom in the x, y, and z directions in Fig. 2 and three rotational degrees of freedom about the x, y, and z directions. Reference numeral 106 in Fig. 2, for example, denotes a force frame for the mirrors 110, 112.The mirrors 110, 112 are each movably mounted on the support frame 106, in particular, by means of an actuator device 118, 120. Each of the first and second actuator devices 118, 120 has one or more actuators 122 for positioning the corresponding first and second mirrors 110, 112. For example, the mirrors 110, 112 can each be displaced in the six degrees of freedom by means of the actuators 122. The mirrors 110, 112 are also mounted on the support frame 106, for example, in a vibration-decoupled manner. Furthermore, the sensor frame 108 is also mounted in a vibration-decoupled manner, for example, with respect to the support frame 106. Furthermore, the support frame 106 is mounted in a vibration-decoupled manner, for example with respect to a frame structure 104 and / or a floor. Fig. 2 also shows a temperature control device 200 for controlling the temperature of the first mirror 110.In the following, the temperature control device 200 is described by way of example as a cooling device 200, whereby the temperature control device 200 can also be used to heat the mirror 110 in other embodiments. The first mirror 110 is liquid-tempered (e.g., liquid-cooled) using the temperature control device 200. However, the second mirror 112 is not liquid-tempered (e.g., liquid-cooled). This circumstance is used below for advantageous compensation of liquid-transmitted acoustic disturbances of the liquid-tempered first mirror 110. Although not shown in Fig. 2, the temperature control device 200 can also be used to temperature control other components of the projection system 100—with the exception of the second mirror 112—in addition to the first mirror 110.For example, the temperature control device 200 can also be configured to control the temperature of the sensor frame 108 or other mirrors not shown. The cooling device 200 (as an example of a temperature control device 200) comprises a cooling unit 202 for cooling a cooling liquid 204. The cooling device 200 also comprises one or more liquid lines 206 for transporting the cooling liquid 204 from the cooling unit 202 to the component 110 to be cooled and back to the cooling unit 202. The cooling device 200 also comprises one or more pumps (not shown) for generating a required flow rate of the cooling liquid 204. The cooling device 200 further comprises one or more valves (not shown) for controlling the cooling flow. In Fig. 2, a compensation system 300 for compensating liquid-transmitted acoustic disturbances of the liquid-tempered first mirror 110 is also shown.The disturbances of the first mirror 110 are compensated using the non-liquid-cooled second mirror 112. The compensation system 300 can be part of the projection system 100. The compensation system 300 comprises the liquid-cooled first mirror 110 and the non-liquid-cooled second mirror 112. The compensation system 300 also includes the second actuator device 120 for adjusting the position P2 of the second mirror 112. The compensation system 300 can optionally also have a first actuator device 118 for adjusting the position P1 of the first mirror 110. The compensation system 300 also includes a computing device 302. The computing device 302 is connected to the sensor device 114 and the second actuator device 120 for (wireless or wired) data transmission 304. Optionally, the computing device 302 can also be connected, for example, to the first actuator device 118 for data transmission 304.Carl Zeiss SMT GmbH 26The computing device 302 has a receiving unit 306 for receiving the first actual value y1(t) of the position P1 of the first mirror 110 and the second actual value y2(t) of the position P2 of the second mirror. The computing device 302 optionally has a controller unit 308 (first controller unit 308) for controlling the position P1 of the first mirror 110. The computing device 302 also has a second controller unit 310 for controlling the position P2 of the second mirror 112. The compensation system 300 can, as illustrated in Figs. 3 and 4, have a first controller device 312 for controlling the position P1 of the first mirror 110 and / or a second controller device 314 for controlling the position P2 of the second mirror 110. The first controller device 312 comprises the controller unit 308, which is implemented, for example, as a software component. Furthermore, the first controller device 312 comprises a controller component 316, which, for example,is implemented as a hardware component. Similarly, the second controller device 314 comprises the controller unit 310, which is implemented, for example, as a software component, and a controller component 318, which is implemented, for example, as a hardware component. In the following, a method for compensating liquid-transmitted acoustic interference excitations of a liquid-tempered optical component (e.g., the first mirror 110) of a lithography system 1 is described with reference to Fig. 5. In this case, the interference excitations of the first optical component 110, e.g., the first mirror 110, are compensated for using a non-liquid-tempered second optical component 112, e.g., B. of the second mirror 112, of the lithography system 1. In a first step S1 of the method, a first actual value y1(t) of the position P1 of the first mirror 110 is received. Furthermore, a second actual value y2(t) of the position P2 of the second mirror 112 is received.The actual values ​​y1(t), y2(t) are detected, for example, by the sensor device 114 and transmitted via data transmission 304 to the receiving unit 306 of the computing device 302. In an optional second step S2 of the method, a position P1 of the first mirror 110 is controlled to a first target value r1(t) for the position P1 of the first mirror 110. Fig. 6 shows a block diagram illustrating a control of the position P1 of the first mirror 110 (control loop R1). The control of the position P1 of the first mirror 110 is based on feedback control. The feedback control is implemented by the controller device 312 and a controlled system 320. The controlled system 320 comprises an actuator 322 for manipulating the position P1 of the first mirror 110. The actuator 322 is implemented in particular by the first actuator device 118 (Fig. 2).The controlled system 320 also includes a sensor system 324 for measuring the current position y1(t) of the first mirror 110. The sensor system 324 is implemented in particular by the sensor device 114 (Fig. 2). Furthermore, the controlled system 320 includes the first mirror 110. The controller device 312, together with the controlled system 320, forms the feedback control in the control loop R1 and ensures that a first deviation e1(t) of the first actual position y1(t) from a first target position r1(t) of the first mirror 110 is kept at the smallest possible value, ideally zero. The target position r1(t) can be a static value (r1(t) = const.) or can also be a function that depends on time t (r1(t) ≠ const.). In particular, the target position r1(t) of the first mirror 110 can also follow any (steady or discontinuous) trajectory in (e.g., three-dimensional) space.The received first actual value y1(t) is transmitted from the receiving unit 306 to the first controller 312, in particular the first controller unit 308, i.e., fed back or recirculated. For example, the first actual value y1(t) is fed back to the controller 312 in a negative form (minus sign in Fig. 6). In step S2, the first deviation e1(t) of the first actual value y1(t) from the first setpoint value r1(t) is also determined. The first deviation e1(t) is determined, for example, by the controller 312 or by an upstream summation unit 326. For example, the first actual value y1(t) is subtracted from the first setpoint value r1(t). To determine the first deviation e1(t), the first setpoint value r1(t) is stored, in particular saved, in the first controller device 312 or in the upstream summation unit 326. Furthermore, in step S2, a first manipulated variable u1(t) is determined based on the first deviation e1(t).The first actuator device 118 is then controlled to position the first mirror 110 based on the determined first manipulated variable u2(t). Carl Zeiss SMT GmbH 28 Since the first mirror 110 is liquid-temperature-controlled and thus subject to acoustic disturbances, a control error e1(t) when controlling the position P1 of the first mirror 110 can be relatively large. The control error when controlling the position P1 of the first mirror 110 can advantageously be at least partially compensated for when controlling the position P2 of the second mirror 112 in step S3. In a third step S3 of the method, the position P2 of the second mirror 112 is controlled. The block diagram in Fig. 6 illustrates in the lower area a control loop R2 for controlling the position P2 of the second mirror 112 in a feedback control.When controlling the position P2 of the second mirror 112, a second actual value y2(t) is also fed back to the second controller 314 or a second summation unit 328, similar to the control of the position P1 of the first mirror 110. First, a second deviation e2(t) of the second actual value y2(t) from a setpoint r2(t) is determined, and a second manipulated variable u2(t) is calculated based on the determined second deviation e2(t). The second actuator 120 is then controlled to position the second mirror 112 based on the second manipulated variable u2(t). Similar to the first control loop R1, the feedback control of the second control loop R2 is implemented by the second controller 314 and a second controlled system 332. The control system 332 comprises an actuator 334 for manipulating the position P2 of the second mirror 112, which is realized in particular by the second actuator device 120 (Fig. 2).The second control system 332 also includes a sensor system 336 for measuring the current position y2(t) of the second mirror 112. The sensor system 336 is implemented in particular by the sensor device 114 (Fig. 2). Furthermore, the control system 332 includes the second mirror 112. The special feature of the control of the position P2 of the second mirror 112 (control loop R2) is that an adjusted setpoint r2(t) is used to determine the second deviation e2(t), which is based on an initial setpoint ri(t) of the position (P2) of the second mirror 112 and the first actual value y1(t) of the position P1 of the first mirror 112. In other words, the position P2 of the second mirror 112 is controlled to a target position r2(t), which includes the actual position y1(t) of the first mirror 110. Carl Zeiss SMT GmbH 29 In particular, in the embodiment of Fig.6, the first actual value y1(t) of the position P1 of the first mirror 112 in the first control loop R1 is fed back to the first controller 312 or the summation unit 326. In addition, the first actual value y1(t) of the position P1 of the first mirror 112 is transferred to the second control loop R2. For example, the first actual value y1(t) is transferred as a feedthrough setpoint rF(t) of the first mirror 110 to the second control loop R2, e.g. B. to a further summation unit 330 of the second control loop R2. The adjusted setpoint r2(t) is determined, for example, by summing the initial setpoint ri(t) and the first actual value y1(t) or the feedthrough setpoint rF(t): r2(t) = ri(t) + y1(t) = ri(t) + rF(t) Thus, a position error of the liquid-tempered first mirror 110 due to liquid-transmitted acoustic disturbances can be forwarded to the control loop R2 of the non-liquid-tempered second mirror 112.The control loop R2 of the non-liquid-temperature-controlled second mirror 112 can therefore at least partially compensate for a position error of the liquid-temperature-controlled first mirror 110 by controlling the position P2 of the second mirror 112. Fig. 7 illustrates a block diagram relating to a further embodiment of the method for compensating for liquid-transmitted acoustic disturbances of the liquid-temperature-controlled first mirror 110. In this embodiment, the position P1 of the first mirror 110 is not controlled. The position P2 of the second mirror 112 is controlled using a second control loop R2' and a second control device 314'. The second control loop R2' according to the embodiment in Fig. 7 differs from the second control loop R2 according to the embodiment in Fig.6 merely in that the first actual value y1(t) transmitted to the second control loop R2 is an actual value y1(t) of an uncontrolled position P1 of the first mirror 110. This means that in the embodiment of Fig. 6, the second control loop R2 is configured to compensate only for a remaining control error of the first mirror 110. In the embodiment of Fig. 7, however, the second control loop R2' is configured to completely control the position P1 of the first mirror 110 on its own. Since the first mirror 110 is liquid-cooled and thus affected by acoustic disturbances transmitted via the cooling liquid, superposition of the resonances of a disturbance and a transfer function of the first control device 312 can occur.To avoid or reduce this, a control frequency range Δf1 of the first control loop R1 can be suitably preset (for example, during manufacture of the first controller device 312). Fig. 8 schematically illustrates a frequency range Δfs of a disturbance excitation. In particular, Fig. 8 shows a diagram indicating an acceleration a (e.g., in one of the three spatial directions x, y, z) of the first mirror 110 as a function of a frequency f. A graph G shows a function of the acceleration a of the first mirror 110 as a function of the frequency f due to a disturbance excitation. As can be seen in Fig. 8, the acceleration a is very low and / or zero (a1, a2) in a first frequency range Δf1 from a frequency f1 to a frequency f2. Furthermore, an acceleration a with large amplitudes occurs in a second frequency range Δf2 from a frequency f2 to a frequency f3.The acceleration a of the first mirror 110 due to disturbances can be determined (although not shown in Fig. 8) in all three spatial directions x, y, z. The acceleration a of the first mirror 110 due to disturbances can be determined, for example, using acceleration sensors (not shown) attached to the first mirror 110 or a mirror body of the first mirror 110. Using values ​​recorded by these sensors, a disturbance frequency range ΔfS of the acoustic disturbances of the first mirror 110 can be determined. In order to avoid resonances during control in control loop R1 and the resulting position errors of the first mirror 110, the position P1 of the first mirror 110 can be controlled in a pre-determined control frequency range ΔfR1, which deviates from the disturbance frequency range Δf. Sis different. For example only, the range Δf1 in Fig. 8 can be determined as a suitable control frequency range ΔfR1. For example, the first pre-determined control frequency range Δf R1as a frequency range for which the control deviation e1(t) of the control loop R1 is less than 10%, less than 5%, less than 3%, less than 1%, less than 0.1%, and / or less than 0.01% of the first setpoint r1(t). Furthermore, the position P2 of the second mirror 112 can be controlled by means of the second control loop R2 in a pre-determined second control frequency range ΔfR2, which is different from the first control frequency range ΔfR1. Since the second mirror 112 is not liquid-cooled, unlike the first mirror 110, it is not subject to acoustic disturbances. Thus, avoiding the disturbance frequency range ΔfS in the second control loop R2 is not necessary. This allows the second control frequency range ΔfR2 to be preset more broadly. In the example Carl Zeiss SMT GmbH 31of Fig.8, the second control frequency range ΔfR2 comprises frequencies from f1 to f4, where f4 is greater than the upper frequency limit f2 of the first control frequency range ΔfR1. Fig. 9 shows an embodiment of the controller device 312, 314, in particular the controller component 316, 318 of the controller device 312, 314 (Figs. 3 and 4). The corresponding controller component 316, 318 has at least one proportional controller element 338, at least one integral controller element 340, and at least one derivative controller element 342. The contributions to the manipulated variable u1(t) determined by the controller elements 338, 340, 342 are combined at a further summation unit 344. In the example of Fig. 9, the controller component 316, 318 has exactly one proportional controller element 338, exactly one integral controller element 340 and exactly one derivative controller element 342 (so-called PID controller). In another example shown in Fig.In the example shown in Figure 10, a controller component 316' of the first controller device 312' has a proportional controller element 338, three integral controller elements 340', and one derivative controller element 342 (so-called PI3D controller). By increasing the number of integral controller elements 342 of the controller device 312' for controlling the position P1 of the first mirror 110, the first control frequency range ΔfR1 can be shifted to lower frequencies (Figure 8). As a result, the first control frequency range ΔfR1 for controlling the position P1 of the liquid-temperature-controlled first mirror 110 can be shifted to a frequency range in which interference excitations are low. Thus, resonance transmissions can be avoided even more effectively. In an optional fourth step S4 of the method, a pressure D (Fig. 2) of the temperature control liquid 204 in the liquid line 206, which is configured for controlling the temperature of the first mirror 110, is actively regulated. In Fig.Figure 11 illustrates a third control loop R3 for controlling the pressure D of the tempering fluid 204 (e.g., cooling fluid 204). A pressure control device 400 comprises a third controller 402 and a third control system 404. The control system 404 includes a sensor 406 for detecting an actual value y. d (t) of the pressure D of the liquid 204, an actuator 408 for changing the pressure D of the liquid 204 (pressure changing device 410) and the liquid line 206. Carl Zeiss SMT GmbH 32 In a feedback control, a detected actual value y d(t) of the pressure D of the liquid 204 is fed back to the third controller device 402 or a summation unit 412. A pressure deviation ed(t) of the actual pressure value yd(t) from a pressure setpoint rd(t) is determined. The pressure setpoint rd(t) is, for example, zero. The third controller device 402 then determines a further manipulated variable ud(t) based on the pressure deviation ed(t). Based on the determined further manipulated variable du(t), a further actuator device 408 of a pressure-changing device 410 (e.g., an expansion chamber fluidically connected to the liquid line 206, not shown) is then controlled to change the pressure D of the liquid 204 in the liquid line 206. Through active pressure control, pressure fluctuations in the liquid 204 can be actively suppressed. In particular, a pressure fluctuation in the liquid 204 can be compensated before it is passed on to the first mirror 110 to be cooled.In this way, a change in the position of the first mirror 110 caused by pressure fluctuations of the liquid 204 can be further reduced or avoided. Optionally, the pressure D of the liquid 204 in the liquid line 206 can be controlled in a pre-determined further control frequency range Δf. d (Fig. 8). The pre-determined further control frequency range Δf d is selected, for example, such that it is different from the first control frequency range ΔfR1, in which the position control of the first mirror 110 takes place. As shown in Fig. 8, the further control frequency range Δf d and the first control frequency range Δf R1For example, they do not interact with each other. Thus, the pressure control is carried out in such a way that pressure fluctuations are compensated for at the frequencies at which the control of the position P1 of the first mirror 110 exhibits large control errors. In the following, with reference to Fig. 12, a method for producing a control device 312, 312' (Figs. 3, 9, and 10) for controlling a position P1 of a liquid-temperature-controlled optical component 110 (first optical component 110, Fig. 2) of a lithography system 1 (Fig. 1) is described. In a first step S1' of the method, an interference frequency range Δfs (Fig. 8) of acoustic interference excitations of the optical component 110 is determined. The interference frequency range Δfs of the acoustic interference excitations of the optical component 110 is in particular an interference frequency range Δfs of the acoustic interference excitations of the optical component 110 during operation of the Carl Zeiss SMT GmbH 33 lithography system 1.During operation of the lithography system 1, the optical components are irradiated, in particular, with working light 6, e.g., EUV light, and / or a substrate holder (wafer holder 14 in Fig. 1) and / or a mask holder (reticle holder 8 in Fig. 1) are moved. In step S1', the interference frequency range Δfs of acoustic interference excitations of the optical component 110 is determined, for example, by prediction (e.g., a model calculation) and / or by detection (e.g., using acceleration sensors). In a second step S2' of the method, a controller component 316 of the controller device 312, 312' is configured (e.g., manufactured and / or adjusted) such that the control of the position P1 of the optical component 110 takes place in a pre-determined control frequency range ΔfR1, which is different from the pre-determined interference frequency range Δfs.For example, the controller component 316 is configured such that the pre-determined control frequency range ΔfR1 and the pre-determined interference frequency range Δfs do not overlap. Although the present invention has been described using exemplary embodiments, it is susceptible to numerous modifications.

[0002] Carl Zeiss SMT GmbH 34 LIST OF REFERENCE SYMBOLS1 Projection exposure system2 Illumination system3 Light source4 Illumination optics5 Object field6 Object plane 7 Retikel 8 Reticle holder9 Reticle displacement drive10 Projection optics11 Image field12 Image plane 13 Wafer14 Wafer holder 15 Wafer displacement drive 16 Illumination radiation 17 Collector 18 Intermediate focal plane 19 Deflecting mirror 20 First facet mirror 21 First facet 22 Second facet mirror 23 Second facet 100 Projection system 102 Projection optics 104 Frame structure 106 Frame structure 108 Frame structure 110 Optical component 112 Optical component 114 Sensor device 116 Laser beam 118 Actuator device 120 Actuator device 122 Aktor200 Temperature control device 202 Temperature control unit Carl Zeiss SMT GmbH 35204 Liquid 206 Liquid line 300 Compensation system 302 Computing device 304 Data transmission 306 Receiving unit 308 Controller unit 310 Controller unit 312, 312' Controller device 314, 314' Controller device 316, 316' Controller component 318 Controller component 320 Controlled system 322 Actuators 324 Sensors 326 Summation unit 328 Summation unit 330 Summation unit 332 Controlled system 334 Actuators 336 Sensors 338 Controller element 340, 340' Controller element 342 Controller element 344, 344' Summation unit 400 Pressure control device 402 Controller device 404 Controlled system 406 Sensors 408 Actuator device (actuators) 410 Pressure change device 412 Summation unit a Accelerationa1, a2, a3 Acceleration D Druck Δf1, Δf2 Frequency range ΔfR1, ΔfR2 Frequency range Δf s , Δf d Frequency range Carl Zeiss SMT GmbH 36e1, e2, ed Deviationf Frequencyf1, f2, f3, f4 Frequency G GraphM1-M6 MirrorP1, P2 Positionr1, r2 Setpointri, rF, rd SetpointR1-R3, R2' Control loopS Beam pathS1-S4 Process stepsS1'-S2' Process steps t Zeit u1, u2, ud Control valuex, y, z Directiony1, y2, yd Actual value

Claims

Carl Zeiss SMT GmbH 37 PATENT CLAIMS 1. Verfahren zum Kompensieren von flüssigkeitsübertragenen akustischen Stör- excitations of a liquid-tempered optical component (110) of a litho- graphieanlage (1), wobei die Störanregungen der optischen Komponente (110) als ei- a first optical component (110) using a non-liquid-tempered second optical component (112) of the lithography system (1), comprising the steps of: a) receiving (S1) a first and second actual value (y 1 , y 2 ) of a position (P 1 , P2) entsprechend der ersten und zweiten optischen Komponente (110, 112), und b) controlling (S3) the position (P2) of the second optical component (112) to an adjusted target value (r2) of the position (P2) of the second optical component (112), which is based on an initial target value (ri) of the position (P2) of the second optical component (112) and the first actual value (y1) of the position (P1) of the first optical component (110).

2. Verfahren nach Anspruch 1, aufweisendControlling (S2) the position (P1) of the first optical component (110) to a first target value (r1) of the position (P1) of the first optical component (110) based on the first actual value (y 1 ).

3. Verfahren nach Anspruch 2, wobei das Regeln der Position (P1) der ersten opti- component (110): determining a first manipulated variable (u 1 ) based on a first deviation (e 1 ) of the first actual value (y 1 ) from the first setpoint (r 1 ), and A nsteuern einer ersten Aktoreinrichtung (118) zum Positionieren der ersten optical component (110) based on the first manipulated variable (u1).

4. Verfahren nach einem der Ansprüche 1 bis 3, wobei das Regeln der Position (P2) the second optical component (112): determining a second manipulated variable (u 2 ) based on a second deviation (e2) of the second actual value (y2) from the adjusted setpoint value (r2), and A nsteuern einer zweiten Aktoreinrichtung (120) zum Positionieren der zweiten optical component (112) based on the second manipulated variable (u 2 ).

5. Verfahren nach einem der Ansprüche 2 bis 4, wobei das Regeln der Position (P1)the first optical component (110) in a first pre-determined control frequency range (ΔfR1), which is separated from a pre-determined interference frequency range Carl Zeiss SMT GmbH 38 (Δf s ) of the acoustic disturbance excitations of the first optical component (110) is different.

6. Verfahren nach Anspruch 5, wobei der erste vorermittelte Regel-Frequenzbe- rich (Δf R1 ) is a frequency range in which the first deviation (e 1 ) is less than 10%, less than 5%, less than 3%, less than 1%, less than 0.1% and / or less than 0.01% of the first setpoint (r1).

7. Verfahren nach einem der Ansprüche 2 bis 6, wobei the regulation (S2) of the position (P 1 ) of the first optical component (110) takes place in a pre-determined first control frequency range (ΔfR1), the control (S3) of the position (P2) of the second optical component (112) takes place in a pre-determined second control frequency range (ΔfR2), and the first and second control frequency ranges (ΔfR1, ΔfR2) are different from one another.

8. Verfahren nach einem der Ansprüche 2 bis 7, wobeithe control (S2, S3) of the position (P1) of the first optical component (110) and / or the second optical component (112) is carried out in each case by means of a control device (312, 314) which has at least one proportional control element (338), at least one integral control element (340) and at least one derivative control element (342), and / or the pre-determined first control frequency range (ΔfR1) for controlling the position (P 1 ) of the first optical component (110) is preset by increasing the number of integral control elements (340') of the control device (312').

9. Verfahren nach einem der Ansprüche 1 bis 8, wobeithe first and second optical components (110, 112) are arranged one after the other with respect to a beam path (S) of the lithography system (1), the first and second optical components (110, 112) are both arranged in an imaging beam path (S) of the lithography system (1), the first and second optical components (110, 112) are both components of a projection system (100) of the lithography system (1), and / or the first and second optical components (110, 112) are both configured to image a mask (7) on a substrate (13) arranged in an image plane (12) of the lithography system (1) and / or the projection system (100) of the lithography system (1).

10. Verfahren nach einem der Ansprüche 1 bis 9, aufweisend Carl Zeiss SMT GmbH 39 Controlling (S4) a pressure (D) of a liquid (204) in a liquid line (206) which is designed for controlling the liquid temperature of the first optical component (110), wherein: an actual pressure value of the pressure (D) of the liquid (204) is received, a further manipulated variable (ud) is determined based on a pressure deviation (ed) of the actual pressure value (yd) from a pressure setpoint (rd), and a further actuator device (408) of a pressure changing device tung (410) basierend auf der ermittelten weiteren Stellgröße (ud) zum Verändern des Drucks (D) der Flüssigkeit (204) in der Flüssigkeitsleitung (206) angesteuert wird.

11. Verfahren nach Anspruch 10, wobei the control (S2) of the position (P1) of the first optical component (110) takes place in a pre-determined first control frequency range (ΔfR1), the control (S4) of the pressure (D) of the liquid (204) in the liquid line (206) takes place in a pre-determined further control frequency range (Δfd), and the first and the further control frequency range (ΔfR1, Δfd) are different from one another.

12. Rechenvorrichtung (302) zum Kompensieren von flüssigkeitsübertragenen acoustic disturbances of a liquid-tempered optical component (110) einer Lithographieanlage (1), wobei die Störanregungen der optischen Kompo- component (110) as a first optical component (110) with the aid of a non-liquid-temperature-controlled second optical component (112) of the lithography system (1) kompensiert werden, aufweisend:a receiving unit (306) for receiving a first and second actual value (y1, y2) einer Position (P1, P2) entsprechend der ersten und zweiten optischen Kompo- nente (110, 112), and e ine Reglereinheit (310) zum Regeln der Position (P2) der zweiten optischen Component (112) to an adjusted setpoint (r 2 ) of the position (P 2 ) of the second optical component (112), which is set to an initial target value (r i ) of the position (P2) of the second optical component (112) and the first actual value (y1) of the position (P1) of the first optical component (110).

13. Kompensationssystem (300) zum Kompensieren von flüssigkeitsübertragenen acoustic disturbances of a liquid-tempered optical component (110) einer Lithographieanlage (1), wobei die Störanregungen der optischen Kompo- component (110) as a first optical component (110) using a non- Carl Zeiss SMT GmbH 40 liquid-tempered second optical component (112) of the lithography lage (1) kompensiert werden, aufweisend: the liquid-tempered first optical component (110), the non-liquid-tempered second optical component (112), an actuator device (120) for setting a position (P 2) of the second optical component (112), and a computing device (302) according to claim 12 for determining a manipulated variable (u2) based on a deviation (e2) of the second actual value (y2) from the adjusted ten Sollwert (rs), und zum Ansteuern der Aktoreinrichtung (120) zum Positionieren the second optical component (112) based on the second manipulated variable (u 2 ).

14. Lithographieanlage (1), insbesondere EUV-Lithographieanlage, mit einer Re- chen device (302) according to claim 12 or a compensation system (300) according to claim 13.

15. Verfahren zum Herstellen einer Reglereinrichtung (312, 312') zum Regeln einer Position (P1) of a liquid-tempered optical component (110) of a litho- graphieanlage (1), aufweisend Determining (S1') an interference frequency range (Δfs) of acoustic interference excitations of the optical component (110), and setting up (S2') a control component (316) of the control device (312, 312') such that the control of the position (P1) of the optical component (110) takes place in a pre-determined control frequency range (ΔfR1), which is delimited by the pre-determined interference frequency range (Δf s ) is different.

Images